The possibility for TEB to dissociate by β-hydrogen elimination, a well-known low temperature decomposition pathway, means that CVD of BxC from TEB can be done at a lower temperature compared to TMB. Conformal CVD of BxC films by thermal CVD has been reported by Souqui et. al. from TMB where atomic hydrogen or dihydrogen was suggested to act as surface inhibitor, at 700 °C. This process yielded carbon rich films with a B/C ratio of 0.5 -0.7. The material properties of BxC films are depending on the B/C ratio being close to 4, making the conformal CVD process with TMB of less interest.