text:
Zalman CNPS9500LED temps too damn high.
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Intel Virgin
Join Date: Feb 2004
Location: New Jersey
Posts: 1,716
Re: Zalman CNPS9500LED temps too damn high.
Originally Posted by
What exactly is your ambient temp when you say,"a warm day"? Your temps don't seem that crazy considering your voltage.
More voltage increases temps significantly more than just increasing the clock speeds.
For example, I have a watercooled E6600 on an Asus P5B DX and here are my idle and load temps at different speeds and voltages.
Stock clocks and voltage - idle: 24/25c load: 32/33c
3.2 (8 x 400) and 1.45v - idle: 27/28c load: 42/43c
3.6 (9 x 400) and 1.525v - idle: 31/32c load: 50/51c
Ambient temp is ~ 23c - 25c. And full load is dual f@h for several hours. Orthos or TAT is a degree or two hotter.
I realize that > voltage = greater heat.
The fact is the base on my heatsink is concave. My room is kept at around 72F. I have to gob on the thermal grease just so the heatsink contacts the base at all. If I spread it thin, my PC shuts off before it reaches windows because theres literally no contact between the CPU and the heatsink.
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text:
Cobwobs Hostel
Nr 42, 22nd December 1989 Street, Maramures, Sighetu Marmatiei, Rumänien, Entfernung zum Stadtzentrum: 2.9km
The hostel is set in a large garden in the center of Sighet about half a kilometer from the town center and one kilometer from the bus and train station. It has three dorm rooms and one double room and can accomodate up to 16 people in very comfortable and spacious accommodation.
There is also a kitchen people can use to prepare their own food or where we can provide breakfast and dinner on request. Most of the food we provide is based around local cuisine and comes from our own garden or the local market.
We have four shower rooms and four toilets plus a left luggage and amenities room. Within easy walking distance of the hostel are several local restraunts, clubs and bars which you will
find very hospitable.
We have a reception open up to ten at night, an hour after the last train arrives in Sighetul which gives people a chance to reach us before we close. If you arrive after this you can always ring the bell and we will of course let you in
This year we are runing trips to a local farm house about five klm out into the most beautiful area near Sighet above the village of Iappa. During the afternoon you can go walking in the hills help the local farmers or maybe go mushroom picking. In the evening we will cook over an open fire, listen to traditional music and if you get lucky local farmers will come and join us and teach you how to dance. Also we will on request run trips across the boarder by bike to the Ukrainian mud baths/spa. Its an intresting way to relax and watch the Ukrainians having fun.
Verfügbarkeit & PreiseWähle bitte die Termine aus und klicke auf "Daten aktualisieren", um die Verfügbarkeit zu sehen
Hostels Ausstattungen & Richtlinien
- Fahrradverleih
- Fahrradkeller
- Kabelfernsehen
- Kostenloser Internet-Zugang
- Haartrockner zum Mieten
- Bettwäsche im Preis inbegriffen
- Schließfächer
- Gepäckraum
- Leselicht
- Ausflugsschalter
ReiserücktrittsversicherungDiese Unterkunft hat eine 1 Tage Stornierungsfrist. Ergeht innerhalb dieser Zeit keine Stornierung, wird eine Stornogebühr in Höhe der ersten Nacht des Aufenthalts in Rechnung gestellt.
AnfahrtKarte anzeigenKarte verbergen
To reach us from the bus and railway station is very easy.
- Take the road opposite the railway station and keep going until you reach the traffic lights, then turn right.
- You will come to a Luk Oil petrol station and opposite it is an orange shop selling drapery. Either call here or enter the garden through the red door to the right of the shop and continue down the path to the new house.
- The entrance to the hostel is at the rear of the house up a short flight of steps where somone will be available to help you further.
If you arrive in the middle of town follow the road heading north towards Satu Mare or Sapunta until you come to the same petrol station mentioned previously.

subset: commoncrawl


text:
Hometown Driving School
- (908) 279-6837
- S. 30 Plainfield Ave
- South Plainfield NJ 07080
Read user reviews
Hometown Driving School30 South Plainfield Avenue, South Plainfield, NJ 07080, United StatesShowing 5 reviews out of 5 total
Ganesh Kumar12/05/145 Stars - you will never get a better instructor than jim. you ask for him and him to teach. he is the best just not in teaching in driving skills but also as a person. the way he gives confidence you will feel comfortable giving in your test. i would surely recommend him for anyone. the fees structure is also very reasonable which makes you smile more. he also gives tips and tricks and he is master in parallel parking , you learn from him you can reduce all your mistakes. may be people reading this might feel i am over nice to him but you will believe if you meet him and learn from him.dixita barua09/15/144 Stars - I m learning driving from them but trust me it is good driving school. they will motivate at each and every step . they will focus on your weak points and will try to improve them. Both Jim and Mustafa are good instructors. Patient and they are very punctual. I would recommend this driving school to everyone!German Vazquez01/09/141 Stars - don't get me wrong jim is a awesome instructor but the other 2 i had weren't so nice, the last instructor kept yelling at me and making me nervous would not recommend unless jim teaches youChatts Shetty06/15/125 Stars - Instructor Jim is awesome. I would highly recommend Jim. My wife took driving class by Jim. He clearly tells where to improve and also suggests when to go for road test. Not like others who just take you to road test and once you fail then suggests where to improve. Jim gives high importance to customer satisfaction. He also told me how I can improve my wife's driving skills so that in free time I myself can instruct her, this way he saved my money on extra driving classes.A Google User01/23/105 Stars - You will be very happy with this school. Very professional.


text:
The invention is, in its various aspects, a method and apparatus for processing a semiconductor wafer. More particularly, the invention is a method and apparatus for identifying and controlling the impact of ambient conditions on photolithography processes. In a first aspect, the invention is a method for processing a semiconductor wafer. The method comprises identifying a disturbance in a photolithographic process arising from an ambient condition; modeling the identified disturbance; and applying the model to modify a control input parameter. In a second aspect, the invention is an apparatus for controlling a photolithography process. The apparatus includes an exposure tool, including a photolithography controller; and a computer receiving data from the exposure tool. The computer is programmed to perform a method comprising: identifying a disturbance in a photolithographic process arising from an ambient condition; modeling the identified disturbance; and applying the model to modify a control input parameter.
1. A method for processing a semiconductor wafer, comprising:
identifying a disturbance in a photolithographic process arising from an ambient condition;
modeling the identified disturbance; and
applying the model to modify a control input parameter for the photolithographic process.
2. The method of
3. The method of
4. The method of
5. The method of
6. The method of
7. The method of
8. The method of
9. The method of
10. The method of
monitoring the effect of modifying the control parameter; and
updating the model.
11. A computer-readable, program storage device encoded with instructions that, when executed by a computer, perform a method for processing a semiconductor wafer, the method comprising:
identifying a disturbance in a photolithographic process arising from an ambient condition;
modeling the identified disturbance; and
applying the model to modify a control input parameter for the photolithographic process.
12. The program storage device of
13. The program storage device of
14. The program storage device of
15. The program storage device of
16. The program storage device of
17. The program storage device of
18. The program storage device of
monitoring the effect of modifying the control parameter; and
updating the model.
19. A computer programmed to perform a method for processing a semiconductor wafer, the method comprising:
identifying a disturbance in a photolithographic process arising from an ambient condition;
modeling the identified disturbance; and
applying the model to modify a control input parameter for the photolithographic process.
20. The computer of
21. The computer of
22. The computer of
23. The computer of
24. The computer of
25. The computer of
26. The computer of
monitoring the effect of modifying the control parameter; and
updating the model.
27. An apparatus for controlling a photolithography process, comprising:
an exposure tool, including a photolithography controller; and
means for receiving data from the exposure tool, identifying a disturbance in a photolithographic process arising from an ambient condition, modeling the identified disturbance and applying the model to modify a control input parameter to the photolithography controller.
28. The apparatus of
29. The apparatus of
30. The apparatus of
31. The apparatus of
32. The apparatus of
33. The apparatus of
1. Field of the Invention
This invention pertains to a method and apparatus for processing a semiconductor wafer and, more particularly, to a method and apparatus for identifying and controlling the impact of ambient conditions on photolithography processes.
2. Description of the Related Art
Semiconductor devices, or microchips, are manufactured from wafers of a substrate material. Layers of materials are added, removed, and/or treated during fabrication to create the electrical circuits that make up the device. The fabrication essentially comprises four basic operations. The four operations are:
layering, or adding thin layers of various materials to a wafer from which a semiconductor is produced;
patterning, or removing selected portions of added layers;
doping, or placing specific amounts of dopants in the wafer surface through openings in the added layers; and
heat treatment, or heating and cooling the materials to produce desired effects in the processed wafer.
Although there are only four basic operations, they can be combined in hundreds of different ways, depending upon the particular fabrication process. Indeed, whole texts have been written on the many ways in which these operations can be employed. See, e.g., Peter Van Zant, Microchip Fabrication A Practical Guide to Semiconductor Processing (3d Ed. 1997 McGraw-Hill Companies, Inc.) (ISBN 0-07-067250-4).
Patterning is also sometimes called photolithography, photomasking, masking, oxide removal, metal removal, and microlithography. The term "photolithography" will hereafter be used to refer to patterning operations. In photolithography, typically, a machine called a "stepper" positions a portion of a wafer being processed under a "reticle," or photomask. A reticle is a copy of a pattern created in a layer of chrome on a glass plate. Light is then shone onto the wafer through the reticle. The chrome blocks some of the light. The light shining through the pattern on the reticle changes the material characteristics of the wafer where it contacts the wafer. These changes make the material more or less susceptible to removal in another operation, depending on the particular process being implemented. The stepper then positions another portion of the wafer under the reticle, and the operation is repeated. This process is repeated until the entire wafer has undergone the operation.
The purpose of photolithography is to create in or on a wafer the parts of what will ultimately be the semiconductor device. The parts must be laid down in the exact dimensions, within certain manufacturing tolerances, required by the circuit design and to locate them in their proper place. Some people consequently consider photolithography to be the most critical of these four basic operations.
The photolithography operations generally set the "critical dimensions" of the semiconductor devices. Errors can cause a whole host of problems including, but not limited to, distorted patterns, misplaced patterns, and other defects. These types of errors can undesirably change the functioning of the electrical circuits so that the wafer has to be scrapped. Photolithography processes are performed at very small dimensions, so that they are also highly susceptible to contamination by particulates or unwanted variations in processing conditions.
One type of processing condition is called an "ambient" condition. Ambient conditions in the processing facility, such as air pressure, temperature, and humidity, significantly impact the performance of semiconductor photolithography tool. Variations in the ambient conditions may deleteriously affect the operation of the tool because photolithography techniques need to account for the effect such conditions have on the operation, especially when they vary. However, there is no known mechanism for controlling photolithographic processes to account for this impact.
The present invention is directed to resolving one or all of the problems mentioned above.
The invention is, in its various aspects, a method and apparatus for processing a semiconductor wafer. More particularly, the invention is a method and apparatus for identifying and controlling the impact of ambient conditions on photolithography processes. In a first aspect, the invention is a method for processing a semiconductor wafer. The method comprises identifying a disturbance in a photolithographic process arising from an ambient condition; modeling the identified disturbance; and applying the model to modify a control input parameter. In a second aspect, the invention is an apparatus for controlling a photolithography process. The apparatus includes an exposure tool, including a photolithography controller; and a computer receiving data from the exposure tool. The computer is programmed to perform a method comprising: identifying a disturbance in a photolithographic process arising from an ambient condition; modeling the identified disturbance; and applying the model to modify a control input parameter.
The invention may be understood by reference to the following description taken in conjunction with the accompanying drawings, in which like reference numerals identify like elements, and in which:
FIG. 1 illustrates a method for fabricating a semiconductor device practiced in accordance with the present invention;
FIG. 2 illustrates semiconductor wafers being processed on an exposure tool, using a plurality of control input signals, in accordance with the present invention;
FIGS. 3-4 illustrate one particular embodiment of the process and tool in FIG. 2; and
FIG. 5 illustrates one particular embodiment of the method of FIG. 1 as may be practiced with the process and tool of FIGS. 3-4.
While the invention is susceptible to various modifications and alternative forms, specific embodiments thereof have been shown by way of example in the drawings and are herein described in detail. It should be understood, however, that the description herein of specific embodiments is not intended to limit the invention to the particular forms disclosed, but on the contrary, the intention is to cover all modifications, equivalents, and alternatives falling within the spirit and scope of the invention as defined by the appended claims.
Illustrative embodiments of the invention are described below. In the interest of clarity, not all features of an actual implementation are described in this specification. It will of course be appreciated that in the development of any such actual embodiment, numerous implementation-specific decisions must be made to achieve the developers' specific goals, such as compliance with system-related and business-related constraints, which will vary from one implementation to another. Moreover, it will be appreciated that such a development effort, even if complex and time-consuming, would be a routine undertaking for those of ordinary skill in the art having the benefit of this disclosure.
Ambient conditions have a significant impact on the performance of semiconductor lithography tools. Identification and correlation of variations in ambient conditions to affects on photolithography performance allows for compensation of their effects. The resultant measurements can then be formulated into a model that relates ambient conditions to disturbances in the performance of photolithography tools. Once this relationship is identified, the photolithography tool variables can be manipulated to compensate for changes in ambient conditions. This procedure can effectively reduce or eliminate the impact of uncontrolled ambient disturbances that can significantly increase the repeatability and capability of photolithography tools in semiconductor manufacturing.
FIG. 1 illustrates one particular embodiment of a method 100 practiced in accordance with the present invention. FIG. 2 illustrates one particular apparatus 200 with which the method 100 may be practiced. For the sake of clarity, and to further an understanding of the invention, the method 100 shall be disclosed in the context of the apparatus 200. However, the invention is not so limited and admits wide variation as is discussed further below.
Referring now to both FIGS. 1 and 2, a lot of wafers 205 is being processed through an exposure tool 210. The exposure tool 210 may be any exposure tool known to the art, provided it includes the requisite control capabilities. The exposure tool 210 includes a photolithography controller 215 for this purpose. The nature and function of the photolithography controller 215 will be implementation specific. For instance, it may be either a critical dimension controller or an overlay controller since the tool 200 is an exposure tool. Four wafers 205 are shown in FIG. 2, but the lot of wafers, i.e., the "wafer lot," may be any practicable number of wafers from one to several thousand.
The method 100 begins, as set forth in the box 120, by identifying a disturbance in a photolithographic process arising from an ambient condition. A "disturbance," as that term is used herein, is an adverse effect in the overlay control that is not caused by the control inputs to the overlay control. The nature, identity, and identification of disturbances will be largely implementation specific and even tool specific. For instance, capabilities for monitoring process parameters vary, to some degree, from tool to tool. Greater sensing capabilities may permit wider latitude in what disturbances are identified and the manner in which this is done. Conversely, lesser sensing capabilities may restrict this latitude.
Exemplary ambient conditions include, but are not limited to, pressure, temperature, and relative humidity. Parameters for a process are generally determined on the assumptions that the process will occur under certain baseline ambient conditions. In reality, however, ambient conditions vary from the baseline conditions. It is these deviations from the baseline that constitute disturbances affecting the process. One such disturbance attributable to deviant ambient conditions is magnification, which may adversely impacted by temperatures deviating from the baseline. This may translate into a change in the magnification overlay parameter. In order to avoid such an interaction, the effect upon magnification can be anticipated and compensated by adjusting the overlay inputs at the same time in accordance with the present invention. Other disturbances might also be encountered in lieu of or in addition to magnification depending on the particular implementation.
Returning to FIG. 2, in this particular embodiment, the process parameters are monitored by tool sensors (not shown). The outputs of these tool sensors are transmitted to the computer system 230 over the line 220. The computer system 230 analyzes these sensor outputs to identify the disturbances.
Turning, to FIG. 1, once the disturbance is identified, the method 100 proceeds by modeling the identified disturbance, as set forth in the box 130. The computer system 230 in FIG. 2 is, in this particular embodiment, programmed to model the disturbance. The manner in which this modeling occurs will be implementation specific.
In the embodiment of FIG. 2, the database 235 stores a plurality of models that might potentially be applied depending upon which disturbance is identified. This particular embodiment, therefore, requires some a priori knowledge of what disturbances might be encountered. The computer system 230 then extracts an appropriate model from the database of potential models to apply to the identified disturbances. If the database 235 does not include an appropriate model, then the disturbance may be ignored or the computer system 230 may attempt to develop one if so programmed. The database 235 may be stored on any kind of computer-readable, program storage medium, such as the optical disk 240, the floppy disk 245, or the hard disk drive (not shown) of the computer system 230. The database 235 may also be stored on a separate computer system (not shown) that interfaces with the computer system 230.
However, the modeling of the identified disturbance may be implemented differently in alternative embodiments. For instance, the computer system 230 may be programmed using some form of artificial intelligence to analyze the sensor outputs and controller inputs to develop a model on the fly in real time. This approach might be a useful adjunct to the embodiment illustrated in FIG. 2 and discussed above where disturbances are identified for which the database 235 has no appropriate model.
The method 100 of FIG. 1 then proceeds by applying the model to modify a control input parameter, as set forth in the box 140. Depending on the implementation, applying the model may yield either a new value for the control input parameter or a correction to the existing control input parameter. The new control input is then formulated from the value yielded by the model and is transmitted to the overlay controller 250 over the line 220. The overlay controller 250 then controls subsequent photolithography process operations in accordance with the new control inputs.
Some alternative embodiments may employ a form of feedback to improve the modeling of disturbances. The implementation of this feedback is dependent on several disparate facts, including the tool's sensing capabilities and economics. One technique for doing this would be to monitor the affect a model's implementation and updating the model. The update will depend on the model and it's affect. For instance a linear model will require a different update than will a non-linear model if all else is equal.
As is evident from the discussion above, some features of the present invention are implemented in software. For instance, the acts set forth in the boxes 120-140 in FIG. 1 are, in the illustrated embodiment, software implemented in whole or in part. Thus, some features of the present invention are implemented as instructions encoded on a computer-readable, program storage medium. The program storage medium may be of any type suitable to the particular implementation. However, the program storage medium will typically be magnetic, such as the floppy disk 245 or the computer 230's hard disk drive, or optical, such as the optical disk 240. When these instructions are executed by a computer, they perform the disclosed functions. The computer may be a desktop computer, such as the computer 230. However, the computer might alternatively be a processor embedded in the exposure tool 210. The computer might also be a laptop, a workstation, or a mainframe in other embodiments. The scope of the invention is not limited by the type or nature of the program storage medium or computer with which it might be implemented.
Thus, some portions of the detailed descriptions herein are, or may be, presented in terms of algorithms, functions, techniques, or processes. These terms are the means used by those skilled in the art most effectively convey the substance of their work to others skilled in the art. These terms are here, and are generally, conceived to be a self-consistent sequence of steps leading to a desired result. The steps are those requiring physical manipulations of physical quantities. Usually, though not necessarily, these quantities take the form of electrical or magnetic signals capable of being stored, transferred, combined, compared, and otherwise manipulated.
It has proven convenient at times, principally for reasons of common usage, to refer to these signals as bits, values, elements, symbols, characters, terms, numbers, or the like. All of these and similar terms are to be associated with the appropriate physical quantities and are merely convenient labels applied to these quantities and actions. Unless specifically stated otherwise, or as may be apparent from the discussion, terms such as "processing," "computing," "calculating," "determining," "displaying," or the like, used herein refer to the action and processes of a computer system, or similar electronic computing device, that manipulates and transforms data represented as physical (electronic) quantities within the computer system's registers and memories into other data similarly represented as physical quantities within the computer system memories or registers or other such information storage, transmission or display devices.
One particular implementation of the present invention is illustrated in FIGS. 3-5. This particular implementation is a modification of the overlay controller disclosed and claimed in the application Ser. No. 09/371,550, entitled "Method and Apparatus for Run-to-Run Controlling of Overlay Registration," filed Aug. 10, 1999, in the name of Anthony J. Toprac, Christopher A. Bode, and Richard D. Edwards. This application is hereby incorporated by reference for all purposes as is set forth fully verbatim herein. The modification effects the method of FIGS. 1-2 in the controller of that application. However, the invention is not so limited and may be practiced with other controllers.
Construction of the Apparatus
An exemplary embodiment 300 of the apparatus 200 in FIG. 2 is illustrated in FIGS. 3-4, in which the apparatus 300 comprises a portion of an Advanced Process Control ("APC") system. FIGS. 3-4 are conceptualized, structural and functional block diagrams, respectively, of the apparatus 300. A set of processing steps is performed on a lot of wafers 305 on an exposure tool 300, sometimes called a "stepper." Because the apparatus 300 is part of an APC system, the wafers 305 are processed on a run-to-run basis. Thus, process adjustments are made and held constant for the duration of a run, based on run-level measurements or averages. A "run" may be a lot, a batch of lots, or even an individual wafer.
In this particular embodiment, the wafers 305 are processed on an exposure tool 310 and various operations in the process are controlled by a plurality of control input signals on a line 320 between the tool 310 and the workstation 330. Exemplary control inputs for this embodiment might include an x-translation signal, a y-translation signal, an x-expansion wafer scale signal, a y-expansion wafer scale signal, a reticle magnification signal, and a reticle rotation signal.
When a process step in the exposure tool 310 is concluded, the semiconductor wafer being processed in the exposure tool 310 is examined in a review station 317. The control inputs generally affect the accuracy of the process steps performed by the exposure tool 310 on the wafers 305. Once errors are determined from the examination after the run of a lot of wafers 305, the control inputs on the line 320 are modified for a subsequent run of a lot of wafers 305. Modifying the control signals on the line 320 is designed to improve the next process step in the exposure tool 310.
Once errors are determined from the examination after the run of a lot of wafers, the control inputs on the line 320 are modified for a subsequent run of a lot of semiconductor wafers. Modifying the control signals on the line 320 is designed to improve the next process step in the exposure tool 310. The modification is performed in accordance with one particular embodiment of the method 100 set forth in FIG. 1, as described more fully below. Once the relevant control input signals for the exposure tool 300 are updated, the control input signals with new settings are used for a subsequent run of semiconductor devices.
Referring now to both FIGS. 3 and 4, the exposure tool 300 communicates with a manufacturing framework comprising a network of processing modules. One such module is the APC system manager 440 resident on the computer 340. This network of processing modules constitutes the APC system. The exposure tool 300 generally includes an equipment interface 410 and a sensor interface 415 and a machine interface 430 resides on the workstation 330. The machine interface 430 bridges the gap between the APC framework, e.g., the APC system manage 440, and the equipment interface 410. Thus, the machine interface 430 interfaces the exposure tool with the APC framework and supports machine setup, activation, monitoring, and data collection. The sensor interface 415 provides the appropriate interface environment to communicate with external sensors such as LabView� or other sensor bus-based data acquisition software. Both the machine interface 430 and the sensor interface 415 use a set of functionality to collect data to be used. The equipment interface 410 and the sensor interface 415 communicate over a line 320 with a machine interface 430 resident on a workstation 230.
More particularly, the machine interface 430 receives commands, status events, and collected data from the equipment interface 410 and forwards as needed to other APC components and event channels. In turn, responses from APC components are received by the machine interface 430 and rerouted to the equipment interface 410. The machine interface 430 also reformats and restructures messages and data as necessary. The machine interface 430 supports the startup/shutdown procedures within the APC System Manager 440. It also serves as an APC data collector, buffering data collected by the equipment interface 410, and emitting appropriate data collection events.
In the particular embodiment illustrated, the APC system is a factory-wide software system, but this is not necessary to the practice of the invention. The control strategies taught by the present invention can be applied to virtually any semiconductor exposure tool on a factory floor. Indeed, the present invention may be simultaneously employed on multiple exposure tools in the same factory or in the same fabrication process. The APC framework permits for remote access and monitoring of the process performance. Furthermore, by utilizing the APC framework, data storage can be more convenient, more flexible, and less expensive than local drives. However, the invention may be employed, in some alternative embodiments, on local drives.
The illustrated embodiment deploys the present invention onto the APC framework utilizing a number of software components. In addition to components within the APC framework, a computer script is written for each of the semiconductor exposure tools involved in the control system. When a semiconductor exposure tool in the control system is started in the semiconductor manufacturing fab, it generally calls upon a script to initiate the action that is required by the overlay controller. The control methods are generally defined and performed in these scripts. The development of these scripts can comprise a significant portion of the development of a control system.
In this particular embodiment, there are several separate software scripts that perform the tasks involved in controlling the photolithography operation. There is one script for the exposure tool 310, including the review station 317 the overlay controller 315. There is also a script to handle the actual data capture from the review station 317 and another script that containing common procedures that can be referenced by any of the other scripts. There is also a script for the APC system manager 440. The precise number of scripts, however, is implementation specific and alternative embodiments may use other numbers of scripts.
Operating the Apparatus. FIG. 5 illustrates one particular embodiment 500 of the method 100 in FIG. 1. The method 500 may be practiced with the apparatus 300 illustrated in FIGS. 3-4, but the invention is not so limited. The method 500 may be practiced with any apparatus that may perform the functions set forth in FIG. 5. Furthermore, the method 100 in FIG. 1 may be practiced in embodiments alternative to the method 500 in FIG. 5.
Overlay operations do not necessarily occur at all phases of the process and, thus, overlay control is not implicated in all operations. For purposes of illustration, assume the overlay control procedure begins at the source/drain portion of the fabrication process in one particular embodiment. The exposure tool 300 exposes the photoresist (not shown), which in turn defines the active areas of the wafer. The overlay controller 315 will treat this as the previous layer when it processes wafer lots through the poly gate steps, so some information is required from wafer lots run at this step. The subsequent time that semiconductor wafer lots enter the domain of the overlay controller 315 is generally during the poly gate portion of semiconductor device fabrication. This is the patterned level just above the source/drain layer. These two adjacent patterned layers are subject to overlay metrology, which enable the use of feedback control to correct errors in overlay. This is generally true for any two adjacent patterned layers that are followed by a review station metrology step.
Referring now to all of FIGS. 3-5, the method 500 begins with processing a lot of wafers 305 through an exposure tool 310, as set forth in box 510. In this particular embodiment, the exposure tool 310 has been initialized for processing by the APC system manager 440 through the machine interface 430 and the equipment interface 410. In this particular embodiment, before the exposure tool 300 is run, the APC system manager script is called to initialize the exposure tool 300. At this step, the script records the identification number of the exposure tool 300 and the lot number of the wafers 305. The identification number is then stored against the lot number in the data store 360. The rest of the script, such as the APCData call and the Setup and StartMachine calls, are formulated with blank or dummy data in order to force the machine to use its default settings.
As part of this initialization, the initial setpoints for critical dimension and overlay control are provided to the overlay controller 315 over the line 320. These initial setpoints may be determined and implemented in any suitable manner known to the art. In the particular embodiment illustrated, overlay controls are implemented by control threads. Each control thread acts like a separate controller and is differentiated by various process conditions. For overlay control, the control threads are separated by a combination of different conditions. These conditions may include, for example, the semiconductor exposure tool 300 currently processing the wafer lot, the semiconductor product, the semiconductor manufacturing operation, and the semiconductor exposure tool 300 that processes the semiconductor wafer lot at a previous layer of the wafer.
Control threads are separated because different process conditions affect the overlay error differently. By isolating each of the process conditions into its own corresponding control thread, the overlay error can become a more accurate portrayal of the conditions in which a subsequent semiconductor wafer lot in the control thread will be processed. Since the error measurement is more relevant, changes to the control input signals based upon the error will be more appropriate.
The control thread for the overlay control scheme depends upon the current exposure tool, current operation, the product code for the current lot, and the identification number at the previous patterned layer. The first three parameters are generally found in the context information that is passed to the script from the exposure tool 300. The fourth parameter is generally stored when the lot is processed through the previous layer. Once all four parameters are defined, they are combined to form the control thread name; STP02_OPER01_PROD01_STP01 is an example of a control thread name. The control thread name is also stored in correspondence to the wafer lot number in the data store 360.
Once the lot is associated with a control thread name, the initial settings for that control thread are generally retrieved from the data store 360. There are at least two possibilities when the call is made for the information. One possibility is that there are no settings stored under the current control thread name. This can happen when the control thread is new, or if the information was lost or deleted. In these cases, the script initializes the control thread assuming that there is no error associated with it and uses the target values of the overlay errors as the control input settings. It is preferred that the controllers use the default machine settings as the initial settings. By assuming some settings, the overlay errors can be related back to the control settings in order to facilitate feedback control.
Another possibility is that the initial settings are stored under the control thread name. In this case, one or more wafer lots have been processed under the same control thread name as the current wafer lot, and have also been measured for overlay error using the review station 317. When this information exists, the control input signal settings are retrieved from the data store 360. These settings are then downloaded to the exposure tool 300.
The wafers 305 are processed through the exposure tool 300. This includes, in the embodiment illustrated, source/drain and poly gate fabrication. The wafers 305 are measured on the review station 317 after their exposure on the tool 300. The review station 317 examines the wafers 305 after they are processed for a number of errors. The data generated by the instruments of the review station 317 is passed to the machine interface 430 via sensor interface 415 and the line 320. The review station script begins with a number of APC commands for the collection of data. The review station script then locks itself in place and activates a data available script. This script facilitates the actual transfer of the data from the review station 317 to the APC framework. Once the transfer is completed, the script exits and unlocks the review station script. The interaction with the review station 317 is then generally complete.
As will be appreciated by those skilled in the art having the benefit of this disclosure, the data generated by the review station 317 should be pre-processed for use. Review stations, such as KLA review stations, provide the control algorithms for measuring the control error. Each of the error measurements, in this particular embodiment, corresponds to one of the control input signals on the line 320 in a direct manner. Before the error can be utilized to correct the control input signal, a certain amount of preprocessing is generally completed.
For example, pre-processing may include outlier rejection. Outlier rejection is a gross error check ensuring that the received data is reasonable in light of the historical performance of the process. This procedure involves comparing each of the overlay errors to its corresponding predetermined boundary parameter. In one embodiment, even if one of the predetermined boundaries is exceeded, the error data from the entire semiconductor wafer lot is generally rejected.
To determine the limits of the outlier rejection, thousands of actual semiconductor manufacturing fabrication ("fab") data points are collected. The standard deviation for each error parameter in this collection of data is then calculated. In one embodiment, for outlier rejection, nine times the standard deviation (both positive and negative) is generally chosen as the predetermined boundary. This was done primarily to ensure that only the points that are significantly outside the normal operating conditions of the process are rejected.
Pre-processing may also smooth the data, which is also known as filtering. Filtering is important because the error measurements are subject to a certain amount of randomness, such that the error significantly deviates in value. Filtering the review station data results in a more accurate assessment of the error in the control input signal settings. In one embodiment, the overlay control scheme utilizes a filtering procedure known as an Exponentially-Weighted Moving Average ("EWMA") filter, although other filtering procedures can be utilized in this context.
One embodiment for the EWMA filter is represented by Equation 1:
AVGN≡the new EWMA average;
W≡a weight for the new average (AVGN);
MC≡the current measurement; and
AVGP≡the previous EWMA average.
The weight is an adjustable parameter that can be used to control the amount of filtering and is generally between zero and one. The weight represents the confidence in the accuracy of the current data point. If the measurement is considered accurate, the weight should be close to one. If there were a significant amount of fluctuations in the process, then a number closer to zero would be appropriate.
In one embodiment, there are at least two techniques for utilizing the EWMA filtering process. The first technique uses the previous average, the weight, and the current measurement as described above. Among the advantages of utilizing the first implementation are ease of use and minimal data storage. One of the disadvantages of utilizing the first implementation is that this method generally does not retain much process information. Furthermore, the previous average calculated in this manner would be made up of every data point that preceded it, which may be undesirable. The second technique retains only some of the data and calculates the average from the raw data each time.
The manufacturing environment in the semiconductor manufacturing fab presents some unique challenges. The order that the semiconductor wafer lots are processed through an exposure tool may not correspond to the order in which they are read on the review station. This could lead to the data points being added to the EWMA average out of sequence. Semiconductor wafer lots may be analyzed more than once to verify the error measurements. With no data retention, both readings would contribute to the EWMA average, which may be an undesirable characteristic. Furthermore, some of the control threads may have low volume, which may cause the previous average to be outdated such that it may not be able to accurately represent the error in the control input signal settings.
The overlay controller 315, in this particular embodiment, uses limited storage of data to calculate the EWMA filtered error, i.e., the first technique. Wafer lot data, including the lot number, the time the lot was processed, and the multiple error estimates, are stored in the data store 360 under the control thread name. When a new set of data is collected, the stack of data is retrieved from data store 360 and analyzed. The lot number of the current lot being processed is compared to those in the stack. If the lot number matches any of the data present there, the error measurements are replaced. Otherwise, the data point is added to the current stack in chronological order, according to the time periods when the lots were processed. In one embodiment, any data point within the stack that is over 48 hours old is removed. Once the aforementioned steps are complete, the new filter average is calculated and stored to data store 360.
Thus, the data is collected and pre-processed, and then processed to generate an estimate of the current errors in the control input signal settings. First, the data is passed to a compiled Matlab� plugin that performs the outlier rejection criteria described above. The inputs to a plug-in interface are the multiple error measurements and an array containing boundary values. The return from the plug-in interface is a single toggle variable. A nonzero return denotes that it has failed the rejection criteria, otherwise the variable returns the default value of zero and the script continues to process.
After the outlier rejection is completed, the data is passed to the EWMA filtering procedure. The controller data for the control thread name associated with the lot is retrieved, and all of the relevant operation upon the stack of lot data is carried out. This includes replacing redundant data or removing older data. Once the data stack is adequately prepared, it is parsed into ascending time-ordered arrays that correspond to the error values. These arrays are fed into the EWMA plug-in along with an array of the parameter required for its execution. In one embodiment, the return from the plug-in is comprised of the six filtered error values.
Returning to FIG. 5, data pre-processing includes identifying a disturbance in an overlay operation arising from critical dimension control of the exposure tool 310 as set forth in the box 520. Known, potential disturbances may be identified by characteristic data patterns or may be identified as known consequences to modifications to critical dimension control. The example of how changes in temperature affect magnification given above falls into this latter category.
The next step in the control process is to calculate the new settings for the overlay controller 315 of the exposure tool 300. The previous settings for the control thread corresponding to the current wafer lot are retrieved from the data store 360. This data is paired along with the current set of overlay errors. The new settings are calculated by calling a compiled Matlab� plug-in. This application incorporates a number of inputs, performs calculations in a separate execution component, and returns a number of outputs to the main script. Generally, the inputs of the Matlab� plug-in are the control input signal settings, the review station errors, an array of parameters that are necessary for the control algorithm, and a currently unused flag error. The outputs of the Matlab� plug-in are the new controller settings, calculated in the plugin according to the controller algorithm described above.
A photolithography process engineer or a control engineer, who generally determines the actual form and extent of the control action, can set the parameters. They include the threshold values, maximum step sizes, controller weights, and target values. Once the new parameter settings are calculated, the script stores the setting in data store 360 such that the exposure tool 300 can retrieve them for the next wafer lot to be processed. The principles taught by the present invention can be implemented into other types of manufacturing frameworks.
Returning again to FIG. 5, the calculation of new settings includes, as set forth in the box 530, modeling the identified disturbance. This modeling may be performed by the Matlab� plugin. In this particular embodiment, only known, potential disturbances are modeled and the models are stored in the database 335 accessed by the machine interface 430. The database 335 may reside on the workstation 330, as shown, or some other part of the APC framework. For instance, the models might be stored in the data store 360 managed by the APC system manager 440 in alternative embodiments. The model will generally be a mathematical model, i.e., an equation describing how the change in critical dimension control affects the overlay performance.
The particular model used will be implementation specific, depending upon the particular exposure tool 300 and the particular disturbance being modeled. Referring once again to the example of temperature/magnification example, the relationship can be described by Equation (2):
Δm≡the change in magnification;
m≡the magnification factor;
Ta≡the ambient temperature;
Tb≡the baseline temperature; and
b≡a tool dependent offset.
Whether the relationship is linear or non-linear will be dependent on the particular parameters involved.
The new settings are then transmitted to and applied by the overlay controller 315. Thus, returning now to FIG. 5, once the identified disturbance is modeled, the model is applied to modify a control input parameter, as set forth in the box 540. In this particular embodiment, the control input is an overlay control input. Using the same example, the machine interface 430 retrieves the model from the database 335, plugs in the values for the magnification (m), the ambient temperature (Ta), the baseline temperature (Tb), and the tool dependent offset (b), and determines the necessary change in the magnification parameter (Δm). The change is then communicated by the machine interface 430 to the equipment interface 410 over the line 320. The equipment interface 410 then implements the change.
The present embodiment furthermore provides that the models be updated. This includes, as set forth in boxes 550-560 of FIG. 5, monitoring the effect of modifying the control input parameters and updating the applied model. For instance, various aspects of the exposure tool 300's operation will change as the tool 300 ages. Referring again to the temperature/magnification example, the tool dependent offset (b) might therefore vary as the tool ages. By monitoring the effect the changes implemented as a result of the disturbance, the necessary value could be updated to yield superior performance.
As noted above, this particular embodiment implements an APC system. Thus, changes are implemented "between" lots. The actions set forth in the boxes 520-560 are implemented after the current lot is processed and before the second lot is processed as set forth in box 570 of FIG. 5. However, the invention is not so limited. Furthermore, as noted above a lot may constitute any practicable number of wafers from one to several thousand. What constitutes a "lot" is implementation specific, and so the point of the fabrication process in which the updates occur will vary from implementation to implementation.
Hierarchical Ordering of Conditions
One particular variation of this implementation includes a hierarchical ordering of conditions that constitute a control thread. Hierarchical ordering is taught generally, without reference to the present invention, in application Ser. No. 09/371,665, filed Aug. 10, 1999, entitled "Method and Apparatus for Performing Run-to-Run Control in a Batch Manufacturing Environment," by Anthony J. Toprac, William J. Campbell, and Christopher A. Bode. This application is hereby incorporated by reference for all purposes as if fully set forth herein verbatim. In one embodiment, the hierarchical ordering of control thread data is related to the strength of the effects that these conditions exert on the control of a manufacturing process.
Generally, a number of discrete process factors will affect the performance of a given manufacturing process. These factors can be arranged in a hierarchy. The different levels in the hierarchy can be arranged in order of the relative impact each of the previous process factors will have on the variance of the present manufacturing process. Each wafer lot processed will generally involve a discrete value from each hierarchy, but will contribute process information to multiple hierarchical levels. Control of each wafer lot will use the lowest hierarchical level (the second level being lower than the first level) for which there is previous process metrology information. Generally, the processing of each wafer lot will add information to each hierarchical level.
More particularly, the control inputs of the exposure tool used in a process may be defined as the first level of a hierarchical ordering of control thread data. The control inputs of a previous operation may be the second most influential factor on the control inputs of the present process, which can be defined as the second level of the hierarchical ordering of control thread data. The control inputs relating to a similar product type may be the third most influential factor on the control inputs of the present process, which can be defined as the third level of the hierarchical ordering of control thread data. Further levels of the hierarchical ordering of control thread data can be defined using other similarities between previous processes and a current process.
Using the aforementioned hierarchical ordering of control thread data, an automatic spawning of control threads can be implemented. In one embodiment, initially, the control inputs for a plurality of semiconductor lots are placed into a single control thread. When sufficient data is present to prove a statistically significant difference between lots belonging to different hierarchical levels, a process controller splits the initial control thread into two control threads. As more data is obtained, new control threads that represent different hierarchical levels are generated. The modeled disturbance may be one factor defining or ordering the hierarchy as described above.
Generally speaking, one control thread is used to run a manufacturing process on a lot of semiconductor devices, much as is described above for FIGS. 3-5. Metrology process data is acquired and control input errors are calculated. The control inputs for the next process run are modified on a run-to-run basis, based upon errors detected from a previous manufacturing run. Based upon the errors detected from the previous manufacturing run, new control input settings are determined and an appropriate bin in a hierarchical level is filled with data, effectively creating new control threads.
The particular embodiments disclosed above are illustrative only, as the invention may be modified and practiced in different but equivalent manners apparent to those skilled in the art having the benefit of the teachings herein. Furthermore, no limitations are intended to the details of construction or design herein shown, other than as described in the claims below. It is therefore evident that the particular embodiments disclosed above may be altered or modified and all such variations are considered within the scope and spirit of the invention. Accordingly, the protection sought herein is as set forth in the claims below.
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While the ZTE Engage flaunts a sturdier design and better screen than most ZTE handsets, it's a poor performer where it counts the most.
Critics say Ellen Pao is fostering censorship that will destroy the community-curated news site. Reddit issues mea culpa, saying it's "screwed up" for years.
Pass up the ZTE Engage LT's poor performance and relatively high price for other entry-level Cricket phones, like the HTC One SV.
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Need a geeky gingerbread treat? Make it so with this tasty "Star Trek" tribute to the U.S.S. Enterprise made by Trekkie bakers.
Find out why this electric racing series has a shot at becoming huge -- and how its technology could change the cars we drive for the better.
Key sections of online community Reddit, including one of the site's most popular drawcards, "Ask Me Anything", are being pulled from public view in protest of the alleged firing of one its key administrators.
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New service from online jeweler Brilliance delivers 3D-printed versions of rings so customers can test gemstone sizes and styles without setting foot in a store.


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38 year old man | Parkville, MD, USA | Seeking women 27-36 within 30 miles of Baltimore, MD
Smiling like a checkerboard and shining like a shoe.
I am an honest, reliable, and trustworthy person. I am very active and like being outside. I ride mountain or road bikes almost everyday, for fitness... and for fun. I try to make the most out of each day. In addition to my day job, I coach high school soccer and lacrosse in Baltimore County (I'm a former H.S. science teacher). I enjoy the time I spend with my players, though it can be challenging at times.:). I put in a good bit of time effort into the things I commit to. Traveling is important to me. I like exploring new places. Destinations typically include a beach or the mountains. I went to Europe this past spring...and would love to go back. Going out to unique restaurants/places is a great way to spend an evening, though I am just as content to spend a night at home with good company watching a movie or engaging in good conversation. Good friends, family, and my dog are important to me. I have a good life...I'm looking for someone to make it even better. My match would be open, honest, and trustworthy. A warm and caring person to share new experiences with.
Camping , Coffee and conversation , Cooking , Dining out , Gardening/Landscaping , Movies/Videos , Museums and art , Music and concerts , Exploring new areas , Playing sports , Travel/Sightseeing , Watching sports
Auto racing / Motorcross, Cycling, Other types of exercise, Running, Soccer, Walking / Hiking, Weights / Machines
I exercise 5 or more times per week.
I have Dogs
I have a boxer/pit mix. He' s great...loves everyone. See photo.
Baltimore (Hampden, Canton, Fells Pt., Federal Hill); Outer Banks, NC (love it there, have been twice so far this year);Snowshoe, WV; Florida; Gunpowder State Park; Loch Raven Res.
Stevenson University, Stevenson, MD
Traveling/exploring new places, new experiences, riding bicycles/motorcycles, music/shows/concerts, movies, my dog, naps, Mexican food, good friends and family, interesting conversation.
Day trips, weekend trips, vacations. The beach. Bicycles & motorcycles. Hiking & sightseeing. Live music. A unique restaurant with an interesting menu. Spending time with my dog. Watching a movie with good company. Friends and conversation.
Blood Meridian by Cormac McCarthy and Cory Branan lyrics (see greeting).
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I own/operate a landscaping business.
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B.S. Biology, Stevenson Univ., 2001 M.B.A, Loyola Univ., Unfinished.


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Juvenile Diabetes
Change in lifestyle among children and a sedentary life has seen a spike in juvenile diabetes. Spot the signs of juvenile diabetes in its early stage, get a comprehensive look on juvenile diabetes as we explore what juvenile diabetes is, the signs and symptoms, types of juvenile diabetes, causes of juvenile diabetes, treatment and cure of juvenile diabetes.
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Juvenile Diabetes: Identifying the Signs and Symptoms
Childhood diabetes or juvenile diabetes is an endocrine disorder that develops in children and adolescents too. Children diagnosed with this condition have a weaker immune system and are insulin dependent. There are some signs and symptoms that parents should monitor, especially those who know that... Continue Reading »
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Diet Tips for Diabetic Children
Diabetic children under the age of 16 with type 1 diabetes are Insulin dependent. Unlike adults they do not have to be on strict diets. Type 1 diabetes is caused since the pancreas cannot produce insulin. This happens when the immune system attacks the insulin-producing beta cells. In diabetic... Continue Reading »
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Mass. residents hibernate as storm bears down
Officials urged people in flood-prone coastal areas of Marshfield to voluntarily leave until after Saturday morning's high tide. Shelters were open in Marshfield, Scituate and on Cape Cod.
Revere, Sandwich Harbor and the east coast of Nantucket were considered vulnerable to major flooding, according to the weather service.
Many businesses in the state were closed by noon, but some local coffee shops and restaurants stayed open.
At Rosie's Liquors in Abington, customers were lined up 10 deep Friday, snapping up 30-packs of beer, bottles of wine and every single bottle of Captain Morgan Spiced Rum.
Manager Kristen Brown said the store had five times its typical sales Thursday and Friday.
"It has been crazy," Brown said. "We've been absolutely slammed. It's almost been like Christmas here."
"A lot of people are saying, 'I'm going to be stuck with my family all weekend. I need something to do.'"
Some gas stations were almost out of fuel after customers formed lines to fill their tanks.
"It hasn't snowed like this in two years. Most people are caught way off guard," said James Stone, owner of a Sunoco station in Abington.
Stone had gone through almost his whole supply of regular-grade gas by noon Friday and was saving the last 3,000 gallons for plow drivers. He said he expected the storm to prevent delivery trucks from bringing more gas until Sunday.
Paul Czapienski, owner of Foster Farrar & Co. True Value hardware store in Northampton, said that business was brisk Friday, but that there was no frenzied or panic buying.
"Being in a hardware store, unfortunately we're in this situation where the worse the weather is, the better off we are," Czapienski said. "It's sad, but it is true."
The storm comes almost 35 years to the day that the famed Blizzard of '78 hit the region. That storm, which killed dozens of people, left about 27 inches of snow in Boston and packed hurricane-force winds and flooding that caused extensive damage along the coast.
Associated Press reporters Denise Lavoie, Jay Lindsay and Bob Salsberg contributed to this report.


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When the Angels' Song is Silent
SATB choir
Composed by Mary Kay Beall. Promise, Christmas, Sacred. Octavo. 8 pages. Published by Hope Publishing Company (HP.C5204).
Item Number: HP.C5204
A perfect piece for the Sunday immediately following Christmas, this new two-part anthem by Mary Kay Beall has poignancy and urgency. The message of the text is thought provoking and joyful, and the inclusion of the familiar Gloria refrain in the final section is inspired.


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An Evidence-Based Approach, 3rd Edition
Management: An Evidence-Based Approach provides an introduction to the broad field of management and organization. Throughout the book the theory of management is related to everyday situations. Theory is selected on the basis of evidence in managerial practice in strategic, organizational and...
Published July 1st 2010 by Routledge
A European Perspective
Management: A European Perspective adopts a step-by-step approach based on the key managerial skills – planning, organization, implementation, supervision and control – to provide a practical introduction to the field. Looking at some leading international companies, Keuning draws on...
Published February 7th 2007 by Routledge


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Posted 11 December 2012 - 21:17
Posted 11 December 2012 - 21:21
Posted 11 December 2012 - 21:22
Even if they officially abandon it, custom roms usually go 2+ years or more !
That Samsung Galaxy SIII is looking pretty good right about now. I know they'll probably abandon it update-wise by summer but what the hell. At least I can swap the battery if it decides to act like this phone.
Posted 11 December 2012 - 21:31
I'm not having that issue.
I went 1 day 10 hours from 85% -> 10% with medium to heavy usage.
The big thing you can do to improve battery life is turn off location aware for applications that don't need it (i.e. Angry Birds). Also turn off background permissions for those kinds of apps.
Mine's running nicely :\
Posted 11 December 2012 - 21:36
UPDATE: I'm having battery drain problems. My wife also has a 920. Charged them both to 100%, mirrored settings/apps on each and left them on over night (screen off). As of this morning, her phone has 96% battery left and mine was @ 71%, so its not my imagination.The day before, it ****ed away nearly half its charge in 10hrs being on standby with no use at all. Phone won't make it through half a day if I actually used it at this point.
Also, Her phone also has the following apps enabled:
Screen brightness = Auto
Tap/Send =on
Nokia Drive background tasks = on
Wi-Fi =on
4G-LTE (can't be disabled on At&t)
location =on
Weather Channel background tasks = on
*Mine has an XBL account, but I've already tried disabling its connection and it makes no difference in battery life.
I've been told to let the phone die, then charge to max, turn off all background tasks, disable Nokia Drive etc. and while I appreciate everyone's help, I believe these tips are simply myths. Basically whats being suggested is to increase battery life by disabling every feature of the phone and don't use it. The more likely scenario here is that a certain number of phones have shipped with faulty batteries. I'm going to swap mine out for another 920 tomorrow if I come home today and see the phones eaten through its battery again. It was on 65% @ 6am when I left, so we'll see....
Posted 11 December 2012 - 21:46
One thing that I can tell which will increase the battery life is to turn off NFC. Since NFC usage is basically non-existant here in the states, why leave it on if you are not going to use it.
Posted 11 December 2012 - 21:50
One thing that I can tell which will increase the battery life is to turn off NFC. Since NFC usage is basically non-existant here in the states, why leave it on if you are not going to use it.
I understand what you're saying but again, wife has same phone with same settings is getting dramatically better life with all this stuff enabled. I disable everything and can't even get close to what she's getting with all the battery sapping stuff on.
Posted 11 December 2012 - 21:53
I understand what you're saying but again, wife has same phone with same settings is getting dramatically better life with all this stuff enabled. I disable everything and can't even get close to what she's getting with all the battery sapping stuff on.
If NFC is an issue, it is an issue with the phone and software/hardware. On my S3, I have always had NFC turned on so me and my girl can easily share what we want between our S3's, and my battery , even on heavy use, last at least 15 hours.
Maybe it is a bad battery.
Posted 11 December 2012 - 22:14
But as mentioned, my wife has the exact same phone with all that crap enabled and she's not having any problems with battery drain.
Posted 11 December 2012 - 23:40
Have both your phones received the latest updates from Nokia? In particular, have you received the network+ update as there have been reports that that fixes the battery life issue.
I received my Lumia 920 on Saturday, it received all the latest updates on Sunday and I'm very happy with the battery life. It's not scientific but I estimate that the battery is lasting about 30% longer than my old Omnia 7.
Posted 12 December 2012 - 00:09
Then if you aren't happy with it...take it back to the store. But quit your complaining. It seems that no amount of tweaking on the phone is going to get a better battery life and no amount of anything is going to make you happy. It may be that this phone is defective....cause that never happens with the iPhone or any droid phone. Just my $0.02 opinion.
It's already known that there are some software bugs in WP8 on the 920....hell read the forums over at wpcentral. That is what apollo+ or whatever it is called is hopefully going to fix.
Posted 12 December 2012 - 10:52


text:
Not exactly the minors, but I saw that Alonzo is 0-2 with 2Ks so far in Omaha. Hopefully he's just saving his big hits for when he gets paid for them.
Not exactly the minors, but I saw that Alonzo is 0-2 with 2Ks so far in Omaha. Hopefully he's just saving his big hits for when he gets paid for them.
Neftali Soto homers for Billings....they lead 2-1
Soto (playing 3B).....2-2 HR
Buchholz (playing 2B)....1-1
This will not change until the Reds win the World Series.......
April 28, 2006.
Juan Duran: 2-4 today (two singles) hitting 6th and playing RF
4-3 Billings after five innings.
Soto: 2-for-3 homerun
Stiffler: 1-for-2 walk
Brown: 1-for-2 homerun
Buchholz: 2-for-2
Wideman: 0-for-1 walk
Castro: 5 IP, 4 H, 3 R, 1 BB, 5 K
I miss Adam Dunn.
Chattanooga lost 7-0.
Cumberland went 2-for-3 with a walk and his 10th stolen base.
I miss Adam Dunn.
Nefi Soto 3-run homerun! Huge night for him.
Soto is now 3-for-4 with two homeruns and four RBI.
Buchholz is 3-for-3.
I miss Adam Dunn.
Yonder Alonso just doubled off the wall. He's 2-for-5 on the night with a double.
I miss Adam Dunn.
Miami Loses!!! We Can Sign Yonder Now!!!
Miami lost 8-3. The Reds can now begin negotiations with Yonder Alonso.
Alonso finished his college career with a 2-for-5 effort with one of those hits being a double off the wall.
I miss Adam Dunn.
9-3 Billings after six.
Soto: 3-for-4 two homeruns, 4 RBI
Stiffler: 1-for-3 walk
Konstanty: 2-for-4 homerun
Brown: 2-for-4 homerun
Stovall: 2-for-4
Buchholz: 3-for-4
Wideman: 0-for-2 walk
Castro: 6 IP, 4 H, 3 R, 1 BB, 5 K, 11 GO/2 FO
I miss Adam Dunn.
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text:
Kitchen and Playsets Role Play Toy Reviews
Top toy kitchens and role play toys! When kids want to pretend to be all grown up, these toys help them get into the action.
- Trending
- New Review
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Chet the Cat and Friends! Yummy Adventures Baking Set
from Educational Insights
This is a set of melamine, food-safe baking utensils that let kids 3+ roleplay baking adventures or help mix batter and serve finished baked goods with parents.
Brio Dinnerware Set
from Brio
The Dinnerware set from Brio is an eight-piece dining set for pretend food play.
My First Kenmore Wooden Washer and Dryer
from Sears
Kids 3+ who love to play house can pretend to do their own laundry with this wooden playset.
Chet the Cat and Friends! Yummy Adventures Dish Set
from Educational Insights
Kids 3+ can have pretend mealtime or real snacktime with this set of food-grade melamine plates and utensils.
My First Kenmore Microwave
from Jakks Pacific
My First Kenmore Microwave from Jakks Pacific is a simple roleplay toy to add to your little cook's kitchen.
Teenage Mutant Ninja Turtles 3D Pop Up Sewerscape
from The Ninja Corporation
Kids 1.5+ can play out Teenage Mutant Ninja Turtles adventures in their very own Turtles-themed play tent.
EverEarth Work Bench
from Maxim Enterprise, Inc.
Kids 3+ can pretend to build with this wooden work bench playset that comes with four pretend tools.
I'm a Little Teapot Musical Tin Tea Set
from Schylling
Kids 3+ can have a musical tea party with this pretend tea set that comes with a teapot that plays "I'm a Little Teapot".
My First Kenmore Iron Board Set
from Sears
Kids 2+ can pretend to be just like mom and dad ironing their clothes with this pretend iron set.
BRIO Pot & Pan Set
from Schylling
Kids 3+ can pretend to cook just like mom and dad with this toy cookware set.


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Know Thy Customer? : Part 2
In part 1 of this blog I discussed how customer segmentation and analytics is gaining in importance in Utilities particularly in the Marketing/Customer Service domain. In this blog I'll discuss how the same techniques can be applied in other lines of...
from Blog: Energy and utilities


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1890-CC $20 MS62 PCGS. CAC. Variety 1-A....
2011 August Chicago Signature US Coin & Platinum Night Auction #1158
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|Printable auction results for all items in the 2011 August Chicago Signature US Coin & Platinum Night Auction.
1890-CC Double Eagle, MS621890-CC $20 MS62 PCGS. CAC. Variety 1-A. The 1890-CC Liberty double eagle enjoyed a mintage of 91,209 pieces, a fairly generous total for a Carson City issue. The 1890-CC is not difficult to locate in circulated grades, where Doug Winter estimates a surviving population of 2,300-2,700 pieces, but the date is scarce in Mint State, and virtually unobtainable in grades above MS62.
Very Rare in Higher Grades
Very Rare in Higher Grades
The present coin is a well-struck MS62 specimen, with attractive orange-gold surfaces that show hints of lilac at the centers. Both sides exhibit rich, vibrant mint luster. A scattering of minor contact marks on both sides explains the grade. Visual appeal is quite strong. Population: 59 in 62, 5 finer (6/11).(Registry values: N4719) (NGC ID# 26BY, PCGS# 9014)
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Population: No data availableSeems like we could not load the Census Data for Marion Station, MD (What should have appeared here). Sometimes this happens when we can not properly match a city or hamlet with 2010 census data. Please go back and click on another area. The error has been logged and we will look into the issue.
Business Industries in Marion Station
Below is a list of the types of businesses in the City of Marion Station for which we have Yellow Pages business listings. If you do not see your industry within the list below, adding your business will automatically create it.
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Brief Information About Marion Station
The community of Marion is located in the county of Somerset. Businesses related to contracting in building, boat repairing, supplies of fruits and vegetables, general contracting, hair removal and replacement products, contribute to the local economy in a positive way.
Recent News from the Green Blog
Each year as a tradition to myself and this green movement website, I write on the events of Earth Day (April 22nd) this year is no exception. I will focus more on some new ideas and representations of our planet Earth. The symbols of Earth Day have been similar throughout the years, including an image or drawing of the Earth..


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If you have
post-traumatic stress disorder (PTSD), your body may
release too much adrenaline. Adrenaline is a hormone that can make you feel
stressed and have nightmares.
Prazosin blocks some of the effects
of adrenaline released in your body. This may help reduce the nightmares and
sleep problems you have with PTSD.
By keeping you from having nightmares,
prazosin may help you get better sleep. With better sleep, you can feel
healthier and more alert. This may help lower your stress and help you feel
more in control of your life.
Research shows that prazosin may
help reduce nightmares, one of the symptoms of PTSD.1
More research is needed to confirm its effectiveness for treating PTSD.
Side effects include:
See Drug Reference for a full list of side effects. (Drug
Reference is not available in all systems.)
Since prazosin is more commonly
used for
high blood pressure, your doctor may want to look into
its benefits for PTSD.
Prazosin may help reduce your nightmares,
but it is not a cure for PTSD. Nightmares and anxiety may come back if you stop
taking your medicine.
Prazosin lowers blood pressure
(hypotension), which can make you feel dizzy. This usually stops when your body
is used to prazosin. Be careful not to stand up too fast, especially if your
dose has just been changed.
Erection drugs like Viagra also can
lower your blood pressure. If you're taking erection drugs along with prazosin,
your blood pressure may drop very fast. Tell your doctor if you're taking drugs
for erection problems.
Prazosin can be taken safely with other
PTSD medicines, such as antidepressants, but not with trazodone. Taking
prazosin with trazodone can cause the rare side effect of priapism. This is an
erection that doesn't go away, which can cause serious health problems.
Complete the new medication information form (PDF)(What is a PDF document?) to help you understand this medication.
CitationsVan Liempt S, et al. (2006). Pharmacotherapeutic
treatment of nightmares and insomnia in posttraumatic stress disorder: An
overview of the literature. Annals of the New York Academy of Sciences, 1071: 502–507.
Last Revised:
January 13, 2011
Healthwise Staff
Medical Review:
Kathleen Romito, MD - Family Medicine & Jessica Hamblen, PhD - Post Traumatic Stress Disorder
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Date: 1907-01-05
Description: Jennie and Edgar Krueger standing with Clara and Emil Blatter next to a house.
Date: 2004
Description: The Schnitzlers posed with this fancy Meadowbrook Cart.
Date: date unknown
Description: View of the center village green featuring parked cars and a monument. A church steeple rises above trees.
Description: Group portrait of men posed standing, sitting and holding tools in a snow-covered logging camp in front of several teams of oxen and horses. One man holds...
Date: 1916 ca.
Description: Exterior view of University of Wisconsin-Madison College of Agriculture. On the left is a large chimney and the Hiram Smith Hall.
Date: 1970-04-25 ca.
Description: View from stage of unknown keyboardist performing on stage at the Sound Storm music festival. There is a cowbell on top of the electric piano, and a large...
Description: Donna, who moved here 9 years ago, shows off her horses, Red and Dasher.
Description: Man operating an experimental 8-16(?) tractor with six wheels over rough terrain.
Description: Three Ford V8 panel trucks and one automobile parked in front of Al Meinke Electric Refrigerator Service store, 1639 Monroe Sreet. On the left is Monroe Cl...
Date: 1865 ca.
Description: Three men standing at entrance of residence used as headquarters when S.G. Swain, (on left), was in charge of fortifications at Fort McPherson. All three m...
Description: A man, two women, and a young child sit or stand among a large number of logs.
Date: 1927
Description: Two-story cottage with a built-in garage. There is a young vine over the roofed entrance, and a bench and potted plant near the garage door.
Description: A view of the facade and side of the building, made mostly of brick.
Date: 1961 ca.
Description: Dale, Glenn, and Paul Oestreich posing next to the turret of memorial Sherman Tank. A red arrow is painted on the tank's turret. In the background are tree...
Date: 1920 ca.
Description: Woman holding flowers posing on the back of an Avery gasoline tractor.
Date: 1902-05-09
Description: Group portrait of strawberry pickers who work at the farm of Paul Goetsch. Paul stands behind the pickers with his son, Russel, sitting on his left should...
Description: Arched portico with columns at main entrance of Memorial Union on the University of Wisconsin-Madison campus.
Description: View across street towards group of men standing on the sidewalk in front of the Perfect Oil Corporation in front of a Mobiloil truck. They are the station...
Description: Children and adults watching the elephant at the Vilas Park Zoo (Henry Vilas Zoo). This photograph was made by Harold Home as illustration for "Wisconsin:...
Date: 1898
Description: Flags and posters are displayed over King Street for the fifty year celebration. One banner reads: "1848 Wisconsin 1898." Pedestrians are on the streets an...
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Hostelworld "meet the world" by Lucky Generals
Rating: 5.0
By Steve Irvine, Creative director, LFH, marketingmagazine.co.uk, Tuesday, 10 June 2008 12:00AM
The little green gherkin, first used in 1883 to promote Heinz pickle products, has been replaced by a vine tomato, which stems from the keystone graphic via the green line to create a fresher, more integrated feel. A 'grown not made' claim has also been introduced to highlight the product's natural, healthy credentials.
Strategically, you can understand Heinz's move. There has been a widespread shift toward more natural, 'foody' communication. Still, this revamp does feel a little predictable. In a move that doesn't feel at all consistent with the brand, it has borrowed category language, rather than creating something distinct. The loss of the gherkin, despite its perceived lack of relevance, also means the label loses some of its personality and quirk.
This feels like a reactive move from the market leader, and whether shoppers will notice the change is questionable. By avoiding changes to the product or bottle shape, the redesign is unlikely to have a negative impact, but I'm not sure if a few tweaks to the label really justify the size of the investment.
Design: Vibrandt.
This article was first published on marketingmagazine.co.uk
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If you see a comment you find offensive, you can flag it as inappropriate. In the top right-hand corner of an individual comment, you will see 'flag as inappropriate'. Clicking this prompts us to review the comment. For further information see our rules for commenting on articles.
Rating: 5.0
Agency: Grey London
Rating: 5.0


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Home > Academics > Colleges > Humanities and Social Sciences > English > News
Department of English
Todd Thompson of the Department of English recently presented "Cyborg Nation: Dismemberment as Mechanization in Popular Nineteenth-Century War Satires" at the 2009 Midwest Popular Culture Association and Midwest American Culture Association in Detroit.
Posted on 12/11/2009 2:24:40 AM
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Thru-Tubing Tools Specialist Odessa, TX Role Synopsis At Baker Hughes the purpose of this position is to, under minimal supervision, run multiple applications of medium to high risk in the Wellbore Intervention Product Group. Key Responsibilities/Accountabilities
Desired Skills:
Employment Type: PERMANENT Hours: FULLTIME
This position is no longer open for new applications. Either the position has expired or was removed because it was filled.
However, there are thousands of other great jobs to be found on Rigzone.


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A Walk In The Garden Of Earthly Delights
A Walk In The Garden Of Earthly Delights composed by William L. Cahn. For mallet quintet. Intermediate. Published by HoneyRock Publishing (HR.HRPE027).
Inspired by NEXUS' first concert tour of Japan. Scored for solo percussionist (xylophone/marimba, sleighbells, crotales, rattle, F# chime, 15-20 sys. bells) and four players on two marimbas, with optional piano accompaniment. [Recorded on The Solo Percussionist/The Music of William L. Cahn - CD 10339/NEXUS].


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30 year old woman | Oak Lawn, IL, USA | Seeking men 21-35 within 15 miles
Ready for a new beginning...
I find it hard to describe myself in words but I will do a short version. I am a single mother of a handsome little boy. Everyday is a new experience with him. My family means the world to me. They help me so much with raising my son. I am very down to earth. I love to laugh and always have a smile on my face. I do snort when you really get me laughing. I am really shy at first but I don't shut up later on. I am also very random at times. If you get to know me, you will understand. I get along with everyone and try to find the best in everyone. I will always help someone in need. I do get embarassed easily. I work as docket assistant at a Intellectual Property firm. I do like my job most days because I don't do the same thing every day. I do like my sports. I love going to Sox games in the summer. I love football season watching my Bears. I am a new fan to hockey. I am still trying to understand the rules but one day I will get it. I am a huge animal lover. I do have 2 large dogs and 1 cat. I am allergic to cats but will deal with that to be around them. As for what I am looking for....I want to find someone that is makes me laugh. Someone that likes staying at home watching a movie but also likes going out to the bar scene once in a while. If you care to know more then message me...
Camping , Dining out , Movies/Videos , Music and concerts , Nightclubs/Dancing , Shopping/Antiques , Travel/Sightseeing , Watching sports
Billiards / Pool, Bowling, Dancing, Swimming
I exercise 1-2 times per week.
I have Cats, Dogs
i have 2 dogs and 2 cats.
Some other viewpoint
My favorite place I went was Vegas. I plan on going back to there someday. I would just like to travel since my family never went on vacations.
Moraine Valley Community College, Palos Hills, IL
My favorite restaurant is Olive Garden. Pink is my favorite color. I enjoy staying in and watching tv or a movie. I love going to the Sox games and watching the Bears.
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Z{{Cta}} {{#if HasMoreInfo}} ?{{CtaSecondary}} {{/if}}
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|5'6" (167cms)
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|Body type:
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|Blue, Brown, Green, Hazel
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|$35,001 to $50,000
|$25,001 to $35,000, $35,001 to $50,000, $50,001 to $75,000, $75,001 to $100,000, $100,001 to $150,000, $150,001+
|Never Married
|Never Married
|Have kids:
|Yes, and they live at home (1)
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|Wants kids:
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|Some college
|High school, Some college, Associates degree
I have my certificate in Administrative Assistant.


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Wellness classes
Howard County General Hospital will sponsor the following wellness classes. The classes are held at the HCGH Wellness Center, 10710 Charter Drive, Suite 100, Columbia, unless otherwise listed. Online registration at hcgh.org is advised for all programs. Information: 410-740-7601.
•Prenatal classes for early pregnancy. Parents-to-be and those in the first trimesters are invited to attend this class from 7 p.m. to 9 p.m. Wednesday, March 19.
•Care by certified nurse midwives. Learn about midwifery care and routine gynecology as well as family centered care during pregnancy. Presented by Jackie Notes, CNM, and Kay Mitchell, CNM, from 7 p.m. to 8:30 p.m. Tuesday, March 18.
•Bariatric surgery. Learn about weight surgery from the Johns Hopkins Center for Bariatric Surgery from 5 p.m. to 6:30 p.m. Tuesday, March 18. Visit hopkinsbayview.org/bariatrics or call 410-550-0409.
•Living with diabetes. Learn from an endocrinologist, podiatrist, psychologist, diabetes nurse educator and dietitian, from 8:30 p.m. to 2:30 p.m. Friday, March 21, and Tuesday, March 25, in the Bolduc Family Outpatient Center at HCGH. A condensed version of this class will held from 6 p.m. to 9 .m. Wednesday, March 19, and Thursday, March 20. Information about both classes 443-718-3000.
•Healthy aging. Seniors learn about the challenges and management options to live a healthy life. Presented by Susan Gibbons, CRNP, Ph.D., and Joseph Gibbons, M.D., from 2 p.m. to 3 p.m. Friday, March 21, Elkridge Senior Center, 6540 Washington Blvd.
•Living well. Learn to manage your health, develop a diet and fitness plan, deal with pain and communicate with health professionals from 1 p.m. to 3:30 p.m. Friday, March 28. Cost is $28.
Blood donations
The Greater Chesapeake and Potomac Blood Services Region of the American Red Cross is requesting blood donations. Eligible donors can call 800-GIVE-LIFE to schedule an appointment. Platelet donors should call 800-272-2123.
Dance classes
Presented by Vantage House, a retirement community, classes are held from 3 p.m. to 4 p.m. Thursdays in the Vantage House auditorium, 5400 Vantage Point Road in Columbia. Dance has shown to improve balance, gait and mood in those with Parkinson's disease. Registration and information: Megan Wallnofer at 410-992-1691.
Spiritual reflections
The Retreat and Conference Center at Bon Secours offers spiritual enrichment programs at 1525 Marriottsville Road in Marriottsville. Information and registration: 410-442-1320.
The county Health Department's North Laurel Community Health Center, 9411 Whiskey Bottom Road, offers HIV/AIDS testing from 1 p.m. to 4 p.m. Mondays and Fridays, and from 10 a.m. to 3:30 p.m. by appointment. Call 410-313-0630. Also, the Columbia Health Center, 7180 Columbia Gateway, conducts HIV testing at 8 a.m. Mondays by appointment. Call 410-313-7500. Testing is free, anonymous and confidential.
VA outpatient clinic
The Department of Veterans Affairs operates a 13,300-square-foot facility to serve veterans in Anne Arundel and Howard counties. The clinic is at 2479 Fifth St., adjacent to the Kimbrough Ambulatory Care Center at Fort Meade. Services include outpatient medical care, preventive health and education services, medical screenings, TeleHealth services and referrals to specialized programs and inpatient services available throughout the VA Medical Health Care System. Information: 410-305-5300.
Look good, feel better
This free program teaches beauty techniques to women with cancer to help them combat appearance-related side effects of treatment. Participants receive cosmetics donated by major manufacturers as well as instruction and suggestions for wigs and head coverings. The class is taught by a licensed cosmetologist. Classes are held 3:30 p.m. the third Monday of the month at the Howard County General Hospital Wellness Center in the Medical Pavilion, 10710 Charter Drive in Columbia. Information and registration: 888-535-4555.