We show that it can monitor film deposition during our electron-assisted CVD process, and that the QCM crystal indeed functions as a regular substrate for the CVD process by characterizing the film deposited on the QCM crystal by electron microscopy, X-ray photoelectron spectroscopy (XPS), elastic recoil detection analysis (ERDA) and Rutherford backscattering spectrometry (RBS). We also show how the biased QCM system can be used to study the surface chemistry of the new CVD method by timeresolved deposition experiments, where the metal precursor and the plasma electrons are supplied sequentially.