In several other works on electron enhanced ALD (EE-ALD), an ALD process related to e-CVD, the surface chemistry is suggested to be governed by Electron Simulated Desorption (ESD), i.e., the electrons are used to remove atoms or molecules from the surface of a material. Secondary emission of electrons is expected to contribute to the overall process of ESD, and secondary emission of electrons is therefore an important feature in the surface chemistry of EE-ALD. We believe that the surface chemistry of e-CVD is instead governed redox reactions where the surface ligands leave the metal centres upon their reduction. Due to a lack of experimental evidence, we have never been able to sketch a mechanism for how the ligands leave the surface. As such, we believe that the surface chemistry in e-CVD reactions are different from the ESD governed surface chemistry in EE-ALD.