CROSS REFERENCE TO RELATED APPLICATIONS  
       [0001]    This application claims priority from U.S. provisional patent application Serial No. 60/393,133 which is entitled “Low Voltage Time of Flight Electron Emission Microscope,” filed Jul. 3, 2002, and is hereby incorporated herein by reference. 
     
    
     
       FIELD OF THE INVENTION  
         [0002]    The present invention relates to imaging objects with emission electrons.  
         BACKGROUND OF THE INVENTION  
         [0003]    Many modern electrical imaging devices, such as modern electron emission microscopes (EEMs), image an object of interest (also called specimen or sample) by first accelerating and focusing electrons emitted from the object using an electric/magnetic objective lens, and then further magnifying the image by using a series of electric/magnetic projector lenses. An electric/magnetic lens typically generates electric or magnetic fields, or a mix of both, in the path of a beam of emitted electrons for altering the trajectories of the emitted electrons, analogous to the way a glass lens alters the trajectory of a beam of light.  
           [0004]    A typical conventional EEM has a radiation source for illuminating an object to be imaged, an electron detector for detecting electrons emitted from the object as a result of the radiation, and one or more electric/magnetic lenses for directing the emitted electrons towards the electron detector to form a magnified image of the object at the detector. In a typical EEM, an electrostatic objective lens is positioned close to the object and has an electrical potential higher than that of the object (usually in the range of 10 to 15 kV) for extracting and accelerating the emitted electrons.  
           [0005]    The focal length of such an electric/magnetic lens varies with the kinetic energy of the electrons focused by it. That is, electrons of different energies will be focused at different focal points. For example, the focal length of a magnetic lens for an electron beam of kinetic energy E may be approximated by  
                 1   f     =       1     8      mE              ∫     z   1       z   2              B   z   2             z             ,           (   1   )                               
 
           [0006]    where m is the electron mass, and B z  is the axial magnetic field distribution. As such, a beam of electrons with dispersed energies is not focused in a single plane by an electric/magnetic lens. Not focusing a beam in a single plane results in distortion of the image formed on a single plane. This distortion due to variation in kinetic energy of the emitted electrons is referred to as chromatic aberration. Thus, the spatial resolution of electric/magnetic lenses is limited in part by chromatic aberration.  
           [0007]    In EEM, the initial kinetic energies of secondary electrons excited by X-ray radiation typically range from several to tens of electron-volts, and, consequently, chromatic aberration limits spatial resolution of an X-ray photoelectron emission microscope (XPEEM) to about 100 nm.  
           [0008]    Several techniques have been developed for reducing chromatic aberration in EEM. The general approach is to filter out emitted electrons having kinetic energies outside a certain range. For example, contrast apertures and Wien filters have been used for such a purpose, improving spatial resolution of XPEEMs to about 20 nm. However, when emitted electrons of varied energies are eliminated, the intensity of emitted electrons arriving at the detector is reduced. Further, certain information is lost. Particularly, a full emission spectrum cannot be obtained.  
           [0009]    An alternative approach is to operate an EEM in a time of flight (TOF) mode as, for example, described in “Time-of-Flight Photoelectron Emission Microscopy TOF-PEEM: first results”,  Nuclear Instruments And Methods in Physics Research , A 406, (1998), 499506, H. Spiecker et al, (“Spiecker”). Spiecker discloses a photoelectron emission microscope (PEEM) with a pulsed radiation source. Emitted electrons are dispersed in a drift tube downstream of the imaging optics. The electrons are retarded at the entrance of the drift tube from ˜700 eV to a drift energy of less than 100 eV and are imaged on a multi-channel plate (MCP) at the end of the tube. The electrons are then accelerated to a scintillator screen having a short decay time. Emitted electrons produced from a single radiation pulse are spatially separated in the drift tube due to the spread in their kinetic energy as the drift time of each electron is dependent on its drift energy. The images formed by electrons in different energy ranges are separately recorded in time. The chromatic aberration in each single image is reduced because the energy spread in electrons forming a single image is smaller than the spread in all transmitted electrons. However, this approach has several limitations. Specifically, only electrons within a narrow energy range are collected for each image and they represent only a small fraction of all of the emitted electrons. Accordingly, the acquisition time for a single image is long. As the TOF spectrometer is placed after the imaging optics, initial electron angular motions tend to limit separation of electrons with different energies within the drift tube, and hence the final spatial resolution of the image. Further, it is difficult to integrate this type of TOF spectrometer into a conventional XPEEM.  
           [0010]    Another approach is to use a tetrode mirror for correcting both chromatic and spherical aberration, as described in “SMART electron optics”, in 12 th    European Congress on Electron Microscopy, Proceedings Volume III , Instrumentation and Methodology, (2000), 81-4, D. Preikszas et al. The spatial resolution can be improved to about 2 nm with this approach. However, this approach requires complicated, precise design and positioning of the various lenses and, particularly, the tetrode mirror.  
           [0011]    Thus, there is a need for an improved imaging device using emitted electrons with low chromatic aberration wherein both high spatial resolution and full spectrum of emitted electrons can be obtained simultaneously.  
         SUMMARY OF THE INVENTION  
         [0012]    In accordance with an aspect of the present invention, an imaging device, such as an EEM, includes an electric/magnetic lens is used to focus pulsed electrons emitted from an object on to a target plane. Before a pulse of emitted electrons reaches the lens, electrons are spatially separated in dependence on their respective kinetic energies and are then subject to a time varying electric field. The electric field compensates for variations in kinetic energies, thus causing the electrons to be focused proximate a single plane, reducing chromatic aberration. The varying electric field may be provided by varying an electric potential at the lens, such as by varying a voltage supplied to an electrode at the lens. This potential effectively varies the focal length of the lens in time, in order to compensate for variations in kinetic energies of electrons arriving at the lens.  
           [0013]    A drift chamber may optionally be provided for better spatial separation. As can be appreciated, since the energy spread in the emitted electrons is reduced at the lens, distortions in the image formed at the target plane due to chromatic aberration are reduced. The kinetic energy of the pulsed emitted beam of electrons may be kept relatively low, e.g. between 20 to 100 eV, so that they have significantly different arrival times at the lens. A low aberration electric/magnetic objective lens may be provided to reduce the effect of the initial angular spread of the emitted electrons. The magnetic and electric field strengths rapidly decrease from the specimen surface so as to strongly collimate the emitted electrons, thus reducing on-axis lens aberrations and minimising the effect of initial angular distribution on their transit times.  
           [0014]    In accordance with an aspect of the invention, there is provided a method of imaging an object, includes illuminating the object to emit at least one pulse of electrons; directing the pulse of electrons along an optical path through a lens, towards a target to form an image of the object at the target; spatially separating electrons within the pulse in dependence on their kinetic energies, before the electrons reach the lens; providing a time varying electric field along the optical path remote from the object, the field varying in time so that the amount of energy provided to individual ones of the electrons in the pulse depends on their spatial separation within the pulse, thereby reducing energy dispersion of electrons passing through the lens and reducing the chromatic aberration in the image.  
           [0015]    In accordance with another aspect of the invention there is provided an apparatus for imaging an object, includes a lens for focusing pulsed electrons emitted from the object and directed along an optical axis to form an image of the object at a target, and a correcting element positioned remote from the object, the correcting element electrically biased to have a dynamically changing voltage for correcting the kinetic energies of electrons passing through the lens, the voltage variable in synchronization with the pulsed electrons for correcting the kinetic energies of the pulsed electrons in dependence on arrival times at the correcting element.  
           [0016]    In accordance with yet another aspect of the invention there is provided a method of imaging an object. The method includes illuminating the object to emit at least one pulse of electrons; directing the pulse of electrons along an optical path through a lens, towards a target to form an image of the object at the target; spatially separating electrons within the pulse in dependence on their kinetic energies, before the electrons reach the lens; varying a focal strength of the lens in time to compensate for variations in kinetic energies of individual ones of the electrons in the pulse, thereby reducing the chromatic aberration in the image.  
           [0017]    In accordance with still another aspect of the invention there is. provided an electric/magnetic lens for use in an electron emission microscope. The lens includes an electrode, having a controllable potential for varying energy imparted to electrons arriving at the electrode, and thereby the focal length of the lens.  
           [0018]    Other aspects, features and advantages of the invention will become apparent to those of ordinary skill in the art upon review of the following description of specific embodiments of the invention in conjunction with the accompanying figures. 
       
    
    
     BRIEF DESCRIPTION OF THE DRAWINGS  
       [0019]    In the figures, which illustrate exemplary embodiments of the invention,  
         [0020]    [0020]FIG. 1 is a simplified schematic diagram illustrating an EEM exemplary of an embodiment of the present invention;  
         [0021]    [0021]FIG. 2 is a simplified schematic diagram illustrating an EEM exemplary of a further embodiment of the present invention;  
         [0022]    [0022]FIG. 3 is a schematic section view of the objective lens shown in FIGS. 1 and 2; and  
         [0023]    [0023]FIG. 4 is a line graph illustrating an example time varying voltage applied to an electrode of the EEM of FIG. 1 or  2 , in manners exemplary of an embodiment of the present invention. 
     
    
     DETAILED DESCRIPTION  
       [0024]    [0024]FIG. 1 illustrates an EEM  10 , exemplary of an embodiment of the present invention. EEM  10  includes an objective lens  26 , a drift chamber  28 , a dynamic projector lens  12 , and an electron detector  34 . An optional deflector/stigmator unit  32  also forms part of EEM  10 . EEM  10  may be used to image an object  16  or a portion thereof using pulsed electrons emitted from object  16 . Beam  38  may be a beam of electromagnetic waves, such as UV light or X-rays, or charged particles, such as electrons. A radiation source (not shown) may form part of EEM  10  to excite object  16  to emit electrons by generating radiation beam  38 . Drift chamber  28  may have an axial length between 20 and 100 cm. An example detector  34  may include a multi-channel-plate (MCP) and a digital sampling oscilloscope to image object  16 .  
         [0025]    Lens  12  is positioned at a distance from object  16  to focus electrons emitted from object  16  in a target plane  18  along an optical axis  20  to form an image  22  of object  16 .  
         [0026]    An electrode  14  controls the electrical potential at lens  12 , and thereby the electric field along optical axis  20  between drift chamber  28  and lens  12 . The voltage on electrode  14  may be supplied by a signal generator and thus varied in time and synchronized with an input signal. Electrode  14  may take various shapes and be placed at various locations along optical axis  20 . In EEM  10 , exemplary projector lens  12  is a weak focusing electrostatic lens and electrode  14  is incorporated in projector lens  12 : electrode  14  of projector lens  12  is biased by a signal generator for controlling the electrical potential at lens  12 . Electrical potential at lens  12  can also be varied in various other manners known to a person skilled in the art.  
         [0027]    Viewed another way, the potential at electrode  14  varies the focal length of lens  12 , and allows the focal length of lens  12  to vary in time so as to compensate for the spread in kinetic energies of the emitted electrons focused by lens  12   
         [0028]    Electrode  14  varies potential at lens  12 , and thereby the field along axis  20 , compensating for the chromatic aberration effect in manners exemplary of the present invention, as described herein  
         [0029]    Specifically, the kinetic energy of an emitted electron arriving at lens  12  depends on both its initial kinetic energy at object  16  and the electrical potential at lens  12  at the time of arrival. Electrons within a pulse of electrons emitted from object  16  will arrive at lens  12  at different times if they have different initial kinetic energies. That is, the electrons will be spatially separated as a result of their travel along optical axis  20 . Thus, when the potential at lens  12  varies as emitted electrons arrive, the kinetic energies of the emitted electrons passing lens  12  are modulated by the variance of the potential and will vary depending on their arrival time at lens  12 . With a beam of pulsed electrons emitted from object  16 , the potential at lens  12  can be controlled to vary in time to reduce the kinetic energy dispersion of electrons passing through lens  12 . As the energy dispersion in the electrons at the lens is reduced, chromatic aberration can be reduced.  
         [0030]    Again, viewed another way, the focal length of lens  12  varies in dependence on the potential at electrode  14 . Change in focal length of lens  12  with time cause electrons with different arrival energies to be focused in the same plane.  
         [0031]    The potential change required at lens  12  can be estimated as follows. Assuming an infinitely short pulse width, and denoting the spread in initial kinetic energy as ? E i , the spread in arrival time at projector lens  12  as ?t, the required change in potential, ? V(t), within time ? t for eliminating any energy spread at lens  12  is, in theory,  
         ?  V ( t )=?  E   i   /e.   (2)  
         [0032]    Beside the spread in initial kinetic energy, there are two additional factors that affect the spread in arrival time at lens  12 : the speeds at which the pulsed electrons travel and the traveling distance between object  16  and lens  12  Clearly lower speeds and longer distance will result in a larger spread in arrival time.  
         [0033]    In order to sufficiently spatially separate electrons of different initial energies in a pulse of emitted electrons, the pulsed electrons are allowed to travel a sufficient distance before they reach lens  12 . Drift chamber  28  may therefore be provided. Drift chamber  28  electrically shields pulsed electrons passing through it from external electrical and magnetic fields. Drift chamber  28  may be biased to a low potential so that pulsed electrons entering it will have low kinetic energies and travel at low speeds within it.  
         [0034]    Further, the kinetic energies of the pulsed electrons may be kept low before they reach lens  12  so that they travel at low speeds.  
         [0035]    Optionally, projector lens  12  of EEM  10  may be replaced with a magnetic projector lens  12 ′ as in EEM  10 ′ depicted in FIG. 2. In the case of a magnetic lens, an electrically biased grid, acting as an electrode  14 , may be placed between the pole-pieces of the magnetic lens to vary the potential at lens  12 ′.  
         [0036]    An additional objective lens  26  (FIGS. 1 and 2) forms part of EEM  10  and  10 ′ and is designed to work with a time of flight spectrometer, but may be designed to also work with other types of imaging energy filters, such as a Wien filter or an Omega filter. The optical magnification of objective lens  26  may be as high as 500 to 10,000. Objective lens  26  may have a focal length ranging from 20 to 200 μm. Objective lens  26  may use mixed electric and magnetic fields to extract and guide electrons emitted from object  16 .  
         [0037]    An exemplary embodiment of objective lens  26  is more particularly illustrated in FIG. 3. As illustrated, objective lens  26  may have a tapered tip  40  which has a small opening  42 . The diameter of opening  42  of tapered tip  40  may be made small so that both axial magnetic and electric fields fall off sharply at opening  42 . For example, diameters between 50 to 200 μm may be used. A smaller opening  42  results in smaller chromatic and spherical on-axis aberration coefficients. Magnetic fields are generated by electromagnet  44  placed below object  16 . Electromagnet  44  comprises an iron casing  46  enclosing a coil  48 . Casing  46  has a central opening  50  in its top plate for producing magnetic fields in the area around opening  42  of objective lens  26 . Object  16  may also be placed in opening  42  of the top plate.  
         [0038]    Of course, other types of objective lenses, such as those used in conventional EEMs may also be used. For example, objective lens  26  may be replaced with an electrostatic objective lens.  
         [0039]    In operation, a radiation source radiates object  16  placed close to objective lens  26  with radiation beam  38 , as illustrated in FIGS. 1 and 2. To generate pulsed emission electrons, radiation beam  38  may be pulsed. Pulses of electrons that have short width and are well separated are preferable because of easy separation of the electrons. Calculations show that beams with pulse width around one nanosecond for overall transit time of over 100 ns, will produce good results. In general, the width of the pulse at the specimen should be limited to be a small fraction of the total transit time. Of course, as can be appreciated, practical pulse width and repetition time are limited by many factors including the time resolution of various elements and control components of the microscope and efficiency considerations. For example, a pulse width of about 10 ns may be appropriate for longer overall transit times.  
         [0040]    Alternatively, radiation beam  38  may be continuous or have a wide pulse width, in which case, object  16  may be driven by nanosecond-wide low voltage pulses at a desired repetition rate which effectively block emission of electrons.  
         [0041]    Pulsed electrons emitted from object  16  may include secondary electrons, photoelectrons or other types of electrons, depending on the characteristics of radiation beam  38  and object  16 .  
         [0042]    Object  16  may be received in proximity to optional objective lens  26 . Lens  26  may be electrically biased relative to object  16 . Pulsed electrons emitted from object  16  are thus extracted and accelerated by objective lens  26  towards detector  34 . A low potential difference between object  16  and object lens  26  may be advantageous to keep the kinetic energies of the pulsed electrons low. Thus, for example, object  16  may be biased to a voltage ranging from −100 to −20 volts, while the electrodes of objective lens  26  are grounded. Where the potential difference between object  16  and objective lens  26  is low, it may be advantageous to use an objective lens  26  as illustrated in FIG. 3. To operate such an objective lens  26 , an electrical current is run through coil  48  to energize electromagnet  44  and thus generate the desired magnetic fields in objective lens  26 . The magnetic flux flows around within iron casing  46  and through opening  50  to tapered tip  40 .  
         [0043]    Advantageously, the magnetic fields help collimate the emitted electrons, reducing the dependence of their subsequent transit times less on their initial angle of emission. Conveniently, a mixed field objective lens may give significantly lower on-axis chromatic and spherical aberrations in the final image than a purely electrostatic or purely magnetic field objective lens.  
         [0044]    After exiting objective lens  26 , pulsed electrons that are not blocked by deflector/stigmator unit  32  enter drift chamber  28 . Drift chamber  28  may also be electrically biased with reference to object  16  so that there is a low potential difference between drift chamber  28  and object  16 , which can be, for example between 10 and 100 V.  
         [0045]    Since the potential difference between object  16  and drift chamber  28  is low, pulsed electrons entering drift chamber  28  will have low kinetic energies. Consequently, pulsed electrons travel at low speeds within drift chamber  28 . Because the pulses are well separated from each other and electrons having different kinetic energies travel at different speeds, a pulse of pulsed electrons drifting in drift chamber  28  gradually become spatially separated along optical axis  20 . Faster electrons will exit drift chamber  28  earlier and slower electrons will exit later. Workable time separation for a single pulse can vary from several to tens of nanoseconds in a typical configuration.  
         [0046]    After exiting drift chamber  28 , pulsed electrons will gain or lose kinetic energy depending on the electric field along optical axis  20 , as influenced by the electrical potential difference between drift chamber  28  and projector lens  12  (or  12 ′). If drift chamber  28  has a higher potential than that at lens  12  (or  12 ′), pulsed electrons will lose kinetic energy. If drift chamber  28  has a lower potential, pulsed electrons will gain kinetic energy. The larger the difference, the larger the change in kinetic energy.  
         [0047]    In any event, electrons eventually arrive at projector lens  12  (or  12 ′). Electrode  14  modulates potential at lens  12  (or  12 ′) by several volts within a few nanoseconds using existing technology. As the voltage changes over time, the arriving pulsed electrons will gain or lose energy differently depending on when they reach projector lens  12  or  12 ′, effectively varying the focal length of projector lens  12 . For example, if the potential at lens  12  (or  12 ′) is higher than at drift chamber  28  and increases over time, those pulsed electrons reaching projector lens  12  (or  12 ′) earlier will gain less kinetic energies than those reaching there later. As those that arrive earlier have higher initial kinetic energies, the spread in kinetic energy is reduced. Thus, it is possible to modulate the voltage on the electrodes of lens  12 , to compensate for the spread in kinetic energies of the pulsed electrons at projector lens  12  so that the effect of chromatic aberration in the formed image of object  16  can be reduced.  
         [0048]    For example, the signal generator of electrode  14  can be synchronized with the radiation pulse  38 . Each radiation pulse  38  triggers a cycle of voltage change on electrode  14 . In each cycle, the voltage may be varied to minimize the energy spread in the electrons of a pulse traveling through projector lens  12   
         [0049]    As will be appreciated, drift chamber  28  may not be necessary if pulsed electrons travel through sufficiently long distance, e.g. in a number of optical components (not all shown), before reaching projective lens  12  so that there is a sufficient separation in arrival time at projective lens  12 .  
         [0050]    To illustrate, the results of an example calculation is described below for the following conditions: the initial energies of the pulsed electrons are from 0 to 5 eV, object  16  is biased to −100 V, objective lens  26  and projective lens  12  are grounded, drift chamber  28  is biased to −75 V, the distance between object  16  and projective lens  12  is 12 cm.  
         [0051]    Calculations show that the spread in electron arrival time at lens  12  is approximately 6.28 ns. Recalling equation (2), the potential at projector lens  12 , or, the voltage on the electrodes of lens  12  (or  12 ′), need to increase by 5 V within 6.28 ns in order to minimize energy spread at projector lens  12  (or  12 ′). Many available fast signal generators can be used for generating this kind of voltage change.  
         [0052]    Since the arrival time at lens  12  (or  12 ′) is not linearly dependent on kinetic energy (rather it is linearly dependent on velocity) and since the kinetic energy of an emitted electron varies during its flight to lens  12  (or  12 ′), the required change in potential at lens  12  (or  12 ′) for obtaining minimum spread in kinetic energy is not linear with time, as shown in FIG. 3, where the dotted line shows the linear change in time and the solid lines shows the required change in time.  
         [0053]    The focused pulsed electrons leaving projector lens  12  are detected by detector  34  for forming an image of object  16 . Detector  34  may have a relatively fast response time, e.g., in the sub-nanosecond range, so that the arrival time of pulsed electrons can be recorded accurately. Coarse focusing can be achieved by moving detector  34  along optical axis  20 . Fine focusing can be achieved through varying the magnitude of electrical potential at projector lens  12 .  
         [0054]    Conveniently, as electrons in the emitted beam have been accelerated differently before reaching lens  12  (or  12 ′) depending on their initial kinetic energies, the kinetic energies of electrons reaching lens  12  are more uniform, resulting in reduced chromatic aberration.  
         [0055]    Calculations show that EEM  10  can have image resolution in the nanometer range, more than an order of magnitude improvement over the image resolution attainable by conventional PEEM systems.  
         [0056]    By dynamically varying the potential on electrode  14 , the energy spread at lens  12  or  12 ′ is significantly reduced, this means that electrons with differing initial energies are focussed on to approximately the same image plane, significantly reducing the effect of chromatic aberration of the whole system.  
         [0057]    Advantageously, the degree of contrast as compared to conventional X-ray absorption can be enhanced using EEM  10 , since the entire spectrum of the photoelectron signal (from zero to several hundred electron-volts) can be directly monitored. In conventional PEEM systems, only the first few electron volts of the photoelectron energy spectrum is usually used to form the image.  
         [0058]    As should now be appreciated, it is possible to minimize the spread in kinetic energy in different ways. Particularly, the potential at lens  12  or  12 ′ may be controlled in different ways. For example, an electrically biased tube or plate, remote from lens  12  (or  12 ′) and along the path of the pulsed electrons, either at, or upstream or downstream from, lens  12  (or  12 ′) may also be used to dynamically vary the focal strength of lens  12  (or  12 ′), thus keeping the focal plane constant at the image plane. Similarly, in some situations it may be possible to dynamically modulate the potential at the final projector lens by changing a voltage on detector  34 . Conveniently, modulating the potential of an electrode at or close to lens  12  can be advantageous for reasons such as compactness and ease of use.  
         [0059]    In alternative embodiments, the bias voltage on drift chamber  28  can also be varied in order to examine a particular part of the emission spectrum in more detail. For instance, to examine the energy spectrum at around 200 eV, the drift chamber voltage can be biased to around 200 volts lower than that of the object  16 . This means that all electrons having initial energies below 200 eV would be filtered (not entering drift chamber  28 ), while those having energies just above 200 eV will travel slowly through drift chamber  28  and have substantial spread in transit time. Therefore, their energy spectra can be analysed in more detail by a time of flight spectrometer. In addition, EEM  10  can be used to energy filter emitted photoelectrons from object  16  by selectively detecting them in time at the image plane. The detection system can operate by capturing information within a small time window that can be preset to any point in the detection cycle. Since in the time of flight spectrometer, the detection time directly corresponds to the initial energy of the electrons, time-windowing therefore effectively energy filters the captured image.  
         [0060]    As can be understood, EEMs  10  or  10 ′ may have alternative and additional components for proper or desired operation, which are readily appreciated and understood by those skilled in the art. For instance, alternative objective or projector lenses may be used. One or more projector lenses may also be added between objective lens  26  and drift chamber  28 , between drift chamber  28  and projector lens  12 , or downstream of projector lens  26 . [Further, where multiple lenses are used, the potentials at more than one lens may be dynamically controlled to reduce the overall chromatic aberration effect. Certain components of EEM  10  or  10 ′ may also be removed. For instance, in an imaging apparatus similar to EEM  10  or  10 ′ detector  34  may be removed and the focused emitted electrons may be bombarded on to a target so as to engrave an image of object  16  on the target.  
         [0061]    Other features, benefits and advantages of the present invention not expressly mentioned above can be understood from this description and the accompanying drawings by those skilled in the art.  
         [0062]    Although only a few exemplary embodiments of this invention have been described above, those skilled in the art will readily appreciate that many modifications are possible. The invention, rather, is intended to encompass all such modification within its scope, as defined by the claims.
An imaging device, such as an EEM, includes an electric/magnetic lens used to focus pulsed electrons emitted from an object on to a target plane. Before a pulse of emitted electrons reaches the lens, electrons are spatially separated in dependence on their respective kinetic energies and are then subject to a time varying electric field that keeps the final focal plane constant for a wide variety of different energy electrons. The electric field compensates for variations in the image focal length caused by a spread in kinetic energies, causing the electrons to be focused proximate the target plane, reducing chromatic aberration. The varying electric field may be provided by varying an electric potential at the lens by, for example, varying a voltage supplied to an electrode at the lens. This potential effectively varies the focal strength of the lens in time, in order to compensate for variations in kinetic energies of electrons arriving at the lens, effectively keeping the image plane position constant.