Electron beam damage of particles during TEM imaging can be due to knock-on or sputtering damage. For instance, Ott et al. showed electron beam damage of ammonium sulfate particles caused formation of circular holes. Supporting Movie 2 shows electron beam damage of an NaCl particle at ~40% RH due to sputtering/knock-on at a magnification of 400 kX (electron flux of 4.15 e -/Å 2 s). Electron beam damage to the NaCl particles was not observed for low magnifications (< 100 kX) and electron fluxes (< 0.374 e -/Å 2 s) used to collect the data in this study (Supporting Movie 1). As long as magnification was limited to < 100 kX, we did not observe any qualitative differences in the dynamics of the NaCl dissolution and droplet growth.