In our previous work, we presented XRR measurements on bare liquid copper and liquid copper fully covered with a graphene layer grown by chemical vapor deposition (CVD) at ~1400 K, where CH4 was used as the precursor gas in the mixture of Ar/H2. Here, we use the data obtained during three different growth experiments: growth 1, growth 2, and growth 3, where the CH4/H2 ratio was 13×10 -3 (constant flow), 9×10 -3 (injection after accumulation for 30 s followed by a constant flow), and 13×10 -3 (injection after accumulation for 20 s followed by a constant flow) respectively. The videos of the growths recorded with an optical microscope and a digital camera are available in the Supporting Information (SI). The typical curvature of the molten Cu drop in our experimental conditions is in the range of 0.1-0.3 m. The preparation time is long enough for the drop curvature to stabilize.