Fig. depicts the configura-on of the ASSLIB cell employed in this work. Two FMO thin films, each with an area of approximately 16 x 6 mm 2 and a thickness of around 100 nm, were deposited on a Li1+xAlxTi2-x(PO4)3 (LATP) (Ohara Inc. Japan) substrate with a thickness of about 150 µm. On the opposite side of the substrate, two LiCoO2 (LCO) thin films with nearly iden-cal areas and thicknesses to the FMO films were deposited. Furthermore, a Pt thin film with a thickness of approximately 30 nm was deposited on top of the FMO films for current collec-on, while Pt and Au thin films with a total thickness of around 100 nm were deposited on the LCO films for the same purpose. The deposi-on condi-ons for the FMO and LCO thin films were consistent with our previous report .