For engineering the required mid-IR response of MIM metasurface, the calcium fluoride CaF 2 has virtue of having the refractive index very close to that of SiO 2 and a high transmission in the of the MIM metasurface and 100 nm is sufficient for full suppression of light transmission at mid-IR wavelengths. After 5 nm of Cr deposition on the Si, CaF 2 and SiO 2 were deposited with designed thickness. The thickness of the films was analyzed by ellipsometry and it was found that the thickness of the films was about 250 ± 20 nm. According to the results of our previous comprehensive search for the optical properties of MIM metasurfaces , it was found that the film thickness of the dielectric spacer has a little effect on the optical properties of the metasurface at mid-IR. After the dielectric composite layer was deposited, the pattern of top-layer structures were drawn by electron beam lithography (EBL) at the required nano-micro-size and scale. The diameter of the nano-disks increased from 400 nm to 2000 nm in 50 nm increments while from 2 µm to 3 µm in 100 nm increments, from 3 µm to 4 µm in 200 nm increments and from 4 µm to 10 µm in 500 nm increments, respectively, for a total number of 60 MIM metasurface patterns. All the patterns have a twice larger period than the disc diameter Λ = 2D. After the EBL definition of metasurface was completed and developed, a 5 nm of Cr and 50 nm of Au were deposited by thermal evaporation. Lift-off to the fabricated metasurfaces was made in N-methyl pyrrolidone.