text:
A plasma processing chamber including a slip cast part having a surface thereof exposed to the interior space of the chamber. The slip cast part includes free silicon contained therein and a protective layer on the surface which protects the silicon from being attacked by plasma in the interior space of the chamber. The slip cast part can be made of slip cast silicon carbide coated with CVD silicon carbide. The slip cast part can comprise one or more parts of the chamber such as a wafer passage insert, a monolithic or tiled liner, a plasma screen, a showerhead, dielectric member, or the like. The slip cast part reduces particle contamination and reduces process drift in plasma processes such as plasma etching of dielectric materials such as silicon oxide.
1. A method of processing semiconductor substrates and reducing particle contamination and/or process drift during consecutive processing of the substrates, the method comprising steps of:
(a) placing a substrate on a substrate holder in an interior space of a plasma processing chamber, the processing chamber including at least one slip cast part having a surface exposed to the interior space, the slip cast part having free silicon contained therein and a protective layer on the surface which protects the silicon from being attacked by the plasma in the interior space;
(b) processing the substrate by supplying process gas to the processing chamber and energizing the process gas into a plasma state in the processing chamber, the slip cast part being exposed to the plasma and optionally providing a ground path for RF current sustaining the plasma;
(c) removing the substrate from the processing chamber; and
(d) consecutively processing additional substrates in the processing chamber by repeating steps (a-c) while minimizing particle contamination of the substrates and/or reducing process drift during the processing step as a result of protecting the free silicon from attack by the plasma.
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This application is a divisional of application Ser. No. 09/469,300, filed on Dec. 22, 1999 now U.S. Pat. No. 6,673,198, which is incorporated herein by reference.
The invention relates to semiconductor processing equipment and more particularly to improved process drift control during processing such as plasma etching of semiconductor substrates.
In the field of semiconductor processing, vacuum processing chambers are generally used for etching and chemical vapor deposition (CVD) of materials on substrates by supplying an etching or deposition gas to the vacuum chamber and application of an RF field to the gas to energize the gas into a plasma state. Examples of parallel plate, transformer coupled plasma (TCP™) which is also called inductively coupled plasma (ICP), and electron-cyclotron resonance (ECR) reactors and components thereof are disclosed in commonly owned U.S. Pat. Nos. 4,340,462; 4,948,458; 5,200,232 and 5,820,723. Because of the corrosive nature of the plasma environment in such reactors and the requirement for minimizing particle and/or heavy metal contamination, it is highly desirable for the components of such equipment to exhibit high corrosion resistance.
During processing of semiconductor substrates, the substrates are typically held in place within the vacuum chamber on substrate holders by mechanical clamps and electrostatic clamps (ESC). Examples of such clamping systems and components thereof can be found in commonly owned U.S. Pat. Nos. 5,262,029 and 5,838,529. Process gas can be supplied to the chamber in various ways such as by gas nozzles, gas rings, gas distribution plates, etc. An example of a temperature controlled gas distribution plate for an inductively coupled plasma reactor and components thereof can be found in commonly owned U.S. Pat. No. 5,863,376.
Aluminum and aluminum alloys are commonly used for walls of plasma reactors. In order to prevent corrosion of the walls, various techniques have been proposed for coating the aluminum surface with various coatings. For instance, U.S. Pat. No. 5,641,375 discloses that aluminum chamber walls have been anodized to reduce plasma erosion and wear of the walls. The '375 patent states that eventually the anodized layer is sputtered or etched off and the chamber must be replaced. U.S. Pat. No. 5,680,013 states that a technique for flame spraying Al2O3 on metal surfaces of an etching chamber is disclosed in U.S. Pat. No. 4,491,496. The '013 patent states that the differences in thermal expansion coefficients between aluminum and ceramic coatings such as aluminum oxide leads to cracking of the coatings due to thermal cycling and eventual failure of the coatings in corrosive environments. U.S. Pat. No. 5,085,727 discloses a carbon coating for walls of a plasma chamber wherein the coating is deposited by plasma assisted CVD.
In order to protect the chamber walls, U.S. Pat. Nos. 5,366,585; 5,556,501; 5,788,799; 5,798,016; and 5,885,356 propose liner arrangements. For instance, the '585 patent discloses a free standing ceramic liner having a thickness of at least 0.005 inches and machined from solid alumina. The '585 patent also mentions use of ceramic layers which are deposited without consuming the underlying aluminum can be provided by flame sprayed or plasma sprayed aluminum oxide. The '501 patent discloses a process-compatible liner of polymer or quartz or ceramic. The '799 patent discloses a temperature controlled ceramic liner having a resistance heater embedded therein and the ceramic can be alumina, silica, titania, zirconia, silicon carbide, titanium carbide, zirconium carbide, aluminum nitride, boron nitride, silicon nitride and titanium nitride. The '016 patent discloses a liner of ceramics, aluminum, steel and/or quartz with aluminum being preferred for its ease of machinability and having a coating of aluminum oxide, Sc2O3 or Y2O3, with Al2O3 being preferred for coating aluminum to provide protection of the aluminum from plasma. The '356 patent discloses a ceramic liner of alumina and a ceramic shield of aluminum nitride for the wafer pedestal for use in CVD chambers.
U.S. Pat. No. 5,904,778 discloses a SiC CVD coating on free standing SiC for use as a chamber wall, chamber roof, or collar around the wafer. U.S. Pat. No. 5,292,399 discloses a SiC ring surrounding a wafer pedestal. A technique for preparing sintered SiC is disclosed in U.S. Pat. No. 5,182,059.
In addition to the above, the use of silicon carbide in semiconductor processing equipment is disclosed in U.S. Pat. Nos. 4,401,689 (susceptor tube), 4,518,349 (furnace support rod), 4,999,228 (diffusion tube), 5,074,456 (upper electrode), 5,252,892 (plasma cathode chamber), 5,460,684 (resistive layer of ESC), 5,463,525 (sensing pin), 5,578,129 (filter plate of load lock system), 5,538,230 (wafer boat), 5,595,627 (upper electrode), 5,888,907 (electrode plate), and 5,892,236 (ion implantation device).
Other documents include Japanese Patent Publication Nos. 60-200519 (susceptor), 63-35452 (diffusion oven tube, liner tube, port element, paddle), 63-186874 (microwave heated sample plate), 63-138737 (upper electrode of plasma etch reactor), 3-201322 (coating for part in vacuum environment), and 8-17745 (wafer heater). Of these, Japanese Patent Publication No. 63-35452 discloses parts made of slip cast silicon carbide.
With regard to plasma reactor components such as showerhead gas distribution systems, various proposals have been made with respect to the materials of the showerheads. For instance, commonly owned U.S. Pat. No. 5,569,356 discloses a showerhead of silicon, graphite, or silicon carbide. U.S. Pat. No. 5,888,907 discloses a showerhead electrode of amorphous carbon, SiC or Al. U.S. Pat. Nos. 5,006,220 and 5,022,979 disclose a showerhead electrode either made entirely of SiC or a base of carbon coated with SiC deposited by CVD to provide a surface layer of highly pure SiC.
In discussing the need for cleanliness and the elimination of contaminants in the processing of semiconductor wafers; U.S. Pat. No. 5,538,230 references U.S. Pat. Nos. 3,962,391; 4,093,201; 4,203,940; 4,761,134; 4,978,567; 4,987,016 and Japanese Publication No. 50-90184. The '230 patent also references U.S. Pat. Nos. 3,951,587 and 5,283,089 for discussions of SiC parts and references U.S. Pat. No. 4,761,134 for a discussion of CVD SiC on Si infiltrated SiC or porous Si that has not been filled with Si.
Japanese Publication No. 63-273323 discloses SiC parts for an ECR plasma deposition apparatus wherein silicon dioxide is deposited on samples, the SiC parts being coated with SiC by generating a plasma in the chamber and introducing methane and silane gases into the chamber.
In view of the need for high purity and corrosion resistance for components of semiconductor processing equipment, there is a need in the art for improvements in materials and/or coatings used for such components. Moreover, with regard to the chamber materials, any materials which can increase the service life of a plasma reactor chamber and thus reduce the down time of the apparatus, would be beneficial in reducing the cost of processing the semiconductor wafers.
The invention provides a method of processing semiconductor substrates and reducing particle contamination and/or process drift during consecutive processing of the substrates. The method comprising steps of (a) placing a substrate on a substrate holder in an interior space of a plasma processing chamber, the processing chamber including at lease one slip cast part having a surface exposed to the interior space, the slip cast part having free silicon contained therein and a protective layer on the surface which protects the silicon from being attacked by the plasma in the interior space, (b) processing the substrate by supplying process gas to the processing chamber and energizing the process gas into a plasma state in the processing chamber, the slip cast part being exposed to the plasma and optionally providing a ground path for RF current sustaining the plasma, (c) removing the substrate from the processing chamber, and (d) consecutively processing additional substrates in the processing chamber by repeating steps (a-c) while minimizing particle contamination of the substrates and/or reducing process drift during the processing step as a result of protecting the free silicon from attack by the plasma.
According to one optional aspect of the method, the slip cast part can comprise a liner within a sidewall of the processing chamber and the processing chamber can include a substantially planar antenna which energizes the process gas into the plasma state by supplying RF power to the antenna. For plasma etching of oxide materials, the process gas can comprise one or more hydrofluorocarbon gases. For oxide etching, the plasma preferably comprises a high density plasma which etches an oxide layer on the substrates while an RF bias is applied to the substrates.
The slip cast part can comprise one or more parts of the chamber. For instance, the slip cast part can comprise a liner within a sidewall of the processing chamber, a gas distribution plate supplying the process gas to the processing chamber, a perforated baffle extending between the substrate holder and an inner wall of the processing chamber, a wafer passage insert, a focus ring surrounding the substrate, a tubular liner protecting a process monitoring device, or the like. In a preferred embodiment, the slip cast part is a wafer passage insert fitted in an opening in a ceramic liner within a sidewall of the processing chamber wherein the liner is heated by a heater which maintains the liner at a desired temperature. The slip cast part can consist essentially of silicon impregnated slip cast SiC coated with CVD SiC.
In an exemplary process, a first slip cast part comprises a heated liner and a second slip cast part comprises a plasma screen arranged such that the liner surrounds the substrate holder and the plasma screen extends between the liner and the substrate holder, the liner being heated to a temperature above room temperature during the processing step. In another process, the slip cast part comprises a gas distribution plate having a resistivity high enough to pass RF energy therethrough, the process gas being energized by an antenna which couples RF energy into the chamber through the gas distribution plate. A third slip cast part can comprise a chamber liner having a resistivity below 200 Ω�cm, preferably below 50 Ω�cm, and more preferably below 10 Ω�cm.
The invention also provides a plasma processing system useful for processing semiconductor substrates comprising a plasma processing chamber having an interior space bounded by a chamber sidewall, a substrate support on which a substrate is processed within the interior space arranged such that the chamber sidewall is spaced outwardly of a periphery of the substrate support, a gas supply through which process gas can be supplied to the interior space during processing of the substrate, an energy source which can energize the process gas in the interior space into a plasma state during processing of the substrate, and a slip cast part having a surface thereof exposed to the interior space, the slip cast part having free silicon contained therein and a protective layer on the surface which protects the silicon from being attacked by the plasma in the interior space. According to a preferred embodiment, the slip cast part is of porous silicon carbide backfilled with silicon and the protective layer is a chemical vapor deposited layer of silicon carbide. A preferred slip cast part is a wafer passage insert of a plasma etch reactor wherein the gas supply supplies a fluorocarbon and/or a fluorohydrocarbon to the interior space.
In a less preferred embodiment, the slip cast part is bonded to the chamber by an elastomer joint or the chamber can include a ceramic liner between the chamber sidewall and the substrate support wherein the slip cast part comprises a tubular liner in an opening extending through the liner. A preferred energy source is an antenna such as a planar coil which inductively couples radiofrequency energy through a dielectric member into the chamber.
According to a preferred embodiment, the interior of the chamber is bounded by a showerhead having a silicon carbide surface extending across the top of the chamber, a liner having a silicon carbide surface extending downwardly from the silicon carbide surface of the showerhead, a plasma screen having a silicon carbide surface extending inwardly from the silicon carbide surface of the liner, and the slip cast part comprises a wafer passage insert fitted in an opening in the liner, the CVD SiC coating forming a surface of the wafer passage insert through which a semiconductor wafer passes into and out of the chamber.
According to the invention, a plasma processing chamber having improved process drift control is provided. The improved process drift control is achieved by use of one or more parts in the chamber of a part having a surface thereof exposed to the interior space, the part having free silicon contained therein and a protective layer on the surface which protects the silicon from being attacked by the plasma in the interior. The free silicon can be silicon impregnated into a porous SiC body, the silicon filling the porosity to minimize undesirable process effects and increase electrical conductivity which is useful for lowering the RF impedance of the part.
The part can have any desired configuration such as that of a wafer passage insert, a chamber wall, a substrate support, an electrode, a showerhead, etc. According to a preferred embodiment, the part comprises a slip cast silicon carbide part which has been backfilled or impregnated with silicon and the protective coating preferably comprises CVD silicon carbide.
The invention provides parts for a plasma chamber wherein the parts are made entirely of Si and SiC. Such materials are compatible in plasma environments since plasma erosion of Si or SiC produces gaseous Si or C compounds which can be pumped from the chamber without particle contamination of the substrate. With regard to thermal control, SiC has been found to exhibit exceptionally high thermal conductivity enabling parts of such material to be heated or cooled to a desired temperature range during processing of substrates such as silicon wafers.
Slip cast SiC parts in accordance with the invention can be made by the following process. In the process, a bimodal distribution of SiC powder is prepared. For example, a first SiC fraction having a mean particle size of 10 to 80 μm, preferably 25 to 50 μm is combined with a second fraction having a mean particle size of 80 to 200 μm, preferably 100 to 150 μm, the powder mixture is combined with water and organic agents such as a flocculent, and the mixture is poured into a mold to form a slip cast part. After drying such as at room temperature, the slip cast part is green machined and sintered at a suitable temperature such as around 1500 to 2000� C., the sintered part is purified in an acid bath, the cleaned part is subjected to impregnation with silicon to fill the porosity (e.g., 15 to 20%) of the part such as by melting powdered silicon and wicking the melted silicon through porous graphite and into the part fill essentially 100% of the porosity in the part, cooling the part followed by removing any excess silicon exuded out of the part, and machining the part to final tolerances such as by diamond grinding. The surface of the part can be sealed with a CVD SiC coating of any suitable thickness such as 50 to 500 μm, preferably around 200 μm for parts not directly exposed to the plasma or the coating can be in excess of 1 mm, preferably 2 mm or more for parts exposed directly to the plasma.
The slip cast part can be used in any plasma reaction chamber wherein it is desired to reduce particle contamination and/or reduce process drift. An example of a single wafer vacuum processing chamber 2 having an inductively coupled plasma source is shown in
In order to maintain a vacuum tight seal between the mounting flange and the chamber 2, suitable O-ring seals can be fitted within grooves in the endwall of the chamber 2 and RF shielding members can surround the vacuum seals. If a large vacuum force is provided by the vacuum pump, it is not necessary to utilize fasteners for attaching the mounting flange to the chamber 2. Instead, the mounting flange can simply rest on the endwall of the chamber 2. If desired, the mounting flange or another part of the plasma generating source assembly can be hinged to the chamber 2 such that the plasma generating source can be pivoted to an orientation such as a vertical orientation for servicing the interior 4 of the chamber 2.
The chamber includes a liner 20, a plasma screen 22 for confining the plasma in the space surrounding the wafer 6 extends inwardly from the lower end of the liner 20 and a wafer passage insert 21. The liner 20 can be supported in any suitable way such as by an elastically bendable frame in the case of a solid cylindrical liner which includes an inner support frame 24 and an outer support frame 26. In order to maintain the liner at a desired temperature during processing of a substrate, a heater 28 can be provided on the top of the inner frame support 24. In operation, the heater 28 is effective to heat the liner 20 and removal of heat from the liner 20 can be accomplished by a temperature controlled member 30 which withdraws heat from the liner through the inner and outer frames. Other types of heating arrangements such as a heater embedded in the liner or suitable radiant heating arrangements can also be used.
As shown in
According to a first embodiment of the invention, the plasma chamber liner 20 comprises interlocking ceramic liner elements such as flat tiles 34, as shown in
The elastomeric joint can comprise any suitable elastomeric material such as a polymer material compatible with a vacuum environment and resistant to thermal degradation at high temperatures such as above 200� C. The elastomer material can optionally include a filler of electrically and/or thermally conductive particles or other shaped filler such as wire mesh, woven or non-woven conductive fabric, etc. Polymeric materials which can be used in plasma environments above 160� C. include polyimide, polyketone, polyetherketone, polyether sulfone, polyethylene terephthalate, fluoroethylene propylene copolymers, cellulose, triacetates, silicone, and rubber. Examples of high purity elastomeric materials include one-component room temperature curing adhesives available from General Electric as RTV 133 and RTV 167, a one-component flowable heat-curable (e.g. over 100� C.) adhesive available from General Electric as TSE 3221, and a two-part addition cure elastomer available from Dow Corning as "SILASTIC." An especially preferred elastomer is a polydimethylsiloxane containing elastomer such as a catalyst cured, e.g. Pt-cured, elastomer available from Rhodia as V217, an elastomer stable at temperatures of 250� C. and higher.
In the case where the elastomer is an electrically conductive elastomer, the electrically conductive filler material can comprise particles of a an electrically conductive metal or metal alloy. A preferred metal for use in the impurity sensitive environment of a plasma reaction chamber is an aluminum alloy such as a 5-20 weight % silicon containing aluminum base alloy. For example, the aluminum alloy can include about 15 wt % silicon. However, filler particles of silicon or silicon carbide can also be used.
A plasma screen 52 extends inwardly from a lower edge of the tiles 34. The plasma screen 52 is preferably of an electrically conductive ceramic material such as Si impregnated SiC coated with CVD SiC and includes openings 54 which are small enough to confine the plasma but allow process gas and processing byproducts to be removed by the vacuum pump.
The heater 48 can comprise an electrical resistance heating, element embedded in an aluminum casting. Thus, by passing electrical current through the heating element, heat will be supplied to the aluminum casting which in turn conducts heat into the inner frame 42, the aluminum backing plates 36, the heat conductive elastomer 38 and into the tiles 34. During heating and cooling of the aluminum body of the heater, the heater will expand to a greater extent than the ceramic liner formed by the tiles 34. In order to accommodate such expansion and contraction, the inner and outer support frames are configured to be elastically bendable. For example, the frames can be segmented such that a series of axially extending lower portions thereof are separated by axially extending slits. In addition, the inner and outer frames can be configured to provide a desired amount of thermal conductance. For instance, the outer frame 44 can be of a metal such as aluminum or an aluminum alloy and a lower portion thereof can have a thickness sufficient to withdraw heat from the liner and a thin upper portion to allow adequate bending of the outer frame due to thermal stresses during processing of a semiconductor substrate.
In order to prevent a line of sight between the wafer 6 and the chamber wall 46, each tile 34 can have edges 56 which interlock with mating edges of adjacent tiles, as shown in FIG. 6. As shown in this alternative embodiment, the chamber 58 can have polygonal inner surfaces 60 wherein the tiles are bonded directly to flat surfaces 60 of the chamber by an electrically and thermally conductive elastomer. Such an arrangement is advantageous in that it has fewer parts than the tile/backing plate arrangement and allows liner removal for cleaning and replacement to be carried out more quickly.
In the foregoing embodiments, the plasma in the chamber can be confined by the SiC surfaces of the gas distribution plate, the liner, the plasma screen and the substrate support which extends upwardly through the inner periphery of the plasma screen. Because the CVD coating on the Si impregnated SiC parts are located between the plasma and aluminum surfaces of the chamber, sputtering of the Al surfaces by the plasma is minimized and contaminating processed wafers with Al is reduced compared to chambers having Al surfaces with line-of-sight to the processed wafer.
In the foregoing embodiment, the liner comprises tiles of Si impregnated SiC coated with CVD SiC bonded to an aluminum backing plate by an electrically and/or thermally conductive elastomer bonding material. If desired, the liner can comprise a continuous surface rather than the individual tiles. The chamber wall can be of any desired configuration such as cylindrical, polygonal, etc. A suitable access opening in the wafer passage insert allows passage of individual wafers into and out of the chamber and additional openings can be provided in Si impregnated SiC parts coated with CVD SiC to allow various measurements to be made by conventional accessories such as process monitoring equipment. The tiles can have a flat rectangular surface facing the interior of the chamber. Alternatively, the exposed surface of the tiles can be curved such that the tiles form a cylindrical inner wall of the chamber.
In the embodiment wherein the tile and backing plate assemblies are bolted to an Al inner support frame which extends around the inner wall of the chamber, the thermal stresses generated during start-up, operation and shut-down of the plasma chamber can be accommodated. The number of SiC tiles can be chosen to achieve a desired limit on part and/or bond stresses generated due to thermal forces encountered in the plasma chamber.
In the embodiment wherein a lower flange of the inner support frame is bolted to the lower edge of an Al outer support frame and a flange at the upper edge of the outer support frame is bolted to a top plate located on top of the chamber, the outer support is segmented into vertically extending plates separated by slots which extend from the lower end of the outer support frame to the top flange. In order to provide temperature control of the SiC tiled surface, a heater located above the top flange of the inner support frame can be bolted to the inner frame. With such an arrangement, the heater can generate heat which is thermally conducted from the inner support frame to the backing plate and SiC tile. The heater can comprise a single resistance heater which extends entirely around the inner wall of the chamber. Alternatively, the heater can comprise any suitable heater arrangement which achieves the desired temperature control of the liner, e.g., maintaining the inner surface of the liner at a desired temperature such as in the range of 80 to 160� C. during plasma etching of dielectric materials such as silicon oxide.
The chamber can include a plasma screen surrounding the substrate support. The annular screen can be attached to a carrier ring by any suitable technique. For instance, the screen can be adhesively bonded to the carrier ring by the elastomer bonding material discussed earlier. In addition, the carrier ring can be bolted to a lower flange on the inner frame such that the screen is clamped between the carrier ring and the flange. The screen can be of any suitable material which will withstand a plasma environment for semiconductor production. Silicon carbide is a preferred material for the screen. The screen can comprise a single unitary ring or a plurality of spaced apart ring segments. For instance, the screen can include circumferentially spaced apart segments.
In order to accommodate the wafer passage insert, the inner and outer frames include cut-outs therein and the tiles surrounding wafer transfer the slot are arranged such that smaller tiles are below the slot and larger tiles are above the slot. The wafer passage insert preferably comprises a single piece of slip cast SiC which is impregnated with Si and then coated with CVD SiC. If desired, the insert can be made from an assembly of several pieces of such material.
According to the embodiment of the invention wherein line-of-sight surfaces of aluminum components are avoided by covering the surfaces with the SiC tiles, the edges of the tiles are preferably designed such that they overlap each other. For instance, the tiles can have mating edges wherein a projection on one tile is received in a recess in an adjacent tile. This effect can be obtained by any edge design wherein a rectilinear path is not provided between the opposed surfaces of the tile. Thus, a mating curved or multi-sided edge surface such as a V-shaped, U-shaped, W-shaped, groove-shaped, notch-shaped, offset-shaped, etc. type edge can provide the desired mating tile edge.
The interlocking tile joints eliminate line-of-sight to aluminum components and accommodate differential thermal expansion/contraction of liner components during startup, operation and/or shutdown of the plasma reactor. For instance, heat from the heater and/or plasma ion thermal energy deposited on the tiles is thermally conducted by the inner frame, through the elastomer bond, up the outer frame and into the chamber top plate. Due to water cooling of the top plate via cooling channels, the heat transferred through outer frame is removed from the chamber.
During processing of semiconductor substrates, the tiles can be preheated by the heater before plasma is generated in the chamber. For instance, the tiles can be heated to a desired temperature by the heater and a thermal control system can be used to adjust the heater power to maintain the tiles at the desired temperature. After plasma is generated in the chamber, the control system can automatically reduce the heater power to maintain the desired time temperature. Further, the thermal impedances of the inner and/or outer frames can be adjusted to achieve the desired range of tile operating temperatures and limit the heater maximum temperature.
During processing of semiconductor substrates such as plasma etching of silicon wafers, in order to minimize deposition of polymer from gaseous byproducts produced during the etching process, it is desirable to maintain chamber surfaces exposed to the plasma at temperatures of about 80� C. to about 160� C., preferably 110 to 150� C. In addition, such temperature control of these surfaces provides reduction in processing drift during sequential processing of individual wafers. Prior to striking a plasma in the chamber, a resistance heater can be used to heat the ceramic liner by thermal conduction, i.e., heat from the heater passes through a resilient Al frame to the ceramic liner. In such an arrangement, the heater and part of the Al frame in contact therewith may heat to around 300� C. in order to heat the ceramic liner to around 150� C. The resilient Al frame comprised of the inner and outer frames allows the part of the Al frame in contact with the heater to expand relative to the portion of the Al frame in contact with the ceramic liner and thus accommodate any bending stresses on the intermediate part of the Al frame.
If desired, one or more parts of the chamber can be made of CVD SiC. The CVD SiC can be deposited on a substrate such as graphite and grown to a desired thickness after which the substrate is removed such as by machining. For example, in the case of a cylindrical liner, CVD SiC can be deposited to a desired thickness on a graphite cylinder and the graphite cylinder is later machined away leaving the CVD SiC cylinder liner. Advantages of the CVD SiC include high thermal conductivity (e.g., CVD SiC has about twice as much thermal conductivity as sintered SiC) and tailored electrical resistivity (e.g., resistivity of SiC can be varied from electrically conducting to semiconducting). An advantage of using CVD SiC for the reactor components is that it is possible to obtain a highly uniform temperature distribution across the surface of the component inside the reactor. In the case of processing wherein the component is maintained at a high enough temperature to minimize polymer buildup on the exposed surfaces of the component, the use of CVD SiC is highly advantageous from the standpoint of temperature control and minimizing particle generation.
An example of preparing a slip cast component in accordance with the invention is as follows.
A mixture of 1 part by weight of medium particles of SiC powder with average particle diameters between 10 μm and 30 μm and 1-2.5 parts by weight of coarse particles of SiC powder with average particle diameters between 80 μm and 200 μm is kneaded and granulated after adding an organic binding agent. Then, the mixture is formed into a shape defined by a plaster mold after which the shaped part is dried. Next, the shaped part is presintered at 800 to 1200� C. followed by reaction sintering at 1500 to 1800� C. while impregnating the shaped part with Si. The sintered part is then placed in a vacuum furnace and coated with SiC using a mixture of trichloromethyl silane gas at 4 ml/min with hydrogen as a carrier gas at 4000 ml/min. As a result, a slip cast SiC part is produced with a CVD SiC coating.
The foregoing has described the principles, preferred embodiments and modes of operation of the present invention. However, the invention should not be construed as being limited to the particular embodiments discussed. Thus, the above-described embodiments should be regarded as illustrative rather than restrictive, and it should be appreciated that variations may be made in those embodiments by workers skilled in the art without departing from the scope of the present invention as defined by the following claims.
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East India ship, Göteborg
4 Reviews
4 Reviews
Outside Göteborg, on its return from China and India, the East India company ship called Götheborg sunk just a little outside the harbour in 1745. Luckily, no one was killed but much of the cargo sunk along with she ship, such as tea, silk, and china. You can still find crushed china on the sea floor, but some of it is on display in the East India ship museum.
The exhibition itself is interesting and well worth a visit. Children will also enjoy the interactive shows and how life was on board in old days. They also show how the ship was built using traditional techniques and materials and the story about the ship is neatly intevowen with the history of the city.
The ship went to China, and back, so it has made the same journey as its namesake in the 18th Centiry.
For info on the ship, see also this link:
Few things in life interests me so much as history (well okay, except for sport, travels, party and girls...:) ), but there are limits for how interesting it can be.
A lot of years ago some persons came up with the bright idea to rebuild the East India ship and travel with it on the original route down to China.
Would cost 5 million euro.
Last year the whole project was done and the "Götheborg" could take off to Shanghai in China. This summer it came back, and it had then costed 60 millions euro...
Now, again, I'm interested in history. But there are limits. Take a look at this ship, and then you can as me start to think about if it's built in pure gold, or how on earth it could cost 60 millions euro!?
There are many people in the world who could have gone to bed less starving for those money...
Or we could have gotten ourselves a really nice football stadium in Gothenburg... :)
Anyway, the original ship sank outside Gothenburg in 1745 after it's third trip to China, which had lasted for 30 months. It had carried tea, porcelain, spices and silk from China. It's said that the shipping company gave the order to sink the ship to get out the insurance money.
In 1984 the ship was found again, and almost immediately they started to talk about building a copy of it. In 1993 the project started, and 14 years later the ship had gone through the whole trip again.
Now it's located just a couple of hundred meters from where I live, in the Gothenburg harbour and during the weekends it's possible for anyone to get onboard, for a fee of 100 SEK. During this summer it will also make some shorter trips along the swedish west coast. And then there are plans to shipping it back to Shanghai next year for that city's 100 years jubilee.
Wonder how much the trip will cost this time...?
To say the truth I was pretty disappointed when I first saw the ship. It's not big, it's not beautiful and it looks like any tourist trap I've seen...
But I guess it's worth a visit anyway. After all, it's swedish history...
The "Göteborg" sailing ship was owned by the Swedish East India Company, active in the 18th century. She sailed to China and only minutes from the safe harbour in Göteborg, she sank and so did all her cargo. Bit by bit, cargo and ship parts have been found throughout the years and then it was decided to make a replica of her. Today, the new Göteborg is ready and can be visited weekends. Having said that, she will set sail first for Stockholm and then China again in autumn 2005 so you might have to wait a year if you are too late...this time she will of course sail with all the modern amenities a ship requires to be legally fit for the world's oceans but they hope to use as little as they can of modernities.
Definately go to the Terra Nova shipyard in Eriksberg and watch as craftsmen faithfully reconstruct the East Indiaman merchant ship from scratch, right down to the last bolt and toggle. In fact, the only aspect about this ship which isn't from the original specs, are the massive Volvo engines being installed because of International Harbour law which prohibits sailing vessels from entering without engine power. Even if you've no particular interest in shipping/sailing history, it's a fascinating way to spend a couple of hours. These craftsmen are hand-building an authentic masterpiece which was launched on Sweden's National Day; June 6th, 2003 and will actually set sail to China and back in 2004-2005, taking the same route which the Swedish merchant ships took in the 18th century. Quite an awesome undertaking if you think about it.
And I thought building something with Lego was tough. ;o)
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James says he's not thinking about 2014 yet
MIAMI LeBron James has this summer on his mind, and is already starting to plan for next season.
The summer of 2014, that can wait.
James said Tuesday that he is not thinking about the possibility of becoming a free agent in 12 months, though he did acknowledge that the prospects of competing with Dwyane Wade, Chris Bosh, Erik Spoelstra and Pat Riley for several more championships with the Miami Heat is more than a tiny bit intriguing.
"That's the goal," James said. "That's the ultimate finish. And we all hope that can happen, obviously."
James' final interview session of this season revealed plenty in 17 minutes, including that he's already feeling an itch to get back on the basketball court after just a few days off, that he'll stop at nothing to give longtime girlfriend Savannah Brinson anything she wants on their wedding day in a couple months, and that he's making no secret of his hope that the Heat bring back at least the majority of this year's championship roster.
The most interesting news, however, was when he spoke of his short- and long-term plans. First, he's vowing to come back better next season, which is no small promise from someone with four MVP awards, two Finals MVP awards and who carries the tag of "best player in the world." And then next summer, it certainly sounds as if he's going to give the prospects of staying in Miami a good, long look.
"This is what we came here for, so that would be the ultimate," James said. "But you can never ... I don't know, life changes, things happen, and we have to be prepared for that. But this is what we all want to be here for, that's to be able to compete for a championship each and every year. And if we can do that, then it'd be awesome."
James scored 37 points in Game 7 of the NBA Finals against the San Antonio Spurs, carrying the Heat to their second straight championship in a season where he picked up his fourth MVP award. He's gotten to the championship series in all three of his seasons with Miami, falling to Dallas in 2011, then beating Oklahoma City last season and the Spurs this year.
The team gathered for physicals and a quick meeting on Tuesday, and now begins the process of scattering for vacation and other business. James will make his annual trip with Nike to China next month, not long after Wade does some business there.
And already, James sounds like he's missing the group that he spent the past nine months with.
"It's like, `Damn, I wish we could come back in the locker room, have another practice, take another flight, have another bus ride with those 15 guys,'" James said. "That's what it's all about. You miss the guys throughout the summer. I know my family probably doesn't want to hear that, but it's the truth."
It was not a Finals without speed bumps for James, who failed to score 20 points in any of the first three games against the Spurs. And after Miami lost Game 5 in San Antonio, James had to prepare without one of his most faithful sounding boards.


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Burnt Offerings by Robert Marasco
For all those folks who have at times felt that their home and possessions owned them, rather than the other way around; for those folks who love a good haunted house/possession tale; and even for those readers who simply enjoy a well-told thriller of a page-turner, Robert Marasco's 1973 novel Burnt Offerings will be a real find. This was Marasco's first novel in a sadly unprolific career; he came out with only two more titles – Child's Play, a drama, in 1970, and Parlor Games, a Gothic-style mystery, in 1979 – before succumbing to lung cancer in 1998, at the age of 62. A real loss, if Burnt Offerings is any indication of the man's skills.
In this work, we meet Ben and Marian Rolfe, a nice, ordinary couple from Queens, who, with 8-year-old son Dav... Read More
I just really get into the characters, and try to imagine what would make them afraid, what would turn them on, all the little gestures that carry that love and tension between...Read More
A Canticle for Leibowitz by Walter M. Miller Jr It's the dark ages again. A 20th century nuclear war spawned a "Flame Deluge" which destroyed human civilization's...Read More
THE WICKED + THE DIVINE (Vol. 1): THE FAUST ACT by Kieron Gillen (writer) and Jamie McKelvie (artist) IMAGE is THE publisher to watch these days, and THE WICKED + THE DIVINE by...Read More
Here are our favorite books published in 2014. Hover over the cover to see who recommends each book and what they say about it. Please keep in mind that we did not read every SFF...Read More
Recent Posts
Horrible Monday: Burnt Offerings by Robert Marasco
Burnt Offerings by Robert Marasco
A Clockwork Orange: A malenky bit of ultraviolence makes for a horrorshow jeezny
A Clockwork Orange by Anthony Burgess
Not everyone may be a fan of Anthony Burgess' A Clockwork Orange, but we all know of it thanks to the iconic film by Stanley Kubrick. The image of juvenile delinquent Alex and his droogs with their frighteningly ruthless smiles, black hats, suspenders, and kicking boots as they terrorize helpless citizens while singing "Singin' in the Rain" in a dystopian near-future London is impossible to forget.
The story is simple: Alex's little gang goes on a horrifying crime spree until he is caught, put into prison, but is offered a new experimental therapy, the fictional Ludovico technique, which involves forcing the subject to watch violent imagery for extended periods while administering drugs that induce nausea. At the end of this treatment, little Alex cannot even think violent thoughts without being crippled with pain and nausea, with the uninte... Read More
Tokyo Raider: A quick GRIMNOIR fix
Tokyo Raider by Larry Correia
Tokyo Raider is another of Larry Correia's audio "shorts" in his popular GRIMNOIR CHRONICLES series. There's not much to these little stories, but they're hard to resist because they're narrated by the amazingly awesome Bronson Pinchot and they give fans a little fix while we wait for another GRIMNOIR novel.
A couple of decades have passed since Warbound, and the United States and Japan are not friendly. But that doesn't stop Japan from asking Joe Sullivan, a heavy, for help in banishing a demon summoned by the Russians to terrorize Tokyo. Joe is the son of Jake Sullivan, the protagonist of the previous GRIMNOIR CHRONICLES books. Joe's mother is Japanese. The Imperium has built a 12-story high... Read More
Sunday Status Update: May 24, 2015
This week, Red Sonja again. Yeah, I don't know.
Red Sonja: A duke contracted me this week (good thing too -- I was almost back to turnips three meals a day) to find his daughter, who had apparently been abducted by a dragon. I've never been exactly clear on why dragons want girls (if they're not going to just eat them), or in fact how they always seemed to latch onto a nobleman's daughter. Did a bit of digging and it turns out she went of her own accord. There's apparently some kind of thriving subculture of bored (read: rich) girls writing about romance with dragons, and dragons turning into particularly studly men, and that sort of nonsense. So anyway, dropped by the cave, had a chat with the dragon. Nice bloke, couldn't be happier to get rid of the girl. Unfortunately, the little idiot spotted a vampire when we were halfway back and decided to elope, so now she's quite a bit paler and breathing... Read More
The Martian Chronicles: A melancholy meditation on failed American ambitions
The Martian Chronicles by Ray Bradbury
I really didn't like The Martian Chronicles when I first read it last year. Considering its legendary status in the genre and its very high ratings by other reviewers I respect, I was really looking forward to finally reading this classic SF tale. But what I discovered was a series of loosely-connected vignettes with some connecting material that seemed fairly superfluous. While I found the first few stories actually featuring Martians very well written and intriguing, once the Martians went offstage and were replaced by an endless series of annoying, hokey Midwesterners from 1950s America, my interest died more quickly than the Martians themselves.
However, I knew I must be missing something. This is considered one of the greatest works of mid-20th century science fiction, and is highly regarded even by the literati outside the genre. So I decided to try the aud... Read More
Welcome to the Expanded Universe
Greetings, FanLit readers, friends, and potential contributors! We're launching a new column, Expanded Universe, curated by me, for feature essays that discuss any aspect of speculative fiction.
How do we define the term "speculative fiction"? Well, that's one thing that this column will end up addressing: given that all fiction exists in the realm of the imagination, what makes some fiction "speculative" and other fiction not? And where do we draw the boundaries within the term for genres like science fiction, fantasy, magical realism, New Weird, slipstream, horror... you get the drift.
The Expanded Universe
Expanded Universe will feature regular essays from authors and editors of fiction, poetry, and non-fiction, as well as from established readers and reviewers, talking about anything ... Read More
Undercity: An underground society with real-world social concerns
Undercity by Catherine Asaro
I'm a sucker for stories that take place underground, so when I saw the cover and title of Catherine Asaro's new book, Undercity, I knew I had to break my commitment to not start a new series until I'd finished all the other ones first. (For the last seven months I've read only books that continue or finish a series I've previously started.)
When she was an orphaned child, Major Bhaajan used to live in the dark dirty tunnels under the city of Cries. She was one of the dust rats — the kids who run in packs through the tunnels. They live in poverty, are malnourished, don't go to school, and have few opportunities. Bhaajan was hard-working and motivated, though. She left the Undercity when she joined the military, and she hoped never to return to Cries. Now, retired from t... Read More
A Darkling Sea: Enjoyable and raises thoughtful questions
A Darkling Sea by James L. Cambias
A Darkling Sea is a fast-paced adventure set in a challenging environment. Part cat-and-mouse war-game, part first contact story, James L. Cambias' first novel is an engrossing read.
The planet Ilmatar is sheathed in ice. Under the kilometer-thick ice crust is a cold ocean, and a group of Terran human scientists are studying it from within an undersea habitat. Ilmatar has at least one intelligent, sentient ocean-dwelling species, and the humans are under strict orders from another non-human race, the Sholen (who act as self-appointed den-mothers for everyone) not to engage with the locals. When two of the humans disregard this rule, one of them is killed by the locals. This prompts the Sholen to try to shut down the project, and the human scientists disagree. Soon things have spiraled out of control.
Cambias' style and the structure of... Read More
Solaris: Can we communicate with an alien sentient ocean? If so, about what?
Solaris by Stanislaw Lem
Solaris is an amazing little novel with a colorful history. First written in 1961 by Stanislaw Lem in Polish, it was then made into a two-part Russian TV series in 1968, before being made into a feature film by famous Russian director Andrei Tarkovsky in 1972. It only reached English publication in 1970 in a Polish-to-French-to-English translation. And just when you thought it had faded from attention, both James Cameron and Steven Soderbergh expressed interest in doing a remake, with Soderbergh getting the nod in 2002 because Cameron was busy with other movies. Finally, a direct Polish-to-English translation by Bill Johnston was made available as an ebook and audiobook in 2011. In my case, I saw the Tarkovsky film back in 1995, watched the Soderbergh film in 2002, finally read the 1970 translation in 2013, and listened to the audiobook version in 2015.
Are the book and films wort... Read More
Thoughtful Thursday: Rename this horrible cover!
It's time again for one of our favorite games!
Please help us rename the horrible cover of this book by Grande Dame Andre Norton.
The author of the new title we like best wins a book from the FanLit Stacks.
Got a suggestion for a horrible cover that needs renaming? Please send it to Kat.
We love this game!
NEXT WEEK's Thoughtful Thursday column: We'll be giving away all of the Nebula and Hugo nominated novels to one lucky winner! Read More


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fair enough. She's also Catholic, but I realize there's not really any unity in the Catholic church.
There is unity of teaching, and transubstantiation is a non-negotiable. Unfortunately, there is often bad catechesis and it sounds as if your friend is the result. Catholics should not believe that the Eucharist is symbolic.


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The NHLPA has announced its arbitration dates, and Mats Zuccarello's hearing will be on July 31. Zuccarello filed for arbitration on July 10. As we noted here, this is just a part of the process. The hearing, if it takes place (remember both sides can still work out a deal), will find the middle ground between the two sides on a one-year deal.
What about Stepan?


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|Jan 6, 2013, 06:22 PM
CES 2013: Withings Debuts New Smart Activity Tracker
Withings today announced its new Smart Activity Tracker, which is designed to measure heart rate, monitor sleep quality and food intake, and track movement.
Health monitoring devices have seen a surge in popularity of late, with offerings like the Jawbone Up, the Nike Fuelband, and the Fitbit One.
The Smart Activity Tracker, which is designed to clip to clothing or fit into a pocket much like the Fitbit One, is the first health monitor to also measure pulse rate. It has a touch-sensitive front allowing for navigation between functions and a heart rate sensor in the back that is activated when a finger is placed on it.
The tracker uses Bluetooth Smart (4.0) to sync to Withings'*Health Mate app, and has an estimated two week battery life.
Withings has also introduced the next iteration of its smart scale. The Smart Body Analyzer WS-50 now tracks air quality and heart rate in addition to changes in weight and body fat.
Both products will be available at CES this week, which begins on Jan. 8 and ends on Jan. 11. The Smart Body Analyzer is expected to go on sale this quarter for $150, while the Smart Activity Tracker is due before the end of March. At this time, no pricing has been announced.
Article Link: CES 2013: Withings Debuts New Smart Activity Tracker
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Las Vegas green card lawyer – Free Initial Consultation
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- Grouping and Descriptive Categories (7)
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- Modern (5)
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Hardware Software
- License: zlib/libpng License ×
SolVBE, VESA VBE1.2 driver for WinXP
SolVBE is a VESA VBE 1.2 driver for Windows XP (and Windows 2000) DOS boxes. It's main goal is to enable playing of old DOS games under windows (along with, for example, VDMSound), however, it works with most VESA 1.2 programs.13 weekly downloads
OSlash is a c++ framework for developing decentralized cloud computing services. It includes a programming environment and virtual machine for assembling networks of processing nodes coordinate their operations through message passing.2 weekly downloads
ASP Watcher
ASP Watcher is a high performance (smokin') MS Internet Information Server Monitoring package. It is small, scaleable, and works pretty good.1 weekly downloads
Dylan Code Collection
A collection of useful libraries written in the Dylan programming language. The intent of this project is to provide easily accessible libraries for people developing applications using Functional Developer and/or Gwydion Dylan.1 weekly downloads
EasyFlash is a flash memory cartridge for the Commodore 64 with multiple configurations and banks possible. Since it does not use traditional UV-EPROMs but Flash memory, it is possible to "burn" the cartridge using your C64. No EPROM programmer is needed.1 weekly downloads
Unofficial LBP-3010 CAPT3 Solaris driver
Unofficial CAPT 3.0 driver for CUPS to support Canon LBP-3010 USB printers. I developed this driver because the official driver is only for Linux and I needed it for Solaris. I reverse engineered the CAPT3.0 protocol to develop this driver.1 weekly downloads
ePolyglot is a set of libraries, classes, and tools which enable Eiffel to interoperate with Python and, to an extent, Haskell. Features for using Python objects from Eiffel, Eiffel objects from Python, and Haskell functions from Eiffel are included.1 weekly downloads
nInfo System Information Libraries0 weekly downloads
A simple pic controller network with remote programming capability0 weekly downloads


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Will Hoffman and Ramis be in the Oscars' 'In Memoriam'?
"Martin Scorsese is on the line." It's a phrase most in Hollywood would give their left breast implant to hear — except in this case. The legendary director was phoning...
or email firstname.lastname@example.com
Published: March 2, 2014 | 5:22am
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Limotec nv, now located in Vichte, Bosstraat 21, Belgium, is present on the World Wide Web since 1996. Limotec nv was established in December 1983, with a view to specialize in the research, development and manufacturing of ' firedetection and gasdetection systems ' conform ATEX - BOSEC - CEBEC and EN-54 specs.
In this short period of time, the company grew steadly as a leading specialist in this area. A performance which was rewarded in the past with the General Management Award of Flanders, the Financial Management Award of Belgium and in 1996 with the ISO 9002:1994 Qualification and in september 2002 with the ISO 9001:2008 Qualification.
Limotec invests a lot of time and money in its 'Research and Development'. This allows the company to launch on a very regular base very innovative systems. Perfection is the only standard Limotec systems has to meet, together with a constant care of after sales service.
Limotec also has a division for custom made automation projects (vision systems, wireless identification, automation, pick and place units, ... )
Limotec BVBA
Bosstraat 21
B-8570 Vichte
F: +32 (0)56 70 44 96a


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In a bid to teach his "most beautiful words" to the young audience, Pope Francis stars in a virtual comic strip for children in a new app.
The Pope Francis Comics app allows children to study his key messages in speeches and tweets, and learn about his life before his papal inauguration, the Guardian reported.
Older children can learn about the Pope through a comic strip while a colouring game is designed for younger children.
The developer, Master New Media, calls it "a fun and interesting educational app that explains the Holy Father's words to children to help them grow and learn".
They say it allows users to "easily see the greatness of the teaching of His Holiness, inspired by the gospel, and put it into practice into their everyday lives, with their family, at school and with friends."
The app, priced at 1.99 pounds for iPad, appears to be an extension of a comic book series launched in Italy last November, by publishing house Edizioni Master.


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Prices shown in currencies other than USA Dollars are estimates based on current exchange rates. We will charge your credit card in USA Dollars on the day your order is shipped, and the conversion to your local currency will be done at the prevailing rate by your credit card issuer.
Shipments outside the USA are declared as "bike parts" for customs purposes and will include the actual amount paid for merchandise and shipping. Jenson USA will not mark your parcel as a "gift", declare a value lower than the actual price paid, or otherwise prepare false customs information.
Tell a friend! We'll send your friends the page and your message.
Note: You and your friend's email addresses are only used once as a referral. We will not collect or store the email addresses.
Expand your secondary shift options with the Shimano Di2 SM-EW90 Junction Box. The junction box mounts directly below the handlebar, making wiring up a set of secondary shifters easy and making it all possible with minimal cabling. Available in a 3 or 5 port version, the SM-EW90 is the gateway to the ultimate Di2 expansion.
Reviewed by 1 customer
Best Uses
Comments about Shimano Di2 SM-EW90 Junction Box A:
Super easy to attach to stem. Except if you're super drunk. I hurt my finger. The next morning I attached it with ease.
Jenson USA ships worldwide, including APO/FPO addresses. For a quote, simply add the items you are interested in to your shopping cart and look for the "Shipping Options" box. You don't have to login or create an account to see shipping charges.
Some manufacturers restrict where we can ship their products. If this item has shipping restrictions, they are listed below. If you'd like to buy an item that we cannot ship to your preferred address, we can accept your foreign credit card and ship to a USA address for you.
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Get free Standard Shipping with your $50 purchase today! Just choose Standard Shipping during checkout.
Please note this offer is only available to physical shipping addresses in the 48 continental United States (no PO Boxes), and oversize charges still apply on some heavy/large items.


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NFC TagInfo
500,000 - 1,000,000 downloadsAdd this app to your lists
+ By NFC Research Lab
Have you ever wondered if you unknowingly carry RFID or NFC-enabled cards in your wallet? Use NFC TagInfo with your NFC-enabled Android device to find them and to check what information they carry.
The NFC TagInfo application reads meta information and data from contactless RFID and NFC transponders. It is an ideal tool for anyone who is curious about the information stored on their Near Field Communication tags.
The analysis tool is a must-have for NFC application developers on the Android platform. NFC TagInfo demonstrates the tag-reading capabilities of the Android API. Developers may use this tool to inspect and verify the information on their NFC and RFID tags.
Main features:
* Read & visualize basic meta information on the tag
* Read & visualize NDEF message data
* Read & visualize raw data (in hexadecimal, ASCII and UTF-8 text encoding)
* Read & visualize access conditions
* Read & visualize electronic passport (eMRTD)
* Save tag information to files
Supported NDEF records:
* Text Record
* URI Record
* Smartposter Record
* Generic Control Record
* Signature Record
* NFC Geo Record
* Android Application Record
* other records (basic support)
Supported tags for reading raw data and access conditions:
* NFC Forum Type 1
* NFC Forum Type 2 / MIFARE Ultralight (EV1) / NTAG
* NFC Forum Type 3 / FeliCa Lite
* my-d(TM) NFC / my-d(TM) move
* MIFARE Classic
* MIFARE DESFire
* MIFARE DESFire EV1
* FeliCa
* ISO/IEC 15693 (only limited support)
* NFC Barcode
Additional MIFARE Classic support:
* View MIFARE application directory
* View value blocks
* Try authentication with typical authentication keys
* You can setup your own authentication keys
* In advanced mode: support for individual authentication keys per sector
* In advanced mode: load & save keyset as XML-file
Additional MIFARE DESFire support:
* Display data from Clipper cards
* Display data from NORTIC cards
* Display data from ORCA cards
ISO/IEC 14443 + ISO/IEC 7816-4 support:
* Detect ePassport application
ePassport support:
* View basic identity card data
* View photo (JPEG2000 support using PassportImageDecoder service)
* View raw data files
* Tested with Austrian/Belgian/Dutch/UK/US passports
* Certain passports (e.g. US passport booklet) can only be read while they are opened
* In advanced mode: load & save keyset as XML-file
While we test our app prior to releases, there might still be some errors that cause unexpected behavior and functional interruptions. If you happen to find such misbehavior please help us by providing a so-called "crash report". You can also file bug reports or feature requests using our issue tracker: http://issues.mroland.at/
Privacy Policy
* NFC TagInfo does not store data retrieved from tags on persistent memory without explicit user consent.
* NFC TagInfo does not transmit data retrieved from tags across the Internet.
Tags: nfc taginfo apk, nfc taginfo, taginfo.apk, taginfo apk, nfc tag info apk, nfc taginfo.apk, nfc tag apk, nfc apk, atm nfc, nfc research lab.
* Support for NXP NTAG 213/215/216 tags
* Limited support for NXP NTAG I2C
* Improved support for Thinfilm/Kovio NFC Barcode tags (if platform supports them)
* Improved support and major bug-fixes for reading NXP MIFARE Ultralight EV1 and NTAG tags
* Improved support for reading NXP MIFARE Ultralight C tags
* Improved support and major bug-fixes for reading electronic passports (eMRTD)
* Major bug-fixes and stability improvements
Some lists where this application appears: Nexus S.
(48 stars)
Does what it says on the tin. Ideal for developers
(48 stars)
Hey! Thanks a lot for developing this wonder. It works perfectly with my venezuelan passport :)
(48 stars)
Good app but I can't get into settings as there is no physical button on the phone and nothing on the screen
(48 stars)
Does its job.
(48 stars)
This app will scan a passport issued in 2008, but not one issued in 2014.
(48 stars)
This is a really useful app, and well worth having for anyone working with NFC chips. There's a trick to reading UK passports: place the passport on a table with the front cover facing down and the spine to the left (you should be looking at the back cover). Place your phone on the back cover, with the top of the phone (the speaker) centred along the bottom edge of the passport. Wait a minute or
(48 stars)
On Note 3 and kills NFC functionality completely till device is restarted.


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The Southern Pine Beetle in New Jersey
Tuesday, December 03, 2013
The New Jersey Pinelands are under attack from the southern pine beetle, as warmer temperatures (particularly in winter) have allowed the insect to spread northward. Aaron Weed, postdoctoral researcher at Dartmouth, is the lead author of a paper on the effects of climate change on North American forests and has looked at the southern pine beetle's presence in New Jersey. He explains the beetle's spread and what it tells us about dangers to forests in the region.
- Consequences of climate change for biotic disturbances in North American forests (Ecological Monographs)
Guests:Aaron Weed
Comments [3]
Sounds flimsy
What about harvesting beetle pheromones and using them against themselves such as verbenone? Release this on the trees and it works as a "no-vacancy" sign for the beetles. This was done already by David Wood from Berkeley and Robert Silverstein at the Stanford Research Institute. See: http://discovermagazine.com/2012/jul-aug/06-pheromone-save-pine-forests-oblivion#.Up4PhnWJDb4
pls ask where they first originated. Asia? US?
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Max Reed
Brass & Wax Cord Necklace
$ 25 Gilt
$ 75
Belts, bags, sunglasses, and more ways to punch up your look without breaking the bank.
Leather and beaded accessories to liven up a simple shirt and tie.
Complete your look with accessories from Miansai, Max Reed, Ransoun, and more.
End the weekend on a high note with a great deal on pieces from some of your favorite designers, including 7 for All Mankind, John Varvatos, and Gant, among others. You'll find everything here from watches and shades to sportcoats and cufflinks. It's the kind of selection you'll want to tell your friends about — but only after you've made your picks.


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Our Amenities
Resistance Machines
Our resistance machines help build muscle by making them work harder to overcome resistance. It's a workout you can't resist!
Cycle Studio
Compete against your friends or push yourself to the limit in our group cycle studio!
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Get centered, get flexible, get going in our yoga/Pilates studio.
Pro Shop
Check out our Gold's Gym Pro Shop for the latest and greatest fitness products, including Gold's Gear and other gym bag essentials.


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Medical Clinic
In conjunction with the Salt Lake Regional Medical Center, Solitude's Ski Patrol operates a medical clinic on the lower level of the Last Chance Mining Camp. Drop by if you are experiencing symptoms of a cold, altitude sickness, sunburn, frostbite or any other ailment or injury that could disrupt your vacation. The Solitude Clinic accepts most medical insurance policies.
Hours of Operation9:00 AM – 5:00 PM/7 days a week (ski season only).
Phone: 435.776.7522


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- Price: $65.00
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Virtu Business Flash Template 35031
XML Flash CS3 Site HTML 5 Template that was composed by our webmaster artist Pearl. It is also available as Facebook Template 35721.
Sources, Software & Requirements
Virtu Business Flash Template 35031 has a width of 1202 pixels and is available in the following sources: .SWF, .HTML, .PSD, .FLA, and .XML. Software required includes Winzip 9+ (Windows) or Stuffit Expander 10+ (Mac) for uncompressing .zip files, Adobe Dreamweaver 8+, Adobe Photoshop CS+, and Adobe Flash CS3. It has had a total of total of 4 downloads since it first appeared.


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an association of francophone West African countries' central medical stores
Africa Child Survival Initiative—Combating Childhood Communicable Diseases Project
artemisinin combination therapy
Asian Collaborative Training Network for Malaria
artesunate plus mefloquine
Amazon Malaria Initiative
adaptable program loans
area under the curve
Burden of Malaria in Africa
Bacillus sphaericus
Bacillus thuringiensis subsp. israelensis
Churches Health Association of Zambia
cost, insurance, freight
Commission on Macroeconomics and Health
Central Medical Stores (Cambodia)
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Saving Lives, Buying Time: Economics of Malaria Drugs in an Age of Resistance Acronyms and Abbreviations ACAME an association of francophone West African countries' central medical stores ACSI-CCCD Africa Child Survival Initiative—Combating Childhood Communicable Diseases Project ACT artemisinin combination therapy ACTMalaria Asian Collaborative Training Network for Malaria AL artemether-lumefantrine A+M artesunate plus mefloquine AMI Amazon Malaria Initiative APLs adaptable program loans AQ amodiaquine AS artesunate ATM artemether ATS artemisinin AUC area under the curve BOMA Burden of Malaria in Africa Bsph Bacillus sphaericus Bti Bacillus thuringiensis subsp. israelensis CHAZ Churches Health Association of Zambia CIF cost, insurance, freight CMH Commission on Macroeconomics and Health CMS Central Medical Stores (Cambodia)
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Saving Lives, Buying Time: Economics of Malaria Drugs in an Age of Resistance CNM National Malaria Center (Cambodia) CNS central nervous system COMESA Common Market for Eastern & Southern Africa CQ chloroquine CRHCS East and Southern Africa Commonwealth Regional Health Community Secretariat CRPF chloroquine-resistant Plasmodium falciparum CRPV chloroquine-resistant Plasmodium vivax CSA chondroitin sulphate A DALY disability-adjusted life-year DDT dichloro-diphenyl-trichloroethane DDU duty delivery unpaid DEET N,N-diethyl-m toluamide (an insect repellant) DFWP duty-free wholesaler price DHA dihydroartemisinin DHFR dihydrofolate reductase-thymidilate synthase DHPS dihydropteroate synthase DNA deoxyribonucleic acid DNDi Drugs for Neglected Diseases Initiative DOTS directly-observed therapy, short course (refers to treatment for tuberculosis) DSS Demographic Surveillance Site (or System) EANMAT East African Network for Monitoring Antimalarial Treatments ECG electrocardiogram EDB Essential Drugs Bureau (Cambodia) EIR entomologic inoculation rate EMVI European Malaria Vaccine Initiative EPI Expanded Programme on Immunization G6PD glucose-6-phosphate dehydrogenase G8 Group of Eight [leading industrialized countries] GAVI Global Alliance for Vaccines and Immunization GDF TB Global Drug Facility GDP gross domestic product GFATM Global Fund to Fight AIDS, Tuberculosis, and Malaria GMR a private South African company that manages medical stores GNI gross national income GSK GlaxoSmithKline
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Saving Lives, Buying Time: Economics of Malaria Drugs in an Age of Resistance HIPC highly indebted poor countries HIV human immunodeficiency virus HMS hyperreactive malarial splenomegaly HRP-2 histidine-rich protein 2 IDA International Development Association IFPMA International Federation of Pharmaceutical Manufacturers Association IMCI Integrated Management of Childhood Illness INN International Nonproprietary Name IOM Institute of Medicine (of The National Academies) IPT intermittent preventive treatment IPTc intermittent preventive treatment in children IPTi intermittent preventive treatment in infants IPTp intermittent preventive treatment in pregnant women IRS indoor residual spraying ITC insecticide-treated curtain ITN insecticide-treated (bed) net kdr knock down resistance LICUS low income countries under stress MARA Mapping Malaria Risk in Africa MDA mass drug administration MDGs Millennium Development Goals MDR multidrug resistance MEWS malaria early warning system MIC minimum inhibitory concentration MIM Multilateral Initiative on Malaria MMSS Malaria Medicines and Supplies Service MMV Medicines for Malaria Venture MoH Ministry of Health MPC minimum parasiticidal concentration MQ mefloquine MSH Management Sciences for Health MSL Medical Stores Ltd. MSP-1 merozoite surface protein-1 MTCT maternal to child transmission MVI Malaria Vaccine Initiative NGO nongovernmental organization NIH National Institutes of Health (U.S.)
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Saving Lives, Buying Time: Economics of Malaria Drugs in an Age of Resistance OTC over-the-counter PAHO Pan American Health Organization PATH Program for Appropriate Technology in Health PCR polymerase chain reaction PF parasitologic failure Pfcrt Plasmodium falciparum chloroquine resistance transporter gene Pfdhfr dihydrofolate reductase gene Pfdhps dihydropteroate synthase gene PfEMP-1 P. falciparum erythrocyte membrane protein-1 Pfmdr Plasmodium falciparum multidrug resistance gene Pgh1 P-glycoprotein homologue pLDH parasite enzyme lactate dehydrogenase PNA Pharmacie Nationale d'Approvisionnement PQ piperaquine PRA Pharmacie Regionale d'Approvisionnement PRSCs poverty reduction support credits PRSP poverty reduction strategy paper QBC quantitative buffy coat test R&D research and development RACTAP Réseau d'Afrique Centrale des Thérapeutiques Antipaludiques (Central African network) RBC red blood cell RBM Roll Back Malaria RDT rapid diagnostic test RNA ribonucleic acid RTS,S a recombinant protein vaccine which pairs hepatitis B surface antigen with DNA encoding a large portion of P. falciparum circumsporozoite protein SACs structural adjustment credits SADCC Southern African Development Coordination Conference SALs structural adjusted loans SEACAT South East African Combination Antimalarial Therapy [Evaluation] SIT sterile insect technology SP sulfadoxine/pyrimethamine SWAp sector-wide approach
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Saving Lives, Buying Time: Economics of Malaria Drugs in an Age of Resistance T 1/2 half-life TB tuberculosis TDR the UNDP/World Bank/WHO Special Programme for Research and Training in Tropical Diseases TEHIP Tanzania Essential Health Interventions Project TNF-alpha tumor necrosis factor alpha TTF therapeutic treatment failure UNICEF United Nations Children's Fund UNDP United Nations Development Programme USAID U. S. Agency for International Development USAMRMC United States Army Medical Research and Materiel Command VA verbal autopsy VAT value added tax VLSS Vietnam Living Standards Surveys WANMAT West African Networks for Monitoring Antimalarial Treatments WHO World Health Organization WHOPES WHO Pesticide Evaluation Scheme WRAIR Walter Reed Army Institute of Research ZK Zambia Kwacha (currency)


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SPOKANE - Wa-Hi was up 1-0 and Marysville-Pilchuck had the bases loaded in the bottom of the seventh in the 4A title game Saturday in Spokane.
With Alyson Ambler struggling in the circle, all breath was held as she pitched M-P's Riley Fritz a ball and two strikes.
Ambler had walked four on the day and hit a pitcher en route to the bases-loaded situation.
But the junior Big Nine Most Valuable Player dug deep and held on - and struck out Fritz to support her own solo home run in the fourth inning to give the Blue Devils their first 4A softball championship.
It's also the first for any team in the Big Nine.
And with the final strike thrown, Ambler was enveloped in a wave of blue.
"I knew it would come down tight," Ambler said. "The teams here are always good. We tried to emphasize squeeze plays in practice … Everybody was sitting on their tippy-toes. I just wanted to get the out. That (stress) is not a feeling I love, but I love the game."
Ambler was frustrated by the home plate ump throughout, and never got the hang of his strike zone.
"The ump was definitely not my friend all day," Ambler said after the win. "I still don't know his strike zone."
But she stayed cool, venting her frustration at-bat - with a solo homer, her second of the day and third in the tournament, in the fourth inning.
"I knew I had to stay calm because if I started freaking out, then my infielders would freak out," she said of the last few tense minutes in the circle. "If that happened, we'd start having accidents. So I stayed calm."
So did Hope Klicker, Ambler's counterpart in the circle.
Klicker pitched the 1-0 first-game win over Skyview and was at first base while Ambler took control of the mound.
"I was thinking, 'Come on, Alyson, you've got it, you've got it,'" a very relieved and teary-eyed Klicker said. "And she did it."
Coach Jerry Humphreys knows his team deserves it.
"There was a lot of pressure on us," Humphreys said. "We worked all year to prepare ourselves for situations like that, and I thought the kids did a great job to squeeze this one out. It's a monster win for Alyson."
The Blue Devils outscored four opponents 17-0 in four weekend games - the first team to shut all opponents down in any recent memory, said one Washington Interscholastic Activities Association event organizer.
"We didn't come in with that as our goal," said Ambler of the blanket shutout. "We wanted to win state."
Marysville-Pilchuck managed to scare the Blue Devils.
The Tomahawks' Sacha Clow led off with a walk, while Ambler struggled.
Haley Fritz then hit an infield bunt, which Klicker read to out Fritz. Klicker threw it back Libbie Jimenez, who ran from second to first, to send Clow back to the bench with the second out, while the third batter hit an infield fly to close the inning.
Riley Fritz singled to open the second, while Ambler sat the next two batters down. A Jessica Christensen sacrifice was mishandled by the Blue Devils infield, allowing her to first and moving R. Fritz to second, then third, with two outs. Ambler walked the next batter to load the bases.
But the final M-P batter of the inning - with three balls and two strikes - hit an infield fly to first to end the threat.
The Blue Devils, meanwhile, didn't make it closer than first in the first three innings, until Ambler's own solo shot to open the fourth and all scoring.
By the bottom of the seventh, Wa-Hi - the visiting team for its first game all weekend due to coin toss - had failed to add an insurance run, despite a Janelle Hartford double in the fifth.
In the bottom of the seventh, three outs between Wa-Hi and school history, M-P's Monica Clow had two strikes but was struck by Ambler on the third pitch to walk to first. Zachary singled, and S. Clow hit a fielder's choice to out M. Clow, putting runners on first and second.
Haley Fritz then hit a short bunt, but Ambler raced forward to tag out Zachary on her way home for the second out and putting runners on first and third.
Ambler then walked Megan Rollins to load the bases.
The pitcher stuck with the plan of staying cool, sitting down final M-P batter R. Fritz with one ball and three strikes and the historic win.
"We pitched some great games," Klicker said of the weekend, which saw the pitching pair combined for 35 strikeouts in the four games. "This wasn't Alyson's best game, but she kept it and got the win."
Ambler had five strikeouts in the championship win, while Klicker had nine in the morning's victory.
Kendsey Hill caught for both aces.
"It was a blur," the sophomore said of the seconds after the final out. "After the last out, it went crazy, then, really, it went black, and the next thing I knew I was on the ground. I was just thinking, 'I can't let anything get by me. If I do …'"
If she did, the very least M-P could do was bring home a tying run, if not the winner.
"I knew Al would get it done," Hill said. "I had confidence in her. I'm really proud of how we all worked together and got things done when we needed to."
Wa-Hi picked up its only loss of the season to Richland during regular-season play. The Bombers were the only other Eastern team in the tournament, and won one and lost two games Friday to head home.
Bomber friends were texting the Blue Devils, asking them to keep the hardware in Eastern Washington, Ambler said.
"They wanted to make sure it stayed here," she said.
Now, the Wa-Hi name is on the trophy.
The win gives seniors Klicker, Savanah Scarborough and Ashley Bezdicek a happy end to their Blue Devils careers.
The team was sixth at state in 2007 and didn't make it in 2008. They were third outright in 2009 and in a six-way tie for third in the rain-shortened 2010 tournament.
"There's no better way for the seniors to end the season than a win at the end of the year," Humphreys said.
His seniors know it.
"I'm speechless," Klicker said, amid well-wishers and hugs. "It's all I've dreamed of since I started high school softball - to win state and feel the power of winning and my team, and knowing this is the best team in Wa-Hi history. It's amazing."
Klicker will continue her softball career at NCAA DI College of Charleston, where she'll play first base.
Teammates Scarborough and Bezdicek were also emotional at the tension-filled end.
"This is what we've been working for since forever," said third basemen Bezdicek. "This is for all of Walla Walla. It's great to bring something back."
And Scarborough is looking forward to class Tuesday.
"It's what we'll all be talking about at school," she said. "We've been working our butts off for so long."
The pride and elation at the win will follow the Blue Devils home.
"This means the world to us and the town of Walla Walla," said junior shortstop Andrea Hamada. "This is a great feeling for everybody. There's so much spirit and we wouldn't be here if it weren't for our parents and fans, who are really the ones who put so much time and money into this. We're playing for all of them."
4A State Championship Game
Wa-Hi 1, Marysville-Pilchuck 0
Wa-Hi 000 100 0 - 1 3 2
Ambler and Hill; R. Fritz, M. Clow and Christensen.
HR - Wa-Hi 1: Ambler.
Hits - Wa-Hi: Ambler, Hartford, Klicker. M-P: R. Fritz, H. Fritz 2, Zachary.
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I'm convinced that all good teams share some common North Star. That collectively, everyone on a team, whether it's a 2-person team or a 2,000-person team should know why the team exists today; it's Mission. I also think there are two more stars in the constellation. The first is where is the team is going over the next 2 – 3 years; it's Vision. And the last is how the team operates each day; it's Operating Principles.
It never surprises me when I compare a high performing team to a low performing one, the high performing team has almost always taken some time to define and collectively understand it's Mission, Vision, and Operating Principles and the low performing team hasn't done so.
Your thoughts?
I agree 100 on this. I live in the SMB world, and SMB's that succeed have defined all 3 of these "stars" and those that fail often have not.


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|College Football: Minnesota at Michigan Preview and Picks
|Written by Anthony Rome
|Wednesday, 24 October 2007 05:09
Little brown jug at stake
Michigan could view Saturday's home game against Big Ten bottom-dweller Minnesota as a tuneup before the season's stretch run.
The 19th-ranked Wolverines (6-2, 4-0), however, have already learned the difficult lesson of what can happen to teams that look ahead in their schedule.
Oddsmakers from Bodog.com have made Michigan -23.5 point spread favorites (View College Football odds) for Saturday's game (Game Matchup). Current public betting information shows that 55% of bets for this game have been placed on Michigan -23.5 (View College Football bet percentages).
Michigan opened the season with a shocking loss to the Football Championship Subdivision's Appalachian State, followed by a defeat to Oregon - both coming at home. The Wolverines, who were ranked No. 5 in the preseason, stayed out of the top 25 until last week.
They have now won six straight, including a 27-17 victory over Illinois last Saturday in which they overcame an early 14-3 deficit.
While Michigan has been able to overcome its frustrating start, injuries could pose a big concern during a final stretch of the season which includes road games against Michigan State and Wisconsin, as well as a season-ending matchup against top-ranked Ohio State in Ann Arbor.
Starting quarterback Chad Henne and top running back Mike Hart are both questionable due to injuries heading into this weekend's game against the Golden Gophers (1-7, 0-4).
Hart missed last Saturday's win with a right ankle injury suffered the previous week in a win over Purdue. Henne, who hurt his hand during the first quarter of the Illinois contest, left the game twice before returning during the final quarter.
Freshman quarterback Ryan Mallett and sophomore backup running back Carlos Brown should be ready if needed by coach Lloyd Carr, who uses the phrase "the expectation is for the position" to motivate his players to step up when needed.
"It speaks to the issue that every guy's responsible for preparing and developing himself," Carr said. "You're always trying to sell that idea because on any football team, you're going to have guys that are second team, third team and guys that are not on the depth chart.
"That to me is one of the ways you give hope to a player because what you're trying to tell him as a coach is, 'You're going to get an opportunity here.'"
Brown took advantage of his opportunity last week starting in place of Hart, who ranks third in the country with 154.0 rushing yards per game. Brown set career highs with 25 carries and 113 rushing yards.
Mallett, on the other hand, struggled in relief of Henne, going 2-for-6 for 16 yards with an interception.
"He's like most freshmen," Carr said of Mallett. "He has made some progress, and he's got a lot of things that he needs to improve on."
If Henne is able to play, he will look to break John Navarre's career passing yards record at Michigan. Henne needs 219 yards to tie Navarre, and could have a good chance at doing so against a Gophers team that has the nation's worst defense.
Minnesota has lost six straight, including an embarrassing 27-21 defeat to FCS school North Dakota State on Saturday. The Gophers allowed 394 yards on the ground as they were officially eliminated from bowl consideration for the first time since 2001.
"We have to get better, without question, and we'll do that," first-year coach Tim Brewster said. "We're recruiting very hard."
Minnesota has also had to deal with a variety of injuries, including the latest to Jay Thomas, who became the third tailback to go down this season after he hurt his knee Saturday.
Five starting defensive players are also injured, further hampering a unit allowing 533.3 yards per game.
"When you win, the hurts don't hurt as much," Golden Gophers quarterback Adam Weber said. "When you start losing, they come one after another."
Michigan has won 26 of the last 28 meetings against Minnesota. The Gophers' two wins in that span have both come in Ann Arbor, though, including a 23-20 victory in 2005 - their last trip there.
by: Staff Writers - Email Us
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