The current collectors were then subjected to soft baking at 100℃ for 1 minute, in order to remove any residual solvent. The dried-films were later exposed to near-UV laser irradiation (450nm, 2.8W, Zmorph Fab) at various lasing parameters of power, speed, defocusing and raster spacing to create the sulfur-graphenic cathodes. Please note, that higher, up to 70 wt/wt % of Sulfur/Resin, content ratios can be currently applied for further increasing cell capacity if so required, along the preparation of one-step slurry-based single layer deposition of higher thicknesses, by well-known slurry-based film formation approaches.