The angle of deposition for 500:1 Ar:CH3ONO was altered from α = -10° and α = 20°, keeping the remaining experimental conditions constant (see SM Section 5, Figure ). As stated in Section 3.2, integrating the cis and trans-ν3 transition when CH3ONO was deposited in Ar at α = 20° produced 63% ± 3% cis-CH3ONO and 37% ± 1% trans-CH3ONO. Decreasing the incidence of deposition (towards a more head-on angle) to α = 10°, we observe no statistically significant (outside of the largest reported 1σ error) change of the cis and trans abundances, with observed cis and trans abundances of 62% ± 3% to 38% ± 1%, respectively. Once more, the deposition angle was changed by 10 degrees in order to reach α = 0°, where the deposition angle is perpendicular to the cold substrate. In this head-on configuration, we again observe the cis conformer abundance to be 62% ± 3% and the trans conformer abundance to be 38% ± 1%. Finally, the angle of deposition was altered past perpendicular by 10 degrees, to α = -10°. We once again do not observe a statistically significant change in conformer abundance, resulting in 61 ± 3% cis and 39 ± 1% trans-CH3ONO. The cis and trans isomer abundances quantified in an Ar matrix across the angles within this study never approached the ratio observed in the gas phase, as shown in Fig. . The cis and trans conformer abundances of N2 and Ar matrices deposited at different angles are summarized in Table .