The large accumulation of the Cl -ions at the brush-bulk interface at significantly high electric field strength is the main reason for the non-linearly high EOS flow strength and the EOS volume flow rate. Here we try to unravel how the electric field orients and deforms the brush layer, which in turn leads to this specific counterion distribution. For this purpose, we first study the variation in the brush height as a function of the electric field strength [see Fig. ]. We find that the brush height decreases [as was indicated earlier by Fig. ] as the electric field strength increases [see Fig. ]. The key question is: How does the brush respond to the applied electric field that causes such a height reduction? Fig. (b) shows the average chain profile of the brushes for different electric field strengths. It suggests that with increasing electric field the chains tilt and at the same time the end of the chains becomes more tangential or parallel to the surface. Furthermore, there appears to be a slight bend near the inside of the brush region (<24 Å) for larger electric field strengths. Therefore, for larger electric field strengths, a combination of tilting and bending reduces the brush height. We shall next aim to quantify such tilting and bending as well as the end of the chains becoming parallel to the surface.