For all three impact energies, 1, 10 and 30 eV, chemical sputtering of W in the form of sputtered WOx molecules was observed. It is interesting to point out that in all cases, no individual sputtered W atoms were observed; W was always chemically sputtered in the form of W-O compounds, having lower bounding energy to the system than W. In particular, no W was subjected to physical sputtering, consistent with the findings of the literature that the threshold for physical W sputtering of O is 40 eV . Single sputtered O atoms and O2 molecules were observed. During the irradiation of the W surface by 4500 O atoms of 30 eV, 326 W atoms were sputtered. For the 10 eV O impact case, a total of 72 W atoms were sputtered. In the 1 eV O shots case, 18 W atoms were sputtered. W sputtering for the 10 eV cases commenced after 1000 O impacts (i.e. after deposition of approximately 800 O atoms). After reaching saturation, 3 tungsten atoms are sputtered on average for every 100 O impacts, indicating a tungsten sputtering yield of 0.03 from tungsten oxide ad-layers. On the other hand, after impacts of 1800 O atoms with 30 eV the sputtering of W started after 7.2 ns, with about 15 W atoms sputtered per every 100 O impacts, i.e., the tungsten sputtering yield increases to 0.15. The predominant chemically sputtered species for all three W slabs is WO4, single O atoms, and O2 molecules.