We found complete photonic band gaps for structures with refractive index as low as n=1.55 with a0/R=2.4 for the topological lattice (Figure ) and a0/R=4.4 for its trivial counterpart (Figure ), when the rod radius is set to r=0.12a0. In contrast, previously demonstrated photonic topological insulators have been fabricated from materials with much higher index, such as silicon (n=3.8) and silicon nitride (n=2.0) in the visible and alumina at microwave frequencies (n=3.1). Our design thus greatly expands the pallet of available materials for producing photonic topological insulators, including polymers at optical, infrared, and microwave frequencies, and oxides at optical frequencies. Further, because this design is compatible with additive manufacturing, it is easily scalable to THz (via stereolithography) and visible frequencies (via multiphoton absorption polymerization), for which fabrication is otherwise challenging.