Figure (a) summarizes FDTD simulated reflectance and absorbance/scattering behavior as a function of a comprehensive MIM metasurface parameter study, including sweeps of SiO 2 thickness from 10 to 100 nm in 10 nm increments, disc diameter from 400 to 800 nm in 100 nm steps, and the ratio of / from 1.5 to 3.0 in 0.5 steps. In both and = abs / sca plots, minimum reflectance (i.e. maximum extinction ) condition is observed along a relatively narrow parameter range band, corresponding to bright-yellow areas. This minimum reflectance condition closely matches the abs / sca = 1 dividing curve (white-band) between where the metasurface is primarily absorbing (red area) and mainly scattering (blue area). Overall, increasing the disc diameter relaxes the constraints on SiO 2 thickness , so that comparable localization can be achieved for larger insulator spacings. Furthermore, increasing nanodisk pattern periods tends to similarly increase the apparent contribution of absorbance, but this is likely due to a simple decrease in the number of dipolar scatterers per unit surface area.