While the overall trends of LSPR modulation obtained through chemical doping and electrochemical doping are qualitatively similar, on a quantitative scale, some stark differences can be observed. Inter-NC LSPR coupling becomes stronger as electrons are added in thin films, counteracting and convoluting the individual NC trends in LSPR shifts and making a clear assessment of the importance depletion effects on the LSPR of each NC challenging. Underscoring the significance of this complicating factor, the chemically induced LSPR shift of ~13 nm NCs studied here is greater than 500 cm -1 , in contrast to 226 cm -1 for 11.5 nm and -191 cm -1 for 16 nm for electrochemical doping in thin films 10% Sn:In2O3 NCs. Therefore, chemical doping has allowed us isolate the effects of depletion layer charging on the LSPR modulation by removing inter-NC plasmon coupling as a strongly competing factor.