To generate chemical contrast nanopatterns with -OH terminal functionalized polymers, we demonstrate a workflow by nanopatterning a first polymer brush monolayer grafted on Si substrate, followed by backfilling a second -OH functionalized polymer brush to graft onto the exposed Si and 541 cm -1 (Supporting Information, Figure ), well within the tool resolution limit to clearly distinguish between the grafted PMMA and polypeptoid brushes of ~1 nm thickness. While the goal here is not to demonstrate the highest resolution possible to pattern polypeptoid brush monolayers, the successful demonstration of nanopatterns with sub-100 nm features using electron-beam lithography, together with the versatile design possible with sequence-defined polypeptoids, makes this sequence-defined polypeptoid brush platform highly attractive for applications that require incorporation of specific chemical functionalities in desired regions.