iii) Kinetic differences -a reaction kinetics favoring the incorporation of Al will lead to a higher Al content in the AlxTi1-xN films. The reaction between Ti(NMe₂)₄ and NH₃ has been reported with an activation energy of 33.5 kJmol⁻¹. In our recent work on AlN ALD from Al(NMe2)3 and NH3, we reported a lower activation barrier of 27 kJmol⁻¹, meaning that TDMAA reacts more readily. This suggests that Al is more easily incorporated in the films. In this present study, we investigated how the reaction rate (or Ti incorporation) changes with temperature for depositions with a 1:1 precursor molar ratio at 200, 250 and 300 °C. The Ti atomic composition was found to be 3.9 %, 5.8 % and 7.2 % respectively. The differences are not that remarkable but there is a trend that might point towards kinetics preventing Ti from being incorporated.