Despite the strong potential of the electrochemically mediated growth of III-V to fabricate films and nanostructures in a costeffective manner, the technique is still at its infancy. Particularly, the growth mechanisms are not fully understood and the influence of the electrochemical parameters on important semiconductor properties, such as crystal quality, has not been elucidated. One key parameter in electrochemical deposition is the applied potential, a fine tuning knob for stoichiometry, crystal structure and growth rate that does not exist in any other synthetic method.