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OHIO SINKHOLE SWALLOWS CAR; DRIVER CLIMBS LADDER: TOLEDO, Ohio (AP) - A northwest Ohio sinkhole has swallowed a car traveling down a street and briefly trapped the driver, who climbed out after authorities gave her a ladder.
WRENTHAM, Mass. (AP) - Aaron Hernandez's home address was no secret after the media camped outside the massive house for days, and cameras caught him leaving, hands cuffed behind his back, when he was arrested for murder.
PORTLAND, Ore. (AP) - On college campuses across the United States, the eternal optimism of youth has been throttled out by a fear of crushing student debt. That's certainly the case in Oregon, where the cost of tuition has soared as public funding for higher education has declined.
NEW YORK (AP) - A former jail guard pleaded guilty Wednesday to charges she had sex behind bars with an inmate convicted of gunning down two police officers in cold blood - a man her lawyer says she still cares about and who fathered her baby boy, named Justus.
COLUMBUS, Ohio (AP) - Tea party activists in Ohio want to turn an enemy - the Internal Revenue Service - into an ally as they fight continued efforts to expand Medicaid.
SACRAMENTO (AP) - A second health insurer notified state regulators Tuesday that it will stop selling individual policies in California.
PROSECUTORS ATTACK ZIMMERMAN STORY SEVERAL WAYS: SANFORD, Fla. (AP) - A judge tossed out a detective's statement that he found George Zimmerman credible in his description of fighting with Trayvon Martin, a decision that benefits prosecutors who are trying to discredit the defendant's self-defense claims.
PITTSBURGH (AP) - A woman who had her newborn taken away because she failed a hospital drug test after she ate a poppy seed bagel has settled a lawsuit over the case.
WASHINGTON (AP) - In a major concession to business groups, the Obama administration Tuesday unexpectedly announced a one-year delay, until 2105, in a central requirement of the new health care law that medium and large companies provide coverage for their workers or face fines.
PRESCOTT, Ariz. (AP) - The lone survivor on an elite Arizona firefighting crew was serving as a lookout and relaying key information to his colleagues when a raging wildfire trapped and killed them, officials said Tuesday.
PRESCOTT, Ariz. (AP) - Fire crews battling a wildfire should identify escape routes and safe zones. They should pay close attention to the weather forecast. And they should post lookouts.
ATLANTA (AP) - Overdose deaths in the U.S. are rising fastest among middle-aged women, and their drug of choice is usually prescription painkillers, the government reported Tuesday.
PHILADELPHIA (AP) - A Philadelphia man charged with putting heroin and methadone in his infant son's bottle to quiet him, but instead killing him, was convicted Tuesday of third-degree murder.
MOUNTAIN VIEW (AP) - Intuit is selling a division that provides software to financial institutions in a deal worth about $1.03 billion as it focuses on products for consumers and small businesses.
6-YEAR-OLD BOY RIDES 3 MILES ON VAN ROOF IN ALASKA: ANCHORAGE, Alaska (AP) - Alaska State Troopers say a 6-year-old boy climbed on top of his parents' minivan and rode it for three miles down a highway before he fell off and suffered cuts and bruises.
SEATTLE (AP) - Lt. Col. Edward Saylor, one of four surviving Doolittle Raiders who attacked Japan during a daring 1942 mission credited with lifting American morale during World War II, has died. He was 94.
SEATTLE (AP) - Seattle Police Chief Kathleen O'Toole has reassigned an officer involved in the arrest last summer of a 69-year-old man who refused to drop a golf club he was carrying on a city sidewalk.
CUPERTINO (AP) - The runaway success of Apple's newest iPhone has fueled a dramatic shift in the global market: the California tech giant is now neck-and-neck with South Korea's Samsung for the title of world's leading seller of smartphones.
PHILADELPHIA (AP) - Better messaging, not changes in policy, is the key to winning elections again, House Democrats said Thursday as they huddled in Philadelphia to talk strategy. And the message, they said, must focus relentlessly on middle class paychecks.
NEW YORK (AP) - It was a Prime quarter for Amazon.
MOUNTAIN VIEW (AP) - Google has gotten into the habit of missing analysts' earnings targets, frustrating investors who believe the online search leader would be more profitable it wasn't pouring so much money into far-flung projects such as Internet-connected eyewear and driverless cars.
STATELINE, Nev. (AP) - A shuttered hotel-casino on the south shore of Lake Tahoe has reopened under the Hard Rock banner after a $60 million renovation that local business and tourism officials hope will help jump-start the struggling main casino drag in the shadow of a big ski resort.
TAMPA, Fla. (AP) - Bart the cat was hit by a car, buried and seemingly crawled back from the dead.
BRIDGEVIEW, Ill. (AP) - Two brothers accused of digging up graves, dumping human remains and reselling plots at a suburban Chicago cemetery went on trial Wednesday in Cook County Circuit Court.
MINNEAPOLIS (AP) - "American Sniper" is tops at the box office but don't expect to see former Minnesota Gov. Jesse Ventura lining up at a theater for it.
ALBUQUERQUE, N.M. (AP) - A disgruntled, former Los Alamos National Laboratory scientist promised to build 40 nuclear weapons for Venezuela in 10 years and design a bomb targeted for New York City in exchange for "money and power," according to secret FBI recordings released Wednesday.
CAMDEN, N.J. (AP) - A woman admitted on Wednesday that she helped two of her children conceal evidence of a gang-related double slaying that occurred at her home, where the bodies were buried in a yard.


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Semiconductor Industry Posts Record-Breaking Revenues Despite 2011 Challenges
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Published Monday, February 6, 2012
WASHINGTON, D.C.—FEBRUARY 6, 2012—The Semiconductor Industry Association (SIA), representing U.S. leadership in semiconductor manufacturing and design, today announced that worldwide semiconductor sales for 2011 reached a record $299.5 billion, a year-on-year increase of 0.4 percent from the $298.3 billion recorded in 2010. Worldwide semiconductor sales in December amounted to $23.8 billion, a decrease of 5.5 percent from the month prior. Fourth quarter sales of $71.5 billion represent a 7.7 percent decline from the immediate prior quarter, and a 5.3 percent decrease over the same period in 2010. All monthly sales numbers represent a 3-month moving average.
"Between the natural disasters in Japan and Thailand and the overall impact of a weak global economy, 2011 presented a number of major challenges for the semiconductor industry. Despite these setbacks the industry showed resiliency and posted year on year growth with record-breaking revenues for 2011," said Brian Toohey, president, Semiconductor Industry Association. "The health of the industry is a direct reflection of the pervasiveness of semiconductor innovations and their applications in almost every aspect of modern society."
In 2011 the industry saw strong demand in several areas; specifically the optoelectronic, sensor and actuator, and microprocessor markets showed solid year over year growth. Lamps and image sensors drove growth in the optoelectronic market to $23.1B, a 6.4% increase over 2010. Optoelectronic applications bring energy efficiency and low cost in a wide range of products including mobile devices and cameras.
Sensors and actuators, currently the smallest semiconductor market segment showed the highest year over year growth at 15.5% to $8.0B in 2011. Sensor technology which can be used to convert temperature, pressure or acceleration into electrical signals is growing as an application in consumer electronics, medical devices and automotive systems to improve safety and efficiency. An area of continued growth for sensors is in the application of MEMS, or microelectromechanical systems which are increasingly included in smartphones, tablets, digital cameras, and numerous other consumer electronic products.
MOS Microprocessors, part of the integrated circuit category, which are predominantly used in PCs and other devices that need processing capabilities also experienced year-over-year growth, with an increase of 7.5 percent in revenue to $65.2B making it the second largest semiconductor market segment for 2011, behind Logic. Strong demand in the enterprise computing segment drove microprocessor sales.
In 2012 the industry is expected to experience further recovery due to increased demand across a broad range of end market segments combined with the delayed sales impact from the supply chain disruptions in the second half of 2011. Additionally, several large semiconductor companies announced plans for new facilities and new R&D projects that will serve to fuel the industry's long-term growth expectations.
"This year our industry will invest billions in capital expenditures and in R&D, which will pay off both in the short and long term. In fact, reinvesting a large percentage of revenues is a hallmark of the industry. It's this combination of R&D investment, top engineering talent, high exports and cutting-edge advances that have made the semiconductor industry a cornerstone of the innovation economy," continued Toohey.
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Bad news coming out of the Angels' camp…. Yesterday (Wednesday), Hamilton was in New York to meet with MLB about a disciplinary action. Neither the team or MLB is commenting on the specifics, but according to the LA Times and CBSSPORTS writer Jon Heyman, Hamilton admitted to MLB about a cocaine relapse a couple months back.
More details as soon as they come out.
** MLB.com story HERE


text:
A technique and apparatus for homogeneous chemical vapor deposition (HCVD), wherein a heated carrier gas is mixed with a source gas in a location close to a substrate on which deposition is to occur. The heated carrier gas transfers heat to the source gas in order to decompose it, producing the intermediate species necessary for deposition onto the substrate. Thus, the source gas is not subjected to heating above its pyrolysis temperature prior to being transported to the immediate vicinity of the substrate. This HCVD apparatus includes a heat source for heating the carrier gas, a tube for bringing the heated carrier gas to a location close to the substrate, and another tube for bringing the reactive source gas to the aforementioned location where it is mixed with the hot carrier gas to cause decomposition of the source gas close to the substrate. The substrate temperature is decoupled from the hot gas temperature and is significantly colder than the hot gas temperature. Simultaneous deposition onto a plurality of substrates is possible, and the system can be scaled-up to provide deposition over a large area.
1. A homogeneous chemical vapor deposition (HCVD) method for depositing a film from the vapor phase onto a substrate which is at a temperature independently controllable with respect to the temperature of the vapor phase, comprising the steps of:
heating a first gas,
bringing said heated first gas to a location in the vicinity of a substrate onto which film deposition is to occur,
bringing a reactive source gas to said location, said source gas being at a temperature less than its pyrolysis temperature and containing constituents to be present in said deposited film,
intermixing said heated first gas and said source gas at said location to transfer heat from said first gas to said source gas, the amount of heat transferred being sufficient to cause decomposition of said source gas into intermediates which deposit onto said subtrate to produce said film.
2. The method of claim 1, where said first gas is comprised of a gas which does not decompose upon being heated.
3. The method of claim 1, where said first gas contains a constituent of said deposited film.
4. The method of claim 1, where said source gas contains Si.
5. The method of claim 4, where said first gas contains nitrogen.
6. The method of claim 4, where said first gas contains oxygen.
7. The method of claim 1, where said deposited film contains silicon.
8. The method of claim 1, where said first gas is transported to said location by a tube heated by a surrounding furnace.
9. The method of claim 1, where said source gas is at room temperature.
10. The method of claim 1, where said first gas contains a gas species selected from the group consisting of He, H, N, Ar, and Xe.
11. The method of claim 1, where the distance between said location and said substrate is of the order of 1 mm to 10 cms.
12. The method of claim 1, where said source gas contains a dopant.
This invention relates to homogeneous chemical vapor deposition (HCVD), and more particularly to an improved reactor and method for HCVD, in which a heated carrier gas is mixed with a source gas reactant in the vicinity of the substrate onto which felon deposition is to occur.
One of the techniques known in the art for depositing films of amorphous or crystalline semiconductors, as well as insulating films, is chemical vapor deposition. In this technique, deposits onto a substrate are produced by heterogeneous gas-solid or gas-liquid chemical reactions at the surface of the substrate. A volatile compound of the element or substance to be deposited is introduced into a reactor and decomposed as by thermal means, or reacted with other gases or vapors, at the surface of the substrate in order to yield non-volatile reaction products which deposit on the substrate surface. Chemical vapor deposition processes are well-known for the deposition of silicon films, and insulators of silicon.
In a particular type of chemical vapor deposition, termed homogeneous chemical vapor deposition (HCVD), a homogeneous reaction is produced by decoupling the temperature of the gas and the substrate. This contrasts with conventional CVD where both the source gases and the substrate are generally hot and are at about the same temperature. By decoupling the temperature of the source gas from the substrate, the substrate can be kept at a much lower temperature. This has advantages in many fabrication processes, and in particular in the fabrication of hydrogenated amorphous silicon.
In a conventional apparatus for HCVD, the source gas is thermally heated to its pyrolyzing temperature, as by using a hot-wall reactor, and is pumped to the vicinity of the substrate or carried thereto by a carrier gas. HCVD relies on the gas phase (homogeneous) decomposition of the source molecules, rather than on surface (heterogenous) decomposition as in standard CVD techniques.
As an example of HCVD, films of silicon can be deposited on a substrate using a source gas such as silane. The silane will be homogeneously decomposed at a high temperature and a low pressure, with a film of silicon being deposited upon the low temperature substrate. The silane is drawn through a furnace-heated reactor containing a pedestal on which the substrate is located. The pedestal is cooled, as by nitrogen flow, to maintain its temperature separate and below that of the gases in the reactor. When the source gas is heated to its pyrolysis temperature, an adequate deposition rate onto the substrate is obtained from the homogeneous decomposition reaction by operating just below the gas phase nucleation threshold. HCVD is described in more detail in the following references:
B. A. Scott et al APPL. PHYS. LETT., 39, 73 (1981)
B. A. Scott et al APPL. PHYS. LETT., 40, 973 (1982)
B. A. Scott et al J. DE PHYSIQUE 42 , C4-635 (1981)
B. A. Meyerson et al J. OF APPL.PHYS., 54 , 1461, March 1983).
Although HCVD is an advantageous process which can be used at low pressures and low temperatures to produce good quality films, this process is not without problems. For example, the major problems associated with HCVD have been the following:
1. low deposition rate,
2. homogeneous nucleation of particulates, and
3. a large depletion of the source gas on the hot reactor walls without the deposition of useful product.
It has been found that conventional HCVD hot-wall reactors do not localize decomposition of the reactants in the vicinity of the substrate, and do not provide steep thermal gradients between the gas phase (hot) reactants and the solid surface (cold) upon which the film is to be grown. If this gradient is not as steep as possible, clusters of particulates will form in the hot gas which either deposit on the walls of the reactor or are swept away as unreacted molecules. This in turn depletes the available supply of film precursor. The extended hotwall reactors also increase the liklihood of gas phase nucleation of particulates. The chemistry of the reactions which occur during the preparation of, for example, amorphous silicon by HCVD are described by B. A. Scott et al, J. APPL. PHYS. 54 (12), page 6853, December 1983 (see paragraph A, page 6855).
A technique for heating reactive source gases in CVD other than by a so-called "hot wall" reactor (which is a furnace generally providing heat along the outside wall of a chamber in which the source gas travels) is the type of CVD termed laser-induced CVD. This technique is described in more detail by R. Bilenchi et al, J. APPL. PHYS. hpl.53, p. 6379, September 1982. In this technique laser light, such as that produced by a CO2 laser, is directed into a gas in order to heat it so that it will decompose. However, this technique is difficult to scale-up, and often provides an uneven temperature distribution.
In laser-induced CVD, the wavelength of the light has to be matched to a vibrational mode in the gas in order to transfer energy to the gas. This often requires that an additional gas be added to the source gases. For example, SiH4 (silane) does not absorb CO2 laser light so in order to absorb the laser light SiF4 is added. The SiF4 absorbs the light, and then transfers heat to the silane. Energy is distributed through the vibrational modes of the SiF4 in a manner in which relaxation will not occur rapidly so that heat can be transferred to the silane for decomposing it. It is also desirable that the additive (such as SiF4) not decompose to contaminate the decomposition products which are to deposit onto the substrate. Since an additive gas with many vibrational modes is required, the choice of the additive is severely limited. For example, more inert gases such as He, Ne, and Ar cannot be efficiently heated with laser light. These inert gases are preferable to use because they will not decompose to adversely participate in the reaction causing the deposited film. Gases such as nitrogen and hydrogen are also poor additives, since they only have one vibrational degree of freedom and relax very readily to a ground energy state. This means that heat will not be efficiently transferred from the hydrogen or nitrogen to the source gas to be decomposed.
In the choice of the additive to be used to absorb laser light, it is also necessary that the additive gas not have a radiational mode, since the energy pumped in by the laser light would then be lost as reradiated light. Accordingly, it is a primary object of the present invention to provide improved reactor design concepts to eliminate the aforementioned problems and to further enhance the generality of HCVD in preparing both amorphous and crystalline forms of insulating and electronic materials.
It is another object of this invention to provide enhanced deposition rates in HCVD.
It is another object of this invention to provide improved HCVD in which homogenous nucleation of particulates is minimized.
It is another object of this invention to provide improved HCVD in which source gas depletion in the reactor is minimized.
It is another object of this invention to provide improved HCVD in which deposition of film precursors onto reactor walls is minimized.
It is a further object of this invention to provide an improved apparatus and method for HCVD for the deposition of amorphous and crystalline films.
It is a still further object of this invention to provide an improved reactor design and technique for HCVD in which a steep thermal gradient is provided between the hot gas phase reactants and the cold substrate onto which deposition is to occur.
It is a still further object of this invention to provide an improved technique and apparatus for HCVD which is suitable for the deposition of thin films over large areas.
It is another object of this invention to provide improved HCVD techniques for processing multiple wafers in which deposition can occur onto a plurality of substrates.
It is another object of this invention to provide enhanced HCVD having an increased range of pressures which can be utilized during deposition.
It is another object of this invention to provide improved HCVD wherein the decomposition of reactants providing the film constituents occurs close to the substrate.
It is another object of this invention to provide improved HCVD which is suitable for the deposition of both insulating and semiconducting films.
It is a further object of this invention to provide improved HCVD for the deposition of both doped silicon films and insulating films of silicon.
In addition to the problems described above with respect to uneven heat distribution, limited availability of additive gases, and the difficulty of scale-up, lasers thamselves are very inefficient light sources (approximately 10%). Thus, while laser-induced CVD is a "cold-wall" approach, it is not without problems.
Accordingly, it is another object of this invention to provide a technique for HCVD which provides an improved cold-wall reactor design.
It is another object of this invention to utilize simple and reliable components for providing a cold-wall reactor.
It is another object of this invention to provide a technique and apparatus and HCVD in which inert gases can be used to provide heat for transfer to source gases.
It is another object of this invention to provide an apparatus and techniques for HCVD wherein uniform heat distribution is obtained through the simple expedient of passing a carrier gas through a hot pipe prior to the transfer of heat from the heated carrier gas to a source gas which is to be decomposed for deposition onto a substrate.
This invention describes a method and a reactor for HCVD which eliminates the aforementioned problems of gas precursor depletion etc., and provides a very steep temperature gradient from the hot gas phase to the cold substrate. This improved reactor design is suitable for large scale use in the deposition of all types of films, including both semiconducting and insulating films.
The invention minimizes the influence of hot walls on the gas phase reactants whose constituents form the deposited film. The technique of this invention is to heat a carrier gas, such as an inert gas, and to transport the heated carrier gas to the vicinity of the substrate onto which deposition is to occur. The cold source gas which is to be decomposed to provide the constituents forming the deposited film is also brought to the vicinity of the substrate where the cold source gas will mix with the heated carrier gas. This intermixing transfers heat to the source gas at or near the substrate surface, which then decomposes and subsequently deposits on the substrate to form the deposited film. In this manner, the source gases are not heated prior to their decomposition, and the decomposition occurs close to the substrate. Further, a very steep thermal gradient is provided between the hot gas phase and the cold substrate in order to reduce the liklihood of gas phase nucleation of particulates from the source gas. The deposition rate is increased and nucleation of particulates in the gas phase is also reduced. These advantages occur while at the same time maintaining independent thermal control of both the gas phase chemistry and the substrate surface chemistry.
A reactor design for achieving this improved HCVD utilizes means for heating the carrier gas, means for transporting it to a location close to the substrate, and means for transporting the source gas to that location where it can be intermixed with the heated carrier gas in order to transfer heat for decomposing the source gases. This reactor can be scaled for the deposition of a film onto a plurality of substrates.
In practice, the source gases can be any gases capable of thermal decomposition in order to yield the constituents required in the deposited film. The carrier gas is generally a gas which does not decompose in order to prevent contamination of the deposited film. Inert gases such as He, Ar, etc., are very suitable. However, while the carrier gas preferably does not decompose and participate in the reaction forming the deposited film, it is within the practice of this invention to also use heated carrier gases which are themselves the source of a deposited film constituent. For example, deposited films of SiO2 can be formed using a source gas comprising silane (SiH4) while the carrier gas could be an oxidant such as NO2. Thus the carrier gas would in this case supply the oxygen necessary for the deposition of SiO2 films.
The specific dimensions of the reactor are scaled to optimize heat transfer from the carrier gas to the reactive source gas, so that a high concentration of film-forming precursors exists adjacent to the substrate surface in the desired steep thermal gradient. In addition to the independent thermal control of the gas phase surface chemistry in this reactor, the conditions over which HCVD may be carried out can be generalized to a much wider range of pressures (0.001 to above 1.0 Torr) than is generally available in prior art "hot wall" reactors.
These and other objects, features and advantages will be apparent from the following more particular description of the preferred embodiments.
FIG. 1 schematically illustrates an apparatus which can be used to mix a hot carrier gas with a source gas prior to deposition onto a substrate.
FIG. 2 is an enlarged view showing a portion of the apparatus of FIG. 1.
FIG. 3 is a schematic illustration of how a plurality of reactor nozzles of the type shown in FIG. 1 can be used to provide deposition onto a plurality of substrates.
FIG. 4 is a schematic illustration of a technique for separating and later mixing a hot carrier gas and a cold source gas in the vicinity of a moving substrate.
FIG. 5 is a schematic illustration of an apparatus for providing HCVD onto a plurality of substrates, using a type of baffle-deflection technique such as that generally illustrated in FIG. 4.
In the practice of this invention, the effects of a hot-wall reactor are minimized by thermally isolating the heated carrier gas from the source gas to be decomposed, until these two gases are brought to a location close to the substrate. At that location, heat is transferred from the heated carrier gas to the cold source gas in order to decompose the source gas. In turn, this provides the constituents which deposit on the substrate to form the desired film. Independent thermal control for the hot gas phase and the cold substrate are provided in order to achieve the advantages of HCVD. The source gases (which can include a dopant-supplying gas) are picked in accordance with the characteristics desired for the deposited film, while the carrier gases are picked in a manner to avoid adverse reactions which would contaminate the deposited film, and/or to provide another constituent of the deposited film. In this manner, inert gases can be used as the carrier gases to avoid many of the problems associated with the prior art. The source gas can also be diluted with an inert "carrier" gas (for example, 10% silane in helium can serve as the "source" gas). A dopant source, such as phosphine (PH3), diborane (B2 H6), or Arsine (As H3) can also be present in the source gas stream.
The exact means by which the carrier gas is heated before contact with the source gas can be varied, but it is generally more simple and economical to pass the carrier gas through a heated pipe in order to uniformly heat it to a desired temperature. The designs shown in the drawing achieve these general purposes.
Referring in more detail to FIG. 1, a reactor nozzle design 10 includes a first means 12 (such as a tube) for transporting the carrier gas to the vicinity of the substrate 14, and a second tube 16 used to transport the source gas to a location close to the substrate 14 where it can be intermixed with the heated carrier gas. A heating means 18, such as a furnace, is used to heat the carrier gas in the enclosed tube 12. The carrier gas is transported along tube 12 in the direction of arrow 20, while the source gas is transported along tube 16 in the direction of arrow 22 using standard techniques, such as pumps well known in all types of CVD and HCVD apparatus.
The materials comprising the different components of FIG. 1 are well known in the art. For example, tubes 12 and 16 can be comprised of stainless steel or quartz while furance 18 is comprised of a high heat conductivity material such as a metal, having embedded cartridge heaters 24 therein. Generally, the apparatus shown in FIG. 1 is located within a larger enclosing reactor tube which is not shown in this drawing for ease of illustration. However, such reactor tubes are well known in the art and are of the type to be described later with respect to FIG. 5.
In the deposition of a film onto a substrate 14, the heated carrier gas exits tube 12 from the nozzle opening 26 and enters an opening 28 in tube 16 where it is brought into contact with the source gas. This operation can be understood more fully by referring to FIG. 2, which shows the source gas transport means 16 more clearly. This transport means is comprised of a tube portion 30 and an annular ring 32 having the opening 28 therein. Annular ring 32 is hollow to allow the source gas to flow around the periphery of ring 32. A plurality of small openings 34 is located on the inner wall of ring 32, through which the source gas passes into the space 28 where it begins intermixing with the heated carrier gas. The mixture of heated carrier gas and source gas then moves to the vicinity of the substrate 14, where decomposition of the source gas occurs to provide the constituents which deposit upon the substrate 14 to produce the desired film.
The distance d1 between the nozzle opening 26 and the annular ring 32, as well as the distance d2 between the annular ring 32 and the substrate 14, can be varied in accordance with the thermal properties and desired chemistry that is to occur between the hot carrier gas and the source gas. These distances depend on the nature of the carrier gas and the source gas, and on how fast the system will come to thermal equilibrium relative to the desired gas phase chemistry and substrate surface chemistry. As an example, the carrier gas is heated to a temperature which will provide sufficient heating to decompose the source gas, which can be at room temperature or biased to a temperature in excess of room temperature. The hot carrier gas and the source gas generally mix within a few mean free paths and the amount of mixing will also depend upon the flow rate of the gases and the heat capacity of these gases. Generally, these distances range from approximately 0.1 mm to several centimeters. Further examples will be given later.
FIG. 3 schematically shows a deposition system in which a plurality of nozzles 10 of the type shown in FIG. 1 are used to provide film deposition onto a plurality of substrates 36. These substrates are located on the substrate holder 38. Each of the injectors 10 provides decomposed source gas to the substrates 36, where the mixture of heated carrier gas and decomposed source gas is indicated by the arrows 40. Thus, a combination of the reactor nozzles 10 can be combined in a single HCVD system to provide deposition onto numerous substrates at the same time.
FIG. 4 illustrates schematically another approach for providing the hot carrier gas and cold source gas to a substrate. Here, a plurality of baffles 42 is used to separate the flow of hot carrier gas and cold source gas.
These gases can be provided by tubes of the type shown in FIG. 1. The baffles 42 do not allow substantial mixing of the carrier gas and the source gas until they reach an area close to the substrate 44. In this illustration, the substrate moves past the baffles 42 in the direction indicated by the arrow 46. Such a system would be used in an apparatus where a plurality of wafers is conveyed past an area where the source gas is heated by intermixing with the hot carrier gas.
FIG. 5 illustrates a more complete structure suitable for HCVD onto a plurality of substrates using the concept of the present invention. The apparatus is comprised of a reactor tube 48, which could be, for example, quartz. A plurality of substrates 50 are located on a plate 52 having high thermal conductivity (such as a metal) which in turn is located on a cooled substrate holder 54. An input port 56 is provided for the flow of coolant into holder 54, while an outlet port 58 is provided for the coolant exhaust. A heated manifold 60 is located in the reaction tube 48, into which are located embedded cartridge heaters 62. Manifold 60 is comprised of a material having high thermal conductivity, such as a metal. Cartridge heaters 62 are used to heat the carrier gas which flows into the manifold 60 via input port 64. The flow of carrier gas into manifold 60 is indicated by the arrow 66. Another input port 68 is provided in the top of reaction tube 48 for entry of the source gas, or reactant gas, as indicated by the arrow 70. The exhause products of the reactor are removed from tube 48 via the output port 72, as indicated by the arrow 74.
Portions 76 of the heated manifold 60 are used to deflect the flow of the heated carrier gas to a location close to each substrate 50. The curved arrows 78 indicate the flow of the source gas in tube 48 in a direction bringing the source gas into close proximity to the substrates 50. Intermixing of the hot carrier gas and the cold source gas close to each of the substrates causes a transfer of heat to the source gas and subsequent decomposition of the source gas. This provides intermediate reaction products and deposition of the desired film constituents on each of the substrates 50. The chemistry of the decomposition reaction depends upon the type of film to be deposited, and is generally known for HCVD systems. For example, the chemistry involved in the deposition of amorphous hydrogenated silicon by HCVD is described in the aforementioned technical article by B. A. Scott et al which appeared on page 6853 of J. APPL. PHYS., 54 (12), December 1983. The apparatus of FIG. 5 provides independent control of the gas phase chemistry and the substrate surface chemistry. The source gas can be pre-heated to a particular temperature or brought into the reaction tube 48 at room temperature. The function of the carrier gas is to provide heat to the source gas to decompose it in a region very close to the substrates 50. In this manner, a very steep thermal gradient is provided between the hot gases and the cold substrate (which is generally several hundred degrees C colder than the hot gases) in order to avoid the problems encountered in prior HCVD systems.
For ease of illustration, the usual pumps, valves, and other equipment typically used in HCVD systems are not shown in FIG. 5. One of skill in the art would be aware of the various components used in HCVD processing.
As noted previously, the carrier gas has as its main function the transfer of heat to the source gas and for this reason can be an inert gas which does not decompose or adversely participate in the reaction to decompose the source gas. This provides an extra clean system and eliminates the formation of particulates in the reactor and the contamination of the deposited film. In the practice of this invention, the hot carrier gas can provide all of the thermal energy necessary for the decomposition of the source gas, or the source gas can be thermally biased to a temperature less than its decomposition temperature prior to entry into the reactor 48. Still further, this type of apparatus provides an easy way to uniformly heat the carrier gas to a desired temperature.
In the injector 10 shown in FIG. 1, the reactive source gas (pure, or mixed with diluent) is injected into the hot flowing carrier gas stream, and the two mix by both diffusion and convection. Full mixing will occur within approximately 0.12 cm or more below the source ring 32, depending upon gas pressure. If the reactor is used to deposit silicon from a gas such as silane, for example, the silane (SiH4) partial pressure should be less than the homogeneous nucleation threshold. Values of this parameter can be found in the literature, for example, in Eversteijn, Phillips Research Reports 26, 134 (1971). For most common operating ranges, e.g., inert (carrier) gas pressures are 1-760 Torr, and growth temperatures Tg are between 500� C. and 1200� C. The reactive source gas is injected at pressures from 10-4 -10 Torr (or more) and at room temperature. Of course, the source gas can be biased to a temperature just below its pyrolysis temperature and then decomposed when it is intermixed with the heated carrier gas. In this case, the carrier gas would not have to be heated to such a high temperature.
In FIG. 1, the nozzle opening 26 has an inside diameter of approximately 1 mm. The source ring 32 has an inside diameter of approximately 1mm or greater, while the outside diameter of the source ring 32 is not critical. If more than one injector 10 is used, as illustrated in FIG. 3, this will dictate the outside diameter of the injector.
The distance d2 from the source gases to the substrate can generally be between 0.5 and 10 cms. These values are dictated by the number of injectors used in the HCVD system (which is a function of the area to be covered) and by thermal equilibrium distances. Such distances are well known in the art and reference is made to S. W. Benson, Foundations of Chemical Kinetics, McGraw-Hill, New York (1960). In a typical condition, the injectors 10 would be separated by approximately 2 cms and the source ring-to-subtrate distance d2 would be approximately 2 cms.
Some typical operating conditions for HCVD in accordance with the present process using any of the structures shown would be the following:
Inert carrier gas--helium
Carrier gas temperature--850� C.
Carrier gas partial pressure in the reactor--10 Torr
Reactive source gas--silane
Source gas partial pressure in the reactor--100 millitorr
Source gas temperature-room temperature
Partial pressures are achieved by regulating the flow of source and carrier gasses.
As mentioned previously, the carrier gas can be any gas and is preferably an inert gas which does not decompose and produce contaminants in the gas stream delivered to the substrate. Suitable inert gases include He, N, H and Ar. Under certain conditions SiF6, and SiF4 can be used. For the deposition of silicon films, silicon containing gases such as SiCl4, SiCl2 H2, Si2 H6, Si3 H8 (and other higher order silanes) can be used for the source gas, in addition to silane.
While it is desirable to have the carrier gas be an inert gas, it is also possible for the carrier gas to carry a constituent which is necessary in the deposited film. For example, the carrier gas can also include NH3 while the source gas contains Si, if it is desired to deposit a silicon nitride film. Correspondingly, oxygen can be added to the carrier gas stream if it is desired to deposit a silicon oxide or silicon dioxide film.
While silicon semiconducting films have been mentioned as suitable films for deposition by this technique, other semiconductors can be deposited provided that volatile reactive gases containing the requisite elements are used as the source gas. For example, GaAs can be deposited from Ga (CH3)3 plus AsH3 injection. Any film which can be prepared by present CVD techniques can be prepared by this improved HCVD technique. In addition, because of the advantages of the present technique, it may be possible to prepare high quality films of materials which have not been successfully prepared by previous CVD techniques.
This improved HCVD technique makes possible the preparation of insulating and passivating layers on substrates which are not able to tolerate conventional high temperature processing. Examples include silicon oxides and silicon nitrides of various stoichiometries which may be deposited from silane/nitrous oxide-oxygen or silane/ammonia mixtures, respectively, at temperatures as low as room temperature. Since the substrate temperature can be decoupled from the gas phase temperature, and since gas phase source decomposition is used to create the intermediate species required for film formation, the substrates do not have to be heated to dissociate the source gas.
This improved HCVD technique can also be used to produce films on materials having dissimilar expansion characteristics. An example is self-supporting membranes of silicon nitride on silicon, as are used in the preparation of x-ray lithography masks. An obstacle to the preparation of these membranes in conventional CVD processes is the need for substrate temperatures of 600�-700� C. These substrates are then cooled to room temperature. When a hole is etched in the silicon substrate from the back to create a free-standing window of silicon nitride, the nitride film cracks due to intrinsic stress induced as the sample/film sandwich is cooled down. This problem is eliminated when the deposition of nitride is on a relatively cool silicon substrate, which is possible in the HCVD technique of this invention. Additionally, it will also be possible to control stress using the present technique, in order to generate uniform curvatures of substrates.
The present technique can be used to deposit both epitaxial silicon and polycrystalline silicon. Using the reactor designs and technique of the present invention, active etchant species can be generated from a thermally excited gas source, independent of substrate temperature, and can be used to pre-clean the silicon surface while substrate temperatures will not exceed the minimum temperature required for eiptaxial growth. This eliminates the prior art need for silicon epitaxy being carried out with high temperature steps (exceeding 1100� C. These previously used high temperatures are required to remove silicon dioxide as well as other contaminants from the silicon surface prior to deposition. Using the present invention, however, allows epitaxy to be performed on a clean substrate surface at temperatures ranging from 600� C. up to approximately 1000� C.
While the invention has been described with respect to preferred embodiments thereof, it will be apparent to those of skill in the art that variations can be made therein without departing from the spirit and scope of the present invention.
Patent Citations
Non-Patent Citations
Referenced by
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iittala Teema 12.5 oz. Soup and Cereal Bowl
iittala Teema 12.5 oz. Soup and Cereal Bowl
Weights & Dimensions
|Product Type: Cereal bowl; Soup bowl
|Material: Porcelain
|Number of Items Included: 1
|Non-Toxic: Yes
|Lead-Free: Yes
|Formal or Casual: Casual
|Shape: Circle
|Pattern: Solid color
|Oven Safe: Yes
|Stove Safe: No
|Microwave Safe: Yes
|Dishwasher Safe: Yes
|Refrigerator Safe: Yes
|Freezer Safe: Yes
|Food Safe: Yes
|Stackable: Yes
|Handles: No
|Utensil Included: No
|Lid Included: No
|Tray Included: No
|Capacity: 12.5 Ounces
|Commercial Use: Yes
|Eco-Friendly: Yes
|Product Care: Dishwasher Safe
|Country of Manufacture: Finland
Questions & Answers (3)
"Hello, what is the height of this unit?" asked by Jen
"Hello, can you confirm the dimensions of this bowl?" asked by Duran
"Hi, what is the volume capacity of this bowl?" asked by Sharon
Still have questions about this product? We're here to help
iittala Teema 12.5 oz. Soup and Cereal Bowl
About the Designer
Kaj Franck Finland (1911 - 1989)
Born in Vyborg, Finland, Kaj Franck is described as the conscience of Finnish design. He removed everything excessive in his designs, leaving only the essentials. Kaj Franck has been awarded a large number of Finnish and international awards and prizes and his work has been displayed at a range of design museums around the world. Some of his most famous objects are the teema tableware and the glass series kartio.
About the ManufacturerIn the quiet north, there is a country that specializes in aesthetics and functional design. In Finland, in a town called Iittala, style and high quality are traditions that remain relevant for generations to come. Whenever an object is produced in the iittala factory, it has to feel, last and work like iittala. The tactility and high quality of the materials can be felt with your bare hands. Objects like that, will work anytime, anywhere with anything. Objects like that will never be thrown away.
|5 star
|4 star
|3 star
|2 star
|1 star
Iittala dishes
Judy from Valley Center, CA– Verified Buyer
These dishes are just what I hoped they would be. Beautiful color and very sturdy. Arrived quickly and packaged very well. Great company to buy from. Highly recommended.
Beautiful Bowl
Barbara from Middleton, WI– Verified Buyer
Perfect size for fruit, desserts, small salads.
I love it
SUNHWA from Carson, CA– Verified Buyer
Practical size.And beautiful with soup., cereals,little friuts.I love ittala
Form and function
Joan from Croton on Hudson, NY– Verified Buyer
This is a bowl I use daily. I love the shape and size and quality. Buy without reservation.
Perfect Sized Bowl
John from Washington DC– Verified Buyer
Really great bowl - perfect for stacking and just the right amount for cereal, soup, and much more!
Perfect shipping
Isabelle from San Juan, PR– Verified Buyer
We love our new Teema dinner ware and it came fast and in perfect condition.
love ittla
yeujung from houston, TX– Verified Buyer
perfect size and shape. versatile for every use. great for soup and cereal
Beautiful quality & styling
JoanAdria from New York
I purchased two, and would have bought more had they more capacity. I think they are better suited for vegetable side dishes than cereal. The color is a great off white...just what I expected. The styling is perfect.
Great bowl!
Jay from Boston, MA
I use this bowl for cereal and ice cream. It is dishwasher safe, very functional, and looks great. I love it!
Portion control bowl
zena from connecticut
Finally the right size...I use it for fruit, cereal, a small portion of everything...
OUR SKU # IIT1172Teema 12.5 oz. Soup and Cereal Bowl is also sometimes listed under the following manufacturer numbers: TB05173, TCG016717, TK007274, TPG016230, TT016254, TW07247


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Great product at a good price. I love it, smells amazing.
Love Dr Bronner products, always use
Very nice product
I am very pleased with all the products I have purchased this time and they are brilliant on my skin and the delievery speed of Feelunique is very fast.
No complaints about BO from my partner so far.....
Great smelling product and lathers well.
Great, very efficient service
very good
OK, but not as good as I was expecting
Ratings Guide Read about our product rating system


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Big 12 Sports
Here's your chance to share your opinion and views on Big 12 football and other sports.
Tech guard Josh Gray announces he's transferring to Odessa JC
Texas Tech guard Josh Gray has announced by his Facebook account he will be transferring to Odessa Junior College. Gray, a 6-1 guard from Lake Charles, La. who finished his high-school career at Houston Wheatley, averaged 9.3 points and 3.2 assists in 31 games last season for the Red Raiders. Late in the season, Gray […] [Read More]
Griner acknowledges she's a lesbian; says 'be who you are'
Former Baylor basketball standout Brittney Griner has made history as the greatest women's basketball player in the history of the Big 12 and maybe in the sport's history. Shortly after she was selected as the No. 1 pick in the WNBA draft by the Phoenix Mercury earlier this week, Griner acknowledged that she is a lesbian. Griner […] [Read More]
Playful Self jabs Johnson about his ISU scoring binge
Kansas coach Bill Self hasn't forgotten a ruckus he got into after the Jayhawks' wild overtime victory at Iowa State earlier this season. Elijah Johnson sparked the Jayhawks' comeback victory in that one with a 39-point effort that was the largest by any Big 12 player this season. Iowa State fans haven't forgotten the last […] [Read More]
Snyder: Money-driven college football is "in a bad place"
Kansas State coach Bill Snyder is one of the wisest men in all of college football. So when the veteran coach speaks about a variety of subjects, people in the business take note. That's why his recent comments on the financial priorities of his sport carry so much weight. While talking to the Kansas City […] [Read More]
Marcus Smart appears headed back for another season at OSU
Marcus Smart has always joked that he's an unconventional player. It's true you don't find many 6-foot-4, 225-pound point guards with his skill set. His bulky but athletic presence on the court has led some to compare him to legendary NBA player Oscar Robertson for what he provides the Cowboys. And Smart appears ready […] [Read More]
Big 12 shut out from very best Texas-based hoop prospects
Texas is supposed to be the heart of Big 12 recruiting. And in most sports, it is. But the very best Texas-based high-school basketball players are surprisingly avoiding the Big 12 in this recruiting season. Rivals.com released its top 150 players over the weekend. And surprisingly, none of the six Texas prospects in the top […] [Read More]
Snyder, Patterson, Briles, Gundy ranked among Athlon's top 15 college coaches
It's always been a fun discussion point where the top college coaches are ranked for their skills in directing teams and building programs. Athlonsports.com took this to an intriguing, thought-provoking level by ranking all 125 FBS coaches. Some of the results were surprising and enlightening. Here's a look at Athlon's top 10 coaches: 1. Nick […] [Read More]
Allen's move to Syracuse a little surprising
Former Alamo Heights quarterback Drew Allen has decided to leave Oklahoma for Syracuse. In a way, it's a little bit of a surprise. Allen looked at Big 12 schools like Oklahoma State and Kansas State and others including Purdue and Colorado before deciding on the Orange. Because he has already graduated from OU, he will be eligible to […] [Read More]


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I think she would hurt me.
I don't need No stinking signature.
That was real nice. Is she warming up in london?
I don't think i could catch that one.
Dead Bears, the only good kind.
OK I give up where is she hiding the holster...must be a flash bang
Don't question my right to own a gun and I won't question your stupidity not to.
You give Peace a chance, we will cover you if it doesn't work out.
I've watched that video about 50x since the weekend ..... gets better and better every time
Member: NRA GOA
Est sularas oth mithas
"either way, you were guilty by association, so you were smited...." JD
I hope I shall possess firmness and virtue enough to maintain what I consider the most enviable of all titles, the character of an honest man.
~George Washington
Oh. My. God!!!
I have a new favorite track athlete! She is AMAZING!!
Forum reward for who ever uncovers her hidden sex tape or amateur nude pics!!


text:
Posts filed under 'Cricut'
A new free font for stand up lettering
Several years ago, the gift packaging project pictured below was posted on Martha Stewart's site.
It's no longer there, but it continues to live on via Pinterest and gets circulated in the various craft groups every so often. When it first appeared, I started working on a font to make it easy to create these stand up letters with a digital diecutter. Soon, however, new features like the eraser tool were added to our diecutting software that made a specialty font unnecessary. But now that Cricut Design Space has hit the scene, I'm dusting off some old resources that can be really useful given its limited feature set. And this one is a time saver no matter which software you use.
So meet the font that I'm calling Top College (because it is a college style slab serif with its bottom missing)…
Download Top College here (If you like it, I'd appreciate a pin, a tweet or a mention in your favorite diecutting group)
To use Top College in your diecutting software, simply type. All of the letters are upper case, but when you use upper case on your keyboard, you get letters with score marks and when you use lower case on your keyboard the letters will appear without score marks. This way you can decide which works best for your project. To use, simply type. If you want the letters to stand up from the top of a downward folded card, be sure to position the base of the text so that it rests on the vertical center line of your card as shown here.
I should mention that this font has very thin lines that will seem to disappear in pull down menus, so you may have to locate it by typing into the search box instead of scrolling.
And because no one likes single layer text (and Top College font can't be offset properly), I designed it to work as a background/mat/shadow for a thinner font called CollegiateInsideFLF. The companion font is widely available online but I'm including it in the download package for your convenience. Be sure to type in all caps when using CollegiateInsideFLF. You will have to isolate letters and use the arrow keys to correct the spacing in Cricut Design Space, but it will line up perfectly in other programs as long as the font size and character spacing settings are the same as the Top College layer.
Here are some samples I put together to show you how Top College works with and without CollegiateInsideFLF. At the back is the corner of what I envision as a placemat, with the stand up portion used as the shadow for the blue letters cut from the companion font. In front is a ribbon that I split and inserted the strip of cut letters through. (This allows you to have a ribbon that is longer than your paper.) And my favorite is the black placecard, made by drawing the companion font with a sketch fill using a metallic pen in Silhouette Studio, and then cutting the unscored version of Top College from the center of the card. I can't wait to see your projects.
Here's a video where I show how to use Top College in Cricut Design Space and Silhouette Studio.
If you don't know how to install fonts in Windows, click here and for Mac, click here.
More on Samantha
The most popular lady in all of Font Land, Samantha, is still on sale and continuing to generate lots and lots of buzz, and questions.
I have spent a lot of time fielding your questions and finding the best procedures, so here is the latest info our lady Samantha (and all of her specially PUA-encoded friends from Laura Worthington, Debi Sementelli , YellowDesign and Stephen Rapp.)
Where's the best place to get Samantha?
The best place to buy is Mighty Deals, when it is for sale there it is deeply discounted.
Which package should I buy?
$17 Upright includes Upright Regular version of font plus matching alternate characters (with swirls), ornaments and catchwords
$17 Italic included Italic Regular version of font plus matching alternate characters (with swirls), ornaments and catchwords
$37 package includes Upright Regular, Upright Bold, Italic Regular and Italic Bold plus matching alternate characters (with swirls), ornaments and catchwords for each of those four versions
$55 package includes Upright Regular, Upright Bold, Italic Regular and Italic Bold plus matching alternate characters (with swirls), ornaments and catchwords for each of those four versions plus the versions you need if you are a web designer serving live type on the web. If you don't know what web fonts are then you do not need them.
Can't you just recommend something?
If you use the Cricut Explore, I recommend the $37 package so you will have the bold versions. (no offset in Design Space, boo)
If you have the free version of Silhouette Studio, I recommend the $17 Upright version and the $17 Italic version. You can "bold" your fonts with the offset feature.
If you have other cutting software, I recommend the $17 Upright version. You can "bold" your fonts with offset and "italicize" them with the shear tool.
Are these OK for commercial use?
Yes, these fonts are also licensed for use on items diecutters typically sell (words and phrases, not individual characters). For licensing details please see Laura's FAQ's.
How do I install them?
Unzip the folder and double click on the font file you want to install. Click the install button. You should see the fonts in the font list in your software the next time you open it or log on. You can find more specific instructions for installing fonts for your operating system in your computer's help.
Which fonts do I install?
Either OTF or TTF, not both. For Mac I recommend installing all OTF files. For Windows I recommend installing all TTF files. That is just what seems to be working best for me.
I installed 4 fonts but only see 2 listed in my software.
This is normal, regular and bold are combined from your computer's perspective.
How do I access the extra glyphs?
That depends on your OS and the software you want to use it in…
Windows Cricut Design Space
Windows Microsoft Word (including on to Cricut Design Space)
Click here for my video tutorial
Windows/Mac Adobe Illustrator (including on to Cricut Design Space)
Windows Silhouette Studio
Also please see this link for written instructions and a couple of corrections.
Mac Cricut Design Space
Mac Silhouette Studio
Windows SCAL 3, Mac SCAL4
Also please see my last blog post about SCAL here
Mac – other programs
I'm using Windows Character Map, but the glyphs are so small.
Here are some ways to see them better
Use Nexus Font's character map instead – Written tutorial from Paper Moon Snippets
Use Microsoft Word instead – video tutorial by me here
Use the Magnifier – Written tutorial from Under A Cherry Tree
I found the Private Use Area but it is empty.
You likely have an earlier version of Samantha and need to email designer Laura Worthington (hello at LauraWorthingtonType dot com) with your receipt so she can send you the latest version
I get an error in Cricut Design Space on my Mac when I select Samantha.
This is a bug in Design Space affecting Samantha Italic. Workaround is to wait it out, then choose Italic from the style menu and proceed. And/or email designer Laura Worthington (hello at LauraWorthingtonType dot com) with your receipt and ask her for the split version
It sounds so complicated.
Samantha is an advanced font that requires advanced techniques but yields advanced results. I recommend that anyone who is apprehensive download Milkshake, which is a free font by the same designer. It has a limited number of alternate characters but enough that you can practice the steps that are needed.
Can I download it to more than one computer?
Yes the license allows for one person on up to five workstations.
How can I print out all the characters?
There is a PDF for that here.
How can I get access to the special characters on my iPad?
You will need 2 additional apps to access the special characters in Samantha in the Cricut Design Space iPad app. One called AnyFont that lets you install fonts on your iPad. The other app called Unicode Character Viewer to let you access the special characters.
I am having trouble using Samantha in Cricut Design Space since the 2.0 update. Any advice?
Try this sequence: Click to make a new text box, type some dummy text from the keyboard, change it to Samantha. If it will not let you change the font, click on the mat and back onto the font box to re-select it and try again. Once you have Samantha selected, paste in your characters from Character Map, Font Book or whatever you use to access the alternates.
The characters I copied, don't match the ones I pasted.
If the characters don't match what you copied, try different versions/styles of Samantha (bold, bold italic, etc) because they have to match or you can get the wrong characters.
Sure Cuts A Lot ups its game
If you haven't taken a look at Sure Cuts A Lot lately, it might be time. There's especially good news if you are…
… a font lover
with Windows (as of v4.008 works in Windows and Mac)
…. a Brother Scan and Cut owner
…. a Pazzles Vue owner
…. or an iPad or Android tablet user
Craft Edge has released both Sure Cuts A Lot 4 ( $59.99 new or 19.99 upgrade for registered SCAL users) and the Sure Cuts A Lot app in recent weeks.
SCAL4 has lots of new features including easy alignment, a stencil tool and conical warp, but the best one, in my opinion, was not announced. You can now get to all the characters in fonts like Samantha and Cantoni (PUA encoded) from the SCAL4 font palette. This makes SCAL4 the very best option for diecutters looking to use these advanced fonts, since a click of the mouse brings each character onto your mat in proper proportion as editable type.
Unfortunately, for now this only works on the Windows version. (Please let email@example.com know you'd like the Mac version to support extended character sets, too.)
We were heard! Thanks for adding your voice and thanks, Craft Edge, for responding so quickly! Here's a video on this
Brother Scan and Cut owners will be happy to know that SCAL4 can export to Brother's native .fcm format!
While you can't cut directly from SCAL4 (or any other software including Brother's) to a SnC, you can design anything you like, or import an existing SVG, export it to a thumb drive and cut without going through their cumbersome Canvas web app. SCAL4 can cut directly to a large number of cutters including the Pazzles Vue. Actually so can the latest version of SCAL3, I'm just late figuring this out.
While you won't find Cricut Explore on this direct cut list, SCAL4 is a great companion to the Explore because it can export to SVG for vector upload into Design Space. In addition to designing from scratch, SCAL4 can import .ai, .eps and vector .pdf files and convert them to .svg. SCAL4's line fill effect is also helpful for creating write files with letters and shapes you want the pen to color in.
SCAL's tablet app (9.99 via Apple's App Store or Google Play) allows you to design for any cutter offline (away from the cutter and from the internet) and then transfer your designs to your computer to cut. If you also have SCAL4 desktop you can control it from the app to be able to cut from the tablet to supported cutters like the Cameo and Vue. Here's a first look at the SCAL app from Rob at Scrappy Dew.
Cricut Explore vs Silhouette Cameo – Which is right for you?
There has been a deluge of biased information out lately comparing the Cricut Explore vs the Silhouette Cameo but the truth is the systems are very different, each with strengths and weaknesses and neither is a slam dunk for everyone. As the holiday rapidly approaches, which should be on your wish list? Let me try my best to give you some objective guidance.
First let me get the similarities out of the way. Both can cut vinyl or card stock to the level of precision and accuracy quite suitable for the typical to advanced crafter. (Cricut-commissioned tests do show the Explore with a slight lead in accuracy.) Both can cut the fonts on your computer or downloadable in TTF or OTF format as well as images in their own native formats. Both allow you to import and vectorize your own images from jpg or png format. Neither allows their proprietary digital content to be exported to another vector format.
It's difficult to compare the digital subscriptions head to head because they are quite different. Keep in mind that with a Silhouette subscription you are *purchasing* image licenses, whereas with a Cricut subscription you are *renting* them. When your subscription ends (or if a company goes out of business), you walk away with nothing from Cricut, whereas the Silhouette image licenses are yours to keep.
It is also difficult to compare individual image purchases. You can purchase some image sets or individual images from Cricut, as well as purchasing/linking cartridges available at varying prices. The actual amount you pay for a Silhouette image varies widely depending on how much you pay for your subscription or download card, but is usually much less than advertised if you shop wisely.
As far as ease of use, I'm unimpressed with both companies' current options. Cricut's carefully designed user interface is marred by frequent errors, freezes and crashes brought about by their unfortunate choice to make Design Space browser based and built on Flash. You won't have to learn many design options, but you will have to learn to install multiple browsers, to delve into their detailed settings, and to clear their caches, sometimes multiple times daily.
I thought Silhouette Studio v2 had a great balance of power and ease of use, but then came V3, and a lot of disappointment. It added meager new features but disproportionately more confusion, making it not so easy to use any more (V2 is still available but not fully compatible with the newest Cameos). Cricut Design Space and Silhouette Studio are free, so I encourage you to load them both and try your hand at some design and printing tasks representative of your needs before you make a machine purchase.
Now, below I've listed some key differences you want to be aware of in light of your own specific needs…
Things you can do with a Cameo that you can't do with an Explore
-Design or cut without an active internet and server connection
-Cut (vinyl or other backed materials) or draw/write without a mat
-Create your own designs from scratch using built in shape tools, freehand tools, line styles, alignment, etc.
-Add a fully adjustable offset (shadow) to any text or image for cutting, for print and cut or for draw/write and cut.
-Cut larger images or designs without tiling (see size chart below)
-Print and cut larger images (see size chart below)
-Cut images out of preprinted media such as fabric, giftwrap, stamped media or commercial greeting cards (requires optional PixScan mat $14.95 MSRP, street price $12.00)
-Print purchased or original designs in high resolution (for print and cut or to create printables, Silhouette default 600 dpi, Cricut estimated max 100 dpi)
-Backup all of your designs (purchased or created) to your own hard drive or other local media and/or to the cloud service of your choice
-Cut without a computer (previously saved files via SD card in the Cameo 1 or USB stick in the Cameo 2)
-Cut/draw complex paths of over 3000 nodes
-Import SVG sets at their correct relative size (requires software upgrade MSRP $49.99, street price $30) Update: Cricut Design Space 2.0 seems to be importing SVGs from Adobe Illustrator at the correct size, but not others.
-Cut directly from 3rd party software such as Make the Cut, Sure Cuts a Lot, Adobe Illustrator or Corel Draw (3rd party software must be purchased, AI and CD require the Silhouette Connect module as well MSRP $49.99, street price $30)
-Roll feed vinyl (optional feeder MSRP $39.95, street price $35)
-Precisely place cuts with respect to the page or mat
-Cut or write on media that is up to 15 inches wide
-Combine elements from existing files via copy and paste
-Easily draw, cut or score the same file with different settings for each layer or pass
Things you can do with an Explore that you can't do with a Cameo
-Write and cut without pausing to exchange pen with blade
-Adjust all material settings including blade depth with a single dial
-Cut thick/dense/tough media like shrink plastic, craft foam and aluminum (may require optional deep cut blade/housing MSRP $29.99, street price $18 and strong grip mat MSRP $14.99 street price $9)
-Cut wirelessly (requires optional bluetooth adapter MSRP $49.99, street price $30 and Bluetooth compatible computer )
-Cut and score without pausing to exchange blade with scoring tool (optional scoring tool MSRP $8.99, street price $5.40) or to adjust blade depth. (I list this reluctantly, because the score pressure can not be controlled independently of the cut and you can not set up a separate file of just the score lines to work around this. Cut and score is somewhat disappointing as it stands now).
-Legally cut Disney images for personal use (purchase of cartridge/image set or individual images required, price varies)
-Cut SVG files out of the box (I list this reluctantly, as Design Space's SVG support is spotty at best. I've been unable to use many of the SVGs I had hoped to)
-Use non-licensed content on items you sell without purchasing an additional license (all items in the Cricut subscription are included in Cricut's generous angel policy)
-Cut ready-made projects with just a few clicks (some projects are free, most must be purchased)
-Cut from an iPad 2 or later (requires optional bluetooth adapter MSRP $49.99, street price $30, and, of course, an iPad).
-Automatically add a bleed zone to a print and cut image
-Quickly turn a layered OEM cut file into a print then cut
-Design with all library images from any internet connected computer without having to purchase the images first
-Edit an existing file of yours from any internet connected computer
There are few cases where the choice is obvious
For instance…
If you prefer to cut ready-made designs with as little effort as possible, then the Explore is for you
If you want to be able to cut metal, shrink plastic or other heavy materials, the Explore has the higher pressure you will need. (However, if pressure is your main consideration and you can afford to pay more, there are other options, such as the Pazzles Vue, that have even more pressure as well as better software and cutting size options)
If you have a ton of Cricut cartridges, you will probably want to stick with Cricut. Likewise, if you own a lot of Silhouette store files, you will likely want to stick with Silhouette
If you want a machine for print and cut invitations, the Cameo is the clear choice because of the size and resolution limitations of Explore's print then cut
If you do primarily vinyl projects, the Cameo is better suited for vinyl work for a number reasons. (ability to cut without a mat, cutting length up to ten feet, optional roll feeder, ability to more easily add weed lines, better typographic support including text wrap, etc.)
If noise is a concern, the Explore is a significantly quieter machine.
If you rely on your cutter for a business, the Explore simply can not be your only machine because internet or server interruptions will bring you to a halt. I would also consider the lack of content control to be a major concern for business owners.
If you already have one, ask for the other. Then you will have the best of both worlds. :)
Print and Emboss and Tutorials
Note: I am no longer distributing templates so as not to infringe on Darice's new Terms of Use.
Earlier this year, I reintroduced the "print and emboss" concept but seemed to stir up more bewilderment than anything else. So I'm uploading the first 2 parts of a 3 part tutorial series. (Don't worry they are both short.)
Part 1 of the tutorial series shows how to use the template to create a customized printout to match the corresponding embossing folder.
Part 2 of the tutorial series shows how to line up the printout with the folder and emboss it.
Part 3 of the tutorial series shows how to create your own templates
Making the most of Dafont.com
Most everyone knows you can download awesome free fonts at Dafont.com, but it's got some other features you may be missing out on. Here's a list of some cool things you can do at Dafont besides downloading:
1. Preview fonts with your own text
2. Customize the size of the text and number of fonts per page
3. View different cases of your preview text
4. View/download a character key
5. View all the variants of a font
6. Filter for commercial use OK fonts
7. Find fonts by the same designer
8. Find fonts in the same category
9. Browse fonts by category
10. Browse fonts by designer
11. Filter for foreign features
12. Create your own categories
13. Learn how to install fonts
14. Get help identifying a font
15. See the newest uploads
16. Sort by popularity, name or date
Take a look at my Robots category for an example.
Character map template for Silhouette Studio
A while back, I posted Character Map templates for Inkscape and Adobe Illustrator. The purpose of these is to make it quick and easy to make a one page reference map of the main glyphs in a given font, especially dingbat fonts. Today I'm adding a Silhouette version to the lineup.
You can download the .studio template here, download the .studio3 template here and instructions are in the margin of the file, but here's a quick rundown. As with all my templates, I recommend you store them on your hard drive instead of your library and that you always work from a duplicate. An easy way to do this is to Save as and rename the file as soon as you open it.
Once you've opened a duplicate template, click anywhere in the middle of the page. You'll see a bounding box to indicate that the grid is selected. Click the A button at the top of the screen (not the A button on the side of the screen).
Select the font you want to map from the scrolling list on the right. You should see the characters change to the new font's. Label the page by typing in the name of the font into the text box provided at the top of the page. This is optional, but will help you remember which font you are looking at.
Here's what a completed page looks like for my 09kutups font.
You can print the page, print it to PDF or just glance at it temporarily for reference. If you want to be able to use the characters after you uninstall the font, click the center of the page again to select the characters, choose Object>Convert to Path, then save the file.
And if you want some suggestions for great dingbats for cutting, here's a great place to start. Ten Great Dingbats for Diecutting


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Was £30.00
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Black aluminised steel deep roaster and rack
Item No.3310199524
From the Raymond Blanc range by Meyer comes this deep roaster and rack set. It is a durable, professional quality roasting essential with an ultra conductive heavy gauge aluminised steel body, a reinforced wire rim and an extra strong non-stick coating.
This item is available for
UK Home Delivery Free (UK orders over £30) or £3.99
Delivered within 4 working days
Next or Named Day Delivery
7 days a week between 8am - 6pm
Monday to Friday - order by 7pm - £4.99
Saturday & Sunday - order by 6pm - £4.99
Next or Named Evening Delivery
7 days a week between 6pm - 10pm
Monday to Sunday - order by 10pm - £6.99
Collect from store the next day - FREE
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Full Delivery details
- Heavy gauge aluminised steel for exceptional heat distribution
- Reinforced wire rim for outstanding strength and durability
- Superior non-stick for easy food release and cleaning
- Oven safe up to 240 C / 475 F / Gas Mark 9
- Lifetime guarantee
- HWD: 41 x 32 x 13 cm


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Membership Dues - Megamenu block
Membership Dues Increase
Important Letter from the CoSN Board of Directors
For K-12 education technology leaders, earning the CETLTM certification will demonstrate to your staff, superintendent, and other stakeholders that you have mastered the knowledge and skills needed to define the vision for and successfully build 21st century learning environments in your school district.
View our directory of Certified Education Technology Leaders or download a printable description of the CETL program for more information. You can also Email Us or call (202) 470-2780 with any questions!
The CETLTM certification exam is based on The Framework of Essential Skills of the K-12 CTO, which is the body of knowledge defining the skill areas critical to today's education technology leaders. The Framework is divided into three primary areas:
Under each of these areas, the Framework further identifies specific responsibilities and the knowledge needed to perform these responsibilities in order to be a successful CTO in today's educational environment. All questions on the exam are tied to the Framework.
What are people saying about the CETLTM?
John Vaille, Chair, Certification Governance Committee
Generous support provided by:


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Homicides In Allegheny Co. Keep Pace With City For 2nd Year In A Row
Gun violence is spreading throughout Allegheny County's suburbs.
5 In Custody After Chase Through Several Neighborhoods
Five people are in custody after a police chase this afternoon through the Swissvale, Homestead and Munhall areas.
Munhall Woman Attacked While Taking Out Trash
A Munhall woman was taking out her trash in the middle of the afternoon when she says she was beaten and robbed. One of the two suspects is in custody, but the other is still on the run.
Munhall Woman To Receive Come Back Award After 2010 Accident
In July of 2010, a Munhall woman's life was changed when she was hit by a car less than a mile from her home. Tonight, she will be receive a big honor.
Police Probe Reported Shooting In Munhall
Munhall Police combed a park for evidence Saturday evening after a reported shooting.
Allegheny County D.A.: Munhall Homeowner Won't Face Charges In Shooting
The Allegheny County District Attorney says the Munhall homeowner who shot and killed an intruder last week will not be facing any charges.
Munhall Homeowner Shoots, Kills Intruder
Police say a homeowner shot and killed an intruder early Tuesday morning in Munhall.
Multiple Projects Close Munhall Road
Munhall Police blocked off a stretch of Homestead-Duquesne Road, while a construction crew installed a 12-inch water main.
Munhall Fire Forces More Than A Dozen People From Their Homes
More than a dozen people were forced out their homes Tuesday morning due to a fire.
Munhall Motorist Caught On Camera Hitting Car And Leaving Scene
Sunday around 1 a.m., a motorist thought he could get away with hitting a parked car on Main Street in Munhall and keep moving.
Police Searching For Stolen Munhall Softball Money Suspects
Munhall Police are investigating a theft at a concession stand at Woodhill Park. The money, which belongs to the Munhall Girls Softball Association, was stolen last week.
Police Find Firearms In Munhall Home After SWAT Incident
Police say that 74-year-old Bernadette Scholl was shot in the head and found lying on a bed in the living room of her Munhall home Thursday.
Man In Custody After SWAT Situation, Fatal Shooting In Munhall
A man is in custody after the SWAT team was called to a home in Munhall Thursday morning.
Munhall Council Votes To Revoke Strip Club's Occupancy Permit
Munhall Council on Wednesday night shut down a controversial strip club following at least two shootings there and numerous complaints. But this may not be the final dance for Club Pink.
A Munhall City Councilman is calling for the closure of a strip club following a fatal shooting early Sunday morning.


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Google Loses Santa To Bing 153
from the who's-been-nice-to-whom dept.
We've improved Slashdot's video section; now you can view our video interviews, product close-ups and site visits with all the usual Slashdot options to comment, share, etc. No more walled garden! It's a work in progress -- we hope you'll check it out (Learn more about the recent updates).
The mayans predicted the disaster that is Apple maps. The end of the era is due to Santa using his iPhone to navigate and strays into NK airspace, being mistaken for a US spyplane and swiftly shot down.
It has made Santa very mad that he has to specify the pictures he is looking for... naughty or nice...
And that's why no presents, he got lost.
"No presents this year, little Timmy. Also, I just got off the phone with the Australian Authorities who said they found Santa dead in Murray Sunset National Park [slashdot.org]. Unfortunately it looks like Santa had a new iPhone for navigation and was forced to eat eight of his reindeer. Then there was apparently a struggle between him and the last reindeer. After several blows, it broke free and eventually flew off to leave Santa to bleed out in the dirt from gory antler wounds. These are sad times but we still have each other, just no more frivolous Christmas gifts -- ever again!"
*walks away nipping on a fifth of bourbon*
NORAD, using Microsoft products... Well, at least we know how the world ends.
The correct question is "Who's Bing?", and the answer is that he starred in White Christmas with Danny (effin) Kaye, so using Bing is entirely appropriate.
"We got a Red Sleigh down, we got a Red Sleigh down!"
All so it can be viewed by Bings non existent users.
Ironically, while the initial problem and police warning got a lot of press coverage, neither the fact that Apple fixed their directions by the very next day [technobuffalo.com]
Good news! The courier sent to deliver that press release has been found. You'll never guess what happened....
My guess is MS made an offer ($$) that Santa (NORAD) couldn't refuse.
Yes, Virginia, there is a Santa Claus. But he's just a ho (ho ho).
Easy - it's not Google.
As in: Bing Is Not Google.
No amount of careful planning will ever replace dumb luck.


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"A story that no one else wanted to tell."
If you live near ANY government facility that is surrounded by a fence, this is a MUST-read. If you live near any of the government facilities that are discussed - by name, this is an actionable-read.
Two criticisms:
1. The audio quality of the first 45 minutes (...or so) is sub-standard. Don't be discouraged by this: keep listening.
2. The ending could have included more detail about the blitzkrieg-cleanup of the buildings and soil.
P.S. The local-alternative newspaper she mentions is named Westword. It has a web site where archival issues can be viewed. About 10 years ago, they did an investigative series on Rocky Flats that is thorough and provides supporting data/viewpoints to Ms. Iversen's material
Report Inappropriate Content
If you find this review inappropriate and think it should be removed from our site, let us know. This report will be reviewed by Audible and we will take appropriate action.


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Ratings based on 63 Verified Reviews
They paid and stayed. We double-checked.
4.6 Room cleanliness
4.6 Service & staff
4.4 Room comfort
4.5 Hotel condition
They paid and stayed.
We double-checked.
We double-checked.
for Everyoneby A verified traveler
Posted Mar 8, 2015
Pros: Location
Very clean and comfortable room and amenities. Staff was very accomodating
for Everyoneby A verified traveler
LayoverPosted Jan 4, 2015
1 night stay before driving home. Clean, comfy and friendly
for Everyoneby A verified travelerfrom Casper wyoming
Posted Dec 7, 2014
Nice hotel only thing we found wrong is a used washcloth was hanging on top of the shower head
for Everyoneby A verified travelerfrom Portland, Oregon
Great access to FreewayPosted Nov 15, 2014
The hotel was very clean and comfortable ...The staff was very friendly and helpful . The location was easy to get to!!
for Everyoneby A verified travelerfrom Wisconsin
Very clean Hotel.Posted Nov 9, 2014
Pros: Clean and Comfortable!
Cons: Nothing. It was great.
Location: Casper. The miracle mile. Fishing
A very nice staff. They printed out directions to the miracle mile. Recommended restaurants. And most of all the room was CLEAN!
for Everyoneby A verified traveler
Good staff.Posted Oct 23, 2014
Staff was friendly and helpful. Bed was comfortable.
by A verified traveler
Posted Oct 23, 2014
Paper thin walls, bad bedding, smokey hallways. I would never stay here again.
for Everyoneby A verified travelerfrom Lander,WY
Traveling with petPosted Aug 29, 2014
Pros: Friendliness
Location: Close to Casper.. And a lot of great places to dine
Comfortable, very clean well kept pet area. Treated my pet like a King!!!
for Everyoneby A verified travelerfrom Cordelia, CA
Decent Hotel right off the InterstatePosted Aug 3, 2014
Visiting relatives in Casper, stayed here one night. Decent price, though rooms are a bit dated. No complaints and the breakfast was good.
for Everyoneby A verified travelerfrom Utah
Nice Hotel and Awesome staffPosted Jul 31, 2014
Pros: Cleanliness, room size and décor, quiet, and great staff.
Cons: Cell phone service is awful even with free Wi-Fi, and unable to access internet either.
Location: Location is a little drive from town but easy access. Alcova reservoir, the mountains, lots of restaurants and shopping.
This Hotel is away from the main hustle and bustle of in town noises and easy to access from the interstate, only takes a few minutes to get there. It is quiet, very clean and the décor in the room is calming and room is spacious. Good TV channel selection -that is important. The front staff is so friendly you feel very welcome. The housekeeping staff so honest--I left money as a tip each morning when I left to go do things and unless I left a note stating the money was for them, they left it lying there on the counter. Seriously this is my 4th time staying at this Sleep Inn and I will continue to select them when I am in Casper. The price is reasonable for the nice room, and the breakfast is great with a nice variety. The cell phone service sucks. Seriously. The Hotel does provide free Wi-Fi but even then my smart phone would not send messages, would not send calls or receive calls and unable to get internet. I did make calls home with the in room phone and was not charged for it so that was great.


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I've ordered several things from MJM Magic and have been more than happy with the service. Orders are sent quickly even using the free shipping. The...Read More ->
This was my first time shopping with MJM magic and I didn't know what to expect. My friend had no problems, and neither did I! The customer service...Read More ->


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Sleep Inn & Suites Auburn
Sleep Inn & Suites Auburn
Hotel Guest Rating: 7.6/10
135 Spirit Drive
Auburn, AL 36830
Hotel Freebies Available*
• Free Breakfast show dates
• Free Internet in Room show dates
• Free Parking show dates
Welcome to the Sleep Inn & Suites Auburn
A hot breakfast, high-speed internet access and private parking: they're all on the house at Sleep Inn & Suites Auburn off of I-85.
Hotel Features
The four-story hotel has 72 rooms that keep you connected to the outside world with free local calls and complimentary internet access. Work desks and coffeemakers provide everything you need for your temporary office. Mini-fridges and microwaves are among the pluses. A heated indoor pool with floor-to-ceiling windows means you can take a dip no matter what time of year. Served in the dining area, the free breakfast buffet always includes hot options like golden-brown waffles. There's also plenty of just-brewed coffee. An on-site guest laundry is a bonus for on-the-go travelers. Parking is free.
Hotel Location
A stone's throw from I-85, the Sleep Inn and Suites has an easy-on, easy-off location three miles south of Auburn University. The Auburn area is dotted by nature preserves like the 700-acre Chewacla State Park, located about two miles east. If you're traveling with the kids, Surfside Water Park is a mile south. Columbus Airport is 43 miles east, and Montgomery Regional Airport is 60 miles southwest.
Guest Favorites
With a "good location" that's "close to the interstate and the university," Sleep Inn & Suites Auburn has "comfy beds" and a staff that's "unusually helpful and friendly," say Priceline guests.
Sleep Inn & Suites Auburn Amenities
- Alarm clock
- AM/FM radio
- Brailed elevators
- Bus parking
- Cable television
- Coffee/Tea maker
- Complimentary full american breakfast
- Desk
- Elevators
- Exercise gym
- Free movies/video
- Hairdryer
- Handicap rooms
- High speed internet connection
- Indoor pool
- Iron
- Laundry/Valet service
- Meeting rooms
- Microwave
- Non-smoking
- Onsite laundry
- Outdoor parking
- Parking
- Pay per view movies on TV
- Ramp access
- Refrigerator
- Safe deposit box
- Telephone
Hotel Guest Reviews of the Sleep Inn & Suites AuburnOur hotel ratings and reviews are from real hotel guests. Priceline.com ensures that its reviews are guests-only by proactively sending hotel surveys to customers after they've completed their hotel stays. In the post-stay surveys, priceline.com hotel customers are asked a number of questions about their stay and the hotel. On a scale of 1-10 with 10 being the best, the survey asks guests to rate their overall experience and specifically rate the hotel's cleanliness, staff and location. Priceline.com does not allow site visitors to post unsolicited hotel reviews.
Sort by: All Travelers | Business Traveler(1) | Traveling as Couple(3) | Family with Young Children(5) | Family with Teens(5) | Senior Traveler(1) | Group Traveler(3)
Verified Hotel Guest from Harvest, AL
March 10, 2015
Family Traveling with Young Children
March 10, 2015
Family Traveling with Young Children
This guest did not leave comments about this hotel.
Lisa from Hartselle, AL
February 22, 2015
Family Traveling with Teens
February 22, 2015
Family Traveling with Teens
I liked it all! Clean, neat, friendly staff and the indoor pool was the best! Breakfast was fresh and filling. Like a mini vacation! I'll be back.
Pamela from Ashland, AL
February 17, 2015
February 17, 2015
Indoor heated pool was cold. Staff was very rude !! Breakfast was not good at all.
Verified Hotel Guest from Sylva, NC
November 23, 2014
November 23, 2014
The hotel was clean and location was convient.
Had a 3 a.m. fire alarm that lasted at least 30 min. No fire. Motel had "undesireable activity" in one room at this time. Asked to talk to the manager afterwards about this incident and was informed that the manager was not available.
The front desk help said I could leave my phone number and the manager would call. Of course, there was no call. I feel I was completely ignored. Do not recommend a motel that has staff that acts this cavalier.
Verified Hotel Guest from Tyler, TX
November 11, 2014
Business Traveler
November 11, 2014
Business Traveler
Decent location. Public areas were on par with other hotels of similar quality.
We were put in an extremely smoky room. Hotel couldn't move us to another room.
Don't stay here if you don't like smoky rooms.
Verified Hotel Guest from Winfield, AL
September 9, 2014
September 9, 2014
It was a pleasant surprise. Quiet, friendly staff (including the breakfast staff). Parking was easy and it was off the main highway and interstate so that traffic noise was nonexistent.
The only negative was the elevator was slow and noisy. But, that was not really a problem.
Carol from Ephrata, PA
July 22, 2014
Family Traveling with Teens
July 22, 2014
Family Traveling with Teens
Price and breakfast
Gym only contained two elliptical machines that were old.
Hotel smelled a little gross at entry to room.
Heeun from Rome, GA
July 19, 2014
Family Traveling with Young Children
July 19, 2014
Family Traveling with Young Children
This guest did not leave comments about this hotel.
Joseph from Sandersville, GA
May 9, 2014
Family Traveling with Young Children
May 9, 2014
Family Traveling with Young Children
The first room we checked into was a no smoking room that had certainly had someone in it who smoked. It reeked! Management moved us right away because they had more rooms.
David from Mobile, AL
February 25, 2014
Family Traveling with Young Children
February 25, 2014
Family Traveling with Young Children
It was an awesome stay with the staff that was so on top of things and so friendly. And with the clean pool for the kids to swim was just right. The beds were so comfy. We really really enjoyed our time up there. And can't wait to stay again. Greaprices
Reviews of Sleep Inn & Suites Auburn
(1 - 10 of 20 reviews)
(1 - 10 of 20 reviews)
from $84
- Quality Inn Auburn from $64 (0.1mi)
- Econo Lodge Auburn from $54 (0.2mi)
- Microtel Inn & Suites By Wyndham Auburn from $52 (0.2mi)
- Holiday Inn Express Hotel And Suites Auburn from $103 (0.4mi)
- Hampton Inn Auburn from $88 (0.5mi)
Most Popular Guest-Rated Hotels in Auburn
- The Hotel At Auburn University
- Hilton Garden Inn Auburn/Opelika
- Holiday Inn Express Hotel And Suites Auburn


text:
An electronic clutch keeps the tool from whipping around when the bit jams against rebar.
Survey says: here are the cordless tools electricians have, the ones they want, and their favorite brands.
This new rotary hammer is designed to hit 20% harder and vibrate 45% less than the company's previous 1 9/16-inch model.
Survey says: here are the cordless tools remodelers have, the ones they want, and their favorite brands.
This upgraded combihammer includes active torque control to reduce the possibility of twisting should a bit ever jam.
This rig holds one or more rotary hammers and isdesigned to boost productivity while reducing exposure to muscle strain,vibration, and silica dust.
A four-speed gear box allows this 18-volt drill to go twice as fast as competing models.
With the introduction of six models in two different voltages the company has jumped into the brushless drill and driver category with both feet.
The brand's hand tools, power tools, and accessories will continue to be produced all over the world but assembly of some cordless models will be shifted to a plant that spans the border of North and South Carolina.
This small combination hammer is set up to collect dust.
Copyright ©
2015 Hanley Wood Media, Inc. All rights reserved.


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Learn how to reach a larger audience by publishing your presentation online. This video presents tools, advantages and drawbacks for four ways of bringing yo...
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Taller impartido en la UDIMA en las primeras jornadas TIC. Se habló de Web 2.0, 3.0, TIC, TAC, TEP, PLE, PLN, artefactos y herramientas digitales en el aula de…
Via Tatiana Gunko, Juergen Wagner
This week I received at least a half dozen emails from people who were looking for suggestions for creating review games or practice quizzes for their students. The following are the tools that I suggested in reply to those emails.