Angstrom Advanced sets the standard in Ellipsometry-bringing the best in ellipsometry technology at the most affordable prices.Angstrom Advanced offers full range of ellipsometers for thin film thickness measurements, optical characterization for refractive index and extinction coefficient analysis (n & k). Angstrom Advanced ellipsometry can be used for many different applications and are used in some of the most prestigious laboratories such as MIT, NASA, UC Berkeley, Yale University, Duke University, NIST and many more.
PHE101M is multi-wavelength ellipsometer. Different wavelengths from UV, VIS or NIR range (up to 5 wavelengths)can be selected. The PHE101M ellipsometer has all of the features which PHE101 has.
The PHE101M is an ideal discrete wavelength ellipsometer for measuring the refractive index and thickness of single and multi-layer films at several wavelengths. It has the widest variable angle (10-90°) which is adjustable in steps of 5°s, with an accuracy of 0.01° (As an option, the angle of incidence can be varied continuously).
The standard wavelength of the PHE101M ellipsometer is HeNe laser at 632.8nm. The wavelength can be selected by a combination of 543nm, 594nm, 612nm, 635nm to 1164nm. Infrared sources at 0.83, 1.31 and 1.52 mm are also available.
A second laser is used for the alignment. It is more advanced than traditional quadrant coordinate method. It makes the alignment more convenient and accurate. It can eliminate the operation's error by the automatic correction.
PHE101 Multi-Wavelength Ellipsometer has a powerful software, acquisition and data interpretation, full material library, complete relations for new materials, bounded model algorithms for simultaneous analysis of multiple models. The software package calculates n, k, and d for substrates, single film and multi-layers. The user can store models and simulation curves that are used for calculation. Data can be entered from the ellipsometer, the keyboard or an external file.
The PHE101M ellipsometry software is prepared for material library with predetermined measurement parameters allowing the operator to select an application and quickly execute measurement. Material library has hundred of materials information, such as semiconductor, dielectric, metal and other materials.