Fig. plots Rsublimation vs. mass for 23 carbon NPs at 1900 K. The main point of interest is that, despite the fact that the EEO2 values varied by orders of magnitude, Rsublimation varied by only a factor of ~3 over the entire set of NPs, and for each NP type, the individual NPs varied by only ±40% from the average values. Note that the graphene oxide and nano-onion NPs (Figs. and) that had EEO2 5 to 20 times higher than average for those materials, still had sublimation rates within 15% of the average Rsublimation values. These data, therefore support the conclusion noted above (cf. Fig. ) that while both sublimation and oxidation are sensitive to the distribution of NP surface sites, O2 etching chemistry is a far more sensitive probe. In part this undoubtedly reflects the higher TNP range where sublimation occurs, but in addition, it is reasonable to expect that the concerted O2 dissociation/C-O bond formation required for oxidation should be strongly dependent on the number and type of under-coordinated surface sites.