text:
Methods of depositing thin seed layers that improve continuity of the seed layer as well as adhesion to the barrier layer are provided. According to various embodiments, the methods involve performing an etchback operation in the seed deposition chamber prior to depositing the seed layer. The etch step removes barrier layer overhang and/or oxide that has formed on the barrier layer. It some embodiments, a small deposition flux of seed atoms accompanies the sputter etch flux of argon ions, embedding metal atoms into the barrier layer. The embedded metal atoms create nucleation sites for subsequent seed layer deposition, thereby promoting continuous seed layer film growth, film stability and improved seed layer-barrier layer adhesion.
1. A method of depositing a metal conductive seed layer on a substrate comprising:
a) providing a substrate having a barrier layer in a recessed feature deposited thereon to a seed layer deposition chamber;
b) performing an inert gas sputter etch of at least the sidewalls of the barrier layer in the seed layer deposition chamber;
c) depositing the metal conductive seed layer over the surface of the wafer substrate in the seed layer deposition chamber.
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15. A method of depositing a metal seed layer on a semiconductor substrate having recessed features; the method comprising:
a) providing the substrate with a barrier layer in a recessed feature deposited thereon to the seed layer deposition chamber;
b) applying a DC power to a metal target within the chamber and an applied RF bias to the substrate to simultaneously etch at least the sidewalls of the barrier layer oxide and implant metal atoms into the barrier layer;
c) applying a DC power to the metal target to deposit a metal seed layer that substantially coats the sidewalls of the features, wherein the implanted seeds are nucleation sites for the deposition of the metal seed layer.
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The present invention pertains to methods for forming a metal seed layer on a barrier layer of a partially fabricated integrated circuit.
Damascene processing is a method for forming interconnections on integrated circuits that involves formation of inlaid metal lines in trenches and vias formed in a dielectric layer (inter-metal dielectric). The metal conductive lines are formed by an electroplating process. Because copper or other mobile conductive material provides the conductive paths of the integrated circuit, the underlying silicon devices must be protected from metal ions (e.g., Cu2+) that might otherwise diffuse or drift into the silicon. Suitable materials for diffusion barrier include tantalum, tantalum nitride, tungsten, titanium tungsten, titanium nitride, tungsten nitride, and the like.
After diffusion barrier is deposited and prior to electroplating, a seed layer of copper or other metal is typically applied by a physical vapor deposition (PVD) process to enable subsequent electrofilling of the features with copper inlay. In order to serve as a seed for electroplating, the seed layer should be continuous, stable and have good adhesion to the barrier layer.
One difficulty with depositing seed layers is that the copper (or other metal) may agglomerate on the barrier layer surface. This phenomenon occurs because of the weak chemical bond between seed and the barrier as a result of the absence of an intermetallic reaction between the two. High oxidation ability of the barrier aggravates this phenomenon. Because of this agglomeration, the copper may not cover the surface in a conformal manner. The thickness of the seed layer coverage is thus uneven, thicker in some places than others, and the layer may include gaps. Such seed layers do not provide a uniform layer for electroplating, which leads to voiding defects in the electroplated copper. Another difficulty is the formation of "overhang" material on the edges of the features. Diffusion barrier overhang, for example, can prevent seed metal deposition flux from reaching the top sidewalls of the features. This phenomenon also leads to seed layers having poor continuity. Defects, poor continuity and poor adhesion of the seed layer all may adversely affect performance of the fabricated device. For example, defects in the seed layer may result in electromigration and stress migration at the seed-barrier interface. Void formation in the electrofilled copper features and subsequent post CMP defects are other consequences of poor seed layer formation that may also lead to device failure.
What are therefore needed are methods of depositing metal seed layers on diffusion barriers that provide seed layers having improved continuity and adhesion to the underlying diffusion barrier.
The present invention meets these needs by providing methods of depositing seed layers that improve continuity of the seed layer as well as adhesion to the barrier layer. According to various embodiments, the methods involve performing a sputter etch in the seed deposition chamber prior to depositing the seed layer. The etch step removes barrier layer overhang and/or oxide that has formed on the barrier layer. In some embodiments, a small deposition flux accompanies the sputter etch flux, embedding metal atoms into the barrier layer. The embedded metal atoms create nucleation sites for subsequent seed layer deposition, thereby promoting continuous seed layer film growth, film stability and improved seed layer-barrier layer adhesion.
One aspect of the invention relates to a method of depositing a metal conductive seed layer on a substrate that involves the operations of a) providing a substrate having a barrier layer deposited thereon to a seed layer deposition chamber; b) performing an inert gas sputter etch of the barrier layer in the seed layer deposition chamber; and c) depositing the metal conductive seed layer over the surface of the wafer substrate in the seed layer deposition chamber.
According to various embodiments, the sputter etch operation may remove barrier material that overhangs a recessed feature (e.g., a trench or via) on the substrate and/or remove oxide that has formed on the barrier layer. In some embodiments, the method involves simultaneously sputtering metal from a target while performing the sputter etch of the barrier material. The metal atoms may then become embedded in the barrier layer surface to provide nucleation sites for the seed layer deposition in (c). In certain embodiments performing operation (b) involves applying a DC power of between about 0 and 10 kW to the target and a RF power of at least about 100 W, e.g. between about 100 and 3000 W, to the substrate.
Another aspect of the invention relates to a method of depositing a metal seed layer on a semiconductor substrate having recessed features that involves a) providing the substrate with a barrier layer deposited thereon to the seed layer deposition chamber; b) applying a DC power to a metal target within the chamber and a RF bias to the substrate to simultaneously etch barrier layer oxide and implant metal atoms into the barrier layer; and c) applying a DC power to the metal target to deposit a metal seed layer that substantially coats the sidewalls of the features, wherein the implanted atoms are nucleation sites for the deposition of the metal.
These and other features and advantages of the present invention will be described in more detail below with reference to the associated drawings.
In the following detailed description of the present invention, numerous specific embodiments are set forth in order to provide a thorough understanding of the invention. However, as will be apparent to those skilled in the art, the present invention may be practiced without these specific details or by using alternate elements or processes. In other instances well-known processes, procedures and components have not been described in detail so as not to unnecessarily obscure aspects of the present invention.
In this application, the term "wafer" will be used interchangeably with "partially fabricated integrated circuit." One skilled in the art would understand that the term "partially fabricated integrated circuit" can refer to a silicon wafer during any of many stages of integrated circuit fabrication thereon. The term "substrate" is also used and includes wafers.
This invention relates to deposition of metal seed layers on diffusion barrier layers. Methods of the invention involve performing a sputter etch operation (also referred to as an etchback operation) in the seed deposition module prior to deposition of the seed layer. According to various embodiments, the sputter etch operation results in one or more of the following: 1) reduction or elimination of oxide formed on the barrier, 2) reduction or elimination of barrier layer overhang at the tops of features, and 3) activation of the barrier surface before seed deposition (e.g., by creating nucleation sites).
Advantages of reducing barrier layer overhang include reduction or elimination of subsequent seed overhang, decrease of preplating aspect ratio, reduction of barrier layer thickness variation within the features and between features, and reduction of copper seed thickness variation within the features and between features. This leads to void free electroplating and reduction in post CMP defects. Advantages of reducing barrier oxide include improved seed-barrier adhesion and reducing line and contact resistance. Advantages of creation of nucleation sites in the barrier layer include increased nucleation density, improved seed layer morphology, improved seed layer continuity and improved seed-barrier adhesion. Improved film continuity and adhesion reduces electromigration along the barrier/seed interface, as well as stress migration. This in turn improves device reliability. The sputter etch or etchback operation also decreases barrier layer roughness, especially on sidewalls, which in turn improves the continuity and smoothness of the seed layer.
As mentioned, the invention finds particular use in Damascene processing.
Suitable materials for diffusion barrier 105 include tantalum, tantalum nitride, tungsten, titanium tungsten, titanium nitride, tungsten nitride, and the like. In a typical process, barrier 105 is formed by a physical vapor deposition (PVD) process such as sputtering, a chemical vapor deposition (CVD) process, or an atomic layer deposition (ALD) process. Typical metals for the conductive routes are aluminum and copper. More frequently, copper serves as the metal in Damascene processes, as depicted in these figures. The resultant partially fabricated integrated circuit 100 is a representative substrate for subsequent Damascene processing, as depicted in
As depicted in
The process follows, as depicted in
The dual Damascene process continues, as depicted in
Next, as depicted in
After diffusion barrier 123 is deposited, a seed layer of copper is deposited to enable subsequent electrofilling of the features with copper inlay 125 as shown on
Copper routes 125 and 107 are now in electrical contact and form conductive pathways, as they are separated only by diffusion barrier 123, which is also somewhat conductive.
As indicated above, the present invention relates to deposition of seed layers on diffusion barriers. Although
Diffusion barriers may be deposited by PVD, CVD or ALD methods. PVD methods result in high quality films, though conformal methods, including ionized-PVD (iPVD), CVD and ALD methods may be used to improve step coverage of the recessed features and reduce overhang of barrier material on the top edges of the features. Regardless of the method used to deposit the diffusion barrier, subsequent barrier oxide formation may significantly and adversely affect copper seed deposition. Barriers, such as tantalum-based barriers, readily oxidize. Even in a high vacuum environment, the time it takes to move the barrier-coated wafer from one module to another (e.g., from a PVD barrier module to a PVD copper seed module) is enough for oxygen to attach itself to the any free Ta bonds (or other barrier material) on the barrier layer surface. The barrier oxide bonds may be strong, thereby making the barrier less attractive to the metal seed layer. The resulting poor adhesion and film discontinuities may result in instability of the seed layer in the plating bath.
As indicated, barrier deposition, especially PVD barrier deposition, may result in barrier material overhang.
The methods of the present invention provide improved methods of forming metal seed layers on diffusion barriers.
The process begins at operation 301 in which a barrier layer is formed on features on the partially fabricated semiconductor substrate. Various processing operations, as described above in the context of
In operation 303, the substrate is transferred to the metal seed deposition module or chamber. The metal seed deposition module is a vacuum chamber that is capable of depositing the metal seed layer. In some embodiments, a suitable PVD apparatus employs a magnetic array for electron confinement to generate a high density plasma. The magnetic array may be implemented as one or more electromagnets, permanent magnets, or some combination of electromagnets and permanent magnets. The apparatus may include other magnets located proximate the substrate region for promoting process uniformity.
Examples of suitable apparatuses include hollow cathode magnetron (HCM) sputtering modules. Such apparatuses are described in further below as well as in U.S. Pat. Nos. 5,482,611; 6,179,973; 6,193,854; and 6,217,716, each of which is incorporated herein by reference for all purposes. Other types of sputtering apparatuses that may be used in accordance with the invention include planar magnetron sputtering modules. If the seed layer to be deposited is copper, a copper target source is used. Also, as described below, the apparatus typically employs a RF biased electrostatic chuck pedestal, which secures the wafer and applies an RF bias on the wafer, if needed.
After transfer to the metal seed deposition module, a sputter etch is performed to remove oxide and/or overhang from the diffusion barrier in operation 305, prior to the main metal seed deposition operation, which occurs in operation 307.
In conventional PVD processes, metal seed layer deposition occurs directly after the substrate is transferred to the copper PVD chamber. An inert gas is introduced to the chamber to form a plasma, the energetic ions of which bombard and eject copper atoms from the target to deposit on the substrate. In the method shown in
As indicated above, the sputter etch removes barrier oxide that has formed prior to the etchback. This improves the continuity and adhesion of the seed layer. If diffusion barrier overhang is present, the sputter etch also removes the overhang material. As indicated above, PVD deposition of diffusion barrier tends to produce films with overhang. The etch operation decreases the preplating aspect ratio, thereby decreasing the likelihood of void formation during electroplating. The etchback operation also reduces feature roughness, particularly on the sidewalls.
Process conditions during the sputter etch and metal seed deposition (operations 305 and 307, respectively, in
In general, etch rate is most strongly related to the RF power, while the deposition rate is most strongly related to the DC source power. Higher RF/DC power ratios correspond to higher E/D ratios on the wafer, which can go to infinity if no DC power is applied to the target. Pure etching is achieved in this case. The etch rate is largely dependent on RF power and pressure since these parameters control the energy of argon ions near the wafer. The deposition rate is largely dependent on DC power since this parameter affects the flux and energy of argon ions near the sputter target.
As indicated, during the etchback step the combination of DC power applied to the target and RF power applied to the wafer has to ensure the net material removal from the wafer. For example, for HCM modules having target areas of between about 1000-6000 cm2. DC power should be in the range from 1 kW to 10 kW or as low as 0 as indicated above for the pure etching. One of skill in the art will understand that this range depends on the target area, and can be different for smaller or bigger targets especially if the method is used with the different source/target design. The RF power may be between about 100 W to 3000 W for a typical substrate (e.g., a 300 mm wafer). This range depends on the wafer area and can be much greater for applications that deal with big substrates. In terms of power density (independent of the target area or substrate area), examples of suitable DC power ranges for the sputter etch operation are range from about 0 W/(cm2 target) to 5 W/(cm2 target) and for the RF power, from about 0.1 W/(cm2 substrate) to 5 W/(cm2 substrate).
After the sputter etch in operation 305, the metal seed layer is deposited in operation 307. Process conditions in operation 307 are such that there is a net deposition, rather than a net etch as in operation 305. Examples of suitable DC power ranges for the seed layer deposition operation are range from about 5 W/(cm2 target) to 25 W/(cm2 target), and, for the RF power, from about 0 W/(cm2 substrate) to 0.5 W/(cm2 substrate). PVD deposition of metal seed layers is described in U.S. Pat. Nos. 6,905,959; 6,773,571; and 6,642,146, which patents are hereby incorporated by reference and for all purposes. After the seed layer is deposited, the recessed features are filled with the conductive metal by electroplating in an operation 309.
In certain embodiments, it is desirable for the inert gas sputter flux in operation 307 to be accompanied by a small deposition flux. In typical HCM operation mode the pedestal capacitive RF discharge feeds on electrons created by the source at relatively low DC power (e.g., 0.1 W/(cm2 target)−5 W/(cm2 target)). Thus, the strong flux of argon or other inert gas ions to the wafer is accompanied by the small flux of copper (or other metal) species to the wafer. As a result, copper atoms are embedded into the barrier surface. These embedded atoms create nucleation centers for the subsequent seed layer deposition in operation 307. The copper atoms may be embedded to the depth of a few lattice constants from the surface into the barrier, depending on their energy. These nucleation centers promote seed film growth, film stability and improve the seed-barrier adhesion. Nucleation density during seed layer deposition also increases. The increased nucleation density results in film having less stress and better crystallographic orientation and texture. The feature edge roughness decreases.
It should be noted that while the sputter etch and metal seed layer deposition operations occur in the same chamber in the process illustrated in
In a particular embodiment, tantalum-based barriers are used for copper metallization (e.g., a TaN/Ta/Cu stack). Tantalum-based barriers are particularly useful as barriers in copper metallization due to the absence of tantalum-copper intermetallic reactions, which means that the copper-tantalum interface is stable. However, this lack of chemical bonds in the interface also means that copper-tantalum adhesion may be a problem under conventional deposition processes described above (although copper does have relatively better adhesion to tantalum compared to many other materials considered for their barrier properties).
As a result copper agglomerates on the tantalum surface at elevated temperatures (as the copper-copper bond is stronger than the tantalum-copper bond). Because of this, the copper seed deposition is typically conducted at low substrate temperatures to suppress agglomeration by "freezing" the deposited copper atoms in place where they are adsorbed. Low temperature deposition reduces adsorbed atom mobility, thereby decreasing agglomeration and increasing nucleation density. However, the film quality is not as good as it would be if the film is grown at thermodynamic equilibrium conditions. As a result film grown at low temperature conditions is stressed. Copper dewetting at the interface and void formation usually accompanies the subsequent stress relaxation at higher temperature anneal processes. Seed layer deposition on tantalum by conventional methods may also present difficulties because tantalum oxidizes very easily. The tantalum oxide bond is strong, making the surface less attractive to subsequent copper seed deposition.
As indicated, the methods of the present invention may be used to improve copper seed deposition on tantalum-based barriers by allowing the copper seed to be deposited on an oxide-free surface thereby improving adhesion, and increasing nucleation density, thereby improving film continuity, reducing film stress, and as a result reducing post CMP defects as well as stress migration and electromigration at the Ta—Cu interface. In certain embodiments, the temperature at which the copper seed layer is deposited may be higher than the low temperatures at which the seed deposition typically occurs, resulting in improved adhesion and reduced stress in the film. For example, deposition temperatures ranging from about 2� C. to about 100 Cmay be used. One of skill in the art will recognize that the various benefits discussed above with regard to Ta-based/Cu stacks may also apply to various other barrier layer-seed layer combinations.
As indicated above, any suitable deposition apparatus appropriate for performing the sputter etch and metal seed deposition operations may be used, including PVD apparatuses that use hollow cathode magnetron (HCM) or planar magnetron targets.
An inert gas, such as argon, is introduced to into the hollow region of the cathode target 407 to form plasma. An intense magnetic field is produced by electromagnets 405 a-405 d within the cathode target region. Additional electromagnets are arranged downstream of the cathode target so that different currents can be applied to each electromagnet, thereby producing an ion flux and a controlled deposition and/or etch rate and uniformity. A metal spacer 409, typically held at plasma floating potential, is used, in conjunction with the source electromagnets to shape the plasma distribution at the target mouth. The RF bias ESC pedestal 403 holds the wafer substrate in place and can apply a RF bias to the wafer substrate. The ion energy, and therefore the deposition and/or etch rate can also be controlled by the pedestal RF bias. Typically, the amount of sputtering is controlled by the RF power at fixed RF frequency. Various RF frequencies can be used to achieve this effect. One preferred RF frequency is 13.56 MHz. An additional function of the ESC pedestal is to provide wafer temperature control during sputter etch and deposition. Typically, argon backside gas is used to provide thermal coupling between the substrate and the ESC. In many cases, the ESC is cooled during deposition.
As well, various aspects of process flows involve deposition of barrier materials (by ALD, CVD or PVD) as well as precleaning, and degassing operations. In these embodiments all these process steps are done in the same processing tool. Tools that allow degas, ALD or CVD deposition, and PVD deposition all under the same vacuum are the INOVA and INOVA NExT deposition systems available from Novellus Systems of San Jose, Calif. These systems are comprised of processing modules, e.g. for Degas, Cool, Preclean, PVD, CVD or ALD processes, mounted to the same wafer handling module. Therefore, once a wafer is in the tool and a vacuum is established, all of the above described process aspects are performed. In particular embodiments, the barrier layer deposition occurs in a tantalum (or other barrier material) PVD deposition module, with the wafer then transferred to the metal seed PVD deposition module for sputter etch and metal seed deposition.
Process Conditions
As discussed above with regard to
During the sputter etch operation, DC power typically ranges from about 0.5 W/(cm2 target) to 5 W/(cm2 target), but it could be as low as 0 for the pure etching , and RF power, from about 0.1 W/(cm2 substrate) to 5 W/(cm2 substrate). DC power is typically higher during the deposition operation than for the sputter etch operation. DC power typically ranges from about 15 W/(cm2 target) to 25 W/(cm2 target), and RF power, from about 0 W/(cm2 substrate) to 0.5 W/(cm2 substrate) for the deposition step.
Plasma reactors that allow fine control of the plasma conditions can be tuned to provide the E/D variations over substrate topology as may be desired. For example, the INOVA HCM reactors provided by Novellus Systems have eight or more separate electromagnetic coils. Fine tuning the E/D profile from via bottom to field region and from the center to edge across of the wafer by independently controlling each of these coils is described in U.S. Pat. No. 6,764,940, which is hereby incorporated by reference.
Other process conditions include temperature, pressure and inert gas flow rate. Temperatures typically range from about −40 C to 50 C for both the sputter etch operation and for the deposition operation. As discussed above, conventional copper seed deposition operations use very low substrate temperatures (e.g., less than about 50 C) in order to reduce adsorbed atom mobility. In certain embodiments, methods of the present invention may use higher substrate temperatures during seed deposition, thereby decreasing film stress. Pressures typically range from about 1E−3 Torr to 1E−2 Torr for the sputter etch operation and about 5E−5 Torr to 5E−3 Torr for the deposition operation, and argon flow rates range from about 10 sccm to 200 sccm for the sputter etch operation and about 0 sccm (gas-free operation) to 20 sccm for the deposition operation. One of skill in the art will understand that these are exemplary ranges that may be need to be adjusted depending on the substrate and apparatus used.
TaN/Ta barriers were deposited by PVD on wafers using INOVA xT deposition systems available from Novellus Systems of San Jose. The barriers were deposited in trenches of 100 nm. After barrier deposition the wafers were transferred to the copper deposition PVD module. An etchback process was performed in the copper deposition module, prior to deposition of the copper seed layer.
Resistivity drift of the deposited Cu film over time is an indication that the film undergoes a re-crystallization process. The more the drift the more stressed film was deposited. Such a film is more likely to relieve the stress over time, which leads to microvoid formation and subsequently failures related to stress-migration or electro-migration mechanisms. Film deposited on the barrier without an air break has a relatively small resistivity drift of 4% over a long time. If there is an air break after Ta deposition, the barrier oxidizes and subsequently deposited Cu film has a resistivity drift of 14% over time.
Such an oxidized barrier was subjected to the etchback step in the copper module before copper deposition. Resistivity drift of the Cu film was reduced back to 4%-showing that the effects of barrier oxidation were eliminated and the barrier-seed interface became stable again. The etchback step was performed using a DC power of 0.6 W/cm2 and a RF power of 1.2 W/cm2 for 10 s.
Elimination of Overhang
Process conditions for the sputter etch are given below. For comparison, process conditions used for subsequent copper seed layer deposition are also shown.
Although various details have been omitted for clarity's sake, various design alternatives may be implemented. Therefore, the present examples are to be considered as illustrative and not restrictive, and the invention is not to be limited to the details given herein, but may be modified within the scope of the appended claims.
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text: UPDATE: You can now watch Netflix without the need of a disc and streams in 1080p with Dolby 5.1 surround sound! New improvements also include a new faster/richer GUI, with content search on the device, and playback speed improvements. Find out more at Netflix. In addition, the PS3 is 3D ready after firmware update. One of the first games to be in 3-D is Batman Arkham Asylum: Game of the Year edition.

subset: commoncrawl


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A few words about Chiang Mai. Thailand's 2nd largest city, capital of the northern part of the country, it is a very pleasant city to spend a few days. The old city is surrounded by ancient walls, and in those 2 square kilometers (more or less) you have tens of temples to visit. To be completely honest after half a dozen I started to get a bit bored, and to entertain myself I started to take close up pictures of small statues and other artifacts, finding it easier than to photograph real moving people =). Results varied, but I could sometimes get interesting, slightly surreal effects.
Tag Archives: Statue
Wat Chedi Luang in Chiang Mai
10 Sep Filed under Close-up, Culture, Thailand. 3 Comments.
Wat Phra Singh in Chang Mai
8 Sep Filed under Culture, Temple, Thailand. 3 Comments.
I love how they put real glasses on the statue... Maybe they were actually even the real dude ones...


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This cold isn't funny anymore. Several authors listed here are writing from Florida, California and Texas, and my question for them: Do you have a guest room? In the meantime, romance authors offer up some hot reads for our chilly nights …
Norah Wilson, author of Every Breath She Takes
Someone recently cracked that January was the Monday of months. I couldn't agree more. The weather here in Atlantic Canada has been vacillating between frigid deep freeze and balmy rain. I've been passing the days reading a couple of books (never have just one on the go!). I actually just finished Lina Gardner's Gift of Prophecy, a dystopian tale that I loved. Great world-building! To keep me warm, I've been reading Bella Love's Spin, a super sexy contemporary romance. Fresh and yummy! And if I look at that cover, I can almost pretend it's summer…
Shirley Jump, author of The Sweetheart Bargain
It's not freezing where I am in Florida (though, given the people wearing parkas when it's 50 degrees out, one would think otherwise!). I've been saving Stephen King's Doctor Sleep to read after I turn in the next Sweetheart Sisters book. I actually had to store the King book in my trunk so I wouldn't be tempted to open it before I finish my deadline book. Oh, and a friend just sent me a whole bunch of recent releases to read, including a new Lori Wilde, Somebody to Love. I see lots of reading by the pool in my future!
Linda Grimes, author of Quick Fix
Punxsutawney Phil has seen his *&^% shadow, and now we have six more weeks of winter to get through. But instead of cursing the rodent (OK, maybe "along with" cursing him), I've decided to fight back with some "kindling" for my internal furnace. Nothing like a good, steamy romance to keep me warm when the flurries are flying! Right now, rereads of Tawna Fenske's hilariously sexy Making Waves, Jill Shalvis' libido-revving Instant Temptation and Molly Harper's rawr-inducing How to Flirt with a Naked Werewolf are stoking my fire. Let it snow!
Shana Galen, author of Sapphires Are an Earl's Best Friend
It's not as cold in Houston as it is in the rest of the country, but it's cold enough for fuzzy socks and cashmere sweaters. I've been reading two new releases. The first is Secrets for Seducing a Royal Bodyguard by Vanessa Kelly. I love a Regency with spies, kidnappings, and a hot hero! The second is the new Young Adult release Uninvited by Sophie Jordan. It's set in the near future when the government can test for Homicidal Tendency Syndrome. Davy has led a perfect life, but she's found to have the gene. Very exciting and interesting book!
L. Alison Heller, author of The Love Wars
So far during this unrelenting winter, we've braved windows accidentally left open (don't ask) and a broken radiator. But in addition to wearing double sweaters and a hat indoors, I have the best coping mechanism: curling up under a blanket (or three) with a good read. If you haven't yet read Jeannie Moon's The Temporary Wife, I highly recommend it. It's a heart-warming and satisfying story of two people resisting their undeniable attraction for and connection to each other. Pick it up! You'll be so busy swooning and cheering as their passion melts away all obstacles that you'll almost forget about the ice pellets outside.
Veronica Scott, author of Escape From Zulaire
Not that we're cursed with a cold weather problem in Southern California, but I still like steamy reads! Just finished True by Laurann Dohner, which is the eleventh book in her hot New Species series. Strongly reminiscent of Lora Leigh's earlier Breeds novels (which are also good for keeping the frost at bay, Aiden's Charity or Elizabeth's Wolf are two of my favorites), but with Laurann's own special twists and turns, True was a great read. Moving on, fanning myself as I go, I'm always rereading various Nalini Singh novels. Caressed by Ice is my favorite in the Psy/Changelings series. Judd is one very sexy guy and heroine Brenna does an excellent job cracking through that Psy ice in his soul to achieve the HEA they both crave.
Amber Belldene, author of the Blood Vine series
California has escaped the polar vortex, and we're having a hot, dry winter that's turned into a drought. I'm praying for storms, rationing water, and couldn't resist the kissing-in-the-rain cover for Christine Rimmer's Marooned With the Maverick, a small-town romance about a bad boy who proves he's a hero in the aftermath of a devastating flood. The way Collin steps up as a leader charmed me! Now we've had one day of rain in California and there's a chill in the air, which requires we actually break out our winter coats. I've got my fuzzy slippers on, and I'm settling in with Serena Bell's Still So Hot. I love Bell's smart, tender, sexy style, and just the lickable cover on this book is enough to keep me warm in our West Coast cold snap.
Nancy Corrigan, author of Beautiful Mistake
Negative temps and wind chills! It's been a very cold winter, but I don't mind as long as I can cuddle on the couch with my hubby and a good book. Dark Magic by Christine Feehan is one guaranteed to keep me warm. Sensual and exciting, Gregori and Savannah's story is fated love at its best. But as much as I adore destined mates, I'm a sucker for challenged couples. Slade by Laurann Dohner offers danger, love and heartache. Trisha and Slade's struggle to overcome their issues and find their HEA has ups and downs that leave me on the edge and revs up my pulse.
Clay & Susan Griffith, authors of the Vampire Empire series
What's keeping me (CLAY) warm? Two words — heat rays. I've been re-reading War of the Worlds by H.G. Wells. As with most of Wells' books, this one holds up really well despite the antiquated style. This classic story of a Martian invasion of Earth starts off quaint and chatty, but quickly turns dark and terrifying. The narrator, and the readers, barely have time to realize what's happening before suddenly normal society has been trampled by the tripods of the Martian war machines. The novel serves as a critique of colonialism, but beyond that, it's a terrific book with fantastic imagery and a simple story of a man who has lost his wife amid total catastrophe. Plus, the end of the book gives you another thing that will keep you warm (SPOILERS!) — a fever — which spells doom for the Martians in the end. Turns out they have no immunity to our germs, nor do their war machines stock Nyquil.
R.T. Wolfe, author of the Black Creek Series
If you can't beat 'em, join 'em. I'm cozying up with Nora Roberts' Northern Lights. Set in beautiful, frigid Alaska, a new police chief proves his worth while taking on the town's most feisty, aloof pilot. Together, they work to solve a murder and find their way through their relationship and the tundra.
Keep visiting HEA for more recommendations from our favorite romance authors. And in case you missed the first posts about hot reads to prevent freezer burn, check them out here, here, here, here and here.
HEA contributor and curator Joyce Lamb has 25 years of journalism experience and eight published romantic suspense novels, three of which have been RITA finalists. You can reach her at email@example.com and follow her on Twitter (@JoyceLamb). You can also follow HEA on Twitter (@HEAusatoday).


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Jame says his wife was the major driving force behind the site -- she needed help leveling, and he found that he had most of the major steps memorized. His site is run completely off of advertising, which he says keeps him from competing with other leveling guides that you must pay for to use. He's also working on an addon, and he says that it actually works faster than Questhelper, so that should be something to see.
Finally, he says he's working on putting together guides for other games -- "Diablo III, Starcraft II, and other MMOs" all get mentioned, so if you've already been following Jame's advice, you might be following it for a while longer. Good to get a little insight and background into the man behind the gold standard for leveling guides.


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Instantly see all available homes for sale in the Atlanta area – and get immediate access to the most complete real estate data, including multiple photos, interactive maps, neighborhood statistics, nearby schools and public transportation, a Walk Score©, and so much more (we'd be here all day if we listed out every awesome thing). Why wait? Start Searching.
Whether you're interested in buying a luxury condo, a single family home, a townhouse or anything in between, you'll have the opportunity to work with a licensed real estate agent who knows the realty process inside and out, and can help you stay a step ahead of any potential snags along the way.
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Copyright 1999-2015 and Patent Pending, ZipRealty. All rights reserved.


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Table of Contents
Cisco Wide Area Application Services vWAAS Installation and Configuration Guide
Displaying Version Information
Obtaining Documentation and Submitting a Service Request
This document describes how to install and configure virtual WAAS (vWAAS) on a VMware virtual machine (VM). The vWAAS software is a virtual form of WAN optimization that supports a virtual private cloud, and on- demand provisioning and teardown, reducing the branch office and data center footprint.
The vWAAS software supports WAN optimization in a cloud environment where physical WAE devices cannot usually be deployed. It also follows the VMware ESXi standard as the preferred platform to deploy data center applications and services.
Virtualization provides various benefits like elasticity, ease of maintenance, and a reduction of branch office and data center footprint. Virtual WAN optimization is the solution to virtual private cloud deployments that require on-demand provisioning and teardown. (See Figure 1.)
Figure 1 vWAAS—Virtual Private Cloud
vWAAS can be deployed at the traditional WAN-edge, in both the branch office and data center. It can also be deployed close to the server when vPATH interception is used.
This section includes the requirements for vWAAS:
– Cisco UCS or other x86 server including:
—64-bit CPU hardware from the VMware compatibility list (HCL).
—Intel VT (virtualization technology) enabled in the BIOS.
– Cisco ISR G2 with an UCS E-Series server module.
Install vWAAS 5.1 OVA, then upgrade using.bin file, or
- VMware vCenter server and vSphere client version 4.x management software.
- For virtual WAAS models that have a disk size greater than 256 GB, a datastore block size greater than 1 MB is required.
The following VMFS (Virtual Machine File System) limitations apply:
Note vWAAS models vCM-500N and vCM-1000N, introduced in WAAS v5.5.1, cannot be downgraded to a version less than v5.5.1.
Note The above two tables for ESXi server datastore memory highlight memory requirements for vWAAS only. To calculate total memory commitment, consider these additional memory requirements:
- minimum of 2GB memory is needed for VMWare v5.0/v5.1
- minimum of 4 GB memory is needed for VMWare v5.5
- memory overhead for vCPU memory (for example, for 1, 2, 4, or 8 vCPUs)
For example:
vWAAS-1300 requires 6GB and VMWare version 5.1 requires 2GB, so overall memory commitment is more than 8GB. With this configuration, any UCS-E module with 8GB default DRAM would also need to have DRAM upgrade added on the UCS-E to accommodate this.
- For the vWAAS datastore, you can use either SAN storage or local storage on the ESXi server. NAS storage should only be used in nonproduction scenarios (for test purposes, for example).
- The OVA file for the specific virtual WAAS model (all models are available with WAAS version 4.3.1 and later, except as noted):
- An ESXi server that has access to either a Central Manager or a virtual Central Manager (models vCM-100N, vCM-500N, vCM-1000N, or vCM-2000N) before installing vWAAS. A vCM does not require a Central Manager.
- Nexus 1000v version 4.2(1)SV1(4) for vPATH interception.
Note On the UCS E-Series Server Module running vWAAS, downgrading to a version earlier than 5.1.1 is not supported. On other vWAAS devices you cannot downgrade to a version earlier than 4.3.1.
Installing the vWAAS VM
You must first install the vWAAS VM on the VMware server using vSphere before configuring vWAAS. To install the vWAAS VM, follow these steps:
Step 1 From the vSphere Client, choose File > Deploy OVF Template. (See Figure 2.)
Figure 2 vWAAS—Deploy OVF Template
Step 3 Navigate to the location of the vWAAS OVA file and click Open.
Step 4 Click Next to accept the selected OVA file.
The Name and Location window appears.
Step 5 Enter a name for the vWAAS VM, choose the appropriate data center, and then click Next. (See Figure 3.)
Figure 3 vWAAS—Name and Data Center Location
The Cluster window appears (if a cluster is configured), or the Resource Pool window appears (if a resource pool is configured). Otherwise, the Datastore window appears (in this case, skip to Step 7).
Step 6 If configured, choose a cluster for the vWAAS VM or, if configured, choose the resource pool and then click Next.
Step 7 Choose a datastore to host the virtual machine and click Next. (See Figure 4.)
Note The datastore must be formatted with a block size greater than 1 MB to support file sizes larger than 256 GB.
The Disk Format window appears.
Step 8 Choose Thick provisioned format disk format and click Next. (See Figure 5.)
Note You must choose Thick provisioned format for vWAAS deployment.
The Network Mapping window appears.
Step 9 Choose the network mapping provided by ESXi and click Next. You have the option to change this later if necessary. (See Figure 6.)
Figure 6 vWAAS—Network Mapping
The Ready to Complete window appears.
Step 10 Click Finish to complete the installation.
The status window appears while the OVA file is being deployed. (See Figure 7.)
Step 11 When the deployment is finished, the Deployment Completed Successfully window appears. (See Figure 8.)
Step 12 You are ready to start the VM. Highlight the vWAAS VM and click Power on Virtual Machine.
Step 13 After vWAAS finishes booting, click the Console tab to view boot up messages. (See Figure 9.)
For vWAAS configuration information, see the "Configuring vWAAS" section.
Configuring vWAAS
Once the vWAAS VM has been installed, you must configure the following vWAAS settings:
- IP address and netmask
- Default gateway and primary interface
- Enterprise license
- Central Manager address
- Interception (WCCP or other)
To configure vWAAS for network connectivity, follow these steps:
Step 1 In the vSphere Client, choose the Console tab and log in to the vWAAS console.
The username is admin, and password is default.
Step 2 Configure the IP address and netmask using the interface virtual command:
Step 3 Configure the default gateway and primary interface using the ip command:
Note If you are using both virtual 1/0 and virtual 2/0 interfaces, you must associate the IP default gateway with the interface that is being used for vPATH interception. To route traffic through another virtual interface (generally management traffic to the Central Manager), you must configure a static route.
Note If you are using a separate virtual interface for management traffic, you must set the management virtual interface as the primary interface.
Ping the IP addresses of the default gateway and Central Manager to verify they can be reached before continuing to the next step.
Step 4 Add the Enterprise license using the license command:
Step 5 Add the Central Manager address using the central-manager command:
Step 6 Enable CMS to register with the Central Manager using the cms command:
Note vWAAS registration with the Central Manager is mandatory before traffic can be optimized.
Step 7 Configure either WCCP, AppNav, or vPATH interception for traffic redirection to vWAAS. WCCP uses a WCCP-enabled router or Layer 3 switch, while vPATH redirects traffic from within the Nexus 1000v virtual switch. For vPATH interception, see the "vPATH Interception" section.
Note You must configure WCCP-GRE as the redirection method for vWAAS running on a UCS-E inside a Cisco ISR G2, where the UCS-E interface is configured as IP unnumbered in IOS.
Refer to the Wide Area Application Services Configuration Guide to enable and configure WCCP interception.
Refer to the Wide Area Application Services Command Reference for more information on specific commands.
vPATH Interception
When vWAAS is deployed as a network service in the virtual data center, server traffic is intercepted in the Nexus 1000v virtual switch using vPATH interception and redirected to vWAAS for WAN optimization.
This section includes the following topics:
vPATH interception is configured on the port profile of the VM server in both directions to redirect the VM server packets to vWAAS. vWAAS receives the vPATH intercepted packet, performs WAN optimization, and returns the response packet to the VEM.
The vWAAS egress traffic received by the VEM is forwarded without further vPATH interception. (See Figure 10.)
Figure 10 vPATH Interception Overview
A special VLAN called the Nexus 1000v service VLAN is used for packets intercepted by vPATH and packets returned by vWAAS.
The Nexus 1000v switch uses the ARP mechanism in the service VLAN to check the status of vWAAS. If the switch does not receive any ARP replies from vWAAS during the timeout interval (18 to 24 seconds), the vWAAS is declared unreachable and it is removed from the service path. This behavior is known as fail-open mode, specified in the VN service configuration.
The key benefits of vPATH interception are the following:
- No need to define the direction of interception (in or out)—vPATH maintains a flow entry table for each TCP flow that is used to intercept and redirect traffic.
- Automatic bypass of pass-through traffic—vWAAS automatically sends offload to vPATH for pass-though traffic.
- Policy-based configuration—Policies defined in the Nexus 1000v VSM are propagated to VMware vCenter and applied to the specified virtual machine.
- VM mobility awareness—If a virtual machine is moved, vPATH continues to intercept and redirect traffic without requiring any network changes.
- Fault-tolerant persistent performance—vWAAS DRE cache can be deployed in SAN. VMware HA creates a new VM upon failure of the vWAAS using the same DRE cache storage.
The following requirements apply to the Nexus 1000V to support vPATH interception:
- Nexus 1000V 4.2(1)SV1(4) software version
- ESX/ESXi 4.0 Update 1 or later
- Virtual supervisor module (VSM) installed and configured
- Port profiles created (including vWAAS network profile, service-VLAN, which is mandatory)
- Virtual ethernet modules (VEM) installed
- Default network interface adapter for vWAAS with WAAS 5.1.1 and above is VMXNET3. For vWAAS with WAAS 5.2.1 and above, either VMXNET3 or E1000 can be used as the network interface adapter.
Configuring vPATH
vPATH interception method is used in the Nexus 1000v switch for vWAAS deployment in the data center.
Note vPATH 2.0 is supported on WAAS with the Nexus 1000v switch in the following version combinations: WAAS version 5.3 and later with the Nexus 1000v switch version 4.2.1v2.2.3, and WAAS version 5.2 with the Nexus 1000v switch version 4.2.1v1.5.2.
Internet traffic destined to the server is intercepted by the Nexus 1000v virtual switch (residing in the ESX host) and redirected to vWAAS for WAN optimization. vWAAS can run either in the same ESX host or in another ESX host which is L2 adjacent.
Similarly, the traffic from the server is also intercepted by Nexus 1000v switch and redirected to vWAAS for WAN optimization. (See Figure 11.)
Figure 11 vWAAS—vPATH Interception
To configure vPATH interception in the Nexus 1000v for vWAAS, you must configure port and VN service profiles, in addition to enabling vPATH:
– Create a port profile for vWAAS (WAAS VLAN)
– Attach the vWAAS port profile to the vWAAS VM
- Enable vPATH using the interception-method vn-service vpath global configuration command in vWAAS
- Configure vPATH interception on the port profile of the server to be optimized
Refer to the Cisco Wide Area Application Services Command Reference for more information on the vn-service global configuration command.
Displaying Version Information
To display vWAAS version information, enter the following commands:
Diskless Startup
Under rare conditions, the vWAAS VM may boot into diskless mode if other VMs on the host VM server do not release control of system resources or the physical disks become unresponsive. The vWAAS device raises a disk_failure critical alarm for disk01 and the show disk details EXEC command shows disk01 as Not used until replaced.
To recover from this failure, follow these steps:
Akamai Connect and vWAAS
The Akamai Connect feature integrates an HTTP object cache inside Cisco WAAS. This allows WAAS to cache any HTTP content whether it is delivered via your internal corporate network, direct from the Internet, or from Akamai's Intelligent Platform.
Note If you are running vWAAS prior to v5.4.1, you will need to add a third virtual disk, and in some cases more memory, to take advantage of the Akamai Connect feature.
To upgrade memory and disk to use the Cache Engine, follow these steps:
Step 2 Right-click the vWAAS and choose Editing Settings....
Step 4 At the Add Hardware dialog box, choose Hard Disk. Click Next.
Step 5 At the Select a Disk dialog box, choose Create a new virtual disk. Click Next.
Step 6 At the Create a Disk dialog box:
Step 7 At the Advanced Options dialog box:
Step 8 At the Ready to Complete dialog box, confirm the following options:
Step 10 The screen displays the status message New hard Disk (adding). Click OK.
Step 11 Wait until the Recent Tasks screen shows Reconfigure Virtual machine task as Completed. Power on.
Step 12 To verify the new disk, display the current hardware listing with Virtual Machine Properties > Hardware.
Related Documentation
For additional information on the Cisco WAAS software, see the following documentation:
- Cisco Wide Area Application Services Upgrade Guide
- Cisco Wide Area Application Services Quick Configuration Guide
- Cisco Wide Area Application Services Configuration Guide
- Cisco Wide Area Application Services Command Reference
- Cisco Wide Area Application Services API Reference
- Cisco Wide Area Application Services Monitoring Guide
- Cisco WAAS Installation and Configuration Guide for Windows on a Virtual Blade
- Cisco WAAS Troubleshooting Guide for Release 4.1.3 and Later
- Cisco WAAS on Service Modules for Cisco Access Routers
- Cisco SRE Service Module Configuration and Installation Guide
- Configuring Cisco WAAS Network Modules for Cisco Access Routers
- WAAS Enhanced Network Modules
- Cisco Wide Area Application Services Online Help
- Using the Print Utilities to Troubleshoot and Fix Samba Driver Installation Problems
- Regulatory Compliance and Safety Information for the Cisco Wide Area Virtualization Engines
- Cisco Wide Area Virtualization Engine 274 and 474 Hardware Installation Guide
- Cisco Wide Area Virtualization Engine 574 Hardware Installation Guide
- Regulatory Compliance and Safety Information for the Cisco Content Networking Product Series
- Cisco Wide Area Application Engine 512 and 612 Hardware Installation Guide
- Cisco Wide Area Application Engine 7326 Hardware Installation Guide
- Cisco Wide Area Application Engine 7341, 7371, and 674 Hardware Installation Guide
- Installing the Cisco WAE Inline Network Adapter
- Cisco Nexus 1000V Software Installation Guide, Release 4.2(1) SV1(4)
- Cisco Nexus 1000V Getting Started Guide, Release 4.2(1) SV1(4)
- Cisco Nexus 1000V and VMware Compatibility Information, Release 4.2(1) SV1(4)
- Cisco Virtual Security Gateway Firewall Policy Configuration Guide, Release 4.2(1)VSG1(1)
Obtaining Documentation and Submitting a Service Request
For information on obtaining documentation, submitting a service request, and gathering additional information, see the monthly What's New in Cisco Product Documentation, which also lists all new and revised Cisco technical documentation, at:
Subscribe to the What's New in Cisco Product Documentation as a Really Simple Syndication (RSS) feed and set content to be delivered directly to your desktop using a reader application. The RSS feeds are a free service and Cisco currently supports RSS version 2.0.
This document is to be used in conjunction with the documents listed in the "Related Documentation" section.
Cisco and the Cisco logo are trademarks or registered trademarks of Cisco and/or its affiliates in the U.S. and other countries. To view a list of Cisco trademarks, go to this URL: www.cisco.com/go/trademarks. Third-party trademarks mentioned are the property of their respective owners. The use of the word partner does not imply a partnership relationship between Cisco and any other company. (1110R)
Any Internet Protocol (IP) addresses used in this document are not intended to be actual addresses. Any examples, command display output, and figures included in the document are shown for illustrative purposes only. Any use of actual IP addresses in illustrative content is unintentional and coincidental.


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MU Visual Arts Center on track to open in '14
HUNTINGTON -- It may not look like much yet, but Marshall University's new Visual Arts Center in downtown Huntington will be something special when it opens next summer.
For now, the six-story former department store across from Pullman Square on 3rd Avenue simply looks like a 111-year-old building receiving an extensive makeover. And that's not really far from the truth, said Ron May, Marshall's director of Facilities Planning and Management.
He said 65 tons of new steel has been put in the building to help reinforce the structure and bring it up to new 2009 wind-load codes, meaning it can withstand speeds of up to 90 miles per hour.
At this point, workers with Neighborgall Construction are installing new floor insulation and drywall.
They also have demolished a section of floor on the ground floor, where new elevators and a stairwell will be built from the basement to the sixth floor. May said flooring on the upper floors will be ripped out next.
"We knew it would be an undertaking," May said.
Crews also are starting to install duct work, which will run through each floor in the old freight elevator shaft.
Contractors plan to start installing new windows by the end of September. May said they anticipate all the renovations to be completed by June 1, then spend June and July moving classroom equipment from Smith Hall. The new Visual Arts Center will be ready for the start of the 2014 fall semester.
Inside the Visual Arts Center:
The first floor will have a student art gallery and retail space, while classrooms, studios and offices will be on the second through sixth floors.
That will include dye labs, weaving, print making, screen printing workrooms, photography, papermaking digital labs, lighting studio, drafting and typography, drawing studio, painting studio and printing studio.


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RAFA A Forum For Rescues and Volunteers to Help All Animals in Need
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On Bended Knee by Nibbles Skribbles
Back in 2007, my husband proposed to me on February 1. 2 days after my birthday, and 2 weeks before Valentines Day. Perfect timing. Our proposal story is simple, I sent him to the grocery store for yogurt. He came home with yogurt and roses. While I was getting the flowers in a vase, he dropped to one knee, right there in our kitchen and proposed. It was perfect. Private and wonderful. I hope your proposal story is just as perfect, and if you want to scrap that memory - new or old - this is the perfect kit. On Bended Knee is soft, sweet and romantic. Filled with bits to help you remember that magical moment when he (or she) asked the big question "Will You Marry Me?"
On Bended Knee is new and on sale! Check out all of the On Bended Knee Products in my store here
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LYSA Registration
League registration open now! Choose adult, youth or TOPSoccer league and preferred registration method:
YOUTH Online Registration Link - for youth rec and TOPSoccer.
Pay by credit card online or pay by check via regular mail.
Youth Paper Registration Form - for Youth Rec and TOPsoccer *
Must be sent via regular mail along with check and photocopy of birth certificate if applicable.
*You need Adobe Reader to access the registration form. You can download here.
Adult Online Registration Link
Adult League Paper Registration Forms:
We have a strict no refund policy.


text:
Ancient Babylonian Medicine: Theory and Practice
March 2010, Wiley-Blackwell
- Represents the first overview of Babylonian medicine utilizing cuneiform sources, including archives of court letters, medical recipes, and commentaries written by ancient scholars
- Attempts to reconcile the ways in which medicine and magic were related
- Assigns authorship to various types of medical literature that were previously considered anonymous
- Rejects the approach of other scholars that have attempted to apply modern diagnostic methods to ancient illnesses
Table of Contents
List of Abbreviations.
Introduction to Babylonian Medicine and Magic.
1 Medicine as Science.
2 Who Did What to Whom?
3 The Politics of Medicine.
4 Medicine as Literature.
5 Medicine and Philosophy.
6 Medical Training: MD or PhD?
7 Uruk Medical Commentaries.
8 Medicine and Magic as Independent Approaches to Healing.
Appendix: An Edition of a Medical Commentary.
Subject Index.
Selective Index of Akkadian and Greek Words.
Index of Akkadian Personal Names.
Author Information
Markham J. Geller is Professor of Semitic Languages at University College London and Professor for the History of Science at the Free University Berlin. He is the author of Evil Demons: Canonical Utukkū Lemnūtu Incantations (2007) and Melothesia in Babylonia (2014), editor of Melammu, the Ancient World in an Age of Globalization (2014), and co-editor of Disease in Babylonia(2007) and Imagining Creation (2008).
"Ancient Babylonian Medicineis an important and fascinating book which not only provides a much needed introduction to the theory and practice of medicine in ancient Mesopotamia but also makes a significant contribution to the study of ancient Mesopotamian scholarship. It is clearly and elegantly written, nicely illustrated, and well produced." (Aestimatio, 1 June 2013)"This book is a rare achievement: as a scholarly work, it provides an important addition to the history of medicine; for the general reader, it is a fascinating introduction to the theory and practice of medicine in Mesopotamian society." (Antiquity Reviews, 2011)
"In sum, Geller has written a remarkably useful and thoughtful volume on what is an elusive topic. Assyriologists and historians of medicine will gain much from reading this work and it will certainly become required reading for the discipline." (Bryn Mawr Classical Review, 19 August 2011)
"Markham J. Geller brings a welcome, dual expertise now rather rare in medical history (he is an MD as well as a Rabbi and Professor of Semitic Languages), and some of his previous studies of Talmudic texts led him to the discovery of medical loan-words that turned out to be embedded Akka-dian dating from the period known as the "Babylonian Captivity". (Times Literary Supplement, 21 January 2011)
"He appends a commentary probably composed by the Uruk scholar Iqisa, who flourished in the latter part of the fourth century BC; the transcription, and possibly the translation, is from a 1924 edition by Campbell Thompson." (SciTech Book News, December 2010)"A magisterial overview of Babylonian medicine, extremely well written. Geller is eminently successful in opening up the subject to non-experts and stimulating historians of medicine of other periods to engage with the field."
Philip van der Eijk, Humboldt University Berlin


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A World with No Boundaries
Random musings of an independent American with Justin Kugler
Posts filtered on Tag
Sharing the love
At the NASA Tweetup for STS-135, the final Space Shuttle Launch, I was fortunate enough to share the experience with the participants and talk with them about what we do on the ISS. [Read More]
Don't give up on the space program
After I read an op-ed in the Minneapolis StarTribune complaining about the "end" of the manned space program, I was compelled to respond – because it isn't true. [Read More]


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As players travel through Tyria in Guild Wars 2, they begin to automatically accumulate skill points beginning at level 5. However, there are so many useful skills out there that a player needs all the skill points they can get their grubby little hands on. Guild Wars 2 helps fulfill the players' never-ending need for skill points by allowing the player to garner additional skill points through the use of skill challenges. Skill challenges are found in every explorable zone, whether it be PvE or WvW. You will see how many skill challenges are present in a zone by looking at the loading screen when you load into a zone.
Kessex Hills is the zone that most human players will adventure in once they leave Queensdale. While Kessex Hills has a large number of waypoints and vistas, there are only five skill challenges to be found here. The skill challenge can take several forms, ranging from simple interaction with an object to a brutal, knock-down fight or a combination thereof. Once a player successfully completes the skill challenge, they are rewarded with an additional skill point. To help you gain the maximum number of skill points, GuildWars2Hub.com offers this complete guide to the skill challenges found in Kessex Hills.
Skill challenge locations are marked on your map. To see where they are located, open your map by hitting the [M] key.
Indicates a skill challenge that has not been completed
Indicates a skill challenge that has been completed
Skill Challenge #1 - Blackroot Cut
This skill challenge is pretty straightforward and is found in the swamp of Blackroot Cut to the far east of the Kessex Hills. You can drop straight down onto it from the road above if you don't feel like fighting your way through the swamp to get to it.
This skill challenge requires to interact with an Eternal Portal, which will then spawn two shades for the player to dispatch. Kill the two shades and you'll gain your skill point. Overall, the fight is very straightforward. If you drop down from the road, make sure you stay away from any mobs wandering about so you don't aggro them during the fight. Lay down any traps and prep any other useful abilities you have right before you interact with the portal so the shades will immediately be impacted by your preparation.
Skill Challenge #2 - Draithor's Demesnes
The second skill challenge in Kessex Hills is located southward of the first skill challenge and is found at Draithor's Demesnes. This skill challenge is found within a cave in the swamp. You'll have to fight through a number of various creatures of Draithor to reach the skill challenge location. To gain the skill point, you'll have to interact with the Enchanted Meat Rack, which will give you a piece of Draithor's Lab's Powerfully Weird Meat. Once you eat the meat, you'll gain the skill point.
The rub in this challenge is that the meat rack is in a room filled with Draithor's creatures. You'll need to drop them as quickly as you can and then interact with the meat rack. The creatures respawn really quickly so don't dilly-dally in this location. Grab the meat and run out.
Skill Challenge #3 - Garenhoff
The third skill challenge in Kessex Hills is located in the town of Garenhoff, which can be found in the Wizard's Fief section of the zone. This skill challenge requires the player to defeat a flame elemental by the name of Merkessa. To begin this challenge, speak to the man next to the elemental, Master Elementalist Dylane. Once you've confirmed that you're ready to go, the fight is on.
This can be a difficult fight. The elemental does a lot of damage and spawns molten areas that do AoE. Personally, I found that using ranged weapons was better dealing with him. In addition, you should prep any traps or other buffs right before you agree to the fight. The easiest way to deal with the elemental is with a group. Once somebody starts the skill challenge, other players tend to rush over to take part as well. The fight itself is kind of hard to miss if you're in the area.
Skill Challenge #4 - Meremoot Hill
The fourth skill challenge in Kessex Hills is found in a cave at Meremoot Hill. To fulfill this skill challenge, all a player needs to do is commune with a pillar of light. The difficulty here is that the pillar is in the center of a centaur encampment. In addition to all the normal centaurs in the area, the Harathi Overlord, a centaur champion, spawns in this area, which is a dynamic event (LINK) in of itself. My recommendation is to go into this skill challenge when the Overlord spawns and a group of players assemble to take him out. The players will usually slake their bloodlust by killing all the centaurs in the area and you'll be free to commune with the pillar of light.
Skill Challenge #5 - Eukaryan Caves
The final skill challenge for Kessex Hills is found on top of the Eukaryan Caves. This skill challenge takes the form of a fight against Toratl. All you have to do to start the fight is talk to him and let the fight begin. Toratl starts out with a leap attack, but otherwise his combat maneuvers are pretty standard. The wrinkle in the fight comes from the war machine by his side, Ol' Stinky. This weapon fires out a gob of poisonous goo that lays out a small AoE attack that lingers in an area for some time. You will want to avoid these goo splatters and go all out on Toratl. As long as you're not stupid and fight while standing in the noxious ooze, you should easily win this fight.
Overall, there are a lesser number of skill challenges found in Kessex Hills than in other zones. The difficulty level for completing these skill challenges is pretty low, with the elemental fight and the challenge located in the centaur encampment being the two most difficult ones to complete. Five extra skill points are nothing to scoff at, and with Guild Wars 2's dynamic leveling system, you can hit Kessex Hills at any time. Gotta collect them all!


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The American Queen, considered the largest riverboat in the world, is set to dock at Huntington's Harris Riverfront Park from 8 a.m. to 5 p.m. Thursday, June 26, and from 1 to 5 p.m. Monday, June 30. The riverboat has not stopped in Huntington for more than a decade, so if you want to head down to the riverfront to take in the sights, here's what to know before you go:
WHAT YOU'LL SEE: It's free to view and take photos of the American Queen, but there are no public tours of the docked boat. Dale Jones and the Backyard Dixie Jazz Stompers will play Dixieland Jazz music from 3 to 5 p.m. Thursday, while Dave Peyton, Joe Dobbs and Charlie Bowen, and their string-based jug-band The 1937 Flood, will play from 3 to 5 p.m. Monday.
JEWEL CITY HOSPITALITY: The Cabell Huntington Convention and Visitors Bureau asks that folks come to the park at 5 p.m. for both dockings to wave to the boat's passengers as they depart.
ABOUT THE QUEEN: The U.S. flagged American Queen is longer than a football field, towering six decks in height and laced with fanciful gingerbread trim. It has 222 state rooms for a capacity of 436 guests and a crew of 160. She is 418 feet long and 89 feet wide.
FOR MORE INFO: Contact the American Queen Steamboat Company at 888-749-5280, visit online at www.AQSC.com or call a professional travel agent for reservations or if you have any questions.
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Christopher Moon, president of Haunted Times Magazine, led the group through the paranormal findings. Moon, a former rock star, is also an instructor at local Ghost Hunter Universities around the country. He attracts guests from all over the world who want to learn first-hand the secrets to finding ghosts. His documentary, "Chasing the Shadows," follows Moon and his crew on some ghost hunts, where they provide some shocking evidence of communication with spirits. John Zaffis, "Godfather of Ghost Hunting," has over 30 years of experience investigating paranormal cases that include exorcisms and possessions. He appears in Moon's documentary, and was featured in "A Haunting in Connecticut," a Discovery Channel documentary. He is the nephew of Ed and Lorraine Warren, who did an investigation in West Hall in 1999 by sensing energy, but not with technology.
After getting cooperation from the Arts Department and necessary officials on campus, the Rensselaer Union Speakers Forum—along with people from public safety, student activities, and the Arts Department—brought Moon and Zaffis into the boiler room. The space is under the ground floor and had originally been used as a furnace room to heat the building. As soon as they entered the room, electromagnetic field (EMF) detectors were showing abnormal readings. Moon advised the students to start taking pictures, as energy creates orbs that can be seen if the auto-adjust setting is off. These orbs look similar to dust spots, but apparently if the picture is zoomed in, you can almost make out a face in the circle. The room was full of energy, so there were lights showing up in everyone's pictures.
After the students were done with pictures, Moon prepared a tape recorder to try and catch a conversation between the entities and the investigators in the room. He was very polite, explaining why the group was there, and thanked the spirits for letting the people into their world. Moon talked about the red dot on the recorder and asked the spirits to direct their comments to the dot. Afterward, Moon played the recording back on machines that he had brought with him. The students asked how many spirits were there, to which they heard a response of "80." They also asked general questions about the spirit's occupation, age, and feelings toward the people in the room.
After the boiler room, the investigators went to where the Poly office used to be, and the EMF machines again gave them abnormal readings. The visitors were again told to start taking pictures, and Moon hooked up "Edison's telephone to the dead," also known as "Frank's box," which Edison invented after his mother died to try to communicate with her. The machine is meant to pick up sound frequencies and convert them into real-time audible information. The crowd asked more questions, such as how many people were in the room. When the sound played back, there were three answers: a whisper of a "two," a "nine," and a "six." Moon explained that there could be different levels of energy that might not even be aware of the other levels in the same space. Someone asked about Betsy, to which they heard "Frank knows." There was also a piano in the room, and the spirit was asked to pluck a string. It made a noise like a musical note and asked if that was okay.
The final room they visited was the auditorium, and the pictures were showing many orbs on the stage. Once everyone sat down in the front row, the energy moved behind them as if the people were being watched, not vice versa. All in all, they were walking around looking for energy for almost four hours, until 12:30 am.
The next evening, Moon and Zaffis gave a lecture in the DCC sharing the information they gathered. While some people were skeptical of the findings, the two showed pictures of the orbs around the students and discussed the noises heard on the tape. The audience could choose to believe or not, but the evidence provided was shocking.
The Speaker's Forum is a group of students under the direction of Cameron McLean. They are dedicated to bringing in lecture programs that both entertain and inform by taking academic teachings one step further outside the classroom.


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Posts Tagged: comedy
This book is officially my favorite book, it has girly, romance, humor, and action. All in one! They have that kind of Hunger Games Capital Feel to it though for the Corporation which made you feel like someone was always watching you. There are fifty girls on the plane going to one single place to get judged by beauty, talent, and smarts and one of them to be crowned Miss Teen Dream. They all crash land on a deserted island. Can you imagine what could happen next?
How would I describe this book? Probably as "a satirical social critique disguised as a John Greenesque high school sex comedy." With a narrative voice straight out of a Woody Allen film, Ned Vizzini tells the story of a typical neurotic teenaged schmuck named Jeremy Heere, who inhabits a very atypical plot. He, wanting to be more cool, swallows a pill called a "squip" which is a supercomputer in pill form that begins to inhabit his brain and control his life. This makes him cool, but at the same time takes a toll on his personal life. Did I like Be More Chill? That's a hard question. Often the tone of the book was too arch-snobbish for me, and the wannabe-Byron protagonist often grated, but the little complexities (e.g. the implied fact that the book is set in an alternate reality) and the dry, sarcastic sense of humor that the squip (who speaks with Jeremy throughout the entire book) itself has pushes past those small disputes I had before. Over all, Be More Chill is a flawed, but entertaining book.


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In 1999, we entered what would eventually be known as the smartphone era. I bought my first Blackberry device from a company called Research In Motion Research In Motion (RIM). This PDA (personal digital assistant) device, which was nothing more than a pager with email capabilities, would soon become one of the first if not smart, then at least semi-intelligent phones. For me, it was the most innovative thing around – I had to have it on my belt, right next to my Motorola flip phone. Wearing a dark blue suit, and now rocking a utility belt with advanced communications technology, I felt like Bruce Wayne.
Those days seem like an eternity ago. Since the days of would-be superheroes, back when people still talked to each other face-to-face, the world of technology has leapfrogged us into a world of high res video and photography, social media and streaming video, all in one device. There is even an app today that helps humans to be more emotive in interpersonal conversations – taught by a computer. RIM most certainly was one the first innovators in the smartphone era, but has since struggled to innovate.
Value from the ashes?
Following the success of the Blackberry, many new market participants entered the wireless battleground, but Apple Apple and Samsung were the most successful in destroying Blackberry's dominance. As with most new technology, something better is always around the corner and ultimately Apple and Samsung's dominance led Blackberry to sign a letter of intent from Fairfax Financial Fairfax Financial Holdings to pay shareholders $9 a share, to take the company private. At this point, it is unclear to me why anyone would be tempted to make such an acquisition, given the company's uncertain future, unless the buyer saw hidden value. Blackberry's portfolio of patents is estimated to be worth $2 billion and they had about $2.6 billion in cash at the end of the last quarter. Add it all up and you've got yourself the purchase price.
A crisis of innovation
Karlheinz Brandenburg, the director of the Fraunhofer Institute for Digital Media Technology in Ilmenau, Germany is often cited as the inventor of the MP3 player. This invention paved the way for Steve Jobs' creation of the Apple iPod, which help catapult this languishing technology company into the largest publicly traded company in world history, based on market capitalization. The creation of the iPod led the company to create smaller versions of the music player, which later lead to the the creation of the iconic i-Phone and later the i-Pad. The invention by Brandenburg, by any measure, helped change how the world listens to music, surfs the internet and communicates.
There have been numerous failed attempts from competitors to knock the Apple cart over, but Samsung has been the only formidable competitor with their smartphone that uses Google's Google's Android operating system. Today, Apple and Samsung continue the fight to garner the most smart phone users, each trying to outdo the other by constantly making improvements to the existing technology. As we watch the unraveling of Blackberry, one wonders: who will be victorious long-term and who will join the ranks of the vanquished? Wall Street puts tremendous pressure on Apple to innovate. Since Steve Jobs died, the technology world has been abuzz with speculation about the legacy of technological advances that Mr. Jobs left behind, the proverbial pipeline of great new products that will change the world.
Apple regularly hosts product launch events, and the stock typically rises leading into the meeting and typically drops considerably after the event. The investment community anxiously awaits the big announcement, that usually ends with disappointment that Apple hasn't reinvented the wheel. Apple is an amazing company and truly has changed the world with the iPod and iPhone but is it really possible to do this repeatedly? Before Steve Jobs returned to his post Apple was a different company – will it slide backwards?
Maybe Apple or Samsung won't be the company that delivers the next big gadget that the world can't live without. Apple and Samsung are under tremendous pressure from Wall Street – there is an innovation crisis being forced upon them. Investor Investor expectations are out of whack with what these companies can realistically do, and they may be in a no-win situation. You would think that investors might be focused on how much money Apple has in the bank, with no debt and one hell of lineup of digital products – but that does not move the needle these days.
Enter the upstart
While a deal appears imminent between Apple and China Mobile China Mobile, Lenovo has been busy climbing the ladder in China and currently ranks fourth among the smartphone makers and fifth in the tablet segment. In Lenovo's most recent earnings report, mobile handsets now represent 14% of total revenues. Currently, this growth story is primarily in China, with 80% of its devices sold there. But Lenovo could easily enter the U.S. market, and what some may be overlooking is that they manufacture their own devices. Apple designs and engineers their technology, but the devices are made by third-party manufacturers like FoxConn. One of the biggest issues with the Apple iPhone is the cost, and Lenovo could likely offer their own devices at a much lower price point, which could be a real issue for Apple. Also, remember the Google purchase of Motorola Mobility Motorola Mobility? Maybe we are seeing the signs of the future. It won't necessarily need to be a wildly different device, but maybe it will be a much cheaper device. With the pressure on Apple and Samsung showing no sign of abatement, now may be the perfect time for a new contender to enter the ring.
Ryan Wibberley is the Chief Executive Officer at CIC Wealth


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Criticism of Catholic Care Continues in KentuckyBy
Pro-abortion and anti-fertility advocates in Kentucky continue to wage battle against a merger in which Catholic hospitals are graciously bailing out the failing University Hospital in Louisville. The anti-life advocates want to force the Catholic owned entity to facilitate abortions, sterilizations and the like.
The merger would combine Jewish Hospital and St. Mary's and St. Joseph's Hospitals with University Hospital.
University officials insist "the merger is a financial necessity. They don't have a backup plan to remain financially stable if it isn't approved." The Catholic hospitals in this merger are pouring hundreds of millions of dollars into the effort to make the hospital facilities better and to offer real medical care in a better way to the community.
And yet, the only thing that pro-abortion activitsts can do is clamor for abortion and sterilization. Governmental and non-governmental pro-abortion extremists are in an uproar about the prospect that this new entity, which the Catholic hospitals will pay handily for to own a large majority of, will actually abide by Catholic practice and not perform abortions, sterilizations or the like.
They even had a committee hearing yesterday in the Kentucky General Assembly on this issue, complete with a grilling of merger officials about where, o! where, will people get their anti-life and anti-fertility procedures!
What's worse, the attack was led in the Assembly side by a so-called Catholic, State Rep. Tom Burch, who "opposes the merger for the same reason" as pro-abortion activists do and who declared that "As a conscientious Catholic, I have an obligation to my constituents and to the people of Kentucky (to see that) that they do not fall under dictates that they do not believe in."
Aren't you glad that there are Catholic politicians out there willing to take a stand for death and barrenness!
Thankfully, the Diocese of Louisville is headed by a great man. Archbishop Joseph E. Kurtz of Louisville is Vice President of the USCCB and has been a national champion on social issues, in particular on marriage. The Archbishop declared very clearly and calmly that "If something calls itself a Catholic ministry, it is the responsibility of the bishop to ensure as best we can that that indeed is an accurate title."
In his article in the archdiocesean paper on August 5, Archbishop Kurtz added poignantly: "Does it truly serve the common good to require us or any health care provider to violate important issues of conscience or principle in order to provide for the health of persons within our community?"
News articles indicate that members of the University, such as doctors at the med school, are not themselves being merged so they will plan to do their anti-life and anti-fertility procedures elsewhere. Even that, however, isn't enough for pro-death extremists. They want to force the Catholic entities to participate, on the Catholic hospital's dime.
5 thoughts on "Criticism of Catholic Care Continues in Kentucky"
@ Hi Matt thanks for the article, but how exactly is a Catholic hospital "forced" to perform abortions? They aren't. There is absolutely no one way can a Catholic hospital be forced to kill babies, unless they willingly and purposely choose to do so. What theses hospitals will do is threaten shutdown. If they are "force" to perform abortions they have no choice but to lay everyone off, turn off the lights, lock the doors and go home. Be a cold day in Hell Catholic hospitals are accomplices to murder.
I actually am concerned about this situation. This is apparently the only emergency hospital in this town. What happens if a woman is taken to this hospital under emergency conditions and is refused certain services as a result. The original article references a C-section and sterilization which are often done together especially when the pregnancy includes hypertension as future pregnancies are incredibly risky to a mothers life after a hypertensive pregnancy. I don't think it's reasonable to expect non-Catholics to understand that the hospital would be unwilling to do such a procedure and it puts this hospital and Catholics in a horrible position where we must refuse to do a procedure that most reasonable people would consider as protecting the mothers life.
So we should compromise on life when it's not a Catholic patient? I find it interesting that you explain the sterilization procedure above as "protecting the mother's life." Since when are future pregnancies the doctor's decision? Many women get abortions or use contraception to protect their lifestyles. They show that they are not open to life, therefore they put their soul in mortal danger. A sterilization, done under the excuse of possible future danger, is the same thing, but more permanent. A good Catholic woman would practice natural family planning or abstinence if necessary, but would remain "open to life" by not mutilating her body and becoming sterile. A future pregnancy in this case would still be welcomed as a blessing from God, albeit with its own unique challenges. NEVER deem to put the life of the mother before the life of the unborn, innocent babies.
What a fabulous idea! We can't change Roe v. Wade and make abortion and contraception illegal, but we can buy up all the hospitals in certain areas and cease doing abortions or offering birth control. Same thing! No legal abortions or birth contol available to the people of Kentucky. We can force everyone to live by our beliefs even when they aren't catholic, AND they are going to pay us to do it! I'm really excited about this approach.
So am I. This is capitalism and the free market in action. The nation clamors for pro-life driven healthcare. Note that the abortionist hospitals are failing, while being bailed out by Catholic hospitals! If leftists want abortion factory hospitals so badly, they can pay for them out of their own pocket – and it looks like they are becoming less and less able to do so. Let us pray that Catholic hospitals become the predominant (or ONLY!) type of hospital in Kentucky and eventually the nation. We will have to fight, though, when 0bama tries to pass laws forcing Catholic hospitals to abandon their pro-life stance. Prepare yourselves.


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Every person is a potential target of a consumer scam, as anyone with an email account knows. The rise of computers and the internet have spawned new methods of consumer fraud, which can now be committed by someone in another state or even another country. But we still face plenty of fraud committed through telephone solicitations, door-to-door and mail-order sales, and a host of other types of fraud.
National Consumer Protection Week is a good occasion to reflect on the importance of protecting consumers and promoting responsible consumer activity. Wisconsin has strong laws protecting consumers, and my office will continue to enforce those laws vigorously. In the past couple of years, my office has filed cases against telemarketers, remodeling contractors, internet vendors, telecommunications companies, locksmiths, phony charities, travel clubs, fitness centers, and many other types of businesses who have tried to take unfair advantage of Wisconsin residents.
We will continue to take strong action against those who violate our consumer protection laws. But the best way to prevent consumer fraud from happening in the first place is for consumers to follow basic precautions so that they can recognize consumer fraud and avoid falling victim to it.
Here are some basic tips every consumer should follow:
An educated consumer is the enemy of would-be scammers. By taking proper precautions, and by reporting illegal activity to law enforcement, we can work together to defeat consumer fraud.


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For being one of NYC's largest venues, Terminal 5 felt packed to its limit by the time SBTRKT got their set kicked off. Perhaps the fact that they started an hour late due to sound issues made the crowd seem larger and more restless, but we in the audience weren't the only ones annoyed by the delay– SBTRKT's Aaron Jerome began the show with an exasperated, "I hope this one f*cking works." Thankfully his wish came true, and the crowd forgot all their worries by the time Sampha, the other half of SBTRKT, began belting out the second song (the very singalong-able "Never Never"). Sampha's soaring vocals and Jerome's virtuoso drumming merged with the duo's banging electronics to create a bombastic, dynamic sound that contained the best of both the pop and electronic worlds. A drunken bro behind me described this phenomenon as "halfway dubstep." Whatever sound they produced, SBTRKT had the crowd singing along with them and dancing, the most energetic of which occurred whenever Sampha started playing on his congos and cowbell setup. The audience's biggest sign of approval came during the opening notes of hit single "Wildfire"– girls screamed, boys shouted, and everyone in sight raised their hands to the sky. It was then that SBTRKT, sound issues and all, really brought the house down. –Patrick Lyons
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Rifling through dusty and forgotten things back at the homestead in Jacksonville, I ran across my old CD collection. With over 400 discs, you could say that I was something of a music junkie, but music had been my way of traveling by proxy for years. One of the flyest standouts in my collection is Jazzanova, a Berlin-based collective of DJs and musicians that has been expertly mixing sounds and cultures since the mid-90s. Jazzanova defies categorization, at once jazz, soul, electronica, and house, but it's the perfect accompaniment to a long drive, a chill evening at home, or an international flight. Have a listen and get lifted:
And then, there's the live show:
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