Based on the main reaction product intensities monitored at 150 °C in Fig. , we propose that HN(CH3)2 is liberated both during the TDMAA pulse, and during the NH3 pulse. This is supported by analogous results regarding the reaction mechanism in the plasma-assisted ALD process of TaNx using similar ligand precursors, Ta(NMe2)5 and H2 plasma and thermal ALD of TiN from Ti(NMe2)4 and NH3 and can be illustrated through transamination exchange reactions: