text:
Chain Maille Scarf – Free Crocheting Pattern « Glove Love. Posted on October 17, 2009 by Simone Chain Maille Scarf I once talked to a guy about crocheting, and he told me he "knew how to crochet".
Sunshine's Creations @Vintage Threads Inc.: crocodile stitch. This is a similar in concept, meaning three-dimensional of look, to the snow queen.
It's not the same, but it's pretty cool anyway. It is in Portuguese, but I thought it was neat enough for you to see. If you know how to crochet the visuals should be enough for you to understand how to do this. I might have these in the wrong order; each one is roughly 10 mins., some are much shorter. She talks a lot; wish I understood her better because I am sure with that much talking I must be missing something. On Demand. Knit & Crochet Today. Video Archive. Knit and Crochet Now!
Is a half hour of commercial-free programming, featuring top-notch information from the best knit and crochet experts. Learn how to knit and crochet exciting patterns the easy way! Crochetville. Wool yarn, mohair yarn, silk yarn, cotton yarn, easy-care synthetic yarn and more! Lion Brand Yarn. Granny Stripe Boutique Bag. Los Angeles Food Photographers ? White on Rice Couple.
Photography and Handcrafts by Shireen Nadir. Meet the new baby.
This is the Canon 7D. Swaddled in TFA Grape. Yes, I said swaddled. Because nothing says love like TFA yarn. No Patons cop-out for my camera! Brown Slippers. (Update: To see more of my patterns, please visit my ONLINE SHOP!)
I've just finished making these slippers. Making crocheted slippers is my addiction. Huge addiction. Spring Placemat. (Update: To see more of my patterns, please visit my ONLINE SHOP!)
I have a confession to make. I really, really love making placemats. Granny Square Purse. Done.
Finished. Here it is. Last time I showed you these squares. They were so much fun to make. Fingerless Mittens. (Update: To see my original patterns, please visit my ONLINE SHOP!)
This is a story of a girl who was trying to knit with four double-pointed needles for the first time in her whole life. The story is going to be exciting yet scary. How to crochet a heart. Galerie de Attic24. Birdie Decoration. This is my pattern/tutorial for a hanging Birdie Decoration.
A completely useless object of course, but very cute all the same. It's an easy project to make, great for using up odds and ends of yarn and can be used in all sorts of ways to bring a little good cheer. This little birdie is made in four pieces :: a round flat circle for the body, a small triangle for the beak and 2 leafy shapes for the wings. There is also a hanging chain to make which you can decorate with flowers if you like, and the option of adding some dangly legs too. Granny Square Tutorials. As if I didn't have enough projects started around the house, I've embarked on a HUGE new endeavor– Learning how to make granny squares and creating a granny square blanket.
I know– seems a little lofty for a such a novice like myself, but I'm really excited about it. Right now I'm practicing and I have to admit– I LOVE it. I'm playing around with two different styles of squares that seem pretty easy (I'm still learning how to read patterns) and different color combos. In the meantime, here are some fabulous granny square tutorials for you to check out and try! Your place to buy and sell all things handmade, vintage, and supplies. Green and Tan Cloche Hat by minimeg.

 Take full advantage of our site features by enabling JavaScript. <a href=" more.

 Help. Chaîne de tjw1963. The Art of Crochet by Teresa - Crochet Shell Variation 4 - Blanket or Scarf.
Art of Crochet by Teresa - Crochet Puff Stitch Hat. Chaîne de mikeyssmail.


text:
More about this preview.

Change DPI Base size is 150
Explore Our fabrics
Optional Filters
I'm going to use this fabric to make...
I'm looking for a fabric that is...
Receive our weekly email with news about contests, giveaways and prodution releases.
Email Address
No Thanks
© 2008-2014 Spoonflower Inc

subset: commoncrawl


text:
Electronic Bathroom Scale from Kalorik®
Item # WX2-283093
- Google+
This item is shipped directly from the factory. To see the expected shipping date, please add to your Shopping Cart. Sorry, no express shipping available. We are unable to ship factory direct items to Alaska, Hawaii, Puerto Rico or APO or FPO addresses.
- Details & Specs
Electronic Bathroom Scale from Kalorik®. Slim and modern with an easy-to-read lighted LCD display.
Stay on top of your health with help from Kalorik!
- Silver spray frame
- Surface in blue glass
- 4 "AAA" batteries (not included)
- 330-lb. capacity
- 12 x 12 x 1 1/4"h.
- 1"-high LCD display with blue backlight
- Auto-zero and auto-off.
- Reviews
<!--BVSEO|dz:Main_Site-en_US|sdk:v184.108.40.206-n|msg:Error: Request errored out - The remote server returned an error: (403) Forbidden. -->
- Articles & Tips
You May Also Like
Prospera Electronic Pulse Massager
Buyer's Club $40.49 Non-Members $44.99 -
Ionic Energizer Solo Detox Foot Spa
Buyer's Club $89.99 Non-Members $99.99 -
Hot / Cold Compression Knee Therapy
Buyer's Club $26.99 Non-Members $29.99


text:
Current language is English, choose a different language:
CyBi®-SELMA is a semi-automatic pipettor for quick, precise and reproducible processing of 96-well and 384-well microplates. This application note summarizes CyBio AG's liquid handling experience with the CyBi®-SELMA 96, 250 μl. The data demonstrate pipetting parameters for a broad range of customer specific applications and show the volume limits which vary with pipetting conditions and liquids.
Request Info
Popular tags in SelectScience


text: Cordaro: The only way to restructure LIPA By: Commentary May 25, 2011 3 Comments By Matthew Cordaro Over time the Long Island Power Authority has wasted millions of dollars in ratepayer funds on consultants to study alternative structures while the answer to their needs is quite evident. Basically the authority has three options: remain as it is now organized with some augmentation, become privatized or transform itself into a full-service municipal ... Subscribe Login Email Address: Password: Already a paid subscriber but not registered for online access yet? For instructions on how to get premium web access, click here.Forgot your password? Print, Digital & Mobile1 Year$129 Digital & Mobile Only1 Month Intro Rate$2.99----------1 Year$99 Digital & Mobile Only1 Month Intro Rate$2.99----------1 Year$99 Print, Digital & Mobile1 Year$129 Print, Digital & Mobile1 Year$129----------Digital & Mobile Only1 Month Intro Rate$2.99----------1 Year$99 Share this:EmailPrintFacebookTwitterGoogle +1 electricity Energy labor LIPA Restructuring staffing union 2:28 pm Wed, May 25, 2011 Long Island Business News Commentary


text:
Venice Court
Most errands require a car.
It is possible to get on a bus.
Flat as a pancake, good bike lanes.
Score Details
Venice Court has a Walk Score of 36 out of 100. This location is a Car-Dependent neighborhood so most errands require a car.
This location is in the Princess Anne neighborhood in Virginia Beach.
Nearby schools include Goddard School, Strawbridge Elementary School and Three Oaks Elementary School.
The closest grocery store is Walmart Supercenter.
Nearby coffee shops include Fresh Tapas & Tonics, Cool Beanz and Starbucks. Nearby restaurants include FIREBREW Bar & Grill, Yanni's Casual Greek and Pappy's Hotdogs.
Venice Court is near Red Mill Farms North Park, Ocean Lakes East Park and Malbon Acres.
There are good bike lanes and the terrain is flat as a pancake. Venice Court is bikeable, there is some bike infrastructure.
Explore how far you can travel by car, bus, bike and foot from Venice Court.
Venice Court has minimal transit which means it is possible to get on a bus.
Bus lines:
0.2 mi
View all Princess Anne apartments on a map.
Popular apartment searches include pool, fireplace and single family. View all Virginia Beach apartments and rentals.
Venice Court is in the Princess Anne neighborhood. Princess Anne is the 22nd most walkable neighborhood in Virginia Beach with a neighborhood Walk Score of 14.
Moving to Virginia Beach from another city? View our moving to Virginia Beach guide.


text:
AD Tag – GNN
2AD – grey matter book ad
3Ad – caverns of blood
4AD – Brain Damage
Ad – Sam Hain
AD – Zoe Suckers Novel Ad
New Ad – Wil Jackson
AD – Will Jackson
8 – Eddie Brewer AD
Ad – Scares that Care Weekend
Social Arena Banner
Subscribe and Follow
zergnet widget
News header
springboard widget – move reviews under
Film Reviews header
podcasts header
interviews header
Interview: Monique Dupree
February 23rd, 2015Interviewed by: Janel SpiegelInterview: Rob Riegel (Tattoo Artist)
February 22nd, 2015Interviewed by: Janel SpiegelInterview: Demonboy (Band)
February 17th, 2015Interviewed by: Riobook reviews header
Book Review: Gone Feral - Author Ted Nulty
Reviewed by: Dave GammonCategory: Book ReviewsBook Review: Jackpot – Authors: Various
Reviewed by: seanofthedeadCategory: Book ReviewsBook Review: Abram's Bridge - Author Glenn Rolfe
Reviewed by: Dave GammonCategory: Book Reviews-
Film Review: The Fiendish Plot Of Dr. Fu Manchu (1980)
SYNOPSIS: "Fu Manchu's 168th birthday celebration is dampened when a hapless flunky spills Fu's age-regressing elixir vitae. Fu sends his lackeys to round up ingredients for a new batch of elixir, starting with the Star of Leningrad diamond, nabbed from a Soviet exhibition in Washington. The FBI sends agents Capone and Williams to England to confer with Nayland Smith, an expert on Fu. Nayland suspects Fu will kidnap the king and queen and demand the … Continue reading


text:
260 Views
By FilmTrailer
94 Views
By HitFix
783 Views
By SplashNews
Keri Russell Victim of Home Invasion and Theft [HD]
123 Views
By SplashNews
4,481 Views
By FilmTrailer
Aliens, Monsters, Explosions & Dwayne Johnson!... [HD]
7,755 Views
By Revision3
Pause/Play: Bettlejuice Comes to DVD! [HD]
111,822 Views
By PausePlay
Movie Trailers - Dark Skies - Trailer
390 Views
By TheEscapist
Access Hollywood - Keri Russell Talks Horror Mo...
74 Views
By hulu
Late Night with Jimmy Fallon - Keri Russell Sea...
256 Views
By hulu
Entertainment Tonight - What Scares 'Dark Skies...
374 Views
By hulu
Scares 'Dark Skies' Star Keri Russell?
2,088 Views
By CBS
Dark Skies (2013): Dark-skies-trailer
378 Views
By AnyClip
HitFix - Austenland: Keri Russell Interview
49 Views
By hulu
Jimmy Kimmel Live - Keri Russell, Part 2 Season...
52 Views
By hulu
Jimmy Kimmel Live - Keri Russell, Part 1 Season...
78 Views
By hulu
HitFix - The Americans: Keri Russell Interview
55 Views
By hulu
The View - Keri Russell and Matthew Rhys Season...
153 Views
By hulu
In Character With - Keri Russell of "Waitress"
150 Views
By hulu
Keri Russell's Bedtime Stories
372 Views
By CBS
Christmas Celebrations - Decorate Noahs Ark Chr...
17 Views
By hulu
HitFix - Dark Skies: Keri Russel Interview
105 Views
By hulu
EXTRAORDINARY MEASURES: Movie Trailer
2,702 Views
144 Views
By FilmTrailer
219 Views
By FilmTrailer
CelebTV.com - On CelebTV's Radar: Baby Bonanza!
101 Views
By hulu
CelebTV.com - Celebs Without Makeup: Kelly Clar...
139 Views
By hulu
Mission: Impossible III - Now I'm Out
204 Views
"Austenland" Premieres in New York
17 Views
By CBS
Watch What Happens Live - After Show: Keri's 'F...
48 Views
By hulu
Watch What Happens Live - Kyra & Keri Play Just...
54 Views
By hulu
Keri Russel explains how she still got scared when she watched her own movie. The actress discusses the script and working with director Scott Stewart. Russel also talks about her upcoming projects such as Austin Land and The Americans.
HitFix sat down with Non-Stop stars Liam Neeson and Julianne Moore to discuss their upcoming thriller Non-Stop and how the filming wasn't nearly as tense as the final film came out to be.
Theo James sits down with Gregory Ellwood to describe the meticulous development of his character Four and his nod to the performances of Paul Newman in the film adaptation of Veronica Roth novel Divergent. James goes on to describe working with Shailene


text:
Credits & Info
- Uploaded
- Apr 18, 2011 | 8:29 AM EDT
If you liked this, check these out!
Pico: Hero Havoc by JoSilver
- Game
- Rated T
- 10,132 Views
Sundown Dash by JoSilver
- Game
- Rated T
- 31,583 Views
Alley Fighter by JoSilver
- Game
- Rated T
- 46,949 Views
Caveman Prototype by JoSilver
- Game
- Rated E
- 7,487 Views
Demon Runner by Fungasm
- Game
- Rated E
- 93,283 Views
KillingOfTheGreatPumpkin by MarkP0rter
- Game
- Rated T
- 4,119 Views
Plenty more like this here!
NG Game Jam 4 Teams had a weekend to make games based on constraints.
Author Comments
Game Jam April 2011!
The Theme of this game Jam was Handicaps...
Mine was I could only use 3 colors...
So forgive me... but you'll be seeing a lot of them.
This is a Top Down Shooter
Keys are...
AWSD: Move
Arrow Keys: Turn and SHOOT! (MASH ON UP TO FIRE FASTER)
Space: RUN!
Don't bother turning your speakers up, there's no sound in this game. I wish I could have added sound but there just wasn't enough time.
Hope you guys enjoy now if you'll excuse me I haven't slept in two days, literally I am stuggling to type this with otut erreer...
Nighty Nighty.
YAHOO!!! Front Page, THANKS TOM!
Rated 4.5 / 5 stars
Aaaawww sound please.... pretty please
The game you created here (on your own, being the only team-member) for the game jam is awesome. You coped well with the colour handicap and the engine is really fun to play.
It's sad that you couldn't add the sound but I would reaaaaally love to see it with sound someday. You should consider updating it when you get to it.
Adding the ability to run was really a good idea, but when running it is hard to control everything properly. I think you would have been better if the down arrow key was the RUN button, since you use the other three arrows anyway and it's uncomfortable to stretch your hand over to the spacebar from either WASD or the arrows.
Also when I tried to move in circles while running and shooting the char didn't turn anymore. (too many buttons at the same time? :P)
Apart from that it's really fun. I think the ninjas where an awesome idea and the boss fight was pretty hard until you find out how to handle him.
All in all a great entry and if you had had the time to add sound it would have been even better.
Good job!
5/5 & 10/10
Thanks glad you liked it.
when it comes to the spacebar for running I found the spacebar works best, I tryed the down arrow but than it becomes hard to shoot and run. and also yeah there are only so many button pressed flash will pick up sadly (adobe needs to fix it).
I really kinda wanna leave this one as is. I polished it as much as I could and sent it off.
But that does mean I wanna abandon it, I created a pretty complex engine for this game and I wanna experiment more with it.
Also thank for playing.... CONTRAST!!!
Rated 4.5 / 5 stars
Was awesome!
I loved it! Struggled at the end though (found a glitch outside the wall) I was up till 5am for some stupid reason... even with the lack of sleep I got over the weekend from this Jam. It's been fun man! :)
Fun it has been... remind me to never do that again... :|
Rated 3.5 / 5 stars
Not too shabby
My major complaint is definitely the lack of sound, but overally the game wasn't bad. The controls took some getting used to, but once I "got it," its actually a pretty effective setup.
The invisible guys are a pain in the ass, though.
Glad you liked it.
I wanted the ninjas to be like "HOLY THERES A NINJA OUTTA NOWHERE" I guess I accomplished that.
Rated 5 / 5 stars
Impressive effort!
Hey I like this, the colors are a bit hard to swallow, perhaps you could have played with the saturation on them a bit so they didn't bleed so bad on monitors.
Overall great job and I forgive you for being a little late in submitting it. :)
I try to do my best with the colors, I totally agree about the colors. I had to stare at it all longer than anybody.
Glad you liked it!


text:
User:Ser Amantio di Nicolao
From Wikipedia, the free encyclopedia
(Redirected from User:AlbertHerring)
This is a Wikipedia user page. This is not an encyclopedia article. If you find this page on any site other than Wikipedia, you are viewing a mirror site. Be aware that the page may be outdated and that the user to whom this page belongs may have no personal affiliation with any site other than Wikipedia itself. The original page is located at http://en.wikipedia.org/wiki/User:Ser_Amantio_di_Nicolao. |
- In Dei nomini, anno Dei nostri Jesu Christi ab eius salutifera
- incarnatione millesimo ducentesimo nonagesimo nono, die prima
- septembris, indictione undecima,
- ego notaro Ser Amantio di Nicolao,
- civis Florentiae, per voluntatem
- Buosi Donati scribo hoc testamentum...
Ser Amantio di Nicolao has signed the Petition against Ignore All Rules abuse. |
1,000,000+ | This user has made over 1,000,000 contributions to Wikipedia. |
This user is a proud member of WikiProject Virginia. |
This user is a member of WikiProject Stub Sorting. |
Multi-licensed with the Creative Commons Attribution Share-Alike License versions 1.0, 2.0, 2.5, and 3.0 | ||
I agree to multi-license my contributions, unless otherwise stated, under Wikipedia's copyright terms and the Creative Commons Attribution Share-Alike license version 1.0, version 2.0, version 2.5, and version 3.0. Please be aware that other contributors might not do the same, so if you want to use my contributions under the Creative Commons terms, please check the CC dual-license and Multi-licensing guides. |
This user has been identified as an Awesome Wikipedian and was awarded his or her own day. |
This user is ranked 7 on the list of Wikipedians by number of pages created. |
0.66% | This user has created 31,037 of the 4,732,287 articles on the English Language Wikipedia |
This is pretty awesome and stuff
Other stuff to consider[edit]
- User:RussBot/Templates with red links
- List of members of the Pan-African Parliament
- Eastern Caribbean Supreme Court - needs work
- Wikipedia:WikiProject Red Link Recovery/Capitalisation
- Wikipedia:List of missing Africa topics
- Amianthium - I have a photograph of this to provide later
- List of Tortricidae genera
- User:Sesel/Article wish list
- List of members of the Croatian Parliament 2000–2003 - this can be filled
- Les XX - as can this
- Gelöbnis treuester Gefolgschaft - and this
- Some Lithuanian biographies
- And I should probably keep this around
- ru:Лаврово (Рамешковский район)
- Silhouettist biographies
- More of the same
- Artists' biographies
- I want to remember this
- Something else, if I ever get around to it
- Wanted articles about Africa
- Notable Guineans
- More painters
- Cyclopedia of Painters and Painting
- Cyclopaedia of American literature
- South Sudanese governments
Places I've visited[edit]
The Random Acts of Kindness Barnstar | ||
Thanks a lot my friend Amantio for reviewing my many articles. Thanks for your generosity. THanks Ashishlohorung (talk) 16:12, 29 November 2013 (UTC) |
The Original Barnstar | ||
Thanks for all your edits! Sue and Steve (talk) 16:42, 16 January 2014 (UTC) |
The Original Barnstar | ||
Thanks for your edits to Pashto! Adjutor101 (talk) 16 October 2014 |
- WikiProject Virginia members
- WikiProject Stub sorting participants
- Wikipedians contributing under Dual License with CC-BySA-1.0
- Wikipedians contributing under Dual License with CC-BySA-2.0
- Wikipedians contributing under Dual License with CC-BySA-2.5
- Wikipedia autopatrollers
- Wikipedians with over 1 million edits


text:
- Tasmania's Southwest National Park by scenic flight from Hobart
- Explore the wilderness of Tasmania's largest national park
- Enjoy a cruise on Melaleuca Inlet and Bathurst Harbour
- Take a bush walk through the Southwest National Park
- Choose from full-day, morning, afternoon and winter tours
Why Our Insiders Chose This Tour
This is a day you will always remember - an opportunity to discover Tasmania's remote Southwest National Park by both air and land. It's an area of pristine and untamed natural beauty. In order to appreciate this special and unique part of Tasmania. I highly recommend the full-day option
What You Can Expect
Entering Tasmania's vast southwest wilderness area, follow the route of the South Coast Track to land at Melaleuca Inlet. On the ground, visit the Deny King Bird Hide at Melaleuca and see the rare and endangered orange-bellied parrot.
Then board a boat to cruise along Melaleuca Inlet and into Bathurst Harbour, an untouched waterway the size of Sydney Harbour. Photograph views of the remote Celery Top Islands, and breathe the cleanest air in the world.
Your return flight to Cambridge takes you over Federation Peak, Mt Picton, Huonville and the Hobart city center.
On the full-day wilderness tour, available year-round, spend approximately six hours at Southwest National Park. Have lunch in a spectacular remote location, a world away from civilization, and take short guided bush walks through the wilderness.
The half-day option operates from November to April, with a choice of morning and afternoon departures. Enjoy around two hours in the Southwest National Park on the half-day tour, with morning or afternoon tea included in the park.
Operating only in winter, from May to October, the five-hour wintertime tour highlights the beauty of Tasmania's wilderness dappled with snow, and includes lunch plus an hour extra on the ground at Claytons Corner on Bathurst Harbour.
Customer Reviews
February 2015
Perfect wilderness experience! Good time spent both in air and on ground. Good perspective of land gained. Peaceful place but the planes used could be updated! New windows for example.
David H
December 2014
Fantastic day out flying with a very experienced pilot who was also our tour guide, boat skipper, naturalist, local historian and caterer. I went to book a half day tour but was so fortunate that only a full day one was available for me. Thoroughly recommended.


text:
Select all
Found the same room at a different price? Tell us, and we'll offer to match it.
Find out more
Balladins Pont Rouge Carcassonne
Kyriad Carcassonne Ouest
Hotel De L'octroi
Hotel Du Chateau
Fast Hotel
Distances are provided for guidance and are calculated 'as the crow flies'. For directions and actual distances by road, please refer to the hotel directions tab for the particular hotel.
Reset filters


text:
About Us
Job & Career
Online business advice
GTC & Imprint
Huhtamaki Films
Job & Career
Bachelor of Arts (DH) Industry
Bachelor of Arts (B.A.) – Business Administration
Job profile:
Same business management training as for industrial business management assistant
First year of training spent entirely in the company and at vocational business school
Second year of training onwards, term time at Economics Faculty of Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU)
Non-term time spent in the company
Duration of training: 48 months
School-leaving qualification: Abitur [German secondary school-leaving examination]
Working hours: 8 a.m. to 5 p.m./flexitime
Vocational business school: part-time education
University: term-time spent at FAU Nuremberg
Vocational training pay: as per collective bargaining agreement
14 monthly salary payments
employer's contribution to tax-deductible employee savings scheme
salary is paid during term time
student fees are paid
Holiday entitlement: 30 days per annum
1st academic year:
External introductory weeks designed to enable trainees to familiarise themselves with the company and get to know other trainees
Purchasing and materials procurement
Reception of goods, product testing, storage of goods
Materials management
2nd academic year:
Two-day external business planning exercise in conjunction with trainees from affiliated companies. This takes place every 2 years in different towns in Germany
Term time at FAU Nuremberg
Curriculum same as for industrial business management assistant
3rd academic year:
Term time at FAU Nuremberg
Curriculum same as for industrial business management assistant
Completion of a specialist assignment in appropriate field of application
4th academic year:
Term time at FAU Nuremberg
Practical assignment in an area of specialisation
Completion of bachelor thesis
Contact & Service
You have questions?
Contact us


text:
Over 10 Million Orders Shipped
English ▼
Currency ▼
Join OurCoupon List
Win a $250.00 Shopping Spree
Enter Now
Great cologne! its a classic thats good for any occasion..Love it!!
Written by Customer on April 20, 2014
Was this review helpful?
Be the first to provide feedback on this review.


text:
Thursday, 25 Feb 2010 06:44 AM
U.S. Marines and Afghan troops slogged through bomb-laden fields Thursday to clear the last pockets of insurgents from the southern Taliban haven of Marjah, while vegetable markets resumed business in other parts of town.
The Marines' progress was slowed by difficult terrain with no roads, few tracks and many hidden mines, but there was no gunfire by mid-morning. Several armored vehicles fell into irrigation canals while others were damaged by roadside bombs.
The last couple days have been relatively calm, with limited engagement by insurgents, as troops secured areas they've already taken and moved into position to tackle these final insurgents holdouts.
NATO said in a statement that while there are still occasional gunfights in town, the number of residents returning has increased in recent days and shops have opened to sell telephones and computers alongside fresh fruits and vegetables.
The mass assault in southern Helmand province, with 15,000 NATO and Afghan troops, is the largest military operation in Afghanistan since the ouster of the Taliban regime in 2001. NATO's strategy is to rout Taliban militants from a town that had served as a logistical base and drug trafficking hub, restore the Afghan government presence, and rush in public services in a bid to win over the confidence of local communities.
In a sign that NATO's push to win over the population may be gaining traction, bomb tips from residents have increased by nearly 50 percent, the alliance said.
As the offensive closes in on its second week, 13 NATO troops have been killed and three Afghan soldiers, according to military officials. Eighty NATO troops have been wounded, along with eight Afghans.
At least 28 civilians have been killed, including 13 children, according to the Afghan human rights commission.
The civilian toll has raised fears that NATO may lose the support of the population even as it drives out the Taliban. The deaths come even though NATO has said its priority is protecting the civilian population and has adopted strict rules to prevent casualties.
A spokesman for the Afghan Defense Ministry said that both the Afghan government and NATO troops realized they had to be realistic and accept that there would be civilian deaths.
"Preventing civilian casualties is our biggest challenge," Gen. Mohammad Zahir Azimi told reporters in Kabul. "You should not expect zero casualties, either from our side or from the international forces. That will only happen when the fighting is over. And we are all trying to make that happen.
NATO spokesman Brig. Gen. Eric Tremblay, speaking alongside Azimi, urged Afghans to recognize that international troops are putting themselves in greater danger in order to try to protect civilians.
"We are going beyond the laws of armed conflict by increasing our risk," Tremblay said.
A day earlier, more than 100 Marines and their Afghan counterparts began their push into a northern Marjah neighborhood they say is the last significant pocket of Taliban insurgents in town.
About 100 fighters are believed to have regrouped into the 28-square-mile (45-square-kilometer) area known as Kareze, according to commanders with the 3rd Battalion, 6th Marines Regiment.
In the past week, Marines have come under heavy fire each time they skirted the zone, and several well-trained snipers have been spotted in the densely protected area, with bunkers and sniper positions.
But instead of the stiff resistance they expected, the troops did not hear a single shot as they moved into the area.
Some Afghans who were fleeing the neighborhood told them that Taliban militants had told them to get out because they were planning a large attack. But others who stayed in their homes said they hadn't seen a militant in days.
A Marine spokesman said Wednesday was the first day there were no gunbattles inside Marjah, though the previous two days had also been relatively calm.
"It's promising," Capt. Abe Sipe said. But he added that fighting will likely spike as the troops move into final pockets of fighters.
"There's still a fair bit of clearing," Sipe said. "We by no means think that this is over."
Associated Press writer Amir Shah contributed to this report from Kabul.
© Copyright 2015 The Associated Press. All rights reserved. This material may not be published, broadcast, rewritten or redistributed.
Monday, 02 Mar 2015 15:55 PM
The Anti-Defamation League announced Monday that director Brett Ratner and producer Ben Silverman will be honored at the . . .
Monday, 02 Mar 2015 15:26 PM
The Utah Senate this week is scheduled to debate legislation permitting patients with some debilitating conditions to be . . .
Monday, 02 Mar 2015 14:21 PM
Dallas Mavericks owner and "Shark Tank" host Mark Cuban and conservative political commentator Ann Coulter have been cas . . .
And here we have Obama showing he would protect Iran over Israel...
Only one way to fix it. Give the democrats an ultimatum. One, use the Cobra...
All of you who voted in these Dems, remember this day, and the regulations that...
The beginning of the end of free speech and voicing our opinions on blog sites...
Of course they are on a collision course. Bibi loves his country and is a...
Newsmax, Moneynews, Newsmax Health, and Independent. American. are registered trademarks of Newsmax Media, Inc. Newsmax TV, and Newsmax World are trademarks of Newsmax Media, Inc.


text:
Learn more about the five boroughs that make up New York City with our complete guide.
Discover what to do, where to stay and what to see in New York City with our planning tool.
NYC is the place for inquisitive minds looking for new things to see, hear, taste and learn.
Enjoy Shakespeare in the Park, Fourth of July fireworks, the US Open and more.
Download your free copy or order a guide online today.
Wireless Internet is available at locations throughout NYC—including many parks and libraries.
Get tips, maps and everything else you'll need during your stay.
These NYC-centric mobile apps put the City at your fingertips.
Three-course prix-fixe dining at NYC's hottest restaurants.
2-for-1 tickets to Off-Broadway's most fascinating shows.
Stay in New York City and save with these offers.
New York City is made up of five boroughs: the Bronx, Brooklyn, Manhattan, Queens and Staten Island. Each one has enough attractions—and enough personality—to be a city all its own. Learn more about them with this guide.
The former Luhring Augustine director Michele Maccarone, an outspoken dealer and activist for artists, holds court in this 8,000-square-foot space, where she dedicates herself to representing artists such as Nate Lowman, Corey McCorkle and Christian Jankowski.


text:
Toshiba IK-DF03A surveillance camera
Linear DXS-65 emergency alarm transmitter
Camera Lowering Device from Metrolux
Assa Abloyd Door Security Systems Beacon
The MIC Series from Bosch Security Systems
B.I.G. Enterprises' Image Icon guard booth
Constructed next to Eero Saarinen's historic TWA terminal, and respectful of it, the new JetBlue Terminal 5 is as operational as it is elegant.
More than a decade in the making, the new U.S. Embassy in Berlin has been drawing heavy fire from German critics. Is their animosity deserved?
Check out these stories, which take a close look at innovative projects that are using wood in creative ways. Proudly sponsored by reThink Wood.


text:
US 7279410 B1 Abstract A method for forming an inlaid interconnect structure for ICs. The method includes forming an etch stop layer, opening a portion of the etch stop layer on an IC die, forming a dielectric layer and cap layer over the etch stop layer, forming a photoresist pattern, and etching the cap and dielectric to form an opening that is then filled with a conductive material (e.g., metal). The method may further include forming a barrier layer within the opening of the etch stop layer. According to another aspect of the invention, a first and second etch stop layer are formed over the substrate and the second etch stop layer is patterned to define two regions, wherein a second region having the first and second etch stop layers experiences a faster etch rate than the first region. The dielectric layer and cap layers are then deposited over both regions and two via or trench openings are formed therethrough in the regions, respectively. The first and second etch stop layers protect the underlying substrate from experiencing punchthrough during the via or trench formation. The etch stop layers are then removed in the openings and a conductive material is formed therein.
Claims(12) 1. A method for forming an integrated circuit structure comprising:
forming a first etch stop layer over said integrated circuit structure associated with a substrate;
forming a second etch stop layer on the first etch stop layer;
patterning a portion of the second etch stop layer, thereby defining a first region having the first etch stop layer and a second region having the second etch stop layer overlying the first etch stop layer, and wherein the second region is a region that experiences etching at a rate that is greater than the first region, wherein the second etch stop layer is not situated in the first region;
forming a layer of dielectric material over the first and second regions;
forming a cap layer over the layer of dielectric material;
patterning the cap layer and the layer of dielectric material to define two via or trench openings, wherein a first via or trench opening is in the first region and a second via or trench opening is in the second region, and both the first and second via or trench openings extend down to the first etch stop layer;
removing the first etch stop layer with the first and second via or trench openings; and
filling the two via or trench openings with a conductive material,
wherein the cap layer has an optimized thickness.
2. The method of
forming a photoresist over the second etch stop layer;
patterning the photoresist to define the first region;
etching the first region in the second etch stop layer using the patterned photoresist as a mask; and
removing the patterned photoresist.
3. The method of
forming a photoresist over the cap layer;
patterning the photoresist to form two openings therethrough, the openings in the photoresist corresponding to the first region and the second region, respectively;
etching the cap layer and the layer of dielectric material using the patterned photoresist as a mask; and
removing the patterned photoresist.
4. The method of
5. The method of
6. The method of
7. The method of
8. The method of
9. The method of
10. A method for forming an integrated circuit structure, comprising:
forming an etch stop layer over a substrate;
forming an opening through the etch stop layer;
forming a barrier layer within the opening of the etch stop layer;
forming a layer of dielectric material over the etch stop layer and the opening formed therethrough;
forming a cap layer over the layer of dielectric material;
patterning the cap layer and the layer of dielectric material to define a via or trench therethrough, the via or trench corresponding generally to the opening in the etch stop layer;
depositing a conductive material over the cap layer and in the via or trench such that the conductive material fills the via or trench; and
removing the conductive material that is not situated in the via or trench;
wherein the cap layer has an optimized thickness.
11. The method of
12. The method of
Description This invention relates generally to semiconductor processing, and more particularly to a method and process for single inlaid structures for integrated circuit interconnections. Integrated circuits (ICs) are formed on semiconductor substrates using a number of different processing steps to create transistor and interconnection elements. In order to electrically connect transistor terminals associated with the semiconductor substrate, conductive (e.g., metal) vias (vertical channels) and interconnections (interconnects) are formed in dielectric (electrically insulating) materials as part of the integrated circuit. The vias and interconnects couple electrical signals and power between transistors, internal circuits of the IC, and circuits external to the IC. Inlaid (�damascene�) interconnect processes for semiconductor devices are replacing conventional �blanket� metal deposition and etch processes. Traditionally, metal films have been deposited and patterned using photolithography techniques to form patterned metal interconnects overlying a semiconductor substrate. As interconnect geometry sizes decrease and as conductive lines are formed closer and closer together, it becomes increasingly difficult to accurately pattern the conductive lines and form the conductive interconnects using the traditional blanket deposition and patterning processes. Consequently, inlaid metal interconnect processes have been developed to overcome some of these problems. In conventional inlaid metal interconnect processing, an interlayer dielectric (ILD) layer and a cap layer (or �hard mask� to protect the ILD layer) are deposited on an etch stop layer (ESL) overlying the semiconductor substrate. A photoresist mask is then patterned on the ILD layer and cap layers and etched to form vias or openings in the ILD layer and cap layers. The ESL formed below the ILD layer serves to stop the etch. The photoresist is then removed and another etch is performed to remove the ESL within the via prior to filling the via with metal. A blanket layer of metal, for example, copper, is then deposited across the surface to completely fill the vias. The blanket metal layer is then polished back from the surface of the ILD layer and cap layers, for example by chemical mechanical polishing (CMP), leaving the metal interconnects only in the via areas and isolated by the ILD layers. Removing the ESL layer from the vias prior to filling them with metal with traditional inlaid etch processing creates several deleterious effects. In particular, when the ESL layer is etched from the vias, the cap layer is also etched to some degree, causing the corners of the cap layer to become rounded. The cap layer must therefore be thick enough to survive the ESL etch and protect the underlying ILD layer. Utilizing a thick cap layer, however, comes at the expense of the dielectric constant (�k�) of the �stack� (i.e., the layers of the ESL, ILD, and cap). As interconnect geometries become denser, it is important that the overall stack is composed of materials with low dielectric constants to prevent capacitance coupling and �cross talk� between interconnect patterns. Because the thickness of the cap layer depends, in part, on surviving the ESL etch, the cap layer may not be optimized to have the lowest stack dielectric constant. Additionally, after the vias are filled with the metal layer, the surface must be polished back to the cap layer in order to remove the metal from the surface and isolate the interconnect patterns. Corner rounding of the cap layer may require additional polishing to insure isolation of the interconnect patterns. The additional polishing may damage the underlying ILD layers. As interconnect patterns become more dense, corner rounding of the cap layer leads to increasingly thick cap layers to compensate for the additional polishing needed to isolate the interconnect features. Furthermore, this increased cap thickness adds additional complications for patterning since advanced lithography processing is moving toward use of thinner resists. As a result, photoresist consumption becomes a greater concern. This issue is especially exacerbated by the need to transition from 248 nm photoresist to 193 nm photoresist, which is inherently less robust to the etch process. Further, the ESL etch may cause ILD attack and modification of the ILD sidewalls. This attack on the ILD layer sidewalls may lead to a higher dielectric constant and decreased performance of the interconnect patterns. Also, under-layer sputtering of copper on the ILD layer sidewalls may increase electromigration and leakage of copper within the structure. A further problem of conventional inlaid metal processing is the feature dependent loading effect during the cap and ILD etches. Certain areas, such as near the die seal or lithography alignment marks can etch significantly faster than in other areas. This difference in etch rate can lead to ESL breakthrough during the ILD etch, resulting in a build-up of charge in the areas that etch more quickly. This could result in conductor charging and explosion. Each of these above mentioned concerns are also applicable to trench patterning in inlaid processing. Therefore, a method and process for single inlaid processing is desired that allows for optimal thickness of the cap material to minimize the dielectric constant of the stack, requiring less polishing to isolate features and allows for the extended use of single layer photoresists. It is also desired to provide a method that minimizes ILD attack and modification, and prevents under-layer copper sputtering on the ILD sidewalls to improve the dielectric constant and electromigration performance of the stack. Further, it is desired to optimize the ESL thickness for electromigration performance, decreased stack dielectric constant, and prevent possible etch through of the ESL layer during the ILD etch. The following presents a simplified summary of the invention in order to provide a basic understanding of some aspects of the invention. This summary is not an extensive overview of the invention. It is intended neither to identify key or critical elements of the invention nor to delineate the scope of the invention. Its sole purpose is to present some concepts of the invention in a simplified form as a prelude to the more detailed description that is presented later. According to one embodiment of the present invention, a method is provided for forming a single inlaid structure for an IC interconnect. The method includes forming an etch stop layer over an integrated circuit substrate structure, forming an opening in a portion of the etch stop layer, and forming a layer of dielectric material and cap material over the etch stop layer and the opening formed in the etch stop layer. The method further includes forming a photoresist pattern over the cap layer, etching the cap layer and the layer of dielectric material to form a via or trench using the photoresist pattern, and filling the via or trench with a conductive material, for example, metal. According to another aspect of the present invention, the methodology includes forming openings in the dielectric and cap materials that are aligned substantially with the etch stop layer openings, and filling the opening with a conductive material, for example, metal. The method for forming the inlaid structure may further include forming a barrier layer within the opening of the etch stop layer prior to forming the layer of dielectric material over the etch stop layer, and removing a portion of the barrier layer that does not fill the exposed etch stop layer opening. The barrier layer comprises, for example, tantalum, and the dielectric material comprises SiLK or another material with a dielectric constant of approximately 3.0 or less, for example. The cap layer has a thickness of, for example, less than about 2000 A. The photoresist mask used to etch the cap layer and the interlevel dielectric (ILD) layer is, in one example, a single layer, and the pattern of the photoresist is, in one example, aligned with openings of the etch stop layer. The conductive material filling the via or trench comprises, for example, copper. According to another aspect of the present invention, a method is provided for forming an integrated circuit interconnect structure. The method includes forming a first etch stop layer on an integrated circuit structure, forming a second etch stop layer (ESL) on the first etch stop layer, patterning the second ESL so that it remains in the areas on the die that due to the feature dependent loading effect, for example, etch quickly. A layer of dielectric material is then formed over the first ESL and the second patterned ESL, and a cap layer is formed over the layer of dielectric material. A photoresist mask is then formed over the cap layer, and the cap, dielectric material, and ESLs are etched using the photoresist mask to form a via. The via is then filled with a conductive material. The method may further include etching the first and second etch stop layers from the pattern where the first and second etch stop layers may be the same or different materials. The first etch stop layer may have a lower dielectric constant than the second etch stop layer, and the thickness of the first etch stop layer may further be based upon the electromigration performance of the first etch stop layer material. All examples of the present invention highlighted herein are applicable to both via and trench damascene patterning, and both such processes are contemplated as falling within the scope of the present invention. To the accomplishment of the foregoing and related ends, the invention comprises the features hereinafter fully described and particularly pointed out in the claims. The following description and the annexed drawings set forth in detail certain illustrative embodiments of the invention. These embodiments are indicative, however, of but a few of the various ways in which the principles of the invention may be employed. Other objects, advantages and novel features of the invention will become apparent from the following detailed description of the invention when considered in conjunction with the drawings. In the present disclosure, like objects that appear in more than one figure are provided with like reference numerals. In accordance with the present invention, a method is provided for forming a single inlaid structure. In one aspect of the present invention, the method reduces corner rounding and ILD layer attack within the via or trench during an ESL etch. The above advantage is achieved by opening the etch stop layer prior to the deposition of the ILD and cap layers and the formation of the via or trench patterns. Further, the opening of the ESL is filled with a barrier layer in another aspect of the present invention to improve electromigration and reduce the need for precise alignment of the ESL and via or trench patterns. Additional aspects of the present invention reduce the probability of etching through the ESL and allow for an improved dielectric constant of the stack. In one aspect, the reduced probability of ESL etch-through is achieved by using a first and second ESL. Specifically, the advantage is achieved by patterning the second ESL to remain only in areas where the etch occurs more quickly. This aspect of the invention allows for protection of the fast etching areas without the need to increase the ESL thickness in all areas of the die. Further, the dielectric constant of the stack may be improved by having the option to choose the first ESL material and thickness based on its dielectric constant and electromigration performance and the second ESL based on its ability to stop the etch. Further, use of a second ESL will not impact the dielectric constant of the resultant stack since it is removed during the etch process. Examples of the invention described herein are for exemplary purposes only and are not intended to be limiting. The present method provides benefits over conventional single inlaid methods. As will be appreciated in the discussion to follow, the cap layer, or hard mask, may be thinned to improve the overall dielectric constant of the stack as well as minimize any over-polishing necessary to isolate features due to corner rounding when opening the etch stop layer. The ILD sidewalls undergo less under-layer metal sputtering, and such reduction may improve electromigration performance and minimize modification of the low dielectric constant of the ILD layer. Further, a thin single layer of photoresist may be used to etch the thinned cap layer and ILD layers resulting in extended use of current single resist layer patterning technology. FIGS. 1 and 2A-2E illustrate an exemplary method 100 for a single inlaid structure according to one aspect of the present invention. While the exemplary method is illustrated and described herein as a series of acts or events, it will be appreciated that the present invention is not limited by the illustrated ordering of such acts or events, as some steps may occur in different orders and/or concurrently with other steps apart from that shown and described herein, in accordance with the invention. In addition, not all illustrated steps may be required to implement a methodology in accordance with the present invention. Moreover, it will be appreciated that the method may be implemented in association with the apparatus and systems illustrated and described herein as well as in association with other systems not illustrated. Referring initially to The method 100 of In Next, a conventional interlayer dielectric (ILD) layer 208 and a conventional cap layer 210 are deposited over the ESL 204 and the substrate 202 in The cap layer 210 can be formed thinner than with conventional inlaid structures in the present invention because the cap layer does not have to survive the stop layer etch to create the opening 207 in the ESL 204 because the ESL has already been patterned. For example, conventional cap layers have a thickness of about 2000-3000 Angstroms, however, the present invention provides for a cap thickness in the range of about 700-2000 Angstroms, thereby significantly easing the etch selectively requirement to photoresist. The cap layer 210 comprises, for example, silicon dioxide (SiO2), silicon oxynitride (SiON), or silicon carbide (SiC), but is not limited to these materials. The cap layer 210 may also comprise two or more layers, for example, an oxide layer over a silicon oxynitride layer. A thin cap layer 210 is desirable because the cap layer material generally has a higher dielectric constant than the ILD layer 208. In conventional processes, the cap layer is rounded at the corners of the via or trench by the eventual ESL etch. The corner rounding effect of the cap requires more polishing to remove the metal layer and isolate the interconnect features. The corner rounding further requires the cap layer 210 to be formed of sufficient thickness to survive the ESL etch. Therefore, the method and process of the present invention allows one to optimize the cap layer thickness, material, etc. for low dielectric constant values that is otherwise compromised because of the corner rounding caused by the ESL etch. A further advantage of the thinner capping stack is a less stringent photoresist etch selectivity requirement. This is especially advantageous as resist thickness and the resist resistance to the etch process is reduced (e.g., transitioning to 193 nm photoresist from 248 nm photoresist). A second photoresist 216 is then formed and patterned in a conventional manner over the cap layer 210 in In Finally, as with the conventional damascene methods, a layer of conductive material 220 is then deposited over the patterned dielectric layer 208 and cap layer 210 and into the vias or trenches, filling the structures. A barrier layer and seed layer (not shown) may also be deposited over the structure prior to the conductive material 220 deposition. Any conductive material 220 on the surface of the cap layer and not in the vias or trenches is then removed, leaving the desired pattern of interconnects. Conductive material 220 is removed, for example, by chemical mechanical polishing (CMP) or other conventional methods. Removing conductive material 220 from the surface isolates the vias or trenches. Conductive material 220 is, for example, copper or other suitable conductive material known in the art. FIGS. 3 and 4A-4G illustrate an exemplary method for a single inlaid structure according to another aspect of the present invention. This example, in addition to the advantages of the first example described above, confines sputtered under-layer material (e.g., copper) between two barrier materials to reduce electromigration and leakage. Further, this embodiment improves stack performance (i.e., a lower stack dielectric constant) because the ESL thickness of this example does not depend upon the etch stop capability of the ESL. Turning to In The ILD layer 408 and the cap layer 410 are then deposited in A cap and ILD etch are then performed in Finally, as described with respect to FIGS. 5 and 6A-6F illustrate an exemplary method for a single inlaid structure according to another embodiment of the present invention. In some embodiments the ESL material is optimized for low dielectric constant values and not limited primarily to etching considerations. In some embodiments a first and second ESL are formed, the first ESL optimized for the stack dielectric constant, the second ESL patterned for etch performance. The second ESL can be deposited and patterned only in critical areas, where the etch rate is fast or the etch selectivity is low and the etch may etch through the ESL. For example, near the die seal or die lithography alignment marks, the ESL can etch faster than in other areas. The portions that etch faster may cause a build-up of electrical charge that in addition to the etch through problem may cause conductor charging and a possible explosion. Therefore, one may want to increase the thickness of the ESL in areas where the etch performs more rapidly. In The patterned resist is removed at 540, and an ILD and cap layer are formed over the first and second ESLs in succession at 550. Another photoresist is then formed and patterned over the cap layer at 560 to define areas where a trench or via is to be formed. The cap layer and ILD are then patterned at 565 using the patterned resist as a mask. In areas where such an etch tends to occur quickly, both the second and first ESL reside thereat, thereby preventing the etch to extend through the first ESL and thus preventing an undesirable punchthrough condition. In areas where the etch occurs less quickly, the first ESL serves to stop the etch. Thus in both areas, the trench or via etch stops at least on a portion of the first ESL. The patterned resist is then removed, and the remaining ESL is removed and the trench or via is formed at 570, followed by a filling of the trench or via with a conductive material at 580. In The ESL1 604 and the ESL2 605 may be similar or dissimilar materials with similar or dissimilar etch characteristics. In one example, the ESLs 604/605 may be deposited with greater thickness (e.g., by patterning a second layer) in those areas where the etch performs more quickly. Using multiple or varying thickness ESL offers several advantages over a single uniform thickness ESL. In one example, two different ESL materials with different etch selectivities can be used to allow for accurately stopping an etch at the ESL1 604 when patterning the ESL2 605. Further, in another example, the ESL1 604 has a lower dielectric constant than the ESL2 605, reducing the overall dielectric constant of the stack because only the ESL1 604 will ultimately contribute to the final dielectric constant of the stack and the ESL2 605 will be removed, as will be further appreciated below. The ILD layer 608 and the cap layer 610 are then deposited over the ESL1 604 and the ESL2 605 in The cap layer 610 and the ILD layer 608 are then etched in Finally, in Although the invention has been shown and described with respect to one or more implementations, equivalent alterations and modifications will occur to others skilled in the art upon the reading and understanding of this specification and the annexed drawings. In particular regard to the various functions performed by the above described components (assemblies, devices, circuits, etc.), the terms (including a reference to a �means�) used to describe such components are intended to correspond, unless otherwise indicated, to any component which performs the specified function of the described component (i.e., that is functionally equivalent), even though not structurally equivalent to the disclosed structure which performs the function in the herein illustrated exemplary implementations of the invention. In addition, while a particular feature of the invention may have been disclosed with respect to only one of several implementations, such feature may be combined with one or more other features of the other implementations as may be desired and advantageous for any given or particular application. Furthermore, to the extent that the terms �includes�, �having�, �has�, �with�, or variants thereof are used in either the detailed description or the claims, such terms are intended to be inclusive in a manner similar to the term �comprising.� Patent Citations
Non-Patent Citations
Legal Events
Rotate |


text: We had a wonderful evening watching the Reno Rodeo. The little kids that rode the sheep bare back were hysterical...and the gals that did the barrel racing was lots of fun. The bronc riders are most amazing and from our seats (bought at the event) we saw everything. Be careful where you sit as the early evening sun and wind... More


text:
Find a copy in the library
Finding libraries that hold this item...
Genre/Form: | Incunabula Quotations, maxims, etc Early works to 1800 |
Document Type: | Book |
All Authors / Contributors: |
Bede, the Venerable Saint; Peter Dannhauser; Sebald Schreyer; Peter Wagner; Aristotle.; Marcus Tullius Cicero; Otto Vollbehr Collection (Library of Congress) |
OCLC Number: | 48163801 |
Notes: | The work named in the title, a florilegium in one alphabet, is wrongly attributed in its introductory paragraph to Venerable Bede. It has brief commentaries after each of the ca. 1100 quotations (translated into Latin) and is followed (leaves kij-n8) by a set of longer selections from Cicero, with an afterword by Petrus Tanhauser addressed to his patron Sebaldus Schreier. The set of quotations from Cicero has the caption title: Marci Tullij Ciceronis ciuis Romani clarissimi ac eloquentie genitoris facundissimi auctoritates p[ro] virtutu[m] capessendaru[m] vberiori lege. Publisher statement from colophon; imprint date from Goff. Signatures: a-m⁸ n¹⁰. Woodcut ill. on t.p.; initial A on aij. Capital spaces, most with guide letters. The afterword is dated (leaf n9): 1490. LC copy bound in wooden boards with blind-stamped leather spine; metal hinges (clasps wanting); fragment of ms. bound in. Has contemporary ms. annotations. Duplicate copies of conjugate leaves d3.6 and d4.5 bound in. |
Description: | [212] p. (last leaf blank) ; 22 cm. (4to) |
Other Titles: | Repertorium sive tabula generalis auctoritatum Aristotelis cum commento. |
User-contributed reviews
Add a review and share your thoughts with other readers.
Be the first.
Add a review and share your thoughts with other readers.
Be the first.
Add tags for "Repertorium siue tabula generalis auctoritatum Arestotelis cu[m] commento : per modum alphabeti et philosophorum.".
Be the first.
Similar Items
Related Subjects:(2)
User lists with this item (1)
- phil-1400-1500(463 items)
by sophir2 updated 2012-02-26


text:
A new hospital springs up around Navy Med neighborhoods in Bethesda
Merger with Walter Reed Army Medical Center brings buildings closer to community
Click here to see the video
This story was corrected on March 30, 2011. An explanation follows the story.
By 5 in the afternoon, a shadow hangs over Stan and Ethel Schiff's brick home along East Parkhill Drive behind Bethesda's naval hospital. For almost 40 years the Schiffs have been able to look out at a grove of tall grasses and trees, with Navy buildings in the distance, and the backyard where their daughter was married fills with sunlight and blossoming azaleas in the spring.
"It was like an oasis back there," said Stan Schiff.
The Schiffs are among those who have lived in their Bethesda neighborhood for decades, almost as long as the military campus, which moved into town in 1942, and have watched the area change more cars, larger houses.
The campus has grown from fewer than a dozen medical and research buildings planned by the hospital's visionary, President Franklin Delano Roosevelt, to an 83-building gated city, and is now adding more to accommodate a consolidation this September between the National Naval Medical Center and Walter Reed Army Medical Center.
The effects of this development will span far beyond the campus' gates neighbors' views now includes a cityscape towering over their homes, some residential streets serve as a drop-off point for employees and already-packed roads are expected to become even more jammed and military leadership has broached the change with an unprecedented outreach to those communities.
Bethesda's neighbors say they are proud of Navy Med's work and are honored to live near the medical center known as the president's hospital.
But despite the Navy's outreach, some neighbors feel that as the campus and its renown have grown, their voices are becoming smaller and that the government agencies involved did not take a large enough role in shaping the merger's effect on the community.
"You wouldn't be able to change their mind about doing the consolidation, but there should have been more consideration for how," said Ethel Schiff. "There was really no great consideration of the neighborhood at all," she said.
The good old days
In September, Walter Reed National Military Medical Center will open, bringing an additional 2,500 employees and a total of 1 million visitors to the Bethesda campus, an increase from the current 8,000 employees and half a million annual visitors. Construction is under way for additional medical buildings, parking garages and other services; outside the gates, county and state transportation staff has plans for $165 million in road, Metro, sidewalk and bike path projects to ease the anticipated traffic problems.
As the military base prepares for one of its largest changes since opening in 1942, people remember a quieter time in the neighborhoods near the campus that are now home to thousands of families.
When Susan and Jack Lass moved to Chestnut Street in East Bethesda in 1975, the houses were of modest size, the streets were smooth and the neighborhood children made the rounds after a snowstorm to offer shoveling services. There were so many trees, driving down the road was like passing through a tunnel, said Jack Lass, 72.
The Lass' home and most others in their neighborhood were built in the early 1950s, after World War II, and now house a mix of federal employees who work at Navy Med and the National Institutes of Health, lawyers and political types who take advantage of the neighborhood's proximity to Metro stations to commute to the District.
Much of what the Lasses remember from their first years in their home has changed, but a few key aspects of the neighborhood that attracted them have stayed the same.
"It's not one of those neighborhoods where people say, oh, I've lived here for 10 years and I don't know my neighbor," said Susan Lass, 67.
The sense of community that the neighborhoods provide in an increasingly crowded area, south of the Beltway, north of downtown Bethesda and bisected by two federal institutions, Navy Med and NIH, is among the top reasons many residents gave for what attracted them and what keeps them there.
In Parkview, a neighborhood of about 120 homes sandwiched between the military campus and Cedar Lane, a group of women meet regularly at a Mahjong club, a Chinese game of matching tiles; a Coyote Club for men has been revived; households with children have their pick of sitters from a babysitting co-op.
"It's become so fast-paced that people have to work at keeping communities," said Bonnie Fedchock, 48, who has lived in Parkview with her husband, Craig, for 12 years. "This neighborhood has been able to do that."
While the bonds within Bethesda's neighborhoods remain strong, some residents feel their connection to their military neighbors has weakened.
Before heightened national security resulted in a gated fence and secured entry to the campus after Sept. 11, the campus' grassy expanses and even it's McDonald's restaurant were open to neighbors.
"It went from being like a college campus to these armed guards really, it felt like a war zone," said Craig Fedchock, 56.
The couple used to walk over to the hospital to let their golden retriever mix a chance to chase the geese that still populate the campus.
Not only are residents spending less time on campus, the campus' business day is spilling out into the neighborhoods.
At the campus' afternoon shift change, a line of cars forms in front of Felicity McGrath's home, where Glenbrook Parkway connects to Jones Bridge Road, across from a campus gate. The number of parking spaces on campus is expected to decline from one per every two employees to one space per four employees. Already, a growing number of employees seem to be getting rides to and from work, and without a place to pull off the road at the gate entrance, those rides queue on the closest residential street.
The Navy denied a request from the East Bethesda Citizens Association for a drop-off area along the Navy's side of Jones Bridge Road, said Ilaya Hopkins, who represents the neighborhood on the BRAC Implementation Committee. Hopkins said the association is hopeful that when construction is complete, access to the campus will improve and fewer cars will queue in on the neighborhood's streets.
A new approach to
being neighborly
The 2005 Base Realignment and Closure, the fifth federal mandate since 1988, will reorganize or consolidate 800 military facilities, including Walter Reed and Navy Med. Bethesda Naval Support Activity officials said they recognize that the structural changes needed at Navy Med to accommodate Walter Reed and the amount of traffic the new hospital will draw to the area will have a significant impact on the neighboring communities.
In response, leadership has expanded its outreach to the community, resulting in an unprecedented level of communication between the military and its neighbors.
"Part of it is it's the right thing to do if we're not proactive we're going to be reactive," said Malanoski. "We want to be good neighbors. It's our neighborhood, too."
During the last major construction on campus, when the medical buildings were modernized in the 1980s, there was no concerted effort to communicate with neighbors because the scope of the project was contained on campus, said spokeswoman Sandy Dean.
Now, Naval Support sends representatives to monthly meetings of the BRAC Implementation Committee, a group for neighborhood and government stake holders. They speak at neighborhood meetings when asked and have an information line for residents to call any hour of the day or night.
Five neighborhood representatives were invited earlier this month on campus for an intimate information session about the status of on-campus projects.
Neighborhood representatives said they are impressed with leadership's efforts to keep their communities abreast of BRAC progress and to seek out their input.
"We've bridged a gap that was there they're really engaging and being very positive," said Deborah Michaels, who attended the on-campus meeting as president of a Glenbrook Village homeowners association, which is located at the corner of Rockville Pike and Jones Bridge Road.
Michaels said the officials that met with the group of neighborhood leaders expressed interest in maintaining an ongoing conversation. Naval Support plans to hold similar meetings about once a quarter and when important information arises, Dean said.
"I think it's imperative we are transparent in what we're doing and I think we have been," said Malanoski of the BRAC. "The communities have not always been happy, but I think they have been understanding."
McGrath is among those understanding neighbors. Even though efforts to get a formal drop-off area along the campus' boundary have failed, she said she thinks the Navy has done its part to listen.
"They did make a good effort to be the good neighbor," said McGrath. "They didn't have to do that, but they did."
Malanoski also made trips to Parkview, to hear concerns from the neighbors, including the Schiffs, whose quality of life will be most affected by the hospital expansion. Parkview is one of two neighborhoods that share a land boundary with the hospital and the new buildings are visible overtop the houses along East Parkview. Neighbors say construction starts early in the morning and floodlights at the sites illuminate the neighborhood through the night.
Stan Schiff said he believes the Navy officer who came to talk about the barracks and administrative office going up behind his house listened to his suggestions, but outside his window is one of six new buildings on campus called for by BRAC.
"You can only judge by what you see out the window," Schiff said.
A community of communities
Many neighbors are proud to live next to Navy Med it's a world-class hospital with a mission that few could criticize but when the hospital was federally mandated to merge with Walter Reed, with no money set aside by Congress for community improvements to accommodate thousands of more people, residents said they felt let down, forgotten about.
"We have tried to find a champion for this since the onset someone to step up, take it on, own it," Michaels said. "No one wants it."
When residents saw a lapse in government leadership, they began to speak for themselves by forming the Coalition of Military Medical Center Neighbors. The group represents about 10,000 people who live, work and attend school in the neighborhoods surrounding the military campus. The coalition formed in 2007, when community members who stay abreast of changes to the area noted the need for people living near the campus to work toward common goals. They wanted advocate for what was best for the community as a whole, rather than leaving each neighborhood association to fight separate battles, said Hopkins, a founding member of the group.
"There's been more leadership from the community and more proactive problem solving from this group of communities than there has been from elected officials, that's for sure," Hopkins said.
The group has played a role in educating the community about traffic problems, pushing for sidewalk and bikeway improvements and influencing the design of a Metro crossing project to include a pedestrian walkway under Rockville Pike and elevators connecting the military hospital's side of the sidewalk to the Medical Center Metro.
The coalition has also served as a unifying force among the neighborhoods.
"The coalition of neighbors is like something I've never seen before," said Ed Krauze, president of the Parkview Citizens Association. Not only are the people who live in a neighborhood in close contact with their next-door neighbors, each neighborhood is now in tune with the next cluster of homes down the road, forming what Krauze described as a community of communities.
"It has made the conversation, I believe, better," Krauze said.
Coalition members believe BRAC and the formation of the coalition may mark a change in community involvement. With its newfound voice and network of members, the group could take on other issues that affect multiple neighborhoods.
For now, the focus is BRAC and fighting for a way to make the hospital provide for service men and women in need while maintaining roads that are manageable to drive. It is a goal that many feel is still far off, despite the hospital's approaching opening day.
"We're supposed to be creating a world-class facility to help people and they're doing that inside the fence," said Michaels. "Outside, we're creating a nightmare."
Correction: This story was corrected to make clear that a certain building on the campus of the National Naval Medical Center does not have a fitness center.


text:
Home | History | Welcome | Weather | Contacts | Moving to Pittsfield | Directions & Maps | State Profile
Photos of Pittsfield
Town Government:
Board of Selectmen
Beautification Committee
Budget Committee
Cable Advisory Committee
Conservation Commission
Drug And Alcohol Coalition
Economic Development
Emergency Management
Housing Standards Agency
Josiah Carpenter Library Board of Trustees
Master Plan Committee
Parks & Recreation
Planning Board
School Board
Trustees - Trust Funds
Website Committee
Zoning Board
Volunteer Application
Town Departments:
Fire Department
Police Department
Highway Department
Building Inspector
Josiah Carpenter Library
Selectmen's Office
Town Administrator
Town Clerk/Tax Collector
Solid Waste Facility
Waste Water Treatment
Employment Opportunities
Forms and Permits
Town Documents
School District SAU#51
Elementary School Website
Middle High School Website
Service Organizations:
Chamber of Commerce
S. Pittsfield Community Ctr
Historical Society
Rotary Club
Lions Club
Senior Center
Pittsfield Players
Pittsfield Youth Workshop
Pittsfield Listens
Pittsfield Youth Baseball
List of Town Organizations
News & Announcements:
Community Center Activites
Public Notices
Community Bulletin Board
Town Calendar
Pittsfield NH Webcam
Public Information:
Pittsfield Business Links
Old Home Day
Parks & Trails
Pittsfield Photographs
Balloon Rally
Clayton Wood, Chairman
Channel 24 Editor / Website Editor / Blog Designer
Jen Goodwin, Secretary
Minutes Archive Editor
Matt Goodwin - Member
Website Designer/Editor - Graphic Design - Town Website Host
Matt Goodwin is the owner of Modern Concepts, he maintains his own sites: Suncook Valley.com, NH Tour Guide, NH Traffic Cams, Kancamagus Highway, Pet Sitters Directory, Home Improvement Directory and Cleaning Directory.
Bob Legg - Member
Photographer / Photo Section Editor
Bob Legg is a NH Photographer offering Wedding Photography and other photography services.
Bill Provencal - Alternate
Town Calendar Editor / Original Town Webmaster
Need Editing or Additions to the Town Site?
If you need something on the town site edited or added, please use the appropriate links below:
Website Editing, email@example.com
Town Calendar Updates, firstname.lastname@example.com
Meeting Minutes Submission, email@example.com
Channel 24 Posting, firstname.lastname@example.com
Photo Gallery,
The Pittsfield Website Committee was formed 2007. The first official meeting was held on August 13, 2007. (an interesting note: Due to a lack of meeting places at the Town Hall, the first several meetings were held in the basement of the Pittsfield Town Hall in the Food Pantry office until better accommodations were made).
The committee is responsible for upgrading and maintaining the Pittsfield town website and the Pittsfield public channel 24. If you have any requests for the Pittsfield website or channel 24, please contact the Pittsfield Website Committee for more information.
The Pittsfield Website Committee meets on the third Monday of every month from 7:00 pm - 9:00pm at the Town Hall (1st floor). Meeting dates are occasionally changed to organize website changes for events in town (see calendar on home page for meeting dates).
PWC News
May 1, 2008:
The Website Committee launches the new town website!
February 10, 2008:
Public Channel 24 has a new look (and sound). Be sure to check out channel 24 for up to date events and information!
Website Policies | View Meeting Minutes
Search Town Website
Town Hall Hours
85 Main St. Monday:11:00am - 7:00pm Tuesday-Friday:8:00am - 4:00pm
Pittsfield Towncrier
by Andi Riel
~ Public Notices ~
View More Notices on the Public Notice Board
Pittsfield Fire Department
Does your house have a number on it and is it clearly visible from the road? The Pittsfield Firefighters Association can help. More
Volunteers Needed for the Emergency Shelter
Food Pantry in Need of Donations!
Don't wait for a food drive! Bring in donations of any size. Click Here for a list of needed items!
Senior/Disabled Resident Call-in Program
Want the fire dept. to check on you daily? Click Here!
Neighborhood Watch
Call John Webber 435-7535. Click Here for more info and the Volunteer Citizens Patrol
Restaurant Owners
interested in providing kitchen scraps to local farmers for fertilizer or animal feed. Please contact. More
All Burning Requires a Permit!
Stop by the fire station or call 435-6807 for burning conditions and permits.
Click Here for more info
Also see Cable Channel 24! Send Request for Ch.24
~ Things to do ~
View More Events on The Community Bulletin Board
is hosting a Facilitating for Public Engagement Training on Monday Feb. 23rd. More
JC Library Program!
Check out what is happening at the library this month.
Weight Lost!
Tops is a not for profit take off lbs sensible program meeting are on Tues. More
Walk The Historical Trail!
Click Here for Guides/Maps
Site Map | Website Policies | Contact Website Committee | About This Site
Copyright © 2014 Town of Pittsfield, New Hampshire


text:
Website development software improves collaboration and speeds website generation
IBM® WebSphere® Portal Extend combines features of IBM WebSphere Portal Enable with enhanced collaboration features. This digital experience platform development software addresses the needs of today's enterprises to improve customer experiences, empower employees to react to marketplace dynamics, extend business assets and increase operational efficiencies.
WebSphere Portal Extend delivers core portal services that aggregate applications and content as role-based applications with personalization, security and Web 2.0 features. Now you can create dynamic portals with collaborative capabilities.
WebSphere Portal Extend website development software allows you to:
- Use portal content management tools that enable rapid website generation.
- Work with prebuilt article, blog and wiki content templates that are ready to use with your web portals.
- Share, view and organize documents within the portal community.
- Collaborate and exchange ideas on projects with individual and shared workspaces, social rendering services, and instant messaging.
- Create editable electronic forms to facilitate transactions and to view and store forms electronically.
Buy WebSphere Portal Extend
Create dynamic portals with collaborative capabilities
IBM Software Subscription and Support is included in the product price for the first year.
Download software online after purchase - no shipping costs.
- Web portal
- Digital Experience Patterns for WebSphere Portal Server and Web Content Manager
- IBM Content Accelerator
- IBM Forms Experience Builder
- IBM Forms Server
- IBM Mobile Portal Accelerator
- IBM Web Experience Factory
- WebSphere Portal Enable for z/OS
- WebSphere Portal Enable
- WebSphere Portal Express
- WebSphere Portal Extend
- WebSphere Portal Server
Not in Netherlands?
Koop online of verneem meer.
Wij staan klaar om u te helpen
Koop online of verneem meer.
- IBM e-mailen
- Prijsopgave aanvragen
Of bel ons op nummer: 020 513 2440020 513 2440
Prioriteitscode: 109HD03W


text:
© Sabine Zehetner 2011. BusyBee Photography
Beautifully captured!
Thank you, Gene!
– Sabine Jacobs
A beauty!!
Can you do anything wrong on Nantucket? Thanks, Gina!
– Sabine Jacobs
Stunning shot! Thank you for all your comments!! Have a great weekend! =)
Thanks, I appreciate it! Have a good weekend too!
– Sabine Jacobs
Wow, this is wonderful. Beautiful!
Thanks, Iris!
– Sabine Jacobs
Stunningly beautiful =)
Thanks a lot!
– Sabine Jacobs
This is a beautiful image!! Congratulations on your win!
Thank you Barbara!
– Sabine Jacobs
Gorgeous shot, Congrats on your challenge win!
Thanks, Cheryl. Also for adding the photo to your favs!
– Sabine Jacobs
Gorgeous, this I think is one of the most realistic captures of the ocean's light I've seen to date. Great job, and congratulations on the well deserved challenge win.
Thank you, Mary! I really appreciate it.
– Sabine Jacobs
Thanks a lot Svetlana!
– Sabine Jacobs
Stunning…I can feel the salty air.


text:
May 6, 2014
Fracking may be a boom opportunity for trucking fleets carrying water, sand, chemicals and other supplies to the oil and natural gas fields, but all those trucks cause problems on area roads.
Tags: Accidents, Safety, Image, Fracking
Author: Deborah Lockridge | Posted @ Tuesday, May 6, 2014 12:00 AM | » Comments(0)
February 29, 2012
Boy, what to think of the world of fracking lately
Tags: Going Green, Natural Gas, Fracking
Author: Deborah Lockridge | Posted @ Wednesday, February 29, 2012 12:00 AM | » Comments(1)
We offer e-newsletters that deliver targeted news and information for the entire fleet industry.
The expert, Mark Betner from CITGO, will answer your questions
The expert, Rence Oliphant from Hendrickson, will answer your questions
COMPOSILITE™ SC - Lift Axle from Hendrickson
VIDEO: Memorial Tribute to Ed Bobit
Video: Changing Lanes - The Siphiwe Baleka Story
Video: Tips On Operating a CNG Vehicle
The IsoTemp Refrigeration Upfit is Designed for Cargo Vans
Rapid Check Speeds Up Diagnostic Process
DumpTruckLoads.com Matches Loads with Trucks
Crysteel Aluminum Dump Body Saves Weight


text:
Subscribe and get the latest issue every Wednesday by email.
Nikolai Roerich Apartment Museum
History of St. Petersburg Museum
By Sophia Kishkovsky
The New York Times
Published: July 27, 2007 (Issue # 1292)
MOSCOW — Dmitry Prigov, a prolific and influential Russian poet and artist who at one point was incarcerated in a Soviet psychiatric hospital as punishment for his work, died on July 16. He was 66.
His death was reported by the Russian news agency RIA Novosti, which said he had collapsed in the Moscow subway earlier this month after a severe heart attack.
Prigov's creative expression took many forms. He said in 2005 that he had written nearly 36,000 poems. He also wrote plays and essays, created drawings, installations and video art, acted in films, staged performance art and performed music.
For years his verse circulated in the Soviet Union as samizdat, officially banned literature that was passed furtively hand to hand. Only in 1990, during the last stages of the Communist era, was a collection of his verse officially published in his country. His work had been published extensively abroad in ImigrI publications and Slavic studies journals.
Trained as a sculptor at the Stroganov Art Institute in Moscow, he began writing poetry in the 1950s, then worked as a municipal architect and created sculptures for parks. In the 1970s he grew close to artists in the Soviet underground and became a leader in Moscow's conceptual art movement, combining his poetry with performance. He was also known for writing verse on cans.
"In America there was Pop Art," said Vitaly Patsyukov, a Russian art historian and friend of Prigov's. "Here it was ideology as a manifestation of mass consciousness." Patsyukov added, "He turned words into objects."
At the time he was producing work considered subversive by the authorities, Prigov was stopped while walking down a street in 1986, he recalled, and was whisked away by the KGB and then to a Soviet psychiatric hospital. His stay was brief, however, after prominent poets like Bella Akhmadulina lodged protests.
In the West he was probably best known for his performance art. Rita Lipson, a senior lecturer in Russian literature and culture at Yale University, recalled Prigov's performance there. His work, she said, was "a form of social protest." One of his most widely known cycles of verse is about a Soviet policeman.
Prigov, who was born in Moscow, is survived by his wife, Nadezhda, a son, Andrei, and a grandson, Georgy.
Patsyukov said Prigov had been looking forward to participating in a conference on religion and art. Contemporary artists and the Russian Orthodox Church have been increasingly at odds in Russia, and Prigov had hoped to reconcile them, Patsyukov said.
Viktor Yerofeyev, a novelist and essayist with whom Prigov worked closely, said Prigov had been "a brilliant poet and created his own distinct poetic world."
"In the 20th century," he said, "the poetic word was torn away from life, but Dmitry Alexandrovich brought poetry closer to life, as another great poet, Pushkin, did in his day."
Friday, Jan. 30 through Wednesday, Feb. 4
A retrospective of the films of Roman Polanski starts today at Loft-Project Etagi, 74 Ligovsky Prospekt, with a screening of 'Repulsion' at 7 p.m. and 'Rosemary's Baby' at 9:15 p.m. The series runs through Feb. 4 and will include Polanski's eminently creepy 'The Tenant,' the cult comedy 'The Fearless Vampire Killers' and 'Cul-de-sac' among others. Tickets are 150-200 rubles and the complete schedule is available at www.vk.com/artpokaz/


text:
I'm so happy to walk again!!!!
Here's what my leg looked like today:
Once he looked at the x-rays, it went like this.
Hmm..what's the drill all about?
Wrenching things off:
Now it's time to drill...
The bar on the heel was a little dirty on the right side, so instead of dragging it through my heel he:
And the vid as promised:
Results 1 to 11 of 11
2015 LIGHTS SHOOTOUTContestsHot Deals See All Hot Deals >>Latest Mountain Bike ArticlesMTBR on Facebook |


text:
If your eye lids don't get seriously oily throughout the day, like mine, you should absolutely love this product. Personally, after about maybe 7-8 hours it starts creasing on me, however eye shadow stays for the most part intact, which is good.
I really love this item, somehow I'm not really sure about the price. Because I have really oily lids and I use double eyelid tape(double-sided kind). I use this primer to help my tape stay in place and not get oily. Without the primer, my lids gets oily within 4 hours? I live in Singapore and it's a all year summer and humid weather. But with this it my lids mostly only got oily after 8 to 9 hours. 11 hours max.
Something I really can't live without anymore. But I can't say much as I have only used this eye primer, it did work out very well for me though.
Definitely will re-purchase it.
HOLY GRAIL PRODUCT! It does exactly what it promises, even on super oily skin like mine. The price is ridiculous IMO, but it never stops me from buying it because I know it works.
I liked this primer for keeping my eye makeup from fading after 12 plus hours of working in a factory.
It's a bit expensive, but very effective. I would sweat and my eye makeup never budged.
I love this stuff, make sure you apply eye balm or eye cream prior to using this so your eyes don't get dry like mine did since I use this everyday.
Think this stuff was okay. I originally bought the full sized version and actually wasn't crazy about it because I thought it was a bit too "slippery" feeling. However, i got another mini tube with one of the Naked Palettes and it grew on me. After trying other primers, I appreciated how light in texture it was. I DO prefer something a little thicker for a lot of looks though so I tend to turn to other primers I have then reaching for this one first. I don't care for the wand aspect on the full sized, a little goes a long way because it is so light weight and I like the mini tube. I think for the price, I probably wouldn't buy it again, at least full sized. I
When i started wearing makeup everyday i started with the E.L.F eyeshadow primer. I did work ok for me but not the best. I have oily skin so throughout the day the eyeshadow had disappeared.
When i went to Barcelona i told myself i should try the Urban Decay eyeshadow primer potion. I had heard so much great things about it. So i purchased it. I had not regret it since then. I love this primer and i recommend it highly.
If you want a good primer you should buy this. Some may think its expenses but its totally worth the money. I will buy this one again!!!!!
I had accumulated a lot of samples of UDPP and finally started using it regularly, I was not disapointed! My eye shadow looks just as it did when I applied it hours and hours later. Before using UDPP my eye shadow would crease up and disapear despite having pretty dry skin. A little goes a long way so while it might be a little more pricey than other options it seems worth it to me.
Yes, believe the hype because this primer is everything it is cracked up to be. I have extreme hooded eyes and cannot wear eye shadows without my lids looking like a mess at the end of the day. This product is amazing priming the lids for shadows and will keep your eye makeup looking just as good as when you first applied it.
Honestly, I do not believe in spending this much on eye primer. You can get the same primer at a drugstore for $3. Will you be disappointed with this primer? No. But can you get the same thing for cheaper? Yes. I am not thrilled about the packaging, I think that a lot of leftover product is still in the tube that the wand cannot reach due to the bent style brush. Overall, a great product but save yourself the money and reach for something half the price.
1 out of 1 people found this review helpful. Did you? Yes No
The only makeup product I use every single day. Holy Grail doesn't even begin to describe it!
I have very oily lids and live in a humid country, and have never ever been able to get my shadow to *not* crease halfway through the day. Then I got a sample of this with my Naked Palette and never looked back! I'm almost embarrassed to admit this, but I can vouch for the fact that this lasts 24 hours if you need it to, even if you spend a few of those hours clubbing.
I recommended it to my mom, who has mature skin with deep eye creases, and with this on her eyeshadow stays perfect all day too.
My only, only gripe is that the back of my (professional sized) tube split before I could use it up.
2 out of 2 people found this review helpful. Did you? Yes No
I love this primer, keeps my eyeshadow and eyeliner on all day and prevents my eyelids from getting too oily as they do without it. It isn't very expensive for the amount of time it lasts. I have had mine nearly 9 months and still have quite a bit left. I just use a very small amount on each eye and it keeps everything in place for the whole day!


text:
Type | Feature Film |
MPAA Rating | NR |
Runtime | 0hr |
Genres | Drama, Short Film |
Keywords | N/A |
Status | Released |
US Release Date | N/A |
Former Spice Girls star Melanie Chisholm has landed a judging role on the inaugural Asian version of reality TV series America's Got Talent.
The Amazing Spiderman co-stars and real life couple Andrew Garfield and Emma Stone will mark Earth Hour by switching off the lights in Singapore.
Members of controversial Russian punk protest group Pussy Riot have been nominated for an arts award in Singapore.
Rihanna has been accused of slurring her words on stage at the opening show of her Australian tour.
British actor Sam Claflin has reached out to family members in Indonesia after an earthquake struck off the country's coast on Wednesday (11Apr12).
Box Office Analysis: May 5 Spider-Man The Scorpion King Life or Something Like It Changing Lanes The Rookie Hollywood Ending
Listen Up!: Jagger, Kravitz team up in latest single
Name | Credit | Credited as |
Jim Mason | Actor | Ship's Mate Finch |
Ramon Novarro | Actor | Joel Shore |
Ernest Torrence | Actor | Mark Shore |
Dan Wolheim | Actor | Noah Shore |
Ben Lewis | Editor |