Fig. (f) shows how the % of Cl -ions varies between the "inside the brush" and "brush-bulk interface" regions as one increases the strength of the applied electric field. An increase in the electric field reduces the brush height and there is a progressive decrease in Cinside (which denotes the percentage of Cl -counterions in "inside the brush" region) and a progressive increase in Cinterfaces (which denotes the percentage of Cl -counterions in "brush-bulk interface" region).