In some experiments which were done to demonstrate the importance of controlled surface reaction, the purge time between TMI and NH3 plasma pulses was varied between 0.1 to 8 sec with growth temperature of 320 °C. To facilitate the comparison on the surface morphology of initial deposition stage, 150 ALD cycles (with a nominal thickness of 6 nm at 320 °C and 10 sec purge time) were performed for each condition.