We conducted an additional series of simulations to explore the instantaneous surface processes while irradiating tungsten oxide with oxygen. The objective was to examine the sputtering of W and O and reflection dynamics upon single O impact on preoxidated W slabs during the irradiation process. To achieve this, we employed two types of slabs derived from previous accumulation simulations: one with 200 O deposits for all incident energies (low oxygen irradiation) and the other with 500, 900, and 1200 O deposits resulting from cumulative O impacts of 1, 10 and 30 eV on W slabs, respectively (high oxygen saturation). We designate the three low oxygen irradiation scenarios as "A-deps" and the three high oxygen saturation scenarios as "B-deps". The A-deps (Fig. ) and B-deps (Fig. ) slabs. For the A-deps slabs, it is evident that most of the impacting O atoms form an ad layer over the W surface, penetrating less than 2 below the surface. However, at the end of the accumulation (Fig. ), the penetrated O atoms are distributed up to 5, 10, and 13 Å the W for impact energies 1,10 and 30 eV, respectively. Fig. shows the increase in the thickness of the ad layer during irradiation by O, with increasing the number of deposited O atoms.