Analogously to local probing, potential pulses at scanning nano/micro-electrodes have been used for driving local reactions at a substrate. Confined electrochemical etching, also referred to as micro/nano machining, has demonstrated a feature size of ~200 nm , where the duration of the pulse has been shown to influence the extent of the electrochemical etching rate through the distance-limited EDL charging . In contrast, the reverse reaction of confined electrodeposition has proven to be more difficult to implement for continuous nanostructuring . Alternative electrochemical scanning probe deposition methods can reach small feature sizes (<10 nm), but the deposits are typically limited to single clusters . As such, free-form electrochemical writing is most successfully shown with nozzlebased approaches (through mechanisms such as electrohydrodynamic jets , local ion delivery , or meniscus-confinement ), but are limited to larger scales (>100 nm), typically due to clogging of the smallest nozzles, and, in the case of local ion delivery, due to broadening diffusion profiles . Despite the potential of pulsed electrochemical nanofabrication for high resolution and high throughput additive manufacturing, a clear demonstration of continuous nanoscale electrodeposition using high frequency pulses has so far been lacking .