However, these methods often lack atomic-level processing precision, uniformity, and scalability for prospective industrial workflows, and are prone to introducing contaminants and defects into the intrinsic Ti 3 C 2 structure. Plasma treatment has been demonstrated to effectively alter surface functional groups with high atomic precision. For example, N 2 plasma can increase the photocatalytic activity of TMC by introducing beneficial surface terminations. Among surface terminations (-F, -OH, =O) of TMC, -OH and =O have demonstrated higher electrical conductivity. Low-power O₂/Ar plasma is ideal to realize etching and replacement of the surface termination functional groups, converting as-fabricated -F into -OH or =O. The mechanisms of O 2 and Ar plasma treatment differ significantly but there is a synergistic amplification effect when using them as a mixture. O₂ plasma treatment induces chemical modification as O 2 discharges and releases O-