Scanning electron microscopy (SEM, ZEISS Gemini 450) was used to study morphological features of the cathode structure before and after the coating procedure. A focused ion beam (FIB, Helios 5UC, ThermoFisher Scientific) equipped with an energy dispersive X-ray spectroscopy (EDS) was used to detect the deposited thin film on the NMC811 substrate and prepare transmission electron microscopy (TEM) sample. Properties of the surface evolution after the PEALD step, as well as the thickness of the coating layers, were also figured out by transmission electron microscopy (TEM, ThermoFisher Scientific Talos F200X G2) equipped with an EDS. Selected area diffraction (SAED) was conducted to explore the crystallography of the materials. To analyze the Al2O3 and MoO3 PEALD coatings, a Philips X-Pert Multipurpose Diffractometer was employed to record the X-ray diffraction (XRD, Rigaku Smartlab 9kW XG) patterns within 10 to 80° at a scan rate of 8° min -1 , the scanning step at 0.01°, and a Cu Kα radiation of 1.5406 Å. X-ray photoelectron spectroscopy (XPS) employs a PHI5000 Versa Probe III surface analysis scanning XPS microprobe. The XPS spectrum was deconvoluted using XPS PEAK 41 software, the background type was Shirley.