The high capacitance seen at metal/water interfaces has to do with the contribution from the electronic response of the metal electrode. The origin of this negative contribution was attributed either to the response of electronic spillover by Schmickler using the jellium model for the sp metals or to the response of contact potential between adsorbed water molecules and metal electrode by Cheng and co-workers using DFTMD and counter-ion methods. However, what the response of electronic spillover looks like for a realistic d-block metal using modern electronic structure calculations and how that changes upon the contact with electrolyte solution is not known. These are precisely the types of questions that finite-field methods can answer. In particular, we can leverage on the freedom to switch between the full DFT Hamiltonian implemented in the CP2K code and the semi-classical Hamiltonian implemented in the MetalWalls code for the same chemical composition of the system under the same electric boundary conditions.