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Systems and methods are described for environmental exchange control for a polymer on a wafer surface. An apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in the environment includes: a chamber adapted to hold the wafer, define the environment, and maintain the polymer in an adjacent relationship with the environment; and a heater coupled to the chamber. A method for improving performance of a spin-on material includes: forming the spin-on material on a surface of a wafer; then locating the spin-on material in an environment so that said environment is adjacent said spin-on material; and then controlling an exchange between the spin-on material and said environment. The systems and methods provide advantages because inappropriate deprotection is mitigated by careful control of the environmental temperature and environmental species partial pressures (e.g. relative humidity).
1. A method for improving image resolution capability of a photoresist, comprising:
forming a layer of unexposed photoresist on a surface of a wafer in a processing chamber;
locating the wafer in a first fluid environment, wherein the wafer is stationary relative to the chamber and a first fluid is in contact with the unexposed photoresist;
controlling an exchange of mass between the unexposed photoresist and the first fluid environment, wherein the exchange of mass is controlled by: measuring at least two independent thermodynamic variables of the first fluid; and introducing and extracting chemical species to the first fluid environment responsive to the measurements;
exposing the photoresist;
relocating the wafer to a second fluid environment, wherein the wafer is stationary relative to the chamber and a second fluid is in contact with the exposed photoresist; and
controlling an exchange of mass between the exposed photoresist and the second fluid environment, wherein the exchange of mass is controlled to resolve a feature size smaller than about 0.25 microns by: measuring at least three independent thermodynamic variables of the second fluid; and introducing and extracting chemical species to the second fluid environment responsive to the measurements.
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[0001] This application claims the benefit of provisional U.S. Patent Application Serial No. 60/186,112 filed Mar. 1, 2000, which is incorporated herein in its entirety by reference. This application is also a continuation-in-part of U.S. patent application Ser. No. 09/222,177 filed Dec. 29, 1998 which claims benefit of provisional U.S. Patent Application Serial No. 60/100,219 filed Sep. 14, 1998, all of which applications are incorporated herein by reference.
[0002] 1. Field of the Invention
[0003] The invention relates generally to the field of microelectronic fabrication. More particularly, the invention relates to the fabrication of polymeric microelectronic structures, such as photoresist masks and low dielectric constant materials.
[0004] 2. Discussion of the Related Art
[0005] The manufacturing of advanced semiconductors requires the production of circuit features at the sub micron level. A very sensitive photoresist is needed to define these features. The problems encountered in obtaining the maximum performance out of these sensitive photoresists is known to those skilled in the art of photolithography.
[0006] A class of new generation deep ultra-violet (DUV) chemically amplified photoresists based on �ACETAL� chemistry is required to produce features between 0.10-0.25 um using an exposure wavelength of 248 nm. One problem with ACETAL-based photoresists is that they are very sensitive to the chemical environment throughout the lithography process sequence. This is due to the fact that the chemical �deprotection� reaction that takes place during the post exposure bake (PEB) process requires the presence of moisture along with a photacid created during the previous exposure step. If the previous post application bake (PAB) process conditions and the stepper environment are not carefully optimized, and film moisture content decreases below a certain value, the ultimate lithographic performance of these photoresists will deteriorate significantly. Since deprotection has to occur at a precise time in the process sequence the moisture content at any given time of the process sequence is critical. What is needed is a solution to this moisture sensitivity.
[0007] The second problem with the ACETAL-based chemistries is that deblocking reaction rate of an ACETAL-based resist is much faster than the less sensitive DUV chemistries such as T-BOC resists due to a weak H�O physical bond. This is why the deblocking reaction starts at room temperature, thus causing contamination of the projection optics of the exposure tools (step and scanner) during the exposure step. What is also needed is a solution to this temperature sensitivity.
[0008] Heretofore, the requirements of obviating moisture and temperature sensitivity referred to above have not been fully met. What is needed is a solution that simultaneously addresses all of these requirements.
[0009] A primary goal of the invention is to improve the critical dimension (CD) tolerance of high performance DUV photoresist by controlling the environment in which the photoresist is thermally processed, before and/or after the exposure step. Another primary goal of the invention is to improve the mechanical and physical properties of materials (e.g. low dielectric constant, low-k liquid polymers) used in increasing the signal transmission speed of metal interconnects.
[0010] A first aspect of the invention is implemented in an embodiment that is based on a method for improving performance of a polymer, comprising: forming said polymer on a surface of a wafer; then locating said wafer in an environment so that said environment is adjacent to said polymer; and then controlling an exchange between said polymer and said environment. A second aspect of the invention is implemented in an embodiment that is based on an apparatus for controlling an exchange between an environment and a polymer on a surface of a wafer located in said environment, said apparatus comprising: a chamber adapted to hold said wafer, define said environment, and maintain said polymer in an adjacent relationship with said environment; and a heater coupled to said chamber. A third aspect of the invention is implemented in an embodiment that is based on a method for improving performance of a spin-on material, comprising: forming said spin-on polymer on a surface of a wafer; then locating said spin-on material in an environment so that said environment is adjacent to said spin-on material; and then controlling an exchange between said spin-on material and said environment.
[0011] These, and other, goals and aspects of the invention will be better appreciated and understood when considered in conjunction with the following description and the accompanying drawings. It should be understood, however, that the following description, while indicating preferred embodiments of the invention and numerous specific details thereof, is given by way of illustration and not of limitation. Many changes and modifications may be made within the scope of the invention without departing from the spirit thereof, and the invention includes all such modifications.
[0012] A clear conception of the advantages and features constituting the invention, and of the components and operation of model systems provided with the invention, will become more readily apparent by referring to the exemplary, and therefore nonlimiting, embodiments illustrated in the drawings accompanying and forming a part of this specification, wherein like reference characters (if they occur in more than one view) designate the same parts. It should be noted that the features illustrated in the drawings are not necessarily drawn to scale.
[0013]FIG. 1 illustrates a schematic diagram of an environmental exchange control system incorporating a water-filled canister with a bubbler, representing an embodiment of the invention.
[0014]FIG. 2 illustrates a schematic diagram of an environmental exchange control system incorporating a mixing chamber with an atomizer, representing an embodiment of the invention.
[0015]FIG. 3 illustrates percent relative humidity and temperature in an environmental exchange control chamber as a function of temperature, representing an embodiment of the invention.
[0016] The invention and the various features and advantageous details thereof are explained more fully with reference to the nonlimiting embodiments that are illustrated in the accompanying drawings and detailed in the following description of preferred embodiments. Descriptions of well-known components and processing techniques are omitted so as not to unnecessarily obscure the invention in detail.
[0017] The context of the invention includes fabrication of microelectronic structures with photoresist and coating microelectronic structures with spin-on materials. The invention can also utilize data processing methods that transform process monitoring signals so as to actuate interconnected discrete hardware elements; for example, to change the partial pressure of an environmental species or change the environmental and/or wafer temperature.
[0018] The concept of the invention provides a structure or assembly for providing a control environment to affect the exchange of chemical species between a liquid polymer on a semiconductor wafer. In particular, the invention may include a wafer processing chamber as part of a lithography track tool for fabricating wafers. A wafer processing chamber can be an environmentally controlled structure into which solvent, moisture and other chemicals can be introduced, monitored and controlled; and out of which solvent, moisture and other chemicals can be extracted. The wafer processing chamber allows for controlling environmental factors such as temperature, pressure, and/or species partial pressure humidity (e.g., to affect development of a film on a surface of the wafer, such as polymer films for photoresist processes, and low dielectric constant liquid polymers). A heater may be coupled to the chamber to control the temperature of the environment. The wafer processing chamber may be coupled to inlet manifolds for providing gaseous and/or liquid mixtures that form a suitable environment within the chamber to control the development of films on the wafers. The structure or assembly of this invention may also be coupled to wafer manufacturing tools such as steppers. The term coupled, as used herein, is defined as connected, although not necessarily directly, and not necessarily mechanically.
[0019] The invention includes coating the wafer with low K dielectric liquid polymer and then treating the wafer in the enclosed wafer processing chamber with the appropriate amount of chemical and the appropriate length of time to obtain the desired properties. The pressure inside this chamber is also adjusted too.
[0020]FIG. 1 shows system incorporating an embodiment of the invention for developing a film layer over a wafer. The chamber 140 may be a wafer processing chamber such as a post application bake (PAB) module or post exposure bake (PEB) module. Preferably the chamber is used to provide, for example, DUV resist coats, ACETAL DUV treatment, a low dielectric liquid polymer, or an ultra low dielectric spin-on on material. The chamber 140 may be coupled to, for example, a stepper as part of a lithography track tool. The chamber 140 is adapted to hold or retain a wafer on a block 144, and is suitable for defining an environment conducive to developing films on wafers as illustrated with discussed embodiments. More specifically, the wafer within the chamber 140 may include a polymer layer, which may then be located within the chamber 140 so that the polymer film is exposed to an environment. The chemical and physical characteristics of the polymer may then be influenced by controlling the exchange between the polymer and the environment, which may be accomplished by affecting the environment and/or the polymer individually through external resources such as heaters/mass flow controllers/bubblers, etc.
[0021] An inlet manifold can be coupled to the chamber 140. The inlet manifold may provide an influx of environmental elements and affect conditions such as humidity and temperature through the influx of air and/or liquid. The chamber 140 may also be coupled to a heater 148 to heat the wafer and/or gas within the chamber 140.
[0022] In one embodiment, the inlet manifold may include or be coupled to an assembly for delivering air and/or liquid mixtures to a top surface of the wafer in a controlled manner so as to affect environmental properties such as temperature, humidity, pressure, and chemical composition. As shown by FIG. 1, the inlet manifold may include an intake conduit 172 coupled to the chamber 140 for providing controlled gas and/or liquid mixtures. The intake conduit 172 may be coupled to two or more conduits containing gasses and/or liquids, with the contents of the conduits feeding into the intake conduit 172. A first conduit 122 that feeds into the intake conduit 172 may be derived from a first gas source 118 extended into a bubbler 120, where the outlet mixture from the bubbler 120 is carried by the first conduit 122 to the intake conduit 172 via a valve 130. The first gas source 118 can provide clean, dry process gasses such as N2. The bubbler 120 may be a water-filled canister that provides an outgoing mixture via the conduit 122 to affect environmental properties such as humidity or chemical composition. A second conduit 124 that feeds into the intake conduit 172 may be provided by another gaseous source, such as a source of purge N2. The gas/liquid contained within the second conduit 124 may be provided with a preselected temperature, humidity, or other quantity. Preferably, the first valve 130 and a second valve 132 control the feed of the first conduit and the second conduit into the intake conduit 172. The intake conduit 172 may then couple with a shower 142 within the chamber 140 to dispense a fluid and/or gas mixture.
[0023] Preferably, the chamber 140 may include a block 144 and the shower 142. The wafer may sit on the block 144 within the chamber 140 so as to be adjacent the environment and receive the fluid/gas dispensed by the shower 142. The block 144 may incorporate or otherwise be coupled to the heater 148 that heats both the block 144 and the wafer to a controlled temperature. A heating power controller 146 and block temperature sensor 136 may in combination control the temperature of the block 144, provided as Tblock. The temperature of the gas or air within the chamber 140, shown as Tair, may be controlled by a second heater (not shown), and/or the temperature of the dispensed fluid/gas from the shower 142. A temperature sensor 152 may couple to the chamber to provide a temperature feedback that represents the temperature of the gas. A pressure control 154 may also be used to monitor and control the pressure of the environment within the chamber 140. The temperature sensor 152 and/or the pressure sensor 154 may be coupled to a data acquisition device (not shown).
[0024] Additional features that facilitate practice of this invention may also include a lid designed or adapted to permit loading or unloading of a wafer from within the chamber 140. Alternatively, the chamber 140 may include a gate designed to permit loading or unloading wafers from within the chamber 140. An outlet manifold 158 may exhaust gasses and/or liquids from the chamber 140. Preferably, the outlet manifold 158 is a vacuum exhaust. In certain applications such as forming DUV resist coat, outgasses exiting via the outlet manifold may be analyzed.
[0025] The wafer may include a polymer film for use in a lithography step of wafer manufacturing, including photoresist films, polymers, or low dielectric materials that are thermo-cured films. The films within the chamber may also be formed from spin casting polymers, and or from depositing a polymer on a metal interconnect. Other suitable films may include organic planarization films, anti-reflection films, siloxane spin-on-glass films, polymide films, and polymide siloxane films.
[0026]FIG. 2 illustrates another embodiment of the present invention. In the system of FIG. 2, the inlet manifold may include or otherwise be associated with an atomizer 230. A pump 210 feeds a liquid mixture such as water into the atomizer 230. The atomizer 230 in combination with or dry N2 flow provides micron-size liquid droplets into an inlet conduit 235. In combination, the pump 210 and the atomizer 230 provide a controlled vapor mixture into the chamber 240. Preferably, the pump 210 is an IVEK type pump, while the atomizer 230 is a sonic air nozzle atomizer. The inlet conduit 235 feeds a mixture of micron-size droplets into a chamber 240. As with the embodiment of FIG. 1, the chamber 240 is adapted to hold and expose a polymer on a surface of a wafer to environmental conditions that influence the chemical and mechanical properties of the polymer. By locating the polymers adjacent to a particular environment provided by the chamber 240, the exchange between the environment and the polymer may be controlled to develop the deprotection reaction of the polymer.
[0027] To this end, the chamber 240 may also be suitable for use with DUV resist coats before wafer exposure, ACETAL DUV treatment, ACETAL resist coats after wafer exposure, or low dielectric liquid polymers. As such, the chamber 240 may also include a temperature controlled block 265 coupled to a heater 270 and temperature sensor 275, as well as a shower head 280 or other dispensers such as nozzles for dispensing the micron-sized droplets over the wafer. A temperature sensor 250 controls the temperature of the environmental gas or air within the chamber 240. An outlet conduit 255 from the chamber 250 feeds the gas and/or liquid mixture to a data acquisition device 260.
[0028] Referring to FIG. 3, environmental temperatures and relative humidity are depicted for a cyclic test of a system representing an embodiment of the invention. It can be appreciated that the relative humidity in the environment can be precisely cycled within a range of from approximately 0% relative humidity to approximately 10% relative humidity. It can also be appreciated that the temperature response lags behind the introduction of additional system heat capacity via the additional moisture.
[0029]FIG. 3 shows that flow HR % and temperature become repeatable after the flow reaches a steady state. The slight difference between each cycle could be caused by the difference of the dispensing OFF time and the fluctuation of N2 flow.
[0030] This invention may be implemented or incorporated with several wafer processing sub-steps to control and increase sensitivity of films residing on wafers during fabrication. A discussion of several embodiments of the invention that involve the use of ACETAL resists, low dielectric liquid polymers, and ultra low dielectric spin on materials follows:
[0031] First Embodiment
[0032] After forming a DUV resist coat on a wafer, the wafer and the coating may be dehydrated within a wafer processing chamber that is being utilized as a post application bake (PAB)module. This involves controlling an exchange between the polymer coating and a surrounding environment defined by the wafer-processing chamber. Specifically, drawing moisture out of the environment will cause the amount of available water on the surface of the polymer to be reduced as this water exchanges to the environment in an attempt to achieve equilibrium. A gaseous mixture such as N2 may be introduced into the wafer processing chamber so that the wafer processing chamber dehydrates the DUV resist coat. The wafer may then be exposed in a normal manner by a stepper and/or scanner tool. Since the resist coat material has been dehydrated before entering the exposure part of the process, only a minute amount of deprotection will take place, during the exposure. As such, the outgas during exposure is minimal, and significantly reduced in comparison to embodiments that lack this PAB dehydration feature. Elimination of outgassing ultimately prevents or reduces the risk of contamination that may damage equipment such as a lens of the stepper exposure tool.
[0033] After the DUV resist coat is exposed, the material on the wafer may be hydrated in an enclosed wafer processing chamber during a post exposure bake (PEB) step. This hydrating process involves controlling an exchange between the exposed polymer and an environment defined by the post exposure bake wafer processing chamber. Specifically, introducing moisture into the environment will cause the amount of water available on the surface of the exposed polymer to increase as the moisture in the environment exchanges to the surface of the polymer in an attempt to achieve equilibrium. The wafer may then be transported to yet another enclosed wafer processing chamber for another PEB process. A controlled amount of moisture is introduced into the post exposure enclosed wafer processing chamber while the wafer is being baked to initiate deprotection. Pattern formation will then take place. Since the wafers are dehydrated prior to this point, substantially no deprotection has previously taken place. This allows deprotection to be focused in one step, thereby increasing the contrast (photo speed) of the photoresist.
[0034] Second Embodiment
[0035] In second embodiment, an ACETAL DUV coated wafer is treated in an environmentally controlled chamber forming a bake unit during a post application sub-step. The chamber regulates a known amount of solvent, moisture or chemical(s) for the purpose of treating the wafer in a controlled fashion. In this embodiment the controlled exchange with the surface of the polymer is limited to the time during which the wafer is located in the environment defined by the PAB unit. Under these conditions, the final performance of the ACETAL resist may be enhanced. In comparison with the prior without any change of resist chemistry or exposure tool.
[0036] Third Embodiment
[0037] In a third embodiment the wafer is treated once after the wafer is exposed. More specifically, after the DUV coated wafer is photolithographically exposed in the stepper, the wafer is transferred to an environmentally controlled chamber forming a PEB unit. In the chamber, a known amount of solvent, moisture or chemical is regulated to treat the wafer in a controlled fashion. In this embodiment, the controlled exchange between the environment and the polymer is limited to the time in which the wafer is located in the PEB unit. Under these conditions, the final performance of the ACETAL resist may be enhanced in comparison to the prior art without any change of resist chemistry or exposure tool.
[0038] Fourth Embodiment
[0039] In a fourth embodiment, a low dielectric liquid polymer. A low dielectric liquid polymer is normally spin coated onto the wafer using a track similar to the one that is used for depositing photoresist. A series of thermal processes are used sequentially to cure the low dielectric film and obtain the desired final properties for the film. Low dielectric liquid polymers provide one way of reducing the capacitance between metal interconnect layers of ULSI circuits. The phrase �low dielectric constant material� is defined herein as having a dielectric constant ranging from approximately 2.5 to approximately 3.5, with air being approximately equal to one. This parameter is a unitless measure.
[0040] Smaller capacitance allows higher operating speed for these devices with reduced power consumption. A wafer processing chamber may affect the development of a low dielectric liquid polymer by controlling the environmental conditions surrounding the wafer within the wafer processing chamber. More specifically, the wafer processing chamber of this invention controls the introduction of moisture, solvent and other chemical to form an environment conducive to the formation of desired film properties, such as uniform film thickness. In addition, controlling the environment within the wafer processing chamber reduces volumetric contraction and/or void formation of the film after its application onto the device wafer.
[0041] Fifth Embodiment
[0042] In a fifth embodiment, a spin-on material is coated on a wafer. This spin-on material may function as an ultra low dielectric constant layer, optionally adjacent one or more interconnect layers. The phrase �ultra low dielectric constant material� is defined herein as having a dielectric constant ranging from approximately 1.5 to approximately 2.5, with air being approximately equal to 1. As noted above this parameter is a unitless measure. Some of these materials are known as xerogel materials. An example of a xerogel material is nano porous silica (SiO2, bulk K approximately=4). The bulk dielectric constant of composite xerogel materials can be from approximately 1 to approximately 2, again with air set to be approximately equal to 1.
[0043] While not being limited to any particular performance indicator or diagnostic identifier, preferred embodiments of the invention can be identified one at a time by testing for the presence of minimal deprotection. The test for the presence of minimal deprotection can be carried out without undue experimentation by the use of a simple and conventional tribology experiment.
[0044] Practical Applications of the Invention
[0045] A practical application of the invention that has value within the technological arts is the use of photoresists. Further, the invention is useful in conjunction with low dielectric films (such as are used for the purpose of reducing capacitance), or in conjunction with deposition processes (such as are used for the purpose of depositing structural layers), or the like. There are virtually innumerable uses for the invention, all of which need not be detailed here.
[0046] Advantages of the Invention
[0047] A method or apparatus, representing an embodiment of the invention, can be cost effective and advantageous for at least the following reasons. This invention improves the lithographic performance and process control of the ACETAL-based or any environmentally sensitive DUV photoresists and improves their chances of being successfully used for smaller feature sizes. This invention provides a way to eliminate/minimize outgassing of the ACETAL-based or any environmentally sensitive photoresists during the exposure step, thereby preventing contamination of the projection optics of exposure tools. This invention improves the mechanical and physical properties of low dielectric constant liquid polymeric films. This invention helps to prevent contamination of stepper optics.
[0048] An embodiment of the invention, referred to as Post Exposure Environmental Control (PEBEC) was reduced to practice as a working example. The main tool used in this study was an 248 nm DUV photocluster comprised of an advanced wafer track machine clustered with a mercury lamp-based scanner with projection optics (NA=0.5) designed for 0.35 μm features. A post exposure bake (PEB) module in the track was modified to include sensors and control the chamber process environment during the PEB process.
[0049] A commercial acetal-based low activation energy resist was processed using the listed conditions in Table 1 unless otherwise noted. The coated film thickness was approximately 6580 Å.
[0050] A scanning electron microscope (SEM) was used to analyze cross-section resist profiles and top-down images.
[0051] To determine measured photoresist contrast a thin film mapper. Two hundred twenty one fields were exposed on a single wafer with 20 or more different doses below the clearing dose (E0). At each dose level, there are 5-7 fields that were randomly distributed on the wafer. After the film was exposed and developed, the remaining film thickness for all fields was measured using the thin film mapper. A contrast curve was then created by plotting the bulk average develop rate (removed film thickness/develop time) as a function of exposure dose.
[0052] The resolution capability of the resist was found to be significantly improved with practice of an embodiment of the invention, PEBEC. In this working example, the process used a 0.25 μm iso line sizing dose determined for the respective process, that is, PEBEC or the standard Process Of Record (POR). The 0.25 μm sizing dose for PEBEC (13.3 mJ/cm2) was significantly lower than that required without it (14.5 mJ/cm2).
[0053]FIG. 4 shows cross-section images of 0.251 μm and 0.20 μm iso and dense line patterns processed with and without PEBEC. The scanner used in this working example is specified for 0.35 μm feature patterning. Thus, the 0.25 μm (FIG. 4a) and 0.20 μm (FIG. 4c) dense lines are not resolved using the POR. When the invention was practiced, not only were the 0.25 μm dense lines (FIG. 4b) resolved, but even the 0.20 μm (FIG. 4d) dense lines were fully resolved with vertical sidewalls apparent.
[0054] Further improvements due to practicing the invention are seen in FIG. 5, which shows the 0.15 μm isolated line patterned with PEBEC at the 0.25 μm iso line sizing dose. Without PEBEC, this feature was completely developed away, i.e. it was unresolved.
[0055] All the disclosed embodiments of the invention described herein can be realized and practiced without undue experimentation. Although the best mode of carrying out the invention contemplated by the inventors is disclosed above, practice of the invention is not limited thereto. Accordingly, it will be appreciated by those skilled in the art that the invention may be practiced otherwise than as specifically described herein.
[0056] For example, the individual components need not be formed in the disclosed shapes, or assembled in the disclosed configuration, but could be provided in virtually any shape, and assembled in virtually any configuration. Further, the individual components need not be fabricated from the disclosed materials, but could be fabricated from virtually any suitable materials. Further, although the enclosed thermal chamber described herein can be a physically separate module, it will be manifest that the enclosed thermal chamber may be integrated into the apparatus with which it is associated. Furthermore, all the disclosed elements and features of each disclosed embodiment can be combined with, or substituted for, the disclosed elements and features of every other disclosed embodiment except where such elements or features are mutually exclusive. It will be manifest that various additions, modifications and rearrangements of the features of the invention may be made without deviating from the spirit and scope of the underlying inventive concept. It is intended that the scope of the invention as defined by the appended claims and their equivalents cover all such additions, modifications, and rearrangements. The appended claims are not to be interpreted as including means-plus-function limitations, unless such a limitation is explicitly recited in a given claim using the phrase �means-for.� Expedient embodiments of the invention are differentiated by the appended subclaims.
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Cartoons: Adventure Time with Finn and Jake fanfiction archive with over 1,579 stories. Come in to read, write, review, and interact with other fans.Test this site now
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Links to Voyage to the bottom of the Sea web sites. Also, Links to movie special effects and ... Voyage FanFiction Sites. Chapter one--Expanding Technical Data Base of ...Test this site now
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I'm feeling partly serious and partly goofy asking this because most of the time I dislike predicting type of articles...but the membership here are both very smart and savvy and also know how to have fun with a topic, so here we go.
For whatever industry you work in, whether it is SEO, web design, social marketing, usability and everything related and in-between, what do you imagine 2015 to be like?
For me, I figure I will continue my mission of making websites work for all people while also being findable in search engines. Because just doing one of those things, like SEO, would bore me and I have to make everything super complicated . I would like to think that Google will get some major smack-down by Yahoo! and Bing because I miss the old days when there were OTHER search engines to play with.
I'd like to stay in touch with all of you too, no matter what IMN decides to do with these forums and whether or not they keep me. A member just got me into Ello. Perhaps I can create a ruckus there.
Finally, I think the stupid wall that separates usability and SEO will continue to crumble. It's taken YEARS for people to get what I've been doing and writing about since 2001. I need to write my book.
What about you all?


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A short film about what happens when two women are left to their own devices for an evening.
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Plastic bag or paper bag for seed storage
i am keeping my heirloom seeds.
I would like to learn what is best between those two.
1)To keep them in small plastic sealed bags?
2)Or in small paper bags/envelopes?
Thank you
I keep my seeds in paper so any excess moisture can be released easily. I make little origami envelopes, sometimes out of the seed packet. Seed packets are generally huge compared to the quantity of seed. I also keep my seed in the frig with dessicant.
One of these days I'm going to get around to making a tutorial for those little origami envelopes.
Now that I have made it that envelope is pretty easy. I like that it allows you to use paper that isn't square. I think I'll try using it for big seeds that need a big envelope.
Here is a folding diagram of the one I use. I like it because it forms a pouch that can be easily opened and closed. Because the opening ends in a point you can gently shake seeds out very accurately.
In my kitchen I use "counter fold" wax paper sheets as used in restaurants which dispense like Kleenex. These sheets are ideal for making these envelopes as they are the right size and are already folded once. They are also remarkably tough. Al
i use tiny ziploc plastic bags that are used for crafts like bead storage. you can get them at michael's or jo-anns. label with a permanent marker. i store the baggies in airtight glass canisters with dessicant at the bottom. i have viable seed from 12 years ago. i also store regular seed packets in these canisters.
Paper is probably superior to plastic, because paper would let the seeds breathe if there were any extra moisture. But both of them seem to work well for me.
I've been storing all seeds in a refrigerator drawer in little paper or plastic envelopes since the mid-1980s (mostly paper though). I throw extra dessicants in the seed drawer. A refrigerator and freezer are dessicating anyway, which is probably good for most seeds. The real advantage is that the cooler temps slow the metabolic rate of the seed embryo. I regularly use seeds that are 20 years old or so and they germinate fine.
A bit of a tangent perhaps, a famous seed company says each seed item is stored according to the species' need
Paper for me, please.
Also a fan of the little self-made folded envelopes, the style of the drawing nil posted. More size-appropriate and easier to repeatedly open/close than a bought envelope. Great way to reuse junk mail!
Thanks for the diagrams. Just tried Calistoga's design and got nowhere. Any chance you could do a short video of hands actually folding this and post it to YouTube?
I've been using a variation of Nil13's design, using tape to make a reusable seal.
The folded paper design I posted earlier, I use only for temporary storage or for mailing seeds. If you are having trouble folding it, it is usually because you do not turn it over as directed in picture #3. For long time storage I use the plastic air tight containers used for diabetic test strip storage. They are a little smaller than the old 35MM film shipping cases. Dr. Norman Deno in his many years of seed experimenting found very little difference in life expectancy between seed at a constant room temperature and that at refrigerator temperature for most seed. Al


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Leather Sofa Options
We have been on a search to replace an old Lane leather sofa for a couple of weeks now. After doing tons of research and visiting several local stores we have narrowed it down to the following three options:
Thomasville 3 cushion Benjamin @ $2,150 (local purchase)
Palliser Luciana @ $1,500 (online purchase)
We were also considering a local closeout on a Southern Motion leather match reclining sofa, but we would like to stick to stationary.
Also, we need to have low backs (or removable legs) as our door is only 34" wide.
Any opinions about these options from a price/value proposition or other alternatives would be appreciated.
A 34" door clearance is about 32 1/2" where a 36" door clearance is about 34 1/2", and much depends of if the door is in a hallway or any objects or walls in the room its going into can potentially be a problem. Outside dimensions of a sofa should be know so that you can measure any doorways before purchasing.
The other option is to purchase a "ready to assemble" sofa, then doors, stairways, elevators and other obstacles isnt much of a problem.
Try google search "ready to assemble" leather sofa or "ready to assemble" custom leather sofa to ensure more options to find the best style for your home.
There are many choices of leather sofas. Your may choose according to your style and budget. Leather sofas are available in different price range. You can buy partial leather, simulated leather or full leather sofas. If you would choose a full leather sofa, buy the Italian leather sofa. This is great piece of furniture because its durability and elegance are unmatched by ordinary sofa sets.


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lol um yea......sure ^^;; Well have fun four eyes XD oh wait so am I =pOriginally Posted by dark angel swordsman
im told that as well but it doesnt matter much im a sexy beast no matter what i doOriginally Posted by dark angel swordsman
lol um yea......sure ^^;; Well have fun four eyes XD oh wait so am I =pOriginally Posted by dark angel swordsman
I think it works both ways... anime girls can be very cute/and/or smexy with glasses, but so can anime guys (mainly the bisshies through)
Not all anime guys that wear glasses turn out evil... it's just the majority of them do. (I can think of serveal) ^^
Leader of the Fangirl Conspiracy
Because teasing boys is so much fun.
[ Minitokyo| Doki Doki | My AO Gallery | Request a Siggy ]
"Bisshies make Hikari happy"
I'm just glad that I'm not the only one that feels that way bout girls with glasses. The first ones that comes into my mind are Mutsuki from Happy Lesson & Naru from Love Hina. But i kinda like Mutsuki more maybe its the fact that she wears glasses & a maid outfit
Girls with glasses. well look at my siggy to find out for urself if i likethem. welcome to ao.
-Just another green eyed angel, distorted by mans love for hate-|THE INFAMOUS CHEETOS OVERLORD||IceNineKills|
I gotta say, Satoshi Kiwatari, from the DNAngel manga, makes glasses look really good. Then when he takes em off, he's cute, but I like the serious look he's got w/ em on.Originally Posted by Eriadd
Treat me like an angel, and I'll be your little devil.
well first off let me welcome you to ao dude. im Kiki. if theres anything you need help with just ask ok?
the glasses well it only works for some girls in my opinon otherwise they look really sexy in them. im about to get my glasses soon, there framless with the nose part and ear parts light green. trust me i think i look hot in them. but you all will find out from syko soon in about 2 weeks.
thanks for the sig SasuraiHell!!!!
anime girls wearing glasses can be hot only if they have everything big......


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PS3 to Act as Digital Video Recorder? 42
from the could-be dept.
We've improved Slashdot's video section; now you can view our video interviews, product close-ups and site visits with all the usual Slashdot options to comment, share, etc. No more walled garden! It's a work in progress -- we hope you'll check it out (Learn more about the recent updates).
a very large limit
How do you measure limitness? That's similar to "Twice as small" and "Three times as light." How do you measure smallness or lightness? You can measure size and thus can say "Half as big," and you can measure weight and can say "A third the weight," but how does one go about measuring the other way around?
I'm using PSP audio streaming right now and could be using video streaming if I weren't waiting to see what the new version of the hardware, integrated with the PS3, looks like (i.e. the software client's already rolled out)...*sniff sniff* Vaporware to me
dvd player support is NOT a novelty item - it's how i watch dvds, never had another dvd player (besides my computers).
i read an article in past few weeks that gave percent - 60 or 70 percent - of ps2 owners use the ps2 as their primary dvd player.
can't find the article, now... it wasn't this [interactual.com]
anyway - point is DVD support is NOT 'novelty' - but in fact useful, and at the time of launch contributed to the reaso
The PS3 is sounding dangerously vaporous, and adding new vapor features doesn't help. Seriously, the conventional wisdom on this was that we'd see a Spring launch in Japan, and Fall in North America. Well, Spring is getting pretty close, and the only news in the PS3 camp is that blogging on how it's too hard to develop for and not really "next gen" gets you fired [kotaku.com].
Whatever the PS3 ends up being, I no longer expect to see it in 2006.
Who goeth a-borrowing goeth a-sorrowing. -- Thomas Tusser


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105-1195 - Fluke Connect™ Vibration Meter
Combine the power of the 789 and the wireless data logging capabilities of Fluke Connect™ with ShareLive™ video call, and technicians can now do a lot more while carrying a lot less.
Mfr Name: Fluke
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See all items in Fluke Connect
82-18870 - Viper GL Vibration Detector
Viper GL Vibration Detector
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Mfr Number: PC.09003
See all items in Wireless Alarms
4H00982C - Bush Anti Vibration Qj-comp(96
BUSH ANTI VIBRATION QJ-COMP(96 Damper,Compressor
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See all items in LG
82-18865 - Viper GLX Vibration Detector
Viper GLX Vibration Detector
Mfr Number: PC.09000
DC212KA - 18V 7/8" Cordless SDS Hammer Kit
SHOCKS™ - Active vibration control reduces vibration up to 70%
Compact L-shape design allows access in tight spaces and optimal balance
1.7 ft-lbs impact energy provides corded power without the cord
Variable speed reversible switch provides greater contr...
Mfr Name: Dewalt
Mfr Number:
See all items in Hammer Drills
4H00982E - Bush,anti Vibration
BUSH,ANTI VIBRATION Damper,Compressor
Mfr Number: 4H00982E
105-870 - 805 Vibration Meter
The Fluke 805 provides reliable vibration measurements as well as bearing condition and temperature for critical go or no-go maintenance decisions.
Mfr Number: FLUKE-805
See all items in Vibration Meters
83-11829 - 120MM Case Fan Rubber Gasket for Vibration Reduction
Installs between fan and computer caseEliminates any potential vibration caused by case fan
Mfr Number: FAN GASKET 12CM
See all items in Filters, Gaskets and Cords
82-180 - Vibration Detector
Senses vibration in walls, ceilings, safes, etc. Mounts in any position Adjustable sensitivity Silver contacts rated at 100mA, 50VDC, 5W Tamper-proof cover Closed circuit operation
Mfr Name: Seco-larm
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83-16232 - GXT27 Steering Wheel with Vibration Feedback for PC and PS3
Compact steering wheel features vibration feedback for realistic racing effects. Features an ergonomic, rubber coated wheel that provides a firm grip. Two wheel mounted gear shift levers and separate gas and acceleration pedals provide precision control.
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83-16215 - Maverick USB Gamepad with Vibration Feedback for PC or PS3
Full feature gamepad uses a inlaid motor to provide vibration feedback for realistic gaming action. Eight direction digital gamepad and 12 function buttons offers precise control while twin analog sticks add additional control functions.
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82-13665 - Knock-Knock Door Chime With Vibration Smart Sensor
Hear when guests arrive while in the back part of an office, home, or basement. Great for buildings that do not have a working or too soft of a doorbell.
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83-11828 - 80MM Case Fan Rubber Gasket for Vibration Reduction
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105-1200 - Fluke Connect™ Vibration Tester
Fluke 810 helps identify and prioritize mechanical problems. Check out how this hand held vibration tester can help make informed maintenance decisions.
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28-17997 - littleBits Vibration Motor Bit
LittleBits was built to break down the barriers between the products we consume and the things we make, to make everyone into an inventor. these modules are designed to work with the Littlebits Kits
There are over 50 Littlebits modules in the making, divided...
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Mfr Number: 650-0034
See all items in Electronics Modules & Kits
I have been doing business with MCM for years and always had great service.


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The films will be shown every other Friday through April 24. Shows begin at sundown. The event may be canceled in the event of inclement weather.
• Feb. 27: "E.T. the Extra-Terrestrial"
• March 13: "Despicable Me
• March 27: "Space Jam"
• April 10: "The Box Trolls"
• April 24: "The Lorax"
Here are some things you might want to bring to ensure a comfortable evening:
• Chairs and/or blankets
• Flashlight
• Umbrellas
• Insect repellent
The Pacific Daily News Friday Nights at the Park series continues this evening at Adelup with the film "E.T. the Extra Terrestrial."
The movie starts at sundown, but guests are encouraged to come earlier to pick their spots and get settled in. The event will include a homemade alien costume contest for children ages 5 to 12.
First-, second- and third-place winners of the contest will receive prize packages from Sylvan Learning Center and gift certificates from Burger King.
The event also will feature an alien mask activity station, where kids will be able to craft their own alien masks.
Vouchers for a free kid's scoop at Cold Stone Creamery will be awarded to the first 50 children who arrive in an alien costume. Costumes don't need to be homemade to be eligible for a prize.
Along with Pacific Daily News, other sponsors for the event include Cold Stone Creamery, Rotary Club of Tumon, i*recycle, Shimbros, USO Guam, the Department of Parks and Recreation, Burger King and Sylvan Learning Center.


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Home > Videos > Ty Dolla $ign f. Too Short & Berner - "Go Deep"
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The key is to hide the condoms after your harem goes home. "Beach House 2" on the way.
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Jay 305 f. Joe Moses - "Thuggin"
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Hurt Everybody - "2K47"
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P-Mation #41: A-Door-Able
Blue boy meets his lovely neighbor!4.46 / 5.00 9,930 Views
Otherworld - Quiet Luke
in da othawurld4.41 / 5.00 6,657 Views
Joe vs the Environment
In collaboration with Earth Hour 2015 and Pocoyo4.07 / 5.00 2,629 Views
Great movie!
also evedent proof thats plans arnt really that good
I remmember seeing this flash for many years ago and i found it so funny, I still think some of the jokes were well done, although some of them were simple, you made Bowser look so dumb and I like how you made fun of the older Mario games, like how Bowser is standing on a bridge and there's a button/axe behind him for no reason other than defeating him, it's just odd why it was placed there.
Some of the jokes are a bit lame, but I do like Bowser's narcissism, how he thinks he's superior, how he thinks his plans are great, although it's common for a character to be that way, the way Bowser's lines are made are/were original back then when this animation came out.
You did a good job for a first NG flash animation.
This is WAYYYY too long... most of it is pretty boring, too. You could've cut a lot of dialogue and scenes and still had the jokes that you did. The voice acting was okay, but the quality was really bad, especially Bowser's. Not everything in this made sense, either. The animation was pretty good, but could have been better. The main complaints I have with this are the length-to-jokes ratio, which was very low.
NICE ANIMATION DUDE! super impressed.
What!? I hate plumbers!
He still hasn't fixed my bathroom!


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Actress Neha Sharma, last seen in "Crook: It's Good To Be Bad" with Emraan Hashmi, will now feature as Shahid Kapoor's love interest in "Teri Meri Kahaani".
"I am playing a guest appearance in Kunal Kohli's 'Teri Meri Kahaani'. As the film speaks about three different eras, I will be seen in 2012 era with Shahid," Neha told IANS.
Describing her role, Neha said: "We both are from London University and how Shahid finds a soulmate in me will unfold in the film. However, later we end up finding our own soulmates."
Neha shot for her part in London in September 2011.
"Teri Meri Kahaani", releasing June 22, is a love story set in three eras. It features Priyanka Chopra in the lead with Shahid.
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Mumbai, March 27 (IANS) Members of the film fraternity have condemned ... 16
Actor Emraan Hashmi has wrapped up his film "Hamari Adhuri Kahani" and ... 1


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Jury sides with Costner in BP spill lawsuit
NEW ORLEANS Kevin Costner said his reputation was at stake as he defended himself against accusations that he cheated fellow actor Stephen Baldwin out of millions of dollars in a lucrative BP contract for oil-cleaning machines after the 2010 spill.
Baldwin and a friend were seeking $17 million in damages, saying they could have made at least that much in the deal. A federal jury sided with Costner and gave them nothing.
Costner smiled and shook his attorney's hand as a grim-faced Baldwin left the courtroom.
"My name means more to me than money and that's why we didn't settle," Costner said.
After a two-week trial, eight jurors deliberated for less than two hours before giving their decision in the lawsuit brought by Baldwin and his friend, Spyridon Contogouris.
Baldwin referred questions about the verdict to his attorney, James Cobb.
"We're disappointed. We thought we proved rather convincingly that these two guys, Mr. Costner and Mr. Smith, defrauded us," Cobb said. "The jury saw it a different way but we respect the jury's verdict."
Contogouris and Baldwin sold their shares in Ocean Therapy Solutions for $1.4 million and $500,000, respectively. The company was marketing the oil-separating centrifuges.
Baldwin testified he would have held out for much more if he had known BP had committed to ordering 32 of them. Soon after they sold their shares, the oil giant made an $18 million deposit on a $52 million order.
Attorneys for Costner and Smith said Baldwin and Contogouris knew BP was preparing to order the machines when they walked away from the company rather than gamble for a more lucrative payout if BP signed a binding contract. At the time they sold their shares, BP only had signed a non-binding letter of intent, the defendants' attorneys said.
Cobb questioned whether celebrity was a factor in the outcome "because I believe we proved our case and because the bigger celebrity won."
Earlier Thursday, during the trial's closing arguments, Cobb told jurors they probably see the case as a "bunch of rich people fighting over money I'll never, ever see." Cobb, however, said his clients deserved to be compensated for being lied to by Costner and business partner Patrick Smith and defrauded out of their fair share of the BP money.
"I had no idea the spider's web of deception could be so pervasive and so hard to unravel," Cobb said.
Costner's attorney Wayne Lee argued his client's fame is the only reason he was sued. The plaintiffs were mistaken when they thought Costner would "roll over and give in" under the threat of a lawsuit, Lee said.
"This lawsuit never should have been brought," Lee said. "Mr. Costner never should have been a party to these proceedings."
Costner and Baldwin were ordered by U.S. District Judge Martin Feldman to attend each day of the trial, which they heeded. The judge thanked them at the end of the trial.
"I know that being here throughout the trial has been a great challenge for them," Feldman said.


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Japan's Newest Linux Supercluster: 13TB RAM 163
from the hey-is-that-DDR-you've-got-there dept.
We've improved Slashdot's video section; now you can view our video interviews, product close-ups and site visits with all the usual Slashdot options to comment, share, etc. No more walled garden! It's a work in progress -- we hope you'll check it out (Learn more about the recent updates).
Ow! Dr. Condoleezza just informed me they make Memory all by themself, lets pre-emptively nuke 'em!
"Scandanavian doing a bad Bush impression"speak, you mean?
Interesting indeed, considering that the Japanese have the necessary materials, infrastructure, and means of delivery, I suspect they will be revealing a deployed nuclear capability soon. This announcement serves as a veiled warning to North Korea.
But isn't Itanium kinda evil (as opposed to slashdot darlings PPC/Power and Opteron)?
While Linux is super cool? So should I like it?
is this thing faster than the Big Mac?
But isn't saying that offensive to turkeys [wikipedia.org]?
mhhh, I looked up some other (German) domains.
Not sure about the results. There are some huge fluctuations(~20x) in the data without obvious explanations. Maybe some can explain how they generate those numbers:
You don't suppose they ever do any weapons research, do you? Hmmm, what to do...
To err is human -- to blame it on a computer is even more so.


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Pronunciation: Tryndamere
Added on: 2012-11-29 Listened: 751 timesin: games
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Germany Boosts Film Funding
COLOGNE, Germany - While much of southern Europe is chopping away at state film subsidies, Germany on Friday boosted funding for film shoots, adding an addition $12.7 million (€10 million) annually to the German Federal Film Fund (DFFF).
The increase brings the DFFF's annual budget to $90 million (€70 million), cash used to support local and visiting productions that shoot in Germany. Recent productions to benefit from DFFF funding include the fantasy epic Cloud Atlas, Lars von Trier's Nymphomaniac, the vampire drama Only Lovers Left Alive from Jim Jarmusch and the animated 3D film Tarzan featuring Kellan Lutz and Spencer Locke.
"It's a good day for culture in Germany," said German culture minister Bernd Neumann. "Especially when you look at the drastic cuts seen in all other comparable European countries, this budget increase is an extraordinary success."
The German alliance of television and film producers also welcomed the move to strengthen the DFFF.
"For us the DFFF isn't just a financing instrument," explained Alexander Thies, chairman of the German producers alliance, "By stimulating international co-productions it has made a decisive contribution to the production landscape (in Germany) so that we are now among the best locations in the world."
In total, the German parliament approved a budget for 2013 that increases spending for film and culture by $127 million (€100 million) to just over $1.6 billion (€1.28 billion) annually.
Never miss a story. Stay up-to-date with THR's Daily Headlines.
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Really this is the best website I had ever bought something from. Shipping is fast and well made products.Read More ->
WOW WOW WOW...is all I can say without being speechless about this website. I have been performing magic for about ten years now, and this is the...Read More ->


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cost to move shed?
I'm thinking of moving a shed (about 8 x 10 ft) in my new house. The old owners had it built right in front of the back patio and it blocks the view. I'd like to move it back 30-50 ft into the yard out of the way. Could this be done? The shed is older (probably 20-30 years old, wood frame construction with vinyl siding), supported on cinderblocks. I was thinking one could move that with a forklift or carefully wedge it onto rollers.
Any idea how much this would cost?
Get a landscaping crew on a spare saturday, and have 3 or 4 pieces of 4" PVC pipe handy. They could roll it across the yard on the PVC. Probably would run a 300 bucks more or less. (Empty the shed it first).
I moved and repositioned our 8x12 "amish built" wood shed solo with the PVC mentioned, a jack, some 4x4's for cribbing, etc. and a "come-along". It took me most of a day to get it in the right place and a bit elevated on cinderblocks....
...then it fell down the hill anyway (just kidding). It's not that hard, just takes time.
"...then it fell down the hill anyway (just kidding). It's not that hard, just takes time".
I hate when that happens!
Excellent advise from homebound! With roman tecchnology frame of mind, you can move mountains. A friend has moved many heavy and large projects with metal fence posts as rollers.
my brother in law, myself and one other person fairly easily moved a 6 X 8 empty barn type shed around my flat yard. If your yard is flat and you have a few buddies you may want to give it a go...just need some of those pvc pipe and some wood to act as a lever, maybe a jack.
Now if you have a mean hill or its going to an area where it needs to be levelled you may be better off just calling a shed place or landscapper to have it moved.


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Find reviews of the latest Digital SLR digital cameras for Over £450.
Nikon's latest advanced entry-level DSLR offers high-end specs and also benefits from a high-res articulated monitor. Could it be Nikon's best entry-level DSLR yet?
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Sony spinning off video and audio department
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Trouble free transaction. Parts shipped separately from local warehouses. 1st part arrived quick (local warehouse), initially thought the order was short, but the invoice mentioned the other part coming from another warehouse. That (2nd) part arrived a few days later. Would shop them again.


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Sacral neuromodulation is a new treatment, which was approved for use in the United Kingdom in 2004, but has only recently been authorised by local authorities and private insurers. Also known as sacral nerve stimulation (SNS) it uses electrical currents to reset the faulty nervesBundles of fibres that carry information in the form of electrical impulses. causing bladder dysfunction.
"Sacral nerve stimulation is a very important breakthrough in the treatment of the overactive bladder and pain syndromes. This new technique provides an effective solution for women when conservative treatment has not worked. It avoids the necessity of repeated treatment with Botox, and the risk of catheters with Botox and major surgery."
Jeremy Ockrim, Consultant Urologist, University College Hospital and Harley Street, London
"Sacral nerve stimulation is a very important breakthrough in the treatment of the overactive bladder and pain syndromes. This new technique provides an effective solution for women when conservative treatment has not worked. It avoids the necessity of repeated treatment with Botox, and the risk of catheters with Botox and major surgery."
Jeremy Ockrim, Consultant Urologist, University College Hospital and Harley Street, London
Overactive bladder is a common complaint in women and can affect men too. Bladder spasms cause frequencyApplied to urination, needing to urinate more often than normal, for whatever reason.-urgency and urge incontinenceIncontinence of urine due to abrupt and uncontrollable urges to urinate, if there is insufficient time to reach a bathroom.. Over 30 per cent of women (and 10% of men) will experience problems with continence, typically after childbirth and menopauseThe time of a woman's life when her ovaries stop releasing an egg (ovum) on a monthly cycle., although younger women can also be affected.
Voiding dysfunction in young women (sometimes called Fowler's syndrome), is a rare condition resulting in an inability to relax the sphincterA ring of muscle around a natural opening or passage that acts as a valve, regulating inflow or outflow. causing retention of urine and catheter dependence.
The causes of pelvic pain are not well understood and in most cases a specific cause is not identified. Interstitial cystitis is an inflammatory condition of the bladder comparable to arthritisInflammation of one or more joints of the body. of the joints or colitisInflammation of the colon, also sometimes used to mean inflammation of the large intestine generally. of the bowelA common name for the large and/or small intestines.. The condition leads to pain as the bladder fills, resulting in frequency urgency and chronicA disease of long duration generally involving slow changes. pain.
The first step is to have a test procedure to see whether SNS will be effective for you.
The nerves are located in the lower back, adjacent to the sacrumA section of the lower backbone that consists of five vertebrae that are fused together.. Under a short general anaestheticAny agent that reduces or abolishes sensation, affecting the whole body. (or occasionally local anaestheticA medication that reduces sensation in a part of the body.), the surgeon uses a small needle to place a thin wire in contact with your sacral nerves. The other end of the wire is tunnelled under the skin or taped to the back and connected to a temporary stimulator control unit, which is worn on your belt. The temporary stimulator is worn for four weeks to assess your response. The approach works well for approximately 70 per cent of patients.
If you find the treatment effective, you will be asked to come into hospital again to have a permanent implant. This is a much smaller device – the size of a £2 coin – which is implanted under the skin and fatOne of the three main food constituents (with carbohydrate and protein), and the main form in which energy is stored in the body. of the lower back so it cannot be felt. You will not have to have anything attached to your back or any external device. A control unit, the size of a mobile phone, is used to change and control the frequency of electrical signals and you can keep this at home. The infectionInvasion by organisms that may be harmful, for example bacteria or parasites. rate for this procedure is less than 1%.
The procedure is carried out under general anaesthetic, and most patients return home on the same day.
This treatment is sometimes referred to as the 'pacemakerA small electrical device that functions to maintain a normal heart rate. for the bladder'. A traditional cardiacRelating to the heart pacemaker is a device implanted inside the body which sends electrical currents to the heart, correcting faulty heart rhythms.
In an 'overactive bladder' the sacral nerves send unwanted messages to the bladder, causing it to contract suddenly (urgency) and empty without due warning (urge incontinence). In voiding dysfunction the reverse happens preventing the sphincter from relaxing. Sacral nerve stimulation works by interrupting this 'faulty circuit' and restoring normal communication between the nerves, brain, and bladder. In pelvic and bladder pain the same nerves conduct the pain signals to the brain. Electrical stimulation at the nerve roots dampens these signals and reduces pain in 40–70% of sufferers.
Unlike Botox, there is no need for repeat treatment, and there is little risk of requiring catheters to empty your bladder. The battery in the permanent implant is effective for up to seven years.
The implant is very small and placed underneath the fat of the lower back / upper buttock area. The surgeon makes a small incision of about 3cm to insert the device during surgery, so recovery is quick and straightforward. The device is cushioned by the body's fat and so you will not be aware that you have any implant in that area although some patients say they are sometimes aware of the device when they lie in certain positions. In 5–10% of patients the device can cause discomfort and its position needs to be adjusted. The electrical stimulation is kept below detectable levels and the patient is not aware of the stimulation unless the pulses are turned up. There is usually an initial period for the first few weeks after the implant is inserted when you are getting used to the device and finding the right level for you.
Sacral nerve stimulation is also used to treat bowel frequency and urgency – a problem that is often associated with overactive bladder. SNS is also reported to help sexual dysfunction and improve sexual sensitivity for women.
Sacral nerve stimulation was first described in 1998 and now has ten years of accumulated evidence establishing its effectiveness and safety. Sacral nerve stimulation was approved by NICE (National Institute for Health and Clinical Excellence) in 2004 and is widely used in Spain, Holland and Germany. However, the technique has not been widely available in the NHS due to cost and limited expertise available in the UK.
To read a patient's account of their experience of sacral nerve stimulation, click here .
"We have been amazed at our patients' responses to the new technique. The implant has revolutionised their lives and allowed them to return to social activities, where they had previously lost confidence. We offer continued after care to adjust the device settings according to our patients' individual needs."
Julie Jenks, Specialist Nurse Practitioner, University College Hospital, London
"We have been amazed at our patients' responses to the new technique. The implant has revolutionised their lives and allowed them to return to social activities, where they had previously lost confidence. We offer continued after care to adjust the device settings according to our patients' individual needs."
Julie Jenks, Specialist Nurse Practitioner, University College Hospital, London
I work alongside Nurse Specialist Julie Jenks and we have the largest experience of sacral nerve stimulation for bladder dysfunction in the UK. I am the lead specialist for SNS and bladder dysfunction at University College Hospital, London. Together we have treated over 140 patients in the last 12 months and have many more waiting; with the majority finding their urgency and incontinence has significantly improved or ceased, and over 70% proceeding to the permanent implant after a test stimulation.
The stimulator runs continuously for up to seven years and will be invisible to everybody. Awareness of the neurostimulator will gradually diminish, and you may not even feel its presence. Sometimes, several visits are necessary to fine tune the settings during the first three months. Otherwise, you may only need a yearly check-up.
Airport screeningA way to identify people who may have a certain condition, among a group of people who may or may not seem to systems can cause the neurostimulator to turn OFF or ON. It does not change your stimulation parameters. Use your patient programmer to switch your neurostimulator to what it was before. To avoid possible problems with airport screening systems, you may want to show your InterStim identification card and ask those in charge to let you bypass the screening device.
There are specific restrictions while carrying out your activities, but you should avoid activities that involve sudden, excessive, or repetitive bending, twisting, bouncing, or stretching especially soon after the surgery. These movements could damage or move your implanted lead or affect the implanted neurostimulator. Usually, movements do not affect the sensation of the stimulation.
1. Herbison GP, Arnold EP. Sacral neuromodulation with implanted devices for urinary storage and voiding dysfunction in adults. Cochrane Database Syst Rev. 2009;15(2):CD004202
2. Van Kerrebroeck et al. Results of Sacral Neuromodulation Therapy for Urinary Voiding Dysfunction: Outcomes of a Prospective, Worldwide Clinical Study. The Journal of Urology. 2007;178:2029-2034
3. Chaabane W et al. Sacral neuromodulation for treating neurogenic bladder dysfunction: clinical and urodynamic study. Neurourology & Urodynamics. 2011;30(4):547-550
4. Gajewski JP, Al-Zahrani AA. The long-term efficacy of sacral neuromodulation in the management of intractable cases of bladder pain syndrome: 14 years of experience in one centre. British Journal of Urology International. 2011;107(8):1258-1264
5. Powell CR, Kreder KJ. Long-term outcomes of urgency-frequency syndrome due to painful bladder syndrome treated with sacral neuromodulation and analysis of failures. The Journal of Urology 2010;183(1):173-176


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Lay your Weapons Down
Kiros craft songs that are at once completely original and yet ring with an air of vague familiarity. Lay Your Weapons Down features a blend of melodic songwriting and faith-based lyrics that takes notes from such pop-rock songsmiths like fellow modern melodic rockers Three Days Grace and Saosin.
Publisher: [United States] : Ain'T No Grave Records, 2012.
Characteristics: 1 compact disc :,digital ;,12 cm.
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"Grill these and serve them as an appetizer to your guests paired with a frosty cold beer!" – Bennyh614
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2007 Toyota FJ Cruiser Parking Distance Sensor
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Parking Distance Sensor Reviews - 2007 Toyota FJ Cruiser
Standard Motor Products | T36025
Perfect replacement for the Toyota factory part at less than 1/2 the cost! I wouldn't have repaired the system for the cost of the factory replacement part. Nice to have that functionality back.
November 13th, 2014 | Posted by Sensor Price Makes Sense