 Noriko Iida, Kosuke Takai, Takashi Kamo, Yasutaka Morikawa, Naoya HayashiNoriko Iida, Noriko Iida, Kosuke Takai, Kosuke Takai, Takashi Kamo, Takashi Kamo, Yasutaka Morikawa, Yasutaka Morikawa, Naoya Hayashi, Naoya Hayashi, Etched multilayer EUV mask fabrication for sub-60nm pattern based on effective mirror width , Proc. SPIE 9984, Photomask Japan 2016: XXIII Symposium on Photomask and Next-Generation Lithography Mask Technology, 99840E 10 May 2016; doi: 10.111712.2242872; 