is once again prompts relevant research in this field. DARPA (United States) Since at least 2001 DARPA has invested in a variety of maskless patterning technologies including parallel e-beam arrays, parallel scanning probe arrays, and an innovative e-beam lithography tool to enable low-volume manufacturing process. The technology is codenamed as Gratings of Regular Arrays and Trim Exposures (GRATE) (previously known as Cost Effective Low Volume Nanofabrication). Economics Foundries In 2018 the Dutch and Russia jointly funded (Rusnano) company Mapper Lithography producing multi e-beam maskless lithography MEMS components went bankrupt and was acquired by ASML Holding, a major competitor at the time. The foundry producing devices is located near Moscow, Russia. As of early 2019 it was run by Mapper LLC. The Mapper Lithography originally was created at Delft University of Technology in 2000. References External links 35th European Mask and Lithography Conference (EMLC 2019) Lithography (microfabrication)