Null ellipsometry and SPR measurements of thin films were performed on a Multiskop (Optrel GbR) with a 632.8 nm HeNe laser light source at 70 • . Null ellipsometry was performed using a HeNe laser at = 632.8 nm at 70 • , and film thicknesses were determined using integrated specific software. Film thickness was obtained by fitting ellipsometric data using manufacturer-provided specialized software. At least three spots on each wafer were measured, and the thickness was averaged. Uncertainties reported are the standard deviation of three measurements. To obtain thickness values of the samples, a simple box model was employed and a refractive index of n = 1.5, k = 0 was used for all polymer layers.