Cui, et al. have proposed that higher viscosity increases the resistance of outward particle flow, but many physical parameters were simultaneously changed, including contact angle, surface tension, and evaporation rate. Noguera-Marín, et al. proposed a relationship between collective diffusion during convective assembly and viscosity. An increased viscosity has also been attributed to delaying meniscus displacement. In this article, for the first time, we study the effect of viscosity on evaporative flux as an isolated parameter. Silica particles are used as model systems, both spherical and in the form of nanoribbons, assembled using dip-coating. We investigate particle assembly in both single and binary dispersant phases and show that surface tension gradients formed during evaporation in the binary system heavily impact assembly patterns. Finally, we show how evaporative flux in a binary solvent system leads to differences in self-assembly patterns. Control over particle patterning is of interest as scaffolds for biological media, for optically active substrates, and as masks for substrate processing.