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A process using a retaining ring assembly of a carrier head to precompress a polishing pad to reduce or minimize the edge effect in a chemical mechanical polishing process.
1. A method of chemically mechanically polishing a substrate, comprising the steps of:
positioning a substrate adjacent to a polishing pad by means of a carrier head, said carrier head including a mounting assembly and a retaining ring;
moving said substrate relative to said polishing pad;
applying a first load to said mounting assembly to press said substrate against said polishing pad;
selecting a second load to be applied by said retaining ring to minimize an edge effect on said substrate; and
independently applying said second load to said retaining ring to press said retaining ring against said polishing pad.
2. The method of claim 1 wherein the step of moving the substrate relative to the polishing pad includes the step of rotating said substrate.
3. The method of claim 1 further the step of moving the substrate relative to the polishing pad includes the step of rotating the polishing pad.
4. The method of claim 1 wherein the first load is greater than the second load.
5. The method of claim 1 wherein the second load is greater than the first load.
The present application is a continuation-in-part of pending U.S. application Ser. No. 08/488,921 filed Jun. 9, 1995, by Norman Shendon et al., entitled FLUID-PRESSURE REGULATED WAFER POLISHING HEAD, and assigned to the assignee of the present application, and is a continuation-in-part of pending U.S. application Ser. No. 08/549,651 filed Oct. 27, 1995, by Michael T. Sherwood et al., entitled CARRIER HEAD DESIGN FOR A CHEMICAL MECHANICAL POLISHING APPARATUS, and assigned to the assignee of the present application, the entire disclosures of which are hereby incorporated by reference.
The present invention relates generally to chemical mechanical polishing of substrates, and more particularly to the control of a retaining ring on a carrier head in a chemical mechanical polishing system.
Integrated circuits are typically formed on substrates, particularly silicon wafers, by the sequential deposition of conductive, semiconductive or insulative layers. After each layer is deposited, the layer is etched to create circuitry features. As a series of layers are sequentially deposited and etched, the outer or uppermost surface of the substrate, i.e., the exposed surface of the substrate, becomes increasingly more non-planar. This occurs because the distance between the outer surface and the underlying substrate is greatest in regions of the substrate where the least etching has occurred, and least in regions where the greatest etching has occurred. With a single patterned layer, this non-planar surface comprises a series of peaks and valleys wherein the distance between the highest peak and lowest valley may be on the order of 7000 to 10,000 Angstroms. With multiple patterned layers, the height differences between the peaks and valleys become even more severe, and can reach several microns.
FIGS. 1A-1E illustrate the process of depositing a layer onto a planar surface of a substrate. As shown in FIG. 1A, a substrate 10 might be processed by coating a circular, flat, silicon wafer 12 with a metal layer 14, such as aluminum. Then, as shown in FIG. 1B, a layer of photoresist 16 may be placed on metal layer 14. Photoresist layer 16 can then be exposed to a light image, as discussed in more detail below, to produce a patterned photoresist layer 16' shown in FIG. 1C. As shown in FIG. 1D, after the patterned photoresist layer is created, the exposed portions of metal layer 14 are etched to create metal islands 14'. Finally, as shown in FIG. 1E, the remaining photoresist is removed.
FIGS. 2A-2B illustrate the deposition of subsequent layers on a substrate. As shown in FIG. 2A, an insulative layer 20, such as silicon dioxide, may be deposited over metal islands 14'. The outer surface 22 of insulative layer 20 replicates the underlying structures of the metal islands, creating a series of peaks and valleys so that outer surface 22 is non-planar. An even more complicated outer surface would be generated by depositing and etching multiple patterned layers.
This non-planar outer surface presents a problem for the integrated circuit manufacturer. If, as shown in FIG. 2B, outer surface 22 of substrate 10 is non-planar, then a photoresist layer 25 placed thereon is also non-planar. A photoresist layer is typically patterned by a photolithographic apparatus that focuses an image onto the photoresist. Such an imaging apparatus typically has a depth of focus of about 0.2 to 0.4 microns for sub-half-micron sized features. If photoresist layer 25 is sufficiently non-planar, i.e., if the maximum height difference h between a peak and a valley of outer surface 22 is greater than the depth of focus of the imaging apparatus, then it will be impossible to properly focus the image onto the entire outer surface 22. Even if the imaging apparatus can accommodate the non-planarity created by a single patterned layer, after the deposition of a sufficient number of patterned layers, the maximum height difference will exceed the depth of focus.
It may be prohibitively expensive to design new photolithographic devices having an improved depth of focus. In addition, as the feature size used in integrated circuits becomes smaller, shorter wavelengths of light must be used, resulting in further reduction of the available depth of focus.
Therefore, there is a need to periodically planarize the substrate surface to provide a planar surface. As shown in FIG. 2C, planarization polishes away a non-planar outer surface, whether a conductive, semiconductive, or insulative layer, to form a relatively flat, smooth outer surface 22. As such, a photolithographic apparatus can be properly focused. Following planarization, additional layers may be deposited on the outer layer to form interconnect lines between features, or the outer layer may be etched to form vias to lower features. Planarization can be performed only when necessary to prevent the peak-to-valley difference from exceeding the depth of focus, or it may be performed each time a new layer is deposited over a patterned layer.
Chemical mechanical polishing (CMP) is one accepted method of planarization. This planarization method typically requires that the substrate be mounted on a carrier or polishing head. The exposed surface of the substrate is then placed against a rotating polishing pad. The carrier head provides a controllable load, i.e., pressure, on the substrate to push it against the polishing pad. In addition, the carrier head may rotate to provide additional motion between the substrate and polishing pad. As the polishing pad rotates, it tends to pull the substrate from beneath the carrier head. To eliminate this problem, the carrier head may be constructed with a downwardly projecting retaining ring. The retaining ring extends circumferentially around the edge of the substrate and forms a recess which retains the substrate beneath the carrier head.
A polishing slurry, including an abrasive and at least one chemically-reactive agent, is spread on the polishing pad to provide an abrasive chemical solution at the interface between the pad and substrate. CMP is a fairly complex process, and differs from simple wet sanding. In a CMP process the reactive agent in the slurry reacts with the outer surface of the substrate to form reactive sites. The interaction of the polishing pad and abrasive particles with the reactive sites results in polishing.
An effective CMP process provides a high polishing rate and generates a substrate surface which is finished (lacks small-scale roughness) and flat (lacks large-scale topography). The polishing rate, finish and flatness are determined by the pad and slurry combination, the relative speed between the substrate and pad, and the force pressing the substrate against the pad. Because inadequate flatness and finish can create defective substrates, the selection of a polishing pad and slurry combination is usually dictated by the required finish and flatness. Given these constraints, the polishing time needed to achieve the required finish and flatness sets the maximum throughput of the CMP apparatus.
A reoccurring problem in chemical mechanical polishing is the so-called "edge effect", i.e., the tendency of the substrate edge to be polished at a different rate than the center of the substrate. The edge effect typically results in over-polishing or under-polishing (the removal of too much or too little material from the substrate) of the perimeter portion, e.g., the outermost five to ten millimeters, of the substrate. The over-polishing or under-polishing of the substrate perimeter reduces the overall flatness of the substrate, makes the edge of the substrate unsuitable for use in integrated circuits, and decreases the yield.
An additional consideration in the production of integrated circuits is process and product stability. To achieve a high yield, i.e., a low defect rate, each successive substrate should be polished under substantially similar conditions. Each substrate should be polished approximately the same amount so that each integrated circuit is substantially identical.
In view of the forgoing, there is a need for a chemical mechanical polishing apparatus which optimizes polishing throughput while providing the desired surface flatness and finish. Specifically, there is a need for a chemical mechanical polishing head which minimizes the edge effect.
In general, in one aspect, the invention is directed to a method of chemically mechanically polishing a substrate. The substrate is positioned adjacent to a polishing pad by means of a carrier head. The carrier head includes a mounting assembly and a retaining ring. The substrate is moved relative to the polishing pad, and a first load is applied to the mounting assembly to press the substrate against the polishing pad. A second load is selected to be applied by the retaining ring to minimize an edge effect on the substrate, and the second load is independently applied to the retaining ring to press said retaining ring against said polishing pad.
Implementations include the following features. The substrate and/or the polishing pad may rotate to move the substrate relative to the polishing pad. The first load may be greater than or less than the second load.
The advantages of the invention include the following. The carrier head can provide an adjustable load to the retaining ring in order to optimize the retaining ring load and minimize the edge effect. A single carrier head may be used regardless of its rotation rate, the rotation rate of the pad, the load applied to the substrate, the slurry and pad composition, and the gap between the carrier plate and retaining ring.
Additional advantages of the invention will be set forth in the description which follows, and in part will be obvious from the description, or may be learned by practice of the invention. The objects and advantages of the invention may be realized by means of the instrumentalities and combinations particularly pointed out in the claims.
The accompanying drawings, which are incorporated in and constitute a part of the specification, schematically illustrate embodiments of the invention, and together with the general description given above and the detailed description given below, serve to explain the principles of the invention.
FIGS. 1A-1E are schematic diagrams illustrating the deposition and etching of a layer on a substrate.
FIGS. 2A-2C are schematic diagrams illustrating the polishing of a non-planar outer surface of a substrate.
FIG. 3 is schematic sectional view of a carrier head in accordance with the present invention.
FIG. 4 is an enlarged view of part of the carrier head of FIG. 3, illustrating an O-ring seal.
FIG. 5 is an enlarged view of part of the carrier head of FIG. 3 in which a lip seal is used in place of the O-ring seal.
FIG. 6 is an illustrative schematic cross-sectional view of another carrier head in accordance with the present invention in which the right half of the carrier head is configured for an eight-inch diameter substrate and the left half of the carrier head is configured for a six-inch diameter substrate.
FIG. 7A is a graph showing the pressure on a polishing pad as a function of the distance from the center of a motionless substrate.
FIG. 7B is a graph showing the pressure on a polishing pad as function of the distance from the center of a moving substrate.
FIG. 7C is a graph showing the pressure on a polishing pad as a function of the distance from the center of a moving substrate surrounded by a retaining ring.
FIG. 8A is a graph showing the amount of material removed from a substrate as a function of the distance from the center of the substrate, for different retaining ring loads.
FIG. 8B is a graph showing edge exclusion as a function of the retaining ring load.
As shown in FIG. 3, a CMP apparatus according to the present invention includes a rotating polishing pad 90 having a polishing surface 92. The polishing pad is typically larger than the surface area of a substrate 10 being polished. Polishing pad 92 is affixed to a rotatable platen 94. If substrate 10 is an eight-inch (200 mm) diameter disk, then polishing pad 90 and platen 94 may be twenty or more inches in diameter. Platen 94 is typically an aluminum or stainless steel plate connected by a stainless steel drive shaft 96 to a platen drive motor (not shown). The drive motor rotates the platen, and thus the polishing pad, at thirty to two-hundred revolutions per minute (r.p.m.), although lower or higher rotational speeds may be used.
The CMP apparatus also includes a carrier or carrier head 100 which the substrate is mounted. Generally, carrier head 100 can be considered to comprise several assemblies or mechanisms: a first adjustable loading mechanism which supplies a downward pressure to load the substrate against the polishing surface; a mounting assembly which holds the substrate and transmits the pressure from the first loading mechanism to the substrate; a retaining ring assembly which ensures that the substrate does not slip from beneath the mounting assembly during polishing operations; and a second adjustable loading mechanism which supplies a downward pressure to load the retaining ring against the polishing surface.
The carrier head 100 positions substrate 10 against polishing pad 90 and uniformly loads outer surface 22 of substrate 10 against polishing surface 92. For clarity, the substrate has been shown as detached from the carrier head. The carrier head is supported over the polishing pad and is vertically-fixed relative to the polishing pad by a support member (not shown). This support member provides a fixed bearing location from which the carrier head may extend to provide a desired load on the substrate.
The carrier head 100 includes a housing support plate 102 which is fixedly connected to or is formed integral with a carrier drive shaft 80. The drive shaft 80 connects carrier head 100 to a carrier head drive motor (not shown), which can rotate the carrier head at about thirty to two-hundred r.p.m. Carrier head 100 typically applies a force of approximately four to ten pounds per square inch (psi), although other pressures may be applied, to substrate 10 to press it against polishing surface 92.
The housing support plate 102 may be circular to match the circular configuration of the substrate. A cylindrical descending wall 104 may be secured to the bottom of housing support plate 102 by a top flange 106. The descending wall 104 includes a lower lip 110 which curves inwardly toward substrate 10. The descending wall 104 encloses a retaining ring assembly or mechanism 146, and the retaining ring assembly, discussed in more detail below, encloses a mounting assembly. The mounting assembly may include a disk-shaped substrate backing member 114 and an edge seal feature 128, also discussed in more detail below.
The substrate backing member 114 is attached to housing support plate 102 by a bellows 118 which provides a vertically-expandable sealed chamber 120. Bellows 118 and backing member 114 may be formed of stainless steel. The bellows 118 can expand and contract so that substrate backing member 114 may move relative to housing support plate 102. The bellows chamber 120 is hermetically sealed. It is bound by bellows 118, backing member 114 and housing support plate 102. The bellows chamber 120 can be pressurized or depressurized through a gas lined passage 122 which connects the inside of the bellows to a first pressure or vacuum source (not shown). The expansion or contraction of bellows 118 is controlled by pressurizing or depressurizing bellows chamber 120 via line 122. By pressurizing bellows chamber 120, a force is exerted on backing member 114, and thus on substrate 10, to press the substrate against the polishing surface of the polishing pad. By depressurizing bellows chamber 120, the backing member is lifted away from the polishing surface.
Carrier head 100 includes a circular recess 126 formed in the bottom surface of backing member 114. The outer perimeter of backing member 114 has an edge seal feature 128, e.g., an O-ring (not shown in the empty O-ring groove 129 of FIG. 2, see FIG. 4) or a lip seal (see FIG. 5). The edge seal feature 128 is located and configured to engage the backside of the substrate, thereby forming, in combination with recess 126, a sealable and pressurizable pocket 130 between the substrate and the substrate backing member.
Pocket 130 is connected by a passageway 131 and a hose 132, coiled inside chamber 120, to a gas line or passageway 133. Gas line 133 is, in turn, connected to a second pressure or vacuum source (not shown). A fluid (preferably an inert gas) may be pumped into or evacuated from pocket to pressurize or depressurize pocket 130.
The depressurization of pocket 130 creates a negative differential pressure between substrate backing member 114 and substrate 10 which pulls the center of substrate inwardly. Recess 126 is sufficiently shallow that the stress imposed on the substrate during the maximum possible inward deflection does not exceed the tensile strength of the substrate material.
The pressurization of pocket 130 creates a positive pressure differential between substrate backing member 114 and substrate 10 which pushes the center of the substrate outwardly. The pressure differential may provide a uniform, hydrostatic load across the backside of the substrate. The pressure in bellows chamber 120 loads the substrate against the polishing pad, and pressurized pocket 130 provides a uniform contact pressure between the polishing pad and the substrate. Thus, the first loading mechanism is provided by a combination of bellow chamber 120 and pocket 130. Alternately, the pressure differential may be increased to apply a separating force greater than the sealing force on edge seal feature 128 to detach the substrate from the edge seal feature.
The pressure in pocket 130 may be adjusted as the carrier head moves the substrate to different stations in the CMP apparatus. When the carrier head is moving the substrate to polishing pad 90, for example, the pressure in pocket 130 may be decreased to provide a partial vacuum, e.g., about one-hundred torr less than atmospheric pressure, to hold the substrate to the carrier head. Once the substrate is positioned on polishing pad 90, a gas is pumped into the pocket until a pressure above atmospheric pressure is achieved. Simultaneously, the pressure in bellows chamber 120 is increased, to provide a load to force the substrate against the polishing pad 90. When polishing is complete, the pressure in pocket 130 is decreased so that the carrier head can return the substrate to a transfer station. There, the pressure in the pocket may be increased to provide a super-atmospheric pressure to separate the substrate from the carrier head.
When the carrier head is rotated, edge seal feature 128 provides a frictional force between the substrate and substrate backing member 114 so that the substrate turns with the carrier head. Thus, torque from drive shaft 103 is transferred through the bellows and the substrate backing member to the substrate to rotate the substrate. However, bellows 118 allows substrate backing member 114 to slightly rotate and translate in the x, y, and z directions, relative to housing support plate 102, during rotation of the carrier head and the polishing operation. The flexibility of the bellows accommodates misalignments or changes in the clearance between substrate backing member 114 and the polishing pad.
As the pressure in bellows chamber 120 is increased, 20 it presses edge seal feature 128, whether O-ring seal 134 or lip seal 136 (FIGS. 4 and 5), into contact with the backside of the substrate. The seal deforms under this pressure which enhances its sealing characteristics. Therefore, as the pressure in bellows chamber 120 is increased, the threshold pressure at which gas in pocket 130 will leak past or "blow-by" edge seal feature 128 also increases. If the pressure in the pocket, multiplied by the surface area of the substrate inside edge seal feature 128, exceeds the load force on the seal-substrate interface, the carrier head lifts off the substrate and blow-by occurs. In the carrier head 100, the area of substrate backing member 114 which is circumscribed by bellows 118 is smaller than the area of substrate 10 circumscribed by edge seal feature 128. Therefore, the pressure in the bellows chamber 120 must exceed the pressure in pocket 130 to prevent blow-by.
The pressure in pocket 130 may be approximately seventy-five torr less than the threshold at which blow-by will occur. At these pressures, there will be a uniform pressure on the entire backside of the substrate, except for a small annular area outside the edge seal feature. The uniform pressure on the substrate ensures that the front surface of the substrate is uniformly loaded against polishing pad 90. However, it is specifically contemplated that higher pressures, including a pressure at or above blow-by, may be used. If such higher pressures are used, the seal-substrate interface will serve as a relief valve, and blow-by will occur periodically to maintain a desired pressure within the pocket.
In the configuration shown in FIG. 4, edge seal feature 128 is a circular O-ring 134 positioned in O-ring groove 129 near the perimeter of substrate backing member 114 and surrounding recess 126. O-ring 134 may be formed of 20 a flexible elastic material such as rubber. A portion of O-ring 134 extends beyond the underside (i.e., substrate engaging side) of backing member 114 to contact the backside of substrate 10 immediately inside its perimeter. The O-ring 134 provides sufficient contact with the substrate to create a frictional rotational force so that the substrate turns with the carrier head. The space between substrate 10 and backing member 114 which is sealed by edge O-ring 124 forms pocket 130.
A second configuration of the polishing head of the present invention is shown in FIG. 5. Here, the edge seal feature is a downwardly-extending circular lip seal 136 located around the perimeter of backing member 114. The lip seal 136 is secured to the backing member by a ring 138 extending about the outer circumference of the lip seal. The lip seal 136 may be a thin elastic member having a rectangular cross-section. It may be made of rubber. A portion of lip seal 136 extends beyond the underside of the backing member to contact the backside of substrate 10. The lip seal 136 provides sufficient contact with the substrate to create a frictional rotational force so that the substrate turns with the carrier head. The space between substrate 10 and backing member 114 which is sealed by lip seal 136 forms pocket 130.
As noted, carrier head 100 includes retaining ring assembly 146 which ensures that substrate 10 does not slip out from beneath the carrier head during polishing operations. As shown in FIGS. 4 and 5, the retaining ring assembly 146 includes an annular retaining ring 162 which is attached to an annular backing ring 148. The retaining ring 162 has through-holes and counterbores spaced evenly about the circumference of the retaining ring. Screws 168 extend through the through-holes and are threaded into corresponding threaded holes in backing ring 148 to hold the retaining ring to the backing ring. The retaining ring 162 may be made of a plastic material, and backing ring 148 may be made of aluminum. The backing ring 148 has an inside flange 150 having a lower face 151 which extends inwardly over substrate backing member 114. When substrate backing member 114 is raised, its top surface contacts lower face 151 to raise the retaining ring assembly 146. The backing ring 148 also includes an outside flange 152 having a top face 154 facing an annular expandable bladder 170 and a bottom face 156 in contact with six to twelve compression springs 172.
The backing ring 148 is urged upwardly away from lip 110 of descending wall 104 by compression springs 172. Bladder 170 may be pressurized by a pressure source (not shown) which is connected to the bladder by pressure line 171. When bladder 170 is pressurized, retaining ring assembly 146 is forced downwardly to its operating position (shown by the dashed lines 162a). The bladder 170 provides a downward force that opposes the force of compression springs 172, and urges the retaining ring against the polishing pad. In the operating position, the retaining ring surrounds the edge of substrate 10. This prevents the substrate from sliding out from under backing member 114 during polishing. A continuously pressurized bladder could replace the compression springs to provide a uniformly distributed retracting forces.
The lower face 151 of the inside flange 150 is configured so that as the plastic material of retaining ring 162 wears away, the travel of the retaining ring is limited when lower face 151 contacts inside flange 150 and the top of substrate backing member 114. This prevents the heads of screws 168 from coming in contact with the polishing pad and introducing undesirable contaminants or damaging the pad.
In another embodiment, shown in FIG. 6, a carrier head 180 comprises three major assemblies: a mounting or base assembly 200, a housing assembly 202 and a retaining ring assembly 204. A bellows system 206 is positioned between the housing assembly, and the base and retaining ring assemblies. Bellows system 206 provides two adjustable loading mechanisms to create a first load on the base assembly and a second load on the retaining ring assembly. Each of these assemblies is explained in detail below. The right half of FIG. 6 shows a carrier head configured for an eight-inch diameter substrate, whereas the left half of FIG. 6 shows a carrier head configured for a six-inch diameter substrate. The two configurations are substantially similar, but differ in the shape of components of retaining ring assembly 204. A more complete description of carrier head 180 may be found in above noted U.S. application Ser. No. 08/549,651.
Base assembly 200 applies a load to substrate 10; that is, it pushes substrate 10 against a polishing pad. Base assembly 200 can move vertically with respect to housing assembly 202 to carry the substrate to and from the polishing pad. Bellows system 206 connects housing assembly 202 to base assembly 200 to create a primary pressure chamber 208 therebetween. Fluid, preferably air, is pumped into and out of primary pressure chamber 208 to control the load on substrate 10. When air is pumped into primary pressure chamber 208, the pressure in the chamber increases and base assembly 200 is pushed downwardly.
Bellows system 206 also connects housing assembly 202 to retaining ring assembly 204 to create a secondary pressure chamber 209. Fluid, preferably air, is pumped into and out of secondary pressure chamber 209 to control the load on the retaining ring.
As explained below, housing assembly 202 is connected to and rotated by drive shaft 80. When housing assembly 202 rotates, bellows system 206 transfers torque from housing assembly 202 to base assembly 200 and retaining ring assembly 204, and causes them to rotate. However, because the bellows are flexible, the base assembly and retaining ring assembly can independently pivot with respect to the housing assembly in order to remain substantially parallel with the surface of the polishing pad.
Base assembly 200 includes a disk-shaped carrier base 210 having a nearly flat mounting or bottom surface 212 which may contact substrate 10. The top surface of carrier base 210 may include an asterisk-shaped depression 216 having six spokes. Depression 216 is surrounded by an annular area 218. Annular area 218 is itself surrounded by a rim 220. Several conduits 222, evenly spaced about a central axis 224 of carrier head 180, extend through carrier base 210 from bottom surface 212 to depression 216. Preferably, two conduits descend vertically from each spoke of the depression to the bottom surface.
A generally flat annular plate 230 rests primarily on annular area 218, with the outer edge of the annular plate abutting rim 220 of carrier base 210. An inner portion 232 of the annular plate projects over depression 216. Annular plate 230 may be attached to carrier base 210 by screws 234 which extend through passages in the annular plate and engage threaded recesses in the carrier base.
A stop cylinder 240 is mounted in a central opening 238 in annular plate 230. Stop cylinder 240 includes a tubular body 242, a radially-projecting lower flange 244, and a radially projecting upper flange 246. Lower flange 244 is welded to a lip 248 at the inner edge of annular plate 230 to support stop cylinder 240 above the annular plate. The gap between depression 216 in carrier base 210 and lower flange 244 of stop cylinder 240 and inner portion 232 of annular plate 230 creates a cavity 250 in base assembly 200. A central channel 252 extends through tubular body 242 from lower flange 244 to upper flange 246 to provide a fluid pathway to cavity 250 and conduits 222. Stop cylinder 240 may be formed of a top portion which is screwed onto a bottom portion. Spacers may be inserted into a gap between the top and bottom portions to control the length of the stop cylinder.
Housing assembly 202 includes a disk-shaped carrier housing 260. The bottom surface of carrier housing 260 has a cylindrical cavity 262. The carrier bottom surface also includes an inner annular surface 264 and an outer annular surface 266 separated by a ridge 268. The top surface of carrier housing 260 includes a cylindrical hub 270 with a threaded neck 274 which projects above an annular area 272. A gently-sloped section 276 surrounds annular area 272, and a ledge 278 surrounds sloped section 276.
Housing assembly 202 further includes an annular inner plate 280 and an annular outer plate 282. Inner plate 280 is connected to inner annular surface 264 on the bottom of carrier housing 260 by pins 284 and counterbore screws 285, and outer plate 282 is similarly mounted to outer annular surface 266 by pins 286 and counterbore screws 287. Preferably, five pins and five screws connect each plate to the carrier housing. The outer edge of inner plate 280 abuts ridge 268. The inner edge of inner plate 280 projects horizontally under cylindrical cavity 262 to form an inwardly pointing lip 290 surrounding an opening 292. The top of cylindrical cavity 262 is closed by a ceiling 294. Stop cylinder 240 of base assembly 200 extends through opening 292 into cylindrical cavity 262, and upper flange 246 projects horizontally over lip 290.
There are several conduits in housing assembly 202 to provide for fluid flow into and out of the carrier head. A first conduit 300 extends from cylindrical cavity 262 through carrier housing 260 to hub 270. A second conduit 302 extends from the bottom surface of inner plate 280, through carrier housing 260, to hub 270. A third conduit (not shown) extends from the bottom surface of outer plate 282 through carrier housing 260 to hub 270. An O-ring 306 inset into the top surface of hub 270 surrounds each conduit.
Carrier head 180 may be attached to drive shaft 80 by placing two dowel pins (not shown) into dowel pin holes (not shown) and lifting the carrier head so that the dowel pins fit into paired dowel pin holes (not shown) in a drive shaft flange 82. This aligns passages in the drive shaft to the conduits in the carrier head. In operation, the dowel pins transfer torque from the drive shaft to the housing assembly so that the housing assembly rotates with the drive shaft. Then threaded perimeter nut 84 can be screwed onto threaded neck 274 to attach carrier head 180 firmly to drive shaft 80.
Bellows system 206 includes several cylindrical metal bellows disposed concentrically in the space between base assembly 200 and housing assembly 202. Each bellows can expand and contract vertically. An inner bellows 310 connects the inner edge of inner plate 280 and to lower flange 244 of stop cylinder 240 to seal cavity 262 and central channel 252 from primary pressure chamber 208. A pump (not shown) can pump air into or out of conduits 222 through a first conduit 300, cavity 262, central channel 252, and cavity 250. If air is pumped out of the conduits, the substrate will be vacuum-chucked to the bottom surface of the carrier head. If air is pumped into the conduits, the substrate will be pressure-ejected from the bottom surface of the carrier head.
Outer bellows 312 connects the outer edge of inner plate 280 to annular plate 230. The ring-shaped space between concentric inner bellows 310 and outer bellows 312 forms primary pressure chamber 208. A pump (not shown) can pump a fluid, preferably air, into or out of primary pressure chamber 208 through second conduit 302. If fluid is pumped into primary pressure chamber 208, the volume of the chamber will expand until substrate 10 beneath base assembly 200 contacts the surface of the polishing pad. Forcing additional fluid into the primary chamber will increase the pressure and thus increase the downward pressure on substrate 10. The pump may adjust the pressure in the primary pressure chamber and thus the load on the substrate.
When primary pressure chamber 208 expands and base assembly 200 moves downwardly with respect to housing assembly 202, metal bellows 310 and 312 stretch to accommodate the increased distance between annular plate 230 and inner plate 280. However, flange 246 of stop cylinder 240 will catch against lip 290 of housing assembly 202 to stop the downward motion of the base assembly and prevent the bellows from over-extending and becoming damaged.
Retaining ring assembly 204 includes an L-shaped ring support 320 with a inwardly-directed horizontal arm 322 and an upwardly-directed vertical arm 324. A backing ring 330 is attached to the top of horizontal arm 322 by screws 332. An outer portion 333 of backing ring abuts vertical arm 324, and an inner portion 334 of backing ring 330 may project horizontally over rim 220 of carrier base 210. A flexible seal 335 connects retaining ring assembly 204 to carrier base 210 to protect the carrier head from slurry. The outer edge of seal 335 is pinched between horizontal arm 322 and backing ring 330. The inner edge of seal 335 is an O-ring having a smaller radius than the carrier base. The O-ring fits elastically into a notch in carrier base 210 to hold the inner edge of seal 335 in place. A flange 336 is attached to the outside of vertical arm 324 and forms the outer wall of carrier head 180. Flange 336 extends upwardly to almost touch carrier housing 260. A seal 338 rests on ledge 278 and extends over flange 336 to protect carrier head 180 from contamination by slurry. A retaining ring 340 is mounted to the bottom surface of horizontal arm 322 a O-ring which fits partially into a notch in ring support 320. Retaining ring 340 includes a protruding portion 342 which will contact polishing pad 90 and block substrate 10 from slipping out from under base assembly 200.
A third bellows 314 connects the inner edge of outer plate 282 of housing assembly 202 to the inner portion 333 of backing ring 330. A fourth bellows 316 connects the outer edge of outer plate 282 to the outer portion 333 of backing ring 330. The ring-shaped space between concentric third and fourth bellows 314 and 316 forms secondary pressure chamber 209. A pump (not shown) can pump fluid, preferably air, into or out of secondary pressure chamber 209 through the third conduit (not shown). If fluid is pumped into secondary pressure chamber 209, the volume of the chamber will expand until retaining ring 340 contacts the surface of the polishing pad. Forcing additional fluid into the secondary pressure chamber will increase the pressure in the secondary pressure chamber and thus increase the downward pressure on retaining ring 340. Because the primary and secondary chambers are pressurized independently, the base assembly and retaining ring can be independently actuated.
Carrier head 180 may use two preassembled bellows assemblies. Inner bellows 310 and outer bellows 312 are welded to inner plate 280 and annular plate 230 to form the first bellows assembly, and third bellows 314 and fourth bellows 316 are welded to outer plate 282 and backing ring 330 to form the second bellows assembly. The two bellows assemblies are dropped onto housing 260 and attached by screws and pins as discussed above. Then carrier base 210 and ring support 322 may be attached.
As discussed above, a common problem in the chemical-mechanical polishing of substrates is the edge effect, i.e., the over-polishing or under-polishing of the outermost five to ten millimeters of the substrate.
One possible cause of the edge effect is a "standing wave" of high compression in the polishing pad which is generated by the motion of the substrate over the polishing pad. FIGS. 7A-7C illustrate the pressure on polishing pad 90 (on the y-axis) as a function of the distance from the center of the substrate (on the x-axis). Each graph is aligned with, a pictorial representation of the element or elements contacting the polishing pad, i.e., substrate 10 or the substrate and the retaining ring 162 or 340.
Referring to FIG. 7A, the pressure on a polishing pad which is compressed by a motionless substrate 10 (which is not surrounded by a retaining ring) is shown by Curve A. Referring to FIG. 7B, the pressure on a polishing pad which is compressed by a moving substrate (again, not surrounded by a retaining ring) is shown by Curve B.
As shown by FIGS. 7A and 7B, if the substrate is motionless, then (moving from the uncompressed portion of the pad to the compressed portion of the pad) the compression in the polishing pad rises quickly just before the edge of the substrate, and then levels off to a constant value (assuming that the load on the substrate is evenly distributed). However, if the substrate moves relative to the polishing pad, e.g., if the platen rotates, then a region of high pressure 350 exists at a leading edge 352 of the substrate. One possible explanation for high pressure region 350 is a "knife edge effect". That is, as leading edge 350 of the substrate 10 travels over polishing pad 90, it attempts to scrape away pad surface 92, generating a standing wave of pressure in front of the substrate and increasing the pressure at the leading edge of the substrate. The high pressure region increases the polishing rate at the substrate's outer perimeter, usually over-polishing, but in some instances under-polishing the edge of the substrate.
In addition to retaining substrate 10 beneath the carrier head, the retaining ring assembly of the carrier head of the present invention can be used to minimize the edge effect. The retaining ring is pressed against polishing surface 92 to, in effect, "precompress" the polishing pad. This precompression alters the pressure distribution over the polishing pad to move high pressure region 350 off of substrate 10 and provide a more uniform pressure on the substrate.
The pressure on polishing pad 90 which is precompressed by the retaining ring is shown by Curve C in FIG. 7C. As can be seen from FIG. 7C, the use of the retaining ring can move the knife edge effect to a leading edge 352' of the retaining ring so that high pressure region 350' is formed beneath the retaining ring and not beneath the outer perimeter of the substrate. As a result, the retaining ring can generate a uniform pressure distribution in the polishing pad under a moving substrate. Because the pressure distribution across the substrate is uniform, the edge effect is reduced or eliminated.
The uniformity of the pressure on the substrate, and thus the severity of the edge effect, depends on the location and shape of high pressure region 350'. This depends on various factors including the load P1 applied by the mounting assembly, the load P2 applied by the retaining ring assembly, the width W1 of the retaining ring, and the width W2 of a gap 354 between the retaining ring and the substrate.
The gap 354 cannot be too large, or else the polishing pad will decompress and the retaining ring will not prevent the edge effect. Preferably, gap 354 is less than about 0.030 inches wide. Preferably, the retaining ring is between 0.2 and 0.4 inches wide, although a wider or narrower retaining ring could be used. Because both the retaining ring width (W1) and the gap width (W2) are set for a specific carrier head, the carrier head of the present invention controls the location and shape of high pressure region 350' with the retaining ring load.
The optimal retaining ring load, i.e., the pressure P2 applied by the retaining ring assembly to the polishing pad, to minimize the edge effect depends on the various substrate processing parameters. These parameters include load P1, pad rotation rate, substrate rotation rate, polishing pad rebound rate (a characteristic of the polishing pad composition), and slurry composition. The optimal load P2 for a particular set of processing parameters may be determined experimentally. For example, for carrier head 180 and the following processing conditions: an IC-1400 polishing pad, a Cabot SS-12 slurry, a carrier head rotation rate of fifty-seven r.p.m., a polishing pad rotation rate of sixty-three r.p.m., a retaining ring width of 0.340 inches, a gap width of approximately twelve mils, and a carrier head load of 5.2 p.s.i., a retaining ring load of about 4.0 p.s.i. is preferred. This results in over-polishing of an annular ring about the substrate edge which is only three millimeters wide. As another example, under the same substrate processing conditions, if the carrier head applies a load of 7.3 p.s.i., then a retaining ring load of about 7.3 p.s.i. is preferred.
The retaining ring of carrier head 100 or 180 can be independently loaded against polishing pad 90, i.e., the pressure applied by the retaining ring to the polishing pad is independent of the pressure applied by the substrate backing member to the substrate. Consequently, the load on the retaining ring can be adjusted to minimize the edge effect for any set of processing parameters. This permits the same carrier head to be used in a variety of polishing operations, e.g., at a variety of substrate loads, without a significant loss in yield or throughput.
In general, the operator of a CMP apparatus using carrier head 100 or 180 selects the processing parameters, including the polishing pad material, slurry composition, pad rotation rate, carrier head rotation rate, and substrate load, in order to obtain the desired finish, flatness and polishing rate. The polishing parameters are generally determined experimentally. Then the operator selects the retaining ring load, based on the selected processing parameters, to minimize the edge effect. In operation, the pressure in chamber 130 or 208 is set to apply the selected substrate load P1. Similarly, the pressure in bladder 170 or bellows chamber 309 is set to apply the selected retaining ring load P2. The retaining ring load P2 may be selected so that the polishing pad will not completely decompress in gap 354 between the substrate and retaining ring.
Referring to FIG. 8A, ten experimental polishing runs were carried out on 200 mm diameter substrates that were coated with a layer of oxide. The polishing was conducted using carrier head 180, an IC-1400 pad, a Cabot SS-12 slurry, a carrier head rotation rate of fifty-seven r.p.m., a pad rotation rate of sixty-three r.p.m., a retaining ring width of 0.340 inches, a gap width of about twelve mils, and a substrate load of 5.2 p.s.i. Each polishing run was conducted at a different retaining ring load. The retaining ring loads are represented by curves A-J at pressures of 11.7 p.s.i. to 1.7 p.s.i., respectively. The amount of oxide removed was measured along the radius of each substrate. In FIG. 8A, the amount of oxide removed from the substrate (the y-axis) is shown as a function of distance from the center of the substrate (the x-axis) for each retaining ring load. It may be noted that the amount of oxide removed is shown as a scaled value, i.e., as a variation from the average amount of oxide removed across the substrate in that polishing run.
Referring to FIG. 8B, the "edge exclusion", i.e., the thickness of the annular area at the edge of the substrate which is unsuitable for an integrated circuit, was calculated from the data obtained in the experimental polishing runs of FIG. 8A. It may be assumed that the edge exclusion begins at the radius at which the amount of oxide removed varies by about at least five percent from the average (either above or below the average as represented by the lines labeled as +5% and -5% on FIG. 8A) of the amount of oxide removed across the substrate. In FIG. 8B, the distance from the center of the substrate at which the amount of oxide removed varies by five percent from the average (the y-axis) is shown as a function of the retaining ring pressure (the x-axis). At the optimal retaining ring load of about four p.s.i., the polishing operation produces substrates with an edge exclusion of only about three millimeters.
As the substrate load P1 or the carrier head rotation rate increases, the optimum retaining ring load P2 also increases (not necessarily in direct proportion). Because the retaining ring load P2 may be selected independently of the substrate load P1 by adjusting the pressure in bladder 170 or bellows chamber 309, a single carrier head can be used for a variety of processing parameters.
In summary, the present invention provides a method for precompressing the polishing pad to reduce or minimize the edge effect. A substrate is pressed against a polishing pad with a first load by a mounting assembly while the polishing pad rotates. A second load is selected and independently applied by the retaining ring. This method provides improved yield and generates substrates having a larger area usable for integrated circuits.
Polishing may be performed on metallic, semiconductive or insulative layers. The particular reactive agents, abrasive particles, and catalysts will differ depending on the surface. being polished. The present invention is applicable to polishing any of the above layers.
The present invention has been described in terms of a preferred embodiment. The invention, however, is not limited to the embodiment depicted and described. Rather, the scope of the invention is defined by the appended claims.
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A warm welcome is assured at this 18th-century end-of-terrace house, located just a stroll from the heart of the historic city. The spacious bedrooms, some with four-poster beds, are comfortable and w...More about Roman City Guest House
An easy two-minute walk from the city centre, shops, restaurants and attractions, the Windsor is set in a Grade I listed Georgian townhouse on Great Pulteney Street, one of the finest boulevards in Eu...More about The Windsor Townhouse
Rosemundy Cottage is the ideal base for exploring Devizes and the surrounding area. All rooms are en suite and offer comfort and practical amenities. The lounge is the perfect venue in which to relax,...More about Rosemundy Cottage Bed and Breakfast
This is a charming, privately-owned hotel set within eight acres of beautiful grounds that has its own arboretum. Bedrooms are individually styled and include four-poster rooms, and ground-floor rooms...More about Beechfield House Hotel, Restaurant & Gardens
This charming farmhouse was built in the 1830s, and is situated on the edge of Warminster and the Wylye valley, making it an ideal base for a visit to Longleat. All rooms are on the first floor of the...More about Home Farm B&B
Nestled in the Wiltshire countryside, this free house offers a warm welcome and remains part of the local community. Inside the pub there is a modern, comfortable restaurant where high-quality food is...More about The White Horse
Located just a few minutes' walk from the city centre and appointed using light shades and oak, Chestnuts' accommodation is fresh and airy. Bedrooms are attractively co-ordinated, well equipped and co...More about Chestnuts House
This recently refurbished inn boasts attractively styled rooms set within a friendly environment. Rooms are comfortable with all the amenities needed for a pleasant nights stay. The popular Inn offers...More about The Bug & Spider
Currently the rating for this establishment is not confirmed. This may be due to a change of ownership or because it has only recently joined the AA rating scheme.�� ...More about Church Farm B+B
Situated in a picturesque market town, The Lansdowne was built in the 16th century as a coaching inn, and it still retains much of the charm and character of that era. Bedrooms are spacious and furnis...More about The Lansdowne


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Klinsmann's faith pays off in win over Costa Rica
The match was played in slightly different conditions than the last time the nations met. That was in a blizzard in Denver, with the United States edging Costa Rica 1-0 in a World Cup qualifier. Tuesday night, there was plenty of moisture on the pitch just before kickoff, but it came from sprinklers trying to keep the turf in shape during a northeastern heat wave.
With both sides already having clinched moving on in the CONCACAF championship, not much happened offensively until late in the match in front of 25,432.
Early in the second half, Costa Rica captain Pemberton came out of his net, collided with a teammate outside the area and then had the ball hit him squarely in the hands. He was given only a yellow card, however, then immediately made saves on Jose Torres' curling free kick and Donovan's shot off a rebound.
That sequence opened up play for a while, but then it deteriorated into sloppiness and some roughness in midfield between teams with no love lost.
U.S. captain DaMarcus Beasley took a nasty spill and was run over by Rodney Wallace early in the match. A woozy Beasley sat out three minutes before returning - and almost immediately stripped the ball from Wallace.
His teammates struggled to link up, showing their lack of familiarity with each other, through the first 20 minutes. Indeed, neither goalkeeper was particularly threatened until U.S. defender Clarence Goodson got free on the left side of the box late in the first half. His left-footed drive was deflected out of bounds by the defense.
Costa Rica played a tightly packed defensive style for much of the match, but coach Jorge Luis Pinto felt his players handled themselves well.
"The only thing we lacked was getting the goal," Pinto said. "The United States got the goal, we didn't."
Notes: The other quarterfinals have Mexico vs. Trinidad and Tobago, and Cuba vs. Panama on Saturday in Atlanta. ... Costa Rica had won eight straight internationals. ... The shutout was the first against the Ticos in 12 Gold Cup matches. ... The United States is 13-12-6 all-time against Costa Rica.
The Associated Press


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Originally Posted by Ric Trexell
No such thing
You need to get out and about more, I regularly see boxes of 120 cameras at £20($32), £10 ($16), and £5 ($8) orless and most are in good working order, and there's no shortage either. Many will get bought and resold on ebay where prices tend to be much higher.
My APUG portfolio


text:
By Carol Norris Enquirer contributor
When: 8 p.m. Friday and Saturday; 2 p.m. Saturday and Sunday
Where: Music Hall
Tickets: $9-$55; 621-5282; cincinnatiballet.com
After the season finale Sunday, they will accept positions with Boston Ballet.
It's not totally unexpected, says artistic director Victoria Morgan. When she hired them two years ago, Morgan says, her hope was for two full seasons from the couple. That she got, plus a recent promise to guest, perhaps as early as next season's Romeo & Juliet.
It's hard to hold onto dancing stars who are much in demand.
With Cincinnati Ballet's Rene Micheo serving as interpreter, Feijoo said the move has nothing to do with problems or regrets here, but is an issue of opportunities.
"We are used to dancing more classical roles and a longer season," Feijoo says. Boston Ballet is doing a full-length Don Quixote and Swan Lake next season.
"After I first hired them, I had artistic directors from around the world calling and asking me how I did it," Morgan says. "They're really a special couple. Because of tours they did before joining us, everyone knew about them. They've been written up in The New York Times, San Francisco Chronicle - even the Wall Street Journal. I think it says something about Cincinnati Ballet that they picked us to come to first."
This weekend, the couple will be dancing principal roles Friday and Saturday evenings - Feijoo in Serenade and both of them in Carmina Burana.
Cincinnati's reputation helped
Although they had a verbal agreement to join Cincinnati Ballet for a third season, the larger Boston Ballet - 42 dancers and 44 performances to CB's 31 dancers and 20 performances (not including Nutcracker) - offered a broader opportunity to be seen. Ballet's no different from baseball; larger markets draw the bigger stars.
"It's frustrating, but I totally understand," said Morgan, who experienced a similar situation in leaving Utah's Ballet West to join the larger San Francisco Ballet when she performed. "They're young (she's 28; he's 27), but a dancer's life is short. You go where you can get the most out of a career."
Elizabeth Olds, assistant to Boston Ballet's artistic director Mikko Nissinen, says the couple will fill spots that will become available for the company's upcoming 40th anniversary season, Feijoo as a principal and Madrigal as a soloist. Morgan and Nissinen remain close friends.
"Directors don't make a habit of pilfering each other's dancers, but you're not going to keep a dancer of a certain caliber from going to another company," Morgan explained. "We're a smaller company, a smaller community. And it's not a bad reputation to have that you can attract national-level dancers that can transition into bigger companies."
Feijoo said she's eager to move to a "more lively" city, but Micheo says she welled up when asked about things she'll miss here. "I'll miss the dancers and especially Victoria . . ." she said before her voice trailed off.
The couple have remained in demand even as they were signed with Cincinnati Ballet. They recently returned from a stint with Ballet Concierto de Puerto Rico, a company that promotes Hispanic and Latino dance artists. In December, Feijoo was featured during a Nureyev memorial gala at La Scala in Italy.
Morgan has encouraged the guest appearances - it brings attention not only to them but to Cincinnati Ballet. But the international guesting may slow down. "To get one thing, you often have to give up another," Feijoo said philosophically, adding that to secure their green cards, they'll need to stay in the United States.
'Year to push from inside'
Morgan first spotted the couple in 2000 when she visited Cuba, where they were members of Alicia Alonso's acclaimed Ballet Nacional de Cuba.
"I saw Lorna dance first and she blew me away. At the time, I never dreamed she'd be dancing with Cincinnati Ballet someday. The audience went crazy after her solo. People just screamed," Morgan said.
While still in Cuba, the couple began to tour as featured dancers and rapidly developed a taste for travel; they soon decided they were ready to leave Cuba and try something new. When she heard the news, Morgan contacted Lorna's sister Lorena Feijoo, a dancer with San Francisco Ballet, to intercede. Plans to hire them were quickly developed. It has been a positive for the company.
"The caliber of dancers here is much higher than when I first came, in part because of the principal dancers we've had - first Anna (Reznik) and Alexei (Kremnev) and now Lorna and Nelson," Morgan said, adding that she credits Kristi Capps' rapid rise - from corps de ballet to principal - in part to the strong dancers she's had around her.
For now, Morgan will continue to encourage current company members to fill the void, with no immediate plans to hire another principal couple. "I'll look for a principal couple on that level again, but this will be the year to push from inside. We're ready for that." she said.
She said their departure comes with no hard feelings.
"I know the stereotype of Latin people as being warm and generous, but they really are. In a dance company spirit and attitude filter from the top, and they've been great to work with - both for me and the other dancers. We'll stay in touch. They'll be back."
Copyright © 2012 news.cincinnati.com. All rights reserved.
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text:
Do I need an adapter with AirPort Extreme like I do with a Linksys router?
With a Linksys wireless router, I need an adapter for my laptop and other PC to connect to the internet. Do I need an adapter with the AirPort?
- Asked by Kirstie T from Redding
QA AirPort Extreme Base Station
Product No Longer Available
1 Answer from the Community
However they do it, they'll need to be capable of connecting wirelessly to at least one version of the 802.11a/b/g/n wireless networks, or instead connect with Ethernet cable.
- Answered by Andrew H from Carmel


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Set in a commanding position overlooking the Cader Idris (or Cadair Idris) and Aran mountain ranges, Penybryn is the perfect location for those looking for that special rural retreat experience.
Sympathetically refurbished in recent years with a touch of luxury, the cottage retains much of its charm whilst also providing modern practicalities and comforts. The cottage enjoys sun and views from most aspects and is perfect in every way for those wishing to relax and enjoy the stunning and tranquil scenery of the southern part of the Snowdonia National Park.
Penybryn is conveniently situated close to the historical market town of Dolgellau and its amenities (2.5 miles, 10 minutes approx) and the beaches at Barmouth and Fairbourne (20 minutes approx). It is only a couple of miles from the Torrent Walk, and approximately 15 minutes drive to the Precipice Walk and Coed y Brenin mountain biking centre. Also, just 20 minutes' walk across country is the beautifully refurbished Cross Foxes Hotel where you are sure to receive a warm welcome from the new owners.
Should you require further accommodation for friends or extended family, we can put you in touch with other cottages owned by family members in the same valley.
Click on the images below to view a larger picture


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10,000 - 50,000 downloadsAdd this app to your listsTweets por @Appszoom
This is the original app of Jaarbeurs, especially developed for visitors of trade fairs and events at Jaarbeurs. You will find everything you need to know about upcoming events and exhibitions and you can instantly share information with colleagues or friends. You will also find a practical ABC, routes and interesting news items. Using this app will enrich your visit to Jaarbeurs and will keep you up to date!
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text:
PowerObjects Releases Newest Version of Power8CRM, a Windows 8 App for Microsoft Dynamics CRM
PowerObjects Unveils Power8CRM Release 3, a Dynamics CRM App for Windows 8 Devices
(PRWEB) December 12, 2012
PowerObjects, 2012 Microsoft Dynamics CRM Partner of the Year, released its third major update of Power8CRM, a Windows 8 app for Dynamics CRM. PowerObjects developed this companion app for Microsoft Dynamics CRM users who have Windows 8 platforms like the Surface tablet.
"Windows 8 gives us an entirely new way to approach content, enabling us to build applications that entice the user in," says Dean Jones, CEO of PowerObjects. "It´s not just about data anymore–it´s about processes. We designed Power8CRM to be process-centric–to draw people in and give them the critical information they need to take action."
Power8CRM Release 3 hit the Windows Store December 6, 2012 and can be downloaded for free on any Windows 8 tablet. New features include a live start screen tile with dynamic information, lead qualification from within the app, and integration with the PowerGlobalSearch add-on for Dynamics CRM.
The app makes use of additional Dynamics CRM add-ons developed by PowerObjects, including PowerWebTraffic and PowerPhoto. Users who have these add-ons installed for their CRM will be able to take advantage of enhanced functionality within Power8CRM.
"Mobile CRM is the future," says Jones. "If you´ve got a Windows 8 tablet, you don´t need to haul around your laptop to get real-time information. This is a fast, efficient way to get the information you need, whether you want to remind yourself what a prospective client looks like in the parking lot before your meeting, or you want to assign someone a task in CRM on the fly."
PowerObjects is continually updating Power8CRM features and functions. For more information and to download the app, go to the Power8CRM download page.
About PowerObjects
Established in 1993, PowerObjects is one of a handful of organizations recognized as a leader in delivering Microsoft Dynamics CRM/xRM solutions to customers. As a Microsoft Partner Gold Certified in the CRM competency and Microsoft Dynamics 2012 Partner of the Year, PowerObjects has an impressive and rapidly growing list of customers benefiting from Microsoft CRM/xRM. PowerObjects fully embraces the power of customer choice and offers hosted, on-premise and online CRM deployment options. Headquartered in Minneapolis, Minnesota, with offices in Chicago, Columbus, Dallas, Omaha and St. Louis, PowerObjects provides CRM solutions to businesses and non-profit organizations in multiple industries including healthcare, life sciences, insurance, financial services, publishing, distribution, manufacturing and professional services.
For the original version on PRWeb visit: http://www.prweb.com/releases/prweb2012/12/prweb10226425.htm


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Canvas Prints by Chantal Vincent
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text:
BioMail (new link) was apparently shut down by its author's department, according to the message posted at its former site. Dmitry also stated, in a message to all users, "I have yet to find a host where I can continue the BioMail alert service temporarily or permanently. If someone can help, I would be very glad. BioMail requires a Unix system with Perl, a webserver installed, and a stable internet connection (Linux computer with Apache is preferable)." Can anyone lend a few server processes to get this up and running asap? [update (3/3)]: Dmitry just let me know via email that not only has the sourceforge crew ok'd running the server there, but he also already received two messages from some of you friendly folks who saw this or got the message from oss4lib-list. Way to go, folks... :)
BioMail needs a host
as seen at freshmeat, and at SIXPACK site: "SIXPACK is a free BibTeX and Reference Manager designed to edit, convert and manage reference files, search and sort bibliographies, import and export many different bibliography types. Sixpack uses the excelent perl package bp by Dana Jacobson to covert between formats." and it reads/writes bibtex, refer, endnote, tip, procite, rfc1807, and plain text along with one-way for several others. written in perl/tk... looks real good.
as seen at freshmeat: "This release includes a new class for interactions with PubMed, POD documentation for the BioMail::Mails module, and a range of bug fixes and cosmetic changes." for more see the BioMail site...
as seen on gnome-list, what's new includes "multiple documents interface, with copy/paste and drag'n'drop; multiple selections (useful with LyX citation for example); all the supported formats (bibtex, medline, ovid, refer) can now be read and written; better date handling; bug fixes." for more see the pybliographer download page at gnome.org. if you haven't tried this yet give it a shot; i might finally get rid of endnote + msword (and there was much rejoicing). :)
as seen at freshmeat: "Fixed some problems which made all previous versions of BioMail nonfunctional due to changes at PubMed site. Added HTML 'skins', csv file format." If this means they finally did the cutoff of the old server some of my pubmed code must be broken too... for more see the redesigned BioMail site.
As seen at freshmeat, gnome-list, and noted by Matt W.: "Many annoying bugfixes, a graphical configuration mechanism, and an XML-based style format for bibliographic outputs." Go to www.gnome.org/pybliographer (note new url) for more.
as seen at gnome.org: "This version is only a minor bug-fixes release." Btw I've been using this a bit and I'm getting ready to let go of Endnote for good. Wooh-hooh... :)
from gnome-list: "endnote generated bibtex files should now be readable; additional configuration topics for bibtex; minor bug fixes" ...and from the pybliographer site: "Consider this version as a 1.0pre1, so please report any problem you encounter with it." Frederic is really doing great work on this... it's got every feature I need now. Wooh-hooh!
as seen at freshmeat: "An installation script, bugfixes, urls for each reference for the text-formatted e-mails, and an option to stop getting empty e-mails." See biomail.sourceforge.net for more.
bp -- perl bibliography package
bp is a freely licensed perl package for manipulating and accessing bibliographic information. It supports bibtex, refer, endnote, procite, inspec, medline and other formats for input/output/conversion. I emailed the author as the bp homepage does not seemed to have changed in two years... will post any response as a comment.


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Eric Adams's Blog
Senator Adams receives the Special Heritage Award
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Senator Adams was awarded by the New York Black Pride organization the special Heritage Award, given to those individuals who exemplifies excellence in their field or has consistently demonstrated a commitment to community service above and beyond the norm. Senator Perkins presented the award.
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|13 posts found
Feature Wishlist?
General Discussion « Infestation: Survivor Stories
Content updates
Proximity Chat (maybe voice too [Preferably radial, not zone])
Crazy ass zombies, new zombies. Maybe have a pool of special abilities (talking like super speed/tongue attack/vomit/blabityblahblah) and let some randomization of them happen. Not even a set amount, let it be possible that they could potentially have all of them; but yeah. Maybe not all zombies, but during an event let randomized chaos rule. Set, scripted shit is lame. Chaotic, never the same thing twice is good.
Raids, not even talking about 40 players on a monster shit. I mean zombie hordes smell blood and swarm all over your encampment or group and starts an event focused on killing you. Make it tiered, make the tiers be randomized to some degree. Also, make the triggers for completing or beginning an event/tier hidden (+random). So lets say you set off a car alarm (why the fuck do zombies care about car alarms btw?); and then a swarm runs out from everywhere. Well don't make said alarm the only trigger. Maybe someone in your party dies, the fresh blood is noticed by the zombies, potential trigger. Multiple (like at least 20) hidden potential triggers.
I could list a lot more, but the game doesn't really seem to have a set direction and it's a fairly new concept. Is this going to be some post-apocalyptice wasteland where everyone is fighting for survival and you can waste other players on the way? Or is it going to be a coordinated player effort to survive? Or is it going to be a scenario where you have to group and beat some big mean super zombie?
If it's a open world free reign kill anyone type of setting; obviously stealing resources needs to have a place and effect on the world. Towns near waste treatment facilities and people to run them; for instance. Etc
If it's coordinate and survive; death needs to have a serious consequence. Temporary zombification? Honestly, I'm not sure what else there could be. For an MMO permadeath seems a bit extreme, and respawning at a waypoint seems a bit lacking. There needs to be some middle ground and honestly; in the 10 minutes i've been typing, I've not got a good one.
If it's beat the big badguy; it needs to be a concentrated descreet effort; with limited extreme rewards and unanimous small reward. This setup is the most boring but the most easily expandable.
I think the best thing would be to combine these three. Make there a section or map or server that is openpvp/town sieging/resource stealing/etc. Make an event or scenario that is fight to survive, with death resulting in expulsion or zombification (with randomized ability pools?). While still having the big badguy events/maps.
Most important thing: intuitive, interactive, reactive, fast paced combat. Usable objects that make sense. Things that would explode should. Big zombie leans back to make a big smash, you dive out of the way or die. Zombie roars in frustration; you shoot him in the back of the throat for guaranteed crits (yeah, kudos borderlands; but it's just an example).
Two cents inserted.
No macros? ok.. no reactive indicator? really?
General Discussion « Star Wars: The Old Republic
This thread is still full of people who want the game to notify them when they should hit mortal strike. Do us all a favor and stay in WoW.
No macros? ok.. no reactive indicator? really?
General Discussion « Star Wars: The Old Republic
Originally posted by sanosukex
You are either lazy, dumb or stubborn. Either way, stop. If you don't like having to pay attention and think quickly then there are two options:
1) Don't play
2) Play and shut up before you turn this into WoW 2 in Space.
No macros? ok.. no reactive indicator? really?
General Discussion « Star Wars: The Old Republic
Originally posted by jdlamson75
This should have been the end of the thread. Let me try to help you all out here since there is an obvious communications diconnect:
Originally posted by jdlamson75
This is where jdlamson75, brilliantly uses sarcasim to feign surprise that someone is upset that the game doesn't play itself for them.
Originally posted by jdlamson75
Here jdlamson75 employs faux empathy. Yet another scintillating quip. In this phrase he is bringing the reader closer to him by wording it in a comforting manner, all the while actually being scathingly contemtuous.
Originally posted by jdlamson75
This is the diamond on the crown. Here jdlamson75's facetiousness cleverly masks his true intent; which is also the crux of his point. The metaphorical tip of his spear. By setting up the pretense that he has a genuine interest in the original poster's opinion. In reality, he is making a scornful commentary on the fact that people (read: drones) expect the game to tell them how to play their class in an optimal manner, because making critical thinking decisions is far beyond their comprehension.
Originally posted by jdlamson75
Finally he salts the wound with a quick and easy remark. This time he evokes a sense of dread and fear at the necessity of having to be aware of your own abilities and timing their use. However, his actual meaning is such that people who can't pay attention to simple things shouldn't be playing games. I would go one further and say they shouldn't be procreating if they are so lazy that they can't shift their eyes to a corner of the screen and react correctly.
Clarifications on what the Awesome trailer was on about
General Discussion « Guild Wars 2
Originally posted by jondifool
Don't exist? No.
Very rare? Yes.
Half the arguements in this thread are ridiculous conjecture. Half of what's left is hyperbole and the rest is somewhat reasonable. I really wish MMOs were marketed completely to college students and up.
BTW, Dinh: You're spot on a reasonable majority of the time. Keep up the good work, so I don't have to.
Blizzards new MMORPG, any info on it?
The Pub at MMORPG.COM « General Discussion
Even mentioning "Project: Hydra" on blizzard property gets their security goons throwing you out. So I'd feel safe in saying no one who wants to work there for long would leak anything.
Don't expect any info unless someone high up gets canned.
LF PvE MMO; Akin to pre-WotLK WoW
LFGame « General Discussion
If you want a linear end-game PvE progression: EQ2, LotRO, or AoC are probably your best bets. From my experience, but I played all of these a while ago. I hear Runes of Magic? Is pretty much in that same vein, but I never took it beyond the starting areas due to non-game related garbage.
Something to keep in mind:
- Research the servers and choose wisely. Seriously, that can make or break th game for you in these medium-market games.
And AoC may come across as a big bad PvP game, but if you want to be carebare it can be totally carebare. Or at least it could when I ran through it. I didn't play that way but we definately had raiders that did.
Tera gameplay looks bad
General Discussion « TERA
This entire thread is silly. Tera is what it is. If you want 100% twitch-based combat go play a melee class in Vindictus. Tera is semi-twitch and semi-hotkey basics. It really comes down to what you want. Tera does have some collision detection and some sick ass attack animations though, including attacks where multiple characters are animated into it; which is pretty neat, but not revolutionary.
It is based on the tried and true standards of last-generation MMOs, but it steps up the game a fair bit. Revolutionary? No. But definitely not a clone of old mechanics. If everything were revolutionary: It would probably all suck. Few extreme ideas are actually worth implementing. As far as I'm concerened the fact that they base combat off of something that you know works is a boon. Harder to ruin something that is already implemented, and it is easy to modify into something way cooler.
And honestly, there aren't many MMOs with good collision NOR manual aiming. So to say it's "like any other MMO" is a blanket generalization and complete hyperbole.
Edit for sanity:
Okay, it's a demo for people to preview the game. They want to showcase the crazy graphics and the cool skills. They aren't going to give you a bunch of polished mobs that are actually reasonably challenging. They are going to load up zones with cannon fodder and give all the classes access to their (finished, polished, tested (IE: NOT MUCH)) super-cool moves. It's more marketing than gameplay. Honestly, how can you people not automatically realize that?
Sigh.. God I hate Nexon
General Discussion « Vindictus
Gotta make that green!
But yeah: Lame. I hope it doesn't launch with retarded translations.
Females spend more on virtual items then men
The Pub at MMORPG.COM « General Discussion
Originally posted by SnarlingWolf
Five Reasons why today we say the opposite of yesterday
Site Suggestions « General Discussion
Nothing against the columns or columnist; I enjoy the read from time to time. However, the above post is ludicrous. Most people these days are not so servile as to need two opposing viewpoints on a subject to adopt one as their own opinion. Read an entirely biased piece of work, then critically analyze from the possible points you can come up with and deduce your own conclusions. If people really are going to get upset and offended because a columnist presents their viewpoint on a subject; then I hope they live in a cave. Them's the breaks.
Therefore, I have to say I somewhat agree with the OP on the contention that it is a cop-out.
If there is no news to present, then it is not entirely wrong to give filler articles.
However, I have to say that the above is not true. There is a boatload of gaming news, it's just not being covered here as much as in the past. I realize that the columns aren't really the place for news disemination, but I wonder why there is such a focus here on editorials as opposed to news. That is what I find annoying.
Females spend more on virtual items then men
The Pub at MMORPG.COM « General Discussion
I can't believe someone wasted their money on the facilitation of that study. I guess if they did a complete demographics breakdown study then nothing was wasted on the Gender question except the couple seconds it took to make, but seriously: Conventional wisdom dictates that this should be catagorized in the "Derpa DURRRR" department. Yeah, that's a scientific term.
Lol I think Bioware was taking a jab at blizzard in their new trailer
The Pub at MMORPG.COM « General Discussion
I hate to burst anyone's bubble but your very specific analysis of the Trailer could be said about any clip depicting faction vs faction battle. To assume that there is an underlying meaning directed at any specific group is silly. More over, if you have some grand ideas that this game is going to be the "WoW Killer" (lol) you are being naive.
I think the game will be good, don't get me wrong. It may be great and even arguable better than WoW in the long haul. However, WoW is WoW. It has a stranglehold. People know it, understand it; and, lets face it, love it. Even if a game has the potential to surpass WoW, why would someone pay for something that needs time to surpass something that's already at the polished stage? Simple answer: It would have either have to be completely revolutionary or the potential would be there to surpass WoW massively.
Honestly, the only thing that will ever kill WoW, as far as I can tell, is Blizzard. It's just got way too much momentum, sadly.


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HoopsHype Karl Malone rumors
Here are some of the questions and answers we asked Robinson. Who was better Karl Malone or Charles Barkley? "I'd have to say Karl. He was remarkably steady. Charles was a force to be reckoned with most of the time, a Hall-of-Famer, but there were times when he was more trouble than he was worth." FanSided
NBA legend Karl Malone knew how to dunk the ball with style as he would hit the air, put his hand behind his head and tomahawk the ball right through the basket. It was his signature dunk and Eric Griffin of the D-League's Texas Legends paid tribute to "The Mailman" in a recent game versus the Reno Bighorns! Bloguin
Karl Malone on what he wants to get off his chest: "I want to say something that's haunted me for a lot of years. I must admit something. I really and truly was so disappointed that the Mavericks didn't draft me. It worked out great for me in Utah, so I'd like to come clean here and say something. I must admit that my first 10 years playing against the Mavericks I wanted to beat them really bad. I got to say that and get it off my chest." Dallas Morning News
On why he wanted to play for the Mavs: "Because they had me out, before they [the NBA] had restrictions, seven or eight times before the draft to the point that I was just convinced they were going to draft me. But they didn't. And I wanted to be close to home. But you know what, I was still close to home. I just went to Utah. I just always growing up wanted to play for the Mavericks because I had the opportunity to play at the next level. But they didn't. So it hurt my feelings for about 10 years, but it worked out unbelievably for me in Utah as you know." Dallas Morning News
"I echo his sentiments exactly," Malone told host Marc Lamont Hill. "We need to look in the mirror ourselves and stop waiting on someone to come march on our behalf. Take ownership ourself, make our community better and stop looking for a handout. Do something about it yourself that you can control." Huffington Post
Many have decried the former players' stance, including Barkley's "Inside The NBA" co-host Kenny Smith. The two even had a frank on-air discussion about it. Despite the backlash, Barkley has not backed down from his position, and neither did Malone on Wednesday. "Stop using the excuse about race," Malone said. "I am sick and tired that every time you turn around, that's what we dangle ... Our problem now is we do so much talking and beating things to death. Let's take ownership in ourselves ... stop waiting for someone to come in and march for us." Huffington Post
While he doesn't harbor ill feelings toward Bryant today, Malone said he's still willing to sort things out between them. "We had a little issue," Malone told host Marc Lamont Hill. "I don't hold grudges ... I love Westerns. I'm old-school Western. Back in the day, when you had a beef, you didn't go get guns and knives ... we just go back in the back with no cameras and knuckle up. Get it over with." Hill pressed Malone if he offered Bryant that route to resolution. "It's a standing offer," Malone said. "Look, I don't want no trouble. I don't have a problem. People say whatever they want to say and that's great. I'm 6-9, 272 [pounds] to be exact. I'm not hard to find. I don't want no trouble. But if something got to go down, I'm not playing fair." Huffington Post
Malone may have outscored Barkley by 13,171 points (and Barkley even trails Malone in points per game), but according to more advanced metrics, there's little doubt that Barkley was the better player. Over a common range of ages (22-36), Barkley was worth about 2.1 more points per 100 possessions to his team's efficiency differential than Malone (in the estimation of Box Plus/Minus) and produced about 10 more wins of Value Over Replacement Player (VORP). For BPM nonbelievers, Barkley also leads in Player Efficiency Rating (PER) and Win Shares per 48 minutes. FiveThirtyEight
In a HuffPost Live interview Wednesday, fellow NBA legend Karl Malone took Barkley's side. "I echo his sentiments exactly," Malone told host Marc Lamont Hill. "We need to look in the mirror ourselves and stop waiting on someone to come march on our behalf. Take ownership ourself, make our community better and stop looking for a handout. Do something about it yourself that you can control." Huffington Post
Duncan pulled down 10 rebounds to move past Walt Bellamy for 10th on the career list, with 14,250. He added 16 points for the 814th double-double of his career, tying former rival Karl Malone for fifth on the all-time list. "He's an incredible, incredible specimen," Spurs coach Gregg Popovich said. "And when I say specimen, I don't mean physical. Just mental toughness, his spirit, his professionalism. It's unparalleled." San Antonio Express-News
Mike Trudell: Kobe said he talked to Michael Jordan after passing MJ for 3rd on the scoring list, and among MJ's messages was: "Go get Karl (Malone)." Twitter @LakersReporter
Ramona Shelburne: Kobe is some 4000 points away from Malone and 6000 points from KAJ. I asked him after the game if he'd play long enough to catch either one. Kobe laughed & said, "Oh my god. Do you have any idea how much my body hurts day to day? I'm no spring chicken. It's good to be out here." Twitter @ramonashelburne
Kevin Ding: Kobe told me before he has "zero" relationship with Karl Malone, once his buddy until Vanessa said Karl hit on her. Twitter @KevinDing
But with a stated intention of not playing beyond next season, reaching Abdul-Jabbar's 38,387 is almost unimaginable for No. 24. In fact, Scott doesn't see anyone catching Abdul-Jabbar. "I think that's gonna stand for a while," Scott said. "I don't think in our lifetime we're going to see it being broken. … It's going to be hard for somebody to break that. They're going to have to play 20-something years I think to get that one." Karl Malone is second on the career scoring list with 36,928. Orange County Register
If Bryant stays near his current pace for the rest of this season and next, he'll not only pass Jordan before his current deal is done, he'll start getting within striking distance of Karl Malone's 36,928 points, second on the all-time list. It will take more work than Bryant is currently under contract for to approach Kareem Abdul-Jabbar's NBA record of 38,387 points. (Bryant shared his feelings about passing Jordan, with whom he has a close relationship, in a solid bit of reporting last week by Bleacher Report's Kevin Ding.) It has not been a topic of conversation in the locker room. "When he does pass it," Kupchak said, "it's a testimony to consistency and playing at a high level for a long time. I think that's nice, but I think we all know that he would trade that for a team that competes for the playoffs or a championship." NBA.com
Mike Mazzeo: KG is 13 minutes shy of becoming the fifth member of the 49,000-minute club (Kareem, Malone, Kidd, Hayes) #Nets Twitter @MazzESPN
Any rumor missing? E-mail us at email@example.com.


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Property Details
Condo, 2 Bedrooms, 2 Baths, 4 Sleeps
Excellent Location! Newly renovated 3rd floor condo with 2 bedrooms,
2 bathrooms and vaulted ceilings. Walking distance to Old Town
Scottsdale, great restaurants, pubs and shopping! Minutes to public
golf courses,walking paths and hiking trails. Master suite has king
size bed/ensuite and walk-in closet. Second bedroom has queen bed and
walk-in closet.
Fully equipped kitchen with microwave, dishwasher, coffemaker,
toaster oven, blender and garbage disposal. This condo offers all the
comforts of home including washer/dryer, all linens, LCD TV/DVD, A/C,
patio, phone, Internet and utilities.
About the Owner
This is our vacation home and you will find everything that a home would need to make it a home!
0 Reviews
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From the Owner
"This property is very close to Old Town Scottsdale so you do not need a car if you wish to walk to all of the nearby restaurants in Old Town. It is also very close to the airport which is another reason we chose this location as you can fly in and out of your destination without having a long commute to your home."
Activity and Interests
12 minutes from Airport, Phoenix Zoo and Botanical Gardens! Minutes
to Continental Golf Course and Fashion Mall.
Convenient location to ASU Skysong, Loop 101 and Tempe Marketplace.
Rental rates
|Rate Period
|Weekend Night
|Monthly *
My Standard Rate
30 night minimum stay
* Approximate monthly rate. Actual rate will depend on the days of the month you stay.
Payment is usually accepted in the quoted currency (USD) unless the currency and the amount is specifically agreed in advance with the owner / advertiser.
Additional information about rental rates
Weekly Rate: $900 - $900
Monthly Rate: $2500 - $2500
Weekly Rates - $800.00
Longer Stays Negotiable
- 12
- Available
- 12
- Unavailable
- 12
- Today
From the Owner
"The sunsets are beautiful from our deck and also you have a view of Camelback mountain."
Property Type
- condo
- Air Conditioning
- Clothes Dryer
- Fireplace ...
- Hair Dryer
- Heating
- Internet
- Iron & Board
- Linens Provided
- Living Room
- Parking ...
- Telephone ...
- Towels Provided
- Washing Machine
- Coffee Maker
- Dishes & Utensils
- Dishwasher
- Microwave
- Oven
- Pantry Items
- Refrigerator
- Stove
- Toaster
- Dining Area
- Books
- DVD Player
- Stereo
- Television
- Video Library ...
Pool / Spa
- Communal Pool
- Hot Tub
- Outdoor Pool
- non smoking only
- not suitable for children
- pets not allowed
- wheelchair inaccessible
Floor Area
- 1150 sq. ft.
- 2 Bathrooms
- Bathroom 2
- Bathroom 1 - toilet, tub, shower, Master Bedroom
- 2 Bedrooms, Sleeps 4
- Bedroom 2 - 1 queen, Guest Bedroom
- Bedroom 1 - 1 king, Master Bedroom
- Balcony
- Deck / Patio
- Golf ...
- Outdoor Grill ...
- Guests provide their own meals
- We are very close to the Greenbelt if you wish to walk or rent bicycles


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AK-47 license plate sold for $1,700
April 27, 2009
A man in the Indian state of Jammu and Kashmir paid nearly $1,700 at an open auction for the right to use a license plate reading AK-47, an official says.
Ramesh Chander Sharma, the regional transport officer at Jammu, said Mohmmad Rafiq Mir offered a top bid of $1,694 at an auction during the weekend, the Press Trust of India reported Sunday.
Around 35 people showed up for (the auction), Sharma said.
Mir, who lives in the state's Poonch district, expressed happiness at garnering the right to don his vehicle with the license plate number that refers to a Soviet assault rifle.
I am happy to get the figure as I am crazy about it (AK-47), Mir told the Press Trust.
Source: upi


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Tag Archives: mymoleskine
For well over five years, Moleskine artists and lovers from all around the world have flocked to the myMoleskine artwork gallery to showcase their talent, participate in the Creativity Challenges or simply look for some artwork inspiration. At well over 40000 published artworks, … Continue reading →
We'd like to thank everyone that took the time to share their art on myMoleskine last month. We're thrilled to have so many talented artists in the Moleskine world, contributing with close to 250 artworks in September. Just like every month, we selected … Continue reading →
It is not often that a myMoleskine contributor gets the nod as Moleskine Author A Month after less than a month worth of submissions, but London-based urban sketcher Sue Harding achieved such feat with ease, winning the award with a wide … Continue reading →
It's time to pick our Moleskine Author A Month! Choosing the three finalists has been a tough task this time around, given the great deal of amazing artworks we received from all over the world. So, thank you to everybody … Continue reading →
Thanks to everyone who took the time to share their art with us! Just like every month, we selected the most prolific contributors to bring you the 3 Author A Month finalists. If you wish to be considered for next … Continue reading →
With the fan vote in, canadian sketcher Ray Eng has been selected as our April Author A Month. Moleskine fans loved his artwork on myMoleskine, but when we reached out to Ray to write this feature, little did we know … Continue reading →
Thank you to everybody who shared their artworks on myMoleskine last month! We received close to 200 fan uploads, and we were glad to see so many new contributors. We have selected the uploads of the 3 most prolific artists … Continue reading →
It's been a tight race, but here we are with Moleskine March Author A Month, atmosfrozen. This young man's talent is as bright as his sense of humor, and if you're the type of person who struggles finishing artworks, keep … Continue reading →
Here we are, right back at it again with another edition of an Author a Month. The previous editions have featured the work of some truly remarkable artists, and this one is looking to be no less: just take a look … Continue reading →
Thank you to everyone who shared with myMoleskine last month. You can help decide who will be the selected one for January 2014 among the three most active on myMoleskine authors. View the artworks here: Temazcal (Traditional Spa, Mexico) – Contributed by … Continue reading →


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The content on this page is being archived for historic and reference purposes only. The content, links, and pdfs are no longer maintained and might be outdated.
QuickStats: Percentage of Adults Aged >18 Years Who Consumed Five or More Alcoholic Drinks in 1 Day at Least Once in the Preceding Year,* by Sex and Age Group --- National Health Interview Survey, United States, 2007
* Based on responses to the following questions: "In your entire life, have you had at least 12 drinks of any type of alcoholic beverage?" and if "yes," "In the past year, on how many days did you have five or more drinks of any alcoholic beverage?"
Estimates are based on household interviews of a sample of the civilian noninstitutionalized U.S. population.
§ 95% confidence interval.
Overall, 20.4% of adults aged >18 years had five or more alcoholic drinks in 1 day at least once in the preceding year. For both men and women, the percentage decreased with age. In all four age groups, men were substantially more likely than women to have had five or more drinks in 1 day at least once in the preceding year.
SOURCE: Heyman KM, Schiller JS, Barnes P. Early release of selected estimates based on data from the 2007 National Health Interview Survey. Available at http://www.cdc.gov/nchs/about/major/nhis/released200806.htm.
All MMWR HTML versions of articles are electronic conversions from typeset documents. This conversion might result in character translation or format errors in the HTML version. Users are referred to the electronic PDF version (http://www.cdc.gov/mmwr) and/or the original MMWR paper copy for printable versions of official text, figures, and tables. An original paper copy of this issue can be obtained from the Superintendent of Documents, U.S. Government Printing Office (GPO), Washington, DC 20402-9371; telephone: (202) 512-1800. Contact GPO for current prices.**Questions or messages regarding errors in formatting should be addressed to firstname.lastname@example.com.
Date last reviewed: 12/10/2008


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ApplianceAmana Range
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