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Stories from Asimov's have won 53 Hugos and 28 Nebula Awards, and our editors have received 20 Hugo Awards for Best Editor.
Short and Sweet
Are single-author genre story collections a dead or dying category? Absolutely not! Are they a dead or dying category for big publishers? Well, yeah, pretty much.
Take a look at the Locus RecommendedReading List for 2010, the most recent one available as I write: www.locusmag.com/ Magazine/2011/Issue02_Recommended Reading.html. Scads of excellent story collections, a brilliant mosaic of a thriving field. But not one from any of the so-called "Big Six" firms or their various imprints: Hachette, HarperCollins, MacMillan, Penguin, Random House, or Simon & Schuster. The last such book I can recall, in fact, was Gene Wolfe's Starwater Strains from Tor in 2005. Or maybe Stephen King's Full Dark, No Stars, Scribner's, 2010.
It's a lamentable state of affairs, this lack of support for short fiction on the part of the Big Six, due to either real or perceived low sales for such books. How can an entire category, essential to the development and history of SF/F/H, simply be written off on strictly mercenary terms? Aren't low sales partly a testament to bad marketing and lack of publisher vision anyhow? Who's buying all the collections that do appear?
But rather than agitate against the self-injurious ignorance and perversity of the Big Six, let's celebrate the superhuman efforts of the independent presses that keep such collections alive.
Here, alphabetically by author, are mini-reviews of twenty great offerings from 2011.
I initially encountered the awesome prose of Michael Bishop over forty years ago, when I read his first story, "Piñon Fall," in the pages of Galaxy magazine. That story likewise is the first to greet readers of his magnificent career retrospective, The Door Gunner and Other Perilous Flights of Fancy (Subterranean, hardcover, $45.00, 528 pages, ISBN 978-1-59606-374-7). Usefully arranged by order of publication with the help of Bishop-savvy editor Michael Hutchins, these lightly but meaningfully revised tales—stefnal, fantastical, one mimetic—comprise an astonishing career, illuminating and enjoyable for readers new and old. But even longtime Bishop fans will encounter unseen gems.
Story collections are not only for the benefit of living authors, but also a means of keeping the work of the field's forebears alive. Robert Bloch—once a famous byline, but possibly growing forgotten since his death in 1994—gets just such a reinvigoration with Yours Truly, Jack the Ripper (Subterranean, hardcover, $40.00, 336 pages, ISBN 978-1-59606-424-9). Not strictly a story collection, since it contains an entire novel, The Night of the Ripper, it's an omnibus of all Bloch's tales concerning the famed British serial killer. This includes the screenplay of Bloch's well-loved Star Trek episode, "Wolf in the Fold." With mordant and ardent professionalism, Bloch rings the changes on Red Jack's hideous career, delivering shiv-ers galore.
When speaking of child prodigies in our field, we often fail to mention Ramsey Campbell. He began his acolyte's editorial correspondence with August Derleth as a Lovecraft-besotted fan in 1961 at age fourteen, and his first book manifested three years later. That volume now receives its slightly premature "fiftieth anniversary edition" from PS Publishing: The Inhabitant of the Lake & Other Unwelcome Tenants (hardcover, £19.99, 298 pages, ISBN 978-1-848632-00-4). These Cthulhu Mythos tales exhibit a compelling and unnatural gravitas for such a young author, and capture without slavish imitation many of HPL's frissons. I particularly enjoyed "The Mine on Yuggoth" for its nighted and hideous cosmic vistas. The bonus material here—Campbell's original drafts, plus Derleth's letters—raises this volume to milestone status.
Readers of this column might recall the name Brendan Connell from my review of his prior collection, the urbicentric Metrophilias. Connell now returns with The Life of Polycrates (Chômu Press, trade paperback, $14.00, 266 pages, ISBN 978-1-907681-04-2), in which the stories exude a kind of fevered Aubrey Beardsley Euro-decadence. Think Alberto Moravia, E.T.A. Hoffmann, Thomas Mann. In "The Dancing Billionaire," louche partygoers hoist "thin-stemmed glasses growing from hands like effervescent fungi." Connell's protagonists are all monsters, and not hopeful ones either. They generally inflict and receive grief and pain and meet bad ends. Perhaps the template is best seen in the protagonist of "Collapsing Claude," who wallows in a sick love affair, then pines for more.
Fans of smart genre criticism and reviews know the name Don D'Ammassa from his long stint as the chief reviewer at the lamentably extinct SF Chronicle, and also from the encyclopedia work he's done for several presses. (D'Ammassa continues his reviewing these days at his website: www.dondammassa.com.) But savvy readers of this magazine and of Analog will have also seen his byline on a number of fine stories over the years. Despite having sold over one hundred fiction pieces, it is only recently that his first collection appeared: Translation Station (The Merry Blacksmith Press, trade paper, $13.95, 200 pages, ISBN 978-0-61548-936-0). The tales here are for the most part hardcore SF—first contact, space travel, life on alien worlds. The title story plus two others form a great mini-saga about hyperspace travel with a unique twist involving wheeled spaceships!
Gardner Dozois's new book, When the Great Days Come (Prime Books, trade paper, $14.95, 360 pages, ISBN 978-1-60701-230-6) functions as an essential career retrospective, spanning as it does exactly forty years of his intermittent but collectively impressive fiction output. Unlike the Bishop volume cited above, this overview is arranged with newest items first, and then, more or less, proceeding backward in time. We see the current version of Dozois up front: a seasoned professional capable of turning out any type of story. For instance, "Recidivist" is a top-notch post-Singularity tale equal to the work of Stross or Doctorow, and full of rueful humor. The voyage back through the decades to his earliest work, which I like to think of as "Angry Young Sturgeon," is one that provides endless pleasures.
On his twenty-fifth anniversary of writing what might be best described as odd, weird, and disturbing fictions, Christopher Fowler has compiled a mammoth volume of twenty-five stories in that macabre vein, christening it Red Gloves (PS Publishing, hardcover, $32.00, 210 pages, ISBN 978-1-848631-98-4). The first half, Devilry, features London-based tales, while the second half, Infernal, is subtitled "The World Horrors." Fowler's London pieces exhibit his elegant and understated prose to good effect, proving he can summon up with keen verisimilitude any portion of that metropolis, evoking the eerie and uncanny even from something so mundane as a limo, in "The Stretch." In the second part of the book, creepiness abounds around the globe, even unto the distant past of the Wild West, with the gruesome tale of "The Boy Thug."
Glenn Grant's Burning Days (Nano-press, trade paper, $11.90, 132 pages, ISBN 978-0-9811905-4-9) brings us icy-hot hardcore cyberpunk fictions originally presented during the 1990s and the early twenty-first century, which prove that old-school Gibsonesque visions, clarified and ramped-up by second-generation insights, remain eternally relevant and exciting. As Bruce Sterling says in his introduction, "Glenn Grant's stories are full of jolting moments of . . . mental clarity . . . moments of ontological realization." As Grant's characters move through ultra-wired, densely depicted milieus, the reader gets to experience their epiphanies in realtime. "La Demoña" is particularly vivid for being told first-person by a young "Mex-Am girl working (illegally) as an apprentice myo-electrician for Pandemonium Crew."
With the blue collar fascinations of Stephen King and the gleeful perversity of a young Ray Bradbury, Glen Hirshberg digs deep beneath the commonplace exteriors of modern American lives to find malaise and bad mojo. The Janus Tree and Other Stories (Subterranean, hardcover, $40.00, 230 pages, ISBN 978-1-59606-408-9) is his latest compilation of mundane façades destroyed by buried impulses and desires. And although illness and madness course through these tales, there are quieter, more melancholy moments such as the account in "Sho-mer" of a young man's bizarre trials during the Jewish ceremony of guarding a corpse. And the two stories concerning a strange urban phenomenon dubbed "the Book Depositories" have a kind of black Brautigan whimsy.
John Wyndham once did a book, The Outward Urge, with his alter ego, Lucas Parkes. Ed McBain collaborated with Evan Hunter on the novel Candyland. Now Robin Hobb and Megan Lindholm, who otherwise share a single body, bring forth The Inheritance and Other Stories (Subterranean, hardcover, $45.00, 392 pages, ISBN 978-1-59606-438-6), representing "their" two approaches to tale-telling: sprawling versus concise. The three Hobb stories, two of which are pendants to her novels, are interesting and will reward her fans. But the Lindholm offerings, to my eyes, are superior, showcasing a vivid imagination, deep empathy, and twisty sense of plotting. Whether dealing with drug-beslimed aliens ("A Touch of Lavender") or roadkill magic ("The Fifth Squashed Cat"), Lindholm delivers surprises and thrills embodied in the lives of some very relatable souls.
Chances are, you will not have seen the fantastika stories of Greg Hrbek in their magazine incarnations, because they all appeared in non-genre publications, places like Conjunctions and Sonora
Review: zines toward which we haughty fans all too often turn a blind eye. But, as the title might hint, none of the stories in Destroy All Monsters (Bison Books, trade paper, $14.95, 192 pages, ISBN 978-0-8032-3644-8) would have seemed out of place in Asimov's or F&SF, and they speak to the same passions and dreams that motivate our genre explorations, with perhaps a tad more polish and gloss. Certainly a touching story like "Sagittarius," which details the feelings of human parents of a child centaur during one crucial evening, might have flowed from the pen of Kelly Link or John Crowley.
Famed for her novels and essays, Gwyneth Jones also writes superb short stories, though at lesser rates of production. Almost twenty-five-years' worth are collected in The Universe of Things (Aqueduct Press, trade paper, $18.00, 296 pages, ISBN 978-1-933500-44-7), and they offer immense pleasures, both cerebral and sensual. If I had to pick one word, I would qualify Jones's work as "playful," in the sense of serious ludic juggling of ideas, emotions, and themes. Whether creating a punk portrait of our near future ("Blue Clay Blues") or a peculiarly enspirited house ("Grandmother's Footsteps"), Jones sports among her tropes like a dolphin at sea. She is a mage whose main message is that "Our magical technology may have unsuspected costs" ("La Cenerentola").
Perhaps you recall a story from these pages almost thirty years ago, titled "Her Furry Face," written by Leigh Kennedy. It was nominated for a Nebula Award and generated some level of controversy for its sensitive but frank depiction of interspecies love. However, if you are not such a longterm veteran of Asimov's, you will still be privileged to encounter the story in Kennedy's new collection, Wind Angels (PS Publishing, hardcover, £19.99, 230 pages, ISBN 978-1-848631-97-7). "Her Furry Face" holds up remarkably well, and is matched by the other entries here, such as "Belling Martha." "She sniffed the frigid wind blowing toward her. . . . Someone was roasting human flesh in their fire." Also, two stories are original to this volume.
Almost four years ago I read Maureen McHugh's story "Special Economics," about the fortunes of a spunky young Chinese girl, and immediately considered it to be the ne plus ultra of hip, wired, globally aware, twenty-first-century SF. I had a chance to peruse it again, thanks to the publication of her new collection, After the Apocalypse (Small Beer Press, hardcover, $16.00, 200 pages, ISBN 978-1-931520-29-4), and found the tale just as au courant as ever. SF would not be deemed irrelevant if it were all as good as this. McHugh proves she can deliver zombie shocks ("The Naturalist"), surreal whimsy ("Going to France"), and beautiful mimesis ("Honeymoon") as well. She's at the top of her game in these pages.
After gifting us with recent short-story volumes by Paul Tremblay and Claude Lalumière, the magnificent, bold and perspicacious Chizine Publications delivers a phenomenal collection with Teresa Milbrodt's Bearded Women (trade paper, $15.95, 280 pages, ISBN 978-1-926851-46-4). Milbrodt's writing is akin to that of Carol Emshwiller or Karen Russell (Swamplandia!). The most outré beings and events are presented with matter-of-fact mimetic clarity and emotional empathy. Besides the hirsute females of the title, Milbrodt shows a fascination with legendary entities such as cyclopes and giants. In "Snakes," the protagonist is quite happy with the reptilian "seventy-eight little siblings" that adorn her pate. And why not? No character in this volume feels themselves a freak. Or rather, all humanity is freakish, some of us just a bit more colorfully so than others.
Flaunting all the hypnotic elliptical lyricism of an R.E.M. song or the writings of Blake Butler or Rikki Ducornet, the little fables in Helen Phillips's collection And Yet They Were Happy (Leapfrog Press, trade paper, $14.95, 180 pages, ISBN 978-1-935248-18-7) cohere into a kind of cloud-like meta-narrative that details a world of metamorphoses and disasters and redemptions that blends Ovid, William Blake, and Walt Disney. "Before we left for our trip, we neglected to wipe the kitchen counters. . . .When we returned—we gasped—for there—in our kitchen—a mouse carnival was taking place!" ("Failure #1.") Ranging from the quasi-autobiographical ("Wedding #1") to the Phildickian ("Apocalypse #8": "The trees are flat, two-dimensional, made of brown paper."), these tales represent our modern world filtered through a unique sensibility and imagination.
Kit Reed has been writing caustic, satirical, jazzy fiction for over fifty years now, and she just keeps getting better. Her newest assemblage of short, sharp shocks is What Wolves Know (PS Publishing, hardcover, £19.99, 232 pages, ISBN 978-1-848631-34-2), and it will knock your socks off with its contrarian, take-no-prisoners approach to both story-telling and subject matter. Consider a story such as "Special," in which celebrity airhead Ashley Famous meets an ending worthy of a Shirley Jackson conte cruel. Or perhaps "Denny," which begins thus: "We are worried about Denny. We have reason to believe he may go all Colum-bine on us." But topicality is not Reed's only forte. In a story like "The Chaise," she creates weirdness resembling Edward Gorey's "The Curious Sofa."
A prophet of the flesh, Geoff Ryman is fascinated by biology, our human capacity (shared with the rest of squishy creation) for bodily transcendence, degeneration and metamorphosis. Whether contemplating the genetics of homosexuality ("Birth Days"), the lives of transgenic sophonts ("Days of Wonder"), or the humiliating transformations attendant upon aging ("VAO"), he brings a kind of saintly compassion and insight to his characters. But not all the entries in Paradise Tales (Small Beer Press, trade paper, $16.00, 314 pages, ISBN 978-1-931520-64-5) conform to this paradigm. There are cosmopolitan explorations, such as the Cambodian-centric "Pol Pot's Beautiful Daughter" and "Blocked." And there are densely speculative cyber-forecasts like "The Future of Science Fiction." But all benefit from Ryman's economical yet lapidary prose.
Here is an open secret: Bruce Sterling actually lives in the future—his eleven-dimensional lifeline is smeared across several eras, I suspect—and he merely visits our era occasionally, leaving behind "fictions" for our edification. How else to explain the uncannily prescient and uber-happening stories in Gothic High-Tech (Subterranean, hardcover, $25.00, 232 pages, ISBN 978-1-59606-404-1)? Are they "merely" the result of being as wired as Charles Stross or Neal Stephenson? No! They derive from actual observation of other eras. Sterling merely uses his journalistic training to document what he sees. In fact, he provides a covert self-portrait in "Black Swan," where cross-dimensional traveler Massimo Montaldo reveals himself to be God—or rather "several million billion Gods," creating entire continua with the press of a function key.
Can you resist a story that begins thus: "Millard Augustine came home every evening promptly at six-fifteen, unlatched his skull port, removed his brain and placed it in the Bolivian Rosewood box lined with Thai silk that had been given to him by his grandfather on his thirteenth birthday" ("A Gray Matter"). Or how about this opener? "Orly's modest cottage was located in the mountainous region on the border between the Land of the Living and the Land of the Dead" ("On Orly's Border"). If these alluring salvos—fully justified by what lurks beyond them—entice you, pick up Gay Terry's Meeting the Dog Girls (Nonstop Press, trade paper, $14.95, 206 pages, ISBN 978-1933065-20-5). Along with some irreducible short allegories, you will find nonpareil fantastika that will stay with you for a long time.
Copyright © 2012 Paul Di Filippo
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text:
Meanwhile, in one of many alternate futures…
"I'm sorry, Ms. Oppenheim. It's beyond conservative treatment."
Jess always knew this day might come, but anticipation doesn't make realization any less agonizing. Her gene mods couldn't protect her forever.
She had to accept she must stop running. Or face… consequences.
"We can print a new joint, but you must consent to the implanted tracking chip…"
So, it's come to this: A decision no athlete should have to face. To continue doing what she loves, she must sacrifice her privacy, with authorities monitoring her every move.
"I need a few days to consider," she says, limping from the doctor's office.
100WITF is Zoë Goodacre's thought-provoking, creative take on the world of business and technology. Join us every week on a journey to fantastical worlds, and take a different spin on top tech stories. Weigh in with a comment below, and follow Zoë Goodacre (Google+) @zgoodacre (Twitter)
Image credit: National Institutes of Health (pd)
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subset: commoncrawl


text:
A process for forming sub-lithographic features in an integrated circuit is disclosed herein. A process for enhancing the etch trimmability and the etch stability of features patterned on a photoresist layer is also disclosed herein. The process includes curing a photoresist layer after patterning and development but before an etch process is performed thereon. By controlling the formation of the cured portions of the features patterned on the photoresist layer, the features can be trimmed to sub-lithographic critical dimensions without pattern deformation or occurrence of other failure mechanisms.
1. A method for achieving a sub-lithographic critical dimension in an integrated circuit device feature, the integrated circuit device feature formed on a semiconductor wafer using a feature patterned on a photoresist layer, the method comprising the steps of:
curing the feature patterned on the photoresist layer with an electron beam; and
trimming the cured feature to form a trimmed feature, wherein the sub-lithographic critical dimension of the trimmed feature is dependent on a dose of the electron beam.
2. The method of
3. The method of
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6. The method of
7. A feature patterned on a photoresist layer having enhanced etch stability and trimmability in an etch process, the feature including a top region and the feature formed by the process comprising, irradiating the feature patterned on a photoresist layer with an electron beam before the etch process, wherein at least the top region of the feature is cross-linked to the point of complete decomposition to form a cross-linked top region.
8. The process of
9. The process of
10. The process of
11. The process of
12. The process of
13. The process of
14. An integrated circuit fabrication process, th e process comprising:
curing a patterned photoresist layer with an electron beam, the patterned photoresist layer disposed over a substrate;
trimming the cured photoresist layer with a plasma etch; and
transferring a pattern of the trimmed photoresist layer to the substrate, wherein a critical dimension of the transferred pattern on the substrate has a sub-lithographic dimension and is a function of a dose of the electron beam in the curing step.
15. The process of
16. The process of
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20. The process of
[0001] The present application is related to U.S. application Ser. No. ______ (Atty. Dkt. No. 39153/404 (F0943)) by Okoroanyanwu et al., entitled "Process for Preventing Deformation of Patterned Photoresist Features;" U.S. application Ser. No. ______ (Atty. Dkt. No. 39153/405 (F0945)) by Okoroanyanwu et al., entitled "Improving SEM Inspection and Analysis of Patterned Photoresist Features;" U.S. application Ser. No. ______ (Atty. Dkt. No. 39153/403 (F0942)) by Okoroanyanwu et al., entitled "Process for Forming Sub-lithographic Photoresist Features by Modification of the Photoresist Surface;" U.S. application Ser. No. ______ (Atty. Dkt. No. 39153/298 (F0785)) by Gabriel et al., entitled "Selective Photoresist Hardening to Facilitate Lateral Trimming;" and U.S. application Ser. No. ______ (Atty. Dkt. No. 39153/310 (F0797)) by Gabriel et al., entitled "Process for Improving the Etch Stability of Ultra-Thin Photoresist," all filed on an even date herewith and assigned to the Assignee of the present application.
[0002] The present invention relates generally to integrated circuit (IC) fabrication. More particularly, the present invention relates to fabrication of IC features having reduced critical dimensions than is possible with conventional lithography and resolution enhancement techniques.
[0003] The semiconductor or integrated circuit (IC) industry aims to manufacture ICs with higher and higher densities of devices on a smaller chip area to achieve greater functionality and to reduce manufacturing costs. This desire for large scale integration requires continued shrinking of circuit dimensions and device features. The ability to reduce the size of structures, such as, gate lengths in field-effect transistors and the width of conductive lines, is driven by the performance of lithographic tools (e.g., wavelength of the exposure sources), resolution enhancement techniques (e.g., phase shifting masks, off-axis illumination, etc.), and photoresist materials (collectively referred to as lithographic techniques).
[0004] However, currently available lithographic techniques lack the resolution to print desirably small IC device features. Thus, various non-lithographic techniques are also employed to shrink or reduce feature dimensions after lithographic printing. One such non-lithographic technique is a resist trimming process that reduces or "trims" features patterned on a photoresist layer of a semiconductor wafer before such features are transferred onto the underlying layer(s) of the semiconductor wafer. The resist trimming process utilizes a plasma etch to remove some of the patterned photoresist material such that the critical dimensions of the patterned features are reduced.
[0005] Different types of photoresist materials exhibit different trimming performances. For example, photoresist materials designed for 193 nm lithography, e.g., photoresist materials comprising acrylate-based polymers and/or alicyclic-based polymers, have poor trimming performance in comparison with 248 nm photoresist materials, e.g., photoresist materials comprising phenolic polymers. Typical failure mechanisms during the resist trimming process for features patterned on 193 nm photoresist materials include pattern collapse, pattern bending, pattern breakage, general mechanical deformation, and/or uncontrollable photoresist erosion rates. Other photoresist materials also exhibit such failure mechanisms depending on the operating conditions of the resist trimming process (e.g., prolonged trimming time) and/or the original dimensions of the lithographically printed features on the photoresist materials.
[0006] To mitigate some of these failure mechanisms, a thinner layer of photoresist material may be disposed on the wafer for lithographic printing or pattern transfer of features from a mask or reticle. However, the initial reduction in photoresist thickness allows for less critical dimension reduction with the resist trimming process due to photoresist consumption concerns. Since the resist trimming process trims the exposed surfaces of the patterned features in both the vertical and horizontal directions (i.e., simultaneously reduces the height and width of the patterned features), by the time a desirable trimmed width has been achieved, there may not be enough height or vertical thickness remaining for the trimmed features to survive subsequent processes (e.g., an etch process for polysilicon gate formation).
[0007] Thus, there is a need for a process for enhancing the etch trimmability and etch stability of patterned photoresist features. There is a further need for a process for forming IC features having smaller critical dimensions than is possible with conventional lithographic and non-lithographic techniques. There is still a further need for a process for preventing pattern collapse, pattern bending, pattern breakage, and/or general mechanical deformation of patterned resist features during etch processing.
[0008] One exemplary embodiment relates to a method for achieving a sub-lithographic critical dimension in an integrated circuit device feature. The integrated circuit device feature is formed on a semiconductor wafer using a feature patterned on a photoresist layer. The method includes curing the feature patterned on the photoresist layer with an electron beam. The method further includes trimming the cured feature to form a trimmed feature. The sub-lithographic critical dimension of the trimmed feature is dependent on a dose of the electron beam.
[0009] Another exemplary embodiment relates to a feature patterned on a photoresist layer having enhanced etch stability and trimmability in an etch process. The feature includes a top region. The feature is formed by the process including irradiating the feature patterned on a photoresist layer with an electron beam before the etch process. At least the top region of the feature is cross-linked to the point of complete decomposition to form a cross-linked top region.
[0010] Still another exemplary embodiment relates an integrated circuit fabrication process. The process includes curing a patterned photoresist layer with an electron beam, and trimming the cured photoresist layer with a plasma etch. The process further includes transferring a pattern of the trimmed photoresist layer to the substrate. The patterned photoresist layer is disposed over a substrate. A critical dimension of the transferred pattern on the substrate has a sub-lithographic dimension and is a function of a dose of the electron beam in the curing step.
[0011] The exemplary embodiments will become more fully understood from the following detailed description, taken in conjunction with the accompanying drawings, wherein like reference numerals denote like elements, in which:
[0012]FIG. 1 is a flow diagram showing a process for enhancing the etch trimmability and the etch stability of patterned features on a photoresist layer of a semiconductor wafer in accordance with an exemplary embodiment;
[0013]FIG. 2 is a general schematic block diagram of a lithographic system for patterning the wafer in accordance with an exemplary embodiment;
[0014]FIG. 3 is a cross-sectional view of the wafer illustrated in FIG. 2, showing a developing step;
[0015]FIG. 4A is a cross-sectional view of the wafer illustrated in FIG. 3, showing one embodiment of a flood electron beam exposure step;
[0016]FIG. 4B is a cross-section view of the wafer illustrated in FIG. 3, showing an alternative embodiment of the flood electron beam exposure step;
[0017]FIG. 4C is a cross-section view of the wafer illustrated in FIG. 3, showing another alternative embodiment of the flood electron beam exposure step;
[0018]FIG. 5 is a cross-section view of the wafer illustrated in each of FIGS. 4A-4C, showing a resist trimming step;
[0019]FIG. 6 is a plot showing critical dimension reduction vs. trim time for various electron beam doses;
[0020]FIG. 7 is a plot showing vertical-to-horizontal etch rate ratios vs. electron beam doses;
[0021]FIG. 8 is a plot showing trim rate vs. electron beam dose for various nominally dimensioned line features; and
[0022]FIG. 9 is a plot showing feature dimension vs. trim time for various electron beam doses.
[0023] In one embodiment of the present invention, an advantageous process for enhancing the etch trimmability and the etch stability of features patterned on a photoresist layer during an integrated circuit (IC) fabrication is provided. An exemplary embodiment of the present invention will be described with respect to a flow diagram shown in FIG. 1. The flow diagram includes a patterning step 40, a developing step 42, a flood electron beam exposure step 44, and a resist trimming step 46.
[0024] Patterning step 40 is carried out using a lithography system 10, as shown in FIG. 2. Lithographic system 10 includes a chamber 12, a light source 14, a condenser lens assembly 16, a mask or a reticle 18, an objective lens assembly 20, and a stage 22. Lithographic system 10 is configured to transfer a pattern or image provided on mask or reticle 18 to a wafer 24 positioned in lithography system 10. Lithographic system 10 may be a lithographic camera, stepper, or scanner unit. For example, lithographic system 10 may be a PAS 5500/900 series machine manufactured by ASML, a microscan DUV system manufactured by Silicon Valley Group, or an XLS family microlithography system manufactured by Integrated Solutions, Inc. of Korea.
[0025] Wafer 24 includes a substrate 26, a layer 28, and a photoresist layer 30. Photoresist layer 30 is disposed over layer 28, and layer 28 is disposed over substrate 26. Wafer 24 can be an entire integrated circuit (IC) wafer or a part of an IC wafer. Wafer 24 can be a part of an IC, such as, a memory, a processing unit, an input/output device, etc. Substrate 26 can be a semiconductor substrate, such as, silicon, gallium arsenide, germanium, or other substrate material. Substrate 26 can include one or more layers of material and/or features, such as lines, interconnects, vias, doped regions, etc., and can further include devices, such as, transistors, microactuators, microsensors, capacitors, resistors, diodes, etc.
[0026] Layer 28 can be an insulative layer, a conductive layer, a barrier layer, or other layer of material to be etched, doped, or layered. In one embodiment, layer 28 can comprise one or more layers of materials, such as, a polysilicon stack comprised of a plurality of alternating layers of titanium silicide, tungsten silicide, cobalt silicide materials, etc. In another embodiment, layer 28 is a hard mask layer, such as, a silicon nitride layer or a metal layer. The hard mask layer can serve as a patterned layer for processing substrate 26 or for processing a layer upon substrate 26. In yet another embodiment, layer 28 is an anti-reflective coating (ARC). Substrate 26 and layer 28 are not described in a limiting fashion, and can each comprise a conductive, semiconductive, or insulative material.
[0027] Photoresist layer 30 can comprise a variety of photoresist chemicals suitable for lithographic applications. Photoresist layer 30 is selected to have photochemical reactions in response to electromagnetic radiation emitted from light source 14. Materials comprising photoresist layer 30 can include, among others, a matrix material or resin, a sensitizer or inhibitor, and a solvent. Photoresist layer 30 is preferably a chemically amplified, positive or negative tone, organic-based photoresist. Photoresist layer 30 may be, but is not limited to, an acrylate-based polymer, an alicyclic-based polymer, or a phenolic-based polymer. For example, photoresist layer 30 may comprise PAR700 photoresist manufactured by Sumitomo Chemical Company. Photoresist layer 30 is deposited, for example, by spin-coating over layer 28. Photoresist layer 30 is provided at a thickness of less than 1.0 μm. Photoresist layer 30 is provided at a thickness of approximately 3,000-10,000 Å for 248 nm lithography, and a thickness of approximately 200-400 nm for 193 nm lithography.
[0028] Chamber 12 of lithographic system 10 can be a vacuum or low pressure chamber for use in ultraviolet (UV), vacuum ultraviolet (VUV), deep ultraviolet (DUV), extreme ultraviolet (EUV), x-ray, or other types of lithography. Chamber 12 can contain any of numerous types of atmospheres, such as, nitrogen, etc. Alternatively, chamber 12 can be configured to provide a variety of other patterning scheme.
[0029] Light source 14 provides light or electromagnetic radiation through condenser lens assembly 16, mask or reticle 18, and objective lens assembly 20 to photoresist layer 30. Light source 14 is an excimer laser, in one embodiment, having a wavelength of 365 nm, 248 nm, 193 nm, 157 nm, or 126 nm, or a soft x-ray source having a wavelength at 13.4 nm. Alternatively, light source 14 may be a variety of other light sources capable of emitting radiation having a wavelength in the ultraviolet (UV), vacuum ultraviolet (VUV), deep ultraviolet (DUV), extreme ultraviolet (EUV), x-ray or other wavelength range.
[0030] Assemblies 16 and 20 include lenses, mirrors, collimators, beam splitters, and/or other optical components to suitably focus and direct a pattern of radiation (i.e., radiation from light source 14 as modified by a pattern or image provided on mask or reticle 18) onto photoresist layer 30. Stage 22 supports wafer 24 and can move wafer 24 relative to assembly 20.
[0031] Mask or reticle 18 is a binary mask in one embodiment. Mask or reticle 18 includes a translucent substrate 32 (e.g., glass or quartz) and an opaque or absorbing layer 34 (e.g., chromium or chromium oxide) thereof. Absorbing layer 34 provides a pattern or image associated with a desired circuit pattern, features, or devices to be projected onto photoresist layer 30. Alternatively, mask or reticle 18 may be an attenuating phase shift mask, an alternating phase shift mask, or other type of mask or reticle.
[0032] Utilizing lithographic system 10, the pattern or image on mask or reticle 18 is projected onto and patterned on photoresist layer 30 of wafer 24. Next, in developing step 42, wafer 24 is exposed to a developer, as is well-known in the art, to develop the pattern on photoresist layer 30. Referring to FIG. 3, a cross-sectional view of a portion of wafer 24 after developing step 42 is shown. The developed pattern includes a feature 50. Feature 50 has a width or lateral dimension 51.
[0033] After photoresist layer 30 has been developed but before features thereon are transferred onto any of the underlying layers, such as layer 28, flood electron beam exposure step 44 is performed. Wafer 24 may be removed from chamber 12 and placed within a different chamber and/or a different environment which provides electron beam tools. Alternatively, chamber 12 may be configured to include additional chambers and/or tools suitable to perform step 44.
[0034] In FIG. 4A, there is shown wafer 24 undergoing flood electron beam exposure step 44. A flood electron beam 52 impinges on the exposed surfaces of layer 30 and chemically transforms or modifies such exposed surfaces to a certain depth. For feature 50, a top surface or region and sidewalls are transformed into a shell 58. Upon completion of step 44, feature 50 comprises an uncured region 60 and shell 58, uncured region 60 being encapsulated from underneath by layer 28 and on all other sides or faces by shell 58. Preferably, the vertical thickness of the top region of shell 58 is greater than the horizontal thickness of each of the sidewalls of shell 58.
[0035] In alternative embodiments, electron beam 52 may transform or cure other regions or proportions of feature 50 in step 44. As shown in FIG. 4B, feature 50 comprises a top cured region 54 and an uncured region 56. Top cured region 54 is the chemically modified region of feature 50 due to penetration by electron beam 52. In this embodiment, the parameters of electron beam 52, to be described in greater detail hereinafter, have been selected such that electron beam 52 does not penetrate deeper than the bottom of top cured region 54. An uncured region 56 is the unchanged region of feature 50. In FIG. 4C, the parameters of electron beam 52 have been selected such that all of the material comprising feature 50 is chemically modified into a cured region 62.
[0036] Electron beam 52 is preferably emitted from an extended area electron source (not shown) and is a uniform collimated beam that is flood exposed over the entire wafer 24 at a normal angle of evidence. The extended area electron source is of the cold cathode type and generates electron beam 52 from the energetic impact of ions against a suitable metal. An example of an extended area electron source suitable to generate electron beam 52 is manufactured by Electron Vision Corporation of San Diego, Calif.
[0037] The electron beam flood exposure conditions or parameters (e.g., beam current, dose, and accelerating voltage) are selected to cause the functional groups and additives in the photoresist material of layer 30 which interact with electron beam 52 to undergo a chemical change, i.e., cross-linking and decomposition. Shell 58, top cured region 54, and cured region 62 are representative of cross-linked and decomposed regions of layer 30. The portions of layer 30 that electron beam 52 are unable to penetrate or bombarded, e.g., uncured regions 60, 56, remain unaffected. (i.e., the functional groups and additives in those regions are not cross-linked to the point of complete decomposition).
[0038] By varying the electron beam flood exposure conditions, processing gas, and/or wafer temperature, the penetration depth of electron beam 52 into layer 30 and/or the degree of chemical change to layer 30 can be controlled. Hence, the curing depth (i.e., the shape and dimensions of the cross-linked or cured region(s) in feature 50) and related etching properties of features patterned on layer 30 can be controlled to achieve much smaller critical dimensions (CDs) than would otherwise be possible.
[0039] The degree of decomposition that the functional groups of the polymer material comprising layer 30 will undergo is a function of the dose of electron beam 52. The penetration depth of electron beam 52 into layer 30 is a function of the energy of electron beam 52 The penetration depth determines the depth or thickness of shell 58, top cured region 54, and cured region 62. In one embodiment, the penetration depth can be selected as a function of the accelerating voltage of electron beam 52 and this relationship can be approximately expressed as:
[0040] where Rg is the penetration depth in microns, Va is the accelerating voltage or energy in keV, and d is the density of the target material (e.g., layer 16) in g/cm3.
[0041] Cross-linking at least a portion of feature 50 increases the bulk modulus and the bulk toughness of feature 50, as well as increasing the interfacial toughness of the substrate-resist polymer bond (i.e., the bond between feature 50 and layer 28). This ensures that feature 50 will be better able to withstand or prevent pattern bending, pattern collapse, pattern breakage, and/or general mechanical deformation during etch processing, such as resist trimming step 46. In addition, the cross-linked region of feature 50 will have a reduced etch rate relative to the noncross-linked region, such that feature 50 can be trimmed to a much smaller CD and higher aspect ratios (in step 46) than would otherwise be possible.
[0042] Furthermore, each of shell 58, top cured region 54, and cured region 62 has different electrical, optical, and material properties relative to uncured regions 60, 56. Complete decomposition of the functional groups of the polymer material causes the electrical and optical properties of shell 58 and regions 54, 62 to be different, increases the density of shell 58 and regions 54, 62, and decreases the porosity of shell 58 and regions 54, 62 relative to uncured regions 60, 56. The cured regions have greater etch resistance (or, equivalently, a slower erosion or etch rate) than the uncured regions. Hence, in resist trimming step 46 following the electron beam exposure or curing step 44, a greater amount of lateral trimming of features on layer 30 (e.g., feature 50) can occur without adversely thinning layer 30 in subsequent etch processing. Alternatively, layer 30 may be thinner and maintain the current resist trimming process.
[0043] In FIG. 5, a cross-sectional view of a portion of wafer 24 during resist trimming step 46 is shown. Resist trimming step 46 is preferably a plasma etching step. Wafer 24 is exposed to a plasma etchant 63 to trim or reduce the dimensions of features patterned on layer 30. Plasma etchant 63 can comprise a variety of plasma etch chemistries, such as, O2, HBr/O2, Cl2/O2, N2/He/O2, or N2/O2. In one embodiment, wafer 24 is in a different processing environment (e.g., different chamber) than for electron beam curing step 44. A variety of standard etching systems, such as those manufactured by Applied Materials of Santa Clara, Calif., or Lam Research of Fremont, Calif., may be utilized to provide plasma etchant 63.
[0044] Plasma etchant 63 etches all exposed surfaces on layer 30, including the top and side surfaces. However, because different portions of layer 30 have different etch rates following electron beam curing step 44 (e.g., top cured region 54 vs. uncured region 56), the dimensional reduction of all of the surfaces of layer 30 will not be the same. As shown in FIG. 5, the vertical reduction of feature 50 (shown upon completion of step 46 as a trimmed feature 64) is less than the lateral reduction of feature 50. The slower etch rate of shell 58 and region 54 relative to region 60 and region 56, respectively, causes advantageous non-uniform trimming of feature 50. Trimmed feature 64 has a lateral dimension or CD 66. When all of feature 50 has been cured (e.g., cured region 62 in FIG. 4C), then feature 50 trims at the same rate in the vertical and horizontal directions. Nevertheless, since the mechanical strength and etch stability of feature 50 has been much improved via step 44, prolonged trimming may still occur to achieve desired the CD. The remaining thickness of layer 30 will exhibit sufficient stability to maintain pattern integrity in subsequent etch processings.
[0045] In any case, without step 44, trimmed feature 64 would exhibit pattern deformation during step 46, would have a trimmed CD greater than dimension 66, and/or would not be able to maintain pattern integrity in subsequent processings (such as, an etch process to transfer the pattern to layer 28). In FIG. 6, a plot of CD loss or reduction vs. the trim time (i.e., the length of time that wafer 24 is undergoing trimming step 46) for various doses of an electron beam is shown. The photoresist line feature has a nominal lateral dimension of 130 nm; the substrate is a 27 nm thickness of silicon oxynitride (SiON) on 150 nm thickness of polysilicon; and the photoresist material is a PAR700 photoresist. Plot lines 100, 102, 104, 106, 108 show the CD loss as a function of the trim time for the photoresist line feature cured with an electron beam dose of 0μC/cm2, 250 μC/cm2, 500 μC/cm2, 1000 μC/cm2, and 2000 μC/cm2, respectively. For plot line 100 (i.e., the uncured feature), the inflection point at the 20 second trim time represents trim etch-induced disintegration and possible pattern collapse. In other words, without electron beam curing, pattern collapse and pattern degradation of the feature being trimmed occurs after 20 seconds of trimming and at a lateral or critical dimension of roughly 95 nm. In contrast, even mild electron beam curing prevents pattern deformation and enhances CD loss (see plot lines 102-108). As the electron beam dose increases, the CD reduction at a given trim time also increases. This increase in CD reduction saturates at an electron beam dose greater than approximately 2000 μC/cm2 (not shown).
[0046] In FIG. 7, a plot of the vertical-to-horizontal etch rate ratio (V/H ratio) as a function of the electron beam dose is shown. A 130 nm nominal laterally dimensioned line feature is used, lithographically patterned on the PAR700 photoresist, as described with respect to FIG. 6. A lower V/H ratio is indicative of an improved trimming process. As shown in FIG. 7, each of V/H ratios 200, 202, 204, 206 is lower than an V/H ratio 208 for the non-cured line feature. For example, each of V/H ratios 204, 206 is less than or equal to 1.5, which is comparable to a production grade polygate 248 nm photoresist material (KrF).
[0047] In FIG. 8, a plot of the etch trim rate vs. the electron beam dose for 100 nm, 110 nm, 120 nm, and 130 nm wide line features which are lithographically patterned on PAR700 photoresist is shown. For each of plot lines 300, 302, 304, 306, the trim rate increases as the electron beam dose increases. In FIG. 9, a plot of the feature dimension or CD vs. the trim time for various electron beam doses is shown. Starting with a 130 nm nominally dimensioned line feature (as described with respect to FIG. 6), plot lines 400, 402, 404, 406 show that smaller CDs can be achieved by electron beam curing the line feature prior to the trimming process than with no curing of the line feature (a plot line 408). The inflection point at 30 seconds for plot line 408 also indicates that prolonged trimming causes adverse pattern degradation for the uncured line feature.
[0048] Hence, using a 193 nm photoresist material for layer 30, lateral dimension 51 (FIG. 3) of feature 50 can be approximately 130 nm before step 46 and lateral dimension 66 (FIG. 5) achievable with electron beam curing or exposure step 44 is in the sub-60 nm range. Moreover, lateral dimension 66 of 35-50 nm is also achievable in a tight pitch. In contrast, without electron beam curing, feature 50 would not be able to achieve a lateral dimension smaller than approximately 90 nm without experiencing pattern deformation and/or etch instability in subsequent processes.
[0049] The advantageous process also allows the initial or original thickness of layer 30 to be thinner while maintaining the existing resist trimming process. This initially thinner thickness of layer 30 allows lithographic printing of smaller lateral dimensions. Thus, after the resist trimming process, the resulting trimmed feature can have much smaller lateral dimensions than is otherwise possible.
[0050] It is understood that although the detailed drawings, specific examples, and particular values describe the exemplary embodiments of the present invention, they are for purposes of illustration only. The exemplary embodiments of the present invention are not limited to the precise details and descriptions described herein. For example, although particular materials or chemistries are described, other materials or chemistries can be utilized. Various modifications may be made in the details disclosed without departing from the spirit of the invention as defined in the following claims
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Full detailed profile on Paige Miller Played by Alexandra Neil on One Life To Live Daytime Soap Opera.
Alexandra Neil
Birthday: 1955-04-07
At the hospital, after Paige announces that Dorian is a match for Jessica, Viki screams with glory, "I knew it!" When asked how she knew Dorian was a match, Viki replies, "It isn't Dorian, it's me!" Although Viki insists on being a donor, Jessica says, "I'm not going to let you do this." However, taking the blame for what happened to Jessica, Viki replies, "If I can save you, my life is a small price to pay." As Paige warns Viki of the risks, Viki screams, "But if I want to do it, why can't I?" Through tears, Jessica cries, "Because you'll break my heart." Nash commends Viki for offering her life for her daughter and makes Viki realize that Jessica needs her mother. Suddenly, after Paige leaves, she returns again with news and says, "You're not going to believe this. We found another match… Antonio!" After Paige leaves, Jessica cries, "How do I ask Antonio to give me a part of him when I've taken so much from him already? " Viki and Clint head out to locate Antonio and promise to return with good news, "We'll do whatever it takes to save you."
After Clint and Viki rejoin Nash and Jessica, Paige storms in with a smile and says, "We have a match for Jessica!" Overwhelmed with thanks, everyone wonders, "Who is the donor?" When Paige says, "It's Dorian," shock comes over Viki's face - knowing that Dorian used her name on Viki's lab test!
At the hospital, although Paige wants Cris to stay overnight for observation, John enters the room and says, "Just let him leave." Reluctantly, Paige allows it then leaves. After Cris signs his release papers, John warns him to stay safe and says, "I have a guard outside of Evangeline's room. I care a lot about her too."
When John arrives, after he informs Talia he'll be heading up the arson case, she briefs him on Evangeline's condition. Bo shows up just in time to get the news from Paige and John. Just then, Layla emerges from Evangeline's room and says, "She won't wake up, John… She just won't wake up…" After Paige explains that Evangeline will be moved to a special care facility, Cris goes to Bo and says, "I want to help you catch these people!"
Nash is devastated by Paige's news that Jessica has liver cancer. When Dorian approaches, Paige and she explain the possibility of a liver transplant and how long the donor list is. After Paige leaves, Nash tells Dorian, "I have to help her. I can't lose her - Bree can't lose her." As Dorian tells Nash he needs to face the fact that Jessica may die, Clint approaches. Although Nash wants to see Jessica, Clint tells him to wait. However, Nash says, "I know someone who Jessica needs to see, someone who can help her." Nash leaves… When Clint tells Dorian he's going to be tested to be a liver donor, Dorian says, "I will too."
Paige goes to Bo's office and gives him the news on Jessica…
Just as Talia and Antonio are leaving, Nash and Clint barge into the waiting room! As Antonio demands that he will not allow Nash to ruin Jessica's life, Paige barges in and announces that Jessica's test results are in. When Nash begins to follow everyone out, Antonio stops him and says, "You're not going anywhere near my wife!" Although Michael tries to reason with Antonio, as Jessica's doctor, Paige sides with Antonio and says, "I'm sorry, Nash. This is the way it's got to be." Surprisingly, Clint tells Antonio that Paige is going to stay with Nash and tell him Jessica's results, "He has the right to know!"
Paige explains Jessica's biopsy and the severity of her condition to Nash…
While Paige is examining Jessica, Bo comes in and asks, "Is there any change? Paige pulls Bo out into the hall.
When the coast is clear, Nash goes into Jessica's room. Although Jessica apologizes profusely for putting Nash at risk, he says, "I love you…" Seeing Paige and Bo on their way back into Jessica's room, Nash briefly hides until they leave again. Taking Jessica's hand, Nash says, "I'll never leave you."
In his office, Paige tells Bo she's going to California - to Hugh's grave - for Mother's Day. After expressing how happy she is that Hugh didn't turn out like Spencer, Paige goes further to say, "Now Spencer's dead and he'll never be able to hurt anyone again!" After Paige gets beeped to the hospital, Bo gets an urgent call, grabs a cop and heads out - ignoring Miles on the way.
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Area doctors Belcher, Melvin receive awards in Lewisburg
LEWISBURG, W.Va. -- Two area physicians received recognition during the May 23 West Virginia School of Osteopathic Medicine Graduation Awards Ceremony.
Barry Belcher, D.O., received the Outstanding Primary Care Preceptor Award for the Southwest Region of its Statewide Campus system. Belcher is a 2005 graduate of school who completed his internship and residency in pediatrics at Charleston Area Medical Center. He has been in practice in Ashland, Ky., for the past four years at Cedar Knoll Pediatrics with King's Daughters Medical Center. He is serving as clinical director of Cedar Knoll Pediatrics as well as chairman of pediatrics for KDMC.
Kelly Melvin, M.D., received the Outstanding Specialty Preceptor Award for the Southwest Region of its Statewide Campus system. Melvin graduated from Marshall University School of Medicine, completing a residency in general psychiatry and a fellowship in child and adolescent psychiatry at Vanderbilt University Medical Center in Nashville.
He is an assistant professor in the Department of Psychiatry and Behavioral Medicine at Marshall University and is also the medical director for the acute child and adolescent inpatient programs for River Park Hospital in Huntington.
Preceptors assist and provide guidance to medical students in their third- and fourth-year clinical rotations. During the annual Graduation Awards Ceremony, recognition was awarded to preceptors from each of the six statewide campus regions who have demonstrated excellence in teaching and mentoring. These health professionals have also demonstrated a commitment to community wellness and service.
The school's President Michael Adelman, D.O., D.P.M., J.D., said physicians willing to offer guidance as preceptors provide an invaluable service to students.
"On top of their responsibilities as physicians, these individuals take on the mentorship and evaluation of students performing clinical rotations at hospitals around the state," Adelman said in a release. "It is impossible to adequately convey the profound impact a good preceptor has on shaping the competencies and character of these future physicians. This award is one small way we can honor their efforts and recognize the positive difference they're making in our students' lives."
Approximately 50 hospitals, clinics and medical centers across West Virginia participate in the school's Statewide Campus program. Outstanding Primary Care and Specialty Preceptor Awards were given to physicians in each campus region including central, eastern, northern, south central, southeast and southwest.


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Judge Jay Delaney
presiding Dec. 29, 2008
In re: Paolo Lopez Ayala, other hearing; (name change), order entered.
Estate of: In re: Donald Eugene Adams, probate hearing; order entered.
Estate of Donald G. McDonald Jr., motion hour; (motion to amend), order entered.
Whalen and Company vs. Henry Hogg, court trial; hearing held, forcible detainer granted, to vacate on or before Jan. 5.
Joe L. Traylor and Tammy Traylor, John C. Malone and Linda Malone to John C. Malone and Linda Malone-trustees of John C. and Linda Malone Revocable Trust to Joe and Tammy Traylor, Lot 1 of Dixon Road Land Division, $1.
Pamela McCauley White, Georgia B. McCauley, Jack Martin Goins-as trustee, to Pamela McCauley White and Georgia B. McCauley, 48 acres on Millersburg Pike.
Mandy Jane Gossett, Jack Martin Goins-as trustee to Mandy Jane Gossett and Nicholas D. Thornton, 0.655 acre on East Pleasant Street.
Case Reports
Dec. 19 – At 10:29 p.m., police investigated a domestic situation on Pike Street.
Dec. 24 – At 1:03 p.m., police investigated a domestic on Elm Street between a father and son. During the course of the argument, two vehicles were damaged.
Dec. 24 – At 4:01 p.m. Andrea Byers, Ashwood Drive, reported that a computer, camera and camcorder were taken from her home. Value of the missing items was $1,400.
presiding Dec. 15, 2008
Estate of Ada Ray Ecklar, motion hour; order entered.
Estate of Carl E. Allen, probate hearing; petition amended, petition granted, order entered.
Estate of Clyde F. Hughes, motion hour; order entered.
Estate of Beatrice G. Slade, probate hearing; will admitted to probate, order entered.
Estate of Ruby Whitaker Lyons Warren, probate hearing; order entered.
Caseland, Inc. to Russell W. Case and Cheryl V. Case, 5.000 acres on County Infirmary Road, $410,000.
United Bank and Trust Company to David Sheakley and Stacy Sheakley, Lot 22, 2.3304 acres of Edgewater Estates Subdivision, $215,000.
Special Warranty Deed: Federal National Mortgage Association to Allen Northern, 1.553 acres on Robinson-Renaker Road, $60,500.
Brenda R. Grider to Ronald McDow and Matthew Ballard, property on Miller Street, $160,000.
Judge Barbara Paul
presiding Dec. 17, 2008
Constance M. Richardson vs. Dale Alan Richardson, motion hour; order entered.
Roy Allen Stith vs. Sandra Faye Stith, review; paying as ordered, remand from docket.
John Martin Swanson vs. Shawna Renee Swanson, motion hour; (motion for child support), motion sustained, agreed order of support entered.
Malcolm Thomas, Ryan Linville, and Catherine Darnell.
Dec. 27 at 5:50 p.m. -- non-injury, US 62 W, Timothy McNees, 41, Berry, driving a 2004 Chevrolet Express, struck a deer.
Dec. 23 at 3:42 p.m. -- non-injury, US 62 East, June C. Sims, 79, Mt. Olivet, driving a 2000 Buick Century.
Dec. 23 at 3:38 p.m. -- non-injury, Ky 1284, Anthony B. Barnes, 19, Cynthiana, driving a 2006 Chevrolet Aveo.
Dec. 23 at 3:17 p.m. -- injury, US 27, Natasha Davis, 25, Cynthiana, driving a 1999 Buick Le Sabre.
Case reports
Dec. 9 – At 8:40 p.m., Rachel M. Thompson, Hillside Drive, reported that while she was at her boyfriend's house, someone entered her apartment and took $21 in rolled pennies, her Social Security card and a blank check.
Dec. 9 – At 10:48 p.m., police were called to Harrison Memorial Hospital where an individual was intoxicated. The subject left the scene on foot after crashing a car into an embankment. He was found at Hillside Drive, arrested and charged with DUI and unauthorized use of a motor vehicle.
Jacqueline M. Young, Stephanie Latasha Sons, Spencer Aubrey, Nicholas Whitaker, and Duncan T. Bell.
Copyright © 2015
The Cynthiana Democrat is your source for local news, sports, events, and information in Cynthiana, KY and the surrounding area.


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The Swarthmore Fund
The Swarthmore Fund: Simple. Inclusive. Transformational.
Bringing the former Annual, Alumni, Parents, and Friends funds together as one, The Swarthmore Fund is a simple way to support Swarthmore students. Your gift to The Swarthmore Fund will have an immediate impact on students today, while gifts to the endowment and deferred gifts will continue to aid future generations of students.
The Swarthmore Fund is inclusive. From the financial aid that makes a Swarthmore education accessible to the profound benefits of an 8:1 student-faculty ratio to the 29 varsity sports and chartered club teams, The Swarthmore Fund enriches almost every aspect of a student's life.
The Swarthmore Fund is vital to providing students with a truly transformational experience. Swarthmore's endowment, substantial though it is, does not bridge the gap between what the College collects in tuition and what is needed to provide the life-changing, world-class education that students receive. Ultimately, it's the generosity of alumni and parents supporting The Swarthmore Fund that make the hallmarks of a Swarthmore education possible.
Why the name change? We wanted to simplify giving for our donors. Previously there were four different funds—Annual, Alumni, Parents, and Friends funds—that focused on making an immediate impact on the lives of current students. Now there is one fund with one name: The Swarthmore Fund.
What "counts" as a gift to The Swarthmore Fund? All gifts to the College made for today's purposes—to be used in the current fiscal year—count toward The Swarthmore Fund, as well as toward class and overall participation. Endowed and deferred gifts are not considered part of The Swarthmore Fund, as they are intended for future use.
Can I direct my Swarthmore Fund gift? Yes, you may choose to support a specific area of the College that you are passionate about and your gift will be counted as part of The Swarthmore Fund. Most donors choose not to direct their gifts because they believe in supporting the College's area of greatest need. These gifts have the effect of transforming students' lives every day, partly by giving the College the flexibility to fund its mission-driven initiatives, such as increasing financial aid packages on a moment's notice.
How can I make my gift? Please visit www.gift.swarthmore.edu, call 1-800-525-8622, or mail a check to: The Swarthmore Fund, 500 College Avenue, Swarthmore, PA 19081.
How can I find out more about The Swarthmore Fund? Please email Lisa Shafer, director, at firstname.lastname@example.com or call 610-328-8009.


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City Hall's Clock Tower
Downtown Minneapolis does not have a very good reputation for hanging on to its historic structures. Today, with only a few exceptions, the downtown skyline is a morass of cold, soulless edifices constructed during the Eighties and Nineties. With the exception, perhaps, of Philip Johnson's 1973 IDS Center, this city could be Anytown, USA. But then there's the city hall's clock tower, rising some 345 feet above the street (400 feet if you measure to the top of the flagstaff). The entire structure, with its Richardsonian Romanesque grandeur, red granite walls, and copper roof, is a great historic building: Originally known as the Municipal Building when it was built between 1887 and 1906, it was the tallest structure in the city until the 1920s. Downtown has long since obscured the city hall's physical prominence, but not that of the tower, which remains a beacon, a symbol of Minneapolis, and a reminder of our history.


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basyx 48"W x 72"H Gray Panel BSX P7248GYGY
Item #867135
- Office Panels
- Sturdy construction and sound absorbing
- Can be connected together to create walls, hallways, and enclosed offices
- Semi-tackable fabric with matching powder coated steel frame helps reduce scratches
- Gray
- 72" D x 48" W x 72" H Size
- 50 lb. Weight
- T-base foot required for complete assembly (sold separately)
- Minimal assembly required
- Each
- basyx Panel T-Base Foot Item #867192 (sold separately)
- basyx 48" Panel System Hanging Shelf Item #867200 (sold separately)
Brand: basyx
Collection Name: Versé Series
Color: Gray
Height: 72 in.
Model: BSX P7248GYGY
Number of Pieces: 1
Width: 48 in.
Please call 1-888-320-3277 with questions or concerns regarding your order.
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AppSense DesktopNow remains one of the leaders in the User State Virtualization market, an important consideration for those deploying non-persistent virtualized desktops and SBC solutions. Besides the deployment of desktop settings and personalization, it also offers application management, user rights management, performance management, and a raft of other features around data and mobility.
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Business Agility ...
And then there were three – NxTop Enterprise morphs to XenClient Enterprise
• • 3 Comments
How will Citrix acquisition of NxTop impact VARs and users? How will XenClient will be marketed longer term. Looks like Citrix will embrace IDV as there is a wider market share, and an admission that VDI will never be the sole solution: hybrid solutions are key to capturing as wide a desktop market share as possible.
Application Virtualization ...
Application Virtualization or Application Deployment, which one is better? (Part IV)
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Application Deployment solutions reduce the cost of delivering applications and help you manage license use? With the end of support for Windows XP happening in 2014 many businesses are moving towards Windows 7 – ideally this inevitable cost is kept low. Application Virtualization can be used on 'traditional' desktops and laptops. Application Virtualization can be used in client side-hypervisors. Application Virtualization extends and increases the efficiencies of desktop virtualization as well as enabling portability and improving compatibility of applications. Application Virtualization can free you, not only from the limitation of having to "install within each device", but lead the way in offering an alternative to "install on only corporate devices". Application Virtualization can be a tool to reduce the complexity and time needed to move from Windows XP to Windows 7, and from future application updates. Indeed, for many companies, Application Virutalization is an option that can be used now by utilising existing license agreements, or for less cost than converting the application to run as a web-based service.


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Below is the poem entitled There's More to Love which was written by poet
Pettit. Please feel free to comment on this poem. However, please remember, PoetrySoup is a place of encouragement and growth.
Read Poems by
Robert Pettit
A woman with larger than average breasts
will stand out prominently from the rest.
I don't care if she has a big round rump.
I just adore a woman that is plump.
A female like that is quite a prize.
She has her charms in extra-large size.
Those are facts many men don't realize.
I can find them in a nightclub, or on a sunny beach.
These wonderful women are always within reach.
They will supply love needs in any way.
I will take a woman like that any day.


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Bust your belly this Fat Tuesday at the Taste of the Triangle. Since 1981, this event has showcased dozens of Southeast Texas eateries and this year promises to be bigger than ever. While you walk around filling yourself with local fare, you'll also be serenaded by the Big Band stylings of the Remember When Orchestra. […] [Read More]
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Find life's little treasures and support LifePath Hospice, an affiliate of Chapters Health System, in the process.
Stop by LifePath Hospice Thrift Stores and shop for pictures, lamps, jewelry, clothing, furniture, books, antiques and so much more. Items are gently used, pre-owned, nearly new and never been worn.
Proceeds support LifePath Hospice patient and family programs. Volunteers are always welcome and tax-deductible donations are appreciated.
New Location Now Open! LifePath Hospice Thrift Store – Brandon
1335 W. Brandon Boulevard, Suite C (Brandon Plaza)
Brandon, FL 33511
Monday – Friday 9 a.m. – 6 p.m.
Saturday 9 a.m. – 5 p.m. Directions
If you are interested in volunteering at the new Brandon store, visit the Events page for upcoming informational meetings or contact Anne Ferrell at 813-357-5321 or email@example.com. LifePath Hospice Thrift Store – South Tampa
1918 South Dale Mabry
Tampa, FL 33629
Monday – Friday 9 a.m. – 6 p.m.
Saturday 9 a.m. – 5 p.m. Directions
LifePath Hospice Thrift Store – Carrollwood
4802 Gunn Highway, Suite 124/126 (Town Centre Plaza)
Tampa, FL 33624
Monday – Friday 9 a.m. – 6 p.m.
Saturday 9 a.m. – 5 p.m. Directions
Monthly Sales and Events Click here to view this month's sales events.
Want more information about sales and events at all three Life's Treasures locations?
Just text LIFESTREASURES to 22828 to sign up for the free, monthly newsletter.


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WIN a SPA weekend in lovely Camps Bay
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WIN a SPA weekend in lovely Camps Bay
11 May 2010
• SPA treatments for 4 people
• Accommodation for 4 people just 150m from the beach!
• Dinner at MOYO
• Winelands tour
• Selection of GREAT South African wines
WIN a dream Spa Weekend for FOUR people in
Camps Bay, Cape Town!
The Accommodation Hunter Spa Weekend includes:
SPA treatments for 4 people
Accommodation for 4 people just 150m from the beach!
Dinner at MOYO
Winelands tour
Selection of GREAT South African wines
How to enter:
• All you need to do, is to join our
Facebook page
and invite all your friends to join. Once that is done just post "Done" on our Facebook wall. It's that simple!
• The first person to get 50 friends to join wins a box of GREAT wine form Getwine.co.za
The draw will be done 21st of June 2010 and announced on the same day. Good luck all! :-)
Please visit our fantastic sponsors to see what it is you are winning:
SPA treatments from Mint Wellness
For many years, mint has been seen as a natural healer and is used worldwide professionally and at home. At
Mint Wellness
, mint is an essential oil for relaxation & calming and is revitalizing to the inner and outer body. It is a natural medicine, fresh fragrance, healthy food, vitalizing drink and a pampering luxury. Our colours, mint green and turquoise, represent nature and serenity and is combined within our wellness centres to add to your complete, naturally pampered experience every time you come to spoil yourself.
Camps Bay accommodation
Approximately 150m from the beach with its theatre, trendy pavement cafes, world-class restaurants and shops,
31 Camps Bay Drive
awaits. This two-bedroom apartment is situated close to the beach. An easy walk to the Theatre on the Bay, trendy award winning restaurants just off the beach, cocktail lounges and jazz bars, beauty spas and boutiques. Camps Bay has so much to offer!
ituated at Eden on the Bay in Blaauwberg,
is only 20min from cosmopolitan Cape Town. Located along the unspoiled shores of the West Coast, Eden on the Bay is inspired by the natural rhythms of the Atlantic Ocean. With views of the two most acclaimed brand icons – Table Mountain and Robben Island,
will look over them as a loving African ancestor.
Winelands tour
BokBus Tours
have become the gold standard in the tour industry in the past 5 years. If you are looking for Garden Route tours, Cape Town tours, Safari tours or Adventure Tours, they are your team. With their well trained tourguides who know the areas you will explore, you will come to love South Africa the way we all love her. From Cape Town to the Garden Route to a private Safari up north, they will take you there!
Great wine
was founded with the philosophy of providing quality South African wines at competitive prices to everyone who is passionate about enjoying a great wine with friends and family.
We supply both labelled and unlabelled wines. Unlabelled South African wines came into the market after the South African currency strengthened and many top wine estates could not export their annual wine harvests. These wines are now sourced by
and made available at greatly reduced prices to you.
If you ask us a question on this page:
• Please be sure to leave your email address so we can get back to you.
• The prize needs to be redeemed between the 1st August 2010 and 30th November 2010
• Your dates that you choose are subject to availability.
• No alcohol can be awarded to anyone below 18 years of age
• Breakages deposit will be required for the accommodation venue
• All prizes may be upgraded at the discretion of Accommodation Hunter
• All entries will be verified
Have a question?
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- 20 May 2010 @ 14h13
Hi there About your FB page - I have Benutriwise Nutrition and Health Software which you could give away as a prize/prizes - please can I have an email address so send through more info. email@example.com On another note - how do you know if someone has actually got 50 friends to join? Regards, Priya
Accommodation Hunter
- 11 May 2010 @ 13h26
Hi James, please note you need to enter on the facebook page. Good luck!
- 11 May 2010 @ 13h25
Done :-)
- 11 May 2010 @ 13h25
Done :-)
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2010 record: 14-0, 8-0 SEC
2011 projected record: 7-5, 3-5 SEC
Why we know we're right: Considering there has not been a repeat national champion since the 1995 season, Auburn has nowhere to go but down. With Russell Wilson looking at the Tigers as a potential landing spot before settling on Wisconsin, you know Auburn has some questions with QBs Barrett Trotter and Clint Moseley. Kiehl Frazier's progress will be interesting to watch. But this team is replacing a lot of starters from last season's team and should take some lumps.
Why we might be wrong: There may be no more Cam Newton to carry the offense, but the team still has Gus Malzahn running the show, and his offense put up numbers even before Newton was in charge. The team has outstanding running backs in Michael Dyer and Onterio McCalebb, and the lines on both side of the ball have talent, but are just largely untested. The Tigers have recruited extremely well the past two seasons, and talent can overcome experience.
Our confidence in this pick: Shaky. Relying on this much youth in the nation's toughest conference will be difficult. And considering three of the Tigers' first four significant games are on the road, that inexperience might be unable to handle going into Clemson, South Carolina and Arkansas and winning.
Judgment day: Sept. 10 vs. Mississippi State. The presumptive race for third place is on in the SEC West, and both of these teams are in the running, especially with Arkansas RB Knile Davis' season-ending ankle injury. The Rebels have momentum from last season in their favor, but the Tigers get to play this one at Jordan-Hare.
Coach's job security: Rock solid. Winning a national title has a way of building goodwill capital. Unless something comes of an ongoing NCAA investigation involving Cam Newton's recruitment, Chizik figures on being Auburn's top Tiger for years to come.
Grading the positions: QB (C), RB (A-), WR/TE (B-), OL (C), DL (B-), LB (B), DB (D), ST (C).