Stainless steel discs (MTI) of 0.5 mm thickness and 15.5 mm diameter were ultrasonically cleaned with dichloromethane, MilliQ water and isopropanol, and used as substrates. Elemental Si and co-deposited Si-Al films were prepared using an Orion 8 confocal sputtering system (AJA International) in sputter-up configuration. The deposition rate for Si was 0.22-0.28 A/s, at 75-100 W DC power with an Ar pressure of 4 mTorr. For the co-deposited films, the Al deposition rate was adjusted to yield compositions from 25 to 80 at% Al.