The MIM metasurface was fabricated as previously reported . In short, silicon substrates were coated with 5 nm of Cr, then 200 nm of Au was deposited. The polymer solution was uniformly coated on the substrate by spin-coating and the curing reaction was carried out by heat or light treatment. The desired nano/micro structures were obtained by series of processes, including spin coating of e-beam resist, e-beam drawing, development, followed by deposition of 5 nm Cr and 50 nm Au with the final l ift-off s tep. A s t he m eta-surface structures are resonating at the molecular finger p rinting s pectral region, we fabricated nano-disc structures with diameters from 600 nm to 4000 nm and measured their reflectance R . A ll t hree polymeric materials used in this study were chosen because they are chemically stable and do not dissolve in the organic solvents using processes of metasurface fabrication. They are not damaged by irradiation during e-beam lithography after curing. A polyimide precursor was polyamic acid (Pyer M. L. Sigma Aldrich), which was diluted with NMP (N-methyl pyrrolidone). SU-8 3050 (Kayaku Microchem) was also diluted with NMP while the OMR-100 (Tokyo Ohka Kogyo) was used as the original solution formulation. After spin coating, the imidization reaction of the polyimide was promoted by sintering at 200 • C. The cross-linking reaction of SU-8 and OMR-100 was promoted by irradiating resist films w ith a n U V-lamp f or 1 0 m in a nd t hen b aking a t 1 00 • C for 10 min.