In another study, Ti-organic films were deposited using TiCl4 and the homo/hetero bifunctional aromatic molecules hydroquinone (HQ), 4-aminophenol (AP), p-phenylenediamine (PDA) and 4,4′oxydianiline (ODA). All films were deposited on a Si surface. All four processes yielded amorphous Ti-organic films. A growth rate of 10-11 Å/cycle was achieved for the for the TiCl4-AP process, which is higher when compared to the growth rates 4.3 Å, 1.2 Å and 1.4 Å for TiCl4-HQ, TiCl4-PDA and TiCl4-ODA processes, respectively. The results are attributed the higher reactivity of OH group with TiCl4 in comparison to the NH2 group and the higher tendency of the heterobifunctional organic precursor to orientate in an upright configuration and avoid unwanted double reactions on the surface. TiCl4 was also coupled with 4,4 -oxydianiline (ODA) to deposit the (-Ti-N-C6H4-O-C6H4-N-)n thin films. Films were deposited on an Si surface in two temperature ranges, 160-230 °C and 250-490 °C.