However, this technique suffers from long plot times for large samples (up to days for objects with dimensions in the millimeter range), which currently slows down its entry into the industrial applications market . To overcome this major limitation, different strategies have been implemented such as the use of galvanometer scanners to increase the scanning speed, whether or not in association with multi-focus spot setups. Multi-foci can be provided by microlens arrays (MLA), spatial light modulators (SLM), ultrafast random-access digital micromirror devices (DMD) or diffractive optical elements (DOE) . In all these strategies, massive parallelization increases throughput by increasing the number of focal spots used simultaneously so that large areas or arrays of periodic structures can be written in the same time frame traditionally used to fabricate a single structure with a single beam.