WL interferometry topographs show that FGO-CMMC coatings show higher coverage of these growths on the plated surface (~40-50% in a 3.75 mm 2 area, versus ~10% for GO-CMMCs), however, the footprint of these growths on the GO-CMMC coatings are significantly larger (Table ). The combination of the higher surface area coverage and smaller dislocation growth sizes observed on FGO-CMMC coatings may suggest that FGO co-deposits without aggregation, resulting in a more uniform distribution of the FGO nanosheets within the FGO-CMMCs coating structure. This is in contrast to GO-CMMCs, which show evidence of a lower concentration of larger volume dislocation co-deposits which is a result of GO nanosheet aggregation before deposition. Due to the presence of these dislocation growths, the R a values of both sets of FGO-CMMC and GO-CMMC coatings have increased to > 1 μm (c.f. <300 nm for Cu Ref ). XRD studies reveal information on the microcrystalline nature of the CMMCs produced by co-deposition with graphene (Figure ). The 0.25 and 0.5 A/dm 2 coatings are compared to their equivalent Cu Ref coatings. All coatings show a pattern consistent with pure copper (fcc) with no evidence of lattice strain induced by graphene incorporation. Ni flash layer is absent due to its thinness and amorphous nature. The FGO-CMMC and GO-CMMC coatings display a small diffraction peak at ~9° relating to the (001) diffraction of (F)GO nanosheets within the coating. This can be further deconvoluted into two peaks, as shown in the figure inset, indicative of two crystallographic phases: The dominant peak (at 9.3° and 9.1°) corresponds to restacked FGO and GO with an increased interlayer spacing (9.7 and 9.3 Å), while the weaker peak (at 10.9° and 10.8°) corresponds to more tightly packed native FGO and GO (8.2 and 8.0 Å). The latter values are representative of the (001)-stacking of FGO and GO powders characterised in the ESI (Figure ). In all cases, the relative intensity of the graphitic peaks to the Cu pattern is consistent, suggestive of a similar graphitic concentration within the CMMCs.