ICP plasma discharge temperatures are typically ~5,500 to 6,500 K and are therefore comparable to that reached at the surface (photosphere) of the sun (~4,500 K to ~6,000 K). ICP discharges are of relatively high electron density, on the order of 1015 cm−3. As a result, ICP discharges have wide applications where a high-density plasma (HDP) is needed. ICP-AES, a type of atomic emission spectroscopy. ICP-MS, a type of mass spectrometry. ICP-RIE, a type of reactive-ion etching. Another benefit of ICP discharges is that they are relatively free of contamination, because the electrodes are completely outside the reaction chamber. By contrast, in a capacitively coupled plasma (CCP), the electrodes are often placed inside the reactor and are thus exposed to the plasma and subsequent reactive chemical species. See also Capacitively coupled plasma Induction plasma technology List of plasma physics articles Pulsed inductive thruster References Electrodynamics Spectroscopy Ion source Plasma physics