FIELD OF THE INVENTION 
   The present invention relates generally to semiconductor manufacturing and, more particularly, to triple gate and gate around metal-oxide semiconductor field-effect transistor (MOSFET) devices and methods of making these devices. 
   BACKGROUND OF THE INVENTION 
   Scaling of device dimensions has been a primary factor driving improvements in integrated circuit performance and reduction in integrated circuit cost. Due to limitations associated with gate-oxide thicknesses and source/drain (S/D) junction depths, scaling of existing bulk MOSFET devices beyond the 0.1 μm process generation may be difficult, if not impossible. New device structures and new materials, thus, are likely to be needed to improve FET performance. 
   Double-gate MOSFETs represent new devices that are candidates for succeeding existing planar MOSFETs. In double-gate MOSFETs, the use of two gates to control the channel significantly suppresses short-channel effects. A FinFET is a double-gate structure that includes a channel formed in a vertical fin. Although a double-gate structure, the FinFET is similar to existing planar MOSFETs in layout and fabrication techniques. The FinFET also provides a range of channel lengths, CMOS compatibility, and large packing density compared to other double-gate structures. 
   SUMMARY OF THE INVENTION 
   Implementations consistent with the principles of the invention provide triple gate and gate around FinFET devices and methods for manufacturing these devices. 
   In one aspect consistent with the principles of the invention, a triple gate metal-oxide semiconductor field-effect transistor (MOSFET) includes a fin structure, a first gate formed adjacent a first side of the fin structure, a second gate formed adjacent a second side of the fin structure opposite the first side, and a top gate formed on top of the fin structure. 
   In another aspect, a gate around MOSFET includes multiple fins, a first sidewall gate structure formed adjacent one of the fins, a second sidewall gate structure formed adjacent another one of the fins, a top gate structure formed on one or more of the fins, and a bottom gate structure formed under one or more of the fins. 
   In yet another aspect, a method for forming gates in a MOSFET is provided. The method includes forming a fin structure on a substrate; forming sidewall gate structures adjacent the fin structure; and forming a top gate structure on top of the fin structure. 
   In a further aspect, a method for forming gates in a MOSFET is provided. The method includes forming a fin structure on a substrate; forming sidewall gate structures adjacent the fin structure; removing one or more portions of the fin structure to form fins; forming at least one additional gate structure under the fins; and forming at least one additional gate structure over the fins. 


   
     BRIEF DESCRIPTION OF THE DRAWINGS 
     The accompanying drawings, which are incorporated in and constitute a part of this specification, illustrate an embodiment of the invention and, together with the description, explain the invention. In the drawings, 
       FIG. 1  illustrates an exemplary process for fabricating a triple gate MOSFET in an implementation consistent with the principles of the invention; 
       FIGS. 2-6  illustrate exemplary cross-sectional views of a triple gate MOSFET fabricated according to the processing described in  FIG. 1 ; 
       FIG. 7  illustrates an exemplary process for fabricating a gate around MOSFET in an implementation consistent with the principles of the invention; 
       FIGS. 8-12  illustrate exemplary cross-sectional views of a gate around MOSFET fabricated according to the processing described in  FIG. 7 ; 
       FIGS. 13-15  illustrate an exemplary process for minimizing the thermal budget required to diffuse active dopants in a polysilicon gate; and 
       FIGS. 16-18  illustrate an exemplary process for forming highly doped abrupt junctions. 
   


   DETAILED DESCRIPTION 
   The following detailed description of implementations consistent with the present invention refers to the accompanying drawings. The same reference numbers in different drawings may identify the same or similar elements. Also, the following detailed description does not limit the invention. Instead, the scope of the invention is defined by the appended claims and their equivalents. 
   Implementations consistent with the principles of the invention provide triple gate and gate around FinFET devices and methods for manufacturing these devices. 
   Triple Gate MOSFET 
     FIG. 1  illustrates an exemplary process for fabricating a triple gate MOSFET in an implementation consistent with the principles of the invention.  FIGS. 2-6  illustrate exemplary cross-sectional views of a MOSFET fabricated according to the processing described with regard to  FIG. 1 . 
   With reference to  FIGS. 1 and 2 , processing may begin with semiconductor device  200 . Semiconductor device  200  may include a silicon on insulator (SOI) structure that includes a silicon substrate  210 , a buried oxide layer  220  and a silicon layer  230  on the buried oxide layer  220 . Buried oxide layer  220  and silicon layer  230  may be formed on substrate  210  in a conventional manner. The thickness of buried oxide layer  220  may range, for example, from about 500 Å to 3000 Å. The thickness of silicon layer  230  may range from about 200 Å to 1000 Å. It will be appreciated that silicon layer  230  is used to form the fin. In alternative implementations, substrate  210  and layer  230  may include other semiconductor materials, such as germanium, or combinations of semiconductor materials, such as silicon germanium. Buried oxide layer  220  may include a silicon oxide or other types of dielectric materials. 
   A gate dielectric layer  240  may optionally be deposited or thermally grown on silicon layer  230  (act  110 ). Gate dielectric layer  240  may be formed at a thickness ranging from approximately 5 Å to 30 Å. Gate dielectric layer  240  may include conventional dielectric materials, such as an oxide (e.g., silicon dioxide). In other implementations, a nitride material, such as a silicon nitride, may be used as the gate dielectric material. 
   A top gate electrode layer  250  may optionally be deposited over gate dielectric layer  240  for forming the top gate (act  120 ). Gate electrode layer  250  may be formed at a thickness ranging from approximately 100 Å to 1000 Å. A number of conductive materials may be used for gate electrode layer  250 . For example, gate electrode layer  250  may include a metal (e.g., tungsten, tantalum, aluminum, nickel, ruthenium, rhodium, palladium, platinum, titanium, molybdenum, etc.), a metal containing a compound (e.g., titanium nitride, tantalum nitride, ruthenium oxide, etc.), or a doped semiconductor material (e.g., polycrystalline silicon, polycrystalline silicon-germanium, etc.). 
   A cover layer  260  (or hard mask) may optionally be formed on top of gate electrode layer  250  to aid in pattern optimization and protect top gate electrode layer  250  during subsequent processing (act  130 ). Cover layer  260  may, for example, include a silicon nitride material or some other type of material capable of protecting the gate electrode during the fabrication process. Cover layer  260  may be deposited, for example, by chemical vapor deposition (CVD) at a thickness ranging from approximately 100 Å to 300 Å. 
   Silicon layer  230 , gate dielectric layer  240 , and top gate electrode layer  250  may be patterned by conventional lithographic techniques (e.g., electron beam (EB) lithography). Silicon layer  230  and layers  240 / 250  may then be etched using well-known etching techniques to form structure  300 , as illustrated in  FIG. 3  (act  140 ). Structure  300  includes fin  310 , gate dielectric  240 , top gate electrode  250 , and cover  260 . The width of fin  310  may range from approximately 50 Å to 1000 Å. 
   Following the formation of structure  300 , a portion of buried oxide layer  220  may be removed using, for example, one or more conventional etching techniques (act  150 ). In one implementation, buried oxide layer  220  may be etched to a depth ranging from about 200 Å to about 500 Å. During the etching, a portion of buried oxide layer  220  below fin  310  may be removed, as illustrated in  FIG. 4 . 
   Sidewall gates  410  and  420  may then be formed, as illustrated in  FIG. 4  (act  160 ). For example, a gate dielectric layer  430  may optionally be deposited or thermally grown on the side surfaces of structure  300  using known techniques. Gate dielectric layer  430  may be formed at a thickness ranging from approximately 5 Å to 30 Å. Gate dielectric layer  430  may include conventional dielectric materials, such as an oxide (e.g., silicon dioxide). In other implementations, a silicon nitride or other materials may be used to form the gate dielectric. 
   A gate electrode layer  440  may then be deposited over semiconductor device  200  to form sidewall gate electrodes  440 , as illustrated in  FIG. 4 . Gate electrode layer  440  may be formed at a thickness ranging from approximately 100 Å to 1000 Å. Similar to top gate electrode layer  250 , a number of materials may be used for sidewall gate electrode layer  440 . Gate electrode layer  440  may be planarized, using, for example, a chemical-mechanical polishing (CMP), to expose the top surface of cover  260  and form two separate sidewall gates  410  and  420 , as illustrated in  FIG. 4 . 
   Cover  260 , top gate electrode  250 , and gate dielectric  240  may then optionally be removed, as illustrated in  FIG. 5  (act  170 ). For example, a mask, or a similar mechanism, may be used in a conventional manner to permit cover  260 , top gate electrode  250 , and gate dielectric  240  to be etched, while minimizing effects to sidewall gates  410  and  420 . In another implementation, gate dielectric  240  may optionally be left intact (i.e., not removed with cover  260  and top gate electrode  250 ). 
   Top gate  610  may then optionally be formed (act  180 ), as illustrated in  FIG. 6 . For example, a gate dielectric material  620  may optionally be regrown or formed on fin  310 . In this case, gate dielectric material  620  may include a material similar to the material used for gate dielectric  240  and may be formed at a thickness ranging from approximately 5 Å to 30 Å. Alternatively, gate dielectric material  240  may remain. Top gate electrode material  630  may then optionally be deposited over gate dielectric material  240 / 620  to form top gate  610 . Gate electrode material  630  may include a material similar to the material used for top gate electrode  250  and may be deposited to a thickness ranging from approximately 100 Å to 1000 Å. 
   The resulting semiconductor device  200  illustrated in  FIG. 6  may include three gates (i.e., sidewall gate  410 , sidewall gate  420 , and top gate  610 ). Conventional MOSFET fabrication processing can be used to complete the transistor (e.g., forming the source and drain regions), contacts, interconnects and inter-level dielectrics for the triple gate MOSFET. 
   Gate Around MOSFET 
     FIG. 7  illustrates an exemplary process for fabricating a gate around MOSFET in an implementation consistent with the principles of the invention.  FIGS. 8-12  illustrate exemplary cross-sectional views of a gate around MOSFET fabricated according to the processing described with respect to  FIG. 7 . Processing may begin with semiconductor device  800 . Semiconductor device  800  may include a SOI structure that includes silicon substrate  810 , buried oxide layer  820 , and silicon layer  830 . The SOI structure may be similar to the one described with respect to  FIG. 2 . Optionally, a gate dielectric layer  840  (act  710 ), a top gate electrode layer  850  (act  720 ), and a cover layer  860  (act  730 ) may be formed on the SOI structure in a manner similar to that described above with respect to acts  110 - 130  of  FIG. 1 . 
   Silicon layer  830 , gate dielectric layer  840 , and top gate electrode layer  850  may be patterned by conventional lithographic techniques (e.g., electron beam (EB) lithography). Silicon layer  830  and layers  840 / 850  may then be etched using well-known etching techniques to form a structure  900 , as illustrated in  FIG. 9  (act  740 ). Structure  900  includes a fin  910 , gate dielectric  840 , top gate electrode  850 , and cover  860 . Fin  910 , consistent with the present invention, may be relatively wide. For example, the width of fin  910  may range from approximately 50 Å to 1000 Å. 
   Following the formation of structure  900 , a portion of buried oxide layer  820  may be removed using, for example, one or more conventional etching techniques (act  750 ). In one implementation, buried oxide layer  820  may be etched to a depth ranging from about 200 Å to about 500 Å. During the etching, a portion of buried oxide layer  820  below fin  910  may be removed, as illustrated in  FIG. 10 . 
   Sidewall gates  1010  and  1020  may then be formed, as illustrated in  FIG. 10  (act  760 ). For example, a gate dielectric layer  1030  may be deposited or thermally grown using known techniques. Gate dielectric layer  1030  may be formed at a thickness ranging from approximately 5 Å to 30 Å. Gate dielectric layer  1030  may include conventional dielectric materials, such as an oxide (e.g., silicon dioxide). In other implementations, a silicon nitride or another material may be used as the gate dielectric material. 
   A sidewall gate electrode layer  1040  may be deposited over semiconductor device  800 . Gate electrode layer  1040  may be formed at a thickness ranging from approximately 100 Å to 1000 Å. Similar to top gate electrode layer  850 , a number of materials may be used for sidewall gate electrode layer  1040 . Gate electrode layer  1040  may be planarized, using, for example, a CMP to expose the top surface of cover  860  and form two separate sidewall gates  1010  and  1020 , as illustrated in  FIG. 10 . 
   Cover  860 , top gate electrode  850 , gate dielectric  840 , and one or more portions of fin  910  may then optionally be removed, as illustrated in  FIG. 11  (act  770 ). For example, a conventional patterning technique and etching technique may be used to remove cover  860 , top gate electrode  850 , gate dielectric  840 , and one or more portions of fin  910 , while minimizing effects to sidewall gates  1010  and  1020 . In another implementation, gate dielectric  840  may optionally be left intact over those portions of fin  910  that are not removed. The etching of fin  910  may terminate on buried oxide layer  820 , as illustrated in  FIG. 11 , to form two separate fins  1110 . Each of fins  1110  has a width ranging from approximately 50 Å to 1000 Å. As shown in  FIG. 11 , two fins  1110  are formed. In other implementations, more than two fins  1110  may be formed. 
   Gate dielectric  1210  may then be thermally grown on the exposed surfaces of fins  1110  (act  780 ), as illustrated in  FIG. 12 . For example, gate dielectric  1210  may be grown to a thickness of about 5 Å to about 30 Å. Gate dielectric  1210  may include a material similar to that used for gate dielectric  840 . Alternatively, gate dielectric  840  may remain over the top surfaces of fins  1110  and gate dielectric  1210  may be grown on the exposed side surfaces of fins  1110 . 
   Additional gates may then be formed (act  790 ), as illustrated in  FIG. 12 . For example, gate electrode material  1220  may optionally be deposited over gate dielectric material  840 / 1210  to form additional gates. Gate electrode material  1220  may then be patterned and etched to form the additional gates. Gate electrode material  1220  may include a material similar to the material used for top gate electrode layer  850  and/or sidewall gate electrode layer  1040  and may be deposited to a thickness ranging from approximately 100 Å to 1000 Å. 
   The resulting semiconductor device  800  may include four (or more) gates (i.e., sidewall gate  1010 , sidewall gate  1020 , top gate  1230 , and bottom gate  1240 ), as illustrated in  FIG. 12 . Top gate  1230  may be formed over fins  1110  and bottom gate  1240  may be formed under fins  1110 . Conventional MOSFET fabrication processing can be used to complete the transistor (e.g., forming the source and drain regions), contacts, interconnects and inter-level dielectrics for the gate around MOSFET. 
   OTHER IMPLEMENTATIONS 
   There is a need in the art to minimize the thermal budget required to diffuse and activate dopants in a polysilicon gate.  FIGS. 13-15  illustrate an exemplary process for minimizing the thermal budget required to diffuse active dopants in a polysilicon gate. As shown in  FIG. 13 , a fin  1300  may be formed on a substrate, such as a SOI substrate. Fin  1300  may be formed using, for example, processes similar to those described above with regard to earlier implementations. 
   A thin polysilicon material  1400  may be deposited on fin  1300 , as shown in  FIG. 14 . An ion implantation process may be performed to dope polysilicon material  1400  with dopants. A conventional annealing process may then be performed. These acts may be repeated one or more additional times, as shown in  FIG. 15 . In other words, fin  1300  may be subjected to multiple polysilicon deposits, implants, and anneals to minimize the thermal budget required to dope the polysilicon. 
   There is also a need in the art to form highly doped abrupt junctions.  FIGS. 16-18  illustrate an exemplary process for forming highly doped abrupt junctions. A top view of an exemplary FinFET  1600  is illustrated in  FIG. 16 . FinFET  1600  includes a fin  1610  and a gate electrode  1620 . A side view of FinFET  1600  is illustrated in  FIG. 17 . FinFET  1600  includes source region  1710 , drain region  1720 , and channel  1730 . Source region  1710  and drain region  1720  may be implanted with dopants. 
   After the doping process, source region  1710  and drain region  1720  may be silicided by depositing a metal over the source/drain regions, followed by an annealing to form a metal-silicide material, as illustrated in  FIG. 18 . Dopants may pile-up at the channel interface to form high concentrated abrupted junctions. 
   CONCLUSION 
   Implementations consistent with the principles of the invention provide triple gate and gate around FinFET devices and methods of manufacturing these devices. 
   The foregoing description of exemplary embodiments of the present invention provides illustration and description, but is not intended to be exhaustive or to limit the invention to the precise form disclosed. Modifications and variations are possible in light of the above teachings or may be acquired from practice of the invention. 
   For example, in the above descriptions, numerous specific details are set forth, such as specific materials, structures, chemicals, processes, etc., in order to provide a thorough understanding of implementations consistent with the present invention. These implementations and other implementations can be practiced, however, without resorting to the details specifically set forth herein. In other instances, well known processing structures have not been described in detail, in order not to unnecessarily obscure the thrust of the present invention. In practicing the present invention, conventional deposition, photolithographic and etching techniques may be employed, and hence, the details of such techniques have not been set forth herein in detail. 
   While series of acts have been described with regard to  FIGS. 1 and 7 , the order of the acts may be varied in other implementations consistent with the present invention. Moreover, non-dependent acts may be implemented in parallel. 
   No element, act, or instruction used in the description of the present application should be construed as critical or essential to the invention unless explicitly described as such. Also, as used herein, the article “a” is intended to include one or more items. Where only one item is intended, the term “one” or similar language is used. The scope of the invention is defined by the claims and their equivalents.
A triple gate metal-oxide semiconductor field-effect transistor (MOSFET) includes a fin structure, a first gate formed adjacent a first side of the fin structure, a second gate formed adjacent a second side of the fin structure opposite the first side, and a top gate formed on top of the fin structure. A gate around MOSFET includes multiple fins, a first sidewall gate structure formed adjacent one of the fins, a second sidewall gate structure formed adjacent another one of the fins, a top gate structure formed on one or more of the fins, and a bottom gate structure formed under one or more of the fins.