For the DC power supply (Figure ), the deposition is rough, and a fine columnar growth pattern can be seen even after a deposition time of 5 minutes. The growth pattern for the DC method first develops as small blobs, and as the deposition time increases those blobs act as nuclei for other blobs to form near and on top, thus increasing in size. Finally, because of the distribution of these blobs, a columnar growth pattern begins to form. Our findings are confirmed by other results in literature, as DC sputtering is known to create fine and columnar depositions, a fact which we have shown holds true even for ultrathin deposition as in our case. On the contrary, in the case of HiPIMS power supply (Figure ), no noticeable growth pattern can be distinguished. This shows that the deposition layer is smooth and homogeneous as there are no noticeable growth patterns. This kind of deposition mechanism is also representative, as the HiPIMS deposition is known to create dense and glassy depositions. This seems to hold even for ultrathin depositions as in our case.