For both substrates, EBL was used to define 300 nm to 2000 nm diameter nanodisc patterns. Then, a 50 nm of Au with 2 nm Cr was evaporated. The following lift-off was performed by dip into an organic solvent, N-Methyl-2-pyrrolidone (NMP) heated up to 100 • C until the metal-on-resist layer was floated. Then, samples were washed in acetone and methanol, dried by air blowing resulting in final transparent MIM windows (Fig. ) used for characterisation.