Model. One possible approach for increasing the total absorption cross-section involves increasing the absorbance of electromagnetic radiation in metasurface materials. The electricomagnetic field localized inside the SiO 2 insulator layer decays primarily the ohmic loss of the metals in MIM structure. However, Cr metal, widely used as an adhesion layer for noble metal plasmonic structures, exhibits a 5 times higher resistance than that of Au. This higher ohmic loss is expected to increase the rate of optical damping, thereby limit the fraction of energy that is available to be re-radiated by way of scattering to free-space. On the other hand, increasing the conductivity of the insulator layer causes the plasmon resonance to disappear . Therefore, it is important not to compromise insulation between the metal reflector layer and the nanodiscs comprising a MIM structure.