In this section, all procedures were carried out following the synthesis of Sb2Se3 and preceding the catalyst soaking. Prior to any of these treatments, a layer of Teflon tape was applied to mask the exposed Au surface. Subsequently, the Sb2Se3 thin films were briefly immersed in a transparent yellow solution of (NH4)2S (10 wt%) for 5 seconds. They were then rinsed with distilled water and dried under a nitrogen stream (N2). This particular sequence of steps was undertaken as the initial measure before further treatments, owing to its effectiveness in enhancing device performance, as previously detailed in our earlier publication. For a 1 mM [Mo3S4] 4+ catalyst deposition, 7.20 mg of [Mo3S4(H2O)9]Cl4 were dissolved in 10 ml 1 M HCl and sonicated for 30 minutes. Similarly, for 1 mM [Mo3S13] 2-catalyst deposition, 7.77 mg (NH4)2[Mo3S13]⋅2 H2O were dissolved in 10 ml distilled H2O and sonicated for 30 minutes. Samples were placed in the catalyst solution and soaked for 12 hours at room temperature. They were then rinsed from the back and annealed at 120˚ C for 30 minutes. The same procedure was performed for the catalyst deposition on FTO.