XPS Measurements. Hybrid films with incorporated TNRs and TNPs (2 mg/mL in chloroform) were deposited on Ti/Au-coated silicon wafers ((2 × 2) cm 2 , Ti/Au thickness: 10 nm/100 nm) by LbL-SC (one deposition cycle). After deposition, the substrate was divided into four equal sections. The different sections were exposed to DUV light for 30 min and 240 min for GO reduction. One section was left untreated as a reference. Measurements were made using a high-resolution two-dimensional delay line detector. Incident radiation was provided by a monochromatic Al K α X-ray source (photon energy 1486.6 eV; anode operating at 15 kV). Spectra were acquired in fixed transmission mode. A pass energy of 25 eV was chosen, resulting in a resolution of > 0.4 eV. A flood gun was used during the measurements at an energy 2.0 eV with 20 µA emission to compensate the charging effect.