This application is a Divisional of application Ser. No. 09/292,371 filed Apr. 15, 1999 now U.S. Pat. No. 6,306,694. 
    
    
     BACKGROUND OF THE INVENTION 
     1. Field of the Invention 
     The present invention relates to a semiconductor device, a manufacturing method thereof and a method of forming a resist pattern used therein. More particularly, the present invention relates to a semiconductor device having a conducting material film formed in a trench, a manufacturing method thereof and a method of forming a resist pattern used therein. 
     2. Description of the Background Art 
     In the field of a DRAM (Dynamic Random Access Memory), which is conventionally known as one type of the semiconductor device, efforts have been made to increase capacity and miniaturize the device. Along with these efforts and achievements, to secure a capacity necessary for a capacitor cell, which is an element of a DRAM, within a limited area of a semiconductor substrate, three-dimensional cells such as a trench type cell or a stacked type cell have been developed. Among the stacked capacitor cells, those with vertically long shape such as a cylindrical type cell or a thick film type cell are mainly used. 
     FIGS. 17-19 show partial sectional views of a cylindrical stacked capacitor cell, on which the present invention is based and which is referenced for describing the manufacturing process of a lower electrode of a capacitor. With reference to FIGS. 17-19, the manufacturing process of the capacitor lower electrode of the cylindrical stacked capacitor cell will be described. 
     As shown in FIG. 17, a first interlayer insulation film  115  is formed on a semiconductor substrate (not shown). Openings  116   a  and  116   b  are formed in first interlayer insulation film  115 . Plugs  117   a  and  117   b  are formed respectively in openings  116   a  and  116   b  for electrically connecting the capacitor lower electrode and a conducting region in a main surface of the semiconductor substrate. A second interlayer insulation film  123  is formed on first interlayer insulation film  115 . Trenches  130   a  and  130   b  are formed in second interlayer insulation film  123  in regions above plugs  117   a  and  117   b . Polycrystalline silicon film  119  is formed on second interlayer insulation film  123  as well as in trenches  130   a  and  130   b . An HSG (Hemi Spherical Grained) polycrystalline silicon film  120  having a resist  127  formed thereon is formed on polycrystalline silicon film  119 . Here, HSG polysilicon film means a polysilicon film having roughened surface, and to roughen (roughening) refers to a process of generating hemispherical grains by growing crystal grains. 
     With etch back of resist  127  using Reactive Ion Etching (hereinafter referred to as RIE), portions  127   a  and  127   b  of resist are left in trenches  130   a  and  130   b  as shown in FIG. 18 while resist  127  (see FIG. 17) is removed in other regions. Here, the level difference L 1  between an upper surface of HSG polycrystalline silicon film  120  on second interlayer insulation film  123  and an upper surfaces of resists  127   a  and  127   b  is called recess length. As will be described hereinafter, as portions  127   a  and  127   b  of resist are used as masks for removing polycrystalline silicon film  119  and HSG polycrystalline silicon film  120  on second interlayer insulation film  123 , the recess length L 1  must be controlled with a high precision. If the recess length L 1  is too small and the upper surfaces of resist portions  127   a  and  127   b  are higher than the upper surface of second interlayer insulation film  123 , problems arise. For example, upon etching for removing polycrystalline silicon film  119  and HSG polycrystalline silicon film  120  on the upper surface of second interlayer insulation film  123 , etching residue may be produced. 
     Then using resist portions  127   a  and  127   b  as masks, polycrystalline silicon film  119  and HSG polycrystalline silicon film  120  on the upper surface of second interlayer insulation film  123  are etched and removed. Thus a capacitor lower electrode of polycrystalline silicon film  119   a  and HSG polycrystalline silicon film  120   a  is formed in trench  130   a  and a capacitor lower electrode of polycrystalline silicon film  119   b  and HSG polycrystalline silicon film  120   b  is formed in trench  130   b  as shown in FIG.  19 . 
     Then resist portions  127   a  and  127   b  are removed and a dielectric film, a capacitor upper electrode and so on are formed on the capacitor lower electrode. The cylindrical stacked capacitor cell is thus formed. 
     The process shown in FIGS. 17-19 has a following problem. When the resist is etched back by RIE to leave resist portions  127   a  and  127   b  only in trenches  130   a  and  130   b  as shown in FIG. 18, an oxide film or the like is sometimes partially formed on the surface of HSG polycrystalline silicon film  120  on the upper surface of second interlayer insulation film  123 . The oxide film thus formed through RIE serves as a mask upon etching of polycrystalline silicon film  119  and HSG polycrystalline silicon film  120  for isolating the capacitor lower electrode trench by trench. Therefore polycrystalline silicon film  119  of HSG polycrystalline silicon film  120  is sometimes partially left on the upper surface of second interlayer insulation film  123 . 
     When polycrystalline silicon film  119  or the like is left on the upper surface of second interlayer insulation film  123 , the capacitor lower electrode is not sufficiently isolated, and whereby a problem such as short circuit of the capacitor lower electrode is caused. As a result, operation failure and reliability degradation of the DRAM occur. 
     Alternatively, CMP (Chemical Mechanical Polishing) can be used for removing resist  127  (see FIG. 17) in the region outside trenches  130   a  and  130   b  for leaving resist portions  127   a  and  127   b  in trenches  130   a  and  130   b . In this case, however, slurry used in CMP is left in the area such as an inner area of trenches  130   a  and  130   b , and adversely affects the subsequent process steps. The slurry thus left in trenches  130   a  and  130   b  also causes operation failure and reliability degradation of the semiconductor device such as a DRAM. 
     SUMMARY OF THE INVENTION 
     An object of the present invention is to provide a highly reliable semiconductor device having a conducting material film formed in a trench. 
     Another object of the present invention is to provide a method of manufacturing a highly reliable semiconductor device having a conducting material film formed in a trench. 
     Still another object of the present invention is to provide a method of forming a resist pattern which can be used in the method of manufacturing the highly reliable semiconductor device having the conducting material film formed in the trench. 
     In the method of manufacturing the semiconductor device according to one aspect of the present invention, an underlying film having an upper surface and a trench is formed. A conducting material film is formed on the upper surface and in the trench. A photo resist film is formed on the conducting material film which is located on the upper surface of the underlying film and in the trench. The photo resist film is left in the trench whereas in other region the photo resist film is developed and removed. With the photo resist film left in the trench used as a mask, the conducting material film on the upper surface of the underlying film is etched and removed. 
     Thus, an etching technique such as RIE which is used in a conventional manufacturing process is not employed in the step of leaving the photo resist film in the trench and removing the photo resist film in the region outside the trench. Therefore the formation of oxide film on the conducting material film caused by etching can be prevented. As a result, in the step of removing the conducting material film on the upper surface of the underlying film, the conducting material film is prevented from being partially left on the upper surface of the underlying film because of the existence of the oxide film. Thus, failure such as short circuit caused by the residual conducting material film can be avoided, whereby a highly reliable semiconductor device can be obtained. 
     In addition, as the development is utilized in the step of leaving the photo resist film in the trench, the thickness of the photo resist film to be removed and therefore the level of the upper surface of the photo resist film left in the trench can be controlled with high precision by controlling the time of development. 
     In the method of manufacturing the semiconductor device in accordance with one aspect of the present invention, the photo resist film in the region outside the trench may be exposed before the development. 
     Then the thickness of the exposed photo resist film, which is to be removed in the step of removing the photoresist film outside the trench, can be controlled by the control of exposure energy when a positive photo resist film is used. Therefore, the level of the upper surface of the photo resist film left in the trench can be controlled more surely. 
     In the method of manufacturing the semiconductor device in accordance with one aspect of the present invention, the photo resist film in the region outside the trench may be completely exposed whereas the photo resist film to be left in the trench may not be exposed in the step of exposing the photo resist film. 
     As the photo resist film in the trench is not exposed when the positive photo resist film is used, the photo resist film can surely be left in the trench after the development. 
     In the method of manufacturing the semiconductor device in accordance with one aspect of the present invention, light used for the exposure may be directed obliquely for irradiation to the upper surface of the underlying film in the step of exposing the photo resist film. 
     Thus the light is prevented from reaching the bottom portion of the trench, because the light for exposure is not in a direction perpendicular to the extension of the upper surface of the underlying film. Therefore the exposure of the photo resist film at the bottom portion of the trench can surely be prevented. As a result, the photo resist film can surely be left in the trench. 
     In the method of manufacturing the semiconductor device in accordance with one aspect of the present invention, an angle of incidence of the light used for exposure with respect to the upper surface of the underlying film may be adjusted so that the light does not reach the photo resist film to be left in the trench in the step of exposing the photo resist film. 
     Thus the exposure of the photo resist film to be left in the trench can even more surely be prevented and the photo resist film can surely be left in the trench. In addition, the location in the trench where the light reaches can be adjusted by adjusting the angle of incidence of the light used for exposure with respect to the upper surface of the underlying film. As a result, the level of the upper surface of the photo resist film left in the trench can be controlled with high precision. 
     In the method of manufacturing the semiconductor device in accordance with one aspect of the present invention, the step of forming the underlying film may include the steps of: forming an underlying film with a planar upper surface; forming a resist pattern for forming a trench on the upper surface using a photo resist film for pattern formation; and forming the trench by removing the underlying film using the resist pattern as a mask. The photo resist film may be less sensitive to the light than the photo resist film for pattern formation. 
     Thus, even when the exposure energy upon photo resist film exposure varies, the fluctuation of the thickness of the exposed portion of the photo resist film can be made smaller than when the photo resist film for pattern formation is used. As a result, the fluctuation of the level of the upper surface of the photo resist film left in the trench can be made smaller than in a conventional art. 
     In the method of manufacturing the semiconductor device in accordance with one aspect of the present invention, the step of forming the photo resist film may include a step of forming the photo resist film such that the non-exposed portion with the thickness of the photo resist film to be left in the trench is left even when the exposure energy is increased in the step of exposing the photo resist film. 
     Thus the delicate control of the exposure energy in the step of exposing the photo resist film is not necessary for adjusting the thickness of the exposed portion of the photo resist film and for leaving the non-exposed portion of the photo resist film with the necessary thickness in the trench. Therefore, even when the exposure energy varies, and even if the light with the exposure energy above a predetermined value is directed to the photo resist film, the non-exposed portion with a predetermined thickness can be formed and whereby the photo resist film with the predetermined thickness can surely be left in the trench. 
     In addition, as the thickness of the exposed portion can be determined by the chemical composition of the photo resist film, the thickness of the non-exposed portion of the photo resist film can be controlled with higher precision than when the thickness of the exposed portion is controlled by adjusting the exposure energy. As a result, more precise control of the level of the upper surface of the photo resist film left in the trench is allowed. 
     The method of manufacturing the semiconductor device in accordance with one aspect of the present invention may further include the step of forming under the photo resist film, a light absorption film absorbing the light used in the step of exposing the photo resist film. 
     Thus the light is prevented from reaching inside the underlying film, because of the existence of the light absorption film. Therefore, the exposure of the side surface and so on of the photo resist film in the trench, caused by the entrance and scattering of the light used in the step of exposing the photo resist film, in the underlying film under the photo resist film, can be prevented. As a result, the photo resist film can surely be left in the trench. 
     In the method of manufacturing the semiconductor device in accordance with another aspect of the present invention, an underlying film having an upper surface and a trench is formed. A conducting material film is formed on the upper surface and in the trench. A photo resist film having an upper surface is formed on the conducting material film in the trench. The level of the upper surface of the photo resist film is made lower than the level of the upper surface of the underlying film through curing of the photo resist film. The conducting material film on the upper surface of the underlying film is etched and removed with the use of cured photo resist film as a mask. 
     Here, the curing is a treatment for hardening and shrinking the photo resist film by directing an ultra violet ray (Deep UV) or conducting a heat treatment on the photo resist film. At curing time longer than a predetermined period, volumetric shrinkage of the photo resist film shows a certain threshold value. 
     Because of this certain threshold value of volumetric shrinkage of the photo resist film at the curing time longer than a predetermined amount, with the adjustment of the thickness of the photo resist film prior to the curing, the height of the upper surface of the photo resist film after the curing can be correctly controlled. 
     In addition, the formation of the oxide film on the conducting material film can be prevented because technique such as RIE is not employed in the step of forming the upper surface of the photo resist film at a level lower than the upper surface of the underlying film. Thus in the step of removing the conducting material film located on the upper surface of the underlying film, a portion of the conducting material film is prevented from being left on the upper surface of the underlying film, which is caused by the existence of the oxide film. As a result, failure such as a short circuit which is attributable to the residual conducting material film can be prevented, and whereby a highly reliable semiconductor device can be obtained. 
     In a method of forming a resist pattern in accordance with still another aspect of the present invention, the resist pattern is formed on an underlying film having an upper surface and a lower upper surface lower than the upper surface and adjacent to the upper surface with a step side wall therebetween. In this method, a photo resist film is formed on the upper surface, the step side wall, and the lower upper surface. The photo resist film formed in a region other than the bottom portion of the step side wall is exposed by the light incident obliquely on the upper surface. A non-exposed portion of the photo resist film is left at the bottom portion of the step side wall and the exposed portion of the photo resist film is removed by development. 
     With the use of the light directed obliquely to the upper surface for the exposure of the photo resist film, the exposure of the photo resist film at the bottom portion of the step side wall can surely be prevented. Thus, the non-exposed portion of the photo resist film can surely be left at the bottom portion of the step side wall. 
     In addition, the amount of the photo resist film left at the bottom portion of the step side wall can be controlled through the adjustment of the angle of incidence of the light used for exposure with respect to the upper surface. 
     A semiconductor device in accordance with still another aspect of the present invention includes an underlying film having a trench, a conducting material film formed in the trench, and, a light absorption film formed on the conducting material film, for absorbing the light used in photolithography for forming the conducting material film. 
     Thus, in the step of forming the conducting material film in the trench, as the light used in the exposure/development is absorbed by the light absorption film, even when the photo resist film is formed in the trench and on the underlying film outside the trench, and the photo resist film outside the trench is removed by the exposure/development, the light is prevented from reaching the underlying film and the conducting material film. Therefore, the light is not scattered in the underlying film and the conducting material film, and the exposure of the side surface and the bottom surface of the photo resist film in the trench can be prevented. As a result, the photo resist film can surely be left in the trench. Thus the failure caused by the partial absence of the photo resist film in the trench, such as the removal of the conducting material film which is to be left in the trench can be prevented in the step of forming the conducting material film in the trench. 
     In the semiconductor device in accordance with the still another aspect of the present invention, the conducting material film may be a capacitor lower electrode, and the device may further include a dielectric film formed on the capacitor lower electrode and a capacitor upper electrode formed on the dielectric film. 
     In the semiconductor device in accordance with the still another aspect of the present invention, the light absorption film may be a silicon nitrided oxide film. 
     The foregoing and other objects, features, aspects and advantages of the present invention will become more apparent from the following detailed description of the present invention when taken in conjunction with the accompanying drawings. 
    
    
     BRIEF DESCRIPTION OF THE DRAWINGS 
     FIG. 1 is a sectional view showing a first example of the semiconductor device in accordance with the present invention. 
     FIGS. 2-6 are partial sectional views showing first to fifth steps of the manufacturing process of the semiconductor device shown in FIG.  1 . 
     FIG. 7 is a graph showing the relation between exposure energy and thickness of a resist film with respect to a resist used in the manufacturing process of the semiconductor device shown in FIG. 1 and a resist used in an ordinary photolithography. 
     FIG. 8 is a graph showing the relation between curing time and thickness of a resist used in a modification variation of the first example of the manufacturing process of the semiconductor device in accordance with the present invention. 
     FIG. 9 is a graph showing the relation between exposure energy and thickness of a resist with respect to a resist used in a third example of the manufacturing process of the semiconductor device in accordance with the present invention and a resist used in an ordinary photolithography. 
     FIG. 10 is a sectional view showing a fourth example of the semiconductor device according to the present invention. 
     FIGS. 11-14 are partial sectional views showing first to fourth steps of the manufacturing process of the semiconductor device shown in FIG.  10 . 
     FIG. 15 is a partial sectional view referenced for describing a fifth example of the manufacturing process of the semiconductor device in accordance with the present invention. 
     FIG. 16 is a partial sectional view referenced for describing a variation of the fifth example of the manufacturing process of the semiconductor device in accordance with the present invention. 
     FIGS. 17-19 are partial sectional views showing first to third steps of a manufacturing process of a semiconductor device on which the present invention is based. 
    
    
     DESCRIPTION OF THE PREFERRED EMBODIMENTS 
     The preferred embodiments of the present invention will be described with reference to the drawings. 
     First Example 
     With reference to FIG. 1, a semiconductor device includes a field effect transistor and a capacitor formed on a semiconductor substrate  1 . In a main surface of semiconductor substrate  1 , a trench isolation oxide film  2  is formed. Gate insulation films  3   a - 3   c  are formed on the main surface of semiconductor substrate  1  in an active region isolated by trench isolation oxide film  2  and on trench isolation oxide film  2 . Polycrystalline silicon films  5   a - 5   c  are formed on gate insulation films  3   a - 3   c . Refractory metal silicide films  6   a - 6   c  are formed on polycrystalline silicon film  5   a - 5   c . Gate electrodes  7   a - 7   c  are formed of polycrystalline silicon films  5   a - 5   ac  and refractory metal silicide films  6   a - 6   c . Source/drain regions  4   a - 4   c  of the field effect transistor are formed in the main surface of semiconductor substrate  1  in the region between gate electrodes  7   a - 7   c . Insulation films  8   a - 8   c  are formed on gate electrodes  7   a - 7   c  and gate insulation films  3   a - 3   c . A first interlayer insulation film  13  is formed on insulation films  8   a - 8   c.    
     An opening  9  is formed in first interlayer insulation film  13  in the region above source/drain region  4   b . A polycrystalline silicon film  10  is formed on an upper surface of first interlayer insulation film  13  and in opening  9 . A refractory metal silicide film  11  is formed on polycrystalline silicon film  10 . An interconnection  12  includes polycrystalline silicon film  10  and refractory metal silicide film  11 . An insulation film  14  is formed on interconnection  12 . A second interlayer insulation film  15  is formed on first interlayer insulation film  13  and insulation film  14 . 
     In the region above source/drain regions  4   a  and  4   c  in the main surface of semiconductor substrate  1 , openings  16   a  and  16   b  are formed with a part of first and second interlayer insulation films  13  and  15  removed. Plugs  17   a  and  17   b  of a conducting material are formed in openings  16   a  and  16   b.    
     A third interlayer insulation film  23  is formed on second interlayer insulation film  15 . Third interlayer insulation film  23  includes trenches  30   a  and  30   b  in regions above plugs  17   a  and  17   b . Polycrystalline silicon films  19   a  and  19   b  are formed in trenches  30   a  and  30   b . HSG polycrystalline silicon films  20   a  and  20   b  are formed on polycrystalline silicon films  19   a  and  19   b . Capacitor lower electrodes  31   a  and  31   b  include polycrystalline silicon films  19   a  and  19   b  and HSG polycrystalline silicon films  20   a  and  20   b . A dielectric film  21  is formed on HSG polycrystalline silicon films  20   a  and  20   b  and on the upper surface of third interlayer insulation film  23 . A capacitor upper electrode  22  is formed on dielectric film  21 . A fourth interlayer insulation film  18  is formed on upper electrode  22 . 
     TiN films  24   a - 24   c  are formed at a predetermined interval on the upper surface of fourth interlayer insulation film  18 . Aluminum interconnections  25   a - 25   c  are formed on TiN films  24   a - 24   c . TiN films  24   d - 24   f  are formed on aluminum interconnections  25   a - 25   c . A fifth interlayer insulation film  26  is formed on TiN films  24   d - 24   f  and on fourth interlayer insulation film  18 . 
     Next with reference to FIGS. 2-6, the manufacturing process of the semiconductor device will be described. 
     As is shown in FIG. 2, trenches  30   a  and  30   b  are formed in third interlayer insulation film  23  in regions above plugs  17   a  and  17   b . A polycrystalline silicon film  19  which is to be a capacitor lower electrode is formed in trenches  30   a  and  30   b  and on the upper surface of third interlayer insulation film  23 . A HSG polycrystalline silicon film  20  is formed on polycrystalline silicon film  19 . Here, interconnection  12  (See FIG.  1 ), field effect transistor and so on located below third interlayer insulation film  23  are formed according to the same manufacturing process as a conventional art. 
     With reference to FIG. 3, a photo resist film  27  is formed on HSG polycrystalline silicon film  20 . 
     Then as shown in FIG. 4, photo resist film  27  is exposed by a light  28  directed thereon. Here, photoresist film  27  is a positive photo resist film. 
     Then by the development of photo resist film  27 , portions  27   a  and  27   b  of the photo resist film are left in trenches  30   a  and  30   b  as shown in FIG. 5 while a portion of photo resist film  27  outside trenches  30   a  and  30   b  such as on the upper surface of a third interlayer insulation film  23  is removed (see FIG.  4 ). Here, recess Length L 1  and thickness L 2  of portions  27   a  and  27   b  of the photo resist film must be controlled with high precision. When recess length L 1  is much smaller than a predetermined amount, sometimes polycrystalline silicon film  19  cannot completely be removed from the upper surface of third interlayer insulation film  23  at the removal of polycrystalline silicon film  19  and HSG polycrystalline silicon film  20  on the upper surface of third interlayer insulation film  23 . When polycrystalline silicon film  19 , for example, is left on the upper surface of third interlayer insulation film  23 , failure such as short circuit between capacitor lower electrodes  31   a  and  31   b  occurs, causing the operation failure of the semiconductor device. On the other hand when recess length L 1  is much too large, capacitor lower electrodes  31   a  and  31   b  become small, and predetermined capacity of a capacitor cannot be secured. 
     Therefore, in the manufacturing process of the semiconductor device in accordance with the present invention, a resist has a different characteristic from a resist used for forming ordinary trenches  30   a  and  30   b  (see FIG. 5) as shown in FIG.  7 . 
     With reference to FIG. 7, with respect to a resist used in an ordinary photolithography, the thickness of the resist is required to change significantly along with the change in exposure energy. In other words, θ 1  must be as large as possible and normally, tan θ 1 =approximately 4.7. On the other hand, the change (magnitude of θ 2 ) in thickness of the resist which is used for forming capacitor lower electrodes  31   a  and  31   b  (see FIG. 1) in accordance with the first example of the present invention along with the change in exposure energy is smaller than that of the ordinary resist. Here, tan θ 2 =approximately 2. 
     By using a resist whose thickness change at the exposure energy change is smaller than that of the ordinary resist, the fluctuation of the film thickness of an exposed portion of the photo resist film  27  (FIG. 4) can be made smaller than the case where the ordinary resist is used, even when the exposure energy of the light used for the exposure fluctuates. As a result the fluctuation of recess length L 1  can be made small(see FIG.  5 ). 
     Here, the exposure and development are used in the step of leaving portions  27   a  and  72   b  of the photo resist film in trenches  30   a  and  30   b . Thus generation of an oxide film possibly caused in the process of conventionally used RIE can be prevented. Therefore in the step of etching polycrystalline silicon film  19  and HSG polycrystalline silicon film  20  on third interlayer insulation film  23 , portions of polycrystalline silicon film  19  and HSG polycrystalline silicon film  20  are prevented from being left on upper surface of third interlayer insulation film  23 , which has been usually experienced because of the existence of oxide film. As a result, the failure caused by the residual polycrystalline silicon film  19 , such as short circuit of capacitor lower electrodes  31   a  and  31   b  is prevented, and whereby a highly reliable semiconductor device can be obtained. 
     In addition, as the recess length L 1  is controllable by changing the exposure energy of light  28  (see FIG. 4) used for the exposure, the recess length L 1  (and the thickness L 2  of left portions  27   a  and  27   b  of photo resist film) can be controlled with high precision. 
     After the step shown in FIG. 5, polycrystalline silicon film  19  and HSG polycrystalline silicon film  20  on the upper surface of third interlayer insulation film  23  are etched with photo resist films  27   a  and  27   b  used as masks. Thus the structure shown in FIG. 6 is obtained. 
     Subsequently, with the removal of photo resist films  27   a  and  27   b  and the formation of dielectric film  21  (see FIG.  1 ), upper electrode  22  (see FIG. 1) and so on, the semiconductor device shown in FIG. 1 can be obtained. 
     Though herein the manufacturing process in accordance with the first example of the present invention is used for forming capacitor lower electrodes  31   a  and  31   b , the process can be used for forming other structure of a semiconductor device such as a demascene interconnection with the same advantage. Though in this example, polycrystalline silicon film  19  and HSG polycrystalline silicon film  20  are formed under the photo resist film (see FIG.  3 ), a conducting material film other than a polycrystalline silicon film, such as a film including at least one selected from the group consisting of silver, aluminum, copper or an alloy thereof, or molybdenum, nickel, palladium, platinum, rhodium, tantalum, titanium and tungsten, or silicide and nitride thereof. 
     In the first example of the present invention, the exposure/development is used for leaving portions  27   a  and  27   b  of photo resist film in trenches  30   a  and  30   b . Curing (irradiation of ultra violet rays and heat treatment) can also be used instead of the exposure/development. With reference to FIG. 8, the photo resist film shrinks upon being cured. The shrinkage of the resist proceeds and the thickness decreases along with the curing. When the curing time exceeds a certain amount of time, the shrinkage of the resist stops at a certain value. Therefore, with the initial thickness of photo resist film  27  being set from the thickness L 2  (see FIG. 5) of photo resist films  27   a  and  27   b  left in trenches  30   a  and  30   b  and the amount of shrinkage L 3  of the photo resist film, a predetermined recess length L 1  can be achieved by curing. In addition, as the fluctuation of shrinkage of the photo resist film at the curing is smaller than the fluctuation of recess length in a conventional RIE, for example, a desired recess length L 1  can be obtained with higher precision. 
     Second Example 
     The second example of the manufacturing process of the semiconductor device according to the present invention essentially includes the same steps as the first example of the present invention shown in FIGS. 2-6. In the second example, however, a resist film without photosensitive agent, such as a resist consisting of novolac resin alone, is used in the place of a positive photo resist film. A negative photo resist film may also be used. By performing the development without the exposure and controlling the time for development, the resist films  27   a and  27   b  are left in trenches  30   a  and  30   b  (see FIG. 5) and the recess length L 1  is controlled. 
     Unlike the conventional art, as RIE is not performed in the step of leaving resist films  27   a  and  27   b  in trenches  30   a  and  30   b , the same advantage as in the first example of the present invention can be obtained. 
     In addition, as the recess length L 1  is controlled by adjusting the time of development and not by controlling the exposure energy, the fluctuation of the exposure energy requires no consideration, whereby the control of recess length L 1  with a higher precision is allowed. 
     Third Example 
     The third example of the manufacturing process of the semiconductor device in accordance with the present invention essentially includes the same steps as the manufacturing process of the semiconductor device in accordance with the first example of the present invention shown in FIGS. 2-6. In a photo resist film used in the third example, the resist film of thickness L 4  is left even when the exposure energy exceeds a certain value, as shown in FIG.  9 . 
     With reference to FIG. 9, in a resist employed in an ordinary photo lithography, the thickness of the left resist attains approximately 0 along with the increase in the exposure energy. In the third example of the present invention, however, photo resist films  27   a  and  27   b  that are used for forming capacitor lower electrodes  31   a  and  31   b  (see FIG. 6) have a characteristic wherein a photo resist film of a certain thickness L 4  is left regardless of the increase in the exposure energy, as shown in FIG.  9 . Therefore, by adjusting the composition of photo resist film  27  (see FIG.  3 ), such that the thickness L 4  of the left photo resist film at the large exposure energy matches the thickness L 2  of photo resist films  27   a and  27   b  (see FIG. 5) left in trenches  30   a  and  30   b , photo resist films  27   a  and  27   b  with a stable thickness can be obtained regardless of the fluctuation of the exposure energy, which occurs when the exposure energy exceeds a certain amount, of the light used for the exposure. This enables the highly precise control of the recess length L 1 . 
     In addition, by adjusting the chemical composition of photo resist film  27 , the thickness L 4  of the photo resist films  27   a and  27   b  which is left even at the large exposure energy can be controlled. Thus, the adjustment of chemical composition of photo resist film  27  allows the control of thickness L 2  of photo resist films  27   a  and  27   b  left in trenches  30   a  and  30   b , and whereby the control of recess length L 1  is allowed. 
     Here, as to the composition of photo resist film  27 , compound of novolac resin and chemical substances as a photosensitive agent including photosensitive group such as hydroxybenzophenon or 1,2-naphthoquinonediazidosulfonyl (1,2-naphthoquinone diazido sulfonyl) group can be used. 
     Fourth Example 
     Referring to FIG. 10, the semiconductor device is essentially provided with the same structure as the first example shown in FIG.  1 . In the semiconductor device shown in FIG. 10, however, light absorption films  29   a  and  29   b  are formed on HSG polycrystalline silicon films  20   a  and  20   b , for absorbing the light used for the exposure at the formation of capacitor lower electrodes  31   a  and  31   b.    
     At the step of exposure for forming photo resist films  27   a  and  27   b  (see FIG. 14) used as masks in trenches  30   a  and  30   b  in the manufacturing process described hereinafter, the light used for the exposure is absorbed by light absorption films  29   a  and  29   b . Thus the light is prevented from reaching insulation film  14 , interconnection  12  and so on below light absorption films  29   a  and  29   b . Thus the light used for exposure is not reflected irregularly by the lower structure such as interconnection  12 , and the side surfaces or the bottom surfaces of photo resist films  27   a  and  27   b  in trenches  30   a  and  30   b  are not irradiated with the light. Therefore, partial exposure and removal of photo resist films  27   a  and  27   b  which should be left in trenches  30   a  and  30   b  can be prevented. Thus photo resist films  27   a  and  27   b  can surely be left in trenches  30   a  and  30   b.    
     With reference to FIGS. 11-14, the manufacturing process of the semiconductor device will be described. FIGS. 11-14 correspond to FIGS. 2-5 showing the manufacturing process of the semiconductor device in accordance with the first example of the present invention. 
     First, after the same step as the manufacturing process of the semiconductor device shown in FIG. 2, light absorption film  29  of silicon nitrided oxide film is formed on HSG polycrystalline silicon film  20 . Thus the structure shown in FIG. 11 is obtained. 
     Next as shown in FIG. 12, photo resist film  27  is formed on light absorption film  29 . Photo resist film  27  is a positive photo resist film as in the first example. 
     Then, by irradiating photo resist film  27  with light  28 , as shown in FIG. 13, photo resist film  27  is exposed in the region outside portions  27   a  and  27   b  (see FIG. 14) which are to be left in trenches  30   a  and  30   b . Because of the existence of light absorption film  29 , light  28  used for the exposure can be prevented from reaching third interlayer insulation film  23  or polycrystalline silicon film  19  below light absorption film  29 . Thus the light reaching third interlayer insulation film  23  and so on is prevented from being reflected irregularly. Therefore, the light is prevented from reaching photo resist film  27  which should be left in trenches  30   a  and  30   b  without being exposed. 
     Then by the development of photo resist film  27 , photo resist films  27   a  and  27   b  are left in trenches  30   a  and  30   b  while photo resist film  27  is removed in the region outside trenches  30   a  and  30   b  as shown in FIG.  14 . Here, the recess length L 1  is controlled by adjusting the exposure energy of light  28  used for the exposure as in the first example. 
     The semiconductor device shown in FIG. 10 can be obtained through the same steps as in the manufacturing process of the semiconductor device according to the first example shown in FIG.  6 . 
     Fifth Example 
     The manufacturing process shown in FIG. 15 essentially corresponds to the manufacturing process of the semiconductor device shown in FIG. 4 in accordance with the first example of the present invention. In the fifth example, however, light  28  for the exposure of photo resist film  27  is directed obliquely so as to form an angle of inclination θ on the upper surface of third interlayer insulation film  23  as shown in FIG.  15 . 
     Being directed obliquely, light  28  for the exposure is prevented from reaching photo resist film  27  located at the bottom portion in trenches  30   a  and  30   b , unlike a conventional case where light  28  enters vertically. Thus the photo resist film  27  at the bottom portion in trenches  30   a  and  30   b  is prevented from being exposed. Hence, photo resist films  27   a  and  27   b  (see FIG. 5) can surely be left in trenches  30   a  and  30   b.    
     In addition, by adjusting the angle of inclination θ of light  28 , it is possible to control light  28  so that it does not reach the portion below the upper surface of photo resist films  27   a  and  27   b  left in trenches  30   a  and  30   b . As a result, the light is surely prevented from reaching the portions  27   a  and  27   b  of photo resist film  27 , which are to be left. In addition, by the adjustment of the angle of inclination θ of light  28 , recess length L 1  can be controlled. 
     As the recess length L 1  is controlled by the adjustment of angle of inclination θ of light  28 , the precision of recess length L 1  can be enhanced without the need of consideration of the fluctuation of the energy of light  28 . 
     Through the same steps as the manufacturing process of the semiconductor device in accordance with the first example of the present invention shown in FIGS. 5 and 6, the semiconductor device shown in FIG. 1 is obtained. 
     With reference to FIG. 16, a variation of the manufacturing process of the semiconductor device in accordance with the fifth example of the present invention is essentially the same with the manufacturing process of the semiconductor device shown in FIG. 15 except that light absorption film  29  is formed on HSG polycrystalline silicon film  20 . 
     Because of the existence of light absorption film  29 , light  28  can be prevented from being transmitted through polycrystalline silicon film  19  or the like. Thus light  28  is not transmitted through polycrystalline silicon film  19  or the like and is not reflected irregularly, and whereby light  28  can be prevented from reaching photo resist film  27  at the bottom portion in trenches  30   a  and  30   b . As a result, photo resist films  27   a  and  27   b  (see FIG. 14) are surely left in trenches  30   a  and  30   b.    
     The semiconductor device as shown in FIG. 10 can be obtained by performing the manufacturing steps of the semiconductor device in accordance with the fourth example of the present invention shown in FIG. 14 after the manufacturing step shown in FIG.  16 . 
     Although the present invention has been described and illustrated in detail, it is clearly understood that the same is by way of illustration and example only and is not to be taken by way of limitation, the spirit and scope of the present invention being limited only by the terms of the appended claims.
A highly reliable semiconductor device having an underlying film with a trench and a conducting material film formed in the trench, a method of manufacturing the same and a method of forming a resist pattern used therein are obtained. The underlying film having an upper surface and the trench is formed. The conducting material film is formed on the upper surface and in the trench. A photo resist film is formed on the conducting material film located on the upper surface of the underlying film and in the trench. The photo resist film is left in the trench whereas the photo resist film is developed and removed outside the trench. The conducting material film located on the upper surface of the underlying film is etched and removed with the photo resist film left in the trench used as a mask.