In the introductory part, TMI was first presented as a suitable precursor for thin film deposition of InN using different techniques. The pyrolysis of this organometallic compound was first studied by Jacko & Price, as early as in 1964. In their study, they could confirm the homogeneous nature of the process in a toluene carrier flow system, also reporting that the TMI decomposition should occur through the sequential dissociation of its In-CH3 bonds to form methylindium (MI, InCH3) and CH3 radicals, i.e.: In(CH3)3(g)→ In(CH3)2(g)+ CH3 • (g) ( )