subband and the top of the valence subband are formed in the same semiconductor layer in Type III superlattice, which is similar with Type I superlattice, the band gap of Type III superlattices can be continuously adjusted from semiconductor to zero band gap material and to semimetal with negative band gap. Another class of quasiperiodic superlattices is named after Fibonacci. A Fibonacci superlattice can be viewed as a one-dimensional quasicrystal, where either electron hopping transfer or on-site energy takes two values arranged in a Fibonacci sequence. Semiconductor materials Semiconductor materials, which are used to fabricate the superlattice structures, may be divided by the element groups, IV, III-V and II-VI. While group III-V semiconductors (especially GaAs/AlxGa1−xAs) have been extensively studied, group IV heterostructures such as the SixGe1−x system are much more difficult to realize because of the large lattice mismatch. Nevertheless, the strain modification of the subband structures is interesting in these quantum structures and has attracted much attention. In the GaAs/AlAs system both the difference in lattice constant between GaAs and AlAs and the difference of their thermal expansion coefficient are small. Thus, the remaining strain at room temperature can be minimized after cooling from epitaxial growth temperatures. The first compositional superlattice was realized using the GaAs/AlxGa1−xAs material system. A graphene/boron nitride system forms a semiconductor superlattice once the two crystals are aligned. Its charge carriers move perpendicular to the electric field, with little energy dissipation. h-BN has a hexagonal structure similar to graphene's. The superlattice has broken inversion symmetry. Locally, topological currents are comparable in strength to the applied current, indicating large valley-Hall angles. Production Superlattices can be produced using various techniques, but the most common are molecular-beam epitaxy (MBE) and sputtering. With these methods, layers can be produced with thicknesses of only a few atomic spacings. An example of specifying a superlattice is []20. It describes a bi-layer of 20Å of Iron (Fe) and 30Å of Vanadium (V) repeated 20 times, thus yielding a total thickness of 1000Å or 100 nm. The MBE technology as a means of fabricating semiconductor superlattices is of primary importance. In addition to the MBE technology, metal-organic chemical vapor deposition (MO-CVD) has contributed to the development of superconductor superlattices, which are composed of quaternary III-V compound semiconductors like InGaAsP alloys. Newer techniques include a combination of gas source handling with ultrahigh vacuum (UHV) technologies such as metal-organic molecules as source materials and gas-source