A schematic illustration outlining the synthesis procedure of nanostructured Sb2Se3 thin films is depicted in Figure . 200 nm of Au layer was deposited onto FTO to form an ohmic contact with the Sb2Se3 thin films. Subsequently, the metallic Sb layer was deposited at varying substrate temperatures using a thermal evaporator. Detailed synthesis information can be found in the experimental section. Both top-view (Figure ) and cross-sectional scanning electron microscopy (SEM) images (Figure ) reveal a compact and pinhole-free morphology of metallic Sb thin films. The thickness of both metallic Sb layers is around 240 nm, as determined by profilometer measurement (Figure ). X-ray diffraction (XRD) was conducted to determine the effect of substrate temperature on the crystal evolution of metallic Sb thin films.