Additionally, it has previously been suggested that the N-C bond on the ligand can only be broken at elevated temperatures, or by using plasma, leading to loss of the entire intact ligand. The combination of a weak metal-N bond and high volatility in metal alkylamides generally facilitates effective deposition at lower temperatures. Our results are in line with this as we only detect the assumed ligand decomposition product, NCH3 + , with m/z = 29, during the NH3 plasma pulse (Fig. ). This activation process is occasionally achieved using plasma containing hydrogen, or nitrogen radicals (NH3 plasma in this case). Presumably, NH3 undergoes oxidation during the reaction process to produce molecular nitrogen as a byproduct, reaction (2). The oxidation of the reducing agent is a key step in the overall reaction mechanism, where it plays a role in facilitating the reaction with the metal center and the formation of AlN.