For p-ssDSCs and n-ssDSCs, the transparent ITO back contact electrode was deposited on the ZnO and SPIRO of the respective NiO and TiO2 films. The deposition was done via directcurrent magnetron sputtering from a ceramic ITO (90/10, purity 99.99 %) sputtering target in a deposition system CS730 (Von Ardenne). The depositions were carried out for 120 s at a power of 640 W, corresponding to 2 W/cm 2 , in an Ar+O2 atmosphere (1.8 % O2) at a total pressure of 0.6 Pa which resulted in an ITO layer with a thickness of 200-250 nm.