In recent years, Atomic Layer Deposition (ALD) has become an extremely versatile and precise method for producing thin layers of a wide variety of materials on surfaces. With its ability to conformally deposit materials of excellent quality layer-by-layer and with atomic precision All experiments were performed using a UHV apparatus (base pressure of 2.0 x 10 -10 mbar) for surface science studies at the Friedrich-Alexander-Universität Erlangen-Nürnberg, Germany.