An introductory illustration of the proximity effects can be seen in Fig2. where one of the resists involved in the study (PR_hybrid Ormocomp/V-Shape, see experimental section for details about the composition) is exposed with an array of irradiation beams (5×5 spot array with a 2.22 µm inter-spot distance) of increasing irradiation intensity. At low intensity, all irradiated spots present a similar polymerization pattern, slight variations being due to non-uniformities in the diffraction pattern resulting from imperfections in DOE fabrication (see experimental section). Upon increasing the intensity, it becomes very apparent that the pattern progressively changes, with an increased polymerization efficiency in the center in comparison with the periphery (Fig 2 .). This evolution corresponds to increasing overlap and crosstalk in the exposed area, and can be influenced by many parameters that we will explore in the rest of this article.