A silicon microneedle-embedded SiNPs array was created to support the monitoring of physiological parameters through the skin. Intradermal monitoring requires a robust sensing device that will stay stable and functionalized during the implementation . The fabrication process of the microneedle platform is schematically depicted in Figure . A P-type dopant native silicon oxide wafer was selected, with a crystallographic orientation of (100). The crystallographic orientation of the silicon wafer is of paramount importance in creating vertically aligned SiNPs using the anisotropic etching process of the MACE reaction . Prior to the fabrication process and in order to prevent damage to the nanostructure, the backside of the needle region undergoes mechanical thinning using a dicing saw.