text:
|Publication number
|Publication type
|Application number
|Publication date
|Aug 11, 2009
|Filing date
|Jul 13, 2004
|Priority date
|Jul 13, 2004
|Fee status
|Also published as
|Publication number
|Paul Christiaan Hinnen, Richard Johannes Franciscus Van Haren, Hubertus Johannes Gertrudus Simons
|Original Assignee
|Asml Netherlands Bv
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (41), Non-Patent Citations (2), Referenced by (2), Classifications (16), Legal Events (3)
|External Links: USPTO, USPTO Assignment, Espacenet
1. Field of the Invention
The present invention relates to a lithographic apparatus and a device manufacturing method.
2. Related Art
A lithographic apparatus is a machine that applies a desired pattern onto a target portion of a substrate. The lithographic apparatus can be used, for example, in the manufacture of integrated circuits (ICs), flat panel displays, and other devices involving fine structures. In a conventional lithographic apparatus, a patterning means, which is alternatively referred to as a mask or a reticle, may be used to generate a circuit pattern corresponding to an individual layer of the IC (or other device), and this pattern can be imaged onto a target portion (e.g., comprising part of one or several dies) on a substrate (e.g., a silicon wafer or glass plate) that has a layer of radiation-sensitive material (e.g., resist). Instead of a mask, the patterning means may comprise an array of individually controllable elements that generate the circuit pattern. For example, the patterning means can be, but is not limited to, a reflective or transmissive contrast device, such as a spatial light modulator, a digital mirror device, a grating light valve, a liquid crystal display, or the like.
In general, a single substrate will contain a network of adjacent target portions that are successively exposed. Known lithographic apparatus include steppers, in which each target portion is irradiated by exposing a pattern onto the target portion in each exposure period. Other known lithographic apparatus include scanners, in which each target portion is irradiated by scanning the pattern through the projection beam in a given direction (the "scanning" direction), while synchronously scanning the substrate parallel or anti-parallel to this direction.
A metrology target generally refers to a type of target that may form part of the pattern written to the substrate, but which does not actually contribute directly to the functional or structural form of the device being manufactured. Usually, the function of a metrology target is to facilitate aspects of the manufacturing process itself, such as alignment of a substrate to the projection system, verification of overlay and/or imaging properties, etc. Metrology targets may therefore include alignment marks and targets used in "offline" metrology equipment associate with or within the lithography apparatus. Offline generally refers to metrology equipment designed to process a substrate separately from, and at a different time to, the main lithography processes used to pattern the substrate, while inline metrology refers to processes carried out at the same time and/or position. For the purposes of this description, protective structures for the above alignment marks and targets are themselves to be understood as types of metrology target.
In one example using mask-based systems, the metrology targets normally have to be defined before the mask is actually made. If it turns out that in manufacturing conditions the metrology target design is non-optimal, e.g., for overlay performance, a new mask or set of masks has to be produced before an improved metrology target design can be implemented. This hampers the speed at which the potential of new metrology target designs can be evaluated and leads to increased costs for the customer.
Therefore, what is needed is a system and method that can optimize performance of metrology targets in lithographic devices. Additionally or alternatively, what is needed is a system and a method that can add flexibility in the choice of metrology target even after the product design has been finalized.
One embodiment of the present invention provides a lithographic apparatus comprising an illumination system arranged to provide a radiation beam, a support structure configured to support a product patterning device, and a metrology target patterning device. The product patterning device is capable of imparting a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed. The metrology target patterning device is capable of imparting a radiation beam derived from the illumination system with a metrology target pattern in its cross-section representing at least one metrology target. The product patterning device is separate from the metrology target patterning device. The lithographic apparatus also comprises a substrate table configured to hold a substrate, a projection system arranged to project the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of the substrate, and a metrology target patterning device controller that is capable of adjusting the metrology target pattern independently of the product pattern.
In this embodiment, having an independent device for controlling the metrology target pattern makes it possible to update the metrology target without changing the product pattern. This arrangement makes it possible to change frequently the metrology target pattern, location, etc., without replacing or altering the product pattern, which may be embodied in an expensive reticle set or a large data set in maskless lithography systems. In various examples, metrology target design changes may be triggered by: 1) inline metrology considerations; 2) offline metrology considerations; and/or 3) new insights from metrology target design projects.
In one example, the metrology target patterning device controller can be arranged to adjust the metrology target pattern after the product pattern has been finalized. This "last minute" addition of the metrology target pattern, just before exposure, greatly increases the scope for efficient metrology target optimization, including inline or "real time" optimization. Optimization may be achieved via a feedback loop, e.g., taking data from an inspection of patterned and processed substrates. More generally, this feature adds choice and flexibility for the printing and positioning of metrology targets.
In one example, at least one of the product patterning device and the metrology target patterning device may comprise an array of individually controllable elements. The use of such arrays for the metrology target pattern, for example, provides increased flexibility and increased update speed when compared with a conventional reflective or transmissive mask. It is often difficult to predict in advance how well a given metrology target (and in particular the substructure associated with a metrology target) will perform. Following a change in the overall metrology target design, therefore, it is frequently necessary to fine-tune parameters of a new metrology target in order to optimize its performance. According to one example of the present embodiment, this is made possible without having to create a new mask each time.
In one example, an array of individually controllable elements serving the same purpose has the advantage of always being fixed in one position, in contrast to a plurality of metrology target patterns embodied in a set of different masks. This example of the present invention may therefore achieve greater accuracy than the set of masks, where masks have to be physically moved in and out of position every time the metrology target pattern is to be changed.
In one example, the product patterning device and/or the metrology target patterning device may also comprise a mask. To accommodate such a feature, the lithographic apparatus may further comprise a mask storage device, capable of storing a plurality of masks, and a mask storage device controller, adapted to transfer a selected mask from the mask storage device to an imaging position in the lithography device. Masks offer several advantages over an array of individually controllable elements and may be more suitable in certain circumstances. For example, due to the relative simplicity of the metrology target pattern in comparison to the product target pattern, it may not be justified to dedicate a relatively expensive array of individually controllable elements with complex control requirements to the metrology target pattern where a relatively simple, inter-changeable metrology target reticle set may suffice. In one example, the throughput rate may be higher with masks, particularly where a fixed mask is used in the product patterning device.
In one example, the metrology target patterning device controller may be arranged to adjust the metrology target based on information derived from inspection of a previously imaged substrate. This feedforward step can be incorporated into a loop in order to provide for efficient updating of metrology targets.
In one example, the apparatus may further comprise a metrology target inspection device capable of inspecting a metrology target on a substrate and automatically providing the results of the inspection to the metrology target patterning device controller. The metrology target patterning device controller may then print a new substrate, which is subsequently inspected in order to further refine the metrology target. The inspection step will normally be carried out outside of the main projection beam path as it is generally necessary to process the metrology target patterned substrates prior to inspection.
In various examples, the optimization process described above may address a number of features of metrology target design. These may include primary structures, substructures and metrology target segmentation. The latter can include alignment mark segmentation, where segmentation along the scan direction is used to generate different diffraction orders that will enhance the signal strength of specific orders to be used for alignment, and process segmentation, where the metrology target is segmented parallel or perpendicular to the scan direction but with segmentation dimensions not related to valid alignment orders. This will not influence the diffraction orders generated but might make the mark compatible with process and design rules.
In one example, the metrology target patterning device controller maybe arranged to provide a metrology target pattern comprising a plurality of metrology targets. In the case where metrology targets are being tested for optimization purposes, a number of metrology targets can be imaged onto each substrate to allow a plurality of tests to be made for each exposed substrate. In this example, the metrology target inspection device discussed above may be arranged to test each of a plurality of metrology targets on the first substrate before sending its control signal to the metrology target patterning device controller in order to improve the metrology target pattern to be applied to the new substrate.
In one example, Two or more of the metrology targets may be positioned in different target portions on the substrate. This approach provides greater scope for positioning multiple metrology targets. In many cases, the optimal position for a certain type of metrology target will be different from other metrology targets. For example, this may be the case for coarse and fine alignment marks.
In one example, different metrology targets are written into different dies. This approach generally reduces the amount of space that needs to be reserved for metrology targets on each die, thereby leaving more room available to the customer to arrange product device features. For example, for the coarse and fine alignment marks mentioned above, if it were not possible to change the metrology target design each exposure (and therefore from die to die), each exposure would have to contain two marks for coarse and fine alignment, which is a waste of space. In designs involving a mask containing both the product pattern and the metrology target pattern, such variation from die to die would not be possible without frequent exchange of the entire mask.
In one example, the metrology target patterning device controller maybe capable of providing metrology targets corresponding to the standards of different manufacturers. This feature allows users to easily print individual layers with machines from different manufacturers. In the absence of this feature, this might only be achieved by creating brand new masks with new metrology targets and this feature avoids the expense and loss of time associated with such steps.
In one example, it is convenient to use metrology targets that are much larger than individual product features. However, these may be imaged slightly differently by the projection apparatus, leading to a mismatch between the metrology targets and product features. Errors arising in this way may be reduced by including a substructure in the metrology target pattern. The substructure may be given a form different to that of the primary structure, for example a form that more resembles product features. In particular, the substructure may be arranged with a characteristic length scale much smaller than that of the primary structure. In addition to product-like features, the substructure may include contact holes and horizontal or vertical lines.
The embodiments and examples of the invention discussed above provide for highly efficient optimization of the type and parameters of these substructures, including the possibility to test over a broader range of parameters than would be possible with prior art schemes.
In one example, the metrology target patterning device maybe arranged to impart the radiation beam with a pattern corresponding to a metrology target and a pattern corresponding to a protective structure for the metrology target. Protective structures prevent excessive mechanical and/or chemical attack from external sources (such as during substrate polishing phases), which may degrade the quality of a metrology target, and therefore induce overlay measurement errors.
In one example, a certain clearance from surrounding features may be desired. However, if the metrology target is too exposed (e.g., to mechanical or chemical attack, as discussed above), it is likely to be vulnerable. Smaller metrology targets risk being exposed (e.g., with radiation) even when they are positioned in the scribe lane between individual dies (this region represents the lane along which the substrate will eventually be cut to separate completed dies) as their spatial extent may be small in comparison to the width of the scribe lane. In other examples, this may not be the case with certain types of larger metrology target (e.g., alignment marks). In examples where metrology targets are positioned around the edge of the substrate outside the dies, most types of metrology target will benefit from some form of protective structure. The provision of such structures increases the effective space available to position metrology targets.
In one example, the protective structures may comprise multiple copies of a metrology target, arranged at an optimal separation from the functional target and from each other. Other dummy structures may also be used, a general aim being to provide a more uniformly patterned surface. Which structures work the best in practice is difficult to predict, thus a number of trials may be desirable to determine an optimum size and shape.
In various examples, cross-talk may occur between the product patterning device and the metrology target patterning device, or between elements of the radiation beam patterned thereby, or between metrology target structures and device structures on the substrate itself. This may be reduced by positioning the metrology targets in the scribe lane of the substrate in a position where no cross-talk is anticipated or where cross-talk is minimized (this may be deduced from a knowledge of the product pattern to be printed). For example, cross-talk with a metrology target of a certain type of structure might in general be minimized by positioning the metrology target away from similar structures in the product device pattern.
Another embodiment of the present invention provides a lithographic apparatus comprising an illumination system adapted to supply a projection beam of radiation, a control system configured to control an array of individually controllable elements serving to impart the projection beam with a pattern in its cross-section, thus providing a patterned radiation beam, a substrate table configured to hold a substrate, and a projection system arranged to project the patterned radiation beam onto a target portion of the substrate. The control system is adapted to receive: a first data file comprising product pattern data representing features of a product device to be formed and a second data file comprising metrology target data representing at least one of an intended metrology target pattern and an intended metrology target location on the substrate.
This embodiment makes it possible quickly and efficiently to add or change the metrology target pattern to be printed onto the substrate.
In one example, the metrology target pattern maybe controlled independent of the product pattern and be altered at a much later stage than would otherwise be possible. In fact, this embodiment allows the metrology target to be changed after the product pattern itself has been finalized and may be left as a final process to be carried out just before the substrate is actually exposed.
In one example, the lithographic apparatus may further comprise a metrology target verification and adaptation device, capable of determining the likely performance of a metrology target based on an analysis of the product pattern data and the metrology target pattern data, and, according to the likely performance thus determined, providing an updated metrology target data to the control system. This embodiment allows for new metrology marks as it makes it possible to adjust automatically the metrology target pattern and position to an optimum state without a user having to manually analyze details of the product structure beforehand. Metrology targets may therefore be changed rapidly without great expense. The metrology target verification and adaptation device may be arranged to operate in real time so that new metrology targets may be introduced inline.
A further embodiment of the present invention provides a metrology target optimizing method, comprising the steps of providing a radiation beam using an illumination system, using a product patterning device to impart a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed, using a metrology target patterning device to impart a radiation beam derived from the illumination system with a metrology target pattern in its cross-section representing at least one metrology target, projecting the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of a substrate, inspecting the metrology target pattern generated on the substrate after developing and processing, and updating control data to be sent to the metrology target patterning device, based on the inspection.
A still further embodiment of the present invention provides a device manufacturing method comprising the steps of providing a radiation beam using an illumination system, using a product patterning device to impart a radiation beam derived from the illumination system with a product pattern in its cross-section representing features of a product device to be formed, using a metrology target patterning device to impart a radiation beam derived from the illumination system with a metrology target pattern in its cross-section representing at least one metrology target, projecting the radiation patterned by the product patterning device and the metrology target patterning device onto a target portion of a substrate, controlling the metrology target patterning device separately from the product patterning device so as to be able independently to change the at least one metrology target without changing the product pattern.
Further embodiments, features, and advantages of the present inventions, as well as the structure and operation of the various embodiments of the present invention, are described in detail below with reference to the accompanying drawings.
The accompanying drawings, which are incorporated herein and form a part of the specification, illustrate the present invention and, together with the description, further serve to explain the principles of the invention and to enable a person skilled in the pertinent art to make and use the invention.
The present invention will now be described with reference to the accompanying drawings. In the drawings, like reference numbers may indicate identical or functionally similar elements.
Overview and Terminology
Although specific reference may be made in this text to the use of lithographic apparatus in the manufacture of integrated circuits (ICs), it should be understood that the lithographic apparatus described herein may have other applications, such as the manufacture of integrated optical systems, guidance and detection patterns for magnetic domain memories, flat panel displays, thin-film magnetic heads, etc. The skilled artisan will appreciate that, in the context of such alternative applications, any use of the terms "wafer" or "die" herein may be considered as synonymous with the more general terms "substrate" or "target portion," respectively. The substrate referred to herein may be processed, before or after exposure, in for example a track (e.g., a tool that typically applies a layer of resist to a substrate and develops the exposed resist) or a metrology or inspection tool. Where applicable, the disclosure herein maybe applied to such and other substrate processing tools. Further, the substrate may be processed more than once, for example in order to create a multi-layer IC, so that the term substrate used herein may also refer to a substrate that already contains multiple processed layers.
The terms "radiation" and "beam" used herein encompass all types of electromagnetic radiation, including ultraviolet (UV) radiation (e.g. having a wavelength of 365, 248, 193, 157 or 126 nm) and extreme ultra-violet (EUV) radiation (e.g. having a wavelength in the range of 5-20 nm), as well as particle beams, such as ion beams or electron beams.
The term "projection system" used herein should be broadly interpreted as encompassing various types of projection systems, including refractive optical systems, reflective optical systems, and catadioptric optical systems, as appropriate, for example, for the exposure radiation being used, or for other factors such as the use of an immersion fluid or the use of a vacuum. Any use of the term "lens" herein may be considered as synonymous with the more general term "projection system."
The term "patterning means" used herein should be broadly interpreted as referring to means that can be used to impart a radiation beam with a pattern in its cross-section such as to create a pattern in a target portion of the substrate. It should be noted that the pattern imparted to the radiation beam may not exactly correspond to the desired pattern in the target portion of the substrate. Generally, the pattern imparted to the radiation beam will correspond to a particular functional layer in a device being created in the target portion, such as an integrated circuit.
Patterning means may be transmissive or reflective. Examples of patterning means include masks, programmable mirror arrays, and programmable LCD panels. Masks are well known in lithography, and include mask types such as binary, alternating phase-shift, and attenuated phase-shift, as well as various hybrid mask types. An example of a programmable mirror array employs a matrix arrangement of small mirrors, each of which can be individually tilted so as to reflect an incoming radiation beam in different directions; in this manner, the reflected beam is patterned. In each example of patterning means, the support structure may be a frame or table, for example, which may be fixed or movable as required and which may ensure that the patterning means is at a desired position, for example with respect to the projection system. Any use of the terms "reticle" or "mask" herein may be considered synonymous with the more general term "patterning means".
The illumination system may also encompass various types of optical components, including refractive, reflective, and catadioptric optical components for directing, shaping, or controlling the projection beam of radiation, and such components may also be referred to below, collectively or singularly, as a "lens."
The lithographic apparatus may be of a type having two (e.g., dual stage) or more substrate tables (and/or two or more mask tables). In such "multiple stage" machines the additional tables may be used in parallel, or preparatory steps may be carried out on one or more tables while one or more other tables are being used for exposure.
The lithographic apparatus may also be of a type wherein the substrate is immersed in a liquid having a relatively high refractive index (e.g., water), so as to fill a space between the final element of the projection system and the substrate. Immersion liquids may also be applied to other spaces in the lithographic apparatus, for example, between the mask and the first element of the projection system. Immersion techniques are well known in the art for increasing the numerical aperture of projection systems.
Further, the apparatus may be provided with a fluid processing cell to allow interactions between a fluid and irradiated parts of the substrate (e.g., to selectively attach chemicals to the substrate or to selectively modify the surface structure of the substrate).
Exemplary Lithography System
Illumination system 104 (e.g., an illuminator) provides a radiation beam 112 comprising, for example, ultra violet (UV) or extreme ultra violet (EUV) radiation. Illuminator 104 receives a radiation beam from radiation source 102.
First support structure 106 (e.g. a mask table) supports a patterning means 114 (e.g. a mask) and is connected to a first positioning means 116 for accurately positioning patterning means 114 with respect to projection system 110.
Substrate table 108 (e.g. a wafer table) holds a substrate 118 (e.g. a resist-coated wafer) and is connected to a second positioning means 120 that accurately positions substrate 118 with respect projection system 110.
Projection system 110 (e.g. a reflective projection lens) images a pattern imparted to radiation beam 112 via patterning means 114 onto a target portion 122 (C) (e.g. one or more dies) of substrate 118.
In this embodiment, lithographic apparatus 100 is of a reflective type (e.g., employing a reflective mask or a programmable mirror array of a type as referred to above). Alternatively, lithographic apparatus 100 may be of a transmissive type (e.g., employing a transmissive mask).
In one embodiment, source 102 and lithographic apparatus 100 may be separate entities. For example, when source 102 is a plasma discharge source. In such cases, source 102 is not considered to form part of lithographic apparatus 100, and radiation beam 112 is generally passed from source 102 to illuminator 104 with the aid of a radiation collector (not shown). The radiation collector can comprise, for example, but not limited to, suitable collecting mirrors and/or a spectral purity filter.
In other cases source 102 may be integral part of apparatus 100. For example, when source 102 is a mercury lamp.
In one example, source 102 and illuminator 104 may be referred to as a radiation system.
Illuminator 104 may comprise adjusting means (not shown) that adjust an angular intensity distribution of beam 112. Generally, at least the outer and/or inner radial extent (commonly referred to as σ-outer and σ-inner, respectively) of the intensity distribution in a pupil plane of illuminator 102 can be adjusted. Illuminator 102 provides a conditioned beam of radiation, referred to as radiation beam 112, having a desired uniformity and intensity distribution in its cross-section.
Radiation beam 112 is incident on mask 114, which is held on mask table 106. Being reflected by mask 114, radiation beam 112 passes through projection system 110, which focuses the beam onto target portion C of substrate 118. With the aid of second positioning means 120 and a position sensor 124 (e.g. an interferometric device), substrate table 108 can be moved accurately, e.g. so as to position different target portions C in the path of beam 112. Similarly, first positioning means 116 and a position sensor 126 can be used to accurately position mask 114 with respect to the path of beam 112, e.g. after mechanical retrieval from a mask library, or during a scan. In general, movement of object tables 106 and 108 will be realized with the aid of a long-stroke module (coarse positioning) (not shown) and a short-stroke module (fine positioning) (not shown), which form part of positioning means 116 and 120. However, in the case of a stepper (as opposed to a scanner) mask table 116 may be connected to a short stroke actuator only, or may be fixed. Mask 114 and substrate 118 may be aligned using mask alignment marks M1, M2 and substrate alignment marks P1, P2, respectively.
In various example, apparatus 100 can be used step, scan, or other modes, examples of which are described below, but are not to be seen as an exhaustive list.
In step mode, mask table 106 and substrate table 108 are kept essentially stationary, while an entire pattern imparted to radiation beam 112 is projected onto a target portion C in one go (i.e., a single static exposure). Substrate table 108 is then shifted in the X and/or Y direction so that a different target portion C can be exposed. In step mode, a maximum size of the exposure field limits the size of the target portion C imaged in a single static exposure.
In scan mode, mask table 106 and substrate table 108 are scanned synchronously, while a pattern imparted to radiation beam 112 is projected onto a target portion C (i.e., a single dynamic exposure). A velocity and direction of substrate table 108 relative to mask table 106 is determined by (de-)magnification and image reversal characteristics of projection system 110. In scan mode, a maximum size of an exposure field limits a width (in the non-scanning direction) of target portion C in a single dynamic exposure, whereas a length of the scanning motion determines a height (in the scanning direction) of target portion C.
In another mode, mask table 106 is kept essentially stationary holding a programmable patterning means, and substrate table 108 is moved or scanned, while a pattern imparted to radiation beam 112 is projected onto target portion C. In this mode, generally a pulsed radiation source 102 is employed and patterning means 114 is updated as required after each movement of substrate table 108 or in between successive radiation pulses during a scan. This mode of operation can be readily applied to maskless lithography that utilizes a programmable patterning means for patterning means 114, for example, but not limited to, a programmable mirror array of a type as referred to above.
Combinations and/or variations on the above described modes of use or entirely different modes of use may also be employed.
Exemplary Product and Target Patterning Means Arrangements
In one exemplary arrangement, shown in
In one exemplary arrangement, shown in
The patterning masks 114-1, 114-2, and 114-3 are arranged to impart a pattern in the cross-section of radiation beam 112 generated by illumination system 104.
Although a single radiation source 102 is illustrated in
In each of the arrangements shown in
Second Exemplary Lithography Apparatus
Apparatus 300 includes at least a radiation system 302, patterning devices 2 and 3, an object table 306 (e.g., a substrate table), and a projection system ("lens") 308.
Radiation system 302 can be used for supplying a projection beam 310 of radiation (e.g., UV radiation), which in this particular case also comprises a radiation source 312.
An array of patterning devices 2 and 3 (e.g., a programmable mirror array) can be used for applying a pattern to projection beam 310. In general, the position of the array of patterning devices 2 and 3 can be fixed relative to projection system 308. However, in an alternative arrangement, an array of patterning devices 2 and 3 may be connected to a positioning device (not shown) for accurately positioning it with respect to projection system 308. As here depicted, patterning devices 2 and 3 are of a reflective type (e.g., have a reflective array of individually controllable elements).
Object table 306 can be provided with a substrate holder (not specifically shown) for holding a substrate 314 (e.g., a resist coated silicon wafer or glass substrate) and object table 306 can be connected to a positioning device 316 for accurately positioning substrate 314 with respect to projection system 308.
Projection system 308 (e.g., a quartz and/or CaF2 lens system or a catadioptric system comprising lens elements made from such materials, or a mirror system) can be used for projecting the patterned beam received from a beam splitter 318 onto a target portion 320 (e.g., one or more dies) of substrate 314. Projection system 308 may project an image of the array of patterning devices 2 and 3 onto substrate 314. Alternatively, projection system 308 may project images of secondary sources for which the elements of the array of patterning devices 2 and 3 act as shutters. Projection system 308 may also comprise a micro lens array (MLA) to form the secondary sources and to project microspots onto substrate 314.
Source 312 (e.g., an excimer laser) can produce a beam of radiation 322. Beam 322 is fed into an illumination system (illuminator) 324, either directly or after having traversed conditioning device 326, such as a beam expander 326, for example. Illuminator 324 may comprise an adjusting device 328 for setting the outer and/or inner radial extent (commonly referred to as R-outer and w-inner, respectively) of the intensity distribution in beam 322. In addition, illuminator 324 will generally include various other components, such as an integrator 330 and a condenser 332. In this way, projection beam 310 impinging on the array of patterning devices 2 and 3 has a desired uniformity and intensity distribution in its cross section.
It should be noted, with regard to
Beam 310 subsequently intercepts the array of patterning devices 2 and 3 after being directing using beam splitter 318. Having been reflected by the array of patterning devices 2 and 3, beam 310 passes through projection system 308, which focuses beam 310 onto a target portion 320 of the substrate 314.
With the aid of positioning device 316 (and optionally interferometric measuring device 334 on a base plate 336 that receives interferometric beams 338 via beam splitter 340), substrate table 306 can be moved accurately, so as to position different target portions 320 in the path of beam 310. Where used, the positioning device for the array of patterning devices 2 and 3 can be used to accurately correct the position of the array of patterning devices 2 and 3 with respect to the path of beam 310, e.g., during a scan. In general, movement of object table 306 is realized with the aid of a long-stroke module (course positioning) and a short-stroke module (fine positioning), which are not explicitly depicted in
In an alternative configuration of the embodiment, substrate table 306 may be fixed, with substrate 314 being moveable over substrate table 306. Where this is done, substrate table 306 is provided with a multitude of openings on a flat uppermost surface, gas being fed through the openings to provide a gas cushion which is capable of supporting substrate 314. This is conventionally referred to as an air bearing arrangement. Substrate 314 is moved over substrate table 306 using one or more actuators (not shown), which are capable of accurately positioning substrate 314 with respect to the path of beam 310. Alternatively, substrate 314 may be moved over substrate table 306 by selectively starting and stopping the passage of gas through the openings.
Although lithography apparatus 300 according to the invention is herein described as being for exposing a resist on a substrate, it will be appreciated that the invention is not limited to this use and apparatus 300 may be used to project a patterned projection beam 310 for use in resistless lithography.
In one example, at least one of patterning devices 2 and 3 comprises an array of individually controllable elements. In general, a position of patterning devices 2 and 3 will be fixed relative to projection system 308. However, in other examples, at least one patterning device 2 or 3 may instead be connected to a positioning means for accurately positioning them with respect to projection system 308.
In one example, as shown in
In one example, product patterning device 2 comprises a reflective mask 4, which is supported and controlled by a mask table and controller 8.
In one example, product patterning device 2 may also be arranged to comprise an array of individually controllable elements, in which case item 8 would function in a similar fashion to the metrology target patterning device controller 10.
In one or more examples or embodiments, patterning the metrology targets using an array of individually controllable elements, independently from whichever process is used to pattern the product features, allows more efficient updates to be made to the metrology targets without affecting the throughput achieved in the product manufacturing cycle.
It is generally difficult to predict in advance how well a given metrology target will perform in practice. Performance may be improved by fine-tuning the properties of the metrology target, but this would normally require substantial expense and loss of time, particularly if a new reticle set has to be produced for each change of metrology target and if device/product manufacturing processes have to be interrupted and/or delayed in order to carry out these processes. One or more examples or embodiments of the present invention improves the situation by separating the metrology target pattern from the product feature pattern and, particularly where an array of individually controllable elements is used, facilitating the process of changing a metrology target pattern.
In this embodiment, substrates developed with the updated metrology target are tested in the same way, and the cycle continues until the performance of the metrology targets falls within predetermined bounds of acceptability. The efficiency of this system allows not only optimization of metrology targets of a standard design type, but, because a larger number of trials are possible, also facilitates broader evaluation of alternative metrology target types.
Exemplary Arrangement of Metrology Targets
In one example, metrology targets 22, 24, 25, and 27 may be confined to a metrology target region (e.g., regions 35 and 39 in
However, in other examples, metrology targets 22, 24, 25, and 27 may be distributed in a more complex fashion over the surface of the substrate W.
The number and size of metrology targets is limited by space considerations, since they sometimes take up room that might otherwise be used for product features. However, it is desirable that metrology targets be of a certain minimum size and that a plurality of different metrology target designs be printed. In a testing context, for example, to see which locations suffer least from cross-talk, this may be to allow more designs to be evaluated per substrate W. More generally, a number of metrology targets will be required to perform the variety of metrology steps required for accurate lithography. Another reason may be to include metrology target standards from a number of different manufacturers in order to allow different layers to be printed by different machines.
Various embodiments and/or examples of the present invention address the problem of limited space for the metrology targets. For example, a separately controllable metrology target patterning device 3, which allows the metrology target to be easily varied, such as between one die and the next, without changing the pattern imparted by product patterning device 2. High throughput may thus be maintained and, in the case where the metrology target is changed between one die and the next, unnecessary repetition of targets between dies is avoided, thus saving space without reducing the number of metrology targets used. For example, where it is necessary to have separate coarse and fine alignment marks, these may be located in corresponding regions of different dies. In this case, two types of exposure die would exist: a first for printing the product and the fine alignment mark, and a second for printing the product and the coarse alignment mark. The occupied area for the metrology marks is the same in each case and space is therefore saved.
In one example, when the metrology targets are used for alignment, they may be inspected at longer wavelengths than that used to image the product features, so that substructure 30 becomes invisible and does not interfere adversely with the operation of the metrology target as a whole. However, the presence of the product-like features ensures that the metrology targets image in a similar way to the actual product features of the device to be formed and do not suffer from different shifts or errors in the projection system.
Copies of the metrology target are shown in this example because this is an approach that may be favored economically to limit the overhead costs associated with applying protective structures, i.e., no new types of marks need to be made available.
It is to be appreciated that alternative structures may be used, particularly where it is possible to produce such structures without change to the product pattern.
In one example, dedicated protective structures are desired as they can be tailored more extensively to optimize their performance. The dedicated structures may be continuous, for example, rather than island-like, and be arranged to completely surround the metrology target to be protected.
The separation of the metrology target patterning device 3 and the product patterning device 2 allows a variety of configurations to be tested. Parameters that may be important include both the form of the surrounding structures and the separation between those structures and the structures to be protected. A balance may need to be struck between protecting the metrology target and leaving enough space around the metrology target to allow it to perform correctly.
In one example, although neighboring patterns (either deliberately added protective structures or nearby product features) can serve to protect a metrology target, they can also have a negative impact on performance if cross-talk occurs. It can be difficult to predict where cross-talk of this kind will be a problem.
In one example, a number of different positions for each type of metrology target are tried, and a deduction of which position is more desirable is determined.
In one example, an application is provided (e.g., implemented in software, firmware, or both,) that is arranged to analyze the product pattern and the desired metrology target pattern(s), and determine whether the intended metrology target location is optimal. For example, locations where the nearby product structure is most different to the metrology target are likely to be preferred.
In this embodiment, although it maybe known what kinds of metrology target are likely to be needed for a given process layer, it may not be clear in advance how best to implement each metrology target for a given product pattern. The separation of the product pattern data from the metrology target pattern data, as described above, allows the implementation of a metrology target verification and adaptation device 7, which is provided to facilitate the introduction of new kinds of metrology target by evaluating a proposed metrology target design and location on the substrate (input, for example, from a metrology target pattern controller 31 via data path 15 a) while taking account of the product pattern to be printed (the relevant data being made available via data paths 13 a and 15 a). If judged necessary, the metrology target verification and adaptation device 7 calculates a suitable correction to either or both of the metrology target pattern or location and sends this correction as a feedback via data path 15 b. Once the metrology target verification and adaptation device 7 judges that the likely performance of the metrology target is within acceptable limits, an updated metrology target pattern data is forwarded via data path 15 c to control system 29. In this way, the metrology target pattern can be updated in real-time without interrupting the product patterning process. The approach also facilitates the effective introduction of entirely new metrology targets in real time.
While various embodiments of the present invention have been described above, it should be understood that they have been presented by way of example only, and not limitation. It will be apparent to persons skilled in the relevant art that various changes in form and detail can be made therein without departing from the spirit and scope of the invention. Thus, the breadth and scope of the present invention should not be limited by any of the above-described exemplary embodiments, but should be defined only in accordance with the following claims and their equivalents.
|Cited Patent
|Filing date
|Publication date
|Jan 21, 1992
|Jul 20, 1993
|Hughes Aircraft Company
|Exposure device including an electrically aligned electronic mask for micropatterning
|May 2, 1991
|Mar 22, 1994
|Fraunhofer-Gesellschaft Zur Forderung Der Angewandten Forschung E.V.
|Illumination device
|Nov 7, 1994
|Mar 19, 1996
|Nikon Corporation
|Method of detecting positions
|Dec 21, 1994
|Jun 4, 1996
|Texas Instruments Incorporated
|Method and apparatus for patterning and imaging member
|Mar 21, 1995
|Jun 25, 1996
|Texas Instruments Incorporated
|Pixel data processing for spatial light modulator having staggered pixels
|Dec 6, 1994
|Nov 26, 1996
|Nikon Corporation
|Scanning light exposure apparatus
|Oct 31, 1994
|May 6, 1997
|Lsi Logic Corporation
|Integrated circuit test reticle and alignment mark optimization method
|Feb 21, 1995
|Aug 12, 1997
|Lucent Technologies Inc.
|Process for fabricating a device in which the process is controlled by near-field imaging latent features introduced into energy sensitive resist materials
|Jan 6, 1995
|Oct 14, 1997
|Texas Instruments Incorporated
|Data loading circuit for digital micro-mirror device
|Apr 26, 1996
|Sep 15, 1998
|Silicon Light Machines
|Method and apparatus for modulating a light beam
|Mar 20, 1997
|Nov 9, 1999
|Silicon Light Machines
|Display device incorporating one-dimensional grating light-valve array
|Feb 20, 1997
|Oct 17, 2000
|Johnson; Kenneth C.
|Microlens scanner for microlithography and wide-field confocal microscopy
|Apr 9, 1999
|Jan 23, 2001
|Kenneth C. Johnson
|High-throughput, maskless lithography system
|Sep 20, 1999
|May 29, 2001
|Mitsubishi Denki Kabushiki Kaisha
|Exposure method, exposure apparatus and semiconductor device manufactured by using the exposure apparatus
|Jul 7, 1999
|Jun 26, 2001
|Ball Semiconductor, Inc.
|Maskless photolithography system that digitally shifts mask data responsive to alignment data
|Jul 23, 1998
|Oct 29, 2002
|Nikon Corporation
|Method of manufacturing exposure apparatus and method for exposing a pattern on a mask onto a substrate
|Mar 2, 1999
|Feb 3, 2004
|Micronic Laser Systems Ab
|Pattern generator using EUV
|Feb 22, 2002
|May 4, 2004
|Asml Netherlands B.V.
|Computer program for determining a corrected position of a measured alignment mark, device manufacturing method, and device manufactured thereby
|Mar 2, 1999
|Jun 8, 2004
|Micronic Laser Systems Ab
|Pattern generator
|Mar 7, 2003
|Sep 21, 2004
|Nikon Corporation
|Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus
|Oct 25, 2002
|Oct 19, 2004
|Dainippon Screen Mfg. Co., Ltd.
|Image recording apparatus using the grating light valve
|May 22, 2001
|Nov 2, 2004
|Nikon Corporation
|Exposure apparatus, method for manufacturing therof, method for exposing and method for manufacturing microdevice
|Jun 9, 2003
|Dec 14, 2004
|Fuji Photo Film Co., Ltd.
|Exposure device
|Jan 28, 2003
|Mar 22, 2005
|International Business Machines Corporation
|Integrated lithographic print and detection model for optical CD
|Feb 27, 2003
|Aug 30, 2005
|Asml Netherlands B.V.
|Calibration methods, calibration substrates, lithographic apparatus and device manufacturing methods
|Sep 22, 2003
|Aug 30, 2005
|Asml Netherlands B.V.
|Lithographic apparatus, computer program, device manufacturing method, and device manufactured thereby
|Jun 25, 2002
|May 23, 2006
|University Of South Florida
|Maskless photolithography for using photoreactive agents
|Apr 25, 2003
|Jul 11, 2006
|Kla-Tencor Technologies Corporation
|Method and mark for metrology of phase errors on phase shift masks
|Dec 24, 2003
|Oct 31, 2006
|Asml Netherlands B.V.
|Method of measurement, method for providing alignment marks, and device manufacturing method
|Feb 3, 2003
|Jan 22, 2004
|Gijsbertsen Johannes Gerardus
|Lithographic apparatus and device manufacturing method
|Jun 10, 2003
|Mar 4, 2004
|Asml Netherlands B.V.
|Lithographic apparatus and device manufacturing method
|Oct 30, 2003
|Jun 24, 2004
|Mircea Dusa
|Test pattern, inspection method, and device manufacturing method
|Jan 7, 2003
|Jul 8, 2004
|Kanti Jain
|Maskless lithography with multiplexed spatial light modulators
|Jun 1, 2004
|Jan 6, 2005
|Method and system for regulating the average electromagnetic torque of a rotating electrical machine, storage medium and data structure for carrying out the method
|Mar 30, 2004
|May 19, 2005
|Fusao Ishii
|Methods for patterning substrates having arbitrary and unexpected dimensional changes
|May 1, 2003
|Sep 29, 2005
|Golan Hanina
|System and method for manufacturing printed circuit boards employing non-uniformly modified images
|Feb 4, 2005
|Jan 19, 2006
|Asml Netherlands B.V.
|Lithographic apparatus and device manufacturing method
|May 28, 2004
|Dec 1, 2004
|ASML Netherlands B.V.
|Lithographic apparatus and device manufacturing method
|Title not available
|Jan 29, 1997
|Jul 30, 1998
|Micronic Laser Systems Ab
|Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
|Feb 26, 1998
|Sep 3, 1998
|Micronic Laser Systems Ab
|Data-conversion method for a multibeam laser writer for very complex microlithographic patterns
|English Abstract of Japanese Patent Pub. 2-278812, published Nov. 15, 1990, 1 pg.
|Office Action, Japanese Patent Appln. 2005-202636, mailed Oct. 7, 2008, 3 pgs.
|Citing Patent
|Filing date
|Publication date
|Jun 7, 2006
|Nov 8, 2011
|Asml Netherlands B.V.
|Mirror array for lithography
|Jun 7, 2006
|Dec 13, 2007
|Asml Netherlands B.V.
|Mirror array for lithography
|U.S. Classification
|356/401, 430/22, 356/620, 430/30, 355/53
|International Classification
|Cooperative Classification
|European Classification
|Oct 28, 2004
Owner name: ASML NETHERLANDS B.V., NETHERLANDS
Free format text: ASSIGNMENT OF ASSIGNORS INTEREST;ASSIGNORS:HINNEN, PAUL CHRISTIAAN;VAN HAREN, RICHARD JOHANNES FRANCISCUS;SIMONS, HUBERTUS JOHANNES GERTRUDUS;REEL/FRAME:015316/0085
Effective date: 20041007
|Jan 31, 2013
|Fee payment
Year of fee payment: 4
|Jan 31, 2017
|Fee payment
Year of fee payment: 8


text:
Cisdem PDFCompressor 3.0.1 is a smart PDF compressor to reduce PDF file size. With the user-friendly interface, it can easily compress the size of single or multiple PDF files and maintain the original PDF format. Besides, four preset filter modes (Minimal file Size, Small File Size, Medium File Size, Large File Size) and resolution/image quality settings let you quickly set the resolution and JPEG quality for different PDF documents.
- Four Preset Modes: Minimal File Size, Small File Size, Medium File Size, Large File Size to meet your different ordinary compression need.
- Customized DPI (Dots Per Inch): You can also set the specific preferred compression result and content quality if necessary.
- Real-time Size: Show the sizes of your PDF files and the predicted sizes in different compression modes after compression.
- Support Batch Compression: No matter compress hundreds of PDF documents or a 500-page PDF file, it just need one click.
- Support Page Selection and Preview: Drag-n-drop multiple PDFs in one go, preview them and select specified pages (e.g., 1,3-10,21 or all pages) to compress.
- Keep the Highest Quality: Only remove the useless elements to reduce the large PDFs to their smallest size, without compromising quality.
- Support all versions of PDF documents without Adobe Acrobat Reader installed.
- Fully support macOS Sierra 10.12.
What's New in Version 3.0.1:
- Four preset compression modes
- Allow users to customize resolution and JPEG quality
- Greatly-improved compression performance
- Brand-new interface
- Add Support for macOS 10.12 Sierra
- Fix some minor bugs
System Requirements:–
1. Unpack and install
2. Go through Installation Guide provided in File
3. Done.

subset: commoncrawl


text:
GOOD MORNING, BLOGTOWN! Hang the sign upon the door, say, "Don't disturb this groove." Just a way to say that I'm so into you. LET'S GO TO PRESS.
It's Cyber Monday. Snore.
A Bronx passenger train jumped the tracks on Sunday, killing four and injuring dozens. Investigations are underway.
On Saturday, star of the Fast & Furious, Paul Walker, died in a fiery car accident—and some are suspecting (irony alert) that drag racing was involved.
UN investigators apparently have information that implicates Syrian President Bashar al-Assad in war crimes. SHOCK.
Amazon is considering using drones to deliver your packages—BUT I THOUGHT THEY ALREADY DID HAAHAHAHAHAHAHAHAAAAA! (Do you get it? Minimum wage workers? DRONES?? HAHAHAHAAAAAAA. Goddammit I kill myself.)
Hey, did you fly US Air out of Austin or Phoenix this weekend? Hope you didn't catch tuberculosis!
While there's more work to be done, according to the government, the troubled HealthCare.gov site is well on its way to being somewhat kinda sorta functional.
Hawaii's new same-sex marriage law went into effect at midnight, so let's say "Hoomaikai ana, lelo hoomaikai" to the happy couples! (Impressed?)
Also congrats to actress Maria Bello (who was great in The Cooler among other films) who came out of the closet in a New York Times op-ed.
In sports, Timbers coach Caleb Porter wins the MLS coach of the year award—and deserves it!
Now here's what's going on in your neck of the woods: Rainy and 45 today, but get out your muffs, because we've got a very cold, sunny week ahead!
And finally, this scientist gets a very rude surprise when he cuts open the stomach of a sperm whale. MONDAYS, AMIRITE?


text:
Nerf have been storming ahead in the outdoor games sector for decades, and today, are more popular than ever before! Here at Cards and Crazes we have a great selection of wholesale Nerf blaster toys and accessories in stock and available for next day delivery.
Our selection of Nerf products includes the Nerf NStrike Elite Firestrike, the Nerf NStrike Elite Jolt Blaster and the Nerf NStrike 30 Dart Refill Pack. We also have the incredibly popular NERF NStrike Elite Strongarm Blaster - speed and mobility belong to you with this awesome blaster. It has an azmaing 75 feet of long range power and can rapid fire six darts. To say it provides hours of fun is a massive understatement.
Can't find the Wholesale Nerf product you're looking for? Don't worry, we're here to help! Call us on 01254 770444 or drop us an email on firstname.lastname@example.com - our friendly toy experts will be more than happy to help.


text:
Kyle's Facebook
Recent Posts
Tag Archives: Westminster
Under the weather
It has been a tough week. Coming through the holidays is always tough – the added pounds, missed workouts, early darkness and, of course, it is still cold. This year was no different. I actually did not miss too many … Continue reading
Day 17: Kickin' off the rust
Breaking out of the funk. Continue reading
Day 14: Change of pace
Got out on the beautiful Colorado trails for some cardio activity. Continue reading
Posted in active lifestyle, running, sports Tagged biking, cardio, cardiovcascular, colorado, encourage, goals, inspire, maintenance, marathon, stationary bicycle, Thornton, training, Westminster Leave a comment


text:
What is "Enough"?
I got an email from a college student this morning asking me for financial advice and tips as they near graduation. I always respond to emails like this and try to give people useful advice. But deep down in my heart I know I am mostly just repeating mundane and useless bull shit. You know,… Read More


text:
About Me
- Finch
- Leeds, Yorkshire, United Kingdom
- I've been making things all my life in some way.....its all I know and all I want to do. You are welcome to follow me on any of the following links...Website, Pinterest, Tumblr, and Facebook.
Wednesday, 31 July 2013
Moth hares............
Apologies for not blogging much on here........I'm using my face book page mostly now as it seems quicker to show and share images and just seems to be best for work at the moment.
Still doing lots of long days but I do love it.....a couple more creatures for The Imaginarium....Two Moths hares are nearly ready.....complete with antennae and two large and two smaller sets of wings....Have been wanting to make these for ages....
Rarely seen by humans moth hares are most active when the moon is fat and the nights are warm.
Initially created by witches as familiars these winged beasts are both powerful and mysterious. Legend tells of groups seen flying together at dusk.....
13 comments:
I love these chimeric creatures!ReplyDelete
In a poetry class I am taking the idea of "moss piglets" came up and I am just so taken with the phrase. Doesn't that seem like a creature that ought to be rendered in textiles?
They look magical!ReplyDelete
Beautiful! They look so mysteriousReplyDelete
I love the way you have photographed them too .... wonderful. See you on facebook! xReplyDelete
Hey Mr. Finch ...ReplyDelete
... love your moths hares! Just magical!
Karen B. ~ Todolwen
That is so so cool!!ReplyDelete
I'm enchanted with these whimsical moth hares and their magical tale, such an inspirationReplyDelete
As long as they don't come crashing round my light while the door is open of an evening...
So full of wonderment and mystery...I ♥ them! xReplyDelete
I hope you will continue to update the blog as I don't have Facebook and I check here every day, I love your creations!ReplyDelete
I thought I spotted one the other night ~ flitting 'round the bittersweet vine near the lamplight...I put out a small dish of honeywater to tempt her closer but she wouldn't oblige. Hoping to have her visit once more ~ReplyDelete
please please please post more often.
Blessed be,
ahhhhhh. thank you.ReplyDelete


text:
Take out: A captive audience part 5on July 20, 2011 at 12:01 am
If you're still here, thanks for sticking it out.
I wanted to get the gags done that I had popping into my head while I was trying to finish the break up/possession thingy over with… so I'm sure this story arc lasted a bit longer than some would have liked it to, but I didn't want to just say, "Okay it's over."
The intent for Friday is a one-off and depending on how many one-offs I'm able to string together I might do them all next week too. I've got ideas for the next part of the Zombie Roomie plot line, but I'm not sure which I'll do next.
Also, George will never learn.


text:
We recommend upgrading to the latest Internet Explorer, Google Chrome, or Firefox.
If you are using IE 9 or later, make sure you turn off "Compatibility View".
Handpicked brands for you
DPS Koala, Santi Guzman, sporting a Classic T under late April sun in the Wasatch. Get one, by following the link in our bio #dpskoalas #mydps #wasatch


text:
Category: Stock Graphic, Illustrations
Stock Graphic >> Illustration - Mother Bird in Nest and Egg 156327 by Popmarleo Shop @ CreativeMarket
File Size: 976.15 KB; Layered: Yes; Vector: Yes.
Brightly Colored bird and her egg. Vector illustration EPS10.
Keywords: birth, birthday, egg, bird, birdie, birdhouse, mother, nest, nestling, kid, baby, cute, animals, watercolor, vector, drawing, childish, cartoon, fun, illustration, artistic, drawn, vintage, isolated, sweet, art, design, decorative, elements, adorable, nature, wings, wild, wildlife, zoo, twig, fauna, wreath, character, colored, colorful, clip, blue, fly, card.


text:
What is Blockchain from Bitcoin?2
In the world of bitcoins, there are mainly two categories of people: the ones that mine Bitcoins with their computers, which are more interested about the technical matters of the coin, such as mining and creating it, and the speculators, which are more interested about exchanging, buying and selling the Bitcoin.
While the rapid and unpredictable changes of the BTC/USD chart is fascinating even for experienced investors, the miners are interested about the way the bitcoins are produced, and it is better even for investors that are not so familiar with computer hardware to understand how the coins are created.
What is a Blockchain?
The principle of blockchains was not invented with bitcoins. There are other areas in which blockchains are used, but in the case of Bitcoins, the principle is interesting, as it gives some unique characteristics to the coin.
A blockchain is a series of nodes and blocks that are connected after the Bitcoin protocol. This way, any transaction made at any time with bitcoins is recorded. Moreover, as Bitcoins are created, each new block contains all the information about the previous blacks, as well as information about the ones that follow, the ones that are about to be created. This way, the possibility of a bitcoin to be falsified or used twice is practically impossible, limiting the possibilities of frauds with bitcoins.
Once a block is created, it is impossible to modify anything about it, and the block following it can't be created unless all the details about the previous one exist in the system. A chain of coins is valid only if the last block created has all the information about the previous one in the chain, starting from the original one.
Failed blocks
Any block of a chain is connected with a unique path with the previous ones, until the original block. However, there is a possibility for orphan blocks to be created. In some cases, there is also the possibility for fork blocks, which occurs when two blocks are created practically at the same time.
As one of the last operations that are made is to connect the block to the chain, whichever of the two blocks manages to connect to the network would be the valid one, while the other would fail to connect, resulting in an orphan block. The respective sequence is not lost, as it is reintroduced to the pool for later processing. Along the time, 100 blocks of Bitcoins where in this situation, and it is expected for a lot more blocks to be in this situation in the near future, especially because the number of miners has grown dramatically during the latest months.
The block chain algorithm has applications in other informational areas, but also in economy. From this point of view, the bitcoin can be considered as the most secure coin in the world, considering the fact that the number of coins is carefully counted, as well as all the transactions made with it.
Mining Bitcoins, creating chains
Creating a block is not an easy task, especially because graphical resources of hundreds of computers are needed for this. Because the amount of information needed for any block is huge, computers from all over the world contribute to the creation of each block. As working in a team is more lucrative, miners prefer to gather in pools, and to contribute as a team to the entire creation process. It is possible to mine as a standalone user, but simple calculation tells us that it is better to mine and to create blocks in a team.
The average speed of a computer for creating blocks is 0.02 Bitcoins per day, so , in rough theory, it might be possible to create one bitcoin every 50 days. You will only be rewarded when you reach 25 Bitcoins, so this means that you need to wait about three years to be rewarded. (The value of a bitcoin on 9 April 2013 was 250 $, so this means about 6000$, but do you really want to wait so long?). Not to mention the fact that you might be so unlucky to create an orphan block, in which case, you will not be rewarded.
In a mining pool, all the computers contribute to the creation of the same block in the chain, which means an increased creation speed. Some pools are so big that they can create a unit within hours. As soon as the block is validated in the blockchain, the miners will be rewarded according to their contribution to the respective block, so even if you will get less money, at least it is safer, faster and it is also fun to mine in a team, especially because you can talk on chat with other miners, so you could get great ideas about improving your mining performance.


text:
'Say what you see' TV commentary has to end
Good live radio commentary is a soundscape. Undulations, sketched out vocally as events unfold, now made real in the mind's eye of the listener.
Television is different but for all the new technology GAA matches still largely take place off screen. Who is marking who, how have the teams lined out, how many sweepers are just some questions being asked and answered by both teams as the ref throws the ball in.
On radio, it's a breathless time as the best analysts explain what brainpower the managers are unveiling. Jamesie O'Connor is a master at it in hurling. His excitement at finally seeing the masterplan unveiled is infectious. It's the foundation text of the game. It is knowledge, shared and imparted and explained.


text:
A Madison man was critically injured in a single-vehicle accident Monday afternoon, according to Georgia State Patrol reports.
Print-ready version
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Ben Elder was injured when he lost control of his truck shortly before 2 p.m. as he traveled west on Dixie Highway near Hightower Road, between Rutledge and Madison in Morgan County, said Trooper J.M. Bloodworth of the Madison post of the Georgia State Patrol.
Elder's Ford F250 truck, owned by the city of Rutledge, hit a dirt driveway embankment and then slammed into a tree on its passenger side after leaving the roadway, according to the investigating officer, Cpl. Doug Wilson.
Elder, 55, works for the Rutledge Water Department. Elder was taken to Atlanta Medical Center in critical condition, according to the patrol.
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text: Bought the moto car dock and a soft case thinking I could mod the case to make it work. Even with the insert out it and trimming the case it still isn't right, so I have come to realize that I will just have to suck it up and put the case on and off every time I get in the car. But I want better protection than just a thin rubber case, so what's the best hard chase that either snaps on and off easily or some way that's quick.


text:
Tryout Information for Levels Two and Three
Scroll down the page for tryout dates, locations and times.
1. Level 1 does NOT require a tryout. (Only levels 2 and 3 require tryouts.)
2. If you have previously passed a level 2 or level 3 tryout, you do not need to try out again – you are already eligible for that level.
3. If you want to play level 3 and have not passed a level 2 tryout, you must first pass a level 2 tryout and then also pass a level 3 tryout. No exceptions.
4. You can try out more than once before the start of any NJTL session.
5. The location where you try out and the location where you intend to play do NOT need to be the same location. You can try out at any of the scheduled tryouts, and you can choose to play at any of our locations.
6. You do not need to notify the NJTL office if you are attending a tryout. Please make every effort to be prompt. If you arrive late, you will NOT have the benefit of important instructions and warm-up time.
*Click here for level 2 tryout rules
*Click here for level 3 tryout rules
Winter II Tryouts
Wednesday, January 3, 2018
|Level 2 TIME
6 – 6:30 pm
|Level 3 TIME
6:30 – 7 pm
Level 2 Tryout Rules:
- Each participant will have one chance to pass all four skill challenges. Participants may not re-try a skill challenge at a tryout if they do not pass it the first time.
1. Bounce the ball down with their racquet 25 times in a row
a. Player may move around while bouncing the ball down
b. Player may use 1 or 2 hands to grip the racquet while performing this task
c. The ball must not bounce twice in between hits (one bounce, one hit)
2. Bounce the ball up with their racquet 25 times in a row
a. Player may move around while bouncing the ball up
b. Player may use 1 or 2 hands to grip the racquet while performing this task
3. Hit 7 out of 10 serves from the baseline into the correct service box
a. Player may choose whether they want to serve from the left or right side
b. Player must toss the ball up (may not bounce feed/serve)
4. Hit 7 out of 10 groundstrokes into the singles court from the baseline area
a. Instructor will feed balls from the middle of the court at the center service line "T"
b. Players will start from behind the baseline
c. Instructor will feed balls (forehand, backhand, forehand, backhand, etc.)
d.Players may hit the ball in any fashion (for example; If they want to hit all forehands, they can run around to hit all forehands; but the feeder will still direct the feeds to alternating sides)
Level 3 Tryout Rules:
Level 3 players should be proficient at all Level 2 skills and have significant match play experience (most playing on school teams) and fill the following criteria:
- Able to hit topspin during rallies.
- Use the continental (hammer) grip on their serves.
- Be in the process of developing better power, spin, and shot placement into their overall game.
- Starting to use strategy in singles and doubles match play.
If you have any questions about the NJTL of Indianapolis Level system, please feel free to e-mail the office at email@example.com or call 317.429.9965.


text:
AUSTIN, Texas -- The Longhorns return nine starters on defense but the two they lose were their most important players -- Kenny Vaccaro and Alex Okafor -- last season.
So, during this offseason, instead of smiling about what they have, most Longhorns have been lamenting who they are losing. That might be because what Texas has coming back was in large part responsible for the worst defensive performance in school history.
But they are supposedly older and wiser now. Of course, that will be tested rather quickly at places like BYU and home against Ole Miss. What can be said about this defense is it is deeper than it has been in several years. The two-deep is littered with returning starters and backups who have also started games. In fact, the linebacker group -- last year's Achilles' heel -- has seven players who have started at least one game. As for who will start the first game of 2013, well here is the best guess two-deep for Aug. 31.


text: G'day all, I am a long time Palm user, and have just switched camps with the signing up of a new phone plan that comes with an HTC Desire. So far, just trying to sync to Outlook - over 8000 calendar entries, over 1000 contacts. Perhaps I should have set a time limit on the calendar items.


text:
Black Seconds Paperback
by Karin Fossum
Ida Joner gets on her brand-new bike and sets off to buy sweets.
A good-natured, happy girl, she is looking forward to her tenth birthday.
Thirty-five minutes after Ida should have come home, Helga Joner, her mother, starts to worry.
She phones the shop and various friends, but no one has seen her daughter.
As the family goes out looking for Ida, Helga's worst nightmare becomes reality, and they contact the police.
Hundreds of volunteers comb the neighbourhood, but there are no traces of Ida or her bike.
As the relatives reach breaking point and the media frenzy begins, Inspector Sejer is calm and reassuring.
But he finds the case puzzling. Usually missing children are found within forty-eight hours.
Ida Joner seems to have vanished without a trace.
- Format: Paperback
- Pages: 256 pages
- Publisher: Vintage Publishing
- Publication Date: 05/07/2007
- Category: Crime & mystery
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Showing 1 - 5 of 5 reviews.
Review by smik
Helga Joner has often thought that her nine year old daughter Ida is too good to be true, too good to last. The disappearance of a child is every parent's worst nightmare. When Ida fails to arrive home from the shop, Helga feels she had been rehearsing the moment for years. First Helga and her sister Ruth scour the streets where they might find Ida, without success, and then they ring the police. Helga feels that somehow she has tempted fate, setting off an inevitable chain of events.When Inspector Konrad Sejer arrives at her house, Helga feels instinctively that he will find Ida. As time passes Sejer becomes concerned that no trace has been found of Ida or the bright yellow bicycle she rode to the shop. One hundred and fifty volunteers search for Ida without success. Eight days later there are still no clues, the search is to be scaled down, and a chance comment by Helga to Sejer gives them something new to work on.The careful reader will pick up the clues laid by Fossum early in the book, and probably feel at the book's end that he/she has always known where it was headed. But that won't diminish your enjoyment of this novel, The path is rich with scenes, characters, and explorations of how people think, and why they make the choices they do. Even so, nothing is certain, the characters are as large as life, and the scenarios so believable.This is the fifth title in Fossum's Inspector Sejer series. What a pity it has taken five years for an English translation of this masterpiece by the Norwegian "Queen of Crime" to become available. If you've never read anything by Karin Fossum, after BLACK SECONDS, you'll want to start the series at beginning, enjoying the connections between her novels, the plots she creates, and the development of the character of Konrad Sejer. Let's hope the next two novels in the series, already published in Norwegian, become more quickly available.Karin Fossum lives in Oslo, and, in her early fifties, a relatively young writer. Her successful Inspector Konrad Sejer series has been translated into over 16 languages. She won the Nordic Glass Key award in 1997 for DON'T LOOK BACK, and in 2005 CALLING OUT FOR YOU was shortlisted for a CWA Gold Dagger.
Review by miyurose
This book is part of a detective series, but it's written like literary fiction. I thought there was some really fantastic imagery; for example, this passage, which alludes to the book's title:Her heart was pounding hard and it hurt; she could hear the clock on the wall ticking mechanically. She had always thought of seconds as tiny metallic dots; now they turned into heavy black drops and she felt them fall one by one.That stuck with me throughout the entire book, and we're brought back to it in the end as Ida's cousin Tomme hears a ticking in his head. The plot here consists of several strings that Inspector Sejer masterfully manages to pull together as one. We're treated to the points of view of several people — Sejer and his partner, Jacob Skarre; Ida's mother, Helga; Ida's aunt, Ruth; Tomme; and even Elsa and Emil Johannes Mork — and this gives us a more well-rounded view of the story. Unlike other crime series, the focus here is much more on the story than on one single character. I thoroughly enjoyed this, and look forward to exploring more of Fossum's work. This emerging genre of 'nordic noir' is quickly becoming one of my favorites.
Review by ten_floors_up
Very accomplished, and probably my favourite out of the Karin Fossum books I've read so far. Should you believe that Scandinavian novels are variations on a theme of dark, brooding angst, then this may dispel that belief. The subject matter is indeed very serious but the treatment doesn't have the slightest hint of sensationalism, and has a very deft human touch. Recommended if your tastes veer towards spare evocative writing, "whydunnit" more than "whodunnit", and if you are a reader who doesn't prefer that every single loose end be tied up by the conclusion.
Review by ccookie
Black Seconds] by Karin FossumFirst line:~The days went by so slowly~A young girl goes missing and seems to have vanished without a trace. Fossum takes us inside the head of her mother, her aunt and uncle, her cousins and the police who are investigating the disappearance.I won this book a number of years ago in a contest put on by the local newspaper and put it on a shelf. There it sat until this month when the 2014 Category Group chose Nordic Mysteries as the April MysteryCat and I figured this was the time to check it out. I am very glad I did.Although I figured out 'who done it', long before Inspector Sejer did, what worked for me was the depth of the characters and the way that the author crafted the story so that we, the reader do know before the police. We are privy to the 'thinking' of the characters so know much more than the inspector does who only has access to physical evidence and whatever information the people involved tell him. And, although I did figure out the perp it was through subtle information ie no one outright said, "I did it". And it took the rest of the book to understand the 'how' and the 'why' for the crime.I'll definitely check out more by this author.3.5 stars
Review by jan.fleming
SYNOPSIS The plot in this book revolves around a child, Ida Joner, that disappears. she rides out on her yellow bike to buy some sweets. When she fails to return 35 minutes after she should have, her mother Helga starts to worry. She starts phoning around, but nobody has seen her. She scours the streets to no avail. So eventually she calls the police.
The next day a local search is organized, but without result. Ida Joner and her yellow bicycle seem to have vanished into thin air. As the relatives reach breaking point and the media frenzy begins, Inspector Sejer is calm and reassuring. But he finds the case puzzling. Usually missing children are found within forty-eight hours. Ida Joner seems to have vanished without a trace. Eventually, all he has to go on is a comment has feels may be significant.

Black Seconds deals with an crime that could happen anywhere. Karin Fossum tells a story of unfortunate confluences of events, accidental occurrences, and opportunities. The path is rich with scenes, characters, and explorations of how people think, and why they make the choices they do. Even so, nothing is certain, the characters are as large as life, and the scenarios so believable. Black Seconds is a powerful, impressive, probing and intriguing novel, almost as good as Calling out for You.

Highly recommended! A simple story, a traditional police procedural but it is the characters and the effects that crime has on ordinary people that make this such a great read.

Though it sounds perverse it really is a gentle thriller.

Fossum writes such empathy and compassion for her cast of characters and that includes for both victim, perpetrator and detectives.

Also by Karin Fossum | View all


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The open application period for the 2018-19 school year will begin in January of 2018.
The lottery will held on March 27, 2018 for the 2018-19 school year. Acceptance and waiting list results will be posted to MMCI accounts the day after the lottery.
Please read the following information carefully! If you have questions regarding lottery and enrollment processes that are not answered below, please contact the MMCI Admissions Committee at: email@example.com.
Parents are strongly encouraged to tour the schools prior to completing an application for the lottery. Please visit the school websites at Monocacy Valley Montessori Public Charter School and Carroll Creek Montessori Public Charter School to read more about MMCI's charter school programs. Read more about how to join a school tour at MVMPCS tours and CCMPCS tours.
How Do I Apply?
Admission to Monocacy Valley Montessori Public Charter School (MVMPCS) and Carroll Creek Montessori Public Charter School (CCMPCS) is determined from the results of two separate lotteries. There is no opportunity to enroll in either of our schools outside of the lottery process. FCPS charter regulations (Policy 440) and Maryland state law (SB 595) govern the lottery and acceptance process.
Applications are submitted and results are displayed via your MMCI log-in account. If you created an MMCI log-in account last year, you MUST use the same account this year. You can retrieve your username and password using the email address you validated when creating your account. If you have never created an MMCI log-in account, please follow the instructions to create one and then validate your email address. During the application period, you will be able to add, edit, or delete children on your application before confirming your lottery submission. Outside of the application period, you will be able to view previous lottery results.
Only one log-in account is allowed per family; duplicate accounts will be identified and deleted. Each log-in account must be verified with a valid email address, and you will be asked to provide a mailing address and telephone number. Please provide accurate information as we use it to communicate with accepted applicants both immediately following the lottery and throughout the year for wait list openings. If you need to change your contact information, please do so during the application period via the "Edit Profile" link in your account.
Applications for both schools are accepted using one application form; however, the lotteries for the two schools are completely separate. The applicant pool for each lottery is unique and the results from one school's lottery have no impact on the results for the other school's lottery. Applicants are advised to be thorough when reading and completing application materials, and to clearly indicate, where requested, the school or schools for which they want to participate in the public lottery. The children on one family application can apply to different lotteries (e.g., an 8th grader for MVMPCS and a 4th grader for Both Schools).
How do the lotteries work?
Each lottery is a random drawing of family application IDs. Each family's application has an equal chance of being selected during the general lottery, regardless of when the application was entered during the application period. When a family application ID is pulled, each child on that application is compared to the remaining openings available at the requested grade levels and the results are recorded as either accepted or wait listed for each child.
Priority lotteries are run prior to the general lottery at each school. The first priority lottery is for children of faculty/staff employed at each school. The second priority lottery is for siblings of children currently enrolled at each school on the day of the lottery. For all priority lotteries, if a slot is not available for a priority student, that student receives a priority wait list number. Also, MVMPCS priority applicants do not receive priority in the CCMPCS lottery and vice versa.
After the priority lotteries are run, the general lottery determines the placement of the remaining applicants at each school. If a child on a family's application is accepted, the other children on that application who were not accepted are given priority wait list numbers for that school. If none of the children on a family's application are accepted, all children are given general wait list numbers. At the conclusion of the general lottery, the list of accepted students per grade level and the wait list numbers per grade level are certified by MMCI Admissions, the school principals, and FCPS.
The acceptance and wait list results are posted to the MMCI accounts the day after the lottery. Children will remain on the active wait list until the next year's lottery is pulled. At that point, those wait lists are discarded and the results of the new lottery become the active wait list. You must re-apply and re-confirm your application every year during the open application period for any student not currently attending your desired school.
Returning Students
No lottery application is necessary for a currently enrolled student who wishes to remain at his or her current school.
How do I enroll my child?
Enrollment forms and other required registration paperwork will not be accepted by either school until your child has been offered a spot at that school.
If your child is selected for admission to an MMCI school, you will need to accept the desired placement by returning the Statement of Enrollment Intent. You will need to fill out an FCPS enrollment form. Both the Statement of Enrollment Intent and the FCPS Enrollment Form will be sent to you. In the event that your child wins a slot at multiple MMCI schools, you must submit enrollment paperwork for the chosen school within a 14 day period and explicitly decline the other offer. The slot declined at the other school(s) will then be released to the waiting list.
Parents of children not currently enrolled in FCPS will also have to complete an immunization form and a record of physical examination, provide current proof of residency (i.e. utility bill) within the last three months, and proof of birth for each child.
Current FCPS students enrolling/transferring to MVMPCS or CCMPCS will need to provide a current proof of residency. The other documentation (health records, student cumulative file, etc.) will be requested from the sending school.
All children on your application must be residents of Frederick County by July 1, 2017.
Proof of immunizations must be on file prior to the first day of school in order for students to attend on the first day.
Montessori Multi-Age Classrooms
There are four distinct age groupings in our Montessori schools: Primary, Lower Elementary, Upper Elementary, and Middle School.
The Primary classrooms include students from age 3 through Kindergarten. Your child must be three by September 1st to enter the three-year-old program, four by September 1st to enter the four-year-old program, and five by September 1st to enter Kindergarten. Early entrance to Kindergarten is only granted via the FCPS Kindergarten Early Entrance process. Please note: we cannot hold a spot for your child in both Pre-K and Kindergarten while you wait for FCPS results; if you request a Grade Level Exception for Kindergarten and are offered a Kindergarten spot via the lottery, you will forfeit that spot if your child is not approved for early entrance by FCPS in early summer. There is no early entrance for three-year-olds or four-year-olds. In addition, Primary students are not permitted delayed entrance. All children in Montessori programs progress at their own pace. Kindergarten hours are 9:00 AM to 3:30 PM on Monday through Thursday and 9:00 AM to 2:30 PM on Friday. The three-year-old and four-year-old program hours are 9:00 AM to 11:30 AM, Monday through Friday. Pre-K students are required to be independently toileting before the start of the school year.
The other three multi-age groupings in our schools include: Lower Elementary (Grades 1-3), Upper Elementary (Grades 4-6), and Middle School (Grades 7-8). The September 1st birthday cut-off also applies to these grade levels; however, there is a place on the application to indicate if your student should be applying for a different grade level based on their current grade level. Grade Level Exceptions are approved by the principals and outcomes are emailed. School hours for 1st through 8th graders are 9:00 AM to 3:30 PM on Monday through Thursday and 9:00 AM to 2:30 PM on Friday.
CCMPCS Spanish Program
For more specific information on CCMPCS's Spanish program, please visit the Spanish Program page.
MVMPCS and CCMPCS do not provide transportation. You must arrange to deliver your child(ren) to and from school each day. If you have three-year-old or four-year-old children in addition to older children who are accepted, you will be responsible for one drop-off and two pick-ups per day. Fee-based before care and after care are available for Kindergarten and up. There is no before care or after care for three-year-old or four-year-old students.
Fees and Fundraising for MMCI's Charter Schools
MVMPCS and CCMPCS are public charter schools. There is no fee for public school. However, since charter schools receive 70% of the funding per pupil given to traditional public schools, we must raise funds to bridge the gap. All MVMPCS and CCMPCS parents are automatic voting members of Monocacy Montessori Communities Inc. (MMCI), the non-profit that holds the charter agreements with FCPS. Per Maryland charter school law, MMCI must exist for our charter schools to exist. Families are requested to contribute to the MMCI Annual Fund Campaign every year to maintain regular operations of our schools. MMCI also participates in the Combined Federal Campaign and Maryland Charity Campaign and welcomes charitable contribution matching if available at your employer. Each school might also run campaigns for specific fundraising goals.
Parental Involvement in MMCI's Charter Schools
Active involvement of parents is at the heart of the charter school philosophy and is necessary for the successful operation of both schools. It is expected that families volunteer 30 hours per year (10 hours for single parent families). Specific ways in which parents might contribute include:
- Serving on the Board Of Trustees (BOT) for Monocacy Montessori Communities, Inc. (MMCI).
- Serving on either school's Governing Council (GC) and its working subcommittees.
- Serving as a guide to students wishing to master a particular skill.
- Offering presentations or short courses to a class in response to student interest.
- Accompanying students on field trips.
- Assisting and participating in special events.
- Coordinating and assisting with school clubs and activities.
In addition, parents are encouraged to attend teacher conferences, meetings of the MMCI corporation and social gatherings for the school community.
Is Montessori a Good Match for My Child?
The following information will help you determine whether the Montessori approach embraced by our schools is right for your child. Basic tenets of the Montessori approach include:
- It is natural for children to want to engage in meaningful work that is relevant to them
- Children will be self-directed when given the opportunity to do so
- Children will operate with as much independence as possible
- Children will remain engrossed in their work for long periods of time
- The work itself should be rewarding for children; external rewards and praise are counterproductive because they teach the child to look to others for validation
- Children learn from natural consequences
- Children should be taught to advocate for themselves
- Children will teach each other and learn from each other
In a Montessori classroom, you will find:
- Long uninterrupted periods of time for work (3 hours or more every morning)
- Students working individually or in small groups on a work plan the student created or helped to create
- Small group or individual instruction
- Multi-age classrooms spanning three grade levels (two levels in the MVMPCS Middle School)
- Teachers working with students to make decisions about their learning
- Busy classrooms with many different activities occurring at once
- Students freely moving around the classroom as needed
- Self-directed students working without frequent adult intervention
- Classroom sizes of 25-30 students
- A peace-loving environment where everyone is expected to treat themselves, others, and the materials with respect
- Children pursuing their interests in a variety of ways (projects, clubs, etc.)
- Many field trips (often planned by students)
- Teachers observing students and modeling the behaviors of a lifelong learner
In a Montessori classroom, you will not find:
- Extrinsic reward systems such as sticker charts
- Competitions between students
- Desks in rows
- Extensive teacher-directed, whole-group instruction
- A large number of paper and pencil tasks
- Silent classrooms: learning involves interactions with other students
- Extensive homework
Some children handle the transition from a traditional school very well. Some children, especially in the higher grades, may experience difficulty with the transition. The staff will work with students to teach them the skills they need to become more self-directed and students are then expected to show increased independence over time.
Thank you for your interest in our schools!
Click to begin application or log-in to your MMCI Account.


text:
Script Analysis with Written Notes - 140 page script
$ 465.00
The Save the Cat! script analysis includes:
Overall view of the script as assessed by the Cat! method including power of concept, delivery of key story points and if we are able to "follow the bouncing ball" of the hero's story
Assessment of A and B stories, key minor character arcs, tone and consistency
Examination of theme, and whether or not that theme is clear and powerful
The goal is to give the writer perspective on his or her script in order to address problems, execute a rewrite, and point the project toward a more structurally-sound direction.
The consultation concludes with a phone conversation for up to one hour with the Master Cat! who has analyzed your script and written notes of 4-5 pages.


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1572 N Main St, West Bend WI 53090-1554 Sold for $106,000 on 12/14/2016
Move In Ready - Low City Taxes
Features of 1572 N Main St West Bend WI 53090-1554
- Single Family Home
- Status: Sold
- 2 Bedrooms
- 1 Full Bathrooms
- 1 Half Bathrooms
- Est. Square Footage: 1,152
- Garage Type: None
- Est. Year Built: 1930
- School District: West Bend
- County: Washington
- Postal Municipality: West Bend
- Listing Company: Shorewest - West Bend-Hartford
- Price/SqFt: $92
Property Description for 1572 N Main St West Bend WI 53090-1554
1572 N Main St West Bend WI 53090-1554 - Move in ready home with plenty of green space to relax and enjoy. Room for a garden and the pets. Set back off the road and improved with newer knockdown drywall, paint and flooring. Low maintenance exterior and vinyl windows. Spread out floor plan with convenient full bathroom with Corian countertop and newer cabinetry, 6 panel doors. Also nicely finished and convenient first floor laundry/half bathroom combination. Open concept design with recessed lighting. Handy little breakfast bar. Easy in and out with no steps. Move in ready condition and super affordable with low interest rates still available. Low city taxes. Why rent when you can make home ownership a reality.
Room Dimensions for 1572 N Main St West Bend WI 53090-1554
- Master BR: 12.0 x 11.0
- BR 2: 13.0 x 7.0
- Family Rm: 11.0 x 9.0
- Kitchen: 12.0 x 10.0
- Living Rm: 15.0 x 11.0
- DiningArea: 11.0 x 8.0
- Full Baths: 1
- Half Baths: 1
Other rooms
- Full, Poured Concrete
Interior Features
- Heating/Cooling: Natural Gas
- Water Waste: Municipal Sewer, Municipal Water
- Appliances Included: None
Building and Construction
- 1 Story Ranch
Land Features
- Waterfront/Access: N
|MLS Number
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|Previous Status
|Activity Date
|New List Price
|Previous List Price
|Sold Price
|Dec 16 2016 9:36AM
|Oct 26 2016 8:58AM
|Oct 25 2016 3:11PM
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Buyer understands that the information which is contained on Data pages is obtained from a number of different sources and which has not been independently verified or confirmed by the various real estate brokers and agents who have been and are involved in this transaction. If any particular measurement or data element is important or material to buyer, Buyer assumes all responsibility and liability to research, verify and confirm said data element and measurement. REALTOR *MLS* Equal Housing Opportunity