Scientists set resolution record for drawing at 1-nanometer
US-based scientists have developed an electron microscope-based lithography system for patterning materials at scales of a single nanometer (nm). They patterned thin films with 1.7-nm-long features having a spacing of 11 nm, yielding an areal density of nearly one trillion features per square centimetre. The technique could be used to create or study materials at atomic scales, researchers said.