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Beyond Placement and Administration: Community Partners as Co-Educators
Annie Cahill Kelly, Director, Community Partnerships and Service Learning, University of Notre Dame
Community partners play a critical role in service-learning and civic engagement. They orient, place and supervise students and ensure that their service flows from course objectives. They also can play a central role in reflecting with students upon their experiences and integrating their service work with their personal and academic lives. This session addresses the role of community partners in reflecting with students and offers strategies and ideas from community partners.
Presentation Details:
The Center for Social Concerns (CSC) at the University of Notre Dame initiates and supports community-based learning opportunities for students and faculty in the South Bend, Indiana area, across the country, and in 12 developing countries. Locally, six Community-Based Learning Coordinators (CBLCs) - individuals who are employed by local community organizations, but partially paid by the CSC for their work to enhance service-learning - formally assist the Center for Social Concerns in integrating student and faculty course work with the activities of their organizations and agencies. A central role of the CBLCs is to engage students in reflection on their service-learning experiences. Community partners often serve as co-teachers in a classroom that is less traditional but just as instrumental in the formation and development of students. They often have more sustained contact with students than faculty or staff do, and can play a critical role in assisting students in processing their experiences, integrating them into their lives and pursuing deeper questions of faith and justice that often arise as a result of students' service experiences. This session will focus on how to maximize that potential for community partners to lead students in reflecting upon their experiences and integrating what they've learned. To accomplish this aim, we will provide an overview of the Community-Based Learning Coordinator model, which has proven to be an innovative means of partnering with the local community. We will outline the history and development of the model, and describe how the partnerships function (meetings, training, funding sources, etc.). Within such contexts, we will address the central question of how community partners can best engage students in reflecting upon service-learning experiences. One of the Community-Based Learning Coordinators will share promising practices and will address what has worked with the spectrum of CBLC agencies. We anticipate a lively discussion with the session participants sharing their own best practices and raising questions.
Learning Outcomes:
- Understand the Community-Based Learning Coordinator model
- Learn ways community partners engage students in reflecting upon their service-learning experiences
Intended Audience: Service-learning professionals; Community organization professionals


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There's no question that the retirement of Ray Lewis leaves a hole in the Ravens' defense in more ways than one.
Lewis hasn't been the same type of player physically in recent years that he was earlier in his career. That's only natural. But what he did still know was how to put everyone in the right positions in defense and how to read an offense. That's a devastating combination.
The fact that the Ravens went 4-0 in the post-season after he came back isn't surprising. Yes, he had trouble with pass coverage during the playoffs, but since he quarterbacked the defense so well, it helped them be in position to make the necessary plays and cut down on giving up the big plays that hurt them throughout the season.
It's kind of ironic that his career ended with the memorable goal-line stand in the Super Bowl. The Ravens need someone who can step in there and help John Harbaugh and Ozzie Newsome field a tough defense. Who can be the leader?
Are they confident in someone like Dannell Ellerbe, who really stepped up this season? The Ravens need to make a decision about who is going to run the defense.
That decision could be even more important if Ed Reed doesn't return. Those are a few of the problems that the Ravens need to figure out during the off-season.
The defense should be better next year, mainly because the Ravens have so many young players who got so much experience and playing time in good situations in 2012. This year's defense wasn't a force the way they've been in the past, but they did just enough.
Now they've got to find a new leader, and that's not always an easy task.

subset: commoncrawl


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Grey's Anatomy
Grey's Anatomy Spoiler: Neve Campbell Will Play [SPOILER] Shepherd
When it was first announced that Neve Campbell would play one of Derek's (Patrick Dempsey) four sisters on an upcoming episode of Grey's Anatomy, we went through what we know about each sister, and tried to figure out which one Neve would be.
Now, thanks to an ABC press release, we know the answer. But it actually leaves us with more questions than before.
Read spoilers at your own risk! For more on Wetpaint Entertainment's philosophy on spoilers, click here.
Now we know that Neve Campbell will be playing Liz Shepherd, the one Shepherd sister who we know absolutely nothing about. Which means that her storyline, and her reasons for showing up in Seattle, are completely open-ended. She could be another doctor, a mother with nieces and nephews for MerDer, or a fugitive. The possibilities are endless!
One thing's for sure: Neve will make her debut in Season 9, Episode 8: "Love Turns You Upside Down", airing December 6. We'll be watching!
For more Grey's spoilers, click here.
Catch the next new episode of Grey's Anatomy on Thursday, November 29 at 9 p.m. ET/PT on ABC.
Source: ABC
Molly Friedman is an editor at Wetpaint Entertainment. Follow her on Twitter @MollyFriedman.
Satisfy your Grey's Anatomy addiction: Like us on Facebook and Follow us on Twitter and Tumblr.


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constant over time are in fact not constant, the estimated time dummies will reflect a mixture of pure price changes and quality changes, and the resulting index will be biased. More generally, there is neither theoretical support nor much empirical evidence for the assumption that prices of all varieties of particular products generally move proportionately over time.
The second direct approach, variants of which have been suggested by Pakes and Levinsohn (1993), Feenstra (1995), Diewert (2001), and others, is what we call the direct characteristics method. Under this approach one estimates a separate hedonic function for each period and computes price relatives for the product under study by, in effect, comparing the functions for the periods involved. The idea is not to require that all estimated nondummy coefficients differ between periods; it is rather to impose between-period coefficient equality only when that hypothesis withstands statistical scrutiny. To the extent that data from multiple periods can be pooled, estimation efficiency (always a concern in these studies) can be enhanced.23 In contrast to the time dummy approach, the direct characteristics index is—as its name denotes—constructed from the characteristics coefficients, which are in general allowed to vary over time. The method also offers an advantage over the BLS's deletion or indirect hedonics methods in that it allows for correction of any sample selection bias that may be created because price changes are only sampled from the set of goods or services that remain unchanged from period to period.
However, despite its conceptual appeal, there are reasons that, given the current state of the art, the direct characteristics approach does not have broad applicability across CPI categories. One issue, which applies to all direct methods, involves the general problem of price data that reflect nonobservable seller attributes. Outlet bias (discussed in detail in Chapter 5), for instance, is difficult to control for in an index produced from a time dummy regression or by relating hedonic functions for successive periods. In contrast to other methods in which prices for replacement items are quoted from the same outlet, product price and characteristics data are combined from multiple sources to estimate direct hedonic indexes (Triplett, 2001b:3).
The most obvious obstacle to widespread use of direct hedonic methods, though, involves the data requirements and the operational difficulty of producing characteristics-based indexes on a high-frequency, up-to-date schedule. To produce such an index, routine data collection and processing procedures would need to be directed toward monthly pricing of a comprehensive set of varieties, chosen to represent a population's consumption, rather than a limited sample. Most importantly, it would be necessary to gather data on the sales of all impor-
Two related direct approaches, both of which give the same result as the direct time dummy method when its assumption of stability of nondummy coefficients (and thus of proportional shifts in prices of all varieties) is satisfied are discussed below in "Technical Note 2."


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Back in May Laura Wasilowski and Frieda Anderson had birthdays and I made them each a tin quiltlet. Laura loves and collects chickens and Frieda loves her dog George, now famous for helping Frieda break her ankle a day before her trip to Australia earlier this year while chasing a squirrel.Saturday we will be celebrating their birthdays as well as Emily Parson and Anne Lullie's birthdays (also in May) at Melody's house. It is not easy finding a day when they are all in the same place at the same time.
This entry was posted on Friday, August 11th, 2006 at 12:12 AM. It is filed under The Work and tagged with metal.
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these are so unique and lovely! the gathering sounds splendid too!
Oh, I love these!
What size are they? Oh this would be a fun project.
this morning i saw an artist on Carol DuValle using a metal tin tape and wondered if this is what you used?
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Hotels in 29006 - Batesburg SC
Only hotels in 29006 zip code are listed below. Search for cheap and discount hotel rates in Batesburg, SC for your upcoming leisure or conference / group travel. We list the best 29006 hotels and motels so you can review the Batesburg hotel list below to find the perfect lodging. Hotels in Lexington county and area code 803 are also listed.
29006 Hotels & Accommodations
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Nwaoma Oba has sent her photo through our contact form. Nwaoma belongs to Abuja. She is student of architecture in College of Architecture and Urban Studies USA. Nwaoma writes in her email that the College of Architecture and Urban Studies is one of top schools of architecture in the United States. It is located in Blacksburg, Virginia. The School of Architecture and Design offers a cross disciplinary program. It offers both Bachelor and Master's degree courses in architecture. The courses help students to think independently and critically. Students learn to develop new strategies and new products. It arms them with all the knowledge and experience to go into private or public practice. This is rated among the top architecture programs.
Thank you so much Nwaoma for sending your picture. We wish you best of luck about your studies and future.
Adesewa Aduba basically belongs Lagos. But these days she is working as a travel guide in Caribbeans. Adesewa tells that if you are planning an overseas vacation and can't decide where to go, here's an idea, that is, the Caribbean Islands that have something for everyone. The Caribbean is located mainly between North and South America, and is one of the worlds most sought out holiday destinations. She more tells that from beach and party holidays to family holidays & romantic breaks, the Caribbean Islands cater to all. Instead of typically flying in, you can opt to take a lavish cruise which covers places like the Bahamas, Barbados, Puerto Rico, Anguilla, Turks & Caicos, Dominica, Jamaica, and the Cayman Islands.
In the end Adesewa says that you can relax while at it and enjoy a vast variety of activities and pampering services like spas, cocktail parties, water sports, luxurious swimming & water slides, and more family oriented activities like, kids' programs (along with baby-sitting services) to make your trip as tranquil and stress-free as humanly possible. Best of all, these cruises are available for all types of budgets, locations, and time durations so that everyone who wants may experience the treat. Well Adesewa thank you so much for your contribution. We sure that if any of our readers will visit Caribbean, he would absolutely hire you as his travel guide.


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Welcome and thank you for visiting!
Riverview Window Fashions Inc. is your one-stop Calgary blinds dealer. We have window coverings for all budgets – without compromising quality or style. Thrilled with the results Riverview has produced, our delighted clients have defined lofty goals for us with statements like: "Wow! Thank you for the great customer service."
We hope your visit here today encourages you to give us a call so we can answer any questions you may have while shopping for blinds in Calagary. When you sit down with Riverview, your Calgary blinds dealer, your consultation includes a professional evaluation, precise measurements and installation and accurate pricing based on proven window treatment design solutions.
Riverview Window Fashions Inc.
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Thank you. If a matching email exists we will send you an email in a few minutes with instructions on how to reset your password.
Don't forget to check your spam folder if you cannot find the email. For further assistance please contact us at email@example.com .Okay
This petite clear-glass vase is a simply elegant display for a bloom or two.


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Chamber of Commerce President Mark V'Soske's award-winning photos on displayWritten by John P. McCartney | | email@example.com
As a 21-year-old member of the Air Force stationed in Guam during the Vietnam conflict in 1966, Mark V'Soske stumbled upon photography. His bunkmate invited him to the darkroom on a lazy Saturday afternoon, and the magic of watching his friend create an image on what had been a blank sheet of paper entranced him.
"I watched him," V'Soske said. "He let me do it. I saw that picture come up, and it was like, 'I'm hooked.' I immediately went and bought a reasonable camera and started."
That start 46 years ago has become a passion that enriches every aspect of his life.
V'Soske's daytime job as president of the Toledo Regional Chamber of Commerce involves community development, business development, lobbying and helping businesses in Greater Toledo compete, survive and grow. He calls his photography "a release."
"Some people who do a job full time get in trouble because they're totally immersed, 24/7, in their work," he said. "In order to be fresh, you have to have some things outside the job. Otherwise, you can become stale and stagnant. And photography has been it for me."
Toledoans are invited to see V'Soske's work, along with that of 56 other artists, at the Photo Arts Club of Toledo's 27th annual show at the National Center for Nature Photography, located at Secor Metropark. [The park is on Central Avenue, six miles west of U.S. 23/I-475.]
The exhibit of 330 photos is open April 21-22 and April 28-29, from noon until 5 p.m. Admission is free.
V'Soske said he believes people "will be very pleased" if they make the trip to see the exhibition.
"They'll be very surprised at the quality of the photographs, the creativity and the excellence of people just like them who like to take pictures," he said. "I think they'll enjoy it immensely."
V'Soske has two photos in the exhibit, both second-place winners in their respective categories. He takes the majority of his photos when he and Karen, his wife of 38 years, take cycling trips across Europe, especially in France.
He said his success as a photographer has been evolutionary.
"I have thousands, tens of thousands, of pictures from way back till now, and frankly, most of them are not good," he said. "When I look at a scene, I try to identify what is it that I want to express with it, what do I want to say with this picture?"
V'Soske acknowledges that digital photography has changed the nature of his craft. He went digital in 1999, and says he loves the opportunities it creates.
"I can do it anywhere," he said. "I can be sitting in an airport, on a tablet or a laptop, and I can work on a picture.
"It is quicker. It isn't as dangerous [as working with film. There are no] fumes or chemicals. What you can do with digital is absolutely amazing."
He does say, however, that digital photography has its drawbacks.
"You can shoot like crazy, and that's one of the problems with digital that people have," he said. "Everybody now has them, and everybody takes millions and millions of pictures, a lot of times without thought, or thinking, 'I can fix it in the computer.' They don't put a lot of thought into it."
V'Soske said he believes that students of photography can learn to think about what they are doing with their cameras by interacting with other photographers. He believes successful photographers "work with a purpose."
He suggests that those interested in pursuing photography join a group.
"Learn the craft," he said. "Buy the books. Understand composition. Understand light.
"Study the old masters of art. Go the museum and start looking at some of these masters, these pictures, but don't just glance at the picture. Look at them and ask yourself questions. Pay attention to how they worked light. What was light? What was dark? Why? What stands out? What did they do to make the subject [stand out]? Look at it and say, 'What did the artist intend the main subject to be?'"
V'Soske occasionally sells a photographic print, but more often than not, he donates his work to community organizations like the Rotary Club and Lutheran Social Services for silent auctions they hold to raise money.
He posts 331 examples of his work on his website, www.markvsoskephotography.com.
Tags: Mark V'Soske, National Center for Nature Photography, Secor Metropark, Toledo Regional Chamber of Commerce


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Want some cheese with that whine?
NorthEAST PORTLAND
Police search for suspects in NorthEAST Portland shooting
goal plant upgrades indeed, Is proof reading a thing of the past?
$800,000 ?? You sure about that?
Shame on you C-TRAN for transporting this piece of trash around our city


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Stand magnifiers are available in a wide range of powers using high-quality lenses, often with the option of self-contained illumination. Design features include special mountings for writing, and ergometric features such as lenses that can tilt or are permanently inclined for more comfortable reading posture. Some stand magnifiers utilize clear mountings or molded designs without obvious housings to allow considerable ambient light into the system.
Consumers who have an unsteady grip or fatigue easily appreciate stand magnifiers, in addition to finding them useful for hobbies and short-term tasks. An inclined lap desk is an adaptive, non-optical device that helps a person maintain a more comfortable posture while using a stand magnifier.
In prescribing and working with stand magnifiers, it is crucial to take into consideration the true dioptric power (TDP) of the lens system.


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This and That
I support the Alternate Rail route instead of expanding James White Parkway. ["A Road to Build," Sideways Glance by Rikki Hall, March 5, 2009] We need our woods and mountains.
Also, what is up with all the dog barking in Knoxville? Can we make this an issue, please? People leave their dogs out unattended all day to bark, bark, bark. Is there not an ordinance for this? Dogs should be kept inside when their owners are not home, or at least fitted with a proven bark-control collar.
This affects quality of life.
Karl Hess, Knoxville


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Rick Hill
Rick Hill is the Valero Alamo Bowl's VP of Marketing and Communications. Prior to the bowl, Rick spent 6 years working for the Spurs, one season with Missions Baseball and two fruitless months trying to sell season tickets for the S.A. Riders.
Monthly Archive for January, 2012
Can't Top That
It's four weeks after the 2011 Valero Alamo Bowl and I still hear TV announcers say "We could have another Alamo Bowl on our hands" when their games turn into offensive shootouts. I like that more than what my friends are telling me: "No way you guys can ever top last year's game." The chance […] [Read More]
The Bowl Experience
People are surprised when I tell them January is one of the busiest months of the year in our office. The fact is we want to wrap-up everything as efficiently and correctly as possible before looking toward next year's game. The main difference this year with previous years is when you have a record-shattering game […] [Read More]
Bowl Attendance At 30+ Year Low
"Attendance at this season's college football bowl games is down from last season and might end up at the lowest per-game average in more than 30 years." — USA Today, January 4, 2010 National media ran with this first sentence from a well-read USA Today story because "bowl attendance at 30+ year low" is a […] [Read More]
Phoning It In
I'm 0-2 on my last two days off. The first one was the Saturday before Thanksgiving. I knocked over a glass of water by my cell phone. I saved it from getting wet, but my charger was soaked. So what did I do? I wiped up the spill and then proceeded to charge my iPhone […] [Read More]
Unbelievably Believable
When Valero renewed its title sponsorship for the 2010-2013 games, it allowed the Valero Alamo Bowl to increase our combined team payout from $4.5 million to over $6 million. Coupled with the attractiveness of San Antonio as a destination city and the bowl's track record of success, this increase allowed us to move up from […] [Read More]


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Below is the poem entitled money wealth and blood which was written by poet
Lokko. Please feel free to comment on this poem. However, please remember, PoetrySoup is a place of encouragement and growth.
Read Poems by
Frederick Lokko
Money some say its as
sweet as honey,but
little do they know that
its stoney. In its
pitiless glare and hatred
makes the people
blood even more red.
Some live for the money
others live to be sorry.
Because where there is
great wealth there is
great worry. Money is
like camphor which
sublimes. It may be there
in an instance and and in
a twinkle gone. Its
fruitful and fleshy and all
of a sudden change
into stone. Vanity lives on
vanity and evil
emerges from wealth.
And wealth is acquired
from money. And money
they say is blood. So
when there is no wealth
there is no money,
when there is no money
there is no blood.
When there is no blood
the heart of the
economy STOPS!!!


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It hasn't really been a great few weeks for Barack Obama in an arena where he hopes to highlight his strengths as president: foreign policy. A series of multilateral meetings beginning with the G-8 summit at Camp David in May and ending Tuesday with the G-20 summit in Los Cabos, Mexico seemed to yield mainly defiance, and not just from unruly Russians like Vladimir Putin, who's doing his own thing in helping Syrian dictator Bashar al Assad, but even from the Western Europeans.
Egypt's generals also seem rather unconcerned about what Obama thinks at the moment. Only days after the Pentagon announced that Defense Secretary Leon Panetta on June 15 "highlighted the need to move forward expeditiously with Egypt's political transition" in a conversation with Hussein Tantawi, head of the Supreme Council of the Armed Forces, the SCAF announced a kind of legal coup, voiding most of the powers of the presidency and legislature.
As they did at last year's G-20 summit in France, European leaders showed some public exasperation with Obama's efforts to pressure them to resolve the eurozone crisis more aggressively. Italian Prime Minister Mario Monti noted that no one has forgotten that the biggest financial crisis started in America in 2008, and European Commission President Jose Manuel Barroso declared, "Frankly we are not here to take lessons in democracy."
It's a pattern that goes back even further: at last year's G-20 summit the Germans considered Obama's appearance to be a "disaster, in the words of one senior German official. The president spent most of his camera time blaming the Europeans (read: Berlin) for the euro crisis that could cost him his presidency. "Who did he think he was?" the official asked. "We don't lecture you about your budget problems."
Much of what dogs Obama is structural: the U.S. is just one of several big players, especially at G-20 summits, and there is frankly little that Obama can do to pressure Europe over the eurozone. On Egypt and other Arab Spring upheavals, he's caught in the geopolitical version of a rock and a hard place: caught between two equally undesirable outcomes involving the advent of either Islamist politicians or revanchist generals.
Ironically, it is unilateral action where Obama has been most effective: drone strikes and special operations. But because that is largely covert, he can't talk about it. Or maybe just leak a little
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The day's action in one quick read."
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The UNC FIT process improvement initiatives seek to document baseline process standards, create standard templates, checklists and forms, and develop process tracking key performance indicators. To date, the process teams have implemented improvement initiatives in the following areas:
- Contracts and Grants
- General Accounting and Financial Reporting
- Financial Aid
- Capital Assets
- Student Accounts
The UNC FIT project will update process improvements in these areas over time as appropriate and add additional process improvement initiatives as other risk areas are identified and resources become available.
Contracts and Grants
Purpose and Scope
The purpose of the Contracts and Grants initiative is to provide guidelines for establishing and maintaining the baseline standards for the post-award Contracts and Grants Process of the University of North Carolina (UNC) System. The focus of the process improvements encompass the following six sub-processes: 1) Account Setup, 2) Time and Effort, 3) Grant Management, 4) Billing and Drawdowns, 5) Reporting, and 6) Grant Closeout.
The standards apply to all sponsored projects within the UNC System. Further, the document assumes the successful completion of the Pre-Award stage (from identifying funding and proposal development and submission) through successful negotiation and acceptance of the award as well as completion of the regulatory review and approval process.
Mission Statement
The Contracts and Grants Office is dedicated to enhancing University research and sponsored activity by providing guidance and support services to its various stakeholders during the Post-Award stage of the process from award setup to award closeout.
UNC FIT Contracts and Grants (PowerPoint)
For more information regarding the Contracts and Grants Initiative please contact Sarah Smith, process team lead.
General Accounting
Purpose and Scope
The purpose of the General Accounting initiative is to provide guidelines for establishing and maintaining the baseline standards for the General Accounting processes of the University of North Carolina (UNC) System. The focus of the process improvements encompass four sub-processes in transactional processing and two sub-processes related to financial reporting. The four sub-processes for transactional processing are: 1) Bank Account Reconciliation, 2) Journal Entries, 3) Maintain Fund Accounts, and 4) Maintain Daily Cash. The two financial reporting sub-processes are Month End Close and Year End Close.
Mission Statement
The General Accounting Office is dedicated to assisting campus leadership with applying the transactional processing and financial reporting standards to improve the general accounting processes in all of the UNC system campuses.
UNC FIT General Accounting (PowerPoint)
For more information regarding the General Accounting Initiative please contact Cliff Flood, Process Team Lead.
Financial Aid
Purpose and Scope
The purpose of the Financial Aid initiative is to provide guidelines for establishing and maintaining the baseline standards for the Financial Aid Process of the University of North Carolina (UNC) System. The focus of the process improvements encompass the following seven sub-processes: 1) Application, 2) Satisfactory Academic Progress, 3) Packaging, 4) Scholarships, 5) Loans, 6) Return of Title IV Funds, and 7) General Management.
Mission Statement
The Financial Aid Office is dedicated to assisting students with meeting college costs and with the process of applying for financial resources necessary to attend college.
UNC FIT Financial Aid (PowerPoint)
For more information regarding the Financial Aid Initiative please contact Bruce Mallette, Advisory Team Lead or Autumn Carpenter, Process Team Lead
Capital Assets
Purpose and Scope
The purpose of providing Capital Assets standards is to ensure that university assets are properly acquired, accounted for, maintained, and disposed of. These procedures are carried out in accordance with State policies, Federal regulations, audit requirements, and governmental accounting standards.
According to the North Carolina Office of the State Controller (OSC), the term "capital asset" refers to property, such as land, land improvements, easements, buildings, equipment, works of art and historical treasures, and infrastructure, with a cost equal to or greater than $5,000 and a useful life of two or more years. Capital assets are acquired for use in normal operations and are not for resale.
These standards are intended to address capital assets using OSC's definition referenced in the prior paragraph. More specifically, given historical data and the materiality of certain financial statement account balances, the focus of these standards is Equipment and Buildings. It should be noted that even though these standards address only capital assets, each department within a university is responsible for maintaining and safeguarding all assets regardless of cost.
Mission Statement
The Capital Assets Group is dedicated to:
- Maintaining an accurate listing of all capital assets held by the university as mandated by state and federal regulations.
- Maintaining accurate accounting and internal control records that document capital assets including proof of asset existence, ownership, and proper valuation.
- Providing uniform procedures and communication to the campus community to encourage proper use and control of capital assets.
For more information regarding the Capital Assets initiative please contact Cliff Flood.
Student Accounts
Purpose and Scope
The Student Accounts standards are intended to promote standardized billing practices, maximize collection activities, and provide support for ancillary activities. These procedures are performed in accordance with state policies, federal regulations, audit requirements, and governmental accounting standards.
Mission Statement
The Student Accounts Office is dedicated to:
- Providing timely and courteous service to students, parents, alumni, and the university community.
- Promoting leading business practices through the optimum use of human resources and technology.
- Ensuring university billing and collection procedures are in compliance with state and federal statutes.
For more information regarding the Student Accounts initiative please contact Autumn Carpenter or Dee Bowling, Process Co-leads.


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Traditional woks are large pots with sloping sides, together with a handle and lid. Many types of woks, particularly the traditional, now sold on the market to comfort, to give the old-fashioned way.
A wok is a large saucepan with high embankments, are treated with a lid and side effects. It is particularly Food suitable for stir-frying. A wok is a handy flask cooking equipment. It is especially in Southeast and East Asia. It is often used together with a long handle Spatula or a long handle shovel, that your hand without burning to cook.
The wok can be seen in the form. Common has a round bottom woks. A round Soil provides traditional round wok pan or spatula to get food at the bottom of the wok and throw around is easy. Wok handle comes in two variants, such as floor and grinding. Loop handles are the most common type of handle for woks of all kinds and materials. These woks are traditionally made bares metal.
Electric woks have a large Advantages over other conventional woks well for heating. The heater may increase each of the units consistent. This is not a cold or a warm place. Non-electrical Woks typically costs about $ 45. Woks are several kits that are sold on the cooking rack and their tools. A wok is really an essential cooking tools for those interested Asian cuisine.
There are many things you can do to your wok as frying, stir frying, deep frying and steaming. Moreover, as some other Kitchen utensils in the kitchen, it deserves a little more caution than just cleaning.
Today, cooking woks are many different types available on the market. This is according to their shape, size, and requires its use in relation to fit in your cooking, such as the following:
• Electric Woks
• Chinese Woks
• Carbon Steel Woks
• Non-stick type woks
• And the nature of stainless steel woks
Are the different types of wok cooking which we for roasting, frying, and also just for hot water. There are also accessories such as woks:
• steamer rack
• Wire-mesh sieves
• Chopsticks
• Pliers
• Bamboo Brushes
• And Wok-rack
The above enhancements are listed below:
– Steamer Racks – The steamer rack is good for steam. He holds food above the boiling water while it circulates the steam and allow to cook food.
– Wire Mesh Strainer – a wire-mesh filter is used as a roast. It helps you to remove cooked food from hot water or hot oil, and protect Your hand from heat.
– Chopsticks – These two thin sticks are used mainly to control food for the mouth.
– Bamboo Brushes – It sure helps you, that you can use your wok over and maintain quality at the best.
– Pliers – These are often used for steaming food or fried foods. Pliers are usually made of metal or wood materials.
– Wok-Rack – These are for drainage of the oil and fat used in deep frying. Wok-rack is ideal to drain off excess oil from the diet.
When choosing a wok, use a round bottom flask wok on a gas stove and a flat wok on an electric stove. The traditional material for woks offer great heat conduction. Apart from this, it's hard enough to heat the oil faster, but easy enough for easy handling.
When you clean wok, wash the wok with hot water. Use a soft cloth or eat a sponge for anything at all remove stuck his forehead. Do not use abrasive soaps or pads for a seasoned wok. Clean the wok, drought and heat on high heat.
About the Author:
For more information on
Traditional Cooking Woks
Low fat Cooking and Woks
please visit our website.
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A photoresist composition comprising an alkali soluble resin, a photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 μm, a crosslinking agent capable of crosslinking the composition when activated by photogenerated acid and a dye that is an aromatic carboxylic acid having phenylazo substitution. The photoresist is characterized by the dye which is soluble in the photoresist solution, unreactive with components of the photoresist composition and may be used in relatively high concentration.
1. A negative-acting photoresist composition comprising an alkali soluble resin, a triazine photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 μm, a crosslinking agent and a dye represented by the formula: ##STR6## where each R is independently selected from the group consisting of hydrogen, lower alkyl, hydroxyl, carboxyl, amino, nitro, halogens and ethers, and each a is independently 1, 2 or 3.
2. The photoresist of claim 1 where each R is selected from the group consisting of hydrogen, lower alkyl having from 1 to 6 carbon atoms and halo.
3. The photoresist of claim 4 where each R is hydrogen.
4. The photoresist of claim 1 where the dye is present in an amount of 0.05 to 6 percent by weight.
5. The photoresist of claim 4 where the amount varies between 0.5 and 4%.
6. The photoresist of claim 1 where the dye has a purity in excess of 99.9 percent by weight.
7. The photoresist composition of claim 1 wherein the photoacid generating compound conforms to the formula: ##STR7## where P represents a trihalomethyl group, a substituted or unsubstituted phenyl group or a substituted or unsubstituted naphtyl group and each X may be the same or different and each represents a halogen atom.
8. The photoresist composition of claim 1 wherein the photoacid generating compound conforms to the formula: ##STR8## where Q is bromine or chlorine, P is --CQ3, --NH2, --NHR, --NR2, or --OR where R is phenyl or lower alkyl having up to 6 carbon atoms; n is an integer of from 1 to 3; and W is an optionally substituted aromatic or heterocyclic nucleus or ##STR9## where Z is oxygen or sulfur and R1 is hydrogen, a lower alkyl or phenyl group.
9. A method for forming an image over a substrate, said method comprising the steps of:
a. coating a substrate with a photoresist composition comprising an alkali soluble resin, a photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 μm, a crosslinking agent capable of crosslinking the composition when activated by photogenerated acid and a dye that is an aromatic carboxylic acid having phenylazo substitution,
b. exposing and developing said photoresist coating to form an image having a retrograde sidewall angle,
c. vapor depositing metal over the developed photoresist coating and underlying substrate, and
d. dissolving the exposed and developed photoresist coating while simultaneously undercutting and washing the metal deposit from the surface of the photoresist.
10. The method of claim 9 where the photoacid generating compound conforms to the formula: ##STR10## where P represents a trihalomethyl group, a substituted or unsubstituted phenyl group or a substituted or unsubstituted naphthyl group and each X may be the same or different and each represents a halogen atom.
11. The method of claim 9 where the photoacid generating compound conforms to the formula: ##STR11## wherein Q is bromine or chlorine, P is --CQ3, --NH2, --NHR, --NR2, or --OR where R is phenyl or lower alkyl having up to 6 carbon atoms; n is an integer from 1 to 3; and W is an optionally substituted aromatic or heterocyclic nucleus or ##STR12## where Z is oxygen or sulfur and R1 is hydrogen, a lower alkyl or phenyl group.
12. The method of claim 9 where the dye conforms to the formula: ##STR13## where each R is independently selected from the group consisting of hydrogen, lower alkyl, hydroxyl, carboxyl, amino, nitro, halogens and ethers, and each a is a whole integer equal to from 1 to 3.
13. The method of claim 12 where each R is selected from the group consisting of hydrogen, lower alkyl having from 1 to 6 carbon atoms and halo.
14. The method of claim 12 where each R is hydrogen.
15. The method of claim 9 where the dye is 2-(4-hydroxyphenylazo)benzoic acid.
16. The method of claim 9 where the dye is present in an amount of 0.05 to 6 percent by weight.
17. The method of claim 16 where the amount varies between 0.5 and 4%.
18. The method of claim 9 where the dye has a purity in excess of 99.9 percent by weight.
19. A negative-acting photoresist composition comprising an alkali soluble resin, a triazine photoacid generating compound that undergoes photolysis when exposed to a pattern of activating irradiation within a wavelength of from 330 to 700 μm, a crosslinking agent and a dye that is an aromatic carboxylic acid having phenylazo substitution.
20. A method of forming an image over a substrate, comprising:
a) coating a substrate with a photoresist composition comprising an alkali soluble resin, a photoacid generating compound, a crosslinking agent capable of crosslinking the composition when activated by photogenerated acid and a dye that is an aromatic carboxylic acid having phenylazo substitution;
b) exposing and developing the photoresist coating to form an image having a retrograde sidewall angle;
c) vapor depositing metal over the developed photoresist coating and underlying substrate; and
d) dissolving the exposed and developed photoresist coating while simultaneously undercutting and washing the metal deposit from the surface of the photoresist.
21. The method of claim 20 wherein the photoacid generating compound is a triazine compound.
1. Field of the Invention
This invention relates to dyes used for the formulation of photoresists, especially acid hardened photoresist formulations having a capability of providing highly resolved features of submicron dimension.
2. Description of the Prior Art
Photoresists are photosensitive films used for transfer of images to a substrate. They form negative or positive images. After coating a photoresist on a substrate, the coating is exposed through a patterned photomask to a source of activating energy such as ultraviolet light to form a latent image in the photoresist coating. The photomask has areas opaque to activating radiation and other areas transparent to activating radiation. The pattern in the photomask of opaque and transparent areas defines a desired image that may be used to transfer the image to a substrate. A relief image is provided by development of the latent image pattern in the resist coating. The use of photoresists is generally described, for example, by Deforest, Photoresist Materials and Processes, McGraw Hill Book Company, New York (1975), and by Moreau, Semiconductor Lithography, Principles, Practices and Materials, Plenum Press, New York (1988).
Known photoresists can provide features having resolution and size sufficient for many existing commercial applications. However for many other applications, the need exists for new photoresists that can provide highly resolved images of submicron dimension. One class of recently developed photoresists capable of enhanced resolution is known as the "acid hardened resists". These resists typically comprise a resin binder, a photoacid or photobase generator and one or more other materials that will result in curing, cross-linking or hardening of the composition upon exposure to activating radiation and heating as necessary to complete the cure. Acid hardening photoresists have been developed for imaging at essentially all conventional wavelengths such as g-line, i-line and deep ultraviolet (DUV).
A preferred acid hardening photoresist composition comprises a photoacid generator, a resin binder, and an amine-based cross-linker such as a melamine-formaldehyde resin exemplified by the Cymel resins available from American Cyanamid. These acid-hardening resists are described in numerous publications including European Patent Applications Nos. 0 164 248 and 0 232 972 and in U.S. Pat. No. 5,128,232, each incorporated herein by reference for their disclosure of conventional acid hardening photoresist compositions and processes for their use. The photoresists of these citations were developed primarily for DUV imaging.
Highly useful acid hardening photoresist compositions are disclosed in U.S. Pat. No. 5,128,232 to Thackeray et al. The patent discloses, inter alia, the use of a resist resin binder that comprises a copolymer of non-aromatic cyclic alcohol units and phenol units. The disclosed photoresists are also particularly suitable for exposure to deep ultraviolet (DUV) radiation. As is recognized by those in the art, DUV radiation refers to exposure of the photoresist to radiation having a wavelength in the range of about 350 nm or less, more typically in the range of about 300 nm or less.
Acid hardening resist compositions such as those disclosed in the above referenced documents provide fine line, high resolution images. However, imaging equipment most prevalent in the industry is adapted for i-line or g-line exposure and the acid hardening resist compositions of the above references are largely insensitive to these exposure wavelengths. Consequently, efforts have been made in the industry to formulate acid hardening photoresist compositions that may be imaged by i-line and g-line exposure.
In U.S. Pat. Nos. 3,954,475 and 3,987,307, both incorporated herein by reference, there is disclosed a class of vinyl-halomethyl-s-triazine compounds capable of photolysis and halogen acid free radical generation upon excitation at a radiation within the wavelength of from about 330 to 700 nanometers, a range that includes both i-line and g-line wavelengths. It is disclosed in these patents that the aforesaid halogenated triazines may be used for formulation of light sensitive compositions. Photoresists utilizing the triazine photoacid generators have been formulated for i-line and g-line imaging. Such photoresists are disclosed in the literature, for example in U.S. Pat. No. 4,189,323 and in European Patent Applns. 0 458 325; 0 519 298; and 0 621 509, each incorporated herein by reference. The photoresists disclosed in the patent and the European applications typically comprises an alkali soluble resin binder such as a phenolic resin, a crosslinking agent and the halomethyl triazine.
Regardless of the imaging radiation for the photoresist composition, it is extremely important that the photoresist exhibit uniform, constant line width, feature size, feature shape and thickness when patterned on a reflective rough semiconductor substrate or over reflective uneven topography. In this instance, light is reflected at an angle from the areas of the substrate into the photoresist causing localized regions of the photoresist to receive an additional dose of imaging radiation, which produces an undesirable profile shape and poor edge acuity after development. The loss of profile shape can severely limit the ability to successfully survive subsequent processing steps such as the etching of the underlying substrate. Uneven edge acuity can have highly deleterious effect on the electrical properties of a manufactured semiconductor device.
It is known in the art to add a dye to a photoresist composition to absorb stray reflections and thus diminish undesirable profile shapes giving excellent line width control and unexposed film thickness retention. In the J. Electrochemical Society: Solid State Science and Technology, Vol. 133, pp. 192-196 (1986), T. R. Pampalone and F. A. Kuyan describe the effect of the addition of Macrolex 60 dye to positive photoresist compositions. They found that the required exposure dose was increased by 220 to 520%. The sidewall angle of this composition was rather poor, about 60°-70°, indicating only moderate resolution. In Solid State Technology, pp. 125-130 (January, 1988), C. A. Mack described absorption properties of two dyed photoresist compositions in an article titled "Dispelling the Myths About Dyed Photoresist." The dyes described were Coumarin 314 and Macrolex 60. Neither dye is soluble in developer. The analysis reported in the above reference indicates that dyed resist compositions may not significantly improve lithographic processing.
U.S. Pat. No. 4,626,492 claims a photoresist composition containing 10-20 percent of a trihydroxybenzophenone and 0.1 to 3.0 percent dye, together with sensitizer and a specific novolak resin composition. The dyes claimed include anthroquinones, coumarins, diphenylmethanes, triphenylmethanes, phenanzines, oxazines, xantheses and phenylazo(4-dialkylamino)benzene. The function of the trihydroxybenzophenone is to increase the dissolution rate of this composition, thus enhancing the light sensitivity of the photoresist. However, the trihydroxybenzophenone additive has the significant disadvantage of being an in vitro mutagen (TSCA Report 8E HQ-0484-0510).
Japanese Patent No. 5,142,538 claims photoresist compositions containing selected phenyl- and naphthyl-azo compounds, including (4-phenylazo)- resorcinol. However the (4-phenylazo)resorcinol component has insufficient absorbency at 436 nm to be useful as the only dye compound in the composition when a mercury g-line wavelength is used to expose the resist coating.
Regardless of the dye used, problems are encountered by the addition of a dye to a photoresist composition. The dye in low concentration inadequately reduces reflected light from the substrate. In higher concentration, the dye competes with the photoresist components for the light thus decreasing sensitivity of the photoresist composition. Other problems include undesirable reaction with resist components and poor solubility in the photoresist composition.
The present invention is directed to an acid hardening photoresist composition characterized by addition of a dye that is an aromatic carboxylic acid substituted with a phenylazo chromophore. The dye has been found to be fully soluble in the photoresist composition thus avoiding formation of a separate heterogeneous phase in a photoresist coating, has high adsorbance at exposing wavelength thereby dampening photospeed variation with coating thickness, and may be used in relatively high concentration whereby image profile may be formed with a retrograde sidewall angle, a desirable feature for metal lift-off processing.
In the Drawings, FIG. 1 represents a photoresist image coated over a substrate using a lift off process where the photoresist is a conventional photoresist; and
FIG. 2 represents the same coated photoresist image over a substrate used in a lift off process where the photoresist of FIG. 1 contains the dye of the invention.
As described above, the photoresist composition of the invention comprises an alkali soluble resin binder, a halogenated photoactive generator, a crosslinking agent and a dye that is an aromatic carboxylic acid having phenylazo substitution.
Exemplary alkali soluble resins are novolak resins, poly(vinylphenol) resins, polystyrenes, copolymers of vinyl phenols with various acrylate monomers such as methacrylate, etc. Preferred resins are novolak resins, polyvinylphenol resins and mixtures of the two. The preferred novolak and poly(vinylphenol) may be in the form of copolymers with cyclic alcohols if desired as disclosed in U.S. Pat. No. 5,128,232.
Procedures for the preparation of conventional novolak and poly(vinylphenol) resins used as photoresists binders are well known in the art and disclosed in numerous publications including those discussed above. Novolak resins are the thermoplastic condensation products of a phenol and an aldehyde. Examples of suitable phenols for condensation with an aldehyde, especially formaldehyde, for the formation of novolak resins include phenol; m-cresol; o-cresol; p-cresol; 2,4-xylenol; 2,5-xylenol; 3,4-xylenol; 3,5-xylenol and thymol. An acid catalyzed condensation reaction results in the formation of a suitable novolak resin which may vary in molecular weight from about 500 to 100,000 daltons. The preferred novolak resins conventionally used for the formation of photoresists are the cresol formaldehyde condensation products.
Poly(vinylphenol) resins are thermoplastic polymers that may be formed by block polymerization, emulsion polymerization or solution polymerization of the corresponding monomers in the presence of a cationic catalyst. Vinylphenols useful for the production of poly(vinylphenol) resins may be prepared, for example, by hydrolysis of commercially available coumarin or substituted coumarins, followed by decarboxylation of the resulting hydroxy cinnamic acids. Useful vinylphenols may also be prepared by dehydration of the corresponding hydroxy alkyl phenols or by decarboxylation of hydroxy cinnamic acids resulting from the reaction of substituted or non-substituted hydroxybenzaldehydes with malonic acid. Preferred poly(vinylphenol) resins prepared from such vinylphenols have a molecular weight range of from about 2,000 to about 100,000 daltons
As noted, phenolic copolymers may be used as binders for the photoresist compositions of this invention. These copolymers comprise phenols and nonaromatic cyclic alcohols analogous in structure to the novolak resins and poly(vinylphenol) resins. These polymers may be formed in several ways. For example, in the conventional preparation of a poly(vinylphenol) resin, a cyclic alcohol may be added to the reaction mixture as a comonomer during the polymerization reaction which is thereafter carried out in normal manner. The cyclic alcohol is preferably aliphatic, but may contain one or two double bonds. The cyclic alcohol is preferably one closest in structure to the phenol reactant. For example, if the resin is a polyvinyl phenol, the comonomer would be vinyl cyclohexanol.
A preferred method for formation of the polymer comprises partial hydrogenation of a preformed novolak resin or a preformed polyvinyl phenol resin. Hydrogenation may be carried out using art recognized hydrogenation procedures; for example, by passing a solution of the phenolic resin over a reducing catalyst such as a platinum or palladium coated carbon substrate, or preferably Raney nickel, at elevated temperature and pressure. The specific conditions are dependent upon the polymer to be hydrogenated. More particularly, the polymer is dissolved in a suitable solvent such as ethyl alcohol or acetic acid, and then the so formed solution is contacted with a finely divided Raney nickel catalyst and allowed to react at a temperature of from about 100° to 300° C. at a pressure of from about 50 to 300 atmospheres or more. The finely divided nickel catalyst may be a nickel-on-silica, nickel-on-alumina, or nickel-on-carbon catalyst depending upon the resin to be hydrogenated. Hydrogenation is believed to reduce the double bonds in some of the phenolic units resulting in a random copolymer of phenolic and cyclic alcohol units in percentages dependent upon the reaction conditions used.
The alkali soluble resin may be a single resin or a mixture of resins. A mixture of resins is preferred. In addition, as is known in the art, the hydroxyl groups or either resin may be substituted with either an acid labile or an acid inert group. Typical examples of suitable blocking groups include alkoxy groups such as methoxy, ethoxy, propoxy, n-butoxy, sec-butoxy, t-butoxy, etc.; alkyl esters represented by RCOO--wherein R is preferably an alkyl group having 1-4 carbon atoms such as methyl, ethyl, propyl, isopropyl and butyl, sec-butyl, t-butyl, etc.; a sulfonyl acid ester such as methanesulfonyl, ethanesulfonyl, propanessulfonyl, benzenesulfonyl and toluene-sulfonyl esters, etc. In the most preferred embodiment of the invention, the resin mixture is a polyvinylphenol resin having a minor portion of its hydroxyl groups mesylated admixed with a novolak resin.
In addition to the resin, the photoresist contains a photoacid generator. The photoacid generator undergoes photolysis to yield an acid upon exposure to activating radiation. Suitable photoacid generators include, by way of example, 1,1-bis[p-chlorophenyl]-2,2,2-trichloroethane (DDT); 1,1-bis[p-methoxyphenyl]-2,2,2-trichloroethane; 1,2,5,6,9,10-hexa bromocyclododecane; 1,10-dibromodecane; 1,1-bis[p-chlorophenyl]-2,2-dichloroethane; 4,4'-dichloro-2-(trichloromethyl)benzhydrol or 1,1-bis(chlorophenyl)-2,2,2-trichloroethane; hexachlorodimethyl sulfone; 2-chloro-6-(trichloromethyl)pryidine; o,o-diethyl-o-(3,5,6-trichloro-2-pyridyl)phosphorothioate; 1,2,3,4,5,6-hexachlorocyclohexane; N(1,1-bis[p-chlorophenyl]-2,2,2-trichoroethyl acetamide; tris [2,3-dibromopropyl]isocyanurate; 2,2-bis[p-chlorophenyl]-1,1-dichloroethylene; and halomethyl-s-triazines. Of the above exemplified halogenated photoacid generators, the halomethyl-s-triazines are preferred. Such compounds conform to the following formulae: ##STR1## where P represents a trihalomethyl group, a substituted or unsubstituted phenyl group or a substituted or unsubstituted naphthyl group and each X may be the same or different and each represents a halogen atom.
A preferred halomethyl-s-triazine conforms to the following structure: ##STR2## wherein Q is bromine or chlorine, P is --CQ3, --NH2, --NHR, --NR2, or --OR where R is phenyl or lower alkyl (lower alkyl meaning an alkyl group having no more than 6 carbon atoms); n is an integer from 1 to 3; and W is an optionally substituted aromatic or heterocyclic nucleus or ##STR3## where Z is oxygen or sulfur and R1 is hydrogen, a lower alkyl or phenyl group. Of course, where W is an aromatic or heterocyclic nucleus, the ring may be optionally substituted. Without attempting an exhaustive listing of substituents, the following are noted as typical: chloro, bromo, phenyl, lower alkyl (an alkyl having no more than 6 carbon atoms), nitro phenoxy, alkoxy, acetoxy, acetyl, amino, and alkyl amino.
The s-triazine compounds as described above generate free radicals when irradiated with actinic radiation of a wavelength from about 330 to about 700 millimicrons. For this reason, the compounds are useful as photoinitiators in light sensitive compositions within the i-line and g-line wavelengths.
The s-triazine compounds are condensation reaction products of certain methyl-halomethyl-s-triazines and certain aldehydes or aldehyde derivatives. They may be prepared by the procedures disclosed in the above cited U.S. Pat. No. 3,954,475 and in accordance with the teachings of Wakabayashi et al., Bulletin of the Chemical Society of Japan, 42, 2924-30 (1969).
Specific examples of halogenated triazines suitable for use as photoacid generators in the invention include for example, 2-[1-(3,4-benzodioxolyl)]-4,6-bis(trichloromethyl)-1,2,5-triazine, 2-[1-(2,3-benzodioxolyl)]-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-[1-(3,4-benzodioxolyl)]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[1-(2,3-benzodioxolyl)]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(2-furylethylidene)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-[2-(5-methylfuryl)ethylidene]-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-[2-(4-methylfuryl)ethylidene]-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-[2-(3-methylfuryl)ethylidene]-4,6-bis-(trichloromethyl)-1,3,5-triazine, 2-[2-(4,5-dimethylfuryl)ethylidene]-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-[2-(5-methoxyfuryl)ethylidene]-4,6-bis(trichloromethyl)-1,3,5-triazine,2-[2-(4-methoxyfuryl)ethylidene]-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-[2-(3-methoxyfuryl)ethylidene]-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-[2-(4,5-dimethoxy-furyl)ethylidene]-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(2-furylethylidene)-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[2-(5-methylfuryl)ethylidene]-4,6-bis(tribromomethyl)j-1,3,5-triazine, 2-[2-(4-methylfuryl)-ethylidene]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[2-(3-methylfuryl)ethylidene]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[2-(4,5-dimethoxyfuryl)ethylidene]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[2-(5-methoxyfuryl)ethylidene]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[2-(4-methoxyfuryl)ethylidene]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[2-(3-methoxyfuryl)ethylidene]-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-[2-(4,5-dimethoxyfuryl)ethylidene]-4,6- bis(tribromomethyl)-1,3,5-triazine, 2,4,6-tris-(trichloromethyl)-1,3,5-triazine, 2,4,6-tris-(tribromomethyl)-1,3,5-triazine, 2-phenyl-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-phenyl-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(4-methoxyphenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxyphenyl)-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(1-naphthyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(1-naphthyl)-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(4-methoxy-1-naphthyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxy-1-naphthyl)-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(4-chlorophenyl)-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-styryl-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-styryl-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(4-methoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(4-methoxystyryl)-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(3,4,5-trimethoxystyryl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(3,4,5-trimethoxystyryl)-4,6-bis(tribromomethyl)-1,3,5-triazine, 2-(3-chloro-1-phenyl)-4,6-bis(trichloromethyl)-1,3,5-triazine, 2-(3-chlorophenyl)-4,6-bis(tribromomethyl)-1,3,5-triazine and the like.
Other triazine type photoacid generators that may be used for i-line and g-line exposure are disclosed in EP application 0,458,325.
The acid-generating agents may be used alone or in admixture. The amount of acid generator may vary from about 0.01 to 5 parts by weight, preferably 0.1 to 3 parts by weight, per 100 parts by weight of the specific alkali soluble resin. When the amount of the acid-generator is less than 0.01 parts by weight, it is difficult to form a resist pattern and when the amount exceeds 5 parts by weight, the ability to strip the resist from the substrate becomes difficult.
The cross-linking agent used is preferably a compound having a methylol group and/or alkoxymethyl group that is capable of cross-linking the specific resin upon heating in the presence of a photogenerated acid. When the cross-linking agent has at least two alkoxymethyl groups, they may be the same as or different from one another.
Typical cross-linking agents include, by way of example, a urea-formaldehyde resin, a thiourea-formaldehyde resin, a melamine-formaldehyde resin, a guanamine-formaldehyde resin, a benzoguanamine-formaldehyde resin, a glycoluril-formaldehyde resin and the like.
Among these cross-linking agents, particularly preferable are compounds represented by the following formulas and oligomers derived from these compounds and having a Mw of 1,500 or less: ##STR4## where each R3 may be the same as or different and each represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms.
A number of compounds represented above are commercially available as, for example, CYMEL (a trade name of Mitsui Cyanamid Co., Ltd.) and Nikalac (a trade name of Sanwa Chemical Co., Ltd.).
These cross-linking agents may be used alone or in admixture. The amount of cross-linking agent may vary from about 1 to 10 parts by weight and more, preferably from 1 to 7 parts by weight, per 100 parts by weight of the resin. When the amount of the cross-linking agent used is less than 1 part by weight, curing of irradiated portions of the composition becomes difficult. When the amount exceeds 10 parts by weight, strippability of the resist coating becomes difficult.
The photoresist of the invention is characterized by addition of a dye that is an azo dye of an aromatic carboxylic acid. A preferred dye in accordance with the invention may be represented by the following formula: ##STR5## where each R is independently selected from the group consisting of hydrogen, lower alkyl, hydroxyl, carboxyl, amino, nitro, halogens and ethers, and each a is a whole integer equal to from 1 to 3. Exemplary dyes conforming to the above formula include 2-(4-hydroxyphenylazo)benzoic acid, 4-(4-hydroxyphenylazo)benzoic acid, 2-(4-hydroxy-3,3'-dimethylphenylazo)benzoic acid, 2-(4-hydroxy-3,3-dichlorophenylazo)benzoic acid, etc. It is preferred that the dye used have a purity in excess of 99.9 weight percent.
The dye is added to the photoresist composition in minor amounts, preferably in an amount of from 0.05 to 6% by weight and more preferably, in an amount of from 0.5 to 4% by weight. It should be noted that the dye of the invention may be added in greater concentration than dyes heretofore used in photoresist compositions, as soluble in the photoresist composition within the concentration limits set forth herein and does not react with components of the photoresist composition. In this respect, it is unexpected and surprised that the dye is unreactive with photoactive generators that are trihalomethyltriazines as depicted in the formulae above.
The ability to add the dye in large concentration permits use of the photoresist for metal lift-off processing. For example, when used in concentrations above about 2%, developed photoresist images have a retrograde sidewall angle- i.e., a profile resembling an inverse trapezoid. This is especially useful for gallium arsenide lithography where metal lift-off is often a conventional processing step. As is known in the art, lift-off is a technique for forming patterns over the surface of a wafer by an additive process, as opposed to removal by a subtractive process using an etchant. In lift-off, an inverse pattern is first formed in a resist layer coated over the wafer thereby exposing the substrate at specific locations. Next, the film to be patterned is deposited over the inverse-patterned resist layer and the exposed substrate. Those portions which are deposited on the resist layer are removed when the wafer is immersed in a developer capable of dissolving the resist layer. In other words, the deposited film on the resist layer is lifted-off during dissolution of the resist layer. The film material deposited on the exposed substrate regions remain behind as the required pattern. The potential requirement for a successful lift-off process is to insure that a distinct break exists between the film material on the top of the resist layer and that deposited on the exposed substrate. This separation allows the developer to reach and attack the resist layer and also ensures that the film atop the resist layer is free to be lifted off.
The use of the dyes identified above in accordance with the invention is especially suitable for enhancing resist lift-off procedure as a consequence of the formation of developed coatings having retrograde wall angles. This is illustrated in FIGS. 1 and 2 of the drawings. In FIG. 1, there is shown a photoresist image 1 over substrate 2 having a coating of vapor deposited metal 3 over its surface. From the Figure, it can be seen that the vapor deposited metal is continuous over all surfaces of the wafer and the imaged photoresist coating. Consequently, because of the continuous nature of the coating, clean separation between the metal deposit on the substrate and the metal deposited on the photoresist layer is difficult to achieve. In contrast, FIG. 2 shows the developed photoresist coating 1' over substrate 2' coated with vapor deposited metal 3'. The photoresist used in this example would contain the dye of the invention. It can be seen that the developed image has a retrograde wall angle in that it slopes inwardly to form a trapezoidal cross section. As a consequence, during vapor deposition, vapor deposits only on substrate 2' and on the top surfaces of the developed photoresist image. It does not deposit over the metal substrate shaded by the retrograde photoresist coating. Because the metal deposit is not continuous, developer readily reaches and dissolves the photoresist coating and the metal deposit over the photoresist coating is cleanly lifted off or removed as the photoresist dissolves.
From the above, it can be seen that an advantage resulting from use of the resist of this invention for lift-off processing, as opposed to other types of liftoff schemes, is a simple single-layer process. The required retrograde wall angle is achieved without resorting to multilayer resist processes, auxiliary layers, polyimide intermediary layers or overplated metal layering. In addition, retrograde wall angle in this resist prevents "wing tips" or "burrs", difficult-to-control boundary crack processes needed for later liftoff when the profile is not very retrograde, curling of barrier layers in multilayer processes and additional acid-etch back processing. Finally, the process is low in cost to perform.
The photoresist may also contain a minor amount of a strong base to neutralize acid migrating into the unexposed regions of the photoresist. Organic amines are preferred bases. Typical organic amines include trimethyl amine, diethyl amine, triethyl amine, dipropyl amine, tripropyl amine, di-isopropyl amine, allyl amine, diallylamine, n-butylamine, dibutylamine, isobutylamine, sec-butylamine, tert-butylamine, dimethyl butylamine, di-n-amylamine, tri-n-amylamine, dicyclohexoamine, etc. Preferred amines are lower trialkyl amines such as triethylamine, tripropylamine and tributylamine. The concentration of the base is small, typically from about a trace up to about 1.5 percent by weight of the composition.
The above compositions are dissolved in a solvent to make a coating composition. The solids content may vary between 5 and 40% by weight of solids and prior to use, the compositions is preferably passed through a filter having a pore diameter of, for example, about 0.2 μm. The solvent used to prepare the composition may include, for example, methyl cellosolve, ethyl Cellosolve, methyl Cellosolve acetate, ethyl Cellosolve acetate, propylene glycol ethyl ether acetate, propylene glycol ethyl ether acetate, propylene glycol propyl ether acetate, toluene, xylene, methyl ethyl ketone, cyclohexanone, methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate, ethyl 2-hydroxy-2-methylpropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, methyl 3-ethoxypropionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanate, 3-methyl-3-methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, 3-methyl-3-methoxybutyl butanate, ethyl acetate, butyl acetate, methyl pyruvate, ethyl pyruvate and the like. The above solvents may be used alone or in admixture of two or more. Ethyl lactate comprises a preferred solvent.
Photoresist compositions of the invention are used in conventional manner. They are coated onto a substrate such as a silicon wafer such as by spin coating, roller coating or the like and dried to form a film. Thereafter, the film is irradiated through a desired pattern to form a latent image in the resist coating. The radiation used for purposes of this invention is i-line and g-line irradiation. Exposure conditions are in accordance with conventional methods used in the prior art. Following exposure, the exposed film is heat treated to cross-link the polymer which cross-linking reaction is activated by photogenerated acid. Typical heat treatment conditions may vary between 40 and 160° C. Following heat treatment, the resist film is developed with a developer such as an aqueous alkaline solution of sodium hydroxide, potassium hydroxide, sodium carbonate, triethylamine, dimethylethanolamine, triethanolamine, tetramethylammoniumhydroxide, etc.
The invention will be better understood by reference to the examples that follow.
Effects of Varying the Amount of Dye in Thin (1.0 μm) Film Resist
The effect of varying the amount of 2-(4-hydroxyphenylazo)benzoic acid (HABA) dye on the resist profile shape, photospeed and lithographic performance was studied. First a batch of negative resist composition without dye was prepared. To this composition, various amounts of HABA dye were added and the resulting resist was processed according to standard lithographic protocols. As such, the dye-less batch of negative resist was prepared by dissolving the following components into a single liquid phase-phase composition which was filtered by passing it through a 0.2 μm teflon filter:
______________________________________novolac resin (condensate of m-cresol, 35%; 403.6 gp-cresol, 60%; 2,5-xylenol, 5% with formaldehyde)poly(4-hydroxystyrene 79%, co-4-methylsulphonyl- 403.6 gphenylstyrene, 21%)Cymel 303 (hexamethoxymelamine) 106.2 g4-methoxystyryl-bis(trichloromethyl)triazine 9.3 gtetrabutylammonium hydroxide 3.1 gSilwet 7604 1.4 gEthyl lactate 2857.7 g______________________________________ wt ofExample wt undyed composition HABA dye dye, % of solids______________________________________1 800 0 02 800 4.0 2.03 800 7.1 3.54 800 10.3 5.0______________________________________
After the dye addition, the photoresist composition was filtered through a 0.2 μm teflon filter. Thereafter, the liquid photoresist was dispensed onto a clean primed 100 mm silicon and spun at a spin speed of about 4000 RPM to achieve a 1.00 μm film thickness after a 110° C./60 sec. post-apply bake. The resist films were exposed using a 0.55 NA GCA I-line 365 nm) wafer stepper, and then the wafer was subjected to a 110° C./60 sec. post-exposure bake. Development was by a track single-puddle process using 0.262N tetramethylammonium hydroxide/water at 21° C. Lithographic results are listed below (wall angles >90 are retrograde):
______________________________________Example Esize (mJ/cm2) resolution (μm) wall angle at 0.40 μm______________________________________1 95 0.325 892 128 0.375 933 179 0.375 93.54 231 0.375 95______________________________________
Results indicate that examples 2 to 4 exhibited retrograde wall angles which are suitable for liftoff processing. Example 3 showed the best tradeoff between achieving a retrograde wall angle useful for liftoff processing, profile shape and sufficiently fast photospeed and thus constitutes a preferred embodiment of the invention.
Effects of Adding HABA Dye to a Thicker-film Photoresist
Example 5: An undyed batch of photoresist was prepared by dissolving the following materials to make a single-phase liquid composition:
______________________________________novolac (condensate of m-cresol, 35%; p-cresol, 21.007 g60%; 2,5-xylenol, 5% with formaldehyde)poly(4-hydroxystyrene, 79%, co-4-methylsulphonyl- 21.007 gphenylstyrene, 21%)Cymel 303 (hexamethoxymelamine) 5.504 g4-methoxystyryl-bis(trichloromethyl)triazine 0.242 gmethoxy-naphthyl-bis(trichloromethyl)triazine 0.242 gSilwet 7604 0.072 gtetrabutylammoniumhydroxide 0.158 gethyl lactate 101.93 g______________________________________
Example 6: A dyed batch of photoresist was prepared by dissolving the following materials to make a single-phase liquid composition:
______________________________________novolac (condensate of m-cresol, 35%; p-cresol, 21.007 g60%; 2,5-xylenol, 5% with formaldehyde)poly(4-hydroxystyrene, 79%, co-4-methylsulphonyl- 21.007 gphenylstyrene, 21%)Cymel 303 (hexamethoxymelamine) 5.504 g4-methoxystyryl-bis(trichloromethyl)triazine 0.242 gmethoxy-naphthyl-bis(trichloromethyl)triazine 0.242 gHABA dye 0.960 gSilwet 7604 0.072 gtetrabutylammoniumhydroxide 0.158 gethyl lactate 101.930 g______________________________________
The resists were filtered and processed in a manner similar to that described in examples 1-4, except that the film thickness was 3.0 μm. Lithographic results are listed below where wall angles >90 are retrograde.
______________________________________Example No. Esize (mJ/cm2) resolution (μm) wall angle at 1.0 μm______________________________________5 76 0.80 92°6 138 0.70 97°______________________________________
The above results indicate that example 6 exhibited a retrograde wall angle which was for liftoff processing.
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Gear Question
First time i got on a board i broke my...
First time i got on a board i broke my wrist, and have broken my right one twice and left wrist once. my Q is how big are these gaurds? i have a new pair of dakine gore-tex gloves and there pretty snug.
Four Horsemen
These are super low profile and comfortable for a wrist guard! But, they are still wrist guards ...so you do need a tiny bit of room inside your glove to fit them. I have had to wear them before and fit them under a pair of AK gloves, which are generally considered to be a pretty tight fitting set.
You should be all good as long as you can wiggle some fingers up into your glove on either side of your wrist when one is on your hand.
Good luck, and no more broken wrists! Those are no fun! believe me, I know :)
View More Details on Red Impact Wrist Guard


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Suggestions or Corrections?
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Please let us know! You can contact Marek Sroka at email@example.com
More on Jewish Studies
For a broader approach, you can also take a look at the History Library's guide to Jewish Studies.
The guide serves as an introduction to Polish-Jewish studies and draws on Polish and Jewish studies collections of the UIUC Library. It was compiled by Carl Lehnen and Christina John (the UIUC Library graduate assistants) under the direction of Marek Sroka (Slavic Librarian and Associate Professor). We welcome your comments about the contents of the guide. Please send them to firstname.lastname@example.com.
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Chapati Maker
Looking for a chapati maker to help you make great Chapatis? Here at Chapatimaker.com we've compiled a large list of articles, comprehensive reviews as well as pictures and videos to help you decide on the best chapati maker to buy. We also try to show you the best deals and discounts so you can get the biggest bang for your buck, with plenty of real reviews by real people that are already owners of chapati maker.


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What prompted the name? We felt it to be the simplest way to describe somewhat what we have to offer naturewise and otherwise. Natural beauty in all seasons - acres of ground with spacious lawns, woods, a tumbling stream to fish or wade in and heated swimming pool where you can enjoy lounging with other guests or sitting under the umbrellas about the pool.
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Since you are looking for a vacation, we have nothing planned. Everything is here for you to enjoy as you like it... either with your own family group or with other guests.
Have you already pictured COUNTRYSIDE? If you have and like it and that's what you want, come and enjoy it with us any season of the year. We'd love to have you.
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Holiday 2007 Madness – Guerlain Holiday 2007 Collection
Guerlain presents one of the most elegant (and pricey) holiday collections of the year. First is the atomizer, which delivers radiant gold powder to skin and hair ($78.00). Limited-Edition Forever Gold Meteorites Voyage Compact are mini pearls scattered in a compact that can be applied to the entire face for an amazing complexion ($155.00). Don't forget Forever Gold Kiss Kiss Lipstick ($27.00), which is the most affordable item in the collection. Limited-Edition Forever Gold Meteorites Pearls contains new gold and silver shades: pearly gold, rose gold, white gold, and apricot ($49.00). You may also want to dazzle your lashes by adding gold flecks with the limited-edition mascara ($30.00). Yeow!
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Has anyone heard from Jason1978 lately?
I know he had been going through chemo but he hasn't been on here in well over a month.
I sent him an email to his gmail account... maybe he'll get that (if he isn't coming on here right now) - and asked him to email me (which I'll share an update with everyone here) or to log on and make a quick post to give an update.
let's keep good thoughts for him.
i was thinking the same thing. haven't heard in a while after his last update that he was feeling well enough to start up some knitting again.