 Plasma-deposited silicon nitride, formed from silane and ammonia or nitrogen, is also widely used, although it is important to note that it is not possible to deposit a pure nitride in this fashion.Plasma nitrides always contain a large amount of hydrogen, which can be bonded to silicon (Si-H) or nitrogen (Si-NH); this hydrogen has an important influence on IR and UV absorption, stability, mechanical stress, and electrical conductivity.This is often used as a surface and bulk passivating layer for commercial multicrystalline silicon photovoltaic cells.