In Sections 3.2-3.3 we report a retention of the gas-phase conformer abundance when N2:CH3ONO is deposited normal to the surface while the cis conformer abundance is enhanced as the angle of deposition deviates from normal. When deposited normal to the surface, CH3ONO cools rapidly and does not have sufficient time to diffuse and desorb, resulting in abundances that match those of the gas phase. When deposited at an angle, the momentum vector of CH3ONO has a parallel component, enabling processes such as surface diffusion and desorption. Quantum chemistry calculations indicate that N2:cis-CH3ONO is energetically stabilized relative to trans:N2. We therefore argue that when N2:CH3ONO is deposited at an angle, CH3ONO does not cool rapidly enough to trap both conformers in their gas phase abundances. Instead, CH3ONO undergoes processes like surface diffusion and desorption. During these processes, the larger energetic stabilization of cis:N2 results in decreased desorption of cis compared to trans, leading to enhancement of the matrix-isolated cis conformer. Energetic stabilization of cis does not preclude enhancement of the cis abundance from surface morphology effects. However, further theoretical and experimental characterization of the angular dependence of N2 matrix deposition is needed.