Electrochemical deposition can revolutionize the fabrication of (opto)electronic nanodevices if carefully controlled at the nanoscale. Among its advantages are its relatively small infrastructure costs, low thermal budget and it offers fine dynamic control over reaction kinetics and thermodynamics, which does not exist with any other synthetic method. However, the biggest challenge in integrating electrodeposition and nanotechnology is the controlled down-scaling of chemical reactions down to the nanoscale. This control would provide additional freedom in designing free-form nano-architectures with extraordinary properties and functionalities. One approach to confine growth is by spatially restricting the electrochemical cell or the feeding of precursors, such as in meniscus confined electrodeposition , local dispensing of ions, or electrohydrodynamic jet printing. A different strategy is the direct electrochemical writing with small electrodes. Complex 3D structures have been successfully made at the scale of tens to few hundredths of microns by using scanning microelectrodes, where the size of the electrode and its distance to the sample define the fabrication resolution. At the nanoscale, scanning probes have demonstrated high precision in nanostructuring metal, semiconductor and oxide surfaces under gas or liquid conditions. based on a variety of tip-surface interactions.