Direct laser lithography to generate a microscale image. Direct laser lithography was used next to generate a complex, microscale image on Material 1. The 50-poly(S-r-CPD) material offered the best control and resolution in generating lines by ablation, as described in the previous sections. The 532 nm laser was used in this process, operating at 7% power (1.3 mW) to generate the finer lines of the "Micro Lisa" image shown in Figure , which were approximately 9 µm wide and 2 µm deep. Higher power laser (17.5%, 3.0 mW) was used to generate the wider and deeper lines of the square frame, which were approximately 23 µm wide and 5 µm deep. The two power settings were used to showcase the control in line width and depth in generating complex images on the polymer surface. The laser ablation process was fully automated and encoded by a suitable script (Data S1). This demonstration of direct laser lithography is unique in the low cost of the polymer substrate and the simplicity of the laser system, operating in the visible spectrum at powers between 1 and 3 mW.