The rapid thermal deposition (RTD) method is based on the evaporation-induced crystallization concept. It consists of immersing the porous support in the precursor solution of ZIFs materials followed by heating the soaked support in an oven at temperatures of 180-200 o C for a short time (15 min). This step promotes the flow of the precursor solution inside the support. The precursor solution is then evaporated for crystallization homogeneously inside and heterogeneously outside the support.