An ALD process needs to be done at relative low temperature to ensure the stability of the chemisorbed monolayer. Meanwhile, a sufficiently long purge time is also required to eliminate unwanted chemical reactions of physiosorbed molecules. In fact, our ALD work was done in a temperature range higher than the typical InN ALD window of 150-300 °C. Considering the difference in film deposition observed in Figs. and at different temperatures and the thermal stability of TMI, our ALD of InN is likely to involve several In-species. TMI is considered to be stable up to 300 °C. Between 300 and 325 °C, TMI is reported to decompose fractionally to dimethylindium (DMI) and methyl radicals by homolytic cleavage of one In-C bond. DMI has also been suggested as a stable surface specie in ALD of InN from TMI. We, therefore, consider DMI as the main chemisorbed In-species on the surface below 325 °C and the overall surface reaction remains controllable. The reaction will eventually become uncontrollable by further increasing the temperature.