Experimental EIS data were collected using a two-electrode system. Platinum interdigital electrodes were designed and fabricated on a silicon chip with a silicon nitride isolation layer. The electrodes were deposited using a physical vapor deposition (PVD) method, achieving a flat surface with a roughness of approximately 5 nm. The interdigital configuration increased the effective surface area, and the electrode spacing was set at 10 µm to minimize bulk impedance effects.