In the realm of materials science and thin film fabrication, the spin coating process stands as an indispensable technique, offering a thin film deposition technique with precise control over film thickness, uniformity, and morphology. Thin film coatings, characterized by their nanometer to micrometer thickness, have become integral in various applications across industries such as semiconductor generation, optical and solar panel coatings, consumer electronics, and biomedical engineering research , owing to the profound impact of thin films on material properties and device functionalities. The spin coating method has emerged as a pivotal step in the creation of high-performance, tailored thin films, in part due to being relatively inexpensive and simple to execute in both research and industrial settings .