The DMAC-TRZ derivatives were then trialled in the reaction using these conditions (DIPEA as the additive, DMF the solvent and 1 mol% of PC). Pleasingly, all compounds dehalogenated the substrate (Table , entries 5-10), and the substituted DMAC-TRZ derivatives afforded higher product yields than DMAC-TRZ (55-100% and 43%, respectively). The GC-MS yields were highest with derivatives possessing EWGs, which may 10 be a consequence of these being more absorptive at the excitation wavelength (390 nm, Figure ); this may influence the reaction kinetics. Thus, the dehalogenation of the substrate using OMePh-DMAC-TRZ as the PC was conducted for 48 h, resulting in an improvement in yield from 55% (18 h irradiation) to 70% ( To increase the dehalogenation yield with DMAC-TRZ, other amines, PC loadings and solvents were screened (Table and); however, no improvement in product yield was observed. Additionally, the tolerance of the reaction to air was investigated; all PCs, except OMePh-DMAC-TRZ, performed equally well under aerated conditions (Table , entries 5-10). Therefore, subsequent reaction scope was conducted using DIPEA as the amine, DMF as the solvent, and aerated conditions.