Hammee analysis suggests that electron-rich and electron-deficient aryl bromides behave differently in this system. Thorough invesQgaQon of the order in catalyst, aryl bromide, and base along with influence of parQal pressure of CO and H2 was conducted for both electron-rich and electron-poor substrates. These studies revealed that while both types of aryl bromide substrates exhibit similar kineQc behavior, more electron-rich aryl bromides react faster and more selecQvely, with less formaQon of hydrodebrominaQon side-products. For both electron-rich and electron-poor substrates, product raQos are dependent on CO pressures, with increasing amounts of hydrodebrominaQon at lower CO pressures. DFT calculaQons were used to probe the plausible mechanisms for the oxidaQve addiQon, migratory inserQon, H2 acQvaQon, and reducQve eliminaQon steps. QuanQtaQve predicQons from these calculaQons were compared with acQvaQon parameters acquired from an Eyring analysis and KIE acquired from side-by-side reacQons with H2 and D2.