The spatial resolution of a photopolymerization reaction is not only influenced by the dimensions of the irradiated voxels, but ultimately also by how far growing radicals species can diffuse away from the irradiated area. The latter parameter can be influenced by multiple factors, such as radical intrinsic mobility and the presence and diffusion ability of radical quenchers, such as for instance molecular oxygen or polymerization inhibitors. Both processes are strongly dependent on the nature and composition of the photoresist.