text:
A plasma treatment system for treating multiple substrates with a plasma. The treatment chamber of the plasma treatment system includes at least one pair of electrodes, typically vertically oriented, between which a substrate is positioned for plasma treatment. Each electrode includes a perforated panel that permits horizontal process gas and plasma flow, which improves plasma uniformity. A process recipe is defined that is effective for removing thin polymer areas, such as flash or chad, attached to and projecting from a polymer substrate.
1. An apparatus for treating substrates with a plasma generated from a process gas, comprising:
a treatment chamber including a processing space, a vacuum port for evacuating said processing space, and a gas port for introducing a process gas into said processing space;
a plasma excitation source capable of generating a plasma from the process gas in said processing space; and
a plurality of electrodes electrically coupled with said plasma excitation source, said electrodes arranged to define a corresponding plurality of processing regions therebetween in the processing space for treating the substrates with the plasma, and each of said electrodes including at least one perforated panel that operates to transfer the process gas and the plasma through each of said electrodes.
2. The apparatus of
3. The apparatus of
4. The apparatus of
5. The apparatus of
6. The apparatus of
a plurality of substrate holders positioned inside said treatment chamber, each of said substrate holders positioned in one of said processing regions, and each of said substrate holders supporting at least one of the substrates.
7. The apparatus of
8. The apparatus of
9. The apparatus of
10. The apparatus of
11. The apparatus of
12. The apparatus of
13. The apparatus of
14. A method of plasma treating a substrate, comprising:
supporting the substrate in a processing region defined inside a treatment chamber between a pair of electrodes;
introducing a process gas into the treatment chamber;
energizing the pair of electrodes to generate a plasma within the treatment chamber from the process gas; and
directing a flow of the process gas and the plasma through a porous portion of each of the electrodes from a location outside the processing region to a pair of locations inside the processing region each defined between one of the electrodes and the substrate.
15. The method of
supporting the substrate between the pair of electrodes with a substrate holder; and
cooling the substrate holder and the substrate while exposed to the plasma.
16. The method of
transmitting the flow of the process gas and the plasma through the perforated panel in each of the electrodes.
17. A method for removing thin attached polymer areas projecting from a polymer substrate, comprising:
supplying a process gas to a treatment chamber holding the polymer substrate, the process gas including a gas mixture containing oxygen and nitrogen trifluoride, and nitrogen trifluoride comprising less than or equal to about 10 percent by volume of the gas mixture;
generating a plasma from the process gas; and
exposing the polymer substrate to the plasma for a time effective to remove the thin attached polymer areas.
18. The method of
transferring power to the process gas in a range of about 4000 watts to about 8000 watts at 40 kHz.
19. The method of
heating the polymer substrate to a process temperature above ambient temperature.
20. The method of
heating the polymer substrate to a process temperature in the range of about 30� C. to about 90� C.
21. The method of
supporting the polymer substrate in thermal contact with a substrate holder; and
cooling the substrate holder with a coolant flow to remove heat transferred from the plasma to the polymer substrate.
22. The method of
positioning the polymer substrate in a processing region defined between a pair of electrodes; and
transferring the plasma and the process gas through a perforated panel in each of the pair of electrodes to the processing region.
23. The method of
cooling the electrodes with a coolant flow to reduce heat transferred from the electrodes to the polymer substrate.
24. The method of
25. The method of
changing the gas mixture such that nitrogen trifluoride comprises greater than or equal to about 90 percent by volume of the process gas; and
exposing the polymer substrate to the plasma for a time effective to remove the residue.
26. The method of
27. The method of
This application is a continuation of Serial No. PCT/US2004/032973 filed on Oct. 6, 2004 which claims the benefit of U.S. Provisional Application No. 60/515,039 filed on Oct. 28, 2003, and the disclosures of which are hereby incorporated by reference in their entirety herein.
The invention relates generally to plasma processing, and more particularly to a plasma treatment system configured to treat substrates.
Plasma treatment is commonly used to modify the surface properties of substrates used in applications relating to integrated circuits, electronic packages, and printed circuit boards. In particular, plasma treatment is used in electronics packaging, for example, to increase surface activation and/or surface cleanliness for eliminating delamination and bond failures, improving wire bond strength, ensuring void free underfilling of chips on circuit boards, removing oxides, enhancing die attach, and improving adhesion for die encapsulation.
Typically, one or more substrates are placed in a plasma treatment system and a surface of each substrate is exposed to generated plasma species. The outermost surface layers of atoms are removed by physical sputtering, chemically-assisted sputtering, and chemical reactions promoted by the plasma. The physical or chemical action may be used to condition the surface to improve properties such as adhesion, to selectively remove an extraneous surface layer, or to clean undesired contaminants from the substrate's surface.
Conventional batch plasma treatment systems exist in which both sides of multiple large panels of material are plasma treated. Each of the panels is positioned between a pair of planar electrodes, which are energized with a suitable atmosphere present in the treatment chamber of the treatment system to generate a plasma. In such plasma treatment systems, one factor affecting the degree of etch uniformity is the spatial uniformity of the plasma density adjacent to the substrate, which is dictated by the design of the electrodes used to create the plasma. Solid planar electrodes produce a uniform plasma but cannot provide adequate gas flow so that the etch rate may be unacceptably low. Therefore, conventional solid electrodes in batch treatment chambers have failed to provide adequate process uniformity across opposite sides of large planar substrates. The plasma density must be precisely and accurately controlled at all spatial positions surrounding both sides of each substrate to provide etch uniformity on both surfaces.
There is thus a need for a plasma treatment system that can uniformly plasma treat both sides of planar substrates each characterized by a large surface area.
The invention addresses these and other problems by providing a plasma treatment system that includes a vacuum chamber with a processing space, a vacuum port for evacuating the processing space, and a gas port for introducing a process gas into the processing space. The system further includes a plasma excitation source capable of generating a plasma from the process gas in the processing space and a plurality of electrodes electrically coupled with the plasma excitation source. The electrodes are arranged to define a corresponding plurality of processing regions therebetween in the processing space for treating substrates with the plasma. Each electrode includes at least one perforated panel that operates to transfer the process gas and the plasma through the electrode.
The invention contemplates that the plasma treatment system may be used to plasma treat substrates composed of a wide range of materials, including but not limited to ceramics, metals, and polymers. The plasma treatment may consist of etching, cleaning, surface activation, and any other type of surface modification apparent to a person of ordinary skill in the art. For example, the plasma treatment may be used to etch a substrate as part of a standard lithography and etch process for forming features in the substrate.
In another embodiment of the invention, a method of plasma treating a substrate includes positioning the substrate between a pair of electrodes situated inside a treatment chamber, introducing a process gas into the treatment chamber, and energizing the pair of electrodes to generate a plasma from the process gas within the treatment chamber. The method further includes directing a flow of the process gas and the plasma through a porous portion of each of the electrodes from a location outside the processing region to a pair of locations inside the processing region each defined between one of the electrodes and the substrate.
In yet another embodiment of the invention, a method is provided for removing relatively thin attached areas of polymer, such as chad or flash, projecting from a polymer substrate. The method includes supplying a process gas to a treatment chamber holding the polymer substrate characterized by a gas mixture including oxygen and nitrogen trifluoride in an amount of less than or equal to about 10 percent by volume of the gas mixture, transferring RF power to the process gas to generate a plasma, and exposing the polymer substrate to the plasma for a time effective to remove the thin attached polymer areas. In specific embodiments, RF power is transferred to the process gas in a range of about 4000 watts to about 8000 watts at 40 kHz. In other specific embodiments, the polymer substrate is heated to a process temperature in the range of about 30� C. to about 90� C. Preferably, the gas mixture includes about 5 percent by volume to about 10 percent by volume of nitrogen trifluoride and the balance of the gas mixture is oxygen.
These and other objects and advantages of the present invention shall become more apparent from the accompanying drawings and description thereof.
The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate embodiments of the invention and, together with a general description of the invention given above, and the detailed description given below, serve to explain the principles of the invention.
FIGS. 8A-D are end views of one of the substrate holders, shown in
With reference to
The treatment chamber 12 is evacuated through a vacuum port 19 by vacuum pump 18 that may comprise one or more vacuum pumps apparent to a person of ordinary skill in the art of vacuum technology. Process gas is admitted to the processing space 16 from a process gas source 20 through an inlet gas port 21 extending through one wall of the treatment chamber 12 at a predetermined flow rate, such as about 2 to about 4 standard liters per minute (slm). The process gas flow is typically metered by a mass flow controller (not shown). The flow rate of gas provided by the mass flow controller and the pumping rate of vacuum pump 18 are adjusted to provide a processing pressure suitable for plasma generation so that subsequent plasma processing may be sustained.
The processing space 16 is evacuated simultaneously with the introduction of the process gas so that fresh gases are continuously exchanged within the processing space 16. During a plasma treatment process, contaminant species sputtered from a planar substrate 26 and spent process gas will be evacuated from processing space 16 by the vacuum pump 18 along with a portion of the flowing stream of process gas. Operating pressures during plasma treatments within the treatment chamber 12 are typically about 150 mTorr to 300 mTorr.
The planar substrates 26 described herein may have features projecting therefrom or embossed therein and are not limited to feature-less planar panels. In addition, the planar substrates 26 are not limited to being rectangular in area but, instead, may have other geometrical shapes.
With continued reference to
The RF power supply of RF generator 22 may be a dual output power supply such that alternating electrodes 24 are bussed together and provide power at 180� out of phase with the remaining electrodes 24, which are also bussed together. This arrangement improves on certain conventional designs in which alternating electrodes were powered and the remaining electrodes were grounded, which produced higher etch rates on the side of the planar substrate adjacent to the powered electrode. As both electrodes 24 are powered in accordance with the invention, the etch rate is similar on the opposite sides of one or more planar substrates 26 positioned between a pair of the electrodes 24.
With continued reference to
The wheeled cart 32 includes a track 34 along which the rack 28 is horizontally movable and that is at approximately the same vertical height as a corresponding track 36 inside the treatment chamber 12. After a group or batch of planar substrates 26 is loaded into the rack 28, the chamber door 14 is opened and the rack 28 is positioned so that tracks 34 and 36 are registered. Rack 28 is transferred from the track 34 of the wheeled cart 32 to the track 36 inside treatment chamber 12 and the chamber door 14 is closed to provide a sealed environment ready for evacuation by vacuum pump 18.
With reference to
Each electrode 24 includes at least one perforated panel 42 of, for example, metallic mesh filling an otherwise open space 40. Each perforated panel 42 is characterized by a porosity represented by a ratio of the total cross-sectional area of passageways or apertures 43 in the perforated panel 42 to the total area of the perforated panel 42. In a specific embodiment of the invention, each electrode 24 includes an annular peripheral frame 44 with a plurality of vertical cross members 46 extending from one horizontal side of the frame 44 to the opposite horizontal side of the frame 44. One perforated panel 42 is positioned in the space defined between each pair of cross members 46 and in the spaces between the cross members 46 at the extrema (i.e., frontmost and rearmost) of the set of cross members 46 and the corresponding opposite vertical sides 44 a, 44 b of the frame 44.
Each perforated panel 42 defines a flow path for process gas and plasma species into and between the regions 38 between adjacent electrodes 24. Typically, the ratio of the collective cross-sectional area of the apertures 43 in each perforated panel 42 to the total area of each perforated panel 42 (i.e., the open area ratio) is less than about 20%. Preferably, the open area ratio is adjusted by varying the panel mesh size such that electrode 24 resembles a solid electrode sufficient to simulate a solid electrode and to provide an adequate etch rate without overly restricting gas flow. The mesh size for perforated panel 42 is depicted diagrammatically in the Figures and may be exaggerated (i.e., not to scale) for purposes of illustration.
The mesh size of the individual perforated panels 42 may vary depending upon the position within the electrode 24. For example, the mesh size may be greater for panels 42 near the center of the electrode 24 as compared with panels 42 adjacent to the sides 44 a, 44 b of the electrode 24. This permits the gas conductance to different portions of the region 38 between adjacent electrodes 24 to be adjusted across the width of the electrodes 24 and may be useful for equalizing the etch rate across the width of the flanked substrate 26.
The perforated panel 42 is coupled thermally and electrically with the frame 44 and cross members 46 for efficient heat and current transfer. Preferably, the perforated panel 42 has the same thickness as the frame 44 and cross members 46 so that the electrode 24 has a uniform thickness across its area, as is shown in
The electrodes 24 have a flanking relationship defined as a side-by-side, spaced-apart relationship in which adjacent electrodes 24 are generally parallel. The invention contemplates that, in various alternative embodiments of the invention, the electrodes 24 may be oriented vertically, horizontally or at any angle therebetween.
With continued reference to
The temperature of the electrodes 24 is controlled by circulating distilled water or another suitable heat-exchange liquid through a serpentine passageway 48 winding inside the tubular frame 44 and cross members 46. To that end, the heat-exchange liquid is supplied from a source 45 external to the treatment chamber 12 to an inlet port 47 of the serpentine tubular passageway 48 of each electrode 24 to an outlet port 49 of a coolant drain 50. The heat-exchange liquid can be used to heat or cool the electrodes 24, depending on the desired effect, by regulating the flow rate and temperature of the liquid. Because heat is transferred from the electrodes 24 to the substrates 26, regulation of the temperature of the electrodes 24 may also be used to beneficially regulate the temperature of the substrates 26 during plasma treatment. In certain embodiments of the invention, the circulation of the heat-exchange liquid may remove excess heat from the electrodes 24.
In one aspect of the invention, the rectangular dimensions or area of the electrode 24 is greater than the rectangular dimensions or area of the substrates 26 being plasma treated. In certain embodiments of the invention, the length and width (i.e., outer dimensions) of the rectangular frame 44 of each electrode 24 is at least about one inch (1″) larger than the substrate 26. Adjusting the relative areas of the electrode 24 and substrate 26 aids in ensuring that the plasma treatment about the substrate periphery is similar to the plasma treatment near the substrate center. The electrodes 24 all have equal areas for the opposite rectangular surfaces confronting the flanking substrates 26.
The electrodes 24 are formed from a metal having relatively high electrical and thermal conductivities, such as aluminum. The side surface of the electrode 24 facing the substrate 26 may be coated by a process such as anodization or chemical vapor deposition with an optional layer 51 of a non-metal. The optional non-metal layer 51 is believed to improve the edge-to-center plasma uniformity. The non-metal layer 51 coating the electrically-conductive core of the electrode 24 may have a thickness ranging from about 10 microns (μm) to about 300 microns. Exemplary coating materials include, but are not limited to, refractory materials such as aluminum oxide and silicon. In certain embodiments, the non-metal layer 51 may be applied only to the frame 44 as the edges of the electrode 24 are believed to induce local variations in plasma density, which are significantly reduced or eliminated by the presence of the non-metal layer 51. In certain embodiments of the invention, the non-metal layer 51 may be applied as a laminate to the electrode 24. Adding the non-metal layer 51 may permit the electrode 24 to have an area confronting the substrate 26 that is substantially equal to the substrate area while improving edge-to-center process uniformity and plasma uniformity.
References herein to terms such as �vertical�, �horizontal�, etc. are made by way of example, and not by way of limitation, to establish a frame of reference. It is understood various other frames of reference may be employed without departing from the spirit and scope of the invention. Although the electrodes 24 are referred to as being vertically oriented, the invention contemplates that the electrodes 24 may be oriented horizontally without departing from the spirit and scope of the invention.
In use and with reference to
The process gas and plasma species flow and diffuse through the perforated panel 42 into and between the regions 38 defined between adjacent electrodes 24. Process gas and plasma can likewise flow into regions 38 through the gaps defined about the peripheral edges of the confronting electrodes 24. The presence of the perforated panels 42 promotes the transfer of process gas and plasma species between the regions 38 and from the processing space into the regions 38 associated with the endmost electrodes 24. The substrates 26 are exposed to the plasma for a duration sufficient for treating (i.e., etching, cleaning, patterning, modifying, activating, etc.) the exposed opposite surfaces of the planar substrates 26. After the treatment is completed, the chamber door 14 is opened, the rack 28 is removed from the treatment chamber 12, and the substrates 26 are offloaded.
With reference to
With reference to
Each of the individual substrate holders 52 includes a pair of hollow frames 54, 56 each of which has a fluid passageway 58, 60, respectively, extending about its periphery and through which a heat-exchange liquid like distilled water may be circulated. The circulated heat-exchange liquid cools the substrate holder 52 and, by conduction, removes heat from the substrate 26 for reducing the temperature of the substrate 26 during plasma treatment. The frames 54, 56 define a central rectangular window across which the substrate 26 is exposed to the plasma inside of the treatment chamber 12. The frames 54, 56 may be formed from any material having good thermal conductivity, such as aluminum.
The heat-exchange liquid is transferred through the fluid passageway 58 in frame 54 between a liquid inlet 62 and a liquid outlet 64. The liquid outlet 64 of frame 54 is coupled by a conduit 65 with a liquid inlet 66 of the fluid passageway 60 in frame 56. Fluid passageway 60 includes a liquid outlet 68 for draining the cooling liquid from the substrate holder 52. As a result, frames 54 and 56 share the circulated heat-exchange liquid. The heat-exchange liquid is supplied to the liquid inlet 62 of frame 54 by a supply line 70 extending from a coolant manifold 72 and returned by a drain line 74 to a drain 76. Each of the other substrate holders 52 is configured with the same type of cooling arrangement and shares the coolant manifold 72 and drain 76. Liquid inlet 66, supply line 70, and drain line 74 may be, for example, lengths of flexible Teflon� tubing.
The flow of coolant liquid to the substrate holders 52 may be controlled by measuring the temperature of the substrates 26. If the substrate temperature exceeds a target temperature, a flow of the coolant liquid may be established for cooling the substrates 26.
The hollow frames 54, 56 have a clamping relationship with the outer perimeter of the substrate 26 that provides an efficient heat transfer path. The upper ends of the hollow frames 54, 56 are coupled together by a hinge 78, which preferably has a three-point design so that the hollow frames 54, 56 can move laterally and vertically relative to each other. A cam action opener 80, which is actuated by an opener bar 82 (
The frame 54 of each substrate holder 52 includes multiple locators 84 that cooperate to locate the substrate 26 held by the hollow frames 54, 56. Two locators 84 (
In use and with reference to FIGS. 8A-D in which like reference numerals refer to like features in
After the substrate 26 is positioned between the frames 54, 56, the support stop 83 is pivoted back to its initial position, which allows the frames 54, 56 to close on the substrate 26 so that the perimeter of the substrate 26 is pinched between the frames 54, 56 with contact sufficient to define a good heat transfer path. The weight of the frames 54, 56 maintains the frames 54, 56 in the closed position. A substrate 26 is loaded into each of the substrate holders 52 and the rack 28 a is positioned at a treatment position inside the treatment chamber 12 for plasma treating the substrates 26. The alignment posts 90, 92 contact the adjacent electrodes 24 so that each substrate 26 is in a plane parallel to the planes containing each of the adjacent electrodes 24. A plasma generated in the treatment chamber 12 treats the surfaces of the substrates 26, as described above.
In one specific embodiment of the invention, the plasma treatment consists of a process that removes thin areas or tabs of polymer, such as flash or chad. These thin attached polymer areas may be created, for example, by past manufacturing steps that are attached to the planar substrates. The thin attached polymer areas are significantly thinner than the planar substrate 26. Typically, the attached thin polymer areas are less than about 5 microns thick. Therefore, the plasma treatment effectively and efficiently removes the thin attached polymer areas with a minimal impact on the thickness of the substrate 26. To that end, the plasma is sustained for a processing time or duration adequate to remove the thin attached polymer areas by an anisotropic etching process as ions and radicals in the plasma erode away the thin attached polymer areas while having little impact on the overall thickness of the substrate 26 and without changing any features (e.g., trenches and vias or metallization traces) present on the plasma treated surfaces.
In accordance with an embodiment of the invention, a processing recipe is provided for etching the thin polymer areas attached to the polymer planar substrate. A processing time in the range of about eight (8) minutes to about thirty (30) minutes suffices for removing such thin polymer areas of typical thickness (e.g., 5 microns) without detrimentally affecting the substrate. However, the exact processing time will depend upon multiple different variables including, but not limited to, the number of planar substrates being plasma treated and the precise thickness of the thin attached polymer areas.
The RF power supplied to the electrodes 24 (
Process gas is introduced into the process chamber with a flow rate of between two (2) slm and four (4) slm total to provide an operating pressure in the range of about 150 to about 300 mTorr. The process gas comprises a mixture of nitrogen trifluoride (NF3) and oxygen (O2), with nitrogen trifluoride comprising less than or equal to about 10 vol % of the gas mixture. Preferably, the process gas is a mixture of about 5 vol % to about 10 vol % of nitrogen trifluoride (NF3) and the balance (90 vol % to 95 vol %) being oxygen (O2), wherein the two components total 100 vol % of the process gas mixture. However, inert gases, such as argon (Ar), may be optionally added to the process gas mixture so long as the relative amounts of NF2 and O2 are kept constant. Radicals and ions of fluorine and oxygen present in the generated plasma remove material from the substrate surfaces and, in particular, remove the thin areas of polymer attached to and projecting from the substrate surfaces by forming volatile gaseous species that are evacuated from the processing chamber along with spent process gas.
Although the process recipe is generally applicable for removing thin attached polymer areas from planar substrates composed of a number of polymers, the process recipe is particularly applicable for removing thin areas of attached polymer from planar substrates composed of an ABF polymer. The use of nitrogen trifluoride improves over conventional polymer dry etch recipes that rely on carbon tetrafluoride or other fluoro-hydrocarbons because nitrogen tetrafluoride is less stable and dissociates more readily, which dramatically increases the radical yield in the plasma. A particular feature of the process recipe is that the source gas mixture used for etching lacks carbon. Thin attached polymer areas are also removed without resorting to wet chemical etching techniques. The process recipe of the invention is particularly applicable for removing unwanted thin attached polymer areas from the surfaces of embossed panels, such as double-sided printed circuit boards, because it is critical to start with a defect-free surface in subsequent processing steps, such as applying metallization in the embossed areas.
A residue may be present on the polymer substrate surfaces following the etching process that removes the thin attached polymer areas. In a second step of the process recipe, an atmosphere of a process gas appropriate for removing the residue may be provided for plasma generation without breaking vacuum and, preferably, without extinguishing the plasma. The radicals and ions of the process gas react with the debris to form volatile products that are evacuated from the plasma chamber. The process gas comprises a mixture of nitrogen trifluoride and oxygen, with nitrogen trifluoride comprising greater than or equal to about 90 vol % of the gas mixture. For example, in a situation for which the residue is silicon, the above-described gas mixture used for etching may be changed to about 90 vol % to about 95 vol % of NF3 and the balance (5 vol % to 10 vol %) O2. However, inert gases, such as Ar, may be optionally added to the process gas mixture so long as the relative amounts of NF2 and O2 are kept constant.
While the present invention has been illustrated by a description of various embodiments and while these embodiments have been described in considerable detail, it is not the intention of the applicants to restrict or in any way limit the scope of the appended claims to such detail. Additional advantages and modifications will readily appear to those skilled in the art. The invention in its broader aspects is therefore not limited to the specific details, representative apparatus and methods, and illustrative examples shown and described. Accordingly, departures may be made from such details without departing from the spirit or scope of applicants' general inventive concept. The scope of the invention itself should only be defined by the appended claims, wherein we claim:
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John Cena
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Courtesy of the Cauliflower Alley Club:
Pro wrestling legend Jackie Fargo died Monday at age 85.
One of the most revered figures in Memphis wrestling history, Jackie Fargo had been hospitalized in critical condition in his home since June 15th.
The CAC will have more posted shortly.
The OWW Forum thread is located here:
It was discovered that the current TNA X–Division Champion Samoa Joe had sustained an injury in the finals of the Tag Team Tournament.
This week's ClickWrestle Match of the Week is Alissa Flash vs. Chik Tormenta from July 17, 2014.
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Sony's Tom Hanks' piracy drama sells out in large and small markets and 71% of audience is over 35
Sony's Saturday night sneak previews for "Captain Phillips" suggest the piracy drama is going to be a box office hit — and skew older.
The awards hopeful, which stars Tom Hanks in the fact-based tale of a sea captain whose ship is besieged by Somali pirates, opens nationwide on Friday.
Also read: Sandra Bullock-George Clooney's 'Gravity' Soars to Record $55M Box-Office Blast-Off
The studio reported the sneaks at roughly 800 theaters were at least 75 percent full throughout the country and there were sellouts in major markets New York, Los Angeles, Chicago and Toronto, but also in smaller cities including San Antonio, Minneapolis, Vancouver and Long Beach, California.
The audience was evenly divided between male and female, while a whopping 71 percent was over 35.
Also read: Oscar Shakeup: 'Captain Phillips' Is Up, 'Foxcatcher' Is Out – and What's Up With 'Wolf of Wall Street'?
"We knew this movie was going to be well-received and that's why we got it out there early," Sony's head of distribution Rory Bruer told TheWrap. He wasn't surprised by the movie's older skew.
"We figured (older audiences) might be where it would start, but we're confident that as word gets out, it's going to play with all ages," he said.
Also read: Tom Hanks Works His Magic as Walt Disney in First 'Saving Mr. Banks' Trailer (Video)
The early screenings were intended to help build buzz for "Phillips," and the size of the run shows Sony's confidence in the film.
The only other movie opening wide on Oct. 11 is Open Road Films' R-rated action thriller "Machete Kills."


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The results are published in the January 30 issue of the journal Science Translational Medicine.
"Insulin resistance has emerged as a key metabolic defect leading to Type 2 diabetes and coronary artery disease (CAD)," said Christoph Buettner, MD, PhD, senior author of the study and Associate Professor of Medicine (Endocrinology, Diabetes and Bone Disease). "Someone who regularly binge drinks even once a week, over many years, may remain in an insulin resistant state for an extended period of time, potentially years," said Dr. Buettner.
In this study, researchers treated rats with alcohol for three consecutive days to simulate human binge drinking. A control group received the same amount of calories. Once alcohol was no longer detectable in blood, glucose metabolism was studied through either glucose-tolerance tests or through controlled-insulin infusions. The rats treated with alcohol were found to have higher concentrations of plasma insulin than the control group, suggesting that insulin resistance may have been the cause of the impaired glucose tolerance.
High plasma insulin levels are a major component of the metabolic syndrome, a group of risk factors that occur together and increase the risk for Type 2 diabetes, coronary artery disease, and stroke.
"Previously it was unclear whether binge drinking was associated with an increased risk for diabetes, since a person who binge drinks may also tend to binge eat, or at least eat too much. Our data show for the first time that binge drinking induces insulin resistance directly and can occur independent of differences in caloric intake," said Claudia Lindtner, MD, first author of the study and an Associate Researcher of Medicine, Endocrinology, Diabetes and Bone Disease at the Icahn School of Medicine.
About The Mount Sinai Medical Center
The Mount Sinai Medical Center encompasses both The Mount Sinai Hospital and Icahn School of Medicine at Mount Sinai. Established in 1968, the Icahn School of Medicine is one of the leading medical schools in the United States, and is noted for innovation in education, biomedical research, clinical care delivery, and local and global community service. It has more than 3,400 faculty in 32 departments and 14 research institutes, and ranks among the top 20 medical schools both in National Institutes of Health (NIH) funding and by U.S. News & World Report.
The Mount Sinai Hospital, founded in 1852, is a 1,171-bed tertiary- and quaternary-care teaching facility and one of the nation's oldest, largest and most-respected voluntary hospitals. In 2012, U.S. News & World Report ranked The Mount Sinai Hospital 14th on its elite Honor Roll of the nation's top hospitals based on reputation, safety, and other patient-care factors. Mount Sinai is one of 12 integrated academic medical centers whose medical school ranks among the top 20 in NIH funding and by U.S. News & World Report and whose hospital is on the U.S. News & World Report Honor Roll. Nearly 60,000 people were treated at Mount Sinai as inpatients last year, and approximately 560,000 outpatient visits took place.
For more information, visit http://www.mountsinai.org/.
Find Mount Sinai on:Facebook: http://www.facebook.com/mountsinainyc
Jeanne Bernard | EurekAlert!
Further information:
Further reports about: > Binge Eating > Diabetes > Disease > Medicine > artery disease > binge drinking > coronary artery disease > insulin resistance > risk factor
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B***h He Sacked Up!!!!
by Delyte Delyte
posted Jun 20 2013 12:20PM
This 47 year old Las Vegas man has a scrotum the size of a 4th grader. Women complain about carrying a child for 9 months but Warren has been dealing with this issue for 5 years. This all came from him rolling over in his bed on his sack and 24 hours later they had swollen to the size of a soccer ball. You hear that guys?!?!?! Handle the family jewels with care.
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Important Home Security Systems Advice You Have To Know Home Security Systems Houston
Are you looking for an ideal way to guard your family as well as your home? Many homes these days are protected by security alarms systems, and when you don't have one, it becomes an option that you might want to consider. This short article will provide you with an introduction to points to consider when selecting a security system.
Whenever you move into a brand new home change all of the locks. Whilst the previous homeowner might have given you secrets to your house, there could be an integral out there that someone has. To make sure you are as safe as you can, get brand-new locks for your new house.
Keep lights on in your house or put the stereo on when you are going on vacation. This is important because it makes it appear like someone is there on the house, so burglars will stay away from taking action by using a potential robbery. This will keep your house safe and protected.
Home security systems systems have more features to just being noise alarms. The vast majority of systems will offer an audible alert when someone enters your house. Mainly because they would like to determine the kids have opened a door, this will be significant to parents who may have small kids.
A survey taken by police officials reveals that 85 percent of which believe a house is more protected when built with a security alarm system. Also, 60 percent of attempted burglaries are unsuccessful once the targeted home includes a alarm system. In the event the home includes a alarm system, that is why, property insurance companies give you a discount.
A house home security systems can mean the main difference between as a victim and protecting yourself. Don't be considered a victim: purchase a good system that will alert you in the event of an intruder and keep you, your family as well as your belongings safe. There is nothing much like the feeling of safety which a security alarms system offers. Home Security Systems Houston


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#62. Monticello, Thomas Jefferson's estate in Virginia, was first featured as the vignette on the back of the Series 1928 $2 United States Note.
Apps That Make a Difference
If you're looking for a different kind of charity to donate to, app charities are the perfect way to go. Charity apps make it easy to donate to and track how much you have contributed. Here are five apps that are different than your typical charity:
- Instead – Did you ever think you could change the world with a cup of coffee? With Instead you can do just that. Instead allows you to donate the amount you would spend on your daily cup of designer coffee or a drive-thru lunch to a nonprofit.
- I Can Go Without – I Can Go Without gives users the ability to network with other charitable people to create fundraisers and boost awareness of charities on social media.
- Charity Miles – Love running or biking? Charity Miles is the app for you! Bikers earn 10 cents a mile and walkers and runners earn 25 cents a mile. It's as simple as downloading the app, picking a charity and start moving.
- One Today – Created by Google, One Today has a simple platform and makes it easy donate a dollar a day to causes and nonprofits you pick.
- Donate a Photo – Are you an Instagram junkie? Donate a Photo allows you to share one photo a day and Johnson & Johnson will make a dollar donation to a charity of your choice. The photos are never used for commercial purposes and so far the app has raised $127,000!
These are just a few of the charity apps out there that make it simple to donate to a good cause. There are millions of apps, and thousands of other amazing charity apps.


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Patent statistics backgrounds
From Statistics Explained
Intellectual property rights and in particular patents provide a link between innovation, inventions and the marketplace. Applying for a patent makes an invention public, but at the same time gives it protection. A count of patents is one measure of a country's inventive activity and also shows its capacity to exploit knowledge and translate it into potential economic gains.
In this context, indicators based on patent statistics are widely used to assess the inventive and innovative performance of a country. This article sketches the context and methodology of statistics on patent applications and grants in the European Union (EU) and some other European countries.
An analysis of the most recent EU data can be found in the Statistics explained dedicated to patent statistics.
Data sources and availability
From 2007 onwards, Eurostat's production of European Patent Office (EPO) and United States Patent and Trademark Office (USPTO) data has been based on the EPO Worldwide statistical patent database. This was developed by the EPO in 2005, using their collection and knowledge of patent data.
European patent applications refer to applications filed directly under the European Patent Convention or to applications filed under the Patent Co-operation Treaty (PCT) and designated to the EPO (Euro-PCT), regardless of whether the patents are granted or not. For patent applications to the EPO all direct applications (EPO-direct) are taken into account, but among the PCT applications (applications following the procedure laid down by the PCT) made to the EPO, only those that have entered into the regional phase are counted. Patent applications are counted according to the priority date (the year in which they were filed anywhere in the world) at the EPO and are broken down according to the International patent classification (IPC). Applications are assigned to a country according to the inventor's place of residence, using fractional counting if there are multiple inventors to avoid double counting. To normalise the data, the total number of applications at the EPO is divided by the national population and expressed in terms of patent applications per million inhabitants.
A patent application to the EPO can be valid in several countries and at most in all of the Contracting States of the European Patent Convention. In July 2009, the Convention was in force in 36 countries (all EU Member States plus Switzerland, Iceland, Liechtenstein, Norway, Monaco, San Marino, Croatia, the former Yugoslav Republic of Macedonia and Turkey). In addition to the Contracting States, three other countries (Albania, Serbia and Bosnia and Herzegovina) have concluded an 'extension agreement' with the EPO, by which these states can also be designated in a European patent application.
The falling trend in patent applications in the last years is linked to the length of patenting procedures and should not be interpreted as a real decline in patenting activity. For this reason the 2009 figures in Eurostat's reference database are flagged as provisional or as estimates.
Patent indicators provide a measure of the innovative performance at country, firm or region level. Nevertheless, indicators are criticized as being "outdated". This is due to the fact that information on patent applications is disclosed to the public 18 months or more after priority date. This issue is known as "timeliness". In order to overcome this, Eurostat carried out a study where nowcasting methods have been discussed and developed.
The main purpose of this study it was to do the presentation of the existing methods for nowcasting of patent data to the European Patent Office (EPO) and the proposal of improved methods. An evaluation of these methods has been performed and conclusions regarding the most adequate methods for most of the countries have been drawn.
Moreover, an attempt to apply econometric models for nowcasting patent applications to the EPO was attempted as well as a comparison analysis. The existing econometric models are presented and 6 new models are detailed. A comparison analysis is performed and the strengths and weaknesses of each model is outlined.
In contrast to EPO data, the USPTO data refers to patents granted. Patents are allocated to the country of the inventor, using fractional counting in the case of multiple inventor countries. Comparisons between EPO and USPTO patents data should be interpreted with caution.
What is new?
Eurostat methods for the production of patent statistics
Over the last decade, Eurostat regularly increased and improved the dissemination of patent data with the production of new indicators on economic activities. The core of the work is linked to the European Research Area (ERA), and to the priorities of the Europe 2020 strategy. There is therefore a need to enhance the information available in patent databases.
In that context Eurostat, in collaboration with the Katholieke Universiteit Leuven (K.U. Leuven), developed and implemented several innovative methodologies to be applied on PATSTAT data. They relate to regionalisation of patentee and inventors addresses (according to the NUTS classification), sector allocation and name harmonisation of applicants as well as patenting by SMEs.
Patenting by SMEs Technology development in the EU-27: in search of SMEs contribution
The development of sector allocation methodologies has allowed to discern the large contribution of the business sector in the development of new technologies (measured by means of patent indicators). Given the wide acknowledgement of the importance of entrepreneurship – and hence the role of small and medium sized enterprises (SMEs) – for economic growth, additional exploration of patenting by SMEs is high on the policymakers' agendas. At the same time, mapping and monitoring the contribution of various firm types in technological activity is a cumbersome exercise: it requires the introduction of additional data pertaining both to the size of firms and their (in) dependency status.
A number of recent studies have matched patent databases with financial directories in order to discern firm types among patent applicants. These studies have either limited themselves to a number of countries and/or have defined SMEs only in terms of size (and not dependency). The current study complements these recent efforts by outlining and applying a methodology that assesses the participation of SMEs in (patented) technology development on the level of the EU-27, based on both firm size and dependency information.
For creating reliable indicators with respect to the contribution of SMEs in corporate patenting, a methodology was developed that consists of two steps. In step 1, harmonized patent applicant names from a patent database (PATSTAT) were matched to harmonized company names from a financial database (Amadeus). Based on the financial information that hence became available for applicants, the patents of the matched firms were classified according to their firm size using the SME definition specified by the European Commission in 2003. Step 2 was introduced because of the large volume of applicants for which no financial data were available, either because no matching firm was retrieved in the financial database or because insufficient information – especially with respect to ownership – was available in the financial database. This second step consisted of the consultation of additional external information sources in order to address missing data.
Patent statistics at Eurostat: methods for regionalisation, sector allocation and name harmonisation
This compendium of methodologies developed by Eurostat in the field of patent statistics contributes to the further development of indicators that are instrumental for analysis and policy development. It presents several methodological enhancements to deal with limitations in patent data sources. First, until now, no exhaustive sector allocation was available for identifying the nature of the applicant: individual, firm, university, public research organisation… Eurostat has bridged this gap by developing an exhaustive sector allocation methodology that is now made available for research and policy analysis.
Second, regarding applicant names in existing patent data sources, non-uniformity is the rule rather than the exception. Therefore, name harmonisation algorithms have been developed with a considerable impact in terms of coverage, resulting in highly improved indicator accuracy. Third, regionalization methodologies have been developed to better capture the regional dimension of technology development within the European Research Area (at EU-27 level).
These enhancements allow greater efficiency and accuracy in patent indicator extractions at regional,sectoral and institutional level, and are hence a considerable step forward in monitoring innovation systems in terms of technological activities.
Regionalisation of patent data
Until recently, economic geography has played only a minor role in economic theory, despite the obvious fact that economic activities are not equally distributed over space. Relatively little empirical attention has been paid to the emergence and growth of regional clusters of technological activities. The existing evidence is mostly based on case study research, while large-scale empirical evidence or verification is rather scarce.[1] One reason for this lack of large-scale empirical evidence on the phenomenon of technology clusters is the low availability of quantitative data at the region-technology level, covering regions worldwide over longer periods. Patent data, which provide information on the date and geographic location of technological development and on the organisations and institutions involved, have become increasingly available at regional level. However, in order to be able to construct patent indicators from them, addresses of inventors and patentees need to be allocated to regions. This section outlines a methodology for achieving this.
Regional patent statistics build on the allocation of inventor and patentee addresses to regions. This allocation or ―regionalisation exercise requires first of all an exhaustive list of postcodes and city names and their respective regions. Within Europe, the NUTS classification is a hierarchical system used to divide the economic territory of the EU4. It is used in the collection, development and harmonisation of EU regional statistics; in socio-economic analyses of the regions; and in the framing of EU regional policies.
See: 'Regionalisation of patent data'
Sector allocation
A corollary of this conception of innovation dynamics is the need for refinements in patent indicators. Sector assignment — i.e. identifying whether patentees are companies (private business enterprise), universities and higher education institutions, or governmental agencies — becomes a necessary condition for further analysis of the dynamics underlying technological performance.
This section outlines an updated version of the sector allocation methodology that was developed in 2006.[2] It starts with an overview of previous efforts in sector assignment of patentees, indicating the relevance of additional development efforts. After that, the currently developed methodology and its outcomes are outlined. Conclusions are drawn on the performance of the current sector allocation methodology, and future avenues for further improvement are delineated.
See: 'Sector allocation'
Name harmonisation
The development of patent indicators on the micro-level of specific entities like companies, universities and individual inventors is faced with specific concerns stemming from the heterogeneity of patentee names that appear in patent documents within and across patent systems. Whereas this poses no challenge to the functioning of the patent system itself, it does complicate analyses at patentee level: the analyst is confronted with inconsistencies such as spelling mistakes, typographical errors and name variants, which often also reflect idiosyncrasies in the organisation of R&D and/or IPR activities within a single organisation.
With the objective of reconciling completeness and accuracy, a comprehensive methodology was developed to obtain harmonised patentee names in an automated way. The methodology consists of several harmonisation layers. In a first layer, which emphasised accuracy or precision', the number of unique patentee names was reduced by approximately 20 % and the average number of patents per patentee increased from 5.5 before to 6.8 after harmonisation. In a second layer, emphasis was placed on recall'(a high coverage in terms of patent volumes). This layer covers the top 500 most active patentees, as well as university patentees. For the top 500 patentees, this additional harmonisation layer resulted in allocating over 30 000 patentee names to the top organisations, raising their aggregated patent volume by almost 70 %.
See: 'Name harmonisation'
Eurostat quarterly review of literature on Patent Statistics - December 2013
This report has been prepared in the framework of Eurostat's work on patent statistics. It consists of an extensive targeted review of the existing and currently developed methodological, analytical and scientific material and of the most recent relevant literature in the following domains:
- PATSTAT data quality
- name harmonisation and gender;
- existing information and databases at institutional or company level or business surveys: comparison and possible integration and matching of data for analytical purposes;
- development of methods on patent data based on technical fields: biotechnology, nanotechnology, environmental technologies, energy, measurement of climate change, eco-innovation, technological innovation, other emerging fields;
- development of methods for compiling information on patent families and citations;
- regionalisation.
The report essentially consists of a collection of electronic articles, working papers and other publications available free of charge. An update of the report will be made available every three months.
Conferences on patent statistics
A conference on Patent Statistics for Decision Makers - Knowledge Assets and Economic Growth, took place in Rio de Janeiro, on 12th and 13th November 2013. The event has been organised by the Organisation for Economic Co-operation and Development (OECD) and the European Patent Office (EPO) in co-operation with Eurostat, Japan Patent Office (JPO), Korean Intellectual Property Office (KIPO), National Science Foundation (NSF), United States Patent and Trademark Office (USPTO) and World Intellectual Property Organization (WIPO).
The goal of the Patent Statistics for Decision Makers 2013 conference was to present the latest empirical evidence relying on patent statistics and to discuss findings with decision makers from both the private and the public sector. The conference aimed to share frontier knowledge on topics relevant to policy-makers, academics, companies, and practitioners including:
- the development of new technology fields and the role of IP in attracting R&D;
- patent 'quality' and the use of patents as indicators of research productivity;
- IP, knowledge markets and technology transfer;
- patenting trends, patent policies and innovation policies;
- IP and societal challenges (e.g. environment, health, aging);
- the financing of innovative enterprises and the role of IP as collateral;
- patenting, IP activities and the strategies of global firms;
- the IP 'bundle': the combined use of different IP rights (e.g. patents and trademarks).
The event was targeted at decision makers, academics, analysts, practitioners and other experts dealing with innovation, intangible assets, academic entrepreneurship, enterprise dynamics, and science and technology-related issues.
The aforementioned organizing bodies are part of the OECD International Patent statistics Task Force which gathers on a regular basis to provide orientations on patent statistics and related methodologies to the patent statistics community worldwide.
Today, (technical) inventions can be protected in Europe either by national patents granted by the competent national authorities or by European patents granted centrally by the European Patent Office (EPO). Member States have their own patent authorities which deal with applications for national patents. The protection conferred by a national patent is limited to the territory of the state concerned.
In 2012 Member States and the European Parliament agreed on the "patent package" – a legislative initiative consisting of two Regulations and an international Agreement, laying grounds for the creation of unitary patent protection in the EU. The patent package implements enhanced cooperation between 25 Member States (all Member States except Italy and Spain). Following the adoption of the two Regulations in December 2012, the contracting Member States will proceed with the signature and ratification of the Agreement on a Unified Patent Court – the third and last component of the "patent package" setting up a single and specialised patent jurisdiction. Once the Agreement and the Regulations enter into force, it will be possible to obtain a European patent with unitary effect – a legal title ensuring uniform protection for an invention across 25 Member States on a one-stop shop basis, providing huge cost advantages and reducing administrative burdens.
If the applicant chooses to apply for a European patent, the application will be dealt with by the EPO, having its headquarters in Munich and a branch in The Hague. The EPO is a body of the European Patent Organisation, an international organisation comprising 38 members (27 EU Member States + 11 other European countries). The Organisation was established in 1973 following the signature of the European Patent Convention (EPC).
The unitary patent – which is the object of today's EU regulations - will be a third option for companies or inventors seeking patent protection in Europe. It will be a further tool in the inventor's toolbox in addition to national patents and 'classical' European patents (i.e. without unitary effect).
A unitary patent is a European patent with unitary effect. The procedure up to the grant of the patent will be the same as for ('classical') European patents without unitary effect. After grant, European patents will fall into one of the two categories. A 'classical' European patent needs to be validated in each State for which it has been granted. It has the same effect as a national patent granted in the respective territory and its fate in these States may be different, depending e.g. on any court proceedings which take place in these States. The 'classical' patent is therefore often compared with a bundle of national patents which is centrally granted.
In contrast, the unitary patent will ensure uniform protection for an invention in 25 Member States (all Member States except Italy and Spain) on a one-stop shop basis.
The Unified Patent Court (UPC) will be the future centralised patent jurisdiction of the participating Member States. It will be a court common to the participating Member States and thus subject to the same obligations under Union law as any national court of the participating Member States, in particular refer, where necessary, questions on the interpretation of European Union law to the Court of Justice of the European Union. The UPC will have exclusive jurisdiction especially in respect of civil litigation related to infringement and validity for both the "classical" European patents and the European patents with unitary effect. It will also have competence in respect of supplementary protection certificates issued for a product protected by a European patent with or without unitary effect.
Further Eurostat information
- Patent Statistics at Eurostat: Methods for Regionalisation, Sector Allocation and Name Harmonisation
External links
- Japan Patent Office (JPO)
- Korean Intellectual Property Office (KIPO)
- The EU Single Market — Industrial Property — Patent
- The Organisation for Economic Co-operation and Development (OECD)
- Unified Patent Court
- US National Science Foundation (NSF)
- US Patent and Trademark Office (USPTO)
- World Intellectual Property Organisation (WIPO)


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Two Good Samaritan sisters have arrived in Bali to participate in the United Nations Framework Convention for Climate Change, which begins today. Running until 14 December, the UNFCCC convention will host Sisters Geraldine Kearney from Sydney and
Good Sams in Bali
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Brisbane launches Life Centre
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As part of our Vision 2020 project, the Ida Institute is continuing to discuss what methods the Hearing Care Manager of the Future will need to use in his or her practice. We have now held the second virtual meeting on this work stream.
In the first Hearing Care Manager meeting, participants highlighted the main ideas of "encourage patient centered care," "offer flexible services," "improve communication," and "more research" as key to the longevity of audiology. In this meeting, participants related these ideas back to the different aspects and action points of the clinical journey. They discussed a range of elements spanning from preparing patients for their initial appointments to the maintenance of long-term relationships between the patient and clinician to the impact physical...
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We're very pleased to welcome the following new members to the Ida Institute Board of Advisors:
Christine Yoshinaga-Itano, PhD is a Professor of Audiology and Chair in the Department of Speech, Language and Hearing Sciences, faculty of the Institute of Cognitive Science, Center for Neurosciences at the University of Colorado, Boulder. She also serves as a Professor of Audiology at the Department of Otolaryngology and Audiology at the University of Colorado, Denver and at the Marion Downs Hearing Center. She previously participated in a post-session workshop on the My World tool.
Sue Archbold is the Chief Executive of the Ear Foundation, a charity which funded the first pediatric cochlear implants in the UK, which she helped to found. She previously ran the Nottingham Cochlear Implant...
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The Ida Institute is excited to be progressing with our Vision 2020 projects. We've now held the initial virtual meetings about the Tele-health portion of our process. The first stage of this process looked at developing a small, flexible model of potential best practices for tele-health in audiology.
Prior to the meetings, three guest speakers uploaded brief video selfies discussing different aspects of tele-health to the Ida Forum. These selfies provided fodder for the initial discussions. Two discussions touched upon in the meetings were how to define tele-health and good tele-health communication.
The primary goal of tele-health is to offer better access to patients with either limited mobility, or who live in places where there isn't easy access to an audiologist. There are, of...
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Ida staff presented a workshop on supporting patient involvement to a group of 15 audiology graduate students at Lund University in Lund, Sweden, this week. Senior Audiologist Melanie Gregrory, audiologist Anne Mette Jeppesen, and chief anthropologist Hans Henrik Philipsen presented different tools, organized activities, and showed different ethnographic films and explained the relevance of ethnography in audiology to the group. Participants were taught the Motivational, Communication Partner, and Living Well tools.
The daylong session began with a role playing exercise that allowed participants to get to know each other, as well as introducing the communication skills necessary for patient centered care. This point was further illustrated by the short ethnographic film "The Color of My...
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The Ida Institute is very excited to be featured in two articles in the latest issue of ENT and Audiology News magazine.
The first article is by Berth Danermark at the Audiological Research Centre at Örebro University in Örebro, Sweden. Dr. Danermark is a former Ida advisory board member and a former participant at an Ida Seminar. His article focuses on patient centered care in audiology and what factors allow or prevent audiologists from implementing these approaches in their practices. His results are based on a questionnaire that was handed out at an Ida Seminar in 2012. The study looks at the use of the Ida Motivation Tools, which were considered the second-most important factor in facilitating patient centered care. The study concluded that the importance of the Ida Tools stems from...
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The Ida Institute is pleased to announce the arrival of two new staff members. Anne Mette Jeppesen and Amanda Farah Cox have both joined the Ida team in the last month.
Anne Mette is joining us as a Project Manager and Audiologist. She will work on the development and launches of tools. She will also be involved in training seminars and workshops, as well as facilitating our Vision 2020 process. Prior to joining Ida, she was a project manager at a large hearing aid company for more than seven years, where she was an expert in tinnitus and worked on the creation of clinical tools. Anne Mette completed her Master of Arts in Audiology and Speech Pathology at the University of Copenhagen, where she did her thesis in cochlear implants.
Amanda is the Ida Institute's new web editor, taking over...
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The Ida Institute is pleased to announce the launch today of our new Ida Basics course. Ida Basics is a brief course designed as an introduction to the fundamentals of patient centered care. Through Ida Basics, users will learn how to implement patient centered care in their practices and have an opportunity to reflect on their current methods, as well as get inspiration for future interactions.
The course can be completed in as little as 60 minutes. Activities include a 20 minute webinar presented by Sue Ann Erdman, the Director of ARCCS, which gives a brief history of patient centered care; the short ethnographic video, "Oh Good, I Can Talk to My Kids," where we see how to apply patient centered care in a clinical setting, as well as the clinician's reactions; and a trial of Ida's...
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Eriksholm held its Summer Camp, sponsored by the Oticon Foundation, last week. The five days of workshops and seminars, held from 27-31 August at the Eriksholm Research Centre in Snekkersten, Denmark, brought together 55 audiologists from around the world. The focus of this year's Summer Camp was how audiologists can help meet hearing aid users' individual needs.
Ida staff members Ena Nielsen and Hans Henrik Philipsen presented a workshop on the Communications Partner Tool, how it can be used to engage a hearing loss patient's support system, and the role of communication partners in a patient's rehabilitation. The ethnographic film, Gill and John, which tells the story of how Gill, who has hearing loss, is supported by her husband John in social situations, was shown. Following the...
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The Ida Institute participated in the Speech Language Pathology and Audiology Conference (Jornada Fonoaudiológica de Bauru) in Sao Paolo, Brazil, held from 20-23 August. Ida Institute Managing Director Lise Lotte Bunden and Senior Audiologist Melanie Gregory gave presentations and held workshops on Ida Motivational Tools to a multi-disciplinary audience including ENTs, audiologists, nurses, dentists, and speech language pathologists, beginning with a presentation to the Society for Otorhinolaryngoloy in Sao Paulo.
Two full days of workshops followed, facilitated by Bunden and Gregory, as well as two Ida Fellows: Audiologist Deborah Viviane Ferrari and psychologist Dagma Abramides, both of the University of Sao Paulo Bauru. Ida Tools were taught by Gregory, and both days of workshops used...
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The Ida Institute is progressing with its Vision 2020 project. We have developed three work streams for the project: The Hearing Care Specialist of the Future, Telehealth, and the Big Message.
We have now held our first meetings on the Hearing Care Specialist of the Future. The objective is to help audiologists adapt as the industry changes in the next few years by looking at what their role in patient care is beyond the audiogram.
Before the meeting about the Hearing Care Specialist of the Future, members of our community uploaded video presentations (Selfies) of their work to our forum to generate discussion. These discussions served as a starting point for the meetings.
The main ideas produced in the Hearing Care Specialist of the Future meetings for the longevity of audiology, are:...
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text: The Local Show Buffalo Moon performs live for The Local Show The Local Show January 12, 2014 Three years since their last performance in our studios, Buffalo Moon has gone through big changes in that time. Most notably: lead singer Karen Freire made the move to New York to clear her head after some personal trials. That transition follows the path of so many other local acts in recent years -- members splitting time between Minnesota and other places out-of-state. Read More ›


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Related quotes
"There are a lot of gut-wrenching, earnings-driven disappointments that you have to wade through to be able to come out the other end,"
"We had a very gut-wrenching decision and significant management and technical problems to overcome."
"We had a very gut-wrenching decision. We thought at the time that there was too much risk to go forward."
"What we had here was a very gut-wrenching decision and significant management and technical hurdles to overcome, and we're happy to be going forward."
"It was gut wrenching, ... To come into our house as a 2-1 team and to lose to Diego the way we did, I mean, they beat us in all phases. They had us against the ropes all day and they left here with the KO."
"It's gut wrenching to see somebody read a description of an accident like that off a teleprompter in front of millions of people for political gain."


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My notes on Manning, McClellin and Jeffery. Matt Bowen
Watching the Bears-Broncos matchup last night, I focused more on personnel in a game that resembled a scrimmage at times. Very little work for the starters and a group of key Bears veterans that didn't even see the field. Here are my notes on three players: Peyton Manning, Shea McClellin and Alshon Jeffery.
US PRESSWIREManning displayed a quick release throwing the ball last night for the Broncos.
Manning: Manning looked comfortable in the pocket throwing the comeback vs. Cover 1 (man-free), working the underneath option game and setting his feet to hit the deep dig route vs. Cover 2. The INT? That's a timing issue from my perspective in the red zone. You put the ball on the back shoudler on the inside Smash route and someone in the secondary is going to make a play. I would have liked to see Manning throw the vertical route tree, but this is the preseason. And with that comes base route concepts and limited game planning. He wasn't perfect, but the Broncos QB showed a quick release throwing the football in his first action back on the field. That's a positive sign this early in August.
McClellin: Typical night for a rookie DE in his first preseason game. McClellin displayed a quick get off at the line of scrimmage, the ability to turn the corner on the edge and true closing speed to pick up a sack. But there are some issues to correct. The Bears rookie needs to lower his pad level, show more strength (plus power) at the point of attack and continue to work on setting up the OT once he gets up the field on the rush. I thought McClellin played hard and this will be a good tape for the DE to watch.
Jeffery: The WR was active, saw plenty of targets and had oppporunites to work his release vs. both press and off-man coverage. You want Jeffery to be more active with his hands vs. press looks and come back to the football on inside cuts with a sharper angle, but he did some good things vs. the Broncos. The Bears didn't use their stack alignments or vertical route combinations (Flat-7, Smash-Seam) that I have seen down at camp, so last night was more about fundamental skills for the rookie within the route and at the top of the stem. Remember, two things you should always look for with rookie wide outs: the ability to beat press and create separation in the route. Those are key moving forward for Jeffery throughout the preseason.
Follow me on Twitter: @MattBowen41
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Posts by Author
Rockets sign Joey Dorsey for two years, $2 million
In need of a backup center to replace Omer Asik, the Rockets turned to a familiar face, reaching agreement to bring back Joey Dorsey after several seasons in Greece and Spain, a person familiar with the decision confirmed. Dorsey, 30, agreed to a two year, fully guaranteed minimum contract worth about $2 million. Yahoo Sports […] [Read More]
Potential to improve remains Rockets' focal point
LAS VEGAS – Late Friday afternoon, general manager Daryl Morey believed the Rockets were "very close to having maybe the best team in the NBA." He was on the verge of signing Chris Bosh, would match the offer sheet to keep Chandler Parsons, and would have a starting five widely labeled the most complete in […] [Read More]
Rockets re-sign sharp-shooter Troy Daniels
The last time Chandler Parsons went out and Troy Daniels came in could not have worked out better for the Rockets. Parsons fouled out in Game 3 of the Rockets' playoff series in Portland. Daniels came off the bench to play overtime, nailing the game-winning 3-pointer to get the Rockets back in the series. The […] [Read More]
Rockets to sign first-round pick Clint Capela for next season
After weeks of uncertainty about their plans for their first-round pick, the Rockets are working on signing Clint Capela in time to begin his NBA career next season. The Rockets have been working with Capela on his buyout and FIBA letter of clearance, ending the idea that he would remain in Europe for at least […] [Read More]
Feigen: Rockets gamble that title chances better if they keep swinging for stars
The backlash was predictable and remains understandable. The Rockets opted against matching Chandler Parsons' contract and as hefty as it no doubt is, to many it was viewed as only money. Pay the man. Don't let him walk away – especially to Dallas – for nothing. NBA contracts are not only about money, of course. […] [Read More]
Canaan starts stating his case for backup PG gig in summer league
No one said anything about a promotion. No one had to. Such things are determined on the court, anyway, but with the Rockets' trade of Jeremy Lin complete on Sunday, the job of backup point guard was open. Isaiah Canaan noticed. Canaan made his summer league debut on Saturday, hours before Lin officially became a […] [Read More]
Rockets choose not to match Parsons offer sheet
The Rockets knew they would be better with Chandler Parsons than without. They believed, however, they were not good enough to consider their roster complete. Months after Parsons had been among the keys to the Rockets' hopes, their captain and perhaps the league's best bargain, he is none of those things. He is instead the […] [Read More]
Rockets finalize trades involving Lin, Asik
For all the deal- and decision-making of the past two weeks, the Rockets' first official deal of the summer fittingly was about a once prized acquisition leaving town. The Rockets trade of Jeremy Lin was completed on Sunday, giving them the cap room they had hoped to use for Chris Bosh. To get the Lakers […] [Read More]
Beverley likes Rockets' prospects this season
Pat Beverley got a jump on his 26th birthday, celebrating it in Taiwan between his role in clinics and tournaments there. But he also could not wait to send a message. The Rockets were reeling from the stunning decision of Chris Bosh to remain in Miami hours after the Rockets sent Beverley's point guard partner, […] [Read More]
Rockets agree to terms with Trevor Ariza on 4-year deal worth $32 million
The Rockets went back to work, and kept going back, past their failed efforts to sign Chris Bosh, Carmelo Anthony or LeBron James, past years of rebuilding and all the way back to one of Daryl Morey's first significant free agent signings as Rockets general manager. Stunned by Friday's sudden change of direction in their […] [Read More]
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Can you believe Thanksgiving is this week? Where oh where does the time go? Christmas will be here soon and then New Year's and then I will have to try really, really hard to not make the a New Year's resolution to lose weight because I shouldn't want to lose weight just because it is January. Sometimes I wish I was a cookie. If I were one of these fun gingerbread man cookies, losing weight would be easy and I wouldn't have to work out a million hours a week or avoid sugar or watch my friends eat while I drink 10 gallons of water and force a smile on my face and say things like, no thank you I am not hungry.
Chocolate Caramel Apples
Do you have any idea what I did this weekend? Well here is a hint. I made some delicious chocolate caramel apples that actually turned out exactly the way I imagined. The caramel didn't fall off. I didn't have to double or triple dip them. All I did was follow a few simple directions and look what happened. [Continue reading…]
Tom Turkey Cookies for Thanksgiving
Well here they are. The last turkeys in my 10 turkey series. Meet the Tom Turkey cookies. … [Continue reading...]
Pretty Turkey Cookies
Turkey number nine is here. He is a bit more traditional than the other turkey cookies I have shared because I thought it was time for a pretty turkey cookie. And, I just got this new cutter from Fancy Flours and realized as I was removing it from the package and got a look at it when it was held sideways, it looked like a turkey. … [Continue reading...]


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the greenest of green
17 february 2014 – FEATURED in A Gorgeous Green
See I told you it was fun! :)
Looks lovely Mel :))
it's toooo fun! cheers babe!
– mellychan
Very cool Mel!
thank you v much!
– mellychan
Good one. – Ted
cheers :)
– mellychan
Great cover!
Love Colleen2012
hey thanks :)
– mellychan
Congratulations :)
– mellychan
Congratulations! Your image represents A Gorgeous Green perfectly with at least 75% green.
Great work! Thank you for contributing to our group, A Gorgeous Green.
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your host,
February 17, 2014
ooooh! this is so nice – thank you very much!
– mellychan
lovely case.
thank you very much!
– mellychan


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Cover Picture
Solar Cells: Inverted Polymer Solar Cells with Reduced Interface Recombination (Adv. Energy Mater. 11/2012)
Article first published online: 5 NOV 2012
DOI: 10.1002/aenm.201290053
Copyright © 2012 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
Advanced Energy Materials
Volume 2, Issue 11, page 1281, November, 2012
Additional Information
How to Cite
Chen, S., Small, C. E., Amb, C. M., Subbiah, J., Lai, T.-h., Tsang, S.-W., Manders, J. R., Reynolds, J. R. and So, F. (2012), Solar Cells: Inverted Polymer Solar Cells with Reduced Interface Recombination (Adv. Energy Mater. 11/2012). Adv. Energy Mater., 2: 1281. doi: 10.1002/aenm.201290053
Publication History
- Issue published online: 5 NOV 2012
- Article first published online: 5 NOV 2012
- Abstract
- Cited By
Due to intrinsic defects, zinc oxide nanoparticles may induce interfacial recombination when used as the electron extraction layer in an inverted polymer solar cell. On page 1333, Franky So, John R. Reynolds, and co-workers demonstrate that UV-ozone treatment is an effective way to passivate defects in ZnO NPs and reduce interface recombination in a polymer solar cell. As a result, the power conversion efficiency of inverted PDTGTPD: PC71BM cells is improved to 8.1%.


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A 3-year-old girl who died after falling out of a window on Sunday had somehow gotten herself locked in the bathroom of her family's apartment in Queens with her 2-year-old sister. "Before their parents could get the door open, Rusroshi [Barua] fell from the bathroom window," the New York Times reports. Tragic.
Parents' Worst Nightmare Comes True in QueensBy Adam Martin
A little girl fell out a window while locked in a bathroom.


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OKCoin and itBit Added to CoinDesk Bitcoin Price Index
OKCoin and itBit have joined CoinDesk's USD price index. The criteria for speed of withdrawals has also been adjusted.
Markets Weekly: Could Central Banks Spark a Bitcoin Rally?
What do the actions of central bankers in East Asia have to do with the bitcoin price? Quite a bit, as it turns out.
New Research Links Bitcoin Price Spikes to Media Hype
New research that analyses bitcoin's price fluctuations and usage patterns through empirical analysis has delivered some interesting results.
Markets Weekly: Trading Volumes More than Double Amid Price Surge
The bitcoin price saw a wild swing of nearly $100 this week, but it was grounded in strong support across exchanges.
Bitcoin Price Surges Past $400 Mark
The bitcoin price has surged past $400 for the first time since mid-October, gaining over 9% today.
Markets Weekly: Bitcoin Rises Amid Dark Markets Crackdown
The bitcoin price has risen after a variety of law-enforcement agencies conducted an inter-continental crackdown on dark markets.
Can Hobbyist Bitcoin Miners Still Make a Buck?
Bitcoin's low price is making things tough for hobbyist miners. Should they ditch the rig and buy bitcoins instead?
Markets Weekly: Price Slump Continues While Transactions Rise
The bitcoin price declined further this week, but there may be reason for optimism in the long-run.
LakeBTC Suspended from CoinDesk Bitcoin Price Index
LakeBTC will be suspended from the CoinDesk BPI for 30 days pending a review of its data.
Markets Weekly: Bitcoin Price Resilience Crumbles
The bitcoin price has crumbled after a rally early in the month and resilience over the last fortnight.


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Glazed Ham with Pecan Crust
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11 Secrets to Your Sexiest Summer view
8 Things He'll Love that You Left At His Place view
Photo Credit: Getty Images
"Sex can lead to that deep love. To me sex can be so beautiful when the butterflies develop...
"Sex can lead to that deep love. To me sex can be so beautiful when the butterflies develop in the stomach and those soft touches become hard then darkness and all good feelings." -- Leila
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Kevin Dundon 270-Watt Hand Stand Mixer Deal!
Hurry and whip up some recipes with this cool hand stand mixer. Right now, for just $74 get a Kevin Dundon 270-Watt Hand Stand Mixer ($250 List Price)! Kevin Dundon, a celebrity chef from Ireland, stamps his seal of approval on this five-speed mixer with 3.5-quart stainless-steel mixing bowl and stand. The stand provides hands-free mixing for big baking projects, but by simply pressing the eject button, the user can take control and mix by hand. If you love baking or even cooking, this is a must have tool. Grab this chance to get a hand stand mixer at 70% off. Hurry and grab this deal now. Includes Free shipping and free returns.
- 270-watt, five-speed mixer with high-speed Turbo option
- Easily converts between a hand mixer and hands-free stand mixer
- 3.5-quart stainless-steel mixing bowl with high mirror polish exterior allows you to wink at yourself while cooking
- Tilt-back head for easily adding extra ingredients
- Chrome-plated dough hooks ideal for mixing dough and fresh artesian breads
- No center post means fewer clogs, resulting in evenly mixed batches
- Stable heel rest helps prevent messes from the hand-mixer motor on the countertop
- Includes a variety of Kevin Dundon's recipes, such as a chocolate mousse and beef and vegetable meatloaf