Neither oxygen stoichiometry nor thickness were measured. We expect the oxygen stoichiometry to reflect the equilibration of the respective thin film composition with air at 700 °C and to be best characterized by phase identification, which as noted in Fig. , Fig. , and Table involved predominantly rutile-type structures where the metal-to-oxygen ratio is approximately 2. The film thickness is on the order of 200 nm and varies with composition as a result of the co-sputter deposition using the natural gradients in deposition rate from each source. The XRF results include calibration of the molar loading of each element. The full XRF analysis can be found at .