The HA-NB ink showed a shorter gelation time (tgel = 9.0 ± 0.7 s) than HA-AE (tgel = 21.4 ± 1.2 s). The rapid reaction kinetics of NB is a consequence of the ring strain which is released upon the addition of a thiyl radical. HA-MA showed a longer gelation time (tgel = 42.2 ± 2.4 s) than thiolene inks. This is in agreement with the chain-growth polymerization mechanism in HA-MA and its sensitivity to oxygen inhibition.