text: Comments on: Insidious Incorporation: No need to "extend" gun rights http://www.thelandofthefree.net/conservativeopinion/2010/04/19/insidious-incorporation-no-need-to-extend-gun-rights/ The Land of the Free presents articles and news about the world and the United States from a conservative, libertarian and classical liberal point of view. Wed, 06 Mar 2013 00:51:05 +0000 hourly 1 http://wordpress.org/?v=3.6 By: Twitter Trackbacks for Insidious Incorporation: No need to "extend" gun rights [thelandofthefree.net] on Topsy.com http://www.thelandofthefree.net/conservativeopinion/2010/04/19/insidious-incorporation-no-need-to-extend-gun-rights/#comment-98396 Twitter Trackbacks for Insidious Incorporation: No need to "extend" gun rights [thelandofthefree.net] on Topsy.com Mon, 19 Apr 2010 10:17:07 +0000 http://www.thelandofthefree.net/conservativeopinion/2010/04/19/insidious-incorporation-no-need-to-extend-gun-rights/#comment-98396 [...] Insidious Incorporation: No need to "extend" gun rights http://www.thelandofthefree.net/conservativeopinion/2010/04/19/insidious-incorporation-no-need-to-extend-gun-rights – view page – cached In the case of McDonald v. City of Chicago, the Supreme Court is expected to "incorporate" the Second Amendment, meaning it will take a provision from the U.S. Constitution, and apply it to the states. It does this, supposedly, by interpreting clauses from the Bill of Rights "through" the 14th Amendment, as if deliberately tying the Constitution in knots. Tweets about this link Topsy.Data.Twitter.User['conservfeed'] = {"location":"New England","photo":"http://a3.twimg.com/profile_images/778795631/USAPin_normal.jpg","name":"Concerned Citizen","url":"http://twitter.com/conservfeed","nick":"conservfeed","description":"Conservative. Don't agree with leadership in Washington. Time for real change. Follow me and I follow back.","influence":""}; conservfeed: "Insidious Incorporation: No need to "extend†gun rights: In the case of McDonald v. City of Chicago, the Supr… http://bit.ly/9qnpAa #tcot " 4 minutes ago view tweet retweet Topsy.Data.Twitter.User['sheaterry'] = {"location":"Franklin, Tn.","photo":"http://a3.twimg.com/profile_images/407331033/facebook_normal.jpg","name":"Shea E. Terry","url":"http://twitter.com/sheaterry","nick":"sheaterry","description":"I'm a God fearing husband and father first, with a passion for helping people succeed with Network Marketing on the Internet.","influence":""}; sheaterry: "Insidious Incorporation: No need to "extend†gun rights: In the case of McDonald v. City of Chicago, the Supreme C… http://bit.ly/9qnpAa " 4 minutes ago view tweet retweet Filter tweets [...] ]]> quick loans nevada


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Rebellious Storage Cabinets from Oooms
Here are two very unique storage cabinets from Oooms that are quite creative in function and design. The Rebellious Cabinet 1 which always has two of its drawers open responds when a push is given. The drawers can't be closed at the same time and a simple push will send the closed drawer open. Beech Wood and Steel 100 x 120 x 40 cm The Rebellious Cabinet 2 has a completely different look but works the same way. This smaller storage unit may be perfect in a bedroom setting, extra storage in a bathroom, or as a buffet sideboard in your casual dining room. 100x 120 x 40

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New organic-based radiation absorbing compositions are provided that are suitable for use as an antireflective coating composition ("ARC") for an overcoated photoresist. These compositions also serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively from an undercoated dielectric layer.
1. A method for forming a photoresist relief image
(a) applying over an integrated circuit substrate a coating layer of an antireflective composition that comprises at least two resins,
the at least two resins comprising i) a silsesquioxane resin and ii) an organic resin that comprises one or more phenyl groups; and
(b) applying a coating layer of a photoresist composition over the antireflective composition layer; and
(c) exposing the photoresist composition to patterned radiation having a wavelength of below 200 nm and developing the exposed photoresist composition layer to form a photoresist relief image.
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The present application is a continuation of U.S. patent application Ser. No. 09/330,417 filed Jun. 11, 1999, now issued as U.S. Pat. No. 6,890,448.
1. Field of the Invention
The present invention relates to compositions and methods for manufacture of integrated circuit systems. More particularly, organic spin-on type antireflective coating (ARC) compositions are provided that can exhibit good resistance to oxygen-based plasma etches and serve as hard masks in circuit manufacturing processes.
2. Background
In the manufacture of semiconductor devices, a variety of conductive device regions and layers are formed on the device substrate, generally segregated by electrically insulating dielectric regions. Those dielectric regions may be formed e.g. from silicon dioxide and produced by various techniques, e.g. oxide growth, sputtering or other chemical deposition procedures. In the manufacture of the device, it is necessary to make openings in the dielectric layers to permit contact and electrical communication between different regions of the device.
Photolithography is employed to form such apertures in dielectric layers. A photoresist is patterned over the dielectric layer and the dielectric regions bared upon exposure are removed by a dry etch, typically a plasma etch or ion bombardment. See generally U.S. Pat. Nos. 5,468,342 and 5,346,586.
However, resist mask also may degrade during the plasma etch of the underlying dielectric material, reducing resolution of the image patterned into the dielectric layer. Such imperfect image transfer can only compromise performance of the semiconductor device.
Certain inorganic materials known as hard masks have been interposed between dielectric and resist layers to reduce imperfections in image transfer from the resist layer to the underlying dielectric layer. The hard mask material, e.g. polysilicon, silicon nitride, aluminum, titanium silicide, or tungsten, is vapor deposited such as by sputtering onto the dielectric layer. A photoresist is then coated and imaged over the hard mask. The inorganic hard mask regions bared upon resist development are removed by a plasma etch to which the organic resist layer is resistant. Relatively high etch selectivity can be achieved between the inorganic hard mask layer and the overcoated patterned organic-based resist. Such etch selectivity is generally not possible between a dielectric layer and an organic-based resist. Upon such etching, the hard mask profile matches the resist mask. Dielectric regions exposed upon hard mask etching now can be removed by an etch that is selective for the dielectric and for which the hard mask is resistant. Because high etch selectively can be realized between the dielectric layer material and the hard mask, image transfer imperfections as discussed above can be avoided. See generally the above cited U.S. patents.
While such an approach can be effective for the manufacture of many integrated circuits, industry demands continue produce even smaller features at higher resolution.
Indeed, other problems in circuit manufacture that can limit resolution and the ability to form ever smaller features. For instance, reflection of activating radiation used to expose a photoresist can limit resolution of the image patterned in the resist. In particular, reflection of radiation from the underlying surface/photoresist interface can produce spatial variations in the radiation intensity in the photoresist, resulting in non-uniform photoresist linewidth upon development. Exposure radiation also can scatter from the underlying surface/photoresist interface into regions of the photoresist coating where exposure is not intended, again resulting in linewidth variation.
It thus would be desirable to have new compositions and methods for integrated circuit manufacture.
The present invention provides new organic-based radiation absorbing compositions suitable for use as an antireflective coating composition ("ARC") for an overcoated photoresist.
The antireflective compositions of the invention also can serve effectively as a hard mask layer by exhibiting a sufficient plasma etch selectively to an undercoated dielectric layer (e.g. an inorganic oxide or an organic layer) and an overcoated photoresist. The antireflective hard mask compositions of the invention contain a component that has inorganic substitution that can provide etch selectivity. For instance, preferred antireflective hard mask compositions of the invention include one or more components that comprises one or more inorganic elements, typically a member of Group IIIa, IVa, Va, VIa, VIIa, VIII, Ib, IIb, IIIb, IVb and/or Vb of the Periodic Table, more preferably silicon, geranium, aluminum, particularly. For example, an antireflective hard mask composition of the invention can contain an organosilicon polymer, e.g. a copolymer provided by reaction of acrylate monomers that have Si substitution.
Antireflective hard mask compositions of the invention also preferably contain a chromophore component that can effectively absorb exposure radiation used to pattern an overlying resist layer. The chromophore can vary with the exposure wavelength employed for the overcoated photoresist. For instance, for a resist imaged at 248 nm, the antireflective hard mask composition may suitably contain a resin or other component that has anthracene or naphthyl groups. For a resist imaged at 193 nm, the antireflective hard mask composition may suitably contain a resin or other component that has phenyl groups. A single resin also may contain the radiation absorbing chromophore and inorganic groups that can provide etch selectivity. The antireflective hard compositions preferably are cured and crosslinked during processing.
The invention also includes methods for patterning and treating a substrate, particularly an electronic packaging device such as a semiconductor wafer and the like.
More particularly, a preferred method of the invention includes providing a substrate (e.g. a semiconductor wafer) having a dielectric surface layer and applying a coating layer of an antireflective hard mask composition of the invention thereon. The organic antireflective hard mask composition can be applied by spin-coating, clearly more convenient than the typical vapor deposition employed for application of current inorganic hard mask layers.
A photoresist layer is then applied over the antireflective hard mask layer and the resist layer is imaged to patterned radiation and developed to provide a relief image over the antireflective layer. The antireflective hard mask is then etched with a plasma that is more reactive with the antireflective layer than the overcoated resist relief image, e.g. an etch selectively of antireflective hard mask layer:photoresist relief image of at least about 3:1, more preferably at least about 5:1, still more preferably at least about 7:1 or 10:1. For instance, an antireflective hard mask layer that contains a silicon inorganic component can be selectively etched with a fluorine-based plasma. An antireflective hard mask layer that contains an Al inorganic component can be selectively etched with a clorine-based plasma.
That etch treatment provides a relief image of the antireflective hard mask composition that corresponds to that of the overlaying patterned resist. The bared dielectric layer areas are then etched with a plasma that is comparatively less reactive with the antireflective hard mask layer, e.g. an etch selectively of underlying dielectric layer:antireflective hard mask layer of at least about 3:1, more preferably at least about 5:1, still more about at least about 7:1 or 10:1. For instance, an Si-based dielectric layer such as a silicon nitride or silicon oxide layer could be selectively etched with a suitable halide plasma, and an organic dielectric layer could be selectively etched with an oxygen-based plasma. Substrate areas bared upon such etching of the dielectric layer then can be selectively processed as desired, e.g. metallized.
To more specifically illustrate systems of the invention, an antireflective hard mask material that comprises Si can be etched with a halide plasma such as a fluorine or chlorine plasma, and an underlying organic dielectric layer can be selectively etched with an oxygen-based plasma. In another system, an antireflective hard mask material that comprises Al can be etched with a chlorine-based plasma, and an underlying SiO2 dielectric layer can be selectively etched with a fluorine-based plasma.
The invention further provides novel articles of manufacture comprising substrates such as a microelectronic wafer coated with an antireflective hard mask composition of the invention alone or in combination with an overcoated photoresist composition and/or an underlying dielectric layer. Other aspects of the invention are disclosed infra.
As discussed above, the invention provides novel antireflective hard mask compositions that can be applied as spin-on formulations. The compositions of the invention can exhibit good etch selectivity relative to an underlying dielectric layer, such as an inorganic material e.g. SiO2 or other inorganic oxide, or an organic resin layer.
The antireflective hard mask compositions are mixtures of carbon groups and inorganic elements such as Si, As and/or Ge. References herein to inorganic atoms or elements are intended to refer to those non-carbon, multivalent elements other than hydrogen, nitrogen, oxygen or sulfur, preferably a member of Group IIb, IIIB, IVB, VB or VIB of the Periodic Table, more preferably a member of Group IIIB or IVB of the Periodic Table.
An antireflective hard mask composition typically will contain at least 1 mole percent of inorganic elements, based on total solids (all components except solvent carrier) of the composition, more typcially at least about 3 or 5 mole percent of inorganic elements, based on total solids (all components except solvent carrier) of the composition. More preferably, the antireflective hard mask composition will contain at least about 7, 10, 12 or 15 mole percent of inorganic elements based on total solids of the composition. Higher levels of inorganic content also will be suitable, e.g. where the antireflective hard mask composition contains at least about 17, 20, 25, 30, 35 or 40 mole percent of inorganic elements, based on total solids of the composition. The antireflective hard mask composition typically has a substantial carbon content, e.g. at least about 10, 15 or 20 mole percent of the composition based on total solids will be carbon. More preferably, at least about 25, 30, 35, 40, 50 or 60 mole percent of the composition based on total solids will be carbon. The one or more chromophores for absorbing exposure radiation of an overcoated photoresist typically will be aromatic carbon groups, as generally discussed above.
Referring now to the
Layer 12 may be an inorganic oxide e.g. SiO2, resin layer such as parylene or a fluorinated amphorous carbon, or any of a variety of materials employed to segregate and electrically insulate features of the processed substrate 10.
In Step 2 of
As discussed above, the antireflective hard mask composition coating contains a component that has chromophore moieties for absorption of exposure radiation of an overcoated photoresist layer as well as inorganic groups to provide plasma etch selectivity with respect to the underlying dielectric layer 12.
Preferred antireflective hard mask compositions of the invention include those that contain a resin that has chromophore and/or inorganic groups thereon. The resin is preferably organic. For instance, a polymer may be employed that has pendant chromophore groups, such as carbocyclic aryl or heteroaromatic groups for effective absorption of exposure radiation, e.g. anthracenyl (for 248 nm), phenyl (for 193 nm), naphthylene, and the like. Preferred chromophores and resins containing same are disclosed in U.S. Pat. No. 5,851,730 and European Published Application 813114A2, both assigned to the Shipley Company.
A resin that has both chromophore and etch-resistant inorganic groups can be readily prepared by reaction of a mixture of appropriate monomers, e.g. reaction of a monomer incorporating an inorganic, etch resistant element (e.g. Si, Ge, Al and the like) together with a monomer that has a desired chromophore group. Such monomers are commercially available or can be readily synthesized. For instance, acrylate monomers that include Si groups are available from a number of commercial sources such as Gelest, Inc. (Tullytown, Pa.) and others. More particularly, exemplary monomers include methacryloxymethyltris-(trimethylsiloxy)silane, allyltris(trimethylsiloxy)silane, allyltrimethoxysilane, vinyltris(trimethylsiloxy)silane, vinyltrimethoxysilane, vinyl(3,3,3-trifluoropropyl)dimethylsilane, vinyltriphenoxysilane, vinyltriethylsilane, vionyltriacetoxysilane, and the like. Vinyl-terminated silicon polymers also are available, such as vinyl terminated or methacryloxypropyl terminated p-dimethylsiloxane, which can be incorporated into other polymers by appropriate reaction, e.g. free radical polymerization in the presence of an initiator such as 2,2′azobisisobutyrnitrile, preferably in a suitable solvent such as tetrahydrofuran and the like, typically with heating until reaction completion. See Example 1 which follows for exemplary synthesis of an antireflective hard mask polymer of the invention.
In the same manner, other inorganic materials can be incorporated into components of an antireflective hard mask composition for use in accordance with the invention. For instance, other polymerizable monomers that have one or more desired inorganic atoms can be reacted to form a resin. Such monomers are commercially available from sources such as Gelest, Inc. and others. For example, suitable monomers may include allyltriethylgermane, allyltrimethylgermane, methacryloxytriethylgermane, tetrallylgermane, vinyltriethylgermane, and the like. Suitable aluminum materials also are commercially available.
Additionally, the inorganic etch-resistant component and antireflective component can be separate, blended materials of an antireflective hard mask composition of the invention. For instance, polymers with an inorganic content can be blended with organic polymers that contain the exposure radiation-absorbing chromophores. For instance, examples of suitable inorganic, etch-resistant polymers include silsesquioxanes such as p-methylsilsesequioxane which has a high silicon content and lesser silanol content; epoxypropoxypropyl terminated p-dimethylsiloxanes; carbinol functional copolymers of methylsiloxane and dimethylsiloxane; alcohol terminated copolymers of dimethylsiloxane and ethylene oxide; and silanol terminated p-dimethylsiloxane. Inorganic crosslinkers also could be employed. For example, aluminum crosslinkers may be suitable to provide the desired inorganic content to an antireflective hard mask composition, such as aluminum s-butoxide bis(ethylacetoacetate). Exemplary organic-based polymers with chromophores that could be blended with such polymers are disclosed in Shipley's U.S. Pat. No. 5,851,730 and European Published Application 813114A2. For 193 nm resist imaging, suitable phenyl-containing polymers are disclosed in copending application Ser. No. 09/153,575, filed Sep. 15, 1998, assigned to the Shipley Company. That application discloses inter alia a preferred antireflective terpolymer consisting of polymerized groups of styrene, 2-hydroxyethylmethacrylate and methylmethacrylate at a respective mole ratio of those groups of 30:38:32.
Polymers of antireflective hard mask compositions of the invention may contain other units in addition to inorganic, etch resistant elements and chromophore units. For instance, resins of compositions of the invention may have pendant cyano groups; itaconic anhydride groups; alicyclic groups such as adamantyl, norbornyl, cyclohexyl, etc.; carbocyclic aryl groups such as naphthyl, phenol; etc.
Preferably, the combined resin or oligomer components of an antireflective hard mask composition of the invention will have one or more inorganic, etch resistant elements present in an amount of at least about 3, 4, 5, 6, 7 or 8 mole percent of the total molar amount of resins or oligomers of the composition. Even higher content of inorganic, etch-resistant atoms may be employed, e.g. a concentration of inorganic, etch resistant elements of at least about 10, 12, 15, or 20 mole percent based on the total amount of resins or oligomers of the compositions. As discussed herein, typical components of an antireflective hard mask composition of the invention are the resin or oligomer components that contain the antireflective chromophore and inorganic, etch-resistant element; if a crosslinking composition, a crosslinker, typically with an acid source; and a solvent carrier. The compositions may however comprise additional components. For instance, the antireflective chromophore and inorganic, etch-resistant element may be provided by non-polymeric, small molecule (e.g. molecular weight less than about 500) additives.
Molecular weights of resins of antireflective hard mask compositions of the invention can vary relatively widely, e.g. weight average molecular weight (Mw) of about 1,000 to about 1,000,000 daltons.
The concentration of the antireflective chromophore and inorganic, etch-resistant component(s) of compositions of the invention may vary within relatively broad ranges, and in general those component(s) are employed in a concentration of from about 50 to 95 weight percent of the total of the dry components of the composition, more typically from about 60 to 90 weight percent of the total dry components (all components except solvent carrier).
Crosslinking-type antireflective hard mask compositions of the invention also contain a crosslinker component or material. A variety of crosslinkers may be employed, including those ARC crosslinkers disclosed in the above-mentioned Shipley U.S. Pat. No. 5,851,730, such as glycouril crosslinkers, particularly methoxy methylated glycouril commercially available under the tradename of Powderlink 1174 from the American Cyanamid Co. Other amine-based crosslinkers may be suitable. For example, melamine crosslinkers may be suitable, particularly melamine-formaldehye resins such as those sold under the tradename Cymel by American Cyanamid such as Cymel 300, 301, 303, 350. Benzoguanamine-based resins and urea-based resins also may be suitable such as the urea resins sold as Bettle 60, 65 and 80 by American Cyanamid, and the benzoguanamine resins sold under the trade names of Cymel 1123 and 1125 by American Cyanamid.
Crosslinking antireflective hard mask compositions of the invention preferably further comprise an acid or acid generator compound for catalyzing or promoting reaction of the crosslinker during curing of the antireflective hard mask coating layer. Preferably an acid generator compound is employed that liberates acid upon photolysis or thermal treatment. Preferably the acid generator is a thermal acid generator is employed, i.e. a compound that generates acid upon thermal treatment. A variety of known thermal acid generators are suitably employed such as e.g. benzoin tosylate, nitrobenzyl tosylate particularly 4-nitrobenzyl tosylate, and other alkyl esters of organic sulfonic acids. A preferred thermal acid generator is Nacure 5225 available from King Industries. Compounds that generate a sulfonic acid upon activation are generally suitable. Typically a thermal acid generator is present in a crosslinking antireflective hard mask composition in concentration of from about 0.3 to 3 percent by weight of the total of the dry components of the composition. Instead of or in addition to a thermal acid generator, a photoacid generator may be employed as an acid generator, and the antireflective hard mask coating layer blanket exposed to activating radiation prior to application of an overcoated photoresist composition.
Also, rather than an acid generator, an acid may be simply formulated into a crosslinking antireflective hard mask composition of the invention, particularly for antireflective hard mask compositions that require heating to cure in the presence of acid so that the acid does not promote undesired reaction of composition components prior to use of the composition. Suitable acids include e.g. sulfonic acids such as toluene sulfonic acid and sulfonic acid, triflic acid, or mixtures of those materials.
The present invention also includes antireflective hard mask compositions that do not undergo significant cross-linking during intended use with a photoresist composition. Such non-crosslinking compositions need not include a crosslinker component or an acid or thermal acid generator for inducing or promoting a crosslinking reaction. In other words, such non-crosslinking antireflective hard mask compositions typically will be essentially free (i.e. less than about 1 or 2 weight percent) or completely free of a crosslinker component and/or acid source for promoting a crosslinking reaction.
Referring again to Step 2 of
Antireflective compositions of the invention preferably also comprise one or more photoacid generators (i.e. "PAG") that are suitably employed in an amount sufficient to inhibit or substantially prevent undesired notching or footing of an overcoated photoresist layer. In this aspect of the invention, the photoacid generator is not used as an acid source for promoting a crosslinking reaction, and thus preferably the photoacid generator is not substantially activated during crosslinking of the antireflective composition (in the case of a crosslinking antireflective hard mask). In particular, with respect to antireflective hard mask compositions that are thermally crosslinked, the antireflective hard mask composition PAG should be substantially stable to the conditions of the crosslinking reaction so that the PAG can be activated and generate acid during subsequent exposure of an overcoated resist layer. Specifically, preferred PAGs do not substantially decompose or otherwise degrade upon exposure of temperatures of from about 140� C. or 150� C. to 190� C. for 5 to 30 or more minutes. Such PAGs and the use thereof in antireflective coating composition are disclosed in U.S. patent application Ser. No. 08/797,741, filed Feb. 6, 1997 of Pavelchek et al and corresponding Japanese Patent Application no. 10-61845, both assigned to the Shipley Company. Suitable PAGs for use in the antireflective hard mask compositions of the invention are identified in the below discussion of photoresist PAGs. Generally preferred photoacid generators for such use in ARCs of the invention include e.g. onium salts such as di(4-tert-butylphenyl)iodonium perfluoroctane sulphonate, and halogenated non-ionic photoacid generators such as 1,1-bis[p-chlorophenyl]-2,2,2-trichloroethane.
Antireflective hard mask compositions of the invention also may contain additional dye compounds that absorb radiation used to expose an overcoated photoresist layer. Other optional additives include surface leveling agents, for example, the leveling agent available under the tradename Silwet 7604 from Union Carbide, or the surfactant FC 430 available from the 3M Company. Preferred surfactant is concentration between 0.2 to 1.5% of solids.
To make a liquid coating antireflective hard mask composition suitable for spin-on applications, the composition components are dissolved in a suitable solvent such as, for example, ethyl lactate or one or more of the glycol ethers such as 2-methoxyethyl ether (diglyme), ethylene glycol monomethyl ether, and propylene glycol monomethyl ether; solvents that have both ether and hydroxy moieties such as methoxy butanol, ethoxy butanol, methoxy propanol and ethoxy propanol; esters such as methyl cellosolve acetate, ethyl cellosolve acetate, propylene glycol monomethyl ether acetate, dipropylene glycol monomethyl ether acetate and other solvents such as dibasic esters, propylene carbonate and gamma-butyro lactone. The concentration of the dry components in the solvent will depend on several factors such as the method of application. In general, the solids content of an antireflective hard mask composition varies from about 0.5 to 20 weight percent of the total weight of the antireflective hard mask composition, preferably the solids content varies from about 2 to 10 weight percent of the total weight of the composition.
Referring now to Step 3 of
A variety of photoresist compositions can be employed with the antireflective hard mask compositions of the invention, including positive-acting and negative-acting photoacid-generating compositions. Photoresists for use with ARCs of the invention in general contain a resin binder and a photoactive component, typically a photoacid generator compound. Preferably the photoresist resin binder has functional groups that impart alkaline aqueous developability to the imaged resist composition. Generally particularly preferred photoresists for use with antireflective compositions of the invention are positive-acting and negative-acting chemically-amplified resists. A number of chemically-amplified resist compositions have been described, e.g., in U.S. Pat. Nos. 4,968,581; 4,883,740; 4,810,613; 4,491,628 and 5,492,793, all of which are incorporated herein by reference for their teaching of making and using chemically amplified positive-acting resists. A particularly preferred chemically amplified photoresist for use with an antireflective composition of the invention comprises in admixture a photoacid generator and a resin binder that comprises a copolymer containing both phenolic and non-phenolic units. For example, one preferred group of such copolymers has acid labile groups substantially, essentially or completely only on non-phenolic units of the copolymer. One especially preferred copolymer binder has repeating units x and y of the following formula:
wherein the hydroxyl group be present at either the ortho, meta or para positions throughout the copolymer, and R′ is substituted or unsubstituted alkyl having 1 to about 18 carbon atoms, more typically 1 to about 6 to 8 carbon atoms. Tert-butyl is a generally preferred R′ group. An R′ group may be optionally substituted by e.g. one or more halogen (particularly F, Cl or Br), C1-8 alkoxy, C2-8alkenyl, etc. The units x and y may be regularly alternating in the copolymer, or may be randomly interspersed through the polymer. Such copolymers can be readily formed. For example, for resins of the above formula, vinyl phenols and a substituted or unsubstituted alkyl acrylate such as t-butylacrylate and the like may be condensed under free radical conditions as known in the art. The substituted ester moiety, i.e. R′—O—C(═O)—, moiety of the acrylate units serves as the acid labile groups of the resin and will undergo photoacid induced cleavage upon exposure of a coating layer of a photoresist containing the resin. Preferably the copolymer will have a Mw of from about 8,000 to about 50,000, more preferably about 15,000 to about 30,000 with a molecular weight distribution of about 3 or less, more preferably a molecular weight distribution of about 2 or less. Non-phenolic resins, e.g. a copolymer of an alkyl acrylate such as t-butylacrylate or t-butylmethacrylate and a vinyl alicyclic such as a vinyl norbornyl or vinyl cyclohexanol compound, also may be used as a resin binder in compositions of the invention. Such copolymers also may be prepared by such free radical polymerization or other known procedures and suitably will have a Mw of from about 8,000 to about 50,000, and a molecular weight distribution of about 3 or less. Additional preferred chemically-amplified positive resists are disclosed in U.S. Pat. No. 5,258,257 to Sinta et al.; U.S. Pat. No. 5,700,624 to Thackeray et al.; and U.S. Pat. No. 5,861,231 to Barclay et al.
Preferred negative-acting resist compositions for use with an antireflective composition of the invention comprise a mixture of materials that will cure, crosslink or harden upon exposure to acid, and a photoacid generator. Particularly preferred negative-acting resist compositions comprise a resin binder such as a phenolic resin, a crosslinker component and a photoactive component of the invention. Such compositions and the use thereof have been disclosed in European Patent Applications 0164248 and 0232972 and in U.S. Pat. No. 5,128,232 to Thackeray et al. Preferred phenolic resins for use as the resin binder component include novolaks and poly(vinylphenol)s such as those discussed above. Preferred crosslinkers include amine-based materials, including melamine, glycourils, benzoguanamine-based materials and urea-based materials. Melamine-formaldehyde resins are generally most preferred. Such crosslinkers are commercially available, e.g. the melamine resins sold by American Cyanamid under the trade names Cymel 300, 301 and 303. Glycouril resins are sold by American Cyanamid under trade names Cymel 1170, 1171, 1172, Powderlink 1174, urea-based resins are sold under the trade names of Beetle 60, 65 and 80, and benzoguanamine resins are sold under the trade names Cymel 1123 and 1125.
Suitable photoacid generator compounds of resists used with antireflective hard mask compositions of the invention include the onium salts, such as those disclosed in U.S. Pat. Nos. 4,442,197, 4,603,101, and 4,624,912, each incorporated herein by reference; and non-ionic organic photoactive compounds such as the halogenated photoactive compounds as in U.S. Pat. No. 5,128,232 to Thackeray et al. and sulfonate photoacid generators including sulfonated esters and sulfonyloxy ketones. See J. of Photopolymer Science and Technology, 4(3):337-340 (1991), for disclosure of suitable sulfonate PAGS, including benzoin tosylate, t-butylphenyl alpha-(p-toluenesulfonyloxy)-acetate and t-butyl alpha-(p-toluenesulfonyloxy)-acetate. Preferred sulfonate PAGs are also disclosed in U.S. Pat. No. 5,344,742 to Sinta et al. The camphorsulfonate PAGs of formulae I and II at column 6 of U.S. Pat. No. 5,879,856 are also preferred photoacid generators for resist compositions used with the antireflective compositions of the invention, particularly chemically-amplified resists of the invention.
In Step 3 of
The resist layer is then imaged with activating radiation through a mask in conventional manner. The exposure energy is sufficient to effectively activate the photoactive component of the resist system to produce a patterned image in the resist coating layer, more specifically, the exposure energy typically ranges from about 3 to 300 mJ/cm2 depending upon the exposure tool. The exposed resist layer may be subjected to a post-exposure bake if desired to create or enhance solubility differences between exposed and unexposed regions of a coating layer. For example, negative acid-hardening photoresists typically require post-exposure heating to induce the acid-promoted crosslinking reaction, and many chemically amplified positive-acting resists require post-exposure heating to induce an acid-promoted deprotection reaction. Typically post-exposure bake conditions include temperatures of about 50� C. or greater, more specifically a temperature in the range of from about 50� C. to 160� C. Resists can be imaged with a wide range of exposure energy, e.g. I-line radiation (365 nm), deep UV particularly 248 nm, sub-200 nm wavelengths such as 193 nm and 157 nm, e-beam, EUV, ion projection lithography (IPL) and extremely short wavelength exposure such as X-ray and other sub-20 nm imaging.
After the latent image is formed in the resist layer, in Step 4 of
In Step 5, antireflective hard mask layer 14 is patterned with a plasma distinct from the plasma employed to form the overlying resist relief images 16′. For instance, antireflective hard mask layer can be etched with a halide-based plasma such as a fluorine or chlorine-based plasma to provide antireflective hard mask relief images 14′ that correspond to the overlying resist relief images 16′ as shown in Step 5 of
Thereafter, as shown in Step 6 of
The selectively defined surface of substrate 10 can then be processed as desired, e.g. the defined areas can be metallized such as by vapor deposited copper, aluminum, tungsten, or other conductive metal, or alloys thereof to provide circuit traces or electrical interconnect vias 19 as depicted in Step 7 of
All documents mentioned herein are incorporated herein by reference. The following non-limiting examples are illustrative of the invention.
15.00 grams of 9-anthracenemethyl methacrylate, 5.61 grams of 2-hydroxyethyl methacrylate, and 26.33 grams of 3[tris(trimethylsilyloxy)silyl]propyl methacrylate were dissolved in 320 grams of tetrahydrofuran. The solution was degassed with a stream of dry nitrogen for 10 minutes and heated to 45� C. 0.475 grams of the polymerization initiator 2,2′azobisisobutyrnitrile was then added to the solution and the solution heated at reflux for 24 hours. The polymer product was isolated by precipitation into 12 L of deionized water and dried in vacuum. Yield 84%. Weight average molecular weight (vs. polystyrene standards) 22,000.
An ARC/hard mask composition of the invention is prepared by admixing the following components: organosilicon polymer of Example 1 above (10 grams), Powderlink 1174 glycouril crosslinker (1.5 grams), para-toluenesulfonic acid (0.2 grams) in a solvent of ethyl lactate to provide a formulation at about 4 weight percent total solids.
That ARC/hard mask composition is spin coated onto a cured dielectric layer (epoxy layer) and dried to provide a coating layer thickness of about 100 nm. A commercially available positive photoresist is then spin coated over the ARC layer to a thickness of about 300 nm and the resist layer exposed to patterned radiation at 248 nm wavelength and developed with an aqueous alkaline developer to provide a resist relief image. The ARC/hard mask layer is then patterned with a fluorine plasma and thereafter the underlying dielectric layer is etched with an oxygen, fluorine free plasma.
The foregoing description of the invention is merely illustrative thereof, and it is understood that variations and modifications can be effected without departing from the scope or spirit of the invention as set forth in the following claims.
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News Section: Law Enforcement
Audit Suggests YMCA Defrauded County on Child Services
BRADENTON – An internal audit by Manatee County Clerk of the Circuit Court and Comptroller R.B "Chips" Shore's office has uncovered fraud by officials with the YMCA, related to after-school and gang prevention programs the non-profit was contracted to administer for the county. The report says that the officials defrauded Manatee County taxpayers at least $100,000, with as much as $175,000 being called into question.
Anonymous complaints about billing in the program spawned the investigation and audit, which also found that staff in the county's Community Services Department who were assigned to administer and monitor the funding agreements "failed to adequately perform their duties."
The audit found a wide range of fraudulent practices by YMCA staff, including falsified documents given to auditors to support payments for the "Y-Dash" Harllee Middle School Program, replicated student sign-in sheets and billing for dates prior to the program's initiation.
Incorrect numbers were also reported in billing for the Gang Prevention program, with the county billed for days when schools were closed and for work supposedly done by employees who were not working on those days according to YMCA employment records. Incorrect numbers were also reported on monthly billings for the School Age Child Care program, with similar practices employed.
According to the report, the Manatee County Community Services Department did not conduct record reviews during the contracted years tested by the audit.
YMCA Gang Outreach Coordinator Jerry Parrish was directly accused in the report of inappropriately using funds. Parrish's travel logs failed to provide times or purposes for various trips, with some appearing to be for personal use according to the report.
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On January 2, 2013, the 112th Congress will adjourn and the long political career of Senator Kay Bailey Hutchison, the first female senator from Texas, will end. Hutchison has held the office since 1993, when, as state treasurer, she ran in a special election against Bob Krueger, who'd kept the seat warm since Lloyd Bentsen had left it for a cabinet post. Before Bentsen the seat had belonged to Ralph Yarborough, a populist from Henderson County who campaigned with the slogan "Let's put the jam on the lower shelf so the little people can reach it." Yarborough succeeded William A. "Dollar Bill" Blakley, a brief occupant after the long tenure of Price Daniel, who managed, in 1956, to do what Hutchison failed to do in 2010: leave the Senate for the governorship. Prior to Daniel, the names sound historical to present generations: Tom Connally, Earle Bradford Mayfield, Charles Allen Culberson, Roger Quarles Mills, Horace Chilton, John Henninger Reagan, Samuel Bell Maxey, James Winwright Flanagan (who is, aside from Hutchison, the only other Republican to have held the seat), Louis Wigfall, Matthias Ward, James Pinckney Henderson, and Thomas Jefferson Rusk, a hero of the Texas Revolution who held the seat for eleven years until, disconsolate over the death of his wife, he shot himself with a rifle at his home in Nacogdoches.
Hutchison's tenure has lasted longer than that of any of her predecessors save Bentsen, Connally, and Culberson. Barring an upset, her successor will be former solicitor general Ted Cruz. After being filled for a century and a half by Anglo men, the same seat that gave Texas its first woman senator may soon be occupied by its first Hispanic senator, both Republicans. There are a number of ironies to savor here, among them that Ann Richards, the last Democratic governor, opened the door for Hutchison by leaving the treasurer's office to run for governor. As David Oshinsky notes in his review of Jan Reid's biography of the platinum-coiffed icon ( "The Last Liberal "), Richards promised to break down barriers and bring women and minorities into government. Who knew they would be from the other party?
This issue also features interviews with Hutchison and Cruz ( "The Kay Place ," and "Ted Cruz's Excellent Adventure "), the two of whom appear, though they both deny it, to be very different kinds of Republicans. Hutchison, with her skill at routing federal dollars to Texas, her relatively moderate positions on social issues, and her belief in "good government," is the sort of R that of late gets called a RINO. Cruz, for his part, is a hero of the tea party, a foe of government spending, and, generally speaking, a bomb thrower. It may be, however, that their differences reflect nothing so much as the principle of generational change, an unstoppable process that has brought us, senator by senator, down through the centuries.


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Suspected copper thief charged in westside burglariesSeptember 18,2013By Darren Marcy
Staff Writer
WEST RUTLAND — Rutland County Sheriff's deputies nabbed a suspected copper thief in West Rutland early today and they have tied him to at least seven copper thefts in the area.
Sgt. David Fox of the Rutland County Sheriff's Department said Greg Munukka, 26, of West Rutland jumped out of a window of a vacant home on Smith Street when officers arrived and led them on a foot pursuit before he was caught on Marble Street near the swamp.
Officers are still actively investigating the case and Fox said the tally will climb as they add up the thefts and damages caused by the copper burglaries.
Fox said Munukka will be held overnight and will likely be arraigned Thursday.
He's currently being held on charges of burglary and unlawful mischief.
"There will probably several counts of each once we get done getting everything tallied up," Fox said.MORE IN This Just InBy Kathleen Phalen Tomaselli Full StoryBennington College and Middlebury College both top a list for most entrepreneurial colleges in... Full StoryWas the response to an alleged assault at College of St. Full Story
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Rick Stein's Far Eastern OdysseyHardback BBC Books
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- Publisher: BBC BOOKS
- Format: Hardback | 320 pages
- Dimensions: 196mm x 250mm x 38mm | 1,220g
- Publication date: 9 July 2010
- Publication City/Country: London
- Sales rank: 1,006
Product description
Rick Stein's Far Eastern Odyssey is an ambitious journey, avoiding the beaten track and tourist hot-spots, in search of the authentic food of Southeast Asia. In this accompanying book to the major BBC series, Rick shares his favourite recipes and some well-known classic dishes inspired by the fragrant ingredients and recipes he sampled from local chefs, family-run restaurants, street vendors and market stalls. In Cambodia, Rick learns how to make a national dish Samlor kako, a stir-fried pork and vegetable soup flavoured with an array of spices; in Vietnam he is shown the best recipe for Pho Bo, a Vietnamese beef noodle soup; and in Thailand, Rick tries Geng Leuong Sai Gung Lai Sai Bua, a yellow curry made with prawns and lotus shoots that you won't find outside the country. Rick Stein's Far Eastern Odyssey includes over 150 new recipes from Cambodia, Vietnam, Thailand, Bangladesh, Sri Lanka, Malaysia and Bali each complemented by Rick's colourful anecdotes from the trip and beautiful on-location photography. This is a visually-stunning culinary tribute to Southeast Asian cooking that evokes the magic of bustling markets, the sizzle of oil and the aromatic steam from a Far Eastern kitchen.
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Author information
Rick Stein is a well-loved and respected chef, TV presenter and author who has produced an array of award-winning books and television series, including Rick Stein's Seafood, Seafood Lover's Guide, Taste of the Sea, Food Heroes, French Odyssey, Mediterranean Escapes and most recently Coast to Coast. All of his books and programmes show a commitment to good-quality produce, sustainable fishing and good husbandry. Rick owns four restaurants, a delicatessen, a patisserie, a seafood cookery school and forty guest bedrooms in the small fishing port of Padstow, Cornwall. In 2003, Rick was awarded an OBE for services to West Country Tourism. He divides his time between Padstow and Australia, which he regards as his second home.
Customer reviews
By Peter Lockwood 15 Jan 2012
This is the most inspiring cook book I have delved into for years. I'm working my way through the Vietnamese section, and if you want real hit for a dinner party try the Vietnamese/French duck with orange (and star anise, chilli, lemongrass, fish sauce, etc). Every time I cook it I get requests for the recipe - now I'm buying copies to give away to friends. Thank you Rick!


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Following the pattern set by some major American cities, which have tried to reduce the supply of firearms by offering to buy guns brought in by the public, the United States is attempting to purchase missiles circulating in Libya. One of the downsides of the fall of the Qaddafi regime was that his huge collection of military toys is now on the open market since militia members and other Libyans gathered it up in the aftermath of the civil war that brought the dictator's rule to an end. According to the New York Times, the Obama administration's plan is as follows:
The United States would provide money and technical support to Libya's government, which would purchase the missiles, and either lock them up in government arsenals or destroy them.
According to the Times, programs like this have worked before in Afghanistan and Iraq, and the $40 million the administration has allocated to deal with the problem should do the trick. But the State Department, like the Times reporting of the story, seems to have forgotten that some of the most dangerous weapons in Qaddafi's arsenal are not laying around in basements in Tripoli waiting to be turned in for U.S. cash. They've already been exported to Gaza.
Huge qualities of anti-aircraft missiles were smuggled out of Libya as the Qaddafi regime was in its last weeks in power. Most appear to have wound up in Gaza, where the Hamas government there was able to pay cash for weaponry that may have improved their ability to fend off Israeli air attacks. Their share of the Qaddafi collection was a qualitative upgrade on their existing armaments. The weapons not only have the capacity to alter somewhat the balance of power between the terrorists and Israel but also boosted the prestige of Hamas in its rivalry with Fatah as they jockeyed for position in their unity talks.
Other Islamic terrorists in Somalia also appear to have benefited from the Libyan crackup.
All of this renders the program the Times ballyhooed this morning as too little and far too late. If Washington is really serious about rounding up the vast supply of munitions that were dumped on the black market by the war in Libya, they're going to have to offer the killers in Gaza and Somalia a bit more than the walking around money they're dishing out on the streets of Tripoli or Benghazi. Which is to say that American efforts to recover the arms are utterly futile even if the Times went along with the pretense that everything was just fine.
But because we know Hamas can't be bribed to give up its new air defense arsenal, perhaps the administration can try the same tactic used when the U.S. attempted to recover a surveillance drone recently lost in Iran: They can say "pretty please."


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New tenants moving into Life Sciences Corridor
Five new companies headed to Elliot Park
Five new companies are moving into the Elliot Park Life Sciences Institute this month — a home for health-care researchers and medical device startups.
The institute sits within the city's Life Sciences Corridor — a cluster of health-care organizations that spans about two miles along Chicago Avenue. It features three major hospitals, Hennepin County Medical Center (HCMC), Abbott Northwestern and Children's.


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View all Fixtures (Downlights)
LED Downlight - Facility Management Product Release
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Indy L-Series Generation 2 LED downlights provide efficacies up to 70 lumens per watt (lm/W) with parabolic reflectors, and up to 85lm/W hyperbolic reflectors. The fixtures can be applied in ceiling heights from eight to 50 feet, and are available in eight light engine lumen packages, up to 46-watt 4000 lumens. Retrofits 6- or 8-inch downlights.
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Against a backdrop of a pending land deal with aerospace giant Boeing, local attorney Andy Savage pledged a new era of openness after being unanimously elected chairman of Charleston County Aviation Authority Thursday.
We are going to open this up, and the sun is going to shine on this room, said Savage, a former Charleston County councilman. There arent going to be any midnight phone calls anymore.
Savage replaced Rep. Chip Limehouse, who stepped down as chairman after nearly 21/2 years to focus on his bid for the 1st Congressional District seat vacated by Rep. Tim Scott.
Limehouse, a Charleston Republican, remains on the board as chairman of the Charleston County legislative delegation, but he appointed retired Maj. Gen. Jim Livingston, a Vietnam War Medal of Honor recipient, as his proxy on the 13-member board while he campaigns.
I am humbled and honored to be affiliated with this great group, Livingston said.
One of Savages first orders of more openness came when it was time to go into a closed-door meeting to discuss the land deal with Boeing.
In the past, a blanket agenda item covered everything allowed under the Freedom of Information Act to be discussed behind closed doors. On Thursday, the agenda was specific and referred to the contract negotiations with Boeing over the price of the more than 800 acres it hopes to buy at Charleston International Airport across from its 265-acre leased campus site.
After the meeting, board members lined up behind Savage, lauding the new policy of openness and better flow of information among the board, staff members and the public.
This is not some cloak and dagger board, said County Council Vice Chairman Elliott Summey, who was sitting in for his father, North Charleston Mayor Keith Summey. Anytime we have transparency, its a wonderful thing. The biggest economic incubator here is Charleston County Aviation Authority.
Board member Michael Stavrinakis agreed.
There were a lot of backroom meetings that I was not invited to, he said. Its a new day.
County Council Chairman Teddie Pryor called it long overdue.
Its a healthy step, former judge Larry Richter said. All of our business should be done in an open fashion.
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Award-winning photographer Mark Cleghorn believes the next generation of imaging lies with a mobile phone app which he now uses regularly for commercial shoots.
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Tutorial on correcting converging verticals in GIMP.
What To Photograph In May 2013
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What To Photograph In March 2012
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Photo Month: 26 March 2010
Zoom bursts are on the cards today. See how you can create the look in camera as well as in Photoshop.
Olympus OM-D EM-5 Discussion
There was an article in Practical Photography looking at using welding glass as a cheap alternative to big stoppers and they found it very difficult to get rid of the cast. Maybe turn your photos to B&W?
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Which Photography Magazine?
I'd concur with the recommendations for Ag, Lenswork and BJP. There are others too like Hotshoe, foto8 and Portfolio - whose current edition . I also enjoy LIP magazine which I get as a member of London Independent Photography. I used to be able to buy a lot of different mags when I was in London, which I wouldn't want to buy regularly but were available in places like The Photographers Gall...
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ePHOTOzine.tv is Here!
Thanks Pete. I think I'm back on track now. I've found some good stuff while browsing too.
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Hi all. I'm back for a bit. I will be very busy over the next couple of months getting ready to deploy, but will try to stop in and check up on things. Hi Amber, glad you found the site :) Look forward to seeing more pictures, know he probably took alot of them. The guys here are curious also, he was going to do some pictures using pringles chips, If you run across any, would you mind postin...
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Wasted talent
I hear you Steve and I know no offense was meant but the thing is if all the older better togs left then just beginners and people without a clue would come here and that would make this a beginners site and nothing more:P Pleeeeeese Mods get this closed whilst everyone is laughing through gritted teeth.:D
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Photography Club comps
Then I would suggest you all draft your issues in a clear and concise way and email them to the commitee members, as I have just done with the camera club I was attending, have now left for a club more friendly and hands on the cameras and members evenings that can be about anything you want, photographically. I have had a response from them saying that they will discuss my issues at the ne...
Forum: General Photography discussion
some of the freeware stuff put a limit the recording time, just something to be aware of Thanks I shall look at for that Much appreciate all your suggestions, this really helps get me started Thank you all very much.
Forum: Digital imaging
Beginner looking for a decent tutorial
Geoff. Just simply learn the exposure triangle of ISO, aperture and shutter speed. The best way to do this is buy Understanding Exposure book from Amazon by Bryan Peterson. I have and love that book, it really helped me when I first started. Other bookshops sell it too, including bookshops like Waterstones which actually pay their tax ;) . The EPZ tutorials are great, but personally I l...
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Karl Taylor is good and worth watching,so is Howie subscribed to those 2 ages ago as well as 10 others, you tube is spot on for me as I find no time for reading but find time to be entertained and stimulated by some videos produced on you tube. I have learnt so much from you tube and this site i would go as far as to say i have learnt 80% of my photography from this site, you tube and readi...
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Well, what a coincidence with this thread, mine arrived this evening and it's just a tiny wee one, just a single stem. So tomorrow afternoon I might get the camera out.
Forum: Taking photos
I have free Photoshop videos on my website and try to do it in an idiot proof fashion (which comes naturally!). I'm a copywriter by day so I'm used to putting complicated jargon into easy to digest language. I also have photo technique and photography marketing tips too. Hope it helps.
Forum: General Photography discussion
Texturizing Photos
We could upload textures to the download area. That would be a good thing to share backgrounds, providing no one is precious about their images? I'll start by add one I've used on several of my recent photos. Flaky PaintIf you want to add them select "wallpaper" as the category for now and if we get a few we will create a specific Textures category. Wow, what a mice treasure trove of informati...
Forum: Digital imaging
How To Take Stunning Pictures
I remember that one channel did a series with Tom Ang (his masterclass book is BRILLIANT I am re reading my copy again) but no one watched it, or maybe we just didnt say how good it was to the bbc? toonman: think its time for a "GEORDIES like susi perry" forum? ps I was born in harvey street, byker
Forum: Taking photos
Car Photography Lighting Tutorial
Hiya Just thought I would clear somethings up :) The shot is done on Bulb and its all about reflection, I like the highlights the off camera flash gives - yes it is tailor made light painting , the tutorial was for people that dont necessarily have access to lighting andl was aimed at Amateurs and enthusiasts alike , Thanks for the comments regards Dylan www.dylantog.com:)
Forum: Taking photos
Off Camera Flash Photography Thread
Lets see some of your set-up shots then I took a few on the moors with Sam last night - cracking sunset, 3 lights... was raining at the time - always a treat - and a lovely sunset as background too.
Forum: Lighting
Photo-iDVD guide to digital photography
Written and presented by Vincent Oliver, author of the book The Advanced Guide to Digital Photography, this DVD is visual, practical and presented in a user-friendly way.
Winter photography - that's snow trouble
PhotographyCourses.Biz have a selection of video tutorials to help you improve your photography.
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Photographers Warned To Embrace Technology
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Learn How To Levitate! (Update)
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Manfrotto launch School of Excellence
The skills of the worlds best photographers and video operators are brought together by Manfrotto in an innovative on-line platform.
Hasselblad now offering new image processing capabilities
New Phocus 1.1 for Mac and Phocus 1.0 for Windows extend the functionality and appeal of Hasselblads image processing software.
Ulead introduce PhotoImpact 10 image editing software
PhotoImpact 10 brings image editing software up to the level of today's digital cameras with novice-friendly professional quality tools.
Buy Ulead PhotoImpact XL and get a free scanner worth £70
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Hassle free processing
Hasselblad launch Phocus v1.0 image processing tool for H3D camera systems.
Portrait Photography tutorial DVD with Monte Zucker
The only other DVD Gary Wolstenholme had seen before with a Monty in it was the full one. Here he takes a look at whether this offering should leave its hat on.
ProPhotoinsights Creating Monochrome tutorial
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Topaz Labs Photoshop Plug-In Bundle Review
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Website creation group test
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Ride-In Theater offers spooky time with 'Night of the Living Dead'
CORPUS CHRISTI - Special to the Caller-Times
It's not often that fans of the Ride-In Theater get to watch a zombie flick with zombies actually being all around them.
The Corpus Christi Ride-In Theater will screen George A. Romero's zombie movie, "Night of the Living Dead," on Friday at the Watergarden.
The Ride-In Theater started up last November as a collaboration between The Corpus Christi Film Society and the Spokespeople, a local bicycle "gang."
"We promote local businesses and encourage people to get out on a bike and enjoy Corpus (Christi)," said Lexi Buquet, co-founder of the Spokespeople. "We grew and the film society reached out to us."
The Spokespeople wanted to make sure that their first Halloween screening was going to be a memorable one.
"October is our first time to get to do something Halloween themed, so we wanted to do something original," Buquet said. "Nothing is more original than 'Night of the Living Dead.'"
To add to the spooky mood, the Watergarden will be infested with zombies.
"We'll have zombies roaming the Watergarden," Buquet said. "We encourage everyone to dress as a zombie."
Donations for Court Appointed Special Advocates of the Coastal Bend (CASA), a local nonprofit, also will be accepted that night.
The Ride-In Theater is also screening the film as a part of Ideas Week, which is a collaboration between the Young Business Professionals of the Coastal Bend and Texas A&M University-Corpus Christi.
"This particular month, we made sure it was during Ideas Week to support them and show people that there are tons of things to do in Corpus Christi."
The Spokespeople hope that more people will realize how unique the Ride-In Theater is.
"It's a different type of atmosphere. It's nothing that's ever (been) done in town before," Buquet said. "You get to be in one of the most beautiful public parks in Corpus (Christi) when people would normally never take advantage of that."
What: Corpus Christi Ride-In Theater presents "Night of the Living Dead"
When: Preshow starts at 7:30 p.m. Friday; film begins at 9 p.m.
Where: Watergarden, 1902 N. Shoreline Blvd.
Cost: Free
Information: www.facebook.com/ccrideintheater or to become a sponsor email Lexi Buquet at firstname.lastname@example.com
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Need Help? Call us at 1-800-566-8098.
Monday-Friday: 6am-3pm / Saturday: 7am-11am / Sunday: 7am-11am


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Click Here To Watch This Video at Hairy Boyz
Find all the Raging Stallion stars at the official Hairy Boyz site.
Description: Tattooed and ripped to absolute perfection, Alexsander Freitas is all man and all yours in this solo video. Don't miss this popular performer at some of his very best.
Permanent link to this video:
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Post this video in the JUB Forums with this code:
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|The Employee Evaluation Form (for Staff)
The purpose of the Employee Performance Appraisal Form is to improve the quality of the University's mission through positive communication, mutual respect, improved employee performance, individual growth and career development.
The evaluation should reflect performance and communication youve had with the employee throughout the year. Feedback is useful only when it is clear enough to allow an employee to target areas for improvement, or key performance strengths. The objective of the evaluation is to place emphasis on describing performance in relation to performance objectives, not to simply assign ratings.
The Process
The evaluation is collaborative in nature. It not only allows the Supervisor to review the employees achievements and performance in the past year but it also helps develop a plan of action for the next year. Employees and supervisors may want to establish a development plan to support continuous learning and improvement.
The scoring on the performance appraisal is a formal reflection to the on-going informal evaluation assessed throughout the year. After the Supervisor has scored the evaluation, he/she should meet with the Next Level Supervisor (NLS) to discuss the scores, answer questions, compare concerns and provide input on how improvements can be facilitated. The role of the NLS is to ensure consistent ratings within the organization and to make sure different Supervisors are applying similar standards of performance. Once the NLS has signed his/her concurrence, a meeting with the employee should be scheduled to discuss the scores, answer questions, compare concerns and discuss how performance can be improved. Some evaluators may prefer to have the employee provide an initial self-evaluation.
Salary Increases
Salary increases will be based upon their annual evaluation, the University's established Wage Scale and the University's budget allotted for increases. Employees with reviews totaling Meets Expectations and above merit an increase. If the employees review is below Meets Expectations, no increase shall be granted. In no case, however, shall a merit increase place an employee above the maximum of the University Wage Scale established for that position.
Documenting Performance
It is not only helpful, but necessary to document an employees performance. Documentation may include, for example, letters of commendation, letters of counsel, and e-mail correspondence pertaining to the employees performance.
Rating Levels
Unacceptable (1 or 2)
Employees performance at this level is consistently below the expectations for the job. Employee does not demonstrate necessary knowledge or skill to perform in this area and will require guidance on steps to incorporate this expectation into his/her work. This rating level may be given to someone who is operating in a new role and is unfamiliar with an area. It may also be given to someone who is experienced in a role but need to improve in a particular job function. This level of performance indicates an immediate need for improvement (may require training, instruction, use of acquired knowledge and skills). It is expected that if an employee remains in this category, further action, disciplinary or otherwise would be warranted. If an Unacceptable rating is given, it must be supported by written notes, letters of expectation, or some form of counsel. This rating should initiate a plan of action to help the employee improve job performance to an acceptable level. Such a plan should specify the steps to be taken, and should specify how the outcome will be assessed. An employee receiving a score at this level will automatically be placed on a 90-day probation.
Needs Improvement (3 or 4)
Employee demonstrates fundamental grasp of competency and is beginning to incorporate its principles into their work. However, the employee consistently demonstrates that there is opportunity to develop further. Note: Many new employees find themselves in this category for at least the first six months to a year on the job. This rating could also be used when a promotion has been given and the individual is in a learning phase with regard to his/her new role. If a Needs Improvement rating is given, it should be supported by written notes, letter of expectation, or some form of counsel. This rating should initiate a plan of action to help the employee improve job performance to an acceptable level. Such a plan should specify the steps to be taken, and should specify how the outcome will be assessed.
Meets Expectations (5 or 6)
Performance at this level consistently meets and may, at times, exceed the established job requirements and performance expectations of the job. At the high end of this level, performance is that of a fully competent performer in all areas. This employee meets the high standards that the University requires of all its employees. At the low end, the employee has met most of the required performance and expectations of the job but may not have reached all of the agreed-upon standards of the quality/quantity/time constraints for the accomplishment of those objectives. A person performing at this level may be described as able and competent in a particular area.
Exceeds Expectations (7 or 8)
Employee consistently meets and exceeds expectations in this area, using ability and experience to produce the desired results, often resulting in improvements or responsibilities. This level of performance indicates the employee is fully competent and demonstrates ability to make significant strides in the overall improvement of a department.
Excels (9 or 10)
Performance at this level significantly and consistently exceeds the established job requirements and performance expectations for this area. Work quality and quantity are of the highest caliber. When operating at this level, an employee contributes unique and innovative solutions to even the most difficult problems. This employee is recognized as one of the best on this competency and serves as a role model in this area. This rating should not be applied across the board. Documentation or written examples are required to support this rating. Be specific when describing how the employee performs at this level. This rating is used to highlight a persons strongest competencies.
My name below indicates that I have read the above instructions and
understand how to proceed. If I have questions I will call Lilian Akawobsa for further clarification.


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music video: azealia banks – liquorice directed by rankin
If you haven't had the chance to see it yet, here is the rather brilliant Americana-style video for Azealia Banks' Liquorice, directed by Rankin and styled by Nicola Formichetti. Fashion credits include Alexander Wang, Jeremy Scott and Adrienne Landau.
Post Tags: azealia banks, liquorice, nicola formichetti, rankin
Browse Timeline
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Classic White Kitchen
A clean, transitional space with ample storage.
Traditional cabinetry is complemented by modern pendant lights and barstools for a timeless feel. A wall of built-in storage keeps the space clear of clutter. "We like doing high walls of cabinetry where we can group the fridge, oven, storage cubbies and pantries together for a full wall of function. When it's placed off to the side it doesn't block light or views, either," says Erin Feasby.
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Google Glass' new design shows up with first buyer
The second full generation of Google Glass has begun to appear in homes officially as one Det Ansinn breaks out the box this morning. This fellow is one of a group called BrickSimple, LLC, developers of Glass apps specifically. They've created such oddities as the GlassBattle game - a Battleship-like title for Google Glass. Describing the new Glass headset, Ansinn suggests that it "looks identical" from the outset - below you'll see a photo of another BrickSimple employee Kel Bucey sporting the new headset.


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Book Your Party Today
We've been throwing the best parties in town since 1949! How many events will you attend this year that look and feel the same? There's only so much you can do when you host...Read More
Live Music is deeply rooted in the history of The Alley. We offer live music throughout the week with our Sunday Night Blues Jam attracting some of the best players in Chicago. On...Read More
Listen To Live Music
The Alley has a rich live music history dating back to the 70's when it was a popular concert hall for well known acts such as Procul Harem, REO Speedwagon, Deep Purple, The...Read More
There's always something happening at The Alley! Located in Highwood, IL, The Alley is Chicagoland's ultimate entertainment experience and nightclub. Check out our live...Read More


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* All fares below were last found on: July 31, 2015 and 2:27:46 PM
Fares are round trip, Fares incl. all fuel surcharges, our service fees and taxes.
Displayed fares are based on historical data, are subject to change and cannot be guaranteed at the time of booking.
See all booking terms and conditions
Queen Alia International Airport
11% of ROYAL JORDANIAN passengers are over 60.
Amman, Beirut, Cairo were the top destinations for ROYAL JORDANIAN passengers.
The most popular airport for Royal Jordanian was Queen Alia International Airport .
Voted "Airline of the Year 2007" by Airfinance Journal, Royal Jordanian is the flag carrier of Jordan. Headquartered at Amman, Jordan, it has its main base at Queen Alia Airport. Founded in the year 1963, it operates 500 flights per week with at least 110 daily departures. This airline is also a member of the Arab Air Carriers Organization and Oneworld; a global airline alliance. It offers scheduled international services to 61 destinations. The major destinations include Amsterdam, Athens, Bangkok, Berlin, Cairo, Chicago, Colombo, London, Mumbai, Singapore, Toronto, Hong Kong and many more. The fleet size of Royal Jordanian comprises of Airbus A319-132, Airbus A320-200, Airbus A321-200, Airbus A330-200, Airbus A340-200, Boeing 787–8, Embraer 175 and Embraer 195. It also has won the Centre for Asia Pacific Aviation award for "Airline Turnaround of the Year 2006".
Reasons to Fly with Royal Jordanian
Appreciated all over for its excellent in-flight amenities, Royal Jordanian is one of the best airlines of the region. Economy class and Crown Class are the two types of classes offered in Royal Jordanian. In Economy Class, 32 inch pitch on the Embraer aircraft and 34-inch pitch on the Airbus aircraft is offered. The seat pitch in Crown Class is 83 inches and 46 inches on short and medium haul aircraft. From personal televisions (PTV) to audio- and video-on-demand system are some of the amenities offered in economy class. Crown Class is equipped with AVOD and portable entertainment devices.
Royal Jordanian Rewards Programs
Sign up for Royal Jordanians frequent flyer program, Royal Plus. Passengers are given points for flying with the airline that later can be redeemed in lieu of discounts and free tickets.
Royal Jordanian Online Check-in
Now check-in can be easily done from mobile or laptop with internet access. You can check in anywhere from 24 hours to 4 hours before your flight.
Sign up for OneTravel emails below to reveal a promo code you can use today.
◊ Applies to bookings for 4+ travelers. Book by August 31, 2015. Enter Promo Code at time of check out. The advertised Promo Code provides discounts against our service fees on stated routes. Promo Code and Instant Savings offers can be combined up to the amount of our service fees. Excess savings will not be applied. Promo Code expires on date indicated and can be withdrawn at anytime without notice. Our standard service fees are $30 per person one-way/roundtrip for economy class tickets.Close [x]


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|Boeing B-9 Bomber
The Boeing B-9 was the first all-metal monoplane bomber used by the US Army Air Corps (USAAC). Although the B-9 was not the first USAAC monoplane bomber, this distinction goes to the Douglas B-7 and the Fokker (General Aviation) XB-8, but they were conceptually far less advanced.1
The B-9 was a privately funded Boeing project that began with the development of the single-engine Boeing Monomail commercial transport. The B-9 was basically an enlarged twin-engine version of the Monomail, using the same construction techniques. It was an innovative design that featured:
|Semi-retractable landing gear.
|Flight control servo tabs.
|Cantilever low-wing monoplane.
|All-metal, semi-monocoque fuselage with stressed skin construction.
|There were two initial models of the B-9, the Model 214 (Y1B-9) and Model 215 (XB-901, YB-9). Both aircraft were identical except for the selection of engines. The Model 214 was powered by a Curtiss V-1570 Conqueror and the Model 215 with a Pratt & Whitney R-1860 Hornet.
|The first of the two B-9 models to fly was the Model 215 on April 29, 1931 and it was during this period that the USAAC was still taking delivery of the Keystone B-6 biplane bomber. The Keystone B-6 remained the backbone of the American bomber force until 1932. In comparison, the B-9 was a radical departure in design—a low-wing monoplane with semi-retractable landing gear (the wheels were partly exposed) that took advantage of new research from the National Advisory Committee on Aeronautics (NACA).
|During testing at the 20 foot NACA wind tunnel at Langley Virginia, built in 1927, engineers experimented with a Sperry Messenger and discovered that drag could be decreased by 40% with the installation of retractable landing gear. Another experiment with a Curtiss Hawk in 1927 showed the advantages of streamlining the engines with the NACA engine cowling. The NACA engine cowling increased airspeed from 118 to 137 mph. With the release new data, aircraft manufacturers rushed to install the NACA engine cowling and create aircraft with retractable landing gear.2
Another development that came out of Langley was the placement of the engines. If not on the nose, engines were normally placed either above or below the wing or slung between the upper-wing and lower-wing on twin-engine biplanes. Additionally, external struts supported the landing gear below the fuselage. The landing gear struts and external engine bracing created tremendous drag. NACA engineers tried different engine configurations in order to decrease drag and found it best to place the engine directly in front of the wing in a streamlined nacelle.3 This was the optimum design. This arrangement also allowed for a low-wing which permitted a retractable landing gear that would retract inside the wing. As drag was eliminated, performance increased dramatically and as new data became available, Boeing engineers created new configurations that were incorporated into the B-9. While the Keystone B-6 lumbered along at 120 mph, the new design of the Boeing B-9 increased airspeed to 163 mph—an increase of 43 mph.
The Model 215 was the first to be tested by the Army as Boeing property under the experimental military designation as the XB-901. The airplane was given the standard Army designation of B-9 and was purchased later in the year and dubbed the YB-9. The Pratt & Whitney Hornet engines used on the YB-9 gave it a top speed of 163 mph (262 km/h).
The Model 214 was the second test model, which was dubbed the Y1B-9 and was originally powered with Curtiss Conqueror engines. The increased power from these engines, combined with increased streamlining of the engine nacelles, increased its top speed to 173 mph (278 km/h). With the exception of the Curtiss B-2 Condor, liquid-cooled engines were never used on production US military bombers, as air-cooled radial engines were lighter and more reliable than the liquid-cooled engines, and also less vulnerable to enemy damage. The Model 214 (Y1B-9) was later converted to Hornet engines.
The Model 246, designated the Y1B-9A was an improved version over the YB-9 which featured more powerful Hornet engines and a redesigned vertical stabilizer. With the new engines, the B-9 airspeed increased to 186 mph, which equaled the speed of all existing American fighter aircraft. Seeking a desirability to protect the flight crews because of the increased speed, enclosed canopies were built for the B-9 bomber, but never installed.
The Model 246 (Y1B-9A) with 600 hp Hornet engines increased airspeed to 186 mph.
As in all Army bombers since World War I, the bomb bay was located inside the fuselage at the center of gravity and additional bombs could be hung from racks under the wings. The total disposable bomb load was 2,400 lbs.4
The flight controls required servo tabs to assist pilots in moving the flight controls due to higher airspeeds and greater loads on the control surfaces. This was the first time servo tabs were used on an American aircraft.5
There were five crew members. Starting from the nose their positions were:
|Radio operator.
|Rear dorsal gunner.
Despite the increased speed, all of the crew sat in open cockpits except for the radio operator in a station forward and below the pilot. The bombardier's nose cockpit was equipped with a bomb site and aiming window and also a flexible gun at the top. The pilots sat in tandem cockpits rather than side-by-side due to the narrowness of the fuselage. The rear gunner's cockpit was located on top of the fuselage and aft of the wing.
Boeing always hoped that it would receive large orders for the airplane and although the B-9 was a great advance over previous USAAC bombers, only seven aircraft were built. It was quickly eclipsed by the Martin B-10 and B-12. The last B-9 was delivered March 20, 1933.
|Boeing Y1B-9A Bomber
|Wing span:
|76 ft 10 in (23.40 m)
|51 ft 6 in (15.70 m)
|12 ft 8 in (3.86 m)
|8,941 lb (4,056 kg)
|Max T/O:
|14,320 lb (6,500 kg)
|Maximum Speed:
|188 mph (302 km/h)
|Cruise Speed:
|165 mph (265 km/h)
|Service Ceiling:
|20,750 ft (6,325 m)
|540 miles (870 km)
|Two Pratt & Whitney R-1860-11 "Hornet" radial engines, 600 hp (450 kW) each.
Two Browning .30 in (7.62 mm) machine guns
2,400 lb (1,089 kg) bombs
1. Chris Chant. From 1914 to the Present Day, The World's Great Bombers. Edison, New Jersey: Chartwell Books, Inc. 2005. 74.
2. Roger E. Bilstein. Orders of Magnitude, A History of the NACA and NASA, 1915-1990. Washington, DC: National Aeronautics and Space Administration Office of Management Scientific and Technical Information Division, 1989. history.nasa.gov/SP-4406/contents.html.
3. Ibid.
4. Chris Chant. 75.
5. Peter M. Bowers. Boeing Aircraft Since 1916. New York: Funk & Wagnalls, 1968. 177.
Return to Aircraft Index
© Larry Dwyer. The Aviation History On-Line Museum.
All rights reserved.
Created November 12, 2009. Updated October 10, 2013.


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I began working after school as a waitress when I was 13 and continued through graduate school. I realized quickly that restaurants offering limited menus were a better bet than those that tried to be all things to all diners. When you saw both fettuccine alfredo and fried rice on the menu, you could pretty much be assured that neither would be very good.
Is the same true for schools?
Are schools trying to offer too many things for students and, as a result, doing none very well?
I spent three hours tonight chaperoning freshmen float building for this weekend's homecoming. A few days ago, I went to a meeting where a social studies teacher explained how students can qualify for an April trip to Washington, D.C. Afterward, I attended a program by the counselors on how they assist students in their academic, personal, emotional and career development. And I went to two volleyball games.
All this stuff goes on every week in every high school in Georgia. American schools are unique in the time, energy and money devoted to non-classroom activities.