It thus seems that a stabilizing step is needed in between the plasma pulse and the precursor pulse to be able to study the surface adsorption during the precursor step. It should be noted that excessive cooling of the QCM may lead to unwanted precursor condensation rather than adsorption on the cold surface. We therefore employed a stabilizing step, and the QCM data in Fig. indicates a saturation of the surface adsorption, approximately 2 s into the precursor purge (white areas). Ensuing the saturation event, the plasma pulse (grey areas) shows a decrease in mass evolution, which is shown to be connected to a signal perturbation by the plasma in Fig. . In the following step, Precursor Off/Plasma Off (blue areas), the signal starts to stabilize, which is in line with the perturbation connected to the plasma electrons. This kind of measurement, where the precursor and the plasma are sequentially introduced allows the possibility to study the surface adsorption of the electronassisted CVD process where plasma electrons are used as reducing agents more closely. To study the reduction step, a combination of multiple in-situ techniques will be necessary to understand what happens when the plasma electrons interact with the surface.