The thickness and areal load of the sputtered thin film were analysed using a HORIBA XGF-900 micro X-ray Fluorescence Analytical Microscope (µ-XRF, Horiba Scientific, Japan). The XRF spectra were acquired at a minimum of 5 different spots on the substrate for 300 s using 50 kV X-Ray energy (Rh source), 100 µm polycapillary optics, without an energy filter. The multilayer FPM function was used to determine the amount and thickness of thin films. Calculations were performed based on the intensity of the Lα-line of Au and Kα-lines of Cu and Si.