 26 May 2010 Evaluation of a next generation EB mask writer for hp 32nm lithographyTadashi Komagata , Takahisa Hasegawa , Kazuya GotoKenji Kono , Ryuuji Yamamoto , Naoki NishidaProceedings Volume 7748, Photomask and Next-Generation Lithography Mask Technology XVII; 77480I 2010 Tadashi Komagata, Takahisa Hasegawa, Kazuya Goto, Kenji Kono, Ryuuji Yamamoto, Naoki Nishida, Yasutoshi Nakagawa, Evaluation of a next generation EB mask writer for hp 32nm lithography, Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77480I 26 May 2010; doi: 10.111712.866750; Tadashi Komagata, Takahisa Hasegawa, Kazuya Goto, Kenji Kono, Ryuuji Yamamoto, Naoki Nishida, Yasutoshi Nakagawa, Evaluation of a next generation EB mask writer for hp 32nm lithography, Proc. SPIE 7748, Photomask and Next-Generation Lithography Mask Technology XVII, 77480I 26 May 2010; 