In particular, we have shown that laser power, the NA of the objective, the chemical nature of the resin and, most importantly, the inter-spot distance of the projected motifs are particularly determining factors that have a strong influence on the strength of these proximity effects. Attempts to model these effects through digital simulations revealed a predominant influence of diffusion processes on the characteristics of the intensity of these proximity effects. More precisely, the characteristic diffusion length and time dependence of the diffusion phenomenon led us to formulate the hypothesis of short lived radicals being the diffusing species. As a support to this hypothesis, we showed that the introduction of ppm amounts of a free radical inhibitor (MEHQ) into the hybrid Ormocomp photoresist, in which proximity effects were particularly strong, led to a marked reduction of the range of these effects. With these considerations in mind, we have proposed a plot strategy that enables these proximity effects to be largely circumvented. This strategy consists in generating patterns with a targeted small inter-structure distances through small displacements of a large interspot spacing DOE generated spot arrays. Despite the limited beam density in the fabrication area, imposing a compromise between DLW throughput and proximity effects, the proposed strategy represents an important step towards massively parallelized high-resolution additive fabrication. We have clearly illustrated that our strategy is efficient in bypassing proximity effects and thus in obtaining sub-micron resolution structures with high reproduction fidelity and greatly reduced fabrication times compared to the single beam approach.