In principle, deposition is the reverse process of etching, by inverting the polarity of the pulse. The charging process laid out above is therefore expected to be equivalent, where it should be noted that additional effects such as mass transport limitations or potential barriers for nucleation can affect the growth process. Based on Equation , the localization is proportional to 𝐿 ∝ 𝐷√( 𝐶 𝜖𝑇 ), such that low diffusion coefficients provide the highest resolution. Thus, dimethyl sulfoxide (DMSO) solvent is used rather than a water-based electrolyte, similarly to what has been reported previously as a means to increase resolution for the localized etching of gold due to the viscosity of the liquid . We consider the absence of protons to be an important factor, where the resolution should be improved by at least a factor ~10 comparing diffusion coefficients of the cobalt ions (D 1*10 -9 m 2 /s, see below) to protons (D = 1*10 -8 m 2 /s) in water.