The wide range of applications of MHP films underscores the importance of accessing to an in-depth knowledge of the film growth mechanism and to better understand the crystallization process, including the evaporation of residual solvent, internal phases, and morphological changes of 2D, Quasi-2D, Quasi-3D, and 3D films during thermal annealing. To optimize the performance of MHP film-based devices, for example, one can focus on improving crystal quality by slowing down the crystallization rate of the film and altering the direction of solvent removal by adding various additives. Most importantly, one can achieve the desired film growth rate by adjusting the amount of additives. Additionally, controlling the thermal annealing time and the pKa (deprotonation) of the spacer can help to regulate the ratio of different phases in the film, ultimately maximizing the performance.