These observations clearly indicate and confirm the SSP concept reported in previous publications for amine stabilized alanes transferable to the comparable and more stabilized compounds 1 -3, 7 and 8 presented in this study. These findings also show a high reactivity in general and more specific towards relevant co-reactants such as NH3 and H2 that could enable thermal ALD for AlN and Al thin film deposition, respectively. Thus, to substantiate this hypothesis, in terms of structure and reactivity of these precursors, we conducted a detailed computational study of three representative precursors, namely compounds 2, 4 and 7.