indicative of additional BCP grafting. The nanostructure of M2 on the self-brushing workflow is much stronger than that of the non-preferential workflow (compare Figure and). There is a greater quantity of BCP grafted to the self-brushed chemical patterns versus those backfilled with the non-preferential brush, which matches what was observed for the non-patterned substrates. After staining, M2S shows a similar nanostructure to that of M1S, and there are no visible defects in either M1S or M2S. Figure shows tracking of the film thickness (blue, left yaxis) and WCA (right, y-axis) on the unpatterned region, i.e., the PS-OH brush layer, to mimic the wetting behavior of the chemical guiding stripes. Again, we see a continuous increase in film thickness from the substrate to M1 and then to M2, indicating grafting of BCP on each subsequent film application. The WCA data matches the cyclical trend seen for the nonpreferential brush background DSA workflow. Figure shows the thickness dependence of the first and second round of self-healing DSA on non-preferential background substrates for BCP film thicknesses of 𝑡 = 2.0𝐿 " , 2.5𝐿 " , and 3.0𝐿 " . Films with 𝑡 > 3.0𝐿 " exhibited mixed parallel and perpendicular orientation, similar to what was reported previously. Figure shows that as film thickness increases, so does the average grain size of the lamellar structure, as seen before. For all film thicknesses, a majority of the defects were healed during the second round of DSA. While all the defects were healed for the film with 𝑡 = 3.0𝐿 " , some defects remained in the films with 𝑡 = 2.0𝐿 " and 2.5𝐿 " . We hypothesize that this was likely due to slight differences between the chemical guiding patterns resulting in non-optimized guiding patterns for the films with 𝑡 = 2.0𝐿 " and 2.5𝐿 " . Figure demonstrates the robustness of the self-healing process provided by the self-brushed BCP monolayer. While the grafted monolayers were <10 nm thick, their effect on self-assembly propagated through films as thick as 60 nm. Previous studies presented similar degrees of defect self-healing, but these methods all required the use of multicomponent BCP films, typically through loading of homopolymer inks to introduce grafting capabilities. These additional components could lead to increased pattern roughness from the inhomogeneity of the multicomponent film. We hypothesize that our novel self-healing platform can reduce pattern defectivity without increasing overall pattern roughness.