 Thus one can adjust the chemistry and ion bombardment in the deposition by changing the frequency of excitation, or by using a mixture of low- and high-frequency signals in a dual-frequency reactor.Excitation power of tens to hundreds of watts is typical for an electrode with a diameter of 200 to 300 mm.Capacitive plasmas are usually very lightly ionized, resulting in limited dissociation of precursors and low deposition rates.