BACKGROUND OF THE INVENTION  
       [0001]     This invention relates generally to buffing pads for buffing machines and more particularly to buffing pads made of resilient foam.  
         [0002]     Buffing pads are often used when a wax or polish is mechanically applied to a surface. The buffing pads generally include a pad material with a buffing surface on one side and an attachment surface on the other side. A pad support is secured to the attachment surface of the pad material, such as by an adhesive. The pad material is typically a soft, non-abrasive material that provides the desired characteristics for the buffing pad when used to spread a polish or wax on a surface. The pad support is generally more rigid than the pad material, and it typically includes a connector for releasably securing the buffing pad to a backing plate on the buffing machine, which typically includes a complementary connector. Suitable connectors include, but are not limited to, hook and loop connectors.  
         [0003]     The form and materials for the pad material have been varied to provide effective contact between the buffing material on the buffing surface and the item to be buffed or polished. The goal is to maximize the contact of the buffing surface with the item, maximizing the effectiveness of the buffing surface in spreading the wax or polish over the item. The variations typically take the form of different shapes for the buffing surface, increasing the contact of the pad with the surface over those portions of the pad which contact the surface.  
         [0004]     One type of pad which has been used is a flat, foam buffing pad. The flat surface of these pads generates more heat than other foam buffing pad designs. The heat causes the buffing material to dry out or break down rapidly, causing the buffing surface of the pad to make contact with the substrate directly. Without adequate lubrication from the buffing material, chatter or a squeaking noise is generated. The chatter notifies the user to add more buffing material. Flat pads also have problems getting the buffing material out to the edge of the buffing surface. This limits the size of the area which can be buffed effectively.  
         [0005]     Another type of pad is a “waffle” pad. The waffle pad has a convoluted buffing surface which reduces chatter. However, it can cause the buffing material to spatter. The buffing surface allows the buffing material to reach the outer edges of the buffing pad, but it does not stop there. It is thrown out beyond the edge of the buffing surface and can end up in areas which are not being buffed. Additional clean-up is necessary to remove the unwanted buffing material.  
         [0006]     Therefore, there remains a need for an improved buffing pad which reduces chatter and spattering of the buffing material.  
       SUMMARY OF THE INVENTION  
       [0007]     The present invention meets this need by providing a buffing pad which allows good contact between the buffing surface of the buffing pad and the substrate to be buffed without generating excessive heat, and which reduces spatter of the buffing material.  
         [0008]     The buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween.  
         [0009]     Another aspect of the present invention is a method of making the buffing pad. The method includes providing a pad support having a first surface and a second surface; providing at least two concentric rings of resilient foam, the concentric rings having an attachment surface and a buffing surface; positioning the concentric rings on the first surface of the pad support so that there is a gap between the concentric rings; and securing the attachment surface of the concentric rings to the first surface of the pad support. 
     
    
     BRIEF DESCRIPTION OF THE DRAWINGS  
       [0010]      FIG. 1  is schematic of the buffing surface of one embodiment of the present invention.  
         [0011]      FIG. 2  is a schematic of the buffing surface of another embodiment of the present invention.  
         [0012]      FIG. 3  is a schematic of the buffing surface of another embodiment of the present invention.  
         [0013]      FIG. 4  is a schematic of a schematic of a cross-section of one embodiment of the buffing surface of  FIG. 3 .  
         [0014]      FIG. 5  is a schematic of a cross-section of another embodiment of the buffing surface of  FIG. 3 .  
         [0015]      FIG. 6  is a schematic of a cross-section of another embodiment of the buffing surface of  FIG. 3 .  
         [0016]      FIG. 7  is a schematic of a cross-section of one embodiment of a two sided pad.  
         [0017]      FIG. 8  is a schematic of a cross-section of another embodiment of a two sided pad. 
     
    
     DETAILED DESCRIPTION OF THE INVENTION  
       [0018]     The concentric ring design of the present invention allows for maximum contact between the buffing surface of the buffing pad and the substrate to be buffed, without generating excessive heat. When the buffing pad is attached to the buffing machine, and the machine is turned on, the gap between the concentric rings widens. The widening of the gap between the concentric rings reduces/breaks the surface tension between the buffing pad and the substrate. Breaking the surface tension improves control and generates less heat, therefore, reducing chatter.  
         [0019]     The gap between the concentric rings also allows for efficient movement of wax or polish from the inner ring to the outer ring(s). As pressure is applied to the buffing pad, the wax or polish is pressed to the surface being buffed. This helps to trap wax or polish where it is needed most, limiting the amount of wax or polish being slung out beyond the outer edges of the buffing surface. As the pressure is released and the pad flattens out, the wax or polish is easily transferred to the entire buffing surface, limiting the amount of wax or polish slung out beyond the outer edges of the buffing surface. Therefore, clean-up of the excess wax or polish is either minimal or not needed.  
         [0020]      FIG. 1  shows one embodiment of the buffing pad  5  of the present invention. The buffing pad  5  is typically circular in shape. The buffing surface  10  of the resilient foam pad  15  includes three concentric rings  20 ,  30 ,  40  of resilient foam.  
         [0021]     The concentric rings can be made of the same type of resilient foam, different types of resilient foam can be used in two or more of the rings, or a blend of resilient foams can be used within each ring. The resilient foam can either be opened cell or closed cell foam. Suitable foam includes, but is not limited to, polyurethane foam, and is commercially available from various foam manufacturers and fabricators.  
         [0022]     As shown in  FIG. 1 , the widths  25 ,  35 ,  45  of the three concentric rings  20 ,  30 ,  40  are all different. The inner concentric ring  40  has the widest width  45 , while the middle concentric ring  30  has the smallest width  35 . However, the widths could all be the same, or some could be the same and some different. In addition, the location of the widest and narrowest concentric rings could be varied.  
         [0023]     There is a gap  50  between concentric rings  20  and  30 , and a gap  55  between concentric rings  30  and  40 . The gap is typically in the range of about 1/16 in. to about ⅛ in., but it can be smaller or larger, if desired.  
         [0024]      FIG. 2  shows another embodiment of the buffing pad  105 . In this embodiment, buffing surface  110  of the resilient foam pad  115  includes three concentric rings  120 ,  130 ,  140  of resilient foam. As shown in  FIG. 2 , the widths  125 ,  135 ,  145  of the three concentric rings  120 ,  130 ,  140  are all different. The widest concentric ring is  120  and the narrowest is  140 . There is a gap  150  between concentric rings  120  and  130 , and a gap  155  between concentric rings  130  and  140 .  
         [0025]      FIG. 3  shows a third embodiment of the buffing pad  205 . The buffing surface  210  of the resilient foam pad  215  includes two concentric rings,  220 ,  230 . The width  225  of concentric ring  220  is about the same as the width  235  of concentric ring  230 . There is a gap  255  between concentric rings  220  and  230 .  
         [0026]      FIG. 4  shows a cross-section of one embodiment of the buffing pad  205  of  FIG. 3 . The buffing surface  210  is on one side of the resilient foam pad  215  and the attachment surface  265  is on the other side of the resilient foam pad  215 .  
         [0027]     In this embodiment, the two concentric rings  220 ,  230  have the same thickness  227 ,  237 . There is a gap  255  between the concentric rings  220  and  230 .  
         [0028]     There is a pad support  270  with a first surface  275  and a second surface  280 . The first surface  275  of the pad support  270  is secured to the attachment surface  265  of the resilient foam pad  215 . The second surface  280  of the pad support  270  has a releasable connector  285 . The releasable connector can be attached to the second surface  280  of the pad support  270 . Alternatively, the releasable connector can form the pad support, if desired. Suitable releasable connectors include, but are not limited to, hook and loop connectors. One part of the releasable connector is on the pad support, while the complementary connector is on the backing plate of the buffing machine (not shown).  
         [0029]     A radius  290  can be formed on the outer edge of the resilient foam pad  215  to enhance buffing and engagement characteristics, if desired.  
         [0030]      FIGS. 5 and 6  show alternative embodiments in which the thickness of the concentric rings varies. In  FIG. 5 , the thickness  237  of concentric ring  230  is greater than the thickness  227  of concentric ring  220 , while in  FIG. 6 , the thickness  227  of concentric ring  220  is greater than the thickness  237  of concentric ring  230 .  
         [0031]     The buffing pads can be made by cutting foam pad into concentric rings having the desired size. The concentric rings can be made of the same foam material, or they can be made of different foam materials, if desired. The concentric rings are arranged on the pad support with a gap between them and secured to it, generally with an adhesive. The concentric rings are typically permanently secured to the pad support, although they could be releasably secured, if desired. The pad support can have a connector attached to the other side, either before or after the concentric rings are attached. The outer edge of the foam pad can be ground into a radius, if desired.  
         [0032]     Although embodiments with two or three concentric rings have been shown, more rings can be used, if desired. There can be two or more concentric rings.  
         [0033]     The buffing pad can be dual-sided, if desired. For example, two buffing pads could be used with the pad supports back to back, as shown in  FIG. 8 . There could be a center mounting ring so that the dual-sided buffing pad can be attached to the buffing machine. The pad supports could be secured to one another, such as with adhesive, hook and loop connectors, etc., as is well known in the art. Alternatively, two resilient foam pads could be attached to a single pad support, as shown in  FIG. 7 . There could be a center mounting ring for attachment to the buffing machine. Other arrangements for dual-sided buffing pads are well-known to those of skill in the art.  
       EXAMPLE 1  
       [0034]     Buffing pads were made according to the present invention with two concentric rings. The inner ring was 4½ in. in diameter with a ⅞ in. centering hole (1 13/16 in. width) and 1¼ in. thick. The outer ring was 8 in. in diameter (1¾ in. width) and 1¼ in. thick. Both the inner ring and the outer ring were made of open cell, polyurethane foam pad.  
         [0035]     The buffing pads were tested and compared to two commercially available foam pads. Each set of pads was tested with the same compounds and glazes, and each pad was evaluated for scratch removal/surface clean-up and gloss level. The testing was conducted on panels sprayed with basecoat and clearcoat. The clearcoat was allowed to air dry for 16 hrs. on one panel and for more than 48 hrs. on another panel. Each panel was sanded with 1500 grit sandpaper on a dual action (DA) sander, wet 1500 grit sandpaper by hand, and wet 3000 grit sandpaper on a DA sander. Each sanded area was buffed with the pads and compounds and glazes, and the pad performance was evaluated.  
         [0036]     The buffing pads of the present invention showed improved cutting capability, control, finished surface, and gloss level as compared to the two commercially available buffing pads.  
         [0037]     When pressure is applied to the buffing pad of the present invention, the pad opens up, creating a larger buffing surface. More cutting action is created by having this larger buffing surface, therefore effectively removing any sand scratches or imperfections in the paint or clearcoat. As pressure is released, the pad flattens out. This flattened surface is the ideal buffing surface to provide a swirl-free, high gloss finish. The pad of the present invention provides a user with a buffing pad that can remove sandscratches and imperfections, while providing a clean, high gloss finish.  
         [0038]     It will be obvious to those skilled in the art that various changes may be made without departing from the scope of the invention which is not to be considered limited to what is described in the specification.
A buffing pad. The buffing pad includes a pad support having a first surface and a second surface; and a resilient foam pad having an attachment surface and a buffing surface, the attachment surface of the resilient foam pad secured to the first surface of the pad support, the resilient foam pad comprising at least two separate concentric rings of resilient foam, the concentric rings being positioned so that there is a gap therebetween. A method of making the buffing pad is also disclosed.