When Cr thickness was increased to 50 nm to aid in absorbance, spectral behaviors changed drastically. The reflectance at shorter wavelengths was further suppressed due to absorption in Cr, although this also involved the reduction in metasurface quality factor and an increased resonance linewidth. Furthermore, the minimum anti-reflection parameter range became broader than that for a thinner Cr layer. In case of SiO 2 = 100 nm, reflectance became less than 10% throughout the 2-to-6 m wavelength window. The thermal radiation output was also considerably improved compared to the MIM design using 5 nm Cr thickness, with maximum radiation exceeding 90% emittance. This illustrates that, due to absorption in the Cr layer, absorbance in MIM pattern became dominant relative to scattering. This can serve as a guideline for designing metasurfaces that perform closer to the true perfect absorption condition → 1.