Synthesis of Bdpy2 probe. Bdpy2 synthesis procedure is explained in the Supporting Information in section S1. SOµC microchips fabrication. 100-mm-Φ silicon wafers are use as initial substrates. First, a numerical code is marked in the wafers for their identification using a diamond tip scriber. Then the wafers are cleaned. The fabrication process starts by a thermal silicon oxidation of 1 µm at 1100 ºC (TS-Series V, Tempress). Then a standard photolithographic process is performed by using a stepper (Nikon i12D) and using 1.2-µm-thick positive photoresist HIPR 6512 (Fujifilm).