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US 7363876 B2 Abstract A transformer-coupled plasma source using toroidal cores forms a plasma with a high-density of ions along the center axis of the torus. In one embodiment, cores of a plasma generator are stacked in a vertical alignment to enhance the directionality of the plasma and generation efficiency. In another embodiment, cores are arranged in a lateral array into a plasma generating plate that can be scaled to accommodate substrates of various sizes, including very large substrates. The symmetry of the plasma attained allows simultaneous processing of two substrates, one on either side of the plasma generator.
Claims(8) 1. A plasma generator comprising:
an inlet in fluid communication with
a first conduit passing through a first transformer core and with
a second conduit passing through a second transformer core, wherein the first transformer core and the second transformer core are located within a common plasma generation plate;
a third conduit passing through the common plasma generation plate, and not passing through any transformer core, in fluid communication with the first conduit to complete a first plasma current circuit around the first transformer core and in fluid communication with the second conduit to complete a second plasma current circuit around the second transformer core; and
an outlet in fluid communication with at least the first conduit and the second conduit.
2. A substrate processing system comprising:
a process chamber with a chamber inlet;
a chamber exhaust; and
a transformer-coupled plasma generator having a first core,
a first conduit passing through the first core,
a second core,
a second conduit passing through the second core, wherein the first core and the second core are located within a common plasma generation plate, and
a third conduit passing through the common plasma generation plate, and not passing through any transformer core, in fluid communication with the first conduit and the second conduit to complete a plasma current circuit path through the process chamber.
3. The substrate processing system of
4. The substrate processing system of
5. The substrate processing system of
a fourth conduit passing through
a third core; and
a fifth conduit passing through
a fourth core.
6. The substrate processing system of
a first primary coil disposed to couple electro-magnetic energy to the first core;
a second primary coil disposed to couple electro-magnetic energy to the second core;
a third primary coil disposed to couple electro-magnetic energy to the third core;
a fourth primary coil disposed to couple electro-magnetic energy to the fourth core, wherein the first primary coil, the second primary coil, the third primary coil, and the forth primary coil are coupled to an AC power supply.
7. The substrate processing system of
8. The substrate processing system of
Description This application is a divisional of U.S. patent application Ser. No. 09/839,360, entitled �MULTI-CORE TRANSFORMER PLASMA SOURCE,� filed Apr. 20, 2001 now U.S. Pat. No. 6,755,150, the entire disclosure of which is incorporated herein by reference for all purposes. Plasmas are used for a variety of purposes in the fabrication of semiconductor devices, such as integrated circuits, and other types of substrates, such as micro-electro-mechanical (�MEMs�) substrates to achieve a variety of results. Plasma methods include the formation of a layer using plasma-enhanced chemical vapor deposition and etching techniques, such as reactive ion etching. A plasma might also be used to clean a processing chamber, or to prepare a surface of a substrate for a subsequent process step, such as a plasma wafer surface clean or activation prior to formation of a layer on the surface. Plasma generators are also used as a source of ions for ion implantation or ion milling. A directed plasma might also be used as a plasma torch for cutting applications. The wide application of plasma processing has resulted in a wide variety of plasma processing systems and apparatus. One type of plasma processing chamber places the wafer on an electrode of the plasma circuit, opposite another planar electrode, and capacitively couples high-frequency electrical power to the two electrodes to form a plasma between them. Such a plasma reactor has advantages where it is desirable to form the plasma in the presence of the substrate, such as when the physical movement of plasma species to and from the substrate is desired. However, some devices or materials might not be compatible with this type of plasma formation, particularly the bombardment by plasma species, including high-energy photons, and associated heating of the substrate. Another approach to plasma processing generates plasma in a remote location, and couples the plasma to a processing chamber. Various types of plasma generators have been developed, including magnetron sources coupled to a cavity, inductively coupled toroidal sources, microwave irradiation directed at a plasma precursor, electron-cyclotron resonance generators, and others. Remote plasma techniques offer a number of advantages for certain types of processes, such as cleaning deposition chambers, but generally the plasma that eventually reaches the chamber is of relatively low density, due to recombination of the reactive plasma species with each other or with components of the processing system, such as the chamber walls or delivery conduit. Inductively coupled plasma systems have been developed that can generate a high-density plasma in one portion of the processing chamber (e.g. above the wafer), yet shield the wafer from the more deleterious effects of the plasma generation process by using the plasma itself as a buffer between the wafer and the plasma generation region and typically relies on diffusion of plasma to provide a uniform ion density across the wafer surface. In one system, a dielectric dome, or chamber top, has a conductive coil wound around the dome. High-frequency electric energy provided to the coil couples to a plasma precursor gas in the chamber and converts the precursor to plasma. In some systems, a second power supply couples an alternating field to the wafer or wafer support structure, and allows a directional component to and from the wafer to be added to the plasma generated by the coils. Such systems are used for both deposition and etch processes to achieve very desirable results, generally providing both high rates and good uniformity across a wafer. However, the fields generated by the coil through the dome have an electric field component normal to the surface of the dome that causes plasma species to be directed to and from the inner surface of the dome. This field component acting on the plasma can cause physical erosion (�sputtering�) of the inside of the dome, as well as affect the power coupling to the plasma, thus causing a non-uniform plasma density. In some instances the plasma might contain species that react with the material of the dome, further eroding the dome and potentially creating particles than can fall from the dome onto the wafer, creating defects. Reaction of the dome material with the plasma often arises in an etch process when the material being etched is similar to the material of the dome, e.g. silica-based glass. If erosion of the inner surface of the dome continues to a point where particulate contamination or strength of the dome is an issue, the dome might have to be replaced, affecting throughput of the plasma system, and potentially disrupting the product flow through an entire fabrication line. Transformer plasma sources have also been developed using a toroidal core. The core is typically a ferrite or similar high-permeability material, and the plasma source acts generally like an alternating-current (�AC�) transformer. Primary windings are wound around the core and an induced plasma flux around the core acts like a secondary winding(s), the plasma flux providing a secondary current to oppose the magnetic fields in the core. In one system, a tube structure forms a continuous closed path (�loop�) that includes a leg through a center opening of the core for transformer-coupled plasma. Another leg includes a gas inlet, and the same or another leg provides a plasma/gas outlet. In another embodiment, one leg of the plasma loop includes the gas inlet, gas/plasma outlet, and a process wafer. Plasma formed in the loop is carried past the wafer surface by the gas flow from the inlet to the outlet. However, recombination of plasma species on the surface of the tubes or in the gas/plasma mixture can reduce the effectiveness of a plasma source. Recombination generally occurs to a greater degree where the distance between the plasma core, where the fields that generate the plasma are generally higher, to the process chamber are greater. Recombination can also affect plasma density, as can dilution with a process gas stream. When performing a plasma or plasma-assisted process on a wafer surface it is generally desirable to have a uniform plasma so that the surface of the wafer is uniformly processed. Uniformity problems are generally greater with larger-sized wafers. Thus, it is desirable to provide a plasma system that avoids the surface erosion problem of conventional systems while creating a high-density, uniform plasma. Embodiments of the present invention provide a plasma processing apparatus applicable to deposition, etch, cleaning processes, ion implantation, ion milling, and plasma torch applications. Such processes may be applied to a substrate, such as a silicon wafer, composite wafer, glass panel, or other materials. In some instances, the plasma generated by the apparatus might be used for chamber cleaning purposes, in the absence of a substrate. A multi-core plasma source forms a number of poloidal plasma currents. In some embodiments, the cores are essentially parallel to each other, i.e. the center axis of the core tori are essentially parallel to each other in a �flat� configuration. In other embodiments, the cores are in a series, or �stacked� configuration. In one flat configuration, a number of relatively small plasma-generating transformer cores are arrayed across a double-walled panel. The panel has a number of through holes, some surrounded by transformer cores, and some providing a return path for the plasma generated by the cores. The panel provides a uniform plasma across a relatively large surface area, and can be scaled to larger sizes. Similarly, plasma uniformity can be improved by increasing the number of cores and through holes. The multi-core panel can be driven by a variety of AC, radio-frequency (�RF�), or microwave (�MW�) sources. The transformers efficiently generate plasma from a variety of precursors over a wide range of pressures. In another embodiment, the panel is curved, rather than flat. In another embodiment, two substrates are simultaneously processed in a plasma chamber using the symmetry achieved by toroidal plasma generators. A plasma processing system includes two substrate support structures that each hold a substrate facing each other with a transformer-coupled plasma generator between them. In yet other embodiments, various configuration of transformer-coupled plasma generators are provided using multiple cores. In some embodiments the multiple cores promote conversion of the precursor into plasma by providing additional plasma generating zones. In other embodiments, the plasma produced by the cores achieves a higher directionality by aligning the cores in a vertical stack. In some embodiments the plasma generators are external to a processing chamber, being coupled to the processing chamber with a conduit, and in other embodiments the processing chamber completes a current path for the secondary circuit of the transformer-coupled plasma generator. In yet another embodiment, an ion source for an ion implantation system utilizes the directional nature of the ion distribution along the centerline of the toroidal plasma generators by ejecting a portion of the ions produced toward extraction electrodes. This is believed to allow optimizing extraction gradients for mass/charge analyzer performance while providing a high ion flux for implantation. In yet another embodiment, a toroidal plasma generator is placed in a plasma torch head. The plasma generator is encased within an inner nozzle, thus protecting the operator from electrical shock hazard. The poloidal current flow minimizes erosion of the inner nozzle material. It is believed that the toroidal plasma generator will produce plasma from a wide variety of precursors over wider pressure ranges and flow rates than conventional arc-discharge plasma generators. In yet another embodiment, an ion source for an ion milling system utilizes the directional nature of the ion distribution along the centerline of the toroidal plasma generators by ejecting a portion of the ions produced toward accelerator plates. It is believed that the transformer-coupled toroidal plasma generator will provide a high flux of ions and that the high-density nature of the plasma along the centerline will improve the performance of the ion milling system. These and other embodiments of the present invention, as well as its advantages and features, are described in more detail in conjunction with the text below and attached figures. I. Introduction Embodiments of the present invention produce a plasma from multiple cores to achieve various beneficial effects. In one embodiment, many small cores are used to achieve a uniform plasma over a large surface area. In another embodiment, multiple cores are used to provide a high plasma density with a compact, efficient plasma generator. In another embodiment, the directionality of the plasma is used to provide an efficient source of ions for ion implantation. In yet another embodiment, the temperature profile of the plasma across the center of the core provides a compact, efficient plasma torch. These and other aspects of the invention will be further understood in light of the specific embodiments discussed below and reference to the accompanying figures. It is understood that other embodiments may be utilized and structural changes may be made without departing from the scope of the present invention. II. Exemplary Substrate Processing System A gas delivery system 36 provides gas(es) to the processing chamber and other system components through gas delivery lines 38, only some of which might be shown. Typical gases provided by the gas delivery system 36 might include plasma precursor gases, such as a cleaning or etching plasma precursor gas, a plasma deposition precursor gas, plasma striking gas, plasma dilution gas, and other gases, such as a cleaning precursor gas provided to an optional remote plasma cleaning system 104, for example. The delivery lines generally include some sort of control, such as a mass flow controller 42 and shut-off valves (not shown). The timing and rate of flow of the various gases is controlled through a system controller 44, as will be described in further detail below. The chamber top 16 includes an outer shell 46. A plasma generator plate 48 is installed between the outer shell and the chamber body 14. The plasma generator plate has a number of through holes 52 that allow gas and plasma to pass through the plate. The magnetic field inside the ferrite cores 21, 22, 23 within the plate drive the secondary plasma current inside the chamber when energized by the AC power supply 20 through the leads 24, 26. Primary windings (not shown) around each core couple the AC power to the core. The primary windings can be connected to the AC power supply in series, in parallel, or in a combination of series and parallel connections. The plate can be made of dielectric materials, such as ceramic, fused silica, or organic polymer, or can be made primarily of metal, such as stainless steel or aluminum alloy with a dielectric gap or spacer to disrupt unwanted currents through the metal around the core. Each toroidal core produces an alternating poloidal plasma flow in the direction of the arrows 25 (during one half cycle) around the core through the through holes, and in the other direction during the other half cycle. The poloidal plasma flow is essentially piece-wise parallel to the surfaces of the generator plate, thus reducing sputtering of those surfaces. In some embodiments, plasma formed by more than one core may couple in an additive or subtractive manner in a through hole, in other embodiments, such coupling is negligible because of the distribution of cores and through holes. For purposes of discussion, a through hole with a core surrounding it will be referred to as a generator hole, and a through hole without a core surrounding it will be referred to as a return hole. The return hole or holes generally completes the plasma current loop around the core. In one embodiment the toroidal cores are made of a ferrite material such as a material sold under the trade designation �3C90� by ROYAL, PHILIPS ELECTRONICS, N.V., but other ferrites or other materials, such as iron, may be appropriate, or the primary winding can define a core with a dielectric material or even a void, for example. The AC power supply is coupled to the cores by the leads 24, 26 that are electrically connected to the primary windings around the cores. The AC power supply could operate at a variety of frequencies, such as about 400 kHz, 10 MHz, 13.5 MHz, or 60 MHz. Although two leads are shown connecting the AC power supply to the cores, an alternative circuit configuration using a single lead and common ground could be used. Specifically, the power supply could be mounted directly on the chamber structure, thus avoiding long leads to the coil and associated electromagnetic radiation, as well as reducing variations in load resulting from long leads. Each core, primary coil, and generated plasma form a transformer circuit that operates as a toroidal transformer plasma source within the interior 70 of the processing chamber when in operation. The primary circuit of the transformer is the coil, with the plasma serving as the secondary circuit of the transformer, the primary coupling to the secondary through the core. As described above, the outer shell 46 and chamber body 14 can be made of a conductive material, thus serving as a shield for electronic emissions generated by the transformer plasma sources, since each transformer plasma source is within the processing chamber. This not only reduces unwanted emissions from the system, but also may allow the AC power supply 20 to operate at frequencies that would otherwise generate an unacceptable level of electronic noise emissions. In such an embodiment, it may be desirable to provide leads from the power supply to the chamber that are shielded. The efficient coupling of the transformer plasma source(s) also allow a plasma to be generated over a wide range of pressure, such as from about 500 mTorr to 3 Torr, and can generate plasma from a wide variety of precursors. The chamber body 14 includes a substrate support member 72, which is mounted on, and forms a continuous inner surface with, the body. Substrates are transferred into and out of chamber by a robot blade (not shown) through an insertion/removal opening (not shown) in the side of the chamber. Motor-controlled lift pins (not shown) are raised and then lowered to transfer the substrate from the robot blade to the substrate support member 72. A substrate receiving portion 74 of the substrate support member can include a wafer hold-down apparatus, such as an electrostatic chuck (not shown), that can selectively secure the substrate to the substrate support member during substrate processing, if desired. In a preferred embodiment, the substrate support member 72 is made from anodized aluminum, aluminum, or aluminum oxide. The substrate support member may also include a heater (not shown) to heat the wafer during processing, or to heat portions of the chamber during a cleaning process. In a preferred embodiment, the substrate support member holds the substrate 34 so that the processing surface 32 of the substrate is opposite and essentially parallel to the major plane of the plasma generator plate. The vacuum system 18 includes a throttle body 76 that houses a twin-blade throttle valve 78 and is attached to a gate valve 80 and turbo-molecular pump 82. It should be noted that the throttle body 76 offers minimum obstruction to gas flow, and allows symmetric pumping, as described in co-pending, co-assigned U.S. patent application Ser. No. 08/712,724 entitled SYMMETRIC CHAMBER by Ishikawa, filed Sep. 11, 1996, and which is incorporated herein by reference. The gate valve can isolate the turbo-molecular pump from the throttle body, and can also control chamber pressure by restricting the exhaust flow capacity when the throttle valve 78 is fully open. The arrangement of the throttle valve, gate valve, and turbo-molecular pump allow accurate and stable control of chamber pressures from between about 1 mTorr to about 3 Torr, depending on gas flow rates. It is understood that other types of vacuum pumps and configurations of vacuum systems could be used with alternative embodiments of the present invention. The AC power supply 20 operates at a nominal frequency of 400 KHz, but could operate at different frequencies, such as 60 Hz, 2 MHz, 13.56 MHz, 60 MHz, or 200 MHz, with appropriate design of the elements of the plasma system. The power supply can supply up to 8 kW, but the processing system typically draws about 3-5 kW when processing a 200 mm wafer. It is understood that lower or higher power levels might be appropriate according to the type of process being performed and the size of the substrate. A particular advantage of embodiments of the present invention utilizing multiple ferrite cores is the relatively low quality factor (�Q�) of the toroidal plasma generating structures (primary-core-secondary (plasma loop)). The low Q allows a high-frequency plasma generation system without the need for complicated matching circuits, as might be required with higher-Q systems. The low Q also reduces the sensitivity of the plasma system to the chamber load, thus resulting in a more stable and consistent plasma operated over a wider process range. In a high-Q system, the power delivered to the plasma can vary as the plasma is formed or chamber conditions change. For example, a plasma might be initiated with a plasma striker gas, such as argon. When a precursor gas, such as NF3 or F2, is provided to the plasma, the dissociation of the gas into plasma creates a sudden increase in plasma species (pressure) as well as electrically charged particles. This effect can change the load on the power supply as well as the match to the load, resulting in reduced power transfer to the plasma and potentially reflecting a harmful level of power back to the generator. In the present invention, a low-Q system can be implemented, avoiding these problems. The optional bias plasma system 30 includes a bias generator 86 and an optional bias-matching network 88. The bias plasma system capacitively couples the substrate receiving portion 74, i.e. the substrate, to conductive (grounded) inner surfaces of the chamber through a common ground 90. The bias plasma system serves to enhance the transport of plasma species (e.g. reactive ions or other particles) created by the plasma generating plate 48 to the surface 32 of the substrate. The gas delivery system 36 provides gases from several gas sources 92, 94, 96, 98 to the chamber and other system components via the gas delivery lines 38 (only some of which might be shown). Gases can be introduced into the chamber in a variety of fashions. For example, a top port 100 is shown as one example of a means for flowing gases in to the chamber. A gas mixing chamber (not shown) can be present between the gas sources and the chamber, or the top port can be arranged with a number of parallel or concentric gas conduits to keep various gases separate until reaching the chamber. In an alternate embodiment, gas conduits are present around the perimeter of the chamber, either above or below the plasma generating plate. In yet an alternative embodiment, a gas delivery ring with a series of gas nozzles is provided about an inner circumference of the processing chamber. Gas generally flows from the gas inlet port(s) to the vacuum exhaust system 18. This flow can also carry plasma species generated by the plasma generator plate toward the surface of the substrate. In other instances, the process wafer might be placed close enough to the plasma generating plate that gas flow is not required for plasma processing of the wafer surface. An optional remote plasma cleaning system 40 is provided to periodically clean deposition residues from chamber components. The cleaning system includes a remote microwave or RF plasma generator 106 that creates a plasma from a cleaning gas source 98 such as molecular fluorine, nitrogen trifluoride, other fluorocarbons or equivalents, in a reactor cavity 108. The reactive species resulting from this plasma are conveyed to the chamber interior through cleaning gas feed port 110 via applicator tube 112. The system controller 44 controls the operation of the plasma processing system 10. In a preferred embodiment, the system controller includes a processor 114 coupled to a memory 116, such as a hard disk drive, a floppy disk drive (not shown), and a card rack (not shown). The card rack may contain a single-board computer (SBC) (not shown), analog and digital input/output boards (not shown), interface boards (not shown), and stepper motor controller boards (not shown). The system controller is coupled to other parts of the processing system by control lines 118 (only some of which might be shown), which may include system control signals from the controller and feedback signals from the system. The system controller conforms to the Versa Modular European (VME) standard, which defines board, card cage, and connector dimensions and types. The VME standard also defines the bus structure having a 16-bit data bus and 24-bit address bus. An example of a system which may incorporate some or all of the subsystems and routines described above would be the ULTIMA� system, manufactured by APPLIED MATERIALS, INC., of Santa Clara, Calif., configured to practice the present invention. Further details of such a system are disclosed in U.S. patent application Ser. No. 08/679,927, filed Jul. 15, 1996, entitled �Symmetric Tunable Inductively-Coupled HDP-CVD Reactor,� having Fred C. Redeker, Farhad Moghadam, Hirogi Hanawa, Tetsuya Ishikawa, Dan Maydan, Shijian Li, Brian Lue, Robert Steger, Yaxin Wang, Manus Wong and Ashok Sinha listed as co-inventors, the disclosure of which is incorporated herein by reference. It is specifically understood that other types of chambers might be adapted to a multi-core toroidal plasma source according to the present invention, and that different types of wafer support systems, such as a center pedestal, might be used, as well as different exhaust configurations, such as a perimeter exhaust configuration. Similarly, additional coils might be added to control the plasma density and distribution (uniformity) inside the processing chamber. For example, instead of the metal outer shell described in conjunction with III. Planar Multi-Core Internal Plasma Generating Plate An AC power supply 20 provides current to the primary coils in the array through leads that are coupled to the primary coils. The primary coils can be directly attached to the leads, or one side of each coil can be connected to a common ground with one side of the power supply. The plate may be grounded as shown, or floating, or at a selected potential. In one embodiment, a bias voltage is applied between the plasma generator plate and a process wafer to provide additional control of the plasma. IV. A Multi-Wafer Plasma Processing System A gas source 36 supplies gas to the process chamber 165. An AC power supply 20 provides current to a primary coil (not shown in this figure) and the toroidal plasma source 161 forms plasma from the gas. The exhaust system 18 removes effluent from the chamber. Two wafers 34A, 34B opposite each other with the symmetrical plasma source in between the wafers. The plane that the toroidal core lies in (the plane of intersection) is essentially parallel to the surface of each wafer. The wafers are held with wafer supports 72A, 72B, which can be mechanical supports, such as pockets or clips, vacuum chucks, or electrostatic chucks, for example. Although the wafers are shown in a vertical orientation, other orientations are possible. When a single torus source is employed, generally a larger diameter of the center opening provides better plasma uniformity. For some 200 mm wafer processing embodiments, a 10 inch or larger diameter opening is used. For some 300 mm wafer processing embodiments a 16 inch or larger diameter opening is used. The distance between wafer and source depends on uniformity which in turn depends on gases, pressure and power. Some embodiments add a gas distribution ring to the torus to improve uniformity. V. External Multi-Core Plasma Systems VI. Multi-Core Plasma Generators Toroidal transformer cores 405, 406, 407, 408 surround conduits 409, 410, 411, 412 that carry gas or vapor through the center of the tori to be disassociated (or at least partially disassociated) into plasma. An AC power supply 20 provides current to the primary coils 413, 414, 415, 416. In this example the primary circuits are driven in parallel; however, in another example they can be connected in series. Similarly, in another embodiment the cores can alternate sides of the plasma generator, or additional cores and associated circuitry can be added to surround other conduit segments. A primary coil (not shown) around each core couples electro-magnetic energy to the plasma generator. The electrical leads (not shown) are typically lead out from the cores to outside the outer shell through the webs. A bottom portion 458 of the inner shell 447 is shaped to promote a symmetrical flow of plasma around the inner shell. When AC current is provided to the plasma generator under plasma-generating conditions, plasma flows back and forth through the centers of each toroidal plasma generating stage (i.e. each core, primary coil, and inner shell). The toroidal configuration of each stage produces a plasma density distribution that is greater in the center of the generator and generally extends beyond the inner shells. In other words, the toroidal plasma generator produces a plasma with directionality, specifically, with a high plasma concentration extending along the center axis of the cores. This directionality can be a desired attribute in some applications, such as a source for ion implantation or ion milling, or a plasma torch application. VII. Spatial Plasma Density The absolute ion density depends on many factors, such as the dimensions of the transformer structure, including the inner diameter of the cover and radius of the core, the pressure, the plasma species, and the AC drive frequency. However, it is possible to drive the transformer at a sufficiently high frequency to establish an essentially steady-state ion distribution as shown. Thus, the transformer-coupled plasma generator can maintain an enhanced ion density or temperature above the reference plane formed by the upper edge of the cover. If a more uniform plasma is desired, the inner diameter of the transformer structure can be increased relative to the diameter of the core. Additional plasma shaping can be done with shaped cores or core covers, or by using electromagnetic fields. VIII. Ion Implantation Source In a conventional ion implantation system, a hot filament or arc discharge is typically used to ionize a gas into ions for implantation. For example, the gas may provide boron or arsenic ions for P-type or N-type doping of a silicon wafer. The ions are extracted from the ion source with extraction electrodes 604, 606 and slightly accelerated so that an analyzing magnet 608 can select the desired ions according to their mass and charge in conjunction with a resolving aperture 610. The extraction electrodes are generally at different electric potentials and form an electric field gradient to accelerate ions of the proper polarity. The selected ions are then accelerated in an acceleration tube 612 to a selected energy for implantation into the substrate or wafer 34, also referred to as the target. A focusing element 614, neutral beam trap 616, Y-axis scanner 618, and X-axis scanner 620 are a few of the other elements typically present in an ion implantation system. Additional elements, such as high-voltage power supplies, controllers, additional extraction electrodes and beam traps (mass resolving slits) may also be present but are not shown for simplicity of illustration. In some systems, the extraction electrodes 604, 606 are an integral part of the ion source 602. A number of vacuum pumps 622, 624, 626 can be operated to provide a selected and differential vacuums in various portions of the system. The transformer-coupled ion source 602 includes a toroidal core 627 and a primary coil 629 and produces a poloidal current flow around the core 627 of the transformer, represented by the double-ended arrows 628, 630. For purposes of discussion, the primary coil, transformer core, and secondary plasma circuit will be referred to as the transformer coupled toroidal plasma generator. Additional components, such as a cover for the core, mounting structure to hold the generator in the ion source, and a cooling system are not shown for clarity of illustration. In other embodiments, the ion source can be a multicore plasma generator such as that shown in The plasma has theta symmetry, that is, the plasma density profile is generally symmetrical about the center axis of the toroidal core. However, the plasma density varies along a radial direction from the center axis of the toroidal core. In particular, the plasma is concentrated through the center of the core, as shown in It is believed that the directionality of the plasma density distribution along the center axis of the torus, represented by the double-ended arrow 630, aids in the extraction of ions from the ion source through the opening or aperture in the ion source. The aperture in the ion source is aligned with the center axis of the torus such that the center concentration of ions (ref. Providing this initial transport of plasma from the transformer core allows greater extraction of ions over a wider range of extraction voltages. The extraction voltage typically affects the boundary shape of the ions exiting the ion source; however, the extraction voltage that achieves the optimal source ion boundary shape is not necessarily the optimum extraction voltage for maximum ion flux. This can result in longer implantation times and reduced throughput. It is believed that a toroidal transformer-coupled ion generator will produce a higher ion flux than conventional sources for similar operating conditions. A high ion flux may also allow greater control of the beam shape and provide more accurate implantation. In particular, a high initial ion flux out of the ion source may allow a high-dose, relatively low energy (shallow) implantation with low noise and divergence because more ions are present in the initial beam than are needed and only a portion of the ion beam (e.g. the center portion) might be selected for acceleration. IX. Plasma Torch Head The torch head 700 includes an outer nozzle 702 and an inner nozzle 704. Gas from which the plasma is formed enters from the inlet side 706 of the torch head and plasma and gas exit the outlet 708. The inner nozzle 704 includes a toroidal core 710 of a transformer-coupled plasma generator. A primary coil (not shown) couples electromagnetic energy from an AC power supply (not shown). Additional cores and primary coils may be stacked along the center axis of the conduit to promote the directionality of the plasma. In this embodiment, the core has an essentially semi-circular cross-section 711 with a long edge 709 parallel to the conduit. The leads (not shown) for the primary coil can be lead through a web, as is described according to reference numeral 457 in Generally speaking, a high-density plasma is formed in the conduit 716 in the portion of the conduit proximate to the core 710, with the plasma current return path through a bypass 718. A plasma initiator device, such as an electric arc or high-frequency parallel plate initiator may be used in some applications to assist in the initial formation of a plasma. Once the plasma is initiated, the toroidal transformer-coupled plasma generator can maintain the plasma over a wide range of operating conditions, such as pressure (e.g., 1 mTorr to 100 Torr) and flow rate The bypass 718 allows for a separate gas flow that does not flow through the conduit 716. This gas flow can serve many purposes. It can provide cooling to the inner nozzle, mass transport of the plasma out the outlet 708, and can dilute the plasma to reduce recombination. In one embodiment, a separate gas, e.g. propane or hydrogen, is flown through the bypass while another gas e.g. oxygen, is flown through the conduit. In another embodiment, the same gas is flown through the conduit and the bypass. Some plasma is in the bypass, as well as in the conduit, to complete the secondary circuit around the transformer core. The tapered shape of the outer nozzle provides an increase in velocity and concentration of the plasma and carrier gas exiting the outlet 708. The poloidal flow of plasma around the core 710 provides a high-density plasma extending along the center axis of the nozzle. This directional aspect to the plasma operates in conjunction with the gas flow to efficiently provide plasma at the outlet 708 of the torch head 700, which lies on the centerline with the conduit. Using a toroidal transformer-coupled plasma generator within the torch head has several advantages over conventional arc-type plasma torch heads. First, arc-type plasma generators are typically run at several hundred volts, which can be lethal if an operator comes in contact with the voltage. While the arc electrodes are typically unavailable to the operator during use, exposed powered electrodes or failures in the isolation of high voltages may present a lethal electrical shock hazard. In comparison, the electrical components of the toroidal transformer-coupled plasma generator can be completely enclosed, and remain so even during servicing of the torch head. Second, the AC power supply can be a simple step-up/step down transformer and in some applications might run at the frequency of the line supply (e.g. 60 Hz). Third, conventional arc-type electrodes are exposed to the plasma and plasma precursor, often causing electrode erosion or contamination. The erosion of the electrodes is exacerbated by the fact that the greatest erosion typically occurs at the point of the electrode, where it is generally desirable to generate the high voltage gradients desired for are discharge. The toroidal transformer-coupled plasma generator has cover with a relatively high surface area surrounding the core, thus intense field lines intersecting the surface of the cover are substantially avoided. Similarly, the poloidal plasma flux generated by the toroidal core runs essentially parallel to the surface of the cover, thus sputtering or similar damage to the core is substantially eliminated. Fourth, while arc discharge generators are relatively sensitive to pressure and flows, and may become unstable or extinguish if appropriately stable operating conditions are not established, the transformer-coupled plasma generator can operate over a wide range of pressures and flow rates. X. Ion Milling Source Accelerator plates or grids (also called vanes) 808 connected to a high-voltage power supply 810 via power lines 812 accelerate ions generated proximate to the transformer core 804, particularly those generated along the center axis of the toroidal core, toward the target substrate 34 in response to a voltage gradient established between the plates. The high-voltage power supply is typically a direct-current supply operating at between about 300-1,500 Volts. A focusing magnet 814 powered directed by a controller 816 with a power supply operates as a lens to produce an ion beam of a selected diameter at a selected location on the substrate 34. The substrate is held by a chuck 818, such as a vacuum or electrostatic chuck. In one embodiment, an electrostatic chuck with grooves for circulating a coolant against the backside of the substrate is used. Helium gas is circulated in the grooves to thermally couple the substrate to the chuck, which is cooled with a water-based coolant. A vacuum system provides the desired chamber pressure, typically between about 10-80 mTorr, in conjunction with gases supplied from the gas delivery system 36 through the gas conduit(s) 38. Gas supplied to the ion source 806 can be substantially inert, such as argon or krypton, or can be reactive, such as O2, C2F5H, F2, NF3, CF4, C3F8, or SF6. In the first case, ion milling is achieved primarily through physical sputtering, while in the latter cases the ion milling may occur through both physical and reactive ion sputtering, depending partially on the type of material being removed. In either case, the ion milling system provides a directed beam of ions to the surface of the substrate for selective removal of material. While the beam is generally directed with the focusing magnet, in one embodiment the substrate 34 and chuck 818 can be tilted and rotated with respect to the ion source 806. To avoid charge build-up on the surface of the substrate, in some embodiments a secondary plasma is formed between the surface of the plasma and the wall 820 of the processing chamber 822 using a secondary plasma supply (AC or DC) 824. This secondary plasma over the wafer surface assists in dissipating the accumulated charge to the grounded chamber wall 820, which is typically made of aluminum or aluminum alloy. While the invention has been described above with respect to specific structures and process steps, it is understood that the invention is not limited to the described embodiments. In particular, alternative configurations of the cover, shape of the core, core materials, or placement of dielectric gaps, or use of other precursors or other process. For example, although embodiments have generally been illustrated with an essentially round core, the core could be made of straight segments, such as in the shape of a square, rectangle, hexagon, or octagon, among others. Similarly, although embodiments have generally been illustrated with one or two substrates, additional substrates could be processes, such as by placing several substrates on the substrate support member(s). These equivalents and alternatives are intended to be included within the scope of the present invention. Other variations will be apparent to persons of skill in the art. Accordingly, it is not intended to limit the invention except as provided in the appended claims. Patent Citations
Non-Patent Citations
Referenced by
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text:
29. I feel old compared to you guys
No problem.
I would contact them directly via their Author Page so they can provide you with support.
entersoftlabs said
page gets hang & browser crashes due to unresponsive script at this location www.xxxxxx.com/media/widgetkid/js/jquery.js:44also slider doesnt load perfectly upon multiple reloads…...
plz help…..
Sorry to hear your having issues. Sadly I don't think any one can assist you, as there is no mention of the theme you have purchased.
Its best to get in touch with the theme author, via their profile page.
I would love to be able to push updates without the 48 hour wait, but understand the issue that everything in the archive needs checking again.
Would be nice to push the update first as the theme has already been accepted, and then the reviewer can check the update / do a diff check on the files at a later time.
addeystock said
I believe its 7:43am in Australia, and the transaction won't be started till 9:00am? It will arrive, it always does.
manserro5 said
http://forrst.com/i/mIt3 – please give me only 3 votes – this would make me happy
Voted, your in!
roodper said
Anyone willing to send me an invitation for Dribbble ? Really appreciate it. My Email email@example.com .
Roodper, you already have one: http://forrst.com/people/roodper/posts
I invited you!
roodper said
Anyone willing to send me an invitation for Dribbble ? Really appreciate it. My Email email@example.com .
Roodper, you already have one: http://forrst.com/people/roodper/posts
I invited you!
I named 'Mason' due to using masonry.js. Seem to have stuck with guys names every since. :/
Bedros said
Hi Ivor , thanks a lot for the reply.
I wish to hear some thoughts about the choice of the font families , do you think it plays a crucial role when it comes to selling/buying templates/themes.
Font selection is massively important for selling and purchasing themes. Have a look through the 'rejected' theme threads, 75% of the time its to do with font choices, mixing the wrong typefaces / families.
Can I ask what your wanting to achieve. If you simply want to know 'Can I use any old font in my designs' sadly the answer is no.
Tuts has a nice article: http://webdesign.tutsplus.com/articles/choosing-the-right-font-a-practical-guide-to-typography-on-the-web/

subset: commoncrawl


text:
True Blood
Sundays 9:00 PM on HBOFollow True Blood
True Blood Season 1
Sookie figures out the link between the string of killings in Bon Temps.
After turning Jessica into a vampire, she turns out to be more than Bill and Eric can handle. Sookie tries to investigate the murder by using the recent vision she had in her head.
When Sam awakens next to Sookie naked, he has no choice but to reveal he's a shapeshifter. Tara thinks she's been cured of her demon until she sees Miss Jeanette working at a pharmacy.
When Sookie is helping Eric find the thief in his bar, she discovers it's a Vampire who comes after her. When Bill kills the Vampire to defend Sookie, he must pay a price for his crime against his kind.
Sookie, suspecting Bill of being burned int he building, tries to hold herself together until she finds out he's still alive. Tara considers going to the exorcist herself after lashing out at Sookie and Sam.
Sookie tells Bill about what her Uncle Bartlett used to do to her, sparking Bill to kill him. Tara pays for an excorcism to purge Lettie Mae of her demon that makes her drink.
After Sookie's grandmother is murdered, there's a funeral where Sookie ends up screaming at the town. Jason, meanwhile, is wrestling with his withdrawal from V.
Bill wins over the Church when he tells stories from the Civil War. With Sookie and Bill being distant, Sam takes Sookie on a date.
When another Bon Temps woman, Dawn, is found dead, Jason Stackhouse is again brought into custody. Sookie tries to use her ability to find the real killer and goes with Bill to Fangtasia, a vampire bar.
Bill claims Sookie as his human to protect her from his vampire "friends." Sam and Tara wind up sleeping together after they're both frustrated with their respective relationship problems.
Bill rescues Sookie from the Rattrays and brings her back to life using his Vampire blood. Meanwhile, Jason is released from custody when they reveal his strangling did not kill Maudette.
The show premise is introduced via a television show that a synthetic blood, Tru Blood, has been introduced that will allow Vampires to live amongst the living in society. A waitress, Sookie Stackhouse, meets a vampire, Bill.
- Show:
- True Blood
- Season:
- 1
- Air Dates:
- to
- Total Episodes:
- 12
Around the Web
True Blood Season 1 Quotes
Grandma [about people charging vampires for sex]: Wonder how much one would charge for something like that?
Jason: A thousand bucks.
Sookie: See, now that just makes me sick.
Grandma: I know. What kind of cheap woman could ever do something like that?
Sookie: No it makes me sick that they're getting a thousand bucks to lay there and do nothing while I bust my ass for ten bucks an hour plus tips
- Permalink: Wonder how much one would charge for something like that? A th...
- Added:
Tara [tending bar]: Uh-oh do... do not snap at me. I have a name. And that name is Tara. Isn't that funny a black girl being named after a plantation. No I don't think it's funny at all. In fact it really pisses me off that my momma was either stupid or just plain mean. Which is why you better be nice if you plan on getting a drink tonight.
Customer: Sorry
- Permalink: Uh-oh do... do not snap at me. I have a name. And that name is T...
- Added:


text:
Vanessa Bruno Fall 2012
Vanessa Bruno Fall 2012
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Vanessa Bruno Fall 2012
>> Vanessa Bruno went dark, tough, and moody for Fall 2012. Shiny vinyl crop-pants, hip-skimming leather skirts, sharp-cut blazers, and sheer lace tops came in a palette of black, black, and more black — plus a few jewel tones, for good measure.
Read More A Little Turn On The CatwalkVanessa Bruno Fall 2012Fall 2012 Paris Fashion WeekFall 2012Vanessa BrunoParis Fashion WeekFashion Week
Link Love
- ASAP Rocky is basically a wizard when it comes to clothes — The Cut
- Even accessories have accessories now — Style.com
- Meryl Streep's daughters just landed a cool new fashion gig — HuffPost Style
- Elizabeth Taylor always wore the best jewels — InStyle
- Would you buy an Apple Watch just to make a statement? — Racked
- The shirtdress may be making a comeback this Spring — SheFinds
- Why you should be on board with dresses over pants — Who What Wear
- Kate Spade Saturday is having a crazy-good sale right now — Lucky
- 1 woman weighs in on whether or not we need fashion — Man Repeller
Latest Fashion


text:
joy#193 of Lake McDonald dusk, 8x10, watercolour, July 11/11
painting by artist edith dora rey
edith dora rey
Montreal, Quebec, Canada
I'm a Swiss/Canadian worker labouring diligently to make meaningful art in Montreal + the beautiful Eastern Townships of Quebec.
My Web Pages:
> My Daily Paintings Gallery
> Edith Dora Rey
> Edith Dora Rey: Nude Dudes+Dudettes
> Edith Dora Rey
> Edith Dora Rey at Redbubble
Recent Paintings:
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abstract abstract art art dora dusk edith edith dora rey joy julie lake mcdonald painting rey small watercolour
link to us - subscribe - about - contact us - art links - press room - login
The Daily Painters Art Gallery - www.dailypainters.com
© 2015 Daily Painters Gallery. All artwork is copyrighted by the individual artists.
Images may not be reproduced without the permission of the artist.


text:
Forearm Muscle Strain
(Muscle Strain, Forearm; Pulled Muscle, Forearm)
A forearm muscle strain is a partial or complete tear of the small fibers of the forearm muscles. Forearm muscles allow you to extend and flex your wrist and fingers.
It is a common injury in sports. It is also common in people who work in jobs with repetitive keyboard motions. Treatment depends on the severity of the strain.
Muscles of the Hand and Forearm
A forearm muscle strain is caused by:
- Stretching the forearm muscles beyond the amount of tension they can withstand
- Suddenly putting stress on the forearm muscles when they are not ready for stress
- Overusing the forearm muscles over time
- Getting a direct blow to the forearm muscles
Risk Factors
Factors increase your chance of developing forearm muscle strain include:
- Participation in sports that overuse the forearm
- Previous strain or injury to the area
- Muscle fatigue
- Weak or tired muscles
- A job that requires repetitive movements that strain the forearm muscles
Symptoms may include:
- Problems flexing your fingers or wrist
- Pain while stretching the fingers or wrist
- Area feels tender and sore
- Muscle spasms
- Swelling
The doctor will ask about your symptoms and medical history. A physical exam will be done.
Most forearm muscle strains can be diagnosed with a physical exam.
Your doctor may want images of the area if severe damage is suspected. Images may be taken with x-ray or MRI.
Muscle strains are graded according to their severity:
- Grade 1—Some stretching with micro tearing of muscle fibers.
- Grade 2—Partial tearing of muscle fibers.
- Grade 3—Complete tearing of muscle fibers. This may also be called a rupture or avulsion.
Talk with your doctor about the best treatment plan for you. Recovery time ranges depending on the grade of your injury. Treatment steps may include:
Acute Care
Your muscle will need time to heal. Avoid activities that place extra stress on these muscles:
- Do not do activities that cause pain.
- Do not play sports until your doctor has said it is safe to do so.
Apply an ice or a cold pack to the area for 15-20 minutes, four times a day, for several days after the injury. Do not apply the ice directly to your skin. Wrap the ice or cold pack in a towel.
Pain Relief Medications
To manage pain, your doctor may recommend:
- Over-the-counter medication, such as aspirin, ibuprofen, or acetaminophen
- Topical pain medication—creams or patches that are applied to the skin
- Prescription pain relievers
Recovery Steps
Use heat only when you are returning to physical activity. Heat may then be used before stretching or getting ready to play sports to help loosen the muscle.
To help reduce your chance of getting forearm muscle strain, take the following steps:
- At work, use an ergonomic keyboard or workstation.
- Keep muscles strong. This will help them absorb the energy of sudden stressful activities.
- Avoid over exercising.
- Learn the proper technique for sports.
- If you are feeling tired, stop exercising.
American Academy of Family Physicians Family Doctor
American Council on Exercise
Canadian Physiotherapy Association
Canadian Academy of Sports Medicine
Dawson, WJ. Intrinsic muscle strain in the instrumentalist. Med Prol Perform Artists. 2005;20:66-69.
Johns Hopkins sports medicine patient guide to muscle strain. John Hopkins Medicine website. Available at: http://www.hopkinsortho.org/muscle_strain.html. Accessed April 26, 2013.
Sprains, strains, and tears. American College of Sports Medicine website. Available at: http://www.acsm.org/docs/brochures/sprains-strains-and-tears.pdf. Accessed April 26, 2013.
What is Occupational Therapy? American Occupational Therapy Association website. Available at: http://aota.org/Consumers.aspx. Accessed April 26, 2013.
10/26/2010 DynaMed's Systematic Literature Surveillance http://www.ebscohost.com/dynamed/what.php: Massey T, Derry S, Moore R, McQuay H. Topical NSAIDs for acute pain in adults. Cochrane Database Syst Rev. 2010;(6):CD007402.
Last reviewed February 2014 by Michael Woods, MD
Please be aware that this information is provided to supplement the care provided by your physician. It is neither intended nor implied to be a substitute for professional medical advice. CALL YOUR HEALTHCARE PROVIDER IMMEDIATELY IF YOU THINK YOU MAY HAVE A MEDICAL EMERGENCY. Always seek the advice of your physician or other qualified health provider prior to starting any new treatment or with any questions you may have regarding a medical condition.


text: Catell: Freedom of choice By: Commentary June 24, 2011 2 Comments By Bob Catell I must take issue with Matt Cordaro that municipalization is the only option for the future of LIPA (LIBN May 25, 2011). Cordaro is advocating for a transition for LIPA that puts the Long Island-based operators from National Grid into the public service. No small feat in itself, but just as Gov. Andrew Cuomo ... Subscribe Login Email Address: Password: Already a paid subscriber but not registered for online access yet? For instructions on how to get premium web access, click here.Forgot your password? Print, Digital & Mobile1 Year$129 Digital & Mobile Only1 Month Intro Rate$2.99----------1 Year$99 Digital & Mobile Only1 Month Intro Rate$2.99----------1 Year$99 Print, Digital & Mobile1 Year$129 Print, Digital & Mobile1 Year$129----------Digital & Mobile Only1 Month Intro Rate$2.99----------1 Year$99 Share this:EmailPrintFacebookTwitterGoogle +1 electricity Energy LIPA Long Island Loong Island Power Authority National Grid rates 2:23 pm Fri, June 24, 2011 Long Island Business News Commentary


text:
« Quote Request Product List »
Update Quantity
9PN2J Dell 600GB 15K RPM SAS-3GBITS Form Factor 3.5 Inches Form Factor Hard Disk Drive In Tray. New Sealed With 6 Month Warranty.
To add more products, click "Quote" button from product pages.
To remove any product from the list, set quantity to '0'.


text:
Balcatta Recycling Centre Repco Superlite
15 posts
• Page 1 of 1
Balcatta Recycling Centre Repco SuperliteAnother goodun spotted at the Balcatta Recycling Centre today, this time a Repco Superlite converted to flat bar. Bike is complete with alloy rims, shot (700 x 19) tyres though.
also there was a step thru Repco Traveller. Both still there, I was looking for something else, happy hunting!
Not sure if I should be posting this here or in the Repco appreciation thread in the retro forum.
Anyway it is now sold to the fat hippy with the long hair (me ) a mate of mine gave me the heads up and I went past in my lunchbreak today. By the time I got to it there was no front wheel left. I didn't have a tape measure but my own bike was in the car from this mornings ride so I comapred top tube lengths with a piece of wire and I would say it is about a 52cm TT so possibly a bit short for me but who knows. Gear wise it has been converted to flat bar with some ordinary bits which will go in the bin. Cranks and chainring (biopace) are Exage as well as single pivot Exage brakes and rear hub. The weirdest thing is the rear dropouts, they are forged angled ones but have not been opened up fully, I am sure the purists will lambast me but as this will become a single speed project then I will be giving them a seeing to with the drill and files to open the slots up Anyway some photo's it looks like a bit of an 80's child judging by the paint colours and puke graphics scheme!
Not a bad score... those Gfx remind me of Miami Vice
but what is with those half-ar5sed cut dropouts? I have seen such dropouts one or two kerbside finds I've picked up. I passed the frames on - primarily for that reason. They rule out FG conversion ... unless you want to cut/file the sucker out yourself. It's almost like they were made on the cusp of realising they could make vertical dropouts cheaper in production - but used their stocks of the old semi-horizontal ones, saving their cutting/finishing tools by only doing the dropout part way. - Kym
Stuck in traffic? You ARE traffic. Sick of arguing with idiots on the internet? Well, do I have news for you!
A very good score for $5! Yeah the dropouts are weird and maybe the reason it was still there, but nothing that half an hour mucking around jigging it up in the drill press and a bit of cutting and filing wont solve. My brain must have been addled before as I measured it with a tape when I got home and found that it and my other bike !! BAN ME NOW FOR SWEARING !! does Shine are both actually 55cm top tubes so it looks like this will be a keeper even with the pimp graphics.
I've got one of those half-arsed dropout jobs also....
These are only a 4130CrMo Main Frame - meaning the rear is Hi-Tensile, I guess. I've seen two of these frames with RH chainstays cracked at the rear dropout union. Probably not a good idea to try to force the rear stays to fit a 130 mm O.L.D. rear wheel in, me thinks. If you need to, get the stays properly 'cold-set' and the dropouts properly aligned God save the ABC & SBS.....
Cheers Kuka, it still has the CroMo label on the I measured it last night and it is already out to 128mm! but the plan for this one is back into 120mm. Do you mind measuring your seatpost diameter as well for me? this one has had a 25.8 seat post fitted which is obviously undersized and a "Paris-Roubaix" seatpost mod done to it to stop it slipping (tek screw through the side of the seat lug)
Kokamunga: do you know what year your tri-a is? 91?
i just picked one up.
26.6 mm seems to be a nice fit God save the ABC & SBS.....
Going by the mish-mash of component date codes on it ('89, '90), I'd say it is a 1991 model, 1990 at the earliest..... God save the ABC & SBS.....
Cheers, I will try and prise it out a bit
my bad..
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Oxford Town #927
IN THIS WEEK'S ISSUE: The Birmingham indie/alternative band To Light A Fire (on the OT cover this week) makes its Oxford and Blind Pig debut on Friday, May 20; the annual Hill Country Harmonica Blues-Harp Homecoming takes place this weekend at Foxfire Ranch and Rooster's Blues House; Oxford Music Snob Daniel Morrow hosts two shows this week around town; Dale Earnhardt Jr. Jr. plays Proud Larry's on Wednesday, May 25; and Oxford Town Outdoors columnist Michelle McAnally breaks down great family-oriented activities hosted by the Oxford Park Commission. Click here to download the complete issue in PDF format. (May 19, 2011)
To Light A Fire to light up The Blind Pig
OXFORD TOWN – The indie/alternative band, To Light A Fire, is headed to Oxford and The Blind Pig for its debut show. Members of the band include Tyler Cody (guitar), Shane Cardinal (bass), Alison Smolin (pictured-drums), Ben Smolin (keyboards/vocals) and Andrew Flickinger (guitar). Catch the rising Birmingham band tomorrow night (Friday, May 20) for an improvised show at The Blind Pig and be sure to check out a feature on the band on Page 9 in this week's issue of Oxford Town. (May 19, 2011, Page 9)
Hill Country Harmonica reloads at Foxfire Ranch
OXFORD TOWN – Hill Country Harmonica — A Northern Mississippi Blues-Harp Homecoming is rapidly becoming one of the largest harmonica-based blues events in the country by featuring multiple workshops, open jams and concerts in a festival-like atmosphere. Check out Page 8 in this week's issue of Oxford Town to get complete details of the annual blues harmonica "homecoming" set to reload at Foxfire Ranch this weekend. Adam Gussow, co-director of Hill Country Harmonica, is pictured. (May 19, 2011, Page 8)
Music In The Hall touts busy week
OXFORD TOWN – Oxford music guru and Music In The Hall founder Daniel Morrow is a busy man this week, bringing two eclectic shows to the forefront. First up, Bottletree Bakery plays host to a new production of MITH featuring Wooden Finger, The Piledrivers and Chimney Choir this Saturday evening (May 21) at 6. On Wednesday, May 25, Morrow introduces Oxford to Aron Shiers and Chris Pickering (pictured) by hosting a free show at Snackbar. For information about these shows and others, see pages 4 and 5 in this week's issue of Oxford Town. (May 19, 2011)
Oxford Town #926
IN THIS WEEKS ISSUE: The Mississippi Cadillac Blues Band is set for an afternoon/evening jam session at Rooster's Blues House this Saturday; New York Rocker Andy Friedman (on the OT cover this week) shares a bill with close friend and local musician Cary Hudson at Proud Larry's; The Taylor Farmers' Market continues this week and bids farewell to Adrian Barron-Robbins as he prepares to return to England for the sumer; Southside Gallery unveils its latest exhibit "Reflections in Oils"; add OPC's Movies in the Park return this summer to entertain your whole family. Click here to download the complete issue in PDF format. (May 12, 2011)
Rooster's hosts Mississippi Cadillac Blues Band this Saturday
OXFORD TOWN – Producer/musician Bud Bays (pictured) and his latest project, Mississippi Cadillac Blues Band, are set for a live performance at Rooster's Blues House this Saturday (May 14) for a rare afternoon/evening jam session on the historic Oxford Square. "Cadillac" is touring in support of its new CD "Stone Cold." Page 5 in this week's issue of Oxford Town features an intimate interview with Bays by Oxford Town Editor Jeff McVay. (May 12, 2011, Page 5)
Andy Friedman rocks Proud Larry's tonight
OXFORD TOWN – New York rocker Andy Friedman will play at Proud Larry's tonight (Thursday, May 12) at 8 p.m. Caleb Stine is scheduled to open the show with Cary Hudson taking the stage after Friedman. Page 7 in this week's issue of Oxford Town features Friedman as he rolls into town in support of his new album "Laserbeams and Dreams." (May 12, 2011, Page 7)
Oxford Town #925
IN THIS WEEK'S ISSUE: On the cover, Taylorpalooza returns to the Plein Air neighborhood this Saturday (May 7); Taylor Farmers' Market kicks off its new season, also on Saturday; Bozarts Gallery in Water Valley unveils its new "Greening The Valley" exhibit; Oxford Theatre's 10 Minute Plays stage readings the the Powerhouse; The Oxford Civic Chorus presents its spring concert "Hooray For Hollywood" on Monday, May 9; The Oxford Fire Department stages a benefit concert for Lafayette County's recent storm victims tonight (May 5) at 6; and Water Valley hosts its inaugural "World's Largest Crappie Fest" this Saturday. Click here to download the complete issue in PDF format. (May 5, 2011)
Musicians rally tonight on the Square to help storm victims
OXFORD TOWN – Musicians Shane Brown, Kelley Norris (pictured) and the One Mile South band take the stage tonight on the historic Oxford Square (in front of city hall and Neilsons) for a concert to benefit the recent storm victims in Lafayette County. The concert is being organized by Capt. James Prichard of the Oxford Fire Department. Page 16 in this week's issue of Oxford Town has details about how you can rock out and help our neighbors at the same time starting tonight (May 5) at 6 on the Square. (May 5, 2011, Page 16)
OT924 – Annual Double Decker issue
OXFORD TOWN – Finally! The revamped Double Decker Festival has arrived and takes place on the historic Oxford Square this weekend. Oxford Town is proud to be the official 2011 Double Decker guide — so start browsing this week's issue to find important info regarding the popular festival. OT's DD coverage pretty much runs from cover to cover, but you'll also find information about other cool art and entertainment events through next week. Click here to download the complete issue in PDF format. (April 28, 2011)


text:
Senoner'park Hochkar: Hochkar Open 2012_QParks Snowboard Tour_28-01-2012
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'Higher, faster, further: on Saturday, the 28th of January the freestyle snowboard elite met up in the Senoner?park Hochkar, in order to match each othershow more in hot battles for cool tricks! In the categories Men and Ladies, the riders gave it their all, showcasing their skills on an exquisitely shaped Big Air Kicker. In the Snowboard Comp Stani took it home again, closely followed by Flo Galler and Marvin Salmina who also took the Best Trick Award for his stylish Frontside 900!
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text:
I spotted him in the corner booth. He was drinking alone, as usual; and as usual, I kept quiet when his eyes roamed to places unfit for polite company. Devon took note of this, and grinned drunkenly at me, although I knew he wasn't as intoxicated as he seemed. Eclavdra's silver eyes flashed from me to the corner and back to me again, and she nodded at me with her 'just give me the word' smile. Maxwell stopped me to take my jacket and kiss my hand- he was always such a gentleman.
Past the sturdy oaken tables where sat members of the noble Highcastle family, past the open space where a dead king danced with a dark elf, past a half-elven pirate with a crimson mohawk and a feral gleam in her eye, I made my way to the corner. The Red Rose Tavern was crowded these days, what with the adventuring season about to start. I could even hear the Nine Gods stomping about on the roof, no doubt bickering about something mortals hadn't conceived of yet.
Load Game > Save 008: Ancient History
Hey Atton, I said, sitting down across from him. You look like you could use another drink. He grinned.
Influence gained: Atton
I'm not in the habit of turning down juma, he told me, especially when a lady's buyin'. I motioned for a waiter, and a green twi'lek sauntered over and took the order. Pfft! Wish she'd been here the first time. I spent ten minutes explaining what juma was to the last waitress. Turns out they call it 'mead' or something here.
Oh. Right. I should've warned you about that, I said, stifling a laugh.
Well, a drink's a drink, right? he leaned back in his seat. Aren't you having some, too?
No, not now. I've got work soon, I told him. However, now would be a great time to have that talk you promised me. Atton sighed.
Alright. What did you want to know? he asked.
Um, well, for starters, what was your childhood like? I mean, what made you join the military? I took out a small notepad.
Persuade: Failure
The twi'lek sat Atton's drink on the table and vanished without a word. He drained half of it in one gulp.
Look, now's a bad time. I don't really want to talk about it, Atton said flatly. I rubbed my temples in frustration.
Alright. Another time, then? I asked, putting the paper away.
Yeah. How about a game of pazaak? he produced his well-worn deck from his jacket. I knew it was his trick deck- I could recognize it by sight now- but I agreed anyway. Thirteen matches later, I was soundly beaten.
Influence gained: Atton
It's been fun, I said, standing and stretching.
Aw, going so soon? he asked with a grin.
Like I said: work, I replied.
Thanks for the drink, Sweetheart, he called after me. I waved half-heartedly at him, not bothering to turn back.
Light Side Points Gained
Influence gained: Atton
Twelve hours later, I was switching off the lights and locking the door when I glimpsed his reflection in the TV screen. He was standing behind me, watching me intently. I turned around and raised an eyebrow at him.
Hi, he said, looking halfway apologetic. I could use some caffa.
I bet you could, I laughed. Help yourself. I'm going to bed.
Oh, come on. Another hour won't hurt. We could have that talk I promised, Atton coaxed.
Look, I'm off all day tomorrow. Let me get some sleep. We can do this later, I said.
I'm busy tomorrow, he bluffed. I could tell by how quickly he said it. I sighed.
Half a pot, Atton, and so help me God it had better make for a good story, I told him, measuring out the grounds. He smiled that self-satisfied smile; the one that made me want to simultaneously drool and kick him in the shins.
Influence gained: Atton
Okay, okay. You don't always have to threaten me with violence, you know, he said, leaning against the sink.
I stick with what works, I informed him. So what is this glorious and riveting thing that's keeping me away from a soft bed and a warm lover? His smug look melted into a devious smirk. It made me swoon without fail, every single time.
It's awfully... sordid, he said. He had my attention.
Really now? I asked, crossing my arms over my chest. Is it terribly dark?
Uncomfortably so, he assured me. I couldn't stop grinning.
Tell me! I leaped forward and grabbed him by the shoulders.
After I get some caffa in me, he said, chuckling.
You teasing bastard! I shrieked. I smacked his chest, doing no damage whatsoever but making a satisfyingly loud 'pop!' on the stiffened leather jacket. Atton laughed. Drink your damned coffee, jackass.
Light Side Points Gained
Influence Gained: Atton
This is good stuff, he told me after his second cup.
It's Colombian, I replied, looking away from the screen and cracking my knuckles.
I've never heard of the Colombian system, Atton said. Corellian, maybe? I laughed.
Never you mind, I said, rolling my eyes. That's about enough to squeeze a story out of. Mind if I take some liberties with the torture scene? I'd like to draw it out a bit, you know, for dramatic effect.
Dramatic effect. Right. Whatever you want, he told me. I'm just here to give you ideas, after all.
I won't keep you any longer, I said, chuckling through a yawn. I know you're a terribly busy man.
Yeah, and you've got a squeaky bed and a snoring fiance to deal with. You need all the sleep you can get, he laughed.
He doesn't snore loud enough to bother me, I said. And what, have you been hanging out in our bedroom or something?
Now when would I have time to do that? I'm a busy man, like you said. Well, that's how you write me, anyway, Atton retorted.
Wouldn't be much to read about if I wrote about you getting drunk, cleaning your guns, and counting cards all day, now would it? I asked, closing out the program. I clicked the 'Safely Remove Hardware' button and pocketed the flash drive.
Influence Lost: Atton
Frack no. Couldn't compare to the secret-agent type operation you've got going with that info stick there. You'd think it was the blueprint of some kinda secret super-weapon battle station, Atton said, hands on his hips. I scowled at him.
Goodnight, Atton. If that really is your name, I said, turning off the overhead light. He looked striking in the harsh light of the kitchen. His stance was wide; overly aggressive. Why would he pick a fight now, of all times?
Does he even know? Atton asked, blocking the doorway.
All that he needs to, yes, I replied.
So he doesn't, he said.
No, I admitted. But why should I tell him?
I dunno. You're the one that preaches about communication and honesty and all that bantha fodder, Atton said, a smile creeping onto his face.
It was a rhetorical question. And I'm not about to start valuing your opinion on relationships, Angsty McAngsterson, I said. He sneered at me. I think you should leave.
Influence Lost: Atton
Atton let the door slam behind him, and with a huff, I went to bed. My fiance was sleeping soundly, and barely stirred when I slid into bed beside him. I felt my consciousness wavering as his warmth spread to me, lulling me into a deep slumber.
I woke up with only the smell of him in bed beside me. I put on some sweatpants and an over-sized tee shirt and made a full pot of coffee. I went about my morning ritual of checking my web comics and eating Ramen noodles in relative silence. After a few minutes, I turned on the TV so it wouldn't be so eerily quiet. The sun outside was freakishly bright, so I closed the blinds.
Creature of the night, eh? Atton asked from my seat at the computer. I was surprised he'd come back so soon. Sorry about last night. I poured myself another cup of coffee.
Yeah, well, we all have our days, I said by way of accepting his apology. I leaned against the kitchen doorway. Atton got up to offer me the chair. I took it, looking at him suspiciously. He sat down on the arm of the couch, about ten feet away. I liked being at least five feet from him. It wasn't like I didn't trust him. I trusted him completely to do what he felt was necessary. Also, that far away, I couldn't smell him. He smelled like alcohol and cigarras and leather. It sent shivers down my spine. He must have seen me thinking about him, or maybe I blushed in the process. Either way, he turned his gray-brown eyes on me and all I could do was watch him.
Did you finish that story? Atton asked.
Oh, that one. Not quite. Just a matter of getting it down onto paper, though, I replied.
Well, I thought of something else last night after I left- something you might like to write about, he said with a smirk.
Oh? What was it? I asked, stirring my steaming coffee. Atton rose from his perch on the arm of the couch. He wandered into the kitchen, studying the surroundings, running his fingers over the refrigerator and range top. I watched him intently as he poured himself a cup of coffee.
Well, there was this time that my little Jedi- block- trick backfired, but in the best way imaginable, he explained, leaning against the fridge.
What, did you make some Sith's head explode with all the pent-up anger inside that melon of yours? I asked with a wry smile.
Not exactly, Atton said, his dark eyes flickering over me as he turned to open the freezer.
I fumbled for the USB port, finally hitting home with the flash drive and plugging it in. I hurriedly opened the word processor and waited, hands poised over the keyboard. I heard him shut the freezer door.
I'm ready when you are, I said, turning so I glimpsed him in my peripheral vision. He was standing behind me now, chuckling softly. The cursor flashed once for every three beats of my heart, and I could feel blood rushing to my face at him being so near.
Trust me, I was anything but ready when she got hold of me, he said. He was leaning over me now, resting his arm on the back of my chair. I knew my face was probably flushed by now, but I couldn't care less. My skin was tingling all over, and I felt like my heart was going to tear itself out of my chest. Atton brought his hand up and touched my neck, just behind my ear. It was cold- too cold to be flesh. When I felt the water running down my neck and dripping down my shoulder, I realized it was ice he'd gotten out of the freezer. I could feel his warm breath on my ear and scalp.
What should I call it? I managed to ask. He moved his hand away and I could immediately feel the heat returning to the numb trail of frigid skin he'd left. Atton dropped the ice cube into my still-steaming cup of coffee, where it cracked loudly.
Shameless, he whispered.


text:
BBC's 'Leading Black Music Station' Dubs Ed Sheeran 'Most Important U.K. Artist'
Grime pioneer Wiley is not happy
U.K. pop folkie Ed Sheeran topped a British radio station's list of "most important U.K. artists in the scene" which wouldn't be all that notable on its own, except that the station in question, 1Xtra, bills itself as "U.K.'s leading black music station."
Though 1Xtra's annual Power List largely reflects their far reaches of their diverse programming, including the nimble-tongued Dizzee Rascal and soulful crooners like Emeli Sande and Laura Mvula, some have taken issue to the milquetoast singer-songwriter that tops the list.
Grime pioneer Wiley, who appears at number 16 on the list, took to Twitter early this morning to register his disapproval.
"We influence a man and all of a sudden it turns he has influenced us," the MC said of Sheeran's place on the list. "We have been bumped basically. Not taking anything away from Ed, he is sick. But black artists in England, we are getting bumped."
Disclosure and their collaborator Sam Smith also placed in the top 5 of 1Xtra's rankings. But the list as a whole features a number of culturally diverse acts, including Rudimental (who paired with Disclosure to create one of SPIN's favorite trends of 2013). Given, however, that Sam Smith is the station's most played artist in 2014 so far, the choices may just be reflective of the prevailing music tastes in the U.K. rather than any intentional slight against any of the other artists that appear on the list.
Either way, Wiley's vitriolic judgements of the "scene" in question still stand.
"England['s] music industry is backwards," he tweeted. "God bless those who try tho[ugh]."
Read all of Wiley's tweets below.
We influence a man and all of a sudden it turns he has influenced us ....Lol
— Wiley (@WileyUpdates) July 12, 2014
England music industry is backwards. God bless those who try tho .
— Wiley (@WileyUpdates) July 12, 2014
People think i am mad .I am not mad i can just see skull duggery from miles away. Lol
— Wiley (@WileyUpdates) July 12, 2014
We have been bumped basically .Not taking anything away from ed ..he is sick . but black artist in england we are getting bumped.
— Wiley (@WileyUpdates) July 12, 2014


text:
Players will explore the story of a team who seek to be the first to descend the faces of the most treacherous mountain ranges on the planet. They will visit the peaks of the Himalayas, where the air is so thin that riders have to descend through the death zone at breakneck speeds to keep from blacking out, to the solid ice ranges of Antarctica, where a sunlit line is the only survival option when temperatures drop 50 degrees centigrade in the shade.
Available Now
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Posted on Feb 3rd 2015 3:30PM
Posted on Feb 3rd 2015 2:15PM
Posted on Feb 3rd 2015 1:45PM


text:
Phantom Alert
Controversial mobile App warns motorists about police checkpoints and red light cameras.
Four U.S. Senators are calling Apps like this harmful to public safety and when it comes to police departments there are definitely some mixed reactions.
Phantom Alert CEO says there has been more than 109,000 downloads of this App in the Seattle area.
One person who owns the App, Mike Cheney, says "I'm not concerned about getting a ticket. I'm more concerned about the safety aspect. A lot of people who deal with the red light cameras, they don't know they're coming up on one."
Others download the App for about $10 a month strictly to avoid red light cameras and spots where officers are running traffic enforcement.
So what do police departments think? In Bellevue, Washington, where red light cameras have been operating for about a year, roughly 23,000 tickets have been issued. The police department says they have no issue with an App that alerts drivers to the city's safety programs.
Officer Carla Iafrate says "I think it's great. Any time you can alert the public to a safety program in any city, I think it's goood news. That way, people's driving habit awareness and safety awareness has gone up and if that's what this application does, then more power to it."
Senators Harry Reid of Nevada, Charles Schumer of New York, Tom Udall of New Mexico, and Frank Lautenberg of New Jersey say they don't like the App because it alerts drivers to where DUI checkpoints are.
Overall, the Phantom Alert CEO maintains that this is an App that makes drivers think twice about their driving habits.


text:
Some people thought Miley might be getting married because she's pregnant but a friend of Miley's reveals the singer wants to wait before she has kids with fiance Liam Hemsworth. Find out when she wants to start thinking about babies!
Miley Cyrus may be ready to walk down the aisle with her love of three years, Liam Hemsworth, but she's not ready to be a mom. She has a specific age in mind when they might start trying!
A source close to the 19-year old pop star exclusively told HollywoodLife.com that Miley "loves kids but has told several of her friends that she told Liam kids are out of the picture for a long time."
So when would she be ready? In six and a half years! "Miley has said she doesn't even want to think about having kids until she's at least 26," the insider added.
Liam, 22, seems at ease with his future wife's delay in wanting to start a family. Our source revealed, "Liam wants kids eventually but understands that they're both young and don't want to complicate things with kids.'
The insider says the couple is just happy to be engaged. "They really just want to enjoy this time together as they plan their wedding."
It's good they are taking things slowly!
Are you glad Miley and Liam are waiting for babies?
Written by Amy Webber, Reporting by Eric Mitchell
More Miley News:
Find Out How Miley Cyrus Got Liam Hemsworth To Propose- Miley Goes Lingerie Shopping For Her Fiance Liam Hemsworth
- Miley Cyrus & Liam Hemsworth and More: The 8 Most Shocking Young Celeb Weddings
View Comment
I think Miley should at least wait until she is 25 years old to have sex and kids. Im not trying to be mean or anything but she has changed a lot since she quit on disney channel. They made her dress like that and when she was set free she was excited about it and she also made a song about it to. It is called "We Can't Stop." She is to young to even get married in the first place dang she's only 19 years old I mean she might be waiting but she needs to wait a little bit longer before she does all that stuff.
Posted at 8:45 AM on July 8, 2013
Posted at 10:39 PM on October 12, 2012
Omg. She needs to focus on school and going to college. Not having a baby. And people say she's a good role model? Ya, I don't think so. Miley drinks, and parties. OH ALSO, on facebook if u guys didn't she had a penis cake. Look it up on the internet. And she's not a good role model. A good role model is a person who wants people to look up to them as a hero. And some of her fans, its possible her fans will follow in the same footsteps..examples of good role models:
Avril lavigne
Drake bell
Miranda cosgrove
One Drection
Rebekah Rust
Posted at 7:48 PM on February 6, 2013
Posted at 7:00 PM on February 17, 2013
Uhm. Avril Lavigne cusses (and seeing what you just posted, I don't think you would see that as a "good role model"), And One Direction talks about sex in their songs, and do infact have sex. So i wouldn't judge Miley so quickly. Yeah, she drinks. But who doesn't atleast once in their teenage life. And she smokes weed. Pfft, Weed isn't bad? You need to get your facts straight! Every one makes stupid choices as a young person. But you wouldn't want people judging you because you wore a low t-shirt, right? You don't know her personally so you can't judge.
that is so true,miley and liam just need to focus on their career and i'm sure their both still in school.Miley is too young to be getting married she's only 19,gosh why is miley so retarted,she really is setting a bad example.She should wait until she's 24 or something,not get married at 19 then start having babies right away,that's just wrong.i hope they don't end up like kim and kris and have to divorce.I really think they should wait but if they want to be stupid and get married now then that's their problem.
Posted at 11:52 PM on August 6, 2012
Posted at 1:16 AM on June 20, 2012
The truth of the matter is, if they wait until Miley is in her mid-20s then they will have been dating for 8 years and their chances of divorce will be really high.
I don't think kids are a good idea right now, either. They need to focus on their career for a little longer. Maybe in 2-3 years they can start thinking about starting a family. But people who wait a long time between marriage and children often wait for the wrong reasons, which can also result in unhappiness/possible divorce. Just be careful.
Posted at 11:19 PM on June 19, 2012
Posted at 10:27 AM on July 9, 2012
Miley is getting married at a very early time! I think she shouldn't of waited until she was, like, 23 to marry Liam. The couple should both face on their career. Miley Cyrus should make more music and Liam should do more acting. But, Miley and Liam are going to be like Kim Kardashian and Kris Humphries, it's not going to work out. Face it, Miley, you're too, uh, odd to get married. One year she's goody-two shoes Hannah Montana, the next, she has a fiance she'll probably marry, have a baby with, then leave him and be a single mother to an Austrailian baby. Wow, time flies quickly. :P
Posted at 4:53 PM on June 12, 2012
Posted at 8:00 AM on June 12, 2012
Posted at 2:26 AM on June 12, 2012
Posted at 10:13 PM on June 12, 2012
Posted at 7:41 PM on June 11, 2012
Posted at 7:24 PM on June 11, 2012
Posted at 6:27 PM on June 11, 2012
Posted at 6:26 PM on June 11, 2012
Posted at 5:59 PM on June 11, 2012
Posted at 11:44 PM on June 29, 2012
I don't think they will even make it down the aisle just because they fight alot. Also it is so stupid how she is jealous of him and it's alright for her to start saying that he and Jennifer Lawerence hooked up or had a fling but when he did she had to come out and say it's alright for her because they're just friends and shecan have friends of the opposire sex but he can't.


text: On Thu, 6 Nov 2003 01:44:47 -0700 (MST) conathan at conet.dyndns.org wrote: > > BTW, I dont exactly know how to get into single user mode, but > it has something to do with kernel parameters on bootup. I have this posted on the wall of my room, 'cos I need it so infrequently the information has usually leaked from my brain. To boot into single user mode: 'Add the word "single" or "emergency" to the kernel command line" In Grub, this means hitting 'e' during the boot delay (I have mine set at 30 seconds, 'cos I'm slow: 'timeout 30' in /boot/grub/menu.lst) and then editing the kernel line to add ' single' to the end of it. Then hit 'b' to boot. N.B. Single user mode is NOT, repeat NOT, a substitute for an emergency boot floppy. But it can sometimes help when the emergency boot floppy has gone walkabout. -- Cheers, Richard Richard A Downing FBCS Anyone sending unwanted advertising e-mail to this address will be charged $25 for network traffic and computing time. By extracting my address from this message or its header, you agree to these terms.


text:
Yolanta House
1/3/5 Herbert Road, Sherwood Rise, Nottingham NG5 1BS
Tel: 0115 962 6316
Yolanta House is a homely Nottingham residence that is ideal for supporting the lifestyle and well-being of older residents, while staff are also skilled in the provision of dementia care.
All care workers are trained to suit the challenges residents face, while being committed to respecting the personal interests, wishes and dignity of each client.
Owner: Mr & Mrs J Sekowski
Person in charge: Mr & Mrs J Sekowski (Owners/Managers)
Local Authority / Social Services: Nottingham City Council (click for contact details)
Type of Service: Care Home only (Residential Care) – Privately Owned , 17 residents
Registered Care Categories*: Dementia • Old Age
Specialist Care Categories: Alzheimer's
Admission Information: Ages 60+.
Languages Spoken by Staff (other than English): Polish
Single Rooms: 17
Shared Rooms: 0
Rooms with ensuite WC: 5
Weekly Charges Guide: Personal Care Single £409 – £446
Facilities & Services: Palliative Care • Day Care • Respite Care • Independent Living Training • Own GP if required • Own Furniture if required • Pets by arrangement • Close to Local shops • Near Public Transport • Wheelchair access • Gardens for residents • Phone Point in own room/Mobile • Television point in own room
Latest CQC* Report on Yolanta House: click here
*Care Quality Commission (CQC) is responsible for the registration and inspection of social care services in England.
Current Recommendations
Recommendation Score: 8.4 (8.435)
The user 'Recommendation Score' (8.4 for Yolanta House) is calculated using a combination of the average of all ratings on user Recommendations submitted in the last 2 years, and the total number of user recommendations submitted in relation to the number of beds at the care home. The maximum Recommendation Score is 10. To see more about the carehome.co.uk user recommendations please click here.
Review of Yolanta House
What all care should be
This place is not like most care homes in that they don't charge Nan extra for funding her own care. They did everything they could to help her settle in and treat both her and us like family. The food is great and I know Nan can order whatever she wants.
She became depressed in her previous care home but has come on leaps and bounds at Yolanta, putting on weight and even getting her twinkly smile back!
In short, highly recommended!
Overall Standard: Excellent |
Facilities: Excellent |
Care / Support: Excellent |
Cleanliness: Excellent |
Treated with Dignity: Excellent |
Food & Drink: Excellent |
Staff: Excellent |
Activities: Excellent |
Management: Excellent |
Safety / Security: Excellent |
Rooms: Excellent |
Value for Money: Excellent |
How likely would you be to recommend Yolanta House? Extremely likely
Submitted by Nigel Harvey (Grandson of Resident/Service User) on Saturday 8 November 2014. Review relates to November 2014.
Review of Yolanta House
A lovely, family-orientated home
When my grandma became ill last year, we couldn't find anywhere that didn't feel like a hospital or part of a chain. We were beginning to lose hope until we found Yolanta House and met the family who run it. They couldn't do enough to explain all about the home and how my gran would be looked after. They even offered to provide advice and help if we chose another home!
Though it looks unassuming from the outside, I can say that the care is second to none. The family are there everyday and are really hands-on. This makes the whole home feel like a big family rather than a revolving door of staff and residents. They take people out on a one-to-one basis rather than just in groups, which makes it feel very personal and informal. When gran deteriorated they visited her in hospital and even sat with her in the night. I never had a single worry while gran was there and I was always welcomed when I visited. It was the next best thing to having gran with us at home.
Overall Standard: Excellent |
Facilities: Excellent |
Care / Support: Excellent |
Cleanliness: Excellent |
Treated with Dignity: Excellent |
Food & Drink: Excellent |
Staff: Excellent |
Activities: Excellent |
Management: Excellent |
Safety / Security: Excellent |
Rooms: Excellent |
Value for Money: Excellent |
How likely would you be to recommend Yolanta House? Extremely likely
Submitted by Eve (Granddaughter of Resident/Service User) on Monday 29 September 2014. Review relates to September 2014.
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text: Not sure which type of membership is right for your company? Click here to complete a quick questionnaire to find out. The annual membership term is January through December. Joining anytime in February through July, your dues are pro-rated and your membership is valid only for the current calendar year and must be renewed annually by January 1. Joining in August or later in the year, your dues are pro-rated for the current year plus you must pay full dues for the following year.


text:
UK & World News
Pensioner Has Close Shave At Level Crossing
A pensioner had a lucky escape when he narrowly avoided being hit by a train after ignoring a barrier on a level crossing.
The 77-year-old was scraped by the locomotive and fell to the floor but ended up with just minor injuries.
Shortly before, he had decided to bypass a barrier which had come down to stop people and vehicles crossing the track.
Thinking no train was coming, he started to walk across the rails slowly until he suddenly realised a train was approaching.
The man was forced to throw himself out of the way of the passenger service as it sped towards him.
Although he ended up on the floor, the pensioner managed to regain his feet and hobble off the track.
Local police in the Czech Republic said he will be fined about £75.