To better understand the time-resolved CVD process (Fig. ), it is also here necessary to understand how the oscillation frequency of the QCM behaves when pulsing plasma electrons on the QCM crystal in contrast to exposing it to a continuous flow of plasma electrons. We explored this by pulsing the plasma in 5 s pulses on the QCM crystal with no flow of FeCp2 in the chamber. This was followed by 5 s with neither plasma nor FeCp2. In line with the signal behavior during a continuous plasma (Fig. ), the plasma exposure perturbates the QCM signal, contributing to a positive frequency shift that subsides, when the plasma is turned off. The magnitude of the frequency shift increases with increasing plasma power (Fig. ), which is in line with exposure to a continuous plasma (Fig. ). We conclude from Fig. and Fig. that the change in the oscillation frequency is not to be trusted during the plasma pulse until it has stabilized. When stabilized, no signal perturbations are present.