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US 6435944 B1 Abstract A CMP slurry is formulated with a single component oxidizer capable of oxidizing a metal undergoing planarization and yielding a complexing agent which complexes with the oxidized metal thereby minimizing overetching. Embodiments include CMP Cu with a fixed abrasive pad or an abrasive containing slurry, employing a peroxy acid, e.g., peroxy benzoic acid, or a polyethylene glycol peroxy acid. In another embodiment, a single component is employed which dissociates in the slurry into an oxidizer and complexing agent, such as an amine-peroxy acid, e.g., urea peroxy acid.
Claims(44) 1. A slurry for chemical mechanical polishing a metal, the slurry consisting essentially of:
a reagent comprising:
a first moiety for oxidizing the metal and for complexing with the metal and/or oxidized metal, the first moiety comprising a peroxide group selected from the group of a peroxycarboxylic acid group, a peroxycarboxylate group, or combinations thereof, the first moiety producing a complexing agent comprising a carboxylic acid or a carboxylate following an oxidation reaction; and
a second moiety for minimizing overetching the metal;
an inhibitor;
abrasive particles; and
deionized water.
2. The slurry according to
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4. The slurry according to
5. The slurry according to
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12. The slurry according to
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14. The slurry according to
an amine-peroxy acid;
abrasive particles;
an inhibitor; and
deionized water.
15. The slurry according to
16. The slurry according to
17. The slurry according to
18. The slurry according to
19. The slurry according to
20. A method of planarizing a surface of a metal layer, the method comprising chemical mechanical polishing the surface with a slurry consisting essentially of:
a reagent comprising:
a first moiety for oxidizing the metal and for complexing with the metal and/or oxidized metal, the first moiety comprising a peroxide group selected from the group of a peroxycarboxylic acid group, a peroxycarboxylate group, or combinations thereof, the first moiety producing a complexing agent comprising a carboxylic acid or a carboxylate following an oxidation reaction; and
a second moiety for minimizing overetching of the metal;
an inhibitor;
abrasive particles; and
deionized water.
21. The method according to
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33. A slurry for chemical mechanical polishing a metal, the slurry comprising a reagent having:
a first moiety for oxidizing the metal and for complexing with the metal and/or oxidized metal; and
a second moiety for minimizing overetching the metal, the second moiety comprising a polyethylene glycol.
34. The slurry according to
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43. The slurry of
44. The slurry according to
Description The present invention relates to a slurry for planarizing metals by chemical-mechanical polishing (CMP) with improved planarity. The present invention is applicable to manufacturing high speed integrated circuits having submicron design features and high conductivity interconnect structures with high production throughput. The escalating requirements for high density and performance associated with ultra large scale integration semiconductor wiring require responsive changes in interconnection technology. Such escalating requirements have been found difficult to satisfy in terms of providing a low RC (resistance and capacitance) interconnect pattern, particularly wherein submicron vias, contacts and trenches have high aspect ratios imposed by miniaturization. Conventional semiconductor devices comprise a semiconductor substrate, typically doped monocrystalline silicon, and a plurality of sequentially formed dielectric interlayers and conductive patterns. An integrated circuit is formed containing a plurality of conductive patterns comprising conductive lines separated by interwiring spacings, and a plurality of interconnect lines, such as bus lines, bit lines, word lines and logic interconnect lines. Typically, the conductive patterns on different layers, i.e., upper and lower layers, are electrically connected by a conductive plug filling a via hole, while a conductive plug filling a contact hole establishes electrical contact with an active region on a semiconductor substrate, such as a source/drain region. Conductive lines are formed in trenches which typically extend substantially horizontal with respect to the semiconductor substrate. Semiconductor �chips� comprising five or more levels of metallization are becoming more prevalent as device geometries shrink to submicron levels. A conductive plug filling a via hole is typically formed by depositing an interlayer dielectric on a conductive layer comprising at least one conductive pattern, forming an opening through the interlayer dielectric by conventional photolitographic and etching techniques, and filling the opening with a conductive material, such as tungsten (W). Excess conductive material on the surface of the dielectric interlayer is typically removed by CMP. One such method is known as damascene and basically involves forming an opening in the interlayer dielectric and filling the opening with a metal. Dual damascene techniques involve forming an opening comprising a lower contact or via hole section in communication with an upper trench section. The entire opening is filled with a conductive material, typically a metal, to simultaneously form a conductive plug in electrical contact with a conductive line. Cu and Cu alloys have received considerable attention as a candidate for replacing Al in interconnect metallizations. Cu has improved electrical properties vis-�-vis W, making Cu a desirable metal for use as a conductive plug as well as conductive wiring. An approach to forming Cu plugs and wiring comprises the use of damascene structures employing CMP, as in Teong, U.S. Pat. No. 5,693,563. However, due to Cu diffusion through interdielectric layer materials, such as silicon dioxide, Cu interconnect structures must be encapsulated by a diffusion barrier layer. Typical diffusion barrier metals include tantalum (Ta), tantalum nitride (TaN), titanium nitride (TiN), titanium-tungsten (TiW), tungsten (W), tungsten nitride (WN), titanium-titanium nitride (Ti�TiN), titanium silicon nitride (TiSiN), tungsten silicon nitride (WSiN), tantalum silicon nitride (TaSiN), and silicon nitride (SiN), for encapsulating Cu. The use of such barrier materials to encapsulate Cu is not limited to the interface between Cu and the dielectric interlayer, but includes interfaces with other metals as well. In conventional CMP techniques, a wafer carrier assembly is rotated in contact with a polishing pad which is mounted on a CMP apparatus. The polishing pad is mounted on a rotating turntable or platen driven by an external driving force. The wafers are typically mounted on a carrier or polishing head which provides a controllable force, i.e., pressure, urging the wafers against the rotating polishing pad. Thus, the CMP apparatus effects polishing or rubbing movement between the surface of each thin semiconductor wafer and the polishing pad while dispersing a polishing slurry containing abrasive particles in a reactive solution to effect both chemical activity and mechanical activity while applying a force between the wafer and a polishing pad. Conventional polishing pads employed in abrasive slurry processing typically comprise a grooved porous polymeric surface, such as polyurethane, and the abrasive slurry varied in accordance with the particular material undergoing CMP. Basically, the abrasive slurry is impregnated into the pores of the polymeric surface while the grooves convey the abrasive slurry to the wafer undergoing CMP. A polishing pad for use in CMP slurry processing is disclosed by Krywanczyk et al. in U.S. Pat. No. 5,842,910. Typical CMP is performed not only on a silicon wafer itself, but on various dielectric layers, such as silicon oxide, conductive layers, such as aluminum and copper, or a layer containing both conductive and dielectric materials as in damascene processing. A distinctly different type of abrasive article from the above-mentioned abrasive slurry-type polishing pad is a fixed abrasive article, e.g., fixed abrasive polishing pad. Such a fixed abrasive article typically comprises a backing sheet with a plurality of geometric abrasive composite elements adhered thereto. The abrasive particles in a binder, e.g., a polymeric binder. During CMP employing a fixed abrasive article, the substrate or wafer undergoing CMP wears away the fixed abrasive elements thereby releasing the abrasive particles. Accordingly, during CMP employing a fixed abrasive article, a chemical agent is dispersed to provide the chemical activity, while the mechanical activity is provided by the fixed abrasive elements and abrasive particles released therefrom by abrasion with the substrate undergoing CMP. Thus, such fixed abrasive articles do not require the use of a slurry containing loose abrasive particles and advantageously reduce effluent treatment and dishing as compared to polishing pads that require an abrasive slurry. During CMP employing a fixed abrasive polishing pad, a chemical agent is applied to the pad, the agent depending upon the particular material or materials undergoing CMP. However, the chemical agent does not contain abrasive particles as in abrasive slurry-type CMP operations. Fixed abrasive articles are disclosed by Rugherford et al. in U.S. Pat. No. 5,692,950, Calhoun in U.S. Pat. No. 5,820,450, Haas et al. in U.S. Pat. No. 5,453,312 and Hibbard et al. in U.S. Pat. No. 5,454,844. Fixed abrasive elements of conventional slurry-less type polishing pads are typically formed in various �positive� geometric configurations, such as a cylindrical, cubical, truncated cylindrical, and truncated pyramidal shapes, as disclosed by Calhoun in U.S. Pat. No. 5,820,450. Conventional fixed abrasive articles also comprise �negative� abrasive elements, such as disclosed by Ravipati et al. in U.S. Pat. No. 5,014,468. In applying conventional planarization techniques, such as CMP, to Cu, it is extremely difficult to achieve a high degree surface uniformity, particularly across a surface extending from a dense array of Cu features, e.g., Cu lines, bordered by an open field. A dense array of metal (Cu) features is typically formed in an interlayer dielectric, such as a silicon oxide layer, by a damascene technique wherein trenches are initially formed. A barrier layer, such as a Ta-containing layer e.g., Ta, TaN, is then deposited lining the trenches and on the upper surface of the silicon oxide interlayer dielectric. Cu or a Cu alloy is then deposited, as by electroplating, electroless plating, physical vapor deposition (PVD) at a temperature of about 50� C. to about 150� C. or chemical vapor deposition (CVD) at a temperature under about 200� C., typically at a thickness of about 8,000 A to about 18,000 A. In planarizing the wafer surface after copper metallization, erosion and dishing are typically encountered, thereby decreasing the degree of surface uniformity or planarity and challenging the depth of focus limitations of conventional photolitographic techniques, particular with respect to achieving submicron dimensions, such as below about 0.25 micron. Conventional techniques for CMP Cu and Cu alloys exhibit unacceptably low polishing rates or poor polishing results. Conventional CMP slurries for Cu and Cu alloys contain abrasive particles, such as alumina or silica, an oxidizer, such as hydrogen peroxide or an acid, a complexing agent and an inhibitor, such as benzotriazole. EPO 864 742 A2, discloses a CMP slurry for Cu and Cu alloys containing a urea hydrogen peroxide oxidizer, a complexing agent, such as ammonium oxalate or tartaric acid, an abrasive, a film forming agent, e.g., benzotriazole, and an optional surfactant. The conventional CMP operates by oxidizing the surface of the metal which is then abraded by the abrasive particles. In EPO 846 742 A2, the complexing agent disturbs the passivation layer during mechanical abrasion and forms a complex with the oxidized metal thereby limiting the depth of oxidation. Conventional oxidizers are small organic molecules, such as hydrogen peroxide, ferric nitrate, potassium iodate and ammonium persulfate. The oxidizers tend to form a thin oxide film to stop further etching once an oxide film is formed. However, the use of small oxidizing molecules tends to diffuse to the metal/oxide interface, or simply diffuses through the less dense oxide film due to their small size and affinity for the metal surface. Such overetching of metal lines results in dishing which may form capillary forces to suck the aqueous solution thereby exacerbating dishing. Currently, dishing is a significant problem in CMP of metal layers, particularly Cu and Cu alloys. There exists a need for a CMP slurry and methodology for planarizing metals with reduced dishing. There exists a particular need for a CMP slurry for planarizing Cu and Cu metal alloy layers with reduce dishing, increased surface planarity, increased throughput and reduced manufacturing costs. An aspect of the present invention is a CMP slurry for planarizing metals, such as Cu and Cu alloys, at high production throughput with no or significantly reduced dishing, improved surface planarity, increased throughput and reduced manufacturing costs. Additional aspects and other features of the present invention will be set forth in part in the description which follows and in part will become apparent to those having ordinary skill in the art upon examination of the following or may be learned from the practice of the present invention. The aspects of the present invention may be realized and obtained as particularly pointed out in the appended claims. According to the present invention, the foregoing and other aspects are implemented in part by a slurry for chemical-mechanical polishing a metal, the slurry comprising a reagent having: a first moiety for oxidizing the metal and for complexing with the metal and/or metal oxide; and a second moiety for minimizing overetching the metal. Another aspect of the present invention is a method of planarizing a surface of a metal by chemical-mechanical polishing employing a slurry comprising a reagent having: a first moiety for oxidizing the metal and for complexing with the metal and/or metal oxide; and a second moiety for minimizing overetching the metal. Embodiments of the present invention comprise CMP Cu or a Cu alloy employing a slurry containing an oxidizing moiety and a complexing moiety, wherein the reduced form of the oxidizing moiety comprises a complexing agent for the metal. Embodiments of the present invention include reagents which are peroxy acids, such as peroxybenzoic acid, chloroperoxybenzoic acid, peroxyacetic acid, and peroxyformic acid. Embodiments of the present invention further include polyethylene glycol peroxy acids. A further aspect of the present invention is a slurry for chemical mechanical polishing and metal, the slurry consisting essentially of: an amine-peroxy acid; abrasive particles; an inhibitor and deionized water. Another aspect of the present invention is a method of planarizing a surface of a metal by chemical mechanical polishing employing a slurry consisting essentially of an amine-peroxy acid; abrasive particles; an inhibitor; and deionized water. Embodiments include employing urea hydrogen peroxide as the amine-peroxy acid which advantageously dissociates in water into an oxidizing agent and complexing agent, thereby avoiding the necessity of providing a separate complexing agent and enhancing the shelf life of the oxidizing component. Additional aspects of the present invention will become readily apparent to those skilled in this art from the following detailed description, wherein embodiments of the present invention are described, simply by way of illustration of the best mode contemplated for carrying out the present invention. As will be realized, the present invention is capable of other and different embodiments, and its several details are capable of modifications in various obvious respects, all without departing from the present invention. Accordingly, the drawings and description are to be regarded as illustrative in nature, and not as restrictive. The present invention achieves the heretofore elusive objective of effectively planarizing metals, such as Cu and Cu alloys, at high production throughput while eliminating or substantially reducing dishing, consistent with the ever increasing demands for reliable interconnect patterns having feature sizes in the deep submicron range. In addition, the present invention enables effective CMP of metals at a reduced manufacturing cost. As used throughout this disclosure, the symbol Cu is intended to encompass high purity elemental copper as well as copper-based alloys, e.g., copper-based alloys containing at least about 80 wt. % copper. The objectives of the present invention are achieved by employing a strategically formulated slurry for CMP metals, such as Cu, with or without abrasive particles. In other words, the slurry of the present invention can be employed with fixed abrasive polishing systems. In accordance with embodiments of the present invention, a reagent is incorporated in the slurry which functions not only as an oxidizer but also complexes with the oxidized metal thereby preventing overetching and enhancing the removal rate by solubilizing the oxidized metal. Embodiments of the present invention, therefore, comprise an organic reagent which contains an oxidizing moiety and a moiety which prevents overetching of the metal. Typically, the oxidizing moiety is a hydrophilic head with a peroxide group and the tail is a hydrophobic tail. The precise mechanism underpinning the manner on which the reagents of the present invention function is not known with certainty. However, it is believed that the reagents employed in the present invention function both as an oxidizer and, upon oxidation, generate a complexing agent. For example, it is believed that the peroxide hydrophilic head of the inventive reagent oxidizes the metal surface. The resulting by-product, e.g., an organic acid, is believed to react with Cu or the oxidized Cu (Cu++) to form a carboxylic acid complex. It is believed that the dishing is significantly curtailed because the reagent molecule stops at the surface of the metal due to the hydrophobic tail. In this way, the thickness of the oxide layer is controlled and dishing reduced. The present invention offers additional advantages vis-�-vis conventional CMP slurries in that the single compound oxidizing and dishing reducing reagent exhibits greater stability than hydrogen peroxide-containing formulations which exhibit a limited pot life. Moreover, the use of a single compound oxidizing-complexing reagent reduces the number of chemicals involved, as by avoiding a separate complexing agent, thereby simplifying processing and reducing material costs. Various reagents can be employed or formulated to implement the oxidizing and complexing functions for use in a CMP slurry in accordance with embodiments of the present invention. For example, the oxidizing moiety can comprise a peroxide group, e.g., a peroxycarboxylic acid group or a peroxycarboxylate group, in which case the resulting complexing agent comprises a carboxylic acid or carboxylate. The complexing moiety can comprise an alkyl group or derivative thereof, such as a polyethylene glycol, or an aryl group, such as benzene or a derivative thereof. Thus, suitable reagents include peroxy acids such as peroxybenzoic acid, chlorobenzoic acid, peroxyacetic acid and peroxyformic acid. In addition, suitable reagents include polyethylene glycol peroxy acids, such as HOOOC(CH2CH2O)n COOOH, wherein n is about 15, and can be synthesized from polyethylene glycol. Given the present disclosure and objectives, suitable amounts of reagents and additional components can be determined and optimized in a given situation. Generally, the present invention is applicable for CMP of various metals, such as aluminum, Cu, titanium, tantalum, nitrides thereof, as well as silicon oxynitride. CMP slurries in accordance with embodiments of the present invention can typically contain about 0.005 wt. % to about 25 wt. % of the reagent, such as about 0.5 to about 5 wt. %, e.g., about 0.5 to about 2.5 wt. %. Advantageously, an inhibitor, such as 5-methyl benzotriazole or benzotriazole, can be present as in an amount of about 0.005 wt. % about 0.5 wt. %, e.g., about 0.001 to about 0.1 wt. %. Slurries employed in the present invention can contain abrasive particles, such as alumina or silica, in an amount of about 0.01 to about 30 wt. %. In another embodiment of the present invention, a base, such as ammonium hydroxide or potassium hydroxide, is introduced to increase the solubility of a reagent if necessary, as when employing a higher molecular weight aliphatic or aromatic carboxylic acid component, e.g. wherein the carboxylic acid component of the reagent contains more than about 7 carbon atoms. The amount of the base is adjusted such that it is present in a sufficient amount to form a salt of the reagent. For example, the base can be present in a molar ratio with respect to the reagent of about 1:1 to about 1:2. Additional conventional slurry additives can be incorporated into the slurry embodiments of the present invention to achieve their known effect, e.g., to further improve or enhance the polishing rate of a barrier layer in the wafer, such as titanium, tantalum, and nitrides thereof. In embodiments of the present invention wherein an abrasive is employed, such an abrasive can include alumina, titania, zirconia, germania, silica, ceria and mixtures thereof. In another aspect of the present invention, a reagent is employed that dissociates upon formulating the slurry into an oxidizer and a complexing agent, thereby advantageously reducing the number of separate chemicals required for formulating the slurry and, additionally, increasing the shelf life of the oxidizing component. Suitable reagents for dissociating into an oxidizer and a complexing agent in accordance with the embodiments of the present invention include any of various amine-peroxy acids, such as urea hydrogen peroxide. Thus, the use of a slurry containing such a reagent creates reaction chemistry in situ for metal CMP. The amine-peroxy acid component, e.g., urea hydrogen peroxide, can be present in an amount of about 0.005 to about 25 wt. %, such as 0.5 to about 5 wt. %, e.g., about 0.5 to about 2.5 wt. %. Advantageously, a separate complexing agent can be excluded from the slurry. Thus, slurries in accordance with the embodiments of the present invention comprise an agent that dissociates into an oxidizing agent and a complexing agent and need only contain abrasive particles, as in an amount up to 30 wt. %, in situations where fixed abrasive elements are not employed, and an inhibitor, such as 5-methyl benzotriazole or benzotriazole, as in an amount of about 0.005 to about 0.5 wt. %, e.g., about 0.001 to about 0.1 wt. %. In accordance with embodiments of the present invention, a Cu metal film is effectively planarized with no or substantially reduced dishing, thereby enabling the use of conventional photolitography to form metal features having dimensions in the deep submicron range. A typical Cu metallization or interconnect system comprises, but is not limited to, interconnects formed by damascene and comprises depositing an interlayer dielectric overlying a substrate, forming an opening, e.g., a damascene opening, in the interlayer dielectric, depositing a diffusion barrier, such as a TaN or Ta, and filling the opening with Cu. Advantageously, the opening in the interlayer dielectric can be filled by initially depositing a seedlayer and then electroplating or electroless plating the Cu layer, typically at a thickness of about 8,000 to about 18,000 A. The damascene openings can also be filled with Cu by PVD at a temperature of about 50� C. to about 150� C. or by CVD at a temperature under about 200� C. Conventional substrates and interdielectric layers are encompassed by the present invention. For example, the substrate can be doped moncrystalline silicon or gallium-arsenide. The interlayer dielectric can comprise any of various dielectric materials conventionally employed in the manufacture of semiconductor devices. For example, dielectric materials, such as silicon dioxide, phosphorus-doped silicon glass (PSG), boron-phosphorus-doped silicon glass (BPSG) and silicon dioxide derived from tetraethyl orthosilicate (TEOS) or silane by plasma enhanced chemical vapor deposition (PECVD) can be employed. Interlayer dielectrics in accordance with the present invention can also comprise low dielectric constant materials, including polymers, such as polymides, and carbon-containing silicon dioxide, e.g., Black Diamond� available from Applied Materials Inc., located in Santa Clara, Calif. The openings are formed in interlayer dielectrics by conventional photolithographic and etching techniques. The present invention provides a CMP slurry for planarizing metals, such as Cu at a high removal rate, e.g., greater than 5,000 Å per minute with reduced dishing, thereby enabling an improvement in the speed of the resulting integrated circuit and yield. Embodiments of the present invention, therefore, enable manufacturing semiconductor devices having enhanced cross-sectional area of copper interconnects, thereby improving electrical performance by reducing interconnect resistance. The slurries of the present invention exhibit high selectivity of Cu to silicon dioxide, thereby rendering them particularly applicable to damascene techniques. The slurries of the present invention enable a reduction in the amount of chemicals employed in a slurry, thereby reducing manufacturing costs and simplifying processing. The slurries in accordance with embodiments of the present invention exhibit significantly greater stability than hydrogen peroxide-containing slurries which have a limited shelf life. The present invention is applicable to planarizing during various stages of semiconductor manufacturing. The present invention enjoys particular applicability in the manufacture of high density semiconductor devices with metal features in the deep submicron range. Only the preferred embodiment of the present invention and but a few examples of its versatility are shown and described in the present disclosure. It is to be understood that the present invention is capable of use in various other combinations and environments and is capable of changes and modifications within the scope of the inventive concept as expressed herein. Patent Citations
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To the Editor:
James R. Oestreich's article ''String Players Young, Gifted and Black'' [March 3] points out that symphony orchestras employ few black musicians. The problem is of long standing. A study of race's effect on judgments of performance (by Charles A. Elliot in Bulletin of the Council for Research in Music Education, Winter 1995-1996) suggests a reason.
A recording of two instrumental etudes was synchronized to several different videotaped performances. Eighty-eight evaluators, all experienced music teachers, were told to judge the quality of the performances, but since the performances were identical, the real variables were the race and gender of the performers. For each etude a white man, a black man, a white woman and a black woman were seen on tape. Women were judged as performing less well than men, while blacks were judged significantly lower than whites.
The prospect that such unthinking racism persists in our musical world is chilling, and it diminishes the lives of white and black musicians alike.
New Haven
The writer is director of bands at Southern Connecticut State University.


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International forum for talented young scientists
INRS researchers at the Global Young Academy
Professor and director Federico Rosei and researchers Marco Peccianti and Alberto Vomiero from the Centre Énergie Matériaux Télécommunications of INRS were recently elected as members of the Global Young Academy (GYA).
The GYA is an international organization founded in 2010 to promote scientific exchange and cooperation between talented young researchers in developed and developing countries. GYA members are rising stars known for the excellence of their research across all disciplines, namely the natural sciences and engineering, medicine, as well as social sciences, the arts and humanities.
Professor Rosei is a world-class scientistwho has made his mark in the field of nanoscience and is widely recognized for his commitment to the advancement of knowledge and training of young researchers. Alberto Vomiero, a Marie Curie Fellow and researcher presently working with Professor Rosei's team, is currently developing environmentally safe nanomaterials for renewable energy and sustainable development. Researcher Marco Peccianti, a postdoctoral fellow in Professor Roberto Morandotti's lab from 2008 to 2011, helped design a new, very stable, high-precision integrated laser.M. Peccianti is researched for the Italian National Research Council.
For the next four years, the three INRS researchers will be active members of this select club, which presently comprises 155 members in their mid-thirties from 54 countries around the world. As GYA members, they undertake to support young researchers, encourage young people to pursue careers in science, and foster a culture of scientific excellence. In addition to promoting multidisciplinary research to solve global problems, they are called on to help develop and implement national science policies targeting young researchers. In an editorial published in Science, GYA founders explained that a central aim of the GYA is to spur the creation of national academies for young scientists that "encourage and empower their members to engage in interdisciplinary research, communicate science to society, and provide advice on national science policies, especially those affecting young scientists."
The new members are invited to the GYA's annual meeting on May 15 to 18, 2013, in Halle, Germany. Congratulations from all the INRS community! ♦
Most popular
// January 14, 2015
Professor Federico Rosei chosen as distinguished lecturer
Recognized by NTC IEEE»
// January 21, 2015
INRS acquires specialized equipment to conduct innovative research
Over $1 million in funding»
// January 23, 2015
Chinese government awards INRS professor Federico Rosei
The Chang Jiang Scholars Award»
// February 4, 2015
Professor Federico Rosei has been elected Fellow of SPIE
For his achievements in nano»
// February 17, 2015
A breakthrough in nanotoxicology by INRS researchers
Silver nanoparticles and...»
// February 19, 2015
INRS receives $1.5 million from NSERC for strategic projects
// February 17, 2015
A novel approach for high performance field emission electron sources
The "nano" Golden Achievement!»
// March 3, 2015
The Advanced Laser Light Source at INRS receives major funding from CFI
A pillar of ultrafast science»


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Coverage: TBS
1:10 PM ET, September 29, 2013
Great American Ball Park, Cincinnati, Ohio
CINCINNATI, OH - SEPTEMBER 29: Henry Rodriguez #36 of the Cincinnati Reds catches a fly ball in the ninth inning against the Pittsburgh Pirates at Great American Ball Park on September 29, 2013 in Cincinnati, Ohio. Pittsburgh defeated Cincinnati 4-2. (Photo by Jamie Sabau/Getty Images)


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Danuta Hyniewska
I have been interested in photography for most of my life, I have been lucky to have an oportunity of travelling around Europe.
human and nature
1 Oct 2013 — 160 views, 14 favorites, 17 comments
In "Photo Challenge: Golden leaves Fall"
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In "Photo Challenge: Extreme Weather and the Aftermath"
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Home > News > Israeli 'nano-lightbulbs' could help detect drug's efficiency
January 9th, 2005
Israeli 'nano-lightbulbs' could help detect drug's efficiency
Abstract: Raz Jelinek has seen the light. After more than three years of research, the professor is unveiling what he has dubbed 'nano-lighbulbs.' These polymer patches placed on the walls of living cells actually change color and light up as a result of events occurring on the cell surface.
Possible Futures
European roadmap for graphene science and technology published February 25th, 2015
Quantum research past, present and future for discussion at AAAS February 16th, 2015
World�s first compact rotary 3D printer-cum-scanner unveiled at AAAS by NTU Singapore start-up: With production funded by crowdsourcing, the first unit will be delivered to the United States in March February 16th, 2015
Nanotechnology Electric Vehicle (EV) Market Analysis Report 2015: According to Radiant Insights, Inc February 13th, 2015
Untangling DNA with a droplet of water, a pipet and a polymer: With the 'rolling droplet technique,' a DNA-injected water droplet rolls like a ball over a platelet, sticking the DNA to the plate surface February 27th, 2015
Graphene shows potential as novel anti-cancer therapeutic strategy: University of Manchester scientists have used graphene to target and neutralise cancer stem cells while not harming other cells February 26th, 2015
Cutting-edge technology optimizes cancer therapy with nanomedicine drug combinations: UCLA bioengineers develop platform that offers personalized approach to treatment February 24th, 2015
Optical nanoantennas set the stage for a NEMS lab-on-a-chip revolution February 24th, 2015
Scientific breakthrough in rechargeable batteries: Researchers from Singapore and Qu�bec Team Up to Develop Next-Generation Materials to Power Electronic Devices and Electric Vehicles February 28th, 2015
First detailed microscopy evidence of bacteria at the lower size limit of life: Berkeley Lab research provides comprehensive description of ultra-small bacteria February 28th, 2015
Leti to Offer Updates on Silicon Photonics Successes at OFC in LA February 27th, 2015
Moving molecule writes letters: Caging of molecules allows investigation of equilibrium thermodynamics February 27th, 2015
Patents/IP/Tech Transfer/Licensing
New Paper-like Material Could Boost Electric Vehicle Batteries: Researchers create silicon nanofibers 100 times thinner than human hair for potential applications in batteries for electric cars and personal electronics February 20th, 2015
Nanotech Discoveries Move from Lab to Marketplace with Lintec Deal: Licensing Partnership Brings Together University Technology, New Richardson-Based Facility Directed by Alumni February 9th, 2015
Graphenea granted patent on graphene transfer February 9th, 2015
Toronto-based Environmental Technology Pioneer Green Earth Nano Science Expands in EU February 6th, 2015


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- Recent Deals
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fuji heavy industries ltd
(7270:Tokyo Stock Exchange)
Executive Profile*
Hiroyuki OikawaFormer Standing Corporate Auditor, Fuji Heavy Industries Ltd. |
Age | Total Calculated Compensation | This person is connected to 0 board members in 0 different organizations across 2 different industries. |
-- | -- |
Mr. Hiroyuki Oikawa served as Chief Executive Officer and President of Subaru Indiana Automotive, Inc. (SIA). Mr. Oikawa served as an Executive Vice President and a Senior Vice President of Fuji Heavy Industries Ltd. until June 25, 2010. He served as a Director of Fuji Heavy Industries Ltd. until June 25, 2010. He served as a Standing Corporate Auditor of Fuji Heavy Industries Ltd.
Corporate Headquarters*Subaru Building Phone: 81 3 3347 2111Tokyo, -- 160-8316 Japan Fax: 81 3 3347 2338 Board Members Memberships*Former Standing Corporate Auditor
Education*There is no Education data available.Other Affiliations* |
Annual Compensation*There is no Annual Compensation data available.Stock Options*There is no Stock Options data available.Total Compensation*There is no Total Compensation data available. |
Recently Viewed | |||
Name | Position/ Company | Compensation |
Thomas A. Kennedy Ph.D. | Chairman and Chief Executive Officer Raytheon Company | $664.0K |
John F. Rishton FCMA | Chief Executive Officer and Executive Director Rolls Royce Holdings plc | 925.0K GBP |
Osamu Suzuki | Chairman, Chief Executive Officer and President Suzuki Motor Corporation | ¥140.0M |
Masamichi Kogai | Chief Executive Officer, President and Representative Director Mazda Motor Corporation | -- |
Shunichi Miyanaga | Chief Executive Officer, President and Representative Director Mitsubishi Heavy Industries Ltd. | ¥135.0M | Compensation as of Fiscal Year 2013. |
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Glacier Ice Rink
From Wikipedia, the free encyclopedia
Location | 1101 South Ave West Missoula, Montana United States |
Owner | Missoula Area Youth Hockey Association |
Operator | Missoula Area Youth Hockey Association |
Capacity | 2,500 |
Surface | Ice Rink |
Construction | |
Broke ground | 1996 |
Opened | October 10, 1996 |
Construction cost | Unknown |
Tenants | |
The Glacier Ice Rink is a two-sheet ice arena located in Missoula, Montana. It is operated by the Missoula Area Youth Hockey Association, a non profit organization whose mission is to "provide recreational opportunities for learning and playing the game of hockey and other ice skating activities for children and adults in our community." The rink is open 10 months a year and offers youth and adult hockey leagues, hockey tournaments and public skating sessions. Glacier Ice Rink is also home to the Missoula Maulers, the Missoula Figure Skating Club, the Missoula Curling Club, the Missoula Referees Association, and the Women's Hockey Association of Missoula (WHAM).
- Missoula Figure Skating Club
- Missoula Curling Club
- Missoula Referees Association
- Womens Hockey Association of Missoula (WHAM)
See also[edit]
External links[edit]
Coordinates: 46°50′55″N 114°00′53″W / 46.848708°N 114.014763°W


text:
The Land of Perpetual Excitement
on ESB
on ESB
The Land of Perpetual Excitement | |
First appearance: | "InSPONGEiac" |
Latest appearance: | "InSPONGEiac" |
The Land of Perpetual Excitement is a book that Patrick reads to SpongeBob, but only in the episode "InSPONGEiac."
The Land of Perpetual Excitement, is a purple book, with a very crazy looking fish on the cover, with the name written in large blue font.
SpongeBob had been trying to go to sleep, Patrick pulled the book off of his dusty book shelf, and began reading the book to SpongeBob. The book starts slow, and helped SpongeBob start to fall asleep. Patrick continued reading, and the book became faster-paced, until SpongeBob was fully awake again. SpongeBob wondered how this could not help him sleep, and Patrick read the title to SpongeBob, "The Land of Perpetual Excitement." Patrick said, "It's a get out of bed story."
- Despite Patrick not being able to read in other episodes (Example:"Tunnel of Glove"), he was fully able to read to SpongeBob. Maybe he got this skill from the book How To Read.
- According to Patrick, it's a "get out of bed" story.


text:
Section 210 of HR 875 requires that a national traceability system for each "article of food through all stages of its production, processing, and distribution" be implemented, and HR 814 lays the system out in no uncertain terms. This traceability system applies to livestock, chickens, and eggs, and is supposed to safeguard our food supply. The problem is, no one other than concentrated animal feeding operations (CAFOs) can reasonably comply with its requirements.
Here is the actual wording from HR 814:
The Federal Food, Drug, and Cosmetic Act (21 U.S.C. 301 et seq.) is amended--
(1) in section 301, by inserting at the end the following:
'(oo) The failure to comply with any requirement of section 414A (relating to the traceability of food).'; and
(2) in chapter IV, by inserting after section 414 the following:
'(a) Establishment of System- Not later than 1 year after the date of the enactment of this section, the Secretary shall establish a traceability system described in subsection (b) for all stages of manufacturing, processing, packaging, and distribution of food.
'(b) Description of System- The traceability system required by subsection (a) shall require each article of food shipped in interstate commerce to be identified in a manner that enables the Secretary to retrieve the history, use, and location of the article through a recordkeeping and audit system or registered identification.
'(c) Records-
'(1) IN GENERAL- The Secretary may require that each person, firm, and corporation required to identify an article of food pursuant to subsection (b) maintain accurate records, as prescribed by the Secretary, regarding the purchase, sale, and identification of the article.
'(2) ACCESS- Each person, firm, and corporation described in paragraph (1) shall, at all reasonable times, on notice by a duly authorized representative of the Secretary, allow the representative to access to each place of business of the person, firm, or corporation to examine and copy the records described in paragraph (1).
'(3) DURATION- Each person, firm, and corporation described in paragraph (1) shall maintain records required to be maintained under this subsection for such period of time as the Secretary prescribes.
'(d) False Information- No person, firm, or corporation shall falsify or misrepresent to any other person, firm, or corporation, or to the Secretary, any information as to any location at which any article of food was held.
'(e) Alteration or Destruction of Records- No person, firm, or corporation shall, without authorization from the Secretary, alter, detach, or destroy any records or other means of identification prescribed by the Secretary for use in determining the location at which any article of food was held.'.


text:
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Wordsmith Talk |
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#189457 - 02/22/10 05:30 PM Re: Cannas [Re: beck123]
Carpal Tunnel
Registered: 06/23/08
Posts: 7076
Loc: Land of the Flat Water Originally Posted By: beck123Synecdoche works both ways: "all hands on board" and "Detroit beat Dallas last week" are both examples of synecdoche. There may be a rhetorical device that addresses just one or the other, but I'm not aware of such a thing. Of course, there may be phrases that express the idea of one or the other, but I don't believe these phrases are "official" rhetorical devices.
Earlier, someone wrote that Hindi must have borrowed the word (=canon) from English. More likely, they are both descended from the same proto-Indoeuropean language, as was William Conrad.
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jones 5pts The 2010Altima failed to satisfy market with its poor interior and CVT issue. Lack of control experienced by many users. Now in 2012Altima, some bolt and faulty suspension problems are appearing. There is nothing change from 2010 to 2012 in Altima to mention.
Rob 5pts It's sad when you think about it. Nissan had a decent looking line-up. It doesn't seem they're staying on top of things like they were trying to do nearly ten years ago. I really liked the look of the last gen Altima and Maxima. I even considered getting an Altima SE-R. Then came the atrocious redesign in 2006. To make matters worse, they eliminated the 6-speed manual from the sedan altogether. Sad. So sad. :(
nate 5pts Look like hyundai is gonna get even more customers. Nissan is foolish for pricing this mediocre car so high. WA wa wa.
dhenley219 5pts Why would anybody buy that fwd when you can Mustang v6/gt Camaro /v6Challager /v6 with more HP better gas mpg to go with it? Trust me the ALTCoupe is not selling. I can't remember the last time I saw one. They are cheap on the used car lots.
Goober 5pts Wow. Why would anyone buy a 3.5 Altima six speed coupe for 31K when you can get a 3.5 Accord 6 speed coupe for 27K? And its a better car to boot!
HappyGenesisC.Owner 5pts Why would people pay that much of money to buy the Altima Coupe when you can buy a sexier, sportier, more powerful, better interior, and RWD Genesis Coupe for a similar price???
Beard 5pts Oops, I should read a little more carefully before posting. I was wrong about the starting price of the coupe.
Beard 5pts How long will they let this one sit unchanged? and, almost 430k STARTING for the coupe?!?! WTF?
Mynamehere 5pts I had 2003 generation of this as my first car... I loved it but meh... the direction they took after so is so boring and getting way too old now... what makes this thing still sell?
fulllmonte 5pts That's what happens when you switch sentences mid-stream....meant "long in the tooth."
static1986 5pts man this cars are not good i traded in my 95 cutlass cutlass supreme for a 2008 altima and it was always in the shop and it burned oil so i ended up trading it in on malibu and i havent had a issue yet


text:
Technical Progress and Labour Demand in Swedish Manufacturing Firms
No abstract is available for this item.
If you experience problems downloading a file, check if you have the proper application to view it first. In case of further problems read the IDEAS help page. Note that these files are not on the IDEAS site. Please be patient as the files may be large.
As the access to this document is restricted, you may want to look for a different version under "Related research" (further below) or search for a different version of it.
Volume (Year): 8 (2008)
Issue (Month): 2 (June)
Pages: 147-167
Handle: | RePEc:kap:jincot:v:8:y:2008:i:2:p:147-167 |
Contact details of provider: | Web page: http://springerlink.metapress.com/link.asp?id=105724 |
References listed on IDEAS
Please report citation or reference errors to , or , if you are the registered author of the cited work, log in to your RePEc Author Service profile, click on "citations" and make appropriate adjustments.:
- R Blundell & Steven Bond, .
"Initial conditions and moment restrictions in dynamic panel data model,"
Economics Papers
W14&104., Economics Group, Nuffield College, University of Oxford.
- Blundell, Richard & Bond, Stephen, 1998. "Initial conditions and moment restrictions in dynamic panel data models," Journal of Econometrics, Elsevier, vol. 87(1), pages 115-143, August.
- Blundell, R. & Bond, S., 1995. "Initial Conditions and Moment Restrictions in Dynamic Panel Data Models," Economics Papers 104, Economics Group, Nuffield College, University of Oxford.
- Richard Blundell & Steve Bond, 1995. "Initial conditions and moment restrictions in dynamic panel data models," IFS Working Papers W95/17, Institute for Fiscal Studies.
- Milner, Chris & Wright, Peter, 1998. "Modelling Labour Market Adjustment to Trade Liberalisation in an Industrialising Economy," Economic Journal, Royal Economic Society, vol. 108(447), pages 509-28, March.
- Damien NEVEN. & Charles WYPLOSZ, 1996.
"Relative Prices, Trade and Restructuring in European Industry,"
Cahiers de Recherches Economiques du Département d'Econométrie et d'Economie politique (DEEP)
9615, Université de Lausanne, Faculté des HEC, DEEP.
- Neven, Damien J & Wyplosz, Charles, 1996. "Relative Prices, Trade and Restructuring in European Industry," CEPR Discussion Papers 1451, C.E.P.R. Discussion Papers.
- Nickell, Stephen & Wadhwani, Sushil, 1991.
"Employment Determination in British Industry: Investigations Using Micro-data,"
Review of Economic Studies,
Wiley Blackwell, vol. 58(5), pages 955-69, October.
- Nickell, Stephen & Wadhwani, Sushil B, 1989. "Employment Determination in British Industry: Investigations Using Micro-Data," CEPR Discussion Papers 320, C.E.P.R. Discussion Papers.
- Alwyn Young, 1991. "Learning by Doing and the Dynamic Effects of International Trade," NBER Working Papers 3577, National Bureau of Economic Research, Inc.
- Hine, Robert C & Wright, Peter W, 1998. "Trade with Low Wage Economies, Employment and Productivity in UK Manufacturing," Economic Journal, Royal Economic Society, vol. 108(450), pages 1500-1510, September.
- Revenga, Ana, 1997. "Employment and Wage Effects of Trade Liberalization: The Case of Mexican Manufacturing," Journal of Labor Economics, University of Chicago Press, vol. 15(3), pages S20-43, July.
- Arellano, Manuel & Bover, Olympia, 1995.
"Another look at the instrumental variable estimation of error-components models,"
Journal of Econometrics,
Elsevier, vol. 68(1), pages 29-51, July.
- M Arellano & O Bover, 1990. "Another Look at the Instrumental Variable Estimation of Error-Components Models," CEP Discussion Papers dp0007, Centre for Economic Performance, LSE.
- Arellano, Manuel & Bond, Stephen, 1991.
"Some Tests of Specification for Panel Data: Monte Carlo Evidence and an Application to Employment Equations,"
Review of Economic Studies,
Wiley Blackwell, vol. 58(2), pages 277-97, April.
- Tom Doan, . "RATS program to replicate Arellano-Bond 1991 dynamic panel," Statistical Software Components RTZ00169, Boston College Department of Economics.
- Young, Alwyn, 1991. "Learning by Doing and the Dynamic Effects of International Trade," The Quarterly Journal of Economics, MIT Press, vol. 106(2), pages 369-405, May.
- Petri Rouvinen, 2002. "R&D-Productivity Dynamics: Causality, Lags, and "Dry Holes"," Journal of Applied Economics, Universidad del CEMA, vol. 0, pages 123-156, May.
- Frank Windmeijer, 2000. "A finite sample correction for the variance of linear two-step GMM estimators," IFS Working Papers W00/19, Institute for Fiscal Studies.
- Greenaway, David & Hine, Robert C. & Wright, Peter, 1999. "An empirical assessment of the impact of trade on employment in the United Kingdom," European Journal of Political Economy, Elsevier, vol. 15(3), pages 485-500, September.
- Niven Winchester & David Greenaway & Geoffrey V. Reed, 2006. "Skill Classification and the Effects of Trade on Wage Inequality," Review of World Economics (Weltwirtschaftliches Archiv), Springer, vol. 142(2), pages 287-306, July.
- Paul, Catherine J Morrison & Siegel, Donald S, 2001. " The Impacts of Technology, Trade and Outsourcing on Employment and Labor Composition," Scandinavian Journal of Economics, Wiley Blackwell, vol. 103(2), pages 241-64, June.
- Michael Landesmann & Sebastian Leitner & Robert Stehrer, 2001. "Trade Liberalization and Labour Markets: Perspective from OECD Economies," wiiw Working Papers 20, The Vienna Institute for International Economic Studies, wiiw.
- Michael Peneder, 2003. "Industry Classifications: Aim, Scope and Techniques," Journal of Industry, Competition and Trade, Springer, vol. 3(1), pages 109-129, March.
- Matthew J. Slaughter & Phillip Swagel, 1997. "Does Globalization Lower Wages and Export Jobs?," IMF Economic Issues 11, International Monetary Fund.
- Mariacristina Piva & Marco Vivarelli, 2005.
"Innovation and Employment: Evidence from Italian Microdata,"
Journal of Economics,
Springer, vol. 86(1), pages 65-83, October.
- Piva, Mariacristina & Vivarelli, Marco, 2003. "Innovation and Employment: Evidence from Italian Microdata," IZA Discussion Papers 730, Institute for the Study of Labor (IZA).
- Filip Abraham & Ellen Brock, 2003. "Sectoral employment effects of trade and productivity in Europe," Applied Economics, Taylor & Francis Journals, vol. 35(2), pages 223-238.
- Jansen, Marion, 2000. "International trade and the position of European low-skilled labour," WTO Staff Working Papers ERAD-2000-01, World Trade Organization (WTO), Economic Research and Statistics Division.
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text:
XNA Game-Themed CS1 Examples (XGC1) | |
Release 2.0 (XNA V3.1) |
1. Obtain the example code
When the game starts, you'll see a screen that
looks similar to this:
This program is extremely similar to the program featured in the previous tutorial - the only visible difference is that there's now a small basketball moving along the path that has been plotted out by the soccer balls. Internally, we've also set up a couple of new functions to make our programming easier.
Note that while this tutorial does demonstrate a very cool, and very useful game-programming technique, it doesn't do anything new with loops.
2. Examining The Program:
Let's examine the
C# source code that produces the behavior we see on-screen
// Create the plotting basketball m_SinBasketBall = new XNACS1Circle();m_SinBasketBall.Center = new Vector2(0.0f, BALL_INIT_Y);m_SinBasketBall.Radius = BALL_RADIUS * 2.0f; // twice the size of the soccer balls on the plotm_SinBasketBall.Texture = "BasketBall"; |
#region compute the position of the plotting-basketballm_SinBasketBall.AddToDrawSet(); // make sure it will be drawnfloat newX = (m_SinBasketBall.CenterX + X_SPEED) % World.WorldMax.X; float xInRad = ComputeRadianFromXPos(newX); m_SinBasketBall.CenterX = newX; m_SinBasketBall.CenterY = ComputeSineYPos(xInRad); #endregion |
float xInRad = ComputeRadianFromXPos(newX);
<summary> /// Access the instance variables: /// m_Freqwuency /// World.WorldMax.X /// and compute an angle (in radian) where m_Frequency number of revolusion can be /// fitted into the World.WorldMax.X space. /// </summary> /// <param name="xPos">a position</param> /// <returns>Angle in radian</returns> private float ComputeRadianFromXPos(float xPos) { return ((xPos / World.WorldMax.X) * (2.0f * ((float)Math.PI)) * m_Frequency); } |
from the previous tutorial.
However, now that this is a function, we can use it in several different
places (instead of just one). Not only is this convenient, but it also
makes the code easier to understand - rather than worrying about the details
of this in the UpdateWorld function, we can just call
ComputeRadianFromXPos, instead.
<summary> /// Access the instance variable: /// m_Amplitude /// and Constant: /// BALL_INIT_Y /// to compute the y-position on the the since curve /// </summary> /// <param name="xInRadian">x value (in radian)</param> /// <returns>y position</returns> private float ComputeSineYPos(float xInRadian) { return BALL_INIT_Y + (m_Amplitude * ((float)Math.Sin(xInRadian))); } |
from the previous tutorial. Creating a function to compute this for us gives us the same advantages as we gained by creating the ComputeRadianFromXPos.


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A Global Paradigm Shattered: The Jurisdictional Nihilism of the Supreme Court's Abduction Decision in Alvarez-MachainAndrew L. StraussWidener University - School of Law January 1, 1994 Temple Law Review, Vol. 67, No. 4, January 1994 Abstract: In the United States v. Alvarez Machain, the United States Supreme Court held that the United States could exercise criminal jurisdiction over a Mexican doctor who was abducted by agents of the American government from his office in Mexico and transported to the United States. As the Court's first international law decision after the end of the cold war, this case set the stage for how it would approach the domestic application of international law in the post cold war era. Despite the importance of the case, the Supreme Court failed to articulate the conceptual understanding of the relationship between the domestic and international orders which led it to disregard international law. Working from the author's own positivist theory of the relationship between the domestic and international realms, he explains why the decision lacks conceptual coherence and offers a structured analysis which leads to the conclusion that the Court should have applied the international law of jurisdiction. Number of Pages in PDF File: 49 Keywords: international law, jurisdiction, abduction JEL Classification: K33, K14 Date posted: May 8, 2008Suggested CitationContact Information
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Your skill will accomplish what the force of many cannot |
PerlMonks |
Reaped: Re^3: OLE - updating a chart in an excel spreadsheetby NodeReaper (Curate) |
on Oct 13, 2012 at 00:33 UTC ( #998804=note: print w/ replies, xml ) | Need Help?? |
This node was taken out by the NodeReaper on Oct 16, 2012 at 12:59 UTC You may view the original node and the consideration vote tally.
In Section
Seekers of Perl Wisdom


text:
Version Control Software
J2EE Industry Management Tool Will allow web based (Facelet) ant compile/build/deploy script generator and runner unsing a JCR content repository for managing J2EE components in a project environnement. Maybe a little of all this soon...
1 weekly downloads -
The Daisy CMS project Daisy is an open source, Java-based content management framework consisting of a stand-alone HTTP/XML accessible content repository with strong search functionalities and a Web-based, Wiki-like editing and publishing user interface.
0 weekly downloads


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Welcome to the # 1 Self-Study CEU Program for the Recreational Therapist!
Self-Study CEUs | Need 50 CEUs | Testimonials | About Danny Pettry | Free Stuff | Books & Games
Dear Rec. Therapist:
Do you know how some Rec. Therapists need to earn continuing education credits for certification, state licensure, or agency requirements? Danny Pettry offers self-study courses for the Rec. Therapist to earn Continuing Education Units.
Join Danny Pettry's Rec. Therapy Today email newsletter and you'll also get a FREE one clock hour of continuing education from Danny Pettry's program.


text:
What does NNI mean in Non-Profit Organizations?
This page is about the meanings of the acronym/abbreviation/shorthand NNI in the Community field in general and in the Non-Profit Organizations terminology in particular.
Find a translation for NNI in other languages:
Select another language:
Discuss this NNI abbreviation with the community:
Use the citation below to add this abbreviation to your bibliography:
"NNI." Abbreviations.com. STANDS4 LLC, 2015. Web. 3 Mar. 2015. <http://www.abbreviations.com/term/206306>.
NNI also stands for:
- Namutoni, Namibia
- National Nanotechnology Initiative
- Native Nations Institute
- Nearest Neighbor Interactions
- Net National Income
... and 17 more »
Nearby & related abbreviations:
Alternative search:
- Search Narcolepsy Network, Inc. on Amazon
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text:
United Television Broadcasting
This employer has taken extra steps to respond to reviews and provide job seekers with accurate company information, photos, and reviews. Interested for your company?Learn More.
Profile Unclaimed
United Television Broadcasting Reviews
United Television Broadcasting 1 1 Review
Recommend to a friend
Approve of CEO
Shigeto Terasaka
0 Ratings
"good company "
- Senior Management
I worked at United Television Broadcasting full-time (more than 8 years)
Prosi tried to improve my carrier throw this company.and i got the creative things from their
Consi was post production head.and creative associates also
Advice to ManagementAdvicei can handle any technical .production .post production.creative works
United Television Broadcasting Awards & Accolades
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Unlock Profile Website www.utbhollywood.com
Headquarters Los Angeles, CA
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Industry Media
Revenue $5 to $10 million (USD) per year
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text:
"When we saw that it was possible to have playing cards made with pictures on them, we thought "What a great idea for a gift!" We ordered a set as a gift for our son and daughter-in-law with a photo of their two cats on the front. While placing the order, we decided we would also like a set of cards like that so we ordered them for ourselves with a photo of our cat on them. The cards just arrived and we absolutely love both sets! Shutterfly did a wonderful job with the pictures, covering the entire face of the cards, and the cards came in a plastic case to keep them protected. Seeing the pictures of our sweet cat on the cards makes us smile. We know our children will love their gift!"
"This is my third deck of playing cards ordered from Shutterfly. I love being able to create a custom deck of playing cards using my own photos. Shutterfly's decks of cards are generally high-quality, producing the kind of heavy paper, glossy cards one would expect when buying a high-quality, generic deck of cards in the store. I'd have given this product five stars, but I've noticed several slight imperfections around the edges of a few cards where the photo was sealed to the card."
"I ordered these for my Dad a week before father's day, estimated shipping said they wouldn't arrive until the Wednesday afterwards. They came in so quickly (the Friday before father's day) and were absolutely perfect. Nice glossy photos, cards are sturdy, and they come in a clear carrying case."
"I love these playing cards! We are a card playing family and these cards are not only durable but beautiful! My pictures came out clear and look wonderful. I will continue to buy a new set each year!!!"
"I am so thrilled with these decks of cards! I ordered 4 sets and was able to personalize them with pictures of each family that I vacation with with my own photos that I've taken over the years. I cannot wait to see the others reactions when they receive them."


text:
New procedure for GERD at St. Joseph's
St. Joseph's Area Health Services and Innovis Health Park Rapids have partnered up to bring surgery without a scalpel to patients suffering from severe heartburn or gastroesophageal reflux disease (GERD).
Dr. Daniel Smith has received training and is the first surgical expert in the region to make this new medical advancement available to patients.
Are you a newspaper subscriber but you don't have a Digital Access account yet? https://secure.forumcomm.com/?publisher_ID=40&event=subscriber/lookup.
You will need your subscription account number and phone number. Not sure if you have an account? Email us at email@example.com and we can help you.


text:
TAYLOR McFERRIN - Early Riser
While we collectively wait for Flying Lotus' You're Dead! to be fully unveiled, take a listen to this underappreciated recent Brainfeeder release, as McFerrin's programmed-but-played, wonky-yet-sleek, collaborations-friendly approach is a perfect fit for the label while still managing to put his own distinct personality into the proceedings.
"A new breed of jazz-influenced musicians are seeing fit to explore the music's once seemingly endless possibilities, developing a new vocabulary that incorporates myriad contemporary styles and ideas alongside the traditional notions of what jazz could or should be. Making a clear point to distance himself from the a cappella work for which his father is most famous, the younger McFerrin shrouds his compositions on Early Riser in a wide range of contemporary and throwback sonic textures that simultaneously look to the past for inspiration and the future for direction. Largely eschewing vocals, McFerrin lets his instrumental chops do the talking, crafting lush soundscapes via his various keyboards within which he then incorporates a number of hip hop-indebted touches. Skittering beats, odd synth textures and hushed, bedroom vocals all compete for supremacy, entering and exiting the mix in a gauzily lysergic manner that lends the music an organic, undulating feel." - PopMatters


text:
You won't be able to dismiss this by usual means (escape or click button), but you can close it programatically based on user choices or actions.
"We went very simple with this design - solid backing, and normal corners. The result is beautiful! The image we chose came out crisp, and the color is spot-on. The paper is high quality too."
"The designer edited the color design on the back to exactly what I asked and even offered another option to choose from. We have the back with Navy and Yellow and the colors look like natural paint. The paper thickness was nice as well, and we got our to look like a ticket. I got so many compliments about the design."
"Easy to use, great communication. I had questions and was able to get help almost immediately with online help. The quality was fantastic and I even got a hand written thank you. Really enjoyed working with this company and would highly recommend."
"Our save-the-date cards turned out to be fabulous! I loved the cute, casual design and it was easy to format our photo to go along with the template text & placement. I added an extra line of text ("formal invitation to follow") and WPD had no trouble accommodating my request. Great quality too - highly recommended!"
"I ordered the sample first, so I already knew what to expect, but these cards are beautiful and such good quality! I am very pleased with my purchase! If I weren't getting invitations through my venue, I would definitely be heading back here!"


text:
Definition of cavalero
n. - Alt. of Cavaliero
The word "cavalero" uses 8 letters: A A C E L O R V.
No direct anagrams for cavalero found in this word list.
Words formed by adding one letter before or after cavalero (in bold), or to aacelorv in any order:
s - cavaleros
List all words starting with cavalero, words containing cavalero or words ending with cavalero
All words formed from cavalero by changing one letter
Other words with the same letter pairs: ca av va al le er ro
Browse words starting with cavalero by next letter
Previous word in list: cavalcades
Next word in list: cavaleros
Some random words: duad ikon ibex soke eglomise jacinth juba
This is not a dictionary, it's a word game wordfinder.
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text:
Categories 7-Day Forecast First Alert Doppler Weather Cameras Humidity 96% Winds 4.6mph View Full Forecast › 21° Colorado Springs ›
Categories 7-Day Forecast First Alert Doppler Weather Cameras Humidity 92% Winds 11.5mph View Full Forecast › 25° Pueblo ›
Union says Denver officers ordered not to wear riot gear DENVER (AP) - Denver's police union says officers' safety is being compromised by orders not... Read Story ›
Thursday Weather: Sunny & Warm (Rinse & Repeat) Colorado Springs hit 60 degrees on Wednesday afternoon. Pueblo warmed to 62 degrees. Those Wednesday... Read Story ›
UNLV hires high school football coach LAS VEGAS (AP) - Bishop Gorman High School coach Tony Sanchez is set to take... Read Story ›
Slum study sought for Lower Westside PUEBLO - Pueblo City Council is expected vote tonight on proposed resolution asking the Pueblo... Read Story ›
Pueblo County records first death from flu A person has died from influenza in Pueblo County, according to Public Health officials. 60... Read Story ›
Union says Denver officers ordered not to wear riot gear DENVER (AP) - Denver's police union says officers' safety is being compromised by orders not... Read Story ›
1 year 4 months ago Trinidad man killed in motorcycle accident LAS ANIMAS COUNTY - No one had seen or heard from Allen Manarik since Sunday. Troopers with the Colorado State Patrol found the body of the 71-year-old Trinidad man near a wrecked 2011 Kawasaki Ninja motorcycle along a rural stretch of CO HWY 12, roughly six miles past the town... Read Story › Share: Facebook Twitter Google Plus
5 years 1 month ago 71 year old arrested in dog abuse case A 71 year old woman was arrested on Friday after pulling a rifle on a sheriff's deputy whom she thought was attempting to take away her dogs. Norma Scott faces charges of assault on a peace officer and obstruction of a peace officer. On Friday, the deputy was sent... Read Story › Share: Facebook Twitter Google Plus
Play Black Forest Selects New Fire Chief Play Air Academy Hockey, Athlete of the Week Play Thousands of kids in need this Christmas Play Improving Stormwater drainage in Colorado Springs Play K9 coming to Canon City Police Dept. Play Report released about safety lapse in Pueblo abuse case Play Pit Bull Trial Play Your Healthy Family Play Pit bull released and reunited with his family Play Caught On Cam: Fiery Rescue Play Santa Delivers A Miracle Play New hospital gown gives full coverage Play City Council and Mayor Bach Battle over Budget Play Urban Renewal hopeful for city loan Play PD: Vandals do over $40K in damage to Pueblo school Play StopFraudColorado.gov targets scammers 1 2 3 4


text:
Category:Province of Cagliari
From Wikimedia Commons, the free media repository
This category has the following 8 subcategories, out of 8 total.
* |
N cont.T |
Pages in category "Province of Cagliari"
This category contains only the following page.
Media in category "Province of Cagliari"
The following 23 files are in this category, out of 23 total.


text:
Symbol: | 3MSSP |
Status: | Active |
IPO Date: | Jul 16, 2011 |
Genre: | Comedy |
MPAA Rating: | n/a |
Phase: | Development |
Release Date: | n/a |
Gross: | n/a |
Theaters: | n/a |
Will Ferrell and Mark Wahlberg reunite for the comedy Three Mississippi. They head neighboring families that play in an annual game of tackle football on Thanksgiving in a rivalry that's become heated over the years. Sean Anders directs from a script by Robert Carlock and Scott Silveri.
Warner Bros.
Three Mississippi (3MSSP)
Change TodayCurrent Value
Shares Held Long on HSX: 96,400,996
Shares Held Short on HSX: 7,864,203
Trading Volume on HSX (Today): 250,000
This Week | H$0.17 | H$0.01 |
This Month | H$0.22 | H$0.01 |
This Season | H$0.29 | H$0.01 |
This Year | H$2.69 | H$0.01 |
What is a: MovieStock®, Status, Change Today
Think you have what it takes to manage a Movie Fund? If you have a portfolio worth over H$100 million, then submit your fund idea proposal to email@example.com.


text:
From $39 / night
Hide Property Details
- 1 bedrooms
- 1 bathrooms
- Sleeps 3
- Apartment
Description from the manager
Relax and enjoy the newest addition to our executive property rentals at this contemporary condo close to the falls. Outfitted with all the creature comforts you're used to having at home including, six full sized appliances, high definition LCD TV, butter soft leather seating and more. You're sure to enjoy this executive condo only minutes from the falls and attractions. Please note that phone service requires the use of a laptop computer to be brought by you or one of your guests. Just bring your personal belongings as this condo has everything you need to ensure your comfort!
Please call us about our discounted rates for long term travel. ...Read more
Jr. Prime Minister - Weekly Rates Save 35%!
Niagara Falls, Ontario, Canada
What's Nearby:
Additional Location Information
Located in the heart of Niagara Falls. Niagara Falls is one of the 'hundred places to see before you die.' There are many attractions to explore, have a blast on Clifton Hill, a street of excitement for parties of all ages and just a short walk from the falls which will not fail to awe! Enjoy indoor nature at the Bird Kingdom and Butterfly Conservatory , or make splash in the city's indoor water parks.
More About This Location
City vacations, Rural retreats, Warm winter getaways
Getting There
Car is not necessary
- Towels Provided
- Clothes Dryer
- Washing Machine
- Local Guides/Maps
- Safe
- Central heating
- Linens Provided
- A/C or climate control
- Iron
- Alarm Clock
- Housekeeping Optional
- Long term rentals allowed (over 1 month)
- Internet Access
- Parking
- Refrigerator
- Stove or Oven
- Paper Towels Provided
- Toaster
- Microwave
- Freezer
- Dishwasher
- Stereo or CD player
- Television
- Satellite or cable TV
- Pet friendly - yes
- Smoking allowed - no
- Suitable for children - yes
- Suitable for the elderly - yes
- Wheelchair accessible - yes
Overall Rating
Also Consider
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text:
Sleeps | 5 |
Bedrooms | 3 |
Bathrooms | 1 |
Half Baths | 1 |
Property type | house |
Minimum Stay | 1 - 3 nights |
The SUFI Apart Hotel is a newly refurbished, Ottoman style building near Blue Mosque and is truly an exquisite gem.
SUFI Apart Suites combines classic historical elements with contemporary style creating the perfect short stay accommodation in Istanbul that reflects today's design values. In keeping with this principle, each of these serviced Istanbul apartments are tastefully interior designed, sumptuously furnished and benefit from state-of-the-art technology on all levels. Spread over three floors, accommodation at the SUFI Apart Hotel comprises of impeccably presented self-contained short stay serviced apartments, some of which are suitable for up to 5 occupants.
Conveniently situated to historic highlights of the old town SULTANAHMET, SUFI Apart Hotel is a short walking distance from Marmara sea side which is great spot for the runners, Blue Mosque, and The Arasta Bazaar. It also benefits from excellent train, light tram underground and bus links. The Byzantine Hippodrome and famous Hagia Sophia and Topkapi Palace can be reached within 5 to 10 minutes. Located in the heart of the ancient Constantinople, SUFI Apart Hotel ensures corporate travellers and visiting guests unrivaled access to some of Istanbul's most sought after cultural, commercial, social, artistic and architectural landmarks, making this the perfect place to rent a serviced short or long stay apartment in Istanbul.
Hotel Exterior SUFI Apart Hotel is ideal for those looking for short term accommodation or a corporate serviced apartment in Istanbul. It is the ideal location for business travellers, holidaying couples, small families as well as tourists who enjoy the energy and vibrant pace of Istanbul life, but seek peace and tranquillity once the day's activities are over.
SUFI Apart Hotel compromises of beautifully furnished, luxury serviced Istanbul apartments which gives an authentic home from home. Our short stay serviced apartments possess comprehensive multi-media platforms including high-speed internet access and the highest quality home entertainment systems.
With a host of markets and supermarkets and famous WENDSDAY's weekly fresh fruit and vegetable open air market on your doorstep, the option of preparing your own culinary delights and eating in couldn't be easier with a high specification, well equipped kitchen with all the necessary appliances.
Whether you are seeking a classy restaurant, a 'celebrity' nightclub, walk through the ancient walls of Justinian, shopping at Arasta Bazaar or antique spotting through the Grand Bazaar, you can comfortably and conveniently pursue any of these favoured interests from the convenience of one of our short stay serviced apartments within our exclusive apart hotel.
We look forward to extending a warm SUFI Apart Hotel welcome to you.
Keywords: Hotel SUFI APART SUITES are well located in a 3 floor building where each floor holds 40sqm. studio apartment with full functioning kitchen dining area as well as a seating area. Through out the summer season you can enjoy the beautiful view from the terrace as well.
I am a third generation member of a family who ran a business of antiques and objects. It was my long dream to create a boutique place and decorate it with one of a kind pieces from my own collection. I love meeting people from around the world and sharing my knowledge of over my country.I myself had been traveling a lot before i started hotel business and today my travel experiences helps me a lot to understand the complete needs and expectations of my guests.
omar farouq tekin purchased this house in 2010
Actually this building was my own house. I lived in there till i received my first child and as she became a toddler I had to move to another place. Almost all my life i lived in the old town of sultanahmet.It is truly a magical place.
imagine everyday you have the full action of a metropolis but at night silence and piece of a sea side village. That's exactly how it is here. Anytime of the day spent time on the beautiful roof top terrace to read your book watch the view and have your beer. Every morning walk 5 minutes from your suite to my boutique hotel to have your buffet breakfast. If you are into exploring the history of Constantinople by all means of it then you are again in the perfect place. You will be able to walk to each historic monument of the ancient city without going into traffic. Parks, museums, sea side running paths, mosques, ancient baths, palaces ancient bazaars all within 10 to 20 minutes walk way. You're gonna love it
Good location close to Blue Mosque and Sultanahmet square. On a quiet side street with a nice selection of small restaurants and shops near. We were there as a family of four with two small children and the staff was very helpful with making reservation, giving recommendations for sites, etc. Highly recommended.
We've stayed 5 nights in SUFI APART and couldnt like it more. The rooms were tastefully decorated, the owner and staff was a delight and the location was unbeatable. I would highly recommend staying here as I will aswell in my next trip to Istanbul
MY property is right in the heart of the old town of SULTANAHMET. All major historic sites such as HAGIA SOFIA, TOPKAPI PALACE, BLUE MOSQUE and BASILICA CISTERN GRAND BAZAAR are within 5 to 15 minutes walk distance. Also very near to the sea side and ancient byzantium walls which creates a perfect view during a morning jogging.Local fresh fruit and veggies market is also taking place every wednesday.
Rate Period | Nightly | Weekend Night | Weekly | Monthly * | Event | ||||
Jan 12 2015 -
Mar 15 2015
3 night minimum stay
Mar 16 2015 -
Nov 1 2015
3 night minimum stay
My Standard Rate
3 night minimum stay
Refundable damage deposit | €200 |
Notes |
giving partys during the stay is not allowed.
getting drunk and disturbing other guests and nieghbouring residents is a reason to be evacuated without any refund or reimbursment smoking is prohibited and if otherwise determeined is a reason to be evacuated without any refund or reimbursment all guests that reserves a studio automatically accepts above mentioned terms and conditions payments can be made via pay pal, hotel's web page's secure payment system or bank transfer |
* Approximate monthly rate. Actual rate will depend on the days of the month you stay.
Payment is usually accepted in the quoted currency (EUR) unless the currency and the amount is specifically agreed in advance with the owner / advertiser.