 They predicted the deposition rate along the substrate diameter for silicon deposition from silane.They also used CFD-ACE+ to model transparent conductive oxide (TCO) thin film deposition with ultrasonic spray chemical vapor deposition (CVD).The University of Louisville and the Oak Ridge National Laboratory used CFD-ACE+ to develop the yttria-stabilized zirconia CVD process for application of thermal barrier coatings for fossil energy systems.