The crystallinity of deposited films was studied using a PANalytical EMPYREAN MRD XRD with a Cu-anode x-ray tube and 5-axis (x-y-z-v-u) sample stage in grazing incidence (GIXRD) configuration with a 0.5 o incident angle. PANalytical X'Pert PRO with a Cu-anode tube and Bragg-Brentano HD optics was used for X-ray Reflectivity (XRR) mode to measure the thickness of the films. From the XRR measurements the software PANalytical X'Pert reflectivity was used to fit the data using a two-layer model, AlN/substrate. A LEO 1550 Scanning electron microscopy (SEM) with an acceleration energy of 10-20 kV was used to study the morphology of the films. Kratos AXIS Ultra DLD X-ray photoelectron spectroscopy (XPS) equipped with Ar sputtering was used to analyse the composition (5% error margin of the atomic percentage) and chemical environments in the films. The composition of the films was obtained after clean sputtering the surface with Ar beam energy of 0.5 KeV with a sputtering area of 3 mm 2 for 600 s. CasaXPS software was used to evaluate the data. Gaussian-Laurentius functions and Shirley background were used to fit the experimental XPS data.