 14 May 2007 Methodology of adhesive energy for photomask fabrication using scanning probe microscopyS. Shimada , T. Shimomura , K. Yoshida , M. Kurihara , H. Mohri , N. HayashiProceedings Volume 6607, Photomask and Next-Generation Lithography Mask Technology XIV; 660728 2007 S. Shimada, S. Shimada, T. Shimomura, T. Shimomura, K. Yoshida, K. Yoshida, M. Kurihara, M. Kurihara, H. Mohri, H. Mohri, N. Hayashi, N. Hayashi, Methodology of adhesive energy for photomask fabrication using scanning probe microscopy, Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660728 14 May 2007; doi: 10.111712.728991; S. Shimada, T. Shimomura, K. Yoshida, M. Kurihara, H. Mohri, N. Hayashi, Methodology of adhesive energy for photomask fabrication using scanning probe microscopy, Proc. SPIE 6607, Photomask and Next-Generation Lithography Mask Technology XIV, 660728 14 May 2007; 