For an Arrhenius plot, we deposited films at 650-900 °C (see Figure ). From the Arrhenius plot, the deposition rate of B-C films from TMB in argon ambient increases with temperature, indicating that the deposition is done under kinetically limited conditions in the whole temperature range studied. Deposition rate of B-C films from TMB in hydrogen ambient increases with temperature up to about 800 °C where the deposition rate levels out for higher temperatures, indicating that mass transport to the surface becomes a limiting factor at about 800 °C. One may argue that an inhibited deposition process could explain this, however, control experiments in hydrogen at 800 °C for 30 minutes and for 3 hours, showed a linear increase in growth rate, like the behavior observed at 700 °C in argon. We thus believe that the deposition process is not inhibited at 800 °C. Thus, depositions at 700 °C are done kinetically limited conditions in both H2 and Ar.