This substitution can disrupt the regular arrangement of atoms, leading to increased disorder within the material. Computational methods by Forslund and Ruban 66 on how Ti inclusions affects the cubic structure and the overall properties of AlxTi1-xN alloys have been used to understand the thermodynamic driving forces influencing coating formation during the CVD process. Their calculations were compared with experimental observations, particularly regarding the preferential growth of certain facets and the segregation of Ti atoms to the surface during the growth of Al-rich films. They revealed that the surface energies of random AlxTi1-xN alloys exhibit minimal dependence on composition, with a significant increase in Ti segregation tendency occurring near pure AlN. The greater the concentration of Al, the more pronounced the segregation of Ti to the surface becomes. In our case, as a result, the presence of high aluminum content hinders the formation of a well-defined crystalline structure, promoting an amorphous phase instead. This amorphous nature leads to a loss of long-range crystalline order of TiN. Notably, an amorphous structure is often considered advantageous for certain applications e.g., corrosion-resistant coatings due to the absence of defective grain boundaries. Even though this is a shortcoming in hard coating applications, the behavior is significant in other applications where such specific material properties are desired, for example diffusion barriers in microelectronics.