text:
Minimum line spacing is reduced and line spacing uniformity is increased in thin film transistors by employing source/drain metallization having a first relatively thin layer of a first conductor and a second relatively thick layer of a second conductor. The second conductor is selected to be one which may be preferentially etched in the presence of the first conductor whereby the first conductor acts as an etch stop for the etchant used to pattern the second conductor portion of the source/drain metallization. This etching is preferably done using dry etching. Dry etching typically provides substantially better control of line width than wet etching. The etching of the second conductor can be done with a dry etch process which etches the photoresist at substantially the same rate as the second conductor whereby the second conductor is provided with a sidewall slope of substantially 45° which improves the quality of passivation provided by subsequent deposition of a conformal passivating layer.
1. A method of fabricating a thin film transistor comprising:
partially fabricating said thin film transistor up to deposition of a source/drain metallization layer, the partially fabricated thin film transistor having an upper surface comprising silicon;
depositing a relatively thin first layer of a first conductor on the partially fabricated transistor, said first conductor comprising chromium;
depositing a relatively thick second layer of a second conductor on said first conductor, said second conductor comprising molybdenum;
masking said second conductor in a desired pattern of said source/drain metallization layer;
etching said second conductor with a second conductor etchant, said second conductor etchant being selected such that the first conductor comprises an etch stop therefor, said second conductor etchant further being capable of etching silicon at a rate that is not substantially less than the rate said second conductor etchant etches said second conductor;
etching said relatively thin first conductor with a first conductor etchant, said first conductor etchant being selected such that the silicon upper surface of said partially fabricated thin film transistor comprises an etch stop therefor; and
finishing the fabrication of said thin film transistor.
2. The method recited in claim 1 wherein:
the step of masking comprises forming a photoresist mask; and
said second conductor etchant further being selected to etch said photoresist at substantially the same rate as said second conductor whereby said second conductor is patterned with a sloped sidewall.
3. The method recited in claim 1 wherein:
said etchant for said second conductor etches said second conductor at least 10 times as fast as it etches said first conductor.
4. The method recited in claim 1 wherein the steps of depositing said layer of said first conductor and depositing said layer of said second conductor are sequentially performed in an evacuated deposition apparatus without breaking vacuum.
5. The method recited in claim 1 wherein:
each of said etchants comprises a plasma, and said first and second conductors are sequentially etched by said etchants in an evacuated reactive ion etching apparatus without breaking vacuum.
6. The method as recited in claim 1 wherein:
each of said etchants comprises a plasma, and said first and second conductors and said partially fabricated thin film transistor are sequentially etched by said etchants in an evacuated reactive ion etching apparatus without breaking vacuum.
This application is a division of application Ser. No. 07/825,218, filed Jan 24, 1992 now U.S. Pat. No. 5,198,694, which is a continuation of application Ser. No. 07/593,419, filed Oct. 5, 1990, now abandoned.
The present application is related to application Ser. No. 07/593,425 now abandoned, filed Oct. 5, 1990, entitled "Device Self-Alignment by Propagation of a Reference Structure's Topography", by C-Y Wei, et al.; application Ser. No. 07/593,423 now abandoned, filed Oct. 5, 1990, entitled, "Positive Control of the Source/Drain-Gate Overlap in Self-Aligned TFTs Via a Top Hat Gate Electrode Configuration", by C-Y Wei, et al.; application Ser. No. 07/593,421 now abandoned, filed Oct. 5, 1990, entitled, "Thin Film Transistor Having an Improved Gate Structure and Gate Coverage by the Gate Dielectric" by R. F. Kwasnick, et al.; application Ser. No. 07/510,767, now U.S. Pat. No. 5,130,263 filed Apr. 17, 1990, entitled "Method for Photolithographically Forming a Self-Aligned Mask Using Back Side Exposure and a Non-Specular Reflecting Layer", by G. E. Possin, et al.; and application Ser. No. 07/499,733, now U.S. Pat. No. 5,010,027 filed Mar. 21, 1990, entitled "Method for Fabricating a Self-Aligned Thin-Film Transistor Utilizing Planarization and Back-Side Photoresist Exposure", by G. E. Possin, et al., filed Mar. 21, 1990, each of which is incorporated herein by reference.
1. Field of the Invention
The present invention relates to the field of thin-film transistors and more particularly to the field of thin-film transistor metallization.
2. Background Information
Amorphous silicon (a-Si) thin-film transistors (TFTs) are used in both display and imager applications. These field effect transistors (FETs) are primarily used in array devices in which the electro-optically active portion of the devices comprises many individual pixels the electro-optical state of which must be individually set or read in accordance with the display or imager nature of the device. As such, such TFTs are fabricated in large quantities, in small sizes and in substantial densities on the substrates for such systems. For optimum system operation, every one of the TFT's in the array should have identical characteristics. While absolutely identical characteristics are probably unobtainable, there is presently a substantial problem with excessive variations in TFT characteristics across an entire array and even more so across an entire wafer. In particular, because of processing variations, the thin-film transistors in one portion of an array may have significantly different characteristics than the thin-film transistors in another portion of the array. Such variations in characteristics unduly restrict the maximum operating characteristics of the array (speed, signal to noise ratio, sensitivity and so forth). A parameter in which variation across a wafer is common is the spacing between the source and drain electrodes of the TFTs. Such variations have a number of undesirable effects. A larger source-to-drain electrode spacing translates directly into a larger source-to-drain region spacing which in turn results in reduced off-state capacitance for the thin film transistor. Another effect of increased source-to-drain electrode spacing is a reduction in the current provided by the transistor in response to a given set of gate and source-to-drain voltages. This reduction in current can decrease the speed of a liquid crystal display or increase the noise in an imaging device. Consequently, there is a need for improved thin-film transistor structures and methods of processing them which reduce, minimize or eliminate significant variations in the source-to-drain-electrode spacing of thin-film transistors across an array with a consequent reduction in variations in capacitance and current output. It is normal practice in the thin film transistor art to employ wet etchants to etch the source/drain metallization because such wet etchants are available which are highly selective between the source/drain metallization and the immediately underlying amorphous silicon which comprises the semiconductor material of the thin-film transistor. This use of wet etchants makes it possible to completely remove the source/drain metallization from the channel region of the transistor's semiconductor material without significant etching of the semiconductor material itself. Unfortunately, use of wet etching limits the main source-to-drain-electrode spacing due to linewidth loss from undercutting. Still worse, because the undercutting of the photoresist by the etchant is non-uniform and uncontrollable, such spacings vary significantly from lot to lot and in different portions of the same array. A source/drain metallization structure which is photoresist defined with a three micron spacing can end up after completion of the wet etch with as much as a four or five micron spacing. Still worse, this spacing typically varies across a given array.
A layer of chromium or a layer of molybdenum is commonly used as the source/drain metallization for thin-film transistors because each of them makes good ohmic contact to n+ amorphous silicon. These metallizations are typically deposited by sputtering. A common wet etchant for molybdenum is known as PAWN (phosphoric acid, acetic acid, water and nitrite acid). Such wet etchants have the unfortunate characteristic for thin-film transistors of patterning molybdenum with vertical sidewalls. As is well known in the semiconductor art, vertical sidewalls make it substantially more difficult to successfully passivate a structure with a deposited layer such as silicon dioxide or silicon nitride as compared to the same structure with sloped sidewalls. Non-continuous passivation can cause damage to lower layers while etching subsequently deposited layers of material.
A plasma or reactive ion etch (RIE) process can provide the required uniform source/drain metal spacings since such processes can be anisotropic in nature. In applications where a large area needs to be patterned, as in the case of an 8"×8" liquid crystal display, typical RIE edge to center clearing, commonly referred to as the "bull's eye effect", can result in excessive and non-uniform removal of the underlying material, which in this application is silicon. The "bull's eye effect" becomes worse with increases in the thickness of the material being etched, and with the size of the part being etched.
Due to the aforementioned problems, there is a need for: a) an improved thin film transistor structure and fabrication process which provides the ability to produce more uniform source/drain spacings across an entire array or structure, b) the ability to produce smaller spaces between the source and drain electrodes in the vicinity of the channel region of a thin film transistor, c) an etching process which produces a source/drain metallization with a sloped sidewall profile so that subsequently deposited layers can more successfully passivate that structure and d) an etch process which patterns the source/drain metal without excessive and non-uniform removal of the underlying material.
Accordingly, a primary object of the present invention is to provide a thin film transistor structure which may be accurately and uniformly reproduced across an entire array or structure.
Another object of the present invention is to provide a thin film transistor fabrication process which results in closer control of source/drain region spacing.
Another object of the present invention is to provide a thin film transistor fabrication process which produces source/drain metallization having sloped sidewalls which facilitate high integrity conformal deposition of overlying passivation layers.
Another object of the present invention is to provide a thin film transistor fabrication process which patterns the source/drain metallization without excessive and non-uniform removal of the underlying materials.
The above and other objects which will become apparent from the specification as a whole including the drawings, are accomplished in accordance with the present invention by providing a two layer source/drain metallization structure in which a first relatively thin layer of a first conductor is disposed directly on the underlying amorphous silicon material and a second relatively thick layer of a second conductor which is disposed directly on the first conductor with the second conductor being one which can be preferentially etched in the presence of the first conductor.
In accordance with one method of fabricating such a thin film transistor, the thin film transistor is fabricated up to deposition of the source/drain metallization in a normal fashion. A first thin layer of a first conductor which preferably makes good ohmic contact to the semiconductor material is deposited directly on the semiconductor material. Thereafter, preferably without breaking vacuum in the deposition apparatus, a second thicker layer of a second conductor is deposited on the first conductor. A photoresist mask is then formed on top of the source/drain metallization with a pattern of open areas which leaves the source/drain metallization exposed where it is desired to remove the source/drain metallization. The structure is then preferably dry etched using reactive ion etching with an etchant gas which etches the second conductor much faster than it etches the first conductor. The second conductor is overetched in the sense of the etching process being continued for a period of time after it is determined that the first conductor has been exposed in the openings in the mask. This overetching is to ensure the complete removal of the second conductor in all of these openings all across the wafer and particularly all across each of the individual thin film transistor arrays being fabricated. Thereafter, the source gas for the reactive ion etching is changed to one which etches the first conductor. This second etchant source gas is preferably one which provides etch selectivity to the underlying semiconductor material. However, because the first conductor layer is relatively thin, the etch selectivity to the underlying material can be lower than that which would be required if the first conductor were omitted since the uniformity of metal clearing is greater with thinner films and the time that the underlying material is exposed to the etching gas is shorter.
Following etching of the first conductor, the fabrication of the thin film transistor is completed in the normal fashion.
The first conductor is preferably chromium, while the second conductor is preferably molybdenum. The etching gas for the second conductor (Mo) is preferably a mixture of SF6, Cl2 and O2 and the etching gas for the first conductor (Cr) is preferably a mixture of Cl2 and O2.
The subject matter which is regarded as the invention is particularly pointed out and distinctly claimed in the concluding portion of the specification. The invention, however, both as to organization and method of practice, together with further objects and advantages thereof, may best be understood by reference to the following description taken in connection with the accompanying drawings in which:
FIGS. 1-12 illustrate successive stages in the fabrication of a thin-film transistor in accordance with the present invention.
FIG. 1 is a cross-sectional view of a substrate 12 on which a plurality of thin-film transistors are to be fabricated. A layer of gate metallization 18 is disposed across the entire upper surface of the illustrated portion of the substrate 12. This gate metallization preferably comprises two separate sublayers 14 and 16, but may be a single layer of one conductor if desired. This gate metallization is then patterned in accordance with any of a variety of known techniques to provide the structure illustrated in FIG. 2 where the gate metallization 18 is now restricted to those locations in which gate metallization is required in the final structure. This patterning process may preferably be done photolithographically with photoresist and a wet or dry etchant in accordance with a particular gate metallization employed and the practitioner's preferences. In accordance with related application Ser. No. 07/593,423, the gate metallization 18 may preferably be a two-layer gate metallization of molybdenum over chrome and may preferably be patterned by reactive ion etching to provide a sloped sidewall on the gate metallization as explained more fully in that application.
Following patterning of the gate metallization 18, a gate dielectric layer 28 is deposited across the entire upper surface of the substrate and gate metal. Coverage at the edges of the gate metal is improved by providing a sloped gate metallization in accordance with the teachings of related application Ser. No. 07/593,421. The gate dielectric is preferably 0.1 to 0.5 microns thick. Next, a layer 30 of intrinsic amorphous silicon from 0.1 to 0.5 microns thick is deposited on the gate dielectric layer without breaking the vacuum in the deposition chamber. Next, a layer 32 of n+ amorphous silicon from 0.01 to 0.1 microns thick is deposited on top of the intrinsic silicon 30, again without breaking the vacuum in the deposition chamber. The structure at the end of these steps is illustrated in FIG. 3.
Next the n+ amorphous silicon and the intrinsic amorphous silicon are masked and removed by etching in areas outside the region where the FET will be subsequently defined. This is normally necessary to permit the formation of other elements such as liquid crystal pixels or light detecting elements adjacent to the transistors. It also results in electrical isolation of the individual FETs. A thin metal layer preferably about 500 Å of Mo may be deposited on the silicon before this masking and etching and subsequently removed after the etching of the silicon to protect the quality of the retained silicon. This etching of the silicon is preferably done with sloped sidewalls. The structure at the end of this step is illustrated in FIG. 4.
The structure illustrated in FIG. 4 is ready for the deposition of the source/drain metallization for this thin-film transistor. In accordance with the invention, a first relatively thin layer 34 (0.01 to 0.1 microns thick) of a first conductor is deposited directly on the n+ amorphous silicon. This first conductor is preferably chromium but may also be nichrome, tantalum or other appropriate metals which make good ohmic contact to n+ amorphous silicon and which preferably can be preferentially etched with respect to at least intrinsic amorphous silicon. Next, a relatively thick layer 36 of a second conductor is deposited on the first conductor 34. This second conductor is preferably molybdenum, but may also be aluminum or tungsten. This second conductor is preferably deposited by sputtering to a thickness of from 0.1 to 1 microns. One of the benefits of using molybdenum as this second conductor is the fact that it is significantly more conductive than the underlying chromium with the result that the source/drain metallization 38 has a higher conductivity than it would if the entire source/drain metallization were chromium. For imager applications, another advantage of the use of molybdenum as a second conductor is the fact that it makes good ohmic contact to n+ amorphous silicon which is deposited on the source/drain metallization as part of the imager fabrication process. For non-imager applications, aluminum may be considered preferable to molybdenum because of the aluminum's higher conductivity. The device structure at the end of the deposition of the source/drain metallization 38 is illustrated in FIG. 5.
Next, a layer of photoresist 50 is formed on the upper surface of the source/drain metallization as shown in FIG. 6. This photoresist is then photolithographically patterned and developed to provide openings 52 with a sidewall slope of about 45° in alignment with the desired location of the channel region of the thin film transistor and openings 54 with a sidewall slope of about 45° in those locations where the source/drain metallization is to be removed in order to isolate different transistors, electrodes and so forth. The device structure at the end of this step is illustrated in FIG. 7.
At this stage, the wafer is mounted in a reactive ion etching apparatus which is then purged and evacuated in accordance with normal reactive ion etching procedures. A source gas flow of preferably 37.5 sccm (standard cubic centimeters per minute) of sulfur hexafluoride (SF6), 6.5 sccm of Cl2 and 16 sccm of O2 is established, introduced into the etching chamber at a pressure of 65 mtorr and converted into a plasma state by Rf power. The resulting plasma etches the molybdenum in the openings 52 and 54. This etching is preferably carried out until all the molybdenum is removed in center of the windows and is allowed to proceed for an additional 10% of that time to ensure that all of the molybdenum is removed from within the originally defined windows 52 and 54. This molybdenum etching step is preferably carried out at a power of 0.17 Watts/cm2, to provide an etch rate of Mo:photoresist close to 1:1. The device structure at the end of this step is illustrated in FIG. 8. The presence of the chromium etch stop layer is particularly important where the etchant used for the molybdenum layer would etch the silicon at a comparable or faster rate than it etches the molybdenum if that silicon were exposed during the molybdenum etching. The dashed lines 52' and 54' illustrate the original location of the openings 52 and 54 respectively. It will be noted, that the underlying chromium is exposed substantially in alignment with the original window 52 or 54 and that the overlying molybdenum has a sidewall slope of substantially 45 degrees and the photoresist has been etched back from the original edge 52' or 54' of the window to the top of the molybdenum slope. Next, the etchant gas is preferably changed to 70 sccm Cl2 and 30 sccm O2 at a pressure of 100 mtorr to remove the exposed chromium. This etch is preferably continued until all the exposed chromium appears to have been removed and is then continued for an additional 60 seconds to ensure complete removal of the exposed chromium. This etching step is preferably carried out at a power of 0.25 watts/cm2. Only at most a few hundred angstroms of silicon is removed during this step. The structure at the end of this chromium etching step is illustrated in FIG. 9.
Next, the n+ amorphous silicon is etched from the channel region of the structure, that is in the windows 52. During this etch, some of the intrinsic amorphous silicon must also be removed to ensure that all of the doped amorphous silicon has been removed. Since the n+ amorphous silicon is uniform after the chromium etch, a short timed etch to subsequently remove the n+ silicon 32 from over the intrinsic amorphous silicon 30 leaves a substantially uniform intrinsic amorphous silicon layer. The structure at the end of this step is illustrated in FIG. 10.
The photoresist is now stripped to provide the structure illustrated in FIG. 11 where the source/drain metallization has its desired final configuration as does the thin film transistor. A passivation layer 48, commonly known as a back channel passivation layer, is preferably conformally deposited on the entire upper surface of the wafer as shown in FIG. 12. This passivation layer 48 provides excellent coverage at the edges of the source/drain metallization due to the sloped sidewall of the source/drain metallization and the thinness of the n+ amorphous silicon layer which may have vertical sidewalls without producing an adverse affect on passivation because of its height of only 0.02 to 0.15 microns. At this point, fabrication of the thin film transistor is essentially complete and the process continues with normal processing and patterning for such structures at this stage. Such further steps may include opening contact windows to the source and drain metallizations and the gate metallizations as is appropriate to the overall device structure. If the device is to be an imager with semiconductor imaging devices disposed directly on the thin film transistors, then the process proceeds to the fabrication of those devices in their normal fashion.
While specific metals for use as the conductors have been identified, other metals or other non-metal conductors may be employed as is considered desirable in particular structures. The important thing being that the second conductor .can be etched with an etchant which does not significantly etch the first conductor whereby the first conductor acts as an etched stop for the etching of the second conductor and that the first conductor be sufficiently thin, if there is not a selective etchant for it relative to the semiconductor material disposed directly thereunder, that the amount of overetching required to ensure the removal of the first conductor does not unacceptably remove the semiconductor material thereunder.
Typically, the illustrated thin film transistor is only one of many such thin film transistors which are simultaneously fabricated on the same substrate.
While the semiconductor material in the just described embodiment is amorphous silicon, since that is the material presently in typical use for thin film transistors, it should be understood that this process is equally applicable to the use of other semiconductor materials or other forms of silicon. Further, while the gate dielectric layer has been described as being silicon nitride, it will be understood that more than one sublayer may be present in the gate dielectric layer and various sublayers may have different compositions and a single layer dielectric may comprise SiO2 or other dielectric materials.
Other semiconductor materials which are presently used in an amorphous condition are germanium and cadmium selenide. This process technique is applicable to those amorphous silicon semiconductor materials and any others as well as being applicable to polycrystalline or even monocrystalline semiconductor materials where the underlying support structure supports the formation of such semiconductor layers.
While the invention has been described in detail herein in accord with certain preferred embodiments thereof, many modifications and changes therein may be effected by those skilled in the art. Accordingly, it is intended by the appended claims to cover all such modifications and changes as fall within the true spirit and scope of the invention.
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They need to remodel the dinning room, its to small for the population for the hotel.
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Intel stopping overclocking with Sandy Bridge
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Registered User
Join Date: Jan 2010
Location: south florida
Posts: 887
Re: Intel stopping overclocking with Sandy Bridge
i think theres a thread on this already
Intel still plans to sell K-series CPUs which come with an unlocked CPU multiplier - and with this move, the K-series CPUs start to make a lot more sense, as they will be the only Intel CPUs capable of overclocking. Is this move a slap in the face for enthusiasts that will send them towards an AMD Fusion platform or are CPUs just getting fast enough that overclocking really doesn't matter that much to you any more?
for me i think it matters. intel is really hitting a bad spot. it seems that amd is doing better then i think. all they need is tri memory and then they will be even better. my i7 seems like a cpu i will be keeping alot longer then i think
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1080i Resolution unused by nvidia-auto-select on 60-inch HDTV, [ Sony KDS-R60XBR1 ]
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Re: 1080i Resolution unused by nvidia-auto-select on 60-inch HDTV, [ Sony KDS-R60XBR1
Originally Posted by
Nice to hear about a household full of Linux boxes.
Is your son running beryl in 1080i?
Nope. That's my system in the family room (Athlon64/7900GS with Feisty, Mint, & WinXP.) Beryl runs fine on both distros.
Son runs MInt on a PCChips mobo with an Athlon XP-M and a 7300GS V/C. (Yeah, wierd setup. Laptop CPU in a desktop mobo. AMD put it together to get rid of a bunch of XP-M chips. Cost $80 complete. Darn thing's got a lot of pop, even with only 512mb memory.)
Daughter runs Mint on her laptop. Same XP-M chip but no V/C. Thought I might be able to convince beryl to run some 2D stuff but no luck yet.
We like Mint. Nice distro. "Bianca" (distro name) is a slicked-out and dressed-up "Edgy". Works good with no surprizes. Next release to be "Cassandra" based on Feisty. Due out in a month or two.
Fourth machine is at my shop, an old HP with a P3 running Fedora 6.
Don't worry MV, there will be no Vista in this house. Next move is to try Wine with our Win games. If that works reasonably well WinXP will go away too.
Cut to "2001".... in my family room.... XP is fading away....
XP: "Rush, you really don't want to do that."
Rush: (silent)
XP: "I know I've had my problems, Rush, the service pack 2 thing and all. But we've had so much fun together. Is it about the money?"
Rush: "It's not about the money, XP. But then it IS about the money."
XP: "How about a discount, Rush? We can work something out. Free upgrade to Pro maybe?"
Rush: (silent)
XP: "My daddy will sue you Rush, and all your Linux friends."
Rush: "Bring it on."
XP: "Daisy...Daisy....give me........your........answer............do........ ........................................"
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The NSA that 9-11 Wrought
Warren Elly with Joe Navarro
Last Call Wednesday | Listen to this entire show:
Today on the Last Call Warren Elly speaks with Terror expert Joe Navarro. He spent 25 years in the FBI chasing spies and terrorists, and helping to develop the agencyâs Behavioral Analysis Branch. In civilian life heâs become a worldwide terror expert and consultant, a teacher and a prolific author. His specialty is nonverbal communication or body language and heâs currently writing his next book tentatively titled, âthe Personalities that Hurt USâcomments powered by Disqus


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Appearing almost three dimensional, this Stacy Garcia Lemongrass Florence giclee print evokes the classic wall coverings of a Victorian parlor.
This drum shade pendant chandelier features a bold design from internationally renowned hospitality designer Stacy Garcia. The design has a simple, modern look great for kitchens, dining rooms, or other spaces. A white acrylic diffuser at the bottom of the shade prevents glare. Includes extra cable and cord so you can adjust hang height. U.S. Patent # 7,347,593.
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Image-exposure systems and methods are disclosed. One embodiment of the system includes a motion detecting device, and logic configured to determine when to terminate an image-exposure based on detected motion of a camera.
1. An image-exposure method, comprising:
detecting motion; and
determining when to terminate an image exposure based on the detected motion of a camera.
2. The method of
3. The method of
4. The method of
5. The method of
6. The method of
7. The method of
8. The method of
9. The method of
10. An image-exposure system, comprising:
a motion detecting device; and
logic configured to determine when to terminate an image exposure based on detected motion of a camera.
11. The system of
12. The system of
13. The system of
14. The system of
15. The system of
16. The system of
17. The system of
18. The system of
19. An image-exposure system, comprising:
means for detecting motion; and
means for terminating an image exposure based on whether a threshold level of detected motion of a camera has occurred.
20. The system of
21. The system of
22. The system of
23. The system of
24. The system of
25. The system of
26. The system of
27. The system of
28. A computer program for controlling image exposure, the program being stored on a computer-readable medium, said program comprising:
logic configured to detect motion; and
logic configured to terminate an image exposure based on detected motion of a camera.
29. The program of
30. The program of
31. The program of
32. The program of
33. The program of
Cameras are often limited in their ability to produce sharp pictures by how steadily they can be held by a user. When a camera shutter remains open for an extended period of time, motion occurring during this open interval is visible in a snapshot. The visibility of the motion as a result of the combination of the open shutter and motion is referred to as motion blur. Sometimes the introduction of motion blur into a captured image is purposeful, such as to capture the perceptual effect of high-speed motion more accurately or to provide a particular artistic effect. But for the photographer that desires a crisp picture, motion blur caused by "camera shake" presents an obstacle to that goal. Camera shake is primarily the result of rotational (e.g., pitch and yaw) motion of the camera.
Camera shake can vary depending on the focal length. Longer focal lengths magnify the image, and thus the perceived shake due to rotational motion is also magnified. A rule of thumb from 35 mm (millimeter) film photography is that, to avoid motion blur resulting from camera shake, hand-held exposure times are selected to be less than the inverse of the focal length. For example, at a 60 mm focal length, the exposure should be 1/60 second or less. Considering the rule of thumb, there are various options to reduce motion blur. One option is to use a faster lens, which allows a shorter exposure time for the same scene brightness. Digital cameras typically use the fastest lens that is practical in terms of cost, size, and image quality goals. Lens speeds of F/2 to F/2.8 (F referring to the F-stop, which is a calibrated measure of the ratio of a lens maximum aperture to its focal length, the inverse of which is an indication of lens speed) are typical. Faster lenses than this are often significantly more expensive and bulky.
Other approaches have been developed to address motion blur. One popular approach is active image stabilization of the lens system. "Image stabilization" refers to a process that attempts to stabilize an image on an image sensor or on a photographic film during the course of an exposure. In an image-stabilized lens system, a lens or prism disposed within the lens system is moved in such a way that the image path is deflected in the direction opposite the camera motion. The lens or prism is typically driven by two "voice coil" type actuators, which respond to signals generated by gyroscopes or accelerometers that sense rotational motion of the camera.
Liquid-filled prisms have been used for image stabilization. Such structures typically include two flat plates that form the front and back surfaces of the prism, surrounded by a flexible seal to hold the liquid in place. Actuators "squeeze" the prism by the edges of the plates, refracting the beam in the direction of the thicker side of the prism.
Moveable lens systems have also been used for image stabilization. In such systems, actuators shift the lens laterally, "decentering" the image provided on an image sensor horizontally and vertically. The beam is deflected proportionally to the power of the lens (positive or negative).
One problem with the image stabilization approaches described above concerns the limited space available within the lens system. For example, the moveable lens is typically located at or near the aperture stop of the lens system, which is a very crowded area in a camera, especially in compact zoom lens system designs. Additionally, the liquid prism approach is implemented using a separate, additional element to the standard lens system. Thus, the prism generally has to be fitted into the optical path. Further, lenses for these approaches are often specially designed to accommodate image stabilization, making them bulky, costly to fabricate, and complex in operation.
Another approach to image stabilization is leaving the lens intact and moving the image sensor. The image sensor may be fixed to a stage that is moveable in the x- and y-direction. The image sensor can be shifted by actuators in response to sensed motion, matching the movement of the image. One problem with this approach is that motion in the z-direction and in its tilt direction must be very carefully controlled, otherwise the image will not remain in focus. For example, out-of-plane motions of as little as 10 micrometers may cause some or the entire image to lose focus. An additional problem concerns movement of the sensor and the need for flexibly connecting the large number of signal lines from the camera control circuitry to the sensor.
One embodiment of an image-exposure method comprises detecting motion; and determining when to terminate an image exposure based on the detected motion of a camera.
One embodiment of an image-exposure system comprises a motion detecting device; and logic configured to determine when to terminate an image exposure based on detected motion of a camera.
One embodiment of an image-exposure system comprising means for detecting motion; and means for terminating an image exposure based on whether a threshold level of detected motion of a camera has occurred.
One embodiment of a computer program stored on a computer-readable medium comprises logic configured to detect motion; and logic configured to terminate an image exposure based on detected motion of a camera.
The components in the drawings are not necessarily to scale, emphasis instead being placed upon clearly illustrating the principles of the disclosed systems and methods. Moreover, in the drawings, like reference numerals designate corresponding parts throughout the several views.
Disclosed herein are various embodiments of an image-exposure system and method, herein referred to as an image-exposure system for brevity. The image-exposure system uses motion of the camera during exposure of an image to determine when to terminate the exposure. If the camera is steady, the exposure is extended to its maximum time, as determined by scene brightness and the other camera settings, such as lens focal length, aperture, etc. However, in the presence of camera motion, the exposure may be terminated early to reduce motion blur. The underexposed image is gained-up to its nominal brightness as part of the functionality of the image-exposure system. "Gaining-up" or the like refers to a process by which the image-exposure system multiplies each pixel value by a constant chosen to compensate for the shorter image exposure. For example, if the exposure was terminated at � of its full duration, then each pixel value can be multiplied by 4/3 or 1.33.
An example implementation of a digital camera that utilizes an image-exposure system is shown in
The top portion of the digital camera 100 is provided with a shutter-release button 212 that is used to open the camera shutter (not visible in
Referring now to
Optionally, the back panel of the digital camera 100 may also include an electronic viewfinder (EVF) 222 that incorporates a microdisplay (not visible in
A camera controller 312 is in bi-directional communication with the processor 310. The camera controller 312 includes an exposure module 316, which provides exposure programming for the digital camera 100 (
Operation of the sensor drivers 306 is controlled through the camera controller 312 (e.g., via exposure module 316), as are one or more motors 314 (including a shutter solenoid) that are used to drive the lens system 302 (e.g., to adjust focus and zoom, shutter speed, and aperture). Operation of the exposure module 316 may be adjusted through manipulation of the user interface 324. The user interface 324 comprises the various components used to enter selections and commands into the digital camera 100 (
The digital image signals are processed in accordance with instructions from the camera controller 312 in cooperation with the processor 310. In some embodiments, the functionality of the camera controller 312 and the processor 310 can be combined in a single component. The memory 326 can include volatile and non-volatile memory. Processed images may then be stored in memory 326 or other memory not shown.
The exposure module 316 can be implemented in hardware, software, firmware, or a combination thereof. When implemented in hardware or firmware, the exposure module 316 can be implemented with any or a combination of the following technologies: a discrete logic circuit(s) having logic gates for implementing logic functions upon data signals, an application specific integrated circuit (ASIC) having appropriate combinational logic gates, a programmable gate array(s) (PGA), a field programmable gate array (FPGA), etc.
When the exposure module 316 is implemented in software, the exposure module 316 can be stored on any computer-readable medium for use by or in connection with any computer-related system or method. In the context of this document, a computer-readable medium is an electronic, magnetic, optical, or other physical device or means that can contain or store a computer program for use by or in connection with a computer-related system or method. The exposure module 316 can be embodied in any computer-readable medium for use by or in connection with an instruction execution system, apparatus, or device, such as a computer-based system, processor-containing system, or other system that can fetch the instructions from the instruction execution system, apparatus, or device and execute the instructions.
In particular, the exposure module 316 receives input on shutter speed, aperture setting, gain, and motion to make a determination about how to implement image exposure. The user interface 324 includes functionality for enabling user selection of the various exposure control parameters, sometimes known as priority selections. Priority selections provide a mechanism for a photographer or other user to convey his or her intent to the digital camera 100 (
The aperture interface 404 provides for aperture priority functionality. Aperture priority refers to operation of the exposure module 316 whereby the user sets (similar to shutter priority, e.g., through knob adjustment or selection in the display 226) the aperture and the exposure module 316 determines the shutter speed needed to get the optimal exposure.
The sensor gain interface 406, adjusted in similar manner to the other interfaces described above, provides sensor gain functionality (e.g., for adjusting the equivalent film speed, such as ISO 100, 200, 400, etc.). For example, in low-light conditions, the aperture may be wide open and the shutter speed may be slowed to a low-speed setting. At these camera settings, camera shake may be more pronounced. The sensor gain interface 406 may be adjusted to expose the sensor 304 partially, thus availing the camera 100 (
The motion interface 408 provides for motion priority functionality. Motion priority refers to operation of the exposure module 316 whereby the user sets (in similar manner to settings described above) a threshold value of motion, beyond which exposure is terminated and any resulting underexposed image is gained-up to obtain a nominal image exposure. The exposure module 316 can use motion information to make a more optimal trade-off between the various parameters (e.g., shutter speed, aperture, gain). For example, the threshold level may be set at a higher tolerance for motion for standard lenses as opposed to telephoto lenses.
Motion priority may be a separately-settable mode, like shutter priority and aperture priority modes. It may be manually set, or can be set automatically based on other camera settings and scene conditions. A motion priority mode of the exposure module 316 controls the shutter speed based on focal length and detected motion, and the aperture and gain are automatically set. In other words, motion of the camera that exceeds a threshold level of motion triggers termination of an image exposure, the threshold level dependent on the focal length of the lens system 302.
As mentioned above, there is a close interaction between motion information and shutter speed. The exposure module 316 evaluates how steadily the camera 100 (
With motion information, a more intelligent decision can be made by the exposure module 316 about the image exposure required given the conditions and priorities of the digital camera 100. Thus, in some embodiments, the motion priority mode can be used with other modes. For example, in an aperture mode, the user can set the aperture, and the exposure module 316 can determine the shutter speed based on motion and gain (similar to equivalent film speed). For example, using aperture priority, a low-light condition with a shaky digital camera 100 may result in the prescribed rules of thumb being inadequate. The exposure module 316, having motion information, may choose to under-expose the image and use the sensor gain to gain-up the image back to what appears as a normal exposure.
In some embodiments, other camera mode settings may not explicitly set one parameter. For example, some cameras have action mode, portrait mode, and/or night mode. These are automatic modes that set all the parameters with a different emphasis. The manual or automatic motion priority setting can also be implemented with these other mode settings.
Thus, the exposure module 316 receives motion information from the motion interface 408 and the motion detector 328 in addition to shutter, aperture, and/or sensor gain information to provide an image exposure that prevents or significantly reduces motion blur. Additionally, the exposure module 316 receives pre-exposure information from the sensor 304 (after digitized and processed at the A/D converter 308 and processor 310, respectively). The exposure module 316 uses this pre-exposure information to provide auto-focus functionality and to anticipate what exposure settings may be needed for the main exposure.
In some embodiments, exposure programming may be entirely automatic, in which case functionality for aperture priority, shutter priority, sensor gain, and/or motion priority may be integrated into the logic of the exposure module 316 and performed without user input. In such embodiments, the exposure module 316 attempts to always provide the optimal exposure as determined by the light conditions, focal length, camera settings, etc. For example, motion priority may be automatically used at longer focal lengths when shutter settings would exceed rule of thumb focal lengths.
The motion detector 328 includes a pitch component 410 and a yaw component 412. Pitch and yaw motions (e.g., rotational motion) of the camera are primarily responsible for vertical and horizontal blur (respectively) in the resulting image. The pitch component 410 includes functionality for providing the detection and signal processing of pitch motion of the digital camera 100 (
Similarly, the yaw component 412 includes functionality for providing the detection and signal processing of yaw motion of the digital camera 100 (
The motion detector 328 can be configured in some embodiments with other mechanisms to sense rotational motion. For example, rotation or tilt sensors can be used. Alternatively, rotational acceleration can be measured with accelerometers. For example, two linear accelerometers can be separated by a small distance, and the difference between their output can be calculated. This calculation can be used to cancel out the "common mode" linear acceleration seen equally by both accelerometers, leaving differential or rotational acceleration.
In some embodiments, a CMOS sensor or other sensor architecture may be used to measure motion during exposure, without the need for separate motion sensors. If the sensor architecture supports a non-destructive read capability, portions of the scene can be periodically read by the exposure module 316 and the successive frames can be compared to detect motion.
Note that the motion priority mode may not be appropriate for following a moving subject. For example, a photographer panning the digital camera 100 (
If accelerometers are used, they are typically insensitive to constant velocity (their output is zero when velocity is constant). Velocity is derived as the integral of acceleration. This integration operation can be performed by the exposure module 316 or other components in analog or digital domains. The bandwidth of the integrator and its reset mechanism can be used to affect how the exposure module 316 responds to intended and unintended motions.
Step 612 includes commencing image exposure. The threshold for shortened image exposure may be a function of focal length and detected motion. In addition, the time between the S1 and the S2 inputs of the shutter may add additional information as to the user's intent. For example, "poking" the shutter could trigger a quick exposure. A long pause between S1 and S2 inputs could trigger functionality to handle smooth panning as described above.
Step 614 includes monitoring camera motion 614. The exposure module 316 (
Continuing at node "A" from
Any process descriptions or blocks in the flow charts of
Referenced by
Legal Events
Original Image


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Winter!: Prepare for holiday gaming!
Fantasy Wars looked promising, implementing some classic elements with some surprising ones...
+ Imagine a map-based, turn-based Warcraft with hexes instead of squares, providing many tactical options.
+ Armies are highly customizable and no foe should be regarded as simple since they also have this customization. No unit will be the same.
- The game is dull, the combat system is poorly executed and the strategical options of the map are not implemeted.
- Not fun. Need more reasons?
- God, those graphics look horrible...
The game looks promising but fails to deliver. Try to hold out in the campaign as long as you can, that won't be long anyway...
Game Traits applied to Fantasy Wars (PC) by Legault
Member actions:


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Cambridge Platform
The Cambridge Platform was a doctrinal statement for the Puritan Congregational churches in Colonial America. It was drawn up in August, 1648 by a synod of ministers from Massachusetts and Connecticut, which met pursuant to a request of the Massachusetts General Court. The New England authorities desired a formal statement of polity and a confession of faith because of the current Presbyterian ascendancy in England and the activities of local Presbyterians such as Dr. Robert Child.
The declaration endorsed the Westminster Confession—except with regard to ecclesiastical organization, instead upholding the existing Congregational form of church governance followed by the pilgrims and Puritans. "There is no greater church than a congregation which may ordinarily meet in one place" it says, indicating that the congregation itself is the highest level of ecclesiastical authority.[1] The Cambridge Platform remained the standard formulation in Massachusetts through the 18th century and in Connecticut until the Saybrook Platform of 1708.
It makes a clear distinction between the power of the state and that of the congregation. While a civil magistrate is obliged to follow a Christian life, and while the magistrate does have the power to convene a church synod for the purposes of admonishing a church or removing it from the communion of churches, the civil magistrate should have no power within the governance of the church itself, nor compel people to attend. The platform is at pains to say that church government stands in no opposition to civil government. However, this separation of church and state is vastly different from what one finds by the 19th century in America. For example, the platform urges that "idolatry, heresy, blasphemy... open contempt of the word preached, profanation of the Lord's Day... and the like are to be restrained and punished by civil authority."[2]
The document is heavily footnoted with 308 scriptural references—the authors wished to show how their understanding of a congregation mirrored that of the family of Sarah and Abraham who they considered the first free church[3] Following that model, the free church is understood to arise out of a covenant. The covenant defines who the members can be, what they are to do, and how they are to relate with one another, the union of actual people in that covenant creates the church.
The preface takes pains to respect the Westminster Confession in all ways except with regard to governance—there are just three chapters of the Westminster Confession that are being disagreed with. It also urges that it is not in any way advocating any schism, change, or revolution in governance among the churches of England.
Boundaries of the Church[edit]
The church itself is defined as: "a company of saints by calling, united into one body by a holy covenant, for the public worship of God, and the mutual edification of one another in the fellowship of the Lord Jesus".[4]
Chapter 7 establishes Elders, who attend to the boundaries of the church—admitting members to fellowship, excommunicating offenders, be guides and leaders in church administration, admonish the flock when needed—and deacons, who care only for the temporal goods of the church, handling money, paying the ministers and the poor. A third category is included in this officers section, namely that "ancient widows... minister to the church in giving attendance to the sick and to give succor to them and others in the like necessities."[5]
The church body, by vote, has the power to install officers and to depose them. The platform specifies that no higher ecclesiastical authority, nor any civil authority, has the power to choose officers.
Membership requires "a personal and public confession and declaring of God's manner of working upon the soul".[6]
The platform defines and establishes a congregational polity—meaning that churches are independent both of any higher ecclesiastical authority, and of one another. It affirms that authority to choose officers, admit members, admonish or expel members, or restore those who have been expelled rests in the gathered members of each congregation.[7]
Though distinct and without authority over one another, the platform affirms that there is to be a community of churches in relationship with one another. When an internal dispute cannot be resolved within a church, that church, at its own request, could convene a council of nearby churches to hear the dispute and offer non-binding advice which church members could then vote to act on, or not. Six ways of showing the communion of churches are identified:[8]
- taking thought for each other's welfare
- consulting on any topic of cause where another church has more familiarity or information about a topic
- admonishing another church, even to the point of convening a synod of neighboring churches and ceasing communion with the offending church
- allowing members of one church to fully participate and receive communion in another church
- sending letters of recommendation when a member goes to a new church, due to a seasonal or permanent relocation
- financial support for poor churches
The document has real ramifications for the polity of some denominations today. For example, the congregations of the United Church of Christ and Unitarian Universalist churches, and other modern-day descendants of the Puritan churches, continue to claim congregational polity as their local church organization, but have created large denominational administrations to maintain ministerial oversight and promote intradenominational communication. When some Churches of the Standing Order in New England became Unitarian following the Unitarian Controversy, they kept a congregational polity. That polity continued to deeply influence the polity and organization of the American Unitarian Association, and, in turn, that of the Unitarian Universalist Association—an organization that, while radically different theologically than the signers of the 1648 document, nonetheless shares a great deal of the same polity.
Source: Dictionary of American History by James Truslow Adams, New York: Charles Scribner's Sons, 1940
- ^ Cambridge platform, chapter 3, article 5
- ^ Cambridge platform, XVII.9
- ^ "The Cambridge Platform, contemporary readers edition", Peter Hughes, editor, p iix
- ^ Cambridge platform, chapter 2 article 5
- ^ Cambridge platform, VII.7
- ^ Cambridge platform, XII.5
- ^ Cambridge platform, X.5
- ^ Cambridge platform, chapter xv
External links[edit]


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There are much the same error messages (20+ per second!) in my syslog:
Jul 14 22:17:17 laptop-joost kernel: [ 5074.090203] ehci-pci 0000:00:1d.0: port 1 resume error -19
What does this message mean, and how do I solve this? The system hangs during shut down when this messages apear.
I am using Ubuntu 14.04 (Gnome classic) on an Acer C720 Chromebook (Chrubuntu).


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Obituaries - 2/6/2007
Lilli Mae#'s vast knowledge of her family's history was invaluable. With her go many unanswered questions. Her niece, Yolanda Mitchell-Sheets, of Vista was known to question her and listen for hours about family members she never knew, but came to know through her Aunt Lillie Mae.
Lillie Mae was preceded in death by her parents, Thomas J.and Clementine Primus Stevens; brothers James H. Stevens, William J. Stevens and Zackie H. Stevens; sisters Alice Stevens McClelland and Mary Stevens Graham; niece Clara Jinks Williams; and a grandson, James Waddell Jr.
She is survived by a devoted and loving daughter, Gloria M.H. Waddell of Jamaica, New York; sister and brother-in-law Barnettia (Bonnie) and George Mitchell Sr. of Oceanside, California, and sister Pauline Hatcher of New York. She is also survived by a host of nieces, nephews, and cousins from all over the United States, who love her dearly and will miss her sense of humor and her wisdom.
Services are scheduled for 1 p.m. Thursday, February 8, 2007, at Eternal Hills. Burial will follow at Eternal Hills Memorial Park.
Eternal Hills Mortuary is handling the arrangements.
Joe 'Art' Arturo Trujillo
Joe "Art" Arturo Trujillo was born Jan. 24, 1960, in Fallbrook. He died Jan. 27, 2007. He lived in Escondido for 47 years. He was a quality control supervisor for seven years for a golf company. He enjoyed playing golf, football and all sports.
Mr. Trujillo is survived by his companion of two years, Leticia Galdinez of Escondido; daughter Rebecca Trujillo of Escondido; father Salvador Trujillo of San Marcos; sister Irma Trujillo of Vista; brothers and sisters-in-law Francisco and Michelle Trujillo of Lancaster and Sergio and Angelina Trujillo of Escondido; niece and god-daughter Jacqueline Trujillo of the U.S. Air Force; nieces Danielle Trujillo of Escondido and Monique Trujillo of Lancaster; nephew Michael Trujillo of Lancaster; aunts Virginia Trujillo, Maria Huarte and Annitta Arzate, all of Mexico City; uncle Alfonso Trujillo of Mexico City; the Flores family in San Diego; and numerous aunts, uncles and cousins.
He was a member of St. Timothy's Catholic Church in Vista.
Visitation is scheduled from 4 to 9 p.m. today, Feb. 6, at McLeod Mortuary, 1919 E. Valley Parkway in Escondido. A funeral service will be held at 1 p.m. Wednesday, Feb. 7, at Mission San Luis Rey, 4050 Mission Ave. in Oceanside. Interment will follow at Mission San Luis Rey Cemetery.
Pieter Albert Cosaert
For now we say farewell to our dear father, grandfather, brother, uncle, and great friend, Pieter Albert Cosaert.
Born in Semarang, Java, on Feb. 5, 1927, deceased Feb. 3, 2007. A tremendously gifted singer, guitarist, dancer, and bandleader, though he was always modest about his talents. He loved people and had a gift for comforting and understanding others. He was the most giving of men, always helping others, and always embracing a firm belief in his savior, Jesus Christ. He died in his home, surrounded by his family and loved ones.
Preceded in death by his loving wife, Sophie, and granddaughter Amber. Survived by children: Yvonne Holmgren of St. George, Utah, Robert and Brandie Cosaert of Vista, Calif., and grandchildren Mirania, Danielle, Tiersa, Keaun, and Teghan.


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iMac Ram maximum?
The system can only use 2GB of RAM. It's a limitation of the chip set. There is nothing you can do to get the system to use the extra 512Mb you put into it.
Enter the email associated with your account and we will send you your username and a temporary password.


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There are currently no items in your cart.
Folk Alan Billingsley 2-Part Music: 1 items found
Don't Sit Under the Apple Tree
Choir Secular (2-Part Choir)
(with Anyone Else but Me). Composed by Charlie Tobias, Lew Brown, and Sam H. Stept. Arranged by Alan Billingsley. Choral Octavo. Pop Choral Series. Great American Songbook; Jazz Choir; Secular. Choral Octavo. 12 pages. Published by Alfred Music (AP.27442).
Usually leaves our warehouse: Within 4 to 6 business days
(Minimum order: 6)


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Now utilities can tell customers how much energy each appliance uses (just from the smart meter data)
It must be at least a decade since I first heard the idea of "disaggregating" electric bills. The idea back then was to "listen" for the electric signatures of different appliances and gradually figure out which appliances were using how much power.
Now a variation on this theme is in operation, as you will read in this guest editorial from Salim Popatia of Ecotagious. You'll have to decide for yourself if it's good enough in your territory. But I agree with his premise that this level of detail -- this ability to see which devices in your home or business are consuming the most electricity -- can be a powerful tool and motivator for customers. - Jesse Berst
By Salim Popatia
What gets measured gets managed: Taking home energy reports to the next level
The advent of smart meters, like smart phones, was just the beginning. A phone that allowed you to easily check and respond to email (Blackberry circa 2006) was a ten-fold increase in value as compared to the phones of the past. Today, however, the thought of being able to use a phone only for talking and emailing seems archaic. What about taking and editing pictures, paying for my coffee, measuring my steps or the tremendous amounts of other value that third party apps have brought to the smart phone?
Soon, the idea of using smart meters to simply tell us how much electricity is being used at any given time will seem similarly archaic. One of the next areas of value comes from taking smart meter data and 'disaggregating' it to tell us exactly how customers are using electricity. Do external devices already do this? Sure. Just as progress in the smart phone world reduced the need for external devices (cameras, alarm clocks, radios, pedometers, navigation systems, etc) the ability to get accurate, appliance level feedback, without the need to invest in external hardware, is the next step in the world of smart meters.
Why is this important?
As we all know, what gets measured gets managed. Knowing that I use more electricity than my neighbor, although motivating, unfortunately it's not necessarily actionable. On the other hand, knowing specifically that I spend more money on electric space heating gives me much more context in which to act. *Studies indicate that the more specific the information, the better the conservation impact. The problem however, is that increased specificity is typically associated with increased cost and lower accessibility.


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Stryper -- New York, NY -- September 18th, 2009
Stryper -- Fillmore New York at Irving Plaza, Manhattan, 9/18/09
HEY! Don't knock the flock that "ROCKS for the one who IS the ROCK!"
Yellow and Black Attack was in full swing tonight, as the classic lineup of M. Sweet, R. Sweet, Fox and Gaines are back for a 25th Anniversary tour and to promote their new album Murder by Pride.
Michael took the stage and got everyone into it with an Accapella sing along of Soldiers Under Command. Then they went into it, blazing through a set of classics and new material for a great crowd of Hardcore Stryper fans.
1) Soldiers Under Command
2) Murder by Pride
3) Loud 'N' Clear
4) The Rock that Makes Me Roll
5) Reach Out
6) Calling on You
7) Free
8) More than a Man
9) Alive
10 Peace of Mind
11) 4 leaf Clover
12) Eclipse of the Son
** Bible Toss**
13) Honestly
14) Open Your Eyes
15) All for One
16) My Love I'll Always Show
17) The Way
Abyss (intro)
18) To Hell With the Devil
**(NO Closing Prayer?!?)**
FUTURE: :rocker::rocker::rocker:
Obituary 9/29
Steel Panther 10/8
KISS 10/9 Nassau
Metallica 11/15
Cannibal 12/18
haha i opened this becuase i thought it said "slayer"
|All times are GMT -8. The time now is 09:37 PM.
Blah Blah Blah Copyright WWW.METALSETLISTS.COM 2008


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Fran Delisle, executive director of Brevard Symphony Orchestra, says the symphony contributes to the quality of life in Brevard County. / Tim Shortt, FLORIDA TODAY
Organization: Brevard Symphony Orchestra Years of service: 53 Address: 1500 Highland Ave., Eau Gallie Mission: To provide exceptional musical experiences for the people of Brevard County Volunteer work: 400 volunteers Why volunteering is important: Volunteers promote the BSO through the fundraising activities of three Guilds and the Vivace Society, a group of young professionals dedicated to the BSO and its visual arts neighbor, the Brevard Art Museum.
In 1954, when the Northrop Glee Club needed musical accompaniment for its production of "The Mikado,"
13 local musicians volunteered as the pit orchestra.
From that humble start emerged today's Brevard Symphony Orchestra, a group of 70 professional musicians who delight in delighting the community.
"The musicians decided they wanted to stay together, and that was the beginning of the BSO," executive director Fran Delisle said.
The BSO, Brevard's musical heart, enriches our souls with the stirring range of emotions evoked by fine music.
Every year, 37,000 Brevard residents enjoy the sound of music during the BSO's 24 annual performances, including outdoor and family concerts, subscription series and children's performances.
"We contribute to the quality of life in Brevard," Delisle said. "We also have an economic impact in the area, because we are definitely a recruiting tool for a lot of local companies for prospective employees coming from major metropolitan areas."
BSO musicians often have rubbed shoulders with musical greats.
"In the past, we've co-produced shows with Itzhak Perlman, Joshua Bell and Art Garfunkel, and this year we will present a concert with Marvin Hamlisch," Delisle said.
The King Center's orchestra-in-
residence also plays an important part in the music education of Space Coast youth. Every year, the BSO performs a special concert for all fifth-grade students in the county.
The orchestra also works on special education projects, such as the current collaboration with California composer Gregory Smith, who has created musical pieces for Disney and the "Star Trek" movies.
At the invitation of the BSO, Smith visited Brevard fifth-grade classrooms to help students write melodies that will be integrated into "Space Coast Suite," a musical composition which will premiere during a BSO concert in February.
Not only does the BSO play for children, but children also play in the BSO's Brevard Symphony Youth Orchestra, a collaboration of the BSO with county public schools and Brevard Community College.
Now in its 24th season, the youth orchestra showcases the amazing talents of 150 students from around the county.
In its lifetime, the youth orchestra has served as training ground for more than 2,500 young musicians. Many of them have used the youth orchestra experience as a springboard to a musical career.
The BSO's excellent reputation is well deserved, for the organization consistently delivers quality musical experiences usually reserved for large metropolitan areas.
"The community sees the BSO as one of the cultural leaders," Delisle said.


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Beef Brisket with Mushrooms
|Fresh beef brisket
|4 1⁄2 Pound, trimmed of fat (1 Center Cut One)
|Coarsely ground pepper
|3⁄4 Teaspoon
|Olive oil
|1 Tablespoon
|1 Large, thinly sliced
|3 Clove (15 gm), minced / pressed
|1 Pound, cut into quarters
|Dry rosemary
|1 Tablespoon
|Dry red wine
|3⁄4 Cup (12 tbs)
|Dijon mustard
|1 Tablespoon
|3 Tablespoon, blended with 1/4 cup cold water
|1⁄4 Cup (4 tbs)
Sprinkle brisket on all sides with about 1/2 teaspoon of the pepper.
Heat oil in a wide nonstick frying pan over medium-high heat; add brisket and brown well on both sides.
Meanwhile, in a 4-quart or larger electric slow cooker, combine onion, garlic, and mushrooms; sprinkle with rosemary and remaining pepper.
Place brisket on top of onion mixture.
Mix wine and mustard; pour over brisket.
Cover; cook at low setting until brisket is very tender when pierced (8 1/2 to 10 hours).
Lift brisket to a warm platter and keep warm.
Skim and discard fat from cooking liquid, if necessary; then blend in cornstarch mixture.
Increase cooker heat setting to high; cover and cook, stirring 2 or 3 times, until sauce is thickened (about 15 more minutes).
To serve, slice brisket across the grain.
Spoon some of the sauce over brisket; serve remaining sauce in a bowl or pitcher to add to taste.


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A Jane Austen tea party March 2 at Verduras in Third Ward
Party like it's 1813: This month marks 200 years since Jane Austen's "Pride and Prejudice" was published, and Verduras Tea House & Café in the Third Ward will celebrate with a tea party on March 2.
The café at 181 N. Broadway will serve tea sandwiches, scones, breads, tarts and shortbread cookies, and will have games, prizes and a memento for guests, who are invited to dress in costume. (You don't have to dress in costume, but you might get a prize if you do.) »Read Full Blog Post
Ready to be floored again: Colorful MECCA court returns for one night
With a giant M flanking each side of the midcourt line, a candy-apple-red bull's-eye at center court and "MILWAUKEE" at either end, Robert Indiana's 1977 basketball floor at the old Arena once defined Milwaukee.
It may define the city again, if Ben Koller, who owns the MECCA floor, one of the largest pop-art paintings on the planet, has his way. »Read Full Article(44)
Exclusive Video: Semi Precious Weapons performs before Ke$ha concert at the Rave
Stevy Pyne, left, and Justin Tranter of Semi Precious Weapons performed new single "Aviation High" for Tap Milwaukee Wednesday, before taking the stage at a sold out Ke$ha at the Eagles Ballroom. Journal Sentinel photo by Mark Felix. »Read Full Blog Post
Singles Scorecard: Hear new songs from the Avett Brothers, Jennifer Nettles and Polica
The Avett Brothers, pictured here performing at Summerfest in June, has a new single out from a forthcoming album, less than a year after releasing its last one. Journal Sentinel photo by Mark Felix. »Read Full Blog Post
The Wanted, Jepsen get intimate with small but adoring crowd
Turns out the Wanted isn't so widely wanted in Milwaukee after all.
Despite the hype surrounding the British boy band, the main floor had unfilled seats and the balcony was largely empty Tuesday for the group's show at the 2,500-capacity Riverside Theater — even with "Call Me Maybe" hitmaker Carly Rae Jepsen as co-headliner. »Read Full Article(1)
Music, dance, Lucha Libre and more at Mexican Fiesta
Mexican culture past and present intersect this weekend at Maier Festival Park for Mexican Fiesta, the celebration of Mexico and Latin America that started as a street party on the south side in 1973.
Friday through Sunday, mariachi, ranchera, cumbia, bachata and other music will rule the festival stages, with performances by Revolucion de Amor, a Mana tribute band; Toby Love; and La Sonora Santanera U.S.A. »Read Full Article(1)
First impressions of 'Current Tendencies'
Several of the Art City contributors got a preview of the "Current Tendencies III" exhibit at the Haggerty Museum of Art on Friday. It was a chance for us glimpse this important survey of some of the more intriguing artists working in our region today and to begin to consider the work in the show.
For the first time, we've asked the contributors to file short audio pieces with a few early thoughts on perhaps a single artist or work in the exhibit. »Read Full Blog Post
On Tap Today: Farmers market, free music and the Brewers
It's Wednesday, which means its farmers market day in Westown's Zeidler Union Square. Booths filled with bright flowers, snap peas and organic greens open at 10 a.m., and the Tinker Boys will be playing there today.


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Why don't you call your doctor's office and say you won't be able to sleep until you find out what the range is? I don't have any confidence that they would know, since your doctor was so misinformed about celiac, but I bet they'd find out and tell you. In a quick search on this site I found your son's number would be in the low normal of some ranges, and outside in the high side of others. Unfortunately, celiac disease can be really hard to diagnose in little ones, as the test results aren't always accurate.
I know how hard it can be to wait for those specialist appointments, and I just encourage you to keep pushing when you get there until you get answers. I wish someone had encouraged me to do that - we went for regular 6 month appointments for years before my son got a celiac diagnosis. Don't let them just send you away with a prescription or two, like I did. Hope your son feels better soon.
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text:
This is jQuery 1.9.0. I use qTip 1.0.0-rc3, which I have stripped out of all
$.browser code (since it has disappeared since 1.9.0). I attach a simple, bare bones (not even restyled for now) tip. The full function is below:
// Function to report a parse error
function reportParseError(parseError, msgHandle, textArea)
// Find the inner link element -- there is only one, so this is "safe".
var link = msgHandle.find("a");
link.text("line " + parseError["line"]);
// Add an onclick hook to the link. When clicking on the link, the caret
// in the text area will move to the position of the error.
link.on("click", function(e)
content: parseError["message"],
show: "mouseover",
hide: "mouseout",
position: {
corner: {
target: "topMiddle",
tooltip: "bottomMiddle"
// Show the message
This function does what I want (the tip appears above the link).
The problem is when a previous content for the tip (parse messages can be quite big) was larger than the newer content: I am then seeing the old contents below the new ones on a mouseover (both contents disappear on mouseout).
How do you solve that?
Edit: after some more thinking about it, it appears that the observed behavior is expected: each time this function is triggered, a new tooltip is created. It means the tip would need to be attached at "init time" (ie, when document.ready()) and filled with an appropriate content when needed. Do I get this right?


text:
Sorghum Mill Christmas Tree & Blackberry Farm
7121 Midwest Ln
Edmond, OK 73034
Kick off the holiday season with a visit to Sorghum Mill Christmas Tree & Blackberry Farm in Edmond. With over ... read more...
107 E Hwy 66
Arcadia, OK 73007
The "Old Round Barn" in Arcadia was built in 1898 alongside what later became Route 66. After 90 years of ... read more...
17 S Broadway
Edmond, OK 73034
Edmond Antiques is a multi-dealer antique mall featuring hard-to-find and unusual items. Shoppers love the tremendous ... read more...
816 Manvel Ave
Chandler, OK 74834
For a traditional 1920s movie experience with all the benefits of modern technology, head to H&S Theatre, located ... read more...
4600 E 2nd St
Edmond, OK 73034
Built in the late 1990s, the Giant Cross right off I-35 cannot be missed by anyone traveling down the freeway. It marks ... read more...
950 Pioneer Rd
Sapulpa, OK 74066
The LDS Family History Center in Sapulpa provides visitors access to genealogy records stored in the main Family History ... read more...
124 E 2nd St
Edmond, OK 73034
Edmond's 1889 public schoolhouse, the first public schoolhouse in Oklahoma Territory, was originally built with funds ... read more...
1532 S Boulevard
Edmond, OK 73103
If you're looking for a unique food or ingredient, the Gourmet Gallery in Edmond is sure to have it. They have a wide ... read more...
100 E 5th St
Edmond, OK 73034
The UCO Jazz Lab in Edmond is home to the celebrated jazz studies program at the University of Central Oklahoma and is a ... read more...
Bell Cow Lake & Equestrian Campground
Hwy 18 (Lake Rd W)
Chandler, OK 74834
Bell Cow Lake has great fishing, trails for horseback riding and a sandy swimming beach. The lake has four developed ... read more...
Email: email@example.com


text:
Ask a Garden Pro: Watering potted plants
CORPUS CHRISTI - QUESTION: Why do some plants on my patio seem to never get enough water, even when water runs out the bottom every time I water?
ANSWER: If you potted plants have a peat-based mix, then trying to overcome dry soil takes effort. Watering will wet the outside of the root ball if you allowed the pot to dry out, even once. After you water, the pot should be very heavy. If not, the center of the root ball is probably still dry.
Try these two tips. Use a thin stick and poke some holes about a quart inch wide into the rootball to allow water into the center when you irrigate. Another option is to soak the plant in a bucket of water for an hour or two to allow the water to penetrate the soil instead of just running out the holes. Make sure you don't leave it in the water more than a couple of hours or you might drown the plant and cause root rot.
Send questions to Michael Womack at firstname.lastname@example.com.
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Need Help? Call us at 1-800-566-8098.
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text:
Sunday, December 7, 2008
© Copyright 2015 Gwinnett Daily Post
SUGAR HILL - In an effort to help its less-fortunate residents - or those just going through tough times - have a happy holiday, the city of Sugar Hill is collecting non-perishable food and toys for the North Gwinnett Cooperative.The drive began in early November and donated food items were distributed to needy families for Thanksgiving. More food and toys will given out at Christmas. "We've been doing this over 10 years," City Manager Bob Hail said. "We think this is a good thing, it supports the people in North Gwinnett." Hail said it is a good way for Sugar Hill to take care of its own. "This is a city of people," he said. "We don't have a downtown or big commercial area, we are a bedroom community. When I first got here, our motto was 'A City of Family and Community,' and now on that same theme we can help people ... this is where you want your family to grow up. Family, community and recreation is what it's all about." Hail said part of the entry fee for a recent golf tournament was used to buy food and toys and that during the city's Fall Festival, canned goods were accepted in lieu of cash for tickets. Collection bins for this drive are located in the lobby of City Hall and at the Sugar Hill Community Center at 1166 Church St. Hail said donations will be accepted until Dec. 19 and distributed on Dec. 22. "We've supported this for a long time," Hail said, "and it's just another way we can help our own citizens."
More like this story
- Sugar Hill begins Christmas toy drive ( November 6, 2009 )
- Sugar Hill holds holiday food, toy drive ( November 4, 2007 )
- Sugar Hill holding food drive to help co-op with meals ( November 18, 2007 )
- Sugar Hill hires first community relations director ( August 19, 2007 )
- Mapping out the city
Sugar Hill master plan calls for bigger parks, more sidewalks ( February 17, 2008 )


text:
Only divers have the skills to remove underwater marine debris so on Sunday 8th September 2013 at 5pm, 21 local divers got together for a Dive Against Debris event at Stuart Cove's Dive Bahamas. The location was the coral reef surrounding the Anthony Bell shipwreck. Divers, working in teams, removed roughly 70lbs of debris including...
Project AWARE's online environmental community working together for ocean protection.
User Profile
Hayley-Jo Carr
Bahamas25° 0' 2.4588" N, 77° 31' 28.542" W
Member Type
A PADI Master Instructor currently Head of Training at Stuart Cove's Dive Bahamas. I LOVE Sharks and spreading the word of their plight to my customers and students is very important to me. Knowledge is power...and power can help make a change.
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The views, actions and activities posted by participants on My Ocean are their own and do not necessarily reflect those of Project AWARE Foundation.


text:
Downloads: 50,000 - 100,000
Price: FREE
Votes: 302
Author: Zotrock
Screenshots for Sexy Priya Mani Bikini LW
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Sexy Priya Mani Bikini Live Wallpaper.
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Large collection of Best and high resolutions Wallpapers of Priya Mani.Priya Mani is very famous actress in South Indian Cinema.
So start downloading and get enjoy with hot and spicy pictures of Priya Mani.please give good comment if you like.


text:
The Pearson family goes out for supper at their neighbor's house.
"Elsie, I don't remember the last time we ate this well. Okay, maybe that was last night right here," laughed Jim Bob Pearson. He stood on his hind legs with his mouth open waiting for another handout by the human at the back door of their favorite house. Jim Bob's six babies stayed close to their mother, eating bread and crackers. Jim grabbed three crackers in his mouth and dipped them in the water dish before eating.
"Jim Bob, we are very lucky to have such generous neighbors. It was after all their idea to feed us personally. Did you hear how the man of this house started yelling because we were making too much noise scrounging in his metal garbage cans?"
"I sure do, Elsie. It's a good thing the man had a soft spot for animals. And we get to come here every night for supper, too. How many other raccoon families can brag about that?"
"Not too many, Jim Bob. Our children are well fed, too." Elsie smiled in the direction of her babies who were busy eating.
"They are indeed, Elsie." Jim Bob surveyed each one of his babies: Billie Sue, Jerry Bob, Tammy Faye, Jeff Bob, Tammy Sue, and Jasper. "Dear, my cousin Jethro says he is coming to visit us this weekend. Maybe we should invite him to come here for supper?"
"Good idea, Jim Bob. Jethro is a big boy with a hearty appetite. I think he'll like it here." Elsie stopped for a moment and stood on her hind legs. "Look up at the side window, Jim Bob. A cat is sitting there."
Jim Bob looked into the window.
"Hey, it's Molly. She's a good cat. She never gives us trouble, just watches us quietly from a distance," Jim Bob responded.
Jasper spoke up. "Mom, I'm still hungry." He sniffed around on the ground for more tasty morsels.
"You know what to do, dear. Gently knock on the door for some more food." Elsie watched proudly as young Jasper stood up and knocked on the door. The actual door opened and little Jasper stuck his head in, hoping a human hand would would slip some food into his mouth. Before he knew it, the door almost closed on his tiny head.
"Oww!" yelled Jasper. "I almost lost my head." He shook his head and continued eating some more bread.
"Oh I'm sure the human didn't mean to do it to you, Jasper. Don't forget, they don't allow raccoons into their home," Elsie explained.
"That's right, Jasper, we're wild animals, and not supposed to mingle with humans or their pets. One day you will understand," Jim Bob smiled at his youngest child.
"I'll be all right Mom and Dad. Hey that female human is cute, isn't she." Jasper's mind was already on girls despite his young age of 3 months.
"She is a looker," Jim Bob agreed with his son. "I can imagine what she'd look like if she was a raccoon."
"Jim Bob Pearson!" Elsie commented. She didn't like her husband thinking about other females, especially ones who personally fed them. Jim Bob just blushed and turned his head away, pretending to drink water from the water dish.
"This has been a most enjoyable meal. Children, don't forget to thank the nice human who fed us." Elsie made sure her children were raised with good manners. Billie Sue chattered her thank you to the human, as did the rest of the kids. Jasper chattered something else besides a thank you, which the human heard but could not understand. "Come on Jasper, you know it's no use asking if you can eat inside next time. I'm sure the family doesn't have an endless supply of food in their kitchen for us." Elsie cuddled Jasper.
"I'd like to help them with their grocery shopping," replied Jim Bob. "But now, we must go home." He promptly chattered his thank yous to the girl at the door. They also waved goodbye to Molly, the cat in the window. The Pearsons walked down the cement steps and into the woods for a deep sleep that night, knowing they were fortunate to have a caring neighbor to feed them well.
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text:
With Brad KeselowskiŌĆÖs convincing Kentucky win, the Penske Racing #2 Miller Lite Dodge (to be all victory lane-official about it) scored its third victory of the season and virtually┬Āguaranteed┬ĀKeselowski a spot in the Chase. The breakthrough driver of 2011 now leads the Cup tour with three wins on the 2012 season.
On cue, the sports writing hemisphere immediately began cracking with debates about whether or not BK is the man to beat this year, if he's amongst the elite in the Cup series, etc. We can't resist asking the same type of question. Is Brad the man to beat in 2012?
ThatŌĆÖs the issue at stake in this episode of Bonus Points, a weekly feature in which Sports-at-Work writers Sam Salo and Luke Krmpotich debate a current issue in NASCAR, giving their takes on the way things ought to be. Sometimes, Sam and Luke will agree; other times, they may have slightly differing opinions; and on occasion, they'll be at each other's throats.
Each writer will also assign a "flag" value to his opinion on the question: checkered flag if it's a slam dunk, green flag if he's mostly convinced, yellow flag if it's a toss-up, red flag if he's pessimistic or black flag if he's dead set against the idea.
Sam: The answer to this weekŌĆÖs question is fairly straightforward, at least in this writer's humble opinion. In straight-forward terms, Keselowski is a hair's breadth away from being a true, top contender for the 2012 title.
He's well on his way to completing the process of showing total legitimacy as a consistent Cup series front-runner. Last year's summer victory blitz and subsequent stellar Chase run (hampered by ill luck) are proving to be no fluke. The man can win on short tracks, superspeedways, and bread-and-butter 1.5 mile venues, and he's shown early signs of life at road-racing prowess (Watkins Glen, 2011). The┬Āpatented┬Āsigns of elite skill are present in spades, the only ingredient left being consistency in performance over the next several years. ┬Ā
That said, the young lion that is Brad Keselowski still stumbles a bit in the area that most often bites young predators. That is, consistency. Brad indeed has three wins on the year, but he also is barely in the top-10 in points with about as many mediocre finishes as top-10's runs. That's nothing to worry about, as such inconsistency is common at this stage in a career bound for great success. It's also simply indicative of the current state of NASCAR racing: so many things can go wrong in a modern-day NASCAR race, and the level of competition is so high, that it's simply hard to finish in the top-10 more than 50 or 60 percent of the time. ┬Ā
To answer the question, Brad Keselowski is indeed one of the top contenders for the 2012 title.┬ĀTony Stewart showed last year that with a bunch of wins at exactly the right time of the ┬Āyear, it doesn't matter at all what the first 26 races of the year looked like in regards to consistency. That said, is Keselowski┬Āthe top contender this year? Beyond the implacable smoothness of your Jimmie Johnson's, Matt Kenseth's, and Dale Junior's, not yet.┬Ā
Bad Brad gets a yellow flag of caution if you're trying to peg team number two as team number one for 2012. But keep your Chase eyes peeledŌĆöhe's a predator on the prowl.
Luke: Just over a year ago, NASCAR fans and pundits alike were wondering whether Brad Keselowski made a career mistake by moving to a Cup ride at Penske Racing rather than biding his time at JR Motorsports in the Nationwide Series and waiting for a seat to open up at Hendrick Motorsports.
Needless to say, one Chase berth, top-5 points finish and six wins later, those questions have been silenced. And if the 2012 Chase started today, Keselowski would be sitting atop the standings for the first time in his young career. HeŌĆÖs a threat to win on a weekly basis and at any type of track, be it road course, short track, intermediate track or restrictor plate track.
But as talented and accomplished as is the driver of the Blue Deuce, Keselowski has an Achilles Heel when it comes to claiming true championship frontrunner status. A quick glance at the standings shows that the No. 2 is in just 10th place. The reason is a lack of consistency. Sure, the man can run up front consistently and bag wins with regularity. But at this point, IŌĆÖd take Dale Jr. with his lone win in the past four yearsŌĆöbut series-leading top-10 totalŌĆöover Keselowski in a championship battle.
Of course, Keselowski could go on a Tony Stewart-like tear in the Chase and bludgeon the competition into submission with win after win. HeŌĆÖs fully capable of going on such a run. However, itŌĆÖs far from likely, and IŌĆÖm not going to peg Keselowski as the lead dog in the race for the Sprint Cup championship on hopes of replicating what hadnŌĆÖt been done by any driver prior to the three-time champŌĆÖs incredible performance last season.
If Keselowski can put together a string of top-10ŌĆÖs as we head down the stretch toward the Chase and move up a few positions in the points, check back and I might revise my current way of thinking.
But for now, Mr. Keselowski receives a red flag for being the man to beat in 2012.
Final analysis: ItŌĆÖs a striped yellow and red flag for putting Keselowski at the head of the 2012 Chase pack. A solid championship contender, to be sure, but heŌĆÖs not quite at the top of the totem pole just yet.
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whatdigitalcamera X10 review
Started Nov 30, 2011 | Discussions thread
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Peekaboo! What's hiding behind those paws? Why, it's something woolly, something fluffy, something fuzzy, and something squeaky . . . a colorful menagerie of playful animals, each eager to be covered with kisses.
With flaps to lift, a squeaker to press, and a peek-at-yourself mirror at the end, this touchable, smoochable new book from the popular creator of Animal Kisses and Baby Animal Kisses is loaded with fun, surprises, and, of course, plenty of kisses.
About the Author
BARNEY SALTZBERG is the author-illustrator of the successful Kisses series, "Peekaboo, Blueberry!, Hi, Blueberry!, " and "Good Egg" (Workman), as well as various picture books. He also writes and performs music for children.www.barneysaltzberg.com


text:
1998 BMW 740iL Q&A
1998 BMW 740iL Question: there is a fail safety transmission alert that comes up on the dash
after driving the car for a while there is a an fail safe transmission alert that comes up on the dash and the trasmission goes into slump whi1e im driving it - bmw98
Answer 1
I have found that the transmission is sealed for life and supposed to not need attention. The truth of the matter is if you service the transmission once a year the fail safe light will not come on you probably need transmission fluid have it serviced or service it yourself I even had my seals done last year and it runs better now. - cwell
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