We applied the CL adjustment to all our EBEC MicroED datasets. We found that in fast EBEC diffraction patterns measured from salen ligand crystals illuminated with a flux of 0.045 e -/Å 2 /s, approximately 0.003 % of all pixels had counts > 80 e -/pix/s (Supplementary Figures ). Despite the low number of pixels affected, those pixels were distributed across a wide number of frames and reflections. Some affected pixels had counts that approached the effective counting limit of the sensor (Supplementary Figures ); these were principally observed in high-incident beam flux datasets.