optical microscope image of the Braille inscription on Material 3 written using the Horiba laser system operating at 638 nm and 2.4 mW. The pits in each corner served as fiducial markers and were generated using a higher laser power setting (638 nm, 5.4 mW). The raised dots could be erased by heating at 160 °C for 5h but the pits formed by ablation were not erased (top middle); stylus profilometry image of the inscription before and after heating (top right). Programable lithography: Reference image (bottom left), optical microscopy image (bottom middle) and stylus profilometry image (bottom right) of the "Micro Lisa" pattern etched into Material 1 using the Horiba laser system (532 nm, 1.3 mW). The wider and deeper lines of the frame were generated using a higher power laser setting (532 nm, 3.0 mW). The coordinates for the erasable information coding and programable lithography are provided in the Supporting Information (Data S1).