The high stability of N2 and H2 gas at equilibrium causes the surface to become uncovered at higher temperatures. This is a challenge for the CVD and ALD growth as the surfaces would decompose during a high temperature process if enough time is passed. This equilibrium decomposition is most noticeable for InN where the surface is bare already at room temperature, a temperature much lower than the one needed for CVD and ALD growth. Overcoming this problem leads to the need to shift the process from the thermal equilibrium, either by not allowing enough time for the NHx to decompose into N2 and H2 or by using a plasma enhanced process.