text:
The present invention relates to an enhanced cyclic deposition process suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive films. The technique increases the chemical reactivity of a precursor used in the process.
1. A sequential method for depositing a film onto a substrate in a deposition chamber comprising:
(a) introducing a reactant gas into the chamber to adsorb at least one layer of the reactant gas onto the substrate;
(b) removing any excess reactant gas from the chamber;
(c) during at least step (a) and prior to the adsorption of the at least one layer of the reactant gas on the substrate, exposing the reactant gas to ions generated from a first ion-generating feed gas to increase the chemical reactivity of the reactant gas;
(d) introducing a second ion-generating feed gas into the chamber;
(e) introducing at least one radical-generating feed gas into the chamber;
(f) generating a plasma from the second ion-generating feed gas and the radical-generating feed gas to form ions and radicals;
(g) exposing the substrate to the ions from the second ion-generating feed gas and radicals;
(h) modulating the ions from the second ion-generating feed gas; and
(i) reacting the adsorbed layer of the reactant gas with the ions from the second ion-generating feed gas and the radicals to deposit the film.
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12. A method for depositing a film onto a substrate in a chamber comprising:
introducing at least one reactant gas into the chamber to adsorb at least one layer of the reactant gas on the substrate;
during the introducing step and prior to the adsorption of the at least one layer of the reactant gas on the substrate, exposing the reactant gas to ions generated from a first ion-generating feed gas to increase the chemical reactivity of the reactant gas;
generating a plasma from a second ion-generating feed gas to form ions and a radical-generating feed gas to form radicals;
electrically biasing the substrate to a negative potential;
exposing the substrate to the ions from the second ion-generating feed gas and the radicals;
modulating the ions from the second ion-generating feed gas; and
reacting the adsorbed layer of the reactant gas with the ions from the second ion-generating feed gas and radicals to deposit the film.
13. The method of
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The present invention relates generally to the field of thin film deposition methods commonly used in the semiconductor, data storage, flat panel display, as well as allied or other industries. More particularly, the present invention relates to cyclic deposition techniques and apparatus suitable for deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high-dielectric constant (high-k) films, and other conductive, semi-conductive, and non-conductive thin films.
As integrated circuit (IC) dimensions shrink and the aspect ratios of the resulting features increase, the ability to deposit conformal, ultra-thin films on the sides and bottoms of high aspect ratio trenches and vias becomes increasingly important. These conformal, ultra-thin films may be barriers, liners, or seeds.
In addition, decreasing device dimensions and increasing device densities has necessitated the transition from traditional chemical vapor deposition (CVD) tungsten plug and aluminum interconnect technology to copper interconnect technology. This transition is driven by both the increasing impact of the RC interconnect delay on device speed and by the electromigration limitations of aluminum based conductors for sub 0.2 micron (μm) device generations. Copper is preferred due to its lower resistivity and higher (greater than 10 times) electromigration resistance as compared to aluminum. A single or dual damascene copper metallization scheme is used since it eliminates the need for copper etching and reduces the number of integration steps required. However, the burden now shifts to the metal deposition step(s) as the copper must fill predefined high aspect ratio trenches and/or vias in the dielectric.
Two major challenges exist for copper wiring technology: the barrier and seed layers. Copper can diffuse readily into silicon and most dielectrics. This diffusion may lead to electrical leakage between metal wires and poor device performance. An encapsulating barrier layer is needed to isolate the copper from the surrounding material (e.g., dielectric or silicon (Si)), thus preventing copper diffusion into or reaction with the underlying material. In addition, the barrier layer also serves as the adhesion or glue layer between the patterned dielectric trench or via and the copper used to fill it. The dielectric material can be a low dielectric constant, i.e., low-k material which typically suffers from poorer adhesion characteristics and lower thermal stability than traditional oxide insulators. Consequently, this places more stringent requirements on the barrier material and deposition method. An inferior adhesion layer will, for example, lead to delamination at either the barrier-to-dielectric or barrier-to-copper interfaces during any subsequent anneal or chemical mechanical planarization (CMP) processing steps leading to degradation in device performance and reliability. Ideally, the barrier layer should be thin, conformal, defect free, and of low resistivity.
In addition, electroplating fill requires a copper seed layer, which serves to both carry the plating current and act as the nucleation layer. The seed layer should be smooth, continuous, of high purity, and have good step coverage with low overhang. A discontinuity in the seed layer will lead to sidewall voiding, while gross overhang will lead to pinch-off and the formation of top voids
Both the barrier and seed layers which are critical to successful implementation of copper interconnects require the deposition of high purity, conformal, ultra-thin films at low substrate temperatures.
Physical vapor deposition (PVD) or sputtering has been adopted as a method of choice for depositing conductor films used in IC manufacturing. This choice has been primarily driven by the low cost, simple sputtering approach whereby relatively pure elemental or compound materials can be deposited at relatively low substrate temperatures. For example, refractory based metals and metal compounds such as tantalum (Ta), tantalum nitride (TaNx), other tantalum containing compounds, tungsten (W), tungsten nitride (WNx), and other tungsten containing compounds which are used as barrier/adhesion layers can be sputter deposited with the substrate at or near room temperature. However, as device geometries have decreased, the step coverage limitations of PVD have increasingly become an issue since it is inherently a line-of-sight process. This limits the total number of atoms or molecules which can be delivered into the patterned trench or via. As a result, PVD is unable to deposit thin continuous films of adequate thickness, control, and coverage to coat the sides and bottoms of high aspect ratio trenches and vias with the necessary degree of conformality. Moreover, medium/high-density plasma and ionized PVD sources developed to address the more aggressive device structures are still not adequate and are now of such complexity that cost and reliability have become serious concerns.
CVD processes offer improved step coverage since CVD processes can be tailored to provide conformal films. Conformality ensures the deposited films match the shape of the underlying substrate, and the film thickness inside the feature is uniform and equivalent to the thickness outside the feature. CVD requires comparatively high deposition temperatures, suffers from high impurity concentrations, which impact film integrity, and have higher cost-of-ownership due to long nucleation times and poor precursor gas utilization efficiency. Following the tantalum containing barrier example, CVD Ta and TaN films require substrate temperatures ranging from 500� C. to over 800� C. and suffer from impurity concentrations (typically of carbon and oxygen) ranging from several to tens of atomic % concentration. This generally leads to high film resistivities (up to several orders of magnitude higher than PVD) and other degradation in film performance. These deposition temperatures and impurity concentrations make CVD Ta and TaN unusable for IC manufacturing, in particular for copper metallization and low-k integration.
A plasma-assisted (PACVD) or plasma-enhanced (PECVD) CVD approach has been demonstrated using tantalum pentabromide (TaBr5) as the precursor gas to reduce the deposition temperature. Ta and TaNx films were deposited from 350� C. to 450� C. and contained 2.5 to 3 atomic % concentration of bromine.
Atomic layer chemical vapor deposition (ALCVD) or atomic layer deposition (ALD) has been proposed as an alternative method to CVD for depositing conformal, ultra-thin films at comparatively lower temperatures. ALD is similar to CVD except that the substrate is sequentially exposed to one reactant at a time. Conceptually, it is a simple process: a first reactant is introduced onto a heated substrate whereby it forms a monolayer on the surface of the substrate. Excess reactant is pumped out. Next a second reactant is introduced and reacts with the first reactant to form a monolayer of the desired film via a self-limiting surface reaction. The process is self-limiting since the deposition reaction halts once the initially adsorbed (physi- or chemisorbed) monolayer of the first reactant has fully reacted with the second reactant. Finally, the excess second reactant is evacuated. The above sequence of events comprises one deposition cycle. The desired film thickness is obtained by repeating the deposition cycle the required number of times.
In practice, ALD is complicated by the painstaking selection of a process temperature setpoint wherein both: 1) at least one of the reactants sufficiently adsorbs to a monolayer and 2) the surface deposition reaction can occur with adequate growth rate and film purity. If the substrate temperature needed for the deposition reaction is too high, desorption or decomposition of the first adsorbed reactant occurs, thereby eliminating the layer-by-layer process. If the temperature is too low, the deposition reaction may be incomplete (i.e., very slow), not occur at all, or lead to poor film quality (e.g., high resistivity and/or high impurity content). Since the ALD process is entirely thermal, selection of available precursors (i.e., reactants) that fit the temperature window becomes difficult and sometimes unattainable.
Continuing with the TaN example, ALD of TaN films is confined to a narrow temperature window of 400� C. to 500� C., generally occurs with a maximum deposition rate of 0.2 Å/cycle, and can contain up to several atomic percent of impurities including chlorine and oxygen. Chlorine is a corrosive, can attack copper, and lead to reliability concerns.
In conventional ALD of metal films, gaseous hydrogen (H2) or elemental zinc (Zn) is often used as the second reactant. These reactants are chosen since they act as a reducing agent to bring the metal atom contained in the first reactant to the desired oxidation state in order to deposit the end film. Gaseous, diatomic hydrogen (H2) is an inefficient reducing agent due to its chemical stability, and elemental zinc has low volatility and is generally incompatible with IC manufacturing. Due to the temperature conflicts that plague the ALD method and lack of kinetically favorable second reactant, serious compromises in process performance result.
In order to address the limitations of traditional thermal or pyrolytic ALD, radical enhanced atomic layer deposition (REALD) or plasma-enhanced atomic layer deposition has been proposed whereby a downstream radio-frequency (RF) glow discharge is used to dissociate the second reactant to form more reactive radical species which drives the reaction at lower substrate temperatures. Using such a technique, Ta ALD films have been deposited at 0.16 to 0.5 Å/cycle at 25� C., and up to approximately 1.67 Å/cycle at 250� C. to 450� C. Although REALD results in a lower operating substrate temperature than all the aforementioned techniques, the process suffers from several drawbacks. Higher temperatures must still be used to generate appreciable deposition rates. Such temperatures are still too high for some films of significant interest in IC manufacturing such as polymer-based low-k dielectrics that are stable up to temperatures of only 200� C. or less. REALD remains a thermal or pyrolytic process similar to ALD and even CVD since the substrate temperature provides the required activation energy for the process and is therefore the primary control means for driving the deposition reaction.
In addition, Ta films deposited using REALD contain chlorine as well as oxygen impurities, and are of low density. A low density or porous film leads to a poor barrier against copper diffusion since copper atoms and ions have more pathways to traverse the barrier material. Moreover, a porous or under-dense film has lower chemical stability and can react undesirably with overlying or underlying films, or with exposure to gases commonly used in IC manufacturing processes.
Another limitation of REALD is that the radical generation and delivery is inefficient and undesirable. RF plasma generation of radicals used as the second reactant such as atomic H is not as efficient as microwave plasma due to the enhanced efficiency of microwave energy transfer to electrons used to sustain and dissociate reactants introduced in the plasma. Furthermore, having a downstream configuration whereby the radical generating plasma is contained in a separate vessel, located remotely from the main chamber where the substrate is situated, negatively impacts the efficiency of transport of the second radical reactant.
In one aspect, the invention features a method of depositing a film onto a substrate in a chamber. The method comprises introducing at least one precursor vapor into the chamber to adsorb at least one layer of the precursor vapor on the substrate. During the introducing step, the precursor vapor is exposed to a source of excitation to increase the chemical reactivity of the precursor vapor.
In another aspect, the invention is directed to a method of depositing a film onto a substrate wherein at least one precursor vapor is introduced into a chamber to adsorb at least one layer of the precursor vapor on the substrate. During the introducing step, the precursor vapor is exposed to an excited species to increase the chemical reactivity of the precursor vapor.
Various implementations of the invention may include one or more of the following features. At least one ligand of a precursor vapor molecule is altered. The size of the molecule is changed. The size of the molecule is reduced. The polarization of the molecule is changed. The polarization of the molecule is increased, decreased, or the sign of polarization is changed. The precursor vapor is exposed to the excited species in the vicinity of the substrate. The excited species forms an afterglow, a plasma, or an ion-generating plasma. The plasma is generated by an excitation source selected from the group consisting of microwave power, DC power, RF power, ultraviolet light, x-rays, a high DC field, a molecular beam, an ion beam, and combinations thereof.
In yet another aspect, the invention is directed to a sequential method for depositing a film onto a substrate in a deposition chamber. The method comprises introducing a reactant gas into the chamber to adsorb at least one layer of the reactant gas onto the substrate. Any excess reactant gas is removed from the chamber. During at least the first step, the reactant gas is exposed to a plasma. At least one ion-generating feed gas and at least one radical generating feed gas are introduced into the chamber. A plasma is generated from the ion generating feed gas and the radical generating feed gas to form ions and radicals. The substrate is exposed to the ions and the radicals. The ions are modulated, and the adsorbed layer of the reactant gas is reacted with the ions and the radicals to deposit the film.
Various implementations of the invention may include one or more of the following features. The second step of the above-described method is accomplished by evacuating or purging the chamber. The plasma level at the third step of the above-described method is less than, greater than, or equal to the plasma level at the sixth step of the above-described method. The reactant gas is exposed to the plasma in the vicinity of the substrate. The reactant gas is exposed to the plasma during the first and second steps of the above-described method. The method is repeated until the film achieves a desired thickness. The substrate is simultaneously exposed to the ions and the radicals. The substrate is exposed to the ions after exposure to the radicals. The plasma at the third step of the above-described method is an ion-generating plasma.
In another aspect, the invention features a method for depositing a film onto a substrate in a chamber. At least one reactant gas is introduced into the chamber to adsorb at least one layer of the reactant gas on the substrate. During the introducing step, the reactant gas is exposed to a plasma. A plasma is generated from an ion generating feed gas to form ions and a radical generating feed gas to form radicals. The substrate is electrically biased to a negative potential. The substrate is exposed the ions and radicals. The ions are modulated, and the adsorbed layer of the reactant gas is reacted with the ions and radicals to deposit the film.
Other implementations of the invention may include one or more of the following features. The reactant gas is exposed to the plasma in the vicinity of the substrate. The method is repeated until the film achieves a desired thickness.
The invention can include one or more of the following advantages. It can increase throughput by increasing the adsorption rate, reducing the dose time, and increasing the deposition rate. A film deposited in accordance with the invention has more abrupt interfaces. A more abrupt interface means that a thinner barrier film can be formed. The films also have improved barrier and adhesion properties.
The details of one or more embodiments are set forth in the accompanying drawings and the description below. Other features, objects and advantages will be apparent from the description and drawings, and from the claims.
The present invention relates to methods and apparatus useable for the deposition of thin films of one or more elements at low temperature. The present invention relates to cyclical deposition techniques and apparatus suitable for the deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, high dielectric constant (high-k) films, and other conductive, semi-conductive, and nonconductive thin films.
In the deposition system of
In the embodiment of
Controlling the RF bias power also controls the density and hence the number of ions generated in the plasma. Increasing the RF bias power generally increases the ion density, leading to an increase in the flux of ions impinging on the substrate. Higher RF bias powers are also required for larger substrate diameters. A preferred power density is ≦0.5 W/cm2, which equates to approximately ≦150 W for a 200 mm diameter substrate. Power densities ≧3 W/cm2 (greater than about 1000 W for a 200 mm diameter substrate) may lead to undesired sputtering of the deposited film.
The frequency of the RF bias power can be 400 kHz, 13.56 MHz, or higher (e.g. 60 MHz, etc.). A low frequency (e.g. 400 kHz), however, can lead to a broad ion energy distribution with high energy tails which may cause excessive sputtering. The higher frequencies (e.g., 13.56 MHz or greater) lead to tighter ion energy distributions with lower mean ion energies, which is favorable for modulated ion-induced ALD deposition processes. The more uniform ion energy distribution occurs because the RF bias polarity switches before ions can impinge on the substrate, such that the ions see a time-averaged potential.
As shown in
In MII-ALD, the same plasma is used to generate both ions 177 (used to drive the surface reactions) and radicals 176 (used as the second reactant). The MII-ALD system utilizes ion imparted kinetic energy transfer rather than thermal energy (e.g., REALD, ALD, PECVD, CVD, etc.) to drive the deposition reaction. Since temperature can be used as a secondary control variable, with this enhancement films can be deposited using MII-ALD at arbitrarily low substrate temperatures (generally less than 350� C.). In particular, films can be deposited at or near room temperature (i.e., 25� C.) or below.
The system of
A first reactant 100 (e.g., precursor A) is introduced to the chamber 170 via valving 105 and the gas feed line 132. Precursor A may be any one or more of a series of gaseous compounds used for depositing semiconductors, insulators, metals or the like that are well-known in the art (e.g, PDEAT (pentakis(diethylamido)tantalum), PEMAT (pentakis(ethylmethylamido)tantalum), TaBr5, TaCl5, TBTDET (t-butylimino tris(diethylamino)tantalum), TiCl4, TDMAT (tetrakis(dimethylamido)titanium), TDEAT (tetrakis(diethylamino)titanium), CuCl, Cupraselect� ((Trimethylvinylsilyl) hexafluoroacetylacetonato Copper I), W(CO)6, WF6, etc.).
Additional precursor gases (e.g., 120, 140) may be introduced and evacuated as required for a given process to create tailored films of varying compositions or materials. As an example, an optional exposure may occur in the case of a compound barrier of varying composition. For example, a TaNx/Ta film stack is of interest in copper technology since TaNx prevents fluorine attack from the underlying fluorinated low-k dielectrics, whereas the Ta promotes better adhesion and crystallographic orientation for the overlying copper seed layer. The TaNx film may be deposited using a tantalum containing precursor (e.g., TaCl5, PEMAT, PDEAT, TBTDET) as the first reactant 100 (precursor A) and a mixture of atomic hydrogen and atomic nitrogen (i.e. flowing a mixture of H2 and N2 into the plasma source 172) as the second reactant to produce a TaNx film. Simultaneous ion exposure is used to drive the deposition reaction. Next a Ta film may be deposited in a similar fashion by using atomic hydrogen (as opposed to a mixture of atomic hydrogen and nitrogen) as the second reactant. An example of a tailored film stack of differing materials can be the subsequent deposition of a copper layer over the TaNx/Ta bi-layer via the use of a copper containing organometallic (e.g., 25 Cu(TMVS)(hfac) or (Trimethylvinylsilyl) hexafluoroacetylacetonato Copper I, also known by the trade name CupraSelect�, available from Schumacher, a unit of Air Products and Chemicals, Inc., 1969 Palomar Oaks Way, Carlsbad, Calif. 92009) or inorganic precursor (e.g. CuCl) shown as precursor C 120 in
A variant of the method shown in
In another embodiment of the MII-ALD process, a substrate 181 heated (e.g., to a low temperature of less than or equal to 350� C.) or unheated is simultaneously exposed to a first reactant and a second reactant, and subjected to modulated ion 177 exposure. By modulating (1) the ion flux (i.e. the number of ions hitting the substrate per unit area per unit time); (2) the energy of the ions striking the substrate; or a combination of (1) and (2), the deposition reaction can be precisely toggled "on" or "off". Since the substrate 181 is maintained at a low substrate temperature, the first and second reactants do not thermally react with any appreciable rate or do not react at all when the ion flux or energy is toggled to a "low" state. Instead, the deposition reaction only takes place when either the ion flux or ion energy is toggled to a suitable "high state". Ion flux or energy modulation can vary generally from 0.1 Hz to 20 MHz, preferably from 0.01 KHz to 10 KHz. During deposition, the main process chamber 180 pressure can be maintained in the range of generally 102 to 10−7 torr, more preferably from 101 to 10−4 torr, depending on the chemistry involved. The desired film thickness is attained via exposure of the substrate to the suitable number of modulated ion flux or energy pulse cycles. This MII-ALD scheme results in a continuous deposition process. The modulation can be either of the ion flux via the plasma power or of the ion energy via an applied periodic wafer bias.
The MII-ALD method utilizing ion flux modulation to control the deposition cycle is illustrated conceptually in
Alternatively, subjecting the substrate 181 to a non-constant wafer voltage bias 185 can vary the incoming ion energy at a fixed plasma power 160 (i.e., ion flux). This embodiment of MII-ALD is illustrated conceptually in
As illustrated in
The deposition rate is affected by the choice of the critical bias pulse train variables: the magnitude, frequency (periodicity), and duty cycle. Preferably, when the bias frequency is high (e.g., 100 Hz-10 KHz) with a short duty cycle (e.g., less than 30%), reducing the net, time-averaged current (which can cause substrate potential drift, de-chucking problems, or charge-induced device damage) while providing a charge relaxation period wherein the ion charges accumulated during ion exposure can redistribute and neutralize.
Once the deposition rate is calibrated for a particular recipe (Angstroms/cycle), the ability to accurately determine the film thickness by counting cycles is a further benefit of this modulation scheme. The higher the frequency, the finer the resolution of this critical deposition process performance metric.
Alternatively, the substrate potential can be modulated by imparting an induced DC bias to the substrate by applying RF power to the pedestal. Preferably, the RF power is coupled into the ESC electrodes.
This process utilizes independent control over the three constituents of plasma—ions, atoms, and precursors. Decoupling these constituents offer improved control over the deposition process.
An added benefit of using MII-ALD is that with proper choice of the second reactant, selective ion-enhanced etching and removal of unwanted impurities can be performed. As an example, for many chemistries, the preferred second reactant is monatomic hydrogen (H) 176. Simultaneous energetic ion and reactive atomic H bombardment will cause selective removal of unwanted impurities (e.g., containing carbon, oxygen, fluorine, or chlorine) commonly associated with organometallic precursors (e.g., TBTDET, PEMAT, PDEAT, TDMAT, TDEAT), and proceed with removal rates superior to either chemical reaction (e.g., atomic H only) or physical sputtering (e.g., Ar ion only) alone. Impurities lead to high film resistivities, low film density, poor adhesion, and other deleterious film effects. Alternatively, in addition to atomic hydrogen, other reactive groups such as nitrogen atoms (N), oxygen atoms (O), OH molecules, or NH molecules, or a combination thereof may be employed.
Another embodiment of the above-described methods is shown in
More specifically, as shown in
In another embodiment, the plasma exposure 630 may be discontinued during the removal 614. It would then be restarted during the second exposure 620 to form an ion-generating plasma. In another embodiment, the plasma exposure may be or may not be discontinued in step 616.
The sequential method shown in
Similarly, the continuous processes shown in
The method of the present invention increases the chemical reactivity of a precursor by removing or otherwise altering at least one ligand of a precursor molecule. The size of the precursor molecule may be changed. For instance, the size may be reduced. The polarization of the precursor molecule may also be changed. For example, the polarization may be increased or decreased, or the sign of polarization may be changed.
As discussed above, the substrate is exposed to a sequence of discreet states. Each of the states represent a step in a deposition cycle. The sequence of steps is repeated to produce a film of a desired thickness. In at least one of the steps, the substrate is exposed to a vapor containing at least one precursor chemical. The precursor vapor adsorbs onto the substrate. The rate of adsorption is not infinite and the density of the adsorbed molecules is also not infinite. However, these two factors influence the cycle time which impacts throughput as well as the deposition rate per cycle. The rate of adsorption as well as the number of available adsorption sites is a function of the substrate and precursor pair. Therefore, altering the precursor results in an alteration of the adsorption rate and number of sites. An alteration that cleaves part of at least one ligand, for example, exposes a chemically reactive bond that in turn can be subject to its own adsorption mechanisms with the substrate independent of the rest of the precursor molecule. Moreover, if this alteration reduces the size of the precursor molecule, then the Steric hindrance phenomena is minimized. Steric hindrance is the phenomena wherein a collection of molecules preferentially space themselves out. In other words, the molecules do not like to be crowded.
The precursor gas, in one implementation, may be exposed to the plasma in the region between the gas line 132 and the showerhead 171. The precursor gas may also be exposed to the plasma in the region below the showerhead.
A precursor molecule, in any event, is altered at or near the substrate rather than in a remote fashion. The present invention thus provides a more reactive precursor molecule, but only in the region of interest in the vicinity of the substrate to prevent stray or parasitic reactions with the vapor delivery system. This sort of precracking during nucleation also reduces nucleation delay for all substrate materials.
Multiple excitation sources may also be used with the present invention. The excitation source employed at step 632 may also be a separate source from that employed at step 634. Additionally, the excitation energy applied at step 632 may vary from one cycle to another cycle to compensate for effects that may vary with time or cycle numbers. For example, as film builds up in the chamber, it alters the ability of the chamber to transmit RF energy. This alteration can be compensated for by varying the applied RF coupling.
Also, in other implementations, the precracked precursor exposure may follow some other reactive gas/plasma exposure step. Also, the plasma, in another embodiment, may be an ion-generating plasma at steps 632 and 722. Moreover, the precursor may be exposed to an excited species at steps 632 and 722. An excited species may be an excited gas which forms an ion-generating plasma, a plasma or afterglow, and/or includes ions, free electrons, or meta-stable gas atoms. Further, in another variant of these techniques, the power level at steps 632 and 722, for instance, may be the same as or greater than the power level at step 634 and 724.
In another embodiment, as shown in
It is generally assumed that the excitation energy must be reduced to zero between the ion-generating plasma steps to prevent gas phase decomposition of the vapors in the ambient and possible resulting contamination of the deposited film. It has been found, however, that this is not the case. The present invention increases throughput by reducing or eliminating the non-productive time in a cyclic deposition process that occurs with each deposition cycle.
As shown in
At step 832, an afterglow rather than a plasma may be formed. The excitation source may also be operated at this same low value only during removal 814, after the first precursor exposure 800. The excitation source may also be operated at this low value during removal 816.
The plasma may be generated by microwave or RF power. The plasma may also be generated by DC power. The excitation source, in other embodiments, may be ultraviolet light, x-rays, a high DC field, a molecular beam, an ion beam, or some other form of electromagnetic radiation. The excitation source may also be some combination of these sources.
The present invention is not limited to use with an MII-ALD system and process. The present invention may be used with various cyclic deposition systems and techniques. For example, it may be used with ALD, ALCVD, pulsed nucleation layer (PNL), or pulsed deposition layer (PDL) systems and methods.
The method of the present invention can be used to deposit various materials, including dielectric, oxide, semiconducting, or metal films, used in the semiconductor, data storage, flat panel display, and allied as well as other industries. In particular, the method and apparatus is suitable for the deposition of barrier layers, adhesion layers, seed layers, low dielectric constant (low-k) films, and high dielectric constant (high-k) films. The deposited layer may be one or more monolayers, or it may be a fractional layer, which is less than one monolayer.
From the description of the preferred embodiments of the process and apparatus set forth above, it is apparent to one of ordinary skill in the art that variations and additions to the embodiments can be made without departing from the principles of the present invention. As an example, chlorine, bromine, fluorine, oxygen, nitrogen, hydrogen, other reactants and/or radicals containing the aforementioned elements or a combination thereof, in conjunction with energetic ion bombardment, can be used to effect etching or material removal as opposed to deposition. This is of particular importance in the cleaning of native oxides of copper, aluminum, silicon, and other common conductor and semiconductor materials used in IC manufacturing. Either the deposition or etching can be accomplished globally (as illustrated in the preceding embodiments) or may be chosen to be local to a controlled area (i.e., site-specific using a small, ion beam point or broad-beam source scanned or otherwise stepped across the substrate, exposing only a fraction of the substrate area at any given time).
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Eye diseases such as macular degeneration or diabetic retinopathy cause loss of central vision. Before digital tablets were invented, people with these diseases often relied on cumbersome lighted magnifiers for reading.
Data and conclusions presented at medical meetings are typically considered preliminary until published in a peer-reviewed medical journal.
More information
The U.S. National Eye Institute has more about vision loss.
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SOURCE: American Academy of Ophthalmology, news release, Nov. 11, 2012
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Former Haig Pit worker George dies, aged 91
Last updated at 12:14, Thursday, 12 April 2012
GEORGE Lewthwaite, the last surviving member of five Whitehaven brothers, has died in Yorkshire just a few weeks short of his 92nd birthday.
All the brothers worked in Haig Pit but George never returned to his home town after serving in World War Two.
His other brothers were Henry, George, Tom, Edward and Joseph, who also left West Cumbria to work.
George's hobby was drawing. He did occasional illustrations for The Whitehaven News focussing on cartoons of local places and people.
His nephew, Tom Lewthwaite, who runs a Whitehaven business at Flatt Walks, recalls: "When war broke out I was told by my own dad (Tom snr) that George couldn't get out of the pit quickly enough."
The brothers were brought up at 13 Preston Street.
In the Second World War George served both in the Artillery and in the Military Police. He returned to settle in the Hull area working for an aircraft company.
George also had two sisters, Margaret and Mary.
His funeral took place yesterday in Hull.
First published at 12:00, Thursday, 12 April 2012
Published by http://www.whitehavennews.co.uk
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The trademarks MLS®(Multiple Listing Service), REALTOR®, REALTORS®, and the associated logos are owned by The Canadian Real Estate Association(CREA) and identify the quality of services provided by the real estate professionals who are members of CREA.
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Latest Systems
Cheating Dome, your magical resource for Cheats, Hints, Tips, Achievements and Trophies!
The Gameboy Col section has been updated at Thursday, June 18, 2015. It contains 1089 cheats and codes for 300 games. You may also navigate our complete games list to get a list for all the games contained in Gameboy Col. This list may be long, so it is not advised.
Latest added games and news to Cheating Dome !
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- State Water says it has started pre-releasing water from the Riverina's two main storages ahead of predicted rain over the coming days. ...Thursday 23 August 2012
- Saturday 21 July 2012
- Grain growers across southern NSW and Victoria are rejoicing after widespread rain fell across the district....Wednesday 11 July 2012
- Farmers in the NSW Murray region are getting desperate for rain....Friday 22 June 2012
- The Australian continent is often described as a land of droughts and flooding rains. Lately it's been more of the latter especially along the eastern seaboard where the past four years have been the wettest on record. Farmers will tell you there's always a lot more money in mud than dust. However as ...Sunday 29 April 2012
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Latest Rainfall stories on ABC Riverina NSW
Latest Rainfall stories on ABC Online
- As rain continues to fall over areas of far north Queensland, so too do the region's rainfall records....Tuesday 30 June 2015
- One short 20-minute deluge caused flooding on the streets of Broken Hill....Wednesday 17 June 2015
- It's been a chilly week and don't we know it....Thursday 4 June 2015
- A unique trial is underway in outback Queensland with drones being launched into the sky to take pictures of remote roads....Monday 25 May 2015
- Scientists still waiting for Rosetta's comet lander Philae to phone home. Listen for more #space news...Wednesday 20 May 2015


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Use Flash Professional CS5 to create a game to play on iOS devices, utilizing device hardware like the accelerometer and integration with a local database.
"I'm a new subscriber. I'm 10 minutes in and I can't thank you enough. I'm learning what would normally cost me nearly $1,000!" —Melissa K.
more from our members »


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Cena vs Lesnar vs Rollins
In one of the best matches in the history of the Royal Rumble, Brock Lesnar successfully retained the WWE Heavyweight Championship by pinning Seth Rollins after an F5. John Cena had been knocked out by a beautifully and masterfully executed Phoenix Splash from Rollins. Lesnar was made to look especially strong in the match because he came back to win after coming close to being stretched out because of a story line rib injury.
January 25, 2015
Brock Lesnar return fight
Earlier this month, it was reported that UFC had been contemplating potential opponents for Brock Lesnar if he decides to walk away from WWE in a couple of months. Frank Mir was a popular choice within the promotion. Aside from their history together, a big reason why Mir was chosen is because he is currently on a four fight losing streak. A battle with Lesnar would be the best possible draw for the legendary fighter at this point.
January 22, 2015
Wyatt vs Undertaker
Every year at Wrestlemania over the last decade, WWE has left a spot open for Undertaker, who is by far the greatest draw in the history of the biggest wrestling pay per view of the year. Even though he has been leaning towards retirement after doing the honors for Brock Lesnar earlier this year, management is still saving him a seat, in case he changes his mind. The opponent has now been handpicked for him the legend, and that person is Bray Wyatt.
December 10, 2014


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Look Inside | Enlarge Cover
Random House Puzzles & Games | Apr 13, 2004
| 64 Pages
| 8-1/2 x 10-7/8
Random House Puzzles & Games
| Apr 13, 2004
| 64 Pages
| 8-1/2 x 10-7/8
The next volume of 50 Sunday-size crosswords from America's Second City·With a middle-of-the-road style and a medium difficulty-level, these puzzles are ideal for a broad range of solvers·These first-class crosswords will appeal to fans from coast to coast
Wayne Robert Williams is the creator of the prestigious Dell Champion line of puzzle magazines. A familiar and well-respected figure in the puzzle world, he has created and edited a wide variety of puzzles, puzzle books and puzzle magazines. He's… More about Wayne Robert Williams
Visit other sites in the Penguin Random House Network


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Backpack Vacuum Dust Care Jet Pac$182.3998" water lift, 8 qt. capacity, Quiet 69 db, Switch on power unit, Blower Adaptor, 4-layer HEPA filtration, HEPA disposable bag, SMS cloth bag, HEPA pre-motor filter, Micron Exhaust Filter, Adjusts for right or left hand vacuuming, comes with 24" drop cord, padded shoulder and waist straps, 35mm tools included: blower convertor crevice tool dusting and upholstery nozzles, rug/floor tool, crushproof hose & telescoping brushed steel wand Learn More
Rotho TB150 Hand-held Turbo Brush Attachment For Stairs & Upholstery, 787 228.$49.95Hand-held turbo brush designed to fit Rotho Water Filtration vacuum cleaners. An excellent added attachment for cleaning stairs & upholstery, especially for homes that have breathing issues or allergies. This attachment comes packaged standard with th Learn More
Rotho Twin TT Electro Plus + Pet Vacuum by Robert Thomas$1,595.00Rotho Twin TT Electro Plus + Pet Vacuum by Robert Thomas Learn More
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Making a Spoof Fred Willard discusses EPIC MOVIE and his hilarious take on epic movies in general.
Cable Highlights The MHP panel talks about the issues facing our water infrastructure, from water pollution to water droughts and shortages.
Cable Highlights Alex Witt talks to NBC News Olympic Security Analyst Andrew Weiss about the current state of affairs at the Sochi Olympics and Russia.


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Boris Johnson helps launch Royal British Legion's Pedal to Paris 2011 ride
Classical singer Laura Wright joins Mayor of London in launching 16th edition, and will ride in event
Mayor of London Boris Johnson, who last week lined up in front of the cameras alongside model Kelly Brook to launch this year's London Sky Ride, has been joined at another bike-related photocall outside City Hall by classical singer Laura Wright. This time, it was to launch Pedal to Paris 2011, organised by The Royal British Legion's to support what it terms "the Afghanistan generation of the Armed Forces."
The 21-year-old singer, who released her debut album The Last Rose earlier this year, will be one of more than 300 cyclists, many of them current and former armed forces personnel, who will set off from Greenwich Park on Thursday 1 September, arriving in Paris on Sunday after riding 285 miles.
The Royal British Legion aims to raise £500,000 through the ride, which will go towards its new £30 million Battle Back Centre, which is due to open this month and which aims to help wounded or sick armed forces personnel recover with the help of adaptive sports, among other things, and enter civilian life.
Helping to launch the 16th edition of the ride, Mr Johnson said: "The Royal British Legion does amazing work to support the brave men and women who have served in our Armed Forces, and their families and loved ones. As these intrepid cyclists set off to Paris I urge everyone to dig deep to support this great cause."
Ms Wright added: "I was a Corporal in the Combined Cadet Force when I was younger, and have always known about the Legion's great work for our Service people. When I heard about the Battle Back Centre, I really wanted to support the project through Pedal to Paris. The ride itself is going to be a huge challenge, and I'll be very happy when I see the Arc de Triomphe!"
The ride was a great challenge for those of us who are unfit, but also a very enjoyable social ride, with 3 speed groups (18+ mph, 15 mph, and 12 mph).
Highly recommended, and a fantastic charity to boot.
It is brilliantly organised, you only need to remember your bike and your shoes!
posted by CJK [5 posts]
6th September 2011 - 10:06


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A mod for Alien Swarm that is based on the ALIENS movie but for a set of new marines to go and investigate LV426 and see what happened there! (This is not like Aliens Colonial Marines)
No downloads were found matching the criteria specified. We suggest you try the download list with no filter applied, to browse all available files. Join now to share files with the community.


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Making a stand requires gumption, determination, and a suitable tool kit. Make sure it fits with today's Groupon: AED 99 for a rotating iPad case in four attractive colours.
Giving cutting edge technology a stylish protective coat, this handy case keeps iPads looking cool and their owners even cooler. The stand allows users three viewing positions with a Velcro strap keeping tablets firmly in place. The rotating action gives the option of vertical or horizontal use, while the premium interior keeps screens finger smudge-free when users and iPad close up shop for the day.
Groupon voucher | Shopping | Electronics | Electronic accessories | Shopping Shopping | Electronic accessories Shopping


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Letter: Kaneland School Board raising taxes
I had the pleasure of attending the Kaneland District 302 School Board meeting on Oct. 27. The meeting started on time at 7 p.m. sharp, with several people in attendance. Pictures of student athletic participation, pictures of Europe with Kaneland High School students, criteria for selecting a new superintendent and school improvement plans were presented,
leaving the presentation of the 2014 tentative tax levy to begin at 10 p.m. Board voting and discussion began at 10:30 p.m., with very few people remaining to witness the conversations.
I think the taxation levy is one of the most important financial discussions of the School District business year. Unfortunately, the board planned the meeting's financial discussions to be last on the agenda, as it has been for the last three years. So, you must be wondering how it turned out.
To the surprise of no one, board members deliberated a few minutes, and as they have been consistent for as long as I can remember, delivered their "tax to the max" vote with a count of 5-2, with Tony Valente and Pedro Rivas voting "no." That "tax to the max" vote now translates into a limiting rate multiplier of 6.0832 times a home value (EAV) of $300,000, giving you and yours a $222 tax increase. And as we all know, that $222 increase will never go away from our future tax bills, so we get to pay this increase forever and ever.
The time is now 10:50 p.m. Public comment allowed me to speak of the board's recent, impulsive hiring of people.
Salaries and benefits for district personnel account for 80 percent of the district's operating expense. Obviously, adding more people to the payroll increases the demand for more taxation. The Kaneland School Board approved the addition of 73 people last year, with 49 of those people added since June 2014. Student population went up one person for the year. I guess the student testing results showing 45 percent of the high school students not progressing at college readiness standards might be a stimulus for more staff. Nonetheless, this is a poor state of affairs for our taxation, school system performance and management of board meetings.
I would not profess to be a great manager of schools, but I wonder about the output of this $66.5 million business enterprise as it is today.
Jerry Elliott
Sugar Grove Township


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I'm losing weight and I don't know how/why?
I'm pretty scared. I've lost 9 pounds in the past 3-4 months. I've always been really skinny/lean. but I'm way too skinny now and I really need to... Show More
in early October I weighed 122.
in early December I weighed 118.
and I weighed myself today and I weigh 113.
Most Helpful Opinion
What Guys Said 2
BMI doesn't mena anything..what you NEED is a BMR caluclater..this is called Basal Metabolic Rate..its what your body burns breathing,digesting food,heart,etc...
this is the minimum you need to NOT lose weighth..its what your body burns if you were to sleep 24/7...add in say 100 calories from you walking..tying your shoe,shopping for food..showering..etc..THIS is the minimum..
eat more than you burn: gain weighth
burn more calories than you eat: lsoe weighth...simple..
use fitday.com to track your everyday food..
What Girls Said 0
Be the first girl to share an opinion and earn 1 extra Xper Point!
Have an opinion?


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We hope you enjoy this trial version of Flowpaper!
• Designed for use on phone and tablet devices.
• Draw with physics
• Playful waves of colour
• Share images with friends
• Load images from your gallery
• Restore accidentally deleted flowpapers by pressing undo Upgradable Features
• Hand picked color pallets and a color mixer to make your own.
Pro upgradable features:
• Export high-resolution images
• Continuous Flow mode, brush strokes keep flowing after you lift your finger.
What's New
Paint Free
Get pleasure from drawing on the screen of your phone!
Draw everything that you want and then share your
masterpieces with friends . Save your pictures to watch later.
- Share via Facebook , email , Bluetooth or via other programs;
- Undo mistakes;
- Redo last canceled actions;
- Use effects (dashed line, emboss, empty inside, blur (normal, solid, inner, outer ))
- Take picture from camera or gallery and draw;
- Change background color;
- Change line width and color;
- Clear;
- Pencil / Eraser;
I hope You will enjoy it!
My Paints Free
Get an ad-free painting tool for free!
My Paints Free is one of the best painting tools for children and adults. It contains
many brushes (over 30) and other features, such as eraser, undo/redo, image
loading/saving/sharing, and more!
★ The Pro version includes all features of the My Paints free version but has a newer
version (with new features added) and new brushes ★
Main benefits:
• Contains no ads, no spyware.
• Tools including various brushes, eraser, filler, color picker (with transparency
• The application supports the most types of Android phones and tablets.
• "My paints" saves edited photos and new pictures into SD-card.
• You can load pictures and photos from the gallery.
• Kids mode included (random color changing).
• The sharing feature is added: you can share your artwork with your friends in Google
+, Facebook, Picasa, DropBox, Facebook, Gmail, etc; via MMS, e-mail, Bluetooth (firstly
you may need to install these apps).
• You can continue to edit your last unsaved artwork next day after new start of the
• Undo/Redo features are included.
• You can play your activities with embedded player
Drawing on the tablet
To leave the application free of charge, it uses advertising.
* Colorful design :)
* Simple and intuitive interface
* Palette of 7 colors
* The "New", "Eraser" and "Save" buttons
* Saving image in PNG format
* Multi-touch support
* Immersive mode for tablets with Android 4.4
* No advertising within the application
Why are so many "weighs"?
Drawing is developed using technologies of HTML5. To the application functioned the same everywhere, we have implemented in it Chromium engine. This explains a significant part of the setup file size.
System requirements:
We recommend use of a Tablet with a diagonal of 7 "and a dual core processor. The installation requires approximately 50 MB of free space. The minimum version of Android 4.0.
Akinator the Genie FREE
Akinator can read your mind and tell you what character you are thinking about, just by asking a few questions. Think of a real or fictional character and Akinator will try to guess who it is. Will you dare challenge the Genie?
Try this free version of the famous Genie! Discover the new Akinometer, share your results on Facebook and turn on the child filter to let your children play safely. Universal version, also works on iPad.
Akinator welcomes you to his lab to show you the most extraordinary and unusual potions (paid potions).
- The supercharged potion unlocks many new characters. Will you manage to beat Akinator?
- The radiant potion removes all ads from the app.
THE ULTIMATE POTION ! Akinator deserves the best! This potion combines the effects of all the others. It will also allow you to customize your characters so you too can impress your friends.
Akinator invites you to think outside the box. As you know, he likes to guess characters and takes up challenges ever more difficult.
To do that, make him guess forgotten characters, who have not been played for a very long time. Compare your trophies with your friends in Game Center.
Thanks to Geniz, you unlock and play with new backgrounds and customize Akinator as you want.The genie will turn into a vampire, a cow-boy or a disco man.
*** TRY OUT THE MyWorld EXPERIENCE!***
The talents of Akinator never end! Another surprise from the Genie: with MyWorld, discover a new way of playing. Challenge Akinator even more: make him guess who are your relatives and friends and gather them all into your own galerie MyWorld.
Even better! Akinator can guess your friends and relatives even if you are not playing. Impossible?! Pass your mobile to your friends and try out the MyWorld experience… and be ready for the amaze!
Become Akinator's fan on Facebook: http://www.facebook.com/Akinator
Follow Akinator on Twitter: http://twitter.com/akinator_team
Please note:
-Akinator requires an Internet connection to use his magic lamp. Turn on Wifi or be sure to have a data plan.
-Available in several languages (French, English, Spanish, Portuguese, German, Japanese, Arabic, Russian, Italian, Chinese, Turkish, Korean, Hebrew, Polish and Dutch)
-To select your language, don't forget to scroll down the list to find it.
Scribblify Paint Draw & Doodle
Let your creativity run wild with Scribblify, a one-of-a-kind universal drawing and painting tool for children and adults of all ages. From natural to abstract and everything in between, Scribblify allows anyone to create spectacular artwork with ease—limited only by one's imagination. This is a completely free (ad-supported) and full-featured app.
Scribblify is packed with 28 hand crafted brushes, each with its own unique appearance and behavior. From neon glow to glitter, organic to surreal, most of the brushes are unlike anything seen before. The wide variety of exclusive brushes, preset backgrounds, advanced color effects and mirror drawing capabilities ensures endless entertainment for all.
Scribblify is a universal app that works across virtually all Android phones and tablets. Scribblify uses the entire screen as its canvas, so you can create even higher resolution artwork on modern tablets. Free and premium versions of Scribblify are also available for all iOS devices.
○ Paint using 28 original brushes to create endlessly fascinating compositions
○ Choose from 560 brilliant base colors and create custom blends using a variety of innovative effects
○ Select from 28 distinct background textures (55 if inverted)
○ Effortlessly create symmetrical artwork using the horizontal, vertical and quad mirroring system; an option also exists to mirror from wherever you touch for expanded effects
○ Enable plasma, multicolor, color variance and two color blend other effects to produce new styles and textures
○ Easily export your artwork to any compatible app on your device including social network apps and third party illustration tools
Video tutorials and help documentation is available on the official Scribblify website. Please contact support for any assistance.
Note: This is an early version of Scribblify for Android. The iOS version is much more mature with additional brushes and capabilities.
**All Pro Upgrade features now come with Flowpaper as standard**
• Designed for use on phone and tablet devices.
• Draw with physics
• Playful waves of colour
• Share images with friends
• Load images from your gallery
• Restore accidentally deleted flowpapers by pressing undo Upgradable Features
• Export high-resolution images.
• Continuous Flow mode, brush strokes keep flowing after you lift your finger.
Silk paints - Galaxy Note
Special edition is created for Samsung Galaxy Note (including Note 3) series devices only.
* application will work on all devices, but Galaxy Note features will work only on Galaxy Note devices.
With stylus you could really improve quality of your arts, but with usage of SPen stylus you will uncover new abilities of your imagination!
In addition to all regular Silk Paints features you will get:
* Control color, brightness or transparency by pressure on screen. With mixing with regular brush effects you could achieve exciting results. You could add accents or light details on fly to stroke.
* Easy zoom-in with stylus button.
* Smart-hover tooltips for more comfortable navigation among features on toolbars and buttons.
- live wallpapers, draw your own or pick from huge gallery!
- live tracks - record and replay beautiful drawings
- gallery of best arts
- make your own live wallpapers or use any from the big gallery of tracks
- additional set of 16 specific brushes (light, dark, rainbow, color companion, etc)
- social interaction
- multi-touch navigation and zoom
- works without internet connection
Join us on Facebook - https://www.facebook.com/SilkPaints and share your talent!
Any feedback is appreciated.
AirBrush Paint
Draw with all your fingers. Let your kids try it!
Time machine with unlimited undo/redo and entire drawing history playback
Cool brushes to make your masterpiece even better
Multitouch zoom/pan navigation
Use any brush in erase mode
Save to the Gallery on your device
Works best on tablets.
We depend on your support!
Please feel free to contact us at email@example.com with questions, ideas and everything you'd like to share with us.
Sincerely yours,
RIAFactory team.
Keywords: draw, paint, drawing, brush, art, picture, pencil, sketch, image, illustration
Talking Pierre the Parrot
Download Talking Pierre's FREE and FUN app and enjoy yourself! He repeats, makes up his own sentences and more!
The genuine bonafide talking parrot has many tricks up his sleeve and he's ready to have all the fun in the world with you! He repeats after you and makes up new sentences, he rocks it out like a true guitar hero and he dodges those tomatoes like a pro!
Enhance the fun by getting the FULL Talking Pierre app which is filled with new animations and responses!
Talk to Pierre: He repeats and invents his own sentences!
Play with Pierre: Try hitting him with a tomato, listen to him rock out on his guitar and have him throw cutlery at you!
Interact with Pierre: Rub his belly, poke him or have him jump the way you want him to!
This app is PRIVO certified. The PRIVO safe harbor seal indicates Outfit7 has established COPPA compliant privacy practices to protect your child's personal information. Our apps do not allow younger children to share their information.
This app contains:
- Promotion of Outfit7's products and contextual advertising
- Links that direct customers to our websites and other Outfit7 apps
- Watching videos of Outfit7's animated characters via YouTube integration
- The option to make in-app purchases
Terms of use: http://outfit7.com/eula-android/
Privacy policy: http://outfit7.com/privacy-policy/
Some of the fun things to do with this app:
- Great for kids who enjoy coloring.
- Paint a masterpiece.
- Writing a special note on the screen of a friend at home.
- Save and share your pictures with your friends or by text, email or social networks.
• Designed for children
• Adapted interface
• Free to play
• A variety of brushes
• Extended color palette
• Brush and eraser sizes
• Progress undo / redo
• Continue editing the last picture
• Save and load sketches in the gallery
• Suitable for android-based phones and tablets
• The English-language development and support
Drawing is the best way to develop children's cognitive and creative skills. Luckily they really love such a pastime! However kids need a lot of tools and materials for this business and often make a huge damage to surrounding objects by paints and ink.
Specially designed and adapted KidSketch provides your child with a wide range of tools to be happy without any risks to real environment.
OpenGL 3D Showcase (GLES1.x)
Includes a report specifying detailed OpenGL information, available display configurations, list of supported OpenGL extensions, and the ability to save all of that information to SD card. This application also comes with the complete source code, available via a long-press on any demo.
--==[Latest News]==--
Since updating to version 8, I have not received any crash reports. I would consider this a final/stable release. If you run into any issues, please email me, and I will fix them ASAP.
Just as in previous versions, you can gain access to source code by long-pressing any demo. If you want to download source code from the convenience of your computer browser, or want to leave a comment, visit my site: http://temperage.com
--==[My Comments]==--
Here I try to respond to your comments/reviews, until Google implements a better way of doing this.
@Matt - your demo #14 did not work because glCopyTexImage2D is poorly implemented on some devices. It works fine in the emulator.
@seankang - latest release fixes your crash. Your device reported a funny GL_VERSION string, everything is fixed now.
@Kevin - can you please be more specific? Any unresolved issues?
v8.0 [Jun 2011]
- Fixed the flickering issue in "Face vs. Vertex Normals" #24
- Modified the "Terrain With Dynamic Lights" #12
- Final fix for crashes related to gl version checking
v7.0 [Jun 2011]
- Added a new Light Attenuation example #28
- Added device information to the Graphic Configuration report
- Fixed crashes related to null value returned by glGetString()
v6.0 [Jun 2011]
- Added new example: Alpha Test and Depth Test #27
- Fixed Object Reflections #20
- Added EGL error checking to fix rare crashes
v5.0 [Jun 2011]
- Changed the display configuration test. Now it is much easier to read, plus you have the ability to save information to text file.
- Ranked all tests according to minimum GLES version required
- Added "Texture Mipmapping" effect demonstration
- Added the demo showing all possible combinations of blend functions.
v4.0 [May 2011]
- Added the ability to get source code from within the app
- Fixed all crashes with examples #18, #19, #20.
- Rewrote Terrain With Dynamic Lights (#12) to fix face normals
- Rewrote Stencil Buffer Shadows (#18) to fix shadow accuracy
- Fixed Point Size Attenuation example #17
v3.0 [Dec 2010]
- Fixed the fog example #13
- Added examples 21-24
v2.0 [Oct 2010]
- Added examples 18-20
v1.0 [Sep 2010]
- Initial public release
--==[Permissions & Requirements]==--
android.permission.WRITE_EXTERNAL_STORAGE - to save source code or graphics configuration info to SD card if you choose to do so.
minSdkVersion="4" - requires at least Android 1.6
glEsVersion="0x00010000" - requires you to have at least OpenGL 1.0
Magic drawing
- animated fire flames
- changing flowers
- color neons
- glittering jewels
- pulsating hearts
Animated brushes have 3 different sizes. You can set 3 different density. This allows you to achieve amazing results while drawing. You can create great animated drawings or static drawings. This cool magic painter will allow you to create a fantastic animated live wallpaper. Write down a name using colored neons or fire flames, draw a spider of jewels, create animated photo frames, whatever you want and when you want. Use your imagination. If you lack a particular brush email us, we'll add it to the magic painter update.
Watch our demo-video, it shows what you can do with application to animated drawing. View our gallery of drawings, live wallpapers and photo frames, which will give you an idea of how to draw.
In case of any problems with the effect of magic painter, drawing application, instead of giving us the negative opinion, please send us an e-mail and review briefly the problem. It will help us to solve it in the next updates of drawing app.
Magic painter is free but contains ads in settings of the wallpaper and inside app. Revenue from advertising will help us to create new attractive wallpapers and applications. All permissions are required only for advertising and are supported by trusted vendors.
More from developer
**All Pro Upgrade features now come with Flowpaper as standard**
• Designed for use on phone and tablet devices.
• Draw with physics
• Playful waves of colour
• Share images with friends
• Load images from your gallery
• Restore accidentally deleted flowpapers by pressing undo Upgradable Features
• Export high-resolution images.
• Continuous Flow mode, brush strokes keep flowing after you lift your finger.


text:
In honor of World Book Day, the International Publishers Association has an infographic on how much children should read and why literacy is important.
Bringing the Love of Books to Indigenous Australians
The Indigenous Literacy Foundation has spent a decade leveraging the skills of publishing pros bring the love of books to remote communities in Australia.
In South Africa, Crowd-sourced Publishing Tackles Book Poverty
A new start-up in South Africa, Book Dash, focuses on creating and giving away free, high-quality books to needy children and encourages them to become lifelong readers
Scholastic Donates 1m Books to Charity Reach Out & Read
Scholastic has donated 1 million books to Reach Out and Read, a literacy charity that works to provide books to at-risk children via doctors and nurses.
As Kids' On-Screen Reading Overtakes Print, Outcome is Worrisome
The UK's National Literacy Trust reveals that children's on-screen reading has overtaken reading in print. But screen-only readers appear to struggle more and enjoy it less.
The Most Influential Children's Publisher You've Never Heard Of
Tens of millions of kids will never see a a book in the language they speak, so NGO Room to Read has published 850 titles in Lao, Hindi, Tamil, Kiswahili, and 25 other languages.
The UK's Largest Children's Book Distributor – McDonald's?
McDonald's in the UK are replacing Happy Meal toys with educational books to help boost literacy; they plan to distribute 15 million books by the end of 2014.
Community Literacy Efforts Pay Off for Small Michigan City
A community wide push in Kalamazoo, Michigan, including mailing books to children and orchestrating library visits, has boosted library book check-outs by 19%.
Pratham Books Seeks "Champions" to Read to Kids in India
For International Literacy Day this September 8th, India's Pratham Books is seeking 100 "champions" of reading to host storytelling sessions around the country.
Birdhouse-like Mini Libraries Migrate from Sea to Shining Sea
Across America individuals are erecting Little Free Libraries — 2' x 2' birdhouse like boxes — that encourage people to 'take a book, leave a book.'


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Expand your lighting options and get the most out of your flash as photographer and teacher Brent Winebrenner takes a practical, hands-on look at the theory behind exposure, with a special emphasis on electronic flash exposure.
Even with today's automatic flash systems, there are good reasons to understand how flash exposure really works. Brent details these concepts in this course. The course describes how to calculate the true power of your flash and how to modify its output to match your needs, a technique that can extend battery life, reduce recycle time, and provide exposure control that is more predictable than fully automatic modes. The course concludes with several shooting scenarios during which Brent explores the creative use of gels, reflectors, and other light modifiers.
In this movie, I'm going to take a moment to review how the flash to subject distance and the aperture scales relate to one another. And then we're going to look at how we can use this information to maintain equivalent exposures when we're working with small strobes. Remember, the square root of 2 is an integral part of the Inverse Square Law, which we use to calculate the change in illumination when the flash to subject distance changes. It's also an integral part of calculating the size of an aperture. And an aperture is nothing more than a circle, and you may recall that the formula for the area of a circle is Pi R squared.
Because Pi is a constant that doesn't change no matter how big or how small the circle, we can ignore it while determining the relative change in the size of the aperture. You probably already know that if we double the area of the circle, we'll create a one stop increase in the size of the aperture. And life would really be simple if the formula read area equals Pi times R because each time the radius is doubled, the area of the circle would double. In that world, a one-stop change from a 5 would be f/10 instead of 7.1.
Unfortunately, the formula demands that we use R squared, not R. This means that the area doubles when the radius increases by the square root of 2. If you look carefully, you'll notice that one-stop increments on the aperture scale are separated by a factor 1.4, which you'll recall from our previous discussion of the Inverse Square Law is equal to the square root of 2. As a result, 1.4 dominates the guide number scale, the flash to subject distance scale, and the aperture scale.
When we look at them together, their similarities become obvious and therefore useful. An understanding of how the square root of 2, or 1.4, is used to determine the change in both the aperture size and the flash to subject distance helps you to use the scales to solve problems more quickly, even when shooting in TTL mode or using big strobes. We alluded to this earlier, but now let's demonstrate the results of making offsetting adjustments to flash to subject distance and aperture.
Remember, the guide number for this flash on this camera is 90. So, I started shooting at f/18 from a distance of 5 feet. I opened up the lens in one-third stop increments, while compensating by backing up the flash in one-third stop increments until I got to a distance of 18 feet, and an aperture of f/5. Now, let's review the series of images. As expected, we see the depth of field changes. In addition because I move the flash, the position of the shadows changed and the level of illumination on the background changed.
However, if you focus on her face, you'll see that I was able to maintain equivalent exposures throughout the entire series. This proves that a change in aperture when offset by an equal change in the flash to subject distance results in an equivalent exposure. Once you've learned the scales, and you know your guide number, you'll know exactly where to place the flash to match your aperture. At first, this may sound like a lot of work in a TTL enabled world, but when you get the hang of it, you can really move fast in response to changing circumstances.
So, no matter what your shooting style, there are times when this level of manual control can really save the day.
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Sedalia's Weekend Events – Weekend of August 8
Here's a look at what's going on in Sedalia this weekend!
Here's a look at what's going on in Sedalia this weekend!
Charlie Danielshas been a long and vocal supporter of the military men and women, serving at home and abroad, and especially the Journey Home Project, which works with other non-profits to raise money for causes that benefit the Veterans of the United States Armed Forces.
Everyone here in our area is familiar with the Sedalia Senior Center down at 312 S. Washington. The Sedalia Senior Center is looking for volunteers!
The Boys & Girls Clubs of West Central Missouri kicked off its annual Great Futures campaign with a day full of activities last week (July 31), culminating in a flash mob at the Summer Program.
Clubs across the country came together at 3 p.m.
Scotty McCreery and Florida Georgia Line recently joined forces with celebs like Scarlett Johansson, President Bill Clinton, Celine Dion, Justin Bieber and Morgan Freeman, but not for entertainment -- it was in the name of clean water.
Keith Urban may have been born in New Zealand, but he makes his home -- and music -- in Nashville, Tenn. Recently, there's been a threat to the esteemed Music Row, and Urban is calling on Music City residents to help preserve the iconic area.
The Boys & Girls Clubs of West Central Missouri Board of Directors has announced Club Comptroller Jessica Pyle will act as interim executive director until a new director is hired.
Pyle replaces Harper Mruk, who offered her resignation at the beginning of July due to family circumstances. Co
Here's a look at some of the events going on this weekend.
Luke Bryan has announced dates for his sixth annual Farm Tour.
Jana Kramer is hand-selecting four pictures that show what 'Love' is. Each week she'll share why she chose that winner, and surprise him or her with a phone call and an autographed calendar. Submit your photo below.


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Click on the links below for more info.
One way to get the most out of your image editing is to expand the tonal range of your photo by setting your white point and black point (this is something Photoshop users have done for many years using Photoshop's Levels control). We do this using the Whites and Blacks sliders. We increase the whites as far as we can without clipping the highlights, and increase the blacks as far as we can without clipping the deepest shadows too much (although, I personally don't mind a little shadow clipping), which expands the tonal range big time.
Step One:
Here's the original image and you can see it looks pretty flat. When you see a flat-looking shot like this, it's a perfect candidate for expanding its tonal range
by setting the white and black points (right in the Basic panel, below Highlights and Shadows).
Step Two:
Start by dragging the Whites slider to the right until you see the "White Triangle of Death" (errrr, I mean the white triangle-shaped clipping warning) up in the top-right corner of the Histogram panel (at the top of the right side Panels area) and back it off a bit until the triangle turns solid black again. That's as far as you want to take it. Any farther and you can damage (clip) the highlights. You can do the same thing with the Blacks slider, but to add more blacks (and expand the range), drag to the left until you see the shadow clipping warning (in the top-left corner of the Histogram panel) turn white. I think some things should actually be solid black in a photo, so if I clip the shadows a bit but the photo looks better to me, I go with it. Just sayin'. Anyway, I'm clipping the shadows a bit here and it still looks good to me.
Step Three:
You can get an onscreen preview of any clipping by pressing-and-holding the Option (PC: Alt) key before you drag either the Whites or Blacks sliders. When you do this with the Whites slider, the image turns black (as seen here). As you drag to the right, any areas that start to clip in individual channels (not as critical) start to appear in that color. So, if you're just clipping the Red channel, you'll see areas appear in red (as seen here) or if they're yellow or blue, you're just clipping those channels. I pretty much let that go for the most part, but if I see areas start to appear in white (all three channels are clipping. Ack!), I know I've gone too far and I back it off to the left a little. If you press-and-hold the Option key with the Blacks slider, it's the opposite. The image turns solid white and as you drag the Blacks slider to the left, any parts that become solid black start to appear in either the color of the channel that's clipping, or in black if all the channels are clipping.
Step Four:
Okay, now that I've gone over the manual way to set your white and black points, and how to use the Option (PC: Alt) key to keep you from clipping either the highlights or shadows, here's what I actually do in my own workflow: I let Lightroom automatically set them for me. That's right, it can automatically set both for you, and it's pretty good at pushing the sliders as far out as they can go without clipping (it does, though, sometimes clip the shadows a bit, but, again, you know how I feel about that). Here's how you have it set them automatically (this is so simple): Just press-and-hold the Shift key, then double-click on the Whites slider knob and it sets your white point; double-click on the Blacks slider knob and it sets your black point. Yes, it's that easy, and that's what I use in my own workflow. By the way, if you Shift-double-click on either one and it doesn't move, then it's already set as far as it should go.
By Scott Kelby
Excerpt from The Adobe Photoshop Lightroom CC Book for Digital Photographers
Learn how to do more from The Adobe Photoshop Lightroom CC Book here: http://kel.by/lrccbook
Step One:
Open a photo where you've got some cloudy gray skies. Then, select the Smart Brush tool from the Toolbox (it's the large paint brush icon in the Enhance section) or just press the F key. (Note: For more on the Smart Brush tool, see the previous tutorial.)
Credit: Matt Kloskowski
Step Two:
Once you have the tool selected, click on the thumbnail on the left side of the Tool Options Bar to open the Preset Picker. From the Presets pop-up menu, choose Nature, and then click on the second thumbnail in the top row, which adds contrast to cloudy skies.
Step Three:
Now, choose a brush size using the Size slider (also in the Tool Options Bar), paint over the sky, and you'll start to see all the details that you knew were there when you took the photo start to come out.
Step Four:
Like most of the Smart Brush tool adjustments, sometimes the default adjustment is too strong. If that's the case, just go to the Layers palette and reduce the Opacity setting to 50%–75%, depending on how strong you want it to look. Not bad, eh? It does a great job of taking an ordinary photo and turning it into something way more dramatic.
By Matt Kloskowski
Excerpt from The Photoshop Elements 13 Book for Digital Photographers
Learn how to do more from The Photoshop Elements 13 Book for Digital Photographers here: http://kel.by/buyPSE13
It has been an awesomely exciting day here at KelbyOne, as for us, news doesn't get much bigger than this!!!
Adobe launched Lightroom CC today, and we had it covered big time!
1. We launched a FREE Lightroom Learning Center, with 20 videos on all the new features, along with Q&As, details and more. Here's the link..
2. We did THREE live Lightroom CC Webcasts (the fourth is coming up in 15 minutes) at this link (7pm EDT)
3. GET THIS: B&H Photo made a special deal, just for our viewers, for today and tomorrow. A FULL-YEAR subscription to the Adobe Photography Bundle (Lightroom CC and Photoshop CC), for just $99.99. That is the lowest price I've ever seen. Here's the link (only good thru tomorrow). Thanks B&H – you guys so rock!!!
4. We released FIFTEEN new Lightroom CC full-length online classes covering a ton of Lightroom learning. It's all on KelbyOne.com right now.
5. There's a whole bunch more, but I've got a run (we've live in just a few minutes). I'll have lots more to share tomorrow on The Grid at 4pm at kelbytv.com/thegrid
See you then!
P.S. If you would help us spread the word about all this stuff, it would be much appreciated!]]>
Step One:
Here, we'll use that same shot we just used for Auto Tone in the previous technique, since it has a number of exposure problems (I reset it here to the original version). When I took the shot, I let part of the sky clip (meaning, I let some of the highlights in the shot get so bright that there's actually no detail in those parts of the sky. No pixels whatsoever. Just blank nothing). You'll hear this problem referred to as having part of the photo "blown out" or "clipped" (short for clipped highlights). How do we know that part of this photo is clipping? Lightroom tells us with a white triangle-shaped highlight clipping warning, which appears in the upper-right corner of the histogram (shown circled here in red).
Step Two:
As long as that highlight clipping warning triangle stays black, you're okay (there's no clipping). If it turns white, you're in trouble (that means there's some serious clipping). If it's red, yellow, or any other color, it's not as bad—you're only clipping in one of those color channels—but it's not ideal (you'd like it to be solid black). Of course, you could drag the Exposure slider to the left a bunch, until the highlight clipping warning eventually turns black, but in most cases, your overall exposure will now be way too dark (as seen here).
Step Three:
One thing that might help you in dealing with highlight clipping is to actually see which areas of your image are clipping. One reason you need to know this is so that you can decide if it really needs dealing with at all, because we only really sweat highlight clipping when it happens in an area where there's some important detail. For example, if the sun is visible in your shot, it's gonna clip. But, as far we know, there's no detail in the surface of the sun, so we can just ignore that. To see which parts of your image are clipping, just click directly on the white highlight clipping warning triangle itself (or press the letter J on your keyboard), and the areas in your image that are clipping will appear in red (as shown here).
Step Four:
Clipping aside, the overall exposure of the sky looks too bright and (as I mentioned earlier) darkening the Exposure amount just a little makes the sky look better. In this case, it'll also remove some of the highlight clipping. So, I lowered the Exposure amount to –1.05 and you can see it did darken the sky and reduce the clipping a bit, but not nearly enough.
Step Five:
The slider that I use to reduce highlight clipping is the Highlights slider, and it does an amazing job of only affecting those really bright areas. If you drag it just a bit to the left (as shown here, where I dragged it to –28), you can see how it completely eliminated the red clipped areas (if you look up at the histogram, the triangle is now black). So, just remember: the Highlights slider is your secret weapon when it comes to highlight clipping.
Step Six:
Now, we still have the same problem we had in the previous technique, which is the trees are so dark in the foreground that it's hard to see any detail. This is where the Shadows slider comes in—it opens up detail and dimension in the shadows when you drag it to the right (as shown here, where I dragged it over to +69). Compare the trees and grass in this image to those in the last step and you'll see how much this helped, even though we darkened the overall exposure (I ended up decreasing the Exposure a bit here to –1.35). I also use this slider when I have a backlit subject (see page 236), where I add an extra step to the process to keep things balanced. Okay, so that's it. Those are the two main "problem solver" sliders.
Excerpt from The Adobe Photoshop Lightroom 5 Book for Digital Photographers
Learn how to do more from The Adobe Photoshop Lightroom CC Book here.


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Click here to print the obituary below
Betty J. Stahlecker
Betty J. Stahlecker
age 89, of New Philadelphia, died Tuesday, Nov. 13, 2012, in the Community Hospice House at New Philadelphia. Born Sept. 9, 1923, in Dellroy, she was a daughter of the late Orin and Trevia Guy Easterday. Betty grew up during the hard times of the Great Depression, and graduated from Dellroy High School. During the Second World War, she contributed to the war effort as an employee of the Timken Roller Bearing Co. at Canton. Additionally, she volunteered at the Salvation
Canteen in the Canton-Massillon area, helping to make soldiers' long train journeys more bearable. Following the war, she was employed by the U.S. Ceramic Tile Co. at East Sparta, where she met Lester Stahlecker. The two were married in 1947, and shared 33 years together before Lester's passing in 1980. Betty later owned and operated the Tammy Lynn Beauty Salon at Dover for approximately 40 years. She was also a long-time school bus driver for the New Philadelphia School Systema job Betty truly loved. She was a member of the Bisel United Methodist Church and the Rebekah Lodge, both at Dover, and the Tuscarawas County Senior Citizens. Betty enjoyed spending time with family and friends, especially her grandsons, whom she loved dearly.
Survivors include a daughter, Tammy Stahlecker of Parker, Ariz.; two grandsons, Sean Trough (a U.S. Army veteran) and James Topia (a student), both also of Parker; several nieces and nephews, including Kathy Fisher and Leslie (Travis) Love. In addition to her parents and her husband, Lester, Betty was preceded in death by three sisters, Ann Coffy, Gladys Gamble and Mary Whitehair; and a brother, John Easterday.
Family and friends are invited to call at the Toland-Herzig Funeral Home & Crematory at Dover Sunday, Nov. 18 from 122 p.m., with a funeral service being held at 2 p.m. Burial will be in Ridgecrest Memory Gardens, Dover. Following the committal, there will be a luncheon in the Toland-Herzig Monarch Center on the Boulevard at Dover. To sign an online guestbook and share a fond memory of Betty, please visit the Obituaries and Flowers link on the funeral home's website. The family suggests that contributions be made to the U.S.O., P.O. Box 96322, Washington, DC 20090, or to Community Hospice, 716 Commercial Ave. S.W., New Philadelphia, OH 44663.
Published in The Times Reporter from Nov. 16 to Nov. 17, 2012


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Student Development Westchester
Academic Organizations
Our academic organizations are tailored to specific areas of academic interest. There are clubs for all majors, schools, and interests involving these specific academic ranges.
Click the organization name below to view the official OrgSync page.
- Accounting Society (ACC)
- Criminal Justice Society (CRJ)
- Delta Sigma Pi - Business Honor Society
- Future Educators of America (FEA)
- Gamma Sigma Alpha - Greek Honor Society
- Lubin Business Association (LBA)
- Psychology Club (PSYCH)
- Student Nurses at Pace (SNAP)
- Student Nurse Coalition for Diversity and Development (SNCDD)
...in addition to a number of honor society chapters on campus.


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