The results obtained by AFM imaging of the CrN layer deposited through HiPIMS sputtering (Figure ) indicate that at reduced deposition times the microscopic scratches that were on the Si substrate took place are still visible after the deposition process, indicating an ultrathin layer (which is confirmed by the results from Table ). As the deposition time increases to 10 minutes, the microscopic scratches that were on the Si substrate are still visible, indicating the formation of a layer that has a thickness comparable to the layer deposited in 5 minutes. Lastly, for the deposition time of 15 minutes, the HiPIMS sputtering method creates a layer that has a more uniform appearance than those obtained at shorter deposition times. The same conclusion is supported by the statistical analysis discussed below.