The surface morphologies of the InN samples were studied by high-resolution LEO 1550 Gemini field emission scanning electron microscope (SEM). The crystalline quality, thickness and the macro-scale roughness were characterized by using x-ray diffraction (XRD) (PANalytical X'Pert Pro with a Cu-anode X-ray tube). Grazing-incidence XRD (GIXRD) and symmetric 2- and -scans were used to study the crystalline quality. The film thickness was determined by analyzing the X-Ray reflectivity (XRR) results. The XRR data was fitted by software PANalytical X'Pert reflectivity using a two-layer model of the InN film and the substrate (InN/substrate).