The generation of metallic nanoparticles, nanocrystals and films have been highly dynamic research areas due to their uses and developments for various applications, including imaging, sensing to catalysis. Obtaining the desired metallic materials, free of contaminants, is essential for many applications. In that context, the use of organometallic or metallorganic precursors has shown to be advantageous. Key criteria for choosing precursors include in particular specific reactivity (e.g. ease of reduction or thermolysis), relative stability, and preparation scalability, along with other physicochemical properties such as volatility or solubility in specific solvents to name but a few. Overall, this decision boils down to choosing a suitable set of ligands that at the same time endow their stability and ensure that they can be readily removed to generate the desired (nano-)material, free of organic or other contaminants (e.g., halides or residual carbonaceous species). Of various synthetic methodologies interested in generating clean materials, Surface Organometallic Chemistry (SOMC), has emerged as a privileged approach to provide better-defined catalytic materials such as supported nanoparticles with tailored interfaces and compositions. SOMC enables the interrogation of promoter effects, and the role of interfacial Lewis acidic sites and alloying in heterogeneous catalysis. For SOMC, similar to Atomic Layer Deposition (ALD), one important criterion is to identify precursors that can react selectively with surface functionalities, in particular surface OH groups. Furthermore, volatile precursors can also be of interest for gas phase deposition. All in all, it is not surprising that organometallic compounds have been privileged molecular precursors, due to their relatively high reactivity towards Brønsted acidic OH groups. The ligand residues in the obtained material are removed under mild treatment conditions (hydrolysis or hydrogenolysis), releasing only hydrocarbon byproducts, that do not interact with surfaces; in addition, lighter homologues can often be sublimed at relatively low temperatures. While readily available and reactive for early transition-metal compounds (group 4-6/7), metal precursors with all desired properties are far scarcer for later, and in particular precious, 4d and 5d transition-metals that often contain more complex stabilizing ligands such as phosphines that are not as easily removed. Additionally, group 10 transition metal alkyl precursors are typically less reactive towards OH groups, even leading to alternative grafting mechanisms in some cases (e.g. involvement of siloxane bridges rather than OH groups). Overall, these precursors are either too inert or too reactive and unstable. The prominent examples are allyl derivatives; while convenient for early transition metals to generate well-defined surface species, the corresponding derivatives of group 10, the bis-h 3 -allyl-M(II) (M=Ni, Pd, Pt) compounds, are thermally unstable. They spontaneously decompose at ambient temperature, thus encumbering their general application to SOMC and related approaches, even if used in the pioneering work of Ermakov and Girolami et al. to generate supported nanoparticles and thin-films, respectively. In contrast, amidinate ligands are known to form stable complexes with most transition-metals. They are a popular class of ligands for ALD applications thanks to their basicity, volatility, and ease of decomposition upon reactive gas treatment. Amidinate ligands adopt a bidentate k 2 -mode in monomeric metal complexes, paralleling h 3 -allyl ligands. This prompted us to combine these two ligands and investigate heteroleptic allyl-amidinate complexes of group 10 as SOMC precursors and to explore their reactivity.