text:
A substrate processing apparatus comprising a processing chamber in which a substrate support is located. The substrate support, which is in the form of a heater pedestal, has a surface dimensioned to receive the substrate, and is circumscribed by a removable purge ring which defines an annulus between itself and the pedestal. At the outer edge of the pedestal is a purge gas manifold, in the form of a cavity between the purge ring and the pedestal. The lower end of the manifold is sealed by means of a mechanical seal that is formed at process temperature as the pedestal expands from heating and comes into contact with the purge ring's lower edge. The upper end of the manifold opens into the annulus defined by the purge ring and the pedestal. The manifold is arranged so that during processing, purge gas is injected into the manifold and projected toward the edge of a substrate received on the surface of the pedestal. This gas moves upwards through the annulus defined between the purge ring and the substrate support. Consequently, processing gas is prevented from contacting the extreme edge portion of the substrate. This reduces unwanted deposition on the peripheral edge and lower surface of the substrate.
1. An apparatus for inhibiting a process fluid from contacting a portion of a substrate, comprising:
(a) a substrate support for supporting the substrate in a processing chamber;
(b) a ring circumscribing the substrate and the substrate support, the ring configured to be separated from a periphery of the substrate support within a characteristic temperature range,
(c) a purge fluid manifold through which a purge fluid is delivered to a region between the ring and the substrate:
(d) a first purge fluid exit in communication with the region between the ring and the substrate; and
(e) a second purge fluid exit configured to be obstructed, by the ring and substrate support coming into circumferential contact, within a processing temperature range.
2. An apparatus as in claim 1 wherein the characteristic temperature range is below the processing temperature range.
3. An apparatus as in claim 1, wherein the ring includes a material having a different coefficient of thermal expansion than that of the substrate support.
4. An apparatus as in claim 3 wherein the material has a smaller coefficient of thermal conductivity than that of the substrate support.
5. An apparatus as in claim 1 further comprising at least one ring support configured to reduce heat transfer between the substrate support and the ring.
6. An apparatus as in claim 5 wherein a contact area, between the ring support and at least one of the ring and the substrate support, is smaller than at least one cross-section through the ring support.
7. An apparatus as in claim 5 wherein the ring support has a lower thermal conductivity than that of the substrate support.
8. An apparatus as in claim 5 wherein the ring support is configured to align the ring with respect to the substrate support.
9. A method for inhibiting a process fluid from contacting a portion of a substrate supported on a substrate support in a processing chamber, comprising the steps of:
(a) circumscribing the substrate support and substrate with a ring configured to be circumferentially separated from the substrate support within a characteristic temperature range;
(b) delivering a purge fluid into a purge manifold having at least one purge fluid exit between the substrate support and the ring; and
(c) sealing the at least one purge exit by bringing the ring and the substrate support into contact, within a processing temperature range.
10. A method as in claim 9 wherein the characteristic temperature range is below the processing temperature range.
11. A method as in claim 9 wherein bringing the ring and substrate support into contact includes thermally bringing together the ring and the substrate support.
12. A method as in claim 11 wherein thermally drawing together the ring and the substrate support includes thermally expanding the substrate support against the ring.
13. A method as in claim 9 further comprising supporting the ring in a manner for inhibiting heat transfer between the substrate support and the ring.
14. A method as in claim 13 wherein supporting the ring includes providing a contact area, between a ring support and at least one of the ring and the substrate support, that is smaller than at least one cross-section through the ring support.
15. A method as in claim 13 wherein supporting the ring includes using a ring support that is less thermally conductive than the substrate support.
16. A method as in claim 13 wherein supporting the ring includes aligning the ring with respect to the substrate support.
This application is a continuation in part of U.S. patent application Ser. No. 08/200,862 filed on Feb. 23, 1994, and titled "Improved Chemical Vapor Deposition Chamber," and of U.S. patent application Ser. No. 08/327,462 filed on Oct. 21, 1994, now issued as U.S. Pat. No. 5,556,476 and titled "Controlling Edge Deposition on Semiconductor Substrates," and of U.S. patent application Ser. No. 08/342,670 filed on Nov. 21, 1994 now issued as U.S. Pat. No. 5,516,367, and titled "Chemical Vapor Depositing Chamber With a Purge Guide," the specifications of which are hereby incorporated by reference.
1. Technical Field
This invention relates to a method and apparatus for depositing useful layers of materials on substrates used in the manufacture of semiconductor die. More particularly, this invention relates to an improvement to a wafer heater pedestal used in such deposition process.
2. Background
Chemical vapor deposition, commonly referred to as "CVD," is one of a number of processes used to deposit thin layers of material on a semiconductor substrate. To process deposition substrates with the CVD process, a vacuum chamber is provided with a susceptor configured to receive a substrate thereon. In a typical prior art CVD chamber, the substrate is placed into and removed from the chamber by a robot blade and is supported by the susceptor during processing. Prior to processing the susceptor and the substrate are heated to a temperature of between 250�-650� C. Once the substrate is heated to an appropriate temperature, a processing gas is charged to the vacuum chamber through a gas manifold often situated above the substrate. The processing gas reacts with the heated substrate surface to deposit a thin material layer thereon. As the gas thermally reacts to form the material layer, volatile byproduct gasses are formed, and these by product gasses are pumped out of the vacuum chamber through a chamber exhaust system.
A primary goal of substrate processing is to obtain as many useful die as possible from each substrate. Many factors influence the processing of substrates in the CVD chamber and affect the ultimate yield of die from each substrate processed therein. These factors include processing variables, which affect the uniformity and thickness of the material layer deposited on the substrate, and contaminants that can attach to a substrate and contaminate one or more die therein. Both of these factors must be controlled in CVD and other processes to maximize the die yield from each substrate.
One of the causes of particulate contaminants in the chamber is improper deposition at the edge of a substrate. Because edge deposition conditions are difficult to control, due in part to the fact that substrate edges are typically chamfered and deposition gas flow is non-uniform around these edges, non-uniform deposition can occur around a substrate's edge. This may lead to deposited layers not adhering properly to each other and/or not adhering properly to the substrate.
This problem is illustrated in FIG. 1(a) which is a schematic partial cross-section of a typical semiconductor substrate. For this example, the substrate 1 is shown with three consecutive layers 2, 3, and 4 deposited thereon. Metals such as aluminum can be deposited on the substrate as the upper layer 4 after depositing intermediate layers 2 and 3 (or more layers, if necessary) on the substrate. As an illustrative, non-limiting example, in the deposition of tungsten on the substrate using WF6 gas, the first layer 2 would typically be titanium, the second layer 3 would be titanium nitride, and the third (upper) layer 4 would be tungsten.
Such a three-layer process for the deposition of tungsten is common as tungsten does not readily adhere to the silicon (or oxidized silicon) surface of the substrate. Accordingly a very thin "primer" layer 2 of titanium is deposited, followed by a second layer 3 of titanium nitride. Tungsten readily adheres to titanium nitride (TiN). As can be seen from FIG. 1(a), however, the tungsten layer 4 has "wrapped" around onto the beveled outer edge 5 of the substrate to contact directly with the silicon substrate.
The problem with this wrap around is that tungsten does not adhere to the silicon substrate surface and could readily chip and flake during the handling of the substrate, resulting in particulate contaminants.
An idealized edge cross-section is, therefore, that illustrated in FIG. 1(b) in which all three layers terminate at or close to the same point with respect to the substrate's edge, preferably above the chamber, with the metal layer 4 being the furthest back from the edge of the substrate.
One solution to this problem of unwanted edge deposition is to provide a shadow ring which is located over and masks a narrow, peripheral area of the substrate to prevent deposition thereon. However, this has the disadvantage that the ultimate yield by the substrate is reduced because its usable area is smaller. It is also inappropriate to use a shadow ring in situations where the entire upper surface of the substrate must be deposited on. The shadow ring is also not as successful as might be desired because of wafer warpage and the fact that the volatile deposition gas still tends to migrate under the lip of the shadow ring and deposit unwanted material on the substrate edge and backside.
Another factor which affects the uniformity of the deposition material layer is the uniformity of heating of the wafer. One method of uniformly heating the wafer is to use a heater pedestal for both supporting and heating the wafer. An example of this arrangement is described in the co-pending U.S. patent application Ser. No. 08/200,862 referenced above. In this arrangement, the wafer is supported on a flat supporting surface of a heater pedestal mounted on a vertical stalk within the chamber. The pedestal is heated from within by means of an electrical heating coil, and the wafer, in turn, is heated by the hot supporting pedestal. In order to provide for improved uniformity of heating of the wafer, this arrangement makes provision for a vacuum chuck in which a "vacuum" is drawn at the interface between the underside of this wafer and the flat supporting surface of the pedestal. The resulting pressure differential across the wafer draws the wafer onto the pedestal resulting in improved uniformity of heating of the wafer.
But as a result of this vacuum drawn at the backside of the wafer, processing gas can be drawn around the edge of the wafer and into the interface between the wafer and the pedestal. This can result in unwanted edge and backside deposition even when a shadow ring is located over the wafer. As explained earlier, this unwanted deposition can lead to the generation of particle contaminants. Accordingly, the improved uniformity of heating is accompanied by the possible increase of unwanted edge and backside deposition.
The need therefore exists for a method and apparatus for controlling the deposition of materials at or around the edge of a semiconductor substrate during CVD and/or other substrate processing operations.
Further, in some processes, cleaning deposits from components within the chamber is difficult to achieve. In the deposition of Aluminum, for example, the cleaning must be accomplished by physical scrubbing or chemical bathing of individual components.
Such deposits are most likely to occur on surfaces which are immediately adjacent the wafer and on surfaces which are suitably heated.
Accordingly, there is a need to reduce the amount of deposition on such surfaces and make them relatively easily cleaned.
There is a further need for such apparatus to be easily cleanable and serviceable, due to the deposition that inevitably occurs on deposition apparatus and the stresses induced by the high temperatures within the chamber.
Briefly, therefore, this invention provides for a substrate processing apparatus comprising a processing chamber in which a substrate support is located. The substrate support, which is in the form of a heater pedestal, has a surface dimensioned to receive the substrate, and is circumscribed by a removable purge ring which defines an annulus between itself and the pedestal.
At the outer edge of the pedestal, a purge gas manifold, is formed as a cavity between the purge ring and the pedestal. The lower end of the manifold is sealed by means of a mechanical seal that is formed at process temperature as the pedestal expands from heating and comes into contact with the purge ring's lower edge. The upper end of the manifold opens into the annulus defined by the purge ring and the pedestal. The manifold is arranged so that during processing, purge gas is injected into the manifold and projected toward the edge of a substrate received on the surface of the pedestal. This gas moves upwards through the annulus defined between the purge ring and the substrate support. Consequently, processing gas is prevented from contacting the extreme edge portion of the substrate. This reduces unwanted deposition on the peripheral edge and lower surface of the substrate.
The purge ring is preferably made of a nickel-chromium-iron alloy, such as 316L stainless steel. The purge ring is supported on three ceramic pins which in turn rest on the pedestal. As a result the purge ring is supported clear of the heater pedestal and there is less heat transfer from the pedestal to the purge ring. The purge ring therefore operates at a lower temperature, reducing deposition on the ring.
The purge ring may have wafer guides formed thereon which align the substrate with respect to the substrate support, and the purge ring may also be supported on the pedestal by ceramic locating/support pins which further reduce heat transfer to the ring.
The purge ring may also have a raised upper edge such that when the ring is positioned on the pedestal, a substrate receiving pocket is formed. When the wafer is placed in the pocket, its processing surface would be at or below the surface of the purge ring. In this case, the raised portion of the purge ring would shield the edge of the wafer from direct flow of processing gas.
The receiving surface of the pedestal may further include vacuum ports formed therein, whereby a vacuum can be drawn at the interface between the pocket floor and the underside of a substrate received thereon, thereby causing the substrate to be drawn onto the pedestal to improve processing.
The receiving surface of the pedestal may also have a substrate receiving pocket formed therein, such that a wafer placed in the pocket would have its surface at or below the surface of the pedestal.
The pedestal preferably includes a heater for heating the support whereby a substrate supported thereon is heated by means of conduction.
This invention finds particular application in, but is not limited to, semiconductor wafer processing chambers which process such wafers using a metal CVD process.
A primary advantage of this invention is that it reduces the occurrence of deposition on the edge and backside of the substrate. This in turn reduces particulate contaminants originating from unwanted edge/underside deposition that inadequately adheres to the substrate.
Another advantage of this invention is that it yields a more uniform deposition material layer on the substrate, while simultaneously reducing the incidence of particle generation during processing. By eliminating the shadow ring which touches the substrate during processing, the overall yield of die from the substrates is increased by eliminating the masked edge of the substrate created by the shadow ring.
Yet another advantage of this invention is that the purge ring may easily be removed for wet or mechanical cleaning.
These advantages and further details of the present invention will become apparent to one skilled in the art from the following detailed description when taken in conjunction with the accompanying drawings.
In the accompanying drawings:
FIGS. 1(a) and 1(b) are partial cross-sections of a semiconductor substrate respectively illustrating non-ideal and ideal deposition of material layers at the edge of the substrate;
FIG. 2 is a top view of the heater pedestal in the invention;
FIG. 3 is a cross-section along line 3--3 in FIG. 2;
FIG. 4 is an enlarged partial sectional view of the upper portion of the pedestal and purge ring, taken along line 4--4 in FIG. 2; and
FIG. 5 is a plan view showing details of a wafer guide.
To reduce the deposition of material on a semiconductor substrate wafer's underside and edge, a heater pedestal as illustrated in FIGS. 2 and 3 includes edge protection in the form of a circumferential purge gas ring 24 positioned adjacent to the periphery of a wafer (not shown) when a wafer is received on the supporting surface 22 of the pedestal 16. Once the wafer is positioned on the pedestal 16 and processing begins, a continuous flow of purge gas is provided to a purge gas manifold 26 to flow through a purge gap 83 and about the entire edge of the substrate. The purge flow has the effect that little or no deposition occurs on the edge of the substrate, or on the underside of the substrate immediately adjacent to the edge. The resulting configuration of deposited layers of material would resemble that illustrated in FIG. 1(b).
Detailed Description
As illustrated in FIG. 2, the pedestal 16 has an upper supporting face 22 on which a semiconductor wafer 23 (not shown in FIG. 2) can be supported. This face 22 has a plurality of concentric circular grooves 40 formed in it. These concentric grooves 40 are typically 0.21 mm (0.08 inches) wide and 0.38 mm (0.015 inches) deep and 2.97 mm (0.117 inches) apart. They are interconnected by means of radially oriented channels 42. Approximately midway along the length of each radial channel 42 a plurality (24 total) of vacuum ports 44 are formed into the body of the pedestal.
FIG. 2 also illustrates apertures 30 which pass through the body of the pedestal 16. These apertures 30 receive wafer lift fingers (not shown) which operate to lift the wafer clear of the upper face 22 of the pedestal 16 so that the wafer can be removed after processing. This removal of the wafer is achieved by means of a conventional processing apparatus robot arm (not shown) which enters the chamber through a port that is selectively opened through a slit valve. The same robot arm is also used to place wafers in position for processing. The lift fingers are moveable vertically under action of a lifting mechanism which is well known in the art.
In FIG. 3, the heater pedestal 16 is shown to comprise a main body 61 supported by a vertical stalk 18. The vacuum ports 44 of FIG. 2 are in communication, via eight holes 45, with a circular manifold groove 46 formed into the underside of the main pedestal body 61. This groove 46 is sealed at the underside of the pedestal by means of ring plugs 48. The groove 46 is also in communication with a vacuum conduit 50 located within the stalk 18. The conduit 50 communicates with the groove 46 by means of at least one generally horizontal conduit (not shown) within the main body 61 of pedestal 16. Within the stalk 18 are, in addition to the vacuum conduit 50, a purge gas conduit 51, a housing containing a thermocouple (not shown) for measuring the temperature of the pedestal, and a conduit 56 for supplying power to a heating element 54 located within the main body 61 of the pedestal 16.
A removable purge ring 24 circumscribes the supporting surface 22 and rests on three ceramic supporting pins 60 which are spaced apart at the perimeter of the pedestal 16. In this position, and as shown in detail in FIG. 4, the angled inner surface 25 of the purge ring 24 together with the angled outer face 27 of the pedestal forms an annulus 80. The annulus 80 directs purge gas into a purge gap 83 defined between the wafer 23 and the ring 24. The gap 83 is dimensioned to allow sufficient flow of purge gas to prevent deposition on the edge and underside of the wafer. In one embodiment of the invention, the purge gap 83 is 0.023 to 0.030 inches when the apparatus is at operating temperature. This configuration of the annulus 80 and the purge gap 83 provides a relatively constant supply of purge gas about the entire perimeter of the substrate. The annulus 80 is supplied by a purge gas manifold 26 in the form of a cavity encircling the entire outer edge of the main body 61 of the pedestal 16.
As further shown in FIG. 4, the inner surface 28 of the purge ring 24 together with the peripheral face 23 of the pedestal 16 forms the purge gas manifold 26. The gas manifold 26 communicates with the purge gap 83 through the annulus 80. At room temperature it is open at its lower end and a gap exists at the interface 82 between the sealing edge 84 of the purge ring 24 and the peripheral surface 23 of the pedestal 16. As described below, in operation, this gap, between the sealing edge 84 of the purge ring and the peripheral surface 23 of the main body 61 of the pedestal, is closed. The gas manifold 26 is supplied with purge gas by eight purge gas outlets 86 formed in the main body 61 of the pedestal 16. These purge gas outlets 86 are in communication with a purge gas supply 57 via a purge gas conduit 51 (shown in FIG. 3).
Because the purge ring 24 is freely removable at room temperature (without loosening any fasteners) when a gap exists at the interface 82, wet and/or mechanical cleaning to remove deposition is facilitated. This same purge ring 24 forms a tight mechanical seal at the interface 82 during processing at elevated temperatures, in the manner described below.
Proper positioning of the wafer on the receiving surface 22 is important, as any gross misalignment places a portion of the wafer edge in a position which obstructs gas flowing out from the purge gap 83. To aid in proper wafer positioning, and as shown in greater detail in FIG. 5, the purge ring 24 has protrusions in its upper surface 32 at its inner circumference in the form of wafer guides 81. These wafer guides 81 have angled inner faces 85 which capture the outer edge of the wafer 23 and serve to align it when it is received on the surface 22 of the pedestal 16. Misalignment of the wafer 23 results in engagement of one or more of the wafer guides by the edge of the wafer. These pins serve to align the entire circumference of the wafer with respect to the purge ring 24 to define the purge gap 83 around the entire edge of the wafer. Use of the wafer guides 81 thus allows tolerance of slight inaccuracies in the positioning of the wafer by the robot blade. In an embodiment of the invention, there are six such wafer guides 81 spaced at equal intervals on the upper surface 32 of the purge ring 24, and positioned to provide approximately 0.012 to 0.013 inches of tolerance between the guides 81 and the outer edge of the wafer 23.
In a preferred embodiment, the purge ring 24 is made from a nickel-chromium-iron alloy such as 316L stainless steel, but may be made of a material which also has a lower coefficient of thermal expansion than the material of which the main body 61 is made. The reasons for this will become apparent below. It is also preferred that the supporting pins 60 on which the purge ring 24 rests be designed to minimize heat transfer from the pedestal 16 to the purge ring 24. This permits the purge ring 24 to operate at a lower temperature and thus reduce the amount of deposition thereon. The reduced deposition on the purge ring 24 allows a greater time interval between downtimes for cleaning and other maintenance. Thus, in order to reduce heat transfer to the purge ring 24, the supporting pins 60 are dome shaped to minimize contact area and made of a ceramic such as alumina which has a poor thermal conductivity.
Additionally, the purge ring 24 has a thin walled section 29 which, due to its reduced cross-sectional area, reduces heat transfer from the sealing edge 84 to the rest of the purge ring, and in particular to the upper surface 32.
Although the figures illustrate an embodiment suitable for use with a circular wafer, it should be noted that the purge gap 83 should follow the perimeter of the substrate. Accordingly, if a non-circular substrate (such as a wafer with a "wafer flat" formed in it) is being processed, the gap should be formed to follow the irregular perimeter. Furthermore, though the illustrated embodiment comprises a flat wafer supporting surface, the invention may be used with substrate supports having different configurations, such as a susceptor having a deep pocket for supporting the substrate. Additionally, the purge ring itself may be configured such that it completely surrounds the periphery of the wafer to produce a pocket in which the wafer is placed.
During processing, the robot blade places an appropriately dimensioned semiconductor wafer on the wafer lift fingers which then lower the wafer onto the upper surface 22 of the pedestal 16. As the wafer is lowered, any misalignment of the wafer will be corrected by the wafer guides 81 which nudge it into position. The semiconductor wafer thus rests on the upper surface 22. In this position, the edge of the wafer will be very close to the purge gap 83, as the wafer guides 81 on the inner circumference of the purge ring 24 are positioned to give approximately 0.080 inches of tolerance with respect to the wafer.
A typical metal deposition process has two discrete deposition steps. During the first step, lasting about thirty (30) seconds, the pressure in the chamber is reduced to about 0.6 kPa (4.5 Torr) and a metal deposition gas introduced into the chamber. This step, known as a nucleation step, results in a very thin layer of metal being deposited on the wafer. This thin layer serves as a base layer onto which further layers of metal are deposited.
During the second deposition step (last less than 60 seconds and during which most of the metal is deposited), a "vacuum" is drawn at the interface between the wafer and the upper face 22 of the pedestal 16. This is achieved by drawing a vacuum to about 2.7 kPa (20 Torr) through the vacuum ports 44 via the conduit 50 and the grooves 46. The drawing of this vacuum results in a pressure of about 2.7 kPa in all the concentric grooves 40. As the interior pressure of the chamber during processing is approximately 10.7 to 12 kPa (80 to 90 Torr), a pressure differential exists across the wafer. This causes the wafer to be drawn against the upper face 22 of the pedestal 16. The advantage of this tight contact is that heat from the pedestal is more uniformly transmitted from the pedestal to the wafer. This leads to a uniform heating of the wafer and, therefore, improved deposition of metal on the wafer surface.
The pedestal 16, in turn, is resistively heated by means of the electrically powered heating coil 54 mounted within the body of the pedestal 16. The coil 54 is supplied with electrical power along a rigid, stainless steel connecting stem 56 located within the body of the stalk 18. Although only one coil is shown in this figure, more than one coil could be used or even multiple heating elements which are nested together but powered separately.
When the pedestal 16 is heated, the main body 61, which is typically made of aluminum, expands due to increased temperature. The purge ring 24, which is made of stainless steel having a lower temperature coefficient of linear expansion and is at a lower temperature, does not expand as much. The peripheral face 23 of the pedestal thus comes into contact with the sealing edge 84 of the purge ring 24, creating a mechanical seal at the interface 82 between the purge ring and the pedestal. The gas manifold 26 is now in communication with only the purge gap 83 and the purge gas outlets 86.
During the second deposition step, an inert purge gas, typically argon, is supplied at a flow rate of approximately two liters per second from the purge gas supply 57 at approximately 207 kPa (30 p.s.i.) and flows through a flow control device, such as a mass flow controller. This control device causes the pressure in the purge gas to drop by about 25% to 33%. Additional pressure drops occur in the gas as it moves through the purge gas outlets 86, towards and into purge gas manifold 26. Nonetheless, the pressure of the purge gas is still great enough in the gas manifold 26 to substantially prevent process gas from migrating into this manifold via the purge gap 83. From this manifold 26, the purge gas flows out through the purge gap 83. Once the purge gas has flowed out, it enters the processing chamber to be exhausted through standard exhausts in the chamber. If supplied at all, the purge gas is supplied during the first deposition step at approximately 250 milliliters (standard cubic centimeters) per minute.
The supply of this purge gas has a particularly advantageous effect in that it substantially reduces or eliminates deposition of metal on the edge and outer portion of the underside of the wafer. It is believed that the deposition gas is removed from the vicinity of the edge of the wafer by the flow of the purge gas. This occurs because the purge gas flows out continually and at high mass flow rates through the purge gap 83, effectively preventing diffusion of deposition gas into the vicinity of the wafer edge.
Although the present invention has been described above in terms of a specific embodiment (that of an apparatus for use in a metal CVD process), it is anticipated that alterations and modifications thereof will no doubt become apparent to those skilled in the art. Additionally, although the invention has been described for use in a thermal CVD chamber, the components herein are equally suited for use in plasma deposition and other substrate processing operations. It is therefore intended that the following claims be interpreted as covering all such alterations and modifications as fall within the true spirit and scope of the invention.
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ApplianceGeneral Electric Refrigerator
Level of DifficultyA Bit Difficult
Time to do repair1- 2 hours
Age of ApplianceMore than 10 years
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7 out of 19 people found this instruction helpful
I had to back-track acouple of times because I put the shelf brackets back in before I had the back panel in.It was also alittle tight getting the thermostat snapped back on the refrigerant line because it is a tight space and I have big hands.For a first timer who has had minimal experiance it wasn't too tough.
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Explore the Entrepreneurship.org Resource Center to find resources. Designed with entrepreneurs in mind, our resource center allows you to find materials to grow great ideas.
Always: too much information, not enough time. This list can pare your blogging time be recommending blogs that are worth your valuable time.
Well-known and well-published futurist Dr. James Canton predicts that the real-time economy of the 21st century will reveal IT as the primary enabling force driving competitive advantage. Check out Dr. Canton's top 10 IT trends for 2007.
Entrepreneur and business model innovator Alexander Osterwalder discusses dynamic, yet simple-to-use tools for visualizing, challenging and re-inventing business models. Osterwalder articulates how to use the visual language of his business model canvas framework, and shares stories of how this approach helps organizations of all sizes to better create, deliver and capture value.
Leaders of biotech companies and other life science businesses need to keep their speeches focused and light on the science. Read more about this and other tips for giving great speeches to investors or anyone else.
Life science entrepreneurs are partnering with universities to bring new products to market. Read more for tips on working with universities.
Depending upon your politics, the recent passing of the historic healthcare reform bill has you high-fiving friends and co-workers or preparing for Armageddon, as it will most certainly usher in a period pestilence, poverty, and perniciousness.
So whether you're popping corks on some bubbly or stocking...
In the depths of the credit crunch, community lenders become a popular financing source for Main Street. But small-business owners may need to work harder to get support from local banks these days.
At MedCity CONVERGE, a national, executive-level summit on healthcare innovation in Philadelphia last week, the program featured opportunities for life science and digital health entrepreneurs to share their lessons from the field. Here are three of their stories.
As the sixth season of one of my favorite shows came to a close last weekend, I realized you can actually extract a few important lessons out of the drama of one of television's best shows. And, since we watched the fictitious Sterling Cooper advertising agency grow from a small, boutique firm to a top 30 Madison Avenue agency this season, I thought I would make a few observations about what Mad Men can teach startups.
Last week's announcement detailing the rollout of Google's fiber optic network had the feel of a Silicon Valley big-time new product launch. It was definitely a big deal for Kansas City on both sides of the state line. Most importantly, information flowed copiously from Google about the details of their project—a welcome relief from the hitherto tight-lipped tech giant. The Google Fiber announcement lived up to the initial promise to deliver gigabit Internet speeds over a fiber optic network to homes at competitive prices.
Want to get connected? Sign up to receive regular news, polls and updates from The Kauffman Foundation.
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Thyroid Disorders Center - Pharr, TX
Pharr Endocrinologist Doctors for Thyroid Disorders
Type of Physician: Endocrinologist
What is a Endocrinologist?
A subspecialty certification by the Board of Internal Medicine; practitioners treat disorders of the internal (endocrine) glands such as the thyroid and adrenal glands. Endocrinology also deals with disorders such as diabetes, metabolic and nutritional disorders, pituitary diseases, and menstrual and sexual problems.
Specialty: Endocrinology
Common Name:
Endocrinologist Doctors in Pharr *
South Texas Diabetes
Mcallen VA Outpatient Clinic
Kent J Lyon MD
Diabetes & Endocrinology Clinic
Joslin Diabetes Center
Joslin Diabetes Center
Joslin Diabetes Center
Donald Roa MD PA
South Texas Endocrine Clinic
Diabetes Control Center
Florina A Duazo MD PA
Humberto R Bruschetta MD PA
Pharr, Texas
Thyroid Disorders
What are thyroid disorders?
Thyroid disorders are conditions that affect the thyroid gland, a butterfly-shaped gland in the front of the neck. The thyroid has important roles to regulate numerous metabolic pro...!--*ICCChunk-4014*-->
Other Related Thyroid Disorders Articles
Emergency Contact for Pharr
Nearby Pharr Hospitals *
Lifecare Hospitals South Campus
Mc Allen Heart Hospital
Rio Grande Regional Hospital
Mcallen Medical Center
Solara Hospitals Of Mcallen
Lifecare Hospital South Texas
Doctors Hospital At Renaissance
Edinburg Regional Medical Ctr
Edinburg Regional Rehab Center
Cornerstone Regional Hospital
Solara Hospital Of Edinburg
South Texas Behavioral Health
Mission Regional Medical Center
Knapp Medical Center
Rio Grande State Center
Harlingen Medical Center
Solara Hospital Harlingen
Valley Baptist Medical Center
*Provider Directory Terms of Use:
The WebMD 'Provider Directory' is provided by WebMD for use by the general public as a quick reference of information about Providers. The Provider Directory is not intended as a tool for verifying the credentials, qualifications, or abilities of any Provider contained therein. Inclusion in the Provider Directory does not imply recommendation or endorsement nor does omission in the Provider Directory imply WebMD disapproval.


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by Kay Steiger Posted on February 3, 2015
"I never thought it was going to go viral. And I thought it was just to folks that were in my district," she said.
by Jack Jenkins Posted on January 28, 2015
Unfortunately for Gov. Jindal, "no-go zones" don't actually exist.
by Jack Jenkins Posted on January 21, 2015
"Long live liberty! Long live friendship! Long live solidarity! Long live France!" Lassana Bathily said.
by Yasmine Taeb - Guest Contributor Posted on January 20, 2015
When it comes to deciphering the roots of such violence, a problematic issue arises when certain individuals attempt to paint Islam and all its adherents with a broad brush.
by Igor Volsky Posted on January 20, 2015
"There are neighborhoods were women feel less comfortable going in without veils there are wrong, we all know there are neighborhoods where police are less likely to go into," Jindal said.
by Aviva Shen Posted on January 18, 2015
The network apologized on air four times on Saturday.
by Jack Jenkins Posted on January 5, 2015
"As a highly visible protest against xenophobia, racism and exclusion, the outdoor lighting of Cologne Cathedral will therefore be turned off on January 5 for the period of the demonstration," Cologne Cathedral Provost Norbert Feldhoff said.
by Beenish Ahmed Posted on December 23, 2014
""A radical, parallel society is taking shape here."
by Ian Millhiser Posted on December 18, 2014
The Islamic Center was rejected after many residents reportedly made "disparaging remarks about the Muslim faith" in opposing their plan.
by Jack Jenkins Posted on December 8, 2014
"This is a community that fled a violent situation. Now we're facing violence in the United States, " Abdinajib Dirir said.


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When Was The Last Time a Retailer Did Something for You? A True Story
1177 days ago - When was the last time a game retailer made a difference in your life? Sebastian shares one of his experiences with retailer Play 'n' Trade, and ta... | Opinion piece | Xbox 360
Fixing Mistakes: Why the next PlayStation Should Play PS2 games
1189 days 14 hours ago - In this weeks ForceTime, Sebastian talks about why the next PlayStation should play PS2 games, and how it has affected PS3 users. | Opinion piece | PS2
The Tester is Dumb but Oddly Compelling
1210 days 15 hours ago - The PlayStation Network reality show The Tester is a completely ridiculous show that is actually worth watching….kind of. | Opinion piece | PS3
Reminder: One more day to enter our Cartoon Network Giveaway
1266 days 18 hours ago - We've had a great run for our giveaway of Cartoon Network's Punch Time Explosion XL for PS3! But it's ending soon, so get your entries in now!... | News | PS3
See what games are coming out in 2015
Bits 'n' Bytes Giveaway: Punch Time Explosion XL for PS3!
1271 days 15 hours ago - Bits 'n' Bytes is giving away a copy of Punch Time Explosion XL for PS3! | News | PS3
Punch Time Explosion XL Lets You Pit Dexter vs. Johnny Bravo
1277 days 8 hours ago - Cartoon Network is releasing Punch Time Explosion XL, a fighting game where you can make Cartoon Network characters beat the crap out of each other. | News | Wii
ForceTime: Don't Like The Spike Video Game Awards? Then Ignore Them!
1282 days 11 hours ago - This week, writer Sebastian Force addresses those who complain about how stupid the Spike Video Game Awards are. | Opinion piece | Culture
Why Twisted Pixel is Awesome
1292 days 13 hours ago - Twisted pixel is one of the best developers in the industry! If you haven't heard about them, here's why you need to check them out. | Opinion piece | Xbox 360
The Humble Bundle Is An Evil Conspiracy
1331 days 7 hours ago - This week I unveil the evil conspiracy behind the Humble Bundle. | Opinion piece | PC
What happens when comic book continuity comes to games?
1338 days 6 hours ago - What happens when comic book continuity comes to games? Could it change the entire industry? Could it potentially dethrone the shooter? Force... | Opinion piece | Culture
Dear Game Journalists: "GameJournos" is a good thing
1345 days 9 hours ago - "Gamejournos" (aka Game Journalists Are Incompetent Fuckwits) is overall a positive for game journalism and gaming itself, no matter what they say,... | Opinion piece | Culture
Warning: Plants vs Zombies Crazy Dave rap will get stuck in your head
1345 days 15 hours ago - For some unknown reason, Crazy Dave from Plants vs Zombies decided he was going to rap today. Actually, come to think of it, Crazy Dave's new rap m... | News | PC
The games that made us gamers: Killer7
1354 days 11 hours ago - Revisit the insanity of Killer 7 with Sebastian as he talks about the game that made him a gamer. | Opinion piece | GameCube
Why are gamers letting Rage screw them over?
1373 days 10 hours ago - This week, ForceTime discusses the problem with Rage putting single player content behind a paywall. | Opinion piece | Culture
Forcetime: "No More Credits"
1381 days 10 hours ago - In the debut of Forcetime, BnB Gaming's Sebastian Force discusses the circumstances surrounding the current "Extra Credits" debacle. | Opinion piece | Culture
Why The Hell Don't Gamers Have A Bill Of Rights?
1415 days 10 hours ago - With the recent emails coming out from Team Bondi's employers about their work conditions, I ask a simple question: Why The Hell Don't Game De... | Opinion piece | Culture
PATCH NOTES: A Twin-Stick Shooter With A Fantastic Twist
1423 days 9 hours ago - Check out Patch Notes, a twin-stick shooter with an amazingly unique twist: Every ten seconds, the game is "patched" which radically changes the ga... | News | Xbox
E3 2011: My First E3!
1450 days 7 hours ago - It's about to get personal: E3 2011 marks both Sebastian's and Bits 'n' Bytes Gaming's first run-in with the world's biggest games conference. | Article | Culture
Don't Like Sequels? Shut up and let the rest of us have fun.
1467 days 2 hours ago - Don't like sequels? Some of the Game Industry's best games have come the second time around. Don't hate some games just because they have a number... | Opinion piece | Culture
What will your kids nostalgia be?
1499 days 20 hours ago - What types of games will your kids grow up with? What will be their Crash Bandicoot, Zelda or Metroid? What will they look back on with nostalgia? | Opinion piece | GameCube


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Apply now for a Business Flex Checking Account!
Apply now for a Business Interest Checking Account!
Apply now for a Business Loan!
Written by Jeff Thredgold, President, Thredgold Economic Associates
October 19
The U.S blinked in recent days, preferring to put off until after the November elections the question of whether or not to declare China a "currency manipulator." Such a move might have been the correct one. What we don't need at this juncture is a trade war with China.
The U.S.-China relationship is unlike any other on the planet. We need the Chinese to buy vast amounts of U.S. Treasury bills, notes, and bonds to help us fund our massive budget deficits. China needs the U.S. to be a major buyer of Chinese-produced goods.
Intense pressure upon China from the U.S., Japan, and Europe to allow its currency to strengthen further in value has been in place for years. The Chinese have allowed their currency, the yuan (also known as the renminbi) to rise in value roughly 20% versus the dollar since 2006, including a 2.8% rise since mid-June 2010.
Critics of China strongly argue that another 20% or 30% or even 40% appreciation is needed to better "balance" the global economy, reduce Chinese exports to the world, and enhance Chinese demand for additional exports from the U.S. and other nations.
U.S. and other major nation manufacturers have a valid claim that the efforts of the Chinese leadership to keep its currency undervalued allow China to sell more products around the globe, thereby undermining (and under pricing) manufacturers in the U.S. and around the world…no argument here.
The Chinese are a proud people. Their leadership has made it clear that additional currency appreciation will come, but it will be on their timetable…not ours.
The Flip Side
However, there is an important and positive by-product of that undervalued yuan. Goods produced in China are more affordable to Americans, whether shopping at Wal-Mart or Target or Forever 21 or other retailers. The Chinese currency manipulation allows greater U.S. household purchasing power for Chinese-made goods…good news for U.S. households that are already under tremendous pressure from a very damaging recession and a weak U.S. economic recovery.
Record imports from China have led politicians from both sides to demand a stronger yuan. The roughly $28 billion U.S.-China trade imbalance in August ($35 billion in U.S. imports, versus $7 billion in U.S. exports) recently provided more ammunition for the appreciation argument.
China is easily our fastest growing export market. China is now the third largest export market of the U.S.—behind only Canada and Mexico. From 2000 to 2009, U.S. exports to China surged 330%, while U.S. exports to the rest of the world rose only 29% (USA TODAY).
The Chinese bought $21.7 billion of U.S. Treasury securities in August, bringing its total ownership to $868.4 billion. Japan ranks second with $836.6 billion of U.S. Treasury securities (money.CNN.com.)
Down the Road
Chinese premier Wen Jiabao talked candidly about the currency earlier this month, noting "if we increase the yuan by 20-40 percent as some people are calling for, many of our factories will shut down, and society will be in turmoil." He noted that would be "a disaster for China and the world." Rarely has a Chinese leader been so candid about societal and political challenges in this nation of 1.3 billion people.
What he may not see are the longer-term benefits to China of a stronger currency…less global friction, stronger Chinese consumer purchasing power, and less dependence upon volatile exports to the global community
"No Way!"
The Year…2005
The Premise…sometimes clairvoyant Adilyn saw a brief glimpse of the future, five years hence
The Setting…having dinner with some intellectual friends
"Trust me!" Stated Adilyn to her skeptical friends, "I really did see a glimpse of the economy and financial markets five years from now."
"No Way!" Stated Kennadie, sitting to Adi's left.
"I did. The government just ran a $1.3 trillion annual budget deficit, following a $1.4 trillion deficit the year before."
"OK," noted Kennadie, "if the deficit were ever that enormous, intermediate and long-term interest rates would have to be at extremely high levels in order to attract all of the buyers necessary of U.S. Treasury notes and bonds to fund that deficit. Such high interest rates would likely kill any economic recovery."
"Actually," noted Adi, "10-year maturity U.S. Treasury notes are around 2.50% and 30-year fixed-rate conventional mortgages are around 4.25%, at or near the lowest levels in 50 years."
"No Way!" Stated Ella, sitting to Adi's right. "That relationship of enormous deficits and extremely low long-term interest rates makes no sense. It would also seem logical that if budget deficits are that out of control, the Federal Reserve must be pushing its key interest rate higher in order to stifle impending inflationary pressures."
"Well actually," noted Adi, "the federal funds rate has been at 0.00%-0.25% for nearly two years, the lowest level ever. In addition, the Fed is likely to buy roughly $500 billion or more of mortgage-backed securities and U.S. Treasury securities in coming months to help the economy. These purchases would be in addition to roughly $2,000,000,000,000 of similar purchases during the past two years."
"No Way!" Stated Kennadie and Ella simultaneously. "First of all, such enormous purchases, all financed with money created out of thin air, would force inflation expectations higher and higher. The Fed would be viewed to have lost its collective mind."
"Actually," stated Adilyn, knowing that further disbelief was imminent, "consumer prices have risen only 1.1% during the most recent 12-month period. In addition, 'core' inflation, excluding food and energy prices, has risen only 0.8% during the past year, the smallest rise in 49 years."
"No Way!" Stated her now clearly exasperated dinner partners. "OK, how 'bout this. With that level of government stimulus and that level of monetary stimulus, the economy must be booming. Home prices must be surging. The unemployment rate must be extremely low. How could it not be with such unprecedented—and frankly unbelievable—stimulus?"
"Well actually," stated Adi, "the economy is barely growing, with a meager 1.7% real (after inflation) growth rate during 2010's second quarter and similar growth expected during the third quarter. Average home prices have fallen roughly 30% over the past three years. In addition, the unemployment rate is at 9.6%, and has been at 9.5% or higher for 14 months, the longest such period since the Great Depression."
"No Way!!" Shouted Kennadie. "That combination of factors simply makes no sense."
"Here's an idea," Ella continued. "You're a good friend. But next time you have one of your clairvoyant episodes, please keep it to yourself."
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Brooklyn-based designer, Bodkin is known for well-constructed and environmentally sustainable garments. All pieces are made from repurposed and salvadged fabrics. The swimwear for the Spring were...
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Yamaha outs retro THR5 and THR10 amps
I like products that look really old, but have modern insides. Yamaha has a new amplifier for musicians that look like something out of the 50's to me. The amps come in two versions including the THR5 pictured and the THR10. These are small amps reports Wired looking like the head unit of a stack. I've got so little music talent in me I have no idea what size that would be.


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AGAWAM, Mass., March 3 /PRNewswire/ -- Contamination by an unknown organism often calls for total shutdown of a cleanroom's operation until that organism can be identified and eliminated. Such shutdowns can have catastrophic effects on the schedules and productivity of medical device and pharmaceutical manufacturers alike.
A new white paper, "The Microbial ID Breakthrough: How DNA Sequencing Services Help Prevent Catastrophic Cleanroom Shutdowns," outlines common sources of contamination, discusses problems and delays associated with traditional methods of identifying those contaminants and highlights breakthrough solutions to these difficulties.
The white paper is available, free, for download at: http://www.microtestlabs.com/microseq/
"Modern cleanrooms used for the manufacture of medical devices, pharmaceuticals, or combination products face widespread, persistent threats of contamination. Much of this contamination comes from the people working in these environments. They carry in invasive organisms on themselves -- as well as on the equipment and materials they bring into the environment," says Dennis Champagne, author of the white paper and Director of Lab Services at Microtest Laboratories.
With more than 13 years' experience in regulatory microbiology and contract laboratory operations, Champagne leads Microtest's microbiology, contract analytical chemistry, laboratory support, and virology departments. He holds a B.S. degree in microbiology from
"Fast action is vital. To get the cleanroom back up and running as quickly
|SOURCE Microtest Laboratories
Copyright©2009 PR Newswire.
All rights reserved


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|Hilton Garden Inn Jones properties are provided below. Search for cheap and discount Hilton Garden Inn hotel rooms in Jones, MI for your group or personal travels. We list the best Hilton Garden Inn Jones hotels/properties so you can review the Jones Hilton Garden Inn hotel list below to find the perfect place.
Our site will also provide Jones, MI hotels & motels that get similar quality scores of a Hilton Garden Inn.
All Hilton Garden Inn in or near Jones
Hotels like Hilton Garden Inn
Next: Show All Available Comparable Hotels with Pricing >


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Laserlyte 392 Batteries, 12-Pack
Special Offer:
56 Issues of Sports Illustrated Magazine
Included with purchase ($20 value).
Laserlyte 392 Batteries, 12-Pack
Weights & Dimensions
|Size: 1.5 Volt
|Pack Size: 12 Per Pack
|Country of Manufacture: United States
About the ManufacturerLaserLyte, the industry leader with the smallest lasers for gun sights, laser bore sights and laser training is celebrating 25 years of laser innovation. Larry Moore started in the firearms/hunting industry over thirty years ago in Arizona and led the way for lasers in the shooting sports industry. Now with his son, Aaron Moore, Larry continues to revolutionize the way customers use lasers for advancing shooting skills and personal protection. From the initial product line-up of laser bore sights, LaserLyte tackles designing, engineering and producing some of the industry's first solid-state lasers for firearms and continues to revolutionize the market with the smallest, high performance lasers for rear sights, rail mounts and side mounts for revolvers, semi-auto pistols and rifles. What started out 25 years ago as an entrepreneur's dream is now a successful shooting industry family business.
Laserlyte 392 Batteries, 12-Pack
Customer Reviews
Tell Us What You Think!
Tell us what you think about this product. It will help us provide you with better products in the future and help your fellow shoppers make better purchases.Write the first review
OUR SKU # LSLT1062392 Batteries, 12-Pack is also sometimes listed under the following manufacturer numbers: BAT-392


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BOISE -- There was a big unveiling Thursday at the Morrison Knudsen Nature Center in Boise.
Local artist Marcus Pierce designed the alpine lake mural with water features within the wall.
In this mural there are elements that are naturalistic forms that you might expect with various wildlife, but I also wanted people to consider how to connect the dots between the different areas of nature and how things are interrelated, said Pierce.
Pierce said the entire mural took about six months from conception to the finished product.


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to page content
to site navigation
Explore the Entrepreneurship.org Resource Center to find resources. Designed with entrepreneurs in mind, our resource center allows you to find materials to grow great ideas.
Growing your healthcare business can be done by paying attention to four categories, according to a finance professor's book of advice. Read more about how the categories, or colors, can be used to form a growth strategy.
Innovations receiving funding at North Carolina State University include two projects with healthcare applications: work on a new Salmonella vaccine and wound-healing bandages.
Scientific researchers -- and their ideas -- will benefit from a new National Science Foundation effort to bring innovative ideas to market. The NSF Innovation Corps will fund 100 projects a year.
Pharmaceutical companies are benefitting from partnerships with academic medical institutions, but can biotech companies do the same? Read more on clinician impact on medical device innovation.
This week, eMed will be providing coverage of Partnering for Cures, a conference bringing together leaders in biotech research to discuss the healthcare business landscape.
In biotech research, the gathering and analysis of data takes a great deal of time. With portable legal consent, Sage Bionetworks aims to reduce data collection time for researchers so they can make their discoveries earlier.
Making new medical discoveries is the lifeblood of the healthcare startup world. That's why the National Institutes of Health wants to lend a hand with a new training program for tomorrow's research geniuses.
I recently attended the 39th Annual Induction Ceremony for the National Inventors Hall of Fame. As it has been in years past, it was awe-inspiring and of significant historical interest.
Nanotechnology firms will benefit from $3 million in grants from a Pennsylvania organization that wants to encourage innovation. Read more about this program for businesses and colleges.
Medical device startups can benefit from the services offered at the Sister Kenny Research Center in Minneapolis in their quest to commercialize products. Read more to find out what the research center has to offer.
Want to get connected? Sign up to receive regular news, polls and updates from The Kauffman Foundation.
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2mm pitch connectors offer 3A on all contacts simultaneously, operate from -55 to +125ºC
June 19, 2012 // Julien Happich
Harwin has added an extra-small bore crimp contact to its Datamate family of high reliability 2mm pitch connectors, designed for use in challenging applications.
Adding to Datamate's existing wire sizes of 22 AWG (large bore) and 24-28 AWG small bore, the new additions to the range feature an extra-small bore, female crimp contact, suitable for use with 28, 30 and 32 AWG wire. This new contact enables designers to use wire which is less bulky and lighter in weight, allowing designers to achieve a closer packing density of components or a reduce in equipment size. For aerospace and portable applications the reduction in weight is very significant. The new contact is gold plated to ensure good conductivity and has a current rating of 3.3A in isolation and 3A on all contacts simultaneously. Contact resistance 25mΩ (maximum), durability is 500 operations. And operating temperature range is -55 to +125ºC.
Visit Harwin at www.harwin.co.ukAll news
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Extensible CPU cores exploit IoT's vast potential
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May 21, 2015
Nokias digital map service HERE is on the block and a crowd of suitors are outbidding each other. But some remain at the ...
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Technical papers
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- Smart Capacitive Design Tips
InterviewCEO interview: What's next after Tower's turn-around?
May 2015 marks the tenth anniversary of Russell Ellwanger taking over as CEO of speciality foundry Tower Semiconductor Ltd. (Migdael Haemek, Israel), which now trades as TowerJazz. And so EE Times Europe ...
Filter WizardCheck out the Filter Wizard Series of articles by Filter Guru Kendall Castor-Perry which provide invaluable practical Analog Design guidelines.
Linear video channel
READER OFFERRead more
In this month's reader offer, Analog Devices is giving away five Blackfin Low-Power Imaging Platform (BLIP) Development Systems (ADZS-BF707-BLIP2), worth 199 dollars each, for EETimes Europe's readers to win.
Targeting demanding ultra-low-power, real-time applications for image sensing and advanced audio, the development platform leverages the company's ADSP-BF707BBCZ-4 Blackfin processor as...MORE INFO AND LAST MONTH' WINNERS...
Design centers
December 15, 2011 | Texas instruments | 222901974
Unique Ser/Des technology supports encrypted video and audio content with full duplex bi-directional control channel over a single wire interface.


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TDK Life on Record SDHC Memory Cards Deliver High Performance and Capacity for Storing Music and Memories
capturing holiday videos and photos, Imation Corp. (NYSE: IMN), exclusive
licensee of the "TDK Life on Record" recording media brand, today announced
the availability of secure digital high capacity (SDHC) memory cards. Designed
to exceed the performance and capacity needs of video, photo and audio
enthusiasts, TDK Life on Record SDHC memory cards support high-definition (HD)
recording with the fastest read/write speeds available and up to 16GB of
storage or 240 minutes of recording time.
Ideal for high-definition (HD) camcorders, as well as digital cameras,
mobile phones, MP3 players, PDAs and more, TDK Life on Record SDHC memory
cards store and save high-quality video files. With speeds of 6MB per second,
discerning memory keepers can quickly view and copy large video or photo files
from a camera to a PC using these Class 6 memory cards. Available with 8GB or
16GB of capacity, you can capture and securely store up to four hours of HD
video on a single card.
"TDK Life on Record offers discerning memory keepers a premium choice for
saving digital memories," said
brand director, Imation Corp. "With the industry's fastest speeds and largest
capacities, consumers can feel confident when using our SDHC memory cards for
storing family videos in crisp high definition this holiday season and beyond,
as well as photos and favorite music."
These SDHC Memory Cards join the growing family of TDK Life on Record
audio and video products. TDK Life on Record SDHC Memory Cards are available
now with 8GB and 16GB capacities at select retailers for suggested retail
prices of
About "TDK Life on Record" Brand Media
"TDK Life on Record" brand is a leading recording media brand worldwide.
TDK's recording media business was acquired by Imation Corp. in 2007. Imation
holds the exclusive global license for the TDK Life on Record brand for
recordable DVD and CD media, digital camcorder tapes, professional data
storage solutions including LTO Ultrium media and more.
About Imation Corp.
Imation is a leading global developer and marketer of branded products
that enable people to capture, save and enjoy digital information. Our
world-class portfolio of digital storage products, audio and video electronics
and accessories reaches customers through a powerful global distribution
network. Our goal is a company with strong commercial and consumer businesses
and continued long-term growth and profitability that creates shareholder
value. Imation Corp.'s global brand portfolio, in addition to the Imation
brand, includes the Memorex brand, one of the most widely recognized names in
the consumer electronics industry, famous for the slogan, "Is it live or is it
Memorex?" and the XtremeMac brand. Imation is also the exclusive licensee of
the TDK Life on Record brand, one of the world's leading recording media
brands. Additional information about Imation is available at
Imation, the Imation logo, Memorex, the Memorex logo, 'Is it live or is it
Memorex?', and XtremeMac are trademarks of Imation Corp. and its subsidiaries.
The TDK Life on Record logo is a trademark of TDK Corporation. All other
trademarks are property of their respective owners.
SOURCE Imation Corp.


text:
Average pay for a Business Intelligence Manager in the United States is considerable, rounding six figures at $99K per year. With some bonuses approaching $20K and certain profit sharing proceeds approaching $11K, overall incomes of Business Intelligence Managers spread between $72K and $142K depending on individual performance. Location and years of experience each impact pay for this group, with the former having the largest influence. Generally, women make up less than a third of all Business Intelligence Managers who answered the questionnnaire. Almost all have medical and dental plans, and a fair number have vision insurance. Job satisfaction is reported as high by the vast majority of workers. This overview is based on answers to PayScale's salary questionnaire.
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Business intelligence managers are responsible for providing data solutions related to business strategies in their organization. They are in charge of a group of analysts that use a variety of statistical methodologies to solve quantitative business issues and increase profitability. Business intelligence managers perform assessments and risk analysis on a regular basis. These managers prepare complex reports and gather intelligence data to make informed conclusions on business practices; they subsequently present their findings and progress to key executives from different company teams. Additionally, they organize and use company resources efficiently while monitoring associates' performance. They also take part in the selection, training process, and performance review of new analytical staff. These analysts typically work in an office environment gathering data using a personal computer with proprietary programs.Read More...
This position generally requires previous experience in business intelligence, as well as positions in which they have taken a leadership or managerial role. Employers also frequently look for candidates with a graduate-level degree in a business-related field. They must have proven leadership and management skills in a similar position. This job requires a graduate degree in a business related field.
Business intelligence managers should have advanced analytical and problem-solving skills, as well as have a strong knowledge of current industry practices including measured profitability approaches. They must be able to work with other intelligence professionals to help meet company objectives; great working relationships with other managers and external partners are also needed.
Survey takers working as Business Intelligence Managers report using a large range of professional skills. Most notably, skills in People Management, Data Mining / Data Warehouse, SAP Business Intelligence, and Data Warehouse are correlated to pay that is above average, with boosts between 8 percent and 17 percent. Those listing Statistical Analysis as a skill should be prepared for drastically lower pay. Tableau Software and Data Modeling also typically command lower compensation. Those educated in Business Intelligence tend to be well versed in Data Analysis and SQL. A tool kit that includes Project Management also typically contains SQL and Data Analysis.
Median of all compensation (including tips, bonus, and overtime) by years of experience.
More years of relevant experience do not necessarily translate to higher paychecks. Whereas the median salary for inexperienced employees is approximately $89K, incomes in the five-to-10 year group are significantly higher, averaging to the comfortable six-figure sum of $100K. People with 10 to 20 years of experience make an average of about $115K in this role. Business Intelligence Managers who surpass 20 years on the job report pay that isn't as high as one would expect; the median compensation for this crowd sits around $120K.
For Business Intelligence Managers, busy San Jose offers a higher-than-average pay rate, 56 percent above the national average. Business Intelligence Managers will also find cushy salaries in San Francisco (+23 percent), Houston (+22 percent), Washington (+18 percent), and Seattle (+9 percent). Trailing the national average by 14 percent, Denver is the market with the smallest paychecks. Two other places where employers offer below-median salaries are Salt Lake City (13 percent less) and New York (4 percent less).
|Extremely satisfied
Rated 5 out of 5
based on 150 votes.
23 %
77 %
|Medical: 94%
|Dental: 89%
|Vision: 76%
|None: 4%


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I was in Portugal (Boom Festival). It was hot and there were dustdevils ;)
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Having a diner with a large group of friends in Rotterdam ;) Oh, you sneaky bitch ;D
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Practical Tips for Navigating the Sales Tax "Minefield" of "Cloud Computing"
If you are in business, then most likely, you are a buyer or seller of software/services that is considered "cloud computing."
If you are impacted by "cloud computing," you may be interested in learning what practical steps or strategy you can follow to help you navigate the sales tax "minefield" of "cloud computing." The following is a list of questions or items that you should take into consideration when buying or selling "cloud computing" services/software.
- What state is the buyer located?
- What state is the seller located?
- What state is the server located?
- Does the seller have nexus in the state where the customer is located? Where the server is located?
- Does the customer receive a copy or have access to the software?
- Who is "using" the software? (i.e., is the seller using the software to provide a service OR is the seller licensing software to the purchaser for the purchaser's use?)
- Pay careful attention to the language in the sales contract. This will help determine or control if the sale is a license of software or a service agreement.
- Be careful how the product/service is marketed.
- Are you selling/purchasing software or expertise? (i.e., what is the primary purpose or objective of the transaction?)
- Is it possible to source the transaction to a nontaxable jurisdiction?
- How is the service or software taxed in the states where the buyer, seller and server are located?
- Does it help or hurt to bundle the service and software pieces of the sale?
Most states still don't know how they are going to tax cloud computing. But one thing is certain, they are going to definitely try.
This blog
Brian Strahle is the owner of LEVERAGE SALT, LLC where he provides state and local tax technical services to accounting firms, law firms and tax research organizations across the United States. He also writes a weekly column in Tax Analysts State Tax Notes entitled, "The SALT Effect." For more info, visit his website: www.leveragestateandlocaltax.com
You can reach Brian at firstname.lastname@example.com.
Connect with Brian on LinkedIn. Follow Brian on Twitter. Join the Leverage | SALT LinkedIn Group, connect and contribute with your colleagues!
Because state and local taxes are deceptively simple and endlessly complicated.


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The Everything Store: Jeff Bezos and the Age of AmazonPaperback
List price $20.19
Unavailable - AbeBooks may have this title.
Additional formats available
- Publisher: BANTAM PRESS
- Format: Paperback | 384 pages
- Dimensions: 152mm x 232mm x 30mm | 520g
- Publication date: 17 October 2013
- Publication City/Country: London
- Sales rank: 31,833
Product description
Amazon made its mark sending new books quickly in nice, smile-embossed boxes. But its visionary founder, Jeff Bezos, wasn't content with being a bookseller. He wanted Amazon to become the world's store, where everything is available to everyone, usually in 24 hours. To do so, he developed a corporate culture of relentless ambition and drive and revolutionized retail the way Ford revolutionized manufacturing. Brad Stone has been given unprecedented access to Amazon employees, both current and former, to give readers the first fly-on-the-wall narrative account of the world's largest online retailer. In a club of tech business innovators that includes Steve Jobs, Bill Gates, and Mark Zuckerberg, Bezos stands out for his hyper-competitive business strategies, which are leading Amazon to current ventures from hardware like e-readers and tablet PCs, web hosting for some of the world's most valuable companies, book publishing, and even a top secret space program. The Everything Store will be the revealing, definitive biography of the company and its genius creator.
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Author information
Brad Stone is an American journalist and writer. Before writing for Bloomberg Businessweek, he was a technology correspondent for the New York Times. He has also worked at Newsweek. He lives in San Francisco.
Review quote
"A masterclass in deeply researched investigative financial journalism ... riveting" -- Tim Waterstone The Times "Stone has done a remarkable job in a way that Bezos would appreciate - by working very hard." -- John Gapper Financial Times "Engrossing... Stone's long tenure covering both Bezos and Amazon... gives his retelling a sureness that keeps the story moving swiftly" New York Times "The definitive biography of the company that changed the way we shop and read... A masterclass in investigative journalism" Mail on Sunday "Scrupulously researched... If only all business books were as readable as this one" -- Ian King The Times Books of the Year


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Poached Egg Salad
Poached eggs, romaine, radicchio, and red grapes combine in this delicious side dish recipe that's ready in under 30 minutes.
- Makes:
- 4 servings
- Cook:
- 7 mins to 9 mins
Rate me!
Poached Egg Salad
medium leeks, thinly sliced
cups seedless red grapes
tablespoons cider vinegar
Salt and ground black pepper
slices crusty bread, toasted
10 ounce package Italian mixed salad greens (romaine and radicchio)
ounces blue cheese, crumbled (1/2 cup)
- In large skillet pour water to halfway up sides. Bring water to simmering (bubbles break surface). One at a time break an egg into measuring cup. Hold lip of cup close to water; carefully slide in egg, allowing each equal space in pan. Simmer, uncovered, 3 to 5 minutes, until whites are set and yolks begin to thicken but are not hard.
- Meanwhile, in second skillet cook leeks and grapes over medium heat in 2 tablespoons hot olive oil for 4 minutes, just until leeks are tender and grape skins burst. Remove from heat. Add vinegar. Sprinkle salt and pepper. With slotted spoon transfer eggs to toast. Serve with greens, leeks, grapes, and cheese. Serves 4.
Nutrition Facts(Poached Egg Salad)
- Per serving:
- 428 kcal cal.,
- 22 g fat
- (7 g sat. fat,
- 3 g polyunsaturated fat,
- 10 g monounsatured fat),
- 433 mg chol.,
- 681 mg sodium,
- 39 g carb.,
- 4 g fiber,
- 15 g sugar,
- 21 g pro.
- Percent Daily Values are based on a 2,000 calorie diet


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Look for several related musician links at the end of a news announcement or article at All About Jazz. Prior to today, we included just the musician's website link--we now include their MySpace, Facebook, Twitter, Website, blog, and other links associated with their musician profile. (See example below.)
If you're a musician, please add the related links to your profile. If you're a musician and currently do not have a profile, please create one today. Our service is free.
Update Profile | Create Profile


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Why on EP whenever theres a space it shows the html < br > thingy?
Some coding problem on the site
Best Answer
It's a problem with EP. Damn you, EP.
Best Answer
That isn't chrome, all web browser speak HTML (the universal language of the internet), that is a problem with EP
Best Answer
that means a break.. you need to have right sc<x>ript which is utf 8 for your chorme
Best Answer
I don't use Chrome and I am getting it. I think it is EP.
Best Answer
Because the polish wore off......
Best Answer
its doing the same for me too :(
Best Answer
Related Questions
hyrok40 36-40, M 0 Nov 29, 2013 in Movies & TV
I looked at my Windows directory and I have both Google Chrome and Google Chrome fr<x>ame. What's that all about?The directory says this GCframe is three times as big. The GCframe is not listed on my All Programs or my quick start menu. What's it all about? I only occasionally use Chrome...conceptualclarity 51-55, M 1 Answer 1 Mar 2, 2013
How to catch fakes: if your on google chrome >right click image> select "search google for this image".
What is your opinion of Google Chrome?cyberkitty 18-21 7 Answers 1 Apr 16, 2009
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Has anyone tried or are using Google Chrome? What do you think of it? Do you think its faster then IE?Stretch1969 41-45, M 9 Answers 4 Dec 1, 2010
Moonpenny 51-55, F 5 Answers 2 Feb 17, 2011


text:
CEI Today: Ethanol election delay, Dodd-Frank's perverse flaws, and the threat of an airline strike
Editorial: The Ethanol Election Delay - Why the U.S. burns 40% of its corn, despite a global food shortage.
Last October, the Competitive Enterprise Institute and Action Aid petitioned the EPA to review the so-called renewable fuel standard that mandates that 13.8 billion gallons of corn ethanol be blended into the gasoline supply next year. The free-market think tank and global hunger charity argued that the EPA's technical regulations implementing the mandate did not meet "basic standards of quality."
That basically applies to all EPA rule making, though in this case the EPA was supposed to answer in 90 days. But last Thursday the agency took another 90-day extension, the third so far. "We would like to assure you that we are working diligently to provide you with a substantive response," the EPA claimed.
American Spectator: Dodd-Frank's Mystery SIFI Theater
There's an even more troubling aspect of Dodd-Frank. The act designates the too-big-to-fail institutions as SIFIs -- Systemically Important Financial Institutions. SIFIs are subject to additional regulations and eligible for orderly liquidation authority. Most importantly, they have to pay staggeringly large fees to help clean up the mess when a peer SIFI fails. That's right -- Dodd-Frank requires some financial institutions to pay to fix problems created by others.
Fox News: The threat striking fear into the hearts of weary airline travelers everywhere
On October 24th, 1978 President Jimmy Carter signed into law the Airline Deregulation Act, ending the nightmare of total government-control over air travel. But now 34 years later, just in time for Halloween 2012, a new, shadowy threat has emerged from the depths of the airline industry to strike terror into the hearts of weary air travelers everywhere.
It's – Attack of the Killer Pilots Union!
The Allied Pilots Association (APA), the largest of the unions representing American Airline employees, has rejected a generous contract offer from the ailing airline; pay raises coupled with a 13.5 percent stake in the new company in exchange for the flexibility to transfer some operations to allied airlines.


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Hudson Highland Group Reschedules Conference Call and Webcast to Discuss Second Quarter Financial Results.
Hudson Highland Group, Inc. (Nasdaq: HHGP), one of the world's leading providers of permanent recruitment, contract professionals and talent management solutions, announced today that it has rescheduled its second quarter financial results call to Thursday, July 30, 2009 at 10:00 a.m. E.T. from its previously announced Thursday, July 30, 2009 9:00 a.m. E.T. The company's second quarter financial results will cover the period ended June 30, 2009 after the market closes on Wednesday, July 29, 2009.
The company will host a live conference call to review its results, market trends and outlook at 10:00 a.m. ET on Thursday, July 30, 2009. The call can be accessed by dialing 1-800-374-1532 (U.S./Canada) or +1-706-634-5594 (International) followed by the participant passcode 19999263 at 9:50 a.m. ET. The call will be webcast simultaneously on the company's investor relations Web site: www.hudson.com and can also be accessed online through Yahoo! Finance at www.yahoo.com.
The archived call will be available through August 7, 2009 by dialing 1-800-642-1687 (U.S./Canada) and +1-706-645-9291 (International) followed by the participant passcode 19999263. Additionally, the webcast archive is available on the company's investor relations Web site: www.hudson.com.
About Hudson Highland Group
Hudson Highland Group, Inc. is a leading provider of permanent recruitment, contract professionals and talent management services worldwide. From single placements to total outsourced solutions, Hudson helps clients achieve greater organizational performance by assessing, recruiting, developing and engaging the best and brightest people for their businesses. The company employs nearly 3,000 professionals serving clients and candidates in more than 20 countries. More information is available at www.hudson.com.
Contact: David F. Kirby Hudson Highland Group +1-212-351-7216 firstname.lastname@example.com
David F. Kirby of Hudson Highland Group, Inc., +1-212-351-7216, email@example.com
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- News
- Premium
- Lifestyle
- Tech
- Communities
- Video
- Multimedia
- More
No-show by 60 SMRT bus drivers for 2nd day
Published on Nov 27, 2012 11:21 AM
THE industrial dispute between public transport operator SMRT and its China-sourced bus drivers took a new turn on Tuesday when 60 of them continued to stay away from work.
SMRT confirmed that 60 drivers did not show up for work, "some of whom have valid medical reasons".
Police deployed officers to SMRT's rented dormitory for drivers in Woodlands in the morning. A police spokesman said its men were there to observe the situation; and that no one has been arrested.
He said the number of policemen on the ground is fewer than the 45 deployed on Monday, when 102 mainland Chinese drivers staged a sit-in at the Woodlands dormitory.
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text:
Research Output for Emanuele Loro
Note: The 2012, 2013, 2014, 2015 publications have not been audited.
Jump to: Publications | Grants and Consultancies | HDR completions
Emanuele Loro may be from another institution or only recently joined Deakin University.
2007 External
Vergani, Lodovica*, Malena, Adriana*, Sabatelli, Patrizia*, Loro, Emanuele*, Cavallini, Lucia*, Magalhaes, Paolo*, Valente, Lucia*, Bragantini, Federica*, Carrara, Franco*, Leger, Bertrand*, Poulton, Joanna*, Russell, Aaron and Holt, Ian P.* (2007) Cultured muscle cells display defects of mitochondrial myopathy ameliorated by anti-oxidants, Brain: a journal of neurology, vol. 130, no. 10, pp. 2715-2724, Oxford University Press, Oxford, England [C1]
ERA journal ID: 14495 – Scopus EID: 2-s2.0-34848827438
Citation counts: Scopus - 7, Thomson - 8
DRO entry for this publication
Grants and Consultancies
No grants and/or consultancies found or audited – the 2014 HERDC financial return has not been completed or loaded as yet.
Higher Degree by Research Completions supervised by Emanuele Loro
No completions found or audited.
- Legend:
- * Not a member of Deakin University at time of output.
DRO to publications collection last synchronised: Tuesday 2nd June 2015 10:04pm


text:
I am a sort of experienced knitter. However, I need clarification on how to start this fabulous piece. Am I reading the pattern right by understanding that the "m" on the second row is a " place marker" on needle? I am sure I will need some guidance with this pattern, and will ask as I go.
thank you in advance,
no, it means increase 1
© 2015 F+W All rights reserved.Use of this site signifies your agreement to the Terms and Privacy Policy, updated March 2007


text:
Autism and Communication Center - Lancaster, PA
Lancaster Developmental-Behavioral Pediatrician Doctors for Autism and Communication
Type of Physician: Developmental-Behavioral Pediatrician
What is a Developmental-Behavioral Pediatrician?
A subspecialty certification by the Board of Pediatrics; practitioners have a special interest in the developmental, learning, and behavioral problems of children, and in the support of parents and children during normal development and illness.
Specialty: Developmental-Behavioral Pediatrics
Common Name:
Developmental-Behavioral Pediatrician Doctors in Lancaster *
Penn State Childrens Hosp PED
Penn State Childrens Hosp PED
Childrens Hosp PA Spclty Cr
Childrens Hospital Philadelphia
Childrens Hospital Philadelphia
Childrens Hospital Philadelphia
Childrens Hospital Philadelphia
Anna H Baumgaertel MD
Bucks County Specialty Care Ctr
Bucks County Specialty Care Ctr
Childrens Hospital PA Chld Dvlp
Childrens Hospital PA Chld Dvlp
Childrens Hospital PA Chld Dvlp
Childrens Hospital PA Chld Dvlp
Childrens Hospital PA Chld Dvlp
Childrens Healthcare Associates
Center Child/Adolescent Health
Center Child/Adolescent Health
St Christophers Spec PED Care
Lancaster, Pennsylvania
Autism Spectrum Disorder (In Children and Adults)
Autism facts
Read the Autism Spectrum Disorder (In Children and Adults) article »
Other Related Autism and Communication Articles
Emergency Contact for Lancaster
Nearby Lancaster Hospitals *
Lancaster General Health
Lancaster Regional Medical Ctr
Women & Babies Hospital
Heart Of Lancaster Reg Med Ctr
Ephrata Community Hospital
Philhaven Hospital
Lebanon VA Medical Center
Memorial Hospital
Caron Treatment Center
Good Samaritan Hospital
Wernersville State Hospital
York Hospital
Penn State Med Ctr Neuro Surg
Penn State Milton S Hershey Med
Healthsouth Rehabilitation Hosp
Jennersville Regional Hospital
Healthsouth Rehabilitation Hosp
VA Medical Center
Brandywine Hospital
Reading Hospital & Medical Ctr
St Joseph Med Ctr-Main Campus
Community General Hospital
Saint John Vianney Center
Harrisburg Hospital
*Provider Directory Terms of Use:
The WebMD 'Provider Directory' is provided by WebMD for use by the general public as a quick reference of information about Providers. The Provider Directory is not intended as a tool for verifying the credentials, qualifications, or abilities of any Provider contained therein. Inclusion in the Provider Directory does not imply recommendation or endorsement nor does omission in the Provider Directory imply WebMD disapproval.


text:
Lost Dog That Went Missing During Hurricane Sandy Reunites With Family [VIDEO]
What would think if your dog went missing seventeen months ago?
What would think if your dog went missing seventeen months ago?
A spring nor'easter will track far enough to the east to spare New Jersey the worst of accumulating snow.
New Jersey officials are warning drivers to be extra careful when it comes to getting their cars fixed.
Mariner's Cove Motor Inn in Point Pleasant Beach caught fire just before 5:30 this morning, killing three and injuring more. Now an investigation is underway to determine what caused the deadly blaze.
Former New Jersey Gov. Jon Corzine's son has died.
Following a historic court ruling, a pregnant woman in New Jersey can now legally ban the father of her child from the delivery room. Is it a fair decision?
An alleged gas leak sparked an explosion that rocked an Upper Manhattan apartment today causing the building to partially collapse. Police and Fire officials are on the scene in E. Harlem at 116th Street and Park Avenue, and video from the scene is astounding.
With less than three months left until Memorial Day, boardwalks and beaches at various shore points are gearing up for a busy season by adding new staffers to the books. That includes Jenkinson's Boardwalk in Point Pleasant Beach, which will hold its annual summer job fair over the next two weekends.
For more than a year, Real Housewives of New Jersey star Teresa Giudice has professed that she and her husband Joe are completely innocent of fraud charges that had been leveled against them. She said she looked forward to her day in court where she was convinced she and Joe would be acquitted. But today, the couple plead guilty to several of those charges, leaving them vulnerable to jail time and possible (in Joe's case) deportation.
Gov. Christie has declared a state of emergency and ordered all state offices closed Monday, in anticipation of hazardous road conditions from the developing snowstorm. A growing number of schools are also planning to remain closed.
Details about our next winter storm on Monday are beginning to come into focus.
A Tornado Watch has been canceled for central and southern counties in New Jersey as mild temperatures bring concerns about flooding, severe thunderstorms and fog.


text:
An update on the F-35Comment
Aitoro Interview September 24, 2014
Reading the tea leaves on SAICComment
Aitoro interview August 29, 2013
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