text:
Controversial call, Boeheim's ejection cost Syracuse at Duke
Syracuse's Tyler Ennis and C.J. Fair were trouble for Duke.
The Blue Devils' Rodney Hood, said his coach, was "the guy."
The 6-foot-8 Mississippi sophomore drew a charge from Fair on the baseline, leading to the ejection of Jim Boeheim with 10.4 seconds left as No. 5 Duke beat No. 1 Syracuse 66-60 Saturday night.
Duke point guard Quinn Cook iced the game by hitting 3-of-4 technical free throws to make it 63-58.
"We needed a big play," said Hood, who slid off Jerami Grant to help close the drive. "They've been in those kinds of games all season long. They're a veteran team in that situation. I wasn't guarding him, but I knew they were going to C.J."
And Boeheim said he found out he could still get on the court and into an official's grill.
"C.J. got into his motion, and the guy was moving," Boeheim said. "It's a new rule. It was a block."
Ironically, Hood was in a questionable call at Syracuse when Duke lost 91-89 in overtime on a dunk play.
"The basketball gods, they're the best," said Duke head coach Mike Krzyzewski. "They put Rodney in the two defining plays, the dunk that was maybe a foul up there, and the charge which I think was a charge today. He was in the play both times."
Ennis, along with Duke freshman Jabari Parker among the best rookies in all of college basketball, was adept all night at creating space with his dribble — and his body, much to the chagrin of the Blue Devils. Rasheed Sulaimon, who guarded Ennis, said the freshman has amazing basketball IQ.
"One thing about him, he knows how to change space," Sulaimon said.
Parker finished with 19 points and 10 rebounds while Hood had 13 points and seven rebounds for Duke (22-6, 11-4 ACC).
The Orange (25-2, 12-2 ACC), which lost to Boston College at home on Wednesday, were led by Grant with 17 points and eight rebounds.
Fair had 12 points and seven boards. Ennis, a superb floor general, finished with nine points, six assists, four steals and just two turnovers in 40 minutes.
"It seemed like both teams were scoring easy up at Syracuse and today it was really difficult to score," Krzyzewski said. "I don't know how either team could play any harder. What a great environment.
"Their celebration of basketball up there and our celebration here was phenomenal. It's what makes our sport so good."
Duke escaped the first half tied at 26 despite shooting 3-for-11 on 3-pointers and 3-for-9 at the foul line. It was also troubled by failing to generate offense from flashes to the high post. That changed in the second half.
"Our defense was really good," Krzyzewski said. "Their defense adjusted what they did in the zone. When we flashed, they stayed with shooters. Up there, when we flashed, they collapsed on shooters. They stayed with shooters today. What turned out to be a good move was putting Rodney in there.
"That part of the game was amazing."
As was the finish.
Contact the writer at email@example.com.


text:
Cypress Group
The Cypress Group is a private equity firm focused on leveraged buyout investments in companies across a range of industry sectors. At its peak in the late 1990s and early 2000s, Cypress was among the largest US private equity firms although by the end of the decade the firm would find itself in the process of winding down its operations.
Source: Wikipedia
Campaign Finance$45,195 Given
Figures are based on itemized contributions reported to the Federal Election Commission and state agencies. Please note that:
- contributions under $200 are not reported, and so are not included in totals.
- only contributions from individuals and organizations to candidates are included. Various accounting measures and more exotic contribution types are excluded.
- contributions are matched based on organization and recipient name reported within each election cycle. Contributions using an incorrect or non-standard version of the name may be missed.
- corporate name changes and mergers may cause figures to differ from those of the Center for Responsive Politics.
- organization totals include known subsidiaries of the organization.
For more information, please see our campaign finance methodology page. Lobbyist bundling data is described on our lobbyist bundling methodology page.
Top Recipients
- PAC Color Block
- Organization's PAC(s)
- Employee Color Block
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Republicans vs. Democratsin dollars
State vs. Federalin dollars
Top PAC Recipients
- PAC Color Block
- Organization's PAC(s)
- Employee Color Block
- Associated Individuals
RegulationsMentioned in 12 dockets
All data is based on documents downloaded from Regulations.gov. The first table shows mentions: all documents that include the name of the company anywhere in the document or document metadata. The second table shows submissions: all documents where the submitter metadata included the company name. Each table shows the top 10 dockets, ranked by number of occurrences.
Matches are based on a search for the company name. Variations in the company name, such as acronyms, nicknames or alternate names may cause documents to be missed. The mention of a company name in a document may be incidental and does not necessarily indicate that the company has any relevance to the document. Company names that are common English words may erroneously match with text that is not referring to the company.
Not all agencies submit public comments to Regulations.gov. For a list of participating and non-participating agencies see here. Agencies that do submit to Regulations.gov have varying levels of accuracy and completeness.
Regulations and public comments can be downloaded in bulk here.
The tables show occurrences of "Cypress Group" in public comments on proposed federal regulations.
Mentions in Document Text
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- Date
View all mentions data for Cypress Group
- Toggle 3 EPA Approval and Promulgation of Implementation Plans; State of Montana; State Implementation Plan and Regional Haze Federal Implementation Plan 2011
- Toggle 2 EPA Approval of San Joaquin Valley Rules 4402 and 4625; submitted February 23, 2012. 2012
- Toggle 2 EPA Approval and Promulgation of Implementation Plans, California 2007San Joaquin Valley 8-hour Ozone Plan and 2007 State Strategy 2011
- Toggle 2 EPA Partial Approval and Partial Disapproval of Air Quality Implementation Plans; California; San Joaquin Valley; Reasonably Available Control Technology for Ozone 2011
- Toggle 1 EPA Proposed Approval San Joaquin Valley APCD Rules 4570, submitted April 5, 2011 and 4565, submitted August 24, 2007; Final published under Docket EPA-R09-OAR-2011-0789. 2011
- Toggle 1 EPA OR Regional Haze Reasonable Progress Long Term Strategy 2012
- Toggle 1 EPA Final Rule for San Joaquin's Rule 4570 and Rule 4565 2011
- Toggle 1 CFTC Definitions: Swap Dealer, Security-Based Swap Dealer, Major Swap Participant, Major Security-Based Swap Participant and Eligible Contract Participant 2012
- Toggle 1 EPA Approval of Negative Declarations for Antelope Valley, San Joaquin Valley and Santa Barbara Air Districts submitted June 20, 2011 and San Joaquin Valley APCD submitted on June 18, 2009. 2012
- Toggle 1 EPA Proposed Approval of the following three rules: SC 1133.1 (amended) CHIPPING AND GRINDING ACTIVITIES; SC 1133.3 (new) EMISSION REDUCTIONS FROM GREENWASTE COMPOSTING OPERATIONS; SJV 4566 (new) ORGANIC MATERIAL COMPOSTING OPERATION 2012

subset: commoncrawl


text:
Hurricane Susan
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Join Date: Jul 2009
Location: Herefordshire, UK.
Posts: 18,613
Re: Hurricane Susan
Originally Posted by
Jeff Almeyda
This totally sucks.
My business was decimated by Hurricane Irene ast year. We had 46" of water inside the factory for almost 3 full days. Over 300K in damage.
The nearby neighborhood of Paterson NJ was devastated as well. There were blocks and blocks of low income housing that were wiped out. There was furniture on the city streets for weeks.
The anguish and human suffering seemed like something out of the Third World.
I pray with all my heart that we do not get anywhere near a repeat of last years tragedy.
Sounds terrible Jeff. Did you manage to recover your business losses? How about your new house? Even more important, your new drum room. Is that out of harms way in terms of flood threat?
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Register now for free, or sign in with any of these services:
Want to set your local edition?
Select an edition for more focused local news coverage when you visit AL.com.
Don't worry. You can change this setting at any time to another local edition.
I know what you're saying but the candidates are given the questions in advance in the spirit of fairness. The fifth candidate interviewed would obviously have an advantage over the first if the questions were provided in advance.
I don't have the breakdown on the demographics of those arrested.
valenkm: Sorry, I misunderstood your comment. I thought you were interested in the total number of DUI arrests from a year ago.
It's in the story: During the same time frame a year ago, six arrests for DUI were made, according to Huntsville police spokesperson Dr. Harry Hobbs.
Bob decided to leave The Times in September.
Uh...er....well, I guess the best way to melt would be to be "aware" you are doing it? On second thought, maybe melting "away" would be better.
I see your point but you could make this argument for most any story. But the reason this story is significant is because there is the consideration of closing a school. And understand it is just a consideration. The headline could just as well say that the system is considering keeping a school open. The news element is that they are considering closing it.
Disagree on the debate about the headline. The new superintendent is considering closing the school as an option. Consider this paragraph from the story: "This analysis involves a look into the operations of the Huntsville Center for Technology, the cost associated with a potential move into our high schools, the impact on student enrollment/achievement/progression within our various career readiness programs, and the current offerings and their alignment with the needs of society," King's email stated.
This is original reporting. This is the story that appeared in today's editions of The Huntsville Times. It is a longer story from the one posted Wednesday morning and includes far more context, including comments from UAH President Robert Altenkirch from an interview done Wednesday. We typically post breaking news immediately on al.com and update throughout the day. We also post the stories that appear in the newspaper. If you compare the stories, you will see some significant differences.
All, the percentage of Alabama A&M's enrollment drop has been corrected.
Along with UAH, Team Huntsville on this project included Marshall Space Flight Center, the U.S. Space and Rocket Center, Sci-Quest, Alabama A&M University, Oakwood University as well as other southeast regional universities, private sector companies and government laboratories.
To clarify, they are not identical posts. The first post was a short story written specifically for al.com immediately after the event. The second post was a longer story that actually appeared in Friday's Huntsville Times. The posts have different headlines because they are different stories, even if they are on the same topic. The videos are also different. Hope that clears up any confusion.
Dr. Portera did not take questions at Tuesday's press conference. Your question is one already on my list for today's trustees meeting. But I wouldn't expect Portera to disclose the names of any other candidates.
Sorry about any vagueness about when the ballons were released. We think it was Sunday because that's when the poems were dated. If we hear from the authors, we'll get that cleared up.
Not sure I understand how The Huntsville Times "has tried and convicted CBG." Please feel free to explain how we have done this? The information came from two sources: the press release detailed in the story and the Wayne County Jail.
Not a defense of Bentley but actually this was more of a pet project for former Gov. Bob Riley.
Florence is about 75 miles from Huntsville, FWIW....
Kevin Matthews, as compliance officer at the Alabama A&M Research Institute, is one of its top officials. As such, he has the credentials to speak for the institute.
Alabama A&M received federal stimulus money but those funds have now expired.
Sorry. Mistake. Fixed.


text:
Every time I think of something I want to do with RES Wisdom, I'm amazed at how easy it is to accomplish. For this example, the flow chart was more complicated to create than the actual Run Book.
What I wanted to do for this blog was create a Run Book that involved virtual machines. I thought of this very usable (I hope ;-) example in words:
– Create a Snapshot of a specific VM
– Implement changes to/in VM (e.g. Install SP2 on 2003 Server)
– If changes fail: revert to Snapshot
– Delete Snapshot
So, if a change to a VM fails, the machine is as "clean" as before!
Creating a flowchart from the words above resulted in this:
To build this Run Book I first created a Job to create a snapshot.
To make the Run Book easy to maintain and exchange (using Building Blocks), I used parameters for the server, the security context and the VM name.
On the Actions tab I selected "Create" and used a parameter for the Snapshot name.
In the same way, I created one job to revert the VM to the snapshot, and another job to delete the snapshot.
Then I created a Job to implement the change within the VM. For testing purposes the job I created was a changed the state of a service.
And, of course, I used a parameter for the service name so I could provide an existing (EventLog) or non existing (whatever) servicename.
When creating the Run Book I simply added the jobs in the right order.
Since Wisdom runs through all jobs sequentially and by default exits the sequence on error, I only had to do two things:
1) Continue Run Book on error on the "Implement Change" Job:
2) Set a condition on the "Revert" Job with "Status of previously executed Job = Failed". When this is True; "Execute this job". When it's false; "Skip this job":
After doing this I AutoCreated and AutoLinked the parameters. Since the ESX host probably won't change in the same environment I gave it a value and untagged the "Input new value when scheduling Job". The snapshot only exists within the Run Book, so I gave this a value as well; Wisdom@[GUID]. The last parameter I prefilled was the SecurityContext, which also won't change too often. The only two parameters you'll need to provide are the names of the VM and the service.
The really cool thing is, when the change fails (e.g. provide a service name that does not exist) Snapshot Intelligence kicks in because it notices a revert to snapshot. On the SI tab you can see the Job that failed so you can adjust it.
To create this Run Book for an ESX(i) server is very easy, since RES Wisdom 2009 natively supports this VMware version. However, I've tried it using VMware Workstation's VMrun command and this works just as good.
I'm convinced the same can be achieved for both XenServer and Hyper-V.
Your best bet would be to look at the PowerShell options for both hypervisors.
Now the only thing to watch out for is that, while scheduling the Run Book, you select the same machine to create the snapshot from as the VM you implement the change in (I'm talking from experience ;-).


text:
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Domestic Tyranny: The Making of American Social Policy Against Family ...By Elizabeth Hafkin Pleck
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text:
An apparatus for removing surface contaminants from a planar or irregularly shaped surface of a substrate by high-energy irradiation is provided. The invention enables removal of surface contaminants without altering the underlying molecular crystal structure of the substrate. The source of high-energy irradiation includes a pulsed or continuous wave laser or high-energy lamp.
1. An apparatus for removing contaminants from the surface of a substrate while preserving the molecular crystal structure of the substrate treatment surface, said apparatus comprising:
a source of gas inert to the substrate treatment surface:
a gas conduit for conveying a gas from said gas source, said gas conduit having a longitudinal axis and a discharge end being movable relative to the treatment surface;
a radiation conduit for conveying radiation to the substrate treatment surface, said radiation conduit having a longitudinal axis, an inlet end, and a discharge end, said discharge end being movable relative to the substrate treatment surface;
a source of radiation coupled to said inlet end of said radiation conduit and irradiating into said inlet end radiation having an energy density and duration sufficient to release surface contaminants from the substrate treatment surface but insufficient to alter the molecular crystal structure of the substrate treatment surface, said discharge end of said radiation conduit and said discharge end of said gas conduit being disposed so that gas discharged from said gas conduit flows across the portion of the treatment surface irradiated by radiation discharged from said radiation conduit; and
means coupled to said gas conduit for directing the flow of gas from said discharge end of said gas conduit radially outwardly away from the longitudinal axis of said gas conduit; and
means coupled to said radiation conduit for directing radiation from said discharge end of said radiation conduit radially outwardly away from the longitudinal axis of said radiation conduit.
2. The apparatus of claim 1 wherein said gas directing means and said radiation directing means comprises a multiple passage device mounted to the discharge end of said gas conduit and said radiation conduit.
3. The apparatus of claim 1 wherein said radiation conduit comprises a light pipe.
4. The apparatus of claim 1 wherein said radiation conduit comprises fiber optics.
5. The apparatus of claim 1 wherein said radiation source is a pulsed laser.
6. The apparatus of claim 5 wherein said pulsed laser operates in the ultraviolet range.
7. The apparatus of claim 1 wherein said radiation source is a continuous-wave laser.
8. The apparatus of claim 1 wherein said radiation source is a high-energy lamp.
9. The apparatus of claim 1 wherein said gas inert to the substrate treatment surface is a chemically inert gas.
10. The apparatus of claim 1 wherein the substrate treatment surface is disposed circumferentially about the interior of an elongated, enclosed passage and further comprising:
a head substantially conforming in cross-sectional profile to the cross-sectional profile of the interior of the passage and adapted to longitudinally traverse the passage, said discharge ends of said gas conduit and said radiation conduit and said gas flow directing means and said radiation direction means being disposed in said head, and said head having a longitudinal axis, a first end proximal to said gas conduit and a second end distal from said gas conduit and spaced from said first end along said longitudinal axis of said head.
11. The apparatus of claim 10 wherein said gas flow directing means is configured to preferentially discharge the gas toward said first end of said head to urge removed contaminants away from said second end of said head.
12. The apparatus of claim 10 wherein said gas flow directing means is configured to preferentially discharge the gas toward said second end of said head to urge removed contaminants away from said first end of said head.
13. The apparatus of claim 10 wherein said gas flow directing means is configured to discharge gas substantially symmetrically about said longitudinal axis of said head to center said head within the passage by the flow of gas from said gas flow directing means.
14. The apparatus of claim 10 further comprising a support structure mounted to said head, substantially circumferentially surrounding said head, and being adapted to center said head within the passage.
15. The apparatus of claim 14 wherein said support structure is porous to the flow of gas and is disposed between said second end of said head and said gas flow directing means and said radiation directing means thereby avoiding contact between said support structure and portions of the treatment surfaces that have been exposed to said radiation when said head is traversed through the passage with said second end of said head leading said first end of said head.
16. The apparatus of claim 10 further comprising a cap mounted to said head adjacent to said second end of said head, said cap having a cross sectional area slightly smaller than the cross sectional area of the passage thereby inhibiting the flow of gas from said gas conduit toward said cap.
17. The apparatus of claim 10 wherein said radiation directing means comprises a plurality of radiation passages and said gas flow directing means has a plurality of gas passages.
18. The apparatus of claim 17 wherein said radiation passages and said gas passages are configured to provide a substantially uniform distribution of gas and radiation across the treatment surfaces.
This application is a continuation of U.S. patent application Ser. No. 07/865,039, filed on Mar. 31, 1992, now abandoned, which is a continuation-in-part of U.S. patent application Ser. No. 07/611,198, filed Nov. 9, 1990, now U.S. Pat. No. 5,099,557 which is a Divisional of U.S. patent application Ser. No. 07/216,903, filed Jul. 8, 1983, now U.S. Pat. No. 5,024,968.
This invention relates to removing contaminants from a surface. More particularly, the invention relates to the removal of contaminants from a substrate surface by irradiation that does not alter the molecular crystal structure of the treatment surfaces.
Surface contaminants include discrete pieces of matter that range in size from submicrons to granules visible to the unaided eye. Such contaminants may be fine dust or dirt particles or unwanted molecules comprised of elements such as carbon or oxygen. Contaminants frequently become adhered to a surface by weak covalent bonds, electrostatic forces, van der Waals forces, hydrogen bonding, coulombic forces or dipole-dipole interactions, making removal of the contaminants difficult.
In certain instances, the presence of surface contaminants renders the contaminated substrate less efficient or inoperable for the substrate's designated purpose. For example, in certain precise scientific measurement devices, accuracy is lost when optical lenses or mirrors in the devices become coated with microfine surface contaminants. Similarly in semiconductors, surface defects due to minor molecular contaminants often render semiconductor masks or chips worthless. Reducing the number of molecular surface defects in a quartz semiconductor mask by even a small amount can radically improve semiconductor chip production yields. Similarly, removing molecular surface contaminants, such as Carbon or oxygen, from the surface of silicon wafers before circuit layers are deposited on the wafer or between deposition of layers significantly improves the quality of the computer chip produced.
Moreover, a significant portion of the debris that ultimately contaminates silicon wafers during production emanates from production apparatus such as process chambers in which the wafers are placed and pipes that conduct processing gas to the chambers. Accordingly, the level of wafer contamination experienced during the course of production can be significantly reduced by the periodic cleaning of such apparatus.
The need for clean surfaces free of even the finest contaminants has led to the development of a variety of surface cleaning methods. These known methods, however, each have serious drawbacks. For example, wet chemical cleaning eliminates metal ions and soluble impurities, but fails to remove particulates. Conversely, scrubbing techniques eliminate particulate, but employ devices that require regular maintenance and risk damaging the treatment surface due to physical contact. Similarly, pressurized fluid jet cleaning facilitates removal of particulates but risks damaging treatment surfaces due to the high pressure at which the cleaning fluid is maintained. Further, this technique may electrostatically damage the treatment surface due to the presence of ions in the cleaning fluid. Ultrasonic cleaning is a technique that may also result in physical damage to the treatment surface due to the intensity of sound waves being conveyed in the liquid medium. Additionally, "Megasonics," a high pressure chemical delivery system, may contaminate treatment surfaces with the contents of the very chemical solutions intended to remove contaminant. Similarly, strippable polymer tape may also contaminate treatment surfaces by depositing a polymer residue thereon. Finally, like "Megasonics" and polymer tape, each of the foregoing cleaning techniques employ cleaning tools and/or agents that can introduce as many new contaminants to a treatment surface as they remove.
Another known method for cleaning substrate surfaces without outside agents requires that the treatment surface be melted to release contaminants which are then removed by ultra high vacuum. This method has the disadvantage that the surface being treated must be briefly melted. Such melting may be undesirable, as for example when a semiconductor surface is cleaned between deposition of circuit layers and it is desired that the integrity of the previously deposited layers not be disturbed. Further, such an operation would be difficult if not impossible to implement for cleaning expansive, irregular surfaces, such as those found in pipes and wafer processing chambers. Finally, the ultra high vacuum equipment used in this process is both expensive and time consuming to operate.
Annealing treatment methods suffer similar drawbacks. When a surface is cleaned by annealing methods, the treatment surface of the substrate being cleaned is heated to a temperature that is generally below the melting point of the material being treated but high enough to enable rearrangement of the material's molecular crystal structure. The surface being treated is held at this elevated temperature for an extended period during which time the surface molecular crystal structure is rearranged and contaminants are removed by ultra high vacuum. Annealing cleaning methods cannot be used where it is desired to maintain the molecular crystal structure of the substrate surfaces.
Another currently utilized cleaning method, known as ablation, suffers from its own particular drawbacks. With ablation, a surface or contaminants on a surface are heated to the point of vaporization. Depending on the material being ablated, the material may melt before being vaporized or the material may sublimate directly on heating. With ablation cleaning techniques, if damage to the treatment surface is to be prevented, the ablation energy must be applied accurately to the contaminants only, rather than the surface on which the contaminants lie, a difficult task when the contaminants are extremely small or randomly spaced, or when the surface being treated is irregularly shaped. Even where the ablation energy can be successfully applied only to the contaminant, it is difficult to vaporize the contaminant without also damaging the underlying treatment surface.
Surface cleaning by melting, annealing and ablation can be conducted with a laser energy source. However, using a laser energy source to remove contaminants from a surface by melting, annealing or ablation does not overcome the inherent disadvantages of these processes. For example, in U.S. Pat. No. 4,292,093, "Method Using Laser Irradiation For the Production of Atomically Clean Crystalline Silicon and Germanium Surfaces" the laser annealing method disclosed requires both vacuum conditions and energy levels sufficient to cause rearrangement and melting of the treatment surface. Other known laser surface cleaning methods involving melting or annealing require similar high energy lasing and/or vacuum conditions, as disclosed in U.S. Pat. Nos. 4,181,538 and 4,680,616. Similarly the laser ablation technique disclosed in U.S. Pat. No. 3,464,534, "Laser Eraser" suffers the same drawbacks as other high energy ablation methods.
The invention solves the problems and avoids the drawbacks of the prior art by removing surface contaminants from the surface of a substrate without altering the molecular crystal structure or otherwise damaging the surface being treated. Gas is flowed across the substrate treatment surface and the substrate is continuously irradiated at an energy density and duration great enough to release surface contaminants from the substrate treatment surface and small enough not to alter the molecular crystal structure of the substrate treatment surface. The irradiation source may be any means known in the art such as a pulsed or continuous wave laser or high-energy lamp. Preferably the radiation is generated by a pulsed ultraviolet laser. The invention can be beneficially applied for removing surface contaminants from a generally planar semiconductor substrate before, between and after deposition of the circuitry layers on the semiconductor substrate. It may also be applied to irregularly shaped surfaces or, more specifically, surfaces lying in non-coincidently related planes. Such planes encompass all possible relationships between the surfaces of a substrate except those occupying the same space or plane. For example, surfaces that are parallel or angularly related, such as opposing interior walls of a pipe or adjacent walls in a cubical chamber, respectively, occupy non-coincidently related planes.
FIG. 1 is a schematic diagram of a contaminant removal method and apparatus according to the invention.
FIG. 2 is a schematic diagram showing how laser radiation is applied in one embodiment of the invention to remove contaminant from relatively planar treatment surfaces.
FIG. 3 is a schematic diagram showing how laser radiation is applied in another embodiment of the invention to remove contaminant from relatively planar treatment surfaces.
FIG. 4 is a schematic diagram showing the use of a mask in combination with radiation and gas applied in accordance with the invention to remove contaminant from relatively planar treatment surfaces.
FIG. 5 is a schematic diagram of a contaminant removal apparatus for removing contaminant from irregularly shaped treatment surfaces according to the invention.
FIGS. 6 through 11 are schematic end views of apparatuses for conveying gas and radiation to irregularly shaped treatment surfaces according to the principles of the invention.
FIGS. 12 and 13 are schematic side views showing how the invention of FIG. 5 may be applied to remove contaminant from the interiors of elongated, enclosed passages.
FIG. 14 is an schematic end view of an apparatus for conveying gas and radiation to irregularly shaped treatment surfaces according to the principles of the invention.
FIG. 15 is a partial plan view of the apparatus illustrated in FIG. 14.
FIG. 16 is a partial plan view of another configuration of an apparatus for conveying gas and radiation to irregularly shaped treatment surfaces according to the principles of the invention.
FIGS. 17 and 17a are schematic side views showing application of the invention of FIG. 5 with a flexible, porous centering support structure.
FIG. 18 is a schematic side view showing application of the invention with an optic diffuser.
FIGS. 19 and 20 are schematic side views showing how the invention of FIG. 5 may be applied to remove contaminant from process chamber interiors.
FIGS. 21 and 22 are schematic side views showing how the invention of FIG. 5 may be applied to remove contaminant from the exteriors of irregularly shaped objects.
FIGS. 23 and 24 are schematic side views showing how radiation is applied in another embodiment of the invention to remove contaminant from ducted interiors.
FIGS. 25 and 26 are schematic end and side views, respectively, showing how radiation is applied in another embodiment of the invention to remove contaminants from the exteriors of irregularly shaped objects.
Reference will now be made in detail to presently preferred embodiments of the invention, examples of which are illustrated in the accompanying drawings. Throughout the drawings, like reference characters are used to designate like elements.
1. Treatment Method
A method and apparatus for removing surface contaminants from the surface of a substrate without altering the molecular crystal structure or otherwise damaging the substrate surface is illustrated schematically in FIG. 1. As shown in FIG. 1, an assembly 10 holds a substrate 12 from which surface contaminants are to be removed. A gas 18 from gas source 16 is constantly flowed over substrate 12. Gas 18 is inert to substrate 12 and is flowed across substrate 12 so as to bathe substrate 12 in a non-reactive gas environment. Preferably, gas 18 is a chemically inert gas such as helium, nitrogen or argon. An enclosure 15 for holding substrate 12 communicates with gas source 16 through a series of tubes 21, valves 22, and a gas flow meter 20.
According to the embodiment of the invention shown in FIG. 1, enclosure 15 comprises a stainless steel sample reaction cell fitted with opposing gas inlet and outlet ports 23, 25 respectively. Enclosure 15 is fitted with a sealed optical grade quartz window 17 through which radiation can pass. Inlet and outlet ports 23, 25 may comprise, for example, stainless steel tubing fitted with valves. After sample 12 is placed in enclosure 15, enclosure 15 is repeatedly flushed and backfilled with gas 18 and is kept at a pressure slightly above ambient atmospheric pressure to prevent inflow of other gases. Although enclosure 15 is shown as a solid chamber, it is anticipated that a surface being cleaned could be enclosed in any type of enclosure through which a gas can be flowed. For example, if the surface being treated is a large fixed object, a large portable enclosure such as a plastic bag might be utilized.
Flow of gas 18 may be regulated by flow meter 20 which, in the preferred embodiment, is a Matheson Model 602 flow meter. Valves 22 are preferably metering, regulating or bellows valves suitable for high temperature and pressure applications and for use with toxic, hazardous, corrosive or expansive gases or liquids, as for example "Swagelok SS-4H"™ series valves by Swagelok Co. of Solon, Ohio. Valves 22 can be opened or closed to isolate enclosure 15, to place enclosure 15 in communication with gas source 16 or to place enclosure 15 in communication with another substance, such as a gas for depositing on substrate 12, coming from an alternate source 40.
According to the method of the invention, high-energy radiation is irradiated upon the substrate treatment surface at an energy density and duration between that required to release surface contaminants from the substrate treatment surface and that which will alter the molecular crystal structure of the surface. According to the embodiment of the invention shown in FIG. 1, a radiation source 14 which may be a laser or high-energy lamp generates radiation 11 directed against the treatment surface of substrate 12. In FIG. 1, source 14 is shown as being outside enclosure 15 and irradiating sample 12 through quartz window 17. However, it is contemplated that source 14 could alternatively be placed within the enclosure 15.
The energy flux and the wavelength of the high-energy irradiation are preferably selected to be dependent upon the surface contaminants being removed. To this end, a gas analyzer 27 may be connected to outlet port 25. Analyzer 27 analyzes the contents of exhaust gas from enclosure 15 to facilitate selective energy and wavelength adjustment of source 14. Gas analyzer 27 may be a mass spectrometer as, for example, a quadrapole mass spectrometer manufactured by Bruker Instruments, Inc. of Billerica, Mass. or by Perkin Elmer of Eden Prairie, Minn.
Selection of the source of irradiation used in the invention depends upon the desired radiation energy and wavelength. The energy level of the radiation in electron volts/photon (Ev/photon) is preferably at least twice the energy necessary to break the bonds adhering the contaminants to the surface being cleaned. The bond energies between common contaminants (such as carbon and oxygen) and common substrate materials (such as silicon, titanium, germanium, iron, platinum and aluminum) range between 2 and 7 Ev/bond, as disclosed in Handbook of Chemistry and Physics, 68th ed., pp. F-169 to F-177 (CRC Press 1987). Accordingly, radiation sources emitting photons with energies in the range of 4 to 14 Ev/photons are desirable. The wavelength should be below the wavelength that would compromise the integrity of the substrate surface by the well-known photoelectric effect, as described in G. W. Castellan, Physical Chemistry, 2d ed., 458-459 (Academic Press, 1975) which is hereby incorporated by reference. The preferred wavelength depends on the molecular species being removed and the resonance states of such species.
Any means known in the art for generating radiation of a suitable energy level may be used in the invention, including high-energy lamps and lasers. Depending upon the application, it is anticipated that light energy from such sources may range from deep ultraviolet to infrared, with corresponding wavelengths from 193-3000 nm, respectively.
The wavelengths and photon energies of a number of suitable lasers are listed in Table 1, below.
TABLE I______________________________________Laser Wavelength (nm) Ev/photon______________________________________XeCl, pulsed 308 4.04argon-ion, continuous 257 4.83waveKrF, pulsed 248 5.01ArF, pulsed 193 6.44Tunable dye lasers, 200-800 6.22-1.55pulsed or continuouswave______________________________________
These lasers are described in greater detail in the following references: M. J. Webber, ed., CRC Handbook of Laser Science, Vols. 1-5 (1982-1987); Mitsuo Maeda, Laser Dyes (Academic Press 1984); and laser product literature from Lambda Physik at 289 Great Road, Acton, Mass., Coherent, Inc. at 3210 Porter Drive, Palo Alto, Calif., and Spectra-Physics at 1250 West Middlefield Road, Mountain View, Calif. It is anticipated that high-energy xenon or mercury lamps or other types of lasers, including visible, ultraviolet, infrared, x-ray or free electron lasers might be utilized as appropriate sources of radiation.
According to the invention, the irradiation directed against the substrate treatment surface from which contaminants are being removed has a power density less than that required to alter the molecular crystal structure of the surface. Preferably, the power density and duration of the irradiation are selected so as to impart an amount of energy on the substrate surface that is significantly below the energy required for alteration of the substrate surface structure. The preferred energy level is dependent on the composition of the substrate being treated. For example, with certain substrate materials such as plastics, this energy level would be much lower than for other materials such as high strength carbide steels. The heats of formation for various materials are well known and are reported in the Handbook of Chemistry and Physics, 68th ed., pp. D33-D42 (CRC Press 1987). The heat of formation generally corresponds to the amount of heat required to break down various materials and can be used as a guideline in selecting an irradiation energy density and duration that will not alter the molecular crystal structure of the treatment surface. The heats of formation of a number of common substrate materials are summarized in Table II, below.
TABLE II______________________________________Material Heat of Formation______________________________________Al2 O3 16906.7 kJ/mol; 17.52 Ev/moleculeSiO2 840.3 kJ/mol; 9.11 Ev/moleculeNb2 O5 1528.2 kJ/mol; 13.27 Ev/moleculeNiO 230.6 kJ/mol; 2.50 Ev/moleculeTi2 O3 500.2 kJ/mol; 15.63 Ev/molecule______________________________________
The irradiation energy density and duration used in the present invention is such that the heat of formation is not approached on the substrate treatment surface. Finding the maximum energy usable on a given substrate material, however, will require some experimentation in light of the material's known heat of formation. Such experimentation ensures that annealing, ablation and melting will not occur.
When a substrate surface is irradiated as described above, the bonds and/or forces holding surface contaminants to the substrate surface are broken and the inert carrier gas carries contaminants away from the substrate surface during irradiation..As long as the cleaned substrate remains in the inert gas environment, new contaminants will not form on the substrate surface. If necessary, a suitable trapping system may be connected to enclosure outlet 25 for trapping and neutralizing removed contaminant species.
2. Planar Treatment Surfaces
A planar substrate being treated in accordance with the invention may be selectively irradiated with a laser. As shown in FIG. 2, for example, substrate 12 is fixed on an XY table 13, which is selectively moved with respect to a fixed beam of laser pulses 11' that are generated by a laser 14', directed through a beam splitter 24 and a focusing lens 28 before contacting selected portions of the surface of substrate 12 over which inert gas 18 flows. Alternatively, as shown in FIG. 3, laser pulses 11' may be split by beam splitters 30, 32 into two sets of pulses which are selectively moved by adjusting mirrors 34-37 over the surface of substrate 12 on a fixed table 19. A laser power meter 26, measuring energy directly from the laser, allows for close monitoring of the laser power being applied to the substrate. Suitable laser power meters are available from Digirad of Oriskany, N.Y. and Scientech, Inc. of Boulder, Colo.
Furthermore, selective irradiation of a planar surface may be achieved through the use of a mask, similar to that used in the semiconductor industry, placed between the source of radiation and the treated substrate. As shown in FIG. 4, mask 9 facilitates selective irradiation of substrate 12 secured to fixed table 19 by limiting access of radiation 11 to substrate 12 through mask passages a. As detailed in FIG. 1, enclosure 15 comprises a stainless steel sample reaction cell fitted with opposing gas inlet and outlet ports 23, 25, respectively, and sealed optical grade quartz window 17 through which radiation can pass.
It is anticipated that high-energy lamps may also be used to irradiate planar surfaces in configurations similar to that disclosed in FIGS. 2 through 4.
The following examples illustrate application of the method of the invention on generally planar treatment surfaces. In Example I, various energy densities of a pulsed KrF excimer laser are applied to a silicon oxide substrate with varying degrees of success. In Example II, the need for the invention in the area of optical components is examined.
The native oxide of silicon is necessary for the promotion of thin film growth on semiconductor surfaces. Unfortunately, when semiconductor surfaces of silicon oxide are exposed to the environment, carbon contaminants adhere weakly to the semiconductor surface. The presence of these contaminants greatly reduces the conductivity or the insulating nature of the thin film to be deposited. Therefore, in semiconductor production, great precautions are taken to minimize environmental exposure through the use of elaborate vacuum, chemical and mechanical techniques. Vacuum techniques are expensive especially if high or near ultra high vacuum is used to keep surfaces clean between processing steps. Chemical (wet and dry) and mechanical techniques can damage the substrate treatment surface and, if the substrate being treated is a processed integrated circuit, the underlying structure.
In an attempt to overcome these problems, radiation from a pulsed KrF excimer laser whose fundamental wavelength is 248 nm (UV range) was applied to the surface of a silicon substrate in a sealed box through which argon gas was flowed. To decrease surface carbon contamination and decrease carbon percentage associated with chemisorbed organometallic (trimethyl aluminum), a precursor to aluminum thin film formation in semiconductor production, irradiation of 35 mj/cm2 for 6000 laser shots at a 10 Hz repetition rate was applied to a silicon oxide substrate surface with the KrF excimer laser. The laser treated surfaces were exposed during a continuous flow of argon gas at a flow rate of 16 l/hr under a 1.03�103 torr backing regulator pressure. After treatment, X-ray Photoelectron Spectroscopy ("XPS") analysis showed the substrate exhibited a significant decrease in surface carbon from a pretreatment average surface carbon covering 30-45% of the substrate surface to an after treatment average surface carbon covering 19% of the substrate surface. The substrate surface itself showed no damage or alteration.
A surface treated by a laser irradiation as described above and then exposed to an organometallic gas flow showed, by XPS analysis, that 20.8% of the substrate surface was covered with carbon as compared to 40-45% of the substrate surface that was covered with carbon after organometallic gas exposure on a non-laser treated surface. When the laser was applied, as described above, both prior to exposure to organometallic gas and again after gas exposure, only 8.9% of the surface was covered with carbon. Areas adjacent to the laser-exposed areas also exhibited some effects of the laser-cleaning treatment. Areas adjacent to the treated area showed a reduced carbon level of 12.7 percent. This effect probably is due to the gaussian nature of the applied laser pulse.
Transfer of the wafer from the sample cell to the XPS analyzer was via an argon filled glove box. The silicon wafer was transferred to the XPS through an inert UHV transfer rod. This kept environmental exposure to a minimum.
Another wafer of silicon oxide, while exposed to argon gas as described above, was exposed to pulsed KrF excimer laser irradiation of 9 mj/cm2 for 6000 shots at a 10 Hz repetition rate. XPS analysis showed a surface carbon coverage of 40-45% both before and after laser treatment. Thus, irradiation at 9 mj/cm2 did not remove adsorbed surface carbon.
Another wafer or silicon oxide, while exposed to argon gas as described above, was exposed to pulsed KrF excimer laser irradiation of 300 mj/cm2 for 6000 shots at a 10 Hz repetition rate. At the end of treatment, the substrate surface had suffered significant damage, including a hole through the substrate. Thus, irradiation at 300 mj/cm2 altered the molecular crystal structure of the substrate surface.
These examples show laser irradiation at an appropriate energy flux and wavelength can decrease surface contamination without damaging underlying surface or adjacent structures.
It is expected, in view of the heat of formation of SiO2, that subjecting a silicon oxide substrate surface to pulsed KrF excimer laser irradiation of less than 100 mj/cm2 for 6000 shots at a 10 Hz repetition rate would not alter the molecular crystal structure of the substrate. Pulsed KrF excimer laser irradiation of less than 75 mj/cm2 for 6000 shots at a 10 Hz repetition rate is not expected to alter a silicon oxide substrate surface in any way.
High energy optical components are difficult to fabricate for such technologies as laser fusion, x-ray lithography and UV excimer laser optics. Laser fusion and x-ray lithography technologies are used exclusively in "clean" environments. Excimer laser optics have a short work life span because with current commercial film deposition technology, it is difficult to fabricate films capable of withstanding prolonged high-energy fluxes.
A perennial problem with high energy optics is optical breakdown. This phenomena can be described as "the catastrophic evolution of damage inflicted in a transparent medium in a strong laser field." Y. R. Shen, Principles of Nonlinear Optics, 1st ed., 528-540 (Wiley Interscience 1984). This phenomena occurs in solids as well as gases. With a solid, such as a high energy optic, optical breakdown is exacerbated by the presence of a surface defect such as scratches and pores in the bulk material. In most cases, optical breakdown is due to surface contamination such as adsorbed dust particles. The presence of these contaminants lowers the breakdown threshold which in turn limits the maximum laser power that can be used from a given laser system. This fact is a very important limitation regarding the pumping of a laser medium (solid state or gaseous) by an external pump energy source. This, in turn, limits the laser power that can be used to transmit energy through optical windows, lenses and other optical components.
Optical breakdown, for example on a solid, is promoted by the presence of surface adhered contaminants. The interaction of a laser pulse train with a sufficient energy cross section may deposit enough energy to generate an "avalanche" ionization on the solid surface. This can form a surface plasma which may disintegrate the solid. The presence of contaminants effectively decreases the laser's efficiency and decreases its use in potential applications.
To overcome the above described problems, the contaminant removal method, as described herein, can be used to remove adhered contaminants such as adsorbed dust. For example, to treat an optical component, the component is exposed to a continuous flow of argon gas during which time a pulse KrF excimer laser is directed at the surface of the optical component. The laser is tuned to an appropriate energy-flux and wavelength that is considerably less than the high energy pulse required to promote ionization and subsequent plasma in high energy optics. The optical component surface is irradiated at the selected flux and wavelength for a duration sufficient to remove adsorbed contaminants.
2. Irregularly Shaped Treatment Surfaces
The embodiments disclosed in FIGS. 2 through 4 are directed primarily towards the treatment of planar or flat substrates, such as silicon wafers. Accordingly, their application is restricted to those substrate surfaces that may be conveniently secured within a process chamber and configured to permit adequate exposure to a source of radiation emanating from a generally fixed location.
Alternatively, FIGS. 5 through 26 disclose embodiments of the invention capable of removing surface contaminants from objects having irregularly shaped internal and external substrate surfaces or, more specifically, surfaces that lie in non-coincidently related planes. Such planes encompass all possible relationships between the surfaces of a substrate except those occupying the same space or plane. For example, surfaces that are parallel or angularly related, such as opposing interior walls of a pipe or adjacent walls in a cubical chamber, respectively, occupy non-coincidently related planes.
Significantly, the apparatuses disclosed in FIGS. 2 through 4 are incapable of treating such substrate surfaces. These apparatuses are strictly limited to singularly planar substrates. Conversely, the apparatuses in FIGS. 5 through 26 may effectively treat surfaces occupying non-coincidently related planes either sequentially or simultaneously, as discussed more fully below.
Although not shown in these figures, a gas analyzer 27, such as that described above, and/or particle detector may be incorporated into these embodiments to facilitate selective energy and wavelength adjustment of source 14 as described above. Suitable particle detectors may be obtained from Particle Measuring Systems, Inc. of Boulder, Colo. and Tencor Instruments of Mountain View, Calif.
FIG. 5 schematically illustrates an apparatus 80 for removing contaminants from elongated enclosed passages, such as pipes 71. Radiation from a radiation source 14 is conducted through a radiation conduit 50, which is an optical waveguide such as a bundle of optical fibers or light pipe, while a gas inert to the substrate treatment surface is conducted from gas source 16 to the treatment surface via gas line 51. Radiation conduit 50 and gas line 51 merge at or before cable head 53, where they may be "bundled" into a single cable 52. Cable head 53, connected to the end of cable 52, includes radiation passages 54 (which may be one or more optical fibers) and gas passages 55. Various configurations of cable head 53 are illustrated in cross section in FIGS. 6-11.
The geometric shape and configuration of radiation passages 54 and gas passages 55 at the end of cable head 53 may be selected based upon the intensity and distribution of radiation and/or gas turbulence required for a particular application (i.e., elongated enclosed passages or more expansive, planar surfaces). For example, FIGS. 6 and 7 disclose configurations that are biased toward enhanced radiation exposure and gas turbulence, respectively. Further, FIGS. 6-9 provide geometries that convey an uneven amount of gas and/or radiation as they repeatedly pass normally over a surface. These are contrasted with the even distribution of gas and radiation provided by FIGS. 10 and 11 when directed normally to a surface. Alternatively, FIGS. 8 and 9 provide a relatively uniform distribution of gas and radiation when applied to surfaces generally parallel to the axis of cable head 53, as discussed more specifically below. Although gas and radiation control is enhanced through the use of cable head 53, it is anticipated that in certain applications this element may be eliminated altogether, allowing gas and radiation to simply emanate directly from the ends of gas conduit 51 and radiation conduit 50.
In addition to facilitating multiple radiation passages 54 and gas passages 55, cable head 53 provides means for redirecting the radiation and gas to substrate treatment surface 70. Such redirection is necessary when apparatus 80 is used for cleaning the interiors of narrow passages such as pipes 71, as shown in FIGS. 12 and 13, where the axis of cable head 53 must be generally parallel to the treatment surface 70.
As shown in FIG. 15, radiation passage 54 and gas passage 55 flare outwardly from the centerline of cable head 53, thereby directing both the radiation and gas flow toward the inner walls of the passage to be cleaned. The angle of the flare from the centerline of cable head 53 may range from only a few degrees to more than 90� as shown in FIGS. 15 and 16, respectively. The configuration of cable head 53 is application-specific, related to gas flow rate and photon delivery requirements for contaminant removal. More specifically, cable head 53 directs radiation at the appropriate density and angle of incidence for a particular contaminant and substrate while maintaining a continuous flow of inert gas across that portion of the substrate being irradiated.
In operation, apparatus 80, and more specifically cable 52 and cable head 53, may traverse an elongated, enclosed passage 71 in either a forward or reverse direction, as shown in FIGS. 12 and 13, respectively. When moving forward, as denoted by arrow 60 in FIG. 12, cable head 53 may be configured as shown in FIG. 15. Radiation passage 54 and gas passage 55 may be disposed in the inner and outer passages, respectively, of cable head 53. In this way, the irradiation of substrate surface 70 from energy conveyed through radiation passage 54 will occur downstream from the flow of gas emanating from the discharge end of gas passage 55, and any dislodged contaminants will be continually pushed ahead of cable head 53 by discharged gas as the cable head moves forward.
Alternatively, cable head 53 may move in a reverse or backward direction denoted by arrow 61 of FIG. 13. When moving backwardly, cable head 53' may be configured as shown in FIG. 16. Radiation passage 54 and gas passage 55 may be disposed in the outer and inner passages, respectively, of cable head 53'. Gas discharged from gas passage 55 flows back along cable 52 in the annular space between the cable and pipe 71. In this way, the portion of substrate surface 70 being irradiated by energy conducted through radiation passage 54 will be blanketed by the gas, and any dislodged contaminants will be continually pushed by gas in the direction of movement of cable head 53' as the cable head moves backwardly along the pipe. To prevent contaminant-laden gas from passing into the portion of the pipe already treated, a cap may be placed at the end of the pipe nearest the portion first .treated. Alternatively, a cap 53a', as illustrated in FIG. 16, may be mounted on the end of the cable head 53'. This cap has an outside diameter slightly less than the inside diameter of pipe 71, so that the annular flow area between the cap and the pipe is much less than the annular flow area between pipe 71 and cable 52 or cable head 53'. The gas will therefore flow away from cap 53a' and toward cable 52.
In both forward and backward moving configurations, the constant flow rate of the inert gas discharged from gas passage 55 is sufficient to move the contaminants away from the area of treatment. This flow of gas may also serve as a means for centering cable head 53 within elongated enclosed passages to be cleaned. As shown in FIGS. 14-16, gas passage 55 may be configured as an annular ring directed outwardly from the centerline of cable 52. Should sufficient gas pressure be applied, the uniform, outwardly directed gas from gas passage 55 may center cable head 53 within an elongated, enclosed passage.
Alternatively, flexible, porous support structure 56, composed of a stable and non-particle shedding material, may be placed around cable head 53 for centering purposes, as shown in FIGS. 17 and 17a. To avoid contaminating cleaned surfaces, support structure 56 should never contact treated surfaces, whether cable head 53 moves in a forward (arrow 60) or reverse (arrow 61 ) direction. Thus, support structure 56 should pass over the substrate surface ahead of the radiation treatment. In such an application, the structure must be sufficiently porous to allow gas and dislodged contaminant to flow through it as cable head 53 traverses the enclosed passage. In the forward moving embodiment shown in FIG. 17, gas passages 55 and radiation passages 54 (not shown) may exit from the side of cable head 53 rather than from its face as illustrated in FIGS. 14 and 15 to enable installation of support structure 56 downstream of gas and contaminant flow.
Where the interior of an elongated, enclosed passage is constructed from sufficiently reflective material, such as basic annealed 316 stainless steel, a high-energy lamp, or radiation conduit 50 with an optical diffuser 57 mounted to its end, may simply emit radiation 11 at the entrance to the passage and allow resulting radiation 11 to reflectively traverse the interior 70', as shown in FIG. 18. The interior 70' of elongated passage 71' is sufficiently reflective to enable radiation 11 to traverse the interior without moving the source of radiation. Inert gas flow 18, conveyed to the entrance of passage 71' by any means known in the art, ensures particulate is moved downstream once dislodged from substrate surface 70'. In addition, reflector 58, which may also be constructed from 316 stainless steel, is secured to the perimeter of the entrance of passage 71' to prevent back flow of radiation and gas.
It is also anticipated that a liquid, rather than a gas, may serve as the inert medium to carry away contaminants dislodged through irradiation from narrow, elongated passages. Such a modification would be particularly useful in the removal of plaque from the interior walls of blood vessels. In such an application, the applied radiation would be characterized by an energy density and duration between that required to release surface contaminants from the treatment surface and that which would not damage or traumatize the composition of the vascular structure.
Analogous to elongated, enclosed passages, apparatus 80, or more particularly cable 52 and cable head 53 may be utilized to clean more expansive interiors such as those of process chambers. In such instances, cable head 53 may be configured without a flare, so that radiation and inert gas are directed straight out the end of the cable along the cable axis. Manual or robotic control may be employed to guide the assembly as it sweeps across such surfaces.
In FIG. 19, for example, chamber 15" includes a gas inlet embodied in gas passage 55 of cable head 53, and gas outlet 25. Within the chamber, robotic arm 81 attached to base 83 provides means for moving cable head 53 about the interior walls of the chamber, identified as substrate treatment surface 70. The arm may spin a complete 360�, and base 83 may move up and down as denoted by arrow 62 providing complete access to the interior of the chamber. As radiation and gas are conveyed to substrate treatment surface 70 by means of passages 54 and 55 of cable head 53, contaminant is dislodged from the surface and is drawn to outlet 25 by means of gravity and gas flow.
Alternatively, FIG. 20 illustrates a chamber cleaning arrangement wherein the gas outlet 25 is positioned at the top of the chamber. As in FIG. 19, robotic arm 81 attached to base 83 provides means for moving cable head 53 about the interior walls of the chamber. In this instance, however, gravity may not be relied upon to draw dislodged contaminant toward gas outlet 25. As such, a secondary gas flow is provided as indicated by arrow 55' to maintain a constant turbulence at the base of chamber 15". This secondary flow creates constant movement of gas toward outlet 25 extending the full depth of the chamber. Accordingly, as the substrate surface 70 is cleaned from bottom to top, contaminant is carried by the upward flowing gas stream produced by secondary flow 55' and expelled through outlet 25. It is anticipated that one or more secondary sources of gas may be added to chamber 15" to accommodate different chamber geometries and gas outlet positions (i.e., side mounting).
In addition to interiors, cable 52 and cable head 53 may be used to remove contaminant from exteriors of irregularly shaped objects. For example, in FIG. 21, chamber 15' is fitted with gas inlets 23 and outlets 25 to enable a bulk gas flow 18 to traverse the chamber. Within the chamber, robotic arm 81 attached to base 82 provides means for moving cable head 53 about object 72, which includes substrate treatment surface 70. Access to the entire surface 70 of object 72 is facilitated by turntable 84. Passages 54 and 55 within cable head 53 convey radiation and sufficient gas flow to the specific area being treated so to dislodge contaminant from substrate surface 70. Once dislodged from the treatment area, contaminant enters the bulk flow gas stream 18 and is removed from chamber 15' via gas outlet 25. As mentioned above, this exiting gas may be monitored through the use of a gas analyzer and/or particle detector to facilitate selective energy and wavelength adjustment of radiation source 14 (not shown).
The principles in FIG. 21 apply equally to FIG. 22 wherein object 73 includes a more planar substrate treatment surface 70 such as that found on a painting.
It is anticipated that the exteriors of irregularly shaped objects may be successfully treated through the foregoing process without the use of a chamber, relying solely on gas supplied by conduit 51. Such an apparatus may be in the form of a hand-held device wherein sufficient decontamination is measured by visual inspection rather than through a gas analyzer and/or particle detector.
In some irregularly shaped surface applications, it may be advantageous to alter apparatus 80 by separating the gas from the radiation transmission means altogether. For example, when removing contaminants from the interior of a process chamber, one or more radiation sources, such as an ultraviolet lamp, may be placed within the chamber via support 85 as shown in FIG. 23. As the ultraviolet lamp irradiates the chamber interior 70 (substrate treatment surface), gas 18 may be provided from one or more inlets 23 to expel dislodged contaminant from the chamber 15"' via outlet 25. Gas flow 18 may be controlled by valves 22 as described above. Alternatively, radiation may be conveyed to the interior of chamber 15"' via conduit 50 and robotic arm 81 as shown in FIG. 24.
Finally, as illustrated in FIGS. 25 and 26, radiation may be generated by means of a bank of high-energy lamps 59 which essentially bathe the substrate treatment surface 70 of object 74 with a sufficient level of radiation to dislodge contaminant. Object 74, which may be an armored vehicle, is exposed to lamps 59 within "Quonset" hut 85, while inert gas 18, accelerated by fan 86, flows over the substrate surface 70. Where geometrically shielded areas may escape the gas turbulence created by fan 86 or radiation generated by bank 59, one or more apparatuses 80 (not shown) may be employed to access these areas.
Patent Citations
Non-Patent Citations
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text:
Jersey Shore
Snooki Opens Up About Adoption
Even though the Jersey Shore cast is forever linked with all things Italian, not everyone on the cast has roots in Italia.
Snooki, one of the show's most infamous cast mates and the most vocal admirer of "Italian gorilla juiceheads," is actually ethnically Chilean and was adopted by her Italian-American parents at a very young age. The 23-year-old star recently opened up on the Johnjay and Rich radio show about her adoption story.
"I was adopted at six months from Chile," Snooks tells the radio hosts. "[My biological parents] gave me up for a reason and I honestly love my parents. I have no desire to actually find out [about my biological parents]."
And the rest, as they say, is history. Snooki was adopted from the tumultous political climate of '80s Chile and jetted off to the glamorous world of upstate New York, where she eventually worked her way up to reality star status.
Snooki isn't the only guidette who isn't 100% Italian. JWOWW is only part Italian and has roots in Spain and Ireland, and Ronnie is actually half Puerto Rican and half Italian. Maybe this explains why so few of the cast members knew Italian when they traveled to Italy!
In any case, we wonder if Snooki's biological parents know that their little girl is famous in the United States for partying front of MTV's cameras. Oh, how different our world would have been if Snooks stayed in Chile!


text:
July 30, 2015
BASTROP, Texas (AP) Volunteers by the dozens have been helping to restore pine forests in Central Texas that were destroyed by wildfires in 2011.
The Austin American-Statesman reports the volunteers have come from across the United States and Canada to help restore the Bastrop County forests, including in Bastrop State Park.
It's been a challenge, though. Jamie Hackett, who is superintendent of the state park, says only about 13 percent of the 250,000 seedlings planted last year survived last winter. She blames the mortality rate on the continuing drought in that area, which is about 30 miles southeast of Austin.
But the heavy Halloween rains have fueled optimism for this year's planting.
The Austin-based nonprofit TreeFolks plans to plant 780,000 trees on 175 to 200 properties this winter.
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text:
This film is part of the Gordon Riley collection and captures the dreadful condition of the former Otley train station in West Yorkshire.
Title-Stationary Scenes
Title-A Railway Story
The voiceover says that the main train line through Otley was cancelled which meant that the train station fell in to disrepair.
The film opens with shots of a building and then a sign for `Otley'. There are parts of old buildings and railings lying all over the space, as if the buildings had been bulldozed. There are shots taken from different parts of the derelict station showing the awful condition that it is in.
Title-The End.
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High School Baseball: Sage Hill's Super pitcher
Story | May 14, 2015 | 7:37 PM
High School Baseball: Sage Hill's Super pitcher
Story | May 14, 2015 | 7:37 PM
High School Roundup: Sage boys' tennis opens playoffs with win
Story | May 13, 2015 | 11:20 PM
BOYS' TENNIS Sage Hill 15, Servite 3 The Lightning swept in doubles in the first round of the CIF Southern Section Division 2 playoffs Wednesday at The Tennis Club. Shayan Emtiaz and Ash Etdali won all three of their sets by 6-0 scores for Sage Hill....
Girls' Lacrosse: Rausch's competitive spirit drove Sailors
Story | May 9, 2015 | 10:01 PM
Girls' Lacrosse: Corona del Mar bows out
Story | May 7, 2015 | 11:49 PM
LOS ALAMITOS — A goal for any Orange County high school girls' lacrosse team is to capture the U.S. Lacrosse Southern Section South Division championship. But improvement surely is a goal as well, and to that end, the Corona del Mar High girls'...


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Paul & Hanna are to Samba to a Ricky Martin number...Lips are sealed about which Ricky Martin track it's going to be, but we can confirm that Paul and Hanna will be treating you to a three-minute Samba session to one of Ricky's sexy Latin beats this Saturday.
Paul retired from Professional Ballroom Dancing after his star performance at Blackpool on Saturday, meaning this may be the last time the Hanna and Paul duo get to tango or samba together, ever!
Either way, they're going to be Living La Vida Loca, and there's no doubt from what we've already seen, that Hanna, She Bangs!
Note, their Samba performance will replace a music act for Saturday.


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Reflections on Carole Simpson's visit to Lesley, by Dr. Barbara "B.J." Addison Reid
Monday, February 11, 2013
To hear Carole's story causes one to admire her accomplishments. Simpson, a graduate of the University of Michigan, began her career as the first woman to broadcast radio news on station WCFL in Chicago, Illinois.
She moved to television in Chicago and into NBC News in 1974, becoming the first African American woman to anchor a major network newscast. She joined ABC News in 1982, and was the anchor of the Sunday edition of World News Tonight from 1988 to October 2003. Simpson became the first woman and the first person of color to moderate a presidential debate when she moderated the debate between George H.W. Bush, Bill Clinton, and Ross Perot.
Simpson has good instincts and a nose for news. Simpson knew Dr. Martin Luther King, Jr. In January 1966, King and his wife moved into an apartment on Hamlin Avenue in Chicago. During an exclusive interview with King, Simpson learned King's reason for being in Chicago, which was to face Mayor Richard Daley and draw attention to segregated housing conditions for Chicago's poor people. Simpson's perseverance in getting the King interview and lead story became a pivotal point in her career.
To feel her story causes gut-wrenching pain. Simpson endured racism and sexism and ageism. Hers is a story of survival in a male-dominated profession that placed the highest premium on white males. Like many of us, when confronted with a response, "No, you can't…" Simpson cried, got mad, and then took the "No's" like vitamin pills with a glass of lemonade, and she continued to strive to move herself forward.
Today, Simpson has returned to teaching and she is a Leader in Residency at Emerson College in Boston, Massachusetts, teaching journalism. She visited Lesley University on February 7 and spoke before an audience in the University Hall Amphitheater, followed by a reception and book signing of her book, "NewsLady."
Simpson's lecture was sponsored by the University Diversity Council at Lesley University, whose mission is to help all members of the Lesley community find common ground, while providing opportunities to value and support diversity-related efforts at the University and in the community.
Dr. Barbara "B.J." Addison Reid is the Director of Equal Opportunity and Inclusion and Title IX Coordinator at Lesley University.
View more photos from Carole Simpson's visit to Lesley.
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Commencement 2015Lesley Poet Wins Guggenheim FellowshipShedding Light on Peru's Transgender Community
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Graham Nash kicks off solo summer US tour dates Honorary degree recipient and past VanDernoot Gallery exhibitor Graham Nash, rock star and photo artist, announces tour dates.KPTM-TV Fox 42July 14, 2015
Finding self through service: the experience of long-term volunteersAmeriCorps volunteer, a Lesley doctoral candidate, teaches rudimentary skills in South Boston's Notre Dame Education CenterGlobal Sisters Report (National Catholic Register)July 13, 2015
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Final Summer Poetry Salon July 28Assistant professor of humanities Aaron Smith reading his poetry in Maryland event.Kent County News (Md.)July 10, 2015
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Family owned and operated Kolcraft® has made firm yet comfortable crib and toddler bed mattresses since 1946. The Pure Sleep Therapeutic™ 80 crib and toddler bed mattress offers 80 everlasting coils and cushioning with waterproof covers so both Mom and baby can rest easy.
- 80 heavy gauge steel coils for firm support
- Firm non-allergenic sleeping surface
- Perma-Dri cover wipes clean with a damp cloth
- Mattress also fits toddler bed frames
- Seven-year warranty on workmanship and materials
- Entire mattress is phthalate and flammability compliant and does not contain toxic fire retardants
- 51.625" L x 27.25" W
Color: Freeze Frame
Shipping Note: This item ships directly from the manufacturer within contiguous United States only. Cannot be shipped to AK/HI, PO boxes, US territories, or APO/FPO addresses.


text:
We win 4 x International Promax's
Sixty40 brings in an Gold International Promax for our TV1 Summer campaign. Check out all the spots here.
If that wasn't enough, we then bring in 3 Silver International Promax's for our Foxtel Winter Games spots. Check out those spots here.
We're very thankful to our clients for bringing us in on such awesome briefs. Both of those jobs were treated very much like a series of short films from script to concept to execution so we're very glad to see them do so well out in the harsh light of broadcast.


text:
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text:
There are Three stages of Syphilis
The first stage of which a few different Syphilis Symptoms may occur.
Syphilis Symptoms include:
Slight Soreness around infected area.
Small red bumps appearing around infected area.
The second stage of Syphilis Symptoms include:
Small bumps start to heal on there own.
Start to see a rash developing on hands, feet, and possibly other areas of the body.
Swollen lymph glands.
Hair loss.
Weight loss.
The third and final stage of Syphilis symptoms show up years later and include:
Second stage Syphilis symptoms start to disappear on there own.
Damage to the brain.
Damage to the eyes (partial blindness).
Damage to the nerves.
Damage to the liver.


text:
Sunday, April 26, 2009
Bacon, Pugs, Tantrums, and Exhaustion
7 comments:
- Givinya De Elba said...
Oh wow I am SO glad you posted! I was going to start flooding your inbox with distressed emails from Australia. Glad you hear you're still there - sorry to hear you're exhausted and are running on half the brain cells that I myself am running on.
And you don't look dead from here.
- April 26, 2009 at 4:37 PM
- T. said...
I am glad you are ok! I miss you on twitter and I miss your writing!
Happy Bacon Birthday! FIVE. wow. They grow so fast, huh? How is he doing these days?
Drop by my blog or by twitter once in a while, so I know you are alive.
- April 27, 2009 at 2:31 AM
- buffi said...
Count me among those who are glad you are alive! Though I can't say anything about people not blogging since it was 3 months between my last two posts! But, if when the Dr figures out your exhaustion thing, please share. I've had the same thing going on here & still haven't gotten better.
Miss you & love you!!
- April 27, 2009 at 6:56 AM
- Ann(ie) said...
If anyone understands lazy, busy and exhausted it's me!!!!! Hang in there, love. And happy happy belated bday to the adorable Mr. Bacon.
- April 27, 2009 at 3:57 PM
- Drama Queen Jenner said...
Just call it Spring Break and be good to yourself until you feel more like yourself!
- April 28, 2009 at 12:15 PM
- Crazy Sister said...
Perhaps Maz and Lovey have discoeverd the secret to a long and energetic life - compost starter - and you should try some. I've had naturopath medicines before, and I think you'd prefer the taste of compost...
- April 28, 2009 at 8:35 PM
- class-factotum said...
Ha! I've told my husband that if he dies in a plane crash, the cats are the first thing to go!
- May 12, 2009 at 5:59 AM


text:
PREVIEW: Bristol Rovers vs Barnet
Posted: February 01, 2013|
BRSITOL Rovers midfielder Oliver Norburn is relieved to have forced his way into manager John Ward's thoughts.
The former Leicester City youngster looked to have slipped down the pecking order following the arrival of John-Joe O'Toole coupled with the emergence of Seanan Clucas as a regular first-team starter in recent weeks.
Norburn, 20, however, was a surprise inclusion for last weekend's 3-1 success at Rotherham United to start a game for only second time since Ward arrived.
"I've been working hard in training to try and force my way back into the team," said Norburn, who had last started a game in the 2-1 win over Plymouth on New Year's Day.
"It was a bit of a surprise to be selected after the lads had put on a great performance to win 3-0 Fleetwood.
" I'm really glad to be back in the team and it always helps when you get a good result.
"I hope I've done enough to keep my place for the Barnet game, but all the boys respect the manager's decisions over which team he picks and just get on with it."
Six arrivals over the duration of the transfer window have certainly offered Ward selection dilemmas to contend with ahead of tonight's clash against relegation rivals Barnet at the Memorial Stadium.
Norburn, pictured, said: "There is competition now, but that is good.
"It is important to know that whoever plays is capable of going out and do a good job for us."
Rovers, meanwhile, could lift themselves out of the League Two relegation zone for the first time in over two months if they could secure a victory against Edgar Davids' fellow relegation-threatened side.
Impressive performances at both Fleetwood and Rotherham added to the fact that Rovers play in front of their home fans for the first time in a month, however, brings added pressure into the mix.
"The two results at Rotherham and Fleetwood have been great and now we need to try and do it at the Memorial Stadium in front of our home fans," Norburn added.
"It is a massive game, but we won't be dwelling on that.
"We'll just go out and try to play the same way as we have in the last couple of games.
"If anything, playing at home in front of our own fans will work in our favour.
"The home crowd will be behind us and we are enjoying the games more because we are winning."
Ward will be hoping to see his side extend a run of form that has seen his side collect ten points from a possible 15 since Mark McGhee was relieved of his duties on December 17.
Norburn said: "We have been a bit unfortunate in that results elsewhere have gone against us to leave us still in the bottom two.
"That's the way it goes sometimes and that shows you can only concentrate on your own games.
"If we keep playing the way we are playing then we give ourselves the best chance.
"I think everyone has just rolled their sleeves up and has been working really hard in training.
"We're just hoping we can now string together a few results to get out of that relegation zone and to really kick on."


text:
Honda Cars India 3rd shift production a boon
Until recently, how Honda would improve vehicle delivery seemed a growing concern. That was back when HCIL production stood at 440 units a day. During the 4th gen Honda City unveil in November, Honda announced it had begun a 3rd shift, which would improve production capacity by 40%. This equates to just over 600 cars each day.
Production increase is directly reflected in Amaze sales these past 3 months, which stands at Amaze 9564 units in November, 7598 units sold in Decmeber and 7398 units sold in January 2014. In all, 66859 units of Honda Amaze has been sold since launch in April 2013.
At the time of launch, new Honda City had alredy attarcted 9000 pre-bookings. In Janaury, HCIL sold 7184 City sedans. Jnaneswar Sen, Sr. Vice President – Marketing &Sales, Honda Cars India Ltd. said, "We have started the year on a positive note. We have received an overwhelming response to all new Honda City and the Honda Amaze continues to do strong sales. We would like to thank our customers for their constant support in achieving our highest ever monthly sales."
Nabanita Singha Roy
Email - [email protected]


text:
The Kardashians
Kourtney Kardashian Says She "Hates" Scott Disick, Is Always Thinking About Breaking Up With Him
A long relationship history — not to mention two shared children — doesn't seem to be smoothing the relationship between Kourtney Kardashian and her longtime boyfriend Scott Disick.
In last night's episode of Keeping Up With the Kardashians, the duo seemed to be constantly bickering and exchanging snide remarks. Things reached a near breaking point in New York City when Scott ditched the Kardashian fam in favor of a wild night on the town, despite the fact that everyone had flown in specifically to attend the opening of RYU, his new restaurant.
When talking to Kris Jenner and Khloe Kardashian about how upsetting Scott's behavior can be, Kourtney reveals just how unhappy she's been in her relationship. When Khloe asks if she wants to break up with Scott, Kourtney responds, "I always do. I don't know if it's hormonal or if I just hate him."
Despite the strong words, the two kissed and made up by the end of the episode, and Kourtney even presented her beau with a "love ring."
Can't get enough Kardashians gossip? Like us on our Facebook page or follow us on Twitter!


text:
Visit marthastewart.com | marthastewartweddings.com
Process the cucumbers in a food processor until smooth. Add the remaining ingredients and pulse to combine.
Chill the soup in the refrigerator until cold, about 1 hour.
Divide among 4 chilled soup bowls and garnish with the chopped cucumber.
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text:
On January 18, 2012, two dramatic shifts were seen in the copyright world. Thousands of websites, including Wikipedia, Google, and Boing Boing, went dark in protest of two proposed pieces of legislation - SOPA (Stop Online Privacy Act), and PIPA (Protect IP Act). On the same day, the Supreme Court upheld Congress's right to move foreign materials previously in the public domain back under copyright protection.
SOPA's goal is "To promote prosperity, creativity, entrepreneurship, and innovation by combating the theft of U.S. property, and for other purposes"[1] and PIPA's goal is, "To prevent online threats to economic creativity and theft of intellectual property, and for other purposes."[2] No one denies these are worthy goals, but the effect would be to hold website operators responsible for any linking to pirated work that may exist on foreign sites accessed through their services. In other words, "The proposed bill's text says that a site could be deemed a SOPA scofflaw if it "facilitates" copyright infringement. That very broad language has tech companies spooked."[3]
In Golan v. Holder, Attorney General[4] , the Supreme Court ruled in favor of a 1994 law that moved foreign works that had previously been in the public domain back under copyright protection. This was done in order to comply with "the Uruguay Round Agreements Act, a treaty seeking to equalize copyright protection on an international basis."[5] Up until then, musicians, filmmakers, and others had been able to use certain foreign works without seeking permission or paying any cost. Golan's position was backed by Google, many librarians, and others, who worried that removing works from the public domain set a bad precedent and discouraged the spread of knowledge.
Both of these events affect rights holders, users, and content distributors. The motion picture and music industries had argued that more laws were necessary for the protection of their content. They have been mostly successful in their attempts to impose tighter and longer restrictions via legislation. The growth of the Internet and the easy sharing of digital materials has made keeping up with piracy a very difficult thing. File sharing sites such as Napster and PirateBay seemed to encourage users to illegally share and access copyrighted content.
But opponents of tighter restrictions argue that rights holders have not innovated enough or found business models that provide online access to content at a reasonable price and with relative ease. They point to the success of Apple's iTunes as a distribution center for copyrighted content for which users are willing to pay.
Complicating the issue is how content gets distributed around the world. Many pirates set up shop in foreign countries where they need not worry about U.S. laws. Content pours into and out of their sites. It is very difficult to know just where the content is coming from so users may link to content that infringes without being aware of it.
Opponents of SOPA/PIPA agree that legislation is needed, but as written, the burden of proof is put on the accused - along with the legal costs - and unduly favors a copyright owner's rights. They contend these are flawed bills that would lead to greater harm than good.
In the end, the massive effort on the part of internet companies and the public paid off. The chart below illustrates how Congress shifted in their support for SOPA/PIPA after the online demonstrations.
On January 20, both bills were postponed or delayed and Chris Dodd, president of the Motion Picture Association of America (MPAA), "conceded that it was time for both sides of the issue -- e.g. Hollywood and Silicon Valley -- to meet to iron out their differences."[6] There is no doubt this issue will be revisited -- alternative legislation has already been introduced -- but the backers of these bills now face a more enlightened and activist public who, along with the service and content providers, are not willing to give up their current freedoms so easily.
And the other battle? There are no more courts to argue in front of, so the content previously more widely available remains locked down. For some, this is a worrisome outcome. "If Congress is free to restore material from the public domain at will," the petition for review argued, "then the public's federal right to copy and to use public domain material this Court has recognized may evaporate at any time."[7]
What does this mean for CLA? Perhaps the greatest lesson learned is that we have to become aware, stay involved, and advocate for legislation that will preserve our rights. We count on having access to just about any content we need for our teaching and research purposes. The Fair Use provision of Copyright Law allows us to use many of these materials without seeking permission or offering payment, but it is not a completely safe harbor. The MPAA and the Recording Industry Association of America (RIAA) and other content producers have lawyers and lobbyists who are well positioned to protect their interests. Google, Facebook, and other content providers may be on our side for some fights, but they are working to protect their bottom lines as well. Content users in the University community, and the public at large, need to understand how in flux all this is. Laws are constantly being written that may affect our access to material. We have tremendous power, but if we assume others will protect us we may end up losing more than we can afford.
If you'd like to learn more about copyright at the University, the Libraries are a wonderful resource. If you are a content producer and would like to protect but also share your materials, Creative Commons offers templates and advice on how to do so. Contact the Digital Content Library staff at firstname.lastname@example.com for other digital media related questions.January 30th, 2012


text:
Seems to be in reference to this one from the archives,
Wednesday, March 14, 2012
Continue My Major
Posted by B-Rate Prof at 6:00 AM
Labels: change major, like
3 comments:
- AnonymousMarch 14, 2012 at 9:13 AM
I'm still baffled when I receive the completely negative evaluation in the middle of a stack of mostly to very positive ones. Glad you got that "continue my major" eval!ReplyDelete
Thanks! I don't believe that 2nd one was in a stack of positive ones though.ReplyDelete
It only takes one to help a student continue on their path. Just one. That one person stoking the fire, that one person escorting the dream... awesome you were that one person for that student!ReplyDelete
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text:
The History faculty is a distinguished crew. Emeriti professors Kathy Roper and Ronald Isetti won "Professor of the Year" awards. In 2013-2014, the honor went to Professor Myrna Santiago. In 2011, Professor Carl Guarneri won the Faculty Researcher-Scholar Award for his work on United States history, particularly the Civil War. In 2012, Brother Charles Hilken won the Faculty Service Award for his dedication to our student body and his devotion to the College. In 2013, Professor Gretchen Lemke-Santangelo won the Faculty Researcher-Scholar Award for her work on the history of American women. Congratulations to an outstanding department!
Carl Guarneri | Interests | Scholarship | Service
- Research, Scholarly, Creative Interests
- American Intellectual and Cultural History
- Civil War and Reconstruction
- American and European Radicalism and Utopianism
- Global and Comparative History
- American Ethnic, Women's and Urban History
- American Architecture
Maps & Directories
Mailing Address
Saint Mary's College of California
1928 Saint Mary's Road
Moraga, CA 94575
(925) 631-4000
Google Map | Campus Map | PO Boxes


text:
WILMINGTON, NC (WWAY) — Wilmington Police say students have helped them find human remains as they searched for an elderly woman missing since early November in the Love Grove community.
Police say Basic Law Enforcement Training students from Cape Fear Community College helped them search for clues this afternoon in the disappearance of Alma Lawson. Around 2:45 p.m., investigators say the group found human remains. They are working to positively identify the remains. An autopsy is scheduled for Monday.
Police initially said the students found a "suspicious item" they believed was connected to Lawson along the train tracks along Railroad Street. Police later said it was a personal item that may have belonged to Lawson. That led them to find other items further down the hill next to the tracks. Searchers cut through thick brush before finding the body submerged in a ravine partially submerged in water.
Lawson, 83, went missing in November near her home on Stanley Street in the neighborhood.
A CFCC spokesman says last week WPD asked the school if the BLET students could help in the search for clues. Instructors were able to tweak their schedule so 17 students could help today.
"We had a class from Cape Fear Community College BLET students who were offered the opportunity to come out and train in this environment, "Wilmington Police Detective Kevin Smith said. " That gave them good training and gave us more eyes on the ground."
Police say they've searched the area several times. They say the fact that it's been cold and foliage has been dying may have helped reveal the item, which they have not yet publicly identified.