Many Ti-organic MLD processes have been developed by using different aromatic molecules as organic precursors. In ref , TiCl4 was coupled with 4-aminophenol (AP) to deposit Ti-(O-C6H4-N=) thin films with an essentially ideal growth rate of 10-11 Å/ cycle at a temperature range of 120-160 °C. The deposited films were high quality and stable in air. The high growth rates are attributed to the rigid structure of AP and the fact that Cl ligands of TiCl4 are small and do not cause steric hindrance.