Finally, ALD runs with a thermal ammonia step were conducted to study if the Bpulses render surface reactivity towards thermal NH3. B-pulses without plasma and no Bpulse, i.e. an all-thermal ALD process with TEG and NH3 rendered no film. Both Ar-and H2-plasma as B-pulse lead to deposition of a film with a thermal NH3 pulse, where the GPC was higher for the H2-plasma, 0.2 Å/cycle, and 0.1 Å/cycle, respectively. These films were found to be X-ray amorphous and have much lower GPC compared to those made using NH3 plasma. All GPCs obtained in this study are summarized in Fig. . ERDA analysis of these films showed very high oxygen content (57-75 at.%), low gallium content (12-38 at.%), and almost no nitrogen (1-5 at.%). We assign this to severe post-deposition oxidation, the films were stored in the air several days prior to ERDA analysis and interpret these contents as an indication of the very poor quality of the films.