Following the ALD settings from our previous study, made in the same ALD reactor , in the standard ALD growth cycle (A-C cycle) used TEG was pulsed for 0.3 s followed by a 10 s N2 purge, followed by a NH3 pulse for 12 s using a mixture of 50 SCCM NH3 and 100 SCCM Ar, followed by a 6 s purge. To study plasma-activated ALD, 2800 W plasma power was used. The same gas lines and NH3/Ar flows were used for both the thermal and plasma processes. A residual gas analysis (RGA) system was connected to the ALD reactor (located approximately 80 cm from the reaction chamber). The gaseous species and reaction byproducts were measured using a Hiden Analytical HPR-30 residual gas analysis (RGA) vacuum process sampling system that contains a HAL 201 RC mass spectrometer (MS) with a Faraday Cup detector. MS analysis involved collecting both scan spectra and multiple ion detection (MID) of specific ions with an electron impact ionization set at 70 eV, enabling the detection and analysis of gas-phase reaction products. The pressure in the QMS was maintained below 10 -7