The polymer monolayers were stained using SIS in a GEMSTAR Arradiance atomic layer deposition tool. The monolayers were subjected to one cycle of SIS of AlOx at 90 ˚C. Each cycle of SIS included three 21 msec pulses of TMA with a 2 min soak time and a 10 min purge time followed by three 21 msec pulses of water with a 2 min soak time and a 10 min purge time.