Alternatively, a more computationally efficient approach is to use a QM/MM method, where metal atoms and reactive adsorbates are described with QM, while the surrounding solvent is treated classically. Such QM/MM has been recently enabled by the development of accurate force fields for the metal-water interaction, and this approach was recently utilized to calculate the free energy of adsorption of benzene and phenol on Pt (111). This prior work, based on rigorous AIMD or QM/MM, demonstrates that solvation can, in specific cases, have a profound role upon the adsorption at metal/water interfaces, specifically leading to a dramatic decrease in the adsorption energy as compared to the gas phase. Herein, we demonstrate that these observations are quite general, applicable for a wide range of organic adsorbates and metal surfaces. Furthermore, we show that beyond merely modulating the strength of adsorption, the conformation/adsorption mode of the organic can also be profoundly modified by solvation. Thus, in many common cases, neither the changes in adsorption strength nor conformation can be properly described by ubiquitous continuum solvation models. Critically, we also propose a simple phenomenological model to correct simple implicit solvation models to achieve semi-quantitative agreement with results obtained from explicit solvation, and further extend the model to account adsorption under applied potential at electrified metal interfaces.