text:
Two years back, I wondered if and when Catalonia would 'cross the Rubicon' and clearly position itself in contravention of Spanish law. Some sort of moment of illegality is essential in any process like this, just like during the Spanish Transition, to mark the break with one judicial and legal authority, and the beginning of a new one.
Yesterday, the two pro-independence groups in the Catalan parliament, with a majority of seats but not quite of votes, signed an agreement to present a 'solemn declaration' to the parliament for ratification next Monday, officially declaring the start of the formation of a new Catalan republic. Among the nine points in the declaration, the parliament will vote to approve that the Catalan institutions are no longer subject to the Spanish Constitutional Court, a tribunal it declares to be 'illegitimate' since its ruling against Catalonia's statute of autonomy in 2010.
Coup d'Etât
It was Mariano Rajoy, then leader of the opposition, who went around Spain collecting millions of signatures "contra los Catalanes", in order to apply pressure to a Constitutional Court decision. The decision to hear the case against the Estatut, described by Javier Pérez Royo in 2007 as a 'Coup d'Etât', was effectively the beginning of the current independence process. And it's Mariano Rajoy's immovable position which has precipitated yesterday's agreement.
Rajoy has been planning for a moment of illegality for some time. Indeed, he thought he had one in last year's 9N public consultation on independence, though that remains to be seen. This time, however, it looks more likely to stick. Which is why we had the uncharacteristically rapid response in the form of a televised statement, apparently agreed in advance with PSOE leader Pedro Sánchez.
Point of no return
So is this a point of no return? It looks like it could well be. Rajoy will now have to decide whether he treats it as a meaningless statement – "provocative", as he has already said, but meaningless all the same. Or whether he intends to take it seriously and respond just as seriously, by calling for sanctions of some sort against Catalonia.
And what will happen if Rajoy does push to suspend autonomy? That would be a first in Spain's current constitutional arrangement. And could it trigger a revolutionary situation in Catalonia? There are still many questions to answer.


text:
Skip to comments.What does it mean to "Table a bill" ?
Posted on 02/13/2009 9:49:55 PM PST by knarf
Wellll ... I always wondered.
It means you delay further action until it is called back to the floor. It means, you put the bill on hold.
Or it means you don't want to go on the record being against it, so you use parliamentary procedure to kill the bill by putting it off for good.
It is also used when it would shameful to have a record of your on a bill so you never let it come up for vote.
As I recall, it depends which side of the big pond you're on. In America, it means to stop discussing a bill. In the U.K., it means to start discussing one.
Disclaimer: Opinions posted on Free Republic are those of the individual posters and do not necessarily represent the opinion of Free Republic or its management. All materials posted herein are protected by copyright law and the exemption for fair use of copyrighted works.

subset: commoncrawl


text:
|Publication number
|Publication type
|Application number
|Publication date
|Jun 27, 2006
|Filing date
|Mar 27, 2000
|Priority date
|Sep 1, 1999
|Fee status
|Also published as
|Publication number
|Weimin Li, Zhiping Yin, William Budge
|Original Assignee
|Micron Technology, Inc.
|Export Citation
|BiBTeX, EndNote, RefMan
|Patent Citations (139), Non-Patent Citations (32), Classifications (36), Legal Events (7)
|External Links: USPTO, USPTO Assignment, Espacenet
This patent application is a divisional resulting from U.S. patent application Ser. No. 09/388,826, filed Sep. 1, 1999, entitled "Low k Interlevel Dielectric Layer Fabrication Methods", naming Weimin Li, Zhiping Yin, and William Budge as inventors, the disclosure of which is incorporated by reference.
This invention relates to methods of forming low k interlevel dielectric layers.
In methods of forming integrated circuits, it is frequently desired to electrically isolate components of the integrated circuits from one another with an insulative material. For example, conductive layers can be electrically isolated from one another by separating them with an insulating material. Insulating material received between two different elevation conductive or component layers is typically referred to as an interlevel dielectric material. Also, devices which extend into a semiconductive substrate can be electrically isolated from one another by insulative materials formed within the substrate between the components, such as for example, trench isolation regions.
One typical insulative material for isolating components of integrated circuits is silicon dioxide, which has a dielectric constant of about 4. Yet in many applications, it is desired to utilize insulative materials having dielectric constants lower than that of silicon dioxide to reduce parasitic capacitance from occurring between conductive components separated by the insulative material. Parasitic capacitance reduction continues to have increasing importance in the semiconductor fabrication industry as device dimensions and component spacing continues to shrink. Closer spacing adversely effects parasitic capacitance.
One way of reducing the dielectric constant of certain inherently insulative materials is to provide some degree of carbon content therein. One example technique for doing so had recently been developed by Trikon Technology of Bristol, UK which they refer to as Flowfill™ Technology. Where more carbon incorporation is desired, methylsilane in a gaseous form and H2O2 in a liquid form are separately introduced into a chamber, such as a parallel plate reaction chamber. A reaction between the methylsilane and H2O2 can be moderated by introduction of nitrogen into the reaction chamber. A wafer is provided within the chamber and ideally maintained at a suitable low temperature, such as 0� C., and at an exemplary pressure of 1 Torr to achieve formation of a methylsilane structure. Such structure/material condenses on the wafer surface. Although the reaction occurs in the gas phase, the deposited material is in the form of a viscous liquid which flows to fill small gaps on the wafer surface. In applications where disposition thickness increases, surface tension drives the deposited layer flat, thus forming a planarized layer over the substrate.
The liquid methylsilanol is converted to a silicon dioxide structure by a two-step process occurring in two separate chambers from that in which the silanol-type structure was deposited. First, planarization of the liquid film is promoted by increasing the temperature to above 100� C., while maintaining the pressure at about 1 Torr, to result in solidification and formation of a polymer layer. Thereafter, the temperature is raised to approximately 450� C., while maintaining a pressure of about 1 Torr, to form (CH3)xSiOy. The (CH3)xSiOy has a dielectric constant of less than or equal to about 3, and is accordingly less likely to be involved in parasitic capacitance than silicon dioxide and/or phosphorous doped silicon dioxide.
Nevertheless, it would be desirable to develop improved methods for reducing parasitic capacitance of interlevel dielectric layers which comprise carbon and regardless of the method of manufacture of such layers.
The invention comprises methods of forming low k interlevel dielectric layers. In one implementation, a low k interlevel dielectric layer fabrication method includes providing a substrate having integrated circuitry at least partially formed thereon. An oxide comprising interlevel dielectric layer comprising carbon and having a dielectric constant no greater than 3.5 is formed over the substrate. After forming the carbon comprising dielectric layer, it is exposed to a plasma comprising oxygen effective to reduce the dielectric constant to below what it was prior to said exposing.
In one implementation, a low k interlevel dielectric layer fabrication method includes providing a substrate having integrated circuitry at least partially formed thereon. In a chamber, an interlevel dielectric layer comprising carbon and having a dielectric constant no greater than 3.5 is plasma enhanced chemical vapor deposited over the substrate at subatmospheric pressure. After forming the carbon comprising dielectric layer, it is exposed to a plasma comprising oxygen at a subatmospheric pressure effective to reduce the dielectric constant by at least 10% below what it was prior to said exposing. The exposing occurs without removing the substrate from the chamber between the depositing and the exposing, and pressure within the chamber is maintained at subatmospheric between the depositing and the exposing.
In one implementation, a low k interlevel dielectric layer fabrication method includes providing a substrate having integrated circuitry at least partially formed thereon. An interlevel dielectric layer comprising a compound having silicon bonded to both nitrogen and an organic material and having a dielectric constant no greater than 8.0 is formed over the substrate. After forming the dielectric layer, it is exposed to a plasma comprising nitrogen effective to reduce the dielectric constant to below what it was prior to said exposing.
Preferred embodiments of the invention are described below with reference to the following accompanying drawings.
This disclosure of the invention is submitted in furtherance of the constitutional purposes of the U.S. Patent Laws "to promote the progress of science and useful arts" (Article 1, Section 8).
Referring to
Substrate 10 comprises a bulk monocrystalline silicon substrate 12 having trench isolation oxide regions 14 formed therein. Integrated circuitry is at least partially formed thereon in the illustrated example in the form of a pair of transistors 16 and 18. Transistors 16 and 18 can comprise conventional constructions, such as overlying layers of gate oxide, polysilicon and silicide. Insulative spacers 20 are formed adjacent transistor gates 16 and 18. Conductively doped diffusion regions 22, 24 and 26 are formed within substrate 12 and proximate gates 16 and 18.
Referring to FIG. 2 and in accordance with but one aspect of the invention, an interlevel dielectric layer 30 comprising carbon and having a dielectric constant no greater than 3.5 is formed over the
By way of example only, example preferred alternate methods of producing an interlevel dielectric layer at this point in the process are now described. Such encompass methods of forming insulative materials comprising carbon, silicon and oxygen. In one example, a first gaseous precursor compound comprising carbon and silicon is combined with a second gaseous precursor compound comprising oxygen to form a second compound comprising carbon, silicon and oxygen. The first compound can comprise, for example, (CH3)ySiHx, wherein y is an integer of from 1 to 4 and x is an integer from 0 to 3. The second precursor compound is an oxygen-containing moiety that is preferably a "dry" compound (i.e., a compound that does not either contain water or decompose to form water), and can comprise, for example, N2O, or an activated oxygen species (e.g., high energy O2, monatomic oxygen, or oxygen radicals). Such provides but one example process whereby water formation is avoided. In one example, the oxygen-containing moiety is generated by exposing O2 to ultra-violet light (a process which can generate, for example, activated oxygen species in the form of O3). In another aspect, the oxygen-containing moiety is generated by exposing an oxygen-containing gas (e.g., O3, O2, N2O, CO, or CO2) to a plasma. The plasma can be within the reaction chamber or remote from the chamber (i.e., not in the chamber). In another example, a compound comprising silicon, carbon and oxygen is formed by reaction of SiH4 with an organic compound comprising oxygen (e.g., CO or CO2).
In a more specific example, methylsilane or trimethylsilane is combined with N2O in a reaction chamber. A pressure within the chamber is maintained at from about 300 mTorr to about 30 Torr, and is preferably maintained at from about 1 Torr to about 10 Torr. An exemplary reaction chamber comprises a spacing between the plates of from about 400 mils to about 600 mils with methylsilane being flowed into the chamber at a rate of about 25 standard cubic centimeters per minute (sccm) to about 2000 sccm (preferably at from about 50 sccm to about 250 sccm). The N2O is flowed into the reaction chamber at a rate from about 50 sccm to about 3000 sccm (preferably at a rate from about 100 sccm to about 1500 sccm, and more perferably at a rate of from about 500 sccm to about 1200 sccm), and, additionally, helium is flowed into the reaction chamber at a rate of about 500 sccm to about 5000 sccm (preferably from 1000 sccm to about 3000 sccm). A radio frequency (RF) power within the chamber is maintained at from about 50 watts to about 500 watts, and preferably from about 100 watts to about 200 watts. The semiconductor substrate (such as a monocrystalline silicon wafer) is provided within the chamber and maintained at a temperature from about 25� C. to about 450� C.
The above-described processing forms (CH3)xSiOy over a substrate. The concentration of methyl groups within the (CH3)xSiOy is typically from about 10% to about 50% (mole percent), i.e., where x equals or ranges from about 1 to about 3, and y ranges from 0 to about 2. Alternately by way of example only, x can be from about 0.1 to about 1, i.e., the concentration of methyl groups can be from about 5% to about 50% molar. In a particular example, a plasma can be generated within the chamber at a RF power of from about 50 watts to about 500 watts (preferably from about 80 watts to about 200 watts).
Such describes but one example process of forming an interlevel dielectric layer, here by chemical vapor deposition with or without plasma in a chemical vapor deposition chamber. In but another considered example, a gaseous precursor compound is introduced into a chemical vapor deposition reaction chamber and subjected to a plasma treatment. A semiconductor substrate is provided in the chamber, and material comprising carbon and silicon is deposited from the plasma-treated precursor compound to over the substrate. After the material is deposited, it is exposed to an oxygen containing moiety and converted to a second material comprising silicon, carbon and oxygen.
In a more specific example, methylsilane is flowed into a reaction chamber at a pressure of from 300 mTorr to about 30 Torr (preferably from about 1 Torr to about 10 Torr) and subjected to a plasma formed at a power of from about 50 watts to about 500 watts (preferably from 100 watts to about 200 watts). A semiconductor substrate is provided in the reaction chamber and maintained at a temperature of about 0� C. to about 600� C. The plasma treated methylsilane deposits a material comprising methyl groups and silicon over the substrate. The deposited material is then exposed to an oxygen-containing moiety to convert the material to (CH3)xSiOy. Accordingly in this example from the oxygen exposure, a whole of the deposited dielectric layer is transformed from one base chemistry (i.e., that comprising a nondescript combination of methyl groups and silicon) to another base chemistry (i.e., (CH3)xSiOy) by the oxygen exposure. The oxygen-containing moiety is preferably in gaseous form, and can comprise, for example ozone, O2 and/or N2O. In particular embodiments, the oxygen-containing moiety is subjected to plasma, heat or ultra-violet light. The oxygen treatment preferably occurs at a pressure of from about 300 mTorr to about 1 atmosphere, with the deposited material being maintained at a temperature of from about 0� C. to about 600� C. during the oxygen treatment to convert the base chemistry to (CH3)xSiOy.
The above-described processings are again only example preferred techniques of forming the preferred interlevel dielectric layer material comprising carbon, here in the form of CH3, and here producing a preferred layer of (CH3)xSiOy. Alternate interlevel dielectric materials comprising carbon are of course contemplated. Further and by way of example only, the deposited interlevel dielectric layer at this point in the process might comprise silicon atoms bonded to both organic material and nitrogen, for example as described below.
After forming carbon comprising dielectric layer 30, in but one aspect of the invention, such layer is exposed to a plasma comprising oxygen effective to reduce the dielectric constant to below what it was prior to said exposing. Preferably, the exposing is at subatmospheric pressure to reduce the dielectric constant by at least 10%, and even more preferably by at least 15%, below what it was prior to said exposing. In a most preferred embodiment, the method by which the interlevel dielectric layer is initially formed is by plasma enhanced chemical vapor deposition in a chamber, with the subsequent exposing of the plasma occurring in subatmospheric pressure in the same chamber. Further, the substrate is preferably not removed from the chamber between the depositing and the exposing. Further, the pressure within the chamber is preferably maintained at subatmospheric between the depositing and the exposing. Further, the exposing is ideally effective to increase stability of the dielectric constant to variation from what the stability was prior to the exposing. Specifically, stability of the dielectric constant of interlevel dielectric materials can have a tendency to increase over time or when exposed to subsequent thermal processing of at least 400� C. Ideally, the exposing is also effective to increase the stability of the dielectric constant of such film.
Exemplary processing in accordance with the invention has been achieved whereby a predominately (CH3)xSiOy interlevel dielectric layer after the exposing had a dielectric constant reduced from 3.0 to about 2.5 or 2.0.
The preferred wafer surface temperature during the exposing is always less than or equal to 550� C., with the exposing also preferably being conducted at subatmospheric pressure. The oxygen comprising plasma is preferably derived at least in part from at least one of O2, O3, N2O and NOx. Preferred parameters for the exposing in a dual plate capacitively coupled reactor include an RF power range of from 300 to 1000 watts, a pressure range of from 1 Torr to 6 Torr, a temperature range of from 100� C. to 450� C., a spacig between the plates of from 400 to 600 mils, an oxygen gas expsure flow of from 500 to 1500 sccm, an inert gas flow (i.e., He and/or Ar) of from 200 sccm to 800 sccm, and a treatment time of from 20 to 100 to more seconds. It is a preferred intent of the exposing to further not transform the whole or all of the dielectric layer from one base chemistry to another base chemistry by the exposing. An outermost portion of the exposed layer might experience a slight reduction in carbon content, but otherwise that portion and the whole of the layer is not transformed from one fundamental material to another even in spite of the low k reducing or resulting property. In one preferred aspect of the invention, the exposing comprises at least 20 seconds of processing time. More preferably and in preferred sequence, the processing comprises at least 40 seconds, 60 seconds, 80 seconds, and 100 seconds of oxygen containing plasma exposure. The plasma exposing is preferably ineffective to appreciably etch the interlevel dielectric layer.
Where the invention is conducted in situ in a plasma enhanced chemical vapor deposition chamber subsequent to the deposition, the exposing might comprise substantially ceasing feeding of one of the reactive gases while maintaining a feed of one of the precursors which comprises oxygen, and thereby maintaining plasma conditions from the deposition through an extended exposure time with the oxygen containing precursor to achieve the exposing effect.
In another considered aspect of the invention, a nitride comprising interlevel dielectric layer 30 is formed over the substrate to also comprise carbon and having a dielectric constant no greater than 8.0.
More preferred, interlevel dielectric layer 30 comprises a compound having silicon bonded to both nitrogen and an organic material and having a dielectric constant no greater than 8.0. After forming such dielectric layer, it is exposed to a plasma comprising nitrogen effective to reduce the dielectric constant to below what it was prior to said exposing, and preferably at least 15% below what it was prior to the exposing. By way of example only, a preferred deposited interlevel dielectric layer material comprises or consists essentially of (CH3)xSi3N(4−x), wherein x is greater than 0 and no greater than 4. Such a composition can be formed by, for example, reacting inorganic silane with one or more of ammonia (NH3), hydrazine (N2H4), or a combination of nitrogen (N2) and hydrogen (H2). The reaction can occur with or without plasma. However, if the reaction comprises an organic silane in combination with dinitrogen and dihydrogen, the reaction preferably occurs in the presence of plasma.
An exemplary specific reaction is to combine methylsilane (CH3SiH3) with NH3 in the presence of a plasma to form (CH3)xSi3N(4−x). The exemplary reaction can occur, for example, under the following conditions. A substrate is placed within a reaction chamber of a reactor, and a surface of the substrate is maintained at a temperature of from about 0� C. to about 600� C. Ammonia and methyl silane are flowed into the reaction chamber, and a pressure within the chamber is maintained at from about 300 mTorr to about 30 Torr, with a plasma at a radio frequency (RF) power of from about 50 watts to about 500 watts. A product comprising (CH3)xSi3N(4−x) is then formed and deposited on the substrate.
Using this particular described example, it was found that the product deposited from the described reaction consists essentially of (CH3)xSi3N(4−x), (wherein x is generally about 1). The (CH3)xSi3N(4−x) is present in the product to a concentration of from greater than 0% to about 50% (mole percent) and is preferably from about 10% to about 20%. The amount of (CH3)xSi3N(4−x) present in the product can be adjusted by providing a feed gas of SiH4 in the reactor in addition to the CH3SiH 3, and by varying a ratio of the SiH4 to the CH3SiH3, and/or by adjusting RF power.
The above provides but only one example of forming an interlevel dielectric layer comprising a compound having silicon bonded to both nitrogen and an organic material. Other methods of forming the same or different materials are of course contemplated.
After forming the dielectric layer, the nitrogen comprising plasma to which the layer is exposed preferably comprises one or more of N2, NH3, N2H4, N2O, and NOx. More preferably, the plasma exposing is preferably void of oxygen atoms therein. Wherein the dielectric layer is formed by chemical vapor deposition in a chamber, such as described above, the exposing preferably occurs within the chamber without removing the substrate from the chamber between the forming and the exposing. Again, the plasma exposing like in the first described example is preferably conducted to be ineffective to appreciably etch the interlevel dielectric layer. Further, a whole of the dielectric layer subjected to the exposing is preferably not transformed from one base chemistry to another by the exposing. Preferred temperature, pressure, power, space arrangements, flows, and treatment times are as described above with respect to the first described embodiments.
In compliance with the statute, the invention has been described in language more or less specific as to structural and methodical features. It is to be understood, however, that the invention is not limited to the specific features shown and described, since the means herein disclosed comprise preferred forms of putting the invention into effect. The invention is, therefore, claimed in any of its forms or modifications within the proper scope of the appended claims appropriately interpreted in accordance with the doctrine of equivalents.
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|U.S. Classification
|438/623, 438/786, 438/777, 438/781, 438/780, 438/794, 438/783, 438/798, 438/793
|International Classification
|Cooperative Classification
|European Classification
|Aug 19, 2008
|Certificate of correction
|Sep 9, 2008
|Certificate of correction
|Nov 25, 2009
|Fee payment
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|Nov 27, 2013
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|May 12, 2016
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Effective date: 20160426


text:
Many are called, but few are chosen.
Will you and your agency accept the challenge to become
the next ULTIMATE KEYBOARD WARRIOR?
Timmermann Group are presenting you with the opportunity to compete against the fiercest athletes in the region in the most epic of battles: A typing competition. There are only 16 available spots and they are reserved for entire organizations. If you are chosen, you will not only be defending your personal honor, but also the honor of the agency you represent and, also, your entire family, probably.I HEAR IT RINGING
No great war was won in an instant (or without some sort of monetary contribution). You will notice on the legendary Eventbrite page, each agency is required to pay a $150 entrance fee. Good news is all proceeds from entry fees (minus prize money) will be donated to support the biggest, toughest, most valiant fight of them all: joining the marketing / advertising / communications profession (read: The Ad Club Scholarship Fund). We, prematurely, thank you for your contribution.SHOW ME THE MONEY
Now that you've entered your agency's name into the gauntlet of awesome, it is time to train and duke it out amongst yourselves. Turn inward, reflect, and select the boldest competitor in your midst. You need to decide who has the ferocious hunger for victory (and raging finger muscles) to be a winner by hosting office prelims via 10fastfingers.com The internal elimination process is one of the best parts of Ultimate Keyboard Warrior. For tips on how to evaluate the raw talent and savage passion lying dormant within your organization,
No one ever said that hubris was a bad thing. Seriously, no one, ever. In the days leading up to the most intense event of the year, it is very important that you share with your competitors, your community, and the world how superior of a
typist athlete you are. Make intimidation videos. Express your bloodthirsty steroid-fueled ferocity. Snap before and after training pictures of your hands. Our only request is that you use the following hashtags to ensure the maximum velocity of trash-talking:
On November 18th, 2015 at 5:30pm. Your agency champion will step into the ring as a part of the crowning event of Ad Club's 2015 St. Louis Digital Symposium. Athletes will clash, head-to-head, in a bracket-style campaign for glory and $400 cash for 1st and $200 for 2nd. Sixteen will enter. Only one will have the capabilities necessary to survive. Do you have what it takes?#WINNING


text:
"What are my qualifications to write this book? None really. So why should you read it? Here's why: I'm a little fat. If a thin guy were to write about a love of food and eating I'd highly recommend that you do not read his book."
Bacon. McDonalds. Cinnabon. Hot Pockets. Kale. Stand-up comedian and author Jim Gaffigan has made his career rhapsodizing over the most treasured dishes of the American diet ("choking on bacon is like getting murdered by your lover") and decrying the worst offenders ("kale is the early morning of foods"). Fans flocked to his New York Times best-selling book Dad Is Fat to hear him riff on fatherhood, but now, in his second book, he will give them what they really crave - his thoughts on all things culinary(ish). Insights such as: why he believes coconut water was invented to get people to stop drinking coconut water, why pretzel bread is number three on his most important inventions of humankind (behind the wheel and the computer), and the answer to the age-old question "which animal is more delicious: the pig, the cow, or the bacon cheeseburger?"
Editors Select, October 2014 - Jim Gaffigan's Dad Is Fat was the first purchase I ever made on Audible. Long before I started working here, I came to the site to download a few of his comedy sketches, having always appreciated his honest and self-deprecating brand of humor. Food: A Love Story, Gaffigan's second full-length book after his 2013 best seller, is full of the hilarious and relatable anecdotes that fans have come to expect. His love of food is perhaps unmatched, and his portly belly and extensive research whilst touring go a long way in adding credibility to his reviews and thoughts on our nation's best (and worst) dishes. I can't wait to revisit Gaffigan's favorite meals with him as narrator. Katie, Audible Editor
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Funny, but read more like a series of jokes
- Adam Shields
Less than Gaffigan
- Jami E. Nettles


text:
Lachung Monastery - A Story of Renewal
Lachung Rinpoche is building a branch Monastery of Chorten Gonpa on the site of the previous Lachung Rinpoche's retreat place. A new Retreat House and Temple had been built. Recently, he was able to also build a Shedra (Dharma School) and dormatory. School has now begun. Lachung Rinpoche wishes to thank all who donated and share in the merit of this Dharma project. He prays that all who are connected to Monastery and Shedra including donors attain Buddhahood in a single mandala.
Brief History of The 1st Lachung Rinpoche, also known as Ship Rinpoche or Rongyed Rinpoche and his relationship to Dodrupchen Rinpoche
The First Lachung Rinpoche
The first Lachung Rinpoche was born In 1883 in the Kham Nyakrong province of Eastern Tibet. He was named Jang Chup Dorjee. After studied Dharma under Great Masters for many years, he settled in Beyul Demojong (Sikkim) the hidden paradise of Guru Padmasambhava in 1924.
He travelled to all the holy places of Guru Rinpoche throughout Sikkim, performing pujas and mediating in various places. He also went on pilgrimage to India.
In Darjeeling Rinpoche constructed his first monastery and named it Dohtsuk Gonpa. He then returned to Sikkim and began to preach dharma in Lachung (a district in the north of Sikkim). In Lachung, Rinpoche bestowed Tsewangs and Bazaguru mani lungs to all of his disciples. After which he was popularly known as Lachung Rinpoche.
As his popularity grew, in 1938, Passang Lepcha, the third Head Lama of Ship Monastery, approached Rinpoche and invited him to Ship village. The purpose of his invitation was to seek Rinpoche's guidance for the construction of a new monastery. The monastery was completed in 7 years and Rinpoche named it Ship Kunzang Choeling Monastery. While in Ship, Rinpoche preached dharma to all the villagers and he was also known as Ship Rinpoche and his teaching spread throughout Sikkim.
While he was staying in Ship monastery, the 11th King The Chogyal of Sikkim, Sir Tashi Namgyal called for his secretary Renock Yabla to make a special invitation to Rinpoche for conducting the royal puja at Tsuklhakhang (the royal Temple) at the Palace. Rinpoche performed the puja during which many auspicious and good signs were experienced by many.
The First Lachung Rinpoche's Retreat Hut
The King and the family, having felt blessed, requested Rinpoche to stay at Rongnyed near the palace and pray for their long life as the Tsedup Lama. Rinpoche then resided on the hill top of Rongnyed performing pujas for the royal family. Rinpoche practiced mediation and continually preached dharma to his followers.
During these early years there were not many learned Buddhist practitioners like Lachung Rinpoche in Sikkim. Rimpoche's only mission in life was to preach dharma and equip Monasteries in Sikkim with the required infrastructure for learning and practicing dharma. Rinpoche brought copies of the Kanjur and Tenjur (sutras and commentaries) from Tibet and had them distributed too many monasteries located in the remote places of Sikkim. He even offered religious instruments and images like Gyaling, Rakdung, Thankas, statues, etc. to many monasteries.
Rinpoche accomplished the task of bringing the bronze statue of Guru Nang srid Zilnon all the way from Lhartsey in Tibet. The size and quality of the statue was first of its kind to Sikkim. The statue was offered by Rinpoche to Sikkim and its people with the prime objective of promoting peace and dharma in the very land considered to be the second Zangdok Palri (hidden paradise of Guru Rinpoche). The Statue is housed at Guru Lhakhang at Deorali Chorten Gonpa, Sikkim.
When Tibet was undergoing a period of instability, many of the Great Masters of Tibetan Buddhism had travelled to Sikkim. Among them, His Holiness The 4th Kyabje Drodupchen Rinpoche came to Sikkim in 1956, in accord with Guru Rinpoche's prediction. In his early years in Sikkim, Kyabje Dodrupchen Ripoche stayed in disguise of a simple and an ordinary monk.
Lachung Rinpoche at once recognized Kyabje Drodupchen Rinpoche in the disguise of the ordinary monk. Rinpoche approached Kyabje Drodupchen on behalf of all sentient beings, especially for Sikkim, and offered him the Dzodun, the seven holy treasures teachings of the great Dzongchen Nyingthik master Longchen Rabzam, also various religious objects and pleaded with him to do what Guru Rinpoche has asked him to do. His Holiness Kyabje Dodrupchen accepted his prayer. Then Rinpoche introduced Kyabje Dodrupchen RInpoche to the public of Sikkim and made them realize how lucky Sikkim was to have such a precious and great master like His Holiness Kyabje Dodrupchen.
Lachung Rinpoche passed away peacefully on 7th November 1966 at the age of 73. Rinpoche's funeral was held at the Dechenling Crimination Ground and His Holiness Kyabje Dodrupchen performed the last rites.
Lachung Rinpoche
Brief History of 2nd Lachung Rinpoche, also known as Ship Rinpoche or Rongyed Rinpoche
After the passing of the first Lachung Rinpoche, the Sikkimese king (Chogyal), patrons, and many of his followers continuously performed pujas and prayers for his rebirth. They approached His Holiness Kyabje Dodrupchen with the request to identify and locate the reincarnation of Lachung Rinpoche.
His Holiness Kyabje Dodrupchen with his supreme divine knowledge recognized the current Lachung Rinpoche at the age of 3. Kyabje Dodrupchen adopted him and took him to Chorten Gonpa, his monastery, and graciously bestowed empowerments, transmissions and instructions of the Dzogchen Nyingthik lineage. In order to gain practical experience in running a monastery, Kyabje Dodrupchen has made Lachung Rinpoche the acting Dorje Lobpon (Abbot) of Chorten Gonpa for a year. This is an indication of Dodrupchen Rinpoche's confidence in Lachung Rinpoche.
The 13th king of Sikkim, Tenzin Wangchuk Namgyal, gave Lachung Rinpoche the Rongnyed site where the previous Rinpoche had stayed where he continues the work of his previous life. There he built a new Tsamkhang (retreat house) and a Temple. At first he alone practiced meditation in the Tsamkhang. Since then many groups of monks have done meditation there and still continue to do so.
January 2011
Thanks to your donations, some progress has been made
January 2012
* Donations may be sent to Tshog Dag Foundation, 75 Potter Road, Rowe, MA 01367. The Tshog Dag Foundation for the Support of Nyingma Monasteries is a religous not-for-profit orgnization incorporated in the Commonwealth of Massachusetts and has been recognized by the IRS as a tax-exempt religious and charitable organization under Section 501(c)(3). Donations are tax-deductible as permitted by law. TDF provides no tax advise: Please consult your tax advisor for proper treatment of contributions.
Tshog Dag Home | Donations | Nyingma | Longchen Nyingthig
Copyright © 2010 All rights reserved


text:
An OVI checkpoint will take place in Coshocton County this evening…
The Ohio State Highway Patrol and the Coshocton County Sheriff's Department will perform the checkpoint from 8 p.m. to 11 p.m. this evening on Seventh Street in the City of Coshocton.
The checkpoint, funded by federal grants, is planned to deter and intercept impaired drivers. The checkpoint will also be held in conjunction with nearby saturation patrols to aggresively combat alcohol-related injury and fatal crashes
If you plan to consume alcohol, designate a driver and make other travel arrangements before you drink.


text:
Headless Installation of Raspbian OS
How to install Raspbian OS on Raspberry Pi without using monitor and keyboard.
I am using Raspberry Pi 3 for a musical light set-up for Christmas. The device is meant to be used in headless mode. However, you do need keyboard, mouse and an HDMI monitor to install and configure an operating system on the Pi.
Can't I install OS in headless mode so that I don't have to unplug these devices from my main system so RPi 3 can borrow them for installation.
Yes, we can.
tl;dr: Flash RaspbianOS and `touch ssh` on the root of 'boot' partition of your SDCard. https://t.co/Hjm84JAqyx
— Omer Akram (@om26er) November 19, 2017
#1 Download Raspbian OS from the official Raspberry Pi page.
# 2 Download Etcher from the official page and install the application.
# 3 Plug in the mirco SD to your PC. Open Etcher app and browse the downloaded image of Raspbian
In the second step, select the microSD card. Please be extra careful to select the correct USB device. Then hit the 'Flash' button and it will start copying files to the micro SD card.
Enable SSH for headless configuration
Your OS is ready but for security reasons Raspbian disables 'ssh' by default. We need to enable it. But how can you enable it without booting into the system? There is a neat work-around. All you need to do is place an empty file called 'ssh' in the root directory of your newly installed Raspbian OS and it will enable SSH.
Open the root directory of the newly install Raspbian OS on your micro SD card and create an empty file named 'ssh', don't give it any extension. You can easily create a file from the file manager of Windows 10 and desktop Linux, but Finder of macOS is not capable of doing so. That's where I resorted to using the terminal.
Open the Terminal app and change directory into the micro SD card:cd /Volumes/path_of_micro_sd_card/
Then create an empty ssh filetouch ssh
Before we unplug the micro SD card, make sure that ssh file is present:
Remove the card from your PC, plug it into a Raspberry Pi, power the pi with 5v USB cable.
In order to ssh into your Pi, you need to know the IP address of the Pi. Either you find it out from your router settings or you can use Pi Finder app to do so. Download the Pi Finder client from the developer and open it. Run the app and it will find the IP address of your Raspberry Pi.
Once you have the IP address, open terminal (now Windows 10 also has support for Linux bash) and ssh into your pissh pi@IP_ADDRESSS
When asked, provide it with the password for piraspberry
Now you are sshed into pi. The first thing you need to do is run the rasp-config file to configure your systemsudo raspi-config
I am assuming you know how to proceed from there.
Enjoy your pi.
The post Headless Installation of Raspbian OS appeared first on The BenefIT.
Sage Sharp talks about increasing diversity in open source
The Southern California Linux Expo 14x (SCaLE 14x) concluded on January 24 with a keynote from open source developer Sage Sharp (formerly Sarah Sharp), who made waves in October, 2015 with a blog post explaining why they stepped down as a Linux kernel developer. Here are some highlights from their presentation.
Sharp opened their talk by giving a nod to SCaLE for being one of the most diverse Linux and open source conferences. Sharp then called on white males in the audience to repeat after them: "Increasing diversity in open source is my responsibility."
Sharp explained it is their responsibility because often in the tech world minorities have to shoulder the unpaid emotional work of increasing diversity. "We have to look at our privileges that shows bias. Each of us have identities and skills that society values and some of us have identities that society discriminates against. Recognizing that we have privilege helps us seek out diverse voices,"Sharp said.
Sharp also talked about the popular notion of meritocracy in the open source world. They pointed at a study by MIT that showed that companies that were described as meritocratic had more bias towards men when it comes to salary versus those who were not described as meritocratic.Sharp said that the reason could be that "when an organization describes as meritocratic we make excuses for why there is disparity."
Sharp urged the audience to reconsider their privilege and unconscious bias and figure out how to increase diversity and bring equality.
Sharp then talked about time. Geeks, for example, need to go into 'deep hack'mode: when you sit down on your computer for the world to melt away around you and you are absorbed in your work, doing whatever you love doing. And you need uninterrupted time to work. But for a lot of people uninterrupted time is a precious commodity, particularly people who are caretakers looking after children or elderly relatives. A majority of women from different cultural backgrounds work as caretakers because they can't afford full time care for their children.
Sharp said that in open source project we assume people will invest all of their time into the project, but even if these women want to contribute they can't give their full time as it's not a luxury they can afford. So open source projects should consider that and try to be inclusive of such people. Events and conferences can offer childcare so women can come, drop their kids and attend the conference. Linux Foundation, for example, has started offering child care at their LinuxCon event.
Sharp also pointed out that when we go out to hire people we look at their GitHub page, how many commits they have made. But caregivers can't have that much commitment as they don't have the luxury of time. Sharp said that next time when you go through resumes don't set aside the ones you know are minorities and may not have a GitHub account.
There are many companies that are adopting non traditional ways to get people in tech. PayPal, for example, offers Recharge program where they have job offerings for women who have taken a break to take care of family; such programs help them in getting back. There is also a pilot program at Etsy where they are offering coaching, mentoring to new moms so that they can talk about how to juggle their time commitments.
Sharp pointed at another notable problem in the US: access to computers. They said that according to the US Census there is a racial disparity in which households own a computer. Sharp said that African-American and Latino households are less likely to own a computer and even if they do they are not the most powerful computers. Then consider who in the family gets to use it, and in what order of priority.
Access to internet is also a challenge in many emerging economies like India where wired broadband is rare and a majority of people are using mobile Internet where they have to pay for every bit they use.
Open source projects can take these points into consideration to be inclusive of such people. We can create sandboxed servers so people with less powerful computers can test and compile their code on the server. Sharp pointed out that Canonical's Launchpad bug tracking system takes 10 clicks to file a report. It will be too expensive for an Indian contributor using the mobile broadband to file a bug report.
Sharp said that open source project should consider how they can reduce the development footprint for the users who are on unreliable internet access. Sharp urged that if your project has documentation, please ship with your documentation so that user doesn't have to go to the internet to access the documentation.
Sharp also talked about bringing new people into open source because a majority of open source projects, like Linux kernel, have an aging developer base. This is a point that was once mentioned during LinuxCon Europe, and it's serious. "In the open source world we tend to let long standing contributors shoulder a lot of burdens and responsibilities. And as a result they get burned out. We should be focusing on growing new leaders and new contributors to our community,"Sharp said.
In order to create successors, next leaders of your project, you should document how you do releases and other stuff so it's easy for other people to take over. If you don't do that the chances are that your project will die as there won't be the next leader.
In the end Sharp shared their own story of how their dad got them into computers, how their husband assisted them as an ally and how other men such as Andrew Greenberg and Bart Massey brought them to the open source world. Their point was: everyone of us can play a role in increasing diversity in the open source world.
Sharp finished their talk with these words: "Improving diversity in open source community is your responsibility, don't be a bystander."
Their talk ended with a standing ovation.
Sharp deserved it.
Ed note: Sarah legally changed their name to Sage in 2017. Originally published in CIO.com
The post Sage Sharp talks about increasing diversity in open source appeared first on The BenefIT.
CNCF orchestrates standardization around Kubernetes
Irrespective of what you think about the Linux Foundation, one of the greatest contributions of the organization has been as a catalyst in the standardization of open source technologies, without the bureaucracy of standardization bodies.
The foundation, through its Collaborative Projects, is doing it at code, developer and stakeholder level. While OCI (Open Container Initiative) standardized container runtime and image format, Cloud Native Computing Foundation (CNCF) is now standardizing Kubernetes.
Isn't Kubernetes open source? Why do we need standardization?
First things first. Kubernetes is a fully open source project created by Google, which was donated to CNCF as an anchor project. It's an upstream project, so why do they have to worry about standardization? It's the same code across the board and most Kubernetes consumers/contributors like CoreOS and Docker stick to the upstream version either way.
The fact is, Kubernetes is spreading like wildfire. Everyone is using it, including Docker, Cloud Foundry, Microsoft, AWS, Alibaba, Red Hat, SUSE, Canonical, Mirantis… the list goes on.
Among these players, there are many who don't consume the upstream project. There are many players that offer Kubernetes distributions with their own patches and tweaks. Most customers consume these Kubernetes distributions.
As these companies take the upstream and 'polish' it, there is an increasing risk of different kubernetes instances becoming incompatible with each other. That creates a serious problem of fragmentation and interoperability. It creates the risk of vendor lock-in.
However, that can't happen. Not under the watch of CNCF. The foundation has launched a certificate program to ensure portability and interoperability across the Kubernetes ecosystem.
"The new Certified Kubernetes Conformance Program gives enterprise organizations the confidence that workloads that run on any Certified Kubernetes Distribution or Platform will work correctly on any other version," said Dan Kohn, Executive Director, Cloud Native Computing Foundation.
What weight does this certification program really carries?
According to CNCF, a Certified Kubernetes product guarantees that the complete Kubernetes API functions as specified, so users can rely on a seamless, stable experience.
32 major and smaller companies have already committed to the certification program. Some of the big companies include Alibaba, Google, Microsoft, CoreOS, Docker, Red Hat, SUSE, Canonical and many more.
"Docker Enterprise Edition (Docker EE) offers an unmodified version of Kubernetes with the added value of the Docker platform including security, management, a familiar developer workflow and tooling, broad ecosystem compatibility and an adherence to industry standards," said Banjot Chanana, Head of Product Management for Docker.
Development of the certification program involved close collaboration between CNCF and the rest of the Kubernetes community, especially the Testing and Architecture Special Interest Groups (SIGs).
The Kubernetes Architecture SIG is the final arbiter of the definition of API conformance for the program. The program also includes strong guarantees that commercial providers of Kubernetes will continue to release new versions to ensure that customers can take advantage of the rapid pace of ongoing development. Kubernetes is one of the highest velocity software projects in the history of open source.
"The interoperability that this program ensures is essential to Kubernetes meeting its promise of offering a single open source software stack supported by many vendors that can deploy on any public, private or hybrid cloud," said Kohn.
Certified Kubernetes implementations are permitted to use the new Certified Kubernetes logo and also are allowed to use the Kubernetes mark in combination with their product name (e.g., XYZ Kubernetes Service).
CNCF is inviting vendors to run the conformance test suite and submit conformance testing results for review and certification by the CNCF. End users should make sure their vendor partners certify their Kubernetes product and can confirm that certification using the same open source test suite.
The post CNCF orchestrates standardization around Kubernetes appeared first on The BenefIT.
Solomon Hykes switches containers, becomes Chief Architect of Docker
"I think of myself more as an enabler; more of a coach than a player. It's pretty fun, actually." – Solomon Hykes
Solomon Hykes, the founder of Docker has stepped up from the position of CTO and taken a new position of Chief Architect and Vice-Chairman of the Board of Directors.
It's more of a strategic position, than operations. Hykes have been working on being one step removed from the technology side of Docker and is contributing indirectly. In my interactions with Hykes, I see him as a visionary and an entrepreneur who looks at the larger picture and tackles bigger challenges that Docker customers face. In a previous interview, Hykes told me, "I think of myself more as an enabler; more of a coach than a player. It's pretty fun, actually."
He is now officially a coach.
Docker went through some reshuffling earlier this year when Ben Golub, the then CEO of Docker was replaced by Steve Singh, the former CEO of Concur Technologies Inc.
Docker now has another industry veteran on its board of directors. Kodak CEO, Jeff Clarke, has joined the company's board of directors.
All these changes are happening as containers are becoming the cornerstone of modern IT infrastructure, and Docker needs to tread carefully as the landscape is changing really fast.
The post Solomon Hykes switches containers, becomes Chief Architect of Docker appeared first on The BenefIT.
Reasons to buy iPhone X
Smartphones are part of corporate culture, you can't work without a smartphone. Any professional, especially those who work in IT, can't live without a smartphone. Calendar, emails and Hangouts/Skype are my life life. I can't work without them. I am quite certain, that's the case with you, too!
I am not going to debate which is the better platform – Android or iOS – because I use both to ensure that I am not vendor locked into any of the two ecosystems. In this video I talk about those who are at the fence, contemplating whether to upgrade to iPhone X or buy iPhone 8 Plus.
This is not your typical YouTube review, where you look at specs. I have spent more than a week with the iPhone X and at least a month with the iPhone 8 Plus, before giving my verdict.
The post Reasons to buy iPhone X appeared first on The BenefIT.
How to run Windows apps on Chromebook
If you still rely on certain Windows applications, you don't have to keep that Windows laptop around.
As a Chromebook user, you know Windows apps don't run on ChromeOS; it's a different platform. In most cases, you don't need any Windows specific apps, but if there are some corner cases, now you can run some Windows applications on Chromebook.
CodeWeaver is bringing its flagship app CrossOver to ChromeOS. Who is CodeWeaver? It's the corporate sponsor of fully open source application Wine, which allows users to run select Windows applications on Linux and macOS. CrossOver is based on Wine, with additional patches, features, support and ease of use.
CodeWeaver has been working on a beta of CrossOver for Chrome OS. It has become possible thanks to Android subsystem of Chrome OS, that allows users to run Android applications on Chrome OS.
"With the announcement of support of Android in Chrome OS, suddenly things made a lot more sense," said Jeremy White, Founder and CEO of CodeWeaver.
The company has been working on Android for the last four years, to bring Windows applications to Android powered devices. However, they realized that you can't really get the desktop experience on Android phones. "Your fingers can't operate the menus. The screen isn't big enough, and you don't really want to compose a document with an onscreen keyboard. It didn't help that Intel effectively exited the phone and tablet space, and we really need to run on an x86 compatible processor in order to provide a good experience," said White.
But when Google announced support for Android apps on ChromeOS, CodeWeavers say an opportunity to add another platform to their product. "A Chromebook has a big enough screen. And a keyboard and a mouse. And often, an Intel processor. What's more, it's really handy to have Quicken or Wizard 101 or your favorite Windows application right there," said White.
So how to get started? Just download CrossOver from the PlayStore on your Chromebook and check out the list of available Windows applications. Microsoft Word is certainly one of the most looked after application, and now you can run it on your Chromebook.
Go ahead, try it out and let me know what you think about it.
The post How to run Windows apps on Chromebook appeared first on The BenefIT.
Chinese WeChat is powered by OpenStack
WeChat maker Tencent wins the OpenStack Superuser Award and joins the OpenStack Foundation as a Gold Member.
"We have maxed out the OpenStack Foundation memberships, but Tencent brings in a unique use case that will benefit the OpenStack community" – Alan Clark, Chairman of the OpenStack Foundation.
Despite critics claiming otherwise, OpenStack is growing at an incredible rate. At the OpenStack Summit in Sydney Australia, we see a vibrant and growing community that's consuming OpenStack in so many different ways that it amazes any industry observer. It's being used all the way from the smaller Smartme.io project to the massive WeChat platform that serves billions of users.
At the first day of the summit Tencent team (the parent company of WeChat) delivered a keynote speech in which they talked about how they are consuming OpenStack to cut cost and scale their infrastructure. Their work around OpenStack bagged them this summit's Superuser Award.
Some of the key factors that contributed to Tencent's success with OpenStack include:
• Cuts server costs by 30 percent and O&M costs by 55 percent, saving the company more than RMB100 million each year.
• Shortens resource delivery from two weeks to 0.5 hours
• Optimizes global resource scheduling; for example, the deployment duration of the global mail system has been cut from 10 days to 1 day.
• Supports the development teams of the services that generate tens of billions of revenues for Tencent annually.
Commenting on the work that TenCent has done, Mark Collier, CTO of the OpenStack Foundation said, "This is an amazing story. There are more than 900 million users on WeChat and it's light years ahead of other chat platforms in other countries. And it runs on OpenStack."
Tencent has also been accepted as a Gold Member of the OpenStack Foundation. Gold members contribute .025% of their annual revenue to the OpenStack Foundation which is capped at $200,000. This contribution funds the development of the platform.
"Tencent is committed to the cloud computing market, and OpenStack is an integral component of our strategy to build a complete hybrid cloud service ecosystem for the global market," said Bowyer Liu, Tencent's chief architect of TStack Cloud. "Tencent hopes to grow with OpenStack, make valuable contributions to the community, and bring prosperity to the OpenStack ecosystem."
The foundation now has 8 platinum and 24 Gold members. According to Clark, fiscally, the foundation is in a very healthy state and it will be investing in new areas to help users.
Tencent has been using OpenStack for its TStack private cloud platform since 2013. TStack was created by the company to provide services for internal internal IT and testing environments for the company's services such as QQ, WeChat and Game.
Today, TStack is also the cloud computing platform Tencent uses to achieve its "internet plus" strategy of providing complete hybrid cloud services for government and enterprises in China.
Currently, TStack is deployed on more than 6,000 nodes in 14 clusters across seven data centers in multiple provinces in China, supporting the Sichuan, Guangdong, Xiamen and Yunnan government clouds. TStack has been running in production for four years with availability over 99.99 percent and today serves more than 100 million users.
The post Chinese WeChat is powered by OpenStack appeared first on The BenefIT.
Red Hat Ceph Storage 3 announced at OpenStack Summit.
At the OpenStack Summit (Sydney), Red Hat announced Red Hat Ceph Storage 3. It's a major upgrade to the company's scalable, software-defined object storage platform. This release introduces support for block storage via iSCSI and file storage via CephFS.
With these additions, Red Hat Ceph Storage 3 widens the scope of unified storage in OpenStack and heterogeneous environments, substantially broadening the use cases for the storage platform built for petabyte scale deployments.
"Red Hat Ceph Storage 3 represents a key milestone for OpenStack, VMware, and Windows communities in need of a unified storage solution. With this release, Red Hat lays the groundwork for all software-based storage services to be delivered as containers in the future while helping customers increase agility and shrink deployment costs," said Ranga Rangachari, vice president and general manager, Storage, Red Hat.
Like all other Red Hat products, Ceph Storage 3 is also based on the community version of the open source Ceph Luminous project. In 2014, Red Hat acquired Inktank, the company behind Ceph storage. In 2015 Red Hat created a Ceph Community Advisory Board to ensure that Ceph becomes a fully community driven project to enjoy wider adoption and contribution. The advisory board includes members from Red Hat competitors like Canonical and SUSE.
Red Hat said in a press release that Ceph Storage 3 also aims to significantly improve the user experience by helping administrators proactively monitor and troubleshoot distributed storage clusters via a graphical view of usage data for the cluster as a whole, or its individual components.
Ceph 3 comes with a new web-based interface, which includes more than a dozen dashboards, is based on the upstream Ceph Metrics project. This release also adds several other usability enhancements and layers of automation, such as dynamic bucket sharding, designed to help simplify maintenance and lower operational costs.
Some of the major highlights of Red Hat Ceph Storage 3 include:
- Enables a large variety of storage needs in OpenStack, helping enterprises fully exploit the scale of the platform for cloud infrastructure deployments without incurring costs of discrete storage systems that need to be procured and managed separately. The introduction of CephFS, a POSIX-compatible, scale-out file system complements the existing block and object storage support provided by Red Hat Ceph Storage for OpenStack. Customers will be able to incorporate storage more effectively with OpenStack for private cloud deployments across a number of use cases including web-scale cloud, Network Functions Virtualization infrastructure (NFVi), and development/compute clouds.
- Eases migration from legacy storage platforms through newly added support for the iSCSI interface for wider platform support and increased breadth of use cases, including backup and recovery. This is particularly beneficial to heterogeneous storage environments such as VMware and Windows that lack a native Ceph driver. The iSCSI gateway enables enterprises to use a cost-effective, highly scalable, and integrated block storage platform that can provide the advanced storage features of a traditional Storage Area Network (SAN), while keeping applications in their compute environments.
- Deploys enterprise storage in Linux containers for simplified operations and a smaller hardware footprint. Containerized storage daemons enable users to run Red Hat Ceph Storage on fewer servers by co-locating services that previously required dedicated hardware, while avoiding the risk of resource conflicts. Preliminary tests based on a standard Red Hat Ceph Storage cluster configuration showed lowered hardware expenditure by at least 24 percent. This is particularly relevant to telco customers, such as those implementing NFVi, who struggle with hardware and space constraints.
Red Hat Ceph Storage 3 is expected to be generally available in November 2017.
The post Red Hat Ceph Storage 3 announced at OpenStack Summit. appeared first on The BenefIT.
Who is writing Linux?
Linux kernel is the world's largest shared technology that's being created by thousands of individuals and hundreds of companies. Any guesses about how many individuals and companies are involved with the development of Linux?
Since the last report, which was released last year, more than 4,300 developers from more than 500 companies have contributed to the kernel.
We often hear that the kernel community is growing old and not many new people are joining. That seems to be wrong. Within the last year, out of these 4,300 contributors, around 1,670 were first timers. Contrary to popular belief, new people continue to contribute to the kernel.
Ever since Linux moved to Git, the version control system written by Linus Torvalds, more than 15,600 developers from more than 1,400 companies have contributed to the Linux kernel. We now know because Git makes it possible to track contributions.
Out of these 1400 companies, the top 10 commercial contributors include Red Hat, SUSE, Samsung, Google, Intel, Linaro, AMD, Renesas and Mellanox (not in any specific order).
Over the last few years, the number of unpaid developers has been decreasing, whereas the number of paid contributors is growing. What could explain that? Report after report shows that there is a huge gap between supply and demand of Linux skills. Due to the shortage of Linux talent, people get absorbed into companies very quickly. Those unpaid developers become paid developers. That said, there was a minor increase in the number of unpaid developers this year. In comparison to last year's 7.7% contribution by unpaid developers, this year's report listed 8.2% unpaid contributions. That's significantly down from the 11.8% from 2014.
While the balance between unpaid and paid developers seem to be stabilizing, the overall number of developers and companies contributing to the kernel continues to grow.
What's most incredible is that according to the report, the average number of changes accepted into the kernel per hour is 8.5, a significant increase from 7.8 changes per hour in the last report, which translates to 204 changes daily and over 1,400 weekly. The report noted that the 4.9 and 4.12 development cycles featured the highest patch rates ever seen in the history of the kernel project.
This year's paper covers work completed through Linux kernel 4.13, with an emphasis on releases 4.8 to 4.13. The last report was released in August 2016 and focused on 3.19 to 4.7.
The post Who is writing Linux? appeared first on The BenefIT.
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Graphics: Mesa 17.2.6 RC, AMDGPU, and Vulkan
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Unity 7 Hoping To Become An Official Flavor For Ubuntu 18.04 LTS
While Canonical abandoned their work on the Unity desktop environment in favor of the Unity-inspired customized GNOME Shell that debuted in Ubuntu 17.10, some within the community have remained interested in maintaining Unity 7 and even getting it into an official spin/flavor of Ubuntu. Posted today to the community.ubuntu.com was a Unity maintenance roadmap, reiterating the hope by some in the Ubuntu community for Ubuntu Unity to become an official LTS distribution of Ubuntu. They are hoping to make it an official flavor alongside Kubuntu, Ubuntu Budgie, Xubuntu, and others. Original/direct: Unity Maintenance Roadmap
Programming/Development: Django and Google India


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text:
More on budget
After a frustrating holiday weekend that failed to yield one more vote to end California's budget stalemate, legislative leaders say they will put the tax increases in the plan up for a vote Tuesday.
Meanwhile, with the state's finances running dangerously low, Gov. Arnold Schwarzenegger is scheduled to begin layoff proceedings for 20,000 government workers. Also on Tuesday, the state also plans to halt all remaining public works projects, about 374, throwing nearly 92,000 construction workers out of a job.
Refunds for California taxpayers already have been delayed because the state has no money to pay them.
"It is clear there is going to be catastrophic consequences for Californians if we don't get it done today," Senate President Pro Tem Darrell Steinberg, D-Sacramento, told reporters Tuesday.
Steinberg called a morning session of the Senate, where lawmakers have so far failed to muster the one additional vote needed to pass the massive package of spending cuts, tax increases and borrowing.
The chamber recessed shortly after it convened to let Republican members huddle privately and plan their strategy. California's two-thirds vote requirement to pass a budget requires all Democrats and three Republicans in each house to support the plan.
The Senate will remain in continuous session until it passes the budget plan, which is intended to close a $42 billion deficit through June 2010. Asked by reporters if he had a backup plan if the lockdown fails to produce a compromise, Steinberg said, "We're going to get it done. That's the plan."
The Assembly has the votes but is waiting for the Senate to act. Assembly Speaker Karen Bass urged state employees facing layoffs to call Republican senators and press them to vote for the budget.
"If we don't pass the budget, the situation is just going to get so much worse," the Los Angeles Democrat told reporters Tuesday. "One more Republican senator needs to do the right thing."
Like other states, California faces plunging tax revenue that has imperiled state services. The proposal put before lawmakers this weekend was negotiated by Schwarzenegger and the four legislative leaders – two from each party.
The plan includes $15.1 billion in program cuts, $14.4 billion in temporary tax increases and $11.4 billion in borrowing. It also would send five ballot measures to voters in a special election to be held May 19.
The stalled effort prompted Schwarzenegger to make good on an earlier promise to begin the layoff process for thousands of state workers.
The governor had delayed releasing the notices on Friday when it appeared lawmakers would pass a compromise plan to close the state's shortfall. But with marathon weekend sessions failing to produce the necessary votes, Schwarzenegger's spokesman said the administration had no choice.
The notices will start going out Tuesday to 20,000 workers in corrections, health and human services and other agencies that receive money from the general fund. Administration officials are seeking to eliminate up to 10,000 jobs as part of the governor's order to cut 10 percent from the government payroll. The procedure to lay off a large number of state workers takes about six months, and many of those who receive notices can apply for jobs in other state agencies that do not rely on the general fund.
Schwarzenegger's finance director said a state board will freeze even more public works projects unless the Legislature approves a budget quickly.
The Pooled Money Investment Board on Tuesday is expected to shut down 276 critical projects worth $3.6 billion, along with 98 transportation projects funded from voter-approved bonds worth $1.8 billion.
The combined $5.4 billion freeze would affect 91,800 California jobs. Some 2,000 infrastructure projects are already on hold because the state lacks the money to pay for them.
Despite the warnings of impending fiscal calamity, most rank-and-file Republicans have refused to agree to higher taxes. Republican lawmakers blamed Democrats for years of overspending.
"You're not going to go back to the people's pocketbooks to fuel that spending," said Sen. Dennis Hollingsworth, R-Temecula.
During a lively floor session Monday night, Sen. George Runner, R-Lancaster, defended his colleagues' stance against tax hikes and said his constituents were pleading with him to vote no on the budget proposal.
He accused Democrats, who hold majorities in both houses, of using the recession to drive an agenda of tax increases.
"You want this emergency," Runner said, drawing jeers from Democrats in the chamber. "Listen, you may not like to hear what we have to say, but it's what we believe."
California lawmakers spent the President's Day holiday as they had Valentine's Day, locked in a frustrating search for one more vote to end the state's budget impasse.
Lawmakers broke the record for longest legislative session in state history over the weekend before disbanding Sunday night. The Assembly was at one point in session for 30 hours.
Getting the final vote out of a Republican senator continued to be problematic. One moderate Republican, Sen. Abel Maldonado, criticized Senate Minority Leader Dave Cogdill for failing to make sure he had enough votes from his caucus.
Maldonado, of Santa Maria, was thought to be one of the GOP lawmakers who would vote for the budget, but so far he has been a holdout.
His critical address on the Senate floor lambasted Democrats for failing to implement some of the reforms he has sought in recent years, such as cutting off all pay to lawmakers when they fail to pass a budget by the constitutional deadline. His comments seemed to suggest that he would not support the proposal in its present form.
"(Tuesday), when they put up the votes, the votes are not going to be there," he said.
The proposed tax hikes include an increase of 1 cent on the dollar in the state sales tax, a 12-cent-a-gallon hike in the gasoline tax and a boost in vehicle licensing fees.
The measure also includes a one-time, 5-percent income tax surcharge for taxpayers who owe money to the state at the end of 2009. The surcharge would drop to 2.5 percent if California gets its expected share of money from the federal stimulus bill.
Many of the tax hikes would remain in effect through the 2013-14 fiscal year if voters approve a cap on state spending during the May special election. That deal is designed to limit labor unions' opposition to the spending cap, which was sought by Republicans as part of the budget negotiations.
The budget plan is designed to close California's deficit through June 2010 if voters also approve a number of related measures at the ballot. Those include the spending cap, a plan to sell bonds based on future lottery proceeds and approval to shift money from accounts for mental health and child-development programs.
AP-WS-02-17-09 1405ESTCopyright © 2017, The San Diego Union-Tribune


text: Hey guys, I am not sure if here is the right place to ask this, but with you guys I feel more comfortable I currently live in the Netherlands and planning to go for a couple of weeks to London with my wife, this is going to be our first time to London. I was thinking what Apps might be helpful for us in our trip? keep in mind that i will be using public transportations there. Thank you in advance.