Silica (quartz) is one of the most commonly used substrates for a variety of applications. The properties such as optical transparency, bio-compatibility, chemical inertness, mechanical rigidity, and electrical insulation make it suitable for various applications such as optical devices, microelectromechanical (MEMS) systems/devices , microfluidic platforms , and solar cells. Typically, silica has high transmittance in the visible region with low reflectance, which can be modulated by surface texturing and exploited in optical devices. Surface texturing improves the scattering and reduces the reflection of the incident light. Wet chemical etching of silica films is extensively used in integrated circuit (IC) technology for device dielectric isolation. Silica is also used for the fabrication of MEMS devices such as resonators , tuning fork probes , and gyros due to its excellent piezoelectric properties, optical transmission, electrical insulation, and stability. The surface morphology affects the performance of these devices. Mechanical polishing is not an effective route to acquire textured surface structures and therefore, a controlled fabrication route is necessary.