Unfortunately, this parallelization can have a detrimental effect on the uniformity of the repeated structures due to the so-called "proximity effects". Polymerization appears to depend on the local photochemical environment and the intensity distribution further away from the desired focal spots. Thus, reducing the distance between structures proves to be more challenging than reducing the feature sizes due to structure broadening and sporadic connections that arise between them. When simultaneously exposing several spots, this effect is exacerbated and different local TPP thresholds are observed, for example, at the center and in the corner of a write spot array. This effect is attributed to diffusion phenomena and has already been observed for conventional single photon polymerization as well as in DLW, both with low one-photon absorption (LOPA) and two-photon absorption . It has even been already taken advantage of to improve surface smoothness . Although it has occasionally been highlighted in articles dealing with DLW, proposing tracks to correct it mainly with dynamic irradiation power control , its precise and quantitative characterization is scarce and has, to our knowledge, never been reported in detail for parallel plotting. It has also recently been identified as a key difficulty that must be overcome to enable significant parallelization speed improvements through the use of large numbers of closely spaced write spots .