text:
Video Industry News Video Company News Technology Industry News Technology Company News Novelty Industry News Novelty Company News Gay Industry News Gay Company News Legal Industry News All Company News
Released: Dec 10th, 2007
Running Time: 155 Min.
Director: Denys Defrancesco
Companies: Swank Digital, Pure Play Media
Cast: Cherry (I), Constance (I), Luba, Katy (I), Miki (II) (Russian), Giana
Critical Rating: AAA 1/2
Genre: All-Sex
Of course if every video were "special," none would really be truly special - and BWS2, hot as it is, just doesn't rank that high. Even with Katy sandwiched in a d.p., the action is wankable, yet somewhat generic. Recommendable nonetheless.
Retailing: Clean and simple title with interracial, big boobs and Euro-babes.


text:
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This paper describes the design and implementation of a fuzzy control system for a car-like autonomous vehicle. The problem addressed is the diagonal parking in a constrained space, a typical problem in motion control of nonholonomic robots. The architecture proposed for the fuzzy controller is a hierarchical scheme which combines seven modules working in series and in parallel. The rules of each module employ the adequate fuzzy operators for its task (making a decision or generating a smoothly varying control output), and they have been obtained from heuristic knowledge and numerical data (with geometric information) depending on the module requirements (some of them are constrained to provide paths of near-minimal lengths). The computer-aided design tools of the environment Xfuzzy 3.0 (developed by some of the authors) have been employed to automate the different design stages: 1) translation of heuristic knowledge into fuzzy rules; 2) extraction of fuzzy rules from numerical data and their tuning to give paths of near-minimal lengths; 3) offline verification of the control system behavior; and 4) its synthesis to be implemented in a true robot and be verified on line. Real experiments with the autonomous vehicle ROMEO 4R (designed and built at the Escuela Superior de Ingenieros, University of Seville, Seville, Spain) demonstrate the efficiency of the described controller and of the methodology followed in its design.
A not-for-profit organization, IEEE is the world's largest technical professional organization dedicated to advancing technology for the benefit of humanity.© Copyright 2016 IEEE - All rights reserved. Use of this web site signifies your agreement to the terms and conditions.

subset: commoncrawl


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From Our 2012 Archives
Health Tip: Why Is My Aging Skin So Dry?
Latest Skin News
(HealthDay News) -- As the typical person ages, the skin looses its plump, smooth appearance. Ever wonder why?
The Cleveland Clinic offers these potential explanations:
-- Diana Kohnle
Copyright © 2012 HealthDay. All rights reserved.


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A travel agent booked my Husband and I into the Somerset Ampang Kuala Lumpur so I wasn't too sure what to expect. It was quite a drive from the airport (45 minutes in the busy period) but well worth the journey as it was near the City centre and all attractions were within a short distance. We were well and truly amazed by the courteousness and helpfulness from all of the staff; they were truly genuine friendly people. The facilities in the apartment were excellent and we had complimentary bottled water, washing powder, toiletries and tea and coffee making facilities replenished daily. We eat at 'Souled Out' which was practically next door to the hotel and the food and atmosphere there was fantastic. The swimming pool on the top floor of the accommodation was very nice and had a very comfy refreshment room near it to allow patrons to make tea or coffee at their leisure and meet other travellers. We would definitely return to this hotel again and would recommend it.
- Official Description (provided by the hotel):
- Located in the prestigious Embassy Row, Somerset Ampang offers stylish accommodation and unrivalled city views of the Kuala Lumpur City Centre. Its prime location provides quick access to the city's business, shopping and entertainment district, marked by Jalan Ampang, JAlan Sultan Ismail and Jalan Tun Razak. ... more less
- Reservation Options:
- TripAdvisor is proud to partner with Booking.com, TripOnline SA, Odigeo, Hotwire, Agoda, Hotels.com, Priceline, Travelocity, Expedia, HotelTravel.com and Ctrip TA so you can book your Somerset Ampang Kuala Lumpur reservations with confidence. We help millions of travelers each month to find the perfect hotel for both vacation and business trips, always with the best discounts and special offers.
- Also Known As:
- Somerset Ampang Kuala Lumpur Hotel Kuala Lumpur


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Growth, Development and Structural Change of Innovator Networks - The Case of Jena
We attempt to extend the static analysis of innovator networks by providing case study based insights into the dynamic, developmental or evolutionary pattern of such networks. In the theoretical part, we develop some building blocs that are considered central to a theory of network evolution. Especially, we focus on the growth of innovator networks and their structural change over time, i.e. how new relationships come into existence and existing ties are cut, how new actors join the system, and other actors leave it. The factors shaping these structural properties, can explain how coherence might increase in some periods while it might decrease in others. We exemplify these patterns for the case of the Jena network of innovators during the period 1995-2001.
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|Date of creation:
|12 Nov 2007
|Date of revision:
|Contact details of provider:
| Postal: Carl-Zeiss-Strasse 3, 07743 JENA
Phone: +049 3641/ 9 43000
Fax: +049 3641/ 9 43000
Web page: http://www.jenecon.de
More information through EDIRC
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, Volume 14, Issue 1, pp 1-10
First online:
Couples-Focused Behavioral Interventions for Prevention of HIV: Systematic Review of the State of Evidence
- Jennifer BurtonAffiliated withDepartment of Social Policy and Social Work, University of Oxford
- , Lynae A. DarbesAffiliated withCenter for AIDS Prevention Studies, University of California
- , Don OperarioAffiliated withDepartment of Community Health, Brown University Email author
Rent the article at a discountRent now
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HIV is frequently transmitted in the context of partners in a committed relationship, thus couples-focused HIV prevention interventions are a potentially promising modality for reducing infection. We conducted a systematic review of studies testing whether couples-focused behavioral prevention interventions reduce HIV transmission and risk behavior. We included studies using randomized controlled trial designs, quasi-randomized controlled trials, and nonrandomized controlled studies. We searched five electronic databases and screened 7,628 records. Six studies enrolling 1,084 index couples met inclusion criteria and were included in this review. Results across studies consistently indicated that couples-focused programs reduced unprotected sexual intercourse and increased condom use compared with control groups. However, studies were heterogeneous in population, type of intervention, comparison groups, and outcomes measures, and so meta-analysis to calculate pooled effects was inappropriate. Although couples-focused approaches to HIV prevention appear initially promising, additional research is necessary to build a stronger theoretical and methodological basis for couples-focused HIV prevention, and future interventions must pay closer attention to same-sex couples, adolescents, and young people in relationships.
KeywordsHIV Prevention Couples Relationships Systematic review
Reference tools
- Title
- Couples-Focused Behavioral Interventions for Prevention of HIV: Systematic Review of the State of Evidence
- Journal
AIDS and Behavior
Volume 14, Issue 1 , pp 1-10
- Cover Date
- 2010-02
- 10.1007/s10461-008-9471-4
- Print ISSN
- 1090-7165
- Online ISSN
- 1573-3254
- Publisher
- Springer US
- Additional Links
- Topics
- Keywords
- Prevention
- Couples
- Relationships
- Systematic review
- Industry Sectors
- Authors
- Jennifer Burton (1)
- Lynae A. Darbes (2)
- Don Operario (3)
- Author Affiliations
- 1. Department of Social Policy and Social Work, University of Oxford, Oxford, Oxfordshire, England
- 2. Center for AIDS Prevention Studies, University of California, San Francisco, CA, USA
- 3. Department of Community Health, Brown University, 121 South Main Street, 4th Floor, Providence, RI, USA


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The immediate past executive director of the International Energy Agency is on a mission attempting to alert officials in the United States, Japan, Europe, China and elsewhere that post-Fukushima Japan may be approaching an energy death spiral.
Politico's Dylan Byers has written one of the fairest, most earnest reviews of another journalist's work that I've read in some time.
The New York Times editors nail it today in a piece ridiculing the settlement between too-big-to-fail banks and states.
Today, more than 800 people will attend "The US Economy Summit" organized by The Atlantic and presented at the Capital Hilton Hotel.
Robots perform the theme from James Bond.
Formally led by the Queen of England, this collection of former British colonies could reconvene into something new and powerful.
The world's emerging economies will need more than just cheap labor to keep growing.
The now politically dominant Muslim Brotherhood's support for the actions of Egypt's military government is clearly a warning shot across America's bow.
While everyone knows that the defense budget is large, national security spending is much larger, nearly double the amount U.S. citizens are told.
If the GOP crowd that these wars are in our national interest, then they should start lining up some of the wealthiest in the country who are helping to agitate for these conflicts to pay more in taxes for them.


text:
Valco Snap 4 in 2013 Buyers Guide
by Fit Pregnancy Magazine
Fit Pregnancy Magazine did their annual Buyer's Guide for 2013; "Having a Baby? You're going to need some new gear. Lucky for you, we've done the legwork and found 109 of the best new products for parents and babies."
The Valco Baby Snap 4 Stroller was chosen as a great pick "At just 13 pounds, the Valco Baby Snap 4 offers a full range of features in a very lightweight package. The seat has a deliberately roomy design, and the generous sun canopy gives full coverage. The stroller stands when folded, and a shoulder strap makes it easy to transport."
See the whole Buyer's Guide on www.fitpregnancy.com
Snap Ultra ~ Valco Baby Lightweight Stroller Review 2015
by The Car Crash Detective more>>
O' Snap, a Snap Duo Double Stroller Review
featured on 'As the Stroller Turns' more>>
Stroller Options for Twins Plus One
by Busy Mommy Mediamore>>
Valco Baby Snap Ultra Stroller Review
by Mom's Stroller Reviews more>>


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Taylorsville Mayor Don Pay joined a long list of last-minute filers interested in participating in Spencer County's fall election.
Pay said Monday that he decided to seek a second four-year term in office to continue the work that began during his administration.
University of Kentucky bids $200,000 for a high school basketball prospect?
Wrong! Just so much Claude Mills talk.
Yet, outrage and legal action threats from a lawyer representing University of Kentucky's athletics department last week against the Chicago Sun-Times, then by the Anthony Davis family this week, leaves us to wonder "The (man) doth protest too much, methinks."
Let's all take a deep breath and remember dog days make news cycle choices a little daffy. Let's chill out with an Ale-8-One and think Governor's Cup.
The time is ripe for Kentucky cantaloupes and watermelons. Americans consume about 14 pounds of watermelon a year and about 11 pounds per year for cantaloupes, according to the United States Department of Agriculture. But how do you pick the best ones?
"One, two, three, four, five," said 15-year-old Brittany Ware as she took inventory of the glinting gold medals she has accrued over a seven-year involvement with Special Olympics, an athletic organization and competition for individuals with intellectual disabilities. Twelve silver and bronze medals sat nearby waiting to be counted – as did a nest of multicolored ribbons.
Under a sweltering sun, three volunteers worked quickly to evenly spread wet concrete as it flowed from a nearby truck Monday morning. But Kelly Creed didn't mind. As construction chairman of Spencer County Habitat for Humanities, he was just thrilled to see progress on the site.
District court
The following case was heard by the Hon. Donna Dutton in Spencer County District Court July 20, 2010.
Oscar William Payne, operating a motor vehicle under/influence of alcohol/drugs, first offense. Amended to alcohol intoxication in a public place. Guilty. $143 court cost and $100 to Shop with a Cop.
The following cases were heard by the Hon. Donna Dutton in Spencer County District Court July 23, 2010.
Brandon T. Clark, failure to wear seat belts. Guilty. $25 fine.
Little Mt. Baptist fall festival
Little Mount Baptist Church will be holding their annual fall festival Saturday, Sept. 11. Events will begin at 10 a.m. and include horse drawn wagon rides, music, food, yard sale, children's activities and a live auction.
Free booth space is available for yard sales and other organizations,' however, there will be no concession food allowed at booths.
The Bears now have a den of their own.
Through contributions of money, time and hard work, the Spencer County High School football team has a locker room to be proud of. After previously being assigned to the visiting locker rooms in the basketball gym, which meant a long walk from the field, their new space is bigger, closer and a source of pride.
"Until this point, our football team didn't have a true locker room," said Coach Wes Napper.
The Kentucky Gourd Society hosted teacher Bonnie Gibson on August 4 - 6. Gibson is a self-taught artist living in Arizona who is internationally know for gourd carving. The classes offered were:
• Power Carving Class, a class for beginner and intermediate gourd carvers
• River Bed Gourd, where students created recesses in the gourds and added pebbles for a river bed effect
• Peacock Feather Gourd, where students inset a piece of glass on their gourds and designed a peacock feather around it
Copyright © 2016
The Spencer Magnet is your source for local news, sports, events, and information in Spencer County, KY and the surrounding area.


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Webcast: Database Provisioning in Minutes: Using Oracle Enterprise Manager 12c DBaaS Snap Clone and EMC Storage
By Scott Mcneil-Oracle on Feb 23, 2015
Oracle Enterprise Manager 12c Database as a Service Snap Clone allows administrators to create fully functional copies of databases using the capabilities of the underlying storage layer. Users can request databases from the self-service console and have them provisioned within minutes instead of hours while keeping storage needs to a minimum.
Attend this presentation
to learn more about the features and benefits of Oracle Enterprise Manager
12c DBaaS Snap Clone using EMC storage and to view a live demo.
The Independent Oracle Users Group (IOUG), is conducting its annual database manageability survey. If you are a database professional responsible for managing and operating your organization's database applications and systems, then the IOUG wants to hear from you.
Take the next few minutes to answer simply questions around your common manageability practices and challenges. Share your experience and insight with the IOUG and Oracle communities and you'll be entered into a draw for a chance to win an Apple iPad from the IOUG. You will also receive a free copy of the final report.
Take the 2015 IOUG Database Manageability Survey
Guest contributors: Courtney Llamas and David Wolf
What are
the steps involved for upgrading from Oracle Enterprise Manager 12c
Release 3 to Release 4? Is it an upgrade in place or a new install/migration
Do the patch
and upgrade functionality work on Oracle Database 11g targets
or only on Oracle Database 12c targets?
Where can
I find a full list of new enhancements compared to Release 3?
Is there
a list available of new features by management pack?
What are
the best hardware configuration and setup in order to provide high availability
capabilities for database as a service (i.e. Oracle RAC, Oracle Exadata)?
Can Snap
Clone be used with EMC storage or is Oracle ZFS storage required?
Does Oracle
Enterprise Manager support monitoring of hypervisors?
Is the
metering and chargeback functionality part of the base product or does
it requires an additional management pack?
Does Enterprise
Data Governance require additional licensing?
How is the
new AWR Warehouse feature different from the existing AWR report in
Oracle Enterprise Manager 12c Release 3?
Does this
new release require more disk space for the AWR Warehouse? More CPU
and memory?
AWR Warehouse also support Oracle Database 10g and/or 11g AWR?
there a list of 3rd party technologies that can be managed by Oracle
Enterprise Manager 12c?
January 21, 2015
1:00 p.m. EST | 10:00 a.m. PST
The goal in every Oracle Enterprise Manager 12c rollout is to take it from zero to manageability in the shortest possible time. This presentation will show you how to accomplish this feat. Oracle experts will demonstrate how to properly architect and deploy Oracle Enterprise Manager 12c, including designing a highly available and scalable environment. Through this demonstration a list of essential techniques and tips compiled from Oracle Enterprise Manager Development's Strategic Customer Programs team will also be shared. Topics such as; users, roles, groups, templates, and incidents will be discussed, plus key architectural decisions.
By attending this webinar, you will learn how to:
Featured Speaker: Courtney Llamas, Principal Member of Technical Staff, Oracle
IOUG eBrief: January Edition Now Available
Check out January's issue of the IOUG eBrief featuring all the latest news and highlights from IOUG and the Oracle Enterprise Manager 12c Special Interest Group (SIG).
Read the latest Economist Intelligence Unit whitepaper called Innovating to Optimize: Creating Room in the IT budget for Initiatives that Boost Business. The paper outlines new ways executives can use technology to improve IT operational processes in order to drive innovation and optimize their business. The Economist interviews industry experts and thought leaders, revealing candid insights and new emerging trends.
|IOUG Webcast: Long Term and Cross-Database Performance Analysis for Oracle Databases Using Automatic Workload Repository Warehouse
January 15, 2015
The Automatic Workload Repository (AWR) feature in Oracle Database has been the standard used by DBAs to diagnose database performance problems.
In this session, you will learn about the new AWR Warehouse capability, which enables DBAs with capacity planning and performance analysis for Oracle Databases without the constraint of the retention period and without any overhead on critical databases.
Learn how AWR Warehouse can tell why performance was slow this month compared to the same period last year or give administrators an annual report of problems in your mission-critical databases.
Featured Speaker: Jagan Athreya, Senior Director of Product Management, Oracle
Check for compliance and automate patching of Oracle Database fleet using EM12c
Oracle along with its regular Quarterly Database PSU/SPU/CPU update this October 2014 released Oracle JAVA VM PSU patch, the patch is recommended to be applied to all databases in your fleet (esp. the ones that uses JAVA). (For more information, support Note- 1929745.1 explains it in detail).
The mandate primarily is to apply the patches against the databases that use JAVAVM option. Ideally, you would need to apply it against all databases, so in case a new database is created in the ORACLE_HOME it is covered.
Oracle Enterprise Manager 12c provides support features of Compliance Management and automated Patching of databases. Using both these features you could identify the databases in your fleet that needs the patch and automate applying them.
To get started, download the starter kit here. It contains utilities to jump start on your compliance, the kit contains a readily importable Compliance Standard and a step-by-step guide.[Read More]
Live Webcast:
October 28
Oracle Database 12c contains many new capabilities including Oracle Multitenant, in-memory column stores and much more. Oracle Real Application Testing gives you verifiable functionality and performance testing capabilities to take advantage of all the new enhancements. Combining your database upgrade with Oracle Real Application Testing assures you that your database will perform as required, whether you're implementing an in-memory column store, consolidating to a database as a service model, or doing an in-place upgrade—join us in this webcast to learn more.
Scripts, the largest pharmacy benefit management organization in the United
States, automates its database services using Oracle Enterprise Manager's
centralized management solution. Watch
the video.
Enterprise Manager 126.96.36.199 has now been released for a few weeks, as well as the 18.104.22.168 OMS Bundle patches (also known as System patches). If you plan to apply these bundle patches to your 184.108.40.206 OMS, and you are concerned about the downtime, then, you can reduce the downtime by referring to this whitepaper that contains patching instructions to reduce downtime.
Patching has always been one of the many joys (or dreads) of Oracle DBAs. The effort compounds as the Database sprawl grows and the architecture complexity increases. Additionally, there is an increasing pressure to patch the systems with minimal or zero downtime.
EM12c's Database patch automation functionality provides an end-to-end management starting with proactive patch recommendations (like quarterly PSUs and CPUs), complete pre-flight checker to ensure predictable patching during maintenance window and automation for patching the comprehensive list of products under the Oracle Database family. ( EM12c Patch Automation overview)
Starting 184.108.40.206 (EM12c R4), the support is enhanced to be more tighter, can be done in 'Out of Place' mode, and has new supplemental features to manage the process along with its additional tasks.
In this post we will take a closer look of the data guard stand by patching feature and then dive into a use case, you could try out in your environment.
10 — 7:00 a.m. PT | 10:00 a.m. ET | 4:00 p.m. CET
Since the demands from the business for IT services is non-stop, creating copies of production databases in order to develop, test and deploy new applications can be labor intensive and time consuming. Users may also need to preserve private copies of the database, so that they can go back to a point prior to when a change was made in order to diagnose potential issues. Using Snap Clone, users can create multiple snapshots of the database and "time travel" across these snapshots to access data from any point in time.
Join us for an in-depth technical webcast and learn how Oracle Cloud Management Pack for Oracle Database's capability called Snap Clone, can fundamentally improve the efficiency and agility of administrators and QA Engineers while saving CAPEX on storage. Benefits include:
The Cloud Odyssey event happened in London recently. Here is the Storify from the event. Enjoy!
Since the launch of Oracle Enterprise Manager 12c Release 3, we have received tons of questions around managing Oracle Multitenant, an Oracle Database 12c Enterprise Edition option, and pluggable databases (PDBs)—more specifically; questions about pluggable database as a service (PDBaaS). In this blog, we provide answers to some of the common questions from people.
What qualifies a database to be pluggable?
Can the pluggable
databases be plugged and unplugged across multiple platforms such as Solaris,
AIX, and Linux?
In terms
of database consolidation, what are the differences between using VMs,
dedicated schemas and pluggable databases?
Pluggable database combines the best of all the other models and offers excellent consolidation, isolation, manageability and is suitable for any application that is certified to run on Oracle Database 12c. With the other models, we see certain shortcomings. For example, server virtualization offers good isolation but creates compliance and administrative headaches. Schema based consolidation offers ease of management and patching, but limited isolation.
How do you
track configuration drift with a pluggable database? I certainly understand
drift in the container database, but in what ways would a pluggable database
drift from its standard baseline?
What is a
zone? Is it physical? Regional?
What will
be the DBA and SYSADMIN role in the pluggable DBaaS environment?
What if you
need custom configurations on a pluggable database? Once the database
is deployed via self-service how do you make changes?
If I'm an
application developer and I request a database with a certain pre-defined
service level, what level of permissions should I expect with that database?
Am I getting DBA or SYSDBA privileges with that request?
Are the pluggable
database as a service capabilities for Oracle Database 12c included in
Oracle Enterprise Manager 12c? Do we need a plug-in? Do we need to license
Oracle Enterprise Manager 12c Database Management Packs?
Which Oracle
Enterprise Manager 12c Management Packs are required to be able to provide
If you have
shared memory and background processes in the container database, how
do you allocate server resources to a particular pluggable database? Can
you assign specific amount of CPU cycles, RAM and IOPS for a given pluggable
What is the
largest number of pluggable databases you can deploy on Oracle Exadata?
Can I use
pluggable database as a service if the target database is 9i or 10g?
Can Active
Data Guard be configured for selective pluggable databases from a container
database? I do not want all pluggable databases to have a standby.
Does RMAN
support pluggable databases?
For complete details of managing pluggable database as a service, be sure to watch this webcast: Delivering Pluggable Database as a Service
Munhowen, a leading Luxembourg beverage distributor, decided to replace its existing IT environment. By selecting Oracle technology, including Oracle Real Application Clusters, Oracle Enterprise Manager, Oracle Linux and Oracle ZFS Storage Appliances, the company was able to enhance system performance and reduce maintenance costs associated with sustaining an optimal hardware environment.
Jean-Pierre Rasquin, CIO, Munhowen, explains: "Implementing Oracle Real Application Clusters, Oracle Enterprise Manager, and Oracle ZFS Storage Appliance helped us to significantly increase our IT environment's availability, scalability, and manageability—providing superior support, tailored to our business needs, while helping us to reduce maintenance costs." Read the press release.
As a DBA, getting ahead of the demands of the job are challenging enough, day in and day out. A recent IOUG survey on database management sheds new light on some of the top challenges facing administrators. Here's an infographic breakdown on what you need to know.
the IOUG Survey.
If you have an Enterprise Manager 12c Release 3 or older agent monitoring database targets, Support may recommend that you install a JDBC (Java database connectivity) patch, such as patch 17591700, to prevent high CPU consumption by the agent.
JDBC patches, including 17591700, have readme files containing instructions for installing the patches to a database, not to an EM agent. This post provides an example of how to install a JDBC patch to an EM agent. It walks through the steps of installing patch 17591700 to an EM12c Release3 agent.
Here are the steps:
1. Identify the version of the JDBC client in the Agent Binaries home.
$ setenv ORACLE_HOME /u01/em12/core/188.8.131.52.0
Note: One way to find out the Agent Binaries home is to look in file /etc/oragchomelist on the agent host. It should contain an entry for an agent install in the format of:
<Agent Binaries home>:<Agent home>
For example, file /etc/oragchomelist contains:/u01/em12/core/188.8.131.52.0:/u01/em12/agent_inst
$ $ORACLE_HOME/OPatch/opatch lsinv -details | grep 'Oracle JDBC/OCI Instant Client'
Oracle JDBC/OCI Instant Client 184.108.40.206.0
In this case, the version of the JDBC client is 220.127.116.11.0.
2. Download the patch from MOS (My Oracle Support) website. The version of the JDBC client should match the version of the database for which the patch is intended. Stage the patch zip file, p17591700_111070_Generic.zip, on the agent host. I stage the patch in directory /u01/stage/jdbc_patch. I will refer to this location as the patch stage directory.
3. Go to the patch stage directory and extract files from the zip file.
$ cd /u01/stage/jdbc_patch
$ unzip p17591700_111070_Generic.zip
Archive: p17591700_111070_Generic.zip
creating: 17591700/
inflating: 17591700/README.txt
creating: 17591700/files/
creating: 17591700/files/jdbc/
creating: 17591700/files/jdbc/lib/
inflating: 17591700/etc/xml/GenericActions.xml
inflating: 17591700/etc/xml/ShiphomeDirectoryStructure.xml
4. Stop the agent.
$ /u01/em12/agent_inst/bin/emctl stop agent
Oracle Enterprise Manager Cloud Control 12c Release 3
Copyright (c) 1996, 2013 Oracle Corporation. All rights reserved.
Stopping agent ..... stopped.
5. Install the patch.
$ cd /u01/stage/jdbc_patch/17591700
6. Start the agent.
$ $ORACLE_HOME/OPatch/opatch apply
Oracle Interim Patch Installer version 184.108.40.206.0
Copyright (c) 2013, Oracle Corporation. All rights reserved.
Oracle Home : /u01/em12/core/220.127.116.11.0
Central Inventory : /u01/app/oraInventory
from : /u01/em12/core/22.214.171.124.0/oraInst.loc
OPatch version : 18.104.22.168.0
OUI version : 188.8.131.52.0
Log file location : /u01/em12/core/22.214.171.124.0/cfgtoollogs/opatch/17591700_Mar_17_2014_12_03_05/apply2014-03-17_12-03-05PM_1.log
Applying interim patch '17591700' to OH '/u01/em12/core/188.8.131.52.0'
Verifying environment and performing prerequisite checks...
Patch 17591700: Optional component(s) missing : [ oracle.dbjava.jdbc, 184.108.40.206.0 ]
Interim patch 17591700 is a superset of the patch(es) [ 16087066 ] in the Oracle Home
OPatch will roll back the subset patches and apply the given patch.
All checks passed.
Backing up files...
Rolling back interim patch '16087066' from OH '/u01/em12/core/184.108.40.206.0'
Patching component oracle.dbjava.ic, 22.214.171.124.0...
Updating jar file "/u01/em12/core/188.8.131.52.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/188.8.131.52.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/aq/AQNotificationEvent$EventType.class"
Updating jar file "/u01/em12/core/184.108.40.206.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/126.96.36.199.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/aq/AQNotificationEvent.class"
Updating jar file "/u01/em12/core/22.214.171.124.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/18.104.22.168.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/dcn/DatabaseChangeEvent$AdditionalEventType.class"
Updating jar file "/u01/em12/core/22.214.171.124.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/184.108.40.206.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/dcn/DatabaseChangeEvent$EventType.class"
Updating jar file "/u01/em12/core/188.8.131.52.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/18.104.22.168.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/dcn/DatabaseChangeEvent.class"
Updating jar file "/u01/em12/core/220.127.116.11.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/220.127.116.11.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/driver/NTFAQEvent.class"
Updating jar file "/u01/em12/core/184.108.40.206.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/184.108.40.206.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/driver/NTFConnection.class"
Updating jar file "/u01/em12/core/126.96.36.199.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/184.108.40.206.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/driver/NTFDCNEvent.class"
Updating jar file "/u01/em12/core/184.108.40.206.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/126.96.36.199.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/driver/NTFManager.class"
Updating jar file "/u01/em12/core/220.127.116.11.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/184.108.40.206.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/driver/T4CConnection.class"
Updating jar file "/u01/em12/core/220.127.116.11.0/jdbc/lib/ojdbc6.jar" with "/u01/em12/core/188.8.131.52.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc6.jar/oracle/jdbc/driver/T4CTTIokpn.class"
Updating jar file "/u01/em12/core/22.214.171.124.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/184.108.40.206.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/aq/AQNotificationEvent$EventType.class"
Updating jar file "/u01/em12/core/188.8.131.52.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/184.108.40.206.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/aq/AQNotificationEvent.class"
Updating jar file "/u01/em12/core/188.8.131.52.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/188.8.131.52.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/dcn/DatabaseChangeEvent$AdditionalEventType.class"
Updating jar file "/u01/em12/core/22.214.171.124.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/184.108.40.206.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/dcn/DatabaseChangeEvent$EventType.class"
Updating jar file "/u01/em12/core/184.108.40.206.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/188.8.131.52.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/dcn/DatabaseChangeEvent.class"
Updating jar file "/u01/em12/core/18.104.22.168.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/220.127.116.11.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/driver/NTFAQEvent.class"
Updating jar file "/u01/em12/core/184.108.40.206.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/188.8.131.52.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/driver/NTFConnection.class"
Updating jar file "/u01/em12/core/126.96.36.199.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/22.214.171.124.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/driver/NTFDCNEvent.class"
Updating jar file "/u01/em12/core/126.96.36.199.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/220.127.116.11.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/driver/NTFManager.class"
Updating jar file "/u01/em12/core/126.96.36.199.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/188.8.131.52.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/driver/T4CConnection.class"
Updating jar file "/u01/em12/core/22.214.171.124.0/jdbc/lib/ojdbc5.jar" with "/u01/em12/core/22.214.171.124.0/.patch_storage/16087066_Feb_4_2013_04_52_18/files//jdbc/lib/ojdbc5.jar/oracle/jdbc/driver/T4CTTIokpn.class"
RollbackSession removing interim patch '16087066' from inventory
OPatch back to application of the patch '17591700' after auto-rollback.
Patching component oracle.dbjava.ic, 188.8.131.52.0...
Verifying the update...
Patch 17591700 successfully applied
Log file location: /u01/em12/core/22.214.171.124.0/cfgtoollogs/opatch/17591700_Mar_17_2014_12_03_05/apply2014-03-17_12-03-05PM_1.log
OPatch succeeded
$ /u01/em12/agent_inst/bin/emctl start agent
Oracle Enterprise Manager Cloud Control 12c Release 3
Copyright (c) 1996, 2013 Oracle Corporation. All rights reserved.
Starting agent ............. started.
The above step completes the process of installing patch 17591700 to the 18.104.22.168 agent.
The Italian National Institute of Astrophysics (INAF) has selected Oracle to store, analyze and manage scientific data generated from the European Space Agency's Gaia mission. The mission sets out to provide in-depth 3-D mapping of the Milky Way galaxy over the course of the next 5 years. An estimated 1 petabyte of astronomical data (equivalent to 1 million gigabytes) will be collected and stored in Oracle Database with Oracle Enterprise Manager entrusted to manage the system.
The goal of the Gaia mission will give researchers a better understanding into how the Milky Way was formed and how it has evolved over time. According to Roberto Morbidelli, Scientific Operation Manager at INAF, "Our activity within the Gaia mission will provide a huge volume of information, a very precious heritage of astronomical data that will have to be stored for the whole 21st century and beyond. Oracle has demonstrated in other research contexts that it would be the ideal technological partner to manage scientific projects of this kind of size. Thus we are sure that it will be a successful choice for INAF too. Oracle has been selected for its technology's reliability, scalability, availability and the appropriate technological evolution planned in the next years; also key was the competence showed by Oracle experts in the development of features useful to our research."
Oracle Enterprise Manager will be deployed to help manage the multiple Oracle Database instances and Oracle Real Application Clusters. Oracle Enterprise Manager will be used to ensure reliable access to Gaia mission data, allowing for numerous third-party applications and systems that control and verify the correct functioning of satellites and astronomical instruments.
"We are proud to offer our technology to the Gaia mission, an international research project that is of both major importance and high ambition," said Xavier Verhaeghe, Vice President, Technology & Big Data Oracle EMEA. "INAF's choice is another confirmation of Oracle's ability to easily manage the extreme challenges involved in processing petabytes of Big Data."
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Mission on Facebook.
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As Product Manager for Oracle Enterprise Manager, one question that is often being asked to me is how much is the upgrade downtime and how it can be reduced?
One easy way to reduce the downtime while doing patch set upgrades is to perform Software only upgrade and then shutdown the existing OMS for the upgrade. This approach will not completely eliminate the downtime but reduce it to a great extent.
When I mention patch set upgrade, we cover following upgrade paths:
a) 18.104.22.168 (with Bundle Patches 1) to 184.108.40.206/ 126.96.36.199
b) 18.104.22.168 to 188.8.131.52
Following table compares the steps required for regular installation (OUI) and software only installation.
As you may notices from the steps listed above, regular OUI upgrade requires stopping OMS before invoking runInstaller and keeping it down until the upgrade is complete. On the other hand Software only upgrade first copies the bits and sets up the environment before stopping OMS, thus reducing the upgrade downtime.
Next comes Agent upgrade. While we recommend Agent Upgrade Console (AUC) to upgrade agents from 22.214.171.124 (with bundle patch1) /12.0.1.02 to 188.8.131.52, sometimes it's not clear what happens during the Agent upgrade and when is the actual downtime . So here are high level steps describing the complete process:
The actual downtime while doing the agent upgrade is on step9 where we shut down your old agent. When the agent is in blackout from step 1 to 8 it still collect's all the monitoring data so there is no loss.
More Information: It is recommended to go through the below checklist notes before starting your upgrade
MOS note 1568143.1 - EM 12c R3: Checklist for Upgrading Enterprise Manager Cloud Control from Version 12.1.0.x to 188.8.131.52
MOS Note 1569883.1 EM 12c R3: Checklist for Upgrading Management Agents Version 12.1.0.x to 126.96.36.199
Collateral :
EM 22.214.171.124 Install and Upgrade collateral page(PPT,Recorded demo,Whitepapers) on OTN:http://www.oracle.com/technetwork/oem/install-upgrade/index.html
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Oracle recently announced new management capabilities for Oracle Database 12c, providing customers with even more enhancements to improve productivity and manageability. The new Oracle Enterprise Manager 12c features are supported out-of-the-box with Oracle Database 12c. So whether you want to take advantage of the new Data Redaction capabilities at the security layer, or whether you want to take a look at some of the heat map capabilities in our Information Lifecycle Management or leverage the new performance management features, such as, Database Operations Monitoring or Enhanced Real-Time ADDM, you can use Oracle Enterprise Manager 12c to manage them all.
These new capabilities can be integrated with your standard monitoring and management that you already have in your environment without having to undertake any additional tools or any additional training. Simply install or upgrade to Oracle Enterprise Manager 12c and Oracle Database 12c and together these two products will let you plug into the Cloud.
Here is a quick summary of all the new Oracle Enterprise Manager 12c capabilities for Oracle Database 12c:
To learn more about all the latest capabilities, be sure to register for our upcoming webcast: Managing Oracle Database 12c with Oracle Enterprise Manager 12c.
Join us for a live Webcast to find out about the recently released Oracle Enterprise Manager 12c plug-ins that deliver new capabilities and support for managing database cloud services with schema as a service for extreme database consolidation and quick efficient database cloning through Snap Clone or RMAN Backups. These new capabilities provide an optimum utilization of development and database resources giving customers more flexibility and control during application development, leading to a faster time-to-market for delivering IT services.
As we deal with Database as a Service use cases, we often find that consumers do not need dedicated databases of their own. Developers of a home-grown application, for example, might be satisfied with a logical slice of the database. This logical slice, leads us to the concept of Schema as a Service—a new capability offered in the latest release of Oracle Enterprise Manager 12c Release 2 Plug-in Update 1.
Schema as a service is the ultimate and extreme in consolidating multiple schemas in a shared database model. Cloud users can request one or more schemas, with or without seed data, from Oracle Enterprise Manager 12c's out-of-the-box self service portal. It offers excellent manageability, not only for its fast efficient provisioning, but because administrators only need to manage a small number of databases.
However, consolidation comes at the expense of isolation, because the operating system and database are not isolated among the database consumers. While enabling Schema as a Service, it's important to isolate the workloads as much as possible to make sure that one user doesn't run away with all the database resources. Administrators can guarantee this does not happen by using Oracle Enterprise Manager 12c's CPU monitoring capabilities built in to Oracle Database Resource Manager to maintain service levels.
For security, the more consolidated you get, the more concerns administrators have about data isolation and security. Using Oracle Data Vault can help resolve these issues. It is integrated with Oracle Enterprise Manager 12c, and administrators can use Oracle Data Vault to enable fine grain control based on roles and privileges within the database cloud service.
For reporting purposes, metering and chargeback capabilities can be implemented to help IT organizations gain in-depth visibility into resource consumption and expenses incurred with each schema as a service deployment. This is useful for regulatory compliance requirements as well.
Schema as a Service at a Glance:
How To:
1. Setting up Platform as a Service Zones
2. Setting up Database Pools
3. Request Settings
4. Quotas
5. Profiles and Service Templates
6. Chargeback
LEARN MORE:Product Info:
Gartner recently announced that Oracle Data Masking Pack, part of Oracle Enterprise Manager's quality management and Oracle Database Security defense-in-depth solution, has been named a leader in the first Magic Quadrant for Data Masking Technology report.
Oracle Data Masking strengths highlighted in the report include:
About Oracle
Data Masking
Key Features:
Oracle Data Masking completely replaces sensitive information such as; names, account numbers, SSNs, financial results, purchasing transactions, etc. in your development, test and QA systems with data that cannot be "reverse engineered" to reveal its original source. This allows production data to be safely used for development, testing, or sharing with out-source or off-shore partners for other non-production purposes. The Pack provides extensive search capabilities to scan enterprise databases for sensitive data discovery based on established data patterns and models.
The solution allows masking of all the related data elements automatically while preserving referential relationships combining the sensitive data columns and associated relationships in an Application Data Model. Oracle Data Masking can detect data dependencies, such as foreign key constraints and replaces sensitive information transparently. This ensures that the referential integrity necessary for applications to work and function properly will continue be in place, even on development systems.
Data Masking
for Security and Compliance
In addition, Oracle Data Masking allows organizations to enforce compliance with regulatory requirements such as; Sarbanes-Oxley, Payment Card Industry Data Security Standards, Health Insurance Portability and Accountability Act, as well as numerous other laws and regulations that restrict the use of actual customer data.
Oracle Data Masking continues to gain strong adoption, check out the latest customers to see how they are benefiting from the solution:
Latest information on Oracle Enterprise Manager and Oracle Management Cloud.


text:
Breast Cancer Health Center
Antiperspirant Chemical Found in Breast Tumors
Jan. 12, 2004 -- For years, rumors have circulated on the Internet that antiperspirant use causes breast cancer, despite a complete lack of scientific evidence to support the claim. Cancer experts say there is no cause for concern, but a group of researchers in the U.K. aren't so sure.
The investigators report finding preservatives commonly used in antiperspirants and other cosmetic products in breast tumors. Their earlier work also implicated the preservatives, known as parabens, as weak promoters of estrogen-dependent breast cells.
Although they are not saying that parabens cause breast cancer, lead researcher Philippa Darbre, PhD, and colleagues are hoping the findings will lead to larger studies.
"Our research certainly does not prove causality, but we believe that in a few of these tumors the level of this chemical was high enough to promote breast cancer cell growth," Darbre tells WebMD. "We don't know, however, if parabens can cause normal cells to become cancer cells."
Little Support for Controversial Idea
Darbre says she is convinced antiperspirants can cause breast cancer but has received little support from the scientific community to test the hypothesis. If she gets funding, the researcher says she hopes to study whether aluminum, which is the active ingredient in most antiperspirants, is also present in breast tumor tissues and whether these chemicals are present in healthy breast tissue.
"I have no doubt that if chemicals in underarm cosmetics are involved in breast cancer, some people will be more susceptible to this than others," she says. "These products may be perfectly safe for some but not for others."
In an editorial accompanying the study, published in the January issue of the Journal of Applied Toxicology, toxicologist Philip W. Harvey, PhD, also calls for more research into the safety of parabens and other chemicals in cosmetics that may promote the growth of estrogen-dependent tumors.
"Absence of evidence is not evidence of absence of a harmful effect," he tells WebMD in an interview. "These chemicals are being directly applied daily, by very large numbers of people, and the long-term health effects of exposure are essentially unknown."


text:
German Stocks Decline Amid Draghi Comments as Metro Falls
German stocks fell to a three-week low as European Central Bank President Mario Draghi said poor demand and financial market conditions may affect the euro-area economy and as investors awaited tomorrow's U.S. jobs data.
Metro AG slid the most in more than five months after Morgan Stanley lowered its recommendation for the retailer. Merck KGaA posted the biggest gain on the benchmark DAX Index, rising 4.9 percent, after agreeing to buy Luxembourg-based AZ Electronic Materials SA for $2.6 billion.
The DAX dropped 0.6 percent to 9,084.95 at the close in Frankfurt, the lowest level since Nov. 13. The gauge has dropped 3.4 percent this week as investors weighed U.S. data to gauge when the Federal Reserve will reduce monthly bond purchases. The benchmark has advanced 19 percent this year. The broader HDAX Index also fell 0.6 percent today.
"Markets are trying to find their orientation," Matthias Jasper, head of equities at WGZ Bank AG in Dusseldorf, Germany, said by phone. "The focus is still on Fed tapering concerns, and Draghi hasn't said anything to surprise markets in a positive way. Ahead of the next Fed meeting, markets will remain a bit nervous."
Draghi predicted the euro area will experience a prolonged period of low inflation, addressing reporters in Frankfurt after the ECB left its key interest rate unchanged.
"The risks surrounding the economic outlook for the euro area are assessed to be on the downside," he said. "Developments in global money and financial market conditions and related uncertainties may have the potential to negatively affect economic conditions"
Jobs Data
In the U.S., Labor Department will tomorrow publish last month's reading on U.S. non-farm payrolls, and data may show the unemployment rate fell to 7.2 percent.
The Fed has said it will consider reducing its $85 billion of monthly bond purchases if the economy improves in line with its forecasts. Policy makers, who next meet on Dec. 17-18, will probably wait until March to reduce monthly bond purchases to $70 billion, according to the median estimate in Bloomberg's survey on Nov. 8.
U.S. gross domestic product climbed at a 3.6 percent annualized rate, Commerce Department figures today showed. That's up from an initial estimate of 2.8 percent and the strongest since the first quarter of 2012. The median forecast of economists surveyed by Bloomberg was for a 3.1 percent gain.
Metro Rating
Metro dropped 4.8 percent to 34.29 euros, the biggest drop since June. Morgan Stanley cut its rating on the retailer to equal weight, similar to neutral, from overweight, citing a lack of immediate reasons for the stock price to go up. The stock has rallied 65 percent this year.
Drillisch AG fell 3.6 percent to 20 euros after saying it will issue 100 million euros of bonds that can be exchanged for shares. The bonds are convertible into about 4.1 million shares, or 7.7 percent of all outstanding shares.
Merck climbed 4.9 percent to 130.50 euros, the highest price since it sold shares to the public in 1995. The acquisition will allow Merck to expand its chemicals business to include AZ's products such as specialty chemicals used in the production of microchips and anti-reflective coatings used in hard-disk drives.
K+S AG, a German potash producer, gained 0.8 percent to 20.96 euros. The stock has still tumbled 40 percent so far this year, heading for its biggest annual loss since at least 1999, according to data compiled by Bloomberg.


text:
All cheats, tips and news tagged: gdc online
Why Solitaire Blitz wasn't the next Words With Friends
FarmVille Expansions: Zynga brainstorms the future of the farm
Matching With Friends was almost Picnic With Friends, and other facts
Zynga: Indiana Jones Adventure World was all about the story
Playdom vet: 'There's always room for hardcore games' on Facebook
The GDC Online Awards Audience Award is open for voting right now
CastleVille and The Sims Social lead the pack in GDC Online award nominations
Game Developers Choice Online Awards Audience Award: Vote for your fave Facebook game
FrontierVille, Ravenwood Fair score multiple GDC Online Awards nominations
Five things you need to know about social games [GDC Online]
Playdom's Social City named 'Best Social Network Game'
Quote of the Moment: Facebook game wall spam is not actually spam
Game Developer Choice Online Awards wants your vote!
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text:
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text: How do I force Finder to always arrange all items in every folder by the date modified? I'm only asking because even after research, I couldn't resolve it -- going to "View" -> "Show View Options" has the "Use as Defaults" greyed out for some reason, for all my folders. So I can't force it to sort by date by default. Any ideas?


text:
Tumblr creative director quits after Yahoo acquisition
Could it be that the recent Yahoo acquisition of Tumblr rubbed some people the wrong way? Yahoo CEO Marissa Mayer said that they wouldn't screw it up, but sometimes you can't make everyone happy. It turns out that Tumblr's creative director and one of the company's first employees, Jacob Bijani, is stepping down from his post.


text:
WOW! You just gave me an education. I know my photbucket is set to private, but now I wonder if the way you described can be done irregardless.
Ok I just tried it while I am logged out.
I retrieved the following link from my post of items for sale:
If you paste that link in the address bar, you bring up just the photo.
Now per your instructions, I erased the /135.jpg to see if it would go to my albums and it took me to the login screen for photobucket.
I have my privacy settings on photobucket set so that no one can view. It looks like the security also addressed the vary thing you just listed out, so if you change your privacy settings your pictures should be just fine.


text:
Round to Flat Power Plug Adapter
If you think the price is too high, please click to apply for lower price
All packages from DX.com are sent without DX logo or any information indicating DX.com. Due to package variations from suppliers, the product packaging customers receive may be different from the images displayed.
To enable volume discounts on this site, use coupon code: BULKRATE during checkout. You will see a discount applied at the bottom of the shopping cart. Competitive pricing is available. Contact us for details.
|3+ units
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|US$1.03 shipped
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|US$1.01 shipped
What is Bulk Rate? BulkRate is a semi-wholesale system with items priced separately from retail. When you use bulk rates, a flat $1.70 registered air mail fee will automatically be added to your cart to ensure delivery of package. While BulkRate's intention is to offer cheaper prices when you buy in bulk, because it is priced separately it on occassions show a higher than retail price. That's why we ask you to enter BULKRATE as a coupon code to manually activate the rates. You can always opt not to use the bulk rates. If you are looking for wholesale prices please feel free to contact us.
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Share your reviews, photos and videos here!
Adapta bien al enchufe europeo. Rápido se quebró el plástico que tiene en las entradas. Lo tengo pegado con cinta aislante y me sigue funcionando. Lo tengo de uso en una cámara CCTV que compre acá mismo en DX. Si lo con... Read more
Got the device today. Plugged my 85V to 240V adapter into it and it works just fine. Real happy with it. Will order again if i need another. Simple and easy to use.
mam już ta przejściówkę dłuższy okres czasu nadal funkcjonuje bez zarzutu
It is a simple north america power adapter. Plain and simple. Though it's plastic quality is not superb, it more than acceptable for its price.
Pros: Lightweight, easy in use, works very well, low price, Cons: Low quality, breaks down pretty easy. It's a reasonable product for a very low price, really good product for a holiday to Asian countries. I ordered 2 in... Read more
I already had SKU 3502, but that adapter is really tight on the female part of the plug. Which is great if you need a permanent but I do... Read more
it is a plug converter,flat to round,there is not much to say,it does its job pretty well,does what it is supposed to do and also the is... Read more
Adapta bien al enchufe europeo. Rápido se quebró el plástico que tiene en las entradas. Lo tengo pegado con cinta aislante y me sigue Lo... Read more
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text:
An ex-hacker, a sexy college professor, stolen top secret hardware, a cover-up, a kidnapping, a government conspiracy, hacked defense computers, Armageddon!
An excerpt from the deposition transcripts:
"Let the record reflect that this deposition commenced at 9:15 am on December the 3rd, 2004 at the FBI offices in Atlanta, Georgia. Present for this recording are Special Agent Alvin Dirk, the Honorable Judge Ramiro Vasquez, and the witness, Robert O. Blain. This deposition is merely a recording of the events which transpired at Norwood University and is not now nor ever will be part of any trial or prosecution. Go ahead."
"My name is Bobby Blain. Most people seem to think it all started when Dr. Jennings hired me, and all the computers started getting hacked. It was easy for people to think that, because I have a history and got myself in some trouble when I was younger. I hacked some computers and almost got the president impeached, but it really started before that, when I still worked for Dr. Karlyn."
"Dr. Karlyn gave me a chance to redeem myself by allowing me to work on his computer for him. Then one day, this scientist I had never seen before comes and gives Dr. Karlyn a device. I was never told what he wanted, but I think he wanted Dr. Karlyn to help him reverse engineer it. I was only asked to build an interface to attach it to the computer. Dr. Karlyn did the rest. I think he figured out how to turn it on, but when he did, strange things started to happen."
"We didn't know it then, but it turns out the device was stolen from a government facility. I don't know where they got it, that is more classified than this deposition. I can tell you with absolute certainty that they didn't make it themselves. I'd like to tell you more, but I don't think I'm allowed."
"Anyway, someone at the university needed to get Dr. Karlyn out of the way and falsely accused him of inappropriate conduct with a student. He could have fought it, the dean believed him, but he decides to leave the school anyway. Before he goes, he gives his computer to Professor Jennings and he gives me a letter of recommendation, so after I help deliver and setup the computer, she agrees to hire me."
"The first night it is up and running, at least two attempts are made to hack into the computer. I forgot to mention that even before I deliver the computer, this guy tries to break in and steal something from it, but I was there and he didn't get anything."
"I can't divulge any secrets about Professor Jennings' project here, but my part is to prove that her process would work if she were given enough computer resources, so I re-write her process to work across a network and run on thousands of computers."
"That's when things got really crazy. Someone keeps trying to hack into our computer; someone hacks the entire school and the phone company. Professor Jennings' secretary is kidnapped. The FBI gets involved, but they're chasing the wrong people for reasons only they can tell you."
"Then someone plants a virus on our computer and the next thing we know, it's spread all over the internet, including some very sensitive government computers. Meanwhile, our project continues to gain speed and surpass anyone's expectations."
"When the FBI come in and learn that the device that was given to Dr. Karlyn is actually some super cool futuristic computer that is able to grow and build more circuits for itself, they want to disconnect the computer and confiscate it."
"That's when computers all over the world go out of control. The pentagon and all the armed forces are helpless. Air traffic is grounded. All the computer problems are traced back to the professor's computer. The FBI want it dismantled more than ever, but the academics involved want to get the device to relinquish control over the world before they do."
"And, well, I guess that's all I'm allowed to say, thank you."
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Comprehensive Description
"Kesun abyssorum, n.sp.
St. 177. 5. iii. 27. 27 miles SW of Deception Island, South Shetlands. 63° 17' 30" S, 61° 17' 00" W. 1080 m. Gear DLH. Bottom: mud and stones. One specimen.
DESCRIPTION. The body (Fig. 69, a) is acorn-shaped from contraction, and measures 21 mm. for 23 chaetigers. The diameter is 6 mm. at its widest part. There is a very short, blunt, smooth prostomium, followed by a triannulate buccal segment with paired nuchal pits. Apart from the prostornium the surface of the body is granular or finely vesicular; and as described by Chamberlin for Kesun fusus, each annulus is marked by a row of fine but distinct vesicular papillae. There is no trace of gills.
In the anterior portion of the body the bristle bundles arc borne on small papillae, and above and below the foot are one or two papillae much larger than the other papillae of the middle annulus (Fig. 69, b). From about the 12th chaetiger all the papillae of the middle ring increase in size till they equal the papillae lying above and below the foot. Consequently, for the last ten segments, the bristle bundles lie in a deep groove (Fig. 69, c), the sides of which are formed by the annulus in which the feet lie. The terminal segments are uniannulate. The lateral prominences so conspicuous in Travisia are wholly absent.
From the 6th to the 9th chaetigers inclusive, there is on each side below the foot an enormous oval nephridiopore, the vertical diameter of which is about equal to the distance between the bristle bundles. Between the bristle bundles sensory pits are present as in Travisia. The anal cylinder is about equal in length to the last two segments, and faintly longitudinally furrowed.
REMARKS. This form is allied to Kesun fusus, Chamberlin: it differs in the number of segments and in the possession of a deep posterior groove in which the feet lie."
(Monro, 1930)
Water temperature and chemistry ranges based on 50 samples.
Environmental ranges
Depth range (m): 1582 - 8255
Temperature range (°C): -0.673 - 1.248
Nitrate (umol/L): 30.362 - 37.829
Salinity (PPS): 34.639 - 34.712
Oxygen (ml/l): 4.519 - 6.210
Phosphate (umol/l): 2.073 - 2.426
Silicate (umol/l): 104.450 - 145.681
Graphical representation
Depth range (m): 1582 - 8255
Temperature range (°C): -0.673 - 1.248
Nitrate (umol/L): 30.362 - 37.829
Salinity (PPS): 34.639 - 34.712
Oxygen (ml/l): 4.519 - 6.210
Phosphate (umol/l): 2.073 - 2.426
Silicate (umol/l): 104.450 - 145.681
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Volume 3, Issue 6, November 1985
A step‐and‐repeat x‐ray exposure system for 0.5 μm pattern replication3(1985); http://dx.doi.org/10.1116/1.582942View Description Hide Description
A new step‐and‐repeat x‐ray exposure system has been developed to establish practical submicron x‐ray lithography. Penumbra and run‐out error have been determined on the basis of resolution consideration and alignment accuracy analysis. The fundamental system parameters have been derived for constructing an efficient and accurate exposure system. To realize such a system, certain new technologies have been developed. (1) A high power Si–Kα x‐ray source brings a large x‐ray flux onto the wafer through a silicon nitride mask membrane. (2) The optical mark and gap detection method is connected to a precise alignment mechanism placed on an x–y table designed for wafer stepping. (3) This construction ensures atmospheric environment exposure. (4) The exposure system operation is fully automatic thanks to microprocessors. A 0.5 μm pattern has been accurately replicated, and a ±0.15 μm alignment accuracy has been achieved using this exposure system.
X‐ray lithography for sub‐100‐nm‐channel‐length transistors using masks fabricated with conventional photolithography, anisotropic etching, and oblique shadowing3(1985); http://dx.doi.org/10.1116/1.582943View Description Hide Description
In order to fabricate submicrometer‐channel‐length MOSFET's using x‐ray lithography, a novel mask fabrication technique was developed. The mask enabled PMMA lines with widths of 100, 160, 250, 270, and 5000 nm to be exposed simultaneously on the same substrate. The mask consists of a polyimide membrane with narrow absorber lines on the front side (facing the substrate) and coarse absorber patterns on the back side (facing the x‐ray source). The narrow absorber lines are formed by oblique shadowing of gold onto sidewalls of rectangular mesas molded on the polyimide from wells anisotropicallyetched in (110)Si. As a result, exposed lines are straight, controlled in width to ∼10%, and have very small edge ripple. Source and drain pattern areas are formed in gold on the back surface of the membrane by conventional photolithography and ion beametching. PMMA lines exposed with the x‐ray mask were used for channel masking during source–drain ion implantation. Operating MOSFET's were fabricated with minimum channel length estimated to be 75 nm.
Plasma‐processed positive and negative resist behavior of obliquely deposited amorphous P–Se films3(1985); http://dx.doi.org/10.1116/1.582944View Description Hide Description
Thin films of amorphous phosphorus decaselenide (P4Se1 0) have been explored for lithographic applications. Depending on the substrate temperature during plasma etching in CF4 gas, either positive or negative resist behavior is observed. The effects of substrate temperature and exposure time on etching characteristics are discussed. Contrast values of 2.5 and 2.9 for positive and negative resist, respectively, have been obtained.
Application of polymer–bisazide composite system negative resists to electron beam lithography3(1985); http://dx.doi.org/10.1116/1.582945View Description Hide Description
Pattern profiles achieved in composite resists of a polymer and a bisazide compound tend to be rectangular, in spite of electron backscattering from substrates. This phenomenon is explained by the bisazide concentration dependence of the composite resist sensitivity to electron beam and the depth profile of bisazide distribution in a polymer film. An optimum amount of bisazide compound, needed to obtain the highest sensitization, exists. It does not depend on molecular weight, but on the kind of polymers used. An excessive amount of bisazide compound incorporation is found to reduce sensitivity. Bisazide compounds distribute to a great extent in the vicinity of a substrate during a prebaking process. These factors reduce the backscattering problem taking place in electron beam lithography to obtain resist patterns with vertical walls.
Flow visualization in low pressure chambers using laser‐induced biacetyl phosphorescence3(1985); http://dx.doi.org/10.1116/1.582946View Description Hide Description
Two optical probes, utilizing laser‐induced biacetyl phosphorescence recorded by an image‐intensifiedsolid state camera, have been developed and used to characterize velocity fields in a low pressure chamber (similar to a plasma‐enhanced CVD reactor). The method has been demonstrated at pressures as low as 0.5 Torr; measurements at lower pressures should be possible. Reactor flow velocity fields influence gas residence times and deposition rates. The method discussed in this paper can be used to investigate these effects.
Some etch properties of doped and undoped silicon oxide films formed by atmospheric pressure and plasma‐activated chemical vapor deposition3(1985); http://dx.doi.org/10.1116/1.582947View Description Hide Description
Silicon oxidefilms formed using two different chemical vapor deposition (CVD) techniques have been characterized by selected etchingproperties, both in dry (plasma) etching and in wet (chemical) etching. Dry etching was accomplished using CHF3+O2 in a reactive ion etching (RIE) system. The films investigated are undoped silicon oxide, phosphorus‐doped silicon oxide at 4 mol % P2O5, and phosphorus‐doped silicon oxide at 9.5 mol % P2O5. The effects of densification, i.e., thermal treatments carried out at 900 °C in an inert atmosphere (N2) and at 920 °C in steam, are discussed in detail. A decrease in etch rate is observed and considered to be an indication of the structural changes that lead to less porous and more stable films.
Oxide formation on GaAs exposed to CF4+O2 plasma3(1985); http://dx.doi.org/10.1116/1.582948View Description Hide Description
The effect of CF4+O2 plasma on GaAs is studied using Auger electron spectroscopy and x‐ray photoelectron spectroscopy.AESsputtering profiles and the chemical shift in the Ga 3d photoelectron peak indicate the Ga2O3‐rich oxide formation on the GaAssurface through exposure to CF4+O2 plasma. The increase in the Schottky diode ideality factor n and the decrease in GaAs MESFET transconductance g m as functions of plasma exposure time are explained with this oxide formation. The GaAs MESFET I–Vcharacteristics are improved by removing the Ga2O3‐rich oxide layer with chemical treatment.
Mass spectrometric studies of plasma etching of silicon nitride3(1985); http://dx.doi.org/10.1116/1.582949View Description Hide Description
Basic chemical processes in a CF4/O2plasma during etching of silicon nitride have been investigated using mass spectrometry. Samples of the discharge are extracted through a quartz capillary and the resulting variations in species abundance at a nitride/oxide interface yield information on etch reaction pathways. Mechanisms of F and CF2 attack and SiF4, N2, NO, and CN product formation are proposed. The experimental data are suitable for application in mass spectrometric endpoint detection.
Reactive ion etching of SiO2 with vertical sidewalls and its application to ion‐implantation masks for bubble devices3(1985); http://dx.doi.org/10.1116/1.582950View Description Hide Description
Silicon dioxide patterns having vertical sidewalls have been obtained without pattern width loss by reactive ion etching in CF4. The polymerization effect, caused by fluorine deficiency in the plasma, is found to influence not only the morphology of the etched resist surface but also the SiO2 etching profiles. The polymerization is greatly reduced by depressing the temperature rise during etching. A temperature‐controlled cathode and a heat sink material are used for this purpose. The polymerization is further reduced by increasing flow rate, by increasing pressure and by decreasing power density. The SiO2 patterns having vertical sidewalls are obtained under the no‐polymerization etching conditions. These SiO2 patterns have been successfully applied to ion‐implantation masks for 16 Mbit bubble devices.
A low temperature process for vapor etching of indium phosphide3(1985); http://dx.doi.org/10.1116/1.582951View Description Hide Description
The vapor of the organic halide, ethylene dibromide (EDB), was used for InP i n s i t uetching. The etching process was carried out in a low pressure (≂50 Pa) flowing system. A two‐zone resistance‐heated furnace was employed such that EDB molecules were decomposed to yield a more reactive form of bromine in the high temperature zone, whereas the substrate was placed in the low temperature zone to avoid thermal degradation of the InP. Surfaces as specular as before etching were obtained by using this technique. The process was studied for substrate temperatures between 120 and 540 °C and for hot zone temperatures between 600 and 900 °C. The etch rate varied between 0.002 and 1.0 μm/min depending on the furnace temperature and the EDB flow rate.
Photoluminescence characterization of molecular beam epitaxy grown In x Ga1−x As(0.51<x<0.57)3(1985); http://dx.doi.org/10.1116/1.582952View Description Hide Description
The results of a low temperature 5.5 K photoluminescence study on undoped n‐type In x Ga1−x As(0.51<x<0.57) filmsgrown on InP substrates by molecular beam epitaxy are presented. The photoluminescence spectrum near the band edge is dominated by a single peak of halfwidth 3–8 meV. This peak is attributed to a bound exciton transition for n<5×101 5 cm− 3 and to a donor‐to‐valence band transition for n>5×101 5 cm− 3. From the peak energy of this transition the band gap is determined as a function of x and compared with earlier studies. A weak emission band below the main peak, observed frequently in the films, is associated with a donor‐to‐acceptor transition and the acceptor is suggested to be carbon. The spatial variation in composition as determined by the variation in the photoluminescence bands is found to be Δx∼0.003 parallel to the growth direction and much less in the plane of the film. In this respect the molecular beam epitaxygrownfilms exhibit much less compositional variation compared to liquid phase epitaxy and vapor phase epitaxy films.
Homo‐ and heteroepitaxial growth of high quality ZnSe by molecular beam epitaxy3(1985); http://dx.doi.org/10.1116/1.582953View Description Hide Description
ZnSe layers (1–2 μm thick) have been grown by molecular beam epitaxy on both (111) and (100) oriented ZnSe substrates. The layers were grown on atomically clean, single‐crystalline ZnSesurfaces prepared i n s i t u by an Argon‐ion sputtering/annealing process. HomoepitaxialZnSe layers grown on (111) ZnSe exhibited microtwinning as indicated by reflection high energy electron diffraction(RHEED) observations together with zero detectable excitonic photoluminescence emission. In contrast, layers grown on (100) ZnSe had smooth surfaces, indicated by a streaky RHEEDpattern, and exhibited strong 4.2 K excitonic emission at 2.7980 eV (I 0 α). This can be contrasted with the Ga‐bound excitonic emission at 2.7972 eV (I Ga 20) observed from layers grown on (100) GaAs substrates.
A simple semiquantitative model for classifying metal–compound semiconductor interface reactivity3(1985); http://dx.doi.org/10.1116/1.582954View Description Hide Description
A scheme for classifying the interfacial reactivity of metal–compound semiconductor systems is presented. The scheme uses a simple bulk model to calculate a ''heat of reaction,'' which includes the effects of metal–semiconductor anion compound formation and metal–semiconductor cation alloying. The scheme is applied to the layered semiconductors GaSe and MoS2, III–V semiconductorInP, and the II–VI semiconductorCdTe, for a wide range of metals. The resulting classification compares favorably with published experimental data on ultrahigh vacuum cleaved surfaces. For the majority of these interfaces, the reactivity classification is the same as that obtained by considering only metal–semiconductor anion compound formation. However, for the combinations Au–InP, Ni–CdTe, Ni–GaSe, Cu–CdTe, and Cu–GaSe, it is only by including alloying that the combination is classified as reactive, in agreement with experimental data.
Al/SiO2/WSi2/Si double‐level metallization for charge‐coupled‐device imagers3(1985); http://dx.doi.org/10.1116/1.582955View Description Hide Description
Replacing aluminum with tungsten silicide in Al/SiO2/Al/Si double‐metal systems reduced hillock formation and allowed the reflow of glass for better second‐metal topography. The high contact resistance of tungsten silicide to n +‐Si and poly‐Si was reduced by implanting the tungsten silicide with phosphorus or arsenic. Charge‐coupled‐device (CCD) imagers were fabricated by this technique.
Angular dependence of etching yield of single crystal Si in Cl2 reactive ion beam etching3(1985); http://dx.doi.org/10.1116/1.582956View Description Hide Description
Reactive ion beametching yield for lightly doped Si(100) using Cl2 gas in the ion source was measured as a function of current density and angle of incidence. Experiments were performed such that the ion flux delivered to the sample was held constant at each angle. At normal ion incidence etching yield decreased linearly with current density. With constant ion flux to the sample surface the yield remained constant from 0° to 70° angle of incidence.
Application of the self‐aligned titanium silicide process to very large‐scale integrated n‐metal‐oxide‐semiconductor and complementary metal‐oxide‐semiconductor technologies3(1985); http://dx.doi.org/10.1116/1.582957View Description Hide Description
This paper reviews recent progress towards integrating the self‐aligned titanium silicide process into VLSI NMOS and CMOS technologies, to simultaneously reduce the gate and junction sheet resistances to below 1 Ω/sq. In addition to reviewing the base line self‐aligned TiSi2 process, the key issues that must be addressed if the process is going to be successfully integrated into a VLSI process flow, without having adverse effects on device parameters, will be discussed. Such issues are how the sheet resistance can be reduced to <1 Ω/sq without bridging between the gate and source/drain regions, the effect of silicide stress on gate oxide integrity, and how both P‐ and N‐type junctions can be silicided without adversely affecting diode or transistor properties. Recent results on the hot electron hardness of silicided devices compared to unsilicided transistors will also be presented. The implementation of the self‐aligned titanium silicide process using rapid thermal processing to simultaneously fabricate transistor gates and junctions with a sheet resistance of 1 Ω/sq will also be described. Using the self‐aligned TiSi2 technology, fully functional VLSI CMOS and NMOS circuits of the 64K static random access memory class of complexity, with 1 μm gates, have been fabricated with yield that is similar to unsilicided parts.
Ion implantation of arsenic in chemical vapor deposition tungsten silicide3(1985); http://dx.doi.org/10.1116/1.582958View Description Hide Description
Impurity profiles in arsenic implantedchemical vapor deposition(CVD)tungsten silicide (WSi x ) have been studied. Arsenic was implanted in WSi2.6 layer deposited on silicon substrates, and impurity profile measurements were performed by Rutherford backscattering spectrometry (RBS) techniques. Observed profiles in the as‐deposited silicide can be fitted well with calculated Gaussian distribution. Carrier concentration profile measurements of silicon substrates indicate that tailing of the profile due to a channeling did not occur. Therefore, a sufficient masking effect has been achieved by this layer for use in a self‐aligned gate implantation process. When annealing was done, the dissolution of excess silicon occurred from the nonstoichiometry silicide. Arsenic ion implanted into the silicide diffused into the silicon substrate. As a result, deeper junctions with a lower surface concentration is formed by furnaceannealing. However, shallow junctions were formed by rapid thermal annealing (RTA).
Influence of dopants and deposition temperatures on the properties of TaSi2/polysilicon films and their thermal oxides3(1985); http://dx.doi.org/10.1116/1.582959View Description Hide Description
Tantalum silicide films were prepared by sputtering from compound targets. The influence of various deposition and process parameters on the TaSi2/poly‐Si filmproperties and on the quality of thermal oxides grown by dry and steam oxidation on top of the polycide was investigated. In particular, the cleaning procedure of the poly‐Si surface prior to TaSi x ‐sputtering was varied and elevated substrate temperatures were adjusted during deposition. Furthermore, As‐ or P‐implantations were inserted at various stages of the process sequence to study the properties of oxidized polycide structures present within actual devices. The polycide films were characterized by measurements of the sheet resistivity as well as by x‐ray microprobe analysis and x‐ray diffraction, while the thermal oxides were investigated by cross‐sectional TEM and breakdown strength measurements. At the elevated substrate temperatures during TaSi x ‐deposition, the sheet resistivity of the as‐deposited and the sinteredfilms decreases and the quality of the thermal oxides increases. At the maximum temperature of 400 °C, best results were obtained for the oxidized polycide structures. The preferential orientation of the TaSi2 crystallites within the polycrystalline layer depends on the process stage of the implantation. These implantations cause an increase of the quality of the thermal oxides on top of the polycides. Best oxides with mean breakdown fields of up to 5 MV/cm—even better than for oxides grown on polysilicon—were obtained by an As implantation process after sintering. Finally, the results were compared with those for TaSi2/poly‐Si films prepared by cosputtering.
Capacitance–voltage characterization of silicide–GaAs Schottky contacts3(1985); http://dx.doi.org/10.1116/1.582960View Description Hide Description
Capacitance–voltage carrier concentration profiling has been used to investigate the high temperature stability of refractorymetal silicide films on GaAs. This technique is more sensitive to silicide–semiconductor interactions than is forward I–V characterization since tenacious surface Fermi level pinning of GaAs can yield stable diode barrier height and ideality factor measurements even for some cases of gross silicide–semiconductor interaction. Using C–V characterization we have found tungsten silicide film compositions that exhibit excellent high temperature stability on GaAs and have suggested failure mechanisms for other less stable film compositions.
Refractory metal silicides for self‐aligned gate modulation doped n +‐(Al,Ga)As/GaAs field‐effect transistor integrated circuits3(1985); http://dx.doi.org/10.1116/1.582961View Description Hide Description
A refractory metal silicide process has been developed for the fabrication of self‐aligned gate (Al,Ga)As/GaAs FET's (MODFET's). Completely planar, self‐aligned gate by ion implantation MODFET's have been fabricated and have demonstrated typical transconductances of 180–200 mS/mm at room temperature and over 300 mS/mm at 77 K. Self‐aligned gate ring oscillator test circuits have demonstrated gate propagation delays as low as 17.6 ps/gate at 2.65 mW/gate at room temperature.