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A high dose rate, high impedance plasma ion implantation method and apparatus to apply high voltage pulses to a target cathode within an ionization chamber to both sustain a plasma in the gas surrounding the target, and to implant ions from the plasma into the target during at least a portion of each pulse. Operating at voltages in excess of 50 kV that are too high for the reliable formation of a conventional glow discharge, the plasma is instead sustained through a beam-plasma instability interaction between secondary electrons emitted from the target and a background pulsed plasma. The voltage pulses are at least about 50 kV, and preferably 100 kV or more. Pulse durations are preferably less than 8 microseconds, with a frequency in the 50-1,000 Hz range. The preferred gas pressure range is 1×10-4 -1×10-3 Torr; auxiliary electrodes can be used at the lower pressures to provide sufficient seed electrons for initiating a plasma, which is sustained by the beam-plasma instability interaction.
1. A plasma ion implantation method, comprising:
providing a target object within a plasma chamber,
introducing an ionizable gas into the chamber, and
applying a series of time-spaced negative voltage pulses to the target at a voltage level high enough to (a) induce a 3-dimensional beam of secondary electrons from the target that sustains a plasma in the gas through a beam-plasma instability interaction for at least a first portion of each pulse, and to (b) implant ions from the plasma into the target during at least a second portion of each pulse, wherein said voltage pulses are applied to the target with a rise time rapid enough for the rise in plasma density and implant current during each pulse to lag behind the voltage pulse rise.
2. The method of claim 1, wherein said ionizable gas introduced into said chamber establishes a gas pressure within said chamber of approximately 1×10-3 -1×10-3 Torr.
3. The method of claim 1, further comprising the step of energizing an auxiliary electrode within said chamber to aid in initiating said plasma with seed electrons emitted from said auxiliary electrode, with said voltage pulses sustaining said plasma through said beam-plasma instability interaction.
4. The method of claim 3, wherein said ionizable gas introduced into said chamber establishes a gas pressure within said chamber less than 1×10-3 Torr.
5. The method of claim 3, wherein said auxiliary electrode comprises a cold cathode suspended in said chamber.
6. The method of claim 3, further comprising the step of establishing a localized magnetic field in the vicinity of said auxiliary electrode to restrict a plasma-initiating Paschen breakdown to said auxiliary cathode.
7. The method of claim 3, wherein said auxiliary electrode is provided as an electron emitting filament, and an auxiliary energizing voltage is applied to said filament to energize it to thermionic temperatures to provide seed electrons.
8. The method of claim 7, wherein said ionizable gas introduced into said chamber establishes a gas pressure within said chamber, and the temperature of said filament controls ion current density independent of said gas pressure and voltage pulses.
9. A plasma ion implantation method, comprising:
providing a target object within a plasma chamber,
introducing an ionizable gas into the chamber, and
applying a series of time-spaced negative voltage pulses to the target at a voltage level of at least about 50 kV to (a) induce a 3-dimensional beam of secondary electrons from the target that sustains a plasma in the gas through a beam-plasma instability interaction for at least a first portion of each pulse, and to (b) implant ions from the plasma into the target during at least a second portion of each pulse.
10. The method of claim 9, wherein said pulses have durations less than about 8 microseconds.
11. The method of claim 10, wherein said voltage pulses are applied at a frequency of approximately 50-1,000 pulses per second.
12. The method of claim 11, wherein said pulse duration is on the order of about 5 microseconds and said pulse frequency is within the approximate range of 100-200 pulses per second.
13. A plasma ion implantation method, comprising:
providing a target object within a plasma chamber,
introducing an ionizable gas into the chamber, and
electrically energizing said target with an energization signal that undergoes a signal rise to (a) emit secondary electrons which forms a 3-dimensional beam that establishes a background plasma in said gas in the vicinity of the target through electron-gas collisions, and a primary pulsed plasma in the vicinity of the target through a beam-plasma instability interaction between said 3-dimensional secondary electron beam and said background plasma, and to (b) produce an implantation of ions from said primary plasma into said target, with said plasma experiencing a rise in density under said beam-plasma instability interaction, and said ion implantation experiencing a rise in implantation rate, that lag said signal rise.
14. A plasma ion implantation method, comprising:
providing a target object within a plasma chamber,
introducing an ionizable gas into the chamber, and
electrically energizing said target is energized with negative voltage pulses of at least about 50 kV to (a) emit secondary electrons which forms a 3-dimensional beam that establishes a background plasma in said gas in the vicinity of the target through electron-gas collisions, and a primary pulsed plasma in the vicinity of the target through a beam-plasma instability interaction between said 3-dimensional secondary electron beam and said background plasma, and to (b) produce a pulsed implantation of ions from said primary plasma into said target.
15. The method of claim 14, wherein said pulses have durations less than about 8 microseconds.
16. The method of claim 15, wherein said voltage pulses are applied at a frequency of approximately 50-1,000 pulses per second.
17. The method of claim 14, wherein said ionizable gas introduced into said chamber establishes a gas pressure within said chamber of approximately 1×10-4 -1×10-3 Torr.
18. The method of claim 14, wherein said voltage pulses are applied to the target with a rise time rapid enough for the rise in plasma density and implant current during each pulse to lag behind the voltage pulse rise.
1. Field of the Invention
This invention relates to plasma ion implantation, and more particularly to a high voltage implantation method and apparatus in which the plasma is generated with the same pulse-power system that applies a high voltage to the target being implanted.
2. Description of the Related Art
Plasma ion implantation is a process in which irregularly shaped target objects are immersed in a plasma and biased negatively to attract positive ions from the plasma, which impact the targets with sufficient energy to be implanted into them. The intent is to improve the surface properties of the object in areas such as better wear characteristics and increased hardness. Numerous different applications for ion implantation are known; its advantageous uses include the rapid processing of ferrous materials, for the production of industrial tool dies with good wear qualities but at relatively low cost and mass per die.
A high voltage, typically greater than 50 kV, must be applied to the target to provide sufficient acceleration to the plasma ions to achieve a significant implantation depth of 0.1 microns or greater. Previous implantation systems have used independent mechanisms to produce a continuous plasma, and to bias the target. One patent in this area, U.S. Pat. No. 4,764,3949 to Conrad, uses a discharge between a cathode inserted into a plasma chamber and a chamber wall (which functions as an anode) to produce a continuous plasma through volume ionization of the background gas. A separately biased target is inserted into the plasma for ion implantation. The background gas pressure is typically 10-5 -10-4 Torr. The plasma envelops all of the surface irregularities of the target object, which is pulse-biased to a high negative potential (on the order of 20-100 kV) with respect to the plasma by a high voltage modulator system that is independent of the plasma production system. The pulse-biasing of the immersed target reduces arcing, limits expansion of the plasma sheath, and achieves an omnidirectional and uniform implantation of plasma ions over the entire target surface. Major disadvantages, however, are that a separate plasma production system is required, and that sustaining the plasma on a continuous basis during the target pulsing results in a high ion surge current during the rise times of the voltage pulses. Furthermore, to achieve high ion doses in a short time period, a very high frequency operation of the target pulse modulator (on the order of 1 kHz) is required, which can lead to arcing. The ion implantation rate could also be increased by increasing the gas pressure above 10-4 Torr to raise the plasma density, but this can also result in arc formation.
In the Conrad patent the plasma sheath is initially close (a few Debye lengths) to the target surface. Upon application of the implantation voltage pulse, the plasma ions are removed from the plasma and the sheath expands. During the OFF time of the implantation voltage pulse, the plasma sheath moves back toward the surface of the part. In conventional practice, there is an upper limit of frequency (˜1 kHz) of the implantation voltage pulses above which the plasma sheath is unable to move back in time, to conform to the target surface, before the next pulse is applied. Furthermore, with the plasma present before the implantation voltage pulse is applied, a very high electric field develops (>50-100 kV/cm) across the plasma sheath once the implantation voltage is applied. A high ion current spike occurs which, together with the high electric field stress, leads to arcing at high repetition rate (>1 kHz) and high gas pressure (>10-4 Torr).
An alternate plasma production mechanism for plasma ion implantation is disclosed in patent application Ser. No. 07/595,123, filed Oct. 10, 1990 by Matossian and Goebel and assigned to Hughes Aircraft Company, the assignee of the present invention. In this application the plasma is formed in a localized plasma generator attached to the vacuum system, rather than by volume ionization of the background gas inside the ionization chamber. It has the advantage of improved uniformity in the implantation working space, improved selective plasma production from more than one species, the elimination of surface contamination from evaporation or sputtering of the filaments used in the U.S. Pat. No. 4,764,394 approach, and the control of the species mix for diatomic working gases. However, this system still utilizes separate discharge and cathode heater power supplies in addition to the high voltage modulator, requires multiple penetrations of the ion chamber, and uses a continuous plasma production that results in a high surge current during the rise time of the target pulse.
Other ion systems are known that operate at a much lower voltage regime than that discussed so far, generally at less than 1 kV, for coating a target rather than implanting ions into it In one such system, described in U.S. Pat. No. 5,015,493 to Gruen, a glow discharge is used to produce ions in the gas. The ions are then attracted to the target surface with the same voltage signal that was used to create the glow discharge. Negative voltage pulses of between 0.1 and 1 kV are applied to the target, with pulse durations of about 10-100 microseconds at a repetition frequency of about 1-10 kHz. Pulses are used rather than a continuous signal to avoid depletion of plasma near the target surface, arcing, and overheating of the target surface during deposition. A specific gas pressure is not given, although the patent states that it "may be less than 100 Pa" (0.73 Torr).
While the Gruen patent is effective for coating a work piece by an ionized vapor, the principles upon which it operates are not applicable to the much higher voltages required for ion implantation. This is because a glow discharge such as that used in the Gruen patent depends upon direct collisions between secondary electrons emitted from the target, and the surrounding gas atoms to produce the ions necessary to sustain the plasma. At the much higher voltages employed for ion implantation, typically on the order of 50 kV or greater, the secondary electrons have a much longer mean free path and a correspondingly lower probability of making an ionizing collision with a gas atom. Thus, the ion density from secondary electron collisions will be much lower at the higher voltage levels. This is illustrated in H. Tawara and T. Kato, "Total and Partial Ionization Cross Sections of Atoms and Ions by Electron Implant", Atomic Data and Nuclear Data Table, Academic Press, Vol. 36, No. 2, March 1987, pages 167-353, in which the ionization cross-sections of the noble gases at energies greater than 20 keV are shown to be on the order of thirty times less than at 100-200 eV; at such low ionization cross sections it would be very difficult to produce and sustain a dense plasma. The drop in ionization would be even greater at 100 keV, at which much ion implantation work is performed.
A pulsed glow discharge has also been used for ion nitriding, in which nitrides are formed at the target surface from an ionized nitrogen gas. This technique is described, for example, in Kwon et al., "A Comparative Study Between Pulsed and D. C. Ion Nitriding Behavior in Specimens with Blind Holes", Proceedings of the International Conference on Ion Nitriding, 1987, pages 77-81. In this technique the gas pressure is even higher, on the order of 1-10 Torr, and again the voltage levels employed to establish a glow discharge (typically less than 1 kV) are much lower than those used for ion implantation.
Other pulsed ion systems are also known. In U.S. Pat. No. 3,732,158 to Przybszewski a 2-5 kV DC voltage source is initially connected to an object to establish a glow discharge used to sputter clean the object, followed by lowering the gas pressure to about 10-2 Torr, pulsing the voltage source and applying RF power to a film material which is sputtered onto the target. In U.S. Pat. No. 3,479,269 to Byrnes, Jr. et al. a sputter etching process is accomplished by applying a negative 1.5 kV pulse train to a target to both form a plasma and to attract ions to the target (see FIG. 5). However, as with the Gruen patent, the systems described in these two patents are not applicable to much higher voltage ion implant techniques.
The present invention seeks to provide a high dose rate, high impedance plasma ion implantation technique and apparatus that eliminates the need for a separate plasma formation system, is capable of a higher implanted-ion dose rate and avoids the ion surge current of the Conrad patent, and is capable of sustaining a plasma at high ion implantation voltages in excess of 50 kV.
These goals are achieved by applying a negative voltage pulse train to an ion implantation target at a voltage level that is too high for the reliable establishment of a conventional glow discharge plasma. Rather, a pulsed plasma is established around the target by means of a beam-plasma instability interaction for at least a portion of each pulse. This is the same plasma generation mechanism that is used to fill the slow wave structure in the PASOTRON® (trademark of Hughes Aircraft Company) microwave source described in U.S. Pat. No. 4,912,367 by Schumacher et al. and assigned to Hughes Aircraft Company. Although the secondary electrons emitted from the target are generally insufficient to establish a direct glow discharge, they do establish a background pulsed plasma that is used to build up a primary pulsed plasma through the beam-plasma instability interaction between the secondary electrons and the background plasma. The plasma is produced as a result of the application of the voltage pulses to the target, such that an ion current surge at the beginning of each voltage pulse is inhibited.
The new implantation method enables targets to be implanted at significantly higher doses in shorter time periods. The preferred operating parameters are a voltage level in excess of 50 kV and preferably in excess of 100 kV, pulse durations of less than about 10 microseconds with a frequency in the 50-1,000 pulses per second range, and a gas pressure of about 1×10-4 -1×10-3 Torr. At the lower pressures, one or more auxiliary electrodes can be placed within the ion chamber. Upon application of target pulses, seed electrons which initiate the beam plasma discharge are produced by the auxiliary electrode. The target pulses also sustain the plasma through the beam-plasma instability interaction. At the higher pressures no auxiliary electrodes are required but they may still be used to help control and adjust plasma conditions.
Further features and advantages of the invention will be apparent to those skilled in the art from the following detailed description, taken together with the accompanying drawings.
FIG. 1 is a simplified elevation view of a pulsed ion implantation system that can be used to practice the method of the invention;
FIG. 2 is a graph illustrating the voltage and ion current responses of a pulsed target, continuous plasma system such as that described in the Conrad patent;
FIGS. 3a, 3b and 3c are graphs respectively illustrating voltage, plasma density and ion current responses achieved with the present invention;
FIG. 4 is a simplified sectional view of another embodiment of the invention, in which auxiliary electrodes are employed;
FIG. 5 is a simplified elevation view of another embodiment of the invention with auxiliary electrode arrangements which are different from the arrangement shown in FIG. 4; and
FIG. 6 is a simplified elevation view of an auxiliary electrode structure with magnetic enhancement.
A simplified view of a plasma ion implantation system that can be used to practice the method of the present invention is given in FIG. 1. It consists of a sealed plasma chamber 2, with a platform 4 supported inside the chamber to support a target object 6 into which ions are to be implanted. A gas such as nitrogen is introduced into the chamber from a gas source 7. The chamber and target support structures are not of conventional design and will be described in detail later.
The output of a high voltage pulse generator 8 is connected through an insulated vacuum feedthrough 10 to the target 6, which is elevated to the same voltage potential as the output of source 8. A ground reference is provided for both the voltage source 8 and the walls of chamber 2. A fast high voltage switch is necessary to form the pulses. The CROSSATRON® switch described in U.S. Pat. Nos. 4,247,804 to Harvey, U.S. Pat. No. 4,596,945 to Schumacher and Harvey and U.S. Pat. No. 5,019,752 to Schumacher, all assigned to Hughes Aircraft Company, is suitable for this purpose.
The voltage pulses supplied from source 8 to the target 6 are high enough for ion implantation, generally in excess of 50 kV and preferably at least100 kV. As described above, in this voltage regime it is very doubtful thata conventional glow discharge could be established around the target, and aplasma formation system that is separate from the target voltage source would normally be used. However, it has been discovered that a plasma can be sustained at these high voltage levels through a mechanism that is quite different from the normal glow discharge. This plasma generating mechanism is referred to as a beam-plasma instability interaction, and hasheretofore been observed only in connection with electron beams. This form of plasma production is described in a thesis by Liu, "Plasma Production By Beam-Plasma Discharge", Stevens Institute of Technology, 1974, pages 1-2; in Schmidt, Physics of High Temperature Plasmas 2d ed., Academic Press, 1979, pages 220-222; in Ishikawa et al, "Ion beam extraction with ion space-charge compensation in beam-plasma type ion source", Journal of Applied Physics, Vol. 53, No. 9, September 1982, pages 6018-6028; in Rosing et al, "Discharge and ion extraction properties of a beam-plasma ion source", Journal of Applied Physics, Vol. 57, No. 3, Feb. 1, 1985, pages 816-818; and in Demirkhanov et al, "Ion Emission From a Beam-Plasma Discharge", Soviet Physics-Technical Physics, Vol 15, No. 7, January 1971,pages 1047-1050.
In this process the electrons that leave a cathode are accelerated by an applied voltage and make ionizing collisions with surrounding gas atoms. However, the background plasma produced by these primary electrons is verytenuous, since they are relatively few in number and their mean free paths are much longer than the length of the discharge chamber. The resulting mixture of primary electrons (the electron beam) and background plasma is unstable with respect to density fluctuations. Due to this beam-plasma interaction, strong high frequency plasma waves are excited in the plasma.These waves heat the background plasma electrons, and the tail of the resulting electron velocity distribution ionizes the fill gas to increase the plasma density to levels much higher than one would calculate based upon the ionization rate of the original high energy electron beam. The plasma density gradually increases, and the primary plasma density reachesa steady state value at which the beam-plasma, plasma production is balanced by particle losses to the chamber walls. Various types of electron beam guns have been employed to provide the beam which initiates the plasma production, including the hollow cathode plasma E-gun describedin U.S. Pat. No. 4,912,367.
In the present invention, rather than employing a one-dimensional electron beam gun, the entire exposed surface of the implantation target in effect serves as the electron source, and the electron beam becomes a 3-dimensional distribution of secondary electrons flowing into the background gas. However, it has been discovered that the same type of beam-plasma instability interaction occurs as with an electron beam. This distinct plasma generation mechanism is used instead of a conventional glow discharge to establish a pulsed plasma around the implantation target6 at the high voltage levels (50-100 kV) required for ion implantation.
With voltage pulses on the order of 100 kV and currents on the order of 50-500 A, a high impedance on the order of 2 Kohm-0.2 Kohm can be sustained across the plasma sheath that surrounds the target surface during each pulse. The pulse duration must be long enough to allow sufficient time to establish plasma in the working chamber via the beam-plasma instability mechanism. The pulse duration must also be short enough to prevent excessive movement of the plasma sheath away from the target surface during implantation, which could otherwise result in the plasma sheath being unable to conform to small features of the target surface. This requirement is distinct from the previous Conrad patent technique, in which the plasma sheath is established around the target surface prior to the application of the implantation voltage pulse. The pulse duration then determines the amount of sheath expansion that will occur. During the pulse-OFF time, the plasma sheath moves back in toward the target surface and establishes its previous position before the next voltage pulse is applied.
In the present invention, there is no plasma or plasma sheath established prior to the application of the implantation voltage pulse. Once the voltage pulse is applied, plasma is formed via the beam-plasma instability, and a plasma sheath is established that moves in toward the target surface during the pulse duration. As the plasma density increases the sheath conforms to the target surface, and then moves away from the target surface as ions are depleted from the plasma during the implantation process. Therefore, in the present invention the pulse duration must be long enough to allow sufficient time to establish plasma in the working chamber via the beam-plasma instability mechanism, but short enough to prevent excessive movement of the plasma sheath away from the target surface during implantation. To satisfy these simultaneous requirements, the pulse duration should be longer than 1 microsecond. In the preferred embodiment a pulse duration of 7-8 microseconds is used; longer pulse durations result in arcing across the plasma sheath between the target surface and the plasma. The pulse repetition frequency should generally be kept between 50-1,000 Hz. Successful operation has been sustained with pulse durations of about 5 microseconds, and a pulse frequency in the range of 80-200 Hz.
The gas pressure within the chamber is another important parameter for the implantation process. Increasing the pressure causes the plasma density torise, and this yields a more rapid implantation of ions. However, arcing can occur if the pressure is too high. It has been found that, with 100 kVpulses, arcing can occur at pressures above about 5×10-3 Torr. Alower limit to the permissible pressure range is established by the minimumpressure at which a pulsed high impedance discharge plasma can be sustained. Suitable plasmas are achievable at gas pressures down to about 1×10-4 Torr, although at such pressures an auxiliary electrode (described below) is generally required to initiate each plasma pulse.
An important advantage of the present invention is that it is capable of achieving much higher plasma densities, and thus faster implantation rates, than the Conrad patent. The ion dose rate per pulse achievable withthe Conrad patent is generally on the order of one milliamp per square centimeter, as opposed to dose rates greater than 10 milliamperes per square centimeter with this invention. This high current density allows the sheath thickness to be small, on the order of 3-6 cm even at 50-100 kV. According to the Conrad patent, the presence of a plasma is needed before the application of the high voltage pulse, so that a small sheath is established to enable the implantation of fine features on the target. With the present high impedance technique, the ion current density is so high that adequately small sheaths are obtained even at 100 kV.
Another significant improvement over the Conrad process that is offered by the invention is that an ion surge current encountered at the beginning ofeach high voltage pulse applied to the target can be virtually eliminated. The Conrad situation is illustrated in FIG. 2, in which a voltage pulse 12applied to the target is plotted on the same time scale as the resulting ion current 14 implanted from the plasma into the target. With the continuous plasma of Conrad, the highest ion current is delivered to the target during the voltage rise time. This produces a high current spike 16, which results from two contributions. The first contribution is from the charging of the large system capacitance (cable, feedthrough, target table, etc.). The second contribution is from the large flux of ions flowing onto the target when the applied high voltage establishes the Child-Langmuir sheath between the target and the plasma by sweeping out the charge (ions) as the sheath expands. The current rises to 2-10 times its equilibrium value while the voltage is rising. The large current spikerequires a significant surge current capability by the high voltage modulator, and places undue stress on the modulator circuit.
With the present invention, by contrast, the plasma and high voltage pulsesare created simultaneously from a single modulator. The voltage pulse risesfaster than the plasma density due to the finite time required to generate the plasma, fill the working volume with plasma, and transport the ions tothe target. The ion current to the target rises slower than the voltage pulse, resulting in ion implantation at full voltage during the current rise time. The situation is illustrated in FIGS. 3a, 3b and 3c, in which curves 18, 20 and 22 respectively indicate the implantation voltage, plasma density and ion current waveforms plotted against a common time scale. It can be seen that the rise in both the plasma density and in the ion current lag behind the voltage rise, and do not reach peak values until the peak voltage has already been established.
The slower ion current rise time provided by the invention gives a "soft start" to the current pulse that reduces the target's arcing rate. Also, this pulse shape can be more easily coupled to step-up transformers to increase the implantation voltage without exciting high frequency oscillations in the voltage pulse applied to the target. This is in contrast to the high current turn-on spike characteristic of the Conrad continuous plasma approach, which tends to ring pulse transformers and to produce significant oscillations in the implantation voltage output duringthe pulse. The result with the continuous plasma technique is an implantation voltage that is typically lower than the modulator's peak voltage during some large portion of the pulse, accompanied by shallow ionimplantation. The improved current pulse 22 illustrated in FIG. 3c providesboth good coupling to a pulse transformer and stable output voltages over the entire pulse length.
As mentioned previously, the pulsed plasma system shown in FIG. 1 may not be capable of initiating a plasma at the lower end of the 1×10-4 -1×10-3 Torr pressure range. A modified system that allows for this is shown in FIG. 4. In FIG. 1, as the gas pressure is reduced to the range of 1×10-4 Torr it becomes increasingly difficult to initiate the beam-plasma discharge. This is because the density of background gas atoms is low, and there are few seedelectrons present that are required to produce a tenuous plasma that then leads to dense plasma production via the beam-plasma instability. There are two techniques that can be used to alleviate this problem and provide sufficient seed electrons. Both techniques involve the use of auxiliary electrodes placed in the ion implantation chamber to provide the required seed electrons. In one technique, thermionic filaments are used as continuously operating auxiliary electrodes as a source of seed electrons.In the other technique, use is made of magnetically augmented metal plates that serve as cold cathode auxiliary electrodes to provide seed electrons for initiating the beam-plasma-discharge process at low pressure.
FIG. 4 is a diagram of the first embodiment to aid in operation at low background pressures. It consists of placing one or more electron-emittingfilaments inside the ionization chamber 2. The filaments 36 are referenced at one end to the vacuum chamber wall, either by using resistors Rc as shown, or by connecting them directly to the wall. The filaments 36 are heated to thermionic temperatures using the power supplies 38, to cause electron emission. No separate plasma is created using these filaments. They merely serve to continuously supply seed electrons to the ion implantation volume. Once the implantation voltage is applied, the seed electrons from the filaments cause sufficient low-level ionization of the background gas so that the beam-plasma discharge process can be initiated at pressures in the lower range of 1×10-4 Torr. By varying the temperature of the filaments, the plasma density, and therefore the ion current density implanted into the target, can be varied and controlled, independent of the gas pressure and the applied voltage. Although it is primarily intended for allowing operation at low pressure ranges, this embodiment can also be used at the high pressure range described previously.
FIG. 5 shows the second embodiment that can be used to aid in beam-plasma discharge operation at low background pressures. This embodiment replaces the hot filament cathodes 36 (and their associated filament heater power supplies 38) with a simple cold cathode system. It consists of one or moremetal electrode structures referred to as auxiliary cathodes 24a and 24b that are suspended in the vacuum chamber 2 through feedthroughs 26a and 26b respectively. The cathodes 24a and 24b receive signals from the high voltage pulse generator 8 and are referenced to the target through ballastresistors Ra and Rb. To provide a mechanism to start the discharge on the cold-cathode surface, a localized magnetic field is introduced to the auxiliary cathode structure by means of permanent magnets 28 (as shown in FIG. 6) on the side of the cathode away from the implantation target. Thislocalized magnetic field increases the path length of any electrons emittedfrom the cold cathode surface; such a discharge can be initiated on the auxiliary cathode at a reduced pressure (≦10-3 microns). The geometry of the magnetic field at the auxiliary cathode is such that an ExB discharge runs on the cathode. The crossed-field plasma production discharge looks similar to that found in a planar magnetron. The plasma discharge is produced locally at the auxiliary cathodes when the high-voltage pulse is initiated, and ion and electrons diffuse to the target region to aid in the plasma build up.
There are several advantages to utilizing a cold cathode technique (as opposed to a hot filament technique) for the auxiliary cathode configuration shown in FIG. 5. First, the filament heater power supply, which would have to float at the high voltage at the start of the pulse, can be eliminated. Second, the ExB discharge initiates before the high-impedance discharge in the main chamber because of the longer path length of the electrons. This provides control over the introduction of the seed electrons to prevent arcing of the target by improper plasma location and generation. Third, the ExB auxiliary cathode can be used to produce a significant amount of plasma, depending upon the value of the ballast resistor, which can be utilized to control the plasma uniformity on the target. Finally, the material of the auxiliary cathode can be selected to minimize contamination of the substrate by picking a low sputtering yield material (such as molybdenum or tungsten) or, alternatively, a cathode material can be picked that aids in the formationof thin films on the target object by providing simultaneous sputter deposition and ion implantation. An example might be a Ti cathode materialto produce TiN on the surface of the target object due to ion implantation of the deposited Ti with nitrogen ions.
An important distinction between the present invention and the prior art exemplified by the Conrad patent should be noted here. As mentioned before, in the prior art it is not possible to simply increase the background gas pressure to achieve a higher ion current and ion dose rate.The reason for this is that the applied implantation voltage pulse is applied in the presence of a previously established plasma that resides closely (a few Debye lengths) to the target surface. This causes a large electric field (>50-100 kV/cm) to develop rapidly at the sheath at the same time that the ion current spike develops. These conditions can lead to arcing at pressures in excess of 10-4 Torr, and can prevent stableoperation. In contrast, with the present invention no plasma is establishedprior to application of the implantation voltage. When the voltage pulse isapplied in the present invention, a low (1 kV/cm) electric field develops between the target and the vacuum chamber walls in the absence of plasma, and then builds slowly to the same high value experienced in the Conrad technique. At high gas pressure in excess of 10-4 Torr, a glow discharge is produced via the previously described beam-plasma interaction. With the initial electric field stress reduced and with the ion current spike eliminated at the beginning of the applied pulse, stableoperation is achieved at high gas pressure greater than 10-4 Torr which would otherwise be impossible to achieve with the prior Conrad technique.
The pulsed plasma created with the invention is characterized by a high impedance of between 2 kohms and 0.2 kohms between the target cathode and chamber wall anode, in the sense that a high voltage drop is sustained at the target relative to the plasma. Nearly all of the applied voltage appears across the discharge in the cathode sheath, rather than across a current limiting resistor in the external circuit.
To conduct the high-impedance beam-plasma-discharge process, the apparatus shown schematically in FIG. 1 should preferably adhere to optimum design requirements. The first design requirement concerns the distance between the target support structure 4 and the vacuum chamber walls, both in the upper and lower hemispheres of the vacuum chamber 2 shown in FIG. 1. When a target 6 is placed on the target support structure 4, the beam-plasma discharge process is initiated and sustained between the target surface and the vacuum chamber walls 2, rather than between the bottom of the target support structure and the vacuum chamber walls 2. To ensure this, the distance between the surface of the target 6 and the upper hemisphere of the vacuum chamber 2 should be sufficiently greater (at least a factor of 2 times greater) than the corresponding distance below the target support structure. This design requirement is distinct and different from the prior art of Conrad, which poses no such requirement on the location of the target support structure with respect to the vacuum chamber walls.
An additional consideration is the design of the target support structure itself. In the preferred embodiment, the target support structure should be dimensioned to leave a gap of about 3 to 4 inches between the edges of the support structure and the adjacent vacuum chamber walls, as suggested in FIG. 1. This gap is small enough to prevent a glow discharge from beingcreated in the gap, while at the same time is large enough to prevent unwanted arcing between the support structure and the chamber walls. In addition, the gap size should be small enough to inhibit plasma, created by the glow discharge above the table 4, from leaking around the table andflowing under the support structure to cause initiation of a glow dischargein that region. In this manner, the target support structure simultaneouslyperforms multiple tasks not previously taught by the prior art Conrad technique. It (a) supports the target 6 to be implanted, and (b) also shields the plasma from flowing beneath it. This is in contrast to conventional target support structures, which consist of a single metal electrode to support the target and which allow plasma to flow around it. The target support structure has not previously been used as a device to limit the flow of plasma to various locations in the ion implantation chamber.
An additional system design consideration that is not required, but has been found to be advantageous because of its simplicity, is the absence ofmagnetic confinement in the main chamber 2 shown in FIG. 1. Because of the use of high pressures in the present invention, magnetic fields are not required. Magnetic fields are typically required in conventional techniques, such as those taught by Conrad, to improve the efficiency of the ionization process for operation at low pressures (10-5 -10-4 Torr). Since the present invention intentionally deals with a higher pressure plasma process, there is no requirement for the use of magnets at the perimeter of the vacuum chamber.
In one demonstration which used a filament as an auxiliary electrode, several samples of 304 stainless steel were used as an implantation targetwith nitrogen gas at a pressure of 5×10-4 Torr The pulsed implantation voltage was 60 kV, applied at a pulse rate of 500 Hz and a pulsed nitrogen ion current density of 4 mA/cm2. The samples were analyzed for a nitrogen profile with the use of a secondary ion mass spectrometer, which verified that nitrogen ions were implanted to a dose of 4×1016 /cm2 and to a depth of 0.1 micron. Another demonstration was accomplished without auxiliary electrodes. A 50-60 kV implantation voltage and a pressure of 1×10-3 Torr of nitrogen were used. The pulse repetition rate was 80 Hz, with a pulse length of 5 microseconds. In one hour an implanted dose of 1×1016 /cm2was achieved with a pulsed current density of 10 mA/cm2. This is contrasted with an implant voltage of 50 kV at the same repetition rate and pulse length in the continuous plasma Conrad system in which the pulsed current density is much lower (on the order of 1 mA/cm2); after operating for one hour at this dose rate the implant dose was less than 1015 /cm2.
While several illustrative embodiments of the invention have been shown anddescribed, numerous variations and alternate embodiments will occur to those skilled in the art. Such variations and alternate embodiments are contemplated, and can be made without departing from the spirit and scope of the invention as defined in the appended claims.
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Thrush is a
yeast infection that can develop in the mouth and throat and on the tongue.
Thrush is most common in newborns, infants, and older adults, but it can occur
at any age. In healthy newborns and infants, thrush is usually not a serious
problem and is easily treated and cured.
To prevent
To reduce the risk of spreading thrush to infants:
If your baby is taking antibiotic medicine for a different
infection, such as an ear infection, rinse his or her mouth out with water
after each dose. Antibiotic medicines can disrupt the balance of bacteria in
the mouth and allow growth of the yeast that causes thrush. Rinsing the mouth
with water after taking an antibiotic can prevent disrupting the normal
environment in the mouth.
If your baby needs medicine to treat
thrush, don't put the medicine dropper in the baby's mouth. Drop the medicine
on a cotton swab and swab it on the affected area. Throw away the swab, and
don't put anything back into the medicine bottle that could be contaminated
with the yeast.
Last Revised:
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subset: commoncrawl


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Managing the 7-12 Learning Environment
In this course students will explore child and adolescent development, student well-being, mental health, and their relationship to the management of learning; principles and practices for establishing a productive learning environment; and frameworks and models for understanding and responding to a range of challenging student behaviours. The course provides opportunities for pre-service Secondary teachers to analyse school policies; to plan and teach lessons using a variety of technologies and strategies; assess student learning; and to evaluate their own classroom management beliefs and practices through a full-time 20 day block of professional experience in a Secondary school setting.
Not currently available.
This Course was last offered in Semester 1 - 2014.
Learning Outcomes
1. Apply frameworks for understanding and interpreting professional practice;
2. Reflect upon their teaching using the NSW Quality Teaching model as a professional learning tool;
3. Demonstrate an understanding of the principles, policies, and practices for establishing and maintaining a productive learning environment;
4. Demonstrate their attainment of graduate teacher standards through professional experience;
5. Teach their subject methods using a variety of strategies and technologies; and
6. Engage in the full life of school including student sport, playground supervision, faculty/grade/stage meetings and school activities and functions.
- Child and adolescent development, student well-being and mental health.
- Principles, policies and practices for establishing a productive learning environment that supports the positive participation of all students in the educational activities of the school.
- Frameworks and models for understanding and responding to a range of challenging student behaviours.
- Graduate Teacher Standards.
Replacing Course(s)
This course replaces the following course(s): EDUC2039. Students who have successfully completed EDUC2039 are not eligible to enrol in EDUC2195.
Review of Progress
This course is a compulsory program requirement for students in the following program(s):
- Bachelor of Teaching (Secondary) / Bachelor of Fine Art (12217)
- Bachelor of Teaching (Second) / Bachelor of Health & Physical Education (12218)
- Bachelor of Teaching (Secondary) / Bachelor of Science (12219)
- Bachelor of Teaching (Secondary) / Bachelor of Technology (12220)
- Bachelor of Teaching (Secondary) / Bachelor of Mathematics (12223)
In addition to meeting the University's overall requirements for academic progression, students enrolled in these program(s) must satisfactorily complete this course in order to progress in their program.
Students must have completed 80 units of approved program courses including pre-requisite courses to enrol in this course.
Assumed Knowledge
EDUC1008 and EDUC2101, and a minimum of 60 credit points.
Assessment Items
Written Assignment: Design and Evaluate a Lesson *
Portfolio: Reflective Portfolio *
Report: Professional Experience Report *
* This assessment has a compulsory requirement.
Compulsory Requirements
In order to pass this course, each student must complete ALL of the following compulsory requirements:
General Course Requirements:
- Practicum: Attendance Requirement - Students must attend a minimum number of these sessions. - 20 day full time professional experience component in a school
Course Assessment Requirements:
- Written Assignment: Pass Requirement - Students must pass this assessment item to pass the course.
- Portfolio: Pass Requirement - Students must pass this assessment item to pass the course.
- Report: Pass Requirement - Students must pass this assessment item to pass the course.
Pre-Placement Requirements:
- Anaphylaxis Training - Students must complete approved anaphylaxis training.
- Child Protection Awareness Training - Students must complete approved child protection awareness training.
- Working with Children and Young Adults Check - A national criminal history check and review of findings of misconduct involving children, required for any child-related work.
Contact Hours
Face to Face On Campus 10 hour(s) per Term
Face to Face Off Campus 120 hour(s) per Term
Face to Face On Campus 10 hour(s) per Term


text:
Rangers hammer Tribe 12-7
Posted: 06/03/2008 - Josh Hamilton and Milton Bradley hit consecutive homers to set the tone in a four-run first inning and the Texas Rangers went on to a 12-7 victory over the Cleveland Indians on Tuesday night.
Posted: 06/03/2008 - Josh Hamilton and Milton Bradley hit consecutive homers to set the tone in a four-run first inning and the Texas Rangers went on to a 12-7 victory over the Cleveland Indians on Tuesday night.
Posted: 06/02/2008 - Casey Blake homered twice and matched a career high with seven RBIs before Ben Francisco hit a tiebreaking two-run homer to power the Cleveland Indians past the Texas Rangers 13-9 on Monday night.
Posted: 06/02/2008 - The Marietta School Board met today to annouce the new head football coach who isn't new at all. Coach DeWayne Taylor will reassume his position as Head Coach of the Indians.
Posted: 06/02/2008 - Terrell Owens has been on his best behavior for quite awhile. The Dallas Cowboys are doing their best to keep it that way.
Posted: 06/02/2008 - Adam "Pacman" Jones can join the Dallas Cowboys for everything but the regular season—for now.
Posted: 06/01/2008 - As is the case at most NASCAR tracks, Kyle Busch heard the boos at Dover International Speedway.
Posted: 06/01/2008 - The Oakland Athletics needed a boost on offense after scoring only nine runs in the previous five games.
Updated: 06/01/2008 - Six days ago, the Grayson Vikings took the field for their first game of the 2008 Junior College World Series. Tonight they leave Grand Junction as the new National Champions for the first time since 2000.
Posted: 05/30/2008 - Kevin Millwood allowed one run through six innings in his first start in almost three weeks, rookie Brandon Boggs matched a career high with three RBIs and the Texas Rangers beat the Oakland Athletics 3-1 Friday night.
Updated: 05/30/2008 - The Grayson Vikings beat Central Arizona to advance to the Junior College World Series championship game. The Vikings scored 5 of their 8 runs in the first inning in route to an 8-7 win.
Posted: 05/29/2008 - East Central University will play 11 games, but only four at home, as the 2008 football schedule was released Thursday.
Updated: 05/29/2008 - An impressive season for the S&S softball team came to an end today in Austin.
Posted: 05/28/2008 - As the competition gets stronger at the JUCO World Series, the Grayson Vikings just continue to play better. Grayson beat Shelton State in a run rule, 13-2, in a battle of tournament unbeatens.
Posted: 05/28/2008 - The Dallas Stars signed defenseman Trevor Daley to a three-year, $6.9 million contract Wednesday.
Updated: 05/29/2008 - Tank Johnson looked into the camera and sent a message to NFL commissioner Roger Goodell, loudly, clearly and with a big smile: "Roger, please, let him play! From Tank. Thanks, buddy."
Updated: 05/29/2008 - The Tampa Bay Rays are a hit on the field, if not in the seats.
Updated: 05/27/2008 - The Grayson Vikings beat the Alvin Dolphins, 10-8, in the 2nd round of the Junior College World Series. Michael Reed hit a three run homer in the bottom of the 9th to advance the Vikings in the winner's bracket.
Updated: 05/29/2008 - With one big swing, Josh Hamilton put his old team away.
Posted: 05/26/2008 - Scott Kazmir won his fourth straight start, striking out 10 in seven innings to lead the AL East-leading Rays over the Texas Rangers 7-3 Monday night.
Updated: 05/27/2008 - The playoff matchups are set for the S&S softball team and the Trenton baseball teams.
Updated: 05/26/2008 - Grayson beats Hagerstown in their first game at the Junior College World Series, 18-2 in 5 innings, Sunday night.
Posted: 05/25/2008 - The No. 24 Texas Longhorns logged 19 hits to post a 15-7 win over the Kansas State Wildcats in the title game of the Phillips 66 Big 12 Baseball Championship at AT&T Bricktown Ballpark.
Posted: 05/25/2008 - Ben Francisco sat motionless for minutes, staring at the floor — a stark contrast to the music blaring over in the Texas Rangers' happy clubhouse.
Posted: 05/25/2008 - Tony Kanaan skidded out of control after a run-in with his teammate. Danica Patrick was clipped by another car just trying to get off pit road. With all those yellow flags, it was hard to get up to speed at the Indianapolis 500.
Posted: 05/25/2008 - Tony Stewart suffered his second heartbreaking defeat of the season Sunday night when a flat tire late in the Coca-Cola 600 handed Kasey Kahne the victory in NASCAR's longest race of the year.


text:
Why can't I proceed past the User Agreement after I select I Accept?
You must scroll through the User Agreement until you reach the end of the agreement in the text box. Then you can accept it and continue.
Why can't I access Online Storage?
Why am I getting the error 'This folder cannot be displayed' when I browse to the Web Folder for Online Storage?
Why can I not copy files into Online Storage? Windows reports that there was an error copying the file.


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Started Jun 13, 2010 0 Replies 0 Favorites
I've entered a contest to win a trip to Cancun. I had to make something to show my support of Mexico in the World Cup. I made a poster and it's on Yucatan Holidays Facebook page. You have to "like"…Continue
Carolyn Dudgeon has not received any gifts yet


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News Schedule for Thanksgiving
KZYX NEWS will be off the air Thanksgiving, Thursday, November 28th and Friday, November 29th and will return Monday morning...
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The MCPB Board of Directors passed the 2016 MCPB Budget at its June 29 meeting in Willits last night. Follow this link to read the numbers.
Go to the Apple App Store on your iPhone or iPad and search for KZYX. The app is free of charge. It's a great way to get the live stream, the KZYX Jukebox, this website and to make a donation. Follow this link for a preview and easy access to the download. Or if you want to type it out here is the URL: https://itunes.apple.com/us/app/kzyx/id998145015?mt=8


text:
Burger King profits up 40 percent
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Join Date: Jan 2006
Posts: 6,726
Re: Burger King profits up 40 percent
Originally Posted by
I've made jokes about losers with a "usual" at a fast food place...but I never honestly thought they existed. Now out of morbid curiosity...I have to ask, how much do you weigh?
Hey man, when you like to eat something, you get it more than once. I can do they same thing at my local taco bell. Just walk in and hand the lady my money, and she makes my food. When you don't have time or are just getting something to eat while your at work, the choices can be limited. My weight: 167lbs, so no I'm not a fat ass from eating fast food all the time.
I think the burger alone is probably okay for you, since it covers all of the pyramid in one step. (bread, vegtables, dairy, meat, and sometimes fruits) The really bad part for you is the fries, since it is fried in 5 gallons of fat.
A burger with a side salad and water is probably a well rounded meal. It might have a little extra fat, but it is still better than having fries, dessert, or a shake.
@Absolution: You'd actually be suprised every now and then. It all depends on what store you walk into. I'd say on average BK tastes a little better, but I've been to a few McDs that were probably some of the best fast food I've had. The quality of the food depends more upon the resturant than the food itself.
EDIT: to try to keep on topic though
Originally Posted by
And incase you're wondering why it's in the console forums, the 3 burger king xbox/360 games helped BK get a 40 percent spike in the quarterly report. It's pretty crazy and at the same time, I can imagine what we'll be seeing from now on.
I saw the games they offered, but I really didn't think they were anything good. I guess they were a big hit with younger kids. Considering they were xbox only, I wouldn't have expected it to do that well, since the xbox is going by the wayside in favor of the 360. However, does the 360 do BC? If it does, then I can see how this would be a better idea.
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I cover health, medicine, psychology and neuroscience. full bio →
Opinions expressed by Forbes Contributors are their own.
I fell into writing about health shortly after grad school, where I realized I didn't want to work in a lab for the rest of my life! My areas of interest are the brain and behavior, as well as what influences the decisions we make about our health, and how the media helps and hinders people's understanding of health issues. As an undergraduate, I studied English Literature and Biopsychology at Vassar College, and got my PhD in Biopsychology and Behavioral Neuroscience at CUNY's Graduate Center in New York City, where I grew up and live now. My day job is as Associate Editor with the health website, TheDoctorWillSeeYouNow.com. My work has appeared in several other publications, including TheAtlantic.com and YogaGlo.com, and I'm particularly excited to join the Forbes health team. Email me at alicegwalton [at] gmail [dot] com .Contact Alice G. Walton
The author is a Forbes contributor. The opinions expressed are those of the writer.
This was such a powerful and insightful article Alice and I understand (as someone with an autoimmune disorder) well what goes through the mind of a person suffering from a life threatening disorder. The decisions, obligations (personal, spiritual, professional) and often, the choices that you come up against to either 1.) prolong your life seeking alternative methods (which is often the choice of many people who simply are afraid and wish not to suffer or alter themselves/lifestyles to ultimately face the same fate) or 2.) Risk upfront the chance to take on the painful and often dangerous man-made drugs. Decisions, Decisions right?
I want to believe that we all will face making choices that will not always serve those that we are closest to or many who will later dissect and regard these choices the way they would have done it.
Ultimately, I would like to think that Steve Jobs' contribution in the time that he was given was all the time needed to show us that one person can change the world. I would like to believe that his suffering might not have been as hard, his life not as long had he decided to take the surgery early.
But in the end, who really knows. Not even the doctors can say for sure. This is what people deal with everyday. The uncertainty of the experts and the gut feeling from within!
People always wonder why we can't cure cancer with all the millions of dollars people are donating. This gives a good explanation on why cancer can't be cured right now.
"Jobs' "magical thinking" may have defined his business brilliance, but it could have been his downfall in his fight against cancer."
This could just as easily and honestly read:
"Jobs' "magical thinking" may have defined his business brilliance, but it also contributed to living longer and better with cancer."
Sadly, there isn't a doctor on the planet who can assure anyone of anything from any cancer treatment. Every body is different. In the end we really only have our intuition to rely on.
Not long before Steve Jobs passed away I was watching an episode of "This Week In Start Ups" and they were talking about giving up one year of your life, so that Steve Jobs could have another ten. Well it came as a big surprise to me when I actually found out that he had passed away cause I was working at Laser Hair Removal Glendale AZ and I didn't think he was actually gonna pass away soon. I'm sad to see him go but he left behind a great legacy!
Some thoughts about Jobs' surprising choices for his cancer treatment, as well as his unique lifestyle http://www.youtube.com/watch?v=fkUVPlr-ec8
Steve Jobs died of cancer because he thought surgery was too mainstream.
Exactly. Nothing magical. No "intuition" involved.
Please research the topic before writing such an egregiously one-sided story. Mr. Jobs was diagnosed with pancreatic cancer in 2003. He was given less than a year to live. He decided to use alternative, natural treatments. Watch the WWDC 2005 video and notice how healthy he looked. He was supposed to be dead in 2004. Only when he decided to use conventional medicine around 2009 that his health worsened. The success rate for chemotherapy, radiation and surgery is less than 10%.
"Mac no matter how hard they tried would always lose to PC, pancreatic cancer" -Steve DeD RIP
This article is misleading. What experts believe that he died because he didn't get surgery fast enough? This article itself say he had a slow growing cancer. So because he received acupuncture, took supplements, and drank juices for NINE months he died sever years later? There is another side of this story to be told. Let me start with a couple maybe's:
-Maybe he knew something about natural healing methods that most people don't know.
-Maybe it was the chemotherapy and/ or the radiotherapy that killed him!
-Maybe his unpublicized liver transplant in 2009 had something to do with it.
-Maybe he would still be alive today if he would have exhausted every natural method or if large greedy corporations would stop suppressing the true potential of inexpensive natural therapies. (and this article doesn't help much)
I could go on and on but I'll keep this short. If anyone is interested in hearing about the other side of the cancer industry, you can youtube the movie "Cut, Burn, Poison" and watch it for free. This kind of stuff is my passion, it's what I do. If anyone wants to discuss this further, add me or my company page (The Awareness Revolution) on facebook.
Jeremy Kinney
I have pncreatic cancer and in my opinion Mr. JOBS. did every everything perfect, and lived longer than most people diagnosed this disease. He was so smart and I admire him for his own health decisions they were not wrong.. what he did gave him his best chances ….
An opposing viewpoint


text:
Blog Archives
October 31st, 2009 at 9:13 am
TV Ratings: House repeat 62.5% better than a new Dollhouse; Ghost Whisperer wins
With a two hour rerun of House, FOX improved 50% with adults 18-49 vs. last Friday and in the 9pm-10 hour, the[Read-More]
October 30th, 2009 at 8:11 pm
Law & Order Given 4 More Episodes This Season?
I have an unconfirmed report that NBC's Law & Order has been given an order for 4 more episodes this season. [...][Read-More]
October 30th, 2009 at 3:24 pm
Cable Ratings: NeNe wins again, FX's The League draws less than a million; Jeff Dunham down
NeNe and the rest of the Atlanta Housewives on Bravo again bested Project Runway on Lifetime. The premiere of FX's The League[Read-More]
October 30th, 2009 at 1:59 pm
Thursday finals: Grey's Anatomy, The Mentalist, 30 Rock tick up, Parks & Recreation, The Jay Leno Show down
No major movement, but as is typical a few shows were up a tenth or down a tenth of an adults 18-49[Read-More]
October 30th, 2009 at 12:42 pm
Production begins on Disney Channel's "Fish Hooks"
via Disney Channel release: PRODUCTION HAS BEGUN ON "FISH HOOKS," A NEW ANIMATED COMEDY SERIES TO PREMIERE ON DISNEY CHANNEL Production has[Read-More]
October 30th, 2009 at 12:35 pm
ABC announces the season premieres of "Scrubs" and "Better Off Ted"
This was already reported a couple of days ago, but ABC is just getting around to putting out the official release today:[Read-More]
October 30th, 2009 at 12:22 pm
ABC's November Sweeps programming to include Hank, The Forgotten and Eastwick
Blame the accountants![Read-More]
October 30th, 2009 at 10:38 am
TV by the Numbers "Fan Excuse" Bingo Cards Are Here!
Bingo cards are here! Now with fewer typos![Read-More]


text:
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1 x Oil of Morocco Blonde Toning Shampoo - 250ml
Nourishes and refreshes hair colour, prevents brassy tones, helps protect from the sun and pollution and provides intense moisture with its infusion of liquid gold - argan oil. Its sulphate-free formulation ensures a healthy and lustrous finish without the excessive foam.
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adds shine, lustre and body without oily residue, & reduces drying time.
Country of Origin: AUSTRALIA
Technical Specifications: Contains Nut Oil
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The protests at the town hall meetings have hit a nerve. Our duly elected officials were merely trying to inform the public of the health care bill, but hecklers made it impossible to get the story straight.
They want to blame their misfortune on the politicians, when this bill is designed to help the American people. The opposition's careless attitude gets in the way of making it easier for people without insurance to get it, either subsidized or gratis.
Lancaster County football fans are in for a gridiron bonanza tonight.
The sixth annual Founders Federal Credit Union Kickoff Classic offers county high school football fans the only chance to see all four teams at one site this season.
In addition to Founders, The Lancaster News, Carolina Gateway and Carolina Shopper serve as media sponsors for the game.
Do the nationalized health care systems of Western Europe and Canada provide better health care than what we have in the United States? Well, not according to my research.
According to the proposed HR 3200, which is the government healthcare law being considered by Congress, many provisions have been included which are not being explained to our citizens correctly.
If passed, one such provision in the law is the life and death provisions involving our senior citizens. Physicians will have no choice in this provision except to comply with the law. Advance Care Planning Consultation is detailed in section 1233, pages 424-434.
Steve Willis, Lancaster County administrator, correctly stated in his Aug. 16 editorial that the Lancaster "County Council cannot ignore the state constitution and state law when determining where the courthouse must be located."
I would like to expand on that statement by adding some additional information – a bit of South Carolina history.
The state law he refers to is embedded in the state constitution of 1790. At that time, the state capital was Charleston.
I want clarify my Aug. 12 letter, "Writer: Use hospitality tax for supply fund raiser." Some people misunderstood my letter and deemed me "racist" in the readers comments section of my letter posted on The Lancaster News Web site, www.thelancasternews.com. Others understood my ire.
I cannot be racist because I was raised in a clear world, even more so than our president. I am neither color, yet at the same time both colors. I have an immigrant ancestry, with both English and African forefathers.
We would like to thank all of the businesses and individuals that supported our trips to the Dixie Belles State tournament in Seneca in July and our World Series run in Sumter in August.
Your contributions meant so much to us. We were very honored to be able to represent Lancaster County at the state level and then to be able to move on to represent South Carolina in the World Series was truly incredible. We tried very hard to make Lancaster proud of us both on and off the field.
I wanted to express my sincere appreciation and thanks to Lancaster High School principal Joseph Kennan.
Over the summer I had been dealing with an issue of being told that my son owed money at the school for something that he already turned in. Although the amount owed was only $50 that is a lot of money in today's economy, especially for something not valid.
Copyright © 2015
The Lancaster News is your source for local news, sports, events, and information in Lancaster County and Lancaster, South Carolina, and the surrounding area..


text:
Male Strippers in CT | Men in Motion Dancers
Men in Motion Dancers - We Have the Best Exotic Male Dancers in CT.
Men in Motion is a professional male revue and private stripogram service in Connecticut. We have been in the adult entertainment business for 20 years. Based in New Haven county, Men in Motion does male review shows in the New Haven, Hartford and the casino areas.
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We do thousands of private parties a year. If you want the privacy with your girlsfriends in your own personal space, then hire one of our sexy Connecticut male dancers. Think about it, you can make the party exactly how YOU want to make the party. From food to decorations everything will run the way you want. Then you have our male stripper show up! Our professional male strippers are exactly that, professional. From tame to wild just let us know what you are looking for and we will set up your event.
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How about going to a male strip show? The Men in Motion Male Revue performs in Connecticut. Click here for our show schedule!
How does a Strip Show work?
Our nightclub shows are about an hour and a half to 2 hours long. They consist of 3-8 men depending upon the venue and ticket response. The show has group routines or an individual skit by each male performer. We take this business seriously that's why our shows are so good. We like to think of ourselves as the premier male stripping company in New England. Click here for our show schedule!
Midget Strippers in Connecticut
You won't believe it but the Men in Motion also has midget dancers! We have both male and female dwarfs and midgets for your party. If you want to have a party that you will never forget, book a midget stripper for your party. It will be burned in your memory forever!
Call or email to arrange a show for your private party or special event!
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Phone: 1-203-551-9753


text: So one fan recently Tweeted that he didn't like Ken Whisenhunt as a candidate for the Detroit Lions because he had been fired as a head coach. It was one of my favorite comments (and there are many) during this search that is less than two weeks old. it just seems longer.


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Stores »
I totally love wearing this, it's so easy!
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It's an age old question for me. Do I want the thing just to want it, or will I actually USE it once I have it?
I recall how badly I wanted the PSP, and though I owned one for 2+ years, I only ever played Final Fantasy Tactics on it extensively. It became a dust collector, and I traded it in at a Gamestop for practically nothing.
I camped out at a local Target for a Wii when it was first released. I think in the years I've owned it I've probably gotten 24 hours of total use. Another dust magnet.
Now, my current craving is the 3DS. There will be a fabulous deal this weekend where I can get the regular 3DS for $130 or the 3DSXL for $160. I've never owned ANY version of the DS, so my possibilities for games to play are virtually endless.
But will I actually play the damn thing? Do I really have interest in it, beyond trying Ocarina of Time for a bit before growing bored? Hell, I have a dozen good Xbox games to play (I just got one this past Christmas) and my Steam list is sad in how packed it is with good games I've yet to touch. And I haven't even looked at my PS3, though games like Uncharted 3 and Arkham City are waiting for me.
Maybe I have enough. Then again, I have a hard time passing up a good deal, and this is certainly that. What say you Giant Bomb, 3DS or no 3DS? If I DO pick one up, what's one game I can't miss?


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Lately my daughters poop has been aweful. Even putting her diapers in the diaper geine hasn't helped. I read once about putting a tablespoon of coffee in the bottom but the combination of poop and coffee was even worse. Is there anything else I can do to make it smell better without emptying it everyday?
Diaper Geine
Comments (6)
have you put a box of baking soda in the bottom of it?? i will not buy a diaper genie cause the one my sil had, stunk so bad. nothing would help the odor.
Check out our blog...everything KIDS:www.havekidswillblog.com
**Gina Kopp**
Mama to beautiful baby girls Arianna Katherine (7lbs3oz) & Genevieve Lynn (6lbs11oz) born 10/20/2009 at 38 weeks
I always double bagged the stinky ones (tied them up in a plastic bag before putting them in the diaper genie) and then kept an actual air freshener stuck to the side of it, that helped a lot. There are actual little tabs you can buy (made by diaper genie or similar brand) that help to neutralize odors but I've never used them myself so cannot attest to their functionability...but might be worth a try.
we have the diaper genie elete and we dont really have any issues with it, although i made the mistake of exchanging some of the original dg refill packages that someone gave me that were too big for the elete. instead of getting the right ones, i thought i would be thrifty and get the walmart brand that says "Fits diaper genie elete" and they are just small trash bag looking things that you have to put this awkward plastic ring around every time and you have to touch the stinky bag to get it out instead of being able to use the nifty cutter thing.
Have yout ried vinegar in it? soaked on a cloth or something? vinegar acts as a nuetralizer and may help...


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Murder in Suburbia (2004–2005)
The series focused on various murders in the fictional suburban English town of Middleford. The crimes are solved by two female police detectives, Inspector Kate Ashurst and Sergeant Emma Scribbins, aka "Ash and Scribbs".
Creator:Nick Collins
Stars:Caroline Catz, Lisa Faulkner, Jeremy Sheffield | See full cast and crew »
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Iowa Graduate Programs in Education
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Viterbo University's School of Education prepares educators who are grounded in Franciscan values and possess the knowledge and skills to be reflective decision makers for the 21st century.
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Robertson knocked off larger schools en route to dual top-three finishes over the weekend in a Las Cruces tennis tournament.
The Cardinal boys finished second only to Las Cruces' Mayfield High in the six-team fray.
Meanwhile, the RHS girls placed third, not far behind champ Clovis and runner-up Mayfield.
Coach Juan Carlos Fulgenzi guided his boys' squad to 14 match wins and three team points.
Luna Community College baseball players have filed a formal grievance against head coach Peter Ortiz alleging that he has been intoxicated during the team's road trips.
The Optic has been unable to reach Ortiz for comment.
The coach was placed on administrative leave earlier this season for unspecified reasons but returned to work in late March. Assistant Antonio Siqueiros filled in during the leave.
Brandon Baca and Jayme Quintana posted state-qualifying scores Monday in the Capital City Golf Invitational at the Santa Fe Country Club.
For Quintana, it was the fourth qualifying leg (only three are required) of the season. The Robertson standout shot an 85, placing third overall.
The family of Mariah Arguello, the Las Vegas native killed by a drunken driver, wants to know more about the driver's activities the night of the accident.
Mariah Arguello, 18, was headed east on Interstate 25 near San Juan when Cecilio Jaramillo, 28, of Santa Fe crossed over and hit Arguello's car head on late the night of April 23. Both died in the crash.
A bottle of beer was found in Jaramillo's car.
In a divided vote last month, the West Las Vegas school board voted down a new contract for Superintendent Jim Abreu, meaning his time with the district ends June 30.
But his allies on the board last week wanted to bring up the subject again, hoping for the board to reconsider.
The issue was on the agenda for the board's regular meeting. However, Abreu supporters' hopes were shattered right from the start when board member David Romero made a motion to remove the item from the agenda.
New Mexico Highlands University hopped to 10th in the latest Collegiate Baseball Newspaper poll on the heels of the Cowboys' four-game sweep of Regis over the weekend in Denver.
NMHU (29-6 overall and 19-3 in the Rocky Mountain Athletic Conference) received 344 points in the poll, which was released Monday. The team was 14th in last week's poll.
With one of the deeper batting orders in loaded District 2-3A softball, West Las Vegas' offense hasn't been the problem this season.
But holding opponents in check has been another matter.
"You give up a couple walks, and you make a couple errors, and you get in trouble," said WLV head coach Lucas Griego. "There's no defense for a walk. We've got to be able to control that."
The Family Justice Center moved into new digs last month.
The nonprofit group, funded by the state government, is now in the building next to the motor vehicle office on Ridge Runner Road in north Las Vegas. It moved from a building in the industrial park.
The group entered into a lease agreement with San Miguel County, which recently built the structure. The center is paying for its lease with the county with in-kind services — providing help to domestic violence victims in the county.
Visitors to Storrie Lake State Park shouldn't expect to see any fences being erected there for at least the next couple of weeks.
As recently as Monday, the Storrie Project Water Users Association placed newspaper advertisements warning that it would close the park because the state refuses to renew its lease for the association's land. The association's leader said last week that the group may begin arranging for a fence as early as this week.
Estevan Vigil, Daniel Martinez and Linda Esquibel are representing the Meadow City in Monday's elite Marilyn Sepulveda Invitational, gathering many of the state's high-profile prep tracksters at the University of New Mexico track and field complex.
It'll be a moment in the spotlight as well as a short rest for them after Thursday's successful New Mexico Highlands University-Puma Joe Abrams Classic.
Vigil had a state-qualifying javelin throw, also winning in the long jump, 100-meter dash, 200 and 400.
Copyright © 2015
The Las Vegas Optic is your source for local news, sports, events, and information in San Miguel County and Las Vegas, NM, and the surrounding area.


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Isaac Aanerud of Rogers was named Most Valuable Player in the Mississippi 8 Conference for boys soccer, after leading the Royals to a share of the conference championship. The fifth-year starter had 14 goals overall for the season, playing forward. On the Royals team, he shared MVP honors with goali...Read More
Rogers volleyball
The Rogers volleyball season ended with a first-round loss to Maple Lake in sectionals 25-22, 25-12, 28-26, 25-21 on Tuesday evening. The Royals finished 12-17. Lauren Bright had 14 kills and Kayla Crane 13 for Maple Lake (18-9)....Read More
The Rogers Royals beat St. Francis 16-25, 25-21, 25-19, 25-14 on Thursday evening. They had a balanced attack with Erica Foyt logging 10 kills, Lindsay Dorr and Maleia Ysteboe 8 each, and Bailee Waldnhoff 6. Ellie Hoyt made 26 assists, served 21-for-23 with 3 aces, and made 13 digs. Hannah Sjerven l...Read More
The North Branch Vikings turned back the Rogers Royals 25-21, 25-17, 21-25, 25-17 on Tuesday evening in North Branch. Erica Folk and Lindsay Dorr made 9 kills each and Maliea Ysteboe 7 for Rogers. Jessica Kolles served 11-for-11 with 3 aces and Bailee Waldhnoff 13-for-14 with 3 aces. Hannah Sjerve...Read More
The Rogers Royals were sharp in their hitting and serving as they defeated Princeton 25-7, 25-14, 25-15 on Tuesday evening. The Royals had 31 kills, led by Erica Folk with nine, Maleia Ysteboe with eight, and Lindsay Dorr with seven, against just eight errors. They served 69-for-71 with eight aces. ...Read More
Champlin Park handed the Rogers Royals a 25-23, 29-31, 25-13, 25-17 loss on Monday evening in Rogers. Mariya Sampson hammered 23 kills and Sydney Hilley 15 for the Rebels (9-1) while Hilley served six aces. Rogers (5-4) will host Princeton on Tuesday....Read More
The Rogers Royals cruised to a 25-14, 25-16, 25-22 win over Mounds View on the Mustangs court Tuesday evening. The Royals (5-3) made 26 kills against just six hitting errors. Erica Folk had nine kills, Lindsay Dorr five, and Hannah Scherle and Maleia Ytseboe four each. Dorr made three solo blocks an...Read More
The Rogers Royals were runners-up to Sauk Rapids-Rice in the Mound-Westonka Invitational on Saturday, winning three of four matches. The SRR Storm turned back the Royals 25-21, 22-25, 15-8 in the championship match. The Royals (4-3) reached the finals beating Woodbury 25-17, 25-20; Spring Lake Park ...Read More
The Rogers volleyball team was swept by Monticello in three close games in Rogers on Thursday evening. The scores were 25-21, 25-23, 25-22 in the conference opener for each. Rogers managed only two aces as the Magic covered the floor capably. Maleia Ytseboe led Rogers at the net with 13 kills...Read More
The Maple Grove Crimson handed Rogers a defeat 25-19, 22-25, 25-16, 25-18 on Thursday evening in Rogers. The Royals had a tough time blocking with 25 errors, while the Crimson were strong on serve receive as Rogers served 72-for-79 with just four aces. Erica Folk and Lindsay Dorr had eight kills e...Read More
by Bruce Strand, Sports editor The Rogers Royals showed two commodities they've been lacking, height and intensity, as they outlasted Elk River 25-18, 25-20, 18-25, 25-19 in the season opener for both Tuesday evening in Elk River. "I liked that we showed emotion and had int...Read More


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1776 $1 Continental Dollar, CURENCY, Pewter AU55 PCGS....
2007 Milwaukee, WI (ANA) Signature Coin Auction #444
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Choice AU 1776 Continental Dollar, CURENCY Variety1776 $1 Continental Dollar, CURENCY, Pewter AU55 PCGS. Breen-1089, Newman 1-C, Hodder 1-A.3, R.3. Early dollar specialists like to include this famous issue in their collections as representative of the first dollar-size pieces produced on behalf of the American Congress. Besides its intense and striking symbolism and its fairly direct link to later Colonial and early federal issues, the Continental dollars are extremely popular as the only 1776-dated Colonial (or, more accurately, pre-federal) pieces. The chain device on the reverse is a pictorial representation of "E Pluribus Unum," Latin for "Out of Many, One," the first national motto, which stresses the individuality of the states but relegates the greater power to their union. And if there were any doubt, each state is represented by a single round link in the chain and identified as such, but the central round device, ringed by AMERICAN CONGRESS and the sun's rays, states WE ARE ONE.
The sundial on the obverse, with FUGIO, "I fly" in Latin, and MIND YOUR BUSINESS beneath, is the prototypical American proverb in graphic form: "work is good, lazy is bad," "mind your own business," "idle hands are the Devil's workshop," "early to bed and early to rise makes a man healthy, wealthy, and wise," "all work and no play makes jack," "the early bird gets the worm," "make hay while the sun shines," the list goes on and on.
Struck in pewter, this piece has typical light to medium gray surfaces, somewhat lighter in color on the reverse. Most of the design elements are boldly defined, although portions of the outer ring on the obverse are sadly absent, above the date and below CURE. Some peripheral weakness is evident on the reverse and both sides have minor scrapes and bruises. Despite these issues, this piece retains considerable luster and presents an attractive appearance. (PCGS# 791)
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Not sure if this is too much mood and not enough lighting. I used the DAZ 4.6 Pro Public Beta version.
Title: MIdnight Snack
When I saw the title, and the style of the render, I thought "Wow, wouldn't it look cool if he was looking inside a fridge?"
The lighting from the fridge would look awesome.


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Jill McKenna of Westminster, Calif., is a marshmallow-making maniac.
When her son Gillen (now 13) was a baby, she sampled a marshmallow while making s'mores (those chocolate, graham cracker and marshmallow treats).
And after popping a marshmallow in her mouth, she decided that it was way too sweet, too flavorless and had an unappealing gummy-yet-resistant texture.
"I decided that I could do better, so I went on a marshmallow-making binge and over the course of several holidays came up with a few variations that our family and friends really like," McKenna writes, adding that Halloween and Christmas are huge events for her family.
"My marshmallow recipe is NOT my original work, but the variations are mine. I grab, collect, and just plain steal recipes from everywhere, so I have no idea where this one originated."
She says that although she is an avid cook, she comes from a long line of "anti-cooks."
"My mother cannot reliably boil water, and lost the recipe for ice cubes 30 years ago," she says. "So I took over most of the holiday baking and candy-making very early, around junior high school age."
She says that her mother, who used to hate marshmallows (and refused to eat them), now adores her homemade 'mallows. In fact, she mandates that McKenna make them for every holiday.
For Halloween she cuts them into a variety of holiday-themed shapes, everything from pumpkins to ghosts to bats. For Christmas, she cuts them into rectangles and dips one end into melted bittersweet chocolate.
Or, for special Christmas gifts, she packages a homemade marshmallow in a cellophane bag along with 1/4 cup shaved dark chocolate. She puts the bag in a holiday-themed mug and writes an instruction card.
The message says, "Add warm milk to shaved chocolate. When chocolate has melted, place marshmallow on top. Sip until boss shuts up, dog stops barking, or children clean their rooms. Do not share, as this treat was made especially with you in mind."
McKenna Marshmallows
Servings: One 9-by-12-inch pan
2 1/2 tablespoons unflavored gelatin
1/2 cup chilled water
1 1/2 cups granulated sugar
1 cup light corn syrup
1/4 teaspoon kosher salt
Homemade marshmallows make special, spooky treats
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Jill McKenna's Halloween marshmallows are made from scratch. These no-fuss treats make great Halloween party eats. (Nick Koon /Orange County Register/MCT)
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text: No recent wiki edits to this page. CareerPaul Gulacy has been drawing comics since the 1970's. Paul has worked on titles such as Batman, Green Lantern, Airboy and many others. Paul recently worked on Hyperion vs. Nightwing, and is most well known for his work on Marvel Comics' Shang-Chi, the Master of Kung-Fu. He also did the art with Terry Austin for Batman versus Predator II: Bloodmatch.


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Everyone knows the pioneering radio and television sex therapist Dr. Ruth but few know the incredible journey that preceded it.
From fleeing the Nazis in the Kindertransport and joining the Haganah in Jerusalem as a scout and sniper, to her struggles to succeed as a single mother coming to America, Becoming Dr. Ruth is filled with the humor, honesty and life-affirming spirit of Karola Ruth Siegel, the girl who became "Dr. Ruth."
Written by Mark St. Germain, acclaimed playwright of The Best of Enemies and Freud's Last Session.
Starring That 70's Show's Debra Jo Rupp