A high-quality G 0 film is formed on the array, showing a smooth surface (Figure ) and defined fingerprint Raman bands of graphitic materials (Figure ). The same coated array was also submitted to a new deposition layer of SiO2, confining the film within a dielectric/conductive/dielectric layered conformation. This conformation closely resembles the one in SoP, in order to guarantee thermal conductivity while electrically insulating the thermal sinking layer from the surroundings. The SEM/EDX image with overlaid and segregated C, O and Si elemental maps reveals the elemental compositions of the different sections of the partially deposited array, as a function of the elemental composition at the uppermost layer. The elemental maps reveal the Crich surface at the right section (G 0 /SiO2) and the Si and O richer surface of the left section (SiO2/G 0 /SiO2), proving effective the association between film casting and deposition methods to form fully integrated complex layered structures.