The patterned-ITO coated quartz substrates (ITO resistance: 20 Ω/square, Qingdao Vatti Glass Co., Ltd) were sequentially solvent cleaned via sonication in ultra-pure water (Millipore Sigma MilliQ Ultrapure Water Purification System) with 2% volume of detergent (Hellmanex III), acetone, and isopropanol for 15 min respectively. These substrates were then dried under compressed air and treated with ultraviolet ozone for 15 min (Jelight UV-Ozone Cleaner) immediately before spincoating PEDOT: PSS. The PEDOT: PSS aqueous solution was filtered with 0.22 μm PVDF syringe filter and then spin-coated onto the cleaned ITO substrates at 4,000 rpm for 60 s (with a ramp of 2000 rpm/s), followed by annealing at 150 °C for 20 min in ambient air. Next, the substrates were transferred to a nitrogen-filled glovebox. After the substrates cooled down to room temperature, 150 uL perovskite precursor was dropped onto the PEDOT: PSS film and spin-coated at 3,000 rpm with a ramp of 2,000 rpm/s for 30 s. Subsequently, the substrates were transferred to a glass petri dish containing 30 μL of DMF vapor for 60 s. The DMF treated petri dish had a resting period of 5 minutes between each substrate to ensure a DMF vapor-rich environment. The petri dish was wiped down with a dry nylon wipe before adding 30 uL of new DMF between spins. Afterward, the substrates were annealed at 70 °C for 5 min in a nitrogen atmosphere to remove any residual solvent. After the substrates cooled down to room temperature, they were moved into a highvacuum thermal evaporation chamber housed within a nitrogen-filled glovebox where TmPyPB (20 nm), TPBi (20 nm), LiF (2 nm) and Al (100 nm) were deposited at 2, 1.5, 0.1, and 3 Å/s, respectively, under a high vacuum of approximately 8×10 -6 mbar. The device area for all devices was 0.04 cm 2 as defined by the overlapping area of the ITO and Al electrode.