Furthermore, the data indicate that while the initial reaction between adsorbed BMP-TFSI, and in particular between TFSI and Li, is little activated or spontaneous and proceeds already at room temperature, complete Li-induced decomposition of the BMP-TFSI like molecular fragments is highly activated and requires significant annealing. Depending on the final product, the required annealing temperatures vary between > 400 K for N-containing species, >500 K for F-containing species and 650 K for S-or O-containing species. The activation barriers are even higher for removal of the resulting adsorbed binary compounds, reaching 650 K for LiFl-and LiCN-like adsorbates and > 650 K for Li2S-and Li2O-like adsorbed species (Figure ), and rather similar barriers are obtained also for reaction with a thick BMP-TFSI film (Figure ).