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Results 1 to 13 of 13
April 23rd, 2014 #1
How do you talk to people at conventions/workshops?
Hey guys, so like the title says.. I was just wondering.. like, how do you that? like for networking and stuff. Talking to pros at their tables or whatever. Im kinda shy when talking to strangers and stuff, like, nothing comes out lol. But there is some events coming up this year and I really want to do it, like just go and meet people and network. But what the hell do you even say?
I tried before in a smaller conventions with some fantasy artist .. and all I could come up with was "Hey man, thats pretty good stuff you got there" and their response would be like " Yea thanks man" and thats it.. haha it'd just die there and move on to the next table.. and repeat.
I guess i just want to hear peoples opinion on the matter and their experiences of what you guys say to people and the artist you admire when you meet them at these events.
Like im planning on going to the massive black workshop in december or whenever it happens this year and i don't wanna fuck it up. I want to make the most of it.
So.. thoughts?
Last edited by The Jeso; April 23rd, 2014 at 05:37 PM.-We are what we repeatedly do. Excellence then, is not an act, but a habit.
-Some are born great, some achieve greatness, and some have greatness thrust upon 'em.
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Hide this ad by registering as a memberApril 23rd, 2014 #2
Just be yourself, I have found that 99.5 % of pro artists are humble, awesome people.
Ask open ended questions, try thinking of them as friends you have yet to meet.
I went to a supanova here in Brisbane, and I am hooked, made a good friend there, and had some great long conversations with some amazing people, who also just happen to be amazing artists too.
We put these incredibly skilled people on a pedestal, (and I do too) but they are people just like us, and love a good chat, eat, and breathe just like us mere mortals .
I should have started going to such things years ago, all these like minded people that love art just like me, who actually treated me as an equal, it was a very valuable and uplifting experience.
Rock on you pro artists who have time for the little guy/girl, you know who you are
Last edited by illoostrader; April 23rd, 2014 at 04:16 AM. Reason: Forgot to subscribe
April 23rd, 2014 #3Jester
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April 23rd, 2014 #4
Simple but reasonable questions (as in no "how are you so awesome!?!") are pretty good ways to break the ice, I'd think (even if you'd know the answer). They usually open a way for you to talk a bit about yourself, which gets you off from the "another random face" level.
Stuff like, what type of ink/watercolour/paper/etc brands they use or maybe have tried, how can they draw X amount of time without getting sore shoulders, if they have anything similar to you (I once approached a comic artist I admired because I noticed we had very similar tattoos, which also gave me time to mention that I was an artist too and so on so when we meet in some other comic place he might remember who I was), or if you carry a small portfolio sketchbook, you could ask if they could critique it or if you could do a sketchswap (draw on each other's sketch books) etc etc....
Just do not self-deprecate, like "oh, I suck at this, you are so great" and so on. Being a sadsack is definitely not what you want to come through as on the first meet.
I guess this might be hard if you are one that lacks confidence or is shy, but try to approach the people as equivalent humans or as two people sharing the same interest, not as "I the noob, you the pro", even if you might so feel.
Last edited by TinyBird; April 23rd, 2014 at 06:07 AM."I eat comics and poop stylization"
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April 24th, 2014 #5
I always try and be polite but ask for what I want. Usually the direct approach works best. So go up to someone and talk to them when they don't look busy and just say hi I'm so and so and I want to be an artist and was wondering if you had some time to give me some advice. Or I'm and artist and I'm struggling with this and I like the way you handle it, any tips for me? things like that. One of the things you can do if you are shy is be aware of how you present yourself to people. People like to be around positive confident people.
This TED talk deals with body language
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April 26th, 2014 #6
There is some good advice going on here guys, thank you.
Yea i guess i could be just straight forward about it and just ask the questions n stuff.. but i just imagine like.. at some point they feel like people coming are just like drones just asking the same questions over and over and that's all they say and they just leave. I guess i don't wanna come up as just the same drone type of person, but more of like, i don't know, like, is not like I'm looking to go and become their best buddy, but at least having some back and forth conversation that goes deeper than "hey what brushes do you use?" So at least they remember me or whatever.
-We are what we repeatedly do. Excellence then, is not an act, but a habit.
-Some are born great, some achieve greatness, and some have greatness thrust upon 'em.
My SKETCHbook
April 26th, 2014 #7
April 26th, 2014 #8
It works both ways. Pro's like to be treated as individuals too, not just a guy that has answers because he's on the other side of a booth or table from you.
Before you go to a convention learn about the artist guests so that if you talk to them you know something about what they do or who they are. As opposed to, I don't know anything about you or your work will you look at my portfolio?
May 2nd, 2014 #9
I think what is always important to keep in mind is that these guys are probably exactly like you. Geeky people that one day had a dream of drawing robots and dragons for a living. You probably have tons and tons in common with them. They aren't trying to be impressed or sucked up to.
What I love to do at conventions is asking them about other random things. Like "Hey man, this piece is sweet. Makes me think about that one castle in Game of Thrones. You see that last episode? Jeez." Or anything like that, I promise you the minute you find common ground you are in for a really cool conversation.
May 3rd, 2014 #10
For me the problem is finding conventions in Toronto Canada. But it's good to hear that the 95 percent are humble people.
May 7th, 2014 #11
General question about conventions. If there's an opportunity to have work reviewed by an art director or other illustrator, do they not mind reviewing the work on a tablet or ipad?
May 18th, 2014 #12-We are what we repeatedly do. Excellence then, is not an act, but a habit.
-Some are born great, some achieve greatness, and some have greatness thrust upon 'em.
My SKETCHbook
May 18th, 2014 #13
But there are other events for networking actually, things like meet-ups or parties that some companies put together.
For example the Toronto Animation Festival is starting soon, http://taafi.com/
and there is CASO, which is also for artists, http://www.casont.ca/
Maybe some of them will interest you


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Looks like the rumour mills have been in overdrive over the last few days. The most amusing that I have read is "Microsoft cuts Ribbon in Office 2007" which is incorrect for 2 reasons. First, the ribbon has NOT been cut from the UI and second it's the 2007 Microsoft Office system and not Office 2007 (a minor correction but lets try to be correct here).
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FISHER, M; (2010) Court of Appeal confirms dictionary approach to claim construction. Journal of Intellectual Property Law and Practice , 5 (10) 677 - 678.
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Articles tagged black america
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While Disintegration contains its share of frank, bracing, straight talk that dispels long-held notions about black Americans, one of Eugene Robinson's underlying assumptions — that America persists in seeing black people as an experiential monolith — is not the defining absolute it used to be.READ more
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Originally Posted by Herkey#1 Kr! Who the fuck gave you the authority to change what I wrote. You think that just because someone made you a moderator you can go around changing posts? I don't want your dumb ass stamp on any of my posts! I'm sure that when whoever gave you the ability to do this they said that you should go around changing what people wrote. Man your a narcassistic jackass! Get over yourself and stop changing my posts. No problem Mr Snap, sorry about that, really. Won't ever happen again. I could use a few more IM-sults though....sorta lackin in that department.
Originally Posted by kr1963 No problem Mr Snap, sorry about that, really. Won't ever happen again. I could use a few more IM-sults though....sorta lackin in that department. Just tellin you to your face what everyone else says behind your back. I've learned to ignore your dumb tables and stats and pretty much anything else you post about and I try to steer clear of you, but I'm definately going to call you out if you start editing my posts for no reason. You're not my personal editor, nor are you anyone elses. It's clear that you overstepped your bounds and you didnt even think twice about doing it because you did it to three different people. Youre the only person on this board who wouldve even thought it was remotely okay to edit another persons post without there being any innapropriate verbage in it. Get over yourself Kurt.
Ok, I'm closing this thread. If you guys want to continue this. Do it privately.


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Components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or high temperature polymer onto the surface of the component. The plasma sprayed components of the present invention can be used for plasma reactor components having surfaces exposed to the plasma during processing. Suitable components include chamber walls, chamber liners, baffle rings, gas distribution plates, plasma confinement rings, and liner supports. By improving polymer adhesion, the plasma sprayed component surfaces can reduce the levels of particle contamination in the process chamber thereby improving yields and reducing down-time required for cleaning and/or replacing chamber components.
1. A method of making a plasma reactor component having one or more surfaces which are exposed to plasma during use, the method comprising plasma spraying a coating material onto a plasma exposed surface of the component to form a coating having surface roughness characteristics that promote the adhesion of polymer deposits.
2. The method of
roughening the plasma exposed surface of the component; and
cleaning the roughened surface prior to plasma spraying the coating material.
3. The method of
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26. A plasma reactor comprising at least one component according to
27. A method of processing a substrate in the plasma reactor of
28. The method of
positioning the substrate on a substrate support in the reactor;
introducing a process gas into the reactor;
applying RF energy to the process gas to generate a plasma adjacent an exposed surface of the substrate; and
etching the exposed substrate surface with a plasma.
29. The method of
30. The method of
31. The method of
[0001] 1. Field of the Invention
[0002] The present invention relates generally to the fabrication of semiconductor wafers, and, more particularly, to plasma etching chambers having components that reduce particle contamination during processing.
[0003] 2. Description of the Related Art
[0004] In the field of semiconductor processing, vacuum processing chambers are generally used for etching and chemical vapor depositing (CVD) of materials on substrates by supplying an etching or deposition gas to the vacuum chamber and application of an RF field to the gas to energize the gas into a plasma state. Examples of parallel plate, transformer coupled plasma (TCP™) which is also called inductively coupled plasma (ICP), and electron-cyclotron resonance (ECR) reactors and components thereof are disclosed in commonly owned U.S. Pat. Nos. 4,340,462; 4,948,458; 5,200,232 and 5,820,723.
[0005] In semiconductor integrated circuit fabrication, devices such as component transistors may be formed on a semiconductor wafer or substrate, which is typically made of silicon. Metallic interconnect lines, which are typically etched from a metallization layer disposed above the wafer, may then be employed to couple the devices together to form the desired circuit. The metallization layers typically comprise copper, aluminum or one of the known aluminum alloys such as Al—Cu, Al—Si or Al—Cu—Si. An anti-reflective coating (ARC) layer and an overlying photoresist (PR) layer, may be formed on top of the metallization layer. The ARC layer typically comprises a titanium containing layer such as TiN or TiW. To form the aforementioned metallic interconnect lines, a portion of the layers of the layer stack, including the metallization layer, can be etched using a suitable photoresist technique. The areas of the metallization layer that are unprotected by the mask may then be etched away using an appropriate etching source gas, leaving behind metallization interconnect lines or features.
[0006] To achieve greater circuit density, modern integrated circuits are scaled with increasingly narrower design rules. As a result, the feature sizes, i.e., the width of the interconnect lines or the spacings (e.g., trenches) between adjacent interconnect lines, have steadily decreased. To form the narrow conductor lines of modern integrated circuits, highly anisotropic etching is desired. Etch anisotropy refers to the rate of vertical etching compared to the rate of lateral etching. In order to form high aspect ratio features with vertical sidewalls, the rate of vertical etching must be significantly greater than the rate of lateral etching. In plasma etching, vertical profiles are often achieved using sidewall passivation techniques. Such techniques typically involve introducing a polymer forming species (usually fluorocarbons such as CF4, CHF3, C4F8) into the reaction chamber during etching. The polymer which forms during etching is preferentially deposited on the sidewalls of the etched features thereby reducing lateral etching of the substrate and increasing etch anisotropy. During the etching process, however, polymer deposits can also form on the interior surfaces of various components of the etch chamber which are exposed to the plasma. Over time, these polymer deposits can flake or peel off thus becoming a source of particle contamination in the plasma reactor.
[0007] The polymer deposits formed inside the plasma reactor typically comprise chain molecules of carbon compounds. When the polymer contacts and adheres to the substrate being processed, it can contaminate that portion of the substrate and reduces the die yield therefrom. Polymer deposits can accumulate on all chamber surfaces, particularly on the surfaces of the chamber housing adjacent the process gas inlet tubes, as well as the underside of the chamber cover or gas distribution plate opposite the substrate surface. The polymer deposited on the interior surfaces of the chamber can migrate onto the substrate to create a substrate defect. Polymer particulate contamination is exacerbated by the thermal cycling of the reactor components during repeated plasma processing cycles. The repeated heating and cooling of the plasma exposed surfaces of reactor components can cause the adhered polymer deposits to exfoliate or flake off due to CTE differentials between the polymer deposits and the reactor surfaces. The polymer deposits can also become dislodged by bombardment with reactant species in the plasma.
[0008] As integrated circuit devices continue to shrink in both their physical size and their operating voltages, their associated manufacturing yields become more susceptible to particle contamination. Consequently, fabricating integrated circuit devices having smaller physical sizes requires that the level of particulate contamination be less than previously considered to be acceptable. Various methods have been employed to reduce particle contamination in plasma reactors. See, for example, U.S. Pat. Nos. 5,366,585; 5,391,275; 5,401,319; 5,474,649; 5,851,343; 5,916,454; 5,993,594; 6,120,640; and 6,155,203.
[0009] In order to reduce particle contamination, plasma reactors can be periodically cleaned to remove the polymer deposits. Plasma cleaning processes are disclosed in U.S. Pat. Nos. 5,486,235; 5,676,759; and 5,685,916. Additionally, the plasma reactor parts are typically replaced periodically with new reactor parts.
[0010] It would be desirable to provide plasma reactor components that reduce the levels of particle contamination inside the reactor chamber. The use of such parts would help to improve the yield and/or increase the period of time between cleaning or replacement of plasma reactor components.
[0011] The present inventors have discovered that particle contamination in plasma reactors can be reduced by plasma spraying a coating material such as a ceramic or high temperature polymer onto plasma exposed surfaces of the reactor. The plasma sprayed material forms a coating having desired surface roughness characteristics to promote adhesion of polymer deposits. The improved adhesion of the polymer deposits on chamber surfaces can reduce the tendency of the deposits to flake or peel off of the chamber surfaces thereby reducing the level of particulate contamination in the reactor. By improving the adhesion of polymer deposits on plasma reactor components, reactor components may need to be cleaned or replaced less frequently thereby reducing the cost of operating the plasma reactor.
[0012] According to one embodiment of the present invention, a method of making a plasma reactor component is provided. The reactor component has one or more surfaces which are exposed to plasma during use. The method includes plasma spraying a coating material onto a plasma exposed surface of the component to form a coating having surface roughness characteristics that promote the adhesion of polymer deposits.
[0013] According to another embodiment of the present invention, a component of a plasma reactor having one or more surfaces exposed to the plasma during processing is provided. The component includes a plasma sprayed coating on a plasma exposed surface thereof. The coating has surface roughness characteristics that promote the adhesion of polymer deposits.
[0014] According to another embodiment of the present invention, a plasma reactor including one or more components as set forth above and a method of processing a substrate therein are also provided. The method includes contacting an exposed surface of the substrate with a plasma.
[0015] The invention will be described in greater detail with reference to accompanying drawings in which like elements bear like reference numerals, and wherein:
[0016]FIG. 1 illustrates a conventional plasma spray process;
[0017]FIG. 2 shows a metal etch chamber incorporating plasma sprayed reactor components according to the present invention;
[0018]FIG. 3 shows a high density oxide etch chamber incorporating plasma sprayed reactor components according to the present invention; and
[0019]FIG. 4 is a top view of a gas distribution plate for the etch chamber of FIG. 3 according to one embodiment of the present invention.
[0020] The invention provides improvements in reducing particle contamination of substrates such as semiconductor (e.g., silicon, gallium arsenide, etc.) wafers, flat panel display substrates, and the like. In particular, the present invention provides components for use in plasma processing chambers having plasma exposed surfaces with surface roughness characteristics that promote polymer adhesion. The roughened surfaces are formed by plasma spraying a coating material such as a ceramic or polymeric material onto the surface. The plasma sprayed components of the present invention can be used for any plasma reactor component that is exposed to plasma during processing. Suitable components include, for example, chamber liners, baffle rings, gas distribution plates, focus rings, plasma confinement rings, pedestals, and liner supports.
[0021] The reactor components of the present invention can be made from metallic materials or ceramic materials. Suitable metallic materials include aluminum. The aluminum surfaces to be plasma spray coated can be bare (except for a native oxide layer) or anodized. Alternatively, the reactor components can be made from ceramic materials such as alumina, silica, quartz, titania, zirconia, yttria, titanium carbide, zirconium carbide, silicon carbide, boron carbide, aluminum nitride, titanium nitride, silicon nitride, and/or boron nitride. The ceramic components can be made by any conventional ceramic manufacturing technique such as hot pressing and sintering ceramic powders into bulk parts.
[0022] In the present invention, any or all of the surfaces of the reactor components which are exposed to the plasma during processing can be coated with a plasma sprayed material such as a ceramic or high temperature polymer. The plasma sprayed coating according to the present invention provides interior surfaces of the reactor with surface roughness characteristics that promote the adhesion of polymer deposits formed in the plasma chamber during etching. In the present invention, the inventive coatings preferably have surface roughness values (Ra) suitable for achieving improved adhesion of polymer byproducts produced during processing of substrates in the plasma reactor. For example, the arithmetic mean surface roughness (Ra) of the plasma sprayed surfaces according to the present invention can range from 150 to 190 micro-inches. Surface roughness values in this range promote the adhesion of polymer deposited on interior surfaces of the reaction chamber during a plasma etch process such as a metal etch.
[0023] The plasma spraying process typically involves spraying a molten or heat softened material onto a surface. FIG. 1 illustrates a typical plasma spraying process. The coating material, usually in the form of a powder 112, is injected into a high temperature plasma flame 114 where it is rapidly heated and accelerated to a high velocity. The hot material impacts on the substrate surface 116 and rapidly cools to form a coating 118.
[0024] The plasma spray gun 120 typically comprises an anode 122 (usually made of copper) and a cathode 124 (usually made of tungsten), both of which can be water cooled. Plasma gas 126 (e.g., argon, nitrogen, hydrogen, helium, etc.) flows around the cathode in the direction generally indicated by arrow 128 and through the anode 122 which is shaped as a constricting nozzle. The plasma is initiated by a high voltage discharge which causes localized ionization and a conductive path for a DC arc to form between the cathode 124 and the anode 122. Resistance heating from the arc causes the gas to reach extreme temperatures, dissociate and ionize to form a plasma. The plasma exits the anode 122 as a free or neutral plasma flame (plasma which does not carry electric current). When the plasma is stabilized and ready for spraying, the electric arc extends down the nozzle. Powder 112 is fed into the plasma flame usually via an external powder port 132 mounted near the anode nozzle exit 134. The powder 112 is rapidly heated and accelerated such that the powder particles 112 in a molten or heat-softened state are caused to impact on substrate 116.
[0025] Various bonding mechanisms may be present at the coating/substrate interface and between the particles making up the plasma sprayed coating. Generally, both mechanical interlocking and diffusion bonding occur. Bonding mechanisms that may be present include: mechanical keying or interlocking; diffusion bonding; and other adhesive, chemical and physical bonding mechanisms (e.g., Van der Waals forces). Factors effecting bonding and subsequent build up of plasma sprayed coatings include: the cleanliness of the substrate surface; the surface area available for bonding; the surface topography or surface profile; the temperature (thermal energy) of the particles and substrate; the time (e.g., reaction rates and cooling rates etc.); the velocity (kinetic energy) of the powder particles; the physical and chemical properties of the substrate and the powder particles; and any physical and chemical reactions that may occur during the process.
[0026] In the present invention, surface preparation techniques such as cleaning and grit or bead blasting can be used to provide a more chemically and physically active component surface for bonding of the plasma sprayed coating. By grit or bead blasting, the surface area available for bonding can be increased which can result in increased coating bond strength. For alumina chamber components, the surfaces to be coated are preferably grit blasted with a contaminant free aluminum oxide media. The roughened surface can then be cleaned to remove loose particles by any suitable technique such as blasting the surface with air or CO2 and/or washing the surface with an acid solution. The roughened surface profile of the substrate resulting from this treatment can help promote mechanical keying or interlocking of the coating with the substrate.
[0027] Once the plasma sprayed coating has been applied, the exposed surface of the coating can be cleaned using any suitable technique. Suitable cleaning techniques include blasting the surface with air or CO2 and/or ultra-sonic cleaning. These cleaning steps can be repeated to achieve the desired level of surface cleanliness or conditioning of the component surface prior to using the component during plasma processing of substrates.
[0028] Plasma spraying has the advantage that it can spray very high melting point materials such as refractory metals and ceramics. Plasma sprayed coatings of ceramics, for example, have been employed as protective coatings for various plasma reactor components. See, for example, U.S. Pat. Nos. 5,560,780; 5,879,523; 5,993,594; and 6,120,640. Additionally, plasma spraying processes have also been developed for high melting point thermoplastic and thermosetting polymers such as polyimides.
[0029] In the present invention, the plasma sprayed coating can be any material that is resistant to erosion by the plasma. For example, any of the ceramic materials suitable for use as reactor components may also be used as coatings as long as these materials can be plasma sprayed. When the coating is a ceramic material, the coating is preferably the same material as the underlying component. By using the same material for the component and the coating, differences in the coefficients of thermal expansion (CTE) between the coating and component can be minimized or eliminated. These differences in CTE values can result in exfoliation of the coating material during thermal cycling of the reactor components during use. When the coating is alumina, the coating is preferably applied to the component at a thickness in the range of 2 to 5 mils (0.002 to 0.005 inches).
[0030] The coating may also be a polymeric material. When the coating is a polymer, the polymer should be capable of being plasma sprayed to form a tightly adherent coating on the component. A preferred high temperature polymer is a polyimide such as VESPEL�, which is a registered trademark of DuPont. Polyimide coatings are preferably applied to the component at a thickness of 10 to 30 mils (0.010 to 0.030 inches).
[0031] In plasma etching of substrates, features are etched into layers of various materials on substrates such as silicon wafers. Materials that are typically etched include metals and dielectric materials such as oxides (e.g., SiO2). In such etching processes, a gas distribution plate can be used to control the spatial distribution of gas flow in the volume of the reactor above the plane of the substrate. Polymer build-up can be particularly problematic in plasma reactors wherein an antenna coupled to a radiofrequency (RF) source energizes gas into a plasma state within a process chamber. Plasma reactor of this type are disclosed in U.S. Pat. Nos. 4,948,458; 5,198,718; 5,241,245; 5,304,279; 5,401,350; 5,531,834; 5,464,476; 5,525,159; 5,529,657; and 5,580,385. In such systems, the antenna is separated from the interior of the process chamber by a dielectric member such as a dielectric window, gas distribution plate, encapsulating layer of epoxy, or the like, and the RF energy is supplied into the chamber through the dielectric member. Such processing systems can be used for a variety of semiconductor processing applications such as etching, deposition, resist stripping, etc.
[0032] During an oxide or metal etch of a semiconductor wafer in a plasma reactor of the aforementioned type, polymer deposits can build up on internal surfaces of the reactor including the exposed surface of the dielectric member or gas distribution plate facing the wafer. As the polymer build-up deepens, the polymer tends to flake or peel off of the dielectric member. When the dielectric member is located directly above the substrate and chuck, polymer particles can fall directly onto the substrate or the chuck below. These polymer particles can introduce defects into the substrate thus decreasing yields. Alternatively, the particles can migrate to the chuck surface causing chucking problems.
[0033] Typically, the etch process is stopped periodically and the interior chamber surfaces cleaned (e.g., using a dry etch treatment) to reduce the levels of particle contamination. Improper or incomplete cleaning, however, can actually increase the particle contaminant levels in the chamber. Further, the delay due to the "down-time" required for cleaning also represents a substantial loss in production yield. Therefore, control of the deposition of polymer on the interior surfaces of the etch chamber is desirable for achieving a high yield and maintaining through-put of the substrates in the plasma reactor.
[0034] An exemplary metal etch reactor of the aforementioned type is a transformer coupled plasma reactor known as the TCP™ 9600 plasma reactor, which is available from LAM Research Corporation of Fremont, Calif. FIG. 2 illustrates a simplified schematic of the TCP™ 9600 plasma reactor. In FIG. 2, a reactor 150 including a plasma processing chamber 152 is shown. Above chamber 152, there is disposed an antenna 156 to generate plasma, which is implemented by a planar coil in the example of FIG. 2. The RF coil 156 is typically energized by an RF generator 158 via a matching network (not shown). Within chamber 152, there is provided a showerhead 154, which preferably includes a plurality of holes for releasing gaseous source materials, e.g., the etchant source gases, into the RF-induced plasma region between the showerhead and wafer 170.
[0035] The gaseous source materials may also be released from ports built into the walls of chamber 152. Etchant source chemicals include, for example, halogens such as Cl2 and BCl3 when etching through aluminum or one of its alloys. Other etchant chemicals (e.g., CH4, HBr, HCl, CHCl3) as well as polymer forming species such as hydrocarbons, fluorocarbons, and hydro-fluorocarbons for side-wall passivation may also be used. These gases may be employed along with optional inert and/or nonreactive gases.
[0036] In use, a wafer 170 is introduced into chamber 152 defined by chamber walls 172 and disposed on a substrate support 162, which acts as a lower or second electrode. The wafer is preferably biased by a radio frequency generator 164 (also typically via a matching network). The wafer can comprise a plurality of integrated circuits (ICs) fabricated thereon. The ICs, for example, can include logic devices such as PLAs, FPGAs and ASICs or memory devices such as random access memories (RAMs), dynamic RAMs (DRAMs), synchronous DRAMs (SDRAMs), or read only memories (ROMs). When the RF power is applied, reactive species (formed from the etchant source gas) etch exposed surfaces of the wafer 170. The by-products, which may be volatile, are then exhausted through an exit port 166. After processing is complete, the wafer can be diced to separate the ICs into individual chips.
[0037] In the present invention, plasma exposed surfaces of a plasma confinement ring (not shown), chamber wall 172, a chamber liner (not shown) and/or showerhead 154 can be provided with a plasma sprayed coating 160 with surface roughness characteristics that promote polymer adhesion. In addition, plasma exposed surfaces of the substrate support 168 can also be provided with a plasma sprayed coating (not shown) according to the present invention. In this manner, substantially all surfaces that confine the high density plasma will have surface roughness characteristics that promote polymer adhesion. In this manner, particulate contamination inside the reactor can be substantially reduced.
[0038] The reactor components of the present invention can also be used in a high-density oxide etch process. An exemplary oxide etch reactor is the TCP 9100™ plasma etch reactor available from LAM Research Corporation of Fremont, Calif. In the TCP 9100™ reactor, the gas distribution plate is a circular plate situated directly below the TCP™ window which is also the vacuum sealing surface at the top of the reactor in a plane above and parallel to a semiconductor wafer. The gas distribution ring feeds gas from a source into the volume defined by the gas distribution plate. The gas distribution plate contains an array of holes of a specified diameter which extend through the plate. The spatial distribution of the holes through the gas distribution plate can be varied to optimize etch uniformity of the layers to be etched, e.g., a photoresist layer, a silicon dioxide layer and an underlayer material on the wafer. The cross-sectional shape of the gas distribution plate can be varied to manipulate the distribution of RF power into the plasma in the reactor. The gas distribution plate material is made from a dielectric material to enable coupling of this RF power through the gas distribution plate into the reactor. Further, it is desirable for the material of the gas distribution plate to be highly resistant to chemical sputter-etching in environments such as oxygen or a hydro-fluorocarbon gas plasma in order to avoid breakdown and the resultant particle generation associated therewith.
[0039] A vacuum processing chamber for oxide etching according to one embodiment of the present invention is illustrated in FIG. 3. The vacuum processing chamber 10 includes a substrate holder 12 in the form of a bottom electrode providing an electrostatic clamping force to a substrate 13 as well as an RF bias to a substrate supported thereon and a focus ring 14 for confining plasma in an area above the substrate. The substrate may be back-cooled with a heat transfer gas such as helium. A source of energy for maintaining a high density (e.g. 1011-1012 ions/cm3) plasma in the chamber such as an antenna 18 in the form of a flat spiral coil powered by a suitable RF source and suitable RF impedance matching circuitry inductively couples RF energy into the chamber 10 so as to provide a high density plasma. The chamber includes suitable vacuum pumping apparatus for maintaining the interior of the chamber at a desired pressure (e.g. below 50 mTorr, typically 1-20 mTorr). A substantially planar dielectric window 20 of uniform thickness is provided between the antenna 18 and the interior of the processing chamber 10 and forms the vacuum wall at the top of the processing chamber 10. A gas distribution plate, commonly called a showerhead 22, is provided beneath the window 20 and includes a plurality of openings such as circular holes (not shown) for delivering process gas supplied by the gas supply 23 to the processing chamber 10. A conical liner 30 extends from the gas distribution plate and surrounds the substrate holder 12. The antenna 18 can be provided with a channel 24 through which a temperature control fluid is passed via inlet and outlet conduits 25, 26. However, the antenna 18 and/or window 20 could be cooled by other techniques such as by blowing air over the antenna and window, passing a cooling medium through or in heat transfer contact with the window and/or gas distribution plate, etc.
[0040] In operation, a wafer is positioned on the substrate holder 12 and is typically held in place by an electrostatic clamp, a mechanical clamp, or other clamping mechanism. Process gas is then supplied to the vacuum processing chamber 10 by passing the process gas through a gap between the window 20 and the gas distribution plate 22. Suitable gas distribution plate arrangements (i.e., showerhead) arrangements are disclosed in commonly owned U.S. Pat. Nos. 5,824,605; 5,863,376; and 6,048,798.
[0041] The gas distribution plate can have various designs one example of which is shown in FIG. 4. The gas distribution plate 40 shown in FIG. 4 includes eighty-nine holes 41 and four embossments 42 near the center thereof for providing a passage for supply of process gas between the gas distribution plate and the dielectric window.
[0042] As shown in FIG. 3, the plasma exposed surfaces of the gas distribution plate 22, chamber liner 30, and/or focus ring 14 are provided with plasma sprayed coatings 32 of ceramic or polymeric materials having surface roughness characteristics that promote polymer adhesion. In this manner, particulate contamination inside the reactor can be substantially reduced.
[0043] After time in use, the interior surfaces of the reactor components according to the present invention can become coated with polymer deposits. According to another embodiment of the present invention, the component can be removed from the reactor so that the existing plasma sprayed coating and any accumulated deposits can be physically removed from the component and a new plasma sprayed coating applied. The old coating can be removed using mechanical means such as grinding or grit blasting. In this manner, the reactor components can be reused.
[0044] A tape test was performed to determine the adhesion properties of the plasma sprayed coatings of the present invention. An alumina gas distribution plate with a plasma sprayed coating of alumina according to the present invention was installed and used in a TCP 9600™ metal etch reactor. A standard hot-pressed and sintered alumina gas distribution plate (without the plasma sprayed coating) was used in the same type of reactor under similar conditions. Substantial polymer deposits formed on the plasma exposed surfaces of both gas distribution plates. In the tape test, a piece of tape was adhered to the surface of each gas distribution plate and peeled off. No polymer was visible on the piece of tape removed from the plasma sprayed GDP. A visual inspection of the tape removed from the standard (non-plasma sprayed) GDP, however, revealed substantial polymer deposits thereon.
[0045] The foregoing has described the principles, preferred embodiments and modes of operation of the present invention. However, the invention should not be construed as being limited to the particular embodiments discussed. Thus, the above-described embodiments should be regarded as illustrative rather than restrictive, and it should be appreciated that variations may be made in those embodiments by workers skilled in the art without departing from the scope of the present invention as defined by the following claims.
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Huawei's new top model not only performs well but also looks very nice and minimalistic. The rigid metal unibody is only 6.4 mm thick, catches the eye with a state-of-the-art design and also feels like a real premium product.
Rock Werchter 2015 is behind us. It was a memorable edition with many strong performances, and for every musical taste.
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Motionhouse Coming to Bass Concert Hall, 4/11
One of the UK's foremost dance theater companies, Motionhouse creates startling and passionate dance theater, fusing images, action, and dynamism to surprise, challenge, and delight. Seven dancers perform on an infinity stage where movement and film integrate in a completely new and breathtaking way.
Motionhouse brings their stunning water-inspired piece Scattered to the Bass Concert Hall stage. The evening-long production combines Motionhouse's trademark highly physical dance theatre and mesmerizing aerial imagery in a unique interaction between film and live performance. Performed on a huge curved floor, which disappears skywards, Scattered uses projection technology, daring dancing, plus aerial harnesses and bungees to create an extraordinary world in which the dancers move seamlessly in, on, and through the image.
For more information on this performance, please visit: http://texasperformingarts.org/season/motionhouse-scattered-austin.
Friday, April 11, 2014, 8:00 pm -Texas Performing Arts at The University of Texas at Austin presents Motionhouse at Bass Concert Hall (2350 East Campus Dr.) A map of the campus: texasperformingarts.org/visit/maps_directions. Tickets ($28 - $38 / Limited $10 student tickets / discounted tickets available for UT faculty & staff, seniors and Military) are on sale now at authorized ticket outlets, which include the Bass Concert Hall Ticket Office and all Texas Box Office outlets, online at TexasPerformingArts.org, or by calling (512) 477-6060 or (800) 982-BEVO.
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Annell Hounshell
Clerk of the Apache County Superior Court
The Court Calendar is no longer provided online by the Clerk of the Court in this location. It may be provided online by Superior Court at some future date. If the calendar becomes available online again, we will add a link to it from this location.
To verify hearing dates and for more complete case information, please have your case number and call 928-337-7550 (8 am to 5 pm, Monday - Friday).


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Respond to Review of Bamboo Garden Vegetarian Cuisine
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Ateneo University Press, Jan 1, 2006 - Fiction - 159 pages
Dean Alfar's first novel is about the sorcery wrought by love, lust, and literature, by friendship, family, and the Filipino nation. Salamanca streaks across decades and spaces, tracking the stormy relationship between polymorphous-perverse Gaudencio Rivera, whose passions ignite prodigious feats of writing and wandering, and Palawena beauty Jacinta Cordova, whose perfection transmutes walls into glass and adoration into art. Tracing the arc of an imperfect marriage sundered by acts of nature (not least human) and sutured by acts of will (not least nonhuman), and vividly peopled by a multigenerational and multinational cast of kith and kin, this work of imagination takes the reader on a magical excursion into Philippine life and history while setting new standards for the Filipino novel along the way.
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Review: SalamancaUser Review - Meesh Salazar - Goodreads
"After everything, you must know that I love you." This ending. I'm so huhu Read full review
Review: SalamancaUser Review - Alena - Goodreads
Our professor required us to read this book back when I was in college and this could totally be a really weird book for some, but it really is sort of good. I could really refer to it as a "high magical fiction" because Dean Francis Alfar has this very, very wide imagination. Read full review
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Abalos's Apolinaria arms aunt Bau Long Huynh beauty began body Carlito Carlos Abalos Cesar Abalos Cesar replied child coconut copra Dencio dreams Emmanuel Crisanto eyes face father Filipino Filomena Abalos finally Gaudencio and Jacinta Gaudencio asked Gaudencio replied Gaudencio Rivera Gaudencio told Gilberta glass house hand head heart Helen Brown Herminia Cruz Honoel Hukbalahap husband Intang Irene Isabel Iscariot Jacinta Cordova Jacinta replied Jacinta told jackfruit Kindly give kiss later laughed legs lips lost Lucio Manila Manilaville Maria Elena Francisco memory mother never night old woman Pacifica Palawan Philippines Puerto Princesa rain realized Ricardo San Miguel Beer Shiro shouted smile South China Sea stood stop storm story tears tell thought tion told Jacinta took town of Tagbaoran trembling ukiyo-e voice waited walked walls Washington Yu watched wife wind words writing


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Cognizant to Present at Morgan Stanley Investor Conference PR Newswire TEANECK, N.J., Feb. 26, 2014 TEANECK, N.J., Feb. 26, 2014 /PRNewswire/ --Cognizant (NASDAQ: CTSH), a leading provider of information technology, consulting, and business process outsourcing services, today announced that Karen McLoughlin, Chief Financial Officer, will present at the following investor conference: 2014 Morgan Stanley Technology, Media and Telecom Conference oDate: Wednesday, March 5, 2014 oTime: 1:15 PM ET Live audio webcast of this presentation will be available at Cognizant's website: http://investors.cognizant.com A replay of the webcast will remain available on the company's website for 60 days. About Cognizant Cognizant (NASDAQ: CTSH) is a leading provider of information technology, consulting, and business process outsourcing services, dedicated to helping the world's leading companies build stronger businesses. Headquartered in Teaneck, New Jersey (U.S.), Cognizant combines a passion for client satisfaction, technology innovation, deep industry and business process expertise, and a global, collaborative workforce that embodies the future of work. With over 50 delivery centers worldwide and approximately 171,400 employees as of December 31, 2013, Cognizant is a member of the NASDAQ-100, the S&P 500, the Forbes Global 2000, and the Fortune 500 and is ranked among the top performing and fastest growing companies in the world. Visit us online at www.cognizant.com or follow us on Twitter: Cognizant. SOURCE Cognizant Website: http://www.cognizant.com Contact: David Nelson, VP, Investor Relations & Treasurer, (201) 498-8840, email@example.com
Cognizant to Present at Morgan Stanley Investor Conference
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CCCU Announces Relocation of Australia Studies Centre
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Explore the world outside your college classroom! Live an adventure in new community! Learn to relate your faith with your passions! BestSemester proudly offers twelve off-campus and study abroad programs around the world through the Council for Christian Colleges & Universities (CCCU). Find out more.
Amidst all of the exciting opportunities your son or daughter will have while studying off-campus, we recognize that you may have questions or concerns that arise. We hope to answer your questions and tell you more!
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Digital distrust: Uzbek cynicism and solidarity in the Internet Age
Article first published online: 5 JUL 2011
DOI: 10.1111/j.1548-1425.2011.01323.x
© 2011 by the American Anthropological Association
American Ethnologist
Volume 38, Issue 3, pages 559–575, August 2011
Additional Information
How to Cite
KENDZIOR, S. (2011), Digital distrust: Uzbek cynicism and solidarity in the Internet Age. American Ethnologist, 38: 559–575. doi: 10.1111/j.1548-1425.2011.01323.x
Publication History
- Issue published online: 5 JUL 2011
- Article first published online: 5 JUL 2011
- accepted January 25, 2011 , final version submitted January 18, 2011
- Abstract
- Article
- References
- Cited By
- [Uzbekistan;
- Internet;
- diaspora;
- media;
- dissent;
- contentious politics]
In this article, I examine how Uzbek exiles have used the Internet to attempt to forge solidarity in a political culture of cynicism and distrust. Tracing the development of internal divisiveness in the Uzbek political opposition, I show how cynicism has been reconstituted as an essential part of Uzbek political integrity, and then I examine how some dissidents have attempted to counteract this cynical political culture through the online promotion of a new political repertoire. I argue that the Internet changes patterns of political dissent by allowing greater interaction between geographically dispersed, like-minded parties but also allows the doubts and antagonisms that existed within those parties to be more easily perceived and, in some cases, exacerbated.


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From Zimbra :: Wiki
|- This is archive documentation, which means it is not supported or valid for recent versions of Zimbra Collaboration.
|- This article is a Work in Progress, and may be unfinished or missing sections.
|- This article is NOT official Zimbra documentation. It is a user contribution and may include unsupported customizations, references, suggestions, or information.
GAL (Server) Topics
Actual GAL (Server) Topics Notes Homepage
Please see Ajcody-Notes-ServerGAL
GAL Behavior Bugs/RFE's
GAL And Alises
Please see the following:
- "hide aliases in GAL on a per-alias basis"
- Some background bugs/rfe's on gal - alias issues:
- "hide account alias in gal search for ZWC"
- "All aliases appear when doing GAL auto-complete when composing new message"
Canonical Addresses - Beyond GAL Issues Really
Please see the following:
- "deprecate canonical address"
- "Please add subaddressing support to email addresses"
External GAL Source
Please see:
Setting/Checking GAL Varaibles
CLI To Sync Gal On Server
Truthfully, I'm not sure of the reasoning behind the command but this might be useful in trouble shooting connector issues with GAL sync issues.
zmprov syg DOMAINNAME.com
4.5.x versions will need quotes at the end.
zmprov syg DOMAINAME.com ""
My Gal & LDAP Settings For A Domain
To see your setting, do the following - replacing with domainname with the domain in question.
su - zimbra zmprov gd [domainname] zimbraGalLdapSearchBase zmprov gd [domainname] zimbraGalSyncLdapSearchBase
You'll see more GAL/LDAP related variables with:
zmprov gd domainname | egrep -i 'ldap|gal'
They are set using:
zmprov md [domainname] zimbraGalLdapSearchBase variable zmprov md [domainname] zimbraGalSyncLdapSearchBase variable
Want My GAL To See All Domains
The default of a domain GAL [zimbraGalInternalSearchBase] is to see only it's domain. To have the GAL for a domain to see all domains on the server you need to set the variable to ROOT.
To see the existing setting:
zmprov gd [domainname] zimbraGalLdapSearchBase
To change the variable for the domain:
zmprov md [domainname] zimbraGalInternalSearchBase ROOT
All global change would be done with:
zmprov mcf zimbraGalInternalSearchBase ROOT
Some Other Ideas - Especially With Multiple Domains And ZCS Servers
This is just some notes I made for a specific case where there were multiple ZCS installs across sister companies. They didn't have a multi-server install and weren't sharing LDAP data therefore.
Here's some ideas I'm considering for this situation:
- Dump GAL data from each server and combine date to either:
- an external LDAP server you can then configure the ZCS servers to use as an external GAL
- admin console > domain > GAL > Configure GAL > Both or External
- reformat GAL data so it can then be imported as an address book via the CLI into a sharead adddressbook on each server. Setup command to run from cron.
- an external LDAP server you can then configure the ZCS servers to use as an external GAL
- Just setup an external Openldap server (which would have replica's at each site) that can be used as an external GAL - make this authoritative in your company. Then setup the ZCS to use it as an external GAL.
- To actually move your infrastructure of ZCS servers into one primary ZCS configuration. Instead of having each site/domain having it's own primary LDAP/ZCS server they would become LDAP replica servers with their domain mailstore's being local to each site. Configure each site/domain to use it's own MTA - if you want/need. And then internally to Zimbra you could set the GAL to be ROOT rather than DOMAIN.
Some bugs to review that touch on this:
- "Add support for multiple GALs per domain"
- "groupings for GAL contacts for 'Select Addresses' dialog and or GAL"
- "GAL via contacts folders with sorting, browsing and real sync"
I'm sure there's some other possibilities.
GAL Related Attributes Usage
This is from earlier 5.x versions, newer version might include more variables.
Attribute scope For GAL op - zimbra - autocomplete - external - serarch - both - sync - all ====================================================================================================================================================================== zimbraHideInGal account,DL,CR zimbra all zimbraFeatureGalEnabled account,cos both search,sync zimbraFeatureGalAutoCompleteEnabled account,cos both autocomplete zimbraPrefGalAutoCompleteEnabled account,cos both autocomplete zimbraGalMode domain both all zimbraGalLdapFilterDef globalConfig both all zimbraGalLdapAttrMap domain,globalConfig both all zimbraGalMaxResults domain,globalConfig both autocomplete, search (for sync, system does not specify a max when searching LDAP) zimbraGalTokenizeAutoCompleteKey domain both autocomplete zimbraGalTokenizeSearchKey domain both search zimbraGalLdapPageSize domain,globalConfig both autocomplete, search, (sync if zimbraGalSyncLdapPageSize is not set) zimbraGalSyncLdapPageSize domain,globalConfig both sync ---------------------------------------------------------------------------------------------------------------------------------------------------------------------- zimbraGalInternalSearchBase domain,globalConfig zimbra autocomplete, search, (sync if zimbraGalSyncInternalSearchBase is not set) zimbraGalSyncInternalSearchBase domain,globalConfig zimbra sync ---------------------------------------------------------------------------------------------------------------------------------------------------------------------- zimbraGalLdapURL domain external autocomplete, search, (sync if zimbraGalSyncLdapURL is not set) zimbraGalSyncLdapURL domain external sync zimbraGalLdapSearchBase domain external autocomplete, search, (sync if zimbraGalSyncLdapSearchBase is not set) zimbraGalSyncLdapSearchBase domain external sync zimbraGalLdapAuthMech domain external autocomplete, search, (sync if zimbraGalSyncLdapAuthMech is not set) zimbraGalSyncLdapAuthMech domain external sync zimbraGalLdapBindDn domain external autocomplete, search, (sync if zimbraGalSyncLdapBindDn is not set) zimbraGalSyncLdapBindDn domain external sync zimbraGalLdapBindPassword domain external autocomplete, search, (sync if zimbraGalSyncLdapBindPassword is not set) zimbraGalSyncLdapBindPassword domain external sync zimbraGalLdapKerberos5Principal domain external autocomplete, search, (sync if zimbraGalSyncLdapKerberos5Principal is not set) zimbraGalSyncLdapKerberos5Principal domain external sync zimbraGalLdapKerberos5Keytab domain external autocomplete, search, (sync if zimbraGalSyncLdapKerberos5Keytab is not set) zimbraGalSyncLdapKerberos5Keytab domain external sync zimbraGalAutoCompleteLdapFilter domain,globalConfig external autocomplete zimbraGalLdapFilter domain external search, (sync if zimbraGalLdapSyncFilter is not set) zimbraGalSyncLdapFilter domain external sync


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Press release from PR Newswire
IntercontinentalExchange CFO to Present at KBW Securities Brokerage & Market Structure Conference on November 28
Monday, November 26, 2012
IntercontinentalExchange CFO to Present at KBW Securities Brokerage & Market Structure Conference on November 2808:30 EST Monday, November 26, 2012ATLANTA, Nov. 26, 2012 /PRNewswire/ -- IntercontinentalExchange (NYSE: ICE), a leading operator of global markets and clearing houses, announced today that Scott A. Hill, ICE's Chief Financial Officer, will speak at the KBW Securities Brokerage & Market Structure Conference. The presentation will take place in New York City, New York on Wednesday, November 28 at 3:35 p.m. ET. The presentation will be broadcast live over the Internet and can be accessed via the "Investors & Media" page of ICE's website at www.theice.com.(Logo: http://photos.prnewswire.com/prnh/20090727/CL51999LOGO)About IntercontinentalExchangeIntercontinentalExchange (NYSE: ICE) is a leading operator of regulated exchanges and clearing houses serving the risk management needs of global markets for agricultural, credit, currency, emissions, energy and equity index products. ICE's Brent crude contract is the world's leading benchmark for crude oil. ICE serves customers in more than 70 countries. www.theice.comThe following are trademarks of IntercontinentalExchange, Inc. and/or its affiliated companies: IntercontinentalExchange, ICE, ICE and block design, ICE Futures Europe and ICE Clear Europe. All other trademarks are the property of their respective owners. For more information regarding registered trademarks owned by IntercontinentalExchange, Inc. and/or its affiliated companies, see https://www.theice.com/terms.jhtml ICE-CORP SOURCE IntercontinentalExchangeFor further information: Melanie Skijus, Director, Investor Relations, IntercontinentalExchange, +1-770-857-2532, email@example.com


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|Blurbarian Since
|January 2011
|Hannah Clarke
|Jersey Channel Islands Uk
|My Occupation
|Senior Youth Worker at Jersey Youth Service and Equine Facilitated Learning Practitioner
|My Bio
I am a qualified teacher, youth and community worker and equine facilitated learning practitioner with over 20 years experience of working with young people.
For the past seven years I have been running youth clubs for young people on the autism spectrum and am dedicated to supporting all young people in reaching their potential, developing meaningful relationships and increasing their emotional resilience.
I am also a trustee for Autism Jersey, Jersey Community Relations Trust and the founder of the charity EASD - Equine Assisted Self Development. (registered charity number 376 Association of Jersey Charities)
|Spoiler alert: I'm thinking my next book will be about...
|Youth work and Autism - OUT NOW
|This book is addictive. Read it. (At your own risk.)
|The Boudica Series by Manda Scott


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Well, I am new here and I found this to be a neat website and so I will go ahead and post my story here. Last night I was laying in my bed with my laptop and felt sleepy, so I shut my eyes. It felt like 2 minutes had past, but I was still awake? Everything went black and I was facing my wall next to my bed. I woke up and could not move and heard strange noises and my door creek open. I was slowly being dragged off my bed and could not scream for help or move.I felt whatever it was taking me. I was terrified and was ready to die. I already have a terrible fear of aliens so thinking "it" was one that was dragging me off my bed was even worse. I hit the floor and regained consciousness and immanently stood up ready to fight for some reason. I thought this was sleep paralysis, but since when does some one move their own body unconsciously and consciously during sleep paralysis? Any thoughts? Is this just me in the dream world or something happening to me that can't be explained?
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Almost Taken?
Almost taken, but by what?aliens sleep paralysis
Started by Bdogxxl , Jan 31 2013 02:52 PM
Started by Bdogxxl , Jan 31 2013 02:52 PM
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Meet the friendly and experienced team at Handcrafters House
Michelle Pearson
Manager, Educator & Technician
Interests: All things patchwork & quilting, cloth dolls and textiles.
Favourite Colour/s: Purple, Green & Rust
Favourite Food: Everything that puts on weight
Biggest Challenge: Finding enough hours in the day or being able to clone myself.
Greatest Achievement: My family & winning International Dealer of the Year for Handi Quilter.
Gail Dods
Proprietor of Handcrafters House & Norwest Craft Supplies
Interests: Reading, bear making and anything crafty!
Favourite Colour/s: Pink, Purple & Blue
Loves: My family & Grandkids!!
Greatest Achievement: Pioneered the way for the craft industry in the North of Western Australia by opening a store in Karratha in 1990 to service the entire community across all craft/art genres. The store is still going strong today after 21 years!
Natasha Titko
Sales Team and Technician
Interests: Patchwork, Gardening, Beading, Nature Programs
Favourite Colour/s: Blue/Green, Jade
Favourite Food: Seafood, Lasagne, Chocolate
Loves: Family, Gardening
Phyllis Pearson
Sales Team and Tutor
Interests: Everything to do with sewing by machine. Dressmaking, overlocking, thread painting, patchwork and quilting, machine embroidery and now software - the list is endless. My sewing room has expanding walls and the UFO's - one day i will find a use for some of them.
Favourite Food: Itallian and Thai
Loves: Family, Our Grandson, Sewing and Gardening
Elinor Milewski
Sales Team and Tutor
Coming from a Montessori classroom in South Africa to a fabulous quilting shop in Australia, it is all an adventure. While I love hiking in the mountains (or hills in Perth), my other great loves for travelling, teaching and patchwork come first, where possible. I have been quilting since 1988 and I've learnt so much and produced many UFO's too!
Jodi Squires
Sales Team
Jodi started with us in early 2013 and came on board at a time of loads of changes within the shop. She and Julie had taken over the role of Natasha and have been handling all stock inventory and intake as well as general Sales in the store. Jodi LOVES being a part of our team!
Julie Cruden
Sales Team
Julie started at the same time as Jodi and together they have formed a formidable team controlling all aspects of the store stock receivable department and also managing general sales and customer service. Like Jodi, Julie also LOVES being part of our team!
Chris Jones
Sales Team and Tutor
Chris joined us in Spring 2013 and as a Handi Quilter owner and a long arm quilter she brings with her a wealth of knowledge in this area. Chris is enjoying our team atmosphere and has a vast knowledge of patchwork and quilting. She will be teaching in 2014 more and more during 2014 and onwards.


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FBI expects surge of December bank robberies
Virginia unemployment fell to 5.2 percent in December, Virginia Employment Commission says
The Virginia Employment Commission says the state's jobless rate fell to 5.2 percent in December.
D.C. enjoys record warm weekend
On Sunday local residents enjoyed a second straight day where the record high temperature was either broken or tied.
First D.C. snow: Magic date is December 5thComment
So far we've come close to seeing a few snowflakes but officially nothing yet. Did you know that December 5th is historically the first eye opener snow of the year?
Holiday book fair in AlexandriaComment
Authors Matthew Iden and Kristin Levine came on Let's Talk Live to talk about a holiday book fair going on this Saturday at Grounded Coffee in Alexandria.
Jolly Fat Man's RunComment
Chuck Dyson, the head Sergeant of the Sergeants Program, and Adam Kisielewski, the Vice President of Operation Second Chance, came on the show to talk about the Jolly Fat Man's Run, which benefits veterans and their families.
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Stephanie McMahonStephanie Marie McMahon
- Birthdate: 09/24/1976 (age 38)
- Height: 5'8"
- Weight: 135 Ib
Stephanie McMahon has been employed with WWE fo...
-- WWE creative team member Michael Hayes is dealing with a personal issue and has been off the road for several weeks now.
-- As noted earlier here on the website, WWE Hall Of Famer Dusty Rhodes is famous for going to the ring and cutting promos completely on his own, without the use of a pre-written script by the WWE creative team. Apparently, this style has caused some friction backstage recently. On recent editions of WWE RAW, Dusty was cutting promos without a script, and even cut Stephanie McMahon off a few times, to the displeasure of the bosses daughter. Additionally, Dusty did the dreaded "face-palm" to Stephanie during a recent promo, which was also something that was not scripted. Stephanie apparently had no idea it was coming, and was not happy about it at all.


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Clearwater, FL. (PRWEB) September 04, 2014
(ISC)²® ("ISC-squared"), the largest not-for-profit membership body of certified information and software security professionals with over 100,000 members worldwide, today announced the finalists for its fourth annual Americas Information Security Leadership Awards (ISLA) Program. With the success of the Americas ISLA program over the past three years, (ISC)² is pleased once again to celebrate the accomplishments of private and public sector industry leaders outside of U.S. federal government throughout the Americas who are inspiring change within the information security workforce. Recipients will be announced during the fourth annual (ISC)² Security Congress on the evening of October 1.
Part of (ISC)²'s Global Awards Program, Americas ISLA aims to recognize the achievements of outstanding information security professionals who have led an industry workforce improvement initiative, program or project. The program recognizes professionals who are leading initiatives that result in a more proficient, resilient information security workforce in Central, North, and South America. The recognition categories include: Information Security Practitioner, Senior Information Security Professional, and Up-and-Coming Information Security Professional. (ISC)2 will also recognize a Community Service Star for spreading information security awareness throughout their community.
"Our awards program provides a unique platform to showcase the information security leaders across the globe who are dedicated to advancing the industry and inspiring the next generation of cybersecurity professionals," said W. Hord Tipton, CISSP, executive director of (ISC)². "We congratulate this year's deserving finalists and applaud their efforts to bolster the cybersecurity workforce of today and tomorrow."
The 2014 Americas ISLA finalists are as follows:
Information Security Practitioner
Individual Finalists:
Senior Information Security Professional Category
Individual Finalists:
Up-and-Coming Information Security Professional Category
Individual Finalists:
A judging committee of 11 members of the (ISC)² North American and Latin American Advisory Boards evaluated the nominees and selected the finalists based upon specific criteria and eligibility requirements. (ISC)² officials will honor the Americas ISLA recipients on Wednesday, October 1, 2014 during a gala dinner and ceremony in Atlanta, Ga. at the Hard Rock Café.
For more information on the Americas ISLA program, please visit http://www.isc2.org/aisla.
# # #
About (ISC)²Ò
Formed in 1989 and celebrating its 25th anniversary, (ISC)² is the largest not-for-profit membership body of certified information and software security professionals worldwide, with over 100,000 members in more than 135 countries. Globally recognized as the Gold Standard, (ISC)² issues the Certified Information Systems Security Professional (CISSPÒ) and related concentrations, as well as the Certified Secure Software Lifecycle Professional (CSSLPÒ), the Certified Cyber Forensics Professional (CCFPSM), Certified Authorization Professional (CAPÒ), HealthCare Information Security and Privacy Practitioner (HCISPPSM), and Systems Security Certified Practitioner (SSCPÒ) credentials to qualifying candidates. (ISC)²'s certifications are among the first information technology credentials to meet the stringent requirements of ISO/IEC Standard 17024, a global benchmark for assessing and certifying personnel. (ISC)² also offers education programs and services based on its CBK®, a compendium of information and software security topics. More information is available at http://www.isc2.org.
# # #
© 2014, (ISC)² Inc., (ISC)², CISSP, ISSAP, ISSMP, ISSEP, CSSLP, CAP, SSCP and CBK are registered marks, and CCFP and HCISPP are service marks, of (ISC)2, Inc.


text:
W. Clum, D.C. has been president of Life Chiropractic
College West for more than 20 years. In addition
to his duties with Life West, Dr. Clum serves
as a member of the board of directors of the Association
of Chiropractic Colleges, Council on Chiropractic
Education, and World Federation of Chiropractic.
He also serves as chairman of the International
Affairs Committee of the International Chiropractors
Association, a member of the Education Committee
of the World Federation of Chiropractic and the
secretary-treasurer of the World Federation of
2000, Dr. Clum was recognized as the "Volunteer
Business Leader of the Year" in Hayward, California,
he was recognized as the "Chiropractor of the
Year" by the International Chiropractors Association
in 1992 and as "Man of the Year" by Dynamic
Chiropractic in the same year. He has received
numerous state, regional, national and international
acknowledgements and awards for his efforts in
the chiropractic profession.
Clum has testified before various Congressional
panels and subcommittees relative to student loan
related matters. He has written and lectured on
cultural and sociological trends affecting the
chiropractic profession and health care in general
in publications and on programs throughout the
United States, Canada, Australia, Africa and Europe.
Clum's answer will be available shortly. For
links to Gerard Clum's home page and other related infomation
please see our resources
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text:
The Coastal Bank has promoted Chap Bennett to executive vice president of commercial real estate and specialty lending. In his new position, Bennett will lead the bank's mortgage company and construction lending department in addition to its structured finance services.
The Georgia Department of Labor's Savannah Career Center, the GDOL's Veterans Services Division and Savannah Technical College will sponsor the annual Southeast Georgia Career Expo, on May 16 from 1-5 p.m. in Savannah Tech's Eckburg Auditorium at 5717 White Bluff Road.
Dr. John Bennett kicked off his arrival to the area by appearing in the Stand Up for America Day parade in Port Wentworth. He joined the Effingham Family Medicine team last month, and said he is excited to be out and about meeting people from around the community.
Medient Studios, Inc., has announced strong revenues for 2012, and issued a shareholders letter as part of its annual report.
The film studio planning a massive studio and development project in Effingham County has entered into a partnership with a major production equipment supplier.
Effingham Health System announced that three of its primary practice locations have received designation by CMS (Centers for Medicare and Medicaid Services) as rural health clinics.
Dasher Insurance Agency has earned the Senior Partner designation from Grange Insurance, placing the agency in an elite group, for the 14th consecutive year.
The Effingham County Chamber of Commerce could be line to receive hotel and motel tax receipts from the county in order to foster tourism efforts.
What they will miss the most, more than anything else, David and Bonnie Gnann said, are their customers.
ATLANTA - The Georgia Department of Labor announced Thursday that metro Savannah's unemployment rate declined to 7.4 percent in March, down three-tenths of a percentage point from 7.7 percent in February. The rate was 8.3 percent in March a year ago.
The Effingham Industrial Development Authority has approved giving a film studio planning a massive project in the county an extra 30 days to finish its development schedule.
Effingham County Chamber of Commerce representatives helped Ms. Jean's Restaurant in Rincon cut the ribbon for their business recently.
The Georgia Department of Labor announced that Georgia's seasonally adjusted unemployment rate dipped to 8.4 percent in March, the lowest rate since December 2008. The rate was down two-tenths of a percentage point from 8.6 percent in February and seven-tenths of a percentage point from 9.1 percent in March a year ago.
The $50 million in additional port deepening funds proposed by Gov. Nathan Deal has been approved by the state legislature and now awaits the governor's signature.
The group building a new store in Rincon has wasted little time in getting its site ready.
Page 21 of 89
Port of Savannah container volumes jumped 25.8 percent in April, with a total volume of 335,337 20-foot equivalent container units, or an additional 69,000 units. The Georgia Ports Authority also saw strong growth in roll-on/roll-off traffic, moving 77,574 units through Brunswick and Savannah, a 14.1 percent gain.
Volvo Cars has chosen Berkeley County in South Carolina as the location of its first American factory, investing up to $500 million in a facility with a capacity to initially produce up to 100,000 cars per year.
The Effingham Chamber of Commerce will hold a job fair Wednesday at the Effingham College and Career Academy.
Page 2 of 2
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Results 1 to 5 of 7
Thread: Names That Have Bad Associations
April 14th, 2014 08:34 PM #1Member
- Join Date
- Dec 2013
- Posts
- 70
Names That Have Bad Associations
Don't ask why, but for characters I want old names with sometimes a bad history; I'm trying to turn the negative image around. Not too negative, though: I'm not doing Cain or Romulus since they're both murderers, and Lilith is a demon queen or whatever so that's out. Anyway, help would be appreciated.
April 14th, 2014 09:35 PM #3Junior Member
- Join Date
- Dec 2013
- Posts
- 5
Desdemona maybe. It doesn't have a bad history as such but she was a character from one of Shakespeare's plays and apparently she had quite a tragic death,and it doesn't really get used that much (it was the name of one of the sims 2 characters in Veronaville though).
April 14th, 2014 10:19 PM #5Member
- Join Date
- Dec 2013
- Posts
- 70
Desdemona seems cool. I'm looking also for names with an old history that are underrated, so your reply was perfect, actually.
April 15th, 2014 04:14 AM #7
Ophelia is such a beautiful name but in Hamlet (Shakespeare) she is insane and dies and it's generally associated with tragedy and insanity and it would be awesome for someone to give it a good connotation• Esther Aveline Willow ~ Rosalie Aislinn Pearl ~ Clara Hermione Mae ~ Polly Matilda Iris ~ Elowen Saskia Eve •
• Oliver Jack Marcel ~ Henry Asher David ~ Theodore Jack August ~ Arthur Gideon Maxwell ~ Felix Charlie Rowan •
Sosie - bookworm and name nerd :-)
April 15th, 2014 10:20 AM #9Senior Member
- Join Date
- Mar 2014
- Location
- Posts
- 570
Lots of Biblical names would work as there are lots of evil characters mentioned!
- Jael: killed a man by sticking a tent peg through his skull
- Salome: asked her step-father Herod to give her John the Baptist's head on a plate
- Herod: see above. Oh and he also married his brother's wife, which isn't really evil but doesn't do him any favours either
- Jehoram: killed and dismembered his 6 brothers in order to become king
- Abimelech: slaughtered 70 men from his tribe
- Jezebel: serial adulteress rumoured to sacrifice babies
- Delilah: seduced Samson then sold the secret of his strength to his enemiesMum of three cat 'children', Hamish, Gandalf and Jones, and looking forward to starting a family sometime in the next 3 years.
Future sons:
Elliott Ronald Taylor | Benedict Edmund Wesley | Rowan Gabriel Arthur
Future daughters:
Romilly Demelza Taylor | Octavia Emmeline Primrose | Prudence Matilda Verity
(Some MNs are family/honour names)


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NYC Parks Events Calendar
Get up, get out, and do something! Just about any day of the year, you can find something fun, informative, and healthy to enjoy at an area park. Feel free to browse the listings below, or use the search tools to find an event that matches your interests and location.
Viewing 8,061–8,070 out of 17,792 events
from May 18, 2013 (x) to April 25, 2026
Sunday, December 21, 2014
Santa's Corner at Bryant Park
at Bryant Park, Manhattan
1:00 p.m.–4:00 p.m.
Join Santa and his helpers for a parade through Winter Village.
Category: Kids, Winter Holidays, Santa's Coming to Town
The Science Behind the Solstice
at Greenbelt Nature Center (in Blood Root Valley), Staten Island
2:00 p.m.–3:00 p.m.
Learn myths and legends surrounding the season's shortest day, as well as the science behind the shorter days and the snow to come.
Category: Nature, Kids
Garden and Conservatory Highlights Walk
at Perkins Visitors Center (in Wave Hill), Bronx
2:00 p.m.–3:00 p.m.
Join us for an hour-long tour of seasonal garden highlights.
Category: Nature, Tours
Central Park Tour: Mid-Park Welcome Tour
at Alexander von Humboldt statue (in Central Park), Manhattan
2:00 p.m.–2:45 p.m.
Explore the park's central features, including the Lake and Ramble woodland, then marvel at the views from Belvedere Castle.
Category: Education, Nature, History, Tours
Remembering Yesterday: Queens and Its World's Fairs
at Kingsland Homestead (in Margaret I. Carman Green - Weeping Beech), Queens
2:30 p.m.–4:30 p.m.
Remembering is both a collective and a personal activity. In this exhibition, both are on display in relation to two World's Fairs that took place in Flushing, Queens in…
Category: Art, History
Winter Solstice Celebration
at Van Cortlandt Golf House & Lower Putnam Trail (in Van Cortlandt Park), Bronx
4:00 p.m.–5:00 p.m.
Enjoy hearthside stories, hot cider, and a candle light walk on the Putnam Trail with the Urban Park Rangers.
Category: Nature, History, Kids, Winter Holidays
Make Music Winter: Wheels by Nissim Schaul
at Grand Army Plaza, Brooklyn
4:00 p.m.–5:30 p.m.
Wheels gathers the city's seasoned and casual cyclists to perform a new piece for bicycle bells by composer Nissim Schaul.
Category: Art, Fitness
Lighting of the World's Largest Hanukkah Menorah
at Grand Army Plaza, Manhattan
5:30 p.m.–6:30 p.m.
Gather around the 32-foot-high, gold-colored, 4,000-pound steel holiday icon at Grand Army Plaza to kick off the annual Jewish Festival of Lights.
Category: Holiday Lightings
Brooklyn's Largest Menorah Lighting
at Grand Army Plaza, Brooklyn
6:00 p.m.–7:00 p.m.
Every night of Chanukah is celebrated with live music, hot latkes, and gifts for the children.
Category: Holiday Lightings
Monday, December 22, 2014
Art in the Garden: The Evolution of an Artist
at Queens Botanical Garden, Queens
8:00 a.m.–6:00 p.m.
Art in the Garden: The Evolution of an Artist Tuesday, September 30 through Sunday, January 17, in the Visitor & Administration Building Gallery Fee: Free with…
Category: Art
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Grain handling group Viterra says they won't use rail freight in the Riverland and South Australian Mallee. Read more.
Topics: road-transport, rail-transport, agricultural-prices, agribusiness, wheat, grain, oilseeds, agricultural-policy, crop-harvesting, loxton-5333, pinnaroo-5304, lameroo-5302, tailem-bend-5260, karoonda-5307
Posted| Updated
Grain handling group Viterra has announced it will no longer be using rail freight in the South Australian Mallee region.
Topics: road-transport, rail-transport, agricultural-prices, agribusiness, wheat, grain, oilseeds, agricultural-policy, crop-harvesting, loxton-5333, pinnaroo-5304, lameroo-5302, tailem-bend-5260, karoonda-5307
The Karoonda East Murray Council says the switch-on date for the Karoonda National Broadband Network (NBN) tower has been delayed.
Topics: information-and-communication, urban-development-and-planning, karoonda-5307, renmark-5341
Posted| Updated
More than 500 South Australian sites have been added to a Federal Government mobile phone blackspot database.
Topics: mobile-phones, information-and-communication, programs-and-initiatives, federal-government, sa, loxton-5333, mount-gambier-5290, karoonda-5307, naracoorte-5271, port-augusta-5700, port-lincoln-5606, port-pirie-5540, renmark-5341
Topics: weather, grain, karoonda-5307
Mallee farmer Peter Loller talks about strong winds and hot weather at his place
Topics: weather, grain, wheat, sheep-production, karoonda-5307
Posted| Updated
Most of South Australia was hit by strong winds yesterday as a vigorous cold front crossed the state towards Victoria.
Topics: weather, grain, wheat, karoonda-5307
Councils in South Australia's Riverland, Murraylands and the Mallee have received more than $11 million in funding, as part of the Federal Government's Roads to Recovery program.
Topics: programs-and-initiatives, local-government, federal-government, karoonda-5307, renmark-5341
A 56-year-old Murray Mallee man has died in a single car crash north of Karoonda.
Topics: road, karoonda-5307, renmark-5341
The Karoonda caravan park is expected to reopen in mid-November.
Topics: urban-development-and-planning, local-government, karoonda-5307, renmark-5341
A research project by the CSIRO could help broadacre farmers know exactly how much nitrogen fertiliser they need to apply to their crops.
Topics: grain, wheat, oilseeds, fertilisers, research, karoonda-5307
CSIRO researcher Gupta Vadakuttu is researching where and when crops draw their nitrogen to help farmers work out fertilising rates.
Topics: grain, wheat, oilseeds, fertilisers, karoonda-5307
Topics: grain, fertilisers, oilseeds, karoonda-5307
Early sowing times will result in better yields most years, says CSIRO cropping systems scientist Andrew Fletcher, despite severe frost damage this year.
Topics: grain, wheat, oilseeds, weather, karoonda-5307
Topics: wheat, weather, agribusiness, karoonda-5307
A researcher with the CSIRO is encouraging frost-affected broadacre farmers to continue sowing early, despite the risks of damage during the coldest times of the year.
Topics: wheat, oilseeds, grain, weather, karoonda-5307
Eastern grain growers are yet to take up a herbicide free weed management method, says Michael Walsh from the Australian Herbicide Resistance Initiative.
Topics: wheat, grain, weeds, karoonda-5307
Posted| Updated
Western Australian grain growers are leading the way in a new non-herbicidal technique for controlling weeds, but it's yet to be widely taken up by grain growers in other states.
Topics: grain, wheat, weeds, oilseeds, karoonda-5307
The Southern Mallee Council says it is continuing talks with the Federal Government over funding for the region's child care service.
Topics: child-care, programs-and-initiatives, activism-and-lobbying, local-government, lameroo-5302, geranium-5301, pinnaroo-5304, karoonda-5307
The Karoonda East Murray Council has appointed a consultant to progress plans for a memorabilia building in the district.
Topics: urban-development-and-planning, local-government, karoonda-5307, renmark-5341
The Karoonda Golf Club will remain closed indefinitely, as there are still not enough players wanting to use the course.
Topics: clubs-and-associations, lifestyle-and-leisure, karoonda-5307, renmark-5341
The Karoonda East Murray Council wants to increase its rates by 4.2 per cent next financial year.
Topics: local-government, karoonda-5307, renmark-5341
Posted| Updated
In towns across Australia there is history at every turn, but looking after collections of artefacts and memorabilia can become a burden.
Topics: history, community-and-society, community-organisations, local-government, government-and-politics, karoonda-5307, sa, adelaide-5000, renmark-5341, mount-gambier-5290, australia
The Karoonda East Murray Council has acknowledged that plans to build a public weighbridge in the region have been slow to progress.
Topics: urban-development-and-planning, local-government, programs-and-initiatives, karoonda-5307, renmark-5341
Topics: agricultural-shows, renmark-5341, karoonda-5307


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Franklin's Magic Christmas
|Franklin's Magic Christmas
|Directed by
|John van Bruggen
|Written by
|Betty Quan
|Noah Reid, Elizabeth Brown, Richard Newman, Bryn McAuley, Luca Perlman, Kristen Bone, Mari Trainor, Donald Burda, Joyce Gordon, Eric Peterson, Araby Lockhart, Chris Wiggins
|Distributed by
|Paramount Home Entertainment
Release dates
|November 6, 2001
Running time
|55 min.
|This article does not cite any references or sources. (May 2013)
Franklin's Magic Christmas was the second Franklin movie, released direct-to-video and DVD in 2001. It is somewhat shorter than Franklin and the Green Knight and Franklin and the Turtle Lake Treasure. It has since aired on Nick Jr. In the United States Canada's Family Channel and on Comcast Video on Demand. This movie was loosely based on the book Franklin and Harriet.
In this story, Franklin the turtle and his little sister, Harriet (introduced in the previous film, Franklin and the Green Knight) are planning to pay a visit to and spend Christmas with their maternal grandparents at Faraway Farm, a farm faraway from Woodland where their mother Mrs. Turtle grew up at. As the Turtle Family gets ready to go to the farm, they sing "Deck the Halls" in only the first and third verses. Franklin immediately becomes annoyed with Harriet when she throws a snowball, causing him to drop a large pile of presents. Bear and Beatrice come, and Franklin accidentally forgets his favourite stuffed toy, Sam, at home. Franklin thinks that Harriet dumped Sam in the snow on purpose, when it was really Beatrice who had Sam after they left, and Bear failed to give it back to Franklin and Franklin is still annoyed with Harriet when they get to Faraway Farm and it's revealed that he and Harriet will be sleeping in the same room. Later, his maternal grandmother tells a strange story from her childhood about a reindeer. This story involves a flashback showing the little Grandma Turtle and Great-Grandpa Turtle. She admits that she might have imagined it as the father takes a family portrait, in which Franklin gives a sad look. Grandma Jenny Turtle sends Franklin to bed, and shows him Sirius outside and sings to him and Harriet Twinkle Twinkle Little Star.
The next day, as Franklin feeds the chickens, Grandma Jenny Turtle lets him in on a little surprise-she is fixing up an old sleigh for Grandfather Turtle. Franklin decides to help, and Grandma Jenny Turtle introduces him to the Collies, who collect the polish. That night there is a blackout, and while Franklin is checking the closet for candles, he comes across the bell from his maternal grandmother's story, revealing that she was not imagining after all.
Franklin shows the bell to Grandma Jenny Turtle the next morning (Christmas Eve), and suggests they use the bell for Grandfather Turtle's sleigh. Grandma Jenny Turtle has Harriet help with the sleigh, but spills the beans at lunch (fortunately Grandfather Turtle wasn't there). Later, as Franklin and Harriet work on the sleigh, Harriet rings the bell, and, just like in Grandma Jenny Turtle's story, a reindeer appears. Franklin runs to the house to tell Grandma Jenny Turtle, distracting Grandfather Turtle, making him slip on a puddle of ice, giving him a broken leg.
Franklin decides to use the sleigh to go and find Dr. Bear in Woodland, when he discovers that Harriet has come along, hidden in the back. The horse, Rosie, is just as surprised, and runs away. Franklin is furious, but then sees that Harriet brought the bell. They ring it, and this time two reindeer come, one with a bell exactly like the one Franklin has. Franklin realizes that the bell must belong to the other reindeer, which is why he comes when somebody rings it. With the bell back, the original reindeer creates a harness seemingly out of nowhere. As they soar above the clouds he sees Sirius, and he and Harriet sing this song, "Twinkle, Twinkle, Little Star". Grandma Jenny finds the note Franklin left for her, Grandpa Dut, Mrs. Turtle, and Mr. Turtle. Mr. and Mrs. Turtle soon arrive home because they were checking on the Collies. Jenny, Mr. and Mrs. Turtle decide to split up. Franklin and Harriet soon arrive home with Dr. Bear, they go home on the sleigh. Rosy soon comes back and Jenny, Mrs. Elizabeth, Mr. Jonathan Turtle and Rosy see Franklin, Harriet, and Dr. Bear, who gives Grandfather Turtle a cast for his leg. She also gives Franklin Sam, which Bear got from the very beginning.
That night, Franklin and Harriet see Santa Claus out the window. The film ends with Franklin and Harriet saying "Merry Christmas" to each other.
External links[edit]
- Franklin's Magic Christmas at the Big Cartoon DataBase
- TV.com Guide
- Franklin's Magic Christmas at Rotten Tomatoes
- Franklin's Magic Christmas at the Internet Movie Database