show that pulsed deposition can be used for direct-write patterning purposes, achieving a linewidth of cobalt lines of ~50 nm, which can potentially be reduced further by optimizing experimental parameters such as the employed pulse (pulse height and rest potentials), solvent, and the radius of the tip. While the present demonstration is limited to mainly in-plane writing, the changing aspect ratio of the structure at larger pulse numbers suggests that this could be expanded to 3D deposition.