In a previous study we have shown that the addition of Cr notably increased the extinction = 1of a metasurface even for layer thicknesses as low as 5 nm . Therefore, it is expected that when the thickness of a Cr adhesion layer is increased further, the absorption cross-section also would be augmented. Figure shows the results of FDTD simulations with different Cr layer thicknesses ranging between 0 nm and 50 nm. There was a clearly observable departure from the abs / sca = 1 condition, denoted by Δ, as the amount of Cr was increased. Indeed, Δ increased from 1 when adhesion layer effects were disregarded, up to 1.25 when Cr layer thickness was 50 nm. These simulation results strongly suggest that the absorption/scattering ratio can be adjusted by controlling the thickness of an absorption layer interspersed between insulator and Au on both sides of the MIM stack. As mentioned previously, then plasmon resonance vanishes if the electric conductivity of insulator layer is increased. However, this MIM structure with Cr absorber layers ensures that the SiO 2 layer insulation between both metallic parts of the MIM structure is maintained.