Film deposition was carried out in two different manners: either by continuously introducing FeCp2 to the substrate while maintaining the plasma discharge, or by introducing the precursor and the plasma in sequential pulses, i.e., time-resolved deposition. Film depositions were carried out during 60 s (continuous CVD) and approximately 120 s (time-resolved CVD), in a total pressure range of 33-50 Pa, depending on the precursor flow. The QCM crystals were replaced after each deposition to always ensure similar surface conditions. The QCM data was collected and analyzed during depositions using the SQM160 software (Inficon), with a temporal resolution of one count/ second.