until the mid-1980s, the capacitors in DRAM cells were co-planar with the access transistor (they were constructed on the surface of the substrate), thus they were referred to as planar capacitors. The drive to increase both density and, to a lesser extent, performance, required denser designs. This was strongly motivated by economics, a major consideration for DRAM devices, especially commodity DRAMs. The minimization of DRAM cell area can produce a denser device and lower the cost per bit of storage. Starting in the mid-1980s, the capacitor was moved above or below the silicon substrate in order to meet these objectives. DRAM cells featuring capacitors above the substrate are referred to as stacked or folded plate capacitors. Those with capacitors buried beneath the substrate surface are referred to as trench capacitors. In the 2000s, manufacturers were sharply divided by the type of capacitor used in their DRAMs and the relative cost and long-term scalability of both designs have been the subject of extensive debate. The majority of DRAMs, from major manufactures such as Hynix, Micron Technology, Samsung Electronics use the stacked capacitor structure, whereas smaller manufacturers such Nanya Technology use the trench capacitor structure (Jacob, pp. 355–357). The capacitor in the stacked capacitor scheme is constructed above the surface of the substrate. The capacitor is constructed from an oxide-nitride-oxide (ONO) dielectric sandwiched in between two layers of polysilicon plates (the top plate is shared by all DRAM cells in an IC), and its shape can be a rectangle, a cylinder, or some other more complex shape. There are two basic variations of the stacked capacitor, based on its location relative to the bitline—capacitor-over-bitline (COB) and capacitor-under-bitline (CUB). In a former variation, the capacitor is underneath the bitline, which is usually made of metal, and the bitline has a polysilicon contact that extends downwards to connect it to the access transistor's source terminal. In the latter variation, the capacitor is constructed above the bitline, which is almost always made of polysilicon, but is otherwise identical to the COB variation. The advantage the COB variant possesses is the ease of fabricating the contact between the bitline and the access transistor's source as it is physically close to the substrate surface. However, this requires the active area to be laid out at a 45-degree angle when viewed from above, which makes it difficult to ensure that the capacitor contact does not touch the bitline.