was a Japanese engineer and physicist, specializing in the field of semiconductor technology and Nobel Prize laureate, best known for inventing the bright gallium nitride (GaN) p-n junction blue LED in 1989 and subsequently the high-brightness GaN blue LED as well. For this and other achievements, Akasaki was awarded the Kyoto Prize in Advanced Technology in 2009, and the IEEE Edison Medal in 2011. He was also awarded the 2014 Nobel prize in Physics, together with Hiroshi Amano and Shuji Nakamura, "for the invention of efficient blue light-emitting diodes, which has enabled bright and energy-saving white light sources". In 2021, Akasaki, along with Shuji Nakamura, Nick Holonyak, M. George Craford and Russell D. Dupuis were awarded the Queen Elizabeth Prize for Engineering "for the creation and development of LED lighting, which forms the basis of all solid state lighting technology". Early life and education He was born in Chiran, Kagoshima Prefecture and raised in Kagoshima City. His elder brother is who was an electronic engineering researcher and a Professor Emeritus at Kyushu University. (Their surname "" is also pronounced Akazaki.) Isamu graduated from Kagoshima Prefectural Daini-Kagoshima Middle School (now Kagoshima Prefectural Konan High School) in 1946, from Seventh Higher School Zoshikan (now Kagoshima University) in 1949 and from Department of Chemistry, Faculty of Science, Kyoto University in 1952. During his university years, he visited shrines and temples that local residents rarely visit, walked around the mountains of Shinshu during the summer vacation, enjoyed classes and enjoyed a fulfilling student era. After he became a researcher, he obtained the degree of Doctor of Engineering from Nagoya University in 1964. Research Akasaki started working on GaN-based blue LEDs in the late 1960s. Step by step, he improved the quality of GaN crystals and device structures at Matsushita Research Institute Tokyo, Inc. (MRIT), where he decided to adopt metalorganic vapor phase epitaxy (MOVPE) as the preferred growth method for GaN. In 1981 he started afresh the growth of GaN by MOVPE at Nagoya University, and in 1985 he and his group succeeded in growing high-quality GaN on sapphire substrate by pioneering the low-temperature (LT) buffer layer technology. This high-quality GaN enabled them to discover p-type GaN by doping with magnesium (Mg) and subsequent activation by electron irradiation (1989), to produce the first GaN p-n junction blue/UV LED (1989), and to achieve conductivity control of n-type GaN (1990) and related alloys (1991) by doping