LaNiO3 targets were synthesized by solid-phase reaction. Stoichiometric amounts of La2O3 (Alfa, > 99.999%) and NiO (Alfa, > 99.999%) were mixed in a mortar. After grinding for 2 hours, the powder was pressed into pellets through a hydraulic press at 10 tons of pressure for 2 minutes, and finally these pellets were calcined in a muffle furnace (Kejing, KSL-1700) at 1000 ℃ for 24 h with a 5 ℃/min heating rate, followed by naturally cooling to room temperature. LaNiO3 single crystalline thin films were grown on one-side polished (100)-oriented 0.1% Nb-doped SrTiO3 (HeFei, Kejing) substrates by PLD using the respective oxide targets. Laser ablation was performed at a repetition rate of 5 Hz and an energy density of 1.0 J/cm 2 with a 248 nm KrF excimer laser. To achieve ~30 nm film thicknesses, the laser was impinged on the target for 30 min applying a substrate temperature of 650 ℃ and an O2 partial pressure of 13.3 Pa.