The most common method for fabrication of devices based on MXenes is the deposition of MXene films. Nevertheless, MXene micropatterning has been achieved using various approaches. With microcontinuous liquid interface production (µCLIP) patterns of around 100-200 µm were achieved. Inkjet printing can also potentially be used to print lines and microarrays with a line width of less than 5 µm. However, the highest resolution for inkjet printing of MXene reported so far is 40 µm line width. Bubble printing offers several advantages which make it a promising technique for micropatterning of MXenes on flexible substrates, such as speed, simplicity, no need for pre/post-processing steps, resolution down to <10 µm, and the capability for free-form patterning. While lines of roughly 7 mm were printed herein due to the size of the imaging spacers used, there is no real limitation to the potential length of the printed lines aside from the substrate dimensions and configuration of the optical setup and stage.