WSe2 photodetectors were fabricated following a standard scotch tape exfoliation technique onto HMDS-functionalised glass substrates. Once exfoliated, the contacts were patterned using optical photolithography with a maskless aligner (µMLA, Heidelberg Instruments). For geometries with channel lengths of less than 2 µm, the electrodes were written using electron beam lithography (JEOL JSM-6500F). The metal contacts were evaporated with a thickness of 2.5 nm titanium followed by 10 nm of gold at a pressure of <2 × 10 -6 mbar. The storage and examination were performed under atmospheric conditions.