Usually, two types of compounds are used as precursors for CVD, namely silver nitrate (AgNO3) and silver (1) complex such as perfluorinated carboxylates. AgNO3 is widely used as precursor in techniques such as Flame Assisted CVD and Atmospheric Pressure CVD . The Flame Assisted CVD (FACVD) enables the deposition of metallic silver layer of thickness 60-90 nm [70], when the substrate surface is heated this technique facilitates the deposition of silver metallic layer having thickness of 60-250 nm . The FACVD method allows the formation of nanocomposite coating of Ag metal oxides (e.g., TiO2 and SiO2) in deposition process on large substrate area . Atmospheric Pressure CVD is used to produce nanocomposite coating on textile surface which is composed of silicon with incorporated AgNPs . Silver(I)acetate and silver (I) trifluoroacetate cannot be used as a precursor in conventional CVD methods such as Metal Organic CVD (MOCVD) and Plasma-Enhanced CVD (PECVD) due to their weak volatility, however continuous films of pure silver were deposited by these compounds with the help of Laser-Inducted CVD (LICVD) . Silver(I)penta-fluoro-propionate is considered as a good organic Ag CVD precursor since layers of AgNPs of diameter 20-60 nm were obtained on the surface of Si (111) substrate after 5 minutes of CVD process at 563K . The CVD method enables scalability, purity, uniformity and control over the size and shape of nanoparticles. However, the process is costly .