Photocatalytic Reduction and Patterning of (GO/rGO)/TNC Films Substratesupported GO/TNC films were illuminated in ambient conditions with deep UV (DUV) light using a custom-built source (main emission at 254 nm, irradiance 520 mW/cm 2 ). Illumination times were varied from 15 min to 7 h. To prevent overheating of the samples the setup was continuously ventilated using fans. For photocatalytic patterning, the films were illuminated through custom-designed quartz masks. To pattern well-defined microstructures, the samples were illuminated through a quartz mask using a Mask Aligner (Karl Suss MJB-3) equipped with a UV lamp (Osram HBO 200 W/DC, Hg lamp, multiline spectrum).