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A two-step method for eliminating transmission errors in alternating phase-shifting masks is described. Initially, the design data is selectively biased to provide a coarse reduction in the inherent transmission error between features of different phase, size, shape, and/or location. During fabrication of the mask with the modified data, residual transmission errors are then eliminated via the positioning of the edges of the etched-quartz trenches which define the phase of a given feature to a set location beneath the opaque chrome film. Application of feedback, in which the aerial image of the mask is monitored during the positioning of the etched-quartz edges, provides additional and precise control of the residual transmission error.
1. A method of eliminating pattern size and placement inaccuracies caused by errors in the relative amount of light transmitted through transparent features of different phase on a phase-shifted photomask, the method comprising the steps of:
building design data of said photomask representing pattern size, shape, placement and phase of said transparent features;
modifying said design data by altering the size or shape of at least one of said phase-shifted features;
fabricating said photomask with said modified design data by forming opaque and transparent features of said photomask and selectively etching transparent material of said photomask to a depth which establishes the phases of said transparent phase-shifted features, thereby partially reducing said transmission errors; and
subjecting said photo-mask to an etch-back process comprising adjusting edge locations of said transparent material within said etched features in relation to edge locations of said opaque film of said photomask to a position wherein residual transmission errors between said features having a different phase on said photomask are corrected, thereby eliminating said residual transmission errors that were not previously corrected by a combination of said design data modification step and said fabrication step.
2. The method of claim 1, wherein non-phase-shifted phases and 180� phases are present in said design data.
3. The method of claim 1, wherein 90� and 270� phases are present in said design data.
4. The method of claim 1, wherein at least two phases are present in the said design data.
5. The method of claim 1, wherein said design data comprises dark-field patterns.
6. The method of claim 1, wherein said design data comprises bright-field patterns.
7. The method of claim 1, further comprising the step of selecting the magnitude of said design modifications for minimizing said transmission error prior to said etch-back process.
8. The method of claim 1, further comprising the step of selecting the magnitude of said design modifications for optimizing process control and yield during said fabrication of said photomask, and further comprising the step of positioning edge locations of said transparent material during said etch-back process.
9. The method of claim 1, wherein said design modifications are determined by software tools.
10. The method of claim 1, wherein said design modifications are selected to optimize the process control and improve the yield achieved during the photolithographic patterning of said photomask.
11. The method of claim 1, wherein said design modifications include corrections for optical proximity effects.
12. The method of claim 1, wherein all edges of said phase-shifted feature are moved independently in accordance with said changes to the size or shape of said phase-shifted feature during said design modifications.
13. The method of claim 12, wherein said movements of said edges of said phase-shifted features are selected based upon the shape and size of said phase-shifted feature.
14. The method of claim 12, wherein said movements of said edges of said phase-shifted features are selected based upon distance, size, shape, and phase of at least one neighboring feature to said phase-shifted feature.
15. The method of claim 1, wherein said etch-back process further comprises at least one step after which measurements of said residual transmission errors are taken in order to minimize said residual transmission errors at the completion of said at least one step.
16. The method of claim 15, wherein said measurements of said residual transmission errors are made by direct aerial image measurements of said photomask with an optical system configured to emulate the usage of said photomask during photolithographic patterning.
17. The method of claim 16, wherein said direct aerial image measurements of said photomask are provided by an aerial image measurements system (AIMS).
18. The method of claim 15, wherein said measurements of said residual transmission errors are made by photolithographic patterning of said photomask onto a wafer substrate and a subsequent characterization of said patterns obtained on said wafer substrate from said photolithographic patterning.
19. The method of claim 1, wherein said etch-back process is applied non-selectively to all of said features defined in said design data.
20. The method of claim 1, wherein said etch-back process is applied to a subset of said features in said design with predetermined characteristics that include size, shape, neighboring features, and phase.
21. The method of claim 1, wherein said etch-back process is incorporated into said selective etching of said transparent material by including an isotropic component to said selective etch.
22. A method of eliminating pattern size and placement inaccuracies caused by errors in the relative amount of light transmitted through transparent features of different phase on a phase-shifted photomask, the method comprising the steps of:
building design data of said photomask representing pattern size, shape, placement and phase of said transparent features;
selectively biasing said design data, said biasing including altering the size or shape of at least one of said phase-shifted features;
fabricating said photomask with said modified design data, forming opaque and transparent features of said photomask and selectively etching transparent material of said photomask to a depth which establishes the phases of said transparent phase-shifted features, said selective biasing of said design data coupled to said fabricating said photomask with said modified design data providing a first reduction of said transmission errors between said features; and
subjecting said photo-mask to an etch-back process comprising adjusting edge locations of said transparent material within said etched features in relation to edge locations of said opaque film of said photomask to a position, wherein residual transmission errors between said features having a different phase on said photomask that were not previously corrected by a combination of said design data modification step and said fabrication step are eliminated.
This invention relates generally to optical photolithography, and more particularly to a method for balancing the transmission of light through features of different phase on alternating phase-shifting masks.
In the photolithography step of integrated circuit manufacturing, a template containing a designed set of clear and dark shapes, referred to as a mask or reticle, is repeatedly printed on the surface of a silicon wafer via optical imaging. The minimum resolution R, defined herein as the smallest center-to-center separation for which two individual objects can be resolved on the wafer (also referred to as the minimum resolvable pitch), is given by the expression:
R=2�k1�(λ/NA), (1)
wherein NA is the numerical aperture of the optical projection system (hereinafter referred to as the stepper) and λ is the wavelength of the light used by the stepper. For partially coherent imaging, the theoretical limit for the resolution, as defined above, occurs at a k1 factor of:
k1=1/ 2�(1+σ)!, (2)
wherein σ is the partial coherence factor of the stepper.
In standard industry practice as outlined in the schematic mask cross-section of FIG. 1, masks containing the desired opaque and clear patterns are fabricated starting from an initial mask blank (FIG. 1A) consisting of a substrate which is transparent to the imaging light 10 and which is coated on one side with an opaque film 20. Typically, the transparent substrate is composed of fused silica (also known as quartz), hereinafter referred to as the quartz substrate, while the transparent substrate material will be referred to as quartz. In addition, the opaque film is typically composed of a chromium-based material to be referred to as the chrome film, while the material of the film itself will be referred to as chrome. The designed shapes are replicated on this mask blank by first selectively patterning (or writing) the designed shapes in a protective material sensitive to electrons or optical exposure (FIG. 1B), and which will be referred to as resist 30. The openings created in the resist via selective patterning 35 are then transferred to the underlying chrome film during a subsequent etch step such that following removal of the resist material (FIG. 1C), the designed clear shapes 40 and opaque shapes 21 are replicated in the final patterned mask. Masks fabricated in this fashion will be referred to hereinafter as standard or chrome-on-glass (COG) masks.
A different class of masks, such as a phase-shifting mask (PSM), has demonstrated the capability of extending resolution beyond conventional imaging limits by taking advantage of both the phase and the intensity of the imaging light. If two clear shapes which transmit light of opposite phases (180� phase difference) are moved in close proximity to each other, the phase difference will produce a destructive interference null between the two shapes. Such a mask has been given several different designations in the literature such as: Levenson, Levenson-Shibuya, phase edge, alternating aperture, or alternating mask. Herein, it will be referred to as an alternating mask or as an alternating PSM. With this alternating PSM approach, the theoretical resolution limit is reduced to:
k1=1/ 4�(1+σ)! (3)
or one-half the resolution of conventional imaging.
The additional mask fabrication steps beyond the standard mask process of FIG. 1 are shown for an etched-quartz or subtractive alternating PSM process in FIG. 2. A phase difference between two clear shapes for an alternating PSM is achieved in standard industry practice by selectively etching into the quartz substrate 10, such that an optical path difference equivalent to the desired phase offset is obtained between two adjacent openings. Following a standard mask patterning as shown in FIG. 1, a second write step is used to selectively open a protective resist coating 50 for the phase-shifted opening 41 leaving the non-phase shifted opening 42 covered, as shown in FIG. 2A. In practice, it is desirable to locate the edges of the resist pattern 55 some distance away from the phase-shifted opening 41 on top of the opaque chrome shapes 21 where appropriate, in order to use the chrome itself as an etch barrier and account for overlay (or pattern placement) errors between the first and second-level write steps in the fabrication process. The quartz is then etched (typically, with an anisotropic reactive-ion etch (RIE) process) to a depth of approximately:
etch depth=phase�/ 2�λ�(n-1)!, (4)
wherein n is the refractive index of the quartz substrate, and the phase of the opening 41 is given in radians. Following removal of the resist 50, the resultant alternating PSM has, as shown in FIG. 2B, the etched-quartz trench 15 providing the desired phase difference between adjacent openings 41 and 42.
More complex fabrication approaches have been proposed for accurately controlling the phase (as determined by equation 4) through the addition of multi-layer films to the transparent substrate. By way of example, T. Chieu et al., in the article "Fabrication of Phase Shifting Masks Employing Multi-Layer Films," Proc. SPIE, Vol. 2197, pp. 181-193, (1994) describe a mask blank wherein two additional layers are added between the transparent quartz substrate and the opaque chrome: an etch stop layer composed of either Al2 O3 or HfO2, and a transparent layer of silicon dioxide at a controlled thickness given by equation (4). The desired phase is then achieved by etching into the SiO2 until the etch stop layer is reached.
The invention to be described herein is applicable to both dark-field and bright-field patterns which are defined in FIG. 3. In prior-art dark-field designs (a majority of the area is designed to be opaque on the mask), the closed shapes within the design (i.e., polygons of any number of vertices and edges, although rectangles are used herein for simplicity) typically represent clear openings in the chrome of the mask, shown by 41 and 42 in the cross-section of FIG. 2B and in the design data of FIG. 3A. In addition, for an alternating PSM, the openings which are to receive the quartz etch required to establish phase 41 are typically indicated by including a surrounding shape that corresponds to the second writing step in the fabrication process, shown by edge 55 in the cross-section of FIG. 2A and by shape 55 in FIG. 3A. For bright-field designs, an example of which is shown in FIG. 3B, (a majority of the area is designed to be transparent on the mask), the closed shapes within the design typically represent remaining regions of opaque chrome as represented by the chrome features 21 in the cross-section of FIG. 2B and the rectangles 21 in the design data of FIG. 3B; the clear openings in the chrome such as 41 and 42 in the cross-section of FIG. 2B are then given by the spaces between the designed shapes 41 and 42 in the design data of FIG. 3B. With a bright-field alternating PSM, the shapes describing the second-level write step for defining the areas for the phase etch 55 in both FIGS. 2B and 3B, will both overlap the designed chrome shapes as well as contain bare edges within the clear areas of the design 56, as shown in FIG. 3B. These bare phase edges may print as a narrow dark line which may require subsequent removal via techniques well known to those skilled in the art, such as the use of a second (trim) mask. The basic principles of this patent are unaffected by the specific technique chosen to remove the residual phase edge in bright-field alternating PSM lithography.
The fabrication process illustrated in FIG. 2 has proven to yield non-ideal results when used to photolithographically image such mask patterns into the photo-sensitive resist (also known as photoresist) on the wafer substrate. The ideal results obtained from printing the mask of FIG. 2B are shown schematically in FIG. 4A. The photoresist 63 on wafer substrate 60 contains two equally-sized openings 61 and 62 corresponding to the clear openings on masks 41 and 42. (Note that for illustrative purposes, a positive photoresist in which the photo-sensitive material is removed in areas that are exposed to light is assumed, although the invention is applicable to negative photoresist as well). In practice, however, it has been conclusively demonstrated that the edges of the etched-quartz trenches 15 of an alternating PSM scatter the incident illumination. This, in turn, leads to a reduced intensity being transmitted through the phase-shifted mask opening 41 (in FIG. 2b) relative to that transmitted through the non-phase-shifted mask opening 42 (in FIG. 2b) during the photolithographic exposure. The asymmetric printing of the desired pattern that results from this transmission error is schematically illustrated in FIG. 4B, wherein the resultant photoresist opening 71 corresponding to the phase-shifted mask opening 41 is undersized in comparison to the adjacent photoresist opening 72 corresponding to the non-phase-shifted mask opening 42. In conjunction with the dimensional error, the center of the photoresist pattern between the two openings 73 has shifted to the right resulting in a pattern placement error as well. The impact of sidewall scattering on transmission error has been substantiated both through simulations of electromagnetic scattering via rigorous solution of Maxwell's equations and through experimental verification as described in an article by R. Kostelak et al., published in the Journal of Vacuum Science and Technology B, Vol. 10(6), pp. 3055-3061, (1992).
Several methods have been described to correct this transmission error. A summary and detailed analysis of these approaches can be found in an article entitled: "Pattern-Dependent Correction of Mask Topography Effects for Alternating Phase-Shifting Masks", by R. A. Ferguson, et al., published in the Proceedings of SPIE, Vol. 2440, pp. 349-360, (1995). Two approaches are discussed herein as relevant prior art to this invention. The first technique, as described schematically in FIG. 5A uses a quartz etch-back process to alleviate the transmission error. Following the standard processing sequence illustrated in FIGS. 1 and 2, the reticle is subjected to an isotropic etch (e.g., immersion in dilute Hf solution) in which the sidewalls of the etched quartz trench 15 are recessed beneath the chrome film 22. The non-phase-shifted opening is also etched simultaneously in this manner such that the relative phase difference as defined by equation (4) remains constant. While this process has been effective at reducing the transmission error, rigorous simulations indicate that complete removal of the transmission error cannot be attained as described in the aforementioned article by R. Ferguson et al. In addition, the overhang of the chrome as indicated by 22 in FIG. 5A can become significantly large (e.g., in excess of 1000 Å), rendering the physical stability of the overhanging chrome questionable under standard manufacturing conditions. This is especially true when the mask undergoes vigorous cleaning procedures that are standard and an essential component of producing and maintaining zero-defect, manufacturing-quality masks.
In a second approach described by A. Wong and A. Neureuther in the article entitled "Mask Topography Effects in Projection Printing of Phase-Shifting Masks", published in IEEE Transactions on Electron Devices, Vol. 40, No. 6, pp. 895-902, (1994), the initial design data (FIG. 3) is manipulated prior to mask fabrication such that when it is coupled to the standard fabrication process of FIGS. 1 and 2, the mask shown schematically in FIG. 5B is obtained. In the aforementioned design modifications, the phase-shifted opening 41 has been enlarged by a preset bias relative to the non-phase-shifted opening 42 in order to increase the transmitted light through the phase-shifted opening 41 and, thus, compensate for the transmission loss from side-wall scattering from the edges of the etched-quartz trench 15. In theory, this approach can fully compensate for the scattering phenomena when the design bias is continuously adjustable. In practice, however, the range of allowable biases is limited to discrete values on a coarse grid (referred to hereinafter as the design grid). While a reduction in the step size of this finite design grid will provide more ideal characteristics, the lower bound that is placed on the step size of the design grid by the writing tool used to pattern the mask limits this technique to unacceptably large residual transmission errors as described in the aforementioned article by R. Ferguson et al.
Accordingly, it is an object of the present invention to eliminate transmission errors of an alternating PSM caused by an intensity reduction as light passes through a phase-shifted feature upon exposure.
It is another object of the invention to eliminate the dimensional and pattern-placement errors on the wafer which occur during photolithographic patterning of an alternating PSM having transmission errors.
It is still another object of the invention to maintain a proper balance in a transmission over a wide range of exposures and focus variations experienced under standard manufacturing conditions.
It is yet another object of the invention to provide a standardized, manufacturable process for fabricating alternating PSMs.
The invention consists of a two step approach for the elimination of transmission errors in alternating PSMs. The first step is performed on the design data itself by selectively biasing the designed shapes in the data in order to provide a coarse reduction in the inherent transmission error present between phase-shifted and non-phase-shifted features. Subsequent removal of the residual transmission error occurs during the mask fabrication process using the biased data, wherein the edges of the etched-quartz trench defining the phase-shifted feature are moved to a position beneath the chrome film at which the transmissions of the phase-shifted and non-phase-shifted features are balanced. Application of feedback during the fabrication process, which includes techniques such as direct aerial image measurements with optical parameters to emulate the photolithographic stepper, provide additional and precise control on the edge location of the etched-quartz trench.
Additional features and benefits of the present invention will become apparent from the detailed description, figures, and claims set forth below.
While the specification concludes with claims particularly pointing out and distinctly claiming what is regarded as the present invention, details of a preferred embodiment of the invention may be more readily ascertained from the technical description when read in conjunction with the accompanying drawings, wherein:
FIGS. 1a-1c show a sequence of prior art mask fabrication steps for a standard chrome-on-glass mask;
FIGS. 2a-2b show another sequence of prior art mask fabrication steps of an etched-quartz alternating PSM;
FIG. 3a shows representative alternating PSM design data for a prior art dark-field design;
FIG. 3b shows representative alternating PSM design data for a prior art bright-field design;
FIG. 4a is a schematic cross-section of a conventional ideal photoresist image patterned on the wafer substrate via photolithographic imaging of an alternating PSM;
FIG. 4b is a schematic cross-section of a prior art photoresist image patterned on the wafer substrate via photolithographic imaging of an alternating PSM having a transmission error;
FIG. 5a shows a schematic cross-section of a prior art etch-back method for transmission error correction in an alternating PSM;
FIG. 5b shows a schematic cross-section of a prior art design biasing method for transmission error correction in an alternating PSM;
FIG. 6 shows a schematic cross-section of an alternating PSM, fabricated in accordance with the present invention;
FIG. 7 shows a plot displaying the resultant transmission error obtained from applying both the coarse design data adjustment and the fine etch-back adjustment in accordance with the present invention, as determined by an aerial image measurements system (AIMS) with optical parameters set to match the stepper exposure condition;
FIG. 8a shows a representative coarse design data adjustment for a dark-field design;
FIG. 8b shows a representative coarse design data adjustment for a bright-field design; and
FIG. 9 shows a schematic cross section of an alternating PSM as fabricated in accordance with the present invention in which the etch-back process is applied to the phase-shifted pattern only.
The invention described herein combines elements of two approaches for reducing the transmission error of an alternating PSM in a novel fashion. It provides a conceptual coarse and fine adjustment that completely eliminates the transmission error, without incorporating the disadvantages of prior art techniques, as described in the background of the invention. A representative schematic of the final mask is shown in FIG. 6.
For convenience of description, features (i.e., openings) on the mask will nominally be referred to as phase-shifted and non-phase-shifted, as were previously described in the Background of the Invention. It will be appreciated by those skilled in the art that this nomenclature is not intended to associate an actual phase value (or lack thereof) with either of the features described herein. This simplified nomenclature is used instead to indicate that there is a phase-difference between the two features for which the transmission is to be balanced, and that this phase difference may be achieved in practice by etching the quartz substrate for one or both of these features in order to maintain the phase relationship as described by equation 4. In addition, in the examples which demonstrate the applicability of the invention, the phase-shifted and non-phase-shifted features are shown to be of equal size, and the transmission error is considered to be eliminated when equal intensities are transmitted through both openings, thus achieving the symmetrically printed pattern on the wafer, as illustrated in FIG. 4a. Practitioners in the art will readily appreciate that the applicability of this invention to equally-sized openings is only a specialized case. In fact, for purposes of this invention, the phase-shifted and/or non-phase-shifted shapes may be of arbitrary size, shape, and/or desired intensity level. Furthermore, the transmission error is considered to be eliminated when the appropriate intensity is transmitted by each shape in order to print the desired features on the wafer.
A key aspect of the invention, the coarse adjustment, is provided by applying a partially-correcting bias between the phase-shifted 41 and the non-phase-shifted shapes 42 in the design data, as indicated by dimension "b" in FIG. 6. This bias is used to increase the amount of light transmitted through the phase-shifted opening 41 relative to the non-phase-shifted opening 42, but as a consequence of the limitations associated with the discrete design grid, as described in the prior art FIG. 5B, this bias is used only to partially reduce the inherent transmission error.
The fine adjustment of this invention occurs during mask fabrication, wherein an etch-back process similar to the prior art isotropic etch of FIG. 5A is used to eliminate the residual transmission error that was not corrected for as a result of the biasing. Since the isotropic etch in this process is used for finely tuning the transmission error, the extent of the etch back, given by dimension "d" in FIG. 6, is substantially smaller than that required by the prior art etch-back process of FIG. 5A.
Referring now to FIG. 7, the representative data shown therein further illustrates the methodology used in this invention. The transmission error between two adjacent features of opposite phase is quantified in the plot shown in FIG. 7 as a function of the coarse tuning via biasing of the design data (curve-to-curve variation) and fine tuning with the etch-back process (change in transmission error along one curve). A transmission error of 0% is the ideal value at which the two features are completely balanced. In FIG. 7, data point 100 represents the transmission error (approximately 28%) when no coarse or fine adjustments are applied. A displacement along the y-axis (etch back depth=0 nm) from data point 100 represents a change in transmission error from the coarse bias adjustment. For the design grid size of 25 nm used in this example, the effect of a coarse adjustment of one grid unit is to reduce the transmission error to 10% (i.e., at data point 110). For a two-grid step bias of 50 nm, the transmission error is over-corrected at data point 120. Thus, for purposes of the invention as described, biasing the design data by a single grid step of 25 nm to point 110 provides the appropriate coarse adjustment to the transmission error. Three data points 111, 112, and 113 (in FIG. 7) show the effect of varying the etch back depth in order to remove the residual transmission error after completing the coarse adjustment. This so-called fine adjustment of the etch-back depth is, in effect, continuously adjustable through control of the etch time. Arbitrary small transmission errors can thus be achieved through good process control during the etch back or through multiple sampling of the transmission error in order to provide feedback correction during the fine-tuning process (progression from 110 through 113, in FIG. 7). By way of example, point 113 at an etch-back depth of 275 Å has a transmission error of less than 1%.
In the preferred embodiment of this invention, the coarse adjustment used to reduce the transmission error is realized through a computer-aided design (CAD) system in which some or all of the edges of the chrome patterns which define a phase-shifted feature of reduced transmission with respect to a non-phase-shifted feature are moved in a direction which increases the transmission through the phase-shifted feature. A representative procedure for the design manipulations is shown in FIG. 8A for dark-field patterns, and in FIG. 8B, for bright-field patterns.
Referring to FIG. 8A, clear shapes 140 and 150 are preferably shown to be of equal size but of different phase, as indicated by the surrounding second-level write phase shape 155. In the design manipulation of this pattern, clear shape 150 is increased in size to become clear shape 250. The corresponding second-level write shape 155 defining the phase of 250 is also increased in size to become phase shape 255. In the bright-field pattern shown in FIG. 8B, chrome shapes 310 and 320 bound non-phase-shifted space 340, while chrome shapes 320 and 330 bound space 350, which is phase-shifted as identified by encompassing second-level write phase shape 360. The coarse bias adjustment is made to increase the size of space 350 by moving the adjacent edge of chrome shape 320 to create chrome shape 420 and by moving adjacent edge of chrome shape 330 to create chrome shape 430. The size of phase shape 360 is correspondingly increased to shape 460.
The amount of any edge bias could, in general, depend on the stepper parameters (λ, NA, σ, etc.), the design grid size, the pattern to be printed (size, shape, distance to adjacent shapes, and the like), and may be predetermined by techniques such as using AIMS (aerial image measurement system) to make direct aerial image measurements of the test mask (which results are shown in FIG. 7). While direct measurements with the AIMS tool is a preferred method for establishing biases because of the speed and accuracy of such a technique, other methods comprising wafer exposures and subsequent measurement of a test mask, simulations that account for the electromagnetic scattering effects (e.g., TEMPEST as described in the aforementioned article by Wong and Neureuther), or prior experience on similar patterns can also be applied with equal success. For finer design grids, wherein multiple biasing options may be available, consideration of the mask manufacturing issues (process control, stability of the chrome overhang, mask inspection for defects, and the like) in relation to the extent of the wet etch required to perform the fine adjustment of the transmission balancing, may have a strong impact on the selection of the bias value.
While the preferred method of performing the coarse adjustment biases is through the application of an automated CAD system which may include sophisticated pattern-dependent correction schemes analogous to optical proximity correction (OPC) algorithms, another embodiment includes the design manipulation occurring via manual designer intervention, such as may be the case of a DRAM cell pattern, wherein a single instance of a pattern is hierarchically replicated many times across the mask.
With regard to the fine adjustment procedure, the preferred implementation of the etch-back process uses an isotropic immersion etch. In it, the quartz substrate etches uniformly in all directions, the chrome film is not attacked, and reasonable process control through variation of the etch time is achievable. The application of a solution such as (but not limited to) diluted HF is capable of meeting these requirements. In the preferred embodiment of this invention, an iterative procedure is used for the wet-etch step in order to achieve the maximum degree of transmission balancing and the AIMS tool is used to provide feedback of the transmission error between iterations such as demonstrated in the three-step fine-tuning process of FIG. 7. With sufficient process control and/or prior experience wherein the desired etch-back depth is well known, a single etch-back step with no feedback can also be applied. In other embodiments of the iterative procedure, alternative feedback measurements besides the AIMS tool are possible such as from direct measurement of exposed wafers.
While the preferred embodiment has been described with reference to an initial mask blank comprised of a transparent substrate coated with an opaque layer, in another embodiment of this invention, one or more layers are included as part of the mask blank between the transparent substrate and the opaque layer as exemplified by the approach described in the aforementioned article by Chieu et al.
In the etch-back process assumed for the schematic of FIG. 6, both the phase-shifted 41 and non-phase-shifted 42 openings are equally subjected to the isotropic etch such that the phase relationship established by the initial anisotropic etch of the quartz (depth of etched-quartz trench 15 in FIG. 2B) is maintained. This method is expected to provide the tightest phase control as well as the easiest implementation for direct feedback measurements (if the phase-shifted and non-phase-shifted features need to be processed differently during the etch back, the resist 50 of FIG. 2A may need to be selectively patterned between each feedback measurement).
Another embodiment of this invention is illustrated in FIG. 9. Similar results can be obtained by either selectively applying the etch-back process only to the phase-shifted patterns 41 or by using a single, partially-anisotropic etch, which not only establishes the depth of the etched-quartz trench 15 of the phase-shifted opening 41, but also the etch-back depth "d" simultaneously.
While this invention has been described with reference to preferred embodiments thereof, it is to be understood that the method of the invention is not limited to the precise details and conditions disclosed and that various changes and modifications, may be made without departing from the spirit of the invention which is defined by the claims that follow.
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The Broadway Season
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Arkaios CrossfitRead MoreEquipment: Sorinex rig Students should bring: towel Average class length: 60 minutes Number of Staff: 5?10 people Class location: Mix of indoor and outdoor classes Established: 2013 Registration required: Yes Good for beginners: Yes Guests allowed: Yes Parking: Parking lot Pro Tip: Come a few minutes early to fill out a liability form. Q&A with Monique, Co-owner Exercise is challenging, and people frequently give up on their fitness routines. How do you keep clients motivated? [We have] different workouts every day. We do beach workouts [and] workouts dedicated to fallen military personnel. [We] also offer kids' classes. CrossFit is a great way to meet people who have similar goals as you. What is the biggest mistake you see people make when trying to get fit on their own? Not being dedicated and understanding it will be hard work. It's hard work to change your habits, but the payoffs are worth it. Also, people tend to not have proper form when working out on their own, which can lead to injuries. Safety is our utmost concern for our members. Besides working out, what else can clients do to spend their time at your facility? Hang out, socialize and mobilize. Is there anything else you want to add that we didn't cover? We offer an unsupervised kids room. We also offer personal training, and we will have a strength room with programming as we grow.94-137 Leoleo St.Waipahu, HI US
CrossFit Ewa BeachRead MoreWalls of hard concrete line the perimeter of CrossFit Ewa Beach's 6,000-square-foot facility, symbolizing the strength and endurance that exercisers strive to achieve as they sculpt their muscles with barbells, kettlebells, and pull-up bars. Here, seasoned trainers espouse functional training techniques that augment everyday movements such as pushing, squatting, and lifting with exercises inspired by Olympic sports such as gymnastics and full-contact badminton. Head trainer Noel Famy, a Level 2 CrossFit instructor and former Marine, transforms groups of strangers into teammates who motivate one another through moments of intimidation and fatigue. Most workouts last less than 40 minutes and can be tailored to a variety of ages and fitness levels. Famy also propels clients toward their goals during personal-training sessions filled with custom-built workouts and nutritional consultations. His nutritional advice revolves around Whole9's version of the Paleo Diet, a nutrition regimen based on Stone Age humans' diet of wild plants and fried velociraptor eggs.2114 Lauwiliwili StreetKapolei, HI US
CrossFit OahuRead MoreAs one of CrossFit's first proponents on the island, Bryant Powers was just happy to find some friends to work out with. After discovering fellow CrossFit buffs online, Bryant began hosting group workouts in Kapiolani Park with his friends Craig and Hollis. Although only two people attended that first class, the trio kept hosting classes, shuttling between the park and Bryant's garage, until they had a large enough following to open their own gym. Several years later, CrossFit Oahu now operates five locations spread across the island and cultivates a community devoted to results-oriented fitness. Incoming students work their way up to intense WODs with instruction in Olympic lifts and proper form. Passionate instructors help busy working professionals burn fat and build muscle, or ramp up workouts in preparation for CrossFit competitions. Members also cross-train in MMA striking, mountain climbing, or extreme rolodexing.1201 Ala Moana BoulevardHonolulu, HI US
HI Town FitnessRead MoreHonolulu born and raised, CrossFit HTF/HI Town Fitness's owners Ian Ajimine and Clarence Chee opened their 2500 sq ft facility to help students of all ages and ability levels learn the Crossfit program. Ajimine brings the intensity of his Army Ranger training to each regimen, and Chee backs him up with triple CrossFit certifications in basic training, kettlebell, and gymnastics. With a program that stays fresh by constantly chaning, they challenge students to whip around heavy battle ropes, heft their own bodyweight, and outrun local sea monsters during high-energy one-hour boot camps.2320 S King St.Honolulu, HI US
The Art of Fitness HonoluluRead MoreWeight and cardio machines stand at attention in The Art of Fitness's intimate workout space, where guests sweat through intense sessions accompanied by their MP3 players or the gym's trainers. The trainers turn to TRX bands, rowing machines, spinning bikes, and ladders during both private training sessions and PowerCircuit group classes, and focus on strengthening the entire body, not just a single underperfoming eyebrow.627 South St., Ste 205Honolulu, HI US
MetaBody Yoga & Fitness PassRead MoreWhen Roald Dahl wrote Charlie and the Chocolate Factory, he imagined a much-coveted golden ticket that granted access to myriad wonders and unveiled the inner workings of an entire industry. MetaBody created a real-life version of that ticket with the MetaBody Yoga & Fitness Pass, though it applies to fitness instead of candy. The pass grants access not to a single gym but to classes at a variety of local studios, specializing in everything from yoga to boot camp. With the freedom to move from location to location, students can sample different regimens, instructors, and styles of exercise to cobble together a program that fits their needs and goals. MetaBody's nutritionists supplement class packages by coaching clients in healthy eating, recipe cooking, and speed-reading nutrition-fact labels.46-56 Kamehameha HwyKaneohe, HI US


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iWatch specs and components show up on Reddit
There's just one day to go until Apple reportedly unveils its long-awaited iWatch and — as if anticipation couldn't be any higher — a Reddit user just posted what he claims to be half a dozen technical images of Apple's wearables device.
The user claims that the device will feature a microphone, speaker, and Siri virtual assistant. It is also reported that there will be a flexible multi-touch screen, that it will be waterproof to a depth of 20 meters, and that Apple will announce the availability of 4 colors and 2 different sizes.


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May 27, 2014
Celgene mentioned positively at RBC Capital
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June 29, 2015
On The Fly: After Hours Movers
HIGHER: Juno Therapeutics (JUNO), up 38.4% after announcing immunotherapy collaboration with Celgene (CELG)... Kite Pharma (KITE) and Lion Biotechnologies (LBIO) are up 8.7% and 5.7% respectively, following Juno's collaboration with Celgene. DOWN AFTER EARNINGS: CHC Group (HELI), down 8%... Apollo Education (APOL), down 6.2%. ALSO LOWER: EnteroMedics (ETRM), down 12.4% after filing to sell common stock and warrants... Celgene (CELG), down 1% after Juno announces immunotherapy collaboration.
Juno surges after Celgene collaboration, CAR-T peers follow
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Celgene, Juno Therapeutics announce ten year collaboration
Celgene (CELG) and Juno Therapeutics (JUNO) announced a global collaboration for the development and commercialization of immunotherapies. The two companies will leverage T cell therapeutic strategies to develop treatments for patients with cancer and autoimmune diseases with an initial focus on Chimeric Antigen Receptor Technology and T Cell Receptor technologies. Under the terms of the collaboration, Celgene has the option to be the commercialization partner for Juno's oncology and cell therapy auto-immune product candidates, including Juno's CD19 and CD22 directed CAR-T product candidates. B-Cell Maturation Antigen is excluded as a target in this collaboration. Under the terms of the collaboration, Celgene has the option to be the commercialization partner for Juno's oncology and cell therapy auto-immune product candidates, including Juno's CD19 and CD22 directed CAR-T product candidates. B-Cell Maturation Antigen is excluded as a target in this collaboration. For Juno-originated programs co-developed under the collaboration: Juno will be responsible for research and development in North America and will retain commercialization rights in those territories; Celgene will be responsible for development and commercialization in the rest of the world, and will pay Juno a royalty on sales in those territories; and Celgene has certain co-promotion options: Celgene will initially be eligible to select two programs, excluding CD19 and CD22, to be subject to a global profit sharing agreement under which the companies will share worldwide expenses and profits equally, except in China; and Additionally, subject to additional obligations, Celgene may select a third program. Juno will have the option to enter into a co-development and co-commercialization agreement on certain Celgene-originated development candidates that target T Cells. For any such Celgene-originated programs co-developed under the collaboration: The parties will share global costs and profits with 70% allocated to Celgene and 30% allocated to Juno; and Celgene will lead global development and commercialization, subject to a Juno co-promote option in the US and certain EU territories. Upon closing, Juno will receive an upfront payment of approximately $150M, and in addition Celgene will purchase 9,137,672 shares of Juno's common stock at $93.00 per share. In conjunction with this stock purchase: Celgene will receive the right to nominate a member to Juno's board of directors; During the 10-year term of the collaboration, Celgene will have the right to purchase additional equity in Juno during specified windows and at specified market premiums subject to satisfaction of certain conditions by each party including Juno opting in on select Celgene programs, such that, at a maximum, Celgene could own up to 30% of Juno's common stock then outstanding; and Celgene has entered into a standstill agreement and agreed to certain lock-up provisions on its share ownership. This transaction has been approved by the boards of directors of both companies. Celgene and Juno currently expect to complete the transaction during the third quarter of 2015, subject to the expiration or termination of applicable waiting periods under all applicable antitrust laws and satisfaction of other usual and customary closing conditions.
Juno jumps 45% after announcing immunotherapy collaboration with Celgene
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June 26, 2015
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June 17, 2015
Celgene announces additional $4B share repurchase authorization
Celgene Corporation announced that during its June meeting the company's Board of Directors authorized the repurchase of up to an additional $4B of the company's common stock. This open-ended program is effective immediately. Purchases may be made in the open market or in privately negotiated transactions from time to time, as determined by Celgene's management and in accordance with the requirements of the Securities and Exchange Commission. Celgene now has a total of approximately $5.2B remaining from previous authorizations plus the new authorization. Since 2009, Celgene has returned approximately $12.3B to shareholders through the repurchase program.
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Business start-ups were at a 14-year high in 2009 according to the Ewing Marion Kauffman Foundation. The Foundation also reported that those in the 54-66 age group were the most likely to start a new businesses!
Why now and why this group?
There are many good reasons for Baby Boomers to start businesses now, says Mary Beth Izard, entrepreneur, author of BoomerPreneurs: How Baby Boomers Can Start Their Own Business, Make Money and Enjoy Life, and professor emeritus of Johnson Community College in Overland Park, Kansas.
Some Boomers may have recently retired and want to shore up their depleted retirement accounts or supplement their income. Others may have recently lost their jobs and think a better option is to create their own. In addition, according to Izard, they also have these six things going for them:
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Amiable Unhitching, With a Prod
By JANE GROSS
Published: May 20, 2004
WHITE PLAINS— MICHELLE GESKY'S first divorce took three years, tens of thousands of dollars and incalculable heartache. A settlement was reached before trial, but not without appearances before the judge and the assignment of a social worker to defuse a thorny custody issue.
Now Ms. Gesky, 41, is divorcing again, determined ''to get past the emotion and not make what is already terrible worse.'' She also wants all three of her children, two from her first marriage and one from her second, to be spared the acrimony.
Her husband, Tom, 36, does not bear the same scars. But he, too, hopes for a divorce where the couple ''can care for each other afterward, like the friends we once were'' and congenially raise their infant daughter.
With those goals in mind, the Geskys decided to try a process called collaborative divorce. Invented more than a decade ago by Stuart G. Webb, a burned-out Minneapolis matrimonial lawyer, it is gaining in popularity around the nation and has recently made its way to New York State.
On a recent evening, at a four-way negotiating session in White Plains with their lawyers, the couple sat shoulder to shoulder on adjoining chairs. It was a peaceful tableau. They didn't recoil from each other's touch. Nor did they bicker or fall silent at moments of disagreement.
Already they had made progress toward decisions about selling their house, dividing their pensions and designing a joint child custody arrangement.
They were considering their daughter's changing needs: nursery school soon, later ballet or bassoon lessons, boyfriends, college. The lawyers chimed in with what-ifs. A stranger in the room could not have told which lawyer represented which client.
''I've lived through the process of a contentious, adversarial, drawn-out, money-hungry divorce, and it's devastating,'' Ms. Gesky said. ''This time I don't want that pain. I want clarity and release.''
Collaborative divorce is now available in 35 states and much of Canada. According to Mr. Webb, who simultaneously gave up litigation and became a Buddhist, 4,500 lawyers nationwide have been trained in the protocol, which halves the legal costs of divorce. New York, where state laws make dissolving a marriage costlier and arguably nastier than anywhere in the nation, is a relative newcomer, with collaborative lawyers first taking cases about two years ago.
In some ways, the method resembles mediation in its problem-solving approach. But rather than a neutral mediator, each party brings a lawyer to the sessions, as advocate and adviser. But the very format changes how lawyers behave.
''We are by nature competitive,'' said Barry Berkman, who organized the first group of collaborative divorce lawyers in New York City and Westchester County after learning about the process at a California symposium. ''Otherwise we'd be botanists.''
Most matrimonial lawyers measure success by who won, and for how much. ''This is different,'' he said. ''Success is a resolution that works for both parties.''
The cornerstone of the process -- and its most controversial element -- is that the two lawyers sign a pledge to withdraw from the case if either of their clients decides to go to court. This gives the lawyers an economic incentive to leave adversarial habits behind. It also encourages clients to stay at the bargaining table, since bolting means starting over with new counsel.
Collaborative divorce also requires a full disclosure of assets and respectful behavior at all negotiating sessions. Yelling, table-pounding, threatening and stalling are against the rules.
The settlement is shaped by figuring out what works for the couple. One husband split an inheritance with his wife to break a logjam, although he was not required to by law. One wife gave ground on weightier items because her husband agreed to continue changing the screens and storm windows every year.
Because this is not how most lawyers think, Mr. Berkman said, those practicing collaborative divorce generally meet in the equivalent of support groups. The 40 lawyers in New York City and its northern suburbs gather monthly to discuss their shared cases.
At one recent meeting in White Plains, Amy Carron Day and Marc Fleisher figured out how to lower the decibel level by beginning sessions with safe topics and coaching the husband to show more support for his quick-to-anger wife. At another meeting, Robin Carton explained to Neil Kozek that her client felt he was ''saber rattling'' when he made reference to what might happen if they went to court, a tactic collaborative lawyers are supposed to leave behind.
There is no nationwide tally of how many cases have been settled this way, and leaders of the movement are only now talking of the need to collect systematic data. But they point to the dramatic experience when collaborative divorce was introduced in Medicine Hat, in the Canadian province of Alberta.
All 29 of the lawyers who regularly practice matrimonial law in Medicine Hat, population 51,000, have now been trained in the collaborative process, according to Janis Pritchard, the first president of the collaborative lawyers' association there, who describes herself as a former ''barracuda litigator.''


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44 year old man | Columbia, MD, USA | Seeking women 30-48 within 20 miles of Laurel, MD
Active within 1 week
Looking to make new friends (and hopefully more)
Hello. I am a kind, good hearted guy looking to meet a lady who is the same. If you enjoy laughing, going to a movie or watching a football game I might be the guy for you. I have a 5 year old daughter who means the world to me. I am originally from Pittsburgh (go Pitt) but have lived in the Baltimore/DC area for nearly half my life now. Anything else you would like to know please let me know.
Movies/Videos , Music and concerts , Playing cards , Travel/Sightseeing , Watching sports
Basketball, Football, Walking / Hiking
I exercise 1-2 times per week.
I have Dogs
I have an 8 year old lab.
Not much into the club scene, but do enjoy going to local pubs to have a beer and hang out with friends.
Favorite current TV shows are Sons of Anarchy, Vegas and The Mentalist. My musical tastes span everything from Billy Joel, to Guns n Roses, to Jay-Z.
I enjoy going to and watching football and basketball games. I also go fly fishing when time allows. I am open to new experiences as well.
Z{{Cta}} {{#if HasMoreInfo}} ?{{CtaSecondary}} {{/if}}
|What he is looking for
|6'0" (182cms)
|5'0" (152cms) to 5'11" (180cms)
|Body type:
|About average
|Slender, About average, Curvy, Athletic and toned, A few extra pounds
|No preference
|No preference
|No Way
|No Way
|Social Drinker
|Social Drinker, Moderately
|Medical / Dental / Veterinary / Fitness
|No preference
|$50,001 to $75,000
|$35,001 to $50,000, $50,001 to $75,000, $75,001 to $100,000, $100,001 to $150,000, $150,001+
|Currently Separated
|No preference
|Have kids:
|Yes, and they live at home (1)
|No preference
|Wants kids:
|Not sure
|Probably not, No, but it's OK if my partner has kids
|White / Caucasian
|No preference
|Christian / Protestant
|No preference
|Bachelors degree
|No preference


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Pronunciation: /ˌɛʃtrəməˈdʊərə/
Entry from British & World English dictionary
Words that rhyme with EstremaduraAngostura, Bonaventura, bravura, Bujumbura, caesura, camera obscura, coloratura, curer, Dürer, durra, figura, fioritura, Führer, insurer, Jura, juror, Madura, nomenklatura, procurer, sura, surah, tamboura, tempura, tourer
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For cost effective coating on large areas.
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text: Antique Gold Ceramic Charm Necklace by Eve&Fox £21.95$45.94€31.89$35.72 In stock free gift wrap This item is not available for delivery to United States. quantity by Eve&Fox Location: Leicestershire, GB read seller's profile see seller's complete range more items from this seller Sterling Silver Swallow Necklace £28.95$60.59€42.06$47.11 Pink Meadow Earrings £18.95$39.66€27.53$30.83 Amethyst Stone Star Bracelet £18.95$39.66€27.53$30.83 Druzy Stone Amethyst Heart Necklace £24.95$52.22€36.25$40.60 'Have Faith' Amethyst Bracelet £24.95$52.22€36.25$40.60 Swan Lake Locket Necklace £21.95$45.94€31.89$35.72 view all you may also like PRODUCT DETAILS DELIVERY RETURNS Made in Britain free gift wrap exclusive ask seller a question save for later A stunning handmade ceramic necklace with a sweet gold swallow charm and pearl heart. This lovely necklace would make a lovely present for a friend or loved one, or as a gift to treat yourself! Comes on a 18 inch Sterling Silver fine chain that has been 18ct gold dipped. All items are beautifully gift wrapped and come in our signiture 'Eve and Fox' boxes Matching Earrings are also available. made from: ceramic, sterling silver, antique gold charm, pearls product code: 129635 This product is dispatched to you by Eve&Fox. MAINLAND UK order now and receive this item on or before price Standard Delivery Wednesday 8 July £1.75$3.66€2.54$2.84 Two Day Delivery Thursday 9 July £5.70$11.93€8.28$9.27 NON-MAINLAND UK estimated delivery price Highlands & Islands of Scotland 2-5 working daysfrom dispatch £1.75$3.66€2.54$2.84 Northern Ireland 2-5 working daysfrom dispatch £1.75$3.66€2.54$2.84 Other UK Islands 2-5 working daysfrom dispatch £3.95$8.26€5.73$6.42 INTERNATIONAL DELIVERY estimated delivery price Not currently available for this region You have 28 days, from receipt of cancellable goods, to notify the seller if you wish to cancel your order or exchange an item. Please note: goods that are personalised, bespoke or made-to-order to your specific requirements, perishable products and personal items sold with a hygiene seal (cosmetics, underwear) in instances where the seal is broken are non-refundable, unless faulty. Read more about our returns policy.Should you choose to return or exchange your order you will need to deliver the item(s) to the UK, where this seller is based. Eve&Fox's return policy


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From Our Editors
A former Miss Seattle, board-certified physician Dr. Amy Miller knows firsthand how important it is to feel confident in your own skin. Having always possessed an interest in skincare and a desire to help others feel beautiful, she traded her pageant gown for a white lab coat and now spends much of her time training other physicians in the use of medical lasers. At St. Louis Skin Solutions, Dr. Miller helms a small staff that includes a licensed aesthetician and supervises all skin treatments, including laser hair and tattoo removal, Botox, and cellulite reduction. Beyond cosmetic enhancement, staff use their skincare expertise to screen for skin cancer, and can also harness laser energy to remove spider veins that don't respond to being slapped with a shoe.


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Candlewood Suites La Crosse
Candlewood Suites La Crosse
Walk Downtown from this Hotel's La Crosse Location
If you're looking for extended stay hotels in La Crosse, choose the Candlewood Suites® La Crosse, WI hotel and you may be able to forget a rental car. Located within walking distance of popular businesses and restaurants in historic downtown, Riverside Park on the Mississippi and Queen Cruise riverboat tours, this La Crosse, WI hotel is your ticket to endless entertainment options during your stay.
Corporate travelers can take advantage of convenient access to I-90, US Hwy-53 and Hwy-35, which lead to many of the area's major businesses. From this La Crosse, Wisonsin hotel's location, you can easily travel to Kwik Trip Corporate Headquarters, SAP Business Objects and Trane Company/Ingersoll Rand. Franciscan Skemp Healthcare/Mayo Clinic and Gundersen Lutheran Hospital are also just a short drive.
You'll never go hungry with popular local restaurants like The Waterfront, Piggy's and The Freighthouse within walking distance of the hotel. Even college visits are easy with this La Crosse, Wisconsin hotel's proximity to UW La Crosse.
You can work off the stress of a long day in the state-of-the-art Fitness Center. After you work up a sweat, you can refuel your body and cook out with the gas grills in the outdoor pavilion area. Return to a comfortable suite and use the free Wi-Fi access to email your family about your trip. Don't hesitate; make your extended stay La Crosse reservations today.
Quick Info
- Check In: 3:00 PM
- Check Out: 11:00 AM
- Minimum Check-In Age: 18
- Late Check Out Available
- Parking: Free
- Print Fact Sheet
- Chat With Us
Important Update[{"start": "1265864400000","end":"1275710400000", "desc": "
The Candlewood Suites La Crosse is now open."}]
- On-site Guest Self-Laundry Facilities
- Housekeeping Full Service
- Standard Wireless Internet service is free for all members
- On-site Fitness Center Available
It's hard to leave your best buddy at home when you're traveling for extended periods, so we provide a pet friendly experience. Restrictions and fees apply.
Whether you are booking suites for a family reunion or suites for your company's training needs, Candlewood Suites hotels can accomodate your group.
Workout whenever you want: Candlewood Gym always has an open door and lots of aerobic and cardio equipment to make it easier to stick to your exercise routine, no sweat.
At Candlewood Suites® hotels, we want you to experience comfort in every sense.
Getting Here
Guest Reviews
Overall Experience
First stay at Candlewood...staff a turn off!
ByBill... Lost in LaCrosse
July 03, 2015
Since this was our first stay at a Candlewood suite we were not familiar with procedures for refreshing towels and bedding. We were given conflicting information from the front desk and from housekeeping about this. Upon check in, I asked where I could get ice and the desk clerk told me to "flip down the lever in the freezer in your room." Since we needed ice, we had to go to a local convenience store and buy it! The front desk staff had very little knowledge of the local area. Don't go to this hotel if you are from out of town and want to get suggestions about restaurants, local attractions, etc.
Enjoyed the stay!
June 22, 2015
Clean and comfortable rooms. Front desk staff friendly and professional.
good snacks
June 17, 2015
good choice and none were out of date. Clean area.
Restful Stay
June 16, 2015
One of the nicest hotels in town right in the middle of it all. Was greeting very well when I arrived and needed some ice. Person at front got me some ice from the back. Clean place, friendly atmosphere. Would and will stay here again next time I'm in town.


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Tue January 22, 2008
Memphis Moment: The Lorraine Motel
By Steve Pike
Memphis, TN – The Lorraine Motel, the site of Dr. Martin Luther King's assassination, has had a long uneven history. When the hotel first opened in the 1920's, it was called the Windsor. In the era of Jim Crow segregation, it was one of the few hotels which welcomed black travelers.


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Marcus Samuelsson's Streetbird Rotisserie Opens This Thursday
It's a chicken mecca.
It's a chicken mecca.
It will stop using chickens raised on human antibiotics in the next two years.
It's called Papa Poule.
Consumer Reports says your chicken is sick, and may make you sick, too.
Chicken tumbling is the new "pink slime."
The newest chicken dishes at New York restaurants are grand birds competing for prime menu space with steaks and other large-format dishes.
The New York senator says USDA documents signify a new era of Chinese chicken.
The Chinese processors that were issued permits are in compliance with food-safety rules, the USDA says.
Some chickens are about to take a long walk off a very short pier.
Though the peasants were far nicer.


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New Program Development Coordinator for Nursing Program
Dr. Michael G. Scales recently announced the appointment of Dr. Inseon Hwang as Program Development Coordinator and Assistant Professor in Nyack's nursing program, which will grant the Bachelor of Science in Nursing. Thrilled with this new appointment, Dr. Scales says, "We are blessed beyond measure to have found someone like Dr. Hwang. In addition to her exceptional education, credentials, and experience, her ability to work in a multi-cultural setting is outstanding and consistent with our core values."
Dr. Hwang earned her Doctor of Nursing Science degree at Columbia University School of Nursing and both the Bachelor of Science and Master of Science degrees in Nursing at Ewha Womans University in Seoul, Korea. She is a member of Sigma Theta Tau International, the Honor Society of Nursing, and was a recipient of the Predoctoral Minority Fellowship from the National Institutes of Health.
A registered nurse in both New York and California, she is currently a family nurse practitioner and a facilitator for the Visiting Nurse Service of New York. Dr. Hwang has co-authored several published papers, which have appeared in professional periodicals such as the American Journal of Public Health and the Journal of Public Health Management Practice. She has also made presentations at the Mid-Atlantic Meeting of the Society of General Internal Medicine and the American Public Health Association.
Committed to community outreach, Dr. Hwang serves as a volunteer nurse for the Korean Community Services of Metropolitan New York. She previously volunteered with AIDS Case Management at Westside Community Mental Health Center in San Francisco, CA and at the Community Health Center in Ewha Womans University in Seoul, Korea.
Dr. Hwang's office is currently located in Shuman Hall on the Rockland County campus.
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Matthew H. Steele, MD
Ratings based on 64 reviews
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Are you a patient of Matthew H. Steele, MD?
Reviews (64)
5 out of 5 stars Breast Lift with Implants
Sientra Smooth Moderate Round 320cc - Weatherford, TX
Show More Dr. Steele has such a calming, sincere and attentive bedside manner. He and his friendly staff answered all my questions and kept me informed on what to expect. Together, Dr. Steele and I chose the Sientra Smooth Moderate Round 320cc. I was 100% on the Sientra brand, as their implant utilizes "High-Strength Cohesive Silicone Gel," a natural feel & look, and offers the best warranty in the industry. After careful, precise measurements and listening to my desires and explanation of my active lifestyle, Dr. Steele recommended the size and shape of the implants. His recommendation was right on and my new breasts look and feel naturally beautiful!
5 out of 5 stars Sientra Breast Implants
29 No Kids, Sientra 465CC. Fort Worth, TX
5 out of 5 stars Breast Implants
30 Year Old Mom of 2, in Need of Some Volume! Fort Worth, TX
Show More Dr. Steele is great. Spent time with me and answered mine and my husbands questions. All the ladies in the office were great. I wanted to schedule my BA as soon as possible and they were able to work with me and get me an appt for 11 days out! I can't wait to see the results. Will post a further update/review after the procedure. 2/25/15 - had my BA today! Dr Steele is amazing and very patient. The surgical center and staff are very nice. 3/3/15 - It has been a week since my surgery and I still can't say enough about Dr. Steele. He has been very helpful and professional through this whole process. His nurse is super sweet and always calls me back promptly to answer my silly questions! 4/10/15 - 6 weeks out this week! Doing great. Healing good. Saw Dr Steele today and as always answered my questions! Dr. Steele is highly recommended in my book!
5 out of 5 stars Breast Augmentation
Deflated Breasts After Breast Feeding... Needed Volume!! - Weatherford, TX
5 out of 5 stars Breast Lift with Implants
47 Year Old Who Desired Perkier Breasts - Fort Worth, TX
Show More I can't say enough great things about Dr. Steele and his staff, especially Cindy, his assistant. They both are so patient and make you fell comfortable. My surgical results are amazing. He truly is an artist when it comes to breasts.
5 out of 5 stars Restylane Silk
Almost 41 - Fort Worth, TX
Show More Dr. Steele is very personal and professional! He's very detail oriented and quite the perfectionist! I've been to other plastic surgeons and I think the perfectionist quality is extremely important!
5 out of 5 stars Male Tummy Tuck
From Saggy Flab to Sculpted Abs: Lipo + Abdominoplasty with Dr. Steele - Fort Worth, TX
Show More More than anything else Dr. Steele listened and paid attention to what I wanted out of the procedure and what I needed based on my situation. He went above and beyond to make sure that the areas which really bothered me (my flanks) came out looking as flat as possible. He and his staff facilitated every aspect of my procedure, what was expected of me, and what I could expect. I can thankfully say I've had no complications and nothing but a positive result. Thanks Dr. Steele and the staff of Plastic Surgery Texas!
5 out of 5 stars Breast Augmentation
38 Year Old That Was in Need of Some "Perk" in Her Life! - Fort Worth, TX
Show More Dr. Steele was always on time and he always answers my questions. His scheduler, Cindy, is wonderful too.
5 out of 5 stars Breast Reduction
Too Big and Droopy - Fort Worth, TX
Show More Polite and professional. Put me at ease.
5 out of 5 stars Breast Reduction
33 Yr Old Athletic Woman, 36F with Lots of Back Pain - Weatherford, TX
Show More Dr Steele was great. He was always very kind and professional. I never had to wait at my appointments, which is a huge deal to me.
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From a recording I'm demoing at the moment.Alto sax part 1 (two sax parts, two clarinet parts) at 103 bpm. ...
Good quality zombie's sound.
The sound of a Hohner Blues Harp harmonica. Key of Bb.
Narasimha has been playing Nadaswaram (world's loudest non-brass acoustic instrument - https://en.wikipedia.org/wiki/Nadaswaram) in the streets of Hyderabad for the past ...
This is an acoustic violin loop recorded with GarageBand.
Harmonica tones and variations of chords.
The second sample in the series. The format is ready to use in sampletank but obviously can be imported to ...
Harmonica recorded in mono with my AKG C214 on my stair case for that oakey timbre.
some flute playing, no eq,delay or reverb.Add fx,edit and loop!
Slide guitar speeded up, sounds a bit like a ukulele.
I recorded as 2 females and myself took turns playing and torturing a violin.
Voldemort Imitation Scream
Short musical phrase played on an alto saxophone. It is a phrase of a jazz ballade.
sax short phrase from aspma repository
Tenor Saxophone riff, recorded using behringer B1 microphone through a Behringer 802A mixer onto a PC with a Terratec EWX2496 ...


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Qeep is the best place to meet cool new people, chat with friends, and flirt and get flirted with! Millions of hot girls and guys are waiting for you.Browse online profiles and photoblogs, share your own photos, and make friends right around the world. Dive into social gaming with FriendZoo and Darkville, or challenge other qeepers to a quick online game of Crazy8s, Tic Tac Toe or Battleships. With 10,000s of new users to meet every day.
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Half-Pinay Bond girl visits Baguio City
MANILA, Philippines – Los Angeles-based actress Rachel Grant, best known for her stint as a Bond girl in the movie "Die Another Day," is currently in Baguio City, where she revealed that she is actually half-Filipino.
|Los Angeles-based actress Rachel Grant visits Baguio City.
Showing off an abel Iloco weave, Grant went around the city (left), which is just an hour's drive from her mother's hometown of San Juan, La Union. Meanwhile, her grandparents hail from Aringay, also in La Union.
"Yes, my mom is from La Union, and I can remember that we always go there during the '80s," she told ABS-CBN News.
In her entry on the movie database, imdb.com, Grant's mother is listed as Isabel Padua, "a Filipina of Spanish descent," who is "distantly related to Filipino celebrities Martin Nievera, Joanne Lorenzana, Alma Moreno and the late Alicia Vergel."
Her bio also mentioned a sister, Angela Grant de Longeuil, an international model for CalCarries, who has appeared in fashion shows in the Philippines and taught flamenco and ballet in Parañaque.
Grant got her big break in the British TV series, "Sci-Fright," in 1999 and was cast as a would-be assassin who poses as a masseuse in the 2002 film "Die Another Die" with Pierce Brosnan as James Bond.
Although Grant grew up in the English town of Nottingham, Grant said she was born in Manila. She even said they would regularly serve the popular Ilocano dish, dinengdeng, at home.
The last time she was in Baguio and La Union was back in the '80s and she immediately noticed the changes. But nonetheless she said she would always remember the rich culture of Baguio.
"We are doing our best so that the children will be able to continue appreciating the culture of the city," she said.
Grant is set to leave for New York, where she will spend Christmas and continue her charity work for children. -- From a report by Ada Sibayan, ABS-CBN News Baguio


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Itunes movie trailers: New trailer for [IDTHF]
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Itunes movie trailers: New trailer for [IDTHF] gardavou on Dec 18, 10:02
yup, still looks pretty awful {nm} lapuckfan on Dec 18, 13:55
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