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A method and apparatus for providing in-situ monitoring of the removal of materials in localized regions on a semiconductor wafer or substrate during chemical mechanical polishing (CMP) is provided. In particular, the method and apparatus of the present invention provides for detecting the differences in reflectance between the different materials within certain localized regions or zones on the surface of the wafer. The differences in reflectance are used to indicate the rate or progression of material removal in each of the certain localized zones.
1. A chemical mechanical polishing (CMP) apparatus comprising:
a rotating polishing platen having a first diameter,
a wafer carrier for holding a wafer in cooperative relationship with said rotating platen, said wafer carrier having multiple chambers that allow for independently varying pressure within the chambers that urge against the wafer at corresponding multiple localized zones on the wafer,
at least one window formed in said polishing platen whereby said window is periodically scanned across a wafer,
an optical detection system carried on said platen for transmitting light through said window and receiving light reflected from the wafer through said window as it rotates past the wafer, to detect the reflectance of materials on the surface of the wafer at the multiple localized zones, and
a controller, which receives reflectance signals representing the reflectance of materials on the surface of the wafer at the multiple localized zones from the optical detection system, and said controller is configured to process said reflectance signals to determine the state of polishing within each of the localized regions, and to selectively vary the pressure independently within each of the multiple chambers responsive to said state of polishing determination.
2. The CMP apparatus of
3. The CMP apparatus of
4. The CMP apparatus of
5. The CMP apparatus of
6. The CMP apparatus of
7. The CMP apparatus of
8. The CMP apparatus of
9. The CMP apparatus of
10. The CMP apparatus of
11. The CMP apparatus of
12. A method of chemical mechanical polishing (CMP) of a semiconductor wafer, comprising the steps of:
providing a CMP machine which includes apolishing pad and awafer carrier having multiple chambers that allow for independently varying pressure within the chambers that urge against a wafer at corresponding localized zones on the wafer;
measuring the reflectance of the surface of the wafer during polishing at each of the localized zones on the wafer;
processing the reflectance data to determine the state of polishing within each of the localized zones; and
independently adjusting the pressure within any one of the chambers responsive to the state of polishing within each of the corresponding localized zones.
13. The method of
reducing or stopping the chemical mechanical polishing, independently within each zone when a change in the reflectance is measured in that zone.
14. The method of
15. The method of
16. The method of
reducing or stopping the chemical mechanical polishing, independently within each zone according to prior reflectance measurements.
17. The method of
detecting the amount of scattering in the reflectance data;
determining the degree of topographical variations on the surface of the wafer based on the amount of scattering at the localized zones; and
controlling the polishing process at the localized zones on the wafer responsive to said topographical variations.
The present invention is related to co-pending U.S. patent application Ser. No. 09/628,563 filed simultaneously herewith and is incorporated by reference in its entirety.
The present invention relates to an in-situ method and apparatus for end point detection during chemical mechanical polishing, and more particularly to a method and apparatus in which localized areas of the surface of a semiconductor wafer or substrate which is undergoing chemical mechanical polishing are monitored to detect the removal of material from the localized wafer surface areas.
Manufacture of semiconductors has become increasingly complex as the device densities increase. Such high density circuits typically require closely spaced metal interconnect lines and multiple layers of insulating material, such as oxides, formed atop and between the interconnect lines. Surface planarity of the semiconductor wafer or substrate degrades as the layers are deposited. Generally, the surface of a layer will have a topography that conforms to the sublayer, and as the number of layers increase the non-planarity of the surface becomes more pronounced.
To address the problem, chemical mechanical polishing (CMP) processes are employed. The CMP process removes material from the surface of the wafer to provide a substantially planar surface. More recently, the CMP process is also used to fabricate the interconnecting lines. For example, when depositing copper leads or interconnect lines, a full layer of the metal 13 is deposited on the surface of the wafer 10 having grooves 12 formed in an oxide layer 11 as shown in FIGS. 1A and 1B. The metal layer 13 may be deposited by sputtering or vapor deposition or by any other suitable conventional technique. The oxide layer, such as doped or undoped silicon dioxide, is usually formed by chemical vapor deposition (CVD). The metal layer covers the entire surface of the wafer and extends into the grooves. Thereafter, individual leads 16 are defined by removing the metal layer from the surface of the oxide. The CMP process may be used to remove the surface metal leaving the leads 16 in the grooves. The leads are insulated from one another by the intervening oxide layer.
In general, to carry out the CMP process, a chemical mechanical polishing (CMP) machines is used. Many types of CMP machines are used in the semiconductor industry. CMP machines typically employ a rotating polishing platen having a polishing pad thereon, and a smaller diameter rotating wafer carrier which carries the wafer whose surface is to be planarized and/or polished. The surface of the rotating wafer is held or urged against the rotating polishing pad. A slurry is fed to the surface of the polishing pad during polishing of the wafer.
It is desirable to precisely determine when the material has been removed from the upper surface of the wafer during the CMP process. This not only prevents discarding of over-polished wafers, but also minimizes the necessity of re-polishing any under-polished wafers. There are many possible ways of determining when to stop the CMP process. Typical methods include: (1) detecting frictional change as the top layer of metal is polished away to expose the silicon oxide layer by monitoring the current to the platen and carrier motors, and (2) monitoring thermal and acoustic signatures from the polishing pad. Electrical impedance, conductance and capacitance can also be used to determine the presence of the metal layers.
More recently, optical measurement has been used in the art with the CMP process. For example, U.S. Pat. No. 5,838,448 uses interferometry and describes detecting the thickness of a thin layer, or the changes in the film thickness, by measuring reflectance variations caused by a change in the incidence angle of incident light. U.S. Pat. No. 5,835,225 describes using reflectance measurements to determine a particular surface property of the substrate. U.S. Pat. No. 5,433,651 describes a method and apparatus for viewing the wafer during polishing and end-pointing the CMP process when a prescribed change in the in-situ reflectance corresponds to a prescribed condition of the polishing process.
While these techniques have provided improvements to the CMP process, these methods provide average (global) characteristics of the whole wafer surface, rather than those of smaller, localized regions or areas of the wafer. This means that, although one part of the wafer may get polished before another, the global system is not typically able to differentiate between over-polished and under-polished regions of the wafer.
In another prior art technique, as described in U.S. Pat. No. 5,972,787, indicator areas are provided on the wafer. These indicator areas are formed of blocks of parallel metal lines with varying line widths and pattern factors that are chosen to violate existing ground rules in such a way that they will be dished out using the standard consumable set (pad/slurry) of a given metal CMP process. The blocks are then inspected to determine the extent of polishing. While this technique provides for indicating the polishing in certain areas of the wafer, the process requires that the CMP step be interrupted for the inspection to take place. Further, the indicator areas require formation of the blocks which add an additional step to the already complex fabrication process. Accordingly, there is a need for an improved method and apparatus that can continuously, and in-situ, monitor localized regions of the wafer surface during the CMP process.
It is an object of the present invention to provide an in-situ method and apparatus for monitoring localized regions of the wafer surface during the CMP process.
It is another object of the present invention to provide a method and apparatus which continuously monitors the polishing progress at different areas of the wafer, and may also be used to determine the end point for removal of material from the surface of the wafer.
It is a further object of the present invention to provide a method and apparatus which employs the difference in reflectance between different materials on a wafer to monitor the polishing progress and/or end point at selected regions on the wafer surface.
It is a further object of the present invention to provide a method and apparatus which monitors reflectance at various surface areas of the wafer and controls the polishing process at said areas to achieve substantially uniform removal of metal during polishing.
The foregoing and other objects of the invention are achieved by a chemical mechanical polishing method and apparatus in which a rotating polishing platen and polishing pad of a first diameter polishes a wafer carried by a wafer carrier. A window is formed in the polishing platen and pad whereby said window periodically scans across the underside of the wafer. An optical detector, such as a fiber optic cable, transmits light through the window onto the surface of the carrier and receives light reflectance through the window from said wafer surface as it rotates past the window and means are provided for monitoring the reflected light, and for controlling the polishing process at localized regions of the wafer responsive to the reflected light information.
More specifically, the chemical mechanical polishing method and apparatus includes a wafer carrier that has a membrane having a central and concentric pressure chambers or compartments which define corresponding zones or regions on the wafer surface. An actuator is provided to control the pressure applied to the central and concentric compartments and thereby control the rate of removal of material from the wafer surface at each of the corresponding zones, and the actuator is engaged responsive to reflected light received at each of the zones.
In another aspect of the present invention, a method of chemical mechanical polishing is provided comprising the steps of: providing a CMP machine which includes a polishing pad and a wafer carrier having multiple chambers that allow for independently varying pressure within the chambers that urge against a wafer at corresponding localized regions on the wafer; measuring the reflectance of the surface of the wafer during polishing at each of the localized regions on the wafer; processing the reflectance data to determine the state of polishing within each of the localized regions; and independently adjusting the pressure within any one of the chambers responsive to the state of polishing within each of the corresponding localized regions.
The foregoing and other objects and features of the invention will be more clearly understood from the following description when read in connection with the accompanying drawings in which:
FIGS. 1A and 1B show the surface of a wafer with a trenched oxide coating with conductive interconnect material applied to the surface, FIG. 1A, and polished, FIG. 1B, to leave leads.
FIG. 2 is a top plan view of a rotating polishing platen and polishing pad with a wafer carrier and observation window in accordance with the present invention.
FIG. 3 is a partial sectional view showing the rotating polishing platen, polishing pad and wafer carrier in accordance with the present invention.
FIG. 4 shows the diaphragmed pressure pad of the wafer carrier associated with a metalized wafer in accordance with one embodiment of the present invention.
FIG. 5 schematically shows the wafer surface with concentric annular areas and the path of the scanning window across the wafer according to the present invention.
FIG. 6 is a schematic of the optical end point detection system according to one embodiment of the present invention.
FIG. 7 shows the output voltage as a function of the gap between the end of the fiber optics bundle and the wafer surface for one exemplary embodiment of the present invention.
FIG. 8 shows reflectance as a function of wavelength for various materials.
FIG. 9 shows the reflectance as a function of wafer position at various polishing times for one exemplary embodiment of the present invention.
FIG. 10 illustrates one example of actual reflectance as a function of time as compared to an ideal signal.
FIG. 11 is a schematic block diagram of a control loop for one example of a chemical mechanical polishing apparatus that may be used with the present invention.
FIG. 12 is a flow chart illustrating processing of the output signal from the reflectance sensor for one embodiment of the present invention.
FIG. 13 is a flow chart illustrating the control of pressure at the various wafer zones in accordance with an alternative embodiment of the present invention.
The inventors have discovered a method and apparatus for providing in-situ monitoring of the removal of materials in localized regions on a semiconductor wafer or substrate during chemical mechanical polishing (CMP). In particular, the method and apparatus of the present invention provides for detecting the differences in reflectance between different materials, such as conductive, insulating and barrier materials, within certain localized regions or zones on the surface of the wafer. The differences in reflectance are used to indicate that the top or bulk material has been removed in each of the localized zones. In the preferred embodiment this information is used to provide real-time control of the CMP process.
Specifically, referring to FIGS. 2 and 3 is shown a portion of a CMP machine which includes a rotating platen 21 and a rotating wafer 22 carried by a wafer carrier (not shown) in accordance with one embodiment of the present invention. The platen 21 carries a polishing pad 23 onto which a polishing slurry is applied during the CMP process. The CMP machine in the present embodiment is employed to remove surface material, either a conductive or insulating material, from the surface of the wafer. In one embodiment, the surface material is a metal, and the metal is removed from the wafer surface to leave conductors imbedded in trenches in an insulating layer. The conductive material can be any suitable conductor such as aluminum or copper. The insulating material can be any suitable insulator such as un-doped silicon dioxide, silicon oxide doped with boron, phosphorous, or both, or low dielectric constant materials. Also, the present invention may be used to remove conductive or insulating materials to expose a barrier material, such as TaN and the like. Further, the barrier layer may also be removed. In one embodiment the present invention is directed to a method for detecting surface metal removal to fabricate a structure such as that schematically illustrated in FIG. 1B. The present invention exploits the reflective differences between the conductive (typically metal) and the insulating materials to monitor the progress of planarizing of the wafer, and to determine which localized regions are nearing removal of the material and thus the end point of the polishing process.
To monitor the CMP process, the difference in reflectance between the conductive and the insulating materials are observed. The preferred conductive materials used for leads in semiconductor devices are aluminum and copper, which are approximately 90-95% reflective for light around one micrometer in wavelength. The reflectance as a function of wavelength for copper, aluminum, silicon and tantalum are shown in FIG. 8. Most insulating materials such as silicon oxide are, as can be seen from FIG. 8, 25-30% reflective at the same wavelength. This difference in reflectance is used to monitor the polishing process. During the CMP process, the pre-polished reflectance from the wafer surface is expected to be about 90% due to full coverage of metal on the surface of the wafer. Upon completion of the CMP process the post-polish reflectance is expected to be lower; in one example in the range of about 25-60%, because the exposed surface has a mixture of insulating material and the metal conductors in the trenches. It is important to note that the these numbers are given for general purposes only, and that the actual different in reflectance between the conductive and insulating or barrier materials will vary primarily based on the type of material and on the pattern and pattern density on the surface of the wafer. In general, lower the density of the metal lines on the patterned wafer, the lower the reflectance value. In one exemplary embodiment of the present invention, the difference in reflectance between the conductive material, and the reflectance value which indicates that the CMP process is nearing completion or is substantially complete at a given zone, is observed to be up to about 65%. Again, the actual difference in reflectance will vary dependent on a number of factors, such as for example the type of material, whether the material is in bulk or patterned, the pattern density, the wavelenght of the light, and the surface finish of the wafer (which may reduce the reflectance).
An optical detection system, preferably a fiber optic reflectance system, is used in the present invention. Referring to FIGS. 3 and 6, one example of the present invention shows a bundle 26 of optical fibers which transmit light from a light source 27 such as a light-emitting diode, to a sensor tip 28. Other optical fibers in the bundle 26 transfer light reflected from the surface of the wafer to a photodetector 29 connected to an amplifier system 31 including an operational amplifier 32 and low pass filter comprising capacitor 33 and resistor 34. The analog output from the operational amplifier is applied to an analog-to-digital converter 36, and then to a processing system which processes the digitized signal in a manner to be presently described. Such an fiber optic system is commercially available, such as a Philtec D64 sensor system.
In the preferred embodiment, the emitting and receiving fibers are in parallel and are randomly distributed in the bundle 26 and oriented generally normal to the wafer surface, although other orientations are acceptable. According to the present invention, the light-emitting diode is selected to emit light at a wavelength that maximizes the differences in reflection of the particular materials on the surface of the wafer. In one example, where a copper layer is to removed to reveal copper leads placed within intervening silicon dioxide layers, the light-emitting diode is selected to emit light at a wavelength of preferably about 880 nm, which is in the range having optimal differences in reflection. Those skilled in the art will recognize that the wavelength providing the most optimal difference in reflectance between the conductive and insulating materials will vary depending on the types of the materials, but that such wavelengths can be determined based on the teaching of the present invention.
The gap distance "g" between the sensor tip 28 and the wafer 22 is important to minimize fluctuations in the reflectance readings. Accordingly, preferably the sensor holder of the present invention is designed to allow gap adjustment. In one example, the sensor holder is comprised of a rigid housing with a nut which receives a threaded sensor tip that screws onto the nut and the gap between the sensor tip 28 and the wafer is adjusted up or down simply by twisting. Other sensor holder configurations may be used so long as they provide a rigid structure that allows adjustment relative to the wafer surface.
Increasing the gap distance "g" can minimize the influence of gap changes as illustrated in FIG. 7 which shows the characteristics of the sensor of the exemplary embodiment. Specifically, each sensor will exhibit a certain voltage at a certain gap distance, as can be determined experimentally or may be available form the manufacturer of the sensor. It is preferred to select a gap distance where the slope of the curve flattens out. In the exemplary embodiment, using a Philtec sensor the gap distance "g" is preferably in the range of about 200 to 250 mils, and more preferably in the range of about 200 and 225 mils. While, one specific example is shown, other suitable sensors may be used to measure reflectance of a wafer surface. However, any suitable sensor must be capable of projecting light onto the wafer and gather the reflected light, and providing an output signal for processing.
To provide in-situ monitoring of the CMP process, the method and apparatus of the present invention employs the sensor tip, inserted in at least one window 36 formed in the rotating platen, to view the wafer during polishing as shown in FIG. 3. The fiber optics bundle with the light emitting diode detector and amplifier are mounted for rotation with the platen. A suitable slip coupling (not shown) may be used to transmit the analog signals through a rotating interface to the analog-to-digital converter 36. More than one window may be formed in the rotating platen, each having a sensor tip inserted therein for viewing multiple locations at the same time. When using multiple sensors, sampling techniques known in the art may be used to process the signal. The window may be of any shape and size, and is limited only by being able to adequately house the sensor tip, an preferably provides a small footprint to minimize the impact on the polishing process.
Of particular advantage, the window 36 may be placed in any desired location such that it traverses a desired region of the wafer during polishing. In the preferred embodiment, the center-to-center offset distance of the wafer and the window are selected such that the sensor tip views the wafer in a scanning arc which travels through the center of the wafer. The scan line 37 shown in FIG. 5 illustrates one example of the scanning arc which travels through the center of the wafer. The polishing may be axis-symmetric, and thus a measure of the reflectance intensity at a distance from the wafer center is expected to be the same for all zones of equal radii. In the instance when polishing is axis-symmetric, the polishing level can be inferred for all other radii in any annular zone, as long as the sensor traverses across the center of the wafer.
Alternatively, different scanning arc trajectories may be selected by changing the center-to-center offset and/or by varying the rotational speeds of both the wafer carrier and the platen. For example, up to a 10% rotational speed offset (i.e. difference in speed between the wafer carrier and the platen) allows one to "step" the trajectory across the wafer.
The optical detection system needs to be protected from the polishing environment. This is accomplished by providing the window(s) 36 in the polishing pad 23, flush with or slightly recessed from the pad surface. Preferably, the window has similar wear properties as those of the pad thus preventing any damage to the surface of the wafer.
Of significant advantage the present invention provides for monitoring the CMP process in certain localized regions or zones. In particular, a plurality of zones are defined on the surface of the wafer and correspond to zones formed in a membrane that engage the wafer. Preferably, the zones are annular; however, the zones may be formed of any suitable shape. Referring to FIGS. 4 and 5, one example of these zones are schematically illustrated, and are further described in co-pending application Ser. No. 09/628,563 wherein a wafer carrier with compartmentalized membranes engages the upper surface of the wafer and urges the wafer across the polishing pad. In this example, the compartments or chambers are in the form of concentric rings and define annular zones whereby the pressure between the wafer and the polishing pad is controlled by these annular zones which are adjacent to the wafer. Thus, by varying the pressure in the annular zones, the rate of polishing on the wafer is controlled at localized regions on the wafer corresponding to each of the annular zones.
More specifically, as further described in the above referenced co-pending application, a wafer carrier is provided which includes a flexible membrane that engages the wafer and urges or presses the wafer against the polishing pad. FIG. 4 schematically illustrates such a wafer carrier 41 which includes a membrane 42 having concentric compartments 43 formed therein and sealed which define the multiple chambers or cavities 46. The chambers 46 form concentric rings with a center chamber 47 surrounded by one or more outer chambers 48. These chambers are defined as annular zones or regions. Each of the chambers separately engage the undersurface of the wafer 22, and thus define localized regions on the wafer surface corresponding to the adjacent annular zones. The pressure applied to the wafer 22 is separately controlled by the pressure in each of the chambers as indicated the arrows P1-P4 in FIG. 4. The result is that concentric zones or regions 48 on the wafer surface can be polished at different rates by controlling the pressure in the corresponding chambers 46. Although four zones are shown in the figures, any suitable number of two or more zones may be defined. Further, the zones may be of a different shape and are not limited to an annular shape, although an annular shape is preferred for the outer zones. In the preferred embodiment, the membrane contains four chambers defining four zones, the four zones being comprised of one circular center zone and three annular concentric zones.
As the sensor traverses across the wafer during polishing, it monitors the polishing progress in the area of the wafer corresponding to one or more of the concentric surface zones. Non-uniform removal of material on the wafer surface tends to occur in patterns concentric about the central normal axis of the wafer due to the rotation of the wafer during polishing. The sensor detects the condition of the wafer a given distance away from the center, and a similar reflectance measurement may be assumed for all equal radii. As described in further detail below, this information regarding the condition of the wafer surface in the different zones is transmitted to a control system to produce a control signal which then selectively controls the pressure in the corresponding chambers behind the wafer as needed to selectively reduce wafer level non-uniformity during the CMP process.
Additionally, the sensor is sensitive to scattering effects due to topographic variations found on the surface material layer on the wafer, particularly when the surface material is copper, just before planarization or removal of the layer. These topographic variations are expected to become more planar during polishing and prior to removal, resulting in an increased reflectance signal. According to one embodiment of the present invention this information is used to ascertain the wafer surface planarity during polishing, and is then used to modify the process parameters to provide more effective and/or efficient polishing. Initially, low pressure gives better planarization and as planarity is reached as indicated by an increased reflectance signal, the process may be modified to higher pressure and velocity to give an increase in removal rate. Thus, the overall polishing time may be reduced. Thus, the present invention provides a method and apparatus for providing feedback control to adjust the CMP process parameters, in addition to monitoring the CMP process.
In another aspect of the present invention, the desired end-point of the CMP process is detected in-situ during polishing. A variety of methods may be used to monitor the CMP process and to determine the end-point. In one example, the end point of the CMP process is determined by comparing the sensor signal to a predetermined threshold value. Referring to FIG. 10, there is a comparison of the ideal signal and an actual signal obtained during removal of a metal coating (copper blanket wafers). It is seen that there is a measurable drop in reflectance as first, the conductive copper layer is removed, and second when the barrier layer is removed.. Experimental results have shown a reasonable correlation between the ideal sensor signal and the actual sensor signal. Accordingly, a threshold reflectance value can be determined for each type of material and pattern type which can be used to compare against actual signals received during processing. When the threshold value is met in a given zone, pressure to the corresponding membrane chamber is reduced or removed to prevent further polishing in that region.
Further, in addition to the threshold value, the entire pressure profile within each zone from the last wafer run can be used to control the next wafer. This control system is referred to as a "feed forward" or run-to-run" control system. This type of system assumes that the nest wafer to be polished will exhibit similar topology and material removal characteristic within the same location or zone as the previous wafer. Thus, a similar pressure profile is applied to the chambers to carry out a similar polishing process.
FIG. 9 exhibits experimental results for tests conducted using the method and apparatus of the present invention. Wafers were polished having a blanket copper layer. The polishing took place until the blanket copper layer was removed to reveal a barrier layer of TaN. FIG. 9 plots the reflectance received as a function of the wafer position (in inches) for multiple polishing passes in time (t) over the wafer. A number of observations can be made. First, the material removal does occur substantially axis-symmetrically about the center of the wafer. The center of the wafer is the last localized region to be polished, and the edges of the wafer polish faster than the other regions of the wafer. This information can be used to create a pressure profile as described above, and sued to provide feed forward or run-to-run control. Specifically, the pressure is varied within each of the chambers corresponding to the localized position (i.e. zones) on the wafer to achieve the desired material removal. For example, the pressure in the outermost chambers which correspond to the edges of the wafer will be reduced at a selected time into the polishing process to account for the faster material removal rate in this region. The pressure may be reduced gradually, so that this region continues to be polished, but at a slower rate. Alternatively, the pressure may remain constant but will be at a lower value in this zone. Conversely, the center chamber which corresponds to the center position (or zone) of the wafer may receive increased pressure, the pressure may remain constant throughout the entire process, or a combination of both techniques may be used, since the center is the last zone to polish in this particular example.
FIG. 11 shows a block diagram of one example of a control system that may be used with the present invention. The control system is comprised primarily of a process controller 50, pressure distribution controller 52, sensor 25, and a wafer database 54. The process controller 50 receives data establishing the process parameters or recipe, and sends commands to the CMP machine 56 to control the CMP process. Additionally, coupled to the process controller 50 and the CMP machine 56 is the pressure distribution controller 52 which controls the pressure within the membrane chambers in the wafer carrier as described above.
The pressure distribution controller 52 receives data via two routes. First, the pressure distribution controller 52 may receive data representative of the reflectance measurements in each of the zones on the wafer directly from the sensor 25. The pressure distribution controller 52 includes hardware and software configured to receive the reflectance measurements, determine the appropriate pressure adjustment needed (if any) within each zone, and then sends a signal to the CMP machine to selectively adjust the pressure within the subject zone as appropriate. The reflectance data from the sensor is also transmitted to, and stored in, the wafer database 54.
In an alternative embodiment, predetermined pressure profile values and/or threshold values for each of the zones are stored in the wafer database 54. These values are then transmitted to the process controller 50 or the pressure distribution controller 52. The pressure distribution controller compares these values to the actual, real-time reflectance values from the sensor 25 and sends a signal to the CMP machine 56 to adjust the pressure in each of the zones as appropriate. Additional data, such as the pre-polish thickness of the wafer 58 and/or the post-polish thickness of the wafer 60 may be sent to the wafer database to assist in determining the appropriate pressure adjustment.
In another embodiment of the present invention, model based detection may be used to monitor and control the CMP process. Specifically, model based control provides for the real time adjustment of the CMP process parameters to better tailor the CMP process to the most effective and efficient process. The detection systems described above focus primarily on selectively controlling the pressure in the zones to provide for substantially uniform polishing of the localized regions of the wafer. This minimizes the occurrence of over-polishing in some regions and under-polishing in other regions.
The model based detection and control system evaluates the amount of scattering in the reflectance signal received from the sensor. As described above, the inventors have found that the degree of scattering is indicative of the topography of the surface layer on the wafer. The extent of scattering of the signal may be evaluated based on statistical techniques such as determining the standard deviation and the variation in the mean as well as the shape of distribution. When a high level of scattering is seen the CMP process can be adjusted to give better planarization. As planarization proceeds, the surface layer the topographical variations begin to flatten out, and the scattering of the signal decreases. As this occurs the CMP process can again be adjusted to increase the removal rate of material from the surface of the wafer. These process adjustments can be made for example, by varying the relative velocity and applied pressure process parameters, and such adjustments can be made selectively within each of the zones as appropriate. Thus, the degree of scattering of the reflectance signal can used as an indicator of the material removal rate, and the polishing state of the wafer at certain localized regions on the wafer, and this information can be used to adjust the CMP process parameters.
In another aspect of the present invention, a method of chemical mechanical polishing is provided. In general, the method comprises the steps of: providing a CMP machine which includes a polishing pad and a wafer carrier having multiple chambers that allow for independently varying pressure within the chambers that urge against a wafer at corresponding localized regions on the wafer; measuring the reflectance of the surface of the wafer during polishing at each of the localized regions on the wafer; processing the reflectance data to determine the state of polishing within each of the localized regions; and independently adjusting the pressure within any one of the chambers responsive to the state of polishing within each of the corresponding localized regions.
More specifically, in one embodiment the method of the present invention may be carried out as illustrated by the flowchart of FIG. 12. A CMP machine is provided and wafer polishing begins at step 100. The CMP machine includes means for varying the pressure against the wafer at localized regions, such as the flexible membrane having chambers that define zones on the wafer as described above. It should be noted however, that the present invention is not limited to this particular configuration, and other means that provide for independent control of the pressure at localized regions of the wafer may be used.
To provide for localized control of the pressure, and therefore localized material removal rate on the wafer, the sensor position is monitored at step 110 using conventional means. The reflectance signal is measured and recorded at step 112. At step 114 the signal measurements are separated into zone. The reflectance signal for each of the zones is then processed at step 116 a-116 d. As described above, processing of the signal may be performed in a variety of ways. For example, the reflectance signal may be compared to a threshold value or to a pressure profile. Based on the output of the processing of the signal at steps 116 a-116 b, a decision is made at step regarding whether the pressure needs adjusting in any one of the localized zones. The inquiry is made for each of the zones at steps 116 a-116 d (four zones in the exemplary embodiment), and the pressure is reduced when the inquiry is positive at steps 118 a-118 d.
FIG. 13 shows the method, particularly the processing step, in greater detail. The method begins at step 130 with polishing of the wafer at step 132. During polishing, the reflectance at various zones on the wafer is measured at step 134. The reflectance data measurements are separated or grouped into zones depending on the position of the sensor when the date was gathered at step 136. The grouped data is then individually processed. In one example, the grouped data is processed to calculate the average reflectance in each of the zones at step 138, data is stored at step 140, and a filtering average is obtained at step 142. The same reflectance data is also processed to calculate the standard deviation of the data in each of the zones, and to obtain the filtering average at steps 144 and 146. The standard deviation data is stored at step 148. The moving average values from both processing steps 142 and 146 are compared against previous, expected or threshold values at step 150. If the values do not differ in any of the zones, the polishing process continues without adjustment. If the values do differ in any one or all of the zones, the pressure in the zone(s) is independently adjusted accordingly at step 152. When all of the zones exhibit reflectance data that is indicative of end-point (as compared to previous, expected or threshold values) then the polishing process stops.
As taught by the foregoing description and examples, an improved method apparatus for chemical mechanical polishing of semiconductor wafers has been provided by the present invention. The foregoing description of specific embodiments and examples of the invention have been presented for the purpose of illustration and description, and although the invention has been illustrated by certain of the preceding examples, it is not to be construed as being limited thereby. They are not intended to be exhaustive or to limit the invention to the precise forms disclosed, and obviously many modifications, embodiments, and variations are possible in light of the above teaching. It is intended that the scope of the invention encompass the generic area as herein disclosed, and by the claims appended hereto and their equivalents.
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Full story for Bryan Singer's planned SUPERMAN RETURNS sequel revealed
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December 10 2010, 06:42 PM
Admiral Buzzkill
Fleet Admiral
Re: Full story for Bryan Singer's planned SUPERMAN RETURNS sequel reve
Stone_Cold_Sisko wrote:
Sounds kind of interesting, but frankly I want to get away from this mindset that making a mediocre movie is acceptable as some kind of setup for "my Wrath of Khan". IMO if you make a mediocre movie, you get booted from the franchise, as it should be.
Sure, give the next guy the chance to start over and make his mediocre movie instead. Then the next guy...
I mean, your statement doesn't actually have anything to do with how anyone involved - studio, directors, etc - actually approach these projects.
"Ah, this is my first time at bat so I won't try that hard. 'Mediocre' is good enough, because I'll do really well on the second one. After all, I know that they'll keep me on."
Yeah, that's the "mindset" and those are the expectations that motivate the way things are done.
Last edited by Admiral Buzzkill; December 10 2010 at
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Below is the poem entitled OUR THOUGHTS which was written by poet
segal. Please feel free to comment on this poem. However, please remember, PoetrySoup is a place of encouragement and growth.
Read Poems by
Simone Segal
Our Thoughts
Top 09/05/2010 16:12:54
What are you thinking?
* Every thought we have creates the words we speak.
* Every thought we have creates every action we take.
* Every action we take creates a reaction.
* Every thought, word, action, reaction, creates our lives!
How's life? Bad? Fair? Good? Great?
Life should be great and can be great with the choices we make! The main choice being our
choice of thoughts. I live my life by thinking in a certain way, a thought pattern that
drives me to everything I desire in life, rather than everything I do not want.
I formed a habit of thinking in a certain way. It wasn't easy but I never gave up! I
used Willpower! If you work out in the gym it's hard at first, but depending on your
desire, the more effort you put in, the bigger the results! You realise what a wonderful
gift willpower is. When used, one feels amazing!
The trouble is most of us do not have any goals in life, nothing to work towards, nothing
to use these amazing gifts we hold waiting to burst out - willpower, imagination,
intuition, perception… I could go on! We are creative beings with minds to THINK!
Unfortunately, what we think about are our perceptions of what we see and hear in the
news, on the TV, etc. All the negativity putting us all into a state of fear.
Fear is debilitating, it throws barriers up to stop us from reaching our goals.
Goals are the keys to direction in life. Without goals we are the sheep following the
masses, following others who never have a clue where they are going. We lose faith.
Faith is believing! We all seem to think that seeing is believing. I see it as believing
in something so much that you make it happen. Having faith and belief in oneself, holds
the truest wisdom to the ultimate power of success!
When we can cast away our fears and doubts, stand up and brush ourselves down when we have
knockbacks, only then, can we attain our goals. Everyone passes failure on their way to
success, in fact look upon failure as just a way of telling you there is a better
direction for you just waiting around the corner.
I study the greatest philosophers and scientists in quantum physics, from the past to this
day. They all agree on one thing - WE BECOME WHAT WE THINK ABOUT!
Sometimes we read or hear things that really ring home true…. My life has changed, how
about you?!!!!!
What are you thinking now?
Simone Segal


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Couple thwarted by deputy after attempted robbery
CORPUS CHRISTI - A couple suspected of a robbery spree early Thursday were chased by a sheriff's deputy until they wrecked, police said.
A 48-year-old man reported a robbery attempt about 5:25 a.m. at an ATM in the 1100 block of Waldron Road.
His vehicle was blocked by an older model car and a man with a screw driver approached him, according to a news release.
To escape the man drove backward from the drive-thru and left his cared in the machine.
A woman from the other vehicle tried to use it, the owner told police, but he got it back from the machine after they drove away.
While police took his information another robbery call was dispatched to a convenience store in the 6300 block of McArdle Road. A clerk told police a woman asked for change, as a man with his face covered entered and demanded money. The clerk gave him cash, and the couple left. The clerk alerted a deputy who pulled into the lot, and he chased the couple through a shopping center along Airline Road and onto westbound S. Padre Island Drive before they crashed into a barrier at the Crosstown Expressway turnaround.
Christina Ambrosia Vasquez, 30, and Jarrod Nathaniel Cantu, 25, were in Nueces County Jail Thursday on suspicion of aggravated robbery, with bail of $150,000 each, jail officials said. Cantu also faced a charge of evading arrest, and evading arrest with a vehicle with additional bail of $2,000.
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Out & About: Country, classical and jazz music festivals
Summer music festivals are as much a part of the Maine scene as clambakes and schooners, and three of them lead this week's A&E calendar.
Let's start the weekend with country music. Stonehedge, an indoor/outdoor events venue in West Gray, hosts its annual Country Fest Friday through Sunday. Maine artists are featured, including Dirigo Highway, a foursome that's poised to make an impact on the national scene.
The 37th annual Sebago-Long Lake Music Festival starts July 14 at historic Deertrees Theatre in Harrison. Concert-goers include many patrons of the Portland Symphony Orchestra. Laurie Kennedy, longtime PSO first violist, is the festival's artistic director, and several PSO instrumentalists are among the 25 musicians who will perform over the course of the next five weeks.
Meantime back in the Port City, the 2009 Summer Jazz Festival continues at One Longfellow Square. Mostly local artists are featured. Next Tuesday's act is the Portland Jazz Orchestra, an 18-piece ensemble.
Country Fest
Russ and Sue Jeffords believe in the old-fashioned rural Maine lifestyle and traditional values. To advance that purpose, they're gradually converting their 19th-century house and barn in West Gray into a homey B&B and function facility called Stonehedge. For starters, they've built a unique post-and-beam concert stage as an annex to the barn, and for the past half-dozen years they've been staging a variety of old-fashioned musical events on the former farm property. These include a country festival, bluegrass jam and a gospel gathering.
This weekend marks the first of these events for the summer season. The Stonehedge 2009 Country Fest is a three-day alfresco affair that will draw a dozen-plus bands and hundreds of listeners. The schedule starts Friday and runs all day Saturday and Sunday.
The Jeffords' musical lineup is loaded with Maine and New England acts. Friday evening's headliner is the Help Wanted Band, a Massachusetts-based foursome who make frequent forays into southern Maine. Top billing on Saturday goes to Emerald Sky, a quintet from Augusta that covers top Nashville artists such as Keith Urban, Lonestar, Brooks & Dunn and Toby Keith. Expect a few Emerald Sky originals interpolated into the Stonehedge show.
Dirigo Highway, which hails from the Waterville area, wraps up the festival on Sunday evening. This foursome is definitely Maine, but they're also definitely poised to break onto the national mainstream: Dirigo Highway recently copped the North American Country Music Association's award for Most Promising Traditional Country Band.
They're currently working on their second CD, titled "You're the One." As I write this, I'm playing an MP3 of title song, penned by guitarist Cliff Gelina; it boasts a pleasing melody, driving rhythm and lots of pop hooks. The accompanying video was shot a couple of years ago at Stonehedge. I'm definitely hoping to catch Dirigo Highway live on Sunday.
Stonehedge's other scheduled acts include Ridge Ryders, Country Felix Band, Steel Rail Express, Branded: No Rules, Lone Star Band, Coyote Drifters, Bad Penny and Shelby Lynn. The latter won last year's Stonehedge Battle of the Bands competition.
Stonehedge is on Route 4/202 in West Gray (near the Windham line). Bring lawn chairs, sunscreen, bug spray and clothing suitable for chilly and damp Maine nights. The Jeffords will set up a tent in the event of rain. Call 428-3659 or visit stonehedge-me.com.
Sebago-Long Lake Music Festival
Rusticating and concertizing in one of Maine's most sylvan settings is the ongoing theme of the Sebago-Long Lake Music Festival, which performs five consecutive Tuesdays each summer as the programming anchor of historic Deertrees Theatre and Cultural Center in Harrison. The festival, which opens July 14, has been one of western Maine's favorite seasonal happenings for nearly four decades and consistently draws concert-goers from the Portland area.
One reason is simple: A number of the Portland Symphony Orchestra's longtime members play with the festival, headed by first violist Laurie Kennedy, who serves as the festival's artistic director.
Twenty-five professional musicians are slated for 2009. Each summer Kennedy's programming focuses on tried-and-true classical chamber works with an occasional modern composition added for variety. With more than two dozen musicians to draw from, she has exceptional leeway to program a very broad spectrum of music with interesting instrumentations. Each of her five programs revolves around a central theme.
The Deertrees building itself is one of the festival's prime attractions, and many first-time visitors vividly remember the charming woodsy surroundings. Deertrees simply oozes bucolic ambiance. The setting certainly exemplifies laid-back summers: The 350-seat theater, built in 1936 by a vacationing New York opera impresario, is a classic example of the rustic Adirondack style.
Between the 1930s and 1950s, Deertrees primarily hosted summer stock theater with visiting Broadway stars. Following those golden years, the property suffered decades of physical decline and revolving-door ownership-management. Shortly before it was scheduled for demolition, a local arts enthusiast led a spirited campaign to restore Deertrees – an effort that continues to the present.
Deertrees Theatre and Cultural Center is located on Deertrees Road, about a mile northeast of Harrison Village. Concerts begin at 7:30 p.m.; pre-concert picnicking on the grounds is encouraged. Call 583-6747 or visit sebagomusicfestival.org on the Internet.
Summer Jazz Festival
Of all musical genres, jazz seems to get the least attention in Maine. One presenter that seems happy to swim against the tide is One Longfellow Square in downtown Portland. The cozy little concert hall hosts a regular program of jazz most Tuesdays throughout the year.
During July and August they call it the Summer Jazz Festival. Most of the acts are locals – and most of them are regulars at One Longfellow – with a heavy representation of professors and players connected to the University of Southern Maine School of Music.
Size-wise, the biggest of this summer's offerings is the Portland Jazz Orchestra, an 18-piece ensemble that performs in the Big Band tradition, led by USM prof Chris Oberholtzer. The PJO is scheduled July 14 and Aug. 11.
On July 21 it's the Steve Grover Quintet playing a program of Beatles music plus some originals. This Portland fivesome comprises Trent Austin on trumpet, Dave Wells on tenor sax, Tony Gaboury on guitar, Dominic Sbrega on bass and Steve Grover on drums.
The schedule for the remainder of the summer: Then and Now is slated July 28, the Lenny Breau Project takes the stage Aug. 18, and Grupo Mofongo performs the festival finale Aug. 25.
All the above concerts start at 8 p.m. One Longfellow Square is located at the corner of Congress and State streets. Call 761-1757 or visit onelongfellowsquare.com on the Internet.


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Club Penguin Blog
Blog — What's New
It's a great game for exercising your puffles. It takes fast thinking and good timing though, so here's a few tips:
Look for things to tap and move. You'll need to search for objects that can help your puffle explore the caves.
EVERY Puffle O is possible to get. If you can see it, you can reach it. Don't give up!
If all else fails—try going as fast as you can! You never know when you'll hit a secret jump and go flying in the right direction!
Rockhopper is a pirate captain, Club Penguin's best-known adventurer, and a very good friend of mine.
Together with his red puffle Yarr, he sails the high seas in his ship, the Migrator. (It's the third one! You don't go on that many daring adventures without losing a ship or two to the waves.)
From Lost Treasure Island to Rockhopper Island, his travels send him far and wide. When he returns, he brings back rare items and tall tales. Legend has it, he has battled a squid, played Mancala against the Merry Walrus (and lost), then fenced with a pirate turtle.
He's always up for a pirate parade, and enjoys a good pizza party—so if you happen to meet him, be sure to join in. And don't mind the odor. It's just the stinky cheese he keeps in his beard for later!
-Aunt Arctic


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With Caroline agreeing to go away with Bo to Northern California for a stay at a treatment facility for dementia, who will run the pub? Nick and Gabi and a few unknowns help run the show but with Kayla gone back to work, will they take over running the place or will someone else? Vote on who you think it'll be.
Find out how Ryan deals with all of Tracy's lies on "Corrie Street" in this week's UK and Aussie Soap Scoop.
Check out Adam Lambert in this week's spooky Pretty Little Liars Halloween episode: This is a dark ride.
Join Soaps.com on Twitter @soapoperafan, "like" Soaps.com on Facebook.
Screen shots courtesy of NBC Universal Inc.
- Christine Fix


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Stoptech uses industry leading technology and materials when manufacturing their brake components from their quality rotors used in their Stoptech Brake Kits to their performance 309 Brake Pads. Stoptech offers everything you would need for your brakes like Pads, Rotors, Stainless Brake Lines and even Brake Fluid.
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Women of the West Story Archive
Two Strikes: The Justina Ford Storyby Fiona Potter, Los Angeles, CA
Dr. Justina Ford was born Justina Warren in Knoxville, Illinois in 1871. Ford came from a large family and her mother was a nurse. As a child, Ford remembered that she liked to play "doctor" with her siblings, and she enjoyed ministering to imaginary ailments, as well as sick neighbors.
After marrying Reverand John Ford I 1892, Ford moved to Chicago, where she studied obstetrics, pediatrics, and gynecology at the Herring Medical School. She interned at the State Hospital in Normal, Alabama, but looked forward to working in a place where an African American might play a fuller role in community life.
Eventually, the Fords moved to the Five Points neighborhood of Denver, Colorado. Five Points came to be known for its African American presence, although during the time of the Ford's arrival it was also home to many immigrants. Barred from the Colorado Medical Association and the right to practice in Denver hospitals, Ford created a bustling business from her home. Although she separated from Reverend Ford in 1915, she continued to work in Denver, eventually remarrying to Alfred Allen. During her decades-long career, Ford estimated she delivered some 7000 babies from all kinds of backgrounds. Two years before her death, in 1952, Ford was finally granted admission to the American Medical Assoication and honored for her service to Denver's working class communities by the Cosmopolitan Club. Her home is the Black American West Museum.


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Sheriff Citizen Medal
The Sheriff's Citizen's Medal is presented to citizens of the community, who are not members of the Sheriff's Department, for exemplary service to the citizens of Pima County. The service should clearly be above and beyond the requirements for a Sheriff's Commendation.
« Return to Medals and Commendations


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By Staff Sgt. Jeff Troth, USAAmerican Forces Press Service
SOTO CANO AIR BASE, Honduras, Nov. 19, 1998 In Honduras, where main roads are scarce, Hurricane Mitch stranded thousands of people.
The U.S. Navy's 7th Mobile Construction Battalion completed their first road improvement mission, making the road to El Valcano passable. It took the Seabees three days to repair over seven miles of severely damaged road.
The northern Honduran town of Yoro has one main road, and Mitch made it impassable. The Seabees sent a two-man reconnaissance team to scout out the damage. The team attempted to drive the road in a Humvee, including a 10-kilometer detour to find a safe place to cross a river, but turned around 45 kilometers shy of Yoro because of the road conditions.
Task Force "Can Do," a team of 17 sailors armed with a bulldozer, a front end-loader and a 5-ton dump truck, headed for La Mesa Air Base Nov. 13 to begin clearing Yoro's road. The task force will fix destroyed culverts, rebuild bridges, clear mudslides, and build detours where necessary.
The task force plans first to open the road from La Mesa Air Base to Santa Rita and then turn east to Yoro. The Seabees intend to live with their equipment as they advance, setting up camp every night wherever they finish work.
[Staff Sgt. Jeff Troth is a member of the Army's 49th Public Affairs Detachment (Airborne), Fort Bragg, N.C., accompanying the U.S. military relief effort.]


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Blimey ,what an honour, two honours actually. So thanks to Arancat ( good luck with your plan to across the Pacific Ocean) and Kelly Lord (good luck with the biggest baddest bucket list competition)
for nominating me.
Of course I am delighted that two people have enjoyed the blog enough to mention it, but also that it happened at a time when I was musing on just how good so many bloggers are. On how much well written entertainment and information they give me, for free, because they care.
So when I read the rules for accepting, I got all giddy. They are:
1. Display the award logo on your blog page. – tick
2. Link back to the person who nominated you -. tick
3. State 7 facts about yourself
4. Nominate 15 other bloggers for the award.
Yahoo, a chance to talk about myself AND credit some of the bloggers I admire. What an opportunity. So chocks away!
I love red wine, cheese and fresh bread,
can't resist buns,
could do with loosing a few kilos,
think George Town, Malaysia is one of the nicest cities ever,
love coral reefs and fish-
but not so keen on deep sea diving,
have a big nose.
The Blogs
1 First off the block is almost Mrs Average. Her Rubbish Diet has gone from personal musings on a backyard bin to a book by way of rubbish czar to the Olympics.
2 Followed Mrs Green in My Zero Waste. She has a similar rags to famous rags story and has appeared with Jeremy (phwoar!) Irons in the film Trashed. Yowser, get down!
3 While I am talking garbage, I have to nominate Everyday Trash for her intelligent, entertaining and wonderfully educational articles on all aspects of rubbish. Well worth a root through her dumpster. Ewww not sure I like how that sounds.
4 There are loads of fantastic plastic- free blogs out there but these guys also have kids! They have just started on their quest for a plastic free life. Nice and lightly written, its fun to follow them take their first nervous steps into a world free of synthetic polymers. Nice name too – PLastsick
5 Off into minimalist territory and lets swing by and say ship ahoy to Bethany living a big yet minimalist life on board a small boat in My Journey to Ithica
6 Stephanie meanwhile is well down the road of rubbish free-living and happily chucking stuff out.Doing exactly what it says on the tin is Stephaniegetsridofhercrap
7 Ihabitat – describes itself as a weblog.Is that a blog? Or a website? Whatever it is the best design weblog ever – will design really save the world? ohhhhh yes and it will look good too.
8 This is a lovely green lifestyle blog by Olive – something for everyone here
9 When I am away from home and missing my own lovely allotment I like spend pottering round Flighty's. A gentle ramble round his plot always refreshes me.
10 Lets Make Wealth history is a good read on pretty much every level
11 The Smallest Samll holding is what I would be doing if I was back in the UK. And links to rescue hens should you want them.
12 And when I do get back home and back to my sewing machine I am going to do the seamless challenge properly. Yes you make all your own clothes for a year. I mean my clothes are homemade for sure, by a tailor in Georgetown and I'm not sure that counts.
13 Though most of the articles here hurt my tiny brain I find myself turning and returning to this Ecotextile blog for clarification and edification on all things green and cloth like
14 There are so many wonderful blogs written people who pick up plastic left behind by others, I feel bad choosing only one. I did a random choice and came up with Flotsam Diaries – and it is a good choice .
To see the many other great anti plastic bloggers out there look at my huge list of likes over at Planet trash. Is that cheating? I don't care – they all deserve an award.
15 This one too is way above my head but I struggle through because it is soo interesting and well written. And I used to hate chemistry. Maybe it's because these are green chemicals.
Right now I am off to fulfill the last requirement and
5. Notify those bloggers of their nomination and the award's requirements.
Boycott Plastic
Inspired to give up plastic? Check these plastic-free products. Use them then compost them.
Related Posts
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5 comments
Congratulations it's well deserved, and thanks for nominating me in this excellent post.
I may well cheat a bit, as I usually do, but will do a post about this with a link back here suggesting that people have a look not only at your blog but all the others that you list. xx
Polythene Pam
I think I am the only one who did follow the rules.
I do sometimes but generally drag my feet with these! Anyway thanks again, and well done for doing it. xx
Pingback: Award Time! (And of course we followed all the rules…) | Journey to Ithaca


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The Illusion of Inclusion – Part II
Inclusive Workplace April 1, 2014 PDJ 3
Four Sides to the Same Coin
By Dr. Helen Turnbull
In stark contrast to the weather I grew up with, the warm air of Miami washed over me as I stepped off the British Airways flight that brought me from my native country of Scotland to my new home in the United States.
George Bernard Shaw said, "England and America are two countries divided by a common language." As an immigrant in 1980 I quickly became aware that everything I had previously taken for granted in the UK could no longer be assumed to be true. I recall in the early months sometimes feeling like an outsider and wondering how long it would be before I stopped thinking I was driving on the "wrong" side of the road. I experienced what George Bernard Shaw meant and, to this day—some 34 years later—I occasionally still bump up against cultural norms and expectations that differ from the mental model I have carried since childhood.
Fast-forward a couple of years, when I found myself in a grocery store asking the bakery assistant for six bagels and she replied, "Oh, you sound so intelligent." I am sure you will agree that you don't have to be really smart to ask for six bagels, and I realized that what she had done was project intelligence on to my British accent. This made me wonder what level of intelligence she would unconsciously project on to other people if their accent was less pleasing to her ear and, once again, I was reminded of the hidden privileges of being perceived as a member of the dominant culture.
Unraveling Complexity
Over the years of doing Diversity and Inclusion work, I have come to realize all of the privileges I have by being white European, Christian, and heterosexual. On the other hand, in addition to being an immigrant, I am also aware of the societal and workplace challenges of being a member of sub cultural groups (e.g., being a woman and a Baby Boomer). In any given day, I move seamlessly and often without conscious awareness from dominance and privilege into sub-ordinance and assimilation, taking on the task of doing what I can to fit in.
Dominance and subordinance are intrinsic to human social relationships and are so embedded in our patterns of behavior that most people do not even notice the shifts they make to accommodate the duality of their roles. As if it were not complicated enough, it is not merely self-perceptions that matter, it is the perceptions and labels others place on us that play a role in the health of our diverse relationships. The labels we are consciously and unconsciously assigned by others and the assumptions they project also have a direct impact on the way we are treated and the way we respond.
Dominance and subordinance are two sides of the same coin. For dominance to exist, subordinance must be its "kissing cousin." And yet, I would contend that there are actually two sides to the story on each side of the coin. How do I perceive my own dominance or subordinance and how do others perceive it?
It doesn't matter whether we are talking about Heidi/Howard Roizen in the classic Harvard Gender inequity Case Study*… the unfair treatment received by black NFL players… following Sheryl Sandberg's request to "Lean In"…or indeed bemoaning the fact that there are fewer women in Congress and the Senate, it is an inescapable fact that the issue of dominance and subordinance permeates the diversity landscape and impacts our perspectives, our sense of privilege and entitlement, or lack thereof, and the quality of our relationships with each other. The key question is: How much do we understand our own part in this daily theater?
One thing I am clear about, whether I do it to myself or you do it to me, when my personal radar becomes focused on being a subculture member, I sometimes catch myself playing small and that drains my energy. Equally true is the fact that when I am living in my dominance, I can sometimes catch myself living large and being superior—and that is surely an energy drainer for other people. How do the four sides of your coin play out?
Dr. Helen Turnbull is the CEO of Human Facets, LLC and a world recognized thought leader in global inclusion and diversity. Her latest book is "Blind Spots: A conversation with Dr. Turnbull about Unconscious Bias." See her TEDx presentation on "The Illusion of Inclusion" at http://pdjrnl.com/tedxhelen.
Neil CockroftApril 14, 2014 #2 Author
I like the 4-sided coin view. The power / privilege (dominant) association of being part of an 'in-group' often gets the greatest focus; the implications of concurrently belonging to 'out-groups' are equally pertinent. So that's where my energy has been going! I am further sensitised (as a fellow British expatriate). Thanks Helen, great insights.Reply
dissertation writing servicesOctober 22, 2014 #3 Author
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Moving From Diversity to Inclusion
Hispanic or Latino: Which is Correct?
Culture, Values and the Impact at Work
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Diversity … A Recipe for Business Success
Douglas H. Brooks, Brinker International, Inc.
CEO in Action Mar 21, 2011 1


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Mounira Banasr, PhD
Associate Research Scientist in Psychiatry
Research Interests
Mental Disorders; Chemicals and Drugs
Research Organizations
Research Summary
Over the last ten years we have witnessed a fundamental change in our understanding of the neurobiology of mood disorders, including major depression disorder (MDD). In addition to chemical imbalances, it is now clear that there are significant structural alterations of limbic brain regions associated with depression, and postmortem studies of MDD patients demonstrate morphological changes including decreases in neuronal size and glial loss that could underlie these changes. We believe that a better understanding of the cellular mechanisms involved in these morphological alteration could offers hope for the development of new and more efficient treatments for depression.
Extensive Research Description
addition to chemical imbalances, it is now clear that there are significant
structural alterations of limbic brain regions associated with depression, and
postmortem studies of MDD patients demonstrate morphological changes including
decreases in neuronal size and glial loss that could underlie these changes.
Most striking
are the consistent reports of decreased number and function of glia in limbic
regions, particularly the prefrontal cortex, suggesting a role for glia in the
neurobiology of MDD. These
studies have focused primarily on astrocytes, although changes in
oligodendrocytes have also been reported. The critical role of astrocytes in
providing metabolic and trophic support raise the possibility that the glial
loss could contribute to decreased size and function of neurons.
However, it is not clear if glial reductions are causally related to MDD, playing a direct role in the expression of depressive symptoms, or are a consequence of the illness. A related question is whether preventing glial deficits would alleviate the symptoms of depression. Although these issues are difficult to address in MDD patients, progress is being made in basic research studies. Exposing rats to chronic stress results in glial reductions, as well as neuronal atrophy similar to the changes observed in MDD patients. Chronic stress also reduces the expression of specific astrocyte markers, as well as astrocytic metabolism in the prefrontal cortex. In rodents, chronic stress also results in behavioral alterations in tests measuring anhedonia and helplessness, core symptoms of depression. Employing these tests, the influence of compounds that disrupt astrocytic function or that cause astrocytic death, on depressive-like behaviors has been determined. Infusions of a toxin that causes glial death into the prefrontal cortex induced anhedonia and helplessness and increases the susceptibility to stress. These findings provide the first evidence that loss of glia may contribute to depressive symptoms and is not merely a side effect. Studies using pharmacologic and genetic approaches aiming to identify the subtype(s) of glial cells mediating these effects and the molecular determinants involved in glial loss are currently underway.
Recently, there has been considerable enthusiasm for studying the antidepressant actions of agents that enhance glial glutamate uptake, a key function of astrocytes. One such drug is riluzole, known to delay the progression of amyotrophic lateral sclerosis, a neurodegenerative disease with documented astrocytic dysfunction. Riluzole is reported to have antidepressant actions in MDD patients and in rodents, and prevents the decrease in glial metabolism and loss induced by chronic stress. Although additional studies with agents that selectively increase or protect glial function are required to further test this hypothesis, this preliminary research offers hope for an entirely new area, targeting glial function for the treatment of depression.
- Action of stress and antidepressants on adult neurogenesis in the hippocampus
- Action of stress and antidepressants on gliogenesis in the prefrontal cortex
- Action of stress and antidepressants on mature glial cells
- Implication of glial cells in the depression and stress related behaviors
- Glial function as a new target for antidepressant action
Selected Publications
- Su XW, Li XY, Banasr M, Koo JK, Shahid M, Henry B, and Duman RS (2009) Chronic treatment with an AMPA receptor potentiator increases neuronal cell proliferation and survival in adult rodent hippocampus. Psychopharmacology.
- Greene J, Banasr M, Lee B, Warner-Schmidt J, and Duman (2009) Vascular Endothelial Growth Factor Signaling is Required for the Behavioral Actions of Antidepressant Treatment: Pharmacological and Cellular Characterization. Neuropsychopharmacology.
- Banasr M, Choudhury GM, Newton SS, Twillinger R, Duman RS, Behar KL, Sanacora G (2008) Glial pathology in an animal model of depression: Reversal of stress-induced cellular, metabolic and behavioral deficits by the glutamate modulating drug riluzole. Mol
- Banasr M, Duman RS (2008) Glial Loss in the Prefrontal Cortex Is Sufficient to Induce Depressive-like Behaviors. Biol Psychiatry Nov 15;64(10):863-70.
- Choudhury GM, Banasr M, de Graaf RA., Rothman DL, Behar KL, Sanacora G (2008) Chronic Riluzole Treatment Increases Glucose Metabolism in Rat Prefrontal Cortex and Hippocampus. J Cereb Blood Flow Metab Jul 16 Dec;28(12):1892-7.
- Banasr M, Valentine GW, Li XY, Gourley SL, Taylor JR, Duman RS (2007) Chronic unpredictable stress decreases cell proliferation in the cerebral cortex of the adult rat. Biol Psychiatry 62:496-504.
- Banasr M, Duman RS (2007) Regulation of neurogenesis and gliogenesis by stress and antidepressant treatment. CNS Neurol Disord Drug Targets 6:311-320.


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Lindsay Lohan arriving to court for the final hearing of her probation. (March 29, 2012)
How fucking stupid are the cops in California? Everyone knows she's a coke fiend but they can't even jail her for felony theft and 3 hit and runs. Meanwhile in Florida they will shoot and kill you for eating a snow cone.


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A Hundred Miles Off
by The Walkmen
Released: May 2006
Label: Talitres Records
The Walkmen have toned down their guitar and organ rumble and in the process of relaxing their former garage stance, they discovered a raspy Dylan-esque drawl. The attitude of "Lost in Boston" is as much cranky defiant folk as directionless New York punk ennui. While their third disc makes less of a racket, there's still plenty of unrestrained vehemence to be found.


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More New and Used
from Private Sellers
2 Pianos, 4 Handsby Dykstra, Ted; Greenblatt, Richard
Consortium Book Sales & Dist
Questions About This Book?
Why should I rent this book?
Renting is easy, fast, and cheap! Renting from eCampus.com can save you hundreds of dollars compared to the cost of new or used books each semester. At the end of the semester, simply ship the book back to us with a free UPS shipping label! No need to worry about selling it back.
How do rental returns work?
Returning books is as easy as possible. As your rental due date approaches, we will email you several courtesy reminders. When you are ready to return, you can print a free UPS shipping label from our website at any time. Then, just return the book to your UPS driver or any staffed UPS location. You can even use the same box we shipped it in!
What version or edition is this?
This is the Reprint edition with a publication date of 4/9/2013.
What is included with this book?
- The New copy of this book will include any supplemental materials advertised. Please check the title of the book to determine if it should include any CDs, lab manuals, study guides, etc.
- The Rental copy of this book is not guaranteed to include any supplemental materials. You may receive a brand new copy, but typically, only the book itself.
In this new play, penned by a pair of celebrated writer/musicians, two zealous and talented young boys are both determined to be famed concert pianists. Over the next fifteen years, they pursue their ambitions tirelessly, confronting and enduring pushy parents, eccentric teachers, stage fright, and the harsh reality of certain dreams.


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Snap windows to edges & other windows
So, I am really loving my MacBook Pro. First Mac I have ever owned. There is an application I loved and had running non-stop. It is called AllSnap. Basically what it did was when you were dragging a window (anything; browser window, finder, etc...), if it got to be within a certain distance from the edge of the screen or another window, it would snap to that edge. I found this program to be extremely useful since I am very OCD about everything being perfectly in line.
Do any of you know of a program similar to this? I have attached the website for AllSnap so you can see a little better what it is. By the way, I have done a search, and on G4TevhTV's (http://www.g4techtv.ca/callforhelp/s...html?freefiles)
website they list AllSnap as a Mac OSX program but on AllSnap's website it is not listed.
At least in Tiger, there is a "Snap to grid" option in the View Options for a Finder window. I would presume that if you made this the default for all windows, you would get close to what you want. This is not quite a "snap to other windows", but it might be close enough?
Im using Lepoard and have not been able to find this option.
So I am guessing no one else has ever seen anything like this?
Give this a try
It's not perfect, but it works well enough until something better comes along!
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Thursday, June 26, 2014
A man who lives near Pawleys Island Veterinary Hospital called 911, June 14, to report the dogs had been barking all morning.
The man said this is an ongoing problem. He said he was on his porch when he heard the dogs.
The deputy, noting the porch was 30-40 yards from the animal hospital, said he also heard the dogs barking while he was on the scene.
The officer went to the business and issued a citation for violating the noise ordinance.
Deputies were sent to Old Barge Drive in Pawleys Island June 14 where a woman said her adult son became irate and mad about some bad news the family learned.
She said her son has never acted in such a manner before but had been like that for three days.
The woman said her son never made threats but she was afraid of his behavior.
The son told a deputy he had been in the yard working all day and had taken a shower so he could take his parents out to supper for Fathers Day. But, he saw his mother was cooking supper which disappointed him.
The man was calm when he spoke with the deputy.
The deputy remained on the scene until the man left with a friend.
Counterfeit cash
The manager at the Pawleys Island Walgreens store said a woman purchased a pre-paid credit card and placed $425 on the card.
She paid by giving the cashier $450 in cash and received $20 change.
As the stores deposit was being put together later that day, it was discovered the four $100 bills the woman had used were counterfeit.
The deputy noted all four of the bills have the same serial number. The $50 bill used also looked odd.
The manager said he has heard there is a counterfeit ring that stretches from Charleston to Myrtle Beach.
He gave the deputy pictures of the suspect from the stores security cameras.
Coins missing
A man from the 500 block of Brace Drive reported his rare coin collection was missing from his home.
He discovered the collection was gone June 12. He said he kept the coins in a drawer in a spare room.
The man said he has never had the coins appraised but he estimates they are worth between $30,000 and $500,000.
He said the only person he suspects is his cleaning lady. He said about a year ago he noticed half a jar of quarters and a rare coin were missing.
The investigation continues.
Truck keyed
A man said his Toyota Tundra was vandalized while parked behind Franks Outback in Pawleys Island June 10.
The North Carolina man said he was in the restaurant for about 45 minutes and during that time someone keyed his truck.
The damage is on the bed, body and fender and is on both sides of the truck. The owner estimates it will cost about $3,000 to repair.
Information is subject to change as the investigation proceeds. Individuals arrested and/or charged have not been convicted.
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The Entrepreneur Evolution 2012 Workshop for Start-Up's, Network Marketers, and Small Business Owners
Saturday, November 10, 2012 from 10:00 AM to 8:00 PM (CST)
Who's Going
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Sara Haughty
San Francisco, California
San Francisco, California
Luke Picard
London, United Kingdom
London, United Kingdom
Rick Vespucio
Florence, Italy
Florence, Italy
Event Details
The ENTREPRENEUR EVOLUTION "Chicago"
This Event is Guaranteed or Your Money Back
Watch Here--> http://youtu.be/ZXaacZnUJF0
- The #1 Way to Generate Leads and Customers on Auto-Pilot
- The Only Way to Make Money with Social Media
- The #1 Way to Create Traffic to Your Website
- The 3 Piece Every Marketing Plan Needs
- The Most Effective Way to Use Video Marketing
- The 4 Ways to Recruit, Build and Lead a Team
- The #1 Reason that 99% of Entrepreneurs Fail
- The ONLY reason to use Social Media
- The 3 Things Needed to Close 60%-80% on every sale
- The #1 Reason Your Website Makes No Money
- The #1 Way to Create Raving FANS
- The Only 3 Things Every Entrepreneur Should Invest In
- The 3 Ways to Make Sure Your Networking becomes Customers
- The 3 Ways to Systematize Your Business
- How to get Massive Traffice to Your Website
- Why Fan Pages don't work
WARNING: After this 1 Day Event You Will Evolve to a Born Again Entrepreneur, and Regain Your Sanity, Leave with a Peace at Mind, and Finally have a Blueprint to Wealth!
Have questions about The Entrepreneur Evolution 2012 Workshop for Start-Up's, Network Marketers, and Small Business Owners? Contact the organizer
Attendee List Sort by: Date | First Name | Last Name
When & Where
DoubleTree Conference Center
3000 Warrenville Road
Saturday, November 10, 2012 from 10:00 AM to 8:00 PM (CST)
Add to my calendar


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A giant marlin attacked BP's BP's Plutino oil facility off the coast of Angola in February. According to a report from the International Energy Agency, the fish's spear-like nose punctured a hose connecting the giant Greater Plutino floating production, storage and offloading facility. That prevented crude oil from being loaded onto a waiting oil tanker. A BP spokesman confirmed to Bloomberg Bloomberg that the marlin attack caused BP to declare force majeure for five days. The Plutino field typically produces about 180,000 bpd, so a five-day marlin disruption would have prevented some 900,000 barrels of oil from getting to market.
First thought: this must be orchestrated retribution by Poseidon's creatures for BP's 2010 Deepwater Horizon disaster.
But no, it turns out this is not the first time that the oil industry has caught pointy-nosed fish in such an unusual way. And the marlins are almost certainly hunting other fish, not oil pipelines. According to the Oil & Gas Journal, in 2010 French oil giant Total Total declared force majeure at the Girassol field in Angola after a school of swordfish punctured oil hoses used in loading tankers. BP's Plutino was also reportedly hit by swordfish in 2009. Aside from fish attacks, Plutino has suffered other technical issues having to do with the relatively high salt content of its crude oil.
Offshore oil and gas installations are well known hotspots of marine biodiversity. Schools of fish congregate around the platform risers as if they were coral reefs. That attracts predators like barracuda, sharks and marlins. And in the Gulf of Mexico hundreds of old decommissioned platforms have been installed on the sea floor off Louisiana to create more than 70 artificial reefs. The remains of 68 platforms comprise Grand Isle 9, the biggest artificial reef, off Louisiana.
This Youtube video collects some great pics of an earlier incident: a marlin stuck in a flexible oil pipeline, and the marlin's bill still embedded inside the thick rubber wall of the hose after being hacked off.
And to think, 15o years ago it was man hunting the leviathans of the sea to harvest their oil. Now it's the sea creatures attacking our oil fields. (A good read here – "1846: The Year We Hit Peak Sperm Whale Oil.")


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WASHINGTON, Dec 7 (Reuters) - The White House on Wednesday rejected Syrian President Bashar al-Assad's claim that he has not ordered his troops to kill peaceful demonstrators.
"It is just not credible," White House spokesman Jay Carney said, asked about an ABC television interview Assad gave where he said only a "crazy" leader kills his own people.
"The world has witnessed what has happened in Syria. The United States and many, many other nations around the world who have come together to condemn the atrocious violence in Syria perpetrated by the Assad regime know exactly what's happening and who is responsible," he said. "I don't think anybody who watched that interview would find Mr. Assad's answers credible." (Reporting by Jeff Mason and Matt Spetalnick)


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Air Arms S500 Xtra FAC sidelever air rifle Precharged pneumatic Sidelever cocking Single-shot 2-stage adjustable trigger Adjustable power 11mm scope grooves (no open sights) 2900 psi fill pressure (200 bar) 231cc tank Built-in manometer (air pressure gauge) Lothar Walther barrel Shrouded barrel for extra-quiet shooting Ambidextrous Monte Carlo poplar stock Dual raised cheekpieces Checkered pistol grip and forearm Superbly blued Magnificent stock finish Ventilated rubber buttpad Our specs show that this rifle has a 19.45" barrel. The shroud is much longer, and the exterior length from the action to the muzzle measures 24". The barrel is only the rifled portion of the gun.
This item is not eligible for coupon discounts.
This item is not eligible for coupon discounts.
Read More
- ManufacturerAir Arms
- Caliber0.22 cal
- Velocity920 fps
- Airgun MechanismPre-charged pneumatic
- ActionSidelever
- Hop UpNo
- Airgun UseSmall game hunting/plinking
- Airgun Rail11mm dovetail
- Front SightsNone
- Rear SightsNone
- Overall Length42.52
- Barrel Length19.45
- Barrel StyleRifled
- SafetyManual
- Fire ModeSingle-shot
- Gun Weight7.85
- BlowbackNo
- Loudness2-Low-Medium
- Product ConditionNew
- Warranty1-year limited warranty
Read More
Read More


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Starting next February and coming to the Brighton Centre on Thursday 9th May, 2013, the 'Back In The Game' tour follows on from the huge critical and commercial success of last year's 'Out Out' tour where over 200,000 tickets were sold and all 150 dates a sell out.
The DVD – 'Micky Flanagan Live: The Out Out Tour' — has been the number 1 selling stand up DVD in 2012 with his show stealing performances on the small screen earning him a prestigious British Comedy Award nomination and The Sun's Comedian Of The Year Award.
Micky has appeared on The Royal Variety Performance, Mock The Week, Have I Got News For You, 8 Out of 10 Cats – amongst others – and next year will cement his reputation as one of the superstars of British Stand Up.
Sea Sprays General Manager Neil is going to this event.
Over 14′s only
Tickets go on sale Friday at 9am on-line and phones. Tickets also available from the venue Box Office from 10am for over the counter sales.


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Born: September 11,1982 Uttarakhand, India
Zodiac: Virgo
Height: 5 feet 6 inches
Biography: A brilliant dancer and a well known Indian film actress, Shriya Saran has acted in many Telugu, Tamil, Malayalam, Hindi and a few of English and Kannada Films also. In 2007 her film called 'Awarapan' got released which was a great success. In 2008 she did an English movie named 'The Other End Of The Line'. She has won a few awards in south film industry. She has also acted with renowned actors like Vivek Oberoi, Zayed Khan and Shabbir Ahluwalia. She has been the brand ambassador for CCL (celebrity cricket league). She is known for her charity work. She is third one after Shahrukh Khan and Amir Khan who gave a lecture at IIM Ahemdabad on Indian Media And Film Industry.See full bio
Shriya Saran : PhotosSee more photos
Shriya Saran : Filmography
- Chennakesava Reddy
- Sivaji (film)
- Shukriya: Till Death Do Us Apart
- Santosham (2002 Film)
- Ek: The Power Of One


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"The third life"
by John Burnside Published
And our created being is suspended in the eternal being, and, with respect to its essential being, it is one with it, with respect to its being.
John of Ruysbroeck
If I've come to the just desserts
of saved-for-later,
it's not before time.
I'd always planned
to set this skin aside
and take that faint
desire path through the fields
to someone else's dusk, the scant
and powder of it, birds
I'd never heard
till now, their songs
like blessings in a reverie of husk
and pollen: common
blessings, like the west wind,
or the stars.


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Try these variations to this delicious stew: Dredge the beef in flour and saute in olive oil before adding to the slow cooker. Also, add a savory spice, such as cumin, cloves or paprika, for even more flavor.
Get school tips, recipes, worksheets, and more
Try These Tips From The Meal Makeover MomsWhen my daughter does not want to try a specific food, her daddy tells her that the food she refuses to eat is his and that she better not eat it all up. She laughs and starts eating the food so that her daddy can't get it.


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Click Here to Watch the Whole Video in HD at Daddy Mugs
Daddy Mugs featuring amateur American Brazilian mostly first time exclusive models streaming videos galleries young men having sex jacking solos duos fetish request.
I saw my buddy Scotty at one of our local bars and in his group of friends that night was Jeremy. I asked him to introduce me. So he brings him over and we start chatting about a few things and I tell him about my website. He got very interested and I asked him to describe himself to me. He said "I'm a slutty bottom Boy." Well that got my attention and got me a bit aroused hearing him say it. Two days later we set up a day and time to do our scene. The boy can suck some good cock and take an ass slapping. I spanked his ass till it was red. After that it was all about me fucking him. The boy rode my cock so that every dam inch of it was inside him. He had never been fucked in a sling before and since I love the sling, I asked him to get in it. I pounded that boy's asshole real good in there and he was my little bottom slut Boy for the night.
Pixels: 320X240 | Bitrate: 350K
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God Damn, I'd give anything for Daddy to fuck me! He is so fuckin hot!! Daddy, if you're reading this, please consider me!! Id let you do anything to me!