Broadening of the diffraction peaks, potentially due to the presence of stacking defects, prevented distinguishing between the two models for these samples. However, the diffraction pattern of B-CuHHTP showed significantly better agreement with that of the near-eclipsed stacking model than the eclipsed. This can be clearly seen by examining the low 2θ diffraction peaks. Distinct peak splitting is seen in this region for B-CuHHTP, closely resembling the peak splitting observed in the simulated pattern for the near-eclipsed model (Fig. ). This splitting was not conclusively seen in the diffraction patterns of both A-CuHHTP and C-CuHHTP. This suggests a potential increased stacking shift of the layers when Cu3(HHTP)2 is synthesised in the presence of DMF, consistent with previous observations. This indicates that modulator identity can influence the stacking sequence of these materials, an exciting phenomenon which has not been noted previously. Future work is needed to further examine the impact of modulator identity on the structures of layered MOFs.