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A Son of Martha
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Kittanning Firemen's Band to rally Steelers fans
Kittanning Firemen's Band to rally Steelers fans
Buzz up!
By Mitch Fryer, LEADER TIMES
Friday, January 16, 2009
About the writer
Mitch Fryer can be reached at email@example.com or 724-543-1303, ext. 242.
Home Delivery
The atmosphere leading up to the Pittsburgh Steelers-Baltimore Ravens AFC championship football game Sunday promises to be even more charged up than usual.
That's because the Kittanning Firemen's Band will be playing for the tailgate crowd and VIPs outside the main gate to Heinz Field.
The ever-rousing marching and concert band from Armstrong County is the invited guest of the Steelers to be the pep band for the rally.
About 37 members under the direction of Jason Krecota will be dressed in Steelers' attire and playing the familiar fight songs, including "The Pennsylvania Polka," and "Here we go Steelers," along with their usual patriotic marches to rev-up the fans for the big game.
In exchange for their music, the band will get tickets to the game and dinner. They also will play at halftime.
The Steelers contacted the band Tuesday with the proposition.
They quickly polled their members and found out they could get a good turnout.
"There's pretty much universal excitement among the members," said board member and band tuba player Mike Miller. "I mean, who wouldn't want to go to this game?"
"We're there as musicians who are fans of the Steelers, supporting our team by playing music and getting the crowd pumped up before the game," Miller said. "We like to think of it as one championship organization being a fan of another championship organization. It's been a great partnership the past few years and certainly something the members really look forward to."
Miller said Tyler Woodside, a percussionist and a junior member of the board of directors, made the phone calls to the members and did the planning and logistics for the trip.
According to Miller, the band has heard that Steelers president Dan Rooney is a big fan and that a picture of the band hangs in the trophy case along with the five Super Bowl trophies.
The Steelers have asked the band to arrive in advance of the game and play for a few hours. The band plans to mingle with the crowd as they play. They'll be standing and performing like a pep band. This is only the second time in the band's 60 seasons that it will be performing in January. The other time was in 2003 for the inauguration of Gov. Ed Rendell.
"It's a wonderful thing to be invited back for something this big, a championship game," said Krecota. "It's always important to put on a good show. It's a great experience for us to be getting the crowd roused up for a great game. We want to stay warm and have fun."
Trumpet player Mike Totos jumped in the air when he heard the band was playing for the Steelers. "I've been a Steelers fan all my life," Totos said. "It's going to be a great atmosphere and an epic game. I'm thrilled to be a part of the game and be able to watch it."
——— Mitch Fryer can be reached at firstname.lastname@example.com or 724-543-1303, Ext. 1342.
(Good for the Steelers for going old school and getting a good marching/concert band instead of some screaming rockshit band or worse yet some garbage rap crap. I'm sad I won't be able to hear them. - mesa)
Last edited by mesaSteeler; 01-16-2009 at 06:37 PM.
Tailgate Coordinator
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Re: Kittanning Firemen's Band to rally Steelers fans
How Cool!
It's not just Steeler Football, it's a way of Life! "I'm a Champion"
Water Boy
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Re: Kittanning Firemen's Band to rally Steelers fans
This is getting better every second. I can't wait to hear them play
Team President
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Re: Kittanning Firemen's Band to rally Steelers fans
Doesn't Lambert's kids go to Kittanning?
"Life is a journey and you never arrive" Chuck Noll 1969-91
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Re: Kittanning Firemen's Band to rally Steelers fans
Jack Lambert's children live the sporting life in Worthington
Buzz up!By Joe Starkey, TRIBUNE-REVIEW
Sunday, April 3, 2005
click to enlarge
Kittanning's Lauren Lambert
Chaz Palla/Tribune-Review
click to enlarge
Kittanning's Elizabeth Lambert
Chaz Palla/Tribune-Review
About the writer
Joe Starkey can be reached via e-mail or at 412-320-7810.
Home Delivery
Every so often, one of Lauren Lambert's schoolmates will realize that Lauren's father, a Little League baseball coach named Jack, was the raging, toothless middle linebacker on the Steelers' four Super Bowl teams of the 1970s.
Lauren's typical response, "That's just my dad."
Lauren's mother has witnessed a few of those encounters.
"They'll run up and say, 'That's not your dad!'" said Lisa Lambert, Jack's wife of 17 years. "The no teeth. The snarling. The legs pumping. They can't believe it's him."
Ah, but it is. The most revered of all Steelers icons has long been living a tranquil family life some 40 miles north of the site of old Three Rivers Stadium.
As tranquil, anyhow, as family life can be with four children playing about 10 different sports.
Jack and Lisa Lambert are raising their kids on a 125-acre plot in the rural outpost of Worthington (population: 763), seven miles west of Kittanning.
Jack Lambert, 52, was a volunteer deputy wildlife officer before he shifted gears several years ago. He now focuses on coaching youth baseball and basketball, tending to his land and working religiously to maintain the town's pristine ball fields.
"He fits in real well," said Dave Stewart, president of the Worthington Little League Association. "Before he started helping me mow the fields, he'd be up at (his son) Johnny's practices. One night, he said, 'You mind if I mow someday?'
"I said, 'Hell no, I don't care.'"
The Lambert clan includes Lauren, a junior at Kittanning High School; Elizabeth, a freshman; and their younger brothers John, 13, and Ty, 11.
"Most people do know (about her husband's identity), because we've lived here for 17 years," Lisa Lambert said. "But we try to keep it low. We don't flaunt it."
In fact, the Lamberts are a model of humility according to those who know them.
"They fit right into our program," said softball coach Tom Emminger. "They're very hard workers."
The Lambert girls took time to speak with a reporter after a Kittanning softball game Thursday. Lauren, who stands a shade under 6 feet, bats clean-up and plays center field for a team expected to make the WPIAL playoffs. Liz is a talented pitcher who could move into a starting role next season.
Their mother, the former Lisa Harbison of Plum, is a volunteer assistant with an impressive athletic background. She was a first-team All-ACC volleyball player at Clemson in 1980 and '81.
She met her future husband at an Oakmont nightspot in 1982, two years before Jack Lambert retired from the NFL.
Lauren and Liz are bright-eyed, well-spoken redheads who inherited their parents' competitive fire. Like their teammates, the two wear football player-style eye black during games.
Once in a while, they'll watch a tape of their father playing linebacker.
"He's a great inspiration," Lauren said. "He gets you going."
Jack Lambert doesn't watch the tapes. In fact, all remnants of his 11-year NFL career are packed in boxes in his basement.
He keeps a low profile at his daughter's sporting events, watching their basketball games from the hallway, through a window on a gym door.
"A lot of people don't know he's there," said Kittanning girls' basketball coach John Odrechowski.
The Lamberts emphasize academics and do not pressure their children in athletics, Lisa Lambert said.
Still, having a Hall of Fame father can create massive expectations. Lauren was Kittanning's leading rebounder and second-leading scorer (8.5 points per game) this past season. She's a .400-plus hitter in softball -- and sometimes senses people watching extra closely when she steps to the plate.
"They expect to see something amazing," she said, laughing.
Liz, the leading scorer on the JV basketball team, is five inches shorter than her sister but makes up for it with a large dose of dad's feistiness.
"She's sky-high no matter what -- every day, every practice," Odrechowski said. "I actually have to tell her to slow down."
The two boys likely will face more scrutiny, which is one reason their parents steered them away from football. John loves hockey -- his dad's favorite sport -- and both are into basketball and baseball.
"Keeping them away from football has probably been a good thing," Lisa Lambert said. "There's no comparison then."
Jack Lambert coaches his older son's Little League team and helps to coach his younger son's team.
"He's stern, but he's thorough," Stewart said. "The kids don't have the slightest idea who he is, either. They don't understand why the adults get so excited about seeing him."
None of the Lambert kids have been to a Steelers game, but they root for the team, and the girls sometimes wear No. 58 T-shirts to "Steelers Days" at school.
Does their father watch the games?
"Oh yeah, he watches," Lauren said.
"Not passionately," she said. "We like to hear him talk about, 'Oh, when we were playing, we wouldn't be allowed to do that.'"
Added Liz: "He'll say, 'They get warm benches. We froze.'"
"He thinks they're pampered today," Lisa Lambert said.
Jack Lambert rarely returns to the city, save for a handful of lucrative autograph-signing sessions each year. He wasn't available for an interview Thursday, but the conclusion of his Hall of Fame acceptance speech on Aug. 4, 1990, spoke eloquently to his priority in retirement.
"I would like my wife, Lisa, and my daughters to stand (his sons were not yet born)," Jack Lambert said. "There, ladies and gentlemen, is my Hall of Fame."
"Life is a journey and you never arrive" Chuck Noll 1969-91
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Re: Kittanning Firemen's Band to rally Steelers fans
Better than Styx!!!!
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High School Sports
Multi-sport coverage from the Express-News staff.
Judson, Sam Houston featured in preseason boys basketball rankings
The Texas Association of Basketball Coaches released its preseason poll this week, and a slew of local boys teams checked in near the top of the poll. Judson opens the year at No. 4 in the 6A poll. The Rockets only lost two games last season and lost to Galena Park North Shore in the […] [Read More]
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In this week's installment of the Cart Cast, fellow Express-News scribe David Hinojosa and I talk about Week 9′s games, look ahead at Week 10 and also start speculating about the playoffs. Also, in case you're interested in stalking David, you can find out where he usually hangs out, so I'd say it's worth a listen. [Read More]
Football: Top performers, Week 9
Each Monday, we like to show a little recognition for the standout players from the weekend's slate of games. Here's the area's best from Week 9. Passing 1. J.D. Raggio, Marion: 15 of 20, 239 yards, four TDs 2. Christopher Casias, Warren: 21 of 38, 384 yards, three TDs 3. Jonathan Hernandez, Edison: 9 of 14, 252 yards, four TDs Honorable mentions: East Central's […] [Read More]
Brennan and Blanco go up, Steele slides in AP state poll
The combination of a lopsided Brennan win and a narrow Steele victory appeared to be enough to shake up this week's Associated Press Class 6A state football poll. Brennan jumps up two spots to No. 7 following the Bears' 69-0 win against Jay. Steele drops two spots to No. 10 after the Knights' one-point win […] [Read More]
Cross country: Oct. 25 high school results
District 26-6A Meet At Roan Forrest Elementary School Boys 3 miles Team: 1, Johnson, 17; 2, Reagan, 59; 3, Lee, 89; 4, Churchill, 96; 5, Roosevelt, 127; 6, Madison, 152; 7, MacArthur, 196. Individual: 1, Jose Murillo, Johnson, 16:28.74; 2, Tyler Payne, Johnson, 16:42.42; 3, Nick Dingman, Johnson, 17:06.59; 4, Pablo Alvarez, Reagan, 17:12.88; 5, […] [Read More]
High School swimming
Saturday's results At Blossom Athletic Center Johnson-MacArthur Girls 200-Yard Medley Relay: 1, Johnson (Hailey Miller, Rachel DeYoung, Emma Walsh, Rebekah Poe), 2:01.14. 200-Yard Freestyle: 1, Megan Diamond, MacArthur, 2:01.60. 200-Yard Freestyle: 1, Leah Alexander, Lee, 2:03.06. 200-Yard IM: 1, Taylor Brown, Johnson, 2:20.66. 50-Yard Freestyle: 1, Berkley Freund, Johnson, 26.16. 100-Yard Butterfly: 1, Megan Diamond, […] [Read More]
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Hello readers! I'm Tiander Turpijn, I'm a Program Manager within the Customer Architecture & Technology (CAT) team here at Microsoft and I will start contributing to our Building Clouds team blog as of today. I will be focusing on Datacenter and System Center automation, but will also talk about...
25 Jul 2013
Blog Post:
Troubleshooting Windows Azure Pack & Gallery Items (VM Roles) (Part 1)
Anders Ravnholt [MSFT]
Hello readers Today we are going to look at another new area which came to market with Windows Azure Pack (WAP) and System Center 2012 R2. The new concept is called Gallery Items and is a new way to distribute applications and workloads (e.g PaaS apps, VM Templates) using Windows Azure Pack and Virtual...
25 Nov 2013
Blog Post:
Windows Azure Pack - Installing & Configuring Series.
Anders Ravnholt [MSFT]
After numerous requests from people we have talked to, we are now doing a blog post on how to install Windows Azure Pack and configuring the basic settings for IaaS and Databases Resource Providers. In the following series of blog posts Shri from the Windows Azure Pack Product team and I will explain...
6 Dec 2013
Blog Post:
Troubleshooting Windows Azure Pack & Usage (Part 2)
Anders Ravnholt [MSFT]
In the previous post we talked about how you can verify if Usage and Metring is working In this blog post it's time to see what could go wrong during installation / configuration of Usage & Metering The following are potential issues you might run into: SPF cannot connect to OM DW. WAP Usage is failing...
21 Nov 2013
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|By Maureen O'Gara
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|October 29, 2009 05:45 AM EDT
MySQL Journal on Ulitzer
Monty Widenius, the creator of the MySQL open source database – which is apparently all that stands between Oracle and its acquisition of Sun – thinks that Oracle shouldn't have his baby and that the European Commission – whose investigation into MySQL has put the Oracle-Sun merger in limbo – should force Oracle to spit it out to another company.
Oracle CEO Larry Ellison, a guy with a collector's temperament not given to letting things that belong to him go, has said he wants to keep MySQL and has claimed to be watching Sun's revenue plunge by $100 million a month while he waits for the EC to finish its probe, a exercise that could take well into January.
MySQL isn't supposed to be why Larry shocked everybody and offered $7.4 billion for poor down-on-its-heels Sun back on April 20. Sticking it to IBM was probably something he relished and with Java, Solaris and Sun servers Oracle can take a run at turning into an enterprise version of Apple. Larry always did have a lot of regard for Apple.
But Oracle also had a certain yen to own MySQL and before Sun up and spent a billion dollars buying the joint, Oracle made a pass at buying it for itself. Maybe it did mean to roll over on it and smother it as some people say but – and we have this on very good authority – Monty was all for selling out to Oracle so it's kind of odd now that he's trying to foment resistance to the idea of Oracle and MySQL being together at last.
Monty says the European Commission is "absolutely right to be concerned" about Oracle getting its hands on MySQL and has taken it into his head that Oracle should commit to selling MySQL to a "suitable third party" to resolve the imagined antitrust impasse and potential conflict of interest (http://monty-says.blogspot.com).
If nothing else Larry is doubtlessly committed to the idea of keeping MySQL out of third party's hands, especially since those hands might in all likelihood belong to, oh, say, Red Hat, VMware or Google.
To raise the hue and cry and lobby the EC to stop Oracle from getting MySQL Monty has tied up with one of the best rabble-rousers in Europe, Florian Mueller, late of the campaign to stop software patents in the EU.
According to Mueller, "Every day that passes without Oracle excluding MySQL from the deal is further evidence that Oracle just wants to get rid of its open source challenger and that the EU's investigation is needed to safeguard innovation and customer choice. This is highly critical because the entire knowledge-based economy is built on databases."
Mueller helped Monty prepare to testify before the EC on the anti-competitive impact of Oracle owning MySQL back in August and has apparently been poking a stick in the ribs of regulators in Russia, China, South Korea, South Africa, Switzerland and maybe Canada to get them to sit up and pay attention.
He's also gotten easily provoked consumer advocate Ralph Nader and Free Software Foundation founder Richard Stallman up in arms.
Stallman, Knowledge Ecology International (KEI), a social justice organization founded by Nader, and a UK-based thing called the Open Rights Group (ORG) sent an open letter to EU competition commissioner Neelie Kroes Tuesday arguing against the Oracle-MySQL combine and claiming that forking, which was previously Monty's fallback position, isn't a viable option to ensure competition in the marketplace, contrary to what defenders of the proposed takeover claim.
The letter claims that "Oracle seeks to acquire MySQL to prevent further erosion of its share of the market for database software licenses and services, and to protect the high prices now charged for its proprietary database software licenses and services.
"If Oracle is allowed to acquire MySQL, it says, "it will predictably limit the development of the functionality and performance of the MySQL software platform, leading to profound harm to those who use MySQL software to power applications."
The letter lays out their objections in detail:
"Defenders of the Oracle acquisition of its competitor naively say Oracle cannot harm MySQL, because a free version of the software is available to anyone under GNU GPL version 2.0, and if Oracle is not a good host for the GPL version of the code, future development will be taken up by other businesses and individual programmers, who could freely and easily 'fork' the GPL'd code into a new platform. This defense fails for the reasons that follow.
"MySQL uses the parallel licensing approach to generate revenue to continue the FLOSS development of the software. If Oracle acquired MySQL, it would then be the only entity able to release the code other than under the GPL. Oracle would not be obligated to diligently sell or reasonably price the MySQL commercial licenses. More importantly, Oracle is under no obligation to use the revenues from these licenses to advance MySQL. In making decisions in these matters, Oracle is facing an obvious conflict of interest – the continued development of a powerful, feature-rich free alternative to its core product.
"As only the original rights holder can sell commercial licenses, no new forked version of the code will have the ability to practice the parallel licensing approach, and will not easily generate the resources to support continued development of the MySQL platform.
"The acquisition of MySQL by Oracle will be a major setback to the development of a FLOSS database platform, potentially alienating and dispersing MySQL's core community of developers. It could take several years before another database platform could rival the progress and opportunities now available to MySQL, because it will take time before any of them attract and cultivate a large enough team of developers and achieve a similar customer base.
"Yet another way in which Oracle will have the ability to determine the forking of MySQL relates to the evolution of the GNU GPL license. GPL version 2.0 (GPLv2) and GPL version 3.0 (GPLv3) are different licenses and each requires that any modified program carry the same license as the original. There are fundamental and unavoidable legal obstacles to combining code from programs licensed under the different GPL versions. Today MySQL is only available to the public under GPLv2.
"Many other FLOSS software projects are expected to move to GPLv3, often automatically due to the common use of the "any later version" clause. Because the current MySQL license lacks that clause, it will remain GPLv2 only and it will not be possible to combine its code with the code of many GPLv3-covered projects in the future. Given that forking of the MySQL code base will be particularly dependent on FLOSS community contributions - more so than on in-company development - the lack of a more flexible license for MySQL will present considerable barriers to a new forked development path for MySQL.
"We note that Oracle has been conspicuously silent about its plans for MySQL since the announcement of the Sun acquisition, until very recently. Oracle CEO Larry Ellison, in the first public statement on the subject, insisted that Oracle will not spin-off MySQL after the merger and also made the outlandish claim that Oracle's product was not in competition with MySQL. While some merger defenders have suggested that the MySQL acquisition will bolster Oracle's position with respect to competition from Microsoft's SQL Server, it is naturally more likely that Oracle will prioritize protecting its core product, the Oracle proprietary database, from further erosion of market share and the shrinking of licensing fees, and this will most efficiently be accomplished by curbing the growth and improvement of the free version of MySQL." See http://keionline.org/ec-mysql.
Mueller, by the way, who was a MySQL shareholder and so should have made out when Sun bought it, claims that "letting Oracle have MySQL is worse than putting the fox in charge of the henhouse because the hens are no threat to the fox while MySQL makes Oracle lose customers and forces it to grant discounts to customers threatening to defect."
Ironically Mueller came by his MySQL stock because he was a strategy advisor of MySQL's ex-CEO Marten Mickos. Mueller and Mickos now find themselves on opposite sides of the fence.
Mickos, an advocate of the fork-as-a-last-resort approach to the problem, recently wrote his own open letter to Kroes urging the EC to rubberstamp Oracle's acquisition of Sun and MySQL with all possible haste claiming that further delay will blunt MySQL's competitive edge and discourage venture capitalists from funding open source companies.
He was in Brussels last week testifying on behalf of the acquisition. He says he has no commercial or financial interests in MySQL, Sun or Oracle.
There are rumors of an EC deadline this week to decide whether to torture Sun and Oracle some more and keep the investigation going. Mueller, meantime, means to take his campaign to the press on both sides of the pond.
In August, he wrote a position paper that Monty Program Ab, Monty's new company in Finland working on MariaDB, the Maria database storage engine and other MySQL-related technologies, provided to the EC. The latest version is at (ftp://ftp.askmonty.org/secret/COMP_M.5529_Req_to_protect_disruptive_inno...).
Oracle was clearly wrong not to anticipate problems with the EC and at least get the review process started sooner.
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text:
750 Jennings Road
Evans, Georgia, 30809
Commute to Downtown Martinez
Almost all errands require a car.
Score Details
750 Jennings Road has a Walk Score of 2 out of 100. This location is a Car-Dependent neighborhood so almost all errands require a car.
This location is in Evans. Nearby parks include Evans Towne Center Dog park and Evans Towne Center Park.
Nearby schools include Academics Plus, Blue Ridge Elementary School and Lakeside High School.
The closest grocery store is ANATOLIAN OLIVE OIL.
Nearby coffee shops include Bean Baskette Coffee / Tavern at the Bean and Waffle House. Nearby restaurants include Jones Creek Restaurant & Clubhouse, Little Caesars and El Alazan Mexican Restaurant.
Explore how far you can travel by car, bus, bike and foot from 750 Jennings Road.
View all Evans apartments on a map.
Popular apartment searches include fireplace, hardwood floor and pool.
This location is in the city of Evans, GA. Evans has an average Walk Score of 9 and has 29,011 residents.


text:
Even though we ARE Nikon lovers,we are NOT affiliated with Nikon Corp. in any way.
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I've got a mint, collectible condition Noct up for sale. This legendary and out-of-production lens is hard to find in this condition. There are no marks on it and everything functions perfectly. Just a couple of normal dust specs inside. The last mint Noct sold for $5,799 elsewhere, but I'm not even pricing mine as high as currently listed ones. I have over 500 transactions on the big site with 100+ feedback, so feel free to check me out. I'm listing this lens here for $4,295 shipped to the continental USA. International buyers will have to pay all shipping and insurance costs using a company that will fully insure it.
Visit my Nikonians gallery.
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text:
A projection lens for imaging a pattern arranged in an object plane onto an image plane using electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region has several imaging mirrors between its object plane and image plane that define an optical axis of the projection lens and have reflective coatings. At least one of those mirrors has a graded reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, where that coating axis is acentrically arranged with respect to the optical axis of the projection lens. Providing at least one acentric, graded, reflective coating allows designing projection lenses that allow highly uniform field illumination, combined with high total transmittance.
1. A projection lens for imaging a pattern, arranged in an object plane, onto an image plane employing electromagnetic radiation from the extreme ultraviolet spectral region, the projection lens comprising:
a plurality of imaging mirrors, each having a reflective coating, the plurality of mirrors defining an optical axis of the projection lens;
wherein the plurality of mirrors are disposed between the object plane and the image plane and are aligned for projection of an off-axis scanning field from the object plane onto the image plane, the scanning field defining a plane including a scanning direction and a cross-scan direction perpendicular to the scanning direction;
wherein at least one of the plurality of mirrors has a graded, reflective coating; and
wherein a field uniformity of the off-axis scanning field, measured in the cross-scan direction, is about 2.5% or less.
2. The projection lens according to
3. The projection lens according to
4. The projection lens according to
5. The projection lens according to
6. The projection lens according to
7. The projection lens according to
8. The projection lens according to
9. The projection lens according to
10. The projection lens according to
11. The projection lens according to
12. The projection lens according to
13. The projection lens according to
14. The projection lens according to
15. The projection lens according to
16. A projection exposure system for use in microlithography employing electromagnetic radiation from the extreme ultraviolet spectral region, the projection exposure system comprising:
an illumination system; and
a projection lens according to
17. A method of fabricating microdevices, the method comprising:
providing a mask having a prescribed pattern;
illuminating the mask with electromagnetic radiation from the extreme ultraviolet spectral region; and
projecting, via the projection lens according to
This is a continuation of application Ser. No. 11/183,877 filed on Jul. 19, 2005, now U.S. Pat. 7,199,922, which is hereby incorporated into the present application by reference and which is a divisional of application Ser. No. 10/208,842 filed Aug. 1, 2002, now U.S. Pat. No. 6,927,901, which is hereby incorporated into the present application by reference and which claims benefit of Provisional Application No. 60/308,861 filed Aug. 1, 2001, which is incorporated into this application by reference.
1. Field of the Invention
The invention relates to a projection lens for imaging a pattern arranged in an object plane onto an image plane employing electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region.
2. Description of the Related Art
Projection lenses of that type are employed on projection exposure systems used for fabricating semiconductor devices and other types of microdevices and serve to project patterns on photomasks or reticles, which shall hereinafter be referred to using the generic terms �masks� or �reticles,� onto an object having a photosensitive coating at ultrahigh resolution.
In order to allow creating even finer structures, various approaches to improving the resolving power of projection lenses are being pursued. It is well known that resolving power may be improved by increasing the image-side numerical aperture (NA) of the projection lens. Another approach is employing shorter-wavelength electromagnetic radiation.
However, improving resolution by increasing numerical aperture has several disadvantages. The major disadvantage is that the attainable depth of focus (DOF) decreases with increasing numerical aperture, which is disadvantageous because, for example, a depth of focus of the order of at least one micrometer is desirable in view of the maximum-attainable planarity of the substrate to be structured and mechanical tolerances. Systems that operate at moderate numerical apertures and improve resolving power largely by employing short-wavelength electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region have thus been developed. In the case of EUV-photolithography employing operating wavelengths of 13.4 nm, resolutions of the order of 0.1 μm at typical depths of focus of the order of 1 μm may theoretically be obtained for numerical apertures of NA=0.1.
It is well known that radiation from the extreme-ultraviolet spectral region cannot be focused using refractive optical elements, since radiation at the short wavelengths involved is absorbed by the known optical materials that are transparent at longer wavelengths. Mirror system that have several imaging, i.e., concave or convex, mirrors that have reflective coatings arranged between their object plane and image plane and define an optical axis of the projection lens are thus employed in EUV-photolithography. The reflective coatings employed are typically multilayer coatings having, for example, alternating layers of molybdenum and silicon.
A reflective lens for use in EUV-photolithography that has four mirrors, each of which has reflective coatings with uniformly thick layers, is disclosed in U.S. Pat. No. 5,973,826.
Another EUV-photolithographic system is shown in U.S. Pat. No. 5,153,898. That system has a maximum of five mirrors, at least one of which has an aspherical reflecting surface. Numerous combinations of materials for multilayer reflective coatings suitable for use in the EUV are stated. Their layers all have uniform thicknesses.
Although reflective coatings with uniform thicknesses are relatively simple to deposit, in the case of imaging systems where the angle of entry, or angle of incidence, of the radiation employed on those areas of the mirrors utilized varies, they usually generate high reflection losses, since the thicknesses of their layers are optimized for a specially selected angle of incidence, or a narrow range of angles of incidence, only. Another of their disadvantages is a nonuniform pupil irradiance that causes a telecentricity error, structurally dependent or field-dependent resolution limits (so-called �H-V-differences or �CD-variations�), and generally lead to a narrowing down of the processing window.
Reflective EUV-imaging systems that have mirrors that have graded reflective coatings that are characterized by the fact that they have a film-thickness gradient that is rotationally symmetric with respect to the optical axis of the entire system are also known (cf. U.S. Pat. No. 5,911,858). Employing graded reflective coatings allows achieving a more uniform distribution of the reflected intensity over a certain range of angles of incidence.
Photolithographic equipment, or steppers, employ two different methods for projecting a mask onto a substrate, namely, the �step-and-repeat� method and the �step-and-scan� method. In the case of the �step-and-repeat� method, large areas of the substrate are exposed in turn, using the entire pattern present on the reticle. The associated projection optics thus have an image field that is large enough to allow imaging the entire mask onto the substrate. The substrate is translated after each exposure and the exposure procedure repeated. In the case of the step-and-scan method that is preferred here, the pattern on the mask is scanned onto the substrate through a movable slit, where the mask and slit are synchronously translated in opposite directions at rates whose ratio equals the projection lens' magnification.
It is one object of the invention to provide an EUV-projection lens operable at high numerical aperture that will allow largely correcting distortion errors along all image directions and providing sufficiently symmetric, high-intensity, illumination of the image field, while maintaining adequate-quality imaging. It is another object to provide a projection lens that, from the optical standpoint, represents a reasonable compromise among wavefront errors, distortion, total transmittance, field uniformity, and uniform pupil irradiance.
As a solution to these and other object the invention, according to one formulation, provides a projection lens for imaging a pattern arranged in an object plane onto an image plane employing electromagnetic radiation from the extreme-ultraviolet (EUV) spectral region, wherein several imaging mirrors that have reflective coatings and define an optical axis of the projection lens are arranged between the object plane and the image plane, wherein at least one of those mirrors has an acentric, graded, reflective coating that has a film-thickness gradient that is rotationally symmetric with respect to a coating axis, wherein that coating axis is acentrically arranged with respect to the optical axis of the projection lens.
The acentricity or eccentricity of a graded, rotationally symmetric, reflective coating with respect to the optical axis of the entire system provided by the invention yields an additional degree of freedom for optimizing the optical characteristics of the projection lens that is lacking in conventional systems, where due account should be taken of the fact that the design, or optical layout, of an EUV-projection system may be roughly segregated into two, consecutive, stages. The first stage is optimizing the layout and designs of the uncoated mirror substrates using a computer and suitable optical-design software, duly allowing for the traditional criteria, such as wavefront aberrations, distortion, assembly conditions, fabrication conditions, etc. Their reflective coatings are then computed and the design recomputed, duly taking account of their reflective coatings. The coatings are effectively �stuck onto� the uncoated substrates, which generally results in imaging performance that is much worse than that of the system with uncoated optics, which, as a rule, will be intolerable unless the system is subsequently reoptimized.
Among other things, that reoptimization should take account of wavefront aberrations and wavefront apodizations caused by the reflective coatings. The competing effects involved are primarily total system transmittance and field uniformity. It has been found that these key properties are usually affected in opposite manners by the sorts of design modifications available. Good compromise solutions that provide adequate total transmittance combined with adequate field uniformity may be particularly favorably obtained using acentric, rotationally symmetric, reflective coatings, where it has generally been found that providing acentric, graded, reflective coatings is particularly beneficial to total transmittance. Field uniformity, on the other hand, is benefited by reflective coatings that are centered on the optical axis.
Angular-range computations for the individual reflective surfaces, from which, in particular, the area of each mirror that is actually utilized (their �footprints�), the average angle of incidence at every point on their surface and the angular bandwidths, or ranges of angles of incidence, at each point on their surfaces may be derived, usually serve as the starting point for this reoptimization. The particularly important items of that data are the average angles of incidence and the ranges of angles of incidence (angular bandwidths).
Since the primary purpose of the reflective coatings employed on EUV-systems is reflecting as much of incident electromagnetic radiation as possible, designs may be optimized for maximum reflectance, where the average angles of incidence at every point obtainable from angular-range computations may be called upon and used as a basis for computing the film thicknesses needed for optimizing reflectance. The manner in which this proceeds will be largely determined by the shape of the object field, which, in the case of the preferred embodiment, is an annular segment.
It has proven beneficial to provide that at least that mirror that has the largest range of angles of incidence, i.e., the largest angular bandwidth, has an acentric, graded, reflective coating. The invention is based on the recognition that employment of constant film thicknesses causes enormous reflectance losses on systems where angles of incidence vary widely over their reflective sections, since films that have constant thicknesses may be optimized for a specially selected angle of incidence, or for a narrow range of angles of incidences, only. This is particularly a problem on high-aperture systems, e.g., systems for which NA>0.2, since angles of incidence on their mirrors are largely determined by their numerical aperture. Once those mirrors that have the largest range of angles of incidence have been identified, design modifications, such as shifting a rotationally reflective coating off-axis, will allow highly effectively tailoring the system's imaging characteristics.
In the case of a preferred embodiment, the range of angles of incidence of that mirror that has the largest range of angles of incidence extends to angles less than 5� to 10� and angles exceeding 10� to 15�. The range of angles of incidence involved may, for example, range from about 1� to about 17�.
In cases where a reflective system is to be optimized for extremely high total transmittance and field uniformity is either unimportant or plays a minor role, it may be beneficial to employ at least one of those mirrors having the largest range of angles of incidence has an acentric, graded, reflective coating whose film-thickness gradient may be optimized in the radial direction such that they will have high reflectance for the radiation employed over the full range of angles of incidence involved. However, in cases where complex optimizations are involved, it may turn out that employing coatings that have been optimized for high reflectance will displace the system so far from an original local minimum that had been reached that that minimum will no longer be automatically locatable, which might result in a new design, instead of a reoptimized design.
Since employing a single, acentric, graded, reflective coating on a reflective system may, in addition to the desired beneficial effects, also adversely affect imaging performance, a preferred embodiment has a mirror that has a first, acentric, graded, reflective coating and at least one other mirror that has a second, acentric, graded, reflective coating whose acentricities, film-thickness gradients, etc., have been adapted to suit one another such that the contributions of their reflective coatings to certain imaging errors are at least partially compensated, where distortion along the cross-scan direction (the x-direction) will be particularly critical, since, for this sort of distortion, there is no compensating effect along the orthogonal y-direction due to the scanning. In the case of preferred embodiments, the acentricities of their reflective coatings are thus configured such that their coating axis is acentric with respect to the projection lens' optical axis along a y-direction, which, in the case of a scanner, corresponds to the scanning direction.
It has proven beneficial to provide that the film thicknesses, d, of their rotationally symmetric film-thickness gradients have the following form:
A preferred projection lens that will be described in detail in conjunction with a sample embodiment has six mirrors between its object plane and image plane. The fifth mirror following its object plane is that mirror that has the largest range of angles of incidence. In the case of a system that has been optimized for maximum reflectance, this mirror may have a centered, graded, reflective coating. In the case of other embodiments, several of their mirrors are provided with centered, graded, reflective coatings that have been adapted to suit one another such that their pupil-irradiance distributions are substantially rotationally symmetric. Preferred here are two, and no more than four, such mirrors, since lateral film-thickness gradients are difficult to deposit. At least this fifth mirror is provided with an acentric, graded, reflective coating in order to allow simultaneously optimizing several quality criteria, in particular, total transmittance and distortion.
Particularly beneficial results are achieved when at least one of those mirrors that precede the fifth mirror, for example, the third or fourth mirror, also has an acentric, graded, reflective coating, where the axes of rotation of both film-thickness gradients of the cascaded, graded, reflective coatings are acentrically displaced parallel to the optical axis such that their respective contributions to distortion along the cross-scan direction at least partially compensate one another.
The foregoing and other characteristics will be apparent, both from the claims and from the description and the drawings, where the individual characteristics involved may represent characteristics that are patentable alone or in the form of combinations of subsets thereof in an embodiment of the invention and in other fields.
In the following description of the major principles of the invention, the term �optical axis� shall refer to a straight line or a sequence of straight-line segments passing through the paraxial centers of curvature of the optical elements involved, which, in the case of embodiments described here, consist exclusively of mirrors that have curved reflecting surfaces. In the case of those examples presented here, the object involved is a mask (reticle) bearing the pattern of an integrated circuit or some other pattern, such as a grating. In the case of those examples presented here, its image is projected onto a wafer coated with a layer of photoresist that serves as a substrate, although other types of substrate, such as components of liquid-crystal displays or substrates for optical gratings, may also be involved.
A typical layout of an EUV-projection lens 1 based on a preferred sample embodiment is shown in
As may be seen from
All reflecting surfaces of the mirrors 4-9 have reflectance-enhancing reflective coatings deposited on them. In the case of preferred embodiments, these coatings are stacks of, for example, about forty alternating pairs of layers, each of which includes a layer of silicon and a layer of molybdenum.
As related to
Table 1 summarizes the design shown in tabular form, where its first row lists the number of the reflective, or otherwise designated surfaces, involved, its second row lists the radius of those surfaces, and third row lists the distance between the respective surface involved and the next surface. The algebraic signs of the radii have been chosen such that a positive sign corresponds to a center of curvature of the reflecting surface that lies on the image-plane side. Its fourth through ninth rows, which are designated �A� through �E,� list the aspheric coefficients of the aspherical reflecting surfaces. It may be seen that all reflecting surface are spherically curved. Their aspherical surfaces may be computed using the following equation:
where 1/r is their curvature and h is the distance of a point on their surface from the optical axis. p(h) thus represents the radial distance of a point on their surface from the inflection point of their surface along the z-direction, i.e., along the optical axis. The constants K, A, B, etc., are listed in Table 1.
The coefficients, C0, C2, xde, and yde, listed in the rows that follow describe the film-thickness gradients for the reflective coatings that, in the case of a preferred embodiment, are applied to the respective mirrors, in accordance with the formula appearing in Eq. 1, which has been explained above, where r0=√{square root over (xde2+yde2)}.
The effects that the reflective coatings chosen have on the imaging performance of the projection lens will now be discussed in several stages.
Computerized design of those reflective coatings was conducted under the boundary condition that each of the coating designs employed should be allowed to distort the transmitted wavefront only to the point where the entire system would not be displaced from a local minimum of its characteristics that was found when the system's basic design was developed for the case of uncoated substrates, where higher-order wavefront errors hardly occurred at all. The major effects are distortion and defocusing. In addition to the wavefronts, described by, for example, Zernike coefficients and distortion along the scanning direction, the y-direction, and the cross-scan direction, the x-direction, the quality criteria that apply to such coating designs are field uniformity and pupil apodization. System design and fabrication characteristics remain virtually unchanged compared to the those of the basic design with uncoated substrates.
We shall start off by describing a projection lens, all of whose reflective coatings have constant film thicknesses, where it is useful to compute an average angle of incidence from the computations of ranges of angles of incidence for all mirrors, where their average angles of incidence should be computed over their entire utilized surfaces. The associated, optimal, film thicknesses are then computed, based on these global average angles of incidence, and inserted into an associated coating design in a known manner. The major effect of these uniformly thick films is a constant image offset along the scanning direction, accompanied by a readily recognizable defocusing. This first-order error may be corrected by a reoptimization. Wavefront aberrations, which are designated by their rms-values, were about 20% worse than those for designs with uncoated mirrors.
These schematic representations show that a pronounced pupil apodization occurs. The irradiance level varies from about 3% to 14% over the pupil. Those areas having differing pupil irradiances are indicated by contours of constant intensity in
In the case of the design shown in
A beneficial compromise between high reflectance and acceptable wavefront corrections may be achieved by providing that at least this mirror 8 has a rotationally symmetric, graded, reflective coating whose film-thickness gradient may be described by Eq. 1.
It has been found that in order to significantly improve reflectance it may be sufficient to adapt the film-thickness gradient along the symmetry axis to suit the average angle of incidence involved.
This will usually be a linear gradient and may be well-adapted using the polynomial of Eq. 1, provided that a corresponding acentricity (r0≠0) may be tolerated.
We have been able to show that this distortion along the cross-scan direction is largely attributable to the acentricity of the graded reflective coating on the fifth mirror 8. This effect can thus be reduced by keeping the acentricity involved small or arranging the graded reflective coating such that it is rotationally symmetric with respect to the optical axis. Typical optical characteristics of a design that employs a centered, graded, reflective coating on the fifth mirror are shown in
Another embodiment that has been optimized to yield a rotationally symmetric pupil apodization will now be described, based on
An embodiment that allows a compromise between total transmittance and field uniformity will now be described, based on
To specialists in the field, it will be clear from the explanation of the fundamental principles of the invention that, in the case of projection lenses designed for use in EUV-microlithography, employing suitably applied and, if necessary, combined, acentric, graded, reflective coatings will allow good compromises between total transmittance and field uniformity. Particularly beneficial therefor are designs that employ several, acentric, graded, reflective coatings, since employment of suitable relative arrangements of such coatings allows compensating for their adverse effects on imaging errors, such as distortion, while largely retaining their good total transmittance. If necessary, any intolerable residual errors may still be eliminated by employing additional, acentric, graded, reflective coatings. For example, an acentric grading may be applied to the first mirror in order to minimize the acentricity at the pupil recognizable in
The above description of the preferred embodiments has been given by way of example. From the disclosure given, those skilled in the art will not only understand the present invention and its attendant advantages, but will also find apparent various changes and modifications to the structures and methods disclosed. It is sought, therefore, to cover all changes and modifications as fall within the spirit and scope of the invention, as defined by the appended claims, and equivalents thereof.
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Battier wears U.S. colors -- black and blue -- with pride
SAPPORO, Japan -- Shane Battier had a quick response when he was asked to define his role on Team USA.
The U.S. made it through the preliminary round unscathed, learning a lesson to take no one lightly after having a much tougher time than any of them had expected in defeating Italy -- a team with no NBA players -- during opening round play in Sapporo, Japan.
The chances are extremely remote that the Americans will see another opponent without an NBA player on its roster, and for their first challenge they'll go up against a former overall No. 1 NBA draft pick in Andrew Bogut, a guy who had plenty to say a while back about the state of the U.S. national team.
• To read more of Chris Sheridan's analysis from the FIBA World Championship, click here.
"See these floor burns?" he said, motioning to a nasty red spot on his forearm. "That's my role."
Battier doesn't make many highlight shows. But he's become an important part of the U.S. team as it prepares for the second round of the FIBA world championships.
The U.S. completed a five-game sweep of Group D with a 103-58 victory over Senegal on Thursday night. The Americans face Australia in the second round Sunday in Saitama. A victory in that game could set up a showdown with Germany and Dirk Nowitzki in the quarterfinals.
Battier is averaging 5.8 points per game through five games, all victories. He has 11 rebounds, five assists and three steals.
Those numbers don't jump off the stat sheet. But numbers don't begin to tell the story of the 27-year-old's contribution -- unless they start tallying bruises.
On a star-laden team, Battier is the guy most likely to incur bodily harm.
The Americans' 121-90 victory over China here this week featured a typical Battier performance. He scored the U.S.' first five points and didn't make another bucket the rest of the night.
But afterward, his teammates were buzzing about how Battier stood his ground when China's Yao Ming barreled through him. Yao, who was called for a charge, and Battier will be teammates with the Houston Rockets next season.
"I love playing with Shane because he does all the little things, like taking charges, chasing the ball, playing great defense," U.S. forward Elton Brand said. "When you look at this guy, he may be scoring seven, but he's responsible for numerous points as well as good defense. I really appreciate what he does."
Brand played with Battier at Duke in 1998 and 1999. Back then, Battier was more star than the workman. In 2000-01, he was the consensus National Player of the Year after leading Duke to the national title.
Battier's scoring average increased each season in Durham, peaking at 19.9 points per game his senior year. Vancouver picked him sixth overall in the 2001 draft. After he averaged 14.4 points per game in his rookie season, Battier's scoring average dropped in his second and third years, to a career low of 8.5 points per game in 2003-04.
A role player was born.
No longer considered a scorer, the 6-8 Battier found other ways to make himself useful. And that got the attention of U.S. coach Mike Krzyzewski, who loved to rave about Battier when he coached him at Duke.
"Shane is the ultimate role player," Krzyzewski said here this week.
Even on the talented U.S. team, which features star captains LeBron James, Dwyane Wade and Carmelo Anthony, there's a place for a guy who knows his role.
Battier, who has represented the U.S. in four other competitions, is enjoying every minute of the experience.
"It probably has been one of the best basketball experiences I've had in my life," he said. "Unbelievable opportunity. A chance to play with some great players and be around some great people for a great country. The pictures I've taken on this trip and the memories I have will be with me forever."
Although Anthony and Wade have dominated the spotlight in the group play, Battier has provided a few snapshots of his own.
On a team that has struggled with long-range shooting, Battier is 6-for-10 from beyond the 3-point arc.
But his defense may be his most valuable asset, especially after Krzyzewski cut Bruce Bowen, widely considered the Americans' best defender.
"Well, I try," Battier said. "I'm trying to earn my hotel room, my uniform somehow. If I can just run around, get a couple of loose balls, make some shots, that's my job."
Battier's made a career of it. And now he's helping U.S. make a run for its first world championship since 1994, one little play at a time.
"There are a bunch of small plays that end up becoming big plays," Battier said. "Small plays are not something that you can turn on and off. You have to do those things every chance you get. For me, that's what I've been able to build a career out of."
Copyright 2006 by The Associated Press
FIBA World Championship
When: Aug. 19-Sept. 3
Where: Japan
Schedule | Standings | Scoreboard
• Spain routs Greece for gold medal
• Lithuania beats Germany for seventh place
• Sheridan: Team USA rebounds
• U.S. beats Argentina, wins bronze
• Gasol out with partial fracture
• France beats Turkey, finishes fifth
• Sheridan: U.S. fails at worlds, again
• Broussard: U.S. has lost grip on game
• Greece beats Team USA 101-95
• Spain beats Argentina, will play for gold
• Sheridan: Coach K's Greek tweak
• Fraschilla breaks down final four
• Sheridan: Things to dislike about win
• U.S. beats Germany 85-65 with D
• Greece beats France, awaits U.S.
• Spain, Argentina bring similarities to semi
• Turkey, France will play for fifth
• Sheridan: U.S. ready for Dirk attack
• Sheridan: U.S. will win silver
• Spain, Argentina win, set up showdown
• Sheridan: World media likes U.S. chances
• U.S. routs Australia, 113-73
• Roundup: Nowitzki saves Germany
• Roundup: Argentina, Lithuania win
• Sheridan: Bizarre Lithuania ending
• Scoop: If all else fails, pray
• Fraschilla breaks down round of 16
• Sheridan: U.S. braces for medal round
• Sheridan blog: U.S.-Australia anecdotes
• U.S. rests Wade in easy win over Senegal
• Sheridan: Bittersweet for Bosh
• Melo scores 35 as U.S. wins group
• Sheridan: Wake-up call
• Rules: FIBA vs. NBA
• Sheridan: U.S. finding form
• U.S. cruises past Slovenia 114-95
• Sheridan: Battier survives Yao
• USA blows out China 121-90
• U.S. 111, Puerto Rico 100
• Sheridan: Mixed grades for opener
• Aug. 24: Nowitzki's 47 fuel Germany in 3 OTs
• Aug. 23: Argentina, Spain win groups
• Aug. 22: Yao can't save China in OT
• Aug. 21: Argentina, Angola reach Sweet 16
• Aug. 20: Puerto Rico gets win
• Aug. 19: Germany, Argentina win
• Wade likes coming off bench
• New Zealand coach resigns
• Battier wears U.S. colors with pride
• Paul dishes on (or to) U.S. stars
• Ginobili doesn't mind sharing minutes
• Angola no longer sacrificial lamb
• Stiebing resurrects career as coach of Qatar
• Sheridan: U.S. won't win tourney
• Fraschilla: Argentina formidable in Group A
• Fraschilla: Nowitzki, Gasol in Group B
• Fraschilla: Greece, Brazil highlight Group C
• Fraschilla: U.S. favored in Group D


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Legislative candidate forums in Alexandria finalized
Details have been finalized for the pair of Legislative Candidate Forums scheduled during October in Alexandria, designed as an education opportunity for local voters.
Each forum will have a time for questions prepared by the Alexandria Lakes Area Chamber of Commerce Legislative Committee along with a time for audience questions. Following the forum, participating candidates will be available to meet with constituents.
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Green shoots showing - cut back or no?
I�m in mid-upper NY State (Zone 5b) bordering MA. In 2011, I bought & planted, late in November, some Chinese garlic. It was ready to harvest before any of my other garlics this year.
This mid-October, I planted several garlic varieties using last year�s cloves, and now (late November), the Chinese is already showing 4 green leaves 6" above the ground while none of the other garlics show above the ground.
Before I mulch for the winter, I�m wondering if I should cut the green back to ground level or just mulch heavily on those Chinese garlics?
Sounds like a Turban variety. They are early-maturing and early to break dormancy. I planted ~8 varieties between late October and late November, and the Turbans are first up for me too.
I would vote for no cutting. Wait until the ground is frozen or nearly so, and mulch them up. They should already have good root systems, so heave shouldn't be an issue; you just want to protect them from extreme cold (i.e. The tips may burn a little, but I think that is better than cutting the whole top. I suspect a cut plant would be more vulnerable to disease than a frost-burned one.
And don't forget to pull away the mulch in early spring to warm and dry the soil.
No, don't cut back! I would wait on the mulch unless it is a lite mulch with the leaves still exposed to the sun until very low freezing temps are predicted. They will take some pretty low temps. The leaves are feeding the bulbs. Let them wilt before mulching unless the temps are going to be very low and freeze the ground.


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1544 North Governeour Road
Wichita, Kansas, 67206
Commute to Downtown Wichita
Almost all errands require a car.
Flat as a pancake, minimal bike lanes.
Score Details
1544 North Governeour Road has a Walk Score of 19 out of 100. This location is a Car-Dependent neighborhood so almost all errands require a car.
This location is in Wichita. Nearby parks include East View Park, Red Bud Park and Edgemoor Park.
Nearby schools include Coleman Middle School, St Thomas Aquinas Elementary School and Harris Communications Magnet School.
The closest grocery stores are Natural Grocers, The Fresh Market and Fresh Market.
Nearby coffee shops include Carlos O'Kelly's Mexican Cafe, Starbucks and Malaysia Cafe. Nearby restaurants include Panera Bread, Redrock Canyon Grill and On the Border.
1544 North Governeour Road is near Wichita State University, College Hill Park and Boston Park.
There are minimal bike lanes and the terrain is flat as a pancake. 1544 North Governeour Road is somewhat bikeable, there is minimal bike infrastructure.
Explore how far you can travel by car, bus, bike and foot from 1544 North Governeour Road.
View all Wichita apartments on a map.
Popular apartment searches include hardwood floor, fireplace and single family.
This location is in the city of Wichita, KS. Wichita has an average Walk Score of 32 and has 382,368 residents.


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The Roundtable
1:14 pm
Mon November 24, 2003
Congressional Corner with MA's Richard Neal 10/09/03
Albany, NY – Privacy and travel are on the table today in the Congressional Corner. David Galletly takes the opportunity in this final conversation with Richard Neal to ask about the federal Do Not Call list and about funding for our national rail system. It's been back and forth between Congress and the courts when it comes to the do not call list and David asks Richard who has the final say.