To improve adhesion of the SU-8 photoresist to the metallized substrate, we used an in house developed procedure to chemically modify the metal surface. This procedure is here described for the first time. The procedure results in a self assembled monolayer of partially hydrophilic alkyl thiol chains with a carboxilic terminal group. The thiol attaches to the Pt metal, and the carboxilic terminal group improves adhesion to the photoresist in comparison with the bare metal or other commonly used hydrophobic alkyl-thiol self assembled monolayers. A solution of 57.7 mg of 16-Mercaptohexadecanoic acid in 385 ml of ethanol, with 10 ml of dionized water, and 5 ml of acetic acid was ultrasonicated at 60 • C for 5 min. Ultrasonication was repeated before each use of the solution to avoid the presence of agglomerates. The substrates were immersed in the solution for 10 min at 70 • C. The samples were then rinsed by spraying with isopropyl alcohol while spinning at 4000 rpm and then blow dried with nitrogen.