text:
May 11, 2006
Verizon and other telecom companies are looking to sell portions of their vast network of phone lines as more consumers disconnect their landlines. Janet Babin reports.
Gaming gets back to kid stuff
May 11, 2006
Video game makers and players are in LA this week for the Electronic Entertainment Expo. One thing you won't find this year — scantily clad women. There's a reason for it, Ethan Lindsey reports.
Recouping virtual hotel taxes
May 11, 2006
If you're getting ready to book your summer vacation online, consider this: Those online travel agencies aren't paying all their taxes. Lisa Napoli reports.
Auctioning TV ad buys
May 10, 2006
Internet auctions have delivered good business for eBay. So could a similar online system be used to buy and sell TV advertising? Some Fortune 500 executives think so. Jeff Tyler explains.
eBay meets TV advertising
May 10, 2006
Efforts are underway to replace the age-old "upfront market" for TV advertising with an eBay-inspired system in which marketers would bid online to place ads on different networks and time slots. Jeff Tyler reports.
AOL lays off call center workers
May 10, 2006
Looks like Web surfers don't need the hand-holding they used to. AOL announced Tuesday it was laying off 7% of its workforce, largely because help requests at its call centers have declined. Alex Cohen has more.
WB makes BitTorrent deal for movie downloads
May 9, 2006
Warner Bros. will become the first major studio to distribute its films and TV shows over the Internet using peer-to-peer technology developed by BitTorrent. Until now, the program has been a popular tool for trading pirated files. Janet Babin reports.
At E3, what's new is old
May 9, 2006
When the new games roll out at E3 this week, many will remind hardcore gamers of one very successful older game: Grand Theft Auto. It was based on the movie Scarface, which itself is being made into a game. Ethan Lindsey reports.
Yahoo targets Google too
May 9, 2006
Microsoft launched a paid search platform last week. Monday Yahoo unveiled its new paid search service. Are these efforts enough to challenge Google? Steve Tripoli has more.
High-end computer maker hits bottom
May 8, 2006
Silicon Graphics filed for Chapter 11 bankruptcy today. Its super-fast computers were once used to make special effects for blockbuster movies, but the increasing power of cheaper computers has put a crimp on sales. Jeff Tyler explains.


text:
On the occasion of Shiv Jayanti procession to be carried in different parts of the city on Wednesday, the city traffic police have diverted traffic on major roads. The roads will be closed for vehicular traffic between 10 am and 6 pm.
The traffic police have appealed to citizens to avoid the road leading to Bhavani Mata Mandir, Ramoshi Gate, Quarter Gate, AD Camp Chowk, Laxmi Road, Sonya Maruti Chowk, Sonya Maruti Chowk, Phadke Haud Chowk, Lal Mahal.
The alternative routes are Rasta Peth, Kasewadi Road, Nana Peth, Appa Balwant Chowk. In Pune Cantonment Area, the procession will begin from 8.30 am from Azam Campus via Golden Silver Jubilee Petrol Pump. Later at 10.22 am, another procession from Lal Mahal will lead to Shivajinagar. The third procession will take place at 4 pm and begin from Bhawani Mata Mandir and end at Shivajinagar.

subset: commoncrawl


text:
Wee & Wingabago Wanderings
View Single Post
Adventurer Anonymous
Joined: Sep 2009
Location: Wooster,OH
Oddometer: 1,050
July 28
Lunch @ Bearpen Gap, Craggy Gardens,
uh-oh Yogi the Rangers not gonna like this
There is a turn off for Stony Fork on the drive up to the picnic area nice gravel road and it beats hanging with the Sarurday afternoon crowd on the BRP. This little private owned mill is near the bottom outside of Dillingham,NC.
I found Forest Road 74 that heads up Walker Mountain and deadends at the trail to the waterfalls. Several nice waterfalls on the switchbacks on the way up.
Huge butterflies
The hike to the falls is 20-30 minutes, moderately strenuous and it had just rained so it was slick in spots.
I guess the falls to be around 90 foot or so.
Came back down the mountain headed N on Dillingfham Rd back across 197 and the skies were again threatening.
Hung out at the Burnsville library and downloaded some FB. Neat little square where the library sits with a playhouse and the Yancy County Music Museum. Shoulda taken some pics. The Lovely Rea and I will check it out next time we go down. My solo trips are justified as scouting trips for things we like to do together.
Trying not to be a dick.
Wee & Wingabago Wanderings
View Public Profile
Find More Posts by steveb126


text:
- Shopping Bag ( 0 items )
Design scenarios for more...
Design scenarios for more than twenty different spaces illustrate real-world case studies for illuminating residential and commercial spaces, from kitchens to doctors' offices. Each scenario includes an in-depth rationale for the proposed solution, insightful lighting distribution diagrams, floor plans, and details for lighting installation and construction. In addition, exercises allow you to develop lighting design skills in preparation for working on actual projects, as well as the NCIDQ and NCARB exams.
Packed with informative illustrations, Lighting Design Basics is an invaluable resource for students, as well as interior designers and architects studying for professional licensing exams.
Chapter 1. Introduction: How to Use This Book.
Chapter 2. Light Sources.
Chapter 3. Luminaires.
Chapter 4. Switching and Dimming.
Chapter 5. Daylighting.
Chapter 6. Lighting Calculations.
Chapter 7. Documenting Lighting Design.
Chapter 8. Lighting Concepts: The Layers Approach.
Chapter 9. A Basic Approach to Lighting Design.
Chapter 10. Residential Lighting Design.
Chapter 11. Office and Corporate Lighting Design.
Chapter 12. Hospitality Lighting Design.
Chapter 13. Health Care/Institutional Lighting Design.
Chapter 14. Lighting for Stores.
Chapter 15. Lighting Common Spaces.
Chapter 16. The Professional Process of Lighting.
Chapter 17. Collaborating with Lighting Designers.
Chapter 18. Computers and Lighting Design.
Chapter 19. Developing Skills Beyond the Basics.
Appendix A. Educational Programs in Lighting.
Appendix B. Energy Codes.
Posted March 14, 2005
While the book does contain some technical information, such as calculations for determining the illumination (amount of light) X ft away from a specific source, the book contains only the most general text relating to lighting situations, such as classrooms, conference rooms, hallways, etc. At $43 and under 200 pages the asking price doesn't seem to represent a high value to me. Try the public library first to see what information is out there, then buy a copy of something you see there or check the bibliography of a book for hints to titles and sources.Was this review helpful? Yes NoThank you for your feedback. Report this reviewThank you, this review has been flagged.
Posted March 3, 2010
No text was provided for this review.
Posted July 14, 2010
No text was provided for this review.


text:
Current Filters
HPI Racing mounts are 10mm thick (stock is 8mm) for extra strength. And, heatsink fins are machined into the mounts to quickly dissipate heat for longer run time and longer motor life. Each mount is precision machined from aluminum to exact HPI specifications for a perfect fit. Mounting hardware and thread lock are included.


text:
UK weather forecast
- Recent locations
UK forecast map
Latest forecasts
|Fort William
|Light rain
|Heavy rain
|Heavy rain
|Light rain
|Light rain
|Newtown (Powys)
|Heavy rain
|Light shower night
|Light rain
Forecast summary
UK forecast for the next 5 days
Rain spreading from the southwest to most areas overnight.
This Evening and Tonight:
Cloud and rain, already affecting Wales and SW England will move northeast through this evening and overnight to reach all but Northern and Eastern Scotland by dawn. Winds will strengthen across England and Wales.
Rain clearing to sunny spells by afternoon across all but the far north-east. However, it will be breezy with blustery showers in many places, some heavy. Gales in NW.
Outlook for Monday to Wednesday:
Bright with a few showers at first on Monday but turning wet and windy later. Very windy with sunshine and showers on Tuesday. Drier and feeling warmer on Wednesday.
Updated at: 1634 on Sat 30 May 2015
Outlook for the UK over the next 6-30 days
UK Outlook for Thursday 4 Jun 2015 to Saturday 13 Jun 2015:
Mostly fine and dry on Thursday and Friday with long periods of sunshine for most of the UK and temperatures warmer than of late. A few light showers are possible in the far north, and later some heavy and thundery showers may develop across southern parts. A similar story into the weekend with some very warm conditions developing but equally the risk of thunderstorms in the south. Despite the warmer weather, a brisk wind is likely in the south and far north at times. Into the second week of June, it looks set to remain mostly dry and warm across the north of the UK. It also remains very warm across the south, but with a continuing chance of heavy, thundery showers.
UK Outlook for Sunday 14 Jun 2015 to Sunday 28 Jun 2015:
High pressure looks as though it will be established across the north of the UK during much of this period. This will bring fine and dry conditions to most parts with warm conditions across the north, and especially the northwest. It is also expected to be very warm in the south, although here there is a risk of some heavy and thundery showers spreading up from continental Europe. Confidence in the forecast evolution declines towards the end of June; however, the general trend looks set to remain similar, with drier conditions in the north, some showers possible in the south, and generally warm temperatures.
Updated at: 1213 on Sat 30 May 2015
Change location
To view a specific weather location, enter a name (this could be a village, town or city) into the search box and select the appropriate location from the list provided. You can also search for world forecast locations.
For web browsers that have geolocation capabilities, you can also use the 'find my location' button to automatically find your location. Find out more in the UK forecast guide.


text:
S. Korea decorates Psy for 'Gangnam Style' success
SEOUL – South Korea has awarded one of its highest cultural honors to the rapper Psy for taking the world by storm with his "Gangnam Style" hit.
The culture ministry announced Tuesday that the 34-year-old singer, whose real name is Park Jae-Sang, would receive the Okgwan Order of Cultural Merit, awarded for "outstanding meritorious services" to the arts.
"Psy has been chosen to be decorated for not only being a long-term artist, but also for advertising Gangnam widely and increasing the world's interest in Korea," a culture ministry official told AFP.
Psy has rocketed to international fame since his "Gangnam Style" video — in which he performs his now famous horse-riding dance — went viral after being posted on YouTube in July.
"Gangnam Style", which is a tribute to an upmarket neighborhood in Seoul, has since racked up more than 654 million views, making it the second most-watched YouTube video of all time, behind Canadian teenage heartthrob Justin Bieber's "Baby", on 796 million.
The song has topped charts from Britain to Australia, and has occupied the number two slot on the US Billboard Hot 100 for six straight weeks.
South Korea sees popular culture as a potent export force providing international exposure for a country that still feels overlooked in comparison to neighbours China and Japan.
The government has spent substantial time and money supporting the so-called Hallyu (Korean Wave) of TV shows and pop music that has swept across Asia in the past decade.
Film director Kim Ki-Duk, who won the Golden Lion at the Venice Film Festival this year with his movie Pieta, will receive the Eungwan Order of Cultural Merit — which ranks higher than Psy's medal.
Get Inquirer updates while on the go, add us on these apps:
Disclaimer: The comments uploaded on this site do not necessarily represent or reflect the views of management and owner of INQUIRER.net. We reserve the right to exclude comments that we deem to be inconsistent with our editorial standards.
To subscribe to the Philippine Daily Inquirer newspaper in the Philippines, call +63 2 896-6000 for Metro Manila and Metro Cebu or email your subscription request here.
Factual errors? Contact the Philippine Daily Inquirer's day desk. Believe this article violates journalistic ethics? Contact the Inquirer's Reader's Advocate. Or write The Readers' Advocate:
c/o Philippine Daily Inquirer Chino Roces Avenue corner Yague and Mascardo Streets, Makati City,Metro Manila, Philippines Or fax nos. +63 2 8974793 to 94


text:
A method of imaging a pattern in a microlithographic exposure apparatus includes performing two exposures, each with a different mask, the superposition of the images defined by the two masks produces the complete circuit pattern. A dipolar illumination mode is used for each exposure, the dipoles of the two exposures being mutually perpendicular. The dipolar illumination mode of the first exposure is used to image mask features parallel to a first direction, and the dipolar illumination mode of the second exposure is used to image mask features perpendicular to the first direction.
1. A method of imaging a patterned structure onto a substrate provided with a layer of energy-sensitive material, comprising:
performing a first exposure to image a first pattern;
performing a second exposure to image a second pattern,
wherein at least one of said first and second exposures is performed using an illumination mode having a substantially dipolar intensity distribution, and wherein at least one of said patterns which is imaged using the illumination mode having a substantially dipolar intensity distribution comprises features oriented substantially perpendicular to an axis joining respective two poles of the substantially dipolar intensity distribution.
2. A method according to
3. A method according to
4. A method according to
5. A method according to
6. A method according to
7. A method according to
8. A method according to
9. A method according to
10. A method according to
11. A method according to
12. A method according to
13. A method according to
14. A method according to
15. A method according to
16. A method according to
17. A method according to
18. A device manufacturing method comprising:
providing a substrate which is at least partially covered by a layer of energy-sensitive material;
providing at least one mask for defining a pattern; and
imaging at least part of said mask pattern onto said substrate using a method according to
19. A method of imaging a patterned structure onto a substrate provided with a layer of energy-sensitive material, comprising:
performing an exposure to image a pattern using an illumination mode having a substantially dipolar intensity distribution,
wherein the pattern imaged using the illumination mode having the substantially dipolar intensity distribution comprises features oriented substantially perpendicular to an axis joining respective two poles of the substantially dipolar intensity distribution.
This application claims the benefit of priority to European Patent Application Nos. 99307686.8, filed Sep. 29, 1999, 99203704.4, filed Nov. 7, 1999, and 00200184.0, filed Jan. 18, 2000, the contents of which are herein incorporated by reference.
1. Field of the Invention
The present invention relates to a method and apparatus for microlithographic exposure, and more particularly, to the application of such a method in a lithographic projection apparatus.
2. Discussion of Related Art
For the sake of simplicity, the projection system may hereinafter be referred to as the "lens"; however, this term should be broadly interpreted as encompassing various types of projection system, including refractive optics, reflective optics, and catadioptric systems, for example. The radiation system may also include elements operating according to any of these principles for directing, shaping or controlling the projection beam of radiation, and such elements may also be referred to below, collectively or singularly, as a "lens". In addition, the first and second object tables may be referred to as the "mask table" and the "substrate table", respectively. Further, the lithographic apparatus may be of a type having two or more mask tables and/or two or more substrate tables. In such "multiple stage" devices the additional tables may be used in parallel, or preparatory steps may be carried out on one or more stages while one or more other stages are being used for exposures. Twin stage lithographic apparatuses are described in International Patent Applications WO98/28665 and WO98/40791, incorporated herein by reference.
Lithographic projection apparatuses can be used, for example, in the manufacture of integrated circuits (ICs). In such a case, the mask (reticle) may contain a circuit pattern corresponding to an individual layer of the IC, and this pattern can then be imaged onto a target portion (comprising one or more dies) on a substrate (silicon wafer) which has been coated with a layer of photosensitive material (resist). In general, a single wafer will contain a whole network of adjacent target portions which are successively irradiated through the reticle, one at a time. In one type of lithographic projection apparatus, each target portion is irradiated by exposing the entire reticle pattern onto the target portion in one go; such an apparatus is commonly referred to as a waferstepper. In an alternative apparatus—which is commonly referred to as a step-and-scan apparatus—each target portion is irradiated by progressively scanning the reticle pattern under the projection beam in a given reference direction (the "scanning" direction) while synchronously scanning the wafer table parallel or anti-parallel to this direction; since, in general, the projection system will have a magnification factor M (generally <1), the speed v at which the wafer table is scanned will be a factor M times that at which the reticle table is scanned. More information with regard to lithographic devices as here described can be gleaned from International Patent Application WO97/33205, incorporated herein by reference.
In one form of microlithography, a mask defining features is illuminated with radiation from an effective source having an intensity distribution at a pupil plane corresponding to a particular illumination mode. An image of the illuminated mask is projected onto a resist-coated semiconductor wafer.
Problems with the prior art include that in the semiconductor manufacturing industry there is increasing demand for ever-smaller features and increased density of features. In other words the critical dimensions (CDs) are rapidly decreasing and are becoming very close to the theoretical resolution limit of state-of-the-art exposure tools such as steppers and scanners as described above. One solution to this problem is to upgrade the optics of the machine or indeed replace the entire machine. A second possibility is to use masks which include so-called "assisting features". These are features smaller than the resolution limit of the exposure tool so that they will not print on the wafer, but their presence near features to be imaged produces diffraction effects which can improve contrast and sharpen fine features. A third possibility is to use complementary Phase Shift Masks where the definition of features such as lines and spaces is established by correspondingly phase shifting the electric field amplitude 180 degrees (rather than by correspondingly modulating the amplitude of the electric field as is the case in commonly used binary chromium masks). This has the effect that the energy of the light diffracted at the mask pattern is angularly distributed in such a manner that image contrast and depth of focus are improved for imaging of lines and spaces at resolution limit. However, none of these methods is entirely satisfactory and they can also prove expensive.
It is an object of the present invention to alleviate, at least partially, at least some of the above problems.
Accordingly, the present invention provides a method of imaging a pattern onto a substrate provided with a layer of energy-sensitive material, comprising the steps of:
The method of the invention enables lithography to be performed with reduced feature size and/or improved processing parameters such as exposure latitude, Mask Error Factor (MEF), depth of focus and proximity effects, without having to use improved optics and/or diffraction-assisted masks.
In a manufacturing process using a lithographic projection apparatus according to the invention, a pattern in a mask is imaged onto a substrate which is at least partially covered by a layer of energy-sensitive material (resist). Prior to this imaging step, the substrate may undergo various procedures, such as priming, resist coating and a soft bake. After exposure, the substrate may be subjected to other procedures, such as a post-exposure bake (PEB), development, a hard bake and measurement/inspection of the imaged features. This array of procedures is used as a basis to pattern an individual layer of a device, e.g. an IC. Such a patterned layer may then undergo various processes such as etching, ion-implantation (doping), metallization, oxidation, chemo-mechanical polishing, etc., all intended to finish off an individual layer. If several layers are required, then the whole procedure, or a variant thereof, will have to be repeated for each new layer. Eventually, an array of devices will be present on the substrate (wafer). These devices are then separated from one another by a technique such as dicing or sawing, whence the individual devices can be mounted on a carrier, connected to pins, etc. Further information regarding such processes can be obtained, for example, from the book "Microchip Fabrication: A Practical Guide to Semiconductor Processing", Third Edition, by Peter van Zant, McGraw Hill Publishing Co., 1997, ISBN 0-07-067250-4.
Although specific reference may be made in this text to the use of the method and apparatus according to the invention in the manufacture of ICs, it should be explicitly understood that such an apparatus has many other possible applications. For example, it may be employed in the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, liquid-crystal display panels, thin-film magnetic heads, etc. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the term "reticle", "wafer" or "die" in this text should be considered as being replaced by the more general terms "mask", "substrate" and "target area", respectively.
Embodiments of the invention will now be described, by way of example only, with reference to the accompanying drawings in which:
FIGS. 2(a) to 2(d) illustrate schematically the intensity distributions of different illumination modes;
In the Figures, like reference symbols refer to like parts.
Embodiment 1
In optical lithography it is known to use off-axis illumination, which enables smaller features to be successfully imaged. With this technique, the mask is illuminated at non-perpendicular angles, which in particular improves the process latitude by increasing the depth of focus and/or contrast.
The smaller the pitch of features on the mask 12 the larger the diffraction angle β will be. If the size of the features decreases and/or their density increases too much there will come a point at which the pupil of the projection lens system 16 can no longer capture more than one diffracted order. In a practical system there will be a range of opening angles α which determines the partial coherence of the light source and thus is very important to the figures of merit of the device, such as exposure latitude, depth of focus and proximity effects. The distribution of opening angles a can be visualized by considering the intensity distribution of the radiation source or equivalently the intensity distribution in the plane of the pupil of the projection lens system (and only looking at the zero order diffracted radiation or in the absence of mask features).
FIGS. 2(a)-2(d) show examples of different illumination mode intensity distributions (or pupil filling at the projection lens). The shaded areas indicate regions of significant radiation intensity. The distance from the center of the pupil is related to the angle of incidence α.
FIG. 2(a) illustrates a simple illumination mode characterized by the parameter σ shown by the arrow in the Figure. Values of σ are conventionally quoted as the ratio of the radius of the illumination intensity disc to the radius of the pupil and therefore take a value between 0 and 1.
FIG. 2(b) shows an annular illumination mode in which the intensity distribution of the source is confined to an annulus to limit the range of angles of incidence of the off-axis illumination, it being remembered that the spatial intensity distribution at the pupil plane is related to the angular distribution at the mask plane. The annulus is characterized by the values σi and σo, which are the ratios of its inner and outer radii to the radius of the pupil.
FIG. 2(c) illustrates the intensity distribution of a quadrupole illumination mode, the use of which generally gives superior imaging results to the use of annular or disc modes. Conventionally. in using such a quadrupole configuration, it is assumed that the mask pattern to be projected is comprised of orthogonal lines along x and y axes and the illumination is oriented such that each of the four poles is situated in a respective one of the four quadrants defined by these x and y axes and their point of intersection.
However, it has been found that superior performance can be obtained using dipolar illumination modes and this fact is utilized in the present invention.
FIG. 2(d) shows an example of the illumination intensity distribution for a dipole mode. The two poles of this mode are located off the optical axis of the imaging system. For the following explanation, the two poles illustrated in FIG. 2(d) will be said to lie along the x axis and will be optimal for imaging lines parallel to the y axis, i.e. perpendicular to the axis joining the two poles (sometimes the x and y axes are referred to as horizontal and vertical respectively, but these terms typically do not bear any relation to the orientation of the machine).
A further advantage of dipole illumination is that it provides a depth of focus, when operating close to the resolution limit, that is superior to the depth of focus that can be obtained with quadrupolar illumination. For 1:1 dense lines, the optimum depth of focus is achieved for quadrupolar illumination when:
Close to the resolution limit, the resolvable line width LW, is given by
A preferred embodiment of the method of the invention is to perform two exposures using two respective perpendicular dipole patterns. The first exposure is used to image mask features parallel to a first direction, and the second exposure using the other dipole illumination mode is used to image mask features perpendicular to the first direction.
In one particular embodiment, two distinct masks are used, one for each of the exposures, and the superposition of the images of the two masks produces a single circuit pattern. As well as changing between mutually perpendicular dipolar illumination modes and changing masks between the first and second exposures it is possible to select independently the specific parameters of the dipole illumination mode for each exposure, such as σo and σi and so on, in order to optimize the exposure for the structure sizes parallel and perpendicular to the first direction.
In an alternative embodiment, a single mask is used, but the said mask contains two different sub-patterns; one of these sub-patterns is then used for the first exposure referred to above, whereas the second sub-pattern is used for the second exposure referred to above.
According to the methods described above, two dipolar illumination modes are used for consecutive exposures. However, this does not necessarily have to be the case. Typically, one dipolar illumination mode would be used to image the most critical features of the pattern in one direction and the other exposure could be performed using a quadrupolar, annular or conventional (disc) illumination mode to fill in the remaining structures. The order of the two exposures may, of course, be reversed and indeed more than two exposures could be used to build up the single pattern, provided that one of them uses a dipolar illumination mode.
In its simplest form, for imaging horizontal and vertical lines only, the two masks (or two sub-patterns, in the case of a single mask with 2 sub-patterns) will define only linear features in these directions respectively. However, for more complicated mask designs, software can be used to decompose the pattern into two distinct sub-patterns. Fourier transformation of the mask pattern can be used to highlight the most critical direction, and that exposure can be performed using a dipolar illumination mode.
Embodiment 3
A further embodiment of the present invention is to use a "soft dipole" illumination mode for at least one of the dipole exposures. A soft dipole mode is particularly suited to imaging a pattern which includes some features which are not in the x or y directions; for example, diagonal or curved lines. Some examples of soft dipole illumination modes include a basic dipole intensity distribution as shown in FIG. 2(d) but with a weaker general background illumination across the pupil, or with a weaker central on-axis pole in addition to the two off-axis poles, or it may resemble a quadrupole illumination mode, but with two strong intensity poles and two weaker intensity poles.
Embodiment 4
In a particular embodiment of the invention, at least one of the dipole exposures is performed using polarized electromagnetic radiation. In a specific example, the electromagnetic radiation is linearly polarized, such that its electric field is oriented substantially perpendicular to the axis joining the two (main) poles in the dipole pattern; if that axis is then substantially perpendicular to the mask features being imaged in a particular exposure (as discussed above), the said electric field will be substantially parallel to those features. This can greatly increase the efficiency of the exposure, producing inter alia greatly increased image contrast.
In a specific embodiment, both the first and second exposure are performed using a dipole illumination mode, the features imaged in the first exposure are substantially perpendicular to those imaged in the second exposure, and the axis joining the (main) dipoles in the dipole illumination mode used for each exposure is substantially perpendicular to the features imaged in that exposure. If linearly polarized electromagnetic radiation is used for each exposure, and is polarized in each case so that its electric field is oriented perpendicular to said axis for that exposure, then both exposures are conducted using polarized radiation, and the polarization directions for both exposures are mutually perpendicular. This set-up can give particularly excellent results.
The polarization mode described in the previous paragraph will here be referred to as polarization mode A. In an alternative situation—here referred to as polarization mode B—the E-field of the illumination radiation is oriented along the x-direction, i.e. parallel to the axis 7 and perpendicular to the features 9. This mode is not preferential in the present invention, but is described here for reference purposes with regard to FIG. 6.
Embodiment 5
In a particular embodiment of the invention, at least one of the dipole exposures is performed using an attenuated Phase Shift Mask, i.e. a mask 12 where the definition of the line-space features as shown in
The projection system in a lithographic projection apparatus is generally a highly precise piece of equipment, often containing many tens of individual optical elements that are designed, machined, finished, and positioned with ultra-high accuracy. Nevertheless, even the most carefully designed projection system will generally suffer from residual optical defects, such as astigmatism, coma, curvature of field, etc. These defects cause image deterioration that can lead to the production of inferior or even rejected products by the lithographic apparatus concerned. Consequently, there is an important impetus to (at least partially) correct such aberrations. In the case of astigmatism, the current invention offers a powerful, effective and elegant solution of this problem.
By way of its very definition, the presence of astigmatism in a projection system results in different focal planes for lines oriented at different angles within an object plane perpendicular to the optical axis of the system. Stated more specifically, if an image to be projected by an astigmatic projection system contains lines extending in distinct first and second directions, which are mutually perpendicular, then the focal plane for the lines extending in the first direction will not coincide with the focal plane for the lines extending in the second direction. Therefore, if a mask pattern containing such lines is imaged onto a substrate in a single step, it will be impossible for all of its lines to be simultaneously sharply focused on the substrate; this will lead to a blurred image.
The present invention circumvents this problem by imaging a mask pattern in two distinct steps: a first step for lines extending in the said first direction, and a second step for lines extending in the said second direction. Between these two steps, it is possible to adjust the focus of the projection apparatus, e.g. by displacing or tilting the substrate table relative to the projection system, by displacing one or more optical elements in the projection system (using dedicated actuators), etc. This ensures optimal focus of the lines extending in both the first and second directions, whereby the effects of astigmatism in the projection system are suppressed.
Embodiment 7
With reference to
The substrate can be displaced in the x, y and z directions and rotated for example about the z axis with the aid of the substrate table. These adjustments are controlled by various servosystems such as a focus servosystem, for example an x, y, φz interferometer system cooperating with the substrate support, and an alignment system with which mask marks can be aligned with respect to substrate marks. These servosystems are not shown in FIG. 7. Only the alignment beams (with their chief rays AB1, AB2) of the alignment system are shown.
Each mask pattern must be imaged a number of times, in accordance with the number of ICs to be formed on the substrate, each time on a different target portion of the substrate.
The depicted apparatus can be used in two different modes:
These processes are repeated until all areas of the substrate have been illuminated.
The apparatus embodying the invention further comprises a changer (not shown) for exchanging first and second masks M; alternatively, in the case of a single mask M with two different mask patterns, the changer serves to move the mask so as to position either one of the said two patterns in the projection beam IB. Each target portion of the substrate must be exposed (at least) twice, once imaging a first mask (sub-pattern) and once imaging a second mask (sub-pattern). The target portions of the entire substrate can all be exposed using the first mask (sub-pattern) and then the first and second masks (or mask sub-patterns) are exchanged and all of the target portions of the substrate are exposed using the second mask (sub-pattern). Alternatively, a given target portion can be consecutively exposed using the first and second masks (or mask sub-patterns) before shifting the substrate stage to image a different target portion using the first and second masks (or mask sub-patterns).
The illumination system of the apparatus embodying the invention includes means for defining the dipole and other illumination modes. It is presently preferred that diffractive optical elements, for example Fresnel lens segments and/or computer-generated holograms, are used to generate the dipole illumination, but other means, such as an apertured plate or interposed blades could be used. Preferably the illumination system includes an axicon/zoom module and other optical components such as an optical integrator. The illumination system can switch between different illumination modes for the first and second exposures and preferably the parameters of each mode, such as σo and σi, are independently selectable for each exposure.
Further details of such illumination systems are disclosed in EP-A-0 687 956 and EP-A-0-949 541, for example, and these references are incorporated herein by reference.
Whilst specific embodiments of the invention have been described above it will be appreciated that the invention may be practiced otherwise than described.
Patent Citations
Non-Patent Citations
Referenced by
Legal Events
Original Image


text:
During this time of the year it is not unusual to see a harbor seal on the beaches of Sea Girt. Seals are amphibious. They are at home on land and in the water. What can you do if an animal strands on the beach? If you see a whale, dolphin, seal or sea turtle Read More
The Borough of Sea Girt Police Department is currently accepting résumés for the position of Special Law Enforcement Officer for the 2015 summer season. The special law enforcement officer position is part-time only. Special law enforcement officers may eventually be considered for full-time employment when there is a vacancy. Applications MUST be received no later Read More
The Sea Girt Police Officer's Association donated turkeys to the Food Bank of Monmouth and Ocean Counties. The turkeys were purchased from Foodtown and delivered to the Food Bank in time for Thanksgiving.
A team of assessors from the New Jersey State Association of Chiefs of Police (NJSACOP) will arrive on Sunday November 23rd & Monday November 24th, 2014, to examine all aspects of the Sea Girt Police Department's policies and procedures, management, operations, and support services Chief Kevin Davenport announced today. "Three years ago the Sea Girt Read More
In our efforts to provide more reliable communications with the residents and businesses in the Borough, we have partnered with Swiftreach Networks, Inc. as our emergency notification service provider. In the past, the Sea Girt Police Department has used this system to provide information about weather related emergencies, crimes, missing persons, school lock downs, school Read More
National Night Out Against Crime – 2014
National Night Out Against Crime The Sea Girt Police Department will be hosting "National Night Out Against Crime" on August 5th, 2014 at the National Guard Training Center in Sea Girt, NJ. The event begins at 5:00pm and will run until 8:00pm. National Night Out Against Crime – America's Night Out Against Crime, began in Read More
Pedestrian Safety Enforcement Operation
This holiday weekend the Sea Girt Police Department will be conducting a pedestrian decoy operation in the area along First Avenue during the afternoon hours. This area will be targeted due to the high number of pedestrians who cross at the various intersections to walk to the beach and bathing pavilion. The Sea Girt Police Read More
Fake IRS Scam Alert
On 6/26/2014 a resident of Sea Girt received a phone call from a phone number they did not recognize. A voice mail was left. The message was in a computerized voice indicating it was the Internal Revenue Service and they were attempting to collect a debt. They were urged not to ignore this message and Read More
Reminder – No Dogs on the Beach After March 15th 2014
Sea Girt Borough Ordinance 9-1.2O states; Control of Dogs; Dogs Restricted During Certain Times. Dogs are prohibited on the beach from March 15 to September 30. No person owning, walking or otherwise having custody or possession of any dog shall cause or permit such dog to go or be upon any part or section of Read More
Are You Getting Messages From Us?
Are you getting special emergency information from the Sea Girt Police Department? If not you need to sign up with our Swiftreach system so you can be informed when every the Sea Girt Police Department or the Sea Girt Office of Emergency Management sends out important information. By adding your information to our Swiftreach network, Read More


text:
WikiLeaks founder, Julian Assange
The UpTake: There's a leak war afoot, and two of the most polarizing participants aren't holding back about who has gone too far, and who hasn't gone far enough.
A rift is forming in the world of leaked top-secret government documents. On one side is Glenn Greenwald, the founding editor of The Intercept online news site, who earlier this week reported that the U.S. government was recording practically every single cell phone call made to or from the Bahamas and another, unnamed country.
On the other side, is Julian Assange, the editor-in-chief of the non-profit Wikileaks, who today published a report that the unnamed country was Afghanistan, a nation where the United States still has troops and is an already tenuous position.
"The Intercept stated that they had censored the name of the victim country at the request of the US government," Assange wrote in the report. "Such censorship strips a nation of its right to self-determination on a matter which affects its whole population."
On May 19, the day Greenwald published the Bahamas report based on documents from the Edward Snowden archive, Wikileaks tweeted, "We condemn Firstlook [the parent company of The Intercept] for following the Washington Post into censoring the mass interception of an entire nation." That initiated a lengthy exchange about when to censor and when to publish, culminating in a widely quoted tweet by Greenwald in which he said he was "very convinced" publishing the name would lead to "deaths."
Today, Assange countered Greenwald's argument, explaining that because the U.S. drone program targets and kills "thousands of people" in Afghanistan, Pakistan, Yemen and Somalia, "The censorship of a victim state's identity directly assists the killing of innocent people."
Michael del Castillo is the technology and innovation reporter at Upstart Business Journal, a member of American City Business Journals. A graduate of Columbia University, his work has appeared in the New Yorker. He is also the cofounder of Literary Manhattan, a nonprofit dedicated to promoting Manhattan's literary community and creating new ways to appreciate literature.
If you are commenting using a Facebook account, your profile information may be displayed with your comment depending on your privacy settings. By leaving the 'Post to Facebook' box selected, your comment will be published to your Facebook profile in addition to the space below.
Sign up to receive Upstart Business Journal's free daily email newsletter, weekend edition and breaking news alerts.


text:
Obama And Romney Square Off In First Presidential Debate In...
- 2012 United States Presidential Election,
- Adult,
- Ann Romney,
- Bestof,
- Debate,
- Democracy,
- Denver,
- Election,
- Former,
- Horizontal,
- Josh Romney,
- Males,
- Massachusetts,
- Matt Romney,
- Mitt Romney,
- Politics,
- Presidential Candidate,
- Presidential Debate,
- Republican Party,
- Son,
- Standing,
- Topics,
- Topix,
- United States Presidential Election,
- University of Denver,
- Waving,
- Wife,
- Women,
Republican presidential candidate, former Massachusetts Gov. Mitt... News Photo2012 United States Presidential Election,Adult,Ann Romney,Bestof,Debate,Democracy,Denver,Election,Former,Horizontal,Josh Romney,Males,Massachusetts,Matt Romney,Mitt Romney,Politics,Presidential Candidate,Presidential Debate,Republican Party,Son,Standing,Topics,Topix,USA,United States Presidential Election,University of Denver,Waving,Wife,WomenPhotographer Justin SullivanCollection: Getty Images News 2012 Getty ImagesDENVER, CO - OCTOBER 03: Republican presidential candidate, former Massachusetts Gov. Mitt Romney (C) waves as he stands with his wife, Ann Romney (2nd R) as son's Matt Romney (R) and Josh Romney (L) look on after the Presidential Debate at the University of Denver on October 3, 2012 in Denver, Colorado. The first of four debates for the 2012 Election, three Presidential and one Vice Presidential, is moderated by PBS's Jim Lehrer and focuses on domestic issues: the economy, health care, and the role of government. (Photo by Justin Sullivan/Getty Images)


text:
The pioneer in business analytics software and solutions, SAS has been recognised by Gartner Inc as a Leader in its new Magic Quadrant for Multichannel Campaign Management.
This is the eighth year SAS has been positioned in the Leaders quadrant. SAS invested 25% of 2013 revenue (US$3.02 billion) in the research and development of new and existing products. This included expanding and improving SAS Customer Intelligence solutions to help address customers' digital transformation needs in 2014.
Gartner says leaders "consistently do considerably better in overall campaign management performance for basic and advanced campaigns, and for integration with digital marketing." Gartner further describes leaders as having "high market visibility, high market penetration, strong market momentum and a strategic vision for growing the campaign management business."
"As multichannel campaign management continues to encompass new social and digital channels, we feel SAS finds itself positioned nicely to account for the new and diverse methods by which consumers receive and respond to marketing messages," said Jonathan Moran, Principal Product Marketer for SAS Customer Intelligence. "These new channels – whether it be a marketing offer embedded in a mobile app or video or over a social sharing site – contain valuable data insights that organisations must be able to analyse and account for when executing multichannel marketing programs."
Sudipta K Sen, Regional Director - South East Asia, Vice Chairman and Board Member, SAS Institute (India) Pvt. Ltd. said, "As the number of customer interaction channels are increasing exponentially, it is becoming more and more important for organisations to create consistent and delightful experiences for customers across these channels. SAS Customer Intelligence Solutions empowers marketers to transform every touch-point into an opportunity to nurture customer relationships and deepen customer intimacy."
In April 2014 SAS unveiled the latest version of SAS Customer Intelligence to help businesses connect data, analytics and data visualisation to become more digitally adept. The updated solution brings together digital data from more sources faster than ever before. Quick and easy access to all digital data – social, mobile or e-commerce – leads to quicker decision making for customer engagement and digital operations. SAS Customer Intelligence provides marketers with answers in minutes or seconds and displays reports with graphical clarity using visual analytics reporting capabilities.


text:
NADA Value .. What gives with that ??
View Single Post
Jasper Windvane
Senior Member
Join Date: Mar 2006
Location: on the water
Posts: 109
Thanks: 0
Thanked 0 Times in 0 Posts
Rep Power:
NADA Value .. What gives with that ??
I see many boats offered for sale at prices that are extremely
over the NADA value for the boat. As an example: I looked
up one sailboat, the NADA value was $13,000 to $15,000 dollars.
The sailboat owner had run an ad asking for $35,000 dollars.
What puzzled me, the boat did not have any special equipment,
or expensive additions. She was basic in every way.
What does the NADA value mean? I am confused.
Jasper Windvane
View Public Profile
Send a private message to Jasper Windvane
Find all posts by Jasper Windvane


text:
All types of curls! (Post a pic of yours)
View Single Post
View Public Profile
Send a private message to Puertoricangirl
Find More Posts by Puertoricangirl
Join Date: Jun 2012
Posts: 383
Thursday, October 17, 2013 at 05:19PM
: All types of curls! (Post a pic of yours)
I love all kinds of curls! Post what yours look like today or some of your favorite pictures of them. 😊 here are mine I have been CG for 7 months and am amazed with the results!
3A Curl Pattern, Low Porosity, High Density, Medium Width, Long Length
Loving my curls/waves!
Product loves: Chagrin Valley Shampoo Bars, ACV rinses, Suave Naturals Conditioner wash on in between days, silk scrunchies, Ouidad Curl refreshing spray, Avocado/olive oil/honey deep treatment, Coconut oil on ends/length
Currently waist length while wet and going for waist length while dry!


text:
We do our best to keep the DMV hours and days of operation up to date. These can change frequently, We suggest confirming with your local office before your visit.
Ravalli County Treasurer's Office of Hamilton, Montana
DMV Phone Number(406) 375-6585
Fax:(406) 375-6595
DMV Office Information
Services Provided at this DMV
- Registration
- Titling
- Plates
- Disabled Services:
- Disabled Parking
DMV Office Hours
Daily Hours:
- Monday
- Tuesday
- Wednesday
- Thursday
- Friday
- 9:00am -5:00pm
- 9:00am -5:00pm
- 9:00am -5:00pm
- 9:00am -5:00pm
- 9:00am -5:00pm
Please Note:
DMV Holidays
New Year's Day, Martin Luther King, Jr. Day, Presidents' Day, Memorial Day, Independence Day, Labor Day, Columbus Day, Veterans Day, Thanksgiving Day, Christmas Day
DMV Payment Options
- - Cash
- - Check
- - Money Order
Local Hamilton Auto Services
Ravalli County Treasurer's Office Report a Bug with this Map
DMV Locations near Ravalli County Treasurer's Office
- Driver Exam Station 18.7 miles
- County Treasurer's Office 41.9 miles
- Driver Exam Station 41.9 miles
- County Treasurer's Office 44.1 miles
DMV Offices in other cities
Driving Records
Quickly obtain your driver record to check for tickets, points and the status of your license.Check Your Driving Record ▶
DMV Practice Tests
Prepare to pass the written driver's license exam with online practice tests.Take a Practice Test ▶
Online Services & more


text:
Description: Ilícito
Image was hearted from ilicitum.tumblr.com
Other images from this site
Jennefer Caroline was first to heart it
22 people have hearted this image
This image is in 5 collections
You might like these too
Now available in your language!Use in your language! Go back to English
Other images from this site
You might like these too
Sign in with Facebook or Twitter to start your gallery.
Sign in with Facebook Sign in with TwitterDon't have Twitter or Facebook? Skip this step!


text:
Results 1 to 15 of 15
Thread: Toy Story 3
November 16th, 2004 #1
Toy Story 3
Yep, it's true. Toy Story 3 is already in the planning and staffing stage, without Pixar. CNN article here.
The short of it is this: Pixar and Disney will end their business relationship after Cars comes out next year, but Disney will retain the rights to all movies produced by Pixar so far. This means that Disney will have the rights to sequels of all Pixar movies up to and including Cars. I personally always speculated that this would rule out any chance of a sequel to any Pixar film, since I'm not sure how you could make a quality sequel to any Pixar film without any of the key people who made the original. But I guess I was wrong.
Anyone else think this seems like abad idea? Can Disney really expect to replace Pixar and still make a movie on the same level?
Hide this ad by registering as a memberNovember 16th, 2004 #2
Seriously, why would Pixar want Disney to produce their films. It's good enough that can produce it. I mean, almost all the kids will think Disney ACTUALLY MADE the film! That's stupid
Tons of people in America actually thought that Disney MADE Spirited Away!! wtf
November 16th, 2004 #3
Its no suprise. It is a bad idea. Di$ney i$ all about one thing nowaday$, and that thing i$n't putting out quality film$. Thanks Eisner, you suck!
I self-published a book on the fundamentals of drawing from life.
November 16th, 2004 #4Can Disney really expect to replace Pixar and still make a movie on the same level?
Personally, Disney disgusts me. When this comes out I am not going to see it. Pixar is better off without them.
November 17th, 2004 #5Registered User
- Join Date
- Nov 2004
- Posts
- 20
- Thanks
- 0
- Thanked 0 Times in 0 Posts
- Follows
- 0
- Following
- 0
the first 2 were rather good (thanks Pixar) 3 will do ok just because people will have liked the first 2 but then they will go strait to dvd and be like the rest of the crap Disney likes to push
Think you got mad photoshop skills? It could win you a car @ www.hhrya.com
November 17th, 2004 #6
I wonder if they will get Tom Hanks and Tim Allen back for #3, and all the rest of the voice talent...
"He turned and looked. A giant yellow duck was trying to force itself into the diner."
November 18th, 2004 #7
Denart said:Seriously, why would Pixar want Disney to produce their films. It's good enough that can produce it. I mean, almost all the kids will think Disney ACTUALLY MADE the film! That's stupid
New website: www.chrisjanderson.com
New Blog: http://www.chrisjanderson.blogspot.com
November 18th, 2004 #8
disney has gone too far...
yeah they do call films made by other people their own...
Do you know the muffinman?
Originally Posted by creatix
Once you understand what the word "stupid" means - age is no longer a valid excuse for being that way.
November 27th, 2004 #9
For all of their fancy ass animation that Disney might want to throw at this, it's still ultimately a great story that will make or break the movie. If somehow those greedy leeches at Disney can come up with a hot story, they just might do okay. Personally I think Pixar set the bar so damn high I think any slip-ups on Disney's part is just going to make them look that much more pathetic than they are now.
And I also know geeks like myself will probably boycott this movie just because we know it's not a Pixar flick.
November 27th, 2004 #10
Pixar rules...but I still have a spot in my heart for Disney...even if they do suck now.
I hope they can make quality stuff. SB Dave is right...it's all about the story. There are getting to be lots of people that can animate in 3d. I don't think it's impossible for Disney to put together a solid team to do the work. Animators jump back & forth between companies a lot anyways don't they? might even get some of the original folks back(if they aren't bitter towards Disney like a lot of people seem to be).
Hoping for them to fail seems like a waste.
My Sketchbook
Encouragement keeps me swimming , even in the undertow of disappointment.
November 27th, 2004 #11
This is going to flop for one simple reason. It's not being made by Pixar. It won't have that unique pixar style and charm. This is why Pixar is completely incapable of making a bad film. They're artists and storytellers first and 3-D animators second. I believe that's what comes across in their movies the most. They're not just making 3-D animated films for the sake of doing so like other studios have. They have cool and genuine ideas.
...It's too bad Disney can't just remake another obscure Japanese movie and change the character's names like they did with Atlantis and The Lion King.
Last edited by N D Hill; November 27th, 2004 at 03:16 PM.
November 27th, 2004 #12Originally Posted by Exo
I would love to shove that into the faces of little kids so they can see what their beloved Disney really is!
November 28th, 2004 #13
Prime example of primitive animation with superb writing and storytelling making it big would be The Simpsons.
Prime example of slick animation and lousy storytelling would be any of the last Disney animate features.
Which one would you much rather watch?
I know I'd much rather watch Homer, Marge, Bart, Lisa & Maggie over Atlantis any day of the week.
November 28th, 2004 #14
I am interested in how this film will turn out.
I'm gonna check out Chicken Little. But, I think Pixar does a lot better with their textures..lately at least.
- J t J -
Fading Oasis
<(^ ^)>
November 30th, 2004 #15
Yes, Pixar has definately set the bar high for Disney; a feat that I doubt very much they can handle. Sorry, Disney. I love you. I always have. But Eisner needs to die a slow and painful death, mush in the same way he's been killing you.
The reason that Pixar doesn't own the rights to their stories anymore was part of the deal with breaking up with the Mouse House. Steve Jobs (not the best guy, but better than some *cough*Eisner*cough*) tried to retain the rights, but it was either keep them and give Disney a large portion of the profits (I think it was like 50-60%, but don't quote me on that) on anything that they make, or just leave everything and start fresh. So, yeah, more Pixar movies without Pixar. I think I read, though, that Tom Hanks isn't so sure about making Toy Story 3 because of that fact. But, I'm sure that if Disney flashes enough $$, he'll come around. A guy's gotta make a living, right?


text:
The Trenchcoat Robbers
They robbed 27 banks in 15 years, one of the most prolific streaks in American history. Then they slipped up.
They robbed 27 banks in 15 years, one of the most prolific streaks in American history. Then they slipped up.
From a Tokyo smash-and-grab to driving a car through the window of a Dubai jewelry shop, how a ragtag band of Balkan thieves set a new bar for audacious heists.
A member of the Pink Panthers, Milan Poparic, escaped from prison yesterday.
The motley gang of L.A. teens that cat-burgled celebrities, sometimes repeatedly, in search of designer clothes, jewelry, and something to do. The story that became The Bling Ring.
The most prolific bank robber in Texas history.
How and why did 200 pages of the Aleppo Codex, "the oldest, most complete, most accurate text of the Hebrew Bible," go missing?
The curious case of SpongeBob SquarePants illustrator Todd White, three ninjas, and an art caper.
The Watergate reporters look back.
In the course of his five-and-a-half-year presidency, beginning in 1969, Nixon launched and managed five successive and overlapping wars — against the anti-Vietnam War movement, the news media, the Democrats, the justice system and, finally, against history itself. All reflected a mind-set and a pattern of behavior that were uniquely and pervasively Nixon's: a willingness to disregard the law for political advantage, and a quest for dirt and secrets about his opponents as an organizing principle of his presidency.
In 16 months, he has broken into more than a thousand homes up and down the San Fernando Valley. According to the police, his haul is worth anywhere from $16 million to $40 million. And yet because he has cultivated so many aliases, law-enforcement officials have been hard-pressed to learn his real name—Ignacio Peña Del Río—much less comprehend his unlikely background.
A profile of lifelong thief and 13-time escapee Chris Gay, aka "Little Houdini."
As a teenager, Trey Smith snuck into the cash- and porn-filled home vault of his friend's father. Fifteen years later, he told the story from prison.
What ever happened to the world's most elusive skyjacker?


text:
X crashing at startup after update
View Single Post
Registered User
Join Date: Nov 2006
Posts: 7
X crashing at startup after update
I've searched posts here, ubuntuforums, Google, etc., but have only managed to find bits and pieces of helpful info. I'm a fairly new Linux user on Ubuntu 6.06. After running Update Manager, and letting it fully update me (month or two of updates), booting up the following day left me at the terminal, with a crashed X. This was a panicky moment for me as a neophyte on Linux, but working for many hours, I learned a bit. I've attached my error log, and as per the sticky here, started X with the `startx -- -logverbose 5` option.
The crux of the situation seems to be that I need nvidia.ko to exist in /lib/modules/2.6.15-27-386/volatile/, but after booting up, it isn't in there. After the crash, in the shell, I can run 'sudo lrm-manager' and 'sudo depmod -a,' which for reasons unknown to me (found in a post somewhere) recreates nvidia files in the volatile directory. At this point, I can 'startx,' and I'm back in, almost as usual - sans the ability to shut down from the X terminal itself.
Once in, I used Synaptic to reinstall all of my kernel and restricted Linux modules, hoping that would update them somehow, and I've run 'sudo apt-get update,' and everything is/was current. My packages all seem to match up, but as I said, I'm very new at this, and it's all pretty confusing to me still. Any help getting this back to the stable, graphical Linux this former Windows user has been enjoying for the past few months would be most appreciated. Let me know if there's any more info I can provide, and thanks!
Attached Files
(23.9 KB, 114 views)
View Public Profile
Find More Posts by gfixler