The photothermal deflec�on spectroscopy (PDS) setup used in this study consisted of a light source (LOT-QD; 1000 W Xe high-pressure lamp and a 300 mm monochromator (LOT-QD MSH 300) op�mized for a maximum intensity of 200 nm to 2500 nm). The light was modulated by a chopper (Thorlabs) with a frequency of 5 Hz and focused on a spot size of 2 x 6 mm on the sample through a f = 75 mm lens. The intensity of the incident light was monitored using a quartz glass plate as a beam spliter placed between the focusing lens and the sample, and a trans-impedance amplified silicon detector (Thorlabs). The deflec�on of a 0. ), which was then fixed in a quartz glass cuvete (CV10Q3500F, Thorlabs) filled with FC-770 (Sigma Aldrich). The PDS measurement was carried out from 200 nm to 2500 nm in 2.5 nm steps, with the monochromator slits at 2 mm the resolu�on was 5 nm in the wavelength range 200 -1000 nm and 10 nm in the wavelength range 1000 -1600 nm.