Only two computational studies focus on modelling of AS-ALD using activation approaches. In both cases, the modeling does not comprise the activation step itself, electron-beam induced deposition (EBID), but instead focuses on the chemoselectivity of adsorption for the resulting surfaces. Thus, as outlined above, the type of computational studies that is carried out parallels the modeling of intrinsically-selective AS-ALD. While modeling studies exist for plasma-based ALD, none of these studies focusses on AS-ALD.