A huge impact of the photoresist composition was indeed highlighted by the comparison between an organic resin PR_organic based on a mixture of acrylates (DPPHA and DDA) and a hybrid resin PR_hybrid based on a modified Ormocomp® resist. The same photoinitiator (PI) was used in both resins so that the difference lies in the monomer mixture composition (organic acrylate mixture stabilized with MEHQ on the one hand, unstabilized hybrid resin on the other). As illustrated in Fig. the PR_hybrid is much more reactive than the PR_organic. Thus, fabrication of a development-resistant structure can be achieved with shorter exposure times in the PR_hybrid resist. However, with the unstabilized PR_hybrid resist, it was impossible to control the polymerization features in order to obtain an homogeneous periodic structure: a marked difference was systematically seen when comparing the central and the peripheral spots, with a clear overpolymerization in the center compared to the corners, regardless of the fabricated test structure (1D: single voxel; 2D: L-shape; 3D: cones).