Many known PS crystals with 2D dimensionality have been exfoliated to produce one-or few-atom-thin 2D PSs. However, neither the crystal growth nor the exfoliation process are high-throughput, and this method cannot be used for materials with 3D dimensionality. Very recently, Zhou et al. reported a versatile chemical vapor deposition (CVD) method enabling the growth of 8 atomically-thin ternary thiophosphates, as well as 5 quaternary thiophosphate solid solutions. The precursors for sulfur and phosphorus were the elemental solids. Metal chloride powders were used as metal precursors. The vapor composition was simply the evaporated precursors in an Ar/H 2 carrier gas. While this method was designed for atomically thin 2D materials, it may be possible to extend it to grow thicker films of any dimensionality. Some high-throughput capabilities might be engineered in a CVD setup by exploiting temperature gradients at the substrate and in the precursors.