When designing precursors for the material systems Al and AlN, certain parameters must be considered. As Al is prone to oxidation, oxygen must be avoided in the precursor's ligandand especially in the coordination-sphere and thus, inhibiting potential oxide formation during the process by incorporation of oxygen atoms originating from the precursor itself in CVD process. Hence, the focus of this comparative study lies on Cand N-coordinating ligands. A further issue which must be considered is the rather low stability of Al-H bonds, which can be addressed by stabilization through dative bonds, through introduction of multidentate ligands or a combination of both. Structural variations of sidechains and substituents can furthermore be exploited to fine-tune the thermal properties and reactivity of a potential precursor and tailor them for a specific process.