where 𝑉 𝑡 (𝑥, 𝑦) and 𝑉 𝑏 (𝑥, 𝑦) are the projected potentials of the top and the bottom layers, respectively. The last term describes the overlap of the top-and bottom-layer potentials, which can, in principle, contribute to the formation of moiré peaks in the diffraction pattern. In high-energy (20  300 keV) electron microscopy, however, the related moiré peaks are not observed because of the following reasons. From Eq. (S3), one sees that the second and third terms, which describes the intensity of the main peaks, are proportional to 𝜎, whereas the last term to 𝜎 2 . Note, however, that for typical TEM electron energies (20  300 keV), the value of 𝜎 is relatively small, e.g., 𝜎 = 0.81 (keV • Å) -1 at 100 keV. Consequently, the last term proportional to 𝜎 2 becomes negligibly small, as compared to the second and third terms, resulting in the absence of moiré peaks in conventional TEM mode. When the electron energy is reduced below ~100 eV, moiré peaks should be visible as 𝜎 becomes relatively high, 55 e.g., 𝜎 = 25.61 (keV • Å) -1 for 100 eV. However, atomic-scale imaging is not possible for such low electron energies.