Similar observations were also made for the Li-induced reactive decomposition of thick BMP-TFSI films. The BEs of initial BMP-TFSI reaction products corresponding to those in the monolayer system and of the binary compounds appearing upon Li post-deposition are indicated at the top of the respective panels in Figure . Also in this case, Li post-deposition lead to XP spectra that are consistent with the calculated BEs of the initial reaction products (high-BE components) and, in particular after subsequent annealing, of the binary compounds (low-BE components). BEs of further possible bulk reaction intermediates where listed in our previous study. The high-BE components are compatible with all three initial reactions (N -S, S -C, C -F bond breaking), very similar to the trends observed for reaction of Li with the monolayer film. This agreement further supports our earlier conclusion that the presence of the graphite substrate does not severely modify the pathway for the reactive, Li-induced decomposition of BMP-TFSI. Although we have no direct proof for this assumption, we assume that also subsequent reaction intermediates formed by further reaction of the initial reaction products (Table ), until finally arriving at the binary compounds listed in Table , are identical in both cases.