Table presents the data on reflection, retention, and sputtering for both A-deps and B-deps scenarios following the impact of O atoms. Additionally, it shows the maximal depths reached by 90% of reflected O atoms and the depths from which 90% of sputtered atoms were ejected. No sputtering of O was observed for the 1 eV impact energy. Moreover, the O retention probability (which complements reflection probability to 1) was notably high for 10 and 30 eV impacts. In contrast, for the 1 eV scenario, the retention probability was approximately 50% for the low-O oxide layer, but only 12% for O in a saturated oxide layer. Details of the sputtering and reflection depths for impacted oxygens are illustrated in SI, Figs. S-5 and S-6. For the 10 eV impacts, 90% of the sputtered O atoms were ejected from less than 1Å below the top of the ad layer, that is, from more than 4 Å above the original W surface of the A deps. This implies that the O atoms sputtered from that surface were predominantly ejected from the ad layer. A similar conclusion can be drawn for sputtering of O in the case of B-deps of the 10 eV impact, where O atoms are sputtered from less than about 6 Å below the top ad layer's surface, well above the B-A-B region. Conversely, for the A-deps scenario, for 30 eV with 200 O deposits, most of the sputtered O was ejected from less