Control experiments were performed to validate the mechanism of the formation of the radical anion. Thus, the individual components, i.e., the parent DHP 5 (Scheme S1) and NDA 2 (Scheme 1) (10M in DMF, degassed with N2) were separately exposed to 370 nm light and the samples were studied with both UV-vis and fluorescence spectroscopy for up to 10 min of exposure. No significant spectral changes in UV-vis and emission study were observed suggesting that no radical formation took place with these systems (Figure ). Whereas the same experiments with 1c displayed a substantial change in the spectra upon exposure to 370 nm light (see above).