At oblique angles of deposition, the parallel momentum of the incoming CH3ONO molecules enables increased diffusion on the surface compared to diffusion after perpendicular deposition. Increased time on the surface during diffusion leads to the increased likelihood that molecules can desorb into vacuum. However, due to preferential binding of a given conformer to N2, suggested from the 1:1 complex results, we conclude that the enhancement of the lowest energy conformercis-CH3ONO-is a result of a stronger binding interaction during the diffusion process. The binding interaction during diffusion will increase the likelihood that the preferential conformer remains on the surface long enough to become isolated, instead of being desorbed into vacuum. We conclude that, in addition to the energetic preference, the surface morphology of the N2 matrix is highly sensitive to the deposition angle due to the random orientation of the diatomic molecule upon impact. The altered surface morphology with increased deposition angle enables longer CH3ONO diffusion timescales, resulting in enhanced trapping of the smaller cis conformer and subsequent cis abundance enhancement.