The main goal in this computation was to obtain instantaneous values of the surface parameters, for example, to differentiate between O reflection and sputtering processes, which were not distinguished in the cumulative simulations. We observed only sputtering yields of O atoms. The process of formation and uptake of WOx that carries chemical sputtering of tungsten is too slow to be detected on a scale of single impact cascade of a few picoseconds. On the other hand, the applied impact energies of O are below the threshold for physical sputtering of tungsten. Thus, the sputtering of tungsten was not seen in the noncumulative irradiation of oxidized tungsten layers.