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The Lorain pattern of depression glass, also known as Basket was made by the Indiana glass company in only yellow and green colors. This subtle pattern features an image of a basket with flowers and plants comping out and around but the pattern pressed into the glass and is not very striking to the eye. Having said that, any yellow pieces of depression glass seem to be very popular with collectors.
Lorain was used on square plates and bowls, tumblers and salad bowls.
Made by: Indiana Glass Company
Date Made: 1929-1932
Approximate Number Sold on eBay (last 3 months): 39
Average Sale Price: $16.89
Most Popular Colors:Yellow, Green
Rare Items: 8 inch bowl.
Popular Depression Glass Items:
1955 Press Photo Automobile Accident at Lorain looking toward the Tracks,US Supreme Court Transcript of Record Werk V Lorain Street Savings,US Supreme Court Transcript of Record Lorain Journal Co V US by U S Suprem,1991 Press Photo Star Football Ludwig Tiny Pincura Lorain Sports Hall of fame,Press Photo Lorain Olympics Jordan Fitzpatrick Corey Cunningham Kathy Tomko,Polka Sharps My Polish Girlfriend LP Vintage Lorain Ohio VG,Woodsman Lorain County Parks District Patch Sale Price genuine V old,La Petite Dorrit Traduit Sous La Direction de P Lorain Par M William,Anchor Hocking Lorain Avacado Open Lace Floral Bowl or Spoon Holder,1968 AAA Street Map of Lorain County Ohio,4 IN ONE Black Bakelite LORAIN MEDINA Rural Electric Co op Inc Letter Opener,Lorain RJ12A25 Flotrol Rectifier 19 rack mount,Lorain RL50F50 Flotrol Rectifier High Frequency 19 rack mount,OLD LARGE HISTORIC PHOTO OF LORAIN OHIO THE LORAIN EYLRIA STREETCAR c1900,Original Slide Lake Terminal RR SW8 823 In 1980 AT Lorain OH,Original Slide Lake Terminal Railroad SW1200 1205 In 1993 At Lorain OH,Original Slide LTRR Lake Terminal RR SW1001 1022 In 1985 At Lorain OH,Vintage 1930s Green Depression Glass Sugar Bowl by Lorain,The Lorain Central High Level Bridge Lorain Ohio 1958 D12,Harbor Entrance at US Coast Guard Station Lorain Ohio D11,VINTAGE LORAIN OHIO POLICE PISTOL TEAM PATCH USED OBSOLETE STYLE,OLD LARGE HISTORIC PHOTO OF LORAIN OHIO AERIAL VIEW OF THE WATERFRONT c1940,Cats Meow Nautical Series Lorain Light House Lighthouse Wood Shelf Sitter,AME LORAIN Whole Wide World 7 With Promo Info Sheet B w Elliot Wolff 12 pb49,AME LORAIN Whole Wide World 7 B w Elliot Wolff 12 pb49293 Sticker On Back O,Vintage Sittlers Dry Goods Advertising Candy Dish Lorain Ohio,Lorain High School Lorain Ohio 1928 Scimitar Yearbook,Vintage Holman Masonic Holy Bible 1968 Lorain Ohio with Box,AME LORAIN Whole Wide World 12 3 Track Wingate 12 House Remix Promo B w Ellio,AME LORAIN Whole Wide World 12 3 Track Wingate 12 Inch House Remix B w Elliot,LORAIN CRANE POCKET WATCH FOB,LOT OF 2 PREMIER LORAIN YARN BLUE 1109,LOT OF 3 PREMIER LORAIN LORAIN SPACE YARN PURPLE PURPLE GREEN VARIEGATED,AMe Lorain Starring InStanding In A Monkey Sea JPN CD album CDLP promo,Lorain Ohio Aug 9 1938 Single Franked Cancel On Cover To Cleveland,BANTAM LORAIN CONTROL CABLE PART 04444V0878 NEW,LORAIN Ohio PU 1908 Launching W M Mills,LORAIN Ohio PU 1911 Launching Albert Price,Johnstown Lorain Works USSteel 1940s tour info booklet many pictures history,TV HEBDO MICHEL CT LES HRITIERS DUVAL DANIEL LEMIRE URGENCE SOPHIE LORAIN,


text:
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Description: View of a bird (Robin) perched on its nest atop an outdoor lighting fixture.
Description: "This band is made specifically for Harley Davidson 'Hog' riders."
Date: 2004
Description: These barn buildings are owned by Ken Schoebel, who lives up the West Bend Road.
Date: 1993-11
Description: "High winds played havoc with the cross on St. Peter's Lutheran Church. Steeplejack, Tim McNitt, of Kiel was called in to rectify the 'leaning cross.'"
Date: 1978-02-17
Description: "Mrs. Bruce Dunbar poses amid shelves of fine wine and liquor at Dunbar's Inn."
Date: 1959-07-05
Description: "Shirley Widmer reminisces on Spring Valley Road."
Date: 1915 ca.
Description: A church near Oak Grove.
Date: 1984-06
Description: "St. Peter's Sunday School children and their teachers."
Date: 2003-03-21
Description: "Today we are at Confections For Any Occasions in beautiful downtown Theresa. On the special time of our 200th different place, we are joined by Andrea Han...
Date: 1978-02-14
Description: "Principal Delores Justman and her first and second grade class — Theresa Public School."
Date: 1892
Description: This bird's eye view map is oriented looking north-east and includes index of points of interest and businesses. The map is a photocopy.
Date: 1908 ca.
Description: Florentina, Jennie, Edgar, and Alexander Krueger standing in the middle of a wheat field on their farm.
Description: "Dr. Arnold W. Boegel receives a 'This Is Your Life' booklet from Walter Sauer, representing the Theresa Lions Club."
Date: 1901-02-10
Description: Winter scene with Herman Riebe, his four sisters, and a cousin riding in a bobsled pulled by a team of white horses through the snow. A fence, a snowy fiel...
Date: 1983-08
Description: "Gerald and Grace Batzler with sons, Roger and Thomas, pose in a field dotted with shocks of grain."
Date: 1975
Description: "Main (Milwaukee) Street. Six taverns were in business in the span of one block!"
Date: 1901-10
Description: Outdoor portrait of Jennie Krueger seated in the grass with a kitten in her lap.
Date: 1906-12
Description: Alexander Krueger and Henry Bigalk sitting on the floor of the front porch smoking pipes. The bag of tobacco sits on the ground in front of them.
Date: 1932-04-10
Description: Outdoor group portrait of the Alexander Krueger family. The women sit in front on chairs while the men stand behind. Front row from the left Jennie Krueger...
Date: date unknown
Description: View of automobiles driving on a street, entering the city. The Theresa water tower can be seen on the left.
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subset: commoncrawl


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What a freaking way to celebrate World Turtle Day! Randy Falk and NECA TOYS have outdone themselves once again! They have broken Twitter and the Internet with their Teenage Mutant Ninja Turtle news!
|TMNT Teaser
As a hardcore TMNT fan I am ecstatic! Totally freaking excited! This has been many years in the making and Randy's patience and perseverance has finally paid off. A long time ago on one of our visits to the studio we spotted some Konami TMNT arcade game figures. Of course, we inquired and Randy coyly told us "maybe one day."


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Personal vs. Professional on Social Media
Think those Instagram selfies of you and friends don't support your career? Think again!
Personal vs. Professional on Social Media
Think those Instagram selfies of you and friends don't support your career? Think again!
How to Nail a Procedural Drama Audition
Procedural dramas are everywhere—and they cast a ton of actors constantly. Here are some quick tips on how to give your audition the edge it needs!
The CSA Breakdown on Todd Thaler
Todd Thaler has worked on everything from "Billy Madison" to "Little Children." He tells Backstage what draws him to a project, what actors should know walking into his room, and why being apologetic can be a drawback.
1 Negative Element Actors Must Remove From Their Lives ASAP
Secret Agent Man knows his fair share of actors, and has seen how they interact with one another. The experiences have led to serious revelations about what does and doesn't work in the dynamic.
How to Profit From Your Creative Skills
There's no reason you have to limit your creative skills to the industry! Get inventive and make money will you do so!
Is Your Child Being Overly Trained?
Backstage Expert Denise Simon explains how to know if your child actor is being overly coached or not.
6 Classic Characters (and the Masters Who Embody Them)
To become a great actor you have to study the greats and the great archetypes! Here are six examples of classic leading men and women!
1 Reason to Think Before You Leap Onto a Project
Producer and casting director Marci Liroff understands that just because you own a camera and have an idea, that doesn't make you a filmmaker. So start doing your research about the people making indie films before signing on.
How to Get Your Short Film/Web Series Seen
YouTube and Vimeo not working for your series? Try these alternate channels!
Your 2016 Marketing Plan Starts With You
Figure out what you want to accomplish this year so you can devise the perfect accompanying marketing plan with three easy steps!


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Atlas Shrugged, p.25-32After solving her little railroad problem, Dagny returns to New York to report to her brother, Jim, on the state of the decaying Rio Norte Line. She proposes rebuilding it - actually, that's not right. She's already placed the orders to start rebuilding it, without consulting anyone. More, she's canceled their contract with Jim's preferred supplier, Orren Boyle's Associated Steel, since he never delivers what he promises, and is placing the order with a competitor, … [Read more...]
Atlas Shrugged: Intellectual Property
Atlas Shrugged: A Novel for the 1%
Way back in 2011, I read Ayn Rand's magnum opus Atlas Shrugged - all 1,074 pages of it - with a promise that I'd eventually get around to doing a chapter-by-chapter review, like my review of Lee Strobel's The Case for a Creator. I got sidetracked by other projects for a while, but now it's about time to fulfill that promise.If you haven't read Atlas cover-to-cover yourself (and who could blame you?), here's the plot in a nutshell: In a twenty-minutes-into-the-future United States of America, … [Read more...]
The Box Office Shrugs at Atlas Shrugged
Way back in 2011, I wrote about the hilarious box-office trainwreck (see what I did there?) that was Atlas Shrugged: Part I. Inexplicably, Ayn Rand's dense, multi-hour soliloquies in defense of capitalism failed to translate well into the medium of film. The last news I heard after the movie's belly-flop was that its producer, heroic rich guy John Aglialoro, was threatening, John Galt-like, to turn his back on our society of ungrateful looters and parasites and not make a sequel.But it … [Read more...]
Why I Should Pay Higher Taxes
If you're an American, you probably know that this week is income-tax time. (If you didn't already know that, sorry to tell you, but you missed the deadline.) Most people anticipate tax season with dread, but for me, this isn't an especially painful time. In fact, I almost look forward to it, because my withholding schedule is set up such that instead of having to pay more in April, I usually get a big refund. As pleasurable as it is to get that refund, I'm aware this makes no rational sense. I … [Read more...]
Why We Should Tax the Churches
This essay was previously published on AlterNet. Last November, I attended a debate in the NYU Intelligence Squared series on the topic, "Would the World Be Better Off Without Religion?" One of the audience questions concerned the enormous wealth hoarded by churches, which Christian apologist Dinesh D'Souza defended as follows:I think in the case of the Vatican, the wealth of the Vatican is in priceless treasures, tapestries, the ceiling of the Sistine Chapel, art. Now, let's remember... it … [Read more...]
Why We Should Tax the Churches
My latest article has been posted on AlterNet, How We All Pay For the Huge Tax Privileges Granted to Religion -- It's Time to Tax the Church. In it, I discuss the enormous wealth owned by churches, financed in part through generous tax exemptions not available to any other organization; the shameless greed of "prosperity gospel" theology; and the bizarre rhetoric of resentment spreading among the American religious right which insists it's a sin to call for higher taxes on the rich or greater … [Read more...]
Weekend Coffee: November 12
Here's some miscellany to accompany your morning coffee: • 70 major U.S. corporations and civic organizations call for DOMA to be struck down in a friend-of-the-court brief supporting a federal legal challenge. • Help defend the First Amendment! The U.S. Forest Service is considering a request from FFRF to terminate a Catholic group's no-cost lease for a shrine to Jesus on federal parkland. The public comment period is open until December 8, and we need to make our voices heard. The … [Read more...]
Penn Jillette: Is Libertarianism Compatible with Atheism?
Penn Jillette is a larger-than-life figure in every way, including but hardly limited to his imposing physical stature. He's of course best known as one of the world's most famous living magicians, and on stage with his partner Teller, he has the cheerful swagger of a carnival barker, revealing how some tricks are done and daring you to guess at the others. That winking insouciance and delight in breaking taboos carries over into his TV show, Bullshit!, which was one of the increasingly few … [Read more...]
Book Review: God, No!
(Author's Note: The following review was solicited and is written in accordance with this site's policy for such reviews.)Summary: Just what you'd expect from its author: outspoken, boisterous, crude, frequently vulgar, often hilarious. Unapologetically atheist, but more about Penn Jillette the person than about atheism per se.God, No! is written by Penn Jillette, the louder half of Penn & Teller who's well-known for his skeptical and libertarian views. He's also known for being … [Read more...]
Weekly Link Roundup
The storm may rage and the winds may howl, but I'm still here! (So far.) Here's a couple of interesting stories I didn't have time to write more about this week:• Following Rick Perry's urgent prayers for rain in his drought-stricken state, Tropical Storm Don formed in the Gulf, headed toward Texas, and then dissipated before dropping any significant rain. The drought continues. How long will it be before Perry's Christian supporters start to seriously consider if God is punishing him for … [Read more...]


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United winger scoops award
Dundee United winger Gary Mackay-Steven has been named as Clydesdale Bank young player of the month for February.
The 21-year-old has proved an excellent acquisition for the Tangerines since joining them from Airdrie United last summer.
He was rewarded for his efforts earlier in the week with a debut for the Scotland Under-21 side in their 0-0 draw with Holland.
Mackay-Steven previously had a couple of years at Liverpool before eventually joining Airdrie and has netted three times in 25 appearances for the Tayside club this season.
Win FREE pizza with Vital Football!
Select your team and get 50% off if they score twice.


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|Organic India Jwala Pepper
This long slender pepper is from India. It is about finger length thus it's other name of finger hot pepper. Very spicy. Makes excellent dried pepper flakes or powder. Our most popular powder at the farmers market. Dries easily because they are so skinny and the flesh is thin.
|Organic Chamomile, German
For years chamomile has been used in teas for a soothing and calming effect. In fact a tea made of it is said to be an excellent anti-fungal agent on other plants! Grows up to 22 inches tall and 12 inches wide, has many thin branches of finely divided green leaves. Tiny 3/4 inch white and sunshine yellow daisy-like flowers appear from early summer to fall.


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...I have also successfully watched as students confidence and reading level increase throughout the school year. I have over 10 years working with children with special needs and/or behavior disorders. I am comfortable working with students with severe emotional behavior disorders (SEBD), ADHD, autism, bipolar, and other learning disabilities.
Jonesboro, GAView Tutor
...Using this approach, I have helped students, with great success, in the following areas:- English- Social Studies- Test prep (SAT, ACT, and LSAT)I hope that we can work together and accomplish more than you anticipated.I graduated from Duke University School of Law in 2011. I am currently a prac...
Atlanta, GAView Tutor
...I am particularly interested in helping students navigate the college admissions and pre-medical/pre-dental admissions processes, and enjoy working with multicultural, multilingual, and international families to address their particular concerns. I am proficient in French and Twi, and lived in W...
Atlanta, GAView Tutor
...I will also proof your paper, if requested, and do some checking for plagiarism. Sincerely, Tony M.I am a Microsoft Certified System Engineer with over 20 years of experience using Microsoft Excel. I have a Masters degree in Middle Grades Education that I completed in July of 2010.
Atlanta, GAView Tutor
...In this course I introduce students to basic vocabulary and fundamental sentence structures in the present and past. Pronunciation, grammar, and everyday vocabulary are stressed as indispensable tools for comprehension and expression. French customs, culture, and everyday life are also highlighted.
Norcross, GAView Tutor


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In our quest to eradicate zits we've tried our fair share of pimple-busting products—with mixed results. This radical serum may very well be The One. The doctor-developed formula penetrates the skin, going straight to the source to eliminate trapped bacteria, dirt, and oil to restore damaged skin. It gets the job done quickly and gently, without irritating or over-drying your skin. The patent-pending YS3 Complex delivers blemish-banishing ingredients, like tea tree oil and salicylic acid, beneath the skin's surface. Willow bark extract reduces inflammation and redness. Bonus: The serum also tackles surface scars and hyperpigmentation.
I have been a long time sufferer of acne. Now that I am in my late 20s, I still have hormonal chin acne that I use prescription medication for. It was under control for a while, but lately it's been acting up and I decided to slather my whole chin with this. The next day my chin was less red and the inflamed pimple seemed not as red. I've been using everyday since and the deep cystic pimples have greatly reduced and it doesn't create redness/dryness. I use this every day under my makeup or before I workout (after I wash my face). I still use my prescription tazorac at night.5
I've had this sample sitting around for awhile because I was pregnant and my skin was looking great. I had my baby a few weeks ago and the change in hormones really did a number on my face, and then a pimple popped up in the of my forehead!!! I was mortified, with family and friends stopping by to see the new baby I need to do something fast. This product was a miracle worker for me. I applied to said pimple in the morning and before bed for 2 day and the pimple was gone. Will be using every last drop of this sample.5


text: In interview, Ahmadinejad pushes new world order Add to ... AP Video Published Wednesday, Sep. 26, 2012 12:45AM EDT Last updated Wednesday, Sep. 26, 2012 12:48AM EDT Iranian President Mahmoud Ahmadinejad spoke to The Associated Press in a wide-ranging interview on the sidelines of the UN General Assembly – his last as president of Iran. Watch More Video: A look back at the wobbly history of Toronto's Trump Tower Obama visits Hiroshima, site of world's first atomic bombing Justin Trudeau promotes free-trade deal with Europe at G7 Who has Neil Young's support in the U.S. presidential election? Why Bernie Sanders wants Larry David to keep impersonating him on SNL Pakistan digs mass graves to prepare for impending heat wave How J.K. Rowling really feels about Donald Trump running for president Riyadh looks to financial sector as end to oil addiction looms Video shows massive explosion after terrorist attack near Baghdad Maduro threatens takeover of private companies John Kerry soothes EU banks over Iran trade All-female combat unit hungry for revenge against Islamic State Vivica A. Fox on her former 'Celebrity Apprentice' boss Donald Trump Toronto Maple Leafs hopeful for next season Syrians risk their lives to protect antiquities, empty museums Shocking footage shows extent of war-torn Yemen's child hunger crisis Footage shows scenes from the battle to recapture Palmyra Drone footage captures Palmyra ruins Syrian troops drive Islamic State out of Palmyra Oil rallies above $40 for the first time since December Comments AA More Related to this Story Video: Iran unveils domestically-built drone Politics Video: Obama tells UN diplomacy can solve Iran nuclear dispute Video: Ahmadinejad: 'We are ready to defend ourselves'


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|Publication number
|Publication type
|Application number
|Publication date
|Jan 5, 2010
|Priority date
|Jan 30, 2006
|Fee status
|Also published as
|Publication number
|Mario Hennig, Rainer Pforr, Gerd Unger
|Original Assignee
|Qimonda Ag
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (14), Referenced by (4), Classifications (13), Legal Events (5)
|External Links: USPTO, USPTO Assignment, Espacenet
This application claims priority under 35 U.S.C. �119 to Application No. DE 102006004230.1 filed on Jan. 30, 2006, entitled "Method for Producing a Mask for the Lithographic Projection of a Pattern onto a Substrate," the entire contents of which are hereby incorporated by reference.
The invention relates to a method for producing a mask for the lithographic projection of a pattern onto a substrate.
Integrated circuits are typically produced with the aid of lithographic process techniques. For a number of circuit planes to be produced on a substrate, a respective mask is produced and used to project the pattern of the plane into a photosensitive layer (resist) on the substrate. By way of example, a projection apparatus that demagnifies the structure elements of the pattern in a ratio of 4:1 or 5:1 is used.
The exposed structures in the resist are subsequently developed so that afterward, in an etching step, the developed structures can be transferred into an underlying layer in which, by way of example, electronic components such as transistors or diodes, doping regions, capacitors, interconnects, or their mutual insulations, etc., are to be formed on the basis of trenches in the layer.
Miniaturization in semiconductor technology has advanced continuously in the past 20 years. Physical limits are imposed on miniaturization by the limited resolution capability, in particular of the projection apparatuses used, with progress continuously being made.
For the quality, however, not only is the minimum width of structure elements that can be obtained on the substrate crucial, but it is also necessary to take account of the uniformity of elements of approximately identical size that are predefined in the layout after an imaging on the substrate. By virtue of a two-stage process—firstly formation of the structure elements on the mask and subsequently on the substrate (e.g. a semiconductor wafer)—the effects of nonuniformity can be intensified in a disadvantageous manner.
This applies particularly when working with line widths, i.e. widths of the structure elements formed, in the range close to the resolution limit of the projection apparatus for the imaging from the mask onto, e.g., a wafer. In the case of line widths on the mask close to the resolution limit of the optical system, a function which relates the line widths respectively resulting in the course of the imaging on the wafer to the initial line widths on the mask becomes nonlinear. Local fluctuations on the mask can therefore lead to considerable line width variations on the substrate. This is referred to as the so-called Mask Error Enhancement Factor (MEEF).
Conversely, variations of line widths of different structure elements that are already formed unintentionally on the mask from the outset in the range have a particularly considerable effect on distributions of the line widths (LB) that correspondingly result on the substrate. A very high degree of uniformity of the line widths (LB) on the mask made available is therefore required.
Currently available techniques for producing structure patterns on masks are based on electron beam writers. However, the latter no longer suffice for the future requirements made of line width uniformity, in the context of which line widths of 50 nm or less are to be obtained after projection on the substrate (semiconductor wafer).
In a manner similar to that in the course of the described structure transfer from the mask into a resist arranged on the substrate, the pattern on the mask is also produced lithographically. However, the pattern is drawn using a high-resolution beam, for instance an electron beam. Masks with less stringent requirements made of the resolution can also be drawn using the laser beam in the ultraviolet wavelength range (at 248 nm or 365 nm).
The patterns drawn in the resist on the mask are transferred into the underlying absorber layer in etching processes, usually by dry etching. In addition to effects that may be brought about by development processes, in particular etching processes for transferring the resist structure into the absorber on the mask are also considered as the cause of fluctuations of the line width. This holds true particularly at the edges and in the corners of the mask substrate which are subject to systematically deviating conditions in the etching process.
This further holds true for the production of photolithographic masks, but arises in a disadvantageous manner in particular in the production of EUV masks (EUV: extreme ultraviolet wavelength range in the range of from approximately 10 to 15 nm, used in the projection of the pattern onto the wafer). In the production of templates for the nano-imprinted technique, these variations of line width considerably restrict the usability of this technique.
One approach for avoiding these disadvantages involves performing a predistortion of the structure elements that is adapted over the region of the mask. This predistortion would have to be calculated in the layout, i.e. the pattern still present in an electronic format. The pattern would then be drawn on the mask with the predistorted layout. The predistortions compensate for the systematic variations of the line width across the region. However, the currently available solutions in terms of hardware and software technology permit this method only to a very limited extent. It would be necessary at any rate to effect renewed adaptation of the layout data after the production of a first reference mask and hence rewriting at the pattern generator, which would in turn result in increased costs since even the first reference mask would have to meet the stringent specifications.
A method is provided for producing a mask for lithographic projection that makes it possible to form an increased uniformity of the line widths on the mask. The line width uniformity is increased on the substrate that is exposed with the pattern of a mask.
A method for producing a production mask for the lithographic projection of a pattern onto a product wafer comprises providing the pattern in an electronically stored format; decomposing the pattern stored in the electronic format into a number of partial patterns; producing a respective intermediate mask for each of the partial patterns in a mask writing device, which comprises a) forming structure elements representing the respective partial pattern on a front side of the corresponding intermediate mask, b) subsequently progressively projecting the intermediate masks for the composition of a common pattern onto a test mask in a first projection apparatus, c) determining a distribution of line widths LB(x,y) of the formed structure elements of the common pattern on the test mask and, in each case, comparing with predefined, nominal line widths for the determination of a distribution of deviations ΔLB(x,y) of the line widths, d) predefining a function that specifies the line width in dependence on the radiation dose used in the first projection apparatus, e) calculating a distribution of corrections for the radiation dose from the predefined function and the measured distribution of deviations ΔLB(x,y) of the line widths so as to compensate for the deviations ΔLB(x,y) in the case of a projection, f) determining the transmission (T) in each case at the location (x,y) of the structure elements on the intermediate mask from the determined distribution of the corrections for the radiation dose, g) forming further structure elements that locally differently reduce the transmission (T) in each case at the location (x,y) of the structure elements of the partial pattern on the front side of the intermediate mask, in a plane spaced apart from the front side of the intermediate mask, with a distribution dependent on the determined transmission (T) at the location (x,y) of the structure elements on the intermediate mask; providing the intermediate masks with the further structure elements arranged in the plane spaced apart from the front side of the intermediate masks in the first projection apparatus for exposure of the production mask; and progressively projecting the intermediate masks onto the production mask for the composition of the common pattern from the decomposed partial patterns on the production mask in the first projection apparatus.
The above and still further features and advantages will become apparent upon consideration of the following detailed description of specific embodiments thereof, particularly when taken in conjunction with the accompanying drawings wherein like reference numerals in the various figures are utilized to designate like components.
The terms intermediate mask, test mask, and production mask, as used herein, designate photomasks. The different terms serve for simplified differentiation of the masks from one another when implementing the methods described herein. The same applies to the terms test wafer and product wafer, which designate semiconductor wafers. However, other types of substrates such as, for example, LCD (liquid crystal displays), can also be produced with a production mask formed as described herein.
In order to further improve the uniformity of line widths, a multistage production process is provided. First, the pattern to be formed on the mask is made available as a layout. The layout is defined herein as a pattern which is stored in an electronic format and which reproduces the positions of structure elements of an integrated circuit plane to be produced with respect to a system of reference coordinates. Auxiliary structures, so-called SRAF structures (sub-resolution assist features) or biases (OPC bias, optical proximity correction) can also be established therein. The auxiliary structures are not directly imaged in the case of projection from a mask onto the substrate, but can influence the imaging of further structure elements.
The layout may also relate to phase masks, with the result that what is specified therein is which structure elements are phase-shifting and which are not, or which structure elements (areas of geometrical figures in the layout) are to be embodied as opaque, semitransparent or fully transparent.
The layout is decomposed into partial patterns. One configuration provides for performing the decomposition in such a way that chips contained in the pattern are not separated. After the decomposition, therefore, the partial patterns preferably comprise layout portions of complete chips. In methods in which chips are separated, problems would possibly arise in the course of alignment in the context of the projection—which will be described below—into a common pattern. The partial patterns may, of course, also comprise a plurality of chips.
The decomposition of the layout is achieved with the aid of conventional software. A series of software tools that can be used to carry out operations such as combination, separation, and rework (e.g. inclusion of biases), are conventionally available for this purpose.
It is also possible, as an alternative, to create the partial patterns separately from the outset, but it is expedient for the purpose of later quality controls such as defect inspection, positional accuracy measurement, etc. to have available an electronically stored overall pattern that serves as a reference for the corresponding measurements.
The partial patterns are drawn on, e.g., a scale enlarged by a factor X relative to the final mask structure in each case on intermediate masks which together produce a mask set. The overall pattern is thus distributed between a plurality of such intermediate masks.
Production is achieved in each case in a conventional mask writing device. The intermediate masks are subsequently transferred on the scale 1/X onto a resist-coated mask blank and in the process are composed in such a way that a test mask having the desired overall pattern for the imaging on the wafer arises after the conclusion of all the customary mask production processes. The imaging from the intermediate mask onto this common test mask can be carried out in a mask stepper or scanner.
Similar projection apparatuses for the imaging of a structure from a mask onto a wafer also have such devices a light source, an illumination optic and an objective lens system as well as illumination and exit pupils and a beam path with mask and image planes; there is no intention here to effect restriction to wavelength ranges for the projection onto the mask.
In one embodiment, a line width distribution is determined on the test mask. The exposure of a wafer is effected only by a final production mask that is yet to be produced.
The structure elements formed on the test mask are measured over the mask surface with regard to their line widths. The deviation of the measured line widths from a respective target value is further calculated. The target value emerges as a predefinition for the respective structure element from the electronically stored pattern, i.e., the layout.
A function is predefined. The function describes a dependence of the line width formed on the test mask on the radiation dose used during the projection from the intermediate masks. On the basis of the function, a correction value for the local radiation dose can be calculated for each structure element to be imaged or each position on the test or intermediate masks. The calculation is performed such that the correction of the local dose after application to the relevant structure element on the mask during production, leads to a desired line width (target line width) on the test mask.
It is possible to calculate a difference matrix having the difference between the desired target line widths and the line width distribution that is actually present. The term "matrix", as used herein, denotes a representation of the distribution over the active region of the masks or over the layout. For points of an imaginary grid, the corresponding values of the distribution are specified as entries in the matrix.
A dose correction matrix or a transmission matrix can then be calculated from such a difference matrix using the function of the line width in dependence on the radiation dose. The transmission matrix specifies, for corresponding points in the layout or on the test mask, the values for the transmission which are used to carry out a correction of the intensity of the light radiated onto the test mask during projection. The dose correction is therefore effected by a local adaptation of the intensity or of the transmission on the test mask—or in close proximity of the location of the structure elements on the test mask in the projection apparatus.
According to the layout that has been decomposed into partial patterns, transmission distributions are determined on the basis of the transmission matrix, which specifies the local values of the transmission, for each of the intermediate masks of the set initially produced.
For the adaptation of the transmission in accordance with the entries in the calculated transmission matrix, according to exemplary embodiments, optical elements similar to quartz pellicles can be added to the intermediate masks, or, in accordance with further examples, the glass substrate of the intermediate masks is processed on the rear side, with the result that the corresponding absorption is produced in the glass carrier of the mask itself. These examples are explained in more detail below.
The effect is that the mask substrates or the optical components assigned thereto are locally adapted in terms of their transmission properties by means of patterning. In this case, the absorbent structure elements are situated at the defocus on the object side. This is because they are sufficiently spaced apart from the structure elements of the pattern on the mask front side (of the intermediate masks). Consequently, this spacing apart gives rise to a smearing out of the adaptation of the transmission in the focal plane of the intermediate mask. On account of this, it is not necessary to realize transmission values that are different in a complicated fashion—for instance by absorption layers having different thicknesses. Rather, the degree of transmission can be set by the density of discrete absorbent elements on the optical component or in the glass carrier on the mask rear side.
The use of such transmission-controlled optical components permits a flexible adaptation of the structure geometries caused by the projection of the intermediate masks on the mask produced for the actual production of wafers, also referred to herein as a "final" production mask. The production mask is produced as already in the case of the production of the test mask by the intermediate masks in the projection apparatus, which may be a mask stepper or scanner.
The production mask is transmission-controlled in contrast to the test mask. One advantage arises when using optical components for the adaptation of the transmission in that the intermediate masks themselves can be reused later. Only the optical components have to be produced anew in each case. As a final step, a product wafer is exposed by means of the production mask produced.
If the process for producing the integrated circuit is changed and the line width distribution on the test mask changes as a consequence, then it is merely necessary to determine this distribution and to produce a new optical component in dependence thereon. In this case, the old production mask is replaced by a new production mask which is produced from the intermediate masks that have adapted anew according to the method described herein.
In a second embodiment, the pattern in the projection apparatus can also be transferred further from the test mask onto a test wafer in order to be measured there with regard to the determination of a line width distribution of structure elements.
The structure elements formed on the test wafer are measured over the image field with regard to their line widths. The deviation of the measured line widths from a respective target value is further calculated. The target value emerges, as explained above, as a predefinition for the respective structure element from the electronically stored pattern, i.e., the layout. Analogously to the first aspect, a difference matrix can be determined from the deviation in each case between measured and predefined line widths on the test wafer.
A correction function is furthermore predefined, which takes account of the effects of the mask error enhancement factor (MEEF), as described above, during the imaging from the test mask onto the test wafer in the wafer stepper or scanner. The MEEF describes the dependence of the line width that results on the test wafer as a function of the line width on the test mask. The correction function is applied to the entries in the difference matrix. The further steps from the determination of the transmission matrix through to the projection of the pattern from the production mask onto a product wafer are carried out in a similar manner as described above in the first embodiment.
Therefore, in the first embodiment, the transmission is controlled on the basis of the line width deviations on the test mask, whereas in the second embodiment, it is controlled on the basis of the corresponding distribution of structure elements on the test wafer.
Minor proximity effects that occur during the transfer of the intermediate masks can also be corrected in accordance with the methods described herein.
Exemplary embodiments of the invention are now described with reference to the figures.
The line width distribution shown leads to comparable or, on account of the MEEF, even intensified line width variations in the image field of a scanner on a wafer if the latter is exposed with the pattern of the mask 110. Significantly smaller line widths occur at the edge, but in particular in the corners, of the image field than the center thereof. This is caused primarily by nonuniformities of the etching process with regard to the absorber layer over the mask, which may be brought about by local variations of the etching plasma.
The layout comprises 2�4 chips 212. On the basis of suitable software executed on the computing system 222, the layout 210 is separated into four partial layouts or partial patterns 214-220. Each partial pattern comprises two of the chips 212 of DRAM components. It should be noted that this exemplary embodiment is reproduced in simplified fashion here. Thus, provision can be made for also establishing barcodes or product identifications and also alignment and measurement structures in regions outside the chips (Kerf).
If, by way of example, a dimension of 40 nm is desired as the target size of a structure element in the chip, then the production of a test mask 200 with a structure element having a dimension of 160 nm is realized. The mask—wafer imaging scale is 4:1 in this example. A scale of 2:1 is provided for the imaging from the intermediate masks 230-236 onto the test or production masks 200, 600. The relevant structure element is consequently produced with an enlarged dimension of 0.32 μm on an intermediate mask 230-236 provided in the process.
The four intermediate masks 230-236 are produced in a mask writer 240 (also referred to as a pattern generator, or PG). Considerable costs and production time can be saved using this method, because high-end devices do not necessarily need to be used for this purpose.
The four intermediate masks 230-236 are supplied to a mask stepper or scanner 250. In the mask stepper or scanner 250, the masks are progressively projected into corresponding exposure fields 252 alongside one another on a mask blank coated with photosensitive resist. The exposed mask blank is formed into the test mask 200 by further processing (development, etching, resist stripping).
A further computer 354 is connected to the metrology device 350, and is used to determine a line width distribution 400 or LB′(x′,y′) over the imaged region of the mask from the measurement results. This is followed by determining the difference with respect to an average line width LB, or with respect to a line width LB predefined in some other way, which can be determined from the layout for the structure elements considered (target line width). The result is a difference matrix ΔLB′(x′,y′) describing the line width fluctuation 410 over the image field on the test wafer 300.
The locally required line width correction is obtained by a local adaptation of the transmission. In this exemplary embodiment, the adaptation is obtained by optical elements which are similar to quartz pellicles and which can be patterned in a mask writer 242, for instance a laser writer. The production process is similar to that of a chromium- or MoSi-coated mask. Examples of optical elements are shown in
The beam bundle structured by the structure elements passes through an objective lens system 16, with the result that it is focused onto the surface 24 of a mask 22 arranged in the image plane. The pattern is demagnified in the ratio 2:1 in this case. The mask 22 may correspond to the test mask 200 and also to the final production mask 600. Arranged on the surface is a light-sensitive resist layer that can be developed, with the result that the pattern transferred by projection can be transferred into an underlying layer, for example in a dry etching process.
The optical element 30 may also be connected to the mask 10 on the front side by the mount 90 also being fixed to the mask 10 by adhesive bonding, by way of example. A gastight termination as in the case of a rear-side pellicle on the mask 10 is thereby realized.
Light-shading or -attenuating elements 60 composed of e.g. chromium or MoSi (molybdenum silicide) are formed on the front side 32 of the optical element 30. The density of the elements 60 corresponds to a correction function which is intended to be used to locally influence the intensity of the light incidence on the mask 10.
As an alternative, the elements 60 may also be implemented as a phase grating, i.e. as depressions etched in the transparent substrate of the optical element 30. In this case, the local grating constant of the phase grating determines on the basis of diffraction whether light contributions can be supplied at this position or whether the light emerges out of the beam path of the lens system, for example, in the event of excessively great diffraction.
A further alternative provides for locally disturbing the structure of the quartz substrate of the optical element 30 by a pulsed laser in order to form light-scattering elements 60.
As is shown in
As an alternative, as shown in
Returning to the exemplary method sequence,
In the case where the resulting four pairs 630-636 composed of mask and assigned optical element are projected onto a further test mask, it is possible to effect a renewed determination of the distribution of the line widths LB(x,y) on the further test mask and also to calculate the matrix ΔLB(x,y) by comparison with the predefined target values for the width of the structure elements. The values of the matrix ΔLB(x,y) can then be compared with predetermined maximum values ΔLBmax(x,y) for the respective deviation ΔLB(x,y). In the case where one of the deviations ΔLB(x,y) is greater than the associated value ΔLBmax(X,y), then the steps of the method as are described proceeding from the situation illustrated in
On the basis of the final production mask, product wafers 700 having increased uniformity of the line widths and hence improved quality can now be produced in volume production.
It is also possible, however, to measure a first one of the product wafers in a manner similar to a test wafer and, in the event of the uniformity of the distribution of line widths not yet being satisfactory, to repeat the steps of the method as are described proceeding from the embodiment illustrated in
This additional loop is advantageous particularly when, in the first pass of the method, the line widths fluctuated only on the basis of the test mask and not on the basis of the test wafer.
While the above description references specific exemplary embodiments, it will be apparent to one skilled in the art that various changes and modifications can be made to such embodiments without departing from the spirit and scope thereof. Accordingly, it is intended that the present invention covers such modifications and variations provided they come within the scope of the appended claims and their equivalents.
|Cited Patent
|Filing date
|Publication date
|Oct 13, 1983
|Mar 12, 1985
|International Business Machines Corporation
|Method of compensating the proximity effect in electron beam projection systems
|Apr 23, 1984
|May 27, 1986
|International Business Machines Corporation
|Method of transferring a pattern into a radiation-sensitive layer
|Nov 8, 1999
|Mar 23, 2004
|Nikon Corporation
|Exposure method and exposure apparatus
|Oct 1, 2003
|Oct 24, 2006
|Renesas Technology Corp.
|Method of manufacturing semiconductor integrated circuit device optical mask therefor, its manufacturing method, and mask blanks
|Nov 25, 2003
|May 1, 2007
|Lg. Philips Lcd Co., Ltd.
|Liquid crystal display substrate fabrication
|Apr 23, 2004
|May 20, 2008
|Asml Netherlands B.V.
|Lithographic processing method and device manufactured thereby
|Sep 30, 2004
|Sep 16, 2008
|Infineon Technologies Ag
|Method for reducing an overlay error and measurement mark for carrying out the same
|Mar 5, 2004
|Oct 7, 2004
|Roderick Kohle
|Set of masks for the projection of structure patterns onto a semiconductor wafer
|Mar 4, 2004
|Oct 14, 2004
|Wolfgang Dettmann
|Set of at least two masks for the projection of structure patterns and method for producing the masks
|Sep 27, 2006
|Apr 5, 2007
|Asml Netherlands B.V.
|Method of patterning a positive tone resist layer overlaying a lithographic substrate
|Sep 26, 2006
|Jun 7, 2007
|Takashi Sawada
|Manufacturing method of pattern formed body and pattern formed body manufacturing apparatus
|Oct 7, 2003
|Apr 22, 2004
|Samsung Electronics Co., Ltd., Suwon
|Manufacturing photomask for photolithography involves selecting transparency-adjusting pattern features during exposure process, and ascertaining densities of pattern features
|Jul 18, 2004
|Jan 27, 2005
|Uclt Ltd.
|Method for correcting critical dimension variations in photomasks
|Jun 17, 2005
|Dec 21, 2006
|Qimonda Ag
|Method and system for photolithography
|Citing Patent
|Filing date
|Publication date
|May 17, 2011
|Infineon Technologies Ag
|Mask and method for patterning a semiconductor wafer
|Apr 10, 2012
|Nov 18, 2014
|International Business Machines Corporation
|Built-in self-test method and structure
|Aug 20, 2007
|Feb 26, 2009
|Henning Haffner
|Mask and Method for Patterning a Semiconductor Wafer
|Nov 25, 2013
|May 28, 2015
|Takao Utsumi
|Low energy electron beam lithography
|U.S. Classification
|716/50, 430/30, 430/394, 430/5
|International Classification
|Cooperative Classification
|European Classification
|May 14, 2007
Owner name: QIMONDA AG, GERMANY
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Owner name: INFINEON TECHNOLOGIES AG, GERMANY
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Effective date: 20150708


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This paper sheds light on the regulatory background of responsible organisational behaviour. Several governments are stepping in with their commitment for corporate governance as they are setting their social and environmental responsibility agenda through different frameworks. Many countries are following the guidelines of the International Labour Organisation (ILO) and the Organisation for Economic Cooperation and Development (OECD). These international organisations have provided highly recognised international benchmarks for transparent and accountable practices. This paper also made reference to some of the relevant European Union(EU) Expert Group recommendations for non-financial reporting. It transpires from the pertinent literature review that businesses are encouraged to adopt the reporting instruments of nongovernmental organisations. Finally, this paper concludes by proposing that the way forward is to have a more proactive government regulation which creates shared value by contributing to the wider societal and environmental objectives.


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I'm writing a connector into SCOM using a subscription, and trying to find out if I have a bug or not:
Do subscriptions work like a feed, so that they return me all the current alarms in the system? Or do they just fire off when a new alarm happens?
My connector polls the subscription every 30 seconds and sometimes doesn't return any alarms, so I'm hoping the reason is there are no new alarms in the system since I last polled it.
Can anyone confirm this for me?


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Scientists baffled by changes in Saturn's rings
New observations by the international Cassini spacecraft reveal that Saturn's trademark shimmering rings, which have dazzled astronomers since Galileo's time, have dramatically changed over the past 25 years.
Among the most surprising findings is that parts of Saturn's innermost ring — the D ring — have grown dimmer since the Voyager spacecraft flew by the planet in 1981. A piece of the D ring also has shifted, moving 125 miles inward toward Saturn.
While scientists puzzle over what caused Saturn's D ring to change in such a short period, the observations could tell something about the age and lifetime of planetary rings.
Scientists also are interested in Saturn and its magnificent rings because they are a model of the disk of gas and dust that initially surrounded the sun. Studying them could yield important clues about how the planets formed 4 1/2 billion years ago.
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What about Uranus?
bada boom!
re: Uranus
It's kinda gaseous too! Ha! <rim shot>
You talk the talk, but do you waddle the waddle?
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Kicking the Tires on Arch Based Antergos
We decided to take the Arch Linux based distribution Antergos out for a test drive. Here's how it handled, out in traffic and on the track. A few months back, a fellow tech writer mentioned in an email exchange that I might try using the Arch Linux based Antergos distro as a way to grab the latest and greatest versions of popular software titles for review. Mainly because of Arch's community repositories, in which users suggest and vote on packages to be included, many popular software titles are available within days after a new release. And since Antergos is a simple install compared to Arch, it would be easy to quickly throw up an installation on a test machine just to look at the latest and greatest from LibreOffice, GIMP and the like.
Red Hat and Fedora
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Gott Named manroland CFO
Brian Gott has been promoted to the position of Chief Financial Officer for manroland Inc. and manroland Canada Inc.
"Brian has proved to be a dedicated manager and exceptionally resourceful while leading his team to perform in an exemplary manner by meeting or exceeding challenging schedules in order to accommodate stringent reporting schedules defined by our German parent," stated manroland Inc.'s Managing Director, Michael Mugavero, who oversees the press maker's North American operations.
Gott joined manroland Inc. in late 1999 as its Accounting Manager and most recently held the position of Controller. Prior to joining manroland, he held key accounting management positions with several manufacturing companies. Gott earned a BA from the University of Illinois and an MBA from Benedictine University.
In late-December, manroland's parent company, manroland sheetfed GmbH in Germany, announced the delivery of its 100th press since the company began trading on February 9, 2012.
"We are delighted to have passed this first milestone, which was exactly our target for 2012 under the new organization," said Dr. Peter Conrady, Head of Sales at manroland sheetfed GmbH. "Following the re-structuring that has taken place this year, the company is able to manage a small profit at this level, despite the factory is only operating at less than one third it's maximum capacity, but with what we are seeing in the pipeline, I do expect this will increase in 2013."
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Mel Gibson Sued for Trying to Run Over a Man
A man is trying to cash in on Mel Gibson's violent reputation by claiming the actor has tried to kill him with a car. Nader Sharif had once tried to fork out money out of Gibson in June, filing a lawsuit in which he claimed Gibson swindled him out of $200,00 for a recyclable rubber company investment. Sharif is filing a second lawsuit.
This time, Sharif said he ran into the actor at a Costa Rican bakery and Gibson got violent, calling him "vile and offensive names". Gibson allegedly threatened Sharif to leave town before storming out of the bakery and entering his car.
Sharif said he followed the star outside but Gibson "accelerated the car to a high rate of speed" and aimed the car at him while flashing the middle finger. Sharif said he managed to jumped out of the way and saved himself.
This should be an easy case for Gibson because many witnesses would testify against Sharif. One witness told TMZ that Gibson was in the bakery to enjoy pastry and coffee when Sharif confronted him. Gibson asked Sharif to leave but the man would not budge. Gibson then left the store and, unlike Sharif's story, drove away without aiming the car at anybody.
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Browse through a variety of lower and upper chest exercises designed by today's leaders in the health fitness industry. We have strength training exercises for beginner, intermediate and advanced users. These exercises will help you increase the strength and definition of your chest area. If you want more information on chest exercises or strength training of any kind, be sure to check out our Fit Facts section and Ask the Expert column. These chest exercises are also featured in full workout routines in our Workouts section.
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McKlein USA Midway Leather Checkpoint-Friendly 17 in. Detachable-Wheeled Laptop Case - Brown
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"The Bold and the Beautiful" airs Weekdays on CBS. Weeknights on Pop TV. Anytime on CBS.com or the CBS app on Android and iOS enabled devices.
The Bold and the BeautifulALL THINGS RELATED
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ALERT: First Two of Eight 'Bold and the Beautiful' Themed Novellas Release Date Announced
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Piece a Cake
not to bad,,
Easy peasy
Best part was the name!
fun puzzle
first try baby
Still not the first page.
Excellent puzzle.
very easy
I enjoyed the name most. Kudos to you kind sir for such jovial nomenclature.
first but at first i didnt realize that the queen was going to be taken but when it did get taken i realized it didnt matter.
Nice... I usually skim comments before I tackle the puzzle (just to get a general consensus of whether it's good or not. Queen sac comment spoiled it for me). Needless to say, I won't read comments beforehand anymore.
easy one
Q-h5 g6
Qxg6 K-f8
Qe8 Mate in 3. No Queen sac.
I thought that today was Wednesday, not Sunday, because that was like a Sunday puzzle.
peace of cake
Is it Sunday already?
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Melinda's Reviews > Dare Truth or Promise
Dare Truth or Promise
by Paula Boock
by Paula Boock
Melinda's review
bookshelves: young-adult, lesbian, australia
Apr 02, 2016
bookshelves: young-adult, lesbian, australia
Read in May, 2009
A good book, although a bit too melodramatic and happily-ever-after to be realistic. Not a terribly memorable story, but I did like that took place in Australia.
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PANO – A Boeing 767-300 carried 261 passengers on the first non-stop flight from Boryspil Airport, Kiev, Ukraine, to Cam Ranh International Airport in Khanh Hoa province on November 26th.
The flight is part of the cooperation between Ho Chi Minh City-based Anh Duong Manufacturing Trade Services Import and Export Limited Company and Russia's Pegas Touristik Company, aiming to bring more tourists from Russia and SNG member countries to Vietnam.
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- First five-star resort on Cam Ranh Peninsula
Among the passengers, 20 members of a Famtrip delegation, representatives of Ukrainian travel agencies, will study the tourism market in Nha Trang City, Phan Thiet City and Ninh Thuan Province.
From now to April 2014, there will be a non-stop flight from Ukraine to Cam Ranh every week, and if everything goes well, this route will be expanded in the future.
Translated by Tuan Anh


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Mummies Alive Showreel
RealtimeUK have released a showreel of their CG work on Mummies Alive.
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Bring a buddy.4.55 / 5.00 9,753 Views
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Vampire Pixel in the Neon City
A sinister deal is underway in the underbelly of Neon City4.34 / 5.00 11,190 Views
That's too bad
This is a really bizarre cartoon and it's a shame it will apparently never advance! I haven't seen the others in this series, but I imagine they're just as weird. I am generally not a fan of your work, but this was actually really good! It reminds me of that one "Twilight Zone" episode. It featured people who were stuck in some place and they couldn't eat or sleep. At the end, it turns out they were actually toys in a container!
I doubt that's going to be the same here, but then again, we'll never find out. Hopefully, we can all learn to appreciate what you left behind. This doesn't have the senseless and silly violence that most of your flashes had. It does look a bit dated, but still nicely done. I appreciate you submitting anything you want to here.
Jesus I keep running into Omhdon. Surface, Xin, Xionic Madness i keep hearing his voice hes a good voice actor
awedome work!!!!!
Interesting story with suspense... I look forward to the next episode.
It's like Gantz... and Godeater... and Persona...


text:
WINSTON-SALEM, N.C. – Douglas Lyles, Ph.D., of Winston-Salem, has been named professor and chairman of the Department of Biochemistry at Wake Forest University Baptist Medical Center.
"We are fortunate to have a scientist and leader of Dr. Lyles's caliber to head this department," said William Applegate, M.D., professor and dean of the School of Medicine. "He was selected from a group of extremely talented candidates."
The Department of Biochemistry has 25 faculty members who are involved in research of cancer, metabolic diseases such as diabetes, the metabolism of oxygen and structural biology. Lyles, who has an active research program in viral diseases, has authored numerous book chapters and journal articles.
Lyles, a professor in the Department of Microbiology and Immunology, has been with the Medical Center since 1978. He is a graduate of the University of Pennsylvania and earned his doctoral degree in biochemistry from the University of Mississippi. He completed post-doctoral training at the Rockefeller University.
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Nearly half of all heart attacks may be silent and like those that cause chest pain or other warning signs, silent heart attacks increase the risk of dying from heart disease and other causes, according to new research published in Circulation. The multi-institutional research team was led by Zhu-Ming Zhang, M.D., and Elsayed Z. Soliman, M.D., of Wake Forest Baptist.
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A shaggy view of Figment's Taxi Toon Rotate when it's bathed in fog
The Figment's Taxi Toon Rotate entrance is like an adventure into Toontown. The train taxis are supposed to look like Benny the Cod, and when you drive you can rotate them by spinning the dashboard.
We suggest you don't try Zombie Mode
© copyright 2011–2016
A Pants Aflame production


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Relevant offers
'Tis the season for overeating, over-celebrating and over-spending. Once the tinsel settles, you'll probably be setting your 2014 resolutions to eat less, party less and spend less.
The new year is the perfect time to sit down with your budget and assess your 2014 plan.
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Are you on target to reach the goals that you were working toward in 2013? Do you have any big events that coming up soon that you'll need to save a little extra for? Think about how you can adjust your budget, how can you spend a little less or earn a little more, to free up money toward your new savings goal.
For now, get back to the holiday celebrations - and revisit these tips on January 1!
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The city of Hardeeville is located within the counties of Beaufort and Jasper. The city covers a total area of 129 sq. km. The economy of the city revolves aaround industries involved in aviation, automotive, construction, apparel, finance, industrial and commercial machinery, insurance, metal and media. Commercial spaces are utilized by arts and crafts shops, breakfast restaurants, campgarounds, clinics, clubs, drug stores, farmers market, libraries, night clubs and road side services.
PSEG Long Island Helps Customers Go Green and Save Green
Energy Efficiency Programs Save Customers Millions of Dollars (Long Island, NY) PSEG Long Island announced today that customers participating in energy efficiency programs in 2015 will save more than $60 million and 307,582,000 kilowatt hours (kWh) per year. The amount of energy saved is good for the environment, too, as it results in the elimination of the carbon dioxide emissions..