In the second batch, the power supply for the sputtering system was an Ionautics high-power impulse magnetron sputtering (HiPIMS) power supply, with an average power of 1000 W, frequency of 900 Hz, with an impulse duration of 65 μs. The substrate was biased at 100V, with a frequency of 900 Hz and an impulse duration of 195 μs.